JP2019042616A - Reaction product manufacturing method using phase interface reaction and phase interface reaction device, plant cultivation method and plant cultivation device - Google Patents

Abstract

To enhance efficiency of a phase interface reaction.SOLUTION: The invention relates to a phase interface reaction device 31 having a reaction container 32, plasma supply means 33 for supplying a plasma-like material 36 into the reaction container 32, water solution supply means 35 for supplying water or solution 34 into the reaction container 32, and an ultraviolet ray irradiation means 38 for irradiating ultraviolet ray 37 to the plasma-like material 36 in the reaction container 32, in which the plasma-like material 36 and a solute containing water or the solution 34 are reacted at a phase interface in the reaction container 32, having a first reaction field 40 in which a first phase interface 39 directly receiving the ultraviolet ray irradiated by the ultraviolet ray irradiation means 38 is formed, and a second reaction field 42 arranged in an opposite side to the ultraviolet ray irradiation means 38 with sandwiching the first reaction field 40, in which a second phase interface 41 receiving the ultraviolet ray passing through the first reaction field 40 is formed, as reaction fields in which the phase interface is formed.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a reaction product manufacturing method and a phase interface reaction apparatus using a phase interface reaction that causes a reaction at a phase interface between a plasma phase and a liquid phase in contact with the plasma phase, and a plant cultivation method and a plant cultivation apparatus. About.

  2. Description of the Related Art Conventionally, there has been known a phase interface reaction apparatus for producing a reaction product by reacting a plasma substance with mist water while irradiating ultraviolet rays in a reaction vessel (see Patent Document 1). This phase interface reaction apparatus is shown in FIG. The phase interface reactor 10 heats the reaction vessel 11, the plasma generator 12 that supplies a plasma substance into the reaction vessel 11, and the water (or aqueous solution) X stored in the heated vessel 19 to atomize it. And a diffusion fan 20 that diffuses a plasma substance and mist water into the reaction vessel 11.

  A plasma supply port 15, a supply port 16 for other gases, and a discharge port 17 are provided at the bottom of the reaction vessel 11. Plasma generated by the plasma generator 12 is supplied from the plasma supply port 15 to the reaction vessel 11 through the pipe 18. Further, a pipe 21 is connected to the supply port 16 for other gases and the like, and a reaction gas or the like can be supplied from a pump recess (not shown). Further, a pipe 22 is connected to the discharge port 17 so that generated gas, unreacted gas, and the like are discharged.

  By the irradiation of the ultraviolet rays by the ultraviolet irradiation means 14, the plasma substance and the atomized water react at the phase interface in the reaction vessel 11. As the plasma substance, for example, oxygen can be used to generate hydroxyl radicals, and nitrogen can be used to generate ammonia and the like.

WO2015 / 198608 Publication

  In the phase interface reaction apparatus as described above, since the amount of reaction product produced is greatly influenced by the efficiency of the reaction performed at the phase interface, there is a demand for further improving the efficiency of the reaction.

  In view of the above requirements, an object of the present invention is to provide a reaction product production method and a phase interface reaction apparatus, a plant cultivation method, and a plant cultivation apparatus that can further improve the efficiency of the reaction.

  In order to achieve the above object, a reaction product manufacturing method according to an embodiment includes a plasma supply step for supplying a plasma substance into a reaction vessel, and a water / aqueous solution supply for supplying water or an aqueous solution into the reaction vessel. And an ultraviolet irradiation step of irradiating the plasma substance in the reaction vessel with ultraviolet rays by ultraviolet irradiation means, and the plasma substance and the solute contained in water or an aqueous solution in the reaction vessel at the phase interface. As a reaction field in which a phase interface is formed, a first reaction field in which a first phase interface that directly receives ultraviolet rays irradiated by ultraviolet irradiation means and a first reaction field are formed. And a second reaction field in which a second phase interface that receives ultraviolet light that has passed through is formed.

  In the reaction product production method according to another embodiment, the first phase interface is further provided with water or an aqueous solution on the front side surface desired for the ultraviolet irradiation means of the guide member accommodated in the reaction vessel and capable of passing ultraviolet rays. It may be formed by flowing, and the second phase interface may be formed by flowing water or an aqueous solution on the back side surface of the guide member.

  In the reaction product manufacturing method according to another embodiment, the light emitting portion of the ultraviolet irradiation means has a cylindrical shape, and the guide member has a cylindrical shape surrounding the light emitting portion of the ultraviolet irradiation means. But it ’s okay.

  In the reaction product manufacturing method according to another embodiment, the ultraviolet light that has passed through the first phase interface may be reflected in the reaction vessel and applied to the second phase interface.

  The reaction product manufacturing method according to another embodiment further includes a plurality of device units that perform any one of the above-described reaction product manufacturing methods, and the ultraviolet light that has passed through the first phase interface of the one device unit. It may be applied to the second phase interface of the device unit.

  In addition, a phase interface reaction apparatus according to an embodiment includes a reaction vessel, a plasma supply unit that supplies a plasma substance into the reaction vessel, and a water / aqueous solution supply unit that supplies water or an aqueous solution into the reaction vessel. And an ultraviolet irradiation means for irradiating the plasma substance in the reaction vessel with ultraviolet rays, and reacting the plasma substance and the solute contained in water or an aqueous solution at the phase interface in the reaction vessel, As a reaction field in which a phase interface is formed, a first reaction field in which a first phase interface that directly receives ultraviolet rays irradiated by ultraviolet irradiation means is formed, and an ultraviolet irradiation means across the first reaction field And a second reaction field that is provided on the opposite side and that forms a second phase interface that receives ultraviolet light that has passed through the first reaction field.

  In the phase interface reaction apparatus according to another embodiment, further, the first phase interface is made to flow water or an aqueous solution on the front side surface desired for the ultraviolet irradiation means of the guide member accommodated in the reaction vessel and capable of passing ultraviolet rays. The second phase interface may be formed by flowing water or an aqueous solution on the back side surface of the guide member.

  In the phase interface reaction apparatus according to another embodiment, the light emitting portion of the ultraviolet irradiation means may have a columnar shape, and the guide member may have a cylindrical shape surrounding the light emitting portion of the ultraviolet irradiation means. .

  The phase interface reaction apparatus according to another embodiment may further include a reflection unit that reflects the ultraviolet rays that have passed through the guide member toward the second phase interface in the reaction container.

  The phase interface reaction apparatus according to another embodiment further includes a transmission part through which a portion desired for the guide member of the reaction vessel can pass through the guide member, and the reaction vessel and the ultraviolet irradiation means description guide member. A plurality of units are provided, and a plurality of units are arranged with the transmission parts facing each other, and the ultraviolet light transmitted through the transmission part of one unit may be applied to the second phase interface of the other unit. .

  Moreover, the plant cultivation method which concerns on one Embodiment gives the liquid fertilizer containing the reaction product produced | generated by one of the above-mentioned phase interface reactions to a plant.

  Moreover, the plant cultivation apparatus which concerns on one Embodiment is provided with the liquid fertilizer supply means which gives the plant the liquid fertilizer containing the reaction product produced | generated by one of the above-mentioned phase interface reaction apparatus and a phase interface reaction apparatus. .

  According to the present invention, the efficiency of the phase interface reaction can be improved.

FIG. 1 shows a schematic configuration diagram of a phase interface reaction apparatus according to a first embodiment of the present invention. FIG. 2 shows a conceptual diagram of a system for supplying water or an aqueous solution to a reaction vessel of a phase interface reactor and a system for recovering, and a system for supplying a plasma substance and a system for recovering. FIG. 3 is a diagram showing the positional relationship between the guide member of the phase interface reaction apparatus and the inner annular space and the outer annular space of the plasma supply path. FIG. 4 shows a diagram of the positional relationship between the guide member of the phase interface reactor, the inner water supply path, and the outer water supply path. FIG. 5 is a cross-sectional view of the upper end of the plasma supply path, the inner water supply path, and the outer water supply path as viewed from the side. FIG. 6 is a view for explaining a state in which the ultraviolet light that has passed through the guide member is reflected by the reflecting portion. FIG. 7 shows a phase interface reaction apparatus according to the second embodiment of the present invention, and shows a conceptual diagram of a state in which a plurality of apparatus units 70 are arranged. FIG. 8: shows the schematic block diagram of the plant cultivation apparatus which concerns on the 1st Embodiment of this invention. FIG. 9: shows the schematic block diagram of the plant cultivation apparatus which concerns on the 2nd Embodiment of this invention. FIG. 10 shows a graph comparing the amount of ammonia produced under various conditions. FIG. 11 shows a schematic configuration diagram of a conventional phase interface reaction apparatus.

  Next, embodiments of a reaction product manufacturing method and a phase interface reaction apparatus using a phase interface reaction according to the present invention, and a plant cultivation method and a plant cultivation apparatus will be described with reference to the drawings. The embodiments described below do not limit the present invention, and all the elements and combinations described in the embodiments are not necessarily essential to the solution means of the present invention. Absent. Moreover, in the following description, a reaction product manufacturing method is demonstrated in embodiment of a phase interface reaction apparatus, and a plant cultivation method is demonstrated in embodiment of a plant cultivation apparatus.

[Phase interface reactor]
1 to 6 show a first embodiment of a phase interface reaction apparatus according to the present invention. The phase interface reactor 31 includes a reaction vessel 32, a plasma supply unit 33 that supplies a plasma substance 36 into the reaction vessel 32, and a water / aqueous solution supply unit 35 that supplies water or an aqueous solution 34 into the reaction vessel 32. And an ultraviolet irradiation means 38 for irradiating the plasma-like substance 36 in the reaction vessel 32 with ultraviolet rays 37, and the plasma-like substance 36 and the solute contained in water or the aqueous solution 34 in the reaction vessel 32 at the phase interface. It is what makes it react. In addition, as a reaction field in which a phase interface is formed, a first reaction field 40 in which a first phase interface 39 that directly receives the ultraviolet rays 37 irradiated by the ultraviolet irradiation means 38 and a first reaction field 40 are formed. A second reaction field 42 provided on the opposite side of the ultraviolet irradiation means 38 and having a second phase interface 41 for receiving the ultraviolet light 37 that has passed through the first reaction field 40. .

  In the present embodiment, the first phase interface 39 is formed by flowing water or an aqueous solution 34 to the front side surface 43 a desired for the ultraviolet irradiation means 38 of the guide member 43 that is accommodated in the reaction vessel 32 and allows the ultraviolet ray 37 to pass therethrough. The first phase interface 39 is formed and becomes a first reaction field 40 in which the reaction between the plasma substance 36 and the solute contained in water or the aqueous solution 34 occurs. The second phase interface 41 is formed by flowing water or an aqueous solution 34 through the back side surface 43 b of the guide member 43, and the second phase interface 41 is included in the plasma substance 36 and the water or aqueous solution 34. The second reaction field 42 where the reaction with the solute occurs.

  The reaction vessel 32 mainly includes an upper end portion 32a, a lower end portion 32b, and a peripheral wall portion 32c sandwiched between them, and there are a plurality of flanges 32d of the upper end portion 32a and flanges 32e of the lower end portion 32b. Are connected by a column 32f. The peripheral wall portion 32c has, for example, a cylindrical shape (an example of a cylindrical shape). In this embodiment, the peripheral wall 32c is made of a metal such as stainless steel and the inner peripheral surface thereof is mirror-finished to reflect the ultraviolet rays 37 that have passed through the guide member 43 toward the second reaction field 42. 32g. For example, a stainless steel pipe can be used as the peripheral wall portion 32c. By using the inner peripheral surface of the peripheral wall portion 32c as the reflecting portion 32g, it is not necessary to provide the reflecting portion 32g as a separate part, and the manufacturing cost can be reduced, and the device can be reduced in weight and size. it can. However, it is also possible to provide the reflecting portion 32g as a component different from the peripheral wall portion 32c.

  The ultraviolet irradiation means 38 is a radiation source capable of irradiating the first reaction field 40 and the second reaction field 42 with the ultraviolet light 37, and for example, an ultraviolet lamp (for example, a lamp that irradiates 185 nm ultraviolet light) can be used. It is. In addition, as the ultraviolet lamp, for example, an excimer lamp (for example, a lamp that emits vacuum ultraviolet rays of 180 nm or less) can be used, and an energy input means using light or electromagnetic waves may be used. The ultraviolet irradiation means 38 is disposed in the center of the reaction vessel 32, and its upper and lower ends are supported by the upper end portion 32a and the lower end portion 32b. The light emitting portion 38a of the ultraviolet irradiation means 38 has, for example, a columnar shape (an example of a column shape), and is accommodated in, for example, a cylindrical (an example of a cylindrical shape) lamp cover glass 44. However, the light emitting portion 38a is not limited to the above shape, and may have another shape such as a plate shape. The light-emitting portion 38a may be a member having any shape such as a plate shape, a polygonal column shape, or a columnar shape on which one or more LEDs are mounted.

  The lamp cover glass 44 is a cylindrical member made of a material that allows the ultraviolet rays 37 to pass well. The upper and lower ends of the lamp cover glass 44 are supported by an upper end portion 32a and a lower end portion 32b. The lamp cover glass 44 can protect the ultraviolet irradiation means 38 from the plasma-like substance 36 and the water or aqueous solution 34 supplied into the reaction vessel 32. The lamp cover glass 44 is made of, for example, synthetic quartz glass, but is not limited thereto.

  The guide member 43 has a cylindrical shape surrounding the light emitting portion 38 a of the ultraviolet irradiation means 38. In the present embodiment, the guide member 43 has a cylindrical shape. However, the guide member 43 is not limited to a cylindrical shape, and may be a hexagonal cylindrical shape, an octagonal cylindrical shape, or a substantially cylindrical shape having a bellows shape in a side view. . The guide member 43 is made of, for example, a member that transmits ultraviolet rays 37 such as a wire mesh, or a plate material formed of a material that transmits ultraviolet rays 37 such as glass. However, the present invention is not limited to these as long as it can pass or transmit the ultraviolet rays 37. When the guide member 43 is made of wire mesh, the surface area (reaction field) of the aqueous phase interface when water or the aqueous solution 34 flows is adjusted by changing the fineness of the mesh of the wire mesh to improve the efficiency of the reaction. Can be made. However, if the fineness of the wire mesh is changed, the passage rate of the ultraviolet rays 37 also changes. Therefore, it is important to balance the surface area of the aqueous phase interface and the passage rate of the ultraviolet rays 37. Further, when the guide member 43 is made of glass, it is possible to improve the efficiency of the reaction by increasing the surface area (reaction field) of the aqueous phase interface when water or an aqueous solution 34 is flowed by providing irregularities on the surface. it can. The upper and lower ends of the guide member 43 are supported by the upper end 32 a and the lower end 32 b of the reaction vessel 32.

  The plasma supply means 33 for supplying the plasma substance 36 into the reaction vessel 32 is a device that generates plasma of the substance to be reacted and supplies the generated plasma (plasma substance 36) into the reaction vessel 32. As the plasma generation device (plasma supply means 33), a known plasma generation device such as a device using a discharge such as glow discharge, a device using a high frequency electromagnetic field, a device using a microwave, or the like can be used as appropriate. When the substance to be reacted is oxygen, a known ozone generator can be used as the plasma generator. The plasma supply means 33 and the reaction vessel 32 are connected by a pipe 45. That is, the plasma generated by the plasma supply means 33 is supplied to the plasma supply port 46 of the upper end portion 32a of the reaction vessel 32 through the pipe 45 and supplied into the reaction vessel 32 through the plasma supply path 47 provided in the upper end portion 32a. Is done.

  A source gas source is connected to the plasma supply means 33. In the present embodiment, for example, an oxygen supply source 48 and a nitrogen supply source 49 are connected as the source gas source, and the gas that can be supplied as the source gas can be switched between oxygen gas and nitrogen gas. The oxygen supply source 48 and the nitrogen supply source 49 are connected to the plasma supply unit 33 via a switching unit 50 such as a three-way solenoid valve. The oxygen supply source 48 is, for example, an oxygen cylinder stored in a state where oxygen gas is pressurized, and the nitrogen supply source 49 is, for example, a nitrogen cylinder stored in a state where nitrogen gas is pressurized. When the oxygen supply source 48 is connected to the plasma supply means 33 by switching the switching means 50 and the discharge port of the oxygen supply source 48 is opened, oxygen gas can be supplied to the plasma supply means 33. By supplying the oxygen gas, the plasma supply means 33 generates plasma-like oxygen (so-called oxygen plasma containing ozone, that is, the plasma-like substance 36). Further, when the nitrogen supply source 49 is connected to the plasma supply means 33 by switching the switching means 50 and the discharge port of the nitrogen supply source 49 is opened, nitrogen gas can be supplied to the plasma supply means 33. By supplying the nitrogen gas, plasma-like nitrogen (plasma-like substance 36) is generated by the plasma supply means 33. In addition, you may use the above-mentioned mixed gas of oxygen gas and nitrogen gas, or gas other than those as source gas.

  The water / aqueous solution supply means 35 for supplying water or the aqueous solution 34 into the reaction vessel 32 mainly includes, for example, a tank 51 in which the water or the aqueous solution 34 is stored and a pump 52 that pumps the water or the aqueous solution 34 in the tank 51. Has been. In the present embodiment, water / aqueous solution supply means 35 for supplying water or aqueous solution 34 to the first reaction field 40 and water / aqueous solution supply means 35 for supplying water or aqueous solution 34 to the second reaction field 42 are separately provided. Provided. However, the water / aqueous solution supply means 35 for the first reaction field 40 and the water / aqueous solution supply means 35 for the second reaction field 42 may be combined into one water / aqueous solution supply means 35.

  The pump 52 of the water / aqueous solution supply means 35 for the first reaction field 40 and the reaction vessel 32 are connected by a pipe 53. That is, the water or aqueous solution 34 in the tank 51 sucked in by the pump 52 is supplied to the inner water supply port 54 provided in the upper end portion 32a of the reaction vessel 32 through the pipe 53, and the inner water provided in the upper end portion 32a. It is supplied to the first reaction field 40 in the reaction vessel 32 through the supply path 55. The pump 52 of the water / aqueous solution supply means 35 for the second reaction field 42 and the reaction vessel 32 are connected by a pipe 56. That is, the water or aqueous solution 34 in the tank 51 sucked in by the pump 52 is supplied to the outer water supply port 57 provided in the upper end portion 32a of the reaction vessel 32 through the pipe 56, and the outer water provided in the upper end portion 32a. It is supplied to the second reaction field 42 in the reaction vessel 32 through the supply path 58.

  3 to 5 show a plasma supply path 47, an inner water supply path 55, and an outer water supply path 58 provided at the upper end portion 32 a of the reaction vessel 32. 3 is a diagram showing the positional relationship between the guide member 43 and the inner annular space 47a and the outer annular space 47b of the plasma supply path 47, and FIG. 4 shows the positions of the guide member 43 and the inner water supply path 55 and the outer water supply path 58. FIG. 5 is a cross-sectional view of the upper end portion 32a when the plasma supply path 47, the inner water supply path 55, and the outer water supply path 58 are viewed from the side.

  The plasma supply path 47 includes an annular inner annular space 47a provided between the lamp cover glass 44 and the guide member 43, and an inner side that guides the plasma substance 36 supplied to the plasma supply port 46 to the inner annular space 47a. The plasma communication passage 47d, the annular outer annular space 47b provided between the guide member 43 and the peripheral wall portion 32c, and the outer plasma for guiding the plasma substance 36 supplied to the plasma supply port 46 to the outer annular space 47b. It is mainly composed of the communication passage 47c. The inner annular space 47 a opens toward the first reaction field 40, and the outer annular space 47 b opens toward the second reaction field 42. Therefore, the plasma-like substance 36 supplied to the plasma supply port 46 flows into the inner plasma communication passage 47d and the outer plasma communication passage 47c, flows into the inner annular space 47a from the inner plasma communication passage 47d, and flows into the inner annular space 47a. The first reaction field 40 is supplied, or flows from the outer plasma communication passage 47 c to the outer annular space 47 b and is supplied to the second reaction field 42.

  The inner water supply path 55 includes an annular inner annular reservoir 55a provided between the lamp cover glass 44 and the guide member 43, and water or an aqueous solution 34 supplied to the inner water supply port 54 into the inner annular reservoir 55a. The inner water communication passage 55b is mainly constituted. The water or aqueous solution 34 supplied to the inner water supply port 54 flows into the inner annular reservoir 55a through the inner water communication passage 55b and is temporarily stored. As shown in FIG. 5, an inner peripheral wall (a peripheral wall between the inner plasma communication passage 47d) 55c of the inner annular reservoir 55a is higher than an outer peripheral wall (a peripheral wall facing the guide member 43) 55d. Therefore, when the liquid level of the inner annular reservoir 55a rises and reaches a predetermined value, the water or the aqueous solution 34 in the inner annular reservoir 55a overflows over the outer peripheral wall 55d and is transmitted to the front side surface 43a of the guide member 43. And run down. That is, the water or the aqueous solution 34 in the inner annular reservoir 55 a is supplied to the first reaction field 40.

  An inner plasma communication passage 47d of the plasma supply path 47 is provided inside the inner annular reservoir 55a, but the inner peripheral wall 55c of the inner annular reservoir 55a is sufficiently higher than the outer peripheral wall 55d, The water or aqueous solution 34 in the reservoir 55a does not flow into the inner plasma communication path 47d due to the surface tension. Further, the inner annular storage portion 55a is subjected to a surface treatment such as electrolytic polishing to improve wettability. Therefore, the water or aqueous solution 34 easily spreads in the inner annular storage portion 55a, the height of the liquid surface can be made equal over the entire circumference, and water or water can be evenly distributed over the entire circumference of the front side surface 43a of the guide member 43. An aqueous solution 34 can be supplied.

  The outer water supply path 58 has an annular outer annular storage portion 58a for storing the water or the aqueous solution 34 supplied to the outer water supply port 57, and an annular outer ring that surrounds the guide member 43 and opens toward the back side surface 43b of the guide member 43. It is mainly composed of an annular channel 58b and a plurality of outer water communication passages 58c that guide the water or aqueous solution 34 in the outer annular reservoir 58a to the annular channel 58b. The water or aqueous solution 34 supplied to the outer water supply port 57 flows into the outer annular reservoir 58a and is temporarily stored. When the liquid level in the outer annular reservoir 58a increases to some extent, the water or aqueous solution 34 in the outer annular reservoir 58a flows into the annular channel 58b through the outer water communication passages 58c, and the back side surface 43b of the guide member 43. It flows down through. That is, the water or the aqueous solution 34 in the annular flow path 58 b is supplied to the second reaction field 42.

  At the lower end 32 b of the reaction vessel 32, an outer plasma recovery path 59 for recovering the plasma substance 36 that has passed through the second reaction field 42 between the peripheral wall portion 32 c and the guide member 43, the guide member 43 and the lamp An inner plasma recovery path 60 that recovers the plasma-like substance 36 that has passed through the first reaction field 40 between the cover glass 44 and water or an aqueous solution 34 that has passed through the first and second reaction fields 40, 42. A water / aqueous solution recovery path 61 for recovery is provided.

  The outer plasma recovery path 59 includes an annular groove 59a that opens toward the space 62 between the peripheral wall portion 32c and the guide member 43, and an outer plasma discharge port 59b that communicates with the annular groove 59a. The plasma substance 36 that has passed through the space 62 between the peripheral wall portion 32c and the guide member 43 flows into the annular groove 59a and is discharged from the outer plasma discharge port 59b.

  The inner plasma recovery path 60 opens toward the second reaction field 42 formed in the space 62 between the peripheral wall portion 32 c and the guide member 43 and the space 63 between the guide member 43 and the lamp cover glass 44. And the inner plasma discharge port 60a that communicates with a relatively high position of the storage portion 64. The plasma-like substance 36 that has passed through the space 63 between the guide member 43 and the lamp cover glass 44 flows into the storage portion 64 and is discharged from the inner plasma discharge port 60a.

  The water / aqueous solution recovery path 61 includes a storage unit 64 and a water / aqueous solution recovery discharge port 61 a communicating with a relatively low position of the storage unit 64. The water or aqueous solution 34 that has passed through the space 62 between the peripheral wall portion 32c and the guide member 43 and the space 63 between the guide member 43 and the lamp cover glass 44 flows into the storage portion 64, and the water / aqueous solution recovery discharge port 61a. Discharged from. That is, the reservoir 64 is shared by the inner plasma recovery path 60 and the water / aqueous solution recovery path 61, and the plasma-like substance 36 and the water or aqueous solution 34 that have flowed in are separated from each other by gas-liquid separation. It discharges from the water / aqueous solution recovery outlet 61a.

  The phase interface reactor 31 is provided with an inert gas replacement means 65 that replaces the air in the lamp cover glass 44 with an inert gas. The inert gas replacement means 65 is a cylinder in which an inert gas such as helium, nitrogen, argon or the like is stored in a pressurized state. The inert gas replacement means 65 and the reaction vessel 32 are connected by a pipe 66. That is, the inert gas supplied from the inert gas replacement means 65 is supplied to the inert gas supply port 67 of the upper end portion 32a of the reaction vessel 32 through the pipe 66, and the inert gas supply provided in the upper end portion 32a. It is supplied to the space 69 between the ultraviolet irradiation means 38 and the lamp cover glass 44 through the path 68, and the air in the space 69 is replaced with an inert gas. The air pushed out from the space 69 between the ultraviolet irradiation means 38 and the lamp cover glass 44 and the inert gas supplied to the space 69 are exhausted from above the space 69. Thereby, the airtightness in the lamp cover glass 44 can be maintained high and the inert gas can be filled, and when the plasma substance 36 is recovered, mixing with the inert gas can be avoided. However, for example, the air and the inert gas may be discharged from the storage portion 64 of the inner plasma recovery path 60 through the inner plasma discharge port 60a.

  The inert gas replacement means 65 is used before the production of the reaction product by the phase interface reaction device 31, and the inside of the lamp cover glass 44 is previously set to an inert gas atmosphere. If oxygen is present in the lamp cover glass 44, ozone is generated by the ultraviolet rays 37 irradiated by the ultraviolet irradiation means 38, and the permeability of the ultraviolet rays 37 is deteriorated. By making the inside of the lamp cover glass 44 an inert gas atmosphere by the gas replacement means 65, it is possible to prevent the deterioration of the transmittance of the ultraviolet rays 37.

  The reaction product manufacturing method using the phase interface reaction according to the present invention performed by such a phase interface reaction apparatus 31 includes a plasma supply step of supplying a plasma substance 36 into the reaction vessel 32, and a reaction vessel 32. A water / aqueous solution supplying step for supplying water or an aqueous solution 34 therein, and an ultraviolet irradiation step for irradiating the plasma-like substance 36 in the reaction vessel 32 with ultraviolet rays 37 by ultraviolet irradiation means 38. The plasma-like substance 36 and water or the solute contained in the aqueous solution 34 are reacted at the phase interface, and a first reaction field that directly receives the ultraviolet rays 37 irradiated by the ultraviolet irradiation means 38 is formed as a reaction field for forming the phase interface. A first reaction field 40 in which a phase interface 39 is formed, and a second reaction field 42 in which a second phase interface 41 that receives ultraviolet rays 37 passing through the first reaction field 40 is formed, It is intended to be formed.

  In the present embodiment, water or an aqueous solution 34 is caused to flow through the first phase interface 39 on the front side surface 43 a that is desired in the ultraviolet irradiation means 38 of the guide member 43 that is accommodated in the reaction vessel 32 and can pass the ultraviolet rays 37. The first phase interface 39 is formed as a first reaction field 40 in which a reaction between the plasma substance 36 and a solute contained in water or the aqueous solution 34 occurs. In addition, the second phase interface 41 is formed by flowing water or an aqueous solution 34 through the back side surface 43 b of the guide member 43, and the second phase interface 41 is included in the plasma substance 36 and the water or aqueous solution 34. The second reaction field 42 in which a reaction with the solute is generated.

  Further, the light emitting portion 38 a of the ultraviolet irradiation means 38 has a cylindrical shape, and the guide member 43 has a cylindrical shape surrounding the light emitting portion 38 a of the ultraviolet irradiation means 38. Further, as shown in FIG. 6, the ultraviolet rays 37 that have passed through the first phase interface 39 are reflected in the reaction vessel 32 and applied to the second phase interface 41.

(Plasma supply process)
The plasma substance 36 supplied from the plasma supply means 33 to the plasma supply port 46 of the reaction vessel 32 through the pipe 45 passes through the inner plasma communication path 47d or the outer plasma communication path 47c of the plasma supply path 47 to the inner annular space 47a or the outer side. It is guided to the annular space 47b. The plasma-like substance 36 guided to the inner annular space 47 a is supplied to the first reaction field 40 and flows down while causing a phase interface reaction with water or the aqueous solution 34, and is stored in the inner plasma recovery path 60. After gas-liquid separation by the unit 64, the gas is collected from the inner plasma outlet 60a. On the other hand, the plasma-like substance 36 guided to the outer annular space 47 b is supplied to the second reaction field 42 and flows down while causing a phase interface reaction with water or the aqueous solution 34, and the annular substance of the outer plasma recovery path 59 is formed. It flows from the groove 59a to the outer plasma discharge port 59b and is collected.

(Water / aqueous solution supply process)
The water or aqueous solution 34 supplied from the water / aqueous solution supply means 35 for the first reaction field 40 to the inner water supply port 54 of the reaction vessel 32 through the pipe 53 passes through the inner water supply path 55 to the first reaction field 40. After being supplied and flowing down while causing a phase interface reaction with the plasma-like substance 36, gas-liquid separation is performed in the storage section 64 of the water / aqueous solution recovery path 61, and then recovered from the water / aqueous solution recovery outlet 61 a. .

  Further, the water or aqueous solution 34 supplied from the water / aqueous solution supply means 35 for the second reaction field 42 to the outer water supply port 57 of the reaction vessel 32 through the pipe 56 passes through the outer water supply path 58 to the second reaction field 42. , And flows down while causing a phase interface reaction with the plasma-like substance 36, and is separated from the gas / liquid in the reservoir 64 of the water / aqueous solution recovery path 61, and then recovered from the water / aqueous solution recovery outlet 61 a. Is done.

(Recovery of reaction products)
The reaction product generated by the phase interface reaction in the first and second reaction fields 40 and 42 is recovered together with the water or the aqueous solution 34 for the water or aqueous solution 34 and does not dissolve in the water or the aqueous solution 34. Things are recovered together with the plasma-like substance 36.
The recovered water or aqueous solution 34 or plasma substance 36 may be supplied to the phase interface reactor 31 again. In this case, the concentration of the reaction product can be increased.

(UV irradiation process)
Since the first reaction field 40 can be directly irradiated with the ultraviolet rays 37 from the ultraviolet irradiation means 38, it is possible to cause the reaction after exciting the water or the aqueous solution 34 in advance with the ultraviolet rays 37. Can be improved. Further, the ultraviolet rays 37 that have passed through the first reaction field 40, that is, the guide member 43, are reflected by the reflection part 32 g provided on the peripheral wall part 32 c and are irradiated to the second reaction field 42. Therefore, also in the second reaction field 42, the reaction can be caused after the water or the aqueous solution 34 is excited in advance by the ultraviolet rays 37, and the reaction rate can be improved. That is, the ultraviolet rays 37 irradiated by the ultraviolet irradiation means 38 can be effectively used for the phase interface reaction, and the reaction efficiency can be improved. In general, instead of the ultraviolet ray 37 having a wavelength of 10 nm to 400 nm, an electron beam or electromagnetic wave (including radiation) having a shorter wavelength than the ultraviolet ray 37 can be used. Therefore, “ultraviolet rays” in the present application can be read as “ultraviolet rays or electron beams or electromagnetic waves having shorter wavelengths”.

  In the phase interface reaction apparatus 31, the light emitting part 38a of the ultraviolet irradiation means 38 has an elongated cylindrical shape, and a cylindrical guide member 43 is disposed so as to surround the light emitting part 38a, and the first and second reaction fields 40, 42 are disposed. The flow of the water or aqueous solution 34 and the plasma-like substance 36 is formed along the light emitting portion 38a. Therefore, the ultraviolet rays 37 can be irradiated over the entire first and second reaction fields 40 and 42, and the reaction efficiency can be improved.

  Further, the phase interface reaction device 31 surrounds the light emitting portion 38a of the ultraviolet irradiation means 38 with a guide member 43, and applies all the irradiated ultraviolet rays 37 to the first and second reaction fields 40 and 42. Yes. Therefore, the ultraviolet rays 37 irradiated from the ultraviolet irradiation means 38 can be used effectively, and the reaction efficiency can be improved.

  In the above description, water or an aqueous solution 34 is supplied to both the first reaction field 40 and the second reaction field 42 to cause a phase interface reaction, but only in the first reaction field 40. Water or an aqueous solution 34 may be supplied to cause a phase interface reaction. That is, only the first reaction field 40 may be used.

(Description of plasma supply process)
In the plasma supply process, the plasma substance 36 is supplied into the reaction vessel 32 by operating the plasma supply means 33. Here, when oxygen gas (oxygen molecules) is supplied to the plasma supply means 33, as oxygen plasma (plasma-like oxygen), ozone (O ₃ ) and oxygen atoms (O), and other oxygen molecules, ionized ions and electrons. And the like are supplied to the reaction vessel 32 through a pipe. When nitrogen gas (nitrogen molecules) is supplied to the plasma supply means 33, a mixture of nitrogen atoms (N), other nitrogen molecules, ionized ions and electrons is supplied to the reaction vessel 32 as nitrogen plasma (plasma-like nitrogen). The When carbon dioxide is supplied to the plasma supply means 33, a mixture of carbon monoxide, carbon atoms, oxygen atoms, carbon dioxide, and other ions and electrons is supplied to the reaction vessel 32 as carbon oxide plasma (plasma-like carbon oxide). Supplied. Further, the substance supplied to the reaction vessel 32 in the plasma state is not limited to these inorganic substances, and may be other organic substances (hydrocarbon, alcohol, ammonia, etc.). Furthermore, only one kind of substance may be converted into plasma, or a mixture of two or more kinds of substances (for example, air) may be converted into plasma and supplied to the reaction vessel 32.

  The supply speed of the plasma substance 36 to the reaction vessel 32 is not particularly limited and is appropriately set according to the apparatus size and the like, and can be, for example, about 0.1 L / min to 100 L / min.

(Explanation about UV irradiation process)
By irradiation with ultraviolet rays 37, the plasma substance 36 and water (or a solute contained in the aqueous solution) react at the phase interface in the reaction vessel 32. Thus, since the plasma substance 36 and the solute contained in water or the aqueous solution 34 are reacted at the phase interface between the plasma phase and the liquid phase in contact with the plasma phase, the contact area of the two components is wide and high efficiency. The reaction can be carried out with

When plasma oxygen (so-called oxygen plasma containing ozone) is used as the plasma substance 36, the following reaction proceeds.
O ₃ + hν (UV) → ³ O ₂ + O (1)
O + H ₂ O + hν (UV) → 2HO · (2)
³ O ₂ + HO · → HOOO · (3)
HOOO · + hν (UV) → ¹ O ₂ + HO · (4)
That is, hydroxy radicals (OH radicals) are generated by the reactions (1) and (2), and singlet oxygen is further generated by the reactions (3) and (4). Hydroxy radicals and singlet oxygen are examples of reaction products generated by phase interface reactions.

  When plasma-like nitrogen is used as the plasma-like substance 36, nitrogen atoms (plasma) react with water at the phase interface when irradiated with ultraviolet rays 37 to generate ammonia and the like. Ammonia is an example of a reaction product generated by a phase interface reaction. Here, when the generated ammonia is further supplied to a plasma generator (discharge device), it can be decomposed to obtain hydrogen molecules (and nitrogen molecules) (decomposition reaction step). Thus, hydrogen molecules can be obtained from nitrogen (air) and water as raw materials via ammonia.

  The method of synthesizing ammonia using the phase interface reaction is a phenomenon in which the atomic gas generated in the plasma is efficiently supplied with dissociated protons by itself at the phase interface with water (plasma / water phase interface). It is a synthesis method that uses air or nitrogen and water as raw materials. When nitrogen molecules are passed through the discharge space of the plasma generator, nitrogen is turned into plasma. When the phase interface between the nitrogen plasma and water is rapidly formed, ammonia is generated. When the nitrogen plasma / water phase interface is irradiated with ultraviolet rays 37 to impart reaction energy, the ammonia synthesis efficiency is further improved.

Ammonia is a gas at normal pressure, but its water solubility is very high (at 20 ° C., NH ₃ 702 g / H ₂ O 100 g). For this reason, the synthesized ammonia is dissolved in the aqueous phase (a part of the ammonia exists in the atmosphere as a gas depending on the conditions of the reaction system). Therefore, the synthesized ammonia can be easily recovered by dissolving the aqueous phase. In addition, since the dissolution rate greatly decreases at high temperatures (eg, the dissolution rate is 1/8 at 100 ° C. when it is 20 ° C.), it can be easily recovered as a gas depending on the reaction system conditions.

  Although the well-known Harbor Bosch method synthesizes ammonia at a high temperature, a high pressure, and a catalyst system for a long time, the above-mentioned phase interface reaction can proceed at room temperature, normal pressure, and no catalyst. Therefore, it is extremely advantageous in that the ammonia synthesis reaction can be advanced with a small amount of energy input. With this technology, raw materials can be procured everywhere (no transportation is required), ammonia can be synthesized using air and water as raw materials, and the raw material costs are extremely low. Is not required, the equipment is light at normal temperature and pressure, low energy reaction system (non-equilibrium chemical reaction system at the phase interface), and there is no need to generate hydrogen from hydrocarbon fuel Therefore, it has great advantages such as being able to significantly reduce energy costs. When ammonia is synthesized from air and water, since oxygen exists in the air, nitrogen plasma and oxygen plasma react to generate a small amount of NO in the gas phase. However, NO is not dissolved at all in the aqueous phase and can be easily exhausted as a gas, so it is considered that NO does not mix with ammonia in the liquid phase. It is considered that the fact that NO water solubility is remarkably lower than that of ammonia is advantageous in that it is not necessary to separate NO, and ammonia can be produced inexpensively and safely.

  In the case where plasma-like carbon oxide (carbon monoxide, carbon dioxide) is used as the plasma-like substance 36, organic substances such as hydrocarbons and alcohols can be synthesized by reaction with water or the like. A plurality of substances, for example, nitrogen and oxygen (air) may be used in the form of plasma.

  Next, a second embodiment of the phase interface reaction apparatus according to the present invention will be described. In addition, it demonstrates centering around difference with the phase interface reactor 31 in 1st Embodiment, and abbreviate | omits description about the same matter.

  FIG. 7 shows a second embodiment of the phase interface reactor 31. In the phase interface reaction apparatus 31 of the second embodiment, a portion desired for the guide member 43 of the reaction vessel 32, that is, the peripheral wall portion 32c is a transmission portion 32h through which the ultraviolet rays 37 passing through the guide member 43 can pass. A plurality of reaction vessels 32, ultraviolet irradiation means 38, and guide members 43 are provided as a unit. A plurality of unitized device units 70 are arranged with the transmission part 32 h facing each other, and the ultraviolet light 37 transmitted through the transmission part 32 h of one device unit 70 is transmitted to the second phase interface 41 of the other device unit 70. I try to hit it.

  That is, in the phase interface reaction apparatus 31 in the first embodiment, the peripheral wall portion 32c of the reaction vessel 32 is made of, for example, a stainless steel pipe to form the reflection portion 32g, and the ultraviolet rays 37 that have passed through the guide member 43 are transmitted to the second reaction field 42. In the phase interface reaction device 31 in the second embodiment, the peripheral wall portion 32c of the reaction vessel 32 is a transmission portion 32h through which the ultraviolet rays 37 can be transmitted, and the ultraviolet rays 37 passing through the guide member 43 are reflected. Is applied to the second reaction field 42 of the adjacent device unit 70.

  That is, in the phase interface reaction apparatus 31 in the first embodiment, the ultraviolet rays 37 that have passed through the guide member 43 are used for the phase interface reaction in the same reaction vessel 32, but the phase interface in the second embodiment is used. In the reaction device 31, the ultraviolet rays 37 that have passed through the guide member 43 are used for the phase interface reaction in another reaction vessel 32. By arranging a plurality of device units 70, it is possible to mutually use the ultraviolet rays 37 between the adjacent device units 70.

  In this phase interface reaction apparatus 31 as well, as in the phase interface reaction apparatus 31 of the first embodiment, the ultraviolet rays 37 that have passed through the guide member 43 can be effectively used for the phase interface reaction, and the reaction efficiency is improved. Can do.

[Plant cultivation equipment]
A plant cultivation apparatus according to the present invention will be described. In FIG. 8, 1st Embodiment of a plant cultivation apparatus is shown. The plant cultivation device 71 includes a phase interface reaction device 31 and a liquid fertilizer supply means 74 that supplies the plant 73 with a liquid manure 72 containing a reaction product generated by the phase interface reaction device 31. The plant 73 is hydroponically cultivated. Many plants 73 are supported by the support member 76 in the cultivation container 75. A liquid fertilizer 72 as a culture solution is filled in a space below the support member 76 where the plant 73 extends its root.

  In this embodiment, since the culture liquid containing nitrogen is used as the liquid fertilizer 72, ammonia is produced by the phase interface reaction apparatus 31 and supplied to the culture liquid adjustment tank 77. That is, nitrogen gas is supplied from the nitrogen supply source 49 to the plasma supply means 33, and plasma nitrogen is generated by the plasma supply means 33 and supplied to the reaction vessel 32. Ammonia produced by the phase interface reaction in the reaction vessel 32 is water-soluble and is recovered together with water or an aqueous solution 34. The ammonia-containing water or aqueous solution 34 is supplied to the culture solution adjustment tank 77 through the pipe 78.

  The component of the liquid fertilizer 72 in the culture broth adjustment tank 77 is monitored by a sensor 79. When the nitrogen component of the liquid fertilizer 72 is insufficient, the phase interface reaction device 31 is activated to cause the nitrogen component (ammonia) to enter the culture broth adjustment tank 77. Supplied. Thereby, the nitrogen component density | concentration in the liquid fertilizer 72 as a culture solution is adjusted appropriately, and is maintained. The liquid fertilizer 72 adjusted in the culture liquid adjustment tank 77 is supplied to the cultivation container 75 by the liquid fertilizer supply means 74, whereby the liquid fertilizer 72 is transferred to the culture liquid adjustment tank 77 → liquid fertilizer supply means 74 → cultivation container 75 → culture liquid adjustment tank. Cycle to 77.

  Thus, in the plant cultivation apparatus 71, the liquid fertilizer 72 containing the ammonia (reaction product) manufactured by the phase interface reaction apparatus 31 can be given to the plant 73. Since the plant cultivation apparatus 71 includes the phase interface reaction apparatus 31, ammonia can be generated on site to adjust the nitrogen component of the liquid fertilizer 72. For this reason, the nitrogen component adjustment of the liquid fertilizer 72 becomes extremely easy. Moreover, it is not necessary to install large-scale equipment for adjusting the nitrogen component of the liquid fertilizer 72.

  Next, a second embodiment of the plant cultivation apparatus will be described. In FIG. 9, 2nd Embodiment of a plant cultivation apparatus is shown. The plant cultivation device 71 includes a phase interface reaction device 31 and a liquid fertilizer supply means 74 that supplies the plant 73 with a liquid manure 72 containing a reaction product generated by the phase interface reaction device 31. The plant 73 is cultivated in hydroponic soil. Many plants 73 are planted in the soil as the medium 80. A tube 81 is provided along the root of each plant 73. The tube 81 is provided with a hole (not shown) for supplying the liquid fertilizer 72 near the root of each plant 73.

  Also in this embodiment, since the culture liquid containing nitrogen is used as the liquid fertilizer 72, ammonia is produced by the phase interface reaction apparatus 31 and supplied to the culture liquid adjustment tank 77. That is, nitrogen gas is supplied from the nitrogen supply source 49 to the plasma supply means 33, and plasma nitrogen is generated by the plasma supply means 33 and supplied to the reaction vessel 32. Ammonia produced by the phase interface reaction in the reaction vessel 32 is water-soluble and is recovered together with water or an aqueous solution 34. The ammonia-containing water or aqueous solution 34 is supplied to the culture solution adjustment tank 77 through the pipe 78.

  The component of the liquid fertilizer 72 in the culture broth adjustment tank 77 is monitored by a sensor 79. When the nitrogen component of the liquid fertilizer 72 is insufficient, the phase interface reaction device 31 is activated to cause the nitrogen component (ammonia) to enter the culture broth adjustment tank 77. Supplied. Thereby, the nitrogen component density | concentration in the liquid fertilizer 72 as a culture solution is adjusted appropriately, and is maintained. The liquid fertilizer 72 adjusted in the culture liquid adjusting tank 77 is supplied to the tube 81 by the liquid fertilizer supply means 74 and is supplied little by little from the hole provided in the vicinity of the root of each plant 73 to the vicinity of the root of each plant 73.

  Thus, in the plant cultivation apparatus 71, the liquid fertilizer 72 containing the ammonia (reaction product) manufactured by the phase interface reaction apparatus 31 can be given to the plant 73. Since the plant cultivation apparatus 71 includes the phase interface reaction apparatus 31, ammonia can be generated on site to adjust the nitrogen component of the liquid fertilizer 72. For this reason, the nitrogen component adjustment of the liquid fertilizer 72 becomes extremely easy. Moreover, it is not necessary to install large-scale equipment for adjusting the nitrogen component of the liquid fertilizer 72.

  In the above description, the plant cultivation apparatus 71 of the present invention is used for hydroponics and hydroponic cultivation, but it can also be applied to other cultivation methods of hydroponic cultivation and hydroponic cultivation. For example, ozone water can also be generated as a reaction product by supplying oxygen gas to the plasma supply means 33 instead of the above nitrogen and air. The generated ozone water can be used for sterilization of piping and the like in a plant factory. As a result, it is possible to grow plants in aseptic conditions and prevent the occurrence of diseases. Ammonia, aqueous ammonia, ozone, ozone water, etc. are examples of reaction products.

  FIG. 10 shows a method (A) in which ammonia is generated by generating a nitrogen plasma gas by discharge and causing a phase interface reaction between the nitrogen plasma phase and the water phase without irradiation with ultraviolet rays. A method (B) in which the phase interface reaction is irradiated with ultraviolet rays (185 nm + 254 nm) to generate ammonia by irradiating the phase interface reaction field with ultraviolet rays (185 nm + 254 nm), and then the ultraviolet phase (185 nm + 254 nm) is irradiated for 1200 seconds. It is the graph which compared with the method (C) which performs a phase interface reaction by the method similar to B), and produces | generates ammonia. Other detailed conditions are as shown in FIG. In all experiments, the produced ammonia was analyzed and quantified with an ion chromatograph apparatus (manufactured by Shimadzu Corporation).

  As a result, the amount of ammonia produced is larger in the case of irradiation with ultraviolet rays (B, C) than in the case of not irradiating with ultraviolet rays (A), and before the water is introduced into the phase interface reaction field, ultraviolet rays are introduced into the water. It was found that the amount of ammonia produced was higher in (C) excited by irradiation with (C) than in (B) without such pre-excitation. This result supports the effect of increasing the reaction product by forming the first reaction field 40 and the second reaction field 42 as in the present invention.

  In the above embodiment, the plasma supply means 33 for supplying the plasma substance 36 into the reaction vessel 32 is disposed outside the reaction vessel 32. However, it may be provided inside the reaction vessel 32 as follows. it can. For example, when water or an aqueous solution supplied to the first reaction field 40 (or the second reaction field 42) or a counter electrode is disposed across the guide member 43 and a high voltage is applied between the counter electrodes, Plasma is generated by discharge in the reaction fields 40 and 42. By such a method, the plasma supply means may exist inside the reaction vessel 32. Furthermore, plasma supply means may exist both inside and outside the reaction vessel 32.

  The present invention can be used for the production of ammonia water, ozone water and the like. It can also be used for plant cultivation.

31 Phase interface reaction device 32 Reaction vessel 32g Reflection unit 32h Transmission unit 33 Plasma supply unit 34 Water or aqueous solution 35 Water / aqueous solution supply unit 36 Plasma-like substance 37 Ultraviolet ray 38 Ultraviolet irradiation unit 38a Light emission unit 39 of ultraviolet irradiation unit First Phase interface 40 First reaction field 41 Second phase interface 42 Second reaction field 43 Guide member 43a Front side surface 43b of guide member Back side surface 70 of guide member Device unit 71 Plant cultivation device 72 Liquid fertilizer 73 Plant 74 Liquid fertilizer supply means

Claims (12)

A plasma supply step for supplying a plasma-like substance into the reaction vessel;
A water / aqueous solution supply step of supplying water or an aqueous solution into the reaction vessel;
An ultraviolet irradiation step of irradiating the plasma substance in the reaction vessel with ultraviolet rays by ultraviolet irradiation means;
Have
A reaction product manufacturing method using a phase interface reaction in which the plasma substance and a solute contained in the water or an aqueous solution are reacted at a phase interface in the reaction vessel,
As a reaction field where the phase interface is formed,
A first reaction field in which a first phase interface that directly receives ultraviolet rays irradiated by the ultraviolet irradiation means is formed;
A second reaction field in which a second phase interface is formed that receives ultraviolet light passing through the first reaction field;
The reaction product manufacturing method which forms. Forming the first phase interface by flowing the water or the aqueous solution on the front side desired in the ultraviolet irradiation means of the guide member accommodated in the reaction vessel and capable of passing the ultraviolet rays;
The method for producing a reaction product according to claim 1, wherein the second phase interface is formed by flowing the water or an aqueous solution on the back side surface of the guide member. The light emitting part of the ultraviolet irradiation means has a cylindrical shape,
The reaction product manufacturing method according to claim 2, wherein the guide member has a cylindrical shape surrounding a light emitting portion of the ultraviolet irradiation means.   4. The method for producing a reaction product according to claim 1, wherein the ultraviolet light that has passed through the first phase interface is reflected in the reaction vessel and applied to the second phase interface. 5. A plurality of apparatus units for carrying out the reaction product production method according to any one of claims 1 to 3,
The reaction product manufacturing method which irradiates the ultraviolet-ray which passed through the said 1st phase interface of one apparatus unit to the said 2nd phase interface of another apparatus unit. A reaction vessel;
Plasma supply means for supplying a plasma substance into the reaction vessel;
Water / aqueous solution supply means for supplying water or an aqueous solution into the reaction vessel;
Ultraviolet irradiation means for irradiating the plasma substance in the reaction container with ultraviolet rays;
With
A phase interface reaction apparatus for reacting the plasma substance and a solute contained in water or an aqueous solution at a phase interface in the reaction vessel,
As a reaction field where the phase interface is formed,
A first reaction field in which a first phase interface that directly receives ultraviolet rays irradiated by the ultraviolet irradiation means is formed;
A second reaction field that is provided on the opposite side of the ultraviolet irradiation means across the first reaction field and that forms a second phase interface that receives the ultraviolet light that has passed through the first reaction field;
A phase interface reaction apparatus having: The first phase interface is formed by flowing the water or aqueous solution to the front side surface desired for the ultraviolet irradiation means of the guide member accommodated in the reaction vessel and capable of passing the ultraviolet rays,
The phase interface reaction apparatus according to claim 6, wherein the second phase interface is formed by flowing the water or the aqueous solution on a back side surface of the guide member. The light emitting part of the ultraviolet irradiation means has a columnar shape,
The phase interface reaction apparatus according to claim 7, wherein the guide member has a cylindrical shape surrounding a light emitting portion of the ultraviolet irradiation means.   The phase interface reaction apparatus according to claim 7 or 8, wherein the reaction container includes a reflection unit configured to reflect ultraviolet rays that have passed through the guide member toward the second phase interface. The desired part of the guide member of the reaction vessel is a transmission part capable of transmitting ultraviolet light that has passed through the guide member,
The reaction vessel, the ultraviolet irradiation means and the guide member are provided as a unit,
A plurality of the units are arranged with the transmission portions facing each other,
The phase interface reaction apparatus of Claim 7 or 8 which irradiates the ultraviolet-ray which permeate | transmitted the said permeation | transmission part of one unit to the said 2nd phase interface of another unit.   The plant cultivation method which gives the plant the liquid fertilizer containing the reaction product produced | generated by the phase interface reaction of any one of Claim 1 to 5. A phase interface reactor according to any one of claims 6 to 10,
Liquid fertilizer supply means for giving a plant liquid fertilizer containing a reaction product generated by the phase interface reaction apparatus;
A plant cultivation apparatus comprising: