JP2019073928A - Fresh water tank system - Google Patents

Abstract

To provide a fresh water tank system capable of washing the inside of the fresh water tank well.SOLUTION: A fresh water tank system 1 comprises a fresh water tank 2 and a washing device 3 that washes the inside of the fresh water tank 2. The washing device 3 comprises a support post 4 erected in the fresh water tank 2 and a nozzle rod 5 supported on the support post 4 slidably in the vertical direction D1, and the nozzle rod 5 is pivotable about a pivot extending in the vertical direction D1. The washing device 3 sprays washing liquid from the swinging nozzle rod 5 toward the inner surface of the fresh water tank 2 to wash the inner surface of the fresh water tank 2.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an upper tank system with an automatic cleaning function.

  In condominiums and buildings, water is stored in upper water tanks (water receiving tanks, elevated water tanks, etc.), and water stored in the upper water tanks is supplied to homes and the like. About upper tank, annual cleaning in the tank, sterilization, water quality inspection are obliged, and in the tank cleaning, the worker enters the upper tank in the tank, cleans with mop or high pressure washer, and chlorinates It is done by However, such manual cleaning work is complicated, and it is not preferable in terms of hygiene that workers enter the upper water tank.

  In patent document 1, the washing | cleaning apparatus in a water tank for wash | cleaning the inside of an upper water tank is proposed. In this cleaning apparatus, the water tank is cleaned by injecting tap water from a horizontally rotating sprinkler.

Unexamined-Japanese-Patent No. 11-61902 gazette

  However, in the cleaning apparatus disclosed in Patent Document 1, since the tap water is only sprayed from the sprinkler installed at the upper position in the water tank, even if the place where the tap water is directly sprayed can be cleaned well, other than that There is a risk that the cleaning will be insufficient for In particular, it can be considered that a water tank having a certain height can not be sufficiently coped with. In addition, condominium residents etc. were forced into inconvenience due to the need to shut off water during cleaning work.

  An object of the present invention is to provide an upper water tank system which can clean the inside of the upper water tank well.

  Another object of the present invention is to provide an upper water tank system capable of washing the upper water tank without water supply.

  The upper water tank system according to the present invention comprises an upper water tank and a washing device for washing the inside of the upper water tank, and the washing device slides in the vertical direction on a column erected in the upper water tank and the column A movably supported nozzle rod, wherein the nozzle rod is pivotable about a pivot extending in the up and down direction, and the cleaning device is directed from the pivoting nozzle rod toward the inner surface of the upper water tank It is characterized in that a cleaning solution is sprayed to clean the inner surface of the upper water tank.

  Further, the upper water tank system of the present invention further includes another upper water tank and another cleaning device for cleaning the inside of the other upper water tank, and the configuration of the other cleaning device is the same as the configuration of the cleaning device. Water is supplied from the other upper water tank while the upper water tank is being cleaned by the cleaning device, and water is supplied from the upper water tank while the other upper water tank is being cleaned by the other cleaning device. Do.

  According to the upper water tank system of the present invention, the inner surface of the upper water tank can be efficiently washed by spraying the cleaning liquid from the swirling nozzle rod toward the inner surface of the upper water tank. In addition, since the nozzle rod can slide in the vertical direction along the support column, even a tall upper water tank can be cleaned well.

BRIEF DESCRIPTION OF THE DRAWINGS The schematic block diagram of the upper water tank system which concerns on 1st Embodiment of this invention. The principal part perspective view of the washing | cleaning apparatus with which the upper water tank system shown in FIG. 1 is provided. III-III sectional view taken on the line of FIG. IV-IV sectional view taken on the line of FIG. V-O-V sectional view taken on the line of FIG. VI-VI sectional view taken on the line of FIG. It is a figure which shows the bottom face of the upper water tank with which the upper water tank system shown in FIG. 1 is equipped, (a) is a top view, (b) is a perspective view. The flowchart which shows the normal water supply process performed with the upper water tank system shown in FIG. The flowchart which shows the automatic washing process performed with the upper water tank system shown in FIG. FIG. 10 is a flowchart showing an upper surface cleaning process performed in S25 of FIG. 9; FIG. FIG. 10 is a flowchart showing a side surface cleaning process performed in S27 of FIG. 9; FIG. FIG. 10 is a flowchart showing the lower surface cleaning process performed in S29 of FIG. 9; FIG. The flowchart which shows the washing | cleaning sewage discharge process performed by S31 of FIG. The schematic block diagram of the upper water tank system which concerns on 2nd Embodiment of this invention. The flowchart which shows the alternate water supply process performed with the upper water tank system shown in FIG. The flowchart which shows the normal water supply process started by S97 of FIG. The flowchart which shows the normal water supply process started by S99 of FIG.

First Embodiment
Hereinafter, an upper water tank system according to a first embodiment of the present invention will be described with reference to the attached drawings.

  As shown in FIG. 1, the upper water tank system 1 according to the present embodiment includes an upper water tank 2, a cleaning device 3 installed in the upper water tank 2, and a cleaning liquid supply device 8 for supplying high pressure cleaning liquid to the cleaning device 3. And. The cleaning device 3 includes a support 4 installed in the upper water tank 2 and a pair of nozzle rods 5 supported by the support 4, and the high-pressure cleaning fluid from the cleaning fluid supply device 8 is supplied to the nozzle rod 5. As shown in FIG. 2, the nozzle rod 5 can slide in the vertical direction D1 with respect to the support column 4, and can also pivot in the horizontal direction indicated by the arrow D2 about a pivot axis extending in the vertical direction D1. The nozzle rod 5 is rotatable in the direction of arrow D3 about a rotation axis extending in the longitudinal direction (horizontal direction) of the nozzle rod 5, and is directed to the inner surface of the upper water tank 2 from the first nozzle 51 or the second nozzle 52 formed in the nozzle rod 5. The upper water tank 2 is configured to be cleaned by injecting the high-pressure cleaning liquid.

  The water supply operation from the upper tank 2 is as follows. Referring to FIG. 1, the upper water tank 2 is supplied with clean water from a pumping pipe P1, and the clean water stored in the upper water tank 2 is supplied to a necessary place via a water supply pipe P2.

  The upper water tank 2 has a cylindrical body 21, a conical ceiling 22 with a high radial center, and a downward conical bottom 23 with a low radial center. The ceiling part 22 is provided with a manhole 23, an electrode rod type water level gauge (not shown) for automatic water supply management, and a ventilation pipe (not shown), and the central part of the bottom part 23 is connected to a drainage pipe P3. A drainage pit is provided.

  Referring to FIGS. 1 to 5, the columns 4 are juxtaposed in the circumferential direction of the pole 41 (FIG. 2) erected on the bottom portion 23 of the upper water tank 2 and the pole 41, and each extends in the vertical direction D1 And four racks 42. A base holder 6 (FIG. 5) is slidably and non-rotatably supported by the column 4 in the vertical direction D1, and a rod base 7 is rotatably supported by the base holder 6 in the direction of arrow D2. The pair of nozzle rods 5 is rotatably supported in the direction of the arrow D3.

  That is, the base holder 6 is provided with four pinions 61 (FIG. 4) meshing with the respective racks 42, and the respective pinions 61 are rotationally driven by the braked motor M1. Therefore, by rotationally driving the pinion 61 by the motor M1, the base holder 6 is raised or lowered along the support 4 together with the rod base 7 and the nozzle rod 5. In addition, the column 4 is provided with two limiter switches (not shown) for detecting the rising end and the falling end of the base holder 6 respectively.

  The rod base 7 is externally fitted to the base holder 6 via a plurality of cylindrical roller bearings B1 (FIG. 5), and is rotatable relative to the base holder 6 in the direction of the arrow D2. Further, a spur gear G1 (FIG. 3) is externally fixed to the base holder 6, and the rod base 7 is provided with two spur gears G2 meshing with the spur gear G1. Therefore, when the spur gear G2 is rotationally driven by the motor M2, the rod base 7 rotates about the base holder 6 in the direction of the arrow D2, whereby the nozzle rod 5 pivots in the direction of the arrow D2. Further, the rod base 7 is provided with two limiter switches (not shown) for detecting the left rotation end and the right rotation end of the rod base 7 (ie, the left rotation end and the right rotation end of the nozzle rod 5) It is done.

  The pair of nozzle rods 5 extend horizontally in opposite directions from each other in the horizontal direction from the rod base 7, and the base end of each nozzle rod 5 is connected to the rod base 7 via the pair of cylindrical roller bearings B2 (FIG. 3). It is rotatably supported in the direction. A spur gear G3 is externally fitted and fixed to the base end of each nozzle rod 5, and the rod base 7 is provided with a spur gear G4 engaged with the spur gear G3. Therefore, when the spur gear G4 is rotationally driven by the motor M3, the nozzle rod 5 pivots in the direction of arrow D3 with respect to the rod base 7 about the longitudinal axis of the nozzle rod 5.

  The tip of each nozzle rod 5 faces the inner side surface of the upper water tank 2, and as shown in FIG. 6, a first nozzle 51 is provided at the tip, and the outer peripheral surface of each nozzle rod 5 is elongated A plurality of second nozzles 52 are juxtaposed along the direction. Further, in the nozzle rod 5, a first flow passage R1 communicating with the first nozzle 51 and a second flow passage R2 communicating with the plurality of second nozzles 52 are defined. In addition to the two limiter switches described above, the rod base 7 has an upper rotational position in which the second nozzle 52 faces upward, and a lower rotational position in which the second nozzle 52 rotates downward 180 ° from the upper rotational position. And three limiter switches (not shown) for detecting 45.degree. Return rotation from the lower rotation position (rotation 135.degree. From the upper rotation position) and detecting the second nozzle 52 diagonally downward. It is provided at the proximal end of the nozzle rod 5.

  As shown in FIG. 1, the cleaning liquid supply apparatus 8 includes a cleaning liquid tank 81 to which the clean water is supplied from the pumping pipe P 1 and a chlorine tank 82 for supplying chlorine to the cleaning liquid tank 81. The cleaning water is prepared by mixing the water and chlorine. The cleaning solution tank 81 is connected to the drain pipe P3 via a gate valve V9. The cleaning liquid tank 81 is connected to the first and second flow paths R1 and R2 of the nozzle rod 5 through the cleaning liquid supply path P4, and a solenoid valve V is provided on the cleaning liquid supply path P4. By switching the solenoid valve V, the cleaning liquid can be supplied to any one of the first flow passage R1 and the second flow passage R2. A spring-shaped pressure-resistant hose H is provided in the section between the solenoid valve V and the first flow path R1 and in the section between the solenoid valve V and the second flow path R2 to follow the elevation of the nozzle rod 5 The spring-like pressure-resistant hose H expands and contracts. Further, a high pressure pump P5 is provided upstream of the solenoid valve V on the cleaning solution supply path P4, and the high pressure pump P5 sucks the cleaning solution in the cleaning solution tank 81 and supplies the high pressure cleaning solution to the nozzle rod 5. The high-pressure cleaning liquid supplied to the nozzle rod 5 in this manner is vigorously jetted from the first and second nozzles 51 and 52 toward the inner surface of the upper water tank 2.

  As shown in FIG. 7, a plurality of guide plates 24 are erected at equal intervals in the circumferential direction on the upper surface (the floor surface / lower surface of the upper water tank 2) of the bottom 23 of the upper water tank 2. Each guide plate 24 is curved in a circular arc shape radially outward from around the center of the floor surface of the upper water tank 2 and curved in a convex shape in a predetermined turning direction Dr (counterclockwise in the example shown in FIG. 3) doing. Further, the inner end portion 241 of each guide plate 24 is located downstream of the outer end portion 242 by a predetermined turning direction Dr, thereby promoting the drainage of the cleaning waste water. Details will be described later.

  Although not shown, the upper water tank system 1 further includes a control device and a fiberscope camera automatic photographing device installed in the upper water tank 2. The control device includes a memory in which various programs are stored, and a control unit. The various programs usually include a water supply program and an automatic cleaning program. The control unit is an output signal for driving the electric / electromagnetic valves V1 to V8, the solenoid valve V, the various motors M1 to M3 and the like based on input signals from various operation switches, electrode rod type water level gauges, and each limiter switch. Control. A water level gauge and a concentration meter for detecting the chlorine concentration are installed in the cleaning solution tank 81, and the opening and closing control of the water injection valve V7 and the chlorine injection valve V8 makes the cleaning solution tank 81 have a predetermined chlorine concentration. The cleaning solution is configured to be stored in a predetermined amount. In the present embodiment, the chlorine concentration of the cleaning solution is set to be relatively high, and sterilization can be performed simultaneously with cleaning the upper water tank 2 with the cleaning solution.

  Next, the normal water supply process and the automatic cleaning process performed in the upper water tank system 1 configured as described above will be described in order. First, the normal water supply process will be described with reference to the flowchart of FIG. The normal water supply process is performed by the control unit executing a normal water supply program.

  In the normal water supply process, first, the drainage pipe valves V1 and V2 (the drainage pipe ball valve V1 and the drainage pipe gate valve V2) are both closed (S1), and the pumping pipe valves V3 and V4 (the pumping pipe ball valve V3 and the pumping pipe gate valve V4 ) (S3), and the water supply pipe valves V5 and V6 (water supply pipe ball valve V5, water supply pipe gate valve V6) are both opened (S5). As a result, the clean water is supplied from the pumping pipe P1 to the upper water tank 2, and the water level in the upper water tank 2 rises. The above-mentioned electrode rod type water level gauge (not shown) is provided in the upper water tank 2, and it is determined whether the water level measured by this water level gauge has reached a predetermined upper water level (S7). If the upper water level has not been reached (S7: NO), the determination of S7 is continued, and if the water level in the upper water tank 2 reaches the predetermined upper water level (S7: YES), the pumping pipe valve V3 is closed (S9). In this state, when the water in the upper water tank 2 is supplied to a necessary place through the water supply pipe P2, the water level of the upper water tank 2 is lowered. It is determined whether the water level of the upper water tank 2 has dropped to a predetermined lower water level (S11), and if it has not dropped to the lower water level (S11: NO), the determination of S11 is continued. On the other hand, when the water level is lowered to the lower water level (S11: YES), the pumping pipe valve V3 is opened (S13), the water replenishment to the upper water tank 2 is started, and the process returns to S7.

  Thus, by repeating the processing of S7 to S13, the water supply operation is performed between the upper water level and the lower water level of the upper water tank 2. The normal water supply process is continued until a predetermined stop command is received.

  Next, the automatic cleaning process will be described with reference to the flowchart of FIG. The automatic cleaning process is performed by the control unit executing an automatic cleaning program, but when the automatic cleaning process is performed, the above-described normal water supply process is stopped.

  When the automatic cleaning process starts, first, a pre-operation process is performed (S21). In the pre-operation processing, first, the upper water tank 2 is drained and emptied. That is, the pumping pipe valves V3 and V4 are sequentially closed to stop pumping water to the upper water tank 2, and the water supply pipe valves V5 and V6 are sequentially shut to prevent water supply. This also has the meaning of preventing the reverse flow from the other tank water supply pipe and the flow of the cleaning liquid into the water supply pipe P2. The drain pipe valves V2, V1 are sequentially opened to drain the upper water in the upper water tank 2. When drainage is completed, the inside of the upper water tank 2 is photographed before cleaning by the photographing device (not shown), and the high pressure pump P5 is turned on.

  Next, initial operation processing is performed (S23). In the initial operation process, first, the nozzle rod 5 is set to the start position. Specifically, the base holder 6 is positioned at the rising end, the rod base 7 at the right rotation end, and the nozzle rod 5 at the upper rotation position. As a result, the nozzle rod 5 is positioned at the right turning end at the rising end, and the second nozzle 52 is in the state of facing upward.

  Next, the upper surface cleaning process is performed (S25). The upper surface cleaning process will be described with reference to the flowchart of FIG. In the upper surface cleaning process, first, the solenoid valve V is switched to connect the cleaning solution tank 81 and the second nozzle 52 (that is, the second flow path R2) of the nozzle rod 5 (S41). Thereby, the high pressure cleaning fluid is supplied to the second flow path R2, and the high pressure cleaning fluid is sprayed from the second nozzle 52 toward the ceiling surface (upper surface) of the upper water tank 2. In this state, the nozzle rod 5 is turned 180 ° from the right turning end to the left turning end (S43), and then it is turned 180 ° in the reverse direction from the left turning end to the right turning end (S45). Then, the process proceeds to S27 of FIG. As described above, in the upper surface cleaning process, the ceiling surface is cleaned by spraying the high-pressure cleaning solution on the ceiling surface while rotating the nozzle rod 5 in the direction of the arrow D2 at the upper end position.

  In S27 of FIG. 9, the side surface cleaning process is performed. The side surface cleaning process will be described with reference to the flowchart of FIG. In the side surface cleaning process, first, the solenoid valve V is switched to connect the cleaning solution tank 81 and the first nozzle 51 (that is, the first flow passage R1) (S51). As a result, the high pressure cleaning fluid is supplied to the first flow path R 1, and the high pressure cleaning fluid is sprayed from the first nozzle 51 toward the inner side surface of the upper water tank 2. In this state, the nozzle rod 5 is turned 180 ° from the right turning end to the left turning end (S53), and then turned 180 ° in the reverse direction from the left turning end to the right turning end (S55). By spraying the high-pressure cleaning solution on the inner side while rotating the nozzle rod 5 in this manner, a predetermined area on the inner side of the upper water tank 2 is cleaned. Next, the nozzle rod 5 is lowered by a predetermined amount (S57), and it is determined whether the nozzle rod 5 has reached the lowering end (S59). If the lowering end has not been reached (S59: NO), the process returns to S53, and if the lowering end has been reached (S59: YES), the nozzle rod 5 is turned 180 ° from the right turning end to the left turning end (S61) Then, it is turned 180 ° in the reverse direction from the left turn end to the right turn end (S63), the process is ended, and the process proceeds to S29 in FIG.

  The amount of descent of the nozzle rod 5 in S57 may be selected in advance based on the vertical width of the area (the above-described fixed area) where the high pressure cleaning liquid from the first nozzle 51 is sprayed on the inner side surface of the upper water tank 2.

  A bottom surface cleaning process is performed in S29 of FIG. The lower surface cleaning process will be described with reference to the flowchart of FIG. In the lower surface cleaning process, the solenoid valve V is switched to connect the cleaning solution tank 81 and the second nozzle 52 (that is, the second flow passage R2) (S71), and rotate the nozzle rod 5 to the lower rotation position by 180 ° (S73). ). Thereby, the high pressure cleaning liquid is supplied to the second flow path R2, and the high pressure cleaning liquid is sprayed from the second nozzle 52 toward the lower surface of the upper water tank 2. In this state, the nozzle rod 5 is turned 180 ° from the right turning end to the left turning end (S75), and then it is turned 180 ° in the reverse direction from the left turning end to the right turning end (S77). Then, the process proceeds to S31 of FIG. As described above, in the lower surface cleaning process, the lower surface (floor surface) of the upper water tank 2 is cleaned by spraying the high-pressure cleaning solution on the lower surface while rotating the nozzle rod 5.

  In step S31 of FIG. 9, the washing and sewage discharge process is performed. The washing sewage discharge process will be described with reference to the flowchart of FIG. 13 and FIG. 7. In the washing wastewater discharge processing, first, the nozzle rod 5 is rotated 45 ° from the lower rotation position to the oblique rotation position so that the second nozzle 52 is on the downstream side of the predetermined turning direction Dr (S81). As a result, from the second nozzle 52 of the nozzle rod 5, a high-pressure cleaning solution is sprayed from the obliquely upward direction toward the lower surface (floor surface) of the upper water tank 2 toward the predetermined swirling direction Dr downstream, that is, in the arrow De direction. Be

  In this state, the nozzle rod 5 is turned 180 ° in the predetermined turning direction Dr from the right turning end to the left turning end (S83). As a result, the cleaning liquid flows radially inward along the side surface (the upstream side of the turning direction Dr) 24a of the guide plate 24 toward the drainage pit, and drainage of the cleaning liquid (washing wastewater) is promoted. That is, since the outer end 242 of the guide plate 24 is positioned upstream of the inner end 241 in the predetermined turning direction Dr, the high-pressure cleaning liquid from the nozzle rod 5 is accompanied by the turning of the nozzle rod 5 in the turning direction Dr. , And is sequentially sprayed from the radially outer side to the inner side on the side surface 24 a of the guide plate 24. This promotes the flow of the cleaning solution toward the center in the radial direction, and also sweeps away solids contained in the cleaning wastewater.

  Next, the high-pressure pump P5 is turned off (S87) by turning 180 ° in the reverse direction from the left turning end to the right turning end (S85). The nozzle rod 5 is rotated by 135 ° to the upper rotational position (S89), and the process ends, and the process proceeds to S33 of FIG.

  In S33 of FIG. 9, the water supply preparation process is performed. In the water supply preparation process, the upper water tank 2 is once filled with water to cause drought, whereby the cleaning liquid of high concentration chlorine is prevented from remaining in the upper water tank 2. Specifically, with the water supply pipe valves V5 and V6 kept closed, the drain pipe valves V1 and V2 are closed, and the pumping pipe valves V4 and V3 are sequentially opened. After storing the water level to the full level of the water level gauge, close the pumping pipe valves V3 and V4 in order and open the drain pipe valves V2 and V1 in order. After draining to the water mark position of the water level, close drain valve V1, V2 in order.

  Next, in S35, the inside of the upper water tank 2 is automatically photographed, and the process is ended. After the end of the automatic cleaning process, the above-described normal water supply process is started.

  As described above, according to the upper water tank system 1 of the present embodiment, the washing of the upper water tank 2 can be automatically performed without human power. Therefore, there is no need for a worker to enter the upper water tank 2 and the inside of the upper water tank 2 can be cleaned more hygienically. In addition, by washing with a cleaning liquid having a relatively high chlorine concentration, sterilization can be performed simultaneously with the washing in the upper water tank 2, and the washing can be performed efficiently. Further, since the cleaning is performed while the nozzle rod 5 is lowered, the entire area from the upper portion to the lower portion of the upper water tank 2 can be cleaned well.

Second Embodiment
Next, an upper water tank system according to a second embodiment of the present invention will be described. The components substantially the same as those of the upper water tank system 1 of the first embodiment are given the same reference numerals, and the description thereof will be omitted.

  14, the upper water tank system 101 of this embodiment is similar to the above-mentioned upper water tank system 1, but two upper water tanks 2 are provided, and a cleaning device 3 is installed in each of the upper water tanks 2. Differ in that they Here, when each upper water tank 2 and the member relevant to this are demonstrated, code | symbol a and b is attached | subjected and distinguished.

  In the upper water tank system 101 configured as described above, water is alternately supplied from the upper water tank 2a and the upper water tank 2b at normal times. Further, the upper water tank 2a and the upper water tank 2b are automatically cleaned in order, and while one upper water tank 2 is being automatically cleaned, water is supplied only from the other upper water tank 2.

  The alternate water supply process performed at the normal time will be described with reference to the flowchart of FIG. In the alternate water supply process, first, the drain pipe valves V1a and V1b are closed (S91), the drain pipe valves V2a and V2b are closed (S92), and drainage from the upper water tanks 2a and 2b is stopped. Next, the water storage pipe valves V4a and V4b are opened (S93), and the water supply pipe valves V6a and V6b are opened (S94) to prepare for water storage. Next, the pumping pipe valves V3a and V3b are opened (S95), and water storage in the upper water tanks 2a and 2b is started. The water supply pipe valves V5a and V5b are opened (S96) to enable water supply from the upper water tanks 2a and 2b.

  Thereafter, the normal water supply process by the upper water tank 2a is started at a predetermined timing (S97). In the normal water supply processing by the upper water tank 2a, the water supply is performed only from the upper water tank 2a and is not performed from the upper water tank 2b. Details will be described later. Thereafter, when a predetermined time (for example, 24 hours) elapses (S98: YES), the normal water supply process by the upper water tank 2b is started (S99). In the normal water supply processing by the upper water tank 2b, the water supply is performed only from the upper water tank 2b and is not performed from the upper water tank 2a. Details will be described later. Thereafter, when a predetermined time (for example, 24 hours) elapses (S100: YES), the process returns to S97, and thus the normal water supply process by the upper water tank 2a and the normal water supply process by the upper water tank 2b are alternately executed.

  The normal water supply process by the upper water tank 2a started in S97 of FIG. 15 will be described with reference to the flowchart of FIG. In the normal water supply process by the upper water tank 2a, first, the pumping pipe valve V3a is closed and the water supply pipe valve V5a is opened (S111). That is, when the water supply pipe valve V5a is already open, the open state is maintained, and when the water supply pipe valve V5a is closed, the water supply pipe valve V5a is opened. This enables water supply from the upper water tank 2a. Next, the pumping pipe valve V3b and the water supply pipe valve V5b are closed (S112), and the water supply from the upper water tank 2b is stopped. It is determined whether the water level in the upper water tank 2a measured by the water level gauge has dropped to a predetermined lower level (S113), and if it has not dropped to the lower level (S113: NO), the determination of S113 is continued, When the water level is lowered to the lower water level (S113: YES), the pumping pipe valve V3a is opened (S114), and supply of fresh water to the upper water tank 2a is started (S114). Next, it is determined whether the water level in the upper water tank 2a has reached a predetermined upper water level (S115), and if it has not reached the upper water level (S115: NO), the determination of S115 is continued, and the upper water tank 2a When the water level inside reaches the predetermined upper water level (S115: YES), the pumping pipe valve V3a is closed (S116), and the process returns to S113. Thus, by repeating the processing of S113 to S116, the water supply operation is performed between the upper water level and the lower water level of the upper water tank 2a.

  The normal water supply process by the upper water tank 2b started in S99 of FIG. 15 will be described with reference to the flowchart of FIG. In the normal water supply processing by the upper water tank 2b, first, the water supply pipe valve V5b is opened (S121) to enable water supply from the upper water tank 2b. Next, the pumping pipe valve V3a and the water supply pipe valve V5a are closed (S122). Thereby, the water supply from the upper water tank 2a is stopped. It is determined whether the water level in the upper tank 2b measured by the water level gauge has dropped to a predetermined lower level (S123), and if it has not dropped to the lower level (S123: NO), the determination of S123 is continued, When the water level is lowered to the lower water level (S123: YES), the pumping pipe valve V3b is opened (S124), and supply of fresh water to the upper water tank 2b is started (S124). Next, it is determined whether the water level in the upper water tank 2b has reached a predetermined upper water level (S125), and if it has not reached the upper water level (S125: NO), the determination of S125 is continued, and the upper water tank 2b When the water level inside reaches the predetermined upper water level (S125: YES), the pumping pipe valve V3b is closed (S126), and the process returns to S123. Thus, by repeating the processing of S123 to S126, the water supply operation is performed between the upper water level and the lower water level of the upper water tank 2b.

  Thus, the water in the upper water tank 2 is prevented from dying and becoming water (non-hygienic) by alternately supplying the water from the first upper water tank 2a and the water from the second upper water tank 2b. ing.

  Then, when the upper water tank 2 is to be cleaned, first, the above-described automatic cleaning process (FIG. 9) is performed for the first upper water tank 2a, and the above-described normal water supply process (FIG. 8) for the second upper water tank 2b. Do. When the automatic cleaning process is completed for the first upper water tank 2a, the automatic cleaning process is performed for the second upper water tank 2b, and the normal water supply process is performed for the first upper water tank 2a. When the automatic cleaning process is completed for the second upper water tank 2b, the above-described alternate water supply process (FIG. 15) is performed. As described above, water can be supplied from the other upper water tank 2 while automatic cleaning of one upper water tank 2 is being performed, so that the upper water tank 2 can be washed without water supply.

  Although the upper water tank system according to the embodiment of the present invention has been described above with reference to the accompanying drawings, the present invention is not limited to this embodiment, and various modifications and corrections can be made without departing from the scope of the present invention. It is possible.

  For example, a measuring device for automatically measuring a free residual chlorine value or / and a PH meter may be provided in the upper water tank 2, and while taking a photograph automatically in S33 of FIG. The PH meter may be automatically measured. In addition, a photograph or measurement value obtained in this manner may be automatically transmitted to a predetermined terminal or the like.

  Moreover, in the said embodiment, although the turning angle of the nozzle rod 5 was 180 degrees, you may be arbitrary angles 180 degrees or more. Similarly, although the oblique rotation angle of the nozzle rod 5 is set to the angle at which the second nozzle 52 is directed obliquely downward 45 °, the oblique rotation angle of the nozzle rod 5 is not limited to this.

1, 101 upper water tank system 2 (2a, 2b) upper water tank 3 cleaning device 4 support 5 post rod 5 nozzle rod 8 high pressure cleaning liquid supply device 51 first nozzle 52 second nozzle

Claims (6)

Upper tank,
And a cleaning device for cleaning the inside of the upper water tank,
The cleaning apparatus includes a support erected in the upper water tank, and a nozzle rod slidably supported on the support in the vertical direction.
The nozzle rod is pivotable about a pivot extending in the vertical direction,
The upper water tank system, wherein the cleaning device sprays a cleaning liquid from the rotating nozzle rod toward the inner surface of the upper water tank to clean the inner surface of the upper water tank. The tip of the nozzle rod faces the side surface of the upper water tank, and the tip of the nozzle rod is provided with a first nozzle.
2. The upper water tank system according to claim 1, wherein the cleaning device cleans the side surface of the upper water tank by repeatedly turning and lowering the nozzle rod while spraying the cleaning liquid from the first nozzle. 3. The nozzle rod is rotatable about a rotational axis extending in the longitudinal direction of the nozzle rod,
A plurality of second nozzles are provided on the circumferential surface of the nozzle rod along the longitudinal direction of the nozzle rod,
The cleaning device cleans the upper surface or the lower surface of the upper water tank by rotating the nozzle rod while spraying the cleaning liquid from the plurality of second nozzles toward the upper surface or the lower surface of the upper water tank. The upper water tank system according to claim 1 or 2. A plurality of guide plates are radially erected on the lower surface of the upper water tank, and the radially outer end of each guide plate is positioned upstream of the radially inner end in a predetermined turning direction,
The cleaning device is characterized in that the nozzle rod is swung in the predetermined turning direction while spraying the washing solution from the plurality of second nozzles obliquely downward, thereby promoting the discharge of the washing wastewater. Upper tank system described in 3. The cleaning apparatus further comprises a high-pressure cleaning liquid supply apparatus for supplying high-pressure cleaning liquid to the cleaning apparatus,
The high-pressure cleaning liquid supply apparatus includes a cleaning liquid tank, a chlorine tank that supplies chlorine to the cleaning liquid tank, and a high-pressure pump that sucks the cleaning liquid in the cleaning liquid tank and supplies high-pressure cleaning liquid to the cleaning apparatus.
The cleaning water tank is supplied with clean water from a pumping pipe, and the cleaning water is prepared by mixing the cleaning water supplied from the pumping pipe and the chlorine supplied from the chlorine tank in the cleaning liquid tank. The upper water tank system according to any one of claims 1 to 4, characterized in that: With other upper tank,
Further comprising another cleaning device for cleaning the inside of the other upper water tank;
The configuration of the other cleaning device is the same as the configuration of the cleaning device,
While the upper water tank is being cleaned by the cleaning device, water is supplied from the other upper water tank,
The upper water tank system according to any one of claims 1 to 5, wherein water is supplied from the upper water tank while the other upper water tank is being cleaned by the other cleaning device.

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