JP2019149303A - Sealed terminal - Google Patents

Sealed terminal Download PDF

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JP2019149303A
JP2019149303A JP2018033720A JP2018033720A JP2019149303A JP 2019149303 A JP2019149303 A JP 2019149303A JP 2018033720 A JP2018033720 A JP 2018033720A JP 2018033720 A JP2018033720 A JP 2018033720A JP 2019149303 A JP2019149303 A JP 2019149303A
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hole
thickness
ceramic plate
sealed terminal
pin
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遥 大村
Haruka Omura
遥 大村
晃一 岩本
Koichi Iwamoto
晃一 岩本
泰志 中野
Yasushi Nakano
泰志 中野
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Kyocera Corp
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Kyocera Corp
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Abstract

To provide a long-life sealed terminal capable of reducing stress generated between an electrical insulator and a metal part even under an environment having a large temperature difference, such as under a cryogenic environment.SOLUTION: A sealed terminal of the present disclosure includes: a ceramic plate 1 including a first surface 1x and a second surface 1y and having a through hole H penetrating between the first surface and the second surface; a metal pin 2 inserted through the through hole H; and a brazing material 3 for sealing a gap between the pin 2 and the through hole H. The ceramic plate 1 includes: a first region R1 including an inner peripheral surface 1h of the through hole H and extending in the thickness direction of the ceramic plate 1, in a direction perpendicular to the thickness direction between the first surface 1x and the second surface 1y; and a second region R2 adjacent to the first region R1. In a cross-section view along the penetration direction of the through hole H, the thickness (d1) of the ceramic plate in the first region R1 is thicker than the thickness (d2) of the ceramic plate in the second region R2.SELECTED DRAWING: Figure 1

Description

本発明は、気体や液体等を密閉する位置で、外部との電気的接続に用いられる密封端子に関する。   The present invention relates to a sealed terminal used for electrical connection with the outside at a position where gas or liquid is sealed.

半導体製造装置等、内部雰囲気と外部雰囲気とを遮断して使用する電気装置には、内外間で電気信号を送受信するために、密封端子が取り付けられている。密封端子は、気体および液体等の流体の流通を阻止しつつ電気または電気信号を導通させるものであり、気体の通過を阻止するものを気密端子、液体の通過を阻止するものを液密端子と呼ぶ場合がある。   In an electrical apparatus such as a semiconductor manufacturing apparatus that is used by blocking the internal atmosphere and the external atmosphere, a sealed terminal is attached to transmit and receive an electrical signal between the inside and the outside. The sealed terminal is for conducting an electrical or electrical signal while preventing the flow of fluid such as gas and liquid, and the one for preventing the passage of gas is the hermetic terminal, and the one for preventing the passage of liquid is the liquid-tight terminal. Sometimes called.

このような密封端子(気密端子)の例として、特許文献1等では、厚さ方向に貫通孔を有する、円筒形状のアルミナ質セラミックス等からなる電気絶縁体の全面に、金属からなるメタライズ層を形成し、それを軸線方向に所定間隔で切断(いわゆる「輪切り」に)して、外周面と前記貫通孔の内周面に隔絶されたメタライズ層(めっきのプライマーとしての金属層)を有する円板状の電気絶縁体を形成している。   As an example of such a sealed terminal (airtight terminal), in Patent Document 1 and the like, a metallized layer made of metal is formed on the entire surface of an electrical insulator made of cylindrical alumina ceramic having a through hole in the thickness direction. A circle having a metallized layer (a metal layer serving as a primer for plating) formed on the outer peripheral surface and separated from the inner peripheral surface of the through-hole by cutting it into an axial direction at predetermined intervals (so-called “ring cutting”). A plate-like electrical insulator is formed.

そして、このような円板状の電気絶縁体は、電気装置等の基板または土台等のワークWに形成された密閉用の穴または開口に嵌め入れられた後、ワークWに接する外周は、外周に設けられたメタライズ層を介して、前記の密閉用の穴に、ロウ付け加工等により固着される。   Such a disc-shaped electrical insulator is inserted into a sealing hole or opening formed in a work W such as a substrate or a base of an electric device or the like, and the outer periphery in contact with the work W is Is fixed to the sealing hole by brazing or the like through the metallized layer provided on the surface.

また、電気絶縁体の内側に設けられた貫通孔には、ピン等の金属製の端子が挿通され、先に述べた貫通孔内周のメタライズ層を介して、前記端子がこの貫通孔の内周にロウ付け加工により取り付けられる。これにより、密封端子は、信号等の電気をワークWの内外で導通させつつ、このワークWの内部を、密閉された状態に保つことができる。   Further, a metal terminal such as a pin is inserted into the through hole provided inside the electrical insulator, and the terminal is connected to the inside of the through hole through the metallization layer on the inner periphery of the through hole described above. It is attached to the circumference by brazing. Thereby, the sealing terminal can maintain the inside of the workpiece W in a sealed state while conducting electricity such as signals inside and outside the workpiece W.

特開2005−317230号公報JP-A-2005-317230

ところで、前述のような密封端子においては、昇温および降温を繰返すと、セラミックス等からなる電気絶縁体に、ひび割れや欠け等の破損が生じて、気密・液密などの密封性が損なわれることがある。これらひび割れ等の電気絶縁体の破損は、貫通孔に嵌合されたリード端子等の金属部品と該電気絶縁体との線膨張係数(熱膨張率)の差によって生じる応力に起因して、発生・進展することが知られている。   By the way, in the sealed terminal as described above, if the temperature rise and fall are repeated, the electrical insulator made of ceramics and the like may be damaged such as cracks and chips, and the sealing performance such as airtightness and liquid tightness may be impaired. There is. Damage to the electrical insulator, such as cracks, occurs due to stress caused by the difference in the coefficient of linear expansion (thermal expansion coefficient) between the electrical insulator and a metal part such as a lead terminal fitted in the through hole.・ It is known to make progress.

特に、密封端子を、液化天然ガス(LNG)や液体水素,液体ヘリウムなどの低温液体が存在する環境下で使用する場合、さらに大きな応力が生じると予想されるため、このような極低温環境に対応できる密封端子が求められている。   In particular, when a sealed terminal is used in an environment where a low-temperature liquid such as liquefied natural gas (LNG), liquid hydrogen, or liquid helium is present, a greater stress is expected to occur. There is a need for sealed terminals that can be used.

本発明の目的は、極低温環境下等、大きな温度差を受ける環境下においても、電気絶縁体と金属部品との間に生じる応力を軽減することのできる、長寿命の密封端子を提供することである。   An object of the present invention is to provide a long-life sealed terminal capable of reducing stress generated between an electrical insulator and a metal part even under an environment subjected to a large temperature difference such as a cryogenic environment. It is.

本開示の密封端子は、第1面と第2面とを含み、
これら第1面と第2面との間を貫通する貫通孔を有するセラミック板と、
前記貫通孔に挿通される金属製のピンと、
前記ピンと前記貫通孔との間のすき間を封止するろう材と、を備え、
前記セラミック板は、前記第1面と前記第2面との間の厚さ方向に直交する方向に、
前記貫通孔の内周面を含み、セラミック板の厚さ方向に延びる第1部位と、
該第1部位に隣接する第2部位と、を有し、
前記貫通孔の貫通方向に沿った断面視において、
前記第1部位におけるセラミック板の厚さは、前記第2部位におけるセラミック板の厚さより厚いことを特徴とする。
The sealed terminal of the present disclosure includes a first surface and a second surface,
A ceramic plate having a through hole penetrating between the first surface and the second surface;
A metal pin inserted through the through hole;
A brazing material that seals a gap between the pin and the through-hole,
The ceramic plate is in a direction perpendicular to the thickness direction between the first surface and the second surface,
A first portion including an inner peripheral surface of the through hole and extending in a thickness direction of the ceramic plate;
A second part adjacent to the first part,
In a cross-sectional view along the penetration direction of the through hole,
The thickness of the ceramic plate in the first part is greater than the thickness of the ceramic plate in the second part.

本開示によれば、昇温および降温を繰返したり、極低温の環境下に晒されたりしても、セラミック板にひび割れや欠け等の不具合が発生する可能性が低減され、その結果、密封性に対する信頼性の高い、長寿命な密封端子とすることができる。   According to the present disclosure, the possibility of occurrence of defects such as cracks and chippings in the ceramic plate is reduced even when the temperature is raised and lowered repeatedly or exposed to an extremely low temperature environment. It is possible to provide a highly reliable and long-life sealed terminal.

(a)は第1実施形態の密封端子の概略構成を示す部分断面図、(b)はロウ付けされた接合部(P部)の拡大断面図、(c)はシミュレーション解析により得られた、接合部(Q部)におけるセラミック板の応力ベクトルの分布を示す図である。(A) is a partial cross-sectional view showing a schematic configuration of the sealed terminal of the first embodiment, (b) is an enlarged cross-sectional view of a brazed joint (P part), (c) was obtained by simulation analysis, It is a figure which shows distribution of the stress vector of the ceramic board in a junction part (Q part). (a)は第2実施形態の密封端子の部分断面図、(b)は(a)のP部拡大断面図である。(A) is the fragmentary sectional view of the sealing terminal of 2nd Embodiment, (b) is the P section expanded sectional view of (a). (a)は第3実施形態の密封端子の部分断面図、(b)は(a)のP部拡大断面図である。(A) is the fragmentary sectional view of the sealing terminal of 3rd Embodiment, (b) is the P section expanded sectional view of (a).

本開示の各実施形態における密封端子は、図1〜図3における概略構成図(a)に示すように、中央部に貫通孔Hが形成された円板(円環)状の電気絶縁体(セラミック板1)と、導電体として貫通孔Hに挿通される金属製のリード端子(ピン2)と、を主体として構成されている。   As shown in the schematic configuration diagram (a) in FIGS. 1 to 3, the sealed terminal in each embodiment of the present disclosure is a circular (annular) electrical insulator (having a through-hole H formed in the center) ( The main component is a ceramic plate 1) and a metal lead terminal (pin 2) inserted through the through hole H as a conductor.

セラミック板1は、たとえばアルミナ(Al)質セラミックス等から成る絶縁性のものであり、電気装置側の基板や土台等(以下、総称してワークWという)に設けられた、密封端子取り付け用の開口穴に嵌め入れられ、このワークWとの間の電気的絶縁を保ったまま、ピン2を保持する。なお、各図において、図示の上下方向を、貫通孔Hの貫通方向、または、セラミック板1の厚さ(厚み)方向として記載している。 The ceramic plate 1 is an insulating one made of, for example, alumina (Al 2 O 3 ) ceramics, and is a sealed terminal provided on a substrate or base on the electric device side (hereinafter collectively referred to as a workpiece W). The pin 2 is held while being fitted in the opening hole for mounting and maintaining electrical insulation with the workpiece W. In each figure, the illustrated vertical direction is described as the through direction of the through hole H or the thickness (thickness) direction of the ceramic plate 1.

また、図示のセラミック板1は、一方の主面である図示上側の第1面(1x)と、他方の主面である図示下側の第2面(1y)と、を有しており、これら平行な二面間に、先にも述べた、リード端子であるピン2を挿通するための貫通孔H(その内周面1h)が穿設されている。また、図示左右方向の、セラミック板1の外周面と、貫通孔Hの内周面1hには、後記のロウ付け加工を行うためのメタライズ層が設けられている。   The illustrated ceramic plate 1 has a first surface (1x) on the upper side in the drawing, which is one main surface, and a second surface (1y) on the lower side in the drawing, which is the other main surface, The through-hole H (the inner peripheral surface 1h) for inserting the pin 2 as the lead terminal described above is formed between the two parallel surfaces. Further, a metallized layer for performing a brazing process described later is provided on the outer peripheral surface of the ceramic plate 1 and the inner peripheral surface 1h of the through hole H in the horizontal direction in the figure.

なお、図1〜図3の(a)では、説明の便宜のために、各メタライズ層を、厚みを持った層として描いているが、実際は、他の部材や層に比べて非常に薄いものである。また、後記のロウ付け加工を行った後は、メタライズ層は、「ろう」の層と一体となって埋もれてしまうものであるので、各図(b)の拡大図では、隠れ線(点線)もしくは、厚みのない単なる太線(実線)として描いている。そして、メタライズ層は、上記「ろう」の層と一体となるものであるため、後記の応力シミュレーションにおいて、このメタライズ層は「ろう」の厚みの一部となすものとしてその中に組み込まれており、層単体として解析には関与していない。   In FIG. 1 to FIG. 3A, for convenience of explanation, each metallized layer is depicted as a layer having a thickness, but in actuality, it is much thinner than other members and layers. It is. In addition, after performing the brazing process described later, the metallized layer is buried together with the “wax” layer, so in the enlarged view of each figure (b), a hidden line (dotted line) or It is drawn as a simple thick line (solid line) with no thickness. And since the metallized layer is integrated with the above-mentioned “wax” layer, in the stress simulation described later, this metallized layer is incorporated as a part of the thickness of the “wax”. It is not involved in the analysis as a single layer.

ピン2は、銅(Cu)や銀(Ag)、または黄銅,真ちゅう,リン青銅等の銅合金等の低融点で低電気抵抗の金属で構成されており、円柱状や角柱状に成形されている。なお、ピン2は、セラミック板1の貫通孔が複数である場合、その数に応じて複数本、配設される。また、ピン2は、端子となる棒材を切断加工することによって、または、端子となる棒材に旋盤を用いた切削加工や金型を用いたプレス加工等の従来周知の金属加工を施すことによって、所定の太さおよび長さに成形される。   The pin 2 is made of a metal having a low melting point and a low electric resistance, such as copper (Cu), silver (Ag), or a copper alloy such as brass, brass, phosphor bronze, etc., and is formed into a cylindrical or prismatic shape. Yes. In addition, when there are a plurality of through holes in the ceramic plate 1, a plurality of pins 2 are arranged according to the number of the pins 2. In addition, the pin 2 is subjected to conventionally known metal processing such as cutting processing using a lathe or press processing using a die, by cutting a bar material serving as a terminal, or a bar material serving as a terminal. Is formed into a predetermined thickness and length.

なお、ピン2は、その外周面の、セラミック板1(貫通孔H内面のメタライズ層)がロウ付け加工される部位(表面)およびその周囲に、ニッケル(Ni)や金(Au),白金(Pt)等からなる保護金属層を被着した構成としてもよい。この保護金属層によって、ピン2が、接合用のろう材から隔離されるので、ピン2がろう材と化学反応するのを有効に防止することができ、好適である。なお、この保護金属層も、前述のメタライズ層と同様、後記の応力シミュレーションにおいては、「ろう」の層の厚みの一部となすものとしてその中に組み込まれており、層単体として解析には関与しない。   The pin 2 has nickel (Ni), gold (Au), platinum (on the periphery (surface) of the outer peripheral surface of the ceramic plate 1 (metallized layer on the inner surface of the through hole H) and its periphery. A protective metal layer made of Pt) or the like may be applied. This protective metal layer isolates the pin 2 from the joining brazing material, and therefore can effectively prevent the pin 2 from chemically reacting with the brazing material. This protective metal layer is also incorporated in the stress simulation described later as a part of the thickness of the “wax” layer in the stress simulation described later. Not involved.

これら、ピン2とセラミック板1とを接合するのに使用される、ろう材3としては、銀ろう(Ag)や金−銅ろう(Au−Cu)等が用いられる。   As the brazing material 3 used to join the pins 2 and the ceramic plate 1, silver brazing (Ag), gold-copper brazing (Au—Cu), or the like is used.

以上の材料および構成を用いた第1実施形態(図1)について説明する。
図1(a)は、第1実施形態の密封端子の概略構成を示す部分断面図であり、図1(b)は、ロウ付け加工された接合部の拡大断面図である。また、図1(c)は、シミュレーション解析により得られた、接合部におけるセラミック板の応力ベクトルの分布を示す図である。
A first embodiment (FIG. 1) using the above materials and configuration will be described.
FIG. 1A is a partial cross-sectional view showing a schematic configuration of the sealed terminal according to the first embodiment, and FIG. 1B is an enlarged cross-sectional view of a joint portion subjected to brazing. Moreover, FIG.1 (c) is a figure which shows distribution of the stress vector of the ceramic board in a junction part obtained by simulation analysis.

図1(a)に示すように、第1実施形態の密封端子のセラミック板1Aは、それぞれ主面と呼ばれる、互いに平行な第1面1xと第2面1yとからなる貫通孔形成部を有しており、その略中央部に、ピン2挿通用の貫通孔Hが形成されている。   As shown in FIG. 1 (a), the ceramic plate 1A of the sealed terminal according to the first embodiment has through-hole forming portions each having a first surface 1x and a second surface 1y that are parallel to each other, which are called main surfaces. In addition, a through hole H for inserting the pin 2 is formed at a substantially central portion thereof.

また、挿通されるピン2は、Fe−Ni−Co合金またはCuからなる柱状(この例では円柱状)で、その外周面2xが、前記貫通孔Hの内周面(内壁)1hに平行な対向面となっている。   The inserted pin 2 has a columnar shape (in this example, a columnar shape) made of Fe—Ni—Co alloy or Cu, and its outer peripheral surface 2x is parallel to the inner peripheral surface (inner wall) 1h of the through hole H. It is the opposite surface.

そして、図1(b)に示すように、ピン2と貫通孔Hの内周面1hの間が、ろう材3を用いてロウ付け加工され、ピン2の外周面2xと貫通孔Hの内周面1hとの間が、気密または液密に閉鎖して密封されている。   Then, as shown in FIG. 1B, the space between the pin 2 and the inner peripheral surface 1h of the through hole H is brazed using a brazing material 3, and the inner surface of the outer peripheral surface 2x of the pin 2 and the through hole H The space between the peripheral surface 1h is hermetically or liquid-tightly closed and sealed.

なお、ロウ付け加工は、ワークWおよびセラミック板1,ピン2を、加熱炉内等、ろう材3が溶融する高温(たとえば780℃)環境下で、各部材を組み合わせた状態で余熱した後、溶融させたろう材3を、これらピン2の外周面2xと貫通孔Hの内周面1hとのすき間に、毛細管現象により滲み込ませることによって行われる。そして、その状態で、密封端子全体が室温(たとえば25℃)まで冷えるまで放冷して、密封端子が完成する。   In the brazing process, after the workpiece W and the ceramic plate 1 and the pin 2 are preheated in a state where the members are combined in a high-temperature environment (for example, 780 ° C.) where the brazing material 3 is melted, such as in a heating furnace, The melted brazing material 3 is carried out by soaking in the gap between the outer peripheral surface 2x of the pin 2 and the inner peripheral surface 1h of the through hole H by capillary action. And in that state, it cools until the whole sealing terminal cools to room temperature (for example, 25 degreeC), and a sealing terminal is completed.

本実施形態の密封端子の構成上の特徴は、セラミック板1Aの第1面1xと第2面1yとの間の厚さ方向に直交する方向(すなわち、第1面1xまたは第2面1yに沿った平面方向)に、前記貫通孔Hの内周面1hを含む第1部位(後記)と、該第1部位に隣接する第2部位(後記)とを有し、第1部位におけるセラミック板1Aの貫通孔Hの貫通方向の厚さは、第2部位におけるセラミック板1Aの貫通孔Hの貫通方向の厚さより厚く形成されている点である。   The structural feature of the sealed terminal of the present embodiment is that the direction perpendicular to the thickness direction between the first surface 1x and the second surface 1y of the ceramic plate 1A (that is, the first surface 1x or the second surface 1y). A ceramic plate in the first portion having a first portion (described later) including the inner peripheral surface 1h of the through-hole H and a second portion (described later) adjacent to the first portion in the planar direction). The thickness in the through direction of the through hole H of 1A is that it is formed thicker than the thickness in the through direction of the through hole H of the ceramic plate 1A in the second part.

すなわち、具体的には、第1実施形態のセラミック板1Aを、図1(b)のように、貫通孔Hの貫通方向(図示上下方向)に沿った断面で視た場合、貫通孔Hの内周面1hを含む貫通孔Hに近接する領域(以下、第1部位R1)の、第1面1xおよび第2面1yの少なくとも一方の面(この例では両面)が、貫通孔Hに接近するに従って他方の面との間の距離が漸次大きくなる傾斜面に形成されている。その結果、セラミック板1Aの第1部位R1の厚さd1は、この第1部位R1に隣接する、第1面1xと第2面1yとが平行する他の部位(以下、第2部位R2)のセラミック板1Aの厚さd2より、厚くなっている(d1>d2)。   Specifically, when the ceramic plate 1A of the first embodiment is viewed in a cross section along the penetration direction (the vertical direction in the drawing) of the through hole H as shown in FIG. At least one surface (both surfaces in this example) of the first surface 1x and the second surface 1y of the region close to the through hole H including the inner peripheral surface 1h (hereinafter, first portion R1) approaches the through hole H. As a result, the distance between the other surface gradually increases and is formed on an inclined surface. As a result, the thickness d1 of the first portion R1 of the ceramic plate 1A is equal to another portion (hereinafter, second portion R2) adjacent to the first portion R1 where the first surface 1x and the second surface 1y are parallel to each other. It is thicker than the thickness d2 of the ceramic plate 1A (d1> d2).

ここで、図1(c)に、シミュレーション解析に基づく、接合部におけるセラミック板1Aの応力ベクトルの分布を示す。シミュレーションは、上記構成において、セラミック板1Aとピン2との間を、高温(780℃)環境下でロウ付け加工した後、室温(25℃)まで放冷した場合の、金属とセラミックの線膨張係数の差によって、セラミック板1A側に発生する応力を、ソフトウェアを用いて解析したものである。   Here, FIG. 1C shows the distribution of the stress vector of the ceramic plate 1A at the joint based on the simulation analysis. The simulation shows the linear expansion of the metal and the ceramic when the ceramic plate 1A and the pin 2 are brazed in a high temperature (780 ° C.) environment and then allowed to cool to room temperature (25 ° C.) in the above configuration. The stress generated on the ceramic plate 1A side due to the difference in coefficients is analyzed using software.

図1(c)のベクトル分布図からもわかるように、セラミック板1Aにおける厚さ方向の端部(図示上側)の応力ベクトルは、前述の第1面1xの傾斜部分(第1部位R1の表面)に沿って発生するため、仮にこのセラミック板1Aの端部や表面にひび割れ等の亀裂が生じた場合でも、この亀裂等が、セラミック板1Aの内部に向かって進展することがない。   As can be seen from the vector distribution diagram of FIG. 1C, the stress vector at the end (upper side in the figure) in the thickness direction of the ceramic plate 1A is the inclined portion of the first surface 1x (the surface of the first portion R1). Therefore, even if a crack such as a crack is generated at the end or surface of the ceramic plate 1A, the crack or the like does not progress toward the inside of the ceramic plate 1A.

したがって、上記構成によれば、第1実施形態のセラミック板1Aおよびこれを用いた密封端子は、極低温まで冷却される等、大きな温度差を受けても、電気絶縁体と金属部品との間にひび割れや欠け等の破損が生じ難く、また、生じたとしても、その進行が抑制される。すなわち、本実施形態の密封端子は、信頼性の高い、長寿命の密封端子とすることができる。   Therefore, according to the above configuration, the ceramic plate 1A of the first embodiment and the sealing terminal using the ceramic plate 1B are cooled between the electrical insulator and the metal component even when subjected to a large temperature difference such as being cooled to a very low temperature. Breakage such as cracks and chips is unlikely to occur, and even if it occurs, its progress is suppressed. That is, the sealed terminal of the present embodiment can be a highly reliable and long-life sealed terminal.

なお、実施形態におけるセラミック板の、貫通孔Hの内周面1hを含む貫通孔に近接する領域(第1部位R1)の厚さを、これに隣接する領域(第2部位R2)の厚さより厚く構成する方法は、他の形状によっても実現できる。たとえば、図2に示すような、湾曲した傾斜面を有するセラミック板1Bとしてもよく、図3に示すような、段部を有するセラミック板1Cとしてもよい。また、前記段部の角部は、仮想線(二点鎖線)で示すように、面取り(C面)状や角丸め(R面)を有する形状としてもよい。以上の構成によっても、第1実施形態と同様の作用・効果を奏することができる。   In addition, the thickness of the area | region (1st site | part R1) adjacent to the through-hole including the internal peripheral surface 1h of the through-hole H of the ceramic board in embodiment is based on the thickness of the area | region (2nd site | part R2) adjacent to this. The thick construction method can be realized by other shapes. For example, a ceramic plate 1B having a curved inclined surface as shown in FIG. 2 or a ceramic plate 1C having a stepped portion as shown in FIG. 3 may be used. Moreover, the corner | angular part of the said step part is good also as a shape which has a chamfering (C surface) shape or a rounded corner (R surface), as shown by a virtual line (two-dot chain line). Also with the above configuration, the same operations and effects as in the first embodiment can be achieved.

また、いずれの形状においても、貫通孔Hに近接する第1部位R1の厚さd1と、これに隣接する第2部位R2の厚さd2との差は、0.01mm以上とすることが好ましい。さらに、貫通孔Hに近接する第1部位R1の、セラミック板の厚さd1方向に直交する方向の幅は、0.01mm以上10mm以下とすることが望ましい。   In any shape, the difference between the thickness d1 of the first part R1 adjacent to the through hole H and the thickness d2 of the second part R2 adjacent thereto is preferably 0.01 mm or more. . Furthermore, it is desirable that the width of the first portion R1 adjacent to the through hole H in the direction orthogonal to the thickness d1 direction of the ceramic plate is 0.01 mm or more and 10 mm or less.

なお、本発明は上述の実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内において、種々の変更、改良等が可能である。   It should be noted that the present invention is not limited to the above-described embodiment, and various changes and improvements can be made without departing from the scope of the present invention.

また、前述の、接合部においてセラミック板に発生する応力のシミュレーション解析は、エムエスシーソフトウェア社のMarc(登録商標)を用いて行ったものである。セラミック板(A−479SS)とピン(たとえばCu製)との間のすき間を、ろう材(BAg−8)でロウ付けする場合の、セラミック板に生じる応力(ストレス)を、前記ソフトを用いてシミュレートした。なお、図1(c)〔(b)図のQ部〕に示す結果(応力ベクトル分布図)は、ロウ付け加工を780℃(応力フリー)で行い、それを常温大気圧下で放冷して、温度を室温(25℃)まで低下させ、25℃の時点で、ピンとの線膨張係数の差により、セラミック板の接合部(表層)に、どの程度の応力ベクトルが生じているかを、視覚的に表示したものである。   The above-described simulation analysis of the stress generated in the ceramic plate at the joint is performed using Marc (registered trademark) manufactured by MSC Software. The stress generated in the ceramic plate when the gap between the ceramic plate (A-479SS) and the pin (made of Cu, for example) is brazed with a brazing material (BAg-8) is used with the above software. Simulated. In addition, the result (stress vector distribution diagram) shown in FIG. 1C (part Q of FIG. 1B) shows that the brazing process is performed at 780 ° C. (stress free), and it is allowed to cool at room temperature and atmospheric pressure. The temperature is lowered to room temperature (25 ° C.), and at 25 ° C., it is visually determined how much stress vector is generated in the joint (surface layer) of the ceramic plate due to the difference in linear expansion coefficient with the pin. Display.

本発明の密封端子は、半導体製造装置等、内部雰囲気と外部雰囲気とを遮断して使用する電気装置に好適に使用することができる。また、液化天然ガス(LNG)、液体ヘリウム、液体窒素、液体酸素、液体ネオン、液体アルゴンなどの低温液体が存在する環境下でも用いることができる。さらに、液化天然ガス(LNG)や液体水素等の極低温液体を車両等に充填する、LNGステーションもしくは水素ガス・ステーション等で用いられる機器等においても、これら極低温液体と接触する部位に使用することが可能である。   The hermetic terminal of the present invention can be suitably used for an electric device such as a semiconductor manufacturing apparatus that is used by blocking an internal atmosphere and an external atmosphere. It can also be used in an environment where a low-temperature liquid such as liquefied natural gas (LNG), liquid helium, liquid nitrogen, liquid oxygen, liquid neon, or liquid argon exists. Furthermore, it is also used in parts that come into contact with these cryogenic liquids in equipment such as LNG stations or hydrogen gas stations that fill vehicles with cryogenic liquids such as liquefied natural gas (LNG) or liquid hydrogen. It is possible.

1 セラミック板
1A,1B,1C セラミック板
1h 内周面
1x 第1面
1y 第2面
2 ピン
2x 外周面
3 ろう材
H 貫通孔
W ワーク
R1 第1部位
R2 第2部位
DESCRIPTION OF SYMBOLS 1 Ceramic plate 1A, 1B, 1C Ceramic plate 1h Inner peripheral surface 1x 1st surface 1y 2nd surface 2 Pin 2x Outer peripheral surface 3 Brazing material H Through-hole W Workpiece | work R1 1st site | part R2 2nd site | part

Claims (5)

第1面と第2面とを含み、これら第1面と第2面との間を貫通する貫通孔を有するセラミック板と、
前記貫通孔に挿通される金属製のピンと、
前記ピンと前記貫通孔との間のすき間を封止するろう材と、を備え、
前記セラミック板は、前記第1面と前記第2面との間の厚さ方向に直交する方向に、
前記貫通孔の内周面を含み、セラミック板の厚さ方向に延びる第1部位と、
該第1部位に隣接する第2部位と、を有し、
前記貫通孔の貫通方向に沿った断面視において、
前記第1部位におけるセラミック板の厚さは、前記第2部位におけるセラミック板の厚さより厚い、密封端子。
A ceramic plate including a first surface and a second surface, and having a through-hole penetrating between the first surface and the second surface;
A metal pin inserted through the through hole;
A brazing material that seals a gap between the pin and the through-hole,
The ceramic plate is in a direction perpendicular to the thickness direction between the first surface and the second surface,
A first portion including an inner peripheral surface of the through hole and extending in a thickness direction of the ceramic plate;
A second part adjacent to the first part,
In a cross-sectional view along the penetration direction of the through hole,
The thickness of the ceramic board in the said 1st site | part is a sealing terminal thicker than the thickness of the ceramic board in the said 2nd site | part.
前記貫通孔の貫通方向に沿った断面視において、
前記第1部位に対応する領域の、前記第1面および前記第2面の少なくとも一方の面は、前記貫通孔に接近するに従って他方の面との間の距離が大きくなる傾斜面である、請求項1に記載の密封端子。
In a cross-sectional view along the penetration direction of the through hole,
At least one of the first surface and the second surface of the region corresponding to the first part is an inclined surface that increases in distance from the other surface as it approaches the through hole. Item 2. The sealed terminal according to Item 1.
前記貫通孔の貫通方向に沿った断面視において、
前記第1部位と前記第2部位との間の境界領域に位置する、前記第1面および前記第2面の少なくとも一方の面側に、前記第1部位の厚さを前記第2部位の厚さより厚くする段部が、配設されている、請求項1に記載の密封端子。
In a cross-sectional view along the penetration direction of the through hole,
The thickness of the first part is set to the thickness of the second part on at least one surface side of the first surface and the second surface, which is located in a boundary region between the first part and the second part. The sealed terminal according to claim 1, wherein a step portion thicker than the thickness is disposed.
前記第1部位の厚さと前記第2部位の厚さとの差が、0.01mm以上である、請求項1〜3のいずれか1つに記載の密封端子。   The sealed terminal according to claim 1, wherein a difference between the thickness of the first part and the thickness of the second part is 0.01 mm or more. 前記第1部位の、前記セラミック板の厚さ方向に直交する方向の幅が、0.01mm以上10mm以下である、請求項1〜4のいずれか1つに記載の密封端子。   The sealed terminal according to any one of claims 1 to 4, wherein a width of the first portion in a direction orthogonal to the thickness direction of the ceramic plate is 0.01 mm or more and 10 mm or less.
JP2018033720A 2018-02-27 2018-02-27 Sealed terminal Pending JP2019149303A (en)

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