JP2018044204A - Magnetic field generating device for magnetron sputtering - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a magnetic field generating device capable of averaging distribution of a magnetic flux density on a target and improving a utilization efficiency of the target.SOLUTION: The magnetic field generating device for magnetron sputtering is provided that has a racetrack geometry and generates a magnetic field on a target surface. The device has, on a base composed of a magnetic material, (a) a central part permanent magnet (perpendicular magnetization) arranged linearly, (b)a first intermediate part permanent magnet (perpendicular magnetization) arranged to surround the central part permanent magnet, (c) a pair of a second intermediate part permanent magnets (horizontal magnetization) arranged via a magnetic gap from the base to abut on an outer side surface of a long side of the first intermediate part permanent magnet, (d) a pair of a third intermediate part permanent magnets (perpendicular magnetization) arranged away from each other in an outer side of the second intermediate part permanent magnet, and (e) an outer peripheral part permanent magnet (perpendicular magnetization) arranged in a rectangle shape surrounding these permanent magnets.SELECTED DRAWING: Figure 1(a)

Description

  The present invention relates to a magnetic field generator incorporated in a magnetron sputtering apparatus used for forming a thin film on a substrate surface.

  Sputtering is a phenomenon in which atoms and molecules constituting the target are knocked out by colliding with an inert substance such as Ar at a high speed. By depositing these knocked-out atoms and molecules on the substrate, a thin film is formed. Can be formed. Magnetron sputtering is a technique that can increase the deposition rate of the target material on the substrate by incorporating a magnetic field inside the cathode, and that enables film formation at low temperatures because no collision of electrons with the substrate occurs. . Therefore, in the manufacturing process of electronic components such as semiconductor ICs, flat panel displays, solar cells, and reflective films, a magnetron sputtering method is often used to form a thin film on the substrate surface.

  The magnetron sputtering apparatus includes an anode-side substrate in a vacuum chamber, a target (cathode) disposed so as to face the substrate, and a magnetic field generator disposed below the target. Glow discharge is caused by applying a voltage between the anode and cathode, ionizing inert gas (such as Ar gas of about 0.1 Pa) in the vacuum chamber, while secondary electrons emitted from the target are magnetically applied. It is captured by the magnetic field formed by the generator and causes a cycloid motion on the target surface. Since the ionization of gas molecules is promoted by the cycloid motion of electrons, the film formation rate is remarkably increased as compared with the case where no magnetic field is used, and the adhesion strength of the film is increased.

  The magnetic field generator provided in the magnetron sputtering apparatus is an apparatus that can generate a magnetic field in a circular shape or a racetrack shape, for example, FIG. 9 (b) (or FIG. 5 (a), FIG. 5 (b) and As shown in FIG. 5 (c)), a linear central magnetic pole member, an outer peripheral magnetic pole member disposed so as to surround the central magnetic pole member, and a magnetization direction between the central magnetic pole member and the outer peripheral magnetic pole member Conventionally, a magnet having a plurality of permanent magnets installed so that the magnetic poles of the same polarity are opposed to the central magnetic pole member is used. When magnetron sputtering is performed using a magnetic field generator having such a configuration, the cross-sectional shape of the target erosion becomes V-shaped as shown in FIG. 11, and the target usage efficiency is not necessarily sufficient. I can not say.

  In conventional magnetron sputtering, in order to increase the use efficiency of the target, a method of making the erosion region of the target more uniform, that is, a method of changing the cross-sectional shape of the erosion from a V shape to a U shape has been considered. Examples of a method for making the erosion region of the target more uniform include a method of mechanically swinging the target or the magnetic circuit, a method of moving and rotating a part of the magnet in the magnetic circuit, and the like. However, the method of mechanically swinging the target or the magnetic circuit in order to make the erosion of the target uniform makes the apparatus larger and greatly increases the cost. Is the current situation.

  Japanese Patent Laid-Open No. 2004-83974 (Patent Document 1) discloses a line of magnetic force that spreads outward from the center of the target as the position where the vertical component of the magnetic flux density becomes zero on the substrate side with respect to the target surface moves away from the target in the vertical direction. A sputtering film forming method is disclosed in which a magnetic field having a shape is formed, and a film thickness distribution and a film quality distribution are made uniform by suppressing the diffusion of plasma to the substrate side by the magnetic field having the magnetic line shape. Specifically, a magnetic field generator as shown in FIGS. 1 and 2 of Patent Document 1 is disclosed. In Patent Document 1, an erosion region can be formed in a wide range from the center of the target to the outer edge of the target by forming the magnetic field lines near the target surface substantially parallel to the target surface, and the utilization efficiency of the target material is increased. It states that it can.

  However, the magnetic field generator described in Patent Document 1 forms a magnetic tunnel between the center and the outer edge of the target on the target surface, and the horizontal component of the magnetic flux density becomes zero near the center of the target surface. Magnetic field line shape in which the ratio (B1 / B2) of the absolute value B1 of the vertical component of the magnetic flux density at the position and the maximum value B2 of the absolute value of the vertical component of the magnetic flux density near the outer edge of the target surface is 2.5 or more, Since the vertical component (B1) of the magnetic flux density in the vicinity of the central portion is 2.5 times larger than that in the vicinity of the outer edge portion (B2), the erosion region is not sufficiently uniform, and further improvement is desired. It is rare.

Japanese Patent Laid-Open No. 2004-83974

  Accordingly, an object of the present invention is to provide a magnetic field generator for magnetron sputtering that can average the distribution of magnetic flux density on the target and improve the utilization efficiency of the target.

  As a result of intensive studies in view of the above object, the present inventors have found that (a) a linear central portion magnetized in a direction perpendicular to the target surface (hereinafter referred to as vertical magnetization) on a base made of a magnetic material. A permanent magnet, (b) a first intermediate permanent magnet (perpendicular magnetization) arranged in a rectangular shape so as to surround the central permanent magnet, and (c) the outer side of the long side of the first intermediate permanent magnet A pair of second intermediate permanent magnets (magnetized in a direction parallel to the target surface) disposed from the base via a magnetic air gap so as to abut the base, and (d) outside the second intermediate permanent magnets A magnetic field generator having a pair of third intermediate permanent magnets (perpendicular magnetization) arranged apart from each other and (d) an outer peripheral permanent magnet (perpendicular magnetization) arranged in a rectangular shape surrounding these permanent magnets Is because there are three or more locations where the vertical component of the magnetic flux density is zero. Erosion area spreads in a U-shape as compared with the conventional magnetic field generator, as a result, found that it is possible to significantly increase the utilization efficiency of the target, and conceived the present invention.

That is, the first magnetic field generator for magnetron sputtering of the present invention for generating a magnetic field on the target surface facing the target is as follows:
On the base made of magnetic material,
(a) a central permanent magnet arranged linearly so that the magnetization direction is perpendicular to the target surface;
(b) From the central permanent magnet to a rectangular shape surrounding the central permanent magnet so that the magnetization direction is perpendicular to the target surface and the magnetic pole facing the target is opposite to the central permanent magnet A first intermediate permanent magnet spaced apart;
(c) The magnetization direction is parallel to the target surface, and one magnetic pole is in contact with the outer surface of both long side portions of the first intermediate permanent magnet arranged in the rectangular shape on the side close to the target, and the outer A pair of second intermediate permanent magnets disposed from the base via a magnetic gap so that the magnetic poles facing the side faces are opposite to the magnetic poles facing the target of the central permanent magnet;
(d) The magnetizing direction is perpendicular to the target surface, and the magnetic poles facing the target are the same as the central permanent magnet, and are spaced apart from the pair of second intermediate permanent magnets. A pair of third intermediate permanent magnets,
(e) a rectangle surrounding the first, second and third intermediate permanent magnets such that the magnetization direction is perpendicular to the target surface and the magnetic poles facing the target are opposite to the central permanent magnets And an outer peripheral portion permanent magnet disposed apart from the first, second and third intermediate permanent magnets.

The second magnetic field generator for magnetron sputtering of the present invention for generating a magnetic field on the surface of the target facing the target is as follows.
On the base made of magnetic material,
(a) a central permanent magnet disposed such that the magnetization direction is perpendicular to the target surface;
(b) A first intermediate permanent magnet, a second intermediate permanent magnet, a third intermediate permanent magnet, and an outer peripheral permanent provided in order from the central permanent magnet so as to surround the central permanent magnet. A magnet,
The first intermediate permanent magnet is provided apart from the central permanent magnet so that the magnetization direction is perpendicular to the target surface and the magnetic pole facing the target is opposite to the central permanent magnet. And
The second intermediate permanent magnet has a magnetization direction parallel to the target surface, one magnetic pole abuts on the side close to the target of the first intermediate permanent magnet, and a magnetic pole facing the side surface is the center. Provided through the magnetic gap from the base so as to be opposite to the magnetic pole facing the target of the part permanent magnet,
The third intermediate permanent magnet is separated from the second intermediate permanent magnet such that the magnetization direction is perpendicular to the target surface and the magnetic pole facing the target is the same as the central permanent magnet. Provided,
The outer peripheral permanent magnet is spaced apart from the third intermediate permanent magnet so that the magnetization direction is perpendicular to the target surface and the magnetic pole facing the target is opposite to the central permanent magnet. It is characterized by being.

In the second magnetron sputtering magnetic field generator of the present invention,
The first intermediate permanent magnet, the second intermediate permanent magnet, the third intermediate permanent magnet, and the outer peripheral permanent magnet are preferably arranged in a regular polygonal shape or a circular shape. The regular polygon is preferably a regular tetragon or a regular octagon.

  In the case where the first magnetron sputtering magnetic field generator of the present invention is used, the magnetic flux density of the target surface is increased from a position facing the longitudinal center of the central permanent magnet toward a direction orthogonal to the longitudinal direction. It is preferable that there are three or more places where the vertical component is zero.

  When the second magnetron sputtering magnetic field generator of the present invention is used, the vertical component of the magnetic flux density becomes zero from the center of the central permanent magnet toward the outer peripheral permanent magnet on the target surface. It is preferable that three or more places exist.

The central permanent magnet and the outer peripheral permanent magnet are neodymium magnets,
The first intermediate permanent magnet, the second intermediate permanent magnet, and the third intermediate permanent magnet are preferably made of a ferrite magnet.

  It is preferable that the magnetic flux density in the direction parallel to the target surface at the position where the magnetic flux density in the direction perpendicular to the target surface is zero is 10 mT or more.

  By using the magnetic field generator of the present invention, there are three or more locations where the vertical component of the magnetic flux density on the target is zero, and the erosion region is expanded in a U shape as compared with the conventional magnetic field generator. Therefore, the progress of erosion of the target can be made more uniform, and the utilization efficiency of the target can be improved.

It is a top view which shows an example of the magnetic field generator for magnetron sputtering of this invention. FIG. 2 is an AA cross-sectional view of FIG. FIG. 2 is a BB cross-sectional view of FIG. 1 (a). It is a top view which shows another example of the magnetic field generator for magnetron sputtering of this invention. FIG. 3 is a cross-sectional view taken along the line CC in FIG. 1 is a plan view showing a magnetron sputtering magnetic field generator of Example 1. FIG. FIG. 4 is a sectional view taken along the line DD in FIG. 3 (a). FIG. 4 is a cross-sectional view taken along the line E-E in FIG. 3 is a plan view showing a magnetron sputtering magnetic field generator of Example 2. FIG. FIG. 5 is an FF sectional view of FIG. 4 (a). 6 is a plan view showing a magnetron sputtering magnetic field generator of Comparative Example 1. FIG. FIG. 6 is a GG sectional view of FIG. 5 (a). FIG. 6 is a cross-sectional view taken along the line HH in FIG. It is the graph which plotted the parallel component (solid line) and perpendicular component (broken line) of the magnetic flux density which generate | occur | produce on a target surface with the magnetic field generator of Example 1 in the arrow (alpha) direction. 6 is a graph in which a parallel component (solid line) and a vertical component (broken line) of magnetic flux density generated on a target surface by the magnetic field generator of Example 2 are plotted in the arrow β direction. 6 is a graph in which a parallel component (solid line) and a vertical component (broken line) of magnetic flux density generated on a target surface by the magnetic field generator of Example 2 are plotted in the arrow γ direction. It is the graph which plotted the parallel component (solid line) and vertical component (broken line) of the magnetic flux density which generate | occur | produce on a target surface with the magnetic field generator of the comparative example 1 in the arrow Y direction. In the magnetic field generator of Example 1, it is a schematic diagram which connects the point from which a magnetic flux density perpendicular | vertical component becomes zero connected with a broken line. In the magnetic field generator of the comparative example 1, it is a schematic diagram which connects the point from which a magnetic flux density perpendicular | vertical component becomes zero with a broken line. It is a schematic diagram showing the erosion cross-sectional shape of the target when magnetron sputtering is performed using the magnetic field generator for magnetron sputtering of the present invention. FIG. 10 is a schematic diagram showing an erosion cross-sectional shape of a target when magnetron sputtering is performed using the conventional magnetic field generator for magnetron sputtering shown in FIG. 9 (b).

[1] magnetic field generator for magnetron sputtering
(1) First ConfigurationA first magnetron sputtering magnetic field generator 1 of the present invention is opposed to a target 9 as shown in FIGS. 1 (a), 1 (b) and 1 (c), for example. And a plurality of permanent magnets for generating a racetrack-like magnetic field on the target surface.

The first magnetron sputtering magnetic field generator 1 is:
On the base 8 made of magnetic material,
(a) the central permanent magnet 2 arranged linearly so that the magnetization direction is perpendicular to the target surface 9a;
(b) the central direction in the rectangular shape surrounding the central permanent magnet 2 so that the magnetization direction is perpendicular to the target surface 9a and the magnetic pole facing the target 9 is opposite to the central permanent magnet 2 A first intermediate permanent magnet 3 disposed apart from the partial permanent magnet 2,
(c) The magnetization direction is parallel to the target surface 9a, and one of the magnetic poles contacts the outer side surface 3a of both long sides of the first intermediate permanent magnet 3 arranged in the rectangular shape on the side close to the target 9. A pair of second electrodes disposed from the base 8 via the magnetic air gap 11 so that the magnetic pole facing the outer surface 3a is opposite to the magnetic pole facing the target 9 of the central permanent magnet 2 Middle permanent magnet 4,
(d) Outside the pair of second intermediate permanent magnets 4 so that the magnetization direction is perpendicular to the target surface 9a and the magnetic poles facing the target 9 are the same as the central permanent magnets 2. A pair of third intermediate permanent magnets 5 spaced apart; and
(e) the first intermediate permanent magnet 3 and the second intermediate magnet so that the magnetization direction is perpendicular to the target surface 9a and the magnetic pole facing the target 9 is opposite to the central permanent magnet 2 In a rectangular shape surrounding the part permanent magnet 4 and the third intermediate part permanent magnet 5, spaced apart from the first intermediate part permanent magnet 3, the second intermediate part permanent magnet 4 and the third intermediate part permanent magnet 5. It has the outer peripheral part permanent magnet 6 arrange | positioned.

  As shown in FIG. 1 (b), the first magnetron sputtering magnetic field generator 1 is arranged between the central permanent magnet 2 and the first intermediate permanent magnet 3 in a cross section orthogonal to the central permanent magnet 2. Has a magnetic air gap 10a, and has a magnetic air gap 10b between the second intermediate permanent magnet 4 and the third intermediate permanent magnet 5, and the third intermediate permanent magnet 5 and the outer peripheral permanent magnet. A magnetic air gap 10c is provided between the magnet 6 and the magnetic air gap 11 is provided between the second intermediate permanent magnet 4 and the base 8 as described above. Further, as shown in FIG. 1 (c), in the longitudinal section of the central permanent magnet 2, there is a magnetic gap 12a between the central permanent magnet 2 and the first intermediate permanent magnet 3, A magnetic gap 12b is provided between the intermediate permanent magnet 3 and the outer peripheral permanent magnet 6. These magnetic gaps 10a, 10b, 10c, 11, 12a, 12b may be spaces or may be filled with nonmagnetic spacers.

  The lengths of the central permanent magnet 2, the first intermediate permanent magnet 3 and the outer peripheral permanent magnet 6 in the direction perpendicular to the target surface 9a are preferably substantially the same. The length of the third intermediate permanent magnet 5 in the direction perpendicular to the target surface 9a is preferably shorter than the length of the central permanent magnet 2 in the direction perpendicular to the target surface 9a.

  The surfaces of the central permanent magnet 2, the first intermediate permanent magnet 3, the second intermediate permanent magnet 4, and the outer peripheral permanent magnet 6 on the target 9 side are preferably on the same plane S. The surface of the third intermediate permanent magnet 5 on the target 9 side is preferably on the base 8 side with respect to the same plane S.

  The central permanent magnet 2, the second intermediate permanent magnet 4, and the third intermediate permanent magnet 5 may be formed integrally or may be configured by combining a plurality of permanent magnets. The first intermediate permanent magnet 3 and the outer peripheral permanent magnet 6 are preferably configured by combining at least four permanent magnets constituting the sides, and each side may be configured by combining a plurality of permanent magnets. . When a combination of a plurality of permanent magnets is used, the individual permanent magnets may be formed by sequentially sticking them on the base 8 with an adhesive or the like, or a permanent magnet in which several permanent magnets are bonded together in advance. The unit may be formed on the base 8 by pasting. The second intermediate permanent magnet 4 is preferably formed by adhering to the base 8 with an adhesive or the like via a spacer made of a non-magnetic material.

  1 (a), 1 (b) and 1 (c) show an example in which the target-side magnetic pole of the central permanent magnet 2 is an S pole, but this magnetic pole may be an N pole. Absent. In that case, all the magnetic poles of the other permanent magnets are also reversed.

(i) Central Permanent Magnet The central permanent magnet 2 is arranged on a base 8 made of a magnetic material so that a plurality of cuboid permanent magnets are connected and aligned so that the magnetization direction is perpendicular to the target surface 9a. It is preferable to arrange them in a straight line. The size and number of permanent magnets of each rectangular parallelepiped constituting the central permanent magnet 2 are not particularly limited, and may be set as appropriate for reasons such as ease of manufacturing a magnet and ease of assembly of a magnetic field generator. . Each permanent magnet may not have the same shape.

  The longitudinal length and width of the central permanent magnet 2 (the length in the direction perpendicular to the long axis direction in plan view) and the length in the direction perpendicular to the target surface 9a are the overall shape of the magnetic field generator 1, It can be arbitrarily set depending on the intensity of the magnetic field to be generated.

  In the case of using a rectangular target in a general magnetron sputtering apparatus, the size of the magnetic field generator is configured to be approximately the same as or slightly smaller than the target due to requirements from the fixing method and cooling method. Here, assuming that the size of the rectangular target and the magnetic field generator are equal, if the length in the longitudinal direction of the target (or magnetic field generator) is W1 and the length in the short direction is W2, the central permanent magnet 2 The length in the longitudinal direction is preferably greater than or equal to the difference between W1 and W2.

(ii) First intermediate permanent magnet The first intermediate permanent magnet 3 has a rectangular shape surrounding the central permanent magnet 2 so that the long side of the rectangle is parallel to the longitudinal direction of the central permanent magnet 2. The central permanent magnet 2 is arranged at a predetermined distance. A magnetic air gap 10a is provided between the central permanent magnet 2 and the long side portion of the first intermediate permanent magnet 3, and the central permanent magnet 2 and the short intermediate portion of the first intermediate permanent magnet 3 A magnetic air gap 12a is provided between them. The first intermediate permanent magnet 3 has a magnetization direction perpendicular to the target surface 9a and a magnetic pole (N pole in the figure) facing the target 9 on the target 9 side magnetic pole (see FIG. Then, it is arranged so as to be opposite to S pole).

  As in the case of the central permanent magnet 2, the first intermediate permanent magnet 3 is preferably constituted by connecting a plurality of rectangular parallelepiped permanent magnets. The size and number of permanent magnets of various shapes constituting the first intermediate permanent magnet 3 are not particularly limited, and are appropriately selected for reasons such as ease of manufacturing the magnet and ease of assembly of the magnetic field generator. You only have to set it.

  As in the case of the central permanent magnet 2, when it is assumed that the rectangular target and the magnetic field generator are equal in size, the length in the longitudinal direction of the target (magnetic field generator) is W1, and the length in the short direction is W2. The length of the long side of the first intermediate permanent magnet 3 configured in a rectangular shape is preferably greater than or equal to the difference between W1 and W2, and the length of the short side is the target (magnetic field generator). The ratio of the length W1 in the longitudinal direction and the length W2 in the lateral direction and the length of the long side may be set as appropriate. The width of the magnet constituting the first intermediate permanent magnet 3 and the length in the direction perpendicular to the target surface 9a are not particularly limited, and are arbitrarily set depending on the overall shape of the magnetic field generator, the strength of the generated magnetic field, etc. can do. However, the length in the direction perpendicular to the target surface 9a is preferably the same as the length of the central permanent magnet 2 in the direction perpendicular to the target surface 9a.

(iii) Second intermediate permanent magnet The second intermediate permanent magnet 4 is arranged on the outer surface 3a of both long sides of the first intermediate permanent magnet 3 arranged in a rectangular shape on the side closer to the target. It arrange | positions in a pair so that it may contact | abut. The second intermediate permanent magnet 4 has a magnetization direction parallel to the target surface 9a, one magnetic pole faces the outer surface 3a of the first intermediate permanent magnet 3 on the side close to the target, and the other magnetic pole Is installed so that it faces the third intermediate permanent magnet 5 side. The magnetic pole (N pole in the figure) of the second intermediate permanent magnet 4 on the side facing the outer surface 3a of the first intermediate permanent magnet 3 is the target side magnetic pole (in the figure, the N pole in the figure). It is configured to be the opposite of S pole).

  The second intermediate permanent magnet 4 is preferably configured by connecting a plurality of rectangular parallelepiped permanent magnets in the longitudinal direction and / or the width direction. The size and number of permanent magnets of various shapes constituting the second intermediate permanent magnet 4 are not particularly limited, and are appropriately selected for reasons such as ease of manufacturing the magnet and ease of assembly of the magnetic field generator. You only have to set it.

  A magnetic air gap 11 is provided between the second intermediate permanent magnet 4 and the base 8, and a magnetic air gap 10b is provided between the second intermediate permanent magnet 4 and the third intermediate permanent magnet 5. Provided. The magnetic air gap 11 and the magnetic air gap 10b may be magnetic air gaps, and may be, for example, a space or may be filled with a spacer made of a nonmagnetic material. In particular, the magnetic gap 11 is preferably filled with a spacer made of a nonmagnetic material.

  The longitudinal length of the second intermediate permanent magnet 4 is between the longitudinal length of the central permanent magnet 2 and the longitudinal direction (long side) length of the first intermediate permanent magnet 3. preferable. The width of the second intermediate permanent magnet 4 (the length in the direction perpendicular to the major axis direction in plan view) and the length in the direction perpendicular to the target surface 9a are not particularly limited, and the overall shape of the magnetic field generator It can be arbitrarily set depending on the intensity of the magnetic field to be generated. However, the length in the direction perpendicular to the target surface 9a is preferably 5 to 200% of the length of the central permanent magnet 2 in the direction perpendicular to the target surface 9a, and preferably 30 to 150%. More preferably, it is 30 to 100%.

(iv) Third Intermediate Permanent Magnet The third intermediate permanent magnet 5 is disposed outside the pair of second intermediate permanent magnets 4 (between the outer peripheral permanent magnet 6) and the pair of second permanent magnets. The middle permanent magnet 4 is arranged at a predetermined distance from the middle permanent magnet 4 in parallel with the central permanent magnet 2. The third middle permanent magnet 5 has a magnetization direction perpendicular to the target surface 9a and a magnetic pole (S pole in the figure) facing the target 9 on the target 9 side magnetic pole (in the figure) of the central permanent magnet 2 (S pole)

  As in the case of the central permanent magnet 2, the third intermediate permanent magnet 5 is preferably configured by connecting a plurality of rectangular parallelepiped permanent magnets. The size and number of permanent magnets of various shapes constituting the third intermediate permanent magnet 5 are not particularly limited, and are appropriately selected for reasons such as ease of manufacturing the magnet and ease of assembly of the magnetic field generator. You only have to set it.

  A magnetic gap 10c is provided between the third intermediate permanent magnet 5 and the outer peripheral permanent magnet 6. The magnetic gap 10c may be a magnetic gap, may be a space, or may be filled with a spacer made of a nonmagnetic material.

  The longitudinal length of the third intermediate permanent magnet 5 is between the longitudinal length of the central permanent magnet 2 and the longitudinal direction (long side) length of the first intermediate permanent magnet 3. preferable. The width of the third intermediate permanent magnet 5 (the length in the direction perpendicular to the major axis direction in plan view) and the length in the direction perpendicular to the target surface 9a are not particularly limited, but the overall shape of the magnetic field generator It can be arbitrarily set depending on the intensity of the magnetic field to be generated. The surface of the third intermediate permanent magnet 5 on the target 9 side is preferably closer to the base 8 than the surface of the central permanent magnet 2 on the target 9 side. The length in the direction perpendicular to the target surface 9a is preferably 5 to 80% of the length of the central permanent magnet 2 in the direction perpendicular to the target surface 9a.

(v) Peripheral permanent magnet Peripheral permanent magnet 6 surrounds all of said central permanent magnet 2, first intermediate permanent magnet 3, second intermediate permanent magnet 4 and third intermediate permanent magnet 5. It is arranged in a rectangular shape at a predetermined distance from these permanent magnets so that the long side of the rectangle is parallel to the longitudinal direction of the central permanent magnet 2. The outer peripheral permanent magnet 6 has a magnetization direction perpendicular to the target surface 9a and a magnetic pole (N pole in the figure) facing the target 9 on the target 9 side magnetic pole (S pole in the figure) of the central permanent magnet 2 ) Place it in the opposite direction. That is, the outer peripheral permanent magnet 6 is provided so as to form the outer periphery of the magnetic field generator.

  The outer peripheral permanent magnet 6 is preferably composed of a plurality of rectangular parallelepiped permanent magnets, and the size and number of permanent magnets used in each rectangular parallelepiped are not particularly limited. What is necessary is just to set suitably for reasons, such as assembly ease of an apparatus. Each permanent magnet may not have the same shape.

  The long side and the short side of the outer peripheral permanent magnet 6, the width of the permanent magnet and the length in the direction perpendicular to the target surface 9a are arbitrary depending on the overall shape of the magnetic field generator 1, the strength of the generated magnetic field, etc. Can be set to However, the length in the direction perpendicular to the target surface 9a is preferably the same as the length of the central permanent magnet 2 in the direction perpendicular to the target surface 9a.

(vi) Permanent magnet The permanent magnet constituting the magnetic field generator for magnetron sputtering can be formed of a known permanent magnet material. The material of the permanent magnet to be used may be appropriately set depending on the equipment configuration (distance from the magnetic field generator to the target) and the required magnetic field strength, but R (at least one of rare earth elements such as Nd), T (Fe Or rare earth iron-based boron magnets (neodymium magnets) such as Fe and Co) and B as essential components, rare earth sintered magnets (with various surface treatments in view of corrosion resistance) or ferrite magnets Is preferred. As the rare earth sintered magnet, a neodymium magnet is particularly preferable.

  In particular, the central permanent magnet 2 and the outer peripheral permanent magnet 6 are preferably composed of rare earth sintered magnets (particularly neodymium magnets). The first intermediate permanent magnet 3, the second intermediate permanent magnet 4, and the third intermediate permanent magnet 5 are preferably made of ferrite magnets. The first intermediate permanent magnet 3, the second intermediate permanent magnet 4, and the third intermediate permanent magnet 5 have a nonmagnetic spacer disposed between the magnet size, the distance from the target, or the base. A rare earth sintered magnet can also be used if it is adjusted by such a method.

  In the magnetron sputtering magnetic field generator 1, the permanent magnet and the magnetic member are preferably configured so that the parallel component of the magnetic flux density at the position where the magnetic flux density vertical component becomes zero on the target surface 9a is 10 mT or more.

  In the target surface 9a, there are three or more locations where the vertical component of the magnetic flux density is zero from the position facing the center in the longitudinal direction of the central permanent magnet 2 toward the direction orthogonal to the longitudinal direction. preferable.

(2) Second ConfigurationThe second magnetron sputtering magnetic field generator 101 of the present invention is, for example, as shown in FIGS. 2 (a) and 2 (b), facing the target 9, and a substantially concentric magnetic field. It consists of a plurality of permanent magnets to generate a strong magnetic field.

The second magnetron sputtering magnetic field generator 101 is:
On the base 108 made of magnetic material,
(a) a central permanent magnet 102 disposed so that the magnetization direction is perpendicular to the target surface 9a;
(b) A first intermediate permanent magnet 103, a second intermediate permanent magnet 104, and a third intermediate permanent magnet provided in order from the central permanent magnet 102 so as to surround the central permanent magnet 102. 105 and outer peripheral permanent magnet 106,
The first intermediate permanent magnet 103 has a magnetization direction perpendicular to the target surface 9a and a magnetic pole facing the target 9 opposite to the central permanent magnet 102. Provided away from
The second intermediate permanent magnet 104 has a magnetization direction parallel to the target surface 9a, and one magnetic pole abuts on the outer surface 103a of the first intermediate permanent magnet 103 on the side close to the target 9, The magnetic pole facing the outer side surface 103a is provided from the base 108 through a magnetic gap so that the magnetic pole facing the target 9 of the central permanent magnet 102 is opposite to the magnetic pole.
The third intermediate permanent magnet 105 is configured such that the magnetization direction is perpendicular to the target surface 9a and the magnetic pole facing the target 9 is the same as the central permanent magnet 102. Provided apart from the permanent magnet 104,
The outer peripheral permanent magnet 106 has the third intermediate permanent magnet 105 so that the magnetization direction is perpendicular to the target surface 9a and the magnetic pole facing the target 9 is opposite to the central permanent magnet 102. It is provided away from.

  The second magnetron sputtering magnetic field generator 101 has, for example, a square appearance as shown in FIG.2 (a), and the first permanent magnet 102 is centered on the base 108. The intermediate permanent magnet 103, the second intermediate permanent magnet 104, the third intermediate permanent magnet 105, and the outer peripheral permanent magnet 106 are arranged so as to surround in a regular square shape in order from the inside. . The CC cross section (FIG. 2 (b)) in FIG. 2 (a) has the same configuration as the AA cross section in FIG. 1 (a) (FIG. 1 (b)), and the second magnetron sputtering magnetic field generator 101 is This configuration is arranged in four-fold symmetry with the central permanent magnet 102 as the central axis.

  In the CC cross section of FIG. 2 (a), there is a magnetic air gap 110a between the central permanent magnet 102 and the first intermediate permanent magnet 103, and the second intermediate permanent magnet 104 and the third intermediate part. A magnetic gap 110b is provided between the permanent magnet 105 and a magnetic gap 110c is provided between the third intermediate permanent magnet 105 and the outer peripheral permanent magnet 106. A magnetic air gap 111 is provided between the permanent magnet 104 and the base 108. These magnetic gaps 110a, 110b, 110c, and 111 may be spaces or may be filled with nonmagnetic spacers.

  The lengths of the central permanent magnet 102, the first intermediate permanent magnet 103, and the outer peripheral permanent magnet 106 in the direction perpendicular to the target surface 9a are preferably substantially the same. The length of the third intermediate permanent magnet 105 in the direction perpendicular to the target surface 9a is preferably shorter than the length of the central permanent magnet 102 in the direction perpendicular to the target surface 9a.

  It is preferable that the surfaces of the central permanent magnet 102, the first intermediate permanent magnet 103, the second intermediate permanent magnet 104, and the outer peripheral permanent magnet 106 on the target 9 side are on the same plane S. The surface of the third intermediate permanent magnet 105 on the target 9 side is preferably on the base 108 side with respect to the same plane S.

  The central permanent magnet 102 may be integrally formed or may be configured by combining a plurality of permanent magnets. The first intermediate permanent magnet 103, the second intermediate permanent magnet 104, the third intermediate permanent magnet 105, and the outer peripheral permanent magnet 106 are configured by combining at least four permanent magnets constituting each side. Further, each side may be configured by combining a plurality of permanent magnets. When a combination of a plurality of permanent magnets is used, the individual permanent magnets may be formed on the base 108 in order by adhering them with an adhesive or the like, or some permanent magnets may be integrated in advance. The unit may be formed on the base 108 by sticking. The second intermediate permanent magnet 104 is preferably formed by adhering to the base 108 with an adhesive or the like via a spacer made of a non-magnetic material.

  2A and 2B show an example in which the target-side magnetic pole of the central permanent magnet 102 is an S pole, but the magnetic pole may be an N pole. In that case, all the magnetic poles of the other permanent magnets are also reversed.

  The magnetic field generator shown in FIGS. 2 (a) and 2 (b) shows an example in which the whole is formed in a regular tetragon (four-fold symmetry) in plan view, but the second magnetron sputtering magnetic field generator is It may have a shape other than a regular square in plan view. For example, in a plan view, it may be a regular polygon such as a regular pentagon, a regular hexagon, a regular heptagon, a regular octagon, a polygon having a three-fold symmetry axis, a four-fold symmetry axis, etc., or a circle. . Preferably, they are a regular tetragon, a regular pentagon, and a regular hexagon.

(i) Central Permanent Magnet The central permanent magnet 102 is a quadrangular prism permanent magnet substantially at the center on the base 108 made of a magnetic material, and the magnetization direction (four-fold axis direction) is perpendicular to the target surface 9a. It is preferable to arrange them as follows. The plan view shape of the permanent magnet constituting the central permanent magnet 102 is not particularly limited, and may be set as appropriate for reasons such as ease of manufacture of the magnet and ease of assembly of the magnetic field generator. In FIG. 2 (a), a quadrangular prism permanent magnet is used, but it may be a cylinder or a regular polygonal column (regular hexagonal column, regular octagonal column, etc.).

  The size of the central permanent magnet 102 in plan view (the length of one side in the case of a polygon or the diameter in the case of a circle) and the length in the direction perpendicular to the target surface 9a are determined from the upper surface of the central permanent magnet 102 to the target surface. It can be arbitrarily set while being proportional to the distance to 9a and the strength of the magnetic field to be generated.

(ii) First Intermediate Permanent Magnet The first intermediate permanent magnet 103 is arranged in a regular square shape surrounding the central permanent magnet 102 at a predetermined distance from the central permanent magnet 102. A magnetic air gap 110 a is provided between the central permanent magnet 102 and the long side portion of the first intermediate permanent magnet 103. The first intermediate permanent magnet 103 has a magnetization direction perpendicular to the target surface 9a, and a magnetic pole (N pole in the figure) facing the target 9 is the target 9 side magnetic pole (in the figure, the central permanent magnet 102). S pole)

  The first intermediate permanent magnet 103 is preferably configured by connecting a plurality of rectangular parallelepiped permanent magnets. There are no particular limitations on the size and number of permanent magnets of the various shapes constituting the first intermediate permanent magnet 103, and it is appropriate for reasons such as ease of manufacturing the magnet and ease of assembly of the magnetic field generator. You only have to set it.

The length W ₁₀₃ on one side of the first intermediate permanent magnet 103 configured in a square shape is preferably 21 to 27% of the length (W1 or W2) on one side of the base. The width of the magnet constituting the first intermediate permanent magnet 103 and the length in the direction perpendicular to the target surface 9a are not particularly limited, and are arbitrarily set depending on the overall shape of the magnetic field generator, the strength of the magnetic field to be generated, etc. can do. However, the length in the direction perpendicular to the target surface 9a is preferably the same as the length of the central permanent magnet 102 in the direction perpendicular to the target surface 9a.

(iii) Second intermediate permanent magnet The second intermediate permanent magnet 104 is closer to the target on the outer surface 103a of both long sides of the first intermediate permanent magnet 103 arranged in a regular square shape. And are arranged in a regular square shape so as to surround the outer periphery of the first intermediate permanent magnet 103. The second intermediate permanent magnet 104 has a magnetization direction parallel to the target surface 9a, one magnetic pole faces the outer surface 103a of the first intermediate permanent magnet 103 on the side close to the target, and the other magnetic pole Is installed so as to face the third intermediate permanent magnet 105 side. The magnetic pole (N pole in the figure) of the second intermediate permanent magnet 104 on the side facing the outer surface 103a of the first intermediate permanent magnet 103 is the target side magnetic pole (in the figure, the N pole in the figure). It is configured to be the opposite of S pole).

  The second intermediate permanent magnet 104 is preferably configured by connecting a plurality of rectangular parallelepiped permanent magnets. The size and number of permanent magnets of various shapes constituting the second intermediate permanent magnet 104 are not particularly limited, and are appropriately selected for reasons such as ease of manufacturing the magnet and ease of assembly of the magnetic field generator. You only have to set it.

  A magnetic air gap 111 is provided between the second intermediate permanent magnet 104 and the base 108, and a magnetic air gap 110b is provided between the second intermediate permanent magnet 104 and the third intermediate permanent magnet 105. Provided. The magnetic air gap 111 and the magnetic air gap 110b may be magnetic air gaps, and may be, for example, a space or may be filled with a spacer made of a nonmagnetic material. In particular, the magnetic gap 111 is preferably filled with a spacer made of a nonmagnetic material.

The length W ₁₀₄ of one side of the second intermediate permanent magnet 104 configured in a square shape is preferably 46 to 52% of the length (W1 or W2) of one side of the base. The width of the second intermediate permanent magnet 104 and the length in the direction perpendicular to the target surface 9a are not particularly limited, and can be arbitrarily set depending on the overall shape of the magnetic field generator, the strength of the generated magnetic field, and the like. . However, the length in the direction perpendicular to the target surface 9a is preferably 5 to 200% of the length of the central permanent magnet 102 in the direction perpendicular to the target surface 9a, and preferably 30 to 150%. More preferably, it is 30 to 100%.

(iv) Third Intermediate Permanent Magnet The third intermediate permanent magnet 105 is disposed outside the second intermediate permanent magnet 104 (between the outer peripheral permanent magnet 106) and the second intermediate permanent magnet 104. Is disposed in a regular square shape surrounding the second intermediate permanent magnet 104 at a predetermined distance. The third intermediate permanent magnet 105 has a magnetization direction perpendicular to the target surface 9a, and a magnetic pole (S pole in the figure) facing the target 9 is the target 9 side magnetic pole (in the figure, the central permanent magnet 102). (S pole)

  As in the case of the first intermediate permanent magnet 103, the third intermediate permanent magnet 105 is preferably configured by connecting a plurality of rectangular parallelepiped permanent magnets. The size and number of permanent magnets of various shapes constituting the third intermediate permanent magnet 105 are not particularly limited, and are appropriately selected for reasons such as ease of manufacturing a magnet and ease of assembly of a magnetic field generator. You only have to set it.

  A magnetic air gap 110c is provided between the third intermediate permanent magnet 105 and the outer peripheral permanent magnet 106. The magnetic air gap 110c may be a magnetic air gap, may be a space, or may be filled with a spacer made of a nonmagnetic material.

The length W ₁₀₅ on one side of the outer periphery of the third intermediate permanent magnet 105 is preferably 64 to 70% of the length (W1 or W2) on one side of the base. The width of the third intermediate permanent magnet 105 and the length in the direction perpendicular to the target surface 9a are not particularly limited and can be arbitrarily set depending on the overall shape of the magnetic field generator, the strength of the generated magnetic field, and the like. . The surface of the third intermediate permanent magnet 105 on the target 9 side is preferably closer to the base 108 than the surface of the central permanent magnet 102 on the target 9 side. The length in the direction perpendicular to the target surface 9a is preferably 5 to 80% of the length of the central permanent magnet 102 in the direction perpendicular to the target surface 9a.

(v) Peripheral Permanent Magnet The outer peripheral permanent magnet 106 is arranged in a regular square shape surrounding the third intermediate permanent magnet 105 at a predetermined distance from the third intermediate permanent magnet 105. The outer peripheral permanent magnet 106 has a magnetization direction perpendicular to the target surface 9a, and a magnetic pole (N pole in the figure) facing the target 9 is the target 9 side magnetic pole (S pole in the figure) of the central permanent magnet 102. ) Place it in the opposite direction. That is, the outer peripheral permanent magnet 106 is provided so as to form the outer periphery of the magnetic field generator.

  As in the case of the first intermediate permanent magnet 103, the outer peripheral permanent magnet 106 is preferably configured by connecting a plurality of rectangular parallelepiped permanent magnets. The size and number of permanent magnets used in each rectangular parallelepiped are It is not particularly limited, and may be set as appropriate for reasons such as ease of manufacturing a magnet and ease of assembly of a magnetic field generator. Each permanent magnet may not have the same shape.

The length W ₁₀₆ on one side of the outer periphery of the outer peripheral permanent magnet 106 is preferably 84 to 90% of the length (W1 or W2) on one side of the base. The width of the permanent magnets constituting the outer peripheral permanent magnet 106 and the length in the direction perpendicular to the target surface 9a can be arbitrarily set according to the overall shape of the magnetic field generator 101, the strength of the generated magnetic field, and the like. However, the length in the direction perpendicular to the target surface 9a is preferably the same as the length of the central permanent magnet 102 in the direction perpendicular to the target surface 9a.

(vi) Permanent magnet The permanent magnet constituting the magnetic field generator for magnetron sputtering can be formed of a known permanent magnet material. The material of the permanent magnet to be used may be appropriately set depending on the equipment configuration (distance from the magnetic field generator to the target) and the required magnetic field strength, but R (at least one of rare earth elements such as Nd), T (Fe Or rare earth iron-based boron magnets (neodymium magnets) such as Fe and Co) and B as essential components, rare earth sintered magnets (with various surface treatments in view of corrosion resistance) or ferrite magnets Is preferred. As the rare earth sintered magnet, a neodymium magnet is particularly preferable.

  In particular, the central permanent magnet 102 and the outer peripheral permanent magnet 106 are preferably made of a rare earth sintered magnet (particularly a neodymium magnet). The first intermediate permanent magnet 103, the second intermediate permanent magnet 104, and the third intermediate permanent magnet 105 are preferably made of ferrite magnets. The first intermediate permanent magnet 103, the second intermediate permanent magnet 104, and the third intermediate permanent magnet 105 have a nonmagnetic spacer disposed between the magnet size, the distance from the target, or the base. A rare earth sintered magnet can also be used if it is adjusted by such a method.

  In the magnetic field generator 101 for magnetron sputtering, it is preferable that the permanent magnet and the magnetic member are configured such that the parallel component of the magnetic flux density at the position where the perpendicular magnetic flux density component is zero on the target surface 9a is 10 mT or more.

  In the target surface 9a, there are three or more locations where the vertical component of the magnetic flux density becomes zero from the position facing the center of the central permanent magnet 102 in the direction parallel to the side of the square and the diagonal direction. Is preferred.

  The present invention will be described in more detail with reference to examples, but the present invention is not limited thereto.

Example 1
A magnetic field generator 201 of Example 1 is shown in FIGS. 3 (a) to 3 (c). The magnetic field generator 201 includes a central permanent magnet 202 and a peripheral permanent magnet made of a rare earth sintered magnet (NMX-48BH made by Hitachi Metals, residual magnetic flux density: about 1,360 mT) on a base 208 made of steel plate (SS400). 206, and a first intermediate permanent magnet 203, a second intermediate permanent magnet 204, and a third intermediate permanent magnet made of sintered ferrite magnet (NMF-12F made by Hitachi Metals, residual magnetic flux density: about 460 mT) 205, W1 = 298 mm, W2 = 198 mm, a = 5 mm, b = 6 mm, c = 25 mm, d = 8 mm, e = 10 mm, f = 5 mm, h = 5 mm, i = 8 mm, j = 14 mm, k = 20 mm, g1 = 15 mm, g2 = 10 mm, g3 = 10 mm, g4 = 5 mm, and g5 = 40 mm. Although not shown, the center permanent magnet 202, the first intermediate permanent magnet 203, the second intermediate permanent magnet 204, the third intermediate permanent magnet 205, the outer peripheral permanent magnet 206, and the base 208 are used. The enclosed magnetic voids 210a, 210b, 210c, 211, 212a, 212b were filled with nonmagnetic (aluminum) spacers.

  The magnetic flux density at a position [corresponding to the position of the target surface (not shown)] 20 mm from the surface (surface facing the target) of the magnetic field generator 201 of Example 1 is obtained by magnetic field analysis. A component parallel to the magnetic flux density (parallel component of magnetic flux density) and a component perpendicular to the magnetic flux density (vertical component of magnetic flux density) from the center of the central permanent magnet 202 to the outer peripheral permanent magnet 206 (α direction shown in FIG. 3 (a)). The magnetic flux density distribution was obtained by plotting. The results are shown in FIG. In FIG. 6, the horizontal axis represents the distance from the center of the central permanent magnet 202, and the vertical magnetic flux density component is indicated by a dotted line, and the horizontal magnetic flux density component is indicated by a solid line.

Example 2
A magnetic field generator 301 of Example 2 is shown in FIGS. 4 (a) and 4 (b). The magnetic field generator 301 includes a central permanent magnet 302 and an outer peripheral permanent magnet made of a rare earth sintered magnet (NMX-48BH made by Hitachi Metals, residual magnetic flux density: about 1,360 mT) on a base 308 made of steel plate (SS400). 306, and a ferrite sintered magnet (NMF-12F made by Hitachi Metals, residual magnetic flux density: about 460 mT), a first intermediate permanent magnet 303, a second intermediate permanent magnet 304, and a third intermediate permanent magnet 305, W1 = W2 = 396 mm, a = 10 mm, b = 12 mm, c = 50 mm, d = 16 mm, e = 20 mm, i = 8 mm, j = 14 mm, k = 20 mm, The electrodes were arranged so that g1 = 30 mm, g2 = 20 mm, and g3 = 20 mm. Although not shown, the center permanent magnet 302, the first intermediate permanent magnet 303, the second intermediate permanent magnet 304, the third intermediate permanent magnet 305, the outer peripheral permanent magnet 306, and the base 308 are used. The enclosed magnetic air gaps 310a, 310b, 310c, 311 were filled with nonmagnetic (aluminum) spacers.

  In the same manner as in Example 1, the magnetic flux density at a position [corresponding to the position of the target surface (not shown)] 20 mm from the surface (surface facing the target) of the magnetic field generator 301 of Example 2 was determined by magnetic field analysis. The magnetic flux density component parallel to the target surface of the magnetic flux density (magnetic flux density parallel component) and the vertical component (magnetic flux density vertical component) are parallel to the center permanent magnet 302 to the outer peripheral permanent magnet 306 (see FIG. The magnetic flux density distribution was obtained by plotting in the β direction described in 4 (a) and the diagonal direction (γ direction described in FIG. 4 (a)). The results are shown in FIGS. 7 (a) and 7 (b), respectively. 7 (a) and 7 (b), the horizontal axis represents the distance from the center of the central permanent magnet 302, and the vertical magnetic flux density component is indicated by a dotted line, and the horizontal magnetic flux density component is indicated by a solid line.

Comparative Example 1
As shown in FIG. 5 (a) to FIG. 5 (c), on a base 408 made of austenitic stainless steel (SUS304), a central magnetic pole member 402 and an outer magnetic pole member 403 made of ferritic stainless steel (SUS430), and ferrite A permanent magnet 404 for a straight portion and a permanent magnet 405 for a corner portion made of sintered magnets (NMX-5D made by Hitachi Metals, residual magnetic flux density: about 360 mT) are magnetized with a magnetic pole having a magnetization direction parallel to the target surface and the same polarity. The magnetic field generator 401 (W1 = 298 mm, W2 = 198 mm, A = 10 mm, B = 10 mm, C = 10 mm, D = 35 mm, G1 = 84 mm and G2 = 84 mm).

  In the same manner as in Example 1, the magnetic flux density at a position [corresponding to the position of the target surface (not shown)] 20 mm from the surface (the surface facing the target) of the magnetic field generator 401 of Comparative Example 1 was determined by magnetic field analysis. The magnetic flux density component parallel to the target surface (magnetic flux density parallel component) and perpendicular component (magnetic flux density vertical component) is obtained from the center of the central magnetic pole member 402 toward the outer magnetic pole member 403 (FIG. 5 (a)). The magnetic flux density distribution was obtained by plotting in the indicated Y direction). The results are shown in FIG. In FIG. 8, the horizontal axis represents the distance from the center of the central magnetic pole member 202, and the vertical component of magnetic flux density is indicated by a dotted line and the horizontal component of magnetic flux density is indicated by a solid line.

  6 and 8, the magnetic field generator 401 of Comparative Example 1 has only one point (P1) where the vertical component of the magnetic flux density is zero in the magnetic flux density distribution in the Y direction. It can be seen that the magnetic field generator 201 (Example 1) has three points (P1, P2, and P3) where the magnetic flux density vertical component becomes zero in the magnetic flux density distribution in the α direction. FIGS. 9A and 9B show lines (dotted lines) connecting points at which the magnetic flux density vertical component becomes zero in the magnetic field generators of Example 1 and Comparative Example 1, respectively. Further, from FIG. 7 (a) and FIG. 7 (b), the magnetic field generator 301 (Embodiment 2) of the present invention has three points where the magnetic flux density vertical component becomes zero in the magnetic flux density distribution in the β direction (P1 , P2 and P3), and in the magnetic flux density distribution in the γ direction, it can be seen that there are five points (P1, P2, P3, P4 and P5) where the perpendicular component of the magnetic flux density is zero.

  Since the magnetic field generator 201 (Example 1) and the magnetic field generator 301 (Example 2) of the present invention have three or more points where the magnetic flux density vertical component becomes zero in this way, the magnetic field generation of the comparative example 1 Compared with the device 401, the erosion area is expected to expand from a V shape as shown in FIG. 11 to a U shape as shown in FIG. 10, making the erosion progress of the target more uniform and improving the utilization efficiency of the target. Can do.

1, 101, 102, 103 ... Magnetic field generator
2, 102, 202, 302 ... permanent permanent magnet
3, 103, 203, 204 ... first intermediate permanent magnet
3a, 203a ・ ・ ・ Side
4, 104, 204, 304 ... second intermediate permanent magnet
5, 105, 205, 305 ... Third intermediate permanent magnet
6, 106, 206, 306 ... Peripheral permanent magnet
8, 108, 208, 308 ... base
9 ... Target
9a ・ ・ ・ Target surface
10a, 10b, 10c, 210a, 210b, 210c ... Magnetic gap
11, 211 ... Magnetic gap
12a, 12b, 212a, 212b ... magnetic gap
110a, 110b, 110c, 310a, 310b, 310c ... Magnetic gap
111, 311 ... magnetic gap
401 ... Magnetic field generator of Comparative Example 1
402 ・ ・ ・ Central magnetic pole member
403 ... Peripheral magnetic pole member
404 ・ ・ ・ Permanent magnet for straight section
405 ... Permanent magnet for corner
408 ... Base

Claims (8)

A magnetron sputtering magnetic field generator for generating a magnetic field on a target surface facing a target,
On the base made of magnetic material,
(a) a central permanent magnet arranged linearly so that the magnetization direction is perpendicular to the target surface;
(b) From the central permanent magnet to a rectangular shape surrounding the central permanent magnet so that the magnetization direction is perpendicular to the target surface and the magnetic pole facing the target is opposite to the central permanent magnet A first intermediate permanent magnet spaced apart;
(c) The magnetization direction is parallel to the target surface, and one magnetic pole is in contact with the outer surface of both long side portions of the first intermediate permanent magnet arranged in the rectangular shape on the side close to the target, and the outer A pair of second intermediate permanent magnets disposed from the base via a magnetic gap so that the magnetic poles facing the side faces are opposite to the magnetic poles facing the target of the central permanent magnet;
(d) The magnetizing direction is perpendicular to the target surface, and the magnetic poles facing the target are the same as the central permanent magnet, and are spaced apart from the pair of second intermediate permanent magnets. A pair of third intermediate permanent magnets,
(e) a rectangle surrounding the first, second and third intermediate permanent magnets such that the magnetization direction is perpendicular to the target surface and the magnetic poles facing the target are opposite to the central permanent magnets A magnetron sputtering magnetic field generator, comprising: an outer peripheral permanent magnet disposed apart from the first, second and third intermediate permanent magnets. A magnetron sputtering magnetic field generator for generating a magnetic field on a target surface facing a target,
On the base made of magnetic material,
(a) a central permanent magnet disposed such that the magnetization direction is perpendicular to the target surface;
(b) A first intermediate permanent magnet, a second intermediate permanent magnet, a third intermediate permanent magnet, and an outer peripheral permanent provided in order from the central permanent magnet so as to surround the central permanent magnet. A magnet,
The first intermediate permanent magnet is provided apart from the central permanent magnet so that the magnetization direction is perpendicular to the target surface and the magnetic pole facing the target is opposite to the central permanent magnet. And
The second intermediate permanent magnet has a magnetization direction parallel to the target surface, and one magnetic pole abuts on the outer surface of the first intermediate permanent magnet on the side close to the target and faces the outer surface. The magnetic pole is provided through the magnetic gap from the base so that the magnetic pole is opposite to the magnetic pole facing the target of the central permanent magnet,
The third intermediate permanent magnet is separated from the second intermediate permanent magnet such that the magnetization direction is perpendicular to the target surface and the magnetic pole facing the target is the same as the central permanent magnet. Provided,
The outer peripheral permanent magnet is spaced apart from the third intermediate permanent magnet so that the magnetization direction is perpendicular to the target surface and the magnetic pole facing the target is opposite to the central permanent magnet. A magnetic field generator for magnetron sputtering characterized by the above. In the magnetic field generator for magnetron sputtering according to claim 2,
The first intermediate permanent magnet, the second intermediate permanent magnet, the third intermediate permanent magnet, and the outer peripheral permanent magnet are arranged in a regular polygonal shape or a circular shape. Magnetic field generator for magnetron sputtering. In the magnetic field generator for magnetron sputtering according to claim 3,
2. The magnetron sputtering magnetic field generator according to claim 1, wherein the regular polygon is any one of a regular square and a regular octagon. In the magnetic field generator for magnetron sputtering according to claim 1,
In the target surface, there are three or more locations where the vertical component of the magnetic flux density becomes zero from a position facing the center in the longitudinal direction of the central permanent magnet toward a direction orthogonal to the longitudinal direction. Magnetic field generator for magnetron sputtering. In the magnetic field generator for magnetron sputtering in any one of Claims 2-4,
Magnetic field generation for magnetron sputtering characterized in that there are three or more locations on the target surface where the perpendicular component of the magnetic flux density becomes zero from the center of the central permanent magnet toward the outer peripheral permanent magnet. apparatus. In the magnetic field generator for magnetron sputtering according to any one of claims 1 to 6,
The central permanent magnet and the outer peripheral permanent magnet are neodymium magnets,
The magnetic field generator for magnetron sputtering, wherein the first intermediate permanent magnet, the second intermediate permanent magnet, and the third intermediate permanent magnet are made of a ferrite magnet.   The magnetic field generator for magnetron sputtering according to any one of claims 1 to 7, wherein a magnetic flux density in a direction parallel to the target surface at a position where a magnetic flux density in a direction perpendicular to the target surface is zero. A magnetic field generator for magnetron sputtering, characterized in that is 10 mT or more.

Images