JP2017215486A - Exposure apparatus and method for manufacturing article - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure apparatus advantageous from the viewpoint of throughput.SOLUTION: The exposure apparatus exposing a substrate with light from a light source includes: a filter that attenuates and transmits the light supplied from the light source to the exposure apparatus; a memory part that stores information representing a transmittance of the filter; an instruction part that gives an instruction value to the light source on the basis of the information, the instruction value instructing the intensity of light required to be output from the light source so as to control an exposure light quantity of the substrate to a target exposure light quantity in exposure processing performed on the substrate through the filter; and a control part that acquires an attenuation amount of the light attenuated by the filter in the exposure processing and updates the information on the basis of the attenuation amount when the attenuation amount is not within a predetermined range.SELECTED DRAWING: Figure 2

Description

  The present invention relates to an exposure apparatus and an article manufacturing method.

  When manufacturing a semiconductor device or the like, an exposure apparatus that projects (transfers) a pattern of an original (mask or reticle) onto each shot area on a substrate via a projection optical system is used. One of the basic functions of the exposure apparatus is exposure amount control for maintaining the exposure amount for each shot area (each point) within an allowable range.

  In exposure amount control of an exposure apparatus, while irradiating the substrate with exposure light, a part of the exposure light is branched and guided to a detector (for example, an integrator sensor), and the exposure amount on the substrate is measured via the detector. Indirect detection. Then, irradiation of the exposure light to the substrate is continued until the integrated value of the detection results by the detector reaches a necessary exposure amount (target exposure amount).

  When a pulsed light source is used as the exposure light source, there is a variation in energy for each pulsed light. Therefore, exposure accuracy can be controlled (reproducibility) by exposing the substrate with a certain number of pulsed light (minimum number of pulses). ) Is guaranteed. Therefore, if the target exposure amount is small, the substrate may not be exposed with pulsed light having a number equal to or greater than the minimum number of pulses when pulsed light from the pulsed light source is used as it is. In such a case, by reducing the output of the pulse light source itself, or by arranging an energy modulator such as an optical filter in the optical path, the pulsed light (exposure light) is attenuated so that the pulsed light exceeds the minimum number of pulses. The substrate is exposed. In order to make the attenuation level of the pulsed light variable, a plurality of optical filters having different transmittances are generally provided in the turret (revolver).

  The transmittance of the optical filter may fluctuate in the short term and in the long term due to local damage caused by the irradiation of the pulsed light or a positioning error when switching the optical filter. Therefore, before exposing the substrate, the transmittance of the optical filter is measured using a detector that indirectly detects the exposure amount on the substrate, and the exposure amount on the substrate is controlled based on the measurement result. The technique to do is proposed (refer patent document 1).

Japanese Patent Laid-Open No. 9-148216

  However, in the prior art, since the transmittance must be measured with a detector before the substrate is exposed, the throughput (productivity) decreases.

  An object of the present invention is to provide an exposure apparatus that is made in view of the problems of the prior art and is advantageous in terms of throughput.

  In order to achieve the above object, an exposure apparatus according to one aspect of the present invention is an exposure apparatus that exposes a substrate with light from a light source, and attenuates and passes light supplied from the light source to the exposure apparatus. And a storage unit that stores information indicating the transmittance of the filter, and based on the information, an exposure amount of the substrate in an exposure process performed on the substrate through the filter becomes a target exposure amount An instruction unit for giving an instruction value indicating the intensity of light to be output from the light source to the light source, and an attenuation amount of the light attenuated by the filter in the exposure process is acquired, and the attenuation amount is determined in advance. And a control unit that updates the information based on the amount of attenuation when it is not within the specified range.

  Further objects and other aspects of the present invention will become apparent from the preferred embodiments described below with reference to the accompanying drawings.

  According to the present invention, for example, an exposure apparatus that is advantageous in terms of throughput can be provided.

It is the schematic which shows the structure of the exposure apparatus as 1 side surface of this invention. It is a flowchart for demonstrating the exposure process in the exposure apparatus shown in FIG. It is a figure which shows the relationship between the output value of the measurement part of the exposure apparatus shown in FIG. 1, and the illumination intensity (exposure amount) on a board | substrate. It is a figure which shows the measurement result when exposing a board | substrate, exposure conditions, and the transmittance | permeability of an optical filter. It is a figure which shows the exposure conditions corresponding to the optical filter which has the transmittance | permeability of 70%. It is a figure which shows the exposure conditions corresponding to the optical filter which has the transmittance | permeability of 60%.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, preferred embodiments of the invention will be described with reference to the accompanying drawings. In addition, in each figure, the same reference number is attached | subjected about the same member and the overlapping description is abbreviate | omitted.

  FIG. 1 is a schematic diagram showing a configuration of an exposure apparatus 10 as one aspect of the present invention. The exposure apparatus 10 is a lithography apparatus that exposes a substrate with light from the light source device 20. The exposure apparatus 10 may be a batch exposure type exposure apparatus (stepper) or a scanning exposure type exposure apparatus (scanner) that scans the original and the substrate in synchronization. As shown in FIG. 1, the exposure apparatus 10 includes an instruction unit 11, an optical filter unit 12, a measurement unit 13, an original stage 14, a projection optical system 15, a substrate stage 16, a storage unit 17, and a control unit. Part 18.

  The instruction unit 11 provides the light source device 20 with an instruction value that indicates the intensity of light to be output by the light source device 20. In the present embodiment, the instruction unit 11 gives the target voltage value TV to the light source device 20 as an instruction value. The optical filter unit 12 includes an optical filter that attenuates and passes the light supplied from the light source device 20 to the exposure device 10. The optical filter unit 12 may have a configuration in which a plurality of optical filters having different transmittances are arranged in a turret (revolver). By combining multiple stages of turrets on which a plurality of optical filters are arranged, the attenuation level of light supplied from the light source device 20 to the exposure apparatus 10 (that is, the transmittance that can be set by the optical filter unit 12) is finely adjusted. be able to.

  The measurement unit 13 is disposed in the optical path downstream from the optical filter unit 12. After the light supplied from the light source device 20 to the exposure device 10 passes through the optical filter unit 12, the measuring unit 13 is the intensity of the light (that is, the light attenuated by the optical filter unit 12). Measure illuminance (monitor). The original stage 14 holds an original (a mask or a reticle). The projection optical system 15 projects an original pattern onto a substrate. The substrate stage 16 holds the substrate. The storage unit 17 stores information indicating the transmittance of each of the plurality of optical filters in the optical filter unit 12. The transmittance of the optical filter indicated by the information stored in the storage unit 17 may be a measurement value obtained by measuring the optical filter in advance or a design value in the initial stage. The control unit 18 includes a CPU, a memory, and the like, and controls the entire exposure apparatus 10. In the present embodiment, the control unit 18 acquires the attenuation amount of light attenuated by the optical filter unit 12 in the exposure process performed on the substrate via the optical filter unit 12. Then, when the attenuation amount is not within the predetermined range, the control unit 18 updates the information stored in the storage unit 17 based on the attenuation amount, that is, the filter transmission in the optical filter unit 12. Perform rate calibration.

  The light source device 20 is a pulse light source that supplies light to the exposure apparatus 10, and includes a light source unit 21, a pulse power source unit 22, a measurement unit 23, and a control unit 24. The light source unit 21 includes a discharge electrode and a chamber that accommodates the discharge electrode. The pulse power supply unit 22 applies a high-frequency voltage synchronized with the repetition frequency of pulse discharge between the discharge electrodes. The measurement unit 23 measures the intensity of light output from the light source unit 21. The measurement unit 23 measures the intensity of the light supplied from the light source device 20 to the exposure device 10 before passing through the optical filter unit 12. The control unit 24 performs voltage control, laser wavelength control, laser gas supply control, and the like of the pulse power source unit 22.

  Here, an exposure process including exposure amount control in the exposure apparatus 10 will be described. In the exposure amount control, the instruction unit 11 sets the target exposure amount of the substrate in the exposure process performed on the substrate via the optical filter unit 12 based on the information indicating the transmittance of the optical filter stored in the storage unit 17. The target voltage value TV is given to the control unit 24 of the light source device 20 so that the exposure amount is obtained. In the present embodiment, the difference between the predicted intensity value measured by the measuring unit 23 predicted from the target voltage value TV and the actually measured intensity value measured by the measuring unit 23 in the exposure process is expressed as an optical filter unit. The case where the attenuation amount of the light attenuated by 12 is used as an example will be described.

  First, the instruction unit 11 sets the target exposure amount, the transmittance of the optical filter in the optical filter unit 12, the output value of the measurement unit 13 when the substrate is exposed at the rated energy value (reference energy value of the light source device 20), and the substrate. An exposure condition is obtained based on the minimum number of pulses necessary for exposure. As a result, the target output value of the measurement unit 13 for realizing the target exposure amount, the transmittance of the optical filter, and the number of pulses of light applied to one shot region on the substrate are obtained. At this time, the control unit 18 obtains a predicted value of the light intensity (pulse energy value) measured by the measurement unit 23 when the substrate is exposed.

  Next, the control unit 18 sets the optical filter so that the transmittance set by the optical filter unit 12 becomes the transmittance obtained when obtaining the exposure condition (that is, the transmittance used when exposing the substrate). Is supplied to the optical filter unit 12. Further, the control unit 18 gives a drive command SM to the original stage 14, the projection optical system 15, and the substrate stage 16 to expose the substrate.

  Next, the instruction unit 11 acquires the output value (illuminance) IL of the measurement unit 13 for each pulse while the substrate is exposed. Then, the instruction unit 11 gives the target voltage value TV of the pulse power supply unit 22 to the control unit 24 of the light source device 20 for each pulse so that the integrated value of the output value IL of the measurement unit 13 becomes the target exposure amount. The control unit 24 gives the target voltage value TV to the pulse power supply unit 22 and changes the intensity (pulse energy value) of the light output from the light source unit 21 for each pulse.

  Next, the control unit 18 acquires an actual measurement value RE of the light intensity (pulse energy value) measured by the measurement unit 23 when the substrate is exposed. The control unit 18 then predicts the light intensity measured by the measurement unit 23 when the substrate is exposed, and the light intensity actual value RE measured by the measurement unit 23 when the substrate is exposed. And compare. When there is a difference between the predicted value and the actual measurement value RE, it is determined that the transmittance of the optical filter in the optical filter unit 12 varies from the transmittance indicated by the information stored in the storage unit 17, and the storage unit The information stored in 17 is updated (transmittance is calibrated).

  As described above, in the present embodiment, the transmittance of the optical filter can be calibrated at any time during the exposure process without measuring the transmittance of the optical filter in the optical filter unit 12 before exposing the substrate. it can. Accordingly, it is possible to reduce a decrease in throughput due to the measurement of the transmittance of the optical filter. Further, since the transmittance of the optical filter in the optical filter unit 12 is calibrated at any time, it becomes possible to obtain appropriate exposure conditions in the exposure amount control, and it is possible to suppress giving an excessive output instruction to the light source device 20. be able to. Thereby, the fall of the precision of exposure amount control can be suppressed.

  Hereinafter, the exposure process in the exposure apparatus 10 will be described in detail with reference to FIGS. FIG. 2A is a flowchart for explaining an exposure process in the exposure apparatus 10. FIG. 2B is a detailed flowchart of the illuminance measurement shown in FIG.

  Referring to FIG. 2A, in S101, the illuminance fluctuation of the exposure apparatus 10 caused by other than the optical filter unit 12 (optical filter) (decrease in the transmittance of the projection optical system 15 or the transmittance of optical components on the optical path). Illuminance measurement is performed in order to measure a decrease in the

  In the illuminance measurement, as shown in FIG. 2B, in S201, the optical filter is retracted from the optical path so that the transmittance set by the optical filter unit 12 is 100%. In S202, the control unit 24 of the light source device 20 is instructed to perform laser oscillation at a rated energy value (for example, 10 mJ). In S203, the output value of the measurement unit 13 when the light source device 20 is performing laser oscillation (that is, the intensity of light supplied from the light source device 20 to the exposure apparatus 10) is acquired.

  The relationship between the output value of the measurement unit 13 and the actual illuminance (actual exposure amount) on the substrate is acquired in advance by measurement using an absolute illuminometer (reference illuminometer) and stored in the exposure apparatus 10. Thereby, it is possible to indirectly determine the illuminance (exposure amount) on the substrate from the output value of the measurement unit 13.

For example, as shown in FIG. 3, when the illuminance on the substrate is measured with an absolute illuminometer, the pulse energy value is 10 mJ (rated energy value), the output value of the measurement unit 13 is 20000 bits, and the illuminance on the substrate (absolute illuminance) Assume that the total output value is 20 J / m ² . If the illuminance fluctuation of the exposure apparatus 10 occurs and the output value of the measurement unit 13 is 18000 bits, it is understood that the illuminance on the substrate is 18 J / m ² .

  Note that the illuminance measurement for measuring the illuminance fluctuation of the exposure apparatus 10 caused by other than the optical filter is generally performed in the exposure apparatus regardless of this embodiment. Therefore, a decrease in throughput due to illuminance measurement is outside the range of the influence of this embodiment.

  Returning to FIG. 2A, in S102, the instruction unit 11 determines the target exposure amount, the optical filter transmittance in the optical filter unit 12, the output value of the measurement unit 13 acquired in S203, and the minimum number of pulses. Find the exposure conditions. Specifically, the target output value TargetIL of the measurement unit 13, the transmittance NDTr of the optical filter, the number of pulses Pls of light irradiating one shot area on the substrate, and the measurement unit 23 measures when the substrate is exposed. The predicted value EPV of the intensity of the light to be obtained is obtained.

Here, a specific example of the process for obtaining the exposure condition (S102) will be described with reference to FIGS. As shown in FIG. 4, it is assumed that the measurement result when the substrate is exposed has a pulse energy value = 10 mJ, an output value of the measurement unit 13 = 20000 bits, and an illuminance on the substrate = 20 J / m ² . The target exposure amount is 100 J / m ² and the minimum number of pulses is 8 Pulse. In this case, TargetIL, NDTr, Pls, and EPV shown in FIG. 5 can be obtained by the following calculation.

Minimum exposure = Illuminance on substrate x Minimum number of pulses
= 20 (J / m ² ) × 8 (pulse) = 160 (J / m ² ) (* 1)
Optical When you meet the minimum number of pulses, a minimum exposure amount 160 J / m ² becomes on the substrate, which exceeds the target exposure amount (100J / m ^2), the light supplied to the exposure device 10 from the light source device 20 Attenuation is performed by the optical filter in the filter unit 12. Specifically, as shown in FIG. 4, an optical filter having a transmittance closest to the target exposure amount is selected from a plurality of optical filters having different transmittances. Here, an optical filter (filter number 4) having a transmittance of 70% is selected.

Minimum exposure after attenuation = (* 1) x NDTr
= 160 (J / m ² ) × 0.7 = 112 (J / m ² ) (* 2)
Be attenuated by an optical filter (filter number 4), the minimum exposure amount exceeds 112J / ^{m 2,} and the target exposure amount (100 J / ^{m 2).} In such a case, the target output value TargetIL of the measurement unit 13 is changed (lowered). The changed TargetIL is obtained by the following calculation.

TargetIL = Output value of the measurement unit 13 (rated energy value) × (target exposure amount ÷ (* 2))
= 20000 (bit) × (100 (J / m ² )) ÷ 112 (J / m ² ) ≈17857 (bit) (* 3)
Furthermore, from (* 3), the predicted value (pulse energy value) EPV of the intensity of light measured by the measurement unit 23 when the substrate is exposed can be obtained by the following calculation.

EPV = Rated pulse energy value × ((* 3) ÷ Output value of measuring unit 13 (rated energy value))
= 10 (mJ) × (17857 (bit) ÷ 20000 (bit)) ≈8.929 (mJ) (* 4)
However, in the calculation of (* 2), an optical filter (filter number 5) having a transmittance of 60% is selected, and the target output value TargetIL of the measurement unit 13 is increased, so that there is not enough for the target exposure amount. It may be supplemented. In this case, the TargetIL, NDTr, Pls, and EPV shown in FIG. 6 can be obtained by the above-described calculation.

  Returning to FIG. 2A, in S103, the control unit 18 selects an optical filter to be used for exposure from a plurality of optical filters in the optical filter unit 12 according to the exposure condition obtained in S102, and arranges it in the optical path.

  In S104, the control unit 18 prepares the original stage 14, the projection optical system 15, and the substrate stage 16 for exposing the substrate according to the exposure conditions obtained in S102.

  In S105, the substrate is exposed according to the exposure condition obtained in S102. While the substrate is being exposed, the target power value TV applied to the light source device 20 is controlled for each pulse so that the output value IL of the measurement unit 13 becomes the target output value TargetIL obtained in S102.

  In S106, the control unit 18 acquires the light intensity (actual value RE) measured by the measurement unit 23 when the substrate is exposed in S105 from the measurement unit 23.

  In S107, the control unit 18 determines the difference between the predicted value EPV of the light intensity measured by the measurement unit 23 obtained in S102 and the actual measurement value RE of the light intensity measured by the measurement unit 23 acquired in S106. Based on this, the transmittance of the optical filter in the optical filter unit 12 is calibrated. However, the calibration of the transmittance of the optical filter may be performed when the difference between the predicted value EPV and the actual measurement value RE is not within a predetermined range. In other words, when the difference between the predicted value EPV and the actual measurement value RE is small, the transmittance of the optical filter may not be calibrated.

  A specific example of calibration of the transmittance of the filter (S107) will be described. It is assumed that the measured value RE of the light intensity measured by the measurement unit 23 when the substrate is exposed through an optical filter (NDTr = 70%) having a transmittance of 70% is 9.1 mJ. The predicted value EPV of the light intensity measured by the measurement unit 23 is a value obtained in consideration of the entire illuminance variation of the exposure apparatus 10 other than the optical filter. For this reason, the difference between the predicted value EPV and the actual measurement value RE is considered to be a difference between the transmittance of the optical filter indicated by the information stored in the storage unit 17 and the actual transmittance. Therefore, when the transmittance of the optical filter indicated by the information stored in the storage unit 17 is NDTr and the transmittance of the actual optical filter is NDTr ′, the transmittance of the optical filter used for exposure is calibrated by the following calculation. can do.

NDTr ′ = NDTr × (EPV ÷ RE)
= 0.7 × (8.929 (mJ) ÷ 9.1 (mJ)) ≈0.687 (* 5)
In this case, as shown in FIG. 4, in the information indicating the transmittance of each of the plurality of optical filters stored in the storage unit 17, the transmittance of the optical filter having the filter number 4 is changed from 70% to 68.7%. Update to In this way, the transmittance of the optical filter is calculated based on the difference between the predicted value EPV and the actual value RE, and the information stored in the storage unit 17 is updated with the calculated value of the transmittance. If calibration of the optical filter is necessary, an error may be notified to the user or the exposure process may be stopped.

  The actual measurement value RE may be a statistical value of intensity measured by the measurement unit 23 for each shot area on the substrate. Such statistical values include, for example, the average value of the intensity measured by the measurement unit 23 for each shot area, or the maximum value or the minimum value of the intensity measured by the measurement unit 23 for each shot area.

  Despite the fact that the substrate is exposed under the same exposure conditions, there may be a large variation in the measured values of the light intensity measured by the measurement unit 23 in a plurality of shot regions on the substrate. In such a case, it may be determined that a problem has occurred in the light source device 20, and the transmittance of the optical filter used for exposure may not be calibrated. In other words, when the variation in intensity of light output from the light source device 20 exceeds a predetermined range, the information stored in the storage unit 17 may not be updated.

  Further, the transmittance of the optical filter calculated by the above-described calculation may be weighted in consideration of the variation of the intensity of light output from the light source device 20 for each pulse. For example, in (* 5), weighting (coefficient) α may be multiplied as follows.

NDTr ′ = NDTr− (NDTr − (* 5)) × α
Here, when α = 0.5 (half of the predicted value EPV and the actual value RE), NDTr ′ = 0.7− (0.7−0.687) × 0.5≈0.694. In this case, as shown in FIG. 4, in the information indicating the transmittance of each of the plurality of optical filters stored in the storage unit 17, the transmittance of the optical filter with the filter number 4 is changed from 70% to 69.4%. Update to

  Here, a case is considered where the transmittance of the actual optical filter is 5% higher than the transmittance indicated by the information stored in the storage unit 17. In this case, when the substrate is exposed through the optical filter of the filter number 4, the predicted value RE of the light intensity measured by the measuring unit 23 is 8.929 (mJ) × (1-0.05) = 8. 483 (mJ). When the pulse energy value is a value that cannot guarantee the stability (for example, variation) of the light output from the light source device 20, there is a possibility that the accuracy of exposure amount control is lowered. Therefore, in such a case, it is necessary to use an optical filter having a lower transmittance than the optical filter of filter number 4, for example, the optical filter of filter number 5.

  As described above, in this embodiment, the information indicating the transmittance of the optical filter stored in the storage unit 17 is always updated to the latest state without measuring the transmittance of the optical filter used for exposure. Can do. Accordingly, it is possible to reduce a decrease in throughput due to the measurement of the transmittance of the optical filter. In addition, it is possible to suppress a decrease in the accuracy of the exposure amount control caused by the variation in the transmittance of the optical filter.

  In the present embodiment, the pulse energy value is employed as the intensity of light output from the light source device 20, but a voltage value may be employed. In this case, the instruction unit 11 instructs the target pulse energy value for each pulse to the control unit 24 of the light source device 20, and the control unit 18 determines the voltage value when the substrate is exposed from the measurement unit 23. Will get.

  In the present embodiment, the attenuation amount of the light attenuated by the optical filter unit 12 is measured by the predicted value of the intensity measured by the measuring unit 23 predicted from the target voltage value TV and by the measuring unit 23 in the exposure process. It was explained as the difference from the measured value of the measured intensity. However, the attenuation amount of the light attenuated by the optical filter unit 12 is determined by the predicted value of the intensity measured by the measurement unit 13 predicted from the target voltage value TV and the transmittance of the optical filter, and the measurement unit 13 in the exposure process. It is good also as a difference with the measured value of the measured intensity | strength.

  The article manufacturing method in the embodiment of the present invention is suitable for manufacturing articles such as devices (semiconductor elements, magnetic storage media, liquid crystal display elements, etc.), for example. Such a manufacturing method includes a step of exposing a substrate coated with a photosensitive agent using the exposure apparatus 10 and a step of developing the exposed substrate. Such a manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article in the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

  As mentioned above, although preferable embodiment of this invention was described, it cannot be overemphasized that this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

DESCRIPTION OF SYMBOLS 10: Exposure apparatus 11: Instruction part 12: Optical filter part 13: Measuring part 17: Memory | storage part 18: Control part 20: Light source device

Claims (11)

An exposure apparatus that exposes a substrate with light from a light source,
A filter that attenuates and passes light supplied from the light source to the exposure apparatus;
A storage unit for storing information indicating the transmittance of the filter;
Based on the information, an indication value indicating the intensity of light that the light source should output is set so that the exposure amount of the substrate in the exposure process performed on the substrate through the filter becomes a target exposure amount. An instruction section to give to
A controller that obtains an attenuation amount of light attenuated by the filter in the exposure process, and updates the information based on the attenuation amount when the attenuation amount is not within a predetermined range;
An exposure apparatus comprising: Before the light supplied from the light source to the exposure apparatus passes through the filter, the measuring unit further measures the intensity of the light,
The control unit obtains, as the attenuation amount, a difference between a predicted intensity value measured by the measurement unit predicted from the instruction value and an actually measured value measured by the measurement unit in the exposure process. The exposure apparatus according to claim 1, wherein: The light source supplied from the light source to the exposure apparatus further includes a measurement unit that measures the intensity of the light after passing through the filter,
The control unit calculates a difference between a predicted value of intensity measured by the measurement unit predicted from the instruction value and the information and an actually measured value of intensity measured by the measurement unit in the exposure process, as the attenuation. The exposure apparatus according to claim 1, wherein the exposure apparatus acquires the quantity.   The exposure apparatus according to claim 2, wherein the control unit sets a statistical value of intensity measured by the measurement unit for each shot area on the substrate in the exposure process as the actual measurement value.   The statistical value includes an average value of the intensity measured by the measurement unit for each shot region, or a maximum value or a minimum value of the intensity measured by the measurement unit for each shot region. The exposure apparatus according to claim 4.   The said control part calculates the transmittance | permeability of the said filter based on the said difference, and updates the said information with the calculated value of the said transmittance | permeability, The any one of Claims 2 thru | or 5 characterized by the above-mentioned. Exposure equipment.   The control unit calculates the calculated value according to NDTr × (EPV ÷ RE), where NDTr is the transmittance of the filter indicated by the information, RE is the measured value, and EPV is the predicted value. An exposure apparatus according to claim 6. The light source includes a pulsed light source,
The exposure apparatus according to claim 6, wherein the control unit weights the calculated value based on a variation in intensity of light output from the light source for each pulse. The light source includes a pulsed light source,
The control unit does not update the information when a variation in intensity of light output from the light source for each pulse exceeds a predetermined range. The exposure apparatus according to any one of the above.   The exposure apparatus according to claim 8, wherein the control unit controls the instruction value for each pulse. A step of exposing the substrate using the exposure apparatus according to claim 1;
Developing the exposed substrate;
A method for producing an article comprising:

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