JP2019198812A - Liquid treatment device - Google Patents

Abstract

To provide a liquid treatment device capable of being reduced in a size of the overall device.SOLUTION: A liquid treatment device including a treatment tank 12 for swirling an introduced liquid L1 to thereby generate a gas phase G in a swirl flow F1 of the liquid L1, a first electrode 30 having a rod-like shape, a second electrode having a tabular shape, a bubble dispersion part 90 connected to the treatment tank 12, and a bubble dispersion accelerating member 92 arranged in the vicinity of a discharge part 17 inside of the bubble dispersion part 90; the bubble dispersion accelerating member 92 hinders bubbles B from being aggregated in a central part inside the bubble dispersion part 90, to disperse the bubbles B.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a liquid processing apparatus for electrochemically processing a liquid. More specifically, the present invention relates to a decomposition and sterilization effect caused by direct contact of plasma with pollutants or bacteria contained in the liquid by generating plasma in the liquid, and ultraviolet and radicals generated by plasma discharge. The present invention relates to a liquid processing apparatus for processing liquid by causing a sterilizing action at the same time.

  FIG. 16 shows an example of a conventional liquid processing apparatus described in Patent Document 1. The liquid processing apparatus 100 includes an apparatus main body 110, a liquid supply unit 150, a pipe 151, a storage tank 190, and a power source 160. The apparatus main body 110 includes a processing tank 112, an introduction part 115, a discharge part 117, a first electrode 130, and a second electrode 131.

  FIG. 17 is a diagram showing a state in which the liquid processing apparatus is operating. The treatment tank 112 has a cylindrical shape, and a swirling flow F1 is generated by introducing the liquid L1 from the introduction portion 115 provided in the tangential direction of the cylinder. Due to the swirling flow F1, the pressure in the vicinity of the central axis X1 of the processing tank 112 is reduced to the saturated water vapor pressure or less, and vapor in which a part of the liquid L1 is vaporized is generated in the vicinity of the central axis X1, thereby generating the gas phase G. The By applying a high voltage between the first electrode 130 and the second electrode 131, plasma discharge is generated in the gas phase G. At this time, the pollutant contained in the liquid is decomposed by direct contact with the plasma. At the same time, for example, components having oxidizing power such as hydroxyl radicals (OH radicals) and hydrogen peroxide are generated, and the decomposition process proceeds by reacting these components with pollutants contained in the liquid. Among radicals generated by generating plasma in water, OH radicals are known to have high oxidizing power, and it is possible to decompose difficult-to-decompose organic compounds dissolved in liquid. It is. Furthermore, the gas phase G containing the oxidizing component in the vicinity of the discharge unit 117 is sheared by receiving the resistance of the water in the storage tank 190 to generate bubbles B containing the oxidizing component. Since the treatment liquid L2 includes not only oxidizing components such as OH radicals and hydrogen peroxide but also bubbles B, it is possible to decompose the pollutants contained in the liquid more efficiently.

JP 2017-225965 A

  However, in consideration of mounting on a product, it is necessary to reduce the size of the apparatus. However, the liquid processing apparatus described in Patent Document 1 has a problem of increasing the size of the entire product.

  In view of such a point, the present invention has an object to provide a liquid processing apparatus capable of realizing downsizing as a whole product.

In order to solve the above-described problem, a liquid processing apparatus according to one aspect of the present invention is a cylinder having a circular cross-sectional shape in which one end portion is closed and a discharge portion having a circular cross-sectional shape is provided at the other end portion. Shaped treatment tank,
A first electrode in which the shape disposed on one end side on the central axis of the processing tank is a rod;
A second electrode disposed on the other end of the treatment tank;
The maximum value of the diameter of the inscribed circle in the cross section orthogonal to the central axis is 1.5 times or more the diameter of the discharge part, and is connected to the discharge part of the treatment tank via the intake port. A bubble dispersion part that is less than double,
The tip of the shadow that is arranged in the central part of the bubble dispersion part and in the vicinity of the discharge part, and projects the smaller one of the discharge part or the intake port of the bubble dispersion part from the processing tank to the bubble dispersion part A bubble dispersion promoting member that is projected entirely on
A power supply for applying a voltage between the first electrode and the second electrode;
A liquid introduction port is provided for introducing the liquid from a tangential direction of the processing tank to cause the liquid to swirl and to generate a gas phase in the swirling flow of the liquid.

  According to the liquid processing apparatus of the above aspect of the present invention, the bubble dispersion is prevented by the bubble dispersion accelerating member hindering the collection of bubbles at the central portion in the bubble dispersion portion, so that the bubble dispersion portion can be made small. As a result, the liquid processing apparatus can be easily mounted on a product.

Side surface sectional drawing which shows the structure of the liquid processing apparatus concerning Embodiment 1 of this invention. Side surface sectional drawing of the apparatus main body concerning Embodiment 1 of this invention. Side surface sectional drawing of the apparatus main body concerning the modification of Embodiment 1 of this invention. Sectional view taken along line III-III in FIG. 2A Side surface sectional view showing a state where a swirl flow is generated inside the processing tank and no voltage is applied Side surface sectional view showing a state where a swirl flow is generated inside the treatment tank and a voltage is applied Side surface sectional view showing a discharge state when the bubble dispersion portion is reduced in a conventional liquid processing apparatus The figure which shows whether discharge is possible in the shortest distance of a discharge part and a bubble dispersion promotion member The figure which shows the possibility of an aggregation of the bubble by the diameter of the bubble dispersion | distribution part in the diameter of 3 mm of the discharge part The figure which shows the possibility of an aggregation of the bubble by the diameter of the bubble dispersion | distribution part in the diameter of 4 mm of a discharge part Front sectional view showing a bubble dispersion section with a square cross section Side sectional view showing a processing tank that combines cylinders with different radii Side sectional view showing a processing tank that combines cylinders with different radii Side cross-sectional view showing a bubble dispersion promoting member with a cross-section combining a circle and a cross Front cross-sectional view showing a bubble dispersion promoting member with a cross-section combining a circle and a cross Front sectional view showing a bubble dispersion promoting member having a cross section of a square and a cross Side sectional view of a conventional liquid processing apparatus Side surface sectional view showing a state in which a swirling flow is generated in a processing tank of a conventional liquid processing apparatus and a voltage is applied

[Embodiment 1]
Hereinafter, a liquid processing apparatus 1 according to an embodiment of the present invention will be described in detail with reference to the drawings. In the drawings, the same or corresponding parts are denoted by the same reference numerals and description thereof will not be repeated. In addition, in order to make the explanation easy to understand, in the drawings referred to below, the configuration is shown in a simplified or schematic manner, or some components are omitted. Further, the dimensional ratio between the constituent members shown in each drawing does not necessarily indicate an actual dimensional ratio.

[overall structure]
First, the overall configuration of the liquid processing apparatus 1 will be described.

  FIG. 1 is a side sectional view showing a configuration of a liquid processing apparatus 1 according to Embodiment 1 of the present invention. In the following drawings, the arrow F indicates the forward direction of the liquid processing apparatus 1, and the arrow B indicates the backward direction. Arrow U indicates the upward direction, and arrow D indicates the downward direction. The arrow R indicates the right direction when viewed from the rear direction, and the arrow L indicates the left direction when viewed from the rear direction.

  The liquid processing apparatus 1 processes a liquid by discharging in the liquid. In the first embodiment, a case where an aqueous solution in which a pollutant is dissolved is processed will be described.

  The liquid processing apparatus 1 includes at least a processing tank 12, a first electrode 30, a second electrode 31, a bubble dispersion unit 90, a bubble dispersion promoting member 92, and a power source 60. More specifically, the liquid processing apparatus 1 includes an apparatus main body 10, a liquid supply unit 50, a power source 60, and a bubble dispersion unit 90. The apparatus main body 10 includes a treatment tank 12, an introduction unit 15 that functions as an example of a liquid introduction port, a discharge unit 17, a first electrode 30, and a second electrode 31. The processing tank 12 is a part that is processing the liquid (for example, water) L1 introduced therein. The front sectional shape inside the treatment tank 12 is circular (see FIG. 3), and the shape of the treatment tank 12 is cylindrical. The introduction unit 15 introduces a liquid into the processing tank 12. The processing tank 12 has a substantially cylindrical storage space 83 having a circular cross-sectional shape perpendicular to the pivot axis (in other words, the central axis) X1 of the liquid L1 in the processing tank 12. An introduction portion 15 is disposed on one end side of the processing tank 12, and a discharge portion 17 is disposed on the other end side of the processing tank 12. The introduction unit 15 introduces a liquid into the processing tank 12. The introduction unit 15 communicates with the liquid supply unit 50 via the pipe 51. The discharge unit 17 discharges the processing liquid L <b> 2 processed in the processing tank 12 from the processing tank 12. The front cross-sectional shape of the discharge part 17 is circular. The discharge unit 17 is connected to the intake port 91 of the bubble dispersion unit 90, and the processing liquid L <b> 2 discharged from the discharge unit 17 is discharged to the bubble dispersion unit 90 through the intake port 91. The material of the treatment tank 12 may be an insulator or a conductor. In the case of a conductor, it is necessary to interpose an insulator between the first electrode 30 and the second electrode 31. Here, the case where the diameter of the intake 91 is the same as the diameter of the discharge part 17 is illustrated. In other words, a case where a circular bubble dispersion part 90 having an inner diameter larger than the diameter of the discharge part 17 is connected to the discharge part 17 of the treatment tank 12 is illustrated. An end wall having an intake port 91 having the same diameter as that of the discharge portion 17 is fixed to the end portion on the connection side of the circular bubble dispersion portion 90. However, such an end wall may not be present as shown in FIG. 2B. Of course, the bubble dispersion portion 90 is not limited to a tubular member, and may have any cross-sectional shape, and may have a function as a tank for temporarily holding the processing liquid L2. .

  The first electrode 30 has a rod shape and is disposed inside the processing tank 12 via an insulator 53. The inner end of the first electrode 30 protrudes into the processing tank 12 and is disposed on the wall surface facing the wall surface on which the discharge portion 17 of the processing tank 12 is formed.

  The second electrode 31 is disposed in the vicinity of the discharge unit 17. The first electrode 30 is connected to a power source 60, and the second electrode 31 is grounded. As an example, in FIG. 1, the second electrode 31 is fixed to the outer surface of the third inner wall 23 where the discharge portion 17 of the processing tank 12 is formed, that is, between the third inner wall 23 and the bubble dispersion portion 90. .

  A high voltage pulse voltage is applied to the first electrode 30 and the second electrode 31 by the power supply 60.

  The liquid supply part 50 is a pump which supplies the liquid (for example, water) L1 in the process tank 12, as an example. The liquid supply unit 50 is connected to the pipe 51. One end of the pipe 51 is connected to the introduction unit 15, and the other end of the pipe 51 is connected to a liquid supply source (not shown) (for example, a water tank or water supply). Alternatively, the other end of the pipe 51 is connected to the bubble dispersion unit 90 and connected to the bubble dispersion unit 90 so that the liquid containing the processing liquid L2 from the liquid processing apparatus 100, that is, the liquid to be processed L3 can be circulated. (Refer to the dashed-dotted line circulation pipe 81 in FIG. 1).

  The power source 60 applies a positive or negative high-voltage pulse voltage of several kV between the first electrode 30 and the second electrode 31. The power supply 60 can also apply a so-called bipolar pulse voltage that alternately applies a positive pulse voltage and a negative pulse voltage, but it is more energy efficient to apply a monopolar pulse voltage that applies only a positive pulse voltage. good.

  The front cross-sectional shape inside the bubble dispersion portion 90 (that is, the cross-sectional shape in the direction orthogonal to the axial direction) is circular, and the shape of the bubble dispersion portion 90 is cylindrical. Moreover, although the center axis | shaft of the bubble dispersion | distribution part 90 and the center axis | shaft of the discharge part 17 are arrange | positioned, it is not restricted to this.

  As an example of the tip portion facing the discharge portion 17, there is a bubble dispersion promotion member 92 in the bubble dispersion portion 90, and the tip portion of the bubble dispersion promotion member 92 is disposed at a position away from the discharge portion 17. It has a plane in a direction orthogonal to the axial direction (for example, the central axis) X1 of the bubble dispersing portion 90 at the tip. With such a plane, the bubbles B trying to gather at the center of the bubble dispersion portion 90 can be eliminated, and the dispersion of the bubbles B can be promoted. As an example, the shape of the bubble dispersion promoting member 92 is a cylinder. Thus, the bubble dispersion promoting member 92 is a region where the bubbles B are to gather on the central axis X1 in the bubble dispersion portion 90, that is, the central portion at a position away from the discharge portion 17 inside the bubble dispersion portion 90. And hinders the aggregation of the bubbles B to promote the dispersion of the bubbles B. That is, the bubble dispersion promoting member 92 is also a bubble aggregation preventing member.

  The bubble dispersion promoting member 92 is not limited to a shape having the same diameter or the same width orthogonal to the axial direction in the entire length, but may be a tapered shape that gradually increases as the distance from the discharge portion 17 increases.

  In order for the bubble dispersion promoting member 92 to have such a function, all the shadows that are projected from the processing tank 12 to the bubble dispersion part 90, whichever is smaller, the discharge part 17 or the intake port 91 of the bubble dispersion part 90 are projected. It is only necessary that the tip of the bubble dispersion promoting member 92 has such a size.

[Device main unit]
Next, the apparatus main body 10 will be described in detail. FIG. 2A is a side sectional view of the apparatus main body 10.

  The processing tank 12 has a first inner wall 21, a second inner wall 22, and a third inner wall 23. The first inner wall 21 is a cylindrical wall portion. The 2nd inner wall 22 is provided in the 1st end part of the 1st inner wall 21, for example, the left end part of FIG. The 3rd inner wall 23 is provided in the 2nd end part of the 1st inner wall 21, for example, the right end part of FIG. 2A. The second inner wall 22 and the third inner wall 23 are substantially circular in a side view. The first inner wall 21, the second inner wall 22, and the third inner wall 23 constitute a substantially cylindrical accommodation space 83 inside the processing tank 12. The central axis of the first inner wall 21, that is, the virtual central axis of the substantially cylindrical accommodation space 83 configured inside the processing tank 12 is defined as a central axis X <b> 1.

  The second inner wall 22 is provided with an electrode support cylinder 24 projecting inward at the center. The electrode support cylinder 24 has a cylindrical shape and extends to the third inner wall 23 side, that is, to the right in FIG. 2A. The electrode support cylinder 24 is arranged so that its central axis coincides with the central axis X1. The first electrode 30 is supported inside the electrode support cylinder 24 via an insulator 53. The shape of the first electrode 30 is a rod shape, and the insulator 53 is disposed around the first electrode 30 in a cylindrical shape. For this reason, the first electrode 30 is disposed such that the longitudinal axis thereof coincides with the central axis X1. Note that although the insulator 53 is clearly shown in FIG. 2A, the insulator 53 may be too thin in some drawings and may not be illustrated. Moreover, if the 1st electrode 30 can be supported with the insulator 53 with respect to the process tank 12, the electrode support cylinder 24 can also be abbreviate | omitted.

  The introduction part 15 penetrates the apparatus main body 10, and one opening end 16 is formed in the first inner wall 21. The introduction portion 15 is disposed at a position adjacent to the second inner wall 22 in a side view. FIG. 3 is a cross-sectional view taken along line III-III in FIG. 2A. The introduction part 15 is disposed on the wall surface of the first inner wall 21.

  The discharge part 17 penetrates, for example, the central part of the third inner wall 23. The discharge portion 17 is formed so that its central axis coincides with the central axis X1.

  The 2nd electrode 31 is a plate-shaped metal member, and the opening part 311 penetrated in the center part is formed. The opening 311 is circular, and is formed so that its central axis coincides with the central axis X1.

[Operation]
Next, the operation of the liquid processing apparatus 1 will be described.

  In the following, for convenience of explanation, a state in which the gas phase G is generated inside the processing bath 12 (FIG. 4) and a state in which a pulse voltage is applied from the power source 60 to the gas phase G to generate plasma P (FIG. 5). Separately described. FIG. 4 is a side cross-sectional view showing a state in which a swirling flow F1 is generated inside the processing tank 12 and no pulse voltage is applied.

  First, as shown in FIG. 4, the liquid (for example, water) L1 from the introduction unit 15 to the treatment tank 12 has a predetermined pressure, that is, the supply pressure of the pump or the supply pressure of the tap water in the case of tap water without a pump. Then, the liquid L1 moves from the introduction portion 15 toward the right in FIG. 4 while generating the swirl flow F1 along the first inner wall 21. The swirl flow F <b> 1 that moves to the right in FIG. 4 while swiveling moves toward the discharge unit 17.

  Due to the swirling flow F1, the pressure in the vicinity of the central axis X1 drops below the saturated water vapor pressure, a part of the liquid L1 is vaporized, and a gas phase G is generated in the vicinity of the central axis X1 of the first inner wall 21.

  The gas phase G is generated from the right end portion 301 of the first electrode 30 to the discharge portion 17 along the central axis X1. The gas phase G receives the resistance of the processing liquid L2 in the bubble dispersion unit 90 in the vicinity of the turning center, specifically, in the vicinity of the discharge unit 17 in FIG. Sheared into bubbles (nano bubbles) and diffused from the discharge portion 17 to the bubble dispersion portion 90 through the intake 91 connected to the discharge portion 17.

  FIG. 5 shows a state in which a swirl flow F <b> 1 is generated inside the treatment tank 12 following the state of FIG. 4, and a pulse voltage is applied between the first electrode 30 and the second electrode 31 from the power supply 60. It is side surface sectional drawing. As shown in FIG. 5, in a state where the gas phase G in which the liquid L <b> 1 is vaporized is generated from the first electrode 30 to the discharge unit 17, a high voltage is generated between the first electrode 30 and the second electrode 31 by the power source 60. Apply a voltage pulse voltage. When a high voltage pulse voltage is applied to the first electrode 30 and the second electrode 31, a plasma P is generated in the gas phase G to generate radicals (OH radicals or the like) or ions. The radicals or ions are dissolved from the gas phase G toward the swirl flow F1 to decompose the pollutant dissolved in the liquid L1. In addition, the plasma P in the gas phase G in the vicinity of the discharge unit 17 generates a large amount of bubbles B containing OH radicals and the like by receiving the resistance of the treatment liquid L2 in the bubble dispersion unit 90. In this way, the treatment liquid L2 that is treated with the OH radicals generated by the plasma P and includes the bubbles B containing the OH radicals or the like is discharged from the discharge unit 17 toward the bubble dispersion unit 90. That is, OH radicals generated by the plasma P are dissolved in the processing liquid L2 in the bubble dispersion unit 90 directly or from inside the bubble B. Then, after a certain period of time, the treatment liquid L2 in the bubble dispersion unit 90 is transformed into relatively stable hydrogen peroxide. Note that the plasma P generated by the application of the high voltage pulse voltage disappears when the application of the voltage is stopped.

  When plasma discharge occurs, ultraviolet rays are generated at the same time. When the generated ultraviolet rays are irradiated to the pollutant or bacteria, the decomposition and bactericidal action can be exhibited. Moreover, as described above, OH radicals and the like are generated by irradiating the hydrogen peroxide solution generated in the treatment liquid with ultraviolet rays.

  FIG. 6 shows a conventional liquid processing apparatus in which the bubble dispersion portion 90 is changed to the same shape as in the first embodiment in order to reduce the size of the bubble dispersion portion 90 in an attempt to reduce the size of the entire product, and is discharged. A comparative example is shown.

  In this comparative example, the processing liquid L2 discharged from the processing tank 12 generates a swirling flow F2 in the bubble dispersion unit 90. Since the vicinity of the central axis of the swirling flow F2 has a negative pressure, the bubbles B discharged and diffused from the treatment tank 12 gather near the central axis of the swirling flow F2. Furthermore, the pressure in the treatment tank 12 is lower than the pressure in the bubble dispersion unit 90 in the vicinity of the central axis X1. Therefore, the bubbles B gathered on the central axis of the swirl flow F2 move to the processing tank 12 side having a low pressure on the central axis X1. When the bubbles B move to the gas phase G, they are absorbed by the gas phase G and the volume of the gas phase G increases. The gas phase G having an increased volume becomes part of the gas phase G due to the swirling flow F <b> 1 in the treatment tank 12, and is discharged to the bubble dispersion unit 90, and the volume of the gas phase G decreases. Thus, the volume of the gas phase G is not stabilized by the bubbles B being absorbed or discharged from the gas phase G. For this reason, the dielectric breakdown voltage required for the discharge changes, the discharge becomes unstable, and the efficiency of the liquid treatment deteriorates.

  That is, when trying to reduce the size of the bubble dispersion portion 90, as described above, a vortex is generated in the central portion along the central axis X1, and the bubbles B are collected and collected in the central portion. When the bubbles B accumulate at the center of the bubble dispersion unit 90, the bubbles B move to the gas phase G in the processing tank 12 due to the pressure difference, and the volume of the gas phase G increases. Then, the gas phase G is discharged as bubbles B from the processing tank 12 to the bubble dispersion unit 90, the volume of the gas phase G becomes too small, and the discharge in the processing tank 12 becomes unstable.

  In order to eliminate such a state where the discharge becomes unstable, it is only necessary to prevent the bubbles B from collecting and collecting at the center of the bubble dispersion portion 90. For this reason, in the first embodiment, as shown in FIG. 5, a columnar bubble dispersion promoting member 92 is disposed at the center of the bubble dispersion portion 90. This bubble dispersion promoting member 92 becomes an obstacle, and aggregation of the bubbles B on the central axis X1 in the bubble dispersion portion 90 can be prevented. Therefore, since the density or volume of the gas phase G is stabilized, stable discharge can be confirmed. As a result, the bubble dispersion part 90 can be miniaturized and the entire product can be miniaturized.

In the first embodiment, as an example, the inner diameter of the treatment tank 12 is 20 mm, and the diameter of the discharge unit 17 is 3 mm. In addition, the inner diameter of the bubble dispersion portion 90 is 14 mm, the shape of the bubble dispersion promoting member 92 in the bubble dispersion portion 90 is a cylinder having a diameter of 10 mm, and the position of the bubble dispersion promoting member 92 is the position of the bubble dispersion promoting member 92. It arrange | positioned so that the shortest distance _Dmin from the front-end | tip to the discharge part 17 might be 20 mm.

Here, the shortest distance _Dmin between the discharge part 17 and the bubble dispersion promoting member 92 is 20 mm, but is not limited to this distance. As shown in FIG. 7, the state of discharge when the shortest distance _Dmin between the discharge part 17 and the bubble dispersion promoting member 92 was changed to 0.1 mm, 10 mm, 20 mm, 30 mm, 40 mm, and 50 mm was verified. From this result, it was confirmed that the discharge was stabilized when the shortest distance _Dmin between the discharge portion 17 and the bubble dispersion promoting member 92 was 0.1 mm or more and 20 mm or less.

  Further, in the first embodiment, the inner diameter of the bubble dispersion portion 90 is 14 mm, but is not limited to this inner diameter. When the diameter of the discharge part 17 is 3 mm, as shown in FIG. 8, when the inner diameter of the bubble dispersion part 90 is changed to 3 mm, 6 mm, 10 mm, 20 mm, and 100 mm, the bubble B in the bubble dispersion part 90 We verified whether a set of From this result, it can be seen that if the inner diameter of the bubble dispersion portion 90 is between 6 and 20 mm, the bubbles B gather at the bubble dispersion portion 90.

  In addition, when the diameter of the discharge portion 17 is changed to 4 mm, the result of verifying whether the bubbles B are aggregated in the bubble dispersion portion 90 when the diameter is changed to 4 mm, 6 mm, 10 mm, 20 mm, and 100 mm is shown in FIG. 9 shows. From this result, it was found that even when the diameter of the discharge part 17 is 4 mm, the bubbles B gather at the bubble dispersion part 90 if the diameter of the bubble dispersion part 90 is between 6 and 20 mm.

From these results, it was found that when the diameter of the bubble dispersion part 90 is not less than 1.5 times and not more than 6 times the diameter of the discharge part 17, a set of bubbles B is generated in the bubble dispersion part 90. . At this time, it was confirmed that the discharge was stabilized if the shortest distance _Dmin between the discharge portion 17 and the bubble dispersion promoting member 92 was 0.1 mm or more and 20 mm or less.

  As described above, according to the first embodiment described above, since the bubble dispersion accelerating member 92 is disposed at the center portion in the bubble dispersion portion 90 connected to the discharge portion 17 of the processing tank 12, the center in the bubble dispersion portion 90 is disposed. Aggregation of the bubbles B on the axis X1 can be prevented, and the bubble dispersion part 90 can be reduced in size, so that the entire product can be reduced in size.

  In addition, although the front cross-sectional shape inside the bubble dispersion | distribution part 90 was made into circular, the case where the front cross-sectional shape inside the bubble dispersion | distribution part 90 is changed into a rectangle is shown in FIG. In this case, the swirl flow F <b> 2 of the bubble dispersion unit 90 is generated along an inscribed circle 93 having a maximum diameter in the bubble dispersion unit 90. Therefore, if the diameter of the inscribed circle 93 of the bubble dispersion part 90 is 1.5 times or more and 6 times or less of the diameter of the discharge part 17 in the cross section orthogonal to the central axis X1, even if the polygon is a polygon, The same effect can be obtained by arranging the promoting member 92. However, since the loss of the swirl flow F2 of the bubble dispersion portion 90 can be reduced, the front cross section inside the bubble dispersion portion 90 (that is, the cross section orthogonal to the central axis X1) is preferably circular.

  Furthermore, although the processing tank 12 has a simple cylindrical shape, it can take various shapes as long as one end portion is a cylindrical processing tank whose closed cross-sectional shape is a circle. For example, as shown in FIG. 11, even in the processing tank 13 in which cylinders having different radii are combined and the conical processing tank 14 shown in FIG. The same effect can be obtained.

  The shape of the bubble dispersion promoting member 92 is a cylinder, but is not limited to a cylinder. FIG. 13 is a side cross-sectional view of the liquid processing apparatus 1 when the bubble dispersion promoting member 92 has a plate shape. It was confirmed that the size of the bubbles B gathered in the bubble dispersion part 90 was smaller than the diameter of the discharge part 17. If all the shadows projected from the processing tank 12 toward the bubble dispersion part 90 along the central axis X1 are projected onto the tip surface of the bubble dispersion promoting member 92, the bubbles B are introduced into the gas phase G. Backflow can be prevented. For example, as shown in FIG. 14, the cross-sectional shape of the bubble dispersion promoting member 92 is a combination of a circular portion 92a at the center and a cross-shaped portion 92b extending in the radial direction from the circular portion 92a, and FIG. As shown in FIG. 4, even if the cross-sectional shape of the bubble dispersion promoting member 92 is a shape in which a rectangular portion 92c at the center and a cross-shaped portion 92d extending in the radial direction from the rectangular portion 92c are combined, Similar effects can be obtained. The circular part or the rectangular part has such a size that all the shadows projected from the processing tank 12 onto the bubble dispersion part 90 from the smaller one of the discharge part 17 or the intake port 91 of the bubble dispersion part 90 are projected.

  The cross-shaped part is a support for supporting the circular part or rectangular part of the central part in the central part, and is not limited to the cross-shaped part, and is arranged in an arbitrary number around the axis at an arbitrary angle. It may be a supported column.

  In addition, when the intake 91 is smaller than the discharge part 17, it is set as the shadow which projected the intake 91 instead of the shadow which projected the discharge part 17. FIG.

  Moreover, although the diameter of the discharge part 17 was 3 mm or 4 mm, it is not necessarily limited to this.

  As mentioned above, although embodiment of this invention was described, embodiment mentioned above is only the illustration for implementing this invention. Therefore, the present invention is not limited to the above-described embodiment, and can be implemented by appropriately modifying the above-described embodiment without departing from the spirit thereof. Specifically, any of the various embodiments or modifications described above can be combined as appropriate to achieve the respective effects. In addition, combinations of the embodiments, combinations of the examples, or combinations of the embodiments and examples are possible, and combinations of features in different embodiments or examples are also possible.

  The liquid processing apparatus according to the above aspect of the present invention generates a plasma in the liquid while realizing downsizing as a whole product, thereby causing a decomposition and sterilization action caused by direct contact of the contaminants or bacteria contained in the liquid with the plasma. In addition, the liquid can be treated by simultaneous decomposition and sterilization by ultraviolet rays and radicals generated by plasma discharge, and can be used for sterilization, deodorization, various environmental improvements, and the like.

DESCRIPTION OF SYMBOLS 1 Liquid processing apparatus 10 Apparatus main body 12 Processing tank 13 Processing tank 14 Processing tank 15 Introduction part 16 Open end 17 Discharge part 21 1st inner wall 22 2nd inner wall 23 3rd inner wall 24 Electrode support cylinder 30 1st electrode 31 2nd electrode 50 Liquid supply part 51 Piping 53 Insulator 60 Power supply 90 Bubble dispersion part 91 Inlet 92 Bubble dispersion promoting member 311 Opening B bubble D _min Minimum distance between the discharge part and the bubble dispersion promoting member F1 Swirling flow in the processing tank F2 Bubble Swirling flow in the dispersion section G Gas phase L1 Liquid L2 Processing liquid P Plasma 100 Liquid processing apparatus 110 Apparatus body 112 Processing tank 115 Introduction section 117 Discharge section 130 First electrode 131 Second electrode 150 Liquid supply section 151 Piping 160 Power supply 190 Storage Tank

Claims (4)

A cylindrical treatment tank having a circular cross section with one end closed and a discharge section having a circular cross section at the other end,
A first electrode in which the shape disposed on one end side on the central axis of the processing tank is a rod;
A second electrode disposed on the other end of the treatment tank;
The maximum value of the diameter of the inscribed circle in the cross section orthogonal to the central axis is 1.5 times or more the diameter of the discharge part, and is connected to the discharge part of the treatment tank via the intake port. A bubble dispersion part that is less than double,
The tip of the shadow that is arranged in the central part of the bubble dispersion part and in the vicinity of the discharge part, and projects the smaller one of the discharge part or the intake port of the bubble dispersion part from the processing tank to the bubble dispersion part A bubble dispersion promoting member that is projected entirely on
A power supply for applying a voltage between the first electrode and the second electrode;
A liquid processing apparatus, comprising: a liquid introduction port that swirls the liquid by introducing the liquid from a tangential direction of the treatment tank and generates a gas phase in the swirling flow of the liquid. The shortest distance between the discharge part and the bubble dispersion promoting member is 0.1 mm to 20 mm,
The liquid processing apparatus according to claim 1. The cross-sectional shape in the direction orthogonal to the axial direction of the bubble dispersion part is circular,
The liquid processing apparatus according to claim 1 or 2. The tip portion of the bubble dispersion promoting member is a plane in a direction perpendicular to the axial direction of the bubble dispersion portion.
The liquid processing apparatus as described in any one of Claims 1-3.

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