JP2019075425A - Position detection apparatus, imprint apparatus, and article manufacturing method - Google Patents

Abstract

To provide an advantageous position detection device in terms of the detection accuracy of the relative position between a mold and a substrate.SOLUTION: A position detection apparatus having an imaging element having an imaging surface on which moire fringes generated by diffracted light diffracted by a plurality of diffraction gratings having different periods are formed includes a division unit that includes am imaging optical system that forms diffracted light on an imaging surface and performs division of first diffracted light that generates a first moire fringe having a period in a first direction and second diffracted light that generates a second moire fringe having a period in a second direction intersecting the first direction in a pupil plane of the imaging optical system.SELECTED DRAWING: Figure 3

Description

The present invention relates to a position detection device, an imprint apparatus, and an article manufacturing method.

  As apparatuses for manufacturing semiconductor devices, liquid crystal display elements and the like, there are lithography apparatuses such as an exposure apparatus and an imprint apparatus. In order to form a fine pattern on a substrate by a lithography apparatus, the accuracy of alignment between a mold (pattern) having a pattern or a mask and a substrate on which the pattern is formed is important.

  For example, in the case of an imprint apparatus, a die-by-die that detects a mold side mark formed on a mold and a substrate side mark formed on a substrate for each shot area on which a pattern is formed Alignment alignment is used.

  The position detection device of Patent Document 1 using this method is a relative position between the mold and the substrate based on measurement results of moire fringes generated by overlapping of diffracted light from diffraction gratings provided on the mold and the substrate and having different periods. To detect In this position detection device, each diffraction grating is illuminated by an illumination optical system having a plurality of poles to increase the amount of diffracted light from each diffraction grating.

JP, 2013-030757, A

  The position detection device of Patent Document 1 can illuminate unnecessary light on a diffraction grating used to measure the relative position in a certain direction. By irradiating unnecessary light, the measurement accuracy of moire fringes may be reduced, and the position detection accuracy may be reduced.

  An object of the present invention is, for example, to provide a position detection device that is advantageous in terms of detection accuracy of the relative position between the mold and the substrate.

  In order to solve the above problems, the present invention is a position detection device having an imaging element provided with an imaging surface on which moire fringes generated by diffracted light diffracted by a plurality of diffraction gratings having different periods are formed. A first diffraction light that has an imaging optical system that forms diffracted light on an imaging surface, and generates a first moiré fringe having a period in a first direction on a pupil plane of the imaging optical system; And a second diffracted light generating a second moiré fringe having a period in a second direction intersecting with the second light source.

  According to the present invention, for example, it is possible to provide a position detection device that is advantageous in terms of the detection accuracy of the relative position between the mold and the substrate.

It is the schematic which shows the structure of the imprint apparatus provided with the position detection apparatus which concerns on 1st Embodiment. It is a figure which shows the example of the mark provided in a type | mold and a board | substrate. It is the schematic which shows the structure of the position detection apparatus which concerns on 1st Embodiment. It is a figure which shows the pupil plane of the 1st optical system which concerns on 1st Embodiment. (A) and (B) of FIG. 5 is a figure which shows the effect with respect to the detection precision of the relative position by dividing | segmenting diffracted light for every measurement direction. It is the schematic which shows the structure of the position detection apparatus which concerns on 2nd Embodiment. It is a figure which shows the pupil plane of the 1st optical system which concerns on 2nd Embodiment. It is the schematic which shows the structure of the position detection apparatus which concerns on 3rd Embodiment. It is a figure for demonstrating the manufacturing method of articles | goods.

Hereinafter, embodiments of the present invention will be described with reference to the drawings and the like.
First Embodiment

<Imprint Device>
FIG. 1 is a schematic view showing a configuration of an imprint apparatus 1 provided with a position detection apparatus 100 according to the present embodiment. The position detection apparatus 100 is also applicable to another lithography apparatus such as an exposure apparatus. Here, as an imprint apparatus using a photo-curing method, an ultraviolet-curable imprint apparatus is used which cures the uncured imprint material on the substrate W by irradiation with ultraviolet light UV. However, as a method of curing the imprint material, a method by irradiation of light in another wavelength range or a method by other energy (for example, heat) may be used. Also, in the following figures, the Z axis is parallel to the optical axis of the ultraviolet light irradiated to the imprint material on the substrate W, and the X axis and the Y axis orthogonal to each other are in a plane perpendicular to the Z axis. taking it.

  The imprint apparatus 1 includes a mold holding unit 10 that holds a mold M and a substrate holding unit 20 that holds a substrate W. The imprint apparatus 1 forms a pattern of an imprint material on a substrate W using a mold M. For example, the mold M has a rectangular outer peripheral portion, and a predetermined concavo-convex pattern P is three-dimensionally formed on a surface facing the substrate W, and is made of a material (such as quartz) that transmits ultraviolet light. The substrate W is a substrate to which the concavo-convex pattern is transferred, and includes, for example, a single crystal silicon substrate or an SOI (Silicon on Insulator) substrate.

  The pattern of the imprint material includes the supply of the imprint material to the substrate W, the contact of the mold M with the imprint material, and the filling of the imprint material into the pattern P of the mold M, alignment, curing, and peeling of the mold M. It is formed by a series of cycles including.

The position detection device 100 is disposed, for example, in the mold holding unit 10. The position detection apparatus 100 shifts the relative position between the mold M and the substrate W in the X direction and the Y direction by optically observing the mark M ₁ formed on the mold M and the mark M ₂ formed on the substrate W. Determine the quantity. Alignment between the mold M and the substrate W is performed based on the calculated amount of deviation. In addition, as a light source of the light which the position detection apparatus 100 uses, a halogen lamp, LED, and LD can be used. Further, it is desirable that the wavelength of light used by the position detection apparatus 100 be different from the wavelength of light for curing the imprint material.

FIG. 2 is a view showing an example of a mark provided on a mold and a substrate. In the present embodiment, the first diffraction grating D ₁ provided on one of the mold M and the substrate W, and the other to provide the second diffraction grating D _2. The first diffraction grating _{D 1} has a period _{T 1} in the X direction. The second diffraction grating _{D 2} has a first period _{T 1} and period different _{T 1} 'in the X direction, and a third period _{T 3} in the Y direction. The position detection device 100 detects the relative positional deviation amount in the X direction by the first moiré fringe F ₁ having a period in the X direction generated by the diffracted light diffracted by the first diffraction grating D ₁ and the second diffraction grating D _2. Ask.

Similarly, the third diffraction grating D ₃ provided in one type of M and the substrate W, and the other to provide a fourth diffraction grating D _4. The third diffraction grating _{D 3} has a second period _{T 2} in the Y direction. The fourth diffraction grating _{D 4} has a second period _{T 2} and the different periods _{T 2} 'in the Y-direction, and has a fourth period _{T 4} in the X direction. The position detection apparatus 100 detects the relative positional deviation amount in the Y direction by the second moiré fringes F ₂ having a period in the Y direction generated by the diffracted light diffracted by the third diffraction grating D ₃ and the fourth diffraction grating D _4. Ask.

If the X direction and the Y direction cross each other even if they are not orthogonal to each other, the position detection apparatus 100 according to this embodiment can obtain the relative positional deviation amount in two directions. In consideration of the detection accuracy of the relative positional deviation amount, the third period T ₃ of the second diffraction grating D ₂ Y direction is different from the second period T ₂ of the third diffraction grating D ₃ Y direction, fourth fourth period _{T 4} in the X direction of the diffraction grating _{D 4} is preferably different from the first period _{T 1} of the first diffraction grating _{D 1} of the X direction.

The position detection apparatus 100 of this embodiment has a mark provided on any one of the mold M and the substrate W as a checkerboard diffraction grating (second diffraction grating D ₂ , fourth diffraction grating D ₄ ) as a zero-order reflected light. Moire fringes are detected in the configuration of the dark field that does not detect. Thereby, the fall of the contrast of the moire fringe by zero-order reflected light can be suppressed.

<Position detection device>
FIG. 3 is a schematic view showing the configuration of the position detection device 100 according to the present embodiment. The position detection apparatus 100 includes a first optical system (illumination optical system) 110, a second optical system (imaging optical system) 120, a first imaging element 130, and a second imaging element 140. As the first imaging device 130 and the second imaging device 140, a CCD or a CMOS may be used. Mark _{M 1} included in the mold M includes a first diffraction grating _{D 1} and the third diffraction grating _{D 3.} Mark _{M 2} where the substrate W is provided includes a second diffraction grating _{D 2} and the fourth diffraction grating _{D 4.}

The first optical system 110 transmits light illuminating the plurality of diffraction gratings and reflects diffracted light diffracted by the plurality of diffraction gratings. The first optical system 110 may transmit diffracted light and reflect illumination light. The second optical system 120 guides the diffracted light reflected by the first optical system 110 to the imaging surface 131 of the imaging element 130. The first image sensor 130 includes a first imaging plane 131 which the first Moire fringe _{F 1} is imaged. The second image sensor 140 includes a second imaging plane 141 second moire fringes _{F 2} is imaged.

FIG. 4 is a view showing a pupil plane S1 of the first optical system 110. As shown in FIG. The first optical system 110 is reflected first reflecting section for reflecting the first diffracted beam to produce a first Moire fringes F ₁ (first detection pupil) NA ₁ and the second diffracted beam to produce a second moire fringes the second reflection portion which includes a (second detection pupil) NA _2.

First reflecting portion NA _1, in the pupil plane S1, is disposed on the Y-axis passing through the center O of the pupil plane S1, the second reflecting portion NA ₂ is disposed on the X-axis passing through the center O of the pupil plane S1 Is desirable from the viewpoint of efficient acquisition of signals. Measurement is possible even at a shifted position due to the balance with the arrangement.

The first optical system 110, the pupil plane S1, the illumination pupil with the light intensity distribution on the illumination pupil IL ₁ and the second reflecting portion NA ₂ having a light intensity distribution of the light illuminating the diffraction grating on the first reflecting portion NA ₁ It has IL ₂ . The illumination pupil IL _1, the first moire fringes F ₁ due to diffraction light generated by illuminating the first diffraction grating D ₁ and second diffraction grating D _2, X direction relative positional deviation is detected. The illumination pupil IL _2, the third diffraction grating D ₃ and the fourth diffraction grating D ₄ second moire fringes F ₂ due to diffraction light generated by illuminating a, Y direction relative positional deviation is detected.

Angle of incidence and period of the second diffraction grating D ₂ Y direction of the light incident from the illumination pupil IL ₁ in the first diffraction grating D _1, by illuminating the first diffraction grating D ₁ and second diffraction grating D ₂ resulting diffracted light is adjusted to return to the first reflecting portion NA _1. Similarly, Y-direction period of the incident angle and the fourth diffraction grating D ₄ of the light incident from the illumination pupil IL ₂ in the third diffraction grating D _3, lighting third diffraction grating D ₃ and the fourth diffraction grating D ₄ diffracted light generated by is adjusted back to the second reflection portion NA _2.

The angle of incidence of the period and the illumination pupil of the diffraction grating In the manner described above, different second diffracted beam to produce a first diffracted light and second Moire fringes F ₂ generating a first Moire fringes F ₁ respectively It can be led to the detection pupil.

The wavelength of the illumination light, since it is the light which is irradiated on the diffraction grating from the illumination pupil is returned to the reflective portion by the diffraction position shifts, the first reflecting portion NA ₁ and the second reflection to accommodate the diffracted light Write parts NA ₂ is is made larger than towards the illumination pupil IL ₁ and the illumination pupil IL _2. In the case of using only a monochromatic wavelength or a narrow band wavelength as illumination light, the illumination pupil and the reflection portion (detection pupil) may have the same size because they return to the same position. In addition, if the illumination pupil is larger than the detection pupil, the efficiency (the ratio of the signal of the mark to the incident light) decreases because more light is not used, but this is possible.

  The first optical system 110 includes a half mirror 111. An aperture is configured at the position of the half mirror 111. The position at which the diaphragm is configured is not limited to the reflection surface of the half mirror 111. Also, instead of the half mirror 111, a polarization beam splitter may be used. In this case, since it is necessary to change the polarization of the illumination light and the diffracted light by 90 degrees, it is necessary to form a 1⁄4λ plate between the polarization beam splitter and the mold M and the substrate W. In this configuration, the illumination light transmitted through the polarization beam splitter is light having only one polarization. By passing through the 1⁄4 λ plate, it becomes circularly polarized light and illuminates the test object. The light returned from the object to be detected is transmitted through the 1⁄4 λ plate, so that the illumination light is polarized 90 degrees. This light is reflected by the polarization beam splitter and guided to the second optical system. When a half mirror is used, the light is 1⁄2 in illumination light and 1⁄2 in detection light, but the light amount is advantageous because it is only 1⁄2 in illumination light when it is a polarization beam splitter.

The second optical system 120, reflective portion 121 for reflecting either one of the second diffracted beam to generate a first diffracted light and second Moire fringes F ₂ generating a first Moire fringes F ₁ and any other And a transparent portion 122 that transmits light. The reflective portion 121 and the transmissive portion 122 are disposed at positions optically conjugate with the first reflective portion NA ₁ and the second reflective portion NA _{2 of} the first optical system 110.

  The second optical system 120 includes a first separation unit (first division unit) 124 including a plurality of lenses 123, a reflection unit 121, and a transmission unit 122, and a plurality of lenses 125. The illumination light having passed through the first optical system 110 and the lens 150 is irradiated to each diffraction grating, and the diffracted light passes through the lens 150 and the first optical system 110 and is incident on the second optical system 120. The reflecting unit 121 and the transmitting unit 122 are configured on the Fourier transform surface (pupil surface) of the second optical system 120 in which the surface on which the diffraction grating is formed is an object surface. In the case of the Fourier transform plane, the diffracted lights generated by the respective illumination lights do not overlap with each other, so that they are easily separated. Further, due to the problem of arrangement, when it is arranged at a position deviated from the Fourier transform plane, the diffracted light is blurred and becomes large. However, if diffracted light does not overlap, separation is possible.

The transmission part 122 has a first area NA ₁ ′ conjugate to the first reflection part NA _1, and the reflection part 121 has a second area NA ₂ ′ conjugate to the second reflection part NA ₂ . _', The first diffracted beam is incident to generate a first Moire fringes F _1, the second region NA _2' first area NA 1, the second diffracted light for generating a second moire fringes F ₂ are incident Do. Thereafter, the first diffracted light, the first moire fringes _{F 1} forms an image on the first imaging plane 131 of the first image sensor 130, the second diffraction light, first to the second imaging plane 141 of the second image sensor 140 2 moire fringes _{F 2} to form an image.

  As described above, the position detection apparatus 100 according to the present embodiment can divide diffracted light in each direction in which relative positional deviation is measured. (A) and (B) of FIG. 5 is a figure which shows the effect with respect to the detection precision of the relative position by dividing | segmenting diffracted light for every measurement direction.

(A) of FIG. 5 shows the light intensity distribution of moire fringes obtained when the diffracted light determined by the optical simulation is not divided. The horizontal axis is the measurement direction, and the vertical axis is the light intensity. When the diffracted light is not divided, light unnecessary for measurement may be incident on the diffraction grating. For example, light used for detection in the X direction of the relative displacement is a light from the illumination pupil IL ₁ disposed axis orthogonal to the X direction. Light from the illumination pupil IL ₂ may cause scattering and the first end portion of the diffraction grating D ₁ and second diffraction grating D _2.

  In (A) of FIG. 5, the peak value of the encircled part shows the influence of scattering at the end. It is believed that this occurs as the continuous grid condition breaks off at the end. By mixing the peak value with the moiré signal used for measurement, it causes an error in the measurement value.

On the other hand, (B) of FIG. 5 shows the light intensity distribution of moire fringes obtained when dividing the diffracted light obtained by the optical simulation. As shown to (B) of FIG. 5, it turns out that the circled peak value which shows the light from an edge part is low compared with (A) of FIG. In addition, it can be seen that the subpeaks seen in the portion close to the moiré signal are also reduced. Therefore, the position detection apparatus 100 according to the present embodiment reduces noise to the moiré signal and improves the S / N ratio, thereby reducing the error and improving the detection accuracy of the relative position as compared to the conventional case.
Second Embodiment

  In the present embodiment, the number of illumination pupils is one. FIG. 6 is a schematic view showing the configuration of the position detection device 200 according to the present embodiment. The same components as those of the first embodiment are denoted by the same reference numerals, and the description thereof is omitted. The position detection device 200 has a first optical system 210 and a second optical system 220.

FIG. 7 is a view showing a pupil plane S2 of the first optical system 210. As shown in FIG. The first optical system 210 includes a first reflecting portion reflecting the first diffracted beam to produce a first Moire fringes F ₁ NA ₁ and NA _3, second reflector for reflecting the second diffracted beam to produce a second moire fringes Parts NA ₂ and NA ₄ are provided.

With respect to the center of the pupil plane S2, the first reflecting portion NA ₃ is disposed at a position of the first reflecting portion NA ₁ symmetrical, fourth reflection portion NA ₄ is of the second reflecting portion NA ₂ and symmetrical position Be placed. Compared to the first embodiment, since the detection pupils corresponding to each measurement direction are increased, more diffracted light can be taken. In addition, one illumination pupil IL is disposed at the center of the pupil plane S2, and the configuration can be simplified as compared with the first embodiment.

The second optical system 220 is reflected portion 221 is reflected either one of the second diffracted beam to generate a first diffracted light and second Moire fringes F ₂ generating a first Moire fringes F ₁ and any other And a second separation part (second division part) 224 provided with a transmission part 222 that transmits light. The reflective portion 221 and the transmissive portion 222 are disposed at positions optically conjugate with the first reflective portions NA _{1 to} NA _{4 of} the first optical system 210.

The transmission part 222 has a first area NA ₁ ′ conjugate to the first reflection part NA ₁ and a third area NA ₃ ′ conjugate to the third reflection part NA _3, and the reflection part 121 has a second reflection part NA _{A second} area NA ₂ ′ conjugate to ₂ and a fourth area NA ₄ ′ conjugate to the fourth reflection part NA ₄ are provided. The first area NA ₁ 'and the third region NA _3', the first diffracted beam is incident to generate a first Moire fringes _{F 1,} the second region NA ₂ 'and the fourth region NA _3', the second diffracted light for generating the 2 moire fringes F ₂ are incident.

Thereafter, the first diffracted light is incident on the first imaging plane 131 of the first image sensor 130, the first moire fringe F ₁ is imaged, the second diffracted light, the second imaging plane of the second image sensor 140 It enters the 141, second moire fringes _{F 2} is imaged. The same effect as that of the first embodiment can be obtained by this embodiment as well.
Third Embodiment

  The present embodiment is a case where one imaging device is used in the second embodiment. FIG. 8 is a schematic view showing the configuration of a position detection apparatus 300 according to the present embodiment. The same components as those in the first embodiment or the second embodiment are denoted by the same reference numerals and description thereof is omitted. The position detection device 300 has a second optical system 320 and an imaging device 330.

The second optical system 320, the first optical element 321 having a first reflecting surface _{R 1,} the second optical element 322 having a second reflecting surface _{R 2,} third separation unit (third divided portion) 323 and a plurality The lens 324 of The first optical element 321 and the second optical element 322 are disposed at a position corresponding to an image plane when the surface of the substrate W in the second optical system 320 is an object plane. As a result, moire fringes are imaged on each reflection surface.

  The third separation unit 323 includes a reflection unit 325 and a transmission unit 326. The reflecting unit 325 and the transmitting unit 326 are configured on the Fourier transform surface (pupil surface) of the second optical system 320 in which the surface on which the diffraction grating is formed is an object surface. That is, the reflecting unit 325 and the transmitting unit 326 are optically conjugate to the first optical system 110 and the second separating unit 224.

Transmitting portion 326, the first reflecting portion NA ₁ and the first region NA ₁ 'conjugate with the first region NA _1'' and third reflection portion NA ₃ and the third region NA _3' conjugate with the third region NA ₃ Have a '. Reflecting portion 325, the second reflecting portion NA ₂ and the second region NA ₂ 'conjugate with the second region NA _2'' and fourth reflecting portion NA ₄ and the fourth region NA _4' conjugate with the fourth region NA ₄ Have a '. The first diffracted light that generates the first moiré fringes F ₁ is reflected by the first reflection surface R ₁ , passes through the transmission portion 326, and is incident on the first imaging region 331 of the imaging element 330. The second diffracted light that generates the second moiré fringes F ₂ is reflected by the second reflection surface R ₂ , is reflected by the reflection portion 325, and is incident on the second imaging region 332 of the imaging element 330. In this embodiment, the first moire fringe F ₁ and second moire fringes F ₂ is imaged in one imaging element. The same effects as those of the first embodiment and the second embodiment can be obtained also by the present embodiment.

(Product manufacturing method)
The pattern of the cured product formed using the imprint apparatus is used permanently on at least a part of various articles or temporarily for manufacturing various articles. The article is an electric circuit element, an optical element, a MEMS, a recording element, a sensor, or a mold. Examples of the electric circuit element include volatile or nonvolatile semiconductor memories such as DRAM, SRAM, flash memory and MRAM, and semiconductor elements such as LSI, CCD, image sensor, and FPGA. The mold may, for example, be a mold for imprinting.

  The pattern of the cured product is used as it is as a component member of at least a part of the article or temporarily used as a resist mask. After etching, ion implantation, or the like is performed in the substrate processing step, the resist mask is removed.

  Next, a specific method of manufacturing an article will be described. As shown in FIG. 9 (a), a substrate 1z such as a silicon wafer on which a workpiece 2z such as an insulator is formed is prepared, and subsequently, the surface of the workpiece 2z is exposed by an inkjet method or the like. Apply the printing material 3z. Here, a state in which a plurality of droplet-shaped imprint materials 3z are applied onto a substrate is shown.

  As shown in FIG. 9B, the mold 4z for imprint is faced with the side on which the concavo-convex pattern is formed facing the imprint material 3z on the substrate. As shown in FIG. 9C, the substrate 1z to which the imprint material 3z is applied is brought into contact with the mold 4z, and pressure is applied. The imprint material 3z is filled in the gap between the mold 4z and the workpiece 2z. In this state, when light is transmitted through the mold 4z as energy for curing, the imprint material 3z is cured.

  As shown in FIG. 9D, after the imprint material 3z is cured, when the mold 4z and the substrate 1z are separated, a pattern of a cured product of the imprint material 3z is formed on the substrate 1z. In the pattern of the cured product, the concave portions of the mold correspond to the convex portions of the cured product, and the concave portions of the mold correspond to the convex portions of the cured product, that is, the uneven pattern of the mold 4z is transferred to the imprint material 3z. It will be done.

  As shown in FIG. 9 (e), when etching is performed using the pattern of the cured product as an etching resistant mask, the portion of the surface of the workpiece 2z which has no cured material or remains thin is removed, and the groove 5z is removed. Become. As shown in FIG. 9F, when the pattern of the cured product is removed, an article having grooves 5z formed on the surface of the workpiece 2z can be obtained. Although the pattern of the cured product is removed here, it may be used, for example, as a film for interlayer insulation included in a semiconductor element or the like, that is, as a component of an article without removing it even after processing.

(Other embodiments)
The embodiments of the present invention have been described above, but the present invention is not limited to these embodiments, and various modifications can be made within the scope of the present invention.

100 Position Detection Device 110 First Optical System 120 Second Optical System 130 First Image Sensor 140 Second Image Sensor

Claims (12)

A position detection device having an imaging element provided with an imaging surface on which moire fringes generated by diffracted light diffracted by a plurality of diffraction gratings having mutually different periods are formed, comprising:
An imaging optical system for imaging the diffracted light on the imaging surface;
In the pupil plane of the imaging optical system, first diffracted light causing first moiré fringes having a period in a first direction and second moiré fringes having a period in a second direction intersecting the first direction are produced. And a division unit that divides the second diffracted light to
A position detection device characterized by The dividing unit includes a reflecting unit that reflects either one of the first diffracted light and the second diffracted light, and a transmitting unit that transmits the other.
The position detection device according to claim 1, It further comprises an illumination optical system that illuminates light on the object provided with the plurality of diffraction gratings,
The dividing unit is disposed at a position optically conjugate with a pupil plane of the illumination optical system.
The position detection device according to claim 1 or 2, characterized in that:   The position detection apparatus according to claim 3, wherein the illumination optical system has an illumination pupil having a light intensity distribution of the light to be illuminated on the object at the center of the pupil plane.   The illumination optical system has a light intensity distribution of the light on a first axis passing through the center of the pupil plane along the first direction and on a second axis passing through the center of the pupil plane along the second direction. The position detection apparatus according to claim 3, comprising an illumination pupil.   The illumination optical system has the illumination pupil at mutually symmetrical positions with respect to the center on the first axis, and has the illumination pupil at mutually symmetrical positions with respect to the center on the second axis. The position detection device according to claim 5,   7. The image pickup surface according to claim 1, wherein the image pickup surface has a first image pickup area on which the first moiré fringes are formed, and a second image pickup area on which the second moiré fringes are formed. The position detection device according to item 1.   The imaging device according to claim 1, further comprising: a first imaging device having the imaging surface on which the first moiré fringes are imaged, and a second imaging device having the imaging surface on which the second moiré fringes are imaged. The position detection device according to any one of items 1 to 6.   The position detection device according to any one of claims 1 to 8, wherein the first direction and the second direction are orthogonal to each other. The first moiré fringe has a first diffraction grating having a first period in the first direction, and a second diffraction grating having a period different from the first period in the first direction and having a period in the second direction. Produced by diffracted light diffracted by
The second moiré fringe has a third diffraction grating having a second period in the second direction, and a fourth diffraction grating having a period different from the second period in the second direction and having a period in the first direction. Produced by diffracted light diffracted by
The period in the second direction of the second diffraction grating is different from the second period of the third diffraction grating, and the period in the first direction of the fourth diffraction grating is different from the period of the first diffraction grating. Different from the first period,
The position detection device according to claim 9, characterized in that: An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold,
And the third diffraction grating provided on one of the mold and the substrate, and the first moiré diffracted by the second diffraction grating and the fourth diffraction grating provided on the other. 11. The position detection device according to claim 10, wherein the amount of deviation of the relative position between the mold and the substrate in the first direction and the second direction is determined based on fringes and the second moiré fringes.
An imprint apparatus characterized in that Performing pattern formation on a substrate using the imprint apparatus according to claim 11;
Processing the substrate on which the pattern formation has been performed in the step;
Manufacturing an article from the processed substrate,
An article manufacturing method characterized by

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