JP2018163954A5 - - Google Patents

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Publication number
JP2018163954A5
JP2018163954A5 JP2017059686A JP2017059686A JP2018163954A5 JP 2018163954 A5 JP2018163954 A5 JP 2018163954A5 JP 2017059686 A JP2017059686 A JP 2017059686A JP 2017059686 A JP2017059686 A JP 2017059686A JP 2018163954 A5 JP2018163954 A5 JP 2018163954A5
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JP
Japan
Prior art keywords
mold
cured product
imprint material
pattern
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2017059686A
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Japanese (ja)
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JP6960232B2 (en
JP2018163954A (en
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Publication date
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Priority to JP2017059686A priority Critical patent/JP6960232B2/en
Priority claimed from JP2017059686A external-priority patent/JP6960232B2/en
Priority to KR1020180027893A priority patent/KR102309719B1/en
Publication of JP2018163954A publication Critical patent/JP2018163954A/en
Publication of JP2018163954A5 publication Critical patent/JP2018163954A5/ja
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Publication of JP6960232B2 publication Critical patent/JP6960232B2/en
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Description

図９（ｄ）に示すように、インプリント材３ｚを硬化させた後、型４ｚと基板１ｚを引き離すと、基板１ｚ上にインプリント材３ｚの硬化物のパターンが形成される。この硬化物のパターンは、型の凹部が硬化物の凸部に、型の凸部が硬化物の凹部に対応した形状になっており、即ち、インプリント材３ｚに型４ｚの凹凸パターンが転写されたことになる。 As shown in FIG. 9D, when the imprint material 3z is cured and then the mold 4z and the substrate 1z are separated, a pattern of a cured product of the imprint material 3z is formed on the substrate 1z. This pattern of cured product, the convex portion of the concave portion is a cured product of the mold, and a shape in which the convex portion of the mold is corresponding to the concave portion of the cured product, i.e., the uneven pattern of the mold 4z to imprint material 3z It has been transcribed.

JP2017059686A 2017-03-24 2017-03-24 Lithography equipment and article manufacturing method Active JP6960232B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2017059686A JP6960232B2 (en) 2017-03-24 2017-03-24 Lithography equipment and article manufacturing method
KR1020180027893A KR102309719B1 (en) 2017-03-24 2018-03-09 Lithography apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017059686A JP6960232B2 (en) 2017-03-24 2017-03-24 Lithography equipment and article manufacturing method

Publications (3)

Publication Number Publication Date
JP2018163954A JP2018163954A (en) 2018-10-18
JP2018163954A5 true JP2018163954A5 (en) 2020-05-07
JP6960232B2 JP6960232B2 (en) 2021-11-05

Family

ID=63859273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017059686A Active JP6960232B2 (en) 2017-03-24 2017-03-24 Lithography equipment and article manufacturing method

Country Status (2)

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JP (1) JP6960232B2 (en)
KR (1) KR102309719B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7280768B2 (en) * 2019-07-12 2023-05-24 キヤノン株式会社 Film forming apparatus and article manufacturing method
JP7383450B2 (en) * 2019-10-23 2023-11-20 キヤノン株式会社 Imprint equipment, imprint method, and article manufacturing method
JP7401396B2 (en) 2020-06-04 2023-12-19 キヤノン株式会社 Imprint device, article manufacturing method, and measurement method for imprint device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03225940A (en) * 1990-01-31 1991-10-04 Fujitsu Ltd Manufacture of semiconductor device
JPH09148224A (en) * 1995-11-24 1997-06-06 Matsushita Electric Ind Co Ltd Aligner and pattern forming method
KR100274596B1 (en) * 1997-06-05 2000-12-15 윤종용 Method and apparatus for detecting particles on the stage holder
JP2003234265A (en) 2002-02-06 2003-08-22 Canon Inc Exposure device
JP2004047512A (en) 2002-07-08 2004-02-12 Tokyo Electron Ltd Method for identifying attracted state, method for releasing, method for processing, electrostatic attracting device, and treatment apparatus
JP5665336B2 (en) * 2009-04-06 2015-02-04 キヤノン株式会社 Substrate holding device and lithography apparatus using the same
JP6045363B2 (en) * 2012-01-27 2016-12-14 キヤノン株式会社 Imprint apparatus and article manufacturing method using the same
JP6066084B2 (en) * 2013-12-11 2017-01-25 日新イオン機器株式会社 Substrate holding device, semiconductor manufacturing device, and substrate adsorption determination method
JP6590598B2 (en) * 2015-08-31 2019-10-16 キヤノン株式会社 Imprint apparatus, imprint method, and article manufacturing method

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