JP2018193933A - Information processor, reference data determination device, information processing method, reference data determination method and program - Google Patents

Abstract

To stop a vacuum pump during a manufacturing process to reduce a risk of inflicting heavy damage on a product during the manufacturing process.SOLUTION: An information processor has a comparison unit configured to: refer to a storage unit where an operation continuity common condition is stored as reference data, the operation continuity common condition extracted from tendency of abnormal data detected in data showing state quantity of an operation-continuable vacuum pump; compare the reference data stored in the storage unit with tendency of abnormal data detected from data showing state quantity of a vacuum pump being operated; and output the comparison result.SELECTED DRAWING: Figure 5

Description

  The present invention relates to an information processing device, a reference data determination device, an information processing method, a reference data determination method, and a program.

  In a semiconductor manufacturing apparatus, a vacuum pump that exhausts gas used in a semiconductor manufacturing process from the chamber for the purpose of creating a vacuum environment in the chamber is widely used. As such a vacuum pump, a positive displacement type vacuum pump provided with a roots type or screw type pump rotor is known.

  In general, a positive displacement vacuum pump includes a pair of pump rotors disposed in a casing and a motor for rotationally driving the pump rotor. A minute clearance is formed between the pair of pump rotors and between the pump rotor and the inner surface of the casing, and the pump rotor is configured to rotate without contact with the casing. The pair of pump rotors rotate in opposite directions while being synchronized with each other, whereby the gas in the casing is transferred from the suction side to the discharge side, and the gas is exhausted from a chamber or the like connected to the suction port.

  Gases used in semiconductor manufacturing processes, or substances generated by chemical reaction of gases used include those that contain components that solidify or liquefy when the temperature decreases. Usually, the vacuum pump described above generates compression heat in the process of transferring gas, so the vacuum pump in operation is at a certain high temperature. In the case where the temperature is not raised above the solidification or liquefaction temperature of the components in the gas or the product by the high temperature by the compression heat, the high temperature of the vacuum pump is maintained by externally heating the pump body or heating the inflowing gas. Even when the gas containing the above-described components is exhausted using the vacuum pump, satisfactory vacuum exhaust is performed without solidifying or liquefying the components or generated substances in the gas.

  However, there is a semiconductor manufacturing process in which liquefaction and solidification of the gas used or the product material from the gas used cannot be prevented by increasing the temperature of the vacuum pump described above. If the operation of the vacuum pump in this step is continued, the solidified product (reaction product) accumulates between the pump rotors and in the gap between the pump rotor and the casing. As this product builds up, the vacuum pump is overloaded during the operation of the vacuum pump, causing the vacuum pump to stop during the manufacturing process, causing significant damage to the product during the manufacturing process. become.

  In order to prevent such damage, Patent Document 1 discloses that an alarm is generated when the integral value or average value of the motor current exceeds a threshold value. Patent Document 2 discloses that a signal from a sensor unit including at least an AE sensor that detects AE (acoustic emission) generated by a vacuum pump is analyzed and diagnosed.

Special table 2008-534831 gazette JP-A-11-62846

  However, there remains a need for a technique that reduces the risk of the vacuum pump being stopped during the manufacturing process and causing significant damage to the product being manufactured.

  The present invention has been made in view of the above problems, and an information processing apparatus and a standard that can reduce a risk that a vacuum pump stops during a manufacturing process and causes great damage to a product in the manufacturing process. An object is to provide a data determination device, an information processing method, a reference data determination method, and a program.

  The information processing apparatus according to the first aspect of the present invention determines the possibility of continuing operation determined using the tendency of abnormal data detected in the state quantity data of the vacuum pump that can continue operation. The trend of abnormal data detected from the data of the state quantity of the operating vacuum pump is compared with the reference data stored in the storage unit with reference to the storage unit storing the reference data of A comparison unit for outputting the comparison result is provided.

  According to this configuration, since it is possible to grasp the continuation of operation when the vacuum pump reaches failure, it is possible to reduce the risk that the vacuum pump stops during the manufacturing process and causes great damage to the product during the manufacturing process. .

  An information processing apparatus according to a second aspect of the present invention is the information processing apparatus according to the first aspect, wherein the comparison unit determines the possibility of continued operation of the vacuum pump as a result of the comparison, and determines The result is output as the comparison result.

  According to this configuration, since the possibility of continuing the operation of the vacuum pump is output, the administrator of the vacuum pump can grasp the possibility of continuing the operation of the vacuum pump.

  An information processing apparatus according to a third aspect of the present invention is the information processing apparatus according to the second aspect, wherein the storage unit stores the attribute of the vacuum pump and the reference data in association with each other. The comparison unit compares the tendency of abnormal data detected from the state quantity of the operating vacuum pump and the reference data stored in the storage unit in association with the attribute of the operating vacuum pump. To do.

  According to this structure, since it can compare for every attribute of a vacuum pump, the determination precision of the possibility of continuous operation can be improved.

  An information processing apparatus according to a fourth aspect of the present invention is the information processing apparatus according to any one of the first to third aspects, wherein the storage unit includes a film forming process of the semiconductor manufacturing apparatus and the reference data. Are stored in association with each other, and the comparison unit is a semiconductor manufacturing device in which the trend of abnormal data detected from the state quantity of the operating vacuum pump is connected to the operating vacuum pump in the storage unit. The reference data stored in association with the current film forming process of the apparatus is compared.

  According to this structure, since it can compare for every film-forming process of a semiconductor manufacturing apparatus, the determination precision of the possibility of an operation continuation can be improved.

  An information processing apparatus according to a fifth aspect of the present invention is the information processing apparatus according to any one of the first to fourth aspects, wherein the comparison unit includes a value based on a state quantity of the vacuum pump in operation. Then, control is performed so as to compare the statistical amount of the value based on the state quantity of the set period of the vacuum pump capable of continuing operation and to notify according to the comparison result.

  According to this configuration, it is possible to notify when the state quantity of the operating vacuum pump is away from the state quantity of the vacuum pump capable of continuing operation, and maintenance or replacement of the vacuum pump is performed before the vacuum pump breaks down. be able to.

  An information processing apparatus according to a sixth aspect of the present invention is the information processing apparatus according to any one of the first to fifth aspects, wherein the comparison unit is configured to generate an abnormality occurrence number of the state quantity of the vacuum pump during operation. And the statistic of the number of occurrences of abnormality of the state quantity in the set period of the vacuum pump that can be continuously operated, and control is performed so as to notify according to the comparison result.

  According to this configuration, it is possible to notify when the state quantity of the operating vacuum pump is away from the state quantity of the vacuum pump capable of continuing operation, and maintenance or replacement of the vacuum pump is performed before the vacuum pump breaks down. be able to.

  An information processing device according to a seventh aspect of the present invention is the information processing device according to any one of the first to sixth aspects, wherein the comparison unit is configured to generate an abnormality in the state quantity of the vacuum pump during operation. Control is performed to compare the interval and the statistical amount of the interval of occurrence of abnormality of the state quantity in the set period of the vacuum pump capable of continuing operation, and notify according to the comparison result.

  According to this configuration, it is possible to notify when the state quantity of the operating vacuum pump is away from the state quantity of the vacuum pump capable of continuing operation, and maintenance or replacement of the vacuum pump is performed before the vacuum pump breaks down. be able to.

  An information processing apparatus according to an eighth aspect of the present invention is the information processing apparatus according to any one of the fifth to seventh aspects, wherein the comparison unit is a semiconductor manufacturing apparatus to which the operating vacuum pump is connected. Processing is performed so as to change the notification timing according to the time of the manufacturing process or the number of manufacturing processes.

  According to this configuration, the notification timing can be changed according to the time of the manufacturing process or the number of manufacturing processes of the semiconductor manufacturing apparatus to which the operating vacuum pump is connected. For this reason, the risk of failure increases as the time of the manufacturing process or the number of manufacturing processes of the semiconductor manufacturing apparatus to which the operating vacuum pump is connected increases, but by increasing the timing of notification, the vacuum pump is The pump can be maintained or replaced.

  The reference data determination device according to the ninth aspect of the present invention refers to a trend of the abnormal data with reference to a storage unit in which abnormal data detected in the data of the state quantity of the vacuum pump capable of continuing operation is stored. Is provided with a determination unit that determines reference data for determining the possibility of continuation of driving.

  According to this configuration, since the reference data is created, when comparing with the trend of the abnormal data detected from the data of the state quantity of the vacuum pump during operation, by comparing with the reference data, The possibility of continuing operation can be determined.

  An information processing apparatus according to a tenth aspect of the present invention is the information processing apparatus according to the ninth aspect, wherein the determination unit determines the reference data for each attribute of the vacuum pump.

  According to this configuration, since the reference data is created for each attribute of the vacuum pump, when comparing with the trend of abnormal data detected from the state quantity data of the operating vacuum pump, the operating vacuum pump Can be compared with the reference data corresponding to the vacuum pump of the attribute to which it belongs. Thereby, the determination accuracy of the possibility of continuing operation of the vacuum pump can be improved.

  An information processing apparatus according to an eleventh aspect of the present invention is the information processing apparatus according to the ninth or tenth aspect, wherein the determining unit determines the reference data for each manufacturing process of the semiconductor manufacturing apparatus.

  According to this configuration, since the reference data is created for each manufacturing process of the semiconductor manufacturing apparatus, when the vacuum pump is compared with the tendency of abnormal data detected from the state quantity data of the operating vacuum pump, It can be compared with reference data corresponding to the manufacturing process of the connected semiconductor manufacturing apparatus. Thereby, the determination accuracy of the possibility of continuing operation of the vacuum pump can be improved.

  The information processing method according to the twelfth aspect of the present invention is to determine the possibility of continuing operation determined using the tendency of abnormal data detected in the state quantity data of the vacuum pump that can continue operation. The trend of abnormal data detected from the data of the state quantity of the operating vacuum pump is compared with the reference data stored in the storage unit with reference to the storage unit storing the reference data of And a step of outputting a comparison result.

  According to this configuration, it is possible to grasp the possibility of continuing the operation of the vacuum pump, and therefore it is possible to reduce the risk that the vacuum pump stops during the manufacturing process and causes great damage to the product during the manufacturing process. .

  In the reference data determination method according to the thirteenth aspect of the present invention, the trend of the abnormal data is referred to with reference to the storage unit storing the abnormal data detected in the data of the state quantity of the vacuum pump that can be continuously operated. And determining the reference data for determining the possibility of continued operation.

  According to this configuration, since the reference data is created, when comparing with the trend of the abnormal data detected from the data of the state quantity of the vacuum pump during operation, by comparing with the reference data, The possibility of continuing operation can be determined.

  The program according to the fourteenth aspect of the present invention determines the possibility of a failure determined by using the tendency of abnormal data detected in the data of the state quantity of the vacuum pump that can continue the operation of the computer. Compare the trend of abnormal data detected from the data of the state quantity of the operating vacuum pump and the reference data stored in the storage unit with reference to the storage unit storing the reference data for And a program for functioning as a comparison unit that outputs a comparison result.

  According to this configuration, it is possible to grasp the possibility of continuing the operation of the vacuum pump, and therefore it is possible to reduce the risk that the vacuum pump stops during the manufacturing process and causes great damage to the product during the manufacturing process. .

  The program according to the fifteenth aspect of the present invention refers to a trend of abnormal data by referring to a storage unit in which abnormal data detected in data of a state quantity of a vacuum pump capable of continuing operation of the computer is stored. Is a program for functioning as a determination unit that determines reference data for determining the possibility of failure arrival.

  According to this configuration, since the reference data is created, when comparing with the trend of the abnormal data detected from the data of the state quantity of the vacuum pump during operation, by comparing with the reference data, The possibility of continuing operation can be determined.

  According to one aspect of the present invention, the possibility of continuation of the operation of the vacuum pump can be grasped, so that the risk that the vacuum pump stops during the manufacturing process and causes great damage to the product during the manufacturing process is reduced. be able to.

1 is a schematic configuration diagram of a semiconductor manufacturing system 10 according to a first embodiment. 1 is a schematic functional configuration diagram of a vacuum pump 3 according to a first embodiment. It is a schematic structure figure of information processor 5 concerning a 1st embodiment. 4 is an example of a table T1 stored in the storage unit 53. It is a flowchart which shows an example of the flow of the comparison process which concerns on 1st Embodiment. It is a schematic block diagram of the reference | standard data determination apparatus 20 which concerns on the modification of 1st Embodiment. It is an example of table T2 memorize | stored in the memory | storage part 23. FIG. It is a flowchart which shows an example of the extraction process of the reference data which concerns on the modification of 1st Embodiment. It is a graph which shows an example of the relationship between the electric current effective value I of the motor 38 in a certain vacuum pump which can be drive | operated, and operation time. It is an example of a frequency graph of parameter α when the aggregate for the operation sustainable vacuum pump at the set time t _s has elapsed. It is a graph which shows the other example of the relationship between the electric current effective value I of the motor 38 in a certain vacuum pump which can be drive | operated, and driving | running time. When the aggregate error occurrence count up to the failure the operation continuable vacuum pump until the set time t _s has elapsed, which is an example of a frequency graph of abnormal occurrences. It is an example of the graph by which the time change of the statistic of the frequency | count of abnormality occurrence of the vacuum pump which returned without failing and the frequency | count of abnormality occurrence of the pump currently driving | operation was plotted. It is a graph which shows the 3rd example of the relationship between the electric current effective value I of the motor 38 in a certain vacuum pump which can be drive | operated, and driving | running time. When the aggregated abnormal interval of a predetermined period of set time t _s has elapsed immediately before the operation sustainable vacuum pump, which is an example of a frequency graph of the set time t _s has elapsed immediately before the abnormality occurs interval. It is an example of the time change of the interval of abnormality generation about the vacuum pump in operation. It is an example of the graph by which the time change of the statistics of the interval of the vacuum pump which returned without failing and the frequency | count of abnormal occurrence of the pump in operation are plotted. It is a graph which shows the 4th example of the relationship between the electric current effective value I of the motor 38, and driving | running time. It is a schematic block diagram of the semiconductor manufacturing system 10b which concerns on 2nd Embodiment. It is a schematic block diagram of the semiconductor manufacturing system 10c which concerns on 3rd Embodiment. It is a schematic block diagram of the semiconductor manufacturing system 10d which concerns on 4th Embodiment.

  Each embodiment will be described below with reference to the drawings.

(First embodiment)
First, the first embodiment will be described. In the first embodiment, the operation continuation common condition extracted from the tendency of abnormal data detected in the data of the state quantity of the vacuum pump that can continue operation is stored in the information processing device 5 as reference data. This will be explained as a premise. Here, the tendency of abnormal data includes the tendency and frequency of occurrence of abnormal data. Then, the information processing apparatus 5 according to the first embodiment compares the tendency of abnormal data detected from the data of the state quantity of the operating vacuum pump with the reference data, and outputs a comparison result.

FIG. 1 is a schematic configuration diagram of a semiconductor manufacturing system 10 according to the first embodiment. As shown in FIG. 1, a semiconductor manufacturing system 10 according to the present embodiment controls a semiconductor manufacturing apparatus 1, a vacuum pump 3, a pipe 2 connecting the semiconductor manufacturing apparatus 1 and the vacuum pump 3, and the vacuum pump 3. A control device 4, an information processing device 5, and a display device 6 connected to the information processing device 5 are provided. The semiconductor manufacturing apparatus 1 includes a film formation process chamber 11 and a control unit 12 that controls the film formation process chamber 11. The film forming process chamber 11 and the vacuum pump 3 communicate with each other via the pipe 2, and when the vacuum pump 3 is operated, the gas (gas) in the film forming process chamber 11 is exhausted and pulled to a substantially vacuum. There are CVD (Chemical Vapor Deposition), PVD (Physical Vapor Deposition), ALD (Atomic Layer Deposition), vapor deposition, and sputter film formation as types of film formation in the film formation process chamber 11.
The vacuum pump 3 may include a roots-type rotor, or may include a screw-type rotor. The vacuum pump 3 may be a claw type or scroll type vacuum pump. The vacuum pump 3 may be a single-stage pump or a multi-stage pump. An exhaust gas processing device is connected to the rear stage of the vacuum pump 3 on the exhaust side. The information processing apparatus 5 according to the present embodiment compares the tendency of abnormal data detected from the data of the state quantity of the operating vacuum pump and the reference data, and outputs the comparison result to the display device 6, for example.

  FIG. 2 is a schematic functional configuration diagram of the vacuum pump 3 according to the first embodiment. As shown in FIG. 2, the vacuum pump 3 is connected to a power source 36, an inverter 37 whose input is connected to the power source 36, a motor 38 whose input is connected to the output of the inverter 37, and a rotating shaft of the motor 38. And a rotor 39. The vacuum pump 3 includes a pressure gauge 35.

  The inverter 37 converts the frequency of the alternating current supplied from the power supply 36 and supplies the drive current obtained by the frequency conversion to the motor 38. As a result, the rotating shaft of the motor 38 is rotated by this drive current, and the rotor 39 is rotated accordingly, whereby the gas sucked from the pipe 2 is discharged. Thus, the gas in the film forming process chamber 11 connected to the pipe 2 is evacuated by continuously transferring the gas from the pipe 2.

  The motor 38 outputs a rotation speed signal indicating the rotation speed of the motor 38 to the inverter 37. For example, the inverter 37 supplies the information processing device 5 with the current effective value of the drive current and the rotation speed of the motor 38 obtained from the rotation speed signal. Further, the pressure value in the vacuum pump 3 measured by the pressure gauge 35 is supplied to the information processing device 5.

  FIG. 3 is a schematic configuration diagram of the information processing apparatus 5 according to the first embodiment. As illustrated in FIG. 3, the information processing apparatus 5 includes an input unit 51, an output unit 52, a storage unit 53, a memory 54, a calculation unit 55, and a communication unit 56.

  The input unit 51 is connected to the inverter 37 and the pressure gauge 35, and the effective current value of the drive current, the rotation speed of the motor 38, and the pressure value in the vacuum pump 3 are input to the input unit 51. The output unit 52 outputs a signal including information to the display device 6 in accordance with a command from the calculation unit 55. The storage unit 53 stores operation data. The calculation unit 55 includes a CPU (Central Processing Unit) 550, an abnormal data detection unit 551, a comparison unit 552, and a cache 553 in which a program is stored.

  The storage unit 53 stores reference data for determining the possibility of continued operation. Here, the reference data is determined by using the tendency of abnormal data detected in the state quantity data of the vacuum pump that can be continuously operated. As an example in the present embodiment, as shown in FIG. 4, the storage unit 53 stores the attribute of the vacuum pump 3 and the reference data in association with each other. FIG. 4 is an example of the table T1 stored in the storage unit 53. In the table T1, a set of attributes of the vacuum pump and reference data is stored. Here, the attributes of the vacuum pump include, for example, the type and model of the vacuum pump and / or the type or model of the semiconductor manufacturing apparatus connected to the vacuum pump, the serial number of the vacuum pump, or the parts (parts) constituting the vacuum pump. Part number.

  The memory 54 temporarily stores information. The communication unit 56 communicates with an external terminal device via a communication network. This communication may be wired or wireless. The CPU 550 reads and executes the program stored in the cache 553.

  The abnormal data detection unit 551 detects abnormal data from the state quantity data of the operating vacuum pump. Here, the abnormal data is, for example, an outlier from the normal range defined for each segmented process, a spike value that is not related to the process, or an abnormality in a change tendency with time of the entire process for each segmented process (for example, instantaneous Not the outlier data, but the overall trend of the segmented section for a certain period).

  The comparison unit 552 compares the tendency of abnormal data detected from the data of the state quantity of the operating vacuum pump detected by the abnormal data detection unit 551 with the reference data stored in the storage unit 53. The comparison result is output. Specifically, for example, the comparison unit 552 determines the possibility of continued operation of the vacuum pump as a result of the comparison, and outputs the determination result as a comparison result. Note that the processing in the comparison unit 552 may be calculated by the CPU 550. Further, the comparison unit 552 may be separately realized by an FPGA (field-programmable gate array) or a dedicated board.

  As described above, in the present embodiment, as an example, the storage unit 53 stores the attribute of the vacuum pump and the reference data in association with each other. The comparison unit 552 compares the tendency of abnormal data detected from the state quantity of the operating vacuum pump 3 with the reference data stored in the storage unit 53 in association with the attribute of the operating vacuum pump 3. May be.

  Next, the flow of comparison processing according to the first embodiment will be described with reference to FIG. FIG. 5 is a flowchart illustrating an example of a flow of comparison processing according to the first embodiment.

  (Step S101) First, the abnormal data detection unit 551 detects abnormal data from the state quantity data of the pump being operated.

  (Step S102) Next, the comparison unit 552 compares the tendency of the abnormal data with the reference data, and determines the possibility of continuing the operation of the vacuum pump 3.

  (Step S103) Next, the comparison unit 552 outputs the determination result of the possibility of continuing operation as a comparison result to the display device 6, for example.

Hereinafter, an example of a comparison method in the comparison unit 552 will be described.
(Comparison method 1)
For example, when the threshold value is stored in the storage unit 53 as the reference data, the comparison unit 552 may determine by comparing the threshold value that is the reference data with the number of occurrences of abnormal data of the operating vacuum pump. Here, the threshold value is set using, for example, the number of occurrences of abnormal data of a plurality of vacuum pumps that can continue operation after the set period has elapsed. Specifically, the threshold value may be an average value, a median value, a minimum value, a maximum value, a representative value, or the like of the number of occurrences of abnormal data of the vacuum pump that can be continued after a set period of time. Specifically, the comparison unit 552 determines whether or not the number of abnormal data occurrences of the operating vacuum pump is within a threshold value, and if it is within the threshold value, the operation of the vacuum pump 3 may be continued. You may judge.

(Comparison method 2)
For example, when the storage unit 53 stores, as the reference data, a plurality of sets of parameters relating to abnormal data (for example, state quantity, number of occurrences, occurrence frequency, occurrence interval) and driving continuation probability, the comparison unit 552 Then, the parameter related to the abnormal data stored in the storage unit 53 is compared with the number of abnormal data occurrences of the operating vacuum pump, and the operation continuation associated with the number of abnormal data generations of the operating vacuum pump in the storage unit 53 is continued. Probability may be output.

(Comparison method 3)
For example, when a plurality of parameters (for example, state quantity, number of occurrences, occurrence frequency, occurrence interval) and driving continuation probability related to abnormal data and operation continuation probability are stored in the storage unit 53 as reference data, the comparison unit 552 The plurality of parameters stored in 53 and the plurality of parameters of the operating vacuum pump are compared, and the operation continuation probability associated with the set of the plurality of parameters of the operating vacuum pump in the storage unit 53 is output. May be.

(Comparison method 4)
For example, the reference value is stored in the storage unit 53 as reference data in association with parameters relating to abnormal data (for example, state quantity, number of occurrences, occurrence frequency, occurrence interval), and parameters relating to deviation values and abnormal data (eg, state It is assumed that the driving continuation probability is stored as reference data in association with a set of quantity, number of occurrences, occurrence frequency, and occurrence interval. The comparison unit 552 compares the parameter relating to the abnormality data stored in the storage unit 53 with the corresponding parameter of the operating vacuum pump, and the deviation value (or coincidence) from the reference value of the corresponding parameter of the operating vacuum pump. The tendency degree) may be determined. And the comparison part 552 may output the driving | running | working continuation probability matched in the memory | storage part 53 with the set of the parameter regarding this deviation value and the said abnormal data.

  (Step S103) Next, the comparison unit 552 outputs a determination result of the possibility of failure arrival as a comparison result (output data). Here, the comparison unit 552 may output the comparison result (output data) to the display device 6 so that the comparison result (output data) is displayed on the display device 6. The comparison result (output data) may be transmitted to an external terminal device via the route.

  This comparison result (output data) includes a warning signal that alerts the possibility of failure, a notification signal that indicates that the possibility of failure is high, a driving continuation probability, and the like. Here, the driving continuation probability is, for example, the probability that a failure will occur within a predetermined time.

  As described above, the information processing apparatus 5 according to this embodiment includes the comparison unit 552. The comparison unit 552 refers to the storage unit 53 in which the operation continuation common condition extracted from the tendency of abnormal data detected in the state data of the vacuum pump that can continue operation is stored as reference data. The tendency of abnormal data detected from the state quantity data of the vacuum pump inside is compared with the reference data stored in the storage unit 53, and the comparison result is output.

  With this configuration, since the possibility of failure of the vacuum pump can be grasped, it is possible to reduce the risk of the vacuum pump being stopped during the manufacturing process and causing great damage to the product during the manufacturing process.

The storage unit 53 may store a film forming process (film forming process) of the semiconductor manufacturing apparatus and reference data in association with each other. In that case, the comparison unit 552 detects the tendency of abnormal data detected from the state quantity of the operating vacuum pump and the current film formation of the semiconductor manufacturing apparatus 1 to which the operating vacuum pump is connected in the storage unit 53. You may compare with the reference | standard data memorize | stored linked | related with a process. With this configuration, the comparison unit 552 can accurately estimate the possibility of failure of the vacuum pump 3 by comparing with the reference data for each film forming process of the semiconductor manufacturing apparatus 1. The risk of the vacuum pump being stopped and causing significant damage to the product during the manufacturing process can be reduced.
In the above example, the storage unit 53 may store the film formation process (film formation process) of the semiconductor manufacturing apparatus and the reference data in association with each other. Other manufacturing processes of the apparatus and reference data may be stored in association with each other. Here, manufacturing processes other than the film forming process include, for example, an implant process, an etching process, an ashing process, a heating process, and the like. In this case, the comparison unit 552 detects the trend of abnormal data detected from the state quantity of the operating vacuum pump, and the current manufacturing process of the semiconductor manufacturing apparatus 1 to which the operating vacuum pump is connected in the storage unit 53. You may compare with the reference | standard data memorize | stored linked | related.

(Modification)
In this embodiment, a person such as a vacuum pump manufacturer has previously determined the operation continuation common condition as reference data from the tendency of abnormal data detected in the data of the state quantity of the vacuum pump that can continue operation. This is not the only one. The reference data determination device 20 extracts a parameter to be noticed from the tendency of abnormal data detected in the data of the state quantity of the vacuum pump that can continue operation, and sets the operation continuation common condition according to the extracted parameter as the reference data May be.

  Hereinafter, the configuration of the reference data determination device 20 will be described. For example, the abnormality data detected in the data of the state quantity of the vacuum pump that can be continuously operated is collected by the manufacturing company of the vacuum pump together with the data of the state quantity of the vacuum pump that can be continuously operated. Here, as an example, the reference data determination device 20 will be described as being installed in the manufacturing company.

  Here, the abnormal data includes, for example, an outlier from the normal range defined for each divided process, a spike value not related to the process, and / or an abnormality of a change tendency with time of the entire process for each divided process (for example, instantaneous It is not an outlier data, but an abnormality in which the entire section for a certain period tends to increase).

  FIG. 6 is a schematic configuration diagram of a reference data determination device 20 according to a modification of the first embodiment. As shown in FIG. 6, the reference data determination device 20 includes an input unit 21, an output unit 22, a storage unit 23, a memory 24, and a calculation unit 25 having a CPU (Central Processing Unit). Each part is connected by a bus.

  The input unit 21 receives an operator input. The output unit 52 outputs information according to a command from the calculation unit 25. The storage unit 23 stores a program for the calculation unit 25 to execute. Further, every time the abnormal data detected in the data of the state quantity of the vacuum pump that can be continuously operated is collected, the abnormal data is added to the storage unit 23 by the operation of the operator.

  In the present embodiment, as an example, a set of the attribute and abnormality data of the vacuum pump is added to the storage unit 23 by an operation by the operator. As described above, the attribute of the vacuum pump is, for example, the type and model of the vacuum pump and / or the type or model of the semiconductor manufacturing apparatus connected to the vacuum pump. As a result, as shown in FIG. 2, a set of vacuum pump attributes and abnormal data is accumulated. FIG. 6 is an example of the table T <b> 2 stored in the storage unit 23. In the table T <b> 2, pairs of vacuum pump attributes and abnormal data file names are stored, and the abnormal data itself is also stored in the storage unit 23. Thereby, the calculating part 25 can refer abnormal data from the file name of abnormal data.

  The memory 24 temporarily stores information. The calculation unit 25 reads and executes a program stored in the storage unit 23. Thereby, the calculation unit 25 functions as the determination unit 251.

  The determination unit 251 refers to the storage unit 23 and determines reference data for determining the possibility of continued operation using the tendency of abnormal data. Specifically, for example, the determination unit 251 performs learning by artificial intelligence, for example, a deep layer using a deep neural network, from the trend of abnormal data detected in the state data of the vacuum pump that can be continuously operated. Using learning (deep learning), etc., determine the tendency to focus on. And the determination part 251 may set the reference data (for example, value of a threshold value) according to the extracted tendency to pay attention to. For example, the determination unit 251 may determine, as reference data, a failure reaching common condition that is a condition common to a failed vacuum pump for a parameter of interest.

  Here, the trends to be noticed are: (1) number of abnormal data occurrences, (2) time variation of abnormal data generation interval (decrease in interval), (3) increase or decrease tendency of abnormal data value, (4) continuation of abnormal occurrence Change in time or duration, (5) process tendency (abnormal) in which abnormal data is generated, and (6) conditions (1) to (4) (for example, in a process) Among them, attention is paid to (1) to (4)), or a combination (set) of (7), (2) to (4).

  The reference data may be a threshold value. For example, when the operation continuation common condition is the number of occurrences of abnormal data, the reference data is a threshold value. For example, when it is common that the number of occurrences of abnormal data is 10 times for vacuum pumps that can continue operation after the set time has elapsed, 10 is set as the reference data.

  The reference data may be a plurality of sets of parameters related to abnormal data (for example, the number of occurrences of abnormal data) and the operation continuation probability. The number of occurrences of the plurality of abnormal data may be a continuous integer or a discontinuous integer.

Further, the reference data may be a set of parameters and reference values related to abnormal data, a set of divergence values and parameters related to abnormal data, and an operation continuation probability associated with the set.
Further, the reference data may be a driving continuation probability associated with a plurality of parameters related to abnormal data occurrence tendency and a set of the plurality of parameters.

  As an example of the extraction process of the reference data, the determination unit 251 may determine the reference data for each attribute of the vacuum pump. With this configuration, since the reference data is created for each attribute of the vacuum pump, the operating vacuum pump belongs when compared with the trend of abnormal data detected from the state quantity data of the operating vacuum pump. It can be compared with the reference data corresponding to the attribute vacuum pump. Thereby, the determination precision of the possibility of failure of the vacuum pump can be improved.

  Next, the flow of reference data extraction processing according to a modification of the first embodiment will be described with reference to FIG. FIG. 8 is a flowchart illustrating an example of reference data extraction processing according to a modification of the first embodiment.

  (Step S201) First, the abnormal data detected in the state quantity data of the failed pump is read from the storage unit 23.

  (Step S202) Next, the determination unit 251 extracts the operation continuation common condition as reference data from the tendency of the read abnormal data.

  (Step S203) Next, the determination unit 251 stores the extracted reference data in the storage unit 23.

Note that the determination unit 251 may extract the reference data for each film forming process of the semiconductor manufacturing apparatus, and the determination unit 251 may calculate the attribute of the vacuum pump and the film forming process of the semiconductor manufacturing apparatus for each set. The reference data may be extracted. With this configuration, since the reference data is created for each film forming process of the semiconductor manufacturing apparatus, the vacuum pump 3 is compared with the tendency of abnormal data detected from the state quantity data of the operating vacuum pump 3. Can be compared with the reference data corresponding to the film forming process of the semiconductor manufacturing apparatus 1 to which is connected. Thereby, the determination precision of the possibility of failure of the vacuum pump can be improved. In this case, each time the abnormal data is collected, the set of the attribute of the vacuum pump, the film forming process of the semiconductor manufacturing apparatus, and the abnormal data is determined so that the determining unit 251 can extract the reference data by referring to the storage unit 23. It is preferable that information is added to the storage unit 23.
Note that the determination unit 251 may extract the reference data for each film forming process of the semiconductor manufacturing apparatus. However, the determination unit 251 is not limited thereto, and the reference data may be extracted for each other manufacturing process of the semiconductor manufacturing apparatus. It may be extracted.

  In the present modification, the reference data determination device 20 determines a tendency to be noticed from the trend of abnormal data detected in the data of the state quantity of the vacuum pump that can be continuously operated, and common operation continuation according to this tendency. The conditions are determined as reference data, but are not limited thereto. A person such as a designer or manufacturer sets a trend (for example, the number of occurrences of abnormal data) from the trend of abnormal data detected in the data of the state quantity of the vacuum pump that can be continuously operated, and determines the reference data The apparatus 20 may set reference data (for example, a threshold value) according to the set operation continuation common condition (for example, the number of occurrences of abnormal data). For example, when the common operation continuation condition is the number of abnormal data occurrences, the reference data determination device 20 sets a statistical amount (for example, a minimum value, a median value, an average value) of the number of abnormal data occurrences in a plurality of abnormal data as a threshold value. It may be set.

(About notification processing)
Then, the example of the alerting | reporting process of the comparison part 552 of the information processing apparatus 5 is demonstrated using FIGS. FIG. 9 is a graph showing an example of the relationship between the effective current value I of the motor 38 and the operation time in a vacuum pump capable of continuing operation. A curve W1 is a time change of the current effective value I of the motor 38 in a vacuum pump capable of continuing operation. The straight line f (t) _ave is the average time change of the current effective value I of the motor 38 in a normal vacuum pump. The straight line f (t) _max is the time change of the maximum value in the normal range of the current effective value I of the motor 38 in the vacuum pump. The straight line f (t) _min is the time change of the minimum value in the normal range of the current effective value I of the motor 38 in the vacuum pump. For example, the comparison unit 552 issues an alert when the current effective value I of the motor 38 currently in operation exceeds f (t) _max .

As shown in FIG. 9, the current effective value during the set time t _s has elapsed as I _b, and subtracting the initial value I ₀ of the current effective value from the current effective value I _b at the set time t _s has elapsed the ΔI value ( IΔ = I _b −I ₀ ). Of the difference value set to [Delta] I time obtained by dividing by t _s has elapsed during the current effective value I _b parameter α (= ΔI / I _b) when aggregated operational data of the pump that has returned without failure the parameter alpha The frequency graph is expressed as shown in FIG.

Figure 10 is an example of the frequency graph of the parameter α when the aggregate for the operation sustainable vacuum pump at the set time t _s has elapsed. The median value of the parameter α is α _C , and the standard deviation of the parameter α is σ ₁ . At that time, the comparison unit 552 performs the first warning (alert) when the parameter α of the operating vacuum pump 3 is (α _C + σ ₁ ), the second alert when the parameter α is (α _C + 2σ ₁ ), A third alert may be issued when (α _C + 3σ ₁ ) (for example, an alert is displayed on the display device 6).

Thus, during the operation of the pump 3, the comparison unit 552 determines the value based on the state quantity of the operating vacuum pump 3 (here, the operating parameter α as an example) and the state of the pump that has returned without failure. And a statistic (α _C + σ ₁ , α _C + 2σ ₁ , or α _C + 3σ _1, as an example) based on a quantity (here, the current effective value as an example) Then, control is performed so as to notify in accordance with the comparison result. Thus, it is possible to notify when the state quantity of the vacuum pump 3 in operation approaches the state quantity at the time of failure of the vacuum pump that can continue operation, and maintenance of the vacuum pump 3 before the vacuum pump 3 breaks down or Can be exchanged. The comparison unit 552 can also perform data processing by comparing the statistics before the present time during operation with the current data. For example, when the current time is 10010 hours, the comparison unit 552 may perform data processing by comparing the statistics at 10000 hours with the current data.

FIG. 11 is a graph showing another example of the relationship between the effective current value I of the motor 38 and the operation time in a vacuum pump capable of continuing operation. As shown in FIG. 11, in the pump returned without failure, an abnormality occurs at times t ₁ , t ₂ , t ₃ , t ₄ , t ₅ ,..., T _N (N is a positive integer). and has, abnormal occurrence number of times until the time of the set time t _s course is N times. For continuous operation possible vacuum pump until the set time t _s has elapsed when the aggregate error occurrence count up to the set time t _s, the frequency graph of the abnormality occurrence count is represented as shown in FIG. 12A, for example.

Figure 12A when the aggregate error occurrence count up to the set time t _s for the operation continuable vacuum pump until the set time t _s has elapsed, which is an example of a frequency graph of abnormal occurrences. The average value of the abnormality occurrence count up to the time of the set time t _s has elapsed N _m, the standard deviation of the error occurrence count up to the time of the set time t _s has elapsed and sigma _2. At that time, the comparison unit 552 has a first alert when the number of occurrences of abnormality of the operating vacuum pump is (N _m + σ ₂ ), 1 between (N _m + σ ₂ ) and (N _m + 2σ ₂ ). A second maintenance warning may be issued (for example, an alert is displayed on the display device 6). The comparison unit 552, (N _m + 2σ ₂₎ second alert when, may be issued to maintenance warning second between (N _m + 2σ ₂₎ and (N _m + 3σ _2).

  Here, the maintenance warning indicates, for example, that maintenance is recommended or that it is a maintenance time.

As described above, the comparison unit 552 determines the number of occurrences of the state quantity of the vacuum pump in operation (here, the current effective value I as an example) and the state quantity until the set time t _{s of the} vacuum pump capable of continuing operation has elapsed. (Here, as an example, the current effective value I) is compared with the statistic of the number of occurrences of abnormality (here, as an example, N _m + 3σ ₂ , N _m + 2σ ₂ , N _m + σ ₂ ), and reports according to the comparison result. Control as follows. Thereby, it is possible to notify when the state quantity of the operating vacuum pump 3 deviates from the number of occurrences of abnormality until the set time t _s of the vacuum pump capable of continuing operation, and before the vacuum pump 3 breaks down. The vacuum pump can be maintained or replaced.
FIG. 12B is an example of a graph in which the time change of the statistics of the number of occurrences of abnormality of the vacuum pump that has returned without failure and the number of occurrences of abnormality of the pump currently in operation are plotted. FIG. 12B shows temporal changes of the statistics N _m + 3σ ₂ , N _m + 2σ ₂ , and N _m + σ ₂ . Point P11 is the point at which the number of occurrences of abnormality of the vacuum pump during operation first exceeds the statistic N _m + σ ₂ . Thus, the comparison unit 552 may issue an alert when the number of occurrences of abnormality of the operating vacuum pump exceeds the statistic N _m + σ ₂ for the first time.

FIG. 13 is a graph showing a third example of the relationship between the effective current value I of the motor 38 and the operation time in a vacuum pump capable of continuing operation. As shown in FIG. 13, the intervals of occurrence of abnormality in the vacuum pump capable of continuing operation are T1, T2, and T3. For continuous operation possible vacuum pump, when (the beta of a predetermined time) time t _s-beta based on the time setting t _s obtained by aggregating the abnormal interval T of the setting period from to time t _s + beta, abnormality The frequency graph of the interval T is expressed as shown in FIG. For example, if the set time t _s is assumed to be a and and a predetermined time β is 100h 10000h, setting period is (10000-100) h~ (10000 + 100 ).

Figure 14 is an example of a frequency graph of the set time t _s has elapsed immediately before the abnormality occurrence interval when aggregating the abnormal interval of a predetermined period immediately before the set time t _s has elapsed for the operation continuable vacuum pump . The median set time t _s has elapsed immediately before the occurrence of abnormality in the interval T T _C, and a sigma ₃ standard deviations of the interval T of the abnormality. Here, although the median T _C as an example, it may be an average value rather than the median.

FIG. 15A is an example of a change over time of an abnormality occurrence interval T for a vacuum pump in operation. The abnormality occurrence interval T gradually decreases as time t elapses. FIG. 15B is an example of a graph in which the time variation of the statistics of the interval of the vacuum pump that has returned without failure and the number of occurrences of abnormality of the currently operating pump are plotted. In Figure 15B, each of the time variation statistics _{T c -3σ 3, T c -2σ} 3, T c -σ 3 is shown. Point P21 is a point where an interval of a vacuum pump in operation falls below a statistic T _c - [sigma] ₃ start point P22 is the statistic for the first time interval of the vacuum pump in operation T _c -2σ ₃ below It is a point. Thus, comparing unit 552, first alert when the interval T of the occurrence of abnormality in the vacuum pump in operation, becomes lower than (T _c - [sigma] _3), falls below (T _c -2σ ₃₎ A second alert may be issued (for example, an alert is displayed on the display device 6).

The comparison unit 552, an interval T of abnormality of the vacuum pump in operation, in a certain timing between the (T _c - [sigma] ₃₎ and (T _c -2σ _3), outputs a maintenance warning (for example, a display device 6). The maintenance warning is, for example, that maintenance is recommended or that it is a maintenance time.

As an example here, it has been described by focusing on a predetermined period immediately before the set time t _s has elapsed, and as long a period before the set time t _s has elapsed, may not be immediately before. For example, it may be noted between 200 hours before the set time t _s has elapsed from the time setting t _s elapses before 400 hours.

Thus, comparing unit 552, the vacuum pump 3 during the operation state quantity state at the occurrence of abnormality of the interval, setting the operation sustainable vacuum pump time t _s has elapsed before (effective current value I as an example here) (as an example _{here, T c -σ 3, T c} -2σ 3) amount statistics of occurrence of abnormality in interval (current effective value I as an example in this case) is compared with the, so to notify according to the comparison result Control. Thus, it is possible to notify when the state of the vacuum pump 3 while driving away from the state of occurrence of abnormality in the interval before the set time t _s has elapsed, the vacuum pump 3 before the vacuum pump 3 fails Maintenance or replacement can be done.

The comparison unit 552 may advance the maintenance or replacement time according to the ratio of the film formation process time to the operating time of the vacuum pump 3. For example, the comparison unit 552 may make the alert or the maintenance warning time earlier by using the coefficient η.
For example, comparison unit 552, the median alpha _c parameter alpha, the average value N _m of abnormality occurrence count up to the previous set time t _s has elapsed, the median T _c of the abnormality generation of an interval, by using the coefficients η acceleration May be. For example, the comparison unit 552 may correct the median value α _c of the parameter α to α _c −η × σ ₁ .

Here, the coefficient η is obtained by using the influence coefficient k and the ratio L (= T _SP / T _w ) of the film formation process time T _SP to the operation time T _w of the vacuum pump 3 η = kL = kT _SP / _Represented by Tw. Here, the influence coefficient k represents the influence of the film forming process on the failure of the vacuum pump, and its initial value is, for example, a value of 1.0 to 2.0. The influence coefficient k may be updated by learning using artificial intelligence, for example, deep learning using a deep neural network. Thereby, the influence coefficient k is optimized. Alternatively, the period of the film forming process may be selected by learning using artificial intelligence, for example, deep learning using a deep neural network. For learning at that time, a set of a film formation process and a sensor signal previously extracted by a person may be used as a teacher data set.
Here, the sensor signal is a signal detected by a particle sensor (laser counter), a micro film formation sensor, a sound wave / vibration sensor, or the like. Here, the micro film formation sensor monitors the film increase by the change of the natural frequency. As a result, the period of the film forming process is automatically selected, so the time T _SP of the film forming process is automatically determined. Incidentally, when calculating the coefficient eta, instead of time T _SP of the deposition process, it may be used the number of deposition processes.

9, 11 and 13, the idling period is included in the operation time on the horizontal axis, but in FIG. 9, 11 and 13, the comparison unit 552 adds the coefficient η corresponding to the process to the operation time for each process. The driving time may be corrected by multiplying. FIG. 15C is a graph showing a fourth example of the relationship between the effective current value I of the motor 38 and the operation time. FIG. 15C shows processes PA, PB, PC, PD, and PE. For example, it is assumed that the process PE is in an idling period. In this case, for example, for each process PA, PB, PC, PD, PE (each operation time t _PA , t _PB , t _PC , t _PD , t _PE ), the coefficient η is 1.5, 1.5, respectively. 2, 2, 1, the comparison unit 552 may calculate the corrected operation time _{tr according} to the calculation formula _tr = 1.5 t _PA +1.5 t _PB +2 t _PC +2 t _PD + t _PE . By correcting the operation time as described above, it can be converted into the time that the load is actually applied to the vacuum pump.

In this way, the comparison unit 552 performs processing to change the notification timing according to the time of the film forming process or the number of film forming processes of the semiconductor manufacturing apparatus 1 to which the operating vacuum pump 3 is connected. Specifically, for example, the comparison unit 552 corrects the operation time in accordance with the film formation process time or the number of film formation processes, and notifies the reference based on the corrected operation time. According to this configuration, the notification timing can be changed according to the time of the film forming process or the number of film forming processes of the semiconductor manufacturing apparatus to which the operating vacuum pump is connected. Although the failure risk increases as the time of the film formation process or the number of film formation processes of the semiconductor manufacturing apparatus 1 to which the operating vacuum pump 3 is connected increases, before the vacuum pump 3 breaks down by increasing the timing of notification. The vacuum pump 3 can be maintained or replaced.
Note that here, the comparison unit 552 performs processing to change the notification timing according to the time of the film formation process or the number of times of the film formation process, but is not limited to the time or number of times of the film formation process. You may process to change the timing to alert | report according to the time or frequency | count of a manufacturing process.

The comparison unit 552 uses artificial data to learn, for example, a deep layer using a deep neural network, using teacher data of a sensor signal of a particle sensor (laser counter) and a film formation amount set in advance by a person. Learning (deep learning) may be performed. Thereby, the comparison unit 552 may determine the film formation amount from the sensor signal of the particle sensor (laser counter) during operation, and update the influence coefficient k using the determined film formation amount.
Alternatively, the comparison unit 552 uses an artificial intelligence learning data, for example, a deep layer using a deep neural network, using teacher data of a sensor signal of a micro film formation sensor and a film formation amount set in advance by a person. Learning (deep learning) may be performed. Thereby, the comparison unit 552 may determine the film formation amount from the sensor signal of the micro film formation sensor in operation, and may update the influence coefficient k using the determined film formation amount.
Alternatively, the comparison unit 552 uses an artificial intelligence learning, for example, a deep layer using a deep neural network, by using teacher data of a sensor signal of a sound wave / vibration sensor and a film formation amount set in advance by a person. Learning (deep learning) may be performed. Accordingly, the comparison unit 552 may determine the film formation amount from the sensor signal of the operating sound wave / vibration sensor, and may update the influence coefficient k using the determined film formation amount.

(Second Embodiment)
Next, the second embodiment will be described. In the second embodiment, vacuum pump abnormality diagnosis, abnormality prediction, and / or stability control are executed using a plurality of sensors.
FIG. 16 is a schematic configuration diagram of a semiconductor manufacturing system 10b according to the second embodiment. Elements common to those in FIG. 1 are denoted by common numbers, and detailed description thereof is omitted.
As shown in FIG. 16, the semiconductor manufacturing system 10 b according to the second embodiment includes a semiconductor manufacturing apparatus 1, a vacuum pump 3, a pipe 2 connecting the semiconductor manufacturing apparatus 1 and the vacuum pump 3, and a vacuum pump 3. The control apparatus 4b to control, the information processing apparatus 5b, and the management apparatus 7 connected to the information processing apparatus 5b are provided.

As an example, the semiconductor manufacturing system 10b according to the second embodiment further includes acceleration sensors S1 to S3, current monitor sensors S11 and S12, and temperature sensors S21 to S26. The acceleration sensors S1 to S3 are, for example, 5-axis acceleration sensors. Thus, the semiconductor manufacturing system 10b has a plurality of sensors.
The control device 4b includes a control unit 41 that controls the motor 38 and a communication unit 42 that communicates with the information processing device.

The information processing device 5 b includes a memory 54, a calculation unit 55, and a communication unit 56. The communication unit 56 communicates with the communication unit 42 of the control device 4b. The communication unit 56 communicates with the management device 7. The communication unit 56 receives sensor data from the acceleration sensors S1 to S3, the current monitor sensors S11 and S12, and the temperature sensors S21 to S26.
The management device 7 can communicate with the information processing device 5b. The management device 7 has a CPU 71.

  The acceleration sensors S1 to S3, the current monitor sensors S11 and S12, and the temperature sensors S21 to S26 have communication functions such as Wi-Fi (registered trademark) or blue-tooth (registered trademark), and are detected by these sensors. The received sensor signals are collected by the communication unit 42 nearby. The sensor signal is transmitted from the communication unit 42 to the communication unit 56 via wiring, and is subjected to data processing by the calculation unit 55 as necessary and stored in the memory 54. The information processing apparatus 5b may be a gateway (for example, a router). The information processing apparatus 5b may have an AI (artificial intelligence) function.

  By using a plurality of sensors, accurate management information can be obtained. For example, when a part of the rotor is increased in reaction force due to foreign matter, fluctuations in rotational speed, fluctuations in the inclination of the rotor shaft, and fluctuations in the motor control current occur. By comparing not only one change but also the rotational speed, the rotor shaft inclination and the motor control current at the same time, abnormal fluctuations can be reliably captured with high accuracy.

The acceleration sensors S1 to S3 may have a MEMS vibration oscillator. A wide band / inexpensive / small, and when mounted on a substrate, is small and effective.
Moreover, you may acquire the driving | running operation condition of a some vacuum pump as data.
You may manage the operating condition of the vacuum pump attached to every apparatus (for example, semiconductor manufacturing apparatus) upstream of a vacuum pump. Comparing the vacuum pump operating status and the number of failures / replacement parts frequency for each attribute (for example, model) of semiconductor manufacturing equipment, and defining the number of failures / replacement part frequency for each attribute (for example, model) of semiconductor manufacturing equipment Can do.

  Although three acceleration sensors are provided in the present embodiment, the present invention is not limited to this, and the number of acceleration sensors may be two or less, or four or more (for example, ten or more). Two or more acceleration sensors may be provided in opposite directions (example / left and right) from the center of the rotor axis of the vacuum pump, one axis or more in the rotor axis direction, and two or more axes in the case of multiple stages.

  In the present embodiment, two current monitor sensors are provided. However, the present invention is not limited to this. One current monitor sensor may be provided, or three or more current monitor sensors may be provided. The current monitor sensor may be attached for measuring the motor driving current for logging the data of the motor driving current fluctuation. When there are a plurality of motors, the number of current monitor sensors may be increased accordingly. For example, in the case of a two-stage motor, two or more current monitor sensors may be provided.

  Although six temperature sensors are provided in the present embodiment, the present invention is not limited to this, and the number of temperature sensors may be five or less, or may be seven or more. Multi-point temperature of the rotor (for example, temperatures in opposite directions from the center), motor temperature, motor shaft temperature, gas input temperature, gas output temperature, rotor input temperature, rotor output The temperature of the part may be detected. When the vacuum pump is multistage, the temperature of the rotor output section at the previous stage and the temperature of the input section at the next stage may be detected.

  The semiconductor manufacturing system 10b may further include a plurality of pressure sensors (for example, five or more). The pressure sensor is the multi-point pressure of the rotor (for example, the pressure in the opposite direction from the center), the pressure of the motor shaft, the pressure of the gas input, the pressure of the gas output, the pressure of the rotor input, the rotor output The pressure of the part may be detected. When the vacuum pump is multistage, the pressure sensor may detect the pressure of the rotor output section at the previous stage and the pressure of the input section at the next stage.

  The semiconductor manufacturing system 10b may further include a rotor or motor shaft rotation sensor. For example, three or more rotation sensors may be provided for a set of one rotor and one motor. If the number of rotors and motors increases, the number of rotation sensors may increase accordingly. The sensors can be combined as described above, and the semiconductor manufacturing system 10b may be provided with a total of 10 or more sensors.

(Effect of using multiple sensors)
By using a plurality of sensors, the calculation unit 55 of the information processing device 5b can perform the following processing.

  When a multi-axis acceleration sensor is used, the calculation unit 55 can compare acceleration fluctuations on the axes, for example, compare differential waveforms with each other, compare FFT (Fast Fourier Transform) waveforms, and the like. In this example, the calculation unit 55 can analyze the comparison between the two axes (x, y) at positions away from the rotor axis, and the fluctuation of the rotor and the parallel axis (z). Since the calculation unit 55 can compare the fluctuation vector components when the two axes at the distant positions can be compared with each other, the twisting of the axis and the relative overload can be accurately determined. . In addition, the calculation unit 55 can compare the fluctuations of the motor current around that time, and can identify the overload on the rotor, the overload of the motor due to it, and its time zone.

  In addition, the calculation unit 55 can perform detection, alarm, and display when abnormal sensor detection occurs after the determination time has elapsed. In this case, the comparison data is registered in the memory 54 as the normal SD condition, and the calculation unit 55 can make a determination by comparing the comparison data.

  It should be noted that the CPU 71 of the management device 7 at the subsequent stage can execute part or all of these processes.

(Third embodiment)
Subsequently, a third embodiment will be described. FIG. 17 is a schematic configuration diagram of a semiconductor manufacturing system 10c according to the third embodiment. Elements common to FIGS. 1 and 16 are assigned common numbers, and detailed description thereof is omitted. As illustrated in FIG. 17, the semiconductor manufacturing system 10 c includes the vacuum pumps 3-1 to 3 -J (J is a positive integer) and the control devices 4 b-1 to 4 b-that control the vacuum pumps 3-1 to 3 -J. J, process devices 8-1 to 8-L (L is a positive integer), an information processing system 9, and a management device 7.
Each vacuum pump 3-1 to 3-J is provided with a plurality of sensors (not shown) as in the second embodiment. Since the configuration of each vacuum pump 3-1 to 3-J is the same as that of the first embodiment, the description thereof is omitted. Since the configuration of the control devices 4b-1 to 4b-J is the same as that of the control device 4b according to the second embodiment, the description thereof is omitted.

  The process apparatuses 8-1 to 8-L are etching apparatuses or film forming apparatuses. The process device 8-1 is connected to the vacuum pumps 3-1, 3-2. The process device 8-2 is connected to the vacuum pumps 3-3 and 3-4. The process device 8-L is connected to the vacuum pump 3-J. The information processing system 9 includes, for example, equipment in the factory and / or an information collection device (for example, a server or a PC (Personal Computer). The information processing system 9 may be a cloud or a mini cloud.

  Sensor signals from a plurality of sensors are input to the control devices 4b-1 to 4b-J. The control devices 4b-1 to 4b-J acquire sensor values from the sensor signals, and process data 8-1 to 8 to which the control devices 4b-1 to 4b-J are connected are obtained as sensor data indicating the sensor values. Output to -L.

  Further, the sensor data is transmitted from each process device 8-1 to 8-L to the information processing system 9 and stored. The information processing system 9 processes sensor data. The information processing system 9 is connected to the management device 7. The management device 7 executes various determination processes and updates the operation parameters at the next stage. In addition, the management device 7 performs maintenance and updates of parts replacement time. These updated values are fed back to the process devices 8-1 to 8-L and the control devices 4b-1 to 4b-J via the information processing system 9. The process devices 8-1 to 8-L and the control devices 4b-1 to 4b-J perform operations corresponding to the operation parameters.

  Note that the communication units 42 of the control devices 4b-1 to 4b-J may be installed in the vacuum pumps 3-1 to 3-J. Further, the communication unit 42 of the control devices 4b-1 to 4b-J may be installed outside in the form of a controller or an adapter.

(Fourth embodiment)
Subsequently, a fourth embodiment will be described. FIG. 18 is a schematic configuration diagram of a semiconductor manufacturing system 10d according to the fourth embodiment. Elements common to FIGS. 1, 16, and 17 are assigned common numbers, and detailed description thereof is omitted. As shown in FIG. 18, the semiconductor manufacturing system 10d includes semiconductor manufacturing apparatuses 1-1 to 1-J (J is a positive integer), vacuum pumps 3-1 to 3-J, and vacuum pumps 3-1 to 3-J. Control devices 4b-1 to 4b-J, gateways 41-1, 41-K (K is a positive integer), information processing system 9, and terminal device 62.

  Each vacuum pump 3-1 to 3-J is provided with a plurality of sensors (not shown) as in the second embodiment. Since the configuration of each vacuum pump 3-1 to 3-J is the same as that of the first embodiment, the description thereof is omitted. Since the configuration of the control devices 4b-1 to 4b-J is the same as that of the control device 4b according to the second embodiment, the description thereof is omitted.

  The gateways 61-1 to 61-K transmit sensor signals, control signals, status signals, and the like transmitted from the control devices 4b-1 to 4b-J to the information processing system 9. Since the high-speed optical communication is used between the gateways 61-1 to 61-K and the control devices 4b-1 to 4b-J, the signal transmission speed is high. Thereby, a large number of sensor signals can be collected in a short time by exchanging signals at high speed.

  The gateways 61-1 to 61-K may have some data processing functions. In this case, the gateways 61-1 to 61-K perform necessary data processing, update the operation parameters in the next stage, and transmit signals to the corresponding control devices 4b-1 to 4b-J for feedback. Good. At this time, status data such as operating states of the vacuum pumps 3-1 to 3-J can be transmitted to the information processing system 9. The information processing system 9 determines the management of the operating state of the semiconductor manufacturing apparatuses 1-1 to 1-J and the vacuum pumps 3-1 to 3-J, and changes the operation parameters at the next stage, changes the status, replaces parts, The maintenance time may be updated. Then, the information processing system 9 may notify the terminal device 62 of these changes or updated information. Thereby, the operator of the terminal device 62 can grasp the change of the operation parameter or the change of the status. Alternatively, the operator of the terminal device 62 can grasp the time of parts replacement or maintenance after the update.

  The gateways 61-1 to 61-K have the functions of a communication adapter, router, and controller in combination. The gateways 61-1 to 61-K automatically adopt (update) a data processing method in which data is stored in the information processing system 9 and updated by automatic learning, and select necessary data groups and unnecessary data groups. You may create the data set which performed. Thereby, the gateways 61-1 to 61-K can improve the calculation processing efficiency in the gateway.

  A part of data processed by the gateways 61-1 to 61-K (thinned in time) is stored in the information processing system 9. The information processing system 9 uses this to create a data set for automatic learning, and performs automatic learning to determine more efficient and stable operation parameters, determination of parts replacement time, or determination of maintenance time. . When the number of data accumulation increases (for example, when the number of data accumulation reaches 5000 to 10,000 cases or more), a highly reliable or highly accurate determination can be performed.

  Note that an information processing system including a plurality of devices may process each of the information processing devices 5 and 5b according to the first or second embodiment in a distributed manner by the plurality of devices. In the first and second embodiments, the control device 4 and the information processing device 5 are described as separate devices. However, the control device 4 may be configured to include the information processing device 5. In the second embodiment, the information processing device 5b and the management device 7 are described as separate devices. However, the information processing device 5b may be configured to include the management device 7. In addition, a program for executing each process of the information processing devices 5, 5b, the management device 7, and the information processing system 9 according to each embodiment is recorded on a computer-readable recording medium and recorded on the recording medium. The above-described various processes related to the information processing apparatus according to the present embodiment may be performed by causing the computer system to read the program and executing the program.

  As described above, the present invention is not limited to the above-described embodiments as they are, and can be embodied by modifying the components without departing from the scope of the invention in the implementation stage. In addition, various inventions can be formed by appropriately combining a plurality of components disclosed in the embodiment. For example, some components may be deleted from all the components shown in the embodiment. Furthermore, constituent elements over different embodiments may be appropriately combined.

DESCRIPTION OF SYMBOLS 1 Semiconductor manufacturing apparatus 2 Piping 3 Vacuum pump 4 Control apparatus 5 Information processing apparatus 6 Display apparatus 7 Management apparatus 8-1, 8-2 Process apparatus 9 Information processing system 10, 10b, 10c, 10d Semiconductor manufacturing system 11 Film formation process chamber DESCRIPTION OF SYMBOLS 12 Control part 20 Reference | standard data determination apparatus 21 Input part 22 Output part 23 Memory | storage part 24 Memory 25 CPU
251 Determination unit 31 Booster pump 32, 34 Piping 33 Main pump 35 Pressure gauge 36 Power source 37 Inverter 38 Motor 39 Rotor 51 Input unit 52 Output unit 53 Storage unit 54 Memory 55 Calculation unit 550 CPU (Central Processing Unit)
551 Abnormal data detection unit 552 Comparison unit 553 Cache 56 Communication unit 61-1 to 61-K Gateway 62 Terminal device

Claims (15)

Refer to the storage unit that stores the reference data for determining the possibility of continued operation, determined using the trend of abnormal data detected in the data of the vacuum pump state quantity that can be continuously operated. An information processing apparatus comprising: a comparison unit that compares a tendency of abnormal data detected from data on a state quantity of an operating vacuum pump with reference data stored in the storage unit and outputs a comparison result. The information processing apparatus according to claim 1, wherein the comparison unit determines the possibility of continuing operation of the vacuum pump as a result of the comparison, and outputs the determination result as the comparison result. In the storage unit, the attribute of the vacuum pump and the reference data are stored in association with each other,
The comparison unit compares the tendency of abnormal data detected from the state quantity of the operating vacuum pump with reference data stored in the storage unit in association with the attribute of the operating vacuum pump. The information processing apparatus according to claim 1 or 2. In the storage unit, a film forming process of a semiconductor manufacturing apparatus and the reference data are stored in association with each other,
The comparison unit associates the tendency of abnormal data detected from the state quantity of the operating vacuum pump with the current film forming process of the semiconductor manufacturing apparatus to which the operating vacuum pump is connected in the storage unit. The information processing apparatus according to any one of claims 1 to 3, wherein the reference data is compared with stored reference data. The comparison unit compares the value based on the state quantity of the vacuum pump in operation with the statistic value of the value based on the state quantity of the set period of the vacuum pump that can be continuously operated, and notifies according to the comparison result. The information processing apparatus according to claim 1, wherein the information processing apparatus is controlled. The comparison unit compares the number of occurrences of abnormality of the state quantity of the vacuum pump during operation and a statistic of the number of occurrences of abnormality of the state quantity of the set period of the vacuum pump that can be continuously operated, and notifies according to the comparison result. The information processing apparatus according to any one of claims 1 to 5, wherein control is performed. The comparison unit compares the interval of occurrence of abnormality of the state quantity of the vacuum pump during operation and the statistical amount of the interval of occurrence of abnormality of the state quantity of the set period of the vacuum pump capable of continuing operation, and according to the comparison result The information processing apparatus according to any one of claims 1 to 6, wherein the information processing apparatus is controlled to be notified. The said comparison part processes so that the timing to alert | report may be changed according to the time of the manufacturing process of the semiconductor manufacturing apparatus to which the said operating vacuum pump is connected, or the frequency | count of a manufacturing process. The information processing apparatus described in 1. Reference data for determining the possibility of continuation of operation using the tendency of the abnormal data with reference to the storage unit storing the abnormal data detected in the data of the state quantity of the vacuum pump that can be operated A reference data determining device comprising a determining unit for determining The reference data determination device according to claim 9, wherein the determination unit determines the reference data for each attribute of the vacuum pump. The reference data determination device according to claim 9, wherein the determination unit determines the reference data for each manufacturing process of the semiconductor manufacturing apparatus.   Refer to the storage unit that stores the reference data for determining the possibility of continued operation, determined using the trend of abnormal data detected in the data of the vacuum pump state quantity that can be continuously operated. An information processing method comprising a step of comparing a tendency of abnormal data detected from state quantity data of an operating vacuum pump with reference data stored in the storage unit and outputting a comparison result.   Reference data for determining the possibility of continuation of operation using the tendency of the abnormal data with reference to the storage unit storing the abnormal data detected in the data of the state quantity of the vacuum pump that can be operated A method for determining reference data, comprising the step of determining Computer
Refer to the storage unit that stores the reference data for determining the possibility of failure, determined using the trend of abnormal data detected in the data of the state quantity of the vacuum pump that can continue operation A program for comparing the tendency of abnormal data detected from the data of the state quantity of the operating vacuum pump with the reference data stored in the storage unit and functioning as a comparison unit that outputs a comparison result . Computer
Reference data for determining the possibility of failure using the tendency of the abnormal data with reference to the storage unit storing the abnormal data detected in the data of the state quantity of the vacuum pump that can be continuously operated A program for functioning as a determination unit for determining