JP2017217832A5 - - Google Patents

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JP2017217832A5
JP2017217832A5 JP2016114116A JP2016114116A JP2017217832A5 JP 2017217832 A5 JP2017217832 A5 JP 2017217832A5 JP 2016114116 A JP2016114116 A JP 2016114116A JP 2016114116 A JP2016114116 A JP 2016114116A JP 2017217832 A5 JP2017217832 A5 JP 2017217832A5
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Prior art keywords
laminated film
heating
resin layer
less
measurement
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JP2016114116A
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JP2017217832A (en
JP6747072B2 (en
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Claims (7)

基材層の少なくとも片面に樹脂層が積層された積層フィルムであって、
前記樹脂層表面において、以下の測定方法で測定される凹部比率が1%以上50%以下である積層フィルム。
[凹部比率の測定方法]
Burker Corporation製の原子間力顕微鏡 DimensionIconを用い、下記測定条件にて表面粗さ測定を行う。得られたHeightSensorチャンネルの表面粗さデータを「NanoScopeAnalysis V1.40」にて解析する。解析は、下記の解析条件にて平面近似(Plane fit)した後に行い、近似して得られた基準面の高さを深さ0nmと規定する。無作為に選んだ長さ10μmの断面チャートにおいて、基準面からの最大深さが5nm以上40nm以下であるピークを直線へと投影した長さの和(ΣDn)を、断面チャートの全長さ10μmで除した比率を凹部比率(%)とする(凹部比率=(ΣDn/10)×100)。表面測定を測定範囲を変えて10回測定を行い、測定範囲ごとに各々無作為に選んだ10点の断面チャートから凹部比率(%)を求め、計100回の平均値を凹部比率(%)とする。
<測定条件>
測定装置 : Burker Corporation製原子間力顕微鏡(AFM)
測定モード : ScanAsyst
カンチレバー: ブルカーAXS社製SCANASYST-AIR
(材質:Si、バネ定数K:0.4(N/m)、先端曲率半径R:2(nm))
測定雰囲気 : 23℃・大気中
測定範囲 : 10(μm)四方
分解能 : 512×512
カンチレバー移動速度: 10(μm/s)
<解析条件>
Plane Fit Mode:XY
Plane Fit Order:3rd
A laminated film in which a resin layer is laminated on at least one surface of a base material layer,
The laminated film whose recess ratio measured by the following measuring method is 1% or more and 50% or less on the surface of the resin layer.
[Method of measuring recess ratio]
The surface roughness is measured using the atomic force microscope DimensionIcon manufactured by Burker Corporation under the following measurement conditions. The surface roughness data of the obtained HeightSensor channel is analyzed by "NanoScopeAnalysis V1.40". The analysis is performed after plane fitting under the following analysis conditions, and the height of the reference plane obtained by approximation is defined as a depth of 0 nm. In a cross-sectional chart of 10 μm in length randomly selected, the sum (ΣDn) of the length of the peak with the maximum depth from the reference plane of 5 nm or more and 40 nm or less projected onto a straight line The divided ratio is taken as the concave portion ratio (%) (concave portion ratio = (ΣDn / 10) × 100). The surface measurement is performed 10 times by changing the measurement range, and the recess ratio (%) is obtained from 10 cross section charts randomly selected for each measurement range, and the average value of total 100 times is the recess ratio (%) I assume.
<Measurement conditions>
Measuring device: Atomic force microscope (AFM) manufactured by Burker Corporation
Measurement mode: ScanAsyst
Cantilever: Bruker AXS SCANASYS T-AIR
(Material: Si, Spring constant K: 0.4 (N / m), Tip radius of curvature R: 2 (nm))
Measurement atmosphere: 23 ° C · Atmospheric measurement range: 10 (μm) square resolution: 512 × 512
Cantilever moving speed: 10 (μm / s)
<Analysis condition>
Plane Fit Mode: XY
Plane Fit Order: 3rd
前記樹脂層の表面弾性率が100MPa以上1000MPa以下である請求項1に記載の積層フィルム。 The laminated film according to claim 1, wherein the surface elastic modulus of the resin layer is 100 MPa or more and 1000 MPa or less. 前記樹脂層の表面エネルギーが25mN/m以上38mN/m以下である請求項1または2に記載の積層フィルム。 The laminated film according to claim 1 or 2, wherein the surface energy of the resin layer is 25 mN / m or more and 38 mN / m or less. 120℃の熱収縮率がMD方向およびTD方向のいずれも0.1%以上2.0%以下である請求項1〜3のいずれかに記載の積層フィルム。 The laminated film according to any one of claims 1 to 3, wherein the thermal shrinkage at 120 ° C is 0.1% or more and 2.0% or less in any of the MD direction and the TD direction. 熱機械分析(TMA)にて、25℃から昇温速度5℃/分で昇温して測定される120℃における熱収縮応力がフィルムMD方向およびTD方向のいずれも0.001MPa以上0.5MPa以下である、請求項1〜4のいずれかに記載の積層フィルム。 The thermal contraction stress at 120 ° C measured by raising the temperature from 25 ° C at a heating rate of 5 ° C / min by thermal mechanical analysis (TMA) is 0.001 MPa or more and 0.5 MPa in both the film MD direction and the TD direction The laminated film according to any one of claims 1 to 4, which is the following. 離型用途に用いる、請求項1〜5のいずれかに記載の積層フィルム。 The laminated film according to any one of claims 1 to 5, which is used for mold release application. ポリエステルフィルムの少なくとも片面に樹脂組成物(α)を塗布する塗布工程と、該樹脂組成物(α)が塗布されたポリエステルフィルムを少なくとも一軸方向に延伸する延伸工程と、該樹脂組成物(α)を加熱して樹脂層を形成する加熱工程と、加熱工程を経た積層フィルムを少なくとも一軸方向に加熱しながら弛緩する加熱弛緩工程をこの順に有する積層フィルムの製造方法であって、前記加熱工程での加熱温度(Tk)が150℃以上240℃以下であり、前記加熱弛緩工程の弛緩処理が2段階以上で行われ、少なくとも1段階の加熱弛緩工程の加熱温度(Tks1)がTk−10〜Tk+10℃であり、少なくとも1段階の加熱弛緩工程の加熱温度(Tks2)がTk−50〜Tk−20℃である、請求項1〜6のいずれかに記載の積層フィルムの製造方法。 A coating step of coating the resin composition (α) on at least one surface of the polyester film, a stretching step of stretching the polyester film coated with the resin composition (α) in at least one uniaxial direction, and the resin composition (α) A method of manufacturing a laminated film having a heating step of heating a resin layer to form a resin layer, and a heating and relaxing step of relaxing the laminated film subjected to the heating step while heating in at least one axial direction in this order, The heating temperature (Tk) is 150 ° C. or more and 240 ° C. or less, the relaxation treatment in the heat relaxation step is performed in two or more steps, and the heating temperature (Tks1) in at least one heat relaxation step is Tk-10 to Tk + 10 ° C. The heating temperature (Tks2) of at least one step of heat relaxation step is Tk-50-Tk-20 ° C according to any of claims 1 to 6, Method of manufacturing a layer film.
JP2016114116A 2016-06-08 2016-06-08 Laminated film Active JP6747072B2 (en)

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JP2016114116A JP6747072B2 (en) 2016-06-08 2016-06-08 Laminated film

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JP2017217832A JP2017217832A (en) 2017-12-14
JP2017217832A5 true JP2017217832A5 (en) 2019-06-06
JP6747072B2 JP6747072B2 (en) 2020-08-26

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JP7419767B2 (en) * 2019-01-23 2024-01-23 東レ株式会社 Release film and laminate

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* Cited by examiner, † Cited by third party
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JP2003221448A (en) * 2002-02-01 2003-08-05 Nitto Denko Corp Aqueous dispersion of polymer and method for producing the same
JP2006163081A (en) * 2004-12-08 2006-06-22 Nippon Paper Chemicals Co Ltd Antidazzle protective substrate and its manufacturing method
JP4970835B2 (en) * 2005-05-26 2012-07-11 日東電工株式会社 Adhesive layer, manufacturing method thereof, adhesive sheet, cleaning sheet, transport member with cleaning function, and cleaning method
WO2008016173A1 (en) * 2006-08-02 2008-02-07 Teijin Dupont Films Japan Limited Multilayer film to be used as base film of luminance-enhancing sheet
JP5306853B2 (en) * 2009-02-26 2013-10-02 三菱樹脂株式会社 Release film
JP2010209189A (en) * 2009-03-09 2010-09-24 Nitto Denko Corp Pressure sensitive adhesive sheet
JP5606725B2 (en) * 2009-11-27 2014-10-15 日東電工株式会社 Coating film protection sheet
JP6205874B2 (en) * 2013-06-07 2017-10-04 東レ株式会社 Release film
JP2015077783A (en) * 2013-09-10 2015-04-23 東レ株式会社 Biaxial orientation polyester film for release
CN106164199B (en) * 2014-04-02 2020-07-24 琳得科株式会社 Adhesive sheet
KR102284922B1 (en) * 2014-04-02 2021-08-02 린텍 가부시키가이샤 Adhesive sheet

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