JP2019171627A - Manufacturing method of honeycomb structure forming die, honeycomb structure forming die, and manufacturing method of honeycomb structure - Google Patents

Manufacturing method of honeycomb structure forming die, honeycomb structure forming die, and manufacturing method of honeycomb structure Download PDF

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JP2019171627A
JP2019171627A JP2018060773A JP2018060773A JP2019171627A JP 2019171627 A JP2019171627 A JP 2019171627A JP 2018060773 A JP2018060773 A JP 2018060773A JP 2018060773 A JP2018060773 A JP 2018060773A JP 2019171627 A JP2019171627 A JP 2019171627A
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honeycomb structure
die
forming
manufacturing
plating layer
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JP6810083B2 (en
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悠太 今泉
Yuta Imaizumi
悠太 今泉
和彦 濱塚
Kazuhiko Hamatsuka
和彦 濱塚
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NGK Insulators Ltd
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Abstract

To provide a manufacturing method of a honeycomb structure forming die having a high degree of freedom of design such as a shape, a high material yield, and high productivity, a honeycomb structure forming die, and a manufacturing method of a honeycomb structure.SOLUTION: A manufacturing method of a honeycomb structure forming die having a backside hole for introducing a forming raw material and a slit for communicating with the backside hole to extrude the forming raw material into a honeycomb structure incudes a step of forming the honeycomb structure forming die by an additive manufacturing method and a step of providing a plating layer having a thickness of 10 to 300 μm so as to cover at least a part of a region constituting the backside hole and the slit of the honeycomb structure forming die.SELECTED DRAWING: Figure 1

Description

本発明はハニカム構造体成形用口金の製造方法、ハニカム構造体成形用口金、及びハニカム構造体の製造方法に関する。特に、付加製造法(Additive Manufacturing Method)に適したハニカム構造体成形用口金の製造方法、ハニカム構造体成形用口金、及びハニカム構造体の製造方法に関する。   The present invention relates to a method for manufacturing a die for forming a honeycomb structure, a die for forming a honeycomb structure, and a method for manufacturing a honeycomb structure. In particular, the present invention relates to a method for manufacturing a die for forming a honeycomb structure suitable for an additive manufacturing method, a die for forming a honeycomb structure, and a method for manufacturing a honeycomb structure.

セラミック質のハニカム構造体の製造方法としては、従来から、成形原料(坏土)を導入する裏孔と、この裏孔に連通する格子状等のスリットと が形成された口金基体を備えたハニカム構造体成形用口金を用いて押出成形する方法が広く行われている。
このようなハニカム構造体成形用口金のスリットの形成には、例えば、四角形状に配設されている場合は砥石による研削加工、六角形状や四角-八角形状の組合せ等、同一線上に配設されない場合は電極を用いた型彫り放電加工等が用いられる。
このようなハニカム構造体成形用口金の裏孔の形成には、例えば、ドリルやリーマ工具を用いた切削加工や電極を用いた放電加工等が用いられる。
Conventionally, as a method for manufacturing a ceramic honeycomb structure, a honeycomb including a die base body in which a back hole for introducing a forming raw material (kneaded material) and a lattice-shaped slit communicating with the back hole is formed. A method of extrusion molding using a structure molding die has been widely performed.
For forming the slits of the honeycomb structure forming die, for example, when they are arranged in a square shape, they are not arranged on the same line, such as grinding with a grindstone, a hexagonal shape or a combination of a square-octagonal shape, etc. In this case, die-sinking electric discharge machining using electrodes is used.
In order to form such a back hole of the die for forming a honeycomb structure, for example, cutting using a drill or a reamer tool, electric discharge using an electrode, or the like is used.

特許文献1においては、裏孔を形成するための板状部材に溝を形成する場合において、その溝によって区画される柱状部の最小幅と、この柱状部の高さとを特定の範囲に規定することによって、高い成形性を実現するとともに、口金基体を構成する二枚の板状部材が剥がれ難いハニカム構造体成形用口金、及びその製造方法を提供することが提案されている。   In Patent Document 1, when a groove is formed in a plate-like member for forming a back hole, the minimum width of the columnar part defined by the groove and the height of the columnar part are defined in a specific range. Accordingly, it has been proposed to provide a die for forming a honeycomb structure and a method for manufacturing the same, which realize high moldability and are difficult to peel off the two plate-like members constituting the die base.

また、スリットの形成を組付けた部材の間隙として行う方法も知られている(特許文献2)。このようなハニカム構造体成形用口金は複数本の細長い線材を束ねて接合することで、一端側に材料が導入される導入孔を備えた導入層が形成され、他端側に成形体が押出される成形溝を備えた成形層が形成される。   In addition, a method of performing slit formation as a gap between assembled members is also known (Patent Document 2). In such a honeycomb structure forming die, a plurality of elongated wires are bundled and joined to form an introduction layer having an introduction hole into which material is introduced on one end side, and the formed body is extruded on the other end side. A molding layer having a molding groove to be formed is formed.

特許第5361224号公報Japanese Patent No. 5361224 特許第3585815号公報Japanese Patent No. 3585815

特許文献1に記載される加工方法によっては、設計形状に対する制約が生じる場合がある。また、スリット及び裏口の形成に必要な研削加工等において回転工具を用いる方法が使用されるため、孔断面形状が丸形状に制約される。また、このような加工方法では、一般的に板状材料から行い、その大部分を除去する加工を行うことで材料収率が悪い。さらに、ハニカム構造体成形用口金の製造において、複数の異なる設備を使用するため、トータルの製造リードタイムが長くなり、生産性の点で好ましくない。   Depending on the processing method described in Patent Document 1, there may be a restriction on the design shape. In addition, since a method using a rotary tool is used in a grinding process or the like necessary for forming the slit and the back opening, the hole cross-sectional shape is restricted to a round shape. Moreover, in such a processing method, it is generally performed from a plate-like material, and the material yield is poor by performing processing to remove most of the material. Further, since a plurality of different facilities are used in the manufacture of the honeycomb structure forming die, the total manufacturing lead time becomes long, which is not preferable in terms of productivity.

そして、特許文献2に記載される方法においては、複数本の細長い線材を束ねて接合するという構造が複雑であり、生産コストが増加するほか、累積誤差が大きくなりがちであり、必要精度の確保が困難となる。   In the method described in Patent Document 2, the structure of bundling and joining a plurality of elongated wires is complicated, which increases production costs and tends to increase accumulated errors, and ensures necessary accuracy. It becomes difficult.

本発明は、上記先行技術文献に記載される発明の問題点にかんがみ、形状などの設計自由度が高く、材料収率が高く、生産性も高いハニカム構造体成形用口金の製造方法、及びハニカム構造体成形用口金、並びにハニカム構造体の製造方法を提供することを課題の一つとする。   In view of the problems of the invention described in the above-mentioned prior art documents, the present invention provides a method for manufacturing a die for forming a honeycomb structure, which has a high degree of design freedom in shape and the like, a high material yield, and a high productivity, and a honeycomb An object is to provide a die for forming a structure and a method for manufacturing a honeycomb structure.

本発明者らは、いわゆる3Dプリンターを用いる付加製造法によりハニカム構造体成形用口金を成形し、さらに所定のめっき層を設けることにより、上記課題を解決することが可能であることを見出し、本発明を完成するに至った。具体的には、本発明は以下のように特定される。   The present inventors have found that the above problem can be solved by forming a die for forming a honeycomb structure by an additive manufacturing method using a so-called 3D printer and further providing a predetermined plating layer. The invention has been completed. Specifically, the present invention is specified as follows.

(1)成形原料を導入する裏孔と、前記裏孔と連通して成形原料をハニカム構造体に押出成形するためのスリットを有するハニカム構造体成形用口金の製造方法であって、
付加製造法により前記ハニカム構造体成形用口金を造形する工程と、
前記ハニカム構造体成形用口金の、前記裏孔及び前記スリットを構成する部位の少なくとも一部を覆うように、厚み10〜300μmのめっき層を設ける工程
を含むハニカム構造体成形用口金の製造方法。
(2)前記めっき層の厚みが20〜200μmである(1)に記載のハニカム構造体成形用口金の製造方法。
(3)前記ハニカム構造体成形用口金の、前記めっき層が設けられた部位の表面粗さ(Ra)が0.3〜7μmである(1)又は(2)に記載のハニカム構造体成形用口金の製造方法。
(4)前記ハニカム構造体成形用口金の、前記めっき層が設けられた部位の表面粗さ(Ra)が0.3〜3μmである(3)に記載のハニカム構造体成形用口金の製造方法。
(5)さらに、前記めっき層を設ける前、前記裏孔及び前記スリット内に砥粒流動体を流すことにより前記ハニカム構造体成形用口金を研磨する流体研磨工程を含む(1)〜(4)のいずれかに記載のハニカム構造体成形用口金の製造方法。
(6)前記流体研磨工程前における前記ハニカム構造体成形用口金の、前記裏孔及び前記スリットを構成する部位の表面粗さ(Ra)が5〜20μmであり、前記流体研磨工程により、前記裏孔及び前記スリットを構成する部位の表面粗さ(Ra)を1〜10μmとする(5)に記載のハニカム構造体成形用口金の製造方法。
(7)前記流体研磨工程により、前記裏孔及び前記スリットを構成する部位の表面粗さ(Ra)を1〜5μmとする(6)に記載のハニカム構造体成形用口金の製造方法。
(8)前記めっき層が無電解Niめっき層である(1)〜(7)のいずれかに記載のハニカム構造体成形用口金の製造方法。
(9)成形原料を導入する裏孔と、前記裏孔と連通して成形原料をハニカム構造体に押出成形するためのスリットを有するハニカム構造体成形用口金であって、前記裏孔及び前記スリットを構成する部位の少なくとも一部が厚み10〜300μmのめっき層に覆われ、前記めっき層に覆われる部位における表面粗さ(Ra)が0.3〜7μmであるハニカム構造体成形用口金。
(10)焼結体である(9)に記載のハニカム構造体成形用口金。
(11)付加製造法により造形された焼結体である(10)に記載のハニカム構造体成形用口金。
(12)前記めっき層の厚みが20〜200μmである(9)〜(11)のいずれかに記載のハニカム構造体成形用口金。
(13)前記めっき層に覆われる部位における表面粗さ(Ra)が0.3〜5μmである(9)〜(12)のいずれかに記載のハニカム構造体成形用口金。
(14)前記めっき層が無電解Niめっき層である(9)〜(13)のいずれかに記載のハニカム構造体成形用口金。
(15)前記めっき層が最表面にある(9)〜(14)に記載のハニカム構造体成形用口金。
(16)(1)〜(8)のいずれかに記載のハニカム構造体成形用口金の製造方法によりハニカム構造体成形用口金を製造し、さらに当該ハニカム構造体成形用口金を使用してハニカム構造体を押出成形する工程を含むハニカム構造体の製造方法。
(17)(9)〜(15)のいずれかに記載のハニカム構造体成形用口金を使用してハニカム構造体を押出成形する工程を含むハニカム構造体の製造方法。
(1) A manufacturing method of a die for forming a honeycomb structure having a back hole for introducing a forming raw material, and a slit communicating with the back hole to extrude the forming raw material into the honeycomb structure,
Forming the honeycomb structure forming die by an additive manufacturing method; and
A method of manufacturing a die for forming a honeycomb structure, comprising a step of providing a plating layer having a thickness of 10 to 300 μm so as to cover at least a part of the portion constituting the back hole and the slit of the die for forming the honeycomb structure.
(2) The method for manufacturing a die for forming a honeycomb structure according to (1), wherein the plating layer has a thickness of 20 to 200 μm.
(3) The honeycomb structure forming die according to (1) or (2), wherein the surface roughness (Ra) of the portion where the plating layer is provided of the die for forming the honeycomb structure is 0.3 to 7 μm. A method of manufacturing the base.
(4) The manufacturing method of the die for forming a honeycomb structure according to (3), wherein the surface roughness (Ra) of the portion where the plating layer is provided of the die for forming the honeycomb structure is 0.3 to 3 μm. .
(5) Furthermore, before providing the said plating layer, the fluid grinding | polishing process which grind | polishes the said die for honeycomb structure shaping | molding by flowing an abrasive fluid into the said back hole and the said slit is included (1)-(4) A method for manufacturing a die for forming a honeycomb structure according to any one of the above.
(6) The surface roughness (Ra) of the part constituting the back hole and the slit of the honeycomb structure forming die before the fluid polishing step is 5 to 20 μm. The method for manufacturing a die for forming a honeycomb structure according to (5), wherein the surface roughness (Ra) of the portion constituting the hole and the slit is 1 to 10 μm.
(7) The method for manufacturing a die for forming a honeycomb structure according to (6), wherein a surface roughness (Ra) of a portion constituting the back hole and the slit is set to 1 to 5 μm by the fluid polishing step.
(8) The manufacturing method of the die for forming a honeycomb structure according to any one of (1) to (7), wherein the plating layer is an electroless Ni plating layer.
(9) A honeycomb structure forming die having a back hole for introducing a forming raw material and a slit communicating with the back hole to extrude the forming raw material into the honeycomb structure, wherein the back hole and the slit A die for forming a honeycomb structure in which at least a part of a portion constituting the substrate is covered with a plating layer having a thickness of 10 to 300 μm, and a surface roughness (Ra) in the portion covered with the plating layer is 0.3 to 7 μm.
(10) The die for forming a honeycomb structure according to (9), which is a sintered body.
(11) The die for forming a honeycomb structure according to (10), which is a sintered body formed by an additive manufacturing method.
(12) The die for forming a honeycomb structure according to any one of (9) to (11), wherein the plating layer has a thickness of 20 to 200 μm.
(13) The die for forming a honeycomb structure according to any one of (9) to (12), wherein a surface roughness (Ra) in a portion covered with the plating layer is 0.3 to 5 μm.
(14) The die for forming a honeycomb structure according to any one of (9) to (13), wherein the plating layer is an electroless Ni plating layer.
(15) The die for forming a honeycomb structure according to any one of (9) to (14), wherein the plating layer is on the outermost surface.
(16) A honeycomb structure forming die is manufactured by the method for manufacturing a honeycomb structure forming die according to any one of (1) to (8), and further, the honeycomb structure is formed using the honeycomb structure forming die. A method for manufacturing a honeycomb structure including a step of extruding a body.
(17) A method for manufacturing a honeycomb structure including a step of extruding a honeycomb structure using the die for forming a honeycomb structure according to any one of (9) to (15).

本発明によれば、自由度の高い口金設計が可能となり、付加加工であるため材料収率が良く、また単設備で基本構造を形成可能なため、製造リードタイムを従来方法と比べ大幅に抑制可能である。   According to the present invention, it is possible to design a die with a high degree of freedom, and because it is an additional process, the material yield is good, and the basic structure can be formed with a single facility, so the manufacturing lead time is greatly reduced compared to the conventional method. Is possible.

本発明の一実施形態により製造されるハニカム構造体成形用口金を模式的に示す斜視図である。1 is a perspective view schematically showing a honeycomb structure forming die manufactured according to an embodiment of the present invention. FIG. 図1に示すハニカム構造体成形用口金によって押出成形されたハニカム構造体を示す斜視図である。FIG. 2 is a perspective view showing a honeycomb structure extruded by the honeycomb structure forming die shown in FIG. 1. 実施例及び比較例における付加製造法に使用されるハニカム構造体成形用口金の設計図の一つである。It is one of the design drawings of the die for forming a honeycomb structure used in the additive manufacturing method in Examples and Comparative Examples.

以下、図面を参照して、本発明のハニカム構造体成形用口金(以下、単に「口金」ということがある)の製造方法、及びハニカム構造体成形用口金、並びにハニカム構造体の製造方法の実施の形態について詳細に説明するが、本発明は、これに限定されて解釈されるものではなく、本発明の範囲を逸脱しない限りにおいて、当業者の知識に基づいて、種々の変更、修正、改良を加え得るものである。   Hereinafter, with reference to the drawings, a method for manufacturing a honeycomb structure forming die (hereinafter, also simply referred to as “die”), a honeycomb structure forming die, and a method for manufacturing a honeycomb structure according to the present invention will be described. However, the present invention is not construed as being limited thereto, and various changes, modifications, and improvements can be made based on the knowledge of those skilled in the art without departing from the scope of the present invention. Can be added.

(1.ハニカム構造体成形用口金)
本発明において、製造しようとするハニカム構造体成形用口金は、成形原料を導入する裏孔と、前記裏孔と連通して成形原料をハニカム構造体に押出成形するためのスリットという基本的構造を有すれば足り、その具体的形状等は制約されない。
典型的には、本発明の一実施形態において、ハニカム構造体成形用口金は、図1に示されるように、少なくとも二つの面5、6を有し、一方の面5に成形原料を導入する裏孔3が形成されるとともに、他方の面6に裏孔3と連通するスリット4が形成された板状の口金基体2を備え、裏孔3に導入した成形原料をスリット4から押出してハニカム構造体10(図2参照)を成形するハニカム構造体成形用口金1である。
(1. Die for forming honeycomb structure)
In the present invention, a honeycomb structure forming die to be manufactured has a basic structure of a back hole for introducing a forming raw material, and a slit for extruding the forming raw material into the honeycomb structure in communication with the back hole. It is sufficient if it is present, and its specific shape is not limited.
Typically, in one embodiment of the present invention, the honeycomb structure forming die has at least two surfaces 5 and 6 as shown in FIG. A plate-shaped base 2 having a back hole 3 formed and a slit 4 communicating with the back hole 3 on the other surface 6 is provided, and a forming raw material introduced into the back hole 3 is extruded from the slit 4 to form a honeycomb. This is a honeycomb structure forming die 1 for forming a structure 10 (see FIG. 2).

なお、後述のように、本発明によれば、自由度の高い口金設計が可能であるから、製造しようとするハニカム構造体成形用口金は、図1に示される構造よりも複雑であってもよい。   As will be described later, according to the present invention, since the die design with a high degree of freedom is possible, the die for forming a honeycomb structure to be manufactured may be more complicated than the structure shown in FIG. Good.

後述のように、付加製造法によりハニカム構造体成形用口金を製造する場合、付加製造法の技術上の制約により、ハニカム構造体を押出成形する際に成形原料とハニカム構造体成形用口金が接触する部分、すなわち、ハニカム構造体成形用口金の裏孔及びスリットを構成する部位の表面の凹凸が従来の製造方法よりも高い場合がある。この場合、成形原料が流動せず、あるいは意図した流動をせず、正確かつ均一な流量調節が困難となるという問題がある。   As will be described later, when a honeycomb structure forming die is manufactured by the additive manufacturing method, due to technical restrictions of the additive manufacturing method, the forming raw material and the honeycomb structure forming die are in contact with each other when the honeycomb structure is extruded. In some cases, the unevenness of the surface of the portion constituting the portion to be formed, that is, the back hole and slit of the honeycomb structure forming die is higher than that of the conventional manufacturing method. In this case, there is a problem that the molding raw material does not flow or does not flow as intended, and accurate and uniform flow rate adjustment becomes difficult.

本発明者は、この問題点についてさらに鋭意検討した結果、ハニカム構造体成形用口金の裏孔及びスリットを構成する部位の表面の少なくとも一部に厚み10〜300μmのめっき層を設けることで、当該部位における表面粗さ(Ra)を低減することを見出した。すなわち、厚み10〜300μmの上記めっき層を設けることにより、付加製造法という全く新しい製造方法による利点を享受しつつも、正確かつ均一な流量調節が可能となり、そのため、高密度で高精度の隔壁を有したハニカム構造体の押出成形が可能となる。この観点から、上記めっき層は、ハニカム構造体を押出成形する際に成形原料とハニカム構造体成形用口金が接触する部分、すなわち、ハニカム構造体成形用口金の裏孔及びスリットを構成する部位の表面すべてについて設けることが好ましい。   As a result of further diligent investigation on this problem, the present inventor provided a plating layer having a thickness of 10 to 300 μm on at least a part of the surface of the portion constituting the back hole and slit of the honeycomb structure forming die. It was found that the surface roughness (Ra) at the site was reduced. That is, by providing the plating layer having a thickness of 10 to 300 μm, it is possible to adjust the flow rate accurately and uniformly while enjoying the advantages of a completely new manufacturing method called an additive manufacturing method. It is possible to extrude the honeycomb structure having the. From this point of view, the plating layer is a portion where the forming raw material and the honeycomb structure forming die come into contact when the honeycomb structure is extruded, that is, the portion constituting the back hole and the slit of the honeycomb structure forming die. It is preferable to provide the entire surface.

めっき層の厚みが10μmより薄いと、当該部位における表面粗さ(Ra)低減の効果が十分ではない。この観点から、めっき層の厚みは20μm以上であることがより好ましく、30μm以上であることがより好ましい。また、めっき層の厚みが300μmより厚いと、めっき処理に要する工数が長大化するとともに裏孔が縮小することでハニカム構造体の押し出し時の圧力が増大する。この観点から、めっき層の厚みは250μm以下であることがより好ましく、200μm以下であることがより好ましい。   When the thickness of the plating layer is thinner than 10 μm, the effect of reducing the surface roughness (Ra) at the site is not sufficient. From this viewpoint, the thickness of the plating layer is more preferably 20 μm or more, and more preferably 30 μm or more. On the other hand, when the thickness of the plating layer is greater than 300 μm, the man-hour required for the plating process increases, and the back hole shrinks, thereby increasing the pressure during extrusion of the honeycomb structure. From this viewpoint, the thickness of the plating layer is more preferably 250 μm or less, and more preferably 200 μm or less.

また、ハニカム構造体の押し出しを容易にする観点から、上記めっき層が設けられた部位上記めっき層が設けられた部位における表面粗さ(Ra)を0.3〜7μmとすることが好ましい。表面粗さ(Ra)を0.3μmより小さくしても効果が薄く、また製造上の困難が増加するため、0.3μmを下限とする。この観点から、表面粗さ(Ra)は0.5μm以上であることがより好ましく、0.7μm以上であることがより好ましい。一方、表面粗さ(Ra)が7μmを超えると、正確かつ均一な流量調節が困難となる。この観点から、上記めっき層が設けられた部位における表面粗さ(Ra)は5μm以下であることがより好ましく、3μm以下であることがより好ましい。   Further, from the viewpoint of facilitating the extrusion of the honeycomb structure, it is preferable that the surface roughness (Ra) at the portion where the plating layer is provided is 0.3 to 7 μm. Even if the surface roughness (Ra) is smaller than 0.3 μm, the effect is small, and the difficulty in manufacturing increases, so 0.3 μm is set as the lower limit. From this viewpoint, the surface roughness (Ra) is more preferably 0.5 μm or more, and more preferably 0.7 μm or more. On the other hand, when the surface roughness (Ra) exceeds 7 μm, accurate and uniform flow rate adjustment becomes difficult. From this viewpoint, the surface roughness (Ra) at the portion where the plating layer is provided is more preferably 5 μm or less, and more preferably 3 μm or less.

本発明において、めっき層の厚みは、画像測定顕微鏡により、裏孔又はスリット幅をめっき前後で測定し、差分により算出される値をめっき層の厚みとして示される。具体的には、裏孔及びスリットについてそれぞれ任意にめっき層がある5箇所について、裏孔径とスリット間隙量を測定し、その平均値をとる。   In the present invention, the thickness of the plating layer is indicated as a thickness of the plating layer by measuring the back hole or slit width before and after plating with an image measurement microscope and calculating the difference. Specifically, the back hole diameter and the slit gap amount are measured at five locations where the plating layer is arbitrarily provided for each of the back hole and the slit, and an average value thereof is taken.

なお、本発明にいう「表面粗さ(Ra)」とは、JIS B0601(2013)「製品の幾何特性仕様(GPS)− 表面性状:輪郭曲線方式 − 用語,定義及び表面性状パラメータ表面粗さ − 定義及び表示」の「4.2.1 輪郭曲線の算術平均高さ」「算術平均粗さ Ra」に準拠して測定した表面粗さを意味する。本発明においては、基準長さL=4mmとする。   The “surface roughness (Ra)” referred to in the present invention is JIS B0601 (2013) “Product Geometrical Specification (GPS) —Surface Properties: Contour Curve Method—Terminology, Definition and Surface Properties Parameters Surface Roughness— It means the surface roughness measured according to “4.2.1 Arithmetic mean height of contour curve” and “Arithmetic mean roughness Ra” in “Definitions and indications”. In the present invention, the reference length L = 4 mm.

そして、後述のように、本発明は付加製造法によりハニカム構造体成形用口金を製造することも想定しているため、この場合におけるハニカム構造体成形用口金は焼結体であり、具体的には、付加製造法により造形された焼結体である。   As will be described later, since the present invention also assumes that the die for forming a honeycomb structure is manufactured by an additive manufacturing method, the die for forming a honeycomb structure in this case is a sintered body. Is a sintered body formed by an additive manufacturing method.

また、上記めっき層の種類は、特に限定されず、例えば、電気Niめっきなどを採用することができる。中でも、めっきの均一性の理由から、無電解Niめっき層を採用することが好ましい。無電解Niめっき層を設ける方法は限定されず、種々の公知の方法により設けることができる。   Moreover, the kind of the plating layer is not particularly limited, and for example, electric Ni plating can be employed. Especially, it is preferable to employ | adopt an electroless Ni plating layer from the reason of the uniformity of plating. The method of providing the electroless Ni plating layer is not limited, and can be provided by various known methods.

また、ハニカム構造体成形用口金は、長寿命化や耐摩耗性の観点から、耐摩耗性材料でコーティングされることがあるが、本発明においては、めっき層を設けることにより、ハニカム構造体成形用口金として必要な耐磨耗性能を獲得することができるので、このようなコーティングを用いることは必ずしも必要ではない。すなわち、本発明において、上記めっき層がハニカム構造体成形用口金の最表面に設けることができる。   Further, the die for forming a honeycomb structure may be coated with an abrasion-resistant material from the viewpoint of extending the life and wear resistance. However, in the present invention, the honeycomb structure is formed by providing a plating layer. It is not always necessary to use such a coating because it can achieve the wear resistance required for the base. That is, in the present invention, the plating layer can be provided on the outermost surface of the die for forming a honeycomb structure.

(2.ハニカム構造体成形用口金の製造方法)
本発明のハニカム構造体成形用口金の製造方法は、付加製造法 により前記ハニカム構造体成形用口金を造形する工程と、前記ハニカム構造体成形用口金の、前記裏孔及び前記スリットを構成する部位の少なくとも一部を覆うように、厚み10〜300μmのめっき層を設ける工程を含む。
(2. Manufacturing method of die for forming honeycomb structure)
The method for manufacturing a die for forming a honeycomb structure according to the present invention includes a step of forming the die for forming a honeycomb structure by an additional manufacturing method, and a portion constituting the back hole and the slit of the die for forming the honeycomb structure A step of providing a plating layer having a thickness of 10 to 300 μm so as to cover at least a part of the substrate.

典型的には、ハニカム構造体成形用口金を構成する金属又は合金の粉末の薄層を形成し、この薄層における粉末を、電子ビームやレーザーで焼結又は溶融結合により固化させて造形物層を形成し、この造形物層を積層することにより積層造形物を製造することができる。
好ましくは、造形用のステージに、ハニカム構造体成形用口金を構成する金属又は合金の粉末敷き詰めて薄層を形成し、次いで、当該薄層に対し、造形すべき部分に電子ビームを照射して前記粉末を溶解させ、その後自然冷却により凝固させる工程を複数回繰り返して行うことで、ハニカム構造体成形用口金を製造することができる。
Typically, a thin layer of metal or alloy powder constituting the die for forming a honeycomb structure is formed, and the powder in the thin layer is solidified by sintering or fusion bonding with an electron beam or a laser to form a shaped article layer The layered object can be manufactured by forming the layer and stacking the layer of the modeled object.
Preferably, a thin layer is formed by spreading a powder of a metal or an alloy constituting the honeycomb structure forming die on the modeling stage, and then the electron beam is irradiated to the portion to be modeled. A honeycomb structure forming die can be manufactured by repeating the process of dissolving the powder and then solidifying by natural cooling a plurality of times.

付加製造法によれば、余分な材料を除去する加工が必要ではなく、又は非常に少量に抑えられるからことで材料収率は従来技術と比較して著しく高くなる。また、単設備で基本構造を形成可能なため、製造リードタイムを従来方法と比べ大幅に抑制可能である。   According to the additive manufacturing method, it is not necessary to perform processing for removing excess material, or the material yield is remarkably increased as compared with the prior art because it is suppressed to a very small amount. In addition, since the basic structure can be formed with a single facility, the manufacturing lead time can be greatly suppressed as compared with the conventional method.

ハニカム構造体成形用口金を構成する金属又は合金の材料は限定されず、必要に応じて種々の材料を選択することができる。例えば、ステンレス合金や超硬合金を用いることができる。ステンレス合金、例えば、SUS630(C:0.07以下,Si:1.00以下,Mn:1.00以下,P:0.040以下,S:0.030以下,Ni:3.00〜5.00,Cr:15.50〜17.50,Cu:3.00〜5.00,Nb+Ta:0.15〜0.45,Fe:残部(単位は質量%))を好適例として挙げることができる。
超硬合金としては、例えば、炭化タングステンを、鉄(Fe)、コバルト(Co)、ニッケル(Ni)、チタン(Ti)、及びクロム(Cr)からなる群より選択される少なくとも一つの金属で焼結した炭化タングステン基超硬合金を好適例として挙げることができる。
いずれの材料も、付加製造法に利用可能である限り、本発明において用いることができる。
The material of the metal or alloy constituting the die for forming a honeycomb structure is not limited, and various materials can be selected as necessary. For example, a stainless alloy or a cemented carbide can be used. Stainless steel alloy, for example, SUS630 (C: 0.07 or less, Si: 1.00 or less, Mn: 1.00 or less, P: 0.040 or less, S: 0.030 or less, Ni: 3.00-5. Preferred examples include 00, Cr: 15.50 to 17.50, Cu: 3.00 to 5.00, Nb + Ta: 0.15 to 0.45, Fe: balance (unit: mass%)). .
As the cemented carbide, for example, tungsten carbide is sintered with at least one metal selected from the group consisting of iron (Fe), cobalt (Co), nickel (Ni), titanium (Ti), and chromium (Cr). A preferred example is a cemented tungsten carbide-based cemented carbide.
Any material can be used in the present invention as long as it can be used in the additive production method.

また、前述の理由で、付加製造法によりハニカム構造体成形用口金を造形した後、当該ハニカム構造体成形用口金の裏孔及びスリットを構成する部位の少なくとも一部を覆うように、厚み10〜300μmのめっき層を設ける必要がある。この観点から、上記めっき層は、ハニカム構造体を押出成形する際に成形原料とハニカム構造体成形用口金が接触する部分、すなわち、ハニカム構造体成形用口金の裏孔及びスリットを構成する部位の表面すべてについて設けることが好ましい。   In addition, for the above-described reason, after forming the honeycomb structure forming die by the additive manufacturing method, the thickness 10 to 10 so as to cover at least a part of the portion constituting the back hole and the slit of the honeycomb structure forming die. It is necessary to provide a 300 μm plating layer. From this point of view, the plating layer is a portion where the forming raw material and the honeycomb structure forming die come into contact when the honeycomb structure is extruded, that is, the portion constituting the back hole and the slit of the honeycomb structure forming die. It is preferable to provide the entire surface.

また、めっき層の厚み、及び当該めっき層が設けられた部位における表面粗さ(Rz)の好ましい範囲は前述のとおりである。   Moreover, the preferable range of the thickness of a plating layer and the surface roughness (Rz) in the site | part in which the said plating layer was provided is as above-mentioned.

また、上記めっき層を設けた後の、ハニカム構造体成形用口金の裏孔又はスリットを構成する部位の表面の表面粗さ(Ra)を上記範囲とすることを容易にするため、上記めっき層を設ける前、口金の裏孔及びスリット内に砥粒流動体を流すことによりハニカム構造体成形用口金を研磨する流体研磨工程を含むことが好ましい。
典型的には、ダイヤモンドや炭化ケイ素などの砥粒を含む流動体(オイルなど)をハニカム構造体成形用口金内に繰り返し通過させることにより研磨することができる。砥粒流動体の組成及び研磨工程の条件は、制限されず、必要に応じて適宜選択・変更することができる。
Moreover, in order to make it easy to make the surface roughness (Ra) of the surface of the part constituting the back hole or slit of the honeycomb structure forming die after providing the plating layer within the above range, the plating layer It is preferable to include a fluid polishing step of polishing the die for forming a honeycomb structure by flowing an abrasive fluid in the back hole and slit of the die before providing the substrate.
Typically, polishing can be performed by repeatedly passing a fluid (such as oil) containing abrasive grains such as diamond and silicon carbide through a die for forming a honeycomb structure. The composition of the abrasive fluid and the conditions of the polishing step are not limited and can be appropriately selected and changed as necessary.

また、上記めっき層を設けた後の、ハニカム構造体成形用口金の裏孔又はスリットを構成する部位の表面の表面粗さ(Ra)を上記範囲とすることを容易にする観点から、上記流体研磨工程前におけるハニカム構造体成形用口金の裏孔及びスリットを構成する部位の表面粗さ(Ra)が5〜20μmであり、上記流体研磨工程により、口金の裏孔及びスリットを構成する部位の表面粗さ(Ra)を1〜10μmとすることが好ましい。特に、上記流体研磨工程により、口金の裏孔及びスリットを構成する部位の表面粗さ(Ra)を1〜5μmとすれば、めっき層の厚みを薄くすることができるので好適である。   From the viewpoint of facilitating setting the surface roughness (Ra) of the portion constituting the back hole or slit of the honeycomb structure forming die after providing the plating layer to the above range, The surface roughness (Ra) of the portion constituting the back hole and slit of the honeycomb structure forming die before the polishing step is 5 to 20 μm, and the portion constituting the back hole and slit of the die is formed by the fluid polishing step. The surface roughness (Ra) is preferably 1 to 10 μm. In particular, if the surface roughness (Ra) of the portion constituting the back hole and slit of the die is set to 1 to 5 μm by the fluid polishing step, it is preferable because the thickness of the plating layer can be reduced.

前述のように、前記めっき層は、無電解Niめっき層であることが好ましい。無電解Niめっき層を設ける方法は特に限定されず、種々の公知の方法を用いることができる。無電解Niめっきは、ニッケルと、次亜リン酸ナトリウム、ホウ水酸化ナトリウム等の還元剤とを含有させためっき液を、80〜100℃程度に加熱して、ハニカム構造体成形用口金をめっき液中に所定時間浸して行うことができる。   As described above, the plating layer is preferably an electroless Ni plating layer. The method for providing the electroless Ni plating layer is not particularly limited, and various known methods can be used. Electroless Ni plating is performed by heating a plating solution containing nickel and a reducing agent such as sodium hypophosphite or sodium borohydride to about 80 to 100 ° C. to plate a die for forming a honeycomb structure. It can be performed by immersing in a liquid for a predetermined time.

(3.ハニカム構造体の製造方法)
本発明のハニカム構造体の製造方法は、一側面において、本発明のハニカム構造体成形用口金の製造方法によりハニカム構造体成形用口金を製造し、さらに当該ハニカム構造体成形用口金を使用してハニカム構造体を押出成形する工程を含むハニカム構造体の製造方法である。
(3. Manufacturing method of honeycomb structure)
In one aspect of the method for manufacturing a honeycomb structure of the present invention, a honeycomb structure forming die is manufactured by the method for manufacturing a honeycomb structure forming die of the present invention, and the honeycomb structure forming die is further used. A method for manufacturing a honeycomb structure including a step of extruding the honeycomb structure.

また、本発明のハニカム構造体の製造方法は、一側面において、本発明のハニカム構造体成形用口金を使用してハニカム構造体を押出成形する工程を含むハニカム構造体の製造方法である。   In one aspect, the method for manufacturing a honeycomb structure of the present invention is a method for manufacturing a honeycomb structure including a step of extruding the honeycomb structure using the honeycomb structure forming die of the present invention.

以下、本発明を実施例により具体的に説明するが、本発明は以下の実施例に限定されるものではない。   EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited to a following example.

[組成]
ハニカム構造体成形用口金の原料となる粉末として、ステンレス金属粉末(Mn:1.00以下,Mo:0.3以下,Ni:3.00〜5.00,Cr:15.50〜17.50,Cu:3.00〜5.00,Fe:70〜80(単位は質量%))を用意した。
[composition]
Stainless steel metal powder (Mn: 1.00 or less, Mo: 0.3 or less, Ni: 3.00 to 5.00, Cr: 15.50 to 17.50) is used as a raw material for the die for forming a honeycomb structure. , Cu: 3.00 to 5.00, Fe: 70 to 80 (unit: mass%)) were prepared.

[付加製造]
各実施例及び比較例のハニカム構造体成形用口金は、3Dsystems社製3DプリンターProX300を使用し、上記ステンレス金属粉末をステージ上に薄層に形成し、これに電子ビームを照射して、ステンレス金属粉末を固化させて造形物層を形成し、この造形物層を繰り返し積層することによって、図1に示される基本的構造を有するものを作製した。造形において使用される口金の設計図は図3に示される。
[Additional manufacturing]
The honeycomb structure forming die of each example and comparative example uses a 3D printer ProX300 manufactured by 3D systems, and the above stainless metal powder is formed into a thin layer on the stage, which is irradiated with an electron beam. A powder having a basic structure shown in FIG. 1 was produced by solidifying the powder to form a shaped article layer and repeatedly laminating the shaped article layer. A design drawing of a base used in modeling is shown in FIG.

[めっき層]
各実施例について、上記付加製造により造形されるハニカム構造体成形用口金について、
エクスツルードホーン社製流体研磨機EX−4350を使用して流体研磨を行い、脱脂処理した後、35%塩酸浴に1分間浸漬し、塩化ニッケル酸性浴にて電解めっきを行い、その直後リン酸ニッケル浴にて、無電解めっきを連続する一回のめっき工程により行い、表1に示される厚みの無電解Niめっき層を、当該口金の裏孔及びスリットの表面に設けた。無電解Niめっき層の厚みの測定方法は前述のとおりである。
なお、上記流体研磨を行う前の、ハニカム構造体成形用口金の裏孔及びスリットの表面粗さ(Ra)、及び上記流体研磨を行った後、上記無電解Niめっき層を設ける前のハニカム構造体成形用口金の裏孔及びスリットの表面粗さ(Ra)は表1に示される。表面粗さ(Ra)の測定方法は前述のとおりである。
[Plating layer]
For each example, about the die for forming a honeycomb structure formed by the above-described addition manufacturing,
Fluid polishing is performed using EX-4350 fluid polishing machine EX-4350, degreased, immersed in a 35% hydrochloric acid bath for 1 minute, electroplated in a nickel chloride acidic bath, and immediately after that Electroless plating was performed in a continuous acid plating process in an acid nickel bath, and an electroless Ni plating layer having a thickness shown in Table 1 was provided on the back hole of the die and the surface of the slit. The method for measuring the thickness of the electroless Ni plating layer is as described above.
Note that the surface roughness (Ra) of the back hole and slit of the honeycomb structure forming die before the fluid polishing and the honeycomb structure before the electroless Ni plating layer is provided after the fluid polishing is performed. Table 1 shows the surface roughness (Ra) of the back hole and slit of the body-forming die. The method for measuring the surface roughness (Ra) is as described above.

製造される各実施例及び比較例のハニカム構造体成形用口金を用いて、坏土を押し出してハニカム構造体を成形し、予期された性状を有するハニカム構造体を製造することができた場合には「〇」、予期された性状を有するハニカム構造体を製造することができなかった場合には「×」とし、表1に成形性として示した。   When the honeycomb structure is formed by extruding the kneaded clay using the honeycomb structure forming die of each example and comparative example to be manufactured, and a honeycomb structure having the expected properties can be manufactured. Is “◯”. When a honeycomb structure having the expected properties could not be manufactured, “X” was shown, and Table 1 shows the formability.

1…ハニカム構造体成形用口金
2…口金基体
3…裏孔
4…スリット
5、6…ハニカム構造体成形用口金の両面
10…ハニカム構造体
11…隔壁
12…セル
DESCRIPTION OF SYMBOLS 1 ... Base for honeycomb structure shaping | molding 2 ... Base body 3 ... Back hole 4 ... Slit 5, 6 ... Both surfaces 10 of die for honeycomb structure shaping | molding ... Honeycomb structure 11 ... Partition 12 ... Cell

Claims (17)

成形原料を導入する裏孔と、前記裏孔と連通して成形原料をハニカム構造体に押出成形するためのスリットを有するハニカム構造体成形用口金の製造方法であって、
付加製造法により前記ハニカム構造体成形用口金を造形する工程と、
前記ハニカム構造体成形用口金の、前記裏孔及び前記スリットを構成する部位の少なくとも一部を覆うように、厚み10〜300μmのめっき層を設ける工程
を含むハニカム構造体成形用口金の製造方法。
A manufacturing method of a die for forming a honeycomb structure having a back hole for introducing a forming raw material, and a slit communicating with the back hole to extrude the forming raw material into the honeycomb structure,
Forming the honeycomb structure forming die by an additional manufacturing method; and
A method for manufacturing a honeycomb structure forming die, comprising a step of providing a plating layer having a thickness of 10 to 300 μm so as to cover at least a part of the portion constituting the back hole and the slit of the die for forming the honeycomb structure.
前記めっき層の厚みが20〜200μmである請求項1に記載のハニカム構造体成形用口金の製造方法。   The method for manufacturing a die for forming a honeycomb structure according to claim 1, wherein the plating layer has a thickness of 20 to 200 µm. 前記ハニカム構造体成形用口金の、前記めっき層が設けられた部位の表面粗さ(Ra)が0.3〜7μmである請求項1又は2に記載のハニカム構造体成形用口金の製造方法。   The method for manufacturing a honeycomb structure forming die according to claim 1 or 2, wherein the honeycomb structure forming die has a surface roughness (Ra) of a portion provided with the plating layer of 0.3 to 7 µm. 前記ハニカム構造体成形用口金の、前記めっき層が設けられた部位の表面粗さ(Ra)が0.3〜3μmである請求項3に記載のハニカム構造体成形用口金の製造方法。   The method for manufacturing a die for forming a honeycomb structure according to claim 3, wherein the honeycomb structure forming die has a surface roughness (Ra) of 0.3 to 3 µm at a portion where the plating layer is provided. さらに、前記めっき層を設ける前、前記裏孔及び前記スリット内に砥粒流動体を流すことにより前記ハニカム構造体成形用口金を研磨する流体研磨工程を含む請求項1〜4のいずれかに記載のハニカム構造体成形用口金の製造方法。   Furthermore, before providing the said plating layer, the fluid grinding | polishing process which grind | polishes the said die for a honeycomb structure shaping | molding by flowing an abrasive fluid into the said back hole and the said slit is included in any one of Claims 1-4. Manufacturing method for a honeycomb structure forming die. 前記流体研磨工程前における前記ハニカム構造体成形用口金の、前記裏孔及び前記スリットを構成する部位の表面粗さ(Ra)が5〜20μmであり、前記流体研磨工程により、前記裏孔及び前記スリットを構成する部位の表面粗さ(Ra)を1〜10μmとする請求項5に記載のハニカム構造体成形用口金の製造方法。   The honeycomb structure forming die before the fluid polishing step has a surface roughness (Ra) of the portion constituting the back hole and the slit of 5 to 20 μm. The method for manufacturing a die for forming a honeycomb structure according to claim 5, wherein the surface roughness (Ra) of the portion constituting the slit is 1 to 10 µm. 前記流体研磨工程により、前記裏孔及び前記スリットを構成する部位の表面粗さ(Ra)を1〜5μmとする請求項6に記載のハニカム構造体成形用口金の製造方法。   The method for manufacturing a die for forming a honeycomb structure according to claim 6, wherein a surface roughness (Ra) of a portion constituting the back hole and the slit is set to 1 to 5 µm by the fluid polishing step. 前記めっき層が無電解Niめっき層である請求項1〜7のいずれかに記載のハニカム構造体成形用口金の製造方法。   The method for manufacturing a die for forming a honeycomb structure according to any one of claims 1 to 7, wherein the plating layer is an electroless Ni plating layer. 成形原料を導入する裏孔と、前記裏孔と連通して成形原料をハニカム構造体に押出成形するためのスリットを有するハニカム構造体成形用口金であって、前記裏孔及び前記スリットを構成する部位の少なくとも一部が厚み10〜300μmのめっき層に覆われ、前記めっき層に覆われる部位における表面粗さ(Ra)が0.3〜7μmであるハニカム構造体成形用口金。   A die for forming a honeycomb structure having a back hole for introducing a forming raw material and a slit communicating with the back hole for extruding the forming raw material into the honeycomb structure, the back hole and the slit being configured A die for forming a honeycomb structure, wherein at least a part of the portion is covered with a plating layer having a thickness of 10 to 300 µm, and the surface roughness (Ra) in the portion covered with the plating layer is 0.3 to 7 µm. 焼結体である請求項9に記載のハニカム構造体成形用口金。   The die for forming a honeycomb structure according to claim 9, wherein the die is a sintered body. 付加製造法により造形された焼結体である請求項10に記載のハニカム構造体成形用口金。   The die for forming a honeycomb structure according to claim 10, which is a sintered body formed by an additive manufacturing method. 前記めっき層の厚みが20〜200μmである請求項9〜11のいずれかに記載のハニカム構造体成形用口金。   The die for forming a honeycomb structure according to any one of claims 9 to 11, wherein the plating layer has a thickness of 20 to 200 µm. 前記めっき層に覆われる部位における表面粗さ(Ra)が0.3〜5μmである請求項9〜12のいずれかに記載のハニカム構造体成形用口金。   The die for forming a honeycomb structure according to any one of claims 9 to 12, wherein a surface roughness (Ra) at a portion covered with the plating layer is 0.3 to 5 µm. 前記めっき層が無電解Niめっき層である請求項9〜13のいずれかに記載のハニカム構造体成形用口金。   The die for forming a honeycomb structure according to any one of claims 9 to 13, wherein the plating layer is an electroless Ni plating layer. 前記めっき層が最表面にある請求項9〜14に記載のハニカム構造体成形用口金。   The die for forming a honeycomb structure according to claim 9, wherein the plating layer is on the outermost surface. 請求項1〜8のいずれかに記載のハニカム構造体成形用口金の製造方法によりハニカム構造体成形用口金を製造し、さらに当該ハニカム構造体成形用口金を使用してハニカム構造体を押出成形する工程を含むハニカム構造体の製造方法。   A honeycomb structure forming die is manufactured by the method for manufacturing a honeycomb structure forming die according to any one of claims 1 to 8, and further the honeycomb structure is extruded using the honeycomb structure forming die. A method for manufacturing a honeycomb structure including the steps. 請求項9〜15のいずれかに記載のハニカム構造体成形用口金を使用してハニカム構造体を押出成形する工程を含むハニカム構造体の製造方法。   A method for manufacturing a honeycomb structure, comprising the step of extruding a honeycomb structure using the die for forming a honeycomb structure according to any one of claims 9 to 15.
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