JP2020075410A - Polymer compound removing material, polymer compound removing device, polymer compound removing method, and polymer compound regenerating method - Google Patents

Abstract

To provide a method for removing a support material, which is capable of sufficiently removing the support material and has a short removal work time.SOLUTION: A support material removal method 200 that removes the support material SP from a three-dimensional model X and restores a model material includes: an immersion process 210 in which the three-dimensional model X is immersed in a cleaning liquid CL; a support material melting process 220 to melt the support material; a cleaning tank separation process 230 for separating the support material SP and the cleaning liquid CL in a cleaning tank 10; an overflow process 240 for overflowing a liquid from the cleaning tank 10; a recovery process 250 for recovering a liquid discharged from the cleaning tank 10 in a recovery tank 50; a recovery tank separation process 260 for separating the support material SP and the cleaning liquid CL in the recovery tank 50; and a support material recovery process 270 for recovering the separated support material SP.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a polymeric compound removing material, a polymeric compound removing device, a polymeric compound removing method, and a polymeric compound regenerating method.

  What is 3D modeling? Based on 3D shape data, thermoplastic resin, photocurable resin, powdered resin, powdered metal, etc. are fused and cured using melt extrusion, inkjet, laser light, electron beam, etc. This is a technique of stacking in a thin film to obtain the desired three-dimensional model. Since shaped objects can be obtained directly from shape data and complex shapes such as hollows and meshes can be integrally molded, starting with the creation of test models that need to be manufactured in small lots or made to order, medical fields, the aircraft industry, etc. The field of application is expanding to industrial robots.

  To obtain a three-dimensional object, a three-dimensional object forming apparatus generally called a 3D printer is used. Specifically, a 3D printer of an inkjet ultraviolet curing method using an acrylic photocurable ink, for example, Objet manufactured by Stratasys, AGLISTA manufactured by Keyence, etc., acrylonitrile butadiene styrene resin, polycarbonate resin, polyphenyl sulfone resin , A 3D printer of a heat-melting lamination method using a polyetherimide resin, for example, FORTAS, Dimension, uPrint manufactured by Stratasys, a 3D printer of a powder molding method, for example, an SLS manufactured by 3D Systems, or a stereolithography method. 3D printers such as SLA manufactured by 3D Systems and DigitalWax manufactured by DWS are known.

  Three-dimensional modeling can form three-dimensional objects with complicated shapes, but in order to manufacture hollow structures, etc., the resin under molding is temporarily supported at the bottom of the three-dimensional object and the three-dimensional object deforms due to its own weight. In order to prevent this, a structure for supporting the shape is required. In the case of a powder molding type 3D printer in which powder raw materials are bound or fused, unbound or unfused powder acts as a support to support the structure, and thus excess powder is not produced after manufacturing. You can get a three-dimensional object by removing it. Moreover, even in the stereolithography 3D printer in which the photosensitive resin is cured stepwise by laser light, etc., the uncured photosensitive resin supports the structure, so the support can be simply pulled up from the photosensitive resin tank. Can be removed. On the other hand, when performing three-dimensional modeling by the widely used hot melt lamination method or inkjet method, the support material is removed after the formation because the three-dimensional modeled object made of the model material and the support made of the support material are formed at the same time. Must be provided with a process to

  However, when performing three-dimensional modeling by the hot melt lamination method or the inkjet method, removing the support material is not a simple task. Since the support material is fused, adhered, or adheres to the model material, when peeling from the model material, there are usually means such as manually peeling with a spatula or a brush or blowing it off with a water jet. Although it is used, it requires a careful work due to the risk of damage to the three-dimensional object, which is a heavy burden.

  Therefore, materials that can be dissolved in water or organic solvents, thermoplastic resins, water-swelling gels, etc. are used as the support material, and power washing such as heating, dissolution, chemical reaction, and water pressure washing and electromagnetic wave irradiation are performed according to the properties of the support material. , A method of separating the difference in thermal expansion has been proposed (Patent Documents 1 and 2). Specifically, the resin can be easily separated from the model material (Patent Documents 3 and 4), or the support material is melted and removed by heat by using wax (Patent Document 5) to simplify the removal of the support material. Has been proposed.

JP, 2005-035299, A JP, 2012-096428, A US Pat. No. 5,503,785 WO 2001-068375 JP, 2004-255839, A

However, even if a support material that is easily separated from the model material is used, it is extremely difficult to efficiently remove the support material that is clogged up in details. In particular, as the shape of the model material becomes more complicated, the time required for removal becomes enormous. In addition, when a method of melting and removing by heat such as wax is used, an oily residue adheres to the surface of the three-dimensional model after melting and removing, and thus finishing work such as wiping is required for the three-dimensional model. Has a problem that it easily penetrates into the model material and deteriorates the surface condition of the three-dimensional object. Further, when there is coating in the next step (for example, when the three-dimensional object is a figure), the residual oil content (support material, etc.) causes defective coating.

  As described above, in three-dimensional modeling, it has been desired to establish a method for removing a support material that can sufficiently remove the support material and that has a short working time.

  In view of such circumstances, the present invention aims to provide a method for removing a polymer compound such as a support material, which can sufficiently remove a polymer compound and has a short removal work time. Further, the present invention aims to provide a polymeric compound removing material, a removing device, and a regenerating method which are used in the method for removing a polymeric compound.

  The present invention is a method for removing a high molecular compound from a work to which the high molecular compound is attached, which comprises removing the work having the high molecular compound attached to a first liquid stored in an immersion tank. A first dipping step of dipping, a high molecular compound melting step of melting the high molecular compound in the first liquid, and the high molecular compound and the first liquid in the dipping tank by utilizing a density difference A wax-type support material for a three-dimensional structure is provided, which comprises a dipping separation step of separating and a second dipping step of dipping the work that has undergone the polymer compound melting step in a second liquid. And the work is a model material for a three-dimensional structure, and the temperature of the first liquid in the polymer compound melting step is a range in which the polymer compound melts while the model material does not melt. The polymer compound is insoluble in the first liquid, the first liquid contains a surfactant and water, and the second liquid contains a post-cleaning agent and water. The post-cleaning agent is characterized by containing a substance having an amino group.

  The present invention is a polymer compound removing device for removing the polymer compound from a work to which the polymer compound adheres, wherein the first liquid is stored and the work to which the polymer compound is adhered A first dipping bath that can be dipped in a liquid, a temperature adjustment mechanism that adjusts the temperature of the first liquid, a second liquid is stored, and the workpiece to which the polymer compound is attached can be dipped in the second liquid A second dipping tank, the polymer compound is a wax-based support material for a three-dimensional structure, the work is a model material for a three-dimensional structure, The temperature is in a range in which the polymer compound melts but the model material does not melt, the polymer compound is insoluble in the first liquid, and the first liquid contains a surfactant and water. The second liquid contains a post-cleaning agent and water, and the post-cleaning agent has a substance having an amino group.

  The present invention is a polymeric compound removing agent for removing the polymeric compound from a work to which a wax-based support material for a three-dimensional structure is attached, which comprises a surfactant and water. The activator is characterized in that it comprises a polyoxyalkylene monoalkyl ether.

  The present invention is a polymer compound removing agent for removing the polymer compound from a work to which a wax-based support material for a three-dimensional structure is attached, which is characterized by containing ethanolamines.

  The present invention is a method for removing a polymer compound from a work to which the polymer compound is attached, wherein the work to which the polymer compound is attached is immersed in a liquid stored in an immersion tank. Immersion step, polymer compound melting step of melting the polymer compound of the work in the liquid, immersion separation step of separating the polymer compound and the liquid by utilizing the density difference in the immersion tank And a liquid surface cooling step of cooling the liquid near the liquid surface in the first area of the dipping tank, and sending the liquid in the first area to a second area of the dipping tank retracted from the first area A liquid feeding step, and the temperature of the liquid in the polymer compound melting step is a range in which the polymer compound melts while the model material does not melt, and the density of the polymer compound is higher than the density of the liquid. And the polymer compound is insoluble in the liquid, and the liquid surface is cooled such that the temperature of the polymer compound falls below the melting point.

  The present invention is a polymer compound removing apparatus for removing the polymer compound from a work to which a polymer compound is attached, wherein a dipping tank for immersing the work to which the polymer compound is attached in a liquid, A liquid temperature controller for setting the temperature of the liquid in the immersion tank so that the polymer compound melts while the work does not melt, and a liquid for cooling the liquid surface in the first area of the immersion tank. A surface cooling mechanism and a liquid feeding mechanism for feeding the liquid surface in the first area to a second area of the immersion tank retracted from the first area, and the density of the polymer compound is the density of the liquid. And the polymer compound is insoluble in the liquid, and the cooling of the liquid surface is performed so that the temperature of the polymer compound falls below the melting point.

  The present invention is a method for removing a high molecular compound from a work to which the high molecular compound is attached, which comprises removing the work having the high molecular compound attached to a first liquid stored in an immersion tank. A first dipping step of dipping, a high molecular compound melting step of melting the high molecular compound in the first liquid, and the high molecular compound and the first liquid in the dipping tank by utilizing a density difference And a dip separation step of separating, wherein the polymer compound is a water-soluble support material, the work is a model material for a three-dimensional structure, and the first liquid of the first liquid in the polymer compound melting step. The temperature is in a range in which the polymer compound melts but the model material does not melt, and the polymer compound is soluble in the first liquid.

  The present invention is a polymer compound removing apparatus for removing the polymer compound from a work to which a polymer compound is attached, wherein a dipping tank for immersing the work to which the polymer compound is attached in a liquid, A liquid temperature adjusting device for setting the temperature of the liquid in the dipping tank so that the polymer compound melts while the work does not melt, and an emulsion break for generating an emulsion break for the liquid in the dipping tank. Generating means, the polymer compound is a water-soluble support material, the work is a model material for a three-dimensional model, the polymer compound is soluble in the liquid Is characterized by.

  The method for regenerating a polymer compound according to the present invention is performed after the method for removing a polymer compound described above, and is characterized by comprising an emulsion break step of performing an emulsion break on the liquid in the immersion tank. Is characterized by.

  The present invention is a polymer compound removing apparatus for removing the polymer compound from a work to which a polymer compound is attached, wherein a dipping tank for immersing the work to which the polymer compound is attached in a liquid, A liquid temperature adjusting device for setting the temperature of the liquid in the dipping tank so that the polymer compound melts while the work does not melt, and an emulsion break for generating an emulsion break for the liquid in the dipping tank. Generating means, the polymer compound is a water-soluble support material, the work is a model material for a three-dimensional model, the polymer compound is soluble in the liquid Is characterized by.

  ADVANTAGE OF THE INVENTION According to this invention, a high molecular compound can be fully removed and the removal method of a high molecular compound with short removal work time can be provided. Furthermore, according to the present invention, it is possible to provide a polymeric compound removing material, a removing device, and a regenerating method, which are used in the polymeric compound removing method.

It is explanatory drawing which shows the outline of the support material removal apparatus of a non-overflow state. It is a flowchart which shows the outline of a support material removal method. It is explanatory drawing which shows the outline of the support material removal apparatus of an overflow state. (A) is a sectional view showing an outline of a support material removing device. FIG. 3B is a plan view showing the outline of the support material removing device. It is explanatory drawing which shows the outline of a coating device. It is a flowchart which shows the outline of a coating method. It is explanatory drawing which shows the outline of a support material removal apparatus. It is explanatory drawing which shows the outline of a support material removal apparatus. It is a flowchart which shows the outline of a support material removal method. It is a side view showing an outline of a three-dimensional model (curtain rail) used in an experiment.

  As shown in FIG. 1, the support material removing device 2 is for removing the support material SP from the three-dimensional structure X, and includes a cleaning tank 10 for storing the cleaning liquid CL and a cleaning liquid CL for storing in the cleaning tank 10. A heater 20 for heating the cleaning liquid, a temperature sensor 30 for measuring the temperature of the cleaning liquid CL, an ultrasonic unit 40 for applying ultrasonic waves to the cleaning liquid CL stored in the cleaning tank 10, a recovery tank 50 adjacent to the cleaning tank 10, and a cleaning A return pipe 60 connecting the tank 10 and the recovery tank 50, a filter 60F and a pump 60P provided in the return pipe 60, a support material recovery unit 70 for recovering the support material, a recovery tank 50 and a support material recovery unit 70. And a filter 80F and a pump 80P provided on the feed pipe 80, and a controller 100 that controls each unit.

  The three-dimensional model X includes a model material MD having an initial target shape and a support material SP for supporting the model material MD.

  The model material MD is a material used in a hot melt laminating method, an inkjet method, or the like, and examples thereof include an ultraviolet curable resin, a thermosetting resin, and a thermoplastic resin. More specifically, there are acrylonitrile / butadiene / styrene resin, polycarbonate resin, polyphenylsulfone resin, polyetherimide resin, acrylic resin and the like. Further, examples of commercially available products include VisiJet Crystal EX200 Plastic Material (Three Systems Japan Co., Ltd.) and the like.

  A wax-based material such as hydrocarbon is used as the support material SP. Specific examples of the wax-based material include 1-octadecanol (stearyl alcohol) (CAS number 112-95-5). Examples of commercially available products include VisiJet 200 (Three Systems Japan Co., Ltd.) and the like.

  The cleaning tank 10 is for immersing the three-dimensional structure X in the cleaning liquid CL. The temperature sensor 30 is provided in the cleaning tank 10 and measures the temperature of the cleaning liquid CL in the cleaning tank 10. The controller 100 reads the sensing signal from the temperature sensor 30 and controls the heater 20 based on the sensing signal. Therefore, the heater 20 is provided in the cleaning tank 10 and can maintain the temperature of the cleaning liquid CL stored in the cleaning tank 10 within a predetermined range. The temperature of the cleaning liquid CL in the cleaning tank 10 is adjusted so that the support material SP melts and the model material MD does not melt. The temperature of the cleaning liquid CL in the cleaning tank 10 is preferably equal to or higher than the melting point of the support material SP, and is preferably lower than the melting point of the model material MD. Further, the temperature of the cleaning liquid CL in the cleaning tank 10 is preferably higher than the cloud point of the cleaning liquid CL.

  The ultrasonic unit 40 is not particularly limited as long as it can contribute to the removal of the support material SP via the vibration of the cleaning liquid CL. The frequency is not particularly limited, but is preferably 30 Hz or more and 60 Hz or less, for example. The application time of ultrasonic waves is not particularly limited.

  The cleaning liquid CL is preferably water-soluble as a whole, and the support material SP is preferably insoluble. Further, the density of the cleaning liquid CL is preferably higher than the density of the support material SP.

  As the cleaning liquid CL, it is preferable to use an aqueous solution of a predetermined cleaning agent. The concentration of the cleaning agent in the cleaning liquid CL may be any as long as the desired effect can be obtained, and the lower limit thereof is, for example, preferably 1% or more, and more preferably 4% or more. Similarly, the upper limit is preferably 20% or less, more preferably 15% or less. The components of the cleaning liquid CL include a solvent and a surfactant. Examples of the solvent include diethylene glycol alkyl ether (CAS No. # 112-34-5). The surfactant acts to remove the support material SP. As the surfactant, a nonionic surfactant is preferably used, and examples thereof include polyoxyalkylene monoalkyl ether (CAS No. 77029-64-2). Examples of additives for detergents include metal ion builders, alkali builders, dispersion / recontamination preventive builders, enzymes, optical brighteners, bleaching agents, foam control agents, and other auxiliary agents such as xylene sulfonic acid. There are sodium (CAS No. 1300-72-7) and sodium silicate (CAS No. 6834-92-0). As the cleaning liquid CL, a water-soluble cutting oil, especially a synthetic oil agent can be used. Synthetic oil agents include, for example, Crystal Cut series (Hang Star Fur), Simtech series (Simkool), chemical solution type WX series (Taiyu Co., Ltd.), and soluble type SX series (Taiyu Co., Ltd.). ..

  The recovery tank 50 includes a recovery wall portion 50B and a recovery bottom portion 50C. A communication portion 50BX that communicates with the cleaning tank 10 is formed on the recovery wall portion 50B. The communication part 50BX may be a notch (not shown) formed at the upper end of the recovery wall part 50B or a hole (not shown) formed in the recovery wall part 50B. Further, an inlet 60X of the return pipe 60 is opened in the recovery tank 50. In the recovery tank 50, the inlet 60X of the return pipe 60 is preferably located lower than the communicating portion 50BX. Therefore, the inlet 60X of the return pipe 60 is preferably opened to the recovery wall 50B or the recovery bottom 50C. It should be noted that the return pipe 60 is preferably provided with a check valve. Thereby, the liquid level LS10 in the cleaning tank 10 can be maintained higher than the liquid level LS50 in the recovery tank 50.

  The cleaning tank 10 includes a cleaning wall portion 10B and a cleaning bottom portion 10C. A communication portion 50BX is opened in the cleaning wall portion 10B. In the cleaning tank 10, the outlet 60Y of the return pipe 60 is preferably located at a position lower than the communication part 50BX. Therefore, the outlet 60Y of the return pipe 60 is preferably opened to the cleaning wall portion 10B or the cleaning bottom portion 10C.

  The support material recovery unit 70 is provided separately from the cleaning tank 10 and the recovery tank 50, and includes a card ridge 71 capable of accommodating the support material SP and a holder 72 accommodating the card ridge 71.

  The card ridge 71 is a card ridge for a three-dimensional modeling apparatus (so-called 3D printer), and is attachable to and detachable from the holder 72 and the three-dimensional modeling apparatus. The card ridge 71 has a supply port 71X on the top surface of the housing. When the card ridge 71 is housed in the holder 72, the supply port 71X faces the outlet 80Y of the feed pipe 80. The inlet 80X of the feed pipe 80 is formed in the recovery wall 50B of the recovery tank 50.

  The filters 60F and 80F remove foreign substances contained in the flowing liquid.

  The pump 80P sends the support material SP from the recovery tank 50 to the support material recovery unit 70 via the feed pipe 80 under the control of the controller 100. As a result, the support material SP in the recovery tank 50 is stored in the cartridge 71.

  The support material removing device 2 preferably further includes a bypass unit 130. The bypass unit 130 includes a bypass pipe 131 in the return pipe 60, a filter (not shown) and a pump (not shown) provided in the bypass pipe 131, a buffer tank 135 in the bypass pipe 131, a three-way valve 141 and a three-way valve 142. Is preferably provided. The excess cleaning liquid CL or the preliminary cleaning liquid CL is stored in the buffer tank 135. By the control of the three-way valve 141 and the three-way valve 142 by the controller 100, the support material removing device 2 causes the cleaning liquid CL from the recovery tank 50 to be directly sent to the cleaning tank 10 (hereinafter, referred to as a through state) and from the recovery tank 50. It is possible to switch between a state of sending the cleaning liquid CL of the above to the buffer tank 135 (hereinafter referred to as a storage state) and a state of directly sending the cleaning liquid CL from the buffer tank 135 to the cleaning tank 10 (hereinafter referred to as a discharge state). Becomes

  As shown in FIG. 2, the support material removing method 200 is for removing the support material SP from the three-dimensional structure X, and includes a dipping step 210 of immersing the three-dimensional structure X in the cleaning liquid CL, and a support material. A melting step 220 for melting the support material, a cleaning tank separation step 230 for separating the supporting material SP and the cleaning liquid CL in the cleaning tank 10, an overflow step 240 for overflowing the liquid from the cleaning tank 10, and a cleaning tank 10. A recovery step 250 for recovering the liquid in the recovery tank 50, a recovery tank separation step 260 for separating the support material SP and the cleaning liquid CL in the recovery tank 50, and a support material recovery step 270 for recovering the separated support material SP. , Is provided.

(Immersion step 210)
In the immersion step 210, the three-dimensional structure X is immersed in the cleaning liquid CL. Ultrasonic waves may be applied to the cleaning liquid CL while the three-dimensional structure X is immersed in the cleaning liquid CL. This makes it easier for the cleaning liquid CL to enter the boundary portion between the model material MD and the support material SP in the three-dimensional model X.

(Support material melting step 220)
In the support material melting step 220, the heater 20 adjusts the cleaning liquid CL to a predetermined temperature. Accordingly, the temperature of the cleaning liquid CL in the cleaning tank 10 is adjusted so that the support material SP melts and the model material MD does not melt. As a result, the support material of the three-dimensional structure X melts in the cleaning liquid CL. Further, the temperature of the cleaning liquid CL is preferably higher than the cloud point of the cleaning liquid CL. As a result, the removal of the support material SP in the three-dimensional structure X is promoted by the active ingredient (surfactant or the like) contained in the cleaning liquid CL. The cloud point of the cleaning liquid CL is preferably as low as possible. As a result, the effect of removing the active ingredient (surfactant or the like) contained in the cleaning liquid CL can be obtained even at a low temperature.

  It should be noted that it is presumed that the removal action by the active ingredient (surfactant etc.) contained in the cleaning liquid CL should be given not only to the liquid support material SP but also to the solid support material SP due to the characteristics of the surfactant. To be done. Based on this assumption, it is considered that the cloud point of the cleaning liquid CL is preferably lower than the melting point of the support material SP.

(Cleaning tank separation step 230)
In the cleaning tank separation step 230, the heater 20 subsequently adjusts the cleaning liquid CL to a predetermined temperature. The melted support material is insoluble in the cleaning liquid CL and has a lower density than the cleaning liquid CL. In the cleaning tank separation step 230, the cleaning liquid CL in the cleaning tank 10 is left standing. Therefore, in the cleaning tank 10, the support material SP and the cleaning liquid CL are separated due to the difference in density. As a result, in the cleaning tank 10, the liquid support material SP is present in the upper part and the cleaning liquid CL is present in the lower part separately.

(Overflow process 240)
In the overflow step 240, when the liquid level in the cleaning tank 10 reaches the communicating portion 50BX due to the supply of the cleaning liquid CL from the recovery tank 50 to the cleaning tank 10, the liquid support material SP preferentially overflows into the recovery tank 50. (Figure 3).

(Collection process 250)
In the recovery step 250, the liquid discharged from the cleaning tank 10 is recovered in the recovery tank 50. The heater provided in the recovery tank 50 subsequently adjusts the liquid to a predetermined temperature.

(Recovery tank separation process 260)
In the recovery tank separation step 260, the heater provided in the recovery tank 50 continuously adjusts the liquid to a predetermined temperature. Furthermore, in the recovery tank 50, the recovered liquid is allowed to stand. In the recovery tank 50, the support material SP and the cleaning liquid CL are separated due to the difference in density between the support material SP and the cleaning liquid CL. That is, in the recovery tank 50, the liquid support material SP exists in the upper part and the cleaning liquid CL exists in the lower part. When the liquid level in the recovery tank 50 rises, the liquid support material SP preferentially overflows from the recovery tank 50 via the feed pipe 80.

(Support material collection process 270)
In the support material recovery process 270, the support material SP overflowing from the recovery tank 50 is supplied to the cartridge 71 through the feed pipe 80. The cartridge 71 that is sufficiently filled with the support material SP is removed from the holder 72 and mounted in a separate three-dimensional modeling device (not shown). An empty cartridge 71 is attached to the holder 72.

  As described above, in the present invention, in the immersion step 210, the support material is separated by the cleaning liquid CL, and the support material is melted. Therefore, even if the shape of the model material is complicated, the support material can be removed in a short time. Further, since the support material is not necessary for the cleaning liquid CL and the density of the support material SP is smaller than that of the cleaning liquid CL, it is easy to separate the both in the overflow process 240 and the recovery process 250. As a result, the separated cleaning liquid CL and support material SP can be reused.

  When recovering the support material SP, a cooling step may be performed at a temperature lower than the melting point of the support material SP. As a result, the support material SP can be easily recovered even if it is a mixture with a liquid such as the cleaning liquid CL. The cooling step may be performed on the cartridge 71, or may be performed on the recovery tank 50 after the recovery tank separation step 260 or the cleaning tank 10 after the cleaning tank separation step 230.

  The pump 60P sends a predetermined liquid from the recovery tank 50 to the cleaning tank 10 via the return pipe 60 under the control of the controller 100. The liquid is preferably the cleaning liquid CL, but may be a mixed liquid of the support material and the cleaning liquid CL. This makes it possible to create a state in which the liquid level LS10 in the cleaning tank 10 is higher than the liquid level LS50 in the recovery tank 50.

  In addition, it is preferable that the heater 20 and the temperature sensor 30 are appropriately provided in a distribution path of the support material SP in order to prevent the support material SP from solidifying. The distribution path of the support material SP includes, for example, the recovery tank 50, the feed pipe 80, and the bypass pipe 131. Further, the return pipe 60 may be provided in the heater 20 and the temperature sensor 30 in case the support material SP is mixed. The liquid temperature adjustment by the heater 20 and the temperature sensor 30 may be appropriately set according to the purpose, and may be the same as the condition of the cleaning tank 10, for example. In the above embodiment, the heater for heating the liquid is used to adjust the temperature of the liquid, but the present invention is not limited to this, and a cooler for cooling the liquid may be used, or a heater and a cooler may be used. Good.

  In the above-described embodiment, it is preferable that a shutter be provided for each of the communication portion 50BX, the inlet 80X of the feed pipe 80, the inlet 60X and the outlet 60Y of the return pipe 60. Then, the controller 100 preferably controls opening / closing of each shutter individually.

  In the above embodiment, the cleaning liquid CL and the support material SP are separated by utilizing the density difference between them and gravity. The present invention is not limited to this, and the cleaning liquid CL and the support material SP may be separated by centrifugation or the like.

  Further, if the height of the liquid surface in the cleaning tank 10 is less than the communicating portion 50BX, the overflow process 240 cannot be performed. Therefore, in order to raise the height of the liquid level in the cleaning tank 10, the cleaning liquid CL is supplied to the cleaning tank 10, another object is immersed in the cleaning liquid CL, or the balloon is inflated while being submerged in the cleaning liquid CL. Good. The cleaning liquid CL may be supplied to the cleaning tank 10 by operating the bypass unit 130. In this case, a liquid level sensor may be separately prepared in the cleaning tank 10. The situation in which the height of the liquid surface is raised corresponds not only to the overflow step 240 in the cleaning tank 10 but also to the recovery tank separation step 260 in the recovery tank 50. Therefore, also in the recovery tank 50, supply of the cleaning liquid CL, immersion of another object in the cleaning liquid CL, inflation operation of the balloon in the cleaning liquid CL, or the like may be performed.

  Although the support material removing device 2 of the above-described embodiment includes one cleaning tank 10 and one recovery tank 50, the present invention is not limited to this. For example, the support material removing apparatus 2 shown in FIG. 4 includes a cleaning tank 10 that stores a cleaning liquid, a recovery tank 50, a rinse tank 18 that stores water and has a structure similar to that of the cleaning tank 10, and a recovery tank 50. A rinsing side recovery tank 58 having a substantially similar structure and a support material recovery tank 78 for recovering the support agent overflowing from the recovery tank 50 and the rinsing side recovery tank 58 are provided.

  The cleaning tank 10 and the recovery tank 50 are adjacent to each other via the communication portion 50BX, and the rinse tank 18 and the rinse side recovery tank 58 are adjacent to each other via the communication portion 58BX. The support material recovery tank 78 is adjacent to the recovery tank 50 and the rinse side recovery tank 58.

  The cleaning tank 10 and the recovery tank 50 communicate with each other via the communication section 50BX. Similarly, the rinsing tank 18 and the rinsing side recovery tank 58 that stores water communicate with each other via the communication portion 58BX. The recovery tank 50 has an outlet 87X on the wall. The rinse side recovery tank 58 has an outlet 88X on the wall. The support material recovery tank 78 has an inlet 87Y and an inlet 88Y on the wall. The recovery tank 50 and the support material recovery tank 78 communicate with each other via an outlet 87X and an inlet 87Y. Each tank is provided with a temperature controller for adjusting the temperature of the liquid and a temperature sensor for measuring the temperature of the liquid.

  Next, a method of using the support material removing device 2 shown in FIG. 4 will be described.

  First, in the cleaning tank 10, an immersion step 210 of immersing the three-dimensional structure X in the cleaning liquid CL is performed. Then, in the cleaning tank 10, the support material melting step 220, the cleaning tank separation step 230, and the overflow step 240 are performed.

  Next, the three-dimensional structure X is taken out from the cleaning liquid CL in the cleaning tank 10, and the rinsing tank 18 is subjected to an immersion step 210 of immersing the three-dimensional structure X in the cleaning liquid CL. Then, in the rinsing tank 18, the support material melting step 220, the cleaning tank separation step 230, and the overflow step 240 are performed. After that, the three-dimensional structure X is taken out from the cleaning liquid CL in the rinsing tank 18 and dried. Thereby, the support material in the three-dimensional structure X can be removed.

  In the recovery tank 50 and the support material recovery tank 78, a recovery step 250, a recovery tank separation step 260, and a support material recovery step 270 are performed. Similarly, in the rinse side recovery tank 58 and the support material recovery tank 78, a recovery step 250, a recovery tank separation step 260, and a support material recovery step 270 are performed. Through such a support material removing method 200, the three-dimensional structure X can be efficiently cleaned and rinsed, and the cleaning function can be recovered and reused and the support material can be recovered and reused.

  By the way, since metal parts such as iron are vulnerable to rust, the metal parts are coated with rust preventive oil during transportation and storage. Therefore, the coated rust preventive oil must be removed when using metal parts. However, a dedicated device is required to remove the coated rust preventive oil. Further, since the cutting oil adheres to the processed metal parts, it is necessary to remove the cutting oil when it is used as it is.

  Next, the coating device 500 shown in FIG. 5 will be described. The coating device 500 includes a bath 510 in which a liquid is stored, and a temperature adjusting device 520 that adjusts the temperature of the liquid. The liquid includes the coating material CT and the cleaning liquid CL. As the coating material CT, one having a rust preventive function (for example, oxygen barrier property) is used. The above-mentioned support material SP can also be used as the coating material CT. When a material other than the support material SP is used as the coating material CT, it is preferable to use a material that is insoluble in the cleaning liquid CL and has a density higher than that of the cleaning liquid CL. In addition, the melting point of the coating material CT is preferably higher than the use temperature and storage temperature of the object. The temperature control device 520 sets the temperature of the liquid higher than the melting point of the coating material CT. The cleaning liquid CL is capable of removing rust preventive oil, and for example, the cleaning liquid CL used in the support material removing device 2 may be used. Further, as the cleaning liquid CL, it is preferable to use one having a rust preventive function (for example, oxygen barrier property).

  Next, a coating method by the coating device 500 will be described. As shown in FIG. 6, the coating method 600 includes a housing step 610, a temperature adjusting step 620, a separating step 630, a dipping step 640, and a pulling step 650. In the storage step 610, the temperature of the liquid containing the coating material CT and the cleaning liquid CL is stored in the bath. In the temperature adjusting step 620, the temperature of the liquid is set higher than the melting point of the coating material CT. In the separation step 630, the coating material CT and the cleaning liquid CL are separated by the density difference. As a result, in the liquid, an upper layer of the coating material CT and a lower layer of the cleaning liquid CL separated from the upper layer are formed on the upper side. In the immersion step 640, the object Y is immersed in the liquid. At this time, the entire object is immersed in the lower layer of the cleaning liquid CL. By the action of the cleaning liquid CL, the dipping step 640 is performed until the oil content covering the object Y before dipping is removed. In the pulling up process 650, the target object Y in the lower tank is pulled up to the outside. By this lifting operation, the entire target Y is coated with the coating material CT.

  The solidifying step 660 may be performed after the pulling step 650. In the solidification step 660, the coating material CT is solidified by cooling the object or the like.

  In the separating step 630, the temperature of the liquid containing the coating material CT and the cleaning liquid CL is higher than the cloud point of the cleaning agent CL, and the temperature of the liquid in the pulling up step 650 is lower than the cloud point of the cleaning agent. Preferably. As a result, during the pulling up operation, the oil content that has covered the target object Y before immersion is less likely to adhere to the target object Y.

  In the above embodiment, the entire object was immersed in the lower layer of the cleaning liquid CL in the immersion step 640, but the present invention is not limited to this. By immersing the lower layer of the cleaning liquid CL in the portion of the oil content covering the object Y before the immersion that is desired to be removed, the oil content of the portion can be removed.

  In particular, rust preventive oil has a strong odor and is sticky. On the other hand, if the coating material CT is selected to be odorless and less sticky (for example, one having a melting point higher than the storage temperature or the use temperature), there will be no harmful effect such as antirust oil. Further, while many rust preventive oils have high volatility, a more stable rust preventive film can be formed by selecting a coating material CT having low volatility. Furthermore, when a coating material CT having a high barrier property for a predetermined substance is selected, the barrier property of the substance can be imparted. For example, by selecting a coating material CT having a high oxygen barrier property, a rust preventive function can be imparted. The present invention can be applied not only to the rust preventive oil but also to the case where it is desired to remove the oil adhering to the object Y before coating. When removing the coating material CT from the object, the support material removing device 2 shown in FIG. 1 can be used.

  In the above embodiment, the support material removing method 2 (see FIG. 2) is performed using the support material removing device 2 (see FIG. 1), but the present invention is not limited to this.

  As shown in FIGS. 7 to 8, the support material removing apparatus 700 is for removing the support material SP from the three-dimensional structure X, and stores the cleaning liquid CL in the cleaning tank 710 and the cleaning tank 710. A heater 720 for heating the cleaning liquid CL, a temperature sensor (not shown) for measuring the temperature of the cleaning liquid CL, an ultrasonic unit 740 for applying ultrasonic waves to the cleaning liquid CL stored in the cleaning tank 710, and a cleaning liquid CL in the cleaning tank 710. A fan 770 that blows air to the liquid surface and a controller 790 that controls each unit are provided.

  The heater 720 is provided in the cleaning tank 710, and can maintain the temperature of the cleaning liquid CL stored in the cleaning tank 710 within a predetermined range. The temperature of the cleaning liquid CL in the cleaning tank 710 is adjusted so that the support material SP melts and the model material MD does not melt. The temperature of the cleaning liquid CL in the cleaning tank 710 is preferably equal to or higher than the melting point of the support material SP, and is preferably lower than the melting point of the model material MD. Further, the temperature of the cleaning liquid CL in the cleaning tank 10 is preferably higher than the cloud point of the cleaning liquid CL.

  As shown in FIG. 9, the support material removing method 800 is for removing the support material SP from the three-dimensional structure X, and includes a dipping step 210 of immersing the three-dimensional structure X in the cleaning liquid CL, and a support material. Melting step 220 for melting the support material SP, a cleaning tank separation step 230 for separating the support material SP and the cleaning liquid CL in the cleaning tank 710, and a liquid surface cooling step for cooling the liquid surface in the first area 710A of the cleaning tank 710. 840, a liquid feeding step 850 of sending the cleaning CL near the liquid surface in the first area 710A to the second area 710B of the immersion tank 710, and a pulling step 860 of pulling up the three-dimensional structure X from the liquid in the immersion tank 710. , Is provided.

  Since the steps from the immersion step 210 to the cleaning tank separation step 230 are the same as described above, their details are omitted. After the cleaning tank separation step 230, in the first area 710 in which the three-dimensional structure X is immersed, the melted support material SP gathers near the liquid surface due to the density difference with the cleaning liquid CL.

  In the liquid surface cooling step 840, the FAN 770 blows air toward the liquid surface of the first area 710A. Therefore, the liquid (mixed liquid of the support material and the cleaning liquid) on the liquid surface of the first area 710A is sent to the second area 710B while being cooled. Since the mixed liquid is cooled by the wind from the FAN 770, the temperature of the mixed liquid is lower than the melting point of the support material. As a result, the support material is precipitated from the mixed liquid. As a result, the support material and the cleaning liquid can be separated.

  In the liquid feeding step 850, the liquid support material in the vicinity of the liquid surface of the first area 710A is sent to the second area 710B as a solid support material by the wind from the FAN 770.

  In this way, since the liquid surface cooling step 840 and the liquid feeding step 850 are performed before the pulling step 860, when the three-dimensional model X is pulled up in the first area 710A in the pulling step 860, the three-dimensional modeling is performed. Adhesion of the support material to the object X can be suppressed. As a result, good washing of the three-dimensional structure X can be performed.

  It should be noted that the first area 710A may be set in the cleaning tank 710 to be an area required when the three-dimensional structure X is pulled up. Further, the second area 710B may be set in the cleaning tank 710 to be an area retracted from the first area 710A.

  In the present embodiment, the liquid surface cooling step 840 and the liquid feeding step 850 are performed simultaneously, but the present invention is not limited to this, and one of the liquid surface cooling step 840 and the liquid feeding step 850 is performed first, and the other May be performed later. Similarly, in the above embodiment, the FAN 770 also serves as the liquid surface cooling mechanism and the liquid feeding mechanism, but the present invention is not limited to this, and the liquid surface cooling mechanism and the liquid feeding mechanism may be separately prepared. ..

  In the support material removing method 800 described above, the three-dimensional structure X taken out from the cleaning liquid CL may not be sufficiently cleaned. The following is presumed as the reason why the cleaning of the three-dimensional structure X is not sufficient.

  Another substance (for example, metal soap) is generated by the reaction between the components of the cleaning liquid CL and the components of the support material. The other substance cannot be separated from the model material MD by the cleaning liquid CL. Therefore, after the support material removing method 800 described above, the other substance remains attached to the model material MD.

  In such a case, a separate post-cleaning step 870 may be performed. In the post-cleaning step 870, the three-dimensional structure X is immersed in the post-cleaning liquid LN.

  The post-cleaning liquid LN is preferably an aqueous solution of a post-cleaning agent. The post-cleaning agent preferably contains an amino group and a hydrophilic group (excluding the amino group). Hydrophilic groups (excluding amino groups) include hydroxy groups, carboxy groups, carbonyl groups and sulfo groups. Specific examples of the post-cleaning liquid LN include ethanolamines (monoethanolamine, diethanolamine, triethanolamine) and the like.

  As the commercially available post-cleaning liquid LN, for example, a synthetic oil agent can be used. Synthetic oil agents include, for example, Crystal Cut series (Hang Star Fur), Simtech series (Simkool), chemical solution type WX series (Taiyu Co., Ltd.), and soluble type SX series (Taiyu Co., Ltd.). ..

  The concentration of the post-cleaning agent in the post-cleaning liquid LN is not particularly limited as long as the effect can be obtained. For example, the lower limit of the concentration of the post-cleaning agent is preferably 5% by weight or more, and more preferably 10% by weight or more.

  Further, the support material removing device 700 may include a post-cleaning unit 900. The post-cleaning unit 900 includes a beaker 910 that stores the post-cleaning liquid LN and a beaker support member 920 provided in the cleaning tank 710. The beaker support member 920 supports the beaker 910. Due to the beaker support member 920, the beaker opening 910X is located above the liquid surface of the cleaning liquid CL.

  The post-cleaning step 870 can be applied not only to the support material removing method 800 but also to the support material removing method 200.

  In the above embodiment, a wax-based material such as hydrocarbon is used as the support material SP, but the present invention is not limited to this, and a water-soluble material can also be used. Examples of the water-soluble support material SP include AR-S1 (Keyence Corporation) and the like.

  Here, in the above embodiment, when the immersion step 210, the support material melting step 220, and the cleaning tank separation step 230 are performed using the water-soluble support material SP, the support in the liquid in the cleaning tank is supported. It may be difficult to separate the material SP and the cleaning liquid CL. In that case, you may perform the emulsion break process which supplies an emulsion breaking agent with respect to the liquid in a washing tank. As a result, the support material SP and the cleaning liquid CL can be separated, and the support material SP and the cleaning liquid CL can be reused. The demulsifier is preferably one that produces calcium ions in an aqueous solution. For example, the demulsifier includes gypsum and the like. Therefore, it is preferable that the above-mentioned support material removing device is provided with an emulsion breaking device that supplies the demulsifying agent to the liquid in the cleaning tank.

<Example>
Experiments A1 and A2 were performed.

(Experiment A1)
Using a 3D printer, a three-dimensional model X (curtain rail, see FIG. 10) was made from the model material MD and the support material SP.

As the model material MD, VisiJet Crystal EX200 Plastic Material (Three Systems Japan Co., Ltd.) was used.
Components of model material MD:
Urethane acrylate oligomer 20-40%
Ethoxylated Bisphenol A Diacrylate (CAS No. 64401-02-01) 15-35%
Tripropylene glycol acrylate (CAS No. 42978-66-5) 1.5-3%

As the support material SP, VisiJet200 (Three Systems Japan Co., Ltd.) was used.
Support material SP ingredient: Hydroxylated wax (CAS number 112-95-5)
Support material SP melting point: 55 to 65 ° C.
Density of the support material ^{SP: 0.85~0.91 (g / cm 3} )

  Using a tabletop ultrasonic cleaner (model number 2501 Branson), the support material was removed from the three-dimensional structure X, that is, the immersion step 210 and the support material melting step 220 were performed. Then, the rinsing process of immersing the three-dimensional structure X in water was performed. Then, the three-dimensional structure X was dried. An aqueous solution of a cleaning agent (concentration 8%) was used as a cleaning solution.

Detergent ingredients:
Diethylene glycol alkyl ether (CAS number 112-34-5)
Polyoxyalkylene monoalkyl ether (CAS number 77029-64-2)
Sodium xylene sulfonate (CAS number 1300-72-7)
Sodium silicate (CAS number 6834-92-0)
Cloud point of water detergent: 50 ℃
Detergent density: 1.082 (g / cm ³ ).

The cleaning conditions in the immersion step 210 and the support material melting step 220 are as follows.
Ultrasonic condition Frequency 42Hz Output 100W
Washing time 3 minutes Temperature of washing solution 65 ℃

The rinsing conditions are as follows.
Ultrasonic condition Frequency 42Hz Output 100W
Washing time 3 minutes Water temperature 65 ° C

(Experiment A2)
Except for the conditions shown in Table 1, the support material was removed, rinsed, and dried with respect to the three-dimensional structure X in the same manner as in Experiment A1.

The three-dimensional structure X after drying was visually evaluated.
The evaluation criteria are as follows.
A: No support material remains on the model material.
◯: A small amount of the support material remained in the fine grooves HM (groove width 1 mm) on the left and right sides of the model material.
Δ: The support material of the fine grooves HM (groove width 1 mm) on both left and right sides of the model material is not removed.
X: Almost the support material of the model material remains.

  Experiments A1 to A2 were carried out under the same conditions as Experiments A1 to A2 using a SIMTEC series CT-100 (Simcoule Co., Ltd.) and a high chip SX-509 (Tayu Co., Ltd.) as cleaning agents. The same tendency was exhibited.

Ingredients for Simtech series CT-100 (Simkool) Water 70-80%
Additive 20-30%
Triethanolamine 3-7%
2-aminoethanol 1-5%
Others 8-16%

High-chip SX-509 (Tayu Co., Ltd.) component water 80%
Triethanolamine 10-20%
Other 0-10%

  The conventional method of removing the support material is as follows. The three-dimensional structure X (3 to 4 pieces) was placed on a net placed in an oven, and heated for 1 hour in a temperature range from the melting point of the support material to the melting point of the model material. This melts most of the support material. Next, the three-dimensional structure X (3-4 pieces) is cleaned for 30 minutes using an ultrasonic cleaner. Then, using isopropyl alcohol, scrape off the remaining support material by rubbing with a toothbrush (about 2-3 hours per piece). In the conventional method of removing the support material, it takes 120 to 140 minutes per one three-dimensional structure X, even if the estimate is small. Further, the cleaning evaluation was “Δ” according to the above criteria. According to the present invention, it is possible to remove the support material within 10 so that the removal work time can be shortened.

(Experiment B)
A cleaning tank separation step 230, an overflow step 240, a recovery step 250, a recovery tank separation step 260, and a support material recovery step 270 are performed on the waste liquid (mixture of the support material and the cleaning liquid) generated in Experiment A1. went. Infrared spectroscopic analysis (KBr method) was performed on the support material obtained in the support material recovery step 270 and the unused support material. The analysis result of the unused support material is shown in Table 2, and the analysis result of the support material is shown in Table 3.

  From Tables 2 and 3, there was no significant difference in the components of both support materials. Therefore, it can be said that the support material can be recycled by the support material removing method 200.

  Experiments C1 to C8 were performed.

(Experiments C1 to C5)
In the same manner as in Experiment A1, the 3D printer X was made from the model material MD and the support material SP using a 3D printer.

  The support material removing method 800 was performed on the three-dimensional model X using the support material removing apparatus 700. In the support material removing method 800 (FIG. 9), the dipping step 210 to the pulling step 860 were performed. The conditions of the support material melting step 220 were the same as those of Experiment A1 except that the conditions shown in Table 4 were used.

(Experiment C6)
All of the support material removing method 800 (FIG. 9), that is, the immersion step 210 to the post-cleaning step 870, was performed. Regarding the conditions regarding the support material melting step 220 and the cleaning tank separation step 230, the same procedure as in Experiment C1 was performed except that the conditions shown in Table 4 were used. An aqueous solution of triethanolamine was used as the post-cleaning liquid LN. The conditions in the post-cleaning step 870 are as described in Table 4. Further, after the post-cleaning step 870, rinsing with water was performed.

(Experiment C7)
In the support material melting step 220 and the cleaning tank separation step 230, the same procedure as in Experiment C6 was performed except that the post-cleaning solution was used instead of the cleaning solution CL and the post-cleaning step was not performed. Further, each condition in the support material melting step 220 and the cleaning tank separation step 230 is as described in Table 4.

(Experiment C8)
It was performed in the same manner as in Experiment C6, except that the post-washing step was not performed. Further, each condition in the support material melting step 220 and the cleaning tank separation step 230 is as described in Table 4.

The three-dimensional structure X after the experiments C1 to C8 was visually evaluated.
The evaluation criteria are as follows.
⊚: No support material or residue-like film remains on the model material.
◯: No support material remains on the model material, but a film that looks like a residue remains.
Δ: Some support material remains on the model material.
X: Almost the support material of the model material remains.

  As a post-cleaning agent, Simtech series CT-100 (Simkool Co., Ltd.) and High Chip SX-509 (manufactured by Taiyu Co., Ltd.) were used to conduct experiments under the same conditions as Experiments C1 to C8. It showed the same tendency as C8.

  Experiments D1 and D2 were performed.

(Experiment D1)
A three-dimensional model X was made from the model material MD and the support material SP using a 3D printer in the same manner as in Experiment A1 except that the model material MD and the support material SP were changed. Similar to Experiment C1, in the support material removing method 800 (FIG. 9), the dipping step 210 to the pulling step 860 were performed.

  AR-G1L (Keyence Corporation) was used as the model material MD.

Components of model material MD:
Silicone 65%
Acrylic monomer 30-35%
Organic phosphorus compound 1-5%
Phenone compound 1-5%

  AR-S1 (Keyence Corporation) was used as the support material SP.

The components of the support material SP are as follows.
Acrylic monomer 10-25%
Polypropylene glycol 70-90%
Photopolymerization initiator 1-5%
Support material SP density: 1.03 (g / cm ³ )

  When the three-dimensional structure X of Experiment D1 was visually evaluated, the result was “⊚”, which was the same as in Experiment C1.

(Experiment D2)
After the experiment D1, 3 cc of gypsum was added to 300 cc of the mixed liquid in the dipping tank in which the three-dimensional structure X was pulled up. Then, as a result of leaving still for 24 hours, the mixed solution was separated into a cleaning solution and a support material in the immersion tank.

  As a model material MD, AR-M2 (Keyence Corporation) or AR-G1H (Keyence Corporation) was used to perform experiments having the same contents as Experiments D1 to D2, and all were the same as Experiments D1 to D2. It became the contents.

AR-M2 (Keyence Corporation) ingredients:
Acrylic monomer 75%
Urethane acrylate monomer 20%
Photopolymerization initiator 5%

AR-G1H (Keyence Corporation) ingredients:
Silicone 60%
Acrylic monomer 35-40%
Organic phosphorus compound 1-5%
Phenone compound 1-5%

  The present invention is not limited to the above-mentioned embodiments, and it goes without saying that various modifications can be made without departing from the gist of the present invention.

2 Support Material Removal Device 10 Cleaning Tank 20 Heater 30 Temperature Sensor 40 Ultrasonic Unit 50 Recovery Tank 60 Pipe 60X Inlet 60Y Outlet 70 Support Material Recovery Unit 71 Cardridge 71X Supply Port 72 Holder 78 Support Material Recovery Tank 80 Feed Pipe 80X Inlet 80Y Outlet 100 Controller 200 Support material removal method 210 Immersion step 220 Support material melting step 230 Cleaning tank separation step 240 Overflow step 250 Recovery step 260 Recovery tank separation step

Claims (13)

A method for removing a high molecular compound for removing the high molecular compound from a work having a high molecular compound attached,
A first dipping step of dipping the work in which the polymer compound is attached to a first liquid stored in the dipping tank;
A polymer compound melting step of melting the polymer compound in the first liquid;
An immersion separation step of separating the polymer compound and the first liquid in the immersion tank by utilizing a density difference;
A second dipping step of dipping the work that has undergone the polymer compound melting step in a second liquid;
The polymer compound is a wax-based support material for a three-dimensional structure,
The work is a model material for a three-dimensional model,
The temperature of the first liquid in the polymer compound melting step is a range in which the polymer compound melts while the model material does not melt,
The polymer compound is insoluble in the first liquid,
The first liquid contains a surfactant and water,
The second liquid contains a post-cleaning agent and water,
The method for removing a polymer compound, wherein the post-cleaning agent has a substance having an amino group. The method for removing a polymer compound according to claim 1, wherein the substance having an amino group contains ethanolamines. The method for removing a polymer compound according to claim 1 or 2, wherein the surfactant contains a polyoxyalkylene monoalkyl ether. A high molecular compound removing device for removing the high molecular compound from a work to which the high molecular compound is attached,
A first dipping tank that stores the first liquid and is capable of dipping the work to which the polymer compound is attached in the first liquid;
A temperature control mechanism for controlling the temperature of the first liquid,
A second dipping tank that stores the second liquid and is capable of immersing the work to which the polymer compound is attached in the second liquid;
The polymer compound is a wax-based support material for a three-dimensional structure,
The work is a model material for a three-dimensional model,
The temperature of the first liquid is in a range in which the polymer compound melts while the model material does not melt,
The polymer compound is insoluble in the first liquid,
The first liquid contains a surfactant and water,
The second liquid contains a post-cleaning agent and water,
The above-mentioned post-cleaning agent has a substance having an amino group. A polymer compound removing agent for removing the polymer compound from a work to which a wax-based support material for a three-dimensional structure is attached,
Contains a surfactant and water,
The surfactant contains a polyoxyalkylene monoalkyl ether, which is a polymeric compound removing agent. A polymer compound removing agent for removing the polymer compound from a work to which a wax-based support material for a three-dimensional structure is attached,
A polymeric compound removing agent comprising ethanolamines. A method for removing a high molecular compound for removing the high molecular compound from a work having a high molecular compound attached,
An immersion step of immersing the work in which the polymer compound is attached to the liquid stored in the immersion tank,
A polymer compound melting step of melting the polymer compound of the work in the liquid;
An immersion separation step of separating the polymer compound and the liquid by utilizing the density difference in the immersion tank,
A liquid surface cooling step of cooling the liquid near the liquid surface in the first area of the immersion tank;
A liquid feeding step of feeding the liquid in the first area to a second area of the immersion tank, which is retracted from the first area,
The temperature of the liquid in the polymer compound melting step is a range in which the polymer compound melts while the model material does not melt,
The density of the polymer compound is lower than the density of the liquid,
The polymer compound is insoluble in the liquid,
The method for removing a polymer compound, wherein the cooling of the liquid surface is performed so that the temperature of the polymer compound falls below a melting point. A high molecular compound removing device for removing the high molecular compound from a work to which the high molecular compound is attached,
An immersion tank for immersing the work to which the polymer compound is attached, in a liquid,
A liquid temperature adjusting device that sets the temperature of the liquid in the immersion tank so that the polymer compound melts while the work does not melt.
A liquid level cooling mechanism for cooling the liquid level in the first area of the immersion tank;
A liquid feed mechanism that feeds the liquid surface in the first area to a second area of the immersion tank that is retracted from the first area,
The density of the polymer compound is lower than the density of the liquid,
The polymer compound is insoluble in the liquid,
The cooling device for a polymer compound, wherein the cooling of the liquid surface is performed such that the temperature of the polymer compound falls below a melting point. The first area is an extraction area for taking out the workpiece immersed in the liquid in the immersion tank,
The apparatus for removing a polymer compound according to claim 8, wherein the second area is a retreat area in which the liquid level in the take-out area is retreated from the take-out area in the dipping tank. The liquid surface cooling mechanism includes a fan that sends gas toward the liquid surface,
The device for removing a polymer compound according to claim 8, wherein the fan also serves as the liquid feeding mechanism. A method for removing a high molecular compound for removing the high molecular compound from a work having a high molecular compound attached,
A first dipping step of dipping the work in which the polymer compound is attached to a first liquid stored in the dipping tank;
A polymer compound melting step of melting the polymer compound in the first liquid;
An immersion separation step of separating the polymer compound and the first liquid in the immersion tank by utilizing a difference in density,
The polymer compound is a water-soluble support material,
The work is a model material for a three-dimensional model,
The temperature of the first liquid in the polymer compound melting step is a range in which the polymer compound melts while the model material does not melt,
The method for removing a polymer compound, wherein the polymer compound is soluble in the first liquid. It is performed after the method for removing a polymer compound according to claim 11,
A method for regenerating a polymer compound, comprising an emulsion break step of performing an emulsion break on the liquid in the immersion tank. A high molecular compound removing device for removing the high molecular compound from a work to which the high molecular compound is attached,
An immersion tank for immersing the work to which the polymer compound is attached, in a liquid,
A liquid temperature adjusting device that sets the temperature of the liquid in the immersion tank so that the polymer compound melts while the work does not melt.
An emulsion break generating means for generating an emulsion break for the liquid in the immersion tank,
The polymer compound is a water-soluble support material,
The work is a model material for a three-dimensional model,
The polymeric compound removing device is characterized in that the polymeric compound is soluble in the liquid.