JP2017211082A - Outer packing material for vacuum heat insulation material, vacuum heat insulation material, and device with vacuum heat insulation material - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an outer packing material for vacuum heat insulation material that can form a vacuum heat insulation material that can maintain heat insulation performance for the long term even in a high-temperature and high-humidity environment.SOLUTION: An outer packing material for vacuum heat insulation material at least has a first film, a second film, a third film, and a thermally weldable film in the stated order. The first film has a first resin base material, and a metal oxide phosphoric layer that is disposed on at least one side of the first resin base material and at least has M-O-P bond (M is a metal atom, O is an oxygen atom, and P is a phosphorus atom). The second film has a second resin base material, and an inorganic layer disposed on at least one side of the second resin base material, and the third film has a third resin base material, and an inorganic layer disposed on at least one side of the third resin base material.SELECTED DRAWING: Figure 1

Description

  The present disclosure relates to an outer packaging material for a vacuum heat insulating material and the like.

  In recent years, reduction of greenhouse gases has been promoted in order to prevent global warming, and energy saving is required for electrical products, vehicles, equipment and buildings. Among these, from the viewpoint of reducing power consumption, the use of vacuum heat insulating materials for electrical products and the like is being promoted. In equipment that has a heat generating part inside the main body, such as electrical products, and equipment that has a heat retaining function using heat from the outside, it is possible to improve the heat insulation performance of the equipment as a whole by providing a vacuum heat insulating material It becomes. For this reason, efforts have been made to reduce energy consumption of devices such as electric products by using vacuum heat insulating materials.

  The vacuum heat insulating material is a material in which a core material is placed in a bag formed of an outer packaging material, the inside of the bag body in which the core material is arranged is decompressed to be in a vacuum state, and an end portion of the bag body is thermally welded. It is formed by sealing. Since the convection of the gas is blocked by making the inside of the bag body in a vacuum state, the vacuum heat insulating material can exhibit high heat insulating performance. Moreover, in order to maintain the heat insulation performance of the vacuum heat insulating material for a long period of time, it is necessary to keep the inside of the bag formed using the outer packaging material in a high vacuum state for a long time. For this reason, the outer packaging material for a vacuum heat insulating material is required to have various functions such as a gas barrier property for preventing gas from permeating from the outside and a thermal adhesive property for covering and sealing the core material. As a general aspect of the outer packaging material for vacuum heat insulating material for fulfilling these functions, a heat-weldable film, a gas barrier film and a protective film are laminated, and each film has an adhesive or the like. (See Patent Documents 1 and 2).

  Even when a vacuum heat insulating material is formed using the outer packaging material for vacuum heat insulating material as described above and a vacuum heat insulating material having high initial heat insulating performance is obtained, the vacuum heat insulating material is exposed to a high temperature and high humidity environment. And there exists a problem that the said gas barrier film etc. deteriorate and heat insulation performance falls with time. In order to cope with such a problem, in Patent Document 3, a layer having an M—O—P bond (wherein M represents a metal atom, O represents an oxygen atom, and P represents a phosphorus atom). A vacuum heat insulating material having excellent reliability even when used in a high-temperature and high-humidity environment is disclosed by using an outer packaging material for vacuum heat insulating material having the above.

JP 2003-262296 A JP 2013-103343 A JP 2011-226644 A

  The layer having the M-O-P bond disclosed in Patent Document 3 is in a high-temperature and high-humidity environment as compared with a high barrier film having an inorganic vapor deposition layer that has been used in a conventional outer packaging material for vacuum heat insulating materials. Little deterioration when exposed. However, since the layer having the M-O-P bond has an initial gas barrier property that is not so high when compared with a high barrier film having the inorganic vapor deposition layer or the like, the vacuum inside the vacuum heat insulating material over time. The problem of gradual decline has not been solved.

  On the other hand, the inorganic vapor deposition layer has a high initial gas barrier property, but generally the gas barrier property is severely deteriorated when exposed to a high temperature and high humidity environment. Therefore, even when a high barrier film having an inorganic vapor deposition layer is used as the outer packaging material for vacuum heat insulating material, the degree of vacuum inside the vacuum heat insulating material decreases with time, so it is difficult to maintain heat insulating performance for a long period of time. It is.

  The present disclosure has been made in view of the above problems, and provides a vacuum heat insulating material outer packaging material and the like that can form a vacuum heat insulating material that can maintain heat insulating performance for a long time even in a high temperature and high humidity environment. The main purpose.

  In one aspect of the present disclosure, the outer packaging material for a vacuum heat insulating material includes at least a first film, a second film, a third film, and a heat-weldable film in this order, and the first film includes: , Disposed on at least one surface side of the first resin substrate and the first resin substrate, and at least a M-O-P bond (wherein M represents a metal atom, O represents an oxygen atom, P Represents a phosphorus atom.) And the second film is an inorganic material disposed on at least one surface side of the second resin base material and the second resin base material. And the third film has a third resin base material and an inorganic layer disposed on at least one surface side of the third resin base material. Providing materials.

  According to the above aspect of the present disclosure, water vapor that has passed through the first film whose initial water vapor barrier property is not as high as that of a high barrier film having an inorganic vapor deposition layer is blocked by the second film. Thereby, even in a high-temperature and high-humidity environment, since the influence of water vapor or the like on the third film located inside the second film is greatly suppressed, the high gas barrier property of the third film can be increased over the long term. It can be maintained as well as the value. On the other hand, the second film is exposed to water vapor that has passed through the first film, but the amount of water vapor that passes through the first film with little deterioration in gas barrier properties even in a high-temperature and high-humidity environment is Since the second film is suppressed for a long time and the influence of the second film is limited, the second film can continuously block water vapor or the like that permeates the third film. Therefore, it is possible to form a vacuum heat insulating material that can maintain the heat insulating performance for a long time even in a high temperature and high humidity environment.

  In the aspect of the present disclosure, the third resin base material includes a hydrophilic group-containing resin, and the third resin base material is disposed on the thermally weldable film side of the inorganic layer of the third film. Preferably it is. This is because the third resin substrate containing the hydrophilic group-containing resin can be protected from water vapor by the inorganic layer of the third film, and the barrier property against oxygen of the hydrophilic group-containing resin can be maintained high.

  In another aspect of the present disclosure, there is provided an outer packaging material for a vacuum heat insulating material having at least a first film, a film with an overcoat layer, and a heat-weldable film in this order. 1 resin base material and at least one surface side of the first resin base material, and at least M-O-P bond (wherein M represents a metal atom, O represents an oxygen atom, and P represents phosphorus The film with an overcoat layer includes a resin substrate, an inorganic layer disposed on at least one surface side of the resin substrate, and the inorganic layer. An overcoat layer disposed on the opposite side of the resin substrate, the overcoat layer contains a hydrophilic group-containing resin, and atoms of metal atoms relative to carbon atoms in the atoms constituting the overcoat layer ratio But 0.1 or more, to provide a vacuum heat insulating material for outer material, characterized in that in the range of 2 or less.

  According to the aspect of the present disclosure, since the film with an overcoat layer is protected by the first film, deterioration of the film with an overcoat layer is suppressed, and high gas barrier properties are maintained even in a high-temperature and high-humidity environment. The outer packaging material can be made. Therefore, it is possible to form a vacuum heat insulating material that can maintain the heat insulating performance for a long time even in a high temperature and high humidity environment.

  The present disclosure is a vacuum heat insulating material having a core material and an outer packaging material for vacuum heat insulating material that encloses the core material, and the outer packaging material for vacuum heat insulating material is the outer packaging material for vacuum heat insulating material described above. A vacuum insulation material is provided. According to the present disclosure, the vacuum insulation material can be maintained for a long period of time in a high-temperature and high-humidity environment because the vacuum insulation material is the above-described vacuum insulation material. Can do.

The present disclosure is an article having a heat insulating region and an article with a vacuum heat insulating material including a vacuum heat insulating material, and the vacuum heat insulating material includes a core material and an outer packaging material for a vacuum heat insulating material that encloses the core material. And the said outer packaging material for vacuum heat insulating materials is the outer packaging material for vacuum heat insulating materials mentioned above, The article with a vacuum heat insulating material characterized by the above-mentioned is provided.
According to the present disclosure, the vacuum heat insulating material provided in the article is a vacuum heat insulating material using the above-described outer packaging material, and can maintain heat insulating performance for a long period of time in a high temperature and high humidity environment. It can be set as the article | item which has heat insulation performance.

  Specifically, according to the present disclosure, the vacuum heat insulating material is the above-described vacuum heat insulating material, and can maintain heat insulating performance for a long time even in a high temperature and high humidity environment. The heat from the heat source part is insulated by the vacuum heat insulating material, and the temperature of the entire device is prevented from becoming high. On the other hand, in the device having the heat insulation part, the temperature of the heat insulation part by the vacuum heat insulation material. Can keep the state. Thereby, it can be set as the apparatus which has the high energy saving characteristic which suppressed power consumption.

  In the present disclosure, there is an effect that an outer packaging material for a vacuum heat insulating material and the like capable of forming a vacuum heat insulating material that can maintain a heat insulating performance for a long time even in a high temperature and high humidity environment can be provided.

It is a schematic sectional drawing which shows an example of the outer packaging material for vacuum heat insulating materials of this indication. It is a schematic sectional drawing which shows an example of the vacuum heat insulating material of this indication. It is drawing which shows an example of the infrared absorption spectrum of the metal oxide phosphate layer in this indication. It is a schematic sectional drawing which shows the other example of the outer packaging material for vacuum heat insulating materials of this indication.

Hereinafter, the outer packaging material for vacuum heat insulating material, the vacuum heat insulating material, and the article with the vacuum heat insulating material of the present disclosure will be described in detail.
In the present specification, “external packaging material for vacuum heat insulating material” may be abbreviated as “external packaging material”.
In addition, when it is described as “gas barrier property”, unless otherwise specified, it means a characteristic having a barrier property against a gas such as oxygen and / or water vapor.
Furthermore, when the vacuum heat insulating material is formed using the outer packaging material, the heat-weldable film side which is the inner side of the vacuum heat insulating material is “the inner side of the outer packaging material” and the outer side of the vacuum heat insulating material is the heat-weldable film. The side far from the position may be described as “the outside of the outer packaging material”.

A. First, the outer packaging material for vacuum heat insulating material according to the present disclosure will be described.
The outer packaging material for a vacuum heat insulating material of the present disclosure can be roughly divided into two modes depending on the layer configuration. Each aspect will be described below.

(I) 1st aspect The outer packaging material of this aspect is an outer packaging material for vacuum heat insulating materials which has at least a 1st film, a 2nd film, a 3rd film, and a heat-weldable film in this order, The first film is disposed on at least one surface side of the first resin base material and the first resin base material, and is at least a M-O-P bond (where M represents a metal atom and O is oxygen) A metal oxide phosphoric acid layer having an atom and P represents a phosphorus atom), and the second film has a second resin substrate and at least one surface side of the second resin substrate. And the third film has a third resin base material and an inorganic layer arranged on at least one surface side of the third resin base material. Is.

  In the following description, the first film may be referred to as a metal oxide phosphate film, the second film as an outer inorganic layer film, and the third film as an inner inorganic layer film.

  The outer packaging material of this aspect is demonstrated with reference to figures. FIG. 1 is a schematic cross-sectional view showing an example of the outer packaging material of this aspect. As illustrated in FIG. 1, the outer packaging material 10 </ b> A of this aspect includes a film 1 with a metal oxide phosphate layer, a film 2 with an outer inorganic layer, a film 3 with an inner inorganic layer, and a film 4 that can be thermally welded. In this order. The metal oxide phosphate layer-equipped film 1 includes a first resin base material 5 and a metal oxide phosphate layer 6 disposed on at least one surface side of the first resin base material 5. The film 2 with an outer inorganic layer has a second resin substrate 7 and an inorganic layer 8a disposed on at least one surface side of the second resin substrate 7, and the film 3 with an inner inorganic layer is It has the 3rd resin base material 9 and the inorganic layer 8b arrange | positioned at the at least one surface side of the said 3rd resin base material 9. As shown in FIG.

  FIG. 2 is a schematic cross-sectional view showing an example of a vacuum heat insulating material using the outer packaging material of the present disclosure. As illustrated in FIG. 2, the vacuum heat insulating material 20 includes a core material 11 and an outer packaging material 10 that encloses the core material 11. The vacuum heat insulating material 20 is configured such that the two outer packaging materials 10 are opposed to each other so that the respective heat-weldable films face each other, and the core material 11 is disposed therebetween, and then one of the outer circumferences of the core material 11 Is used as an opening, and the end portions 12 of the remaining three outer packaging materials 10 are thermally welded to prepare a bag body that is formed by the two outer packaging materials 10 and in which the core material 11 is disposed. Then, the opening 11 is sealed in a state where the internal pressure of the bag body is reduced, so that the core material 11 is enclosed by the outer packaging material 10.

  When the vacuum heat insulating material formed using the outer packaging material is placed in a high-temperature and high-humidity environment, the outer film of the outer packaging material is exposed to high-temperature water vapor. Therefore, even if it is an outer packaging material in which a large number of films with high initial gas barrier properties are laminated, if the laminated films are deteriorated by heat or water vapor, it is impossible to maintain the gas barrier properties as a whole outer packaging material. There's a problem.

  In this aspect, the above problem is solved by determining the layer configuration of the outer packaging material based on the idea that the outer film of the outer packaging material is used to prevent the inner film from being deteriorated. is there. That is, in this aspect, by using a film with a metal oxide phosphoric acid layer having a feature of little deterioration when exposed to a high-temperature and high-humidity environment on the outer side of the outer packaging material, the inner film is deteriorated. The outer packaging material as a whole maintains a high gas barrier property in a high-temperature and high-humidity environment.

  However, the film with the metal oxide phosphate layer has an initial barrier property against water vapor, and even if the initial barrier property against water vapor is maintained in a high-temperature and high-humidity environment, a certain amount of water vapor is present. Since the film with the metal oxide phosphate layer passes through and reaches the inner film, it is difficult to completely prevent the deterioration of the inner film. Therefore, in this aspect, the film with the outer inorganic layer is disposed inside the film with the metal oxide phosphate layer, and the film with the inner inorganic layer is disposed inside the film with the outer inorganic layer. Water vapor that has passed through the film with an oxide phosphate layer is blocked by the film with an outer inorganic layer. Thereby, deterioration of the film with the inner inorganic layer can be prevented over a long period of time, and the gas barrier property similar to the initial value can be exhibited in the film with the inner inorganic layer even in a high temperature and high humidity environment. On the other hand, the film with an outer inorganic layer is exposed to water vapor that has passed through the film with a metal oxide phosphate layer, but the metal oxide has little deterioration in gas barrier properties even in a high-temperature and high-humidity environment. Since the amount of water vapor that permeates the film with the phosphoric acid layer is suppressed over a long period of time and the influence of the film with the outer inorganic layer is limited, the film with the outer inorganic layer is on the film side with the inner inorganic layer. Permeated water vapor and the like can be continuously blocked.

  Thus, according to this aspect, by arranging the films having different characteristics in a specific order to form the outer packaging material, the outer packaging material can maintain a high gas barrier property even in a high-temperature and high-humidity environment. It can be. Therefore, it is possible to form a vacuum heat insulating material that can maintain the heat insulating performance for a long time even in a high temperature and high humidity environment.

  The outer packaging material of this aspect has a film with a metal oxide phosphate layer, a film with an outer inorganic layer, a film with an inner inorganic layer, and a film that can be thermally welded in this order. Hereinafter, each structure of the outer packaging material of this aspect is demonstrated.

1. Film with metal oxide phosphate layer (first film)
The film with a metal oxide phosphate layer in this embodiment has a first resin substrate and a metal oxide phosphate layer.

(1) Metal Oxide Phosphate Layer The metal oxide phosphate layer is disposed on at least one surface side of the first resin substrate, and is at least a M-O-P bond (where M represents a metal atom, O represents an oxygen atom, and P represents a phosphorus atom. When the outer packaging material has the metal oxide phosphate layer, the amount of water vapor reaching each film located on the inner side of the metal oxide phosphate layer can be greatly suppressed, and the metal oxide phosphorus It can suppress that each film located inside an acid layer deteriorates with water vapor | steam.

  The metal oxide phosphate layer is particularly limited as long as it is a layer having at least a M-O-P bond (where M represents a metal atom, O represents an oxygen atom, and P represents a phosphorus atom). For example, a layer containing a reaction product of a metal oxide and a phosphorus compound can be used. Hereinafter, the reaction product of such a metal oxide and a phosphorus compound will be described.

(A) Metal oxide As the metal atom (M) constituting the metal oxide, the ease of handling for producing the metal oxide and the gas barrier properties of the resulting composite structure are more excellent. It is preferably at least one selected from the group consisting of zirconium, and particularly preferably aluminum. The metal atom (M) constituting the metal oxide may be one type or two or more types. Silicon may be classified as a semimetal, but in this specification, silicon is included in the metal.

  The metal oxide is preferably manufactured by a liquid phase synthesis method in consideration of controllability of the shape and size of the metal oxide to be obtained, manufacturing efficiency, and the like. In the liquid phase synthesis method, a hydrolyzable condensation product of the compound (L) is obtained by hydrolyzing and condensing the compound (L) having a hydrolyzable characteristic group bonded to the metal atom (M) as a raw material. Metal oxides can be synthesized. Moreover, when manufacturing the hydrolysis-condensation product of a compound (L) with a liquid phase synthesis method, the compound (L) which a partly hydrolyzed compound (L) other than the method of using the compound (L) itself as a raw material ( L) partial hydrolyzate, compound (L) completely hydrolyzed product obtained by completely hydrolyzing compound (L), compound (L) partially hydrolyzed and condensed part of compound (L) Metal oxidation can also be achieved by condensing or hydrolyzing a hydrolysis condensate, a product obtained by condensing a part of a complete hydrolyzate of compound (L), or a mixture of two or more of these as raw materials. Can be manufactured. The metal oxide thus obtained is also referred to as “hydrolysis condensate of compound (L)” in this embodiment. There are no particular limitations on the type of the hydrolyzable characteristic group (functional group), and examples include halogen atoms (F, Cl, Br, I, etc.), alkoxy groups, acyloxy groups, diacylmethyl groups, nitro groups, and the like. However, a halogen atom or an alkoxy group is preferable and an alkoxy group is more preferable because of excellent controllability of the reaction.

The compound (L) contains at least one compound (L ¹ ) represented by the following formula (I) because the reaction is easily controlled and the resulting metal oxide phosphate layer has excellent gas barrier properties. Is preferred.
M ¹ X ¹ _m R ¹ _(nm) (I)
[In formula (I), M ¹ is selected from the group consisting of Al, Ti and Zr. X ¹ is selected from the group consisting of F, Cl, Br, I, R ² O—, R ³ C (═O) O—, (R ⁴ C (═O)) ₂ CH—, and NO ₃ . R ¹ , R ² , R ³ and R ⁴ are each selected from the group consisting of an alkyl group, an aralkyl group, an aryl group and an alkenyl group. In Formula (I), when a plurality of X ¹ are present, these X ¹ may be the same as or different from each other. In the formula (I), when a plurality of R ¹ are present, these R ¹ may be the same or different from each other. In the formula (I), when a plurality of R ² are present, these R ² may be the same as or different from each other. In the formula (I), when a plurality of R ³ are present, these R ³ may be the same as or different from each other. In Formula (I), when a plurality of R ⁴ are present, these R ⁴ may be the same as or different from each other. n is equal to the valence of M ¹ . m represents an integer of 1 or more and n or less. ]

Examples of the alkyl group represented by R ¹ , R ² , R ³ and R ⁴ include a methyl group, an ethyl group, a normal propyl group, an isopropyl group, a normal butyl group, an s-butyl group, a t-butyl group, and 2-ethylhexyl. Groups and the like. Examples of the aralkyl group represented by R ¹ , R ² , R ³ and R ⁴ include a benzyl group, a phenethyl group and a trityl group. Examples of the aryl group represented by R ¹ , R ² , R ^3, and R ⁴ include a phenyl group, a naphthyl group, a tolyl group, a xylyl group, and a mesityl group. Examples of the alkenyl group represented by R ¹ , R ² , R ³ and R ⁴ include a vinyl group and an allyl group. R ¹ is preferably, for example, an alkyl group having 1 to 4 carbon atoms. X ¹ is preferably F, Cl, Br, I, or R ² O—. In a preferred example of the compound (L ¹ ), X ¹ is a halogen atom (F, Cl, Br, I) or an alkoxy group (R ² O—) having 1 to 4 carbon atoms, and m is n (M ¹ valence). M ¹ is preferably Al since the handling property for producing the metal oxide and the gas barrier property of the resulting composite structure are more excellent.

As the compound (L ¹ ), at least one compound selected from aluminum triisopropoxide and aluminum tri-s-butoxide is preferable. As the compound (L ¹ ), one type may be used alone, or two or more types may be used in combination. The proportion of the compound other than the compound (L ¹ ) in the compound (L) is, for example, 5 mol% or less or 0 mol%. In one example, the compound (L) consists only of the compound (L ¹ ). Examples of the compound (L) other than the compound (L ¹ ) include compounds in which the above hydrolyzable characteristic group is bonded to a metal atom such as magnesium, calcium, zinc, or silicon.

  By hydrolyzing the compound (L), at least a part of the hydrolyzable characteristic group of the compound (L) is substituted with a hydroxyl group. Furthermore, the hydrolyzate condenses to form a compound in which the metal atom (M) is bonded through the oxygen atom (O). When this condensation is repeated, a compound that can be substantially regarded as a metal oxide is formed. In addition, a hydroxyl group usually exists on the surface of the metal oxide thus formed.

  The metal oxide phosphoric acid layer has a specific structure in which metal oxide particles are bonded to each other via a phosphorus atom derived from a phosphorus compound described later. Such a reaction product or structure can be formed by mixing and reacting a metal oxide and a phosphorus compound. The metal oxide used for mixing with the phosphorus compound (immediately before mixing) may be the metal oxide itself or may be in the form of a composition containing the metal oxide. In a preferred example, the metal oxide is mixed with the phosphorus compound in the form of a liquid (solution or dispersion) obtained by dissolving or dispersing the metal oxide in a solvent.

(B) Phosphorus compound The phosphorus compound contains a site capable of reacting with a metal oxide, and typically contains a plurality of such sites. In a preferred example, the phosphorus compound contains 2 or more and 20 or less such sites (atomic groups or functional groups). Examples of such sites include sites capable of reacting with functional groups (for example, hydroxyl groups) present on the surface of the metal oxide, such as halogen atoms bonded directly to phosphorus atoms or bonded directly to phosphorus atoms. Contains oxygen atoms. Those halogen atoms and oxygen atoms can cause a condensation reaction (hydrolysis condensation reaction) with a hydroxyl group present on the surface of the metal oxide. A functional group (for example, a hydroxyl group) present on the surface of the metal oxide is usually bonded to a metal atom (M) constituting the metal oxide.

Examples of the phosphorus compound include phosphoric acid, polyphosphoric acid, phosphorous acid, phosphonic acid, and derivatives thereof. Specific examples of polyphosphoric acid include pyrophosphoric acid, triphosphoric acid, polyphosphoric acid condensed with four or more phosphoric acids, and the like. Examples of the above derivatives include salts of phosphoric acid, polyphosphoric acid, phosphorous acid, phosphonic acid, (partial) ester compounds, halides (chlorides, etc.), dehydrates (niline pentoxide, etc.) and the like. . Examples of phosphonic acid derivatives include hydrogen atoms directly bonded to phosphorus atoms of phosphonic acid (HP (═O) (OH) ₂ ), which may have various functional groups. Substituted compounds (eg, nitrilotris (methylenephosphonic acid), N, N, N ′, N′-ethylenediaminetetrakis (methylenephosphonic acid), etc.), salts thereof, (partial) ester compounds, halides and dehydration Things are also included. Furthermore, organic polymers having a phosphorus atom such as phosphorylated starch can also be used as the phosphorus compound. These phosphorus compounds may be used alone or in combination of two or more. Among these phosphorus compounds, the stability of the coating solution when forming a metal oxide phosphate layer using a coating solution is excellent, and the gas barrier properties of the resulting metal oxide phosphate layer are more excellent. It is preferable to use an acid alone or to use phosphoric acid and another phosphorus compound in combination.

  In this embodiment, it is preferable that the phosphorus compound is mixed with the metal oxide described above in the form of a solution obtained by dissolving the phosphorus compound in a solvent. Although any solvent can be used at that time, water or a mixed solvent containing water is a preferable solvent. In addition, in a phosphorus compound or a composition containing a phosphorus compound that is used for mixing with a metal oxide, a metal oxide phosphate layer that is superior in gas barrier properties is obtained because the metal atom content is reduced. To preferred. The content ratio of the metal atom contained in the phosphorus compound or the composition containing the phosphorus compound to be mixed with the metal oxide is the number of moles of all phosphorus atoms contained in the phosphorus compound or the composition containing the phosphorus compound. The reference (100 mol%) is preferably 5 mol% or less, more preferably 1 mol% or less, and may be 0 mol%.

(C) Reaction product In the metal oxide phosphoric acid layer, the ratio between the number of moles of metal atoms (N _M ) constituting the metal oxide and the number of moles of phosphorus atoms derived from the phosphorus compound (N _P ) 0.8 ≦ mol number (N _M ) / mole number (N _P ) ≦ 4.5, preferably 1.1 ≦ mol number (N _M ) / mol number (N _P ) ≦ 3. More preferably, the relationship of 0 is satisfied. When the value of the number of moles (N _M ) / number of moles (N _P ) exceeds 4.5, the metal oxide becomes excessive with respect to the phosphorus compound, the bonding between the metal oxide particles becomes insufficient, Since the amount of hydroxyl groups present on the surface of the metal oxide increases, the gas barrier property tends to decrease. On the other hand, when the value of the number of moles (N _M ) / number of moles (N _P ) is less than 0.8, the phosphorus compound becomes excessive with respect to the metal oxide, and excess phosphorus that does not participate in the bond with the metal oxide. The amount of the compound increases, the amount of the hydroxyl group derived from the phosphorus compound tends to increase, and the gas barrier property tends to decrease.

  The metal oxide phosphoric acid layer may further contain a specific polymer (C). The polymer (C) is a polymer (C) having at least one functional group (f) selected from the group consisting of a hydroxyl group, a carboxyl group, a carboxylic anhydride group, and a carboxyl group salt. In this embodiment, a polymer that satisfies the requirements as a phosphorus compound and includes a functional group (f) is handled as a phosphorus compound without being included in the polymer (C).

  As the polymer (C), a polymer containing a structural unit having a functional group (f) can be used. Specific examples of such structural units include 1 functional group (f) such as a vinyl alcohol unit, an acrylic acid unit, a methacrylic acid unit, a maleic acid unit, an itaconic acid unit, a maleic anhydride unit, and a phthalic anhydride unit. Examples include structural units having at least one unit. The polymer (C) may contain only one type of structural unit having the functional group (f), or may contain two or more types of structural units having the functional group (f). In order to obtain a metal oxide phosphoric acid layer having better gas barrier properties, the proportion of the structural unit having the functional group (f) in the total structural units of the polymer (C) is 40 mol% or more. Is more preferable, 70 mol% or more is more preferable, and 100 mol% may be sufficient.

  In order to obtain a composite structure having better gas barrier properties, the polymer (C) is composed of polyvinyl alcohol, ethylene-vinyl alcohol copolymer, polysaccharide, polyacrylic acid, polyacrylic acid salt, polymethacrylic acid, And at least one polymer selected from the group consisting of salts of polymethacrylic acid. From the viewpoint of gas barrier properties and mechanical properties (drop impact strength, etc.) of the obtained metal oxide phosphate layer, the number average molecular weight of the polymer (C) is preferably 8,000 or more, and 10,000. More preferably. The upper limit of the number average molecular weight of the polymer (C) is not particularly limited, and is, for example, 1,500,000 or less. The content of the polymer (C) in the metal oxide phosphate layer is more preferably 30% by mass or less, based on the mass of the metal oxide phosphate layer (100% by mass), and 20% by mass. It may be the following. The polymer (C) may or may not react with the other components in the metal oxide phosphate layer. In this embodiment, the polymer (C) is also expressed as the polymer (C) when it reacts with other components. For example, the case where the polymer (C) is bonded to a metal oxide and / or a phosphorus atom derived from a phosphorus compound is also expressed as a polymer (C). In this case, the content of the polymer (C) is calculated by dividing the mass of the polymer (C) before bonding with the metal oxide and / or phosphorus atom by the mass of the metal oxide phosphate layer. .

  The metal oxide phosphoric acid layer may be composed of only a reaction product obtained by reacting at least a metal oxide and a phosphorus compound (including one having a polymer (C) portion), or Although it may be comprised only from the reaction product and the polymer (C) which has not reacted, it may further contain other components. Examples of other components include inorganic acid metal salts such as carbonates, hydrochlorides, nitrates, hydrogen carbonates, sulfates, hydrogen sulfates, borates, and aluminates; oxalates, acetates, Organic acid metal salts such as tartrate and stearate; metal complexes such as acetylacetonate metal complexes (such as aluminum acetylacetonate), cyclopentadienyl metal complexes (such as titanocene), cyano metal complexes; layered clay compounds; Agents; polymer compounds other than the polymer (C); plasticizers; antioxidants; ultraviolet absorbers; flame retardants and the like. The content of the other components in the metal oxide phosphoric acid layer is preferably 5% by mass or less, and may be 0% by mass (excluding other components).

(D) Metal Oxide Phosphate Layer The thickness of the metal oxide phosphate layer (the total thickness of each layer when the outer packaging material has two or more metal oxide phosphate layers) is 1.0 μm or less. Is preferably 0.9 μm or less. It is because the dimensional change at the time of processing of an outer packaging material can be reduced, and a softness | flexibility can be improved. Further, the lower limit of the thickness is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

The presence or absence of the MOP bond in the metal oxide phosphate layer as described above can be determined by the presence or absence of an infrared absorption peak in the range of 1080 cm ⁻¹ or more and 1130 cm ⁻¹ or less in the infrared absorption spectrum. . The method for measuring the infrared absorption spectrum of the metal oxide phosphate layer is not particularly limited. For example, the measurement by the ATR method (total reflection measurement method), the composition to be measured is scraped, and the infrared absorption spectrum is measured by KBr. An infrared absorption spectrum can be obtained by measuring by a method, measuring a sample collected from a measurement object by microinfrared spectroscopy, or the like. In addition, when measuring the infrared absorption spectrum of the metal oxide phosphate layer disposed on the base material, absorption derived from the base material is observed, and an accurate absorption spectrum of the metal oxide phosphate layer cannot be obtained. Sometimes. In that case, the infrared absorption spectrum of the metal oxide phosphate layer can be obtained by subtracting the infrared absorption spectrum of the substrate measured separately.

In the infrared absorption spectrum of the metal oxide phosphoric acid layer in the range of 800 cm ⁻¹ or more and 1400 cm ⁻¹ or less, the bond constituting the metal oxide, the bond constituting the phosphorus compound, and the metal oxide and the phosphorus compound Among all infrared absorption peaks derived from bonds formed by themselves and / or reacting with each other, the metal atom (M) constituting the metal oxide and the phosphorus atom (P) derived from the phosphorus compound And the infrared absorption peak derived from the M—O—P bond bonded through the oxygen atom (O) is maximized, that is, the maximum infrared absorption peak wavenumber (n ¹ ) is 1080 cm ⁻¹ or more. It is preferable that it exists in the range below 1130 cm < ^-1 >. This is because a metal oxide phosphoric acid layer having excellent gas barrier properties can be obtained.

Further, in the infrared absorption spectrum of the metal oxide phosphate layer, the half width of the absorption peak having a maximum in the maximum absorption wave number (n ¹ ) is 200 cm ⁻¹ from the viewpoint of gas barrier properties of the metal oxide phosphate layer to be obtained. Or less, more preferably 100 cm ⁻¹ or less, and particularly preferably 50 cm ⁻¹ or less.

FIG. 3 shows an example of an infrared absorption spectrum of a metal oxide phosphate layer that can be used in this embodiment. The infrared absorption spectrum is in a range of 800 cm ⁻¹ or more and 1400 cm ⁻¹ or less by a total reflection measurement method (ATR method) using a Fourier transform type infrared spectrophotometer (manufactured by Varian, FTS7000) as a measuring device. It is measured.

  The other points of the metal oxide phosphate layer, such as the method for forming the metal oxide phosphate layer, can be the same as those described in Japanese Patent Application Laid-Open No. 2011-226644, and a description thereof is omitted here. .

(2) 1st resin base material If a resin base material can support the said metal oxide phosphoric acid layer, it will not specifically limit. For example, a resin film is preferably used. When the first resin base material is a resin film, the resin film may be unstretched or uniaxially or biaxially stretched. The first resin substrate may or may not have transparency.

  The resin used for the first resin substrate is not particularly limited, and examples thereof include polyolefin resins such as polyethylene and polypropylene, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polybutylene terephthalate (PBT). Polyester resin, cyclic polyolefin resin, polystyrene resin, acrylonitrile-styrene copolymer (AS resin), acrylonitrile-butadiene-styrene copolymer (ABS resin), poly (meth) acrylic resin, polycarbonate resin, polyvinyl alcohol (PVA), Polyvinyl alcohol resin such as ethylene-vinyl alcohol copolymer (EVOH), saponified ethylene-vinyl ester copolymer, various polyamide resins such as nylon, polyimide resin, polyurethane Fat, acetal resin, may be used various resins such as cellulose resins. In this embodiment, among the above resins, PET, polypropylene, and the like are preferably used, and PET is more preferably used from the viewpoints of toughness, oil resistance, chemical resistance, availability, and the like.

  A hydrophilic group-containing resin such as a polyvinyl alcohol resin is a resin having an excellent barrier property against oxygen, but the barrier property against oxygen of a hydrophilic group-containing resin is easily deteriorated by exposure to water vapor. is there. Since the film with the metal oxide phosphate layer having the first resin base material is disposed on the outer side of the outer packaging material, that is, at a position that is easily exposed to water vapor, the first resin base material has a hydrophilic group. It is preferred that no containing resin is used.

  The first resin base material may contain various plastic compounding agents and additives. Examples of the additive include a lubricant, a crosslinking agent, an antioxidant, an ultraviolet absorber, a light stabilizer, a filler, a reinforcing agent, an antistatic agent, a pigment, and a modifying resin. The first resin base material may be subjected to a surface treatment. This is because the adhesion to the metal oxide phosphoric acid layer can be improved. Examples of the surface treatment include oxidation treatment, roughening treatment (roughening treatment), easy adhesion coating treatment and the like disclosed in Japanese Patent Application Laid-Open No. 2014-180837.

  Although the thickness of the 1st resin base material is not specifically limited, For example, it exists in the range of 6 micrometers or more and 200 micrometers or less, More preferably, it exists in the range of 9 micrometers or more and 100 micrometers or less.

  The first resin base material preferably has an indentation elastic modulus of 1.5 GPa or more, more preferably 2.0 GPa or more, and particularly preferably 2.5 GPa or more. The upper limit of the indentation elastic modulus is not particularly limited, but is preferably 6.0 GPa or less, and preferably 5.0 GPa or less. By setting the indentation elastic modulus of the first resin base material within the above range, the first resin base material is less likely to expand with respect to external stress. It can be made small, and the occurrence of defects such as cracks can be suppressed.

The indentation elastic modulus can be measured by using a super micro load hardness tester by a method based on ISO 14577: 2015. For measurement, a sample of a desired size is cut out from the outer packaging material, and a Vickers indenter (a square pyramid diamond indenter with a face angle of 136 °) is attached to the layer to be measured on its cross section or surface. Using a testing machine, the indentation speed is 0.1 μm / second, the indentation depth is 2 μm, the holding time is 5 seconds, and the drawing speed is 0.1 μm / second. The above measurement is performed in an atmosphere having a temperature of 23 ° C. ± 2 ° C. and a humidity of 60% RH ± 5% RH. As the ultra micro hardness tester, for example, Picodenter HM500 (manufactured by Fisher Instruments) can be used.
When measuring the cross section of the sample of the outer packaging material, the outer periphery of the sample is fixed and fixed with a cured resin adhesive, and the exposed sample is cut in the thickness direction with a diamond knife to measure the exposed cross section. Moreover, when measuring the surface of the sample of the outer packaging material, the surface opposite to the surface to be measured is fixed to a flat glass plate having a thickness of 1.1 mm with a cured resin adhesive, and the surface is measured. The thickness of each resin layer at the time of calculating the indentation elastic index can be measured by measuring the cut section with an optical microscope. The indentation elastic modulus of layers other than the 1st resin base material mentioned later is also measured by said measuring method.
Under one condition, in one sample cut out from the outer packaging material, measurement is performed at at least five different points with respect to the layer to be measured, and the average of these measured values is set as the value of the indentation elastic modulus of the condition.

(3) Film with metal oxide phosphate layer In the film with metal oxide phosphate layer, the positional relationship between the metal oxide phosphate layer and the first resin substrate is not particularly limited. May be arranged on the heat-weldable film side. In this embodiment, in order to protect the metal oxide phosphoric acid layer from exposure to water vapor and physical stress, the metal oxide phosphoric acid layer is closer to the film side that can be thermally welded than the first resin base material. Preferably they are arranged. Further, in the film with the metal oxide phosphate layer farthest from the thermally weldable film, the metal oxide phosphate layer is on the outer side of the outer packaging material, and the first resin base material is on the inner side of the outer packaging material. When arrange | positioning, it is preferable that protective films, such as resin films, are arrange | positioned on the outer side of the said metal oxide phosphoric acid layer. About the said protective film, since it is the same as that of what is demonstrated in "5. protective film" mentioned later, description here is abbreviate | omitted.

2. Film with outer inorganic layer (second film)
The film with an outer inorganic layer in this embodiment has a second resin base and an inorganic layer disposed on at least one surface side of the second resin base. By disposing the film with the outer inorganic layer inside the film with the metal oxide phosphate layer described above, water vapor that has passed through the film with the metal oxide phosphate layer is disposed inside the film with the outer inorganic layer. Reaching the film with the inner inorganic layer can be prevented.

(1) Inorganic layer An inorganic layer is arrange | positioned at the at least one surface side of a 2nd resin base material, and mainly contributes to the gas-barrier property of a film with an outer side inorganic layer. The inorganic layer is not particularly limited as long as it can exhibit a desired gas barrier property, and may or may not have transparency. As such a layer having gas barrier properties, for example, a metal layer, a layer containing an inorganic compound as a main component, or the like can be used. As said metal layer, the metal vapor deposition film etc. which are comprised from metals, such as aluminum, stainless steel, titanium, nickel, iron, copper, or an alloy containing these, etc. can be mentioned.

  In addition, the inorganic compound in the layer containing the inorganic compound as a main component may be any material that can exhibit a desired gas barrier property. For example, the inorganic oxide, inorganic oxynitride, inorganic nitride, inorganic oxide carbide, inorganic Examples thereof include one or two or more inorganic compounds selected from oxycarbonitride and silicon zinc oxide. Specifically, inorganic compounds containing one or more atoms selected from silicon (silica), aluminum, magnesium, calcium, potassium, tin, sodium, titanium, boron, yttrium, zirconium, mucerium, and zinc Can be mentioned. More specifically, silicon oxide, aluminum oxide, magnesium oxide, titanium oxide, tin oxide, silicon zinc alloy oxide, indium alloy oxide, silicon nitride, aluminum nitride, titanium nitride, oxidation Examples thereof include silicon nitride. The said inorganic compound may be used independently, and the said material may be mixed and used for arbitrary ratios.

  In this embodiment, the inorganic layer is preferably a metal layer, and more preferably an aluminum layer. This is because the metal layer is less expensive than the inorganic oxide layer and the like and has excellent bending resistance.

  The thickness of the inorganic layer is not particularly limited as long as a desired gas barrier property can be exhibited. Depending on the type of the inorganic layer, for example, within the range of 5 nm or more and 200 nm or less, especially 30 nm. As mentioned above, it is preferable to be in the range of 150 nm or less, particularly in the range of 60 nm or more and 120 nm or less. If the thickness of the inorganic layer is less than the above range, film formation may be insufficient and the desired gas barrier property may not be exhibited. If the thickness exceeds the above range, cracks are likely to occur and flexibility may be reduced. Or when an inorganic layer contains a metal and an alloy, in the vacuum heat insulating material formed using the outer packaging material of this aspect, there exists a possibility that a heat bridge may arise.

  The inorganic layer may be a single layer or may have a stacked structure in which two or more layers are stacked so that the thickness is within the above range. When using an inorganic layer having a laminated structure, inorganic layers having the same composition may be combined, or inorganic layers having different compositions may be combined. The inorganic layer may be subjected to surface treatment such as corona discharge treatment from the viewpoint of improving gas barrier properties and adhesion to other layers.

  As a method of forming the inorganic layer on one surface side of the second resin base material, a conventionally known method can be used according to the kind of the inorganic layer. For example, a method of forming an inorganic layer on the second resin substrate using a dry film forming method such as a physical vapor deposition (PVD) method or a chemical vapor deposition (CVD) method, specifically, an electron beam ( EB) A vacuum deposition method using a heating method can be used. Moreover, the method of using a ready-made gas barrier thin film and thermocompression bonding a 2nd resin base material and the thin film heated previously, the method of bonding to a 2nd resin base material or a thin film through an adhesive bond layer, etc. are mentioned. . As a specific method for forming an inorganic layer by the PVD method and the CVD method, for example, a method disclosed in JP 2011-5835 A can be used.

The gas barrier inorganic layer alone (one layer) is preferably an oxygen permeability of at ^{0.5cc / (m 2 · day ·} atm) or less, preferably ^{0.1cc / (m 2 · day ·} atm) or less It is preferable that Further, the water vapor permeability is preferably 0.5 g / (m ² · day) or less, more preferably 0.1 g / (m ² · day) or less. When the oxygen and water vapor permeability of the inorganic layer are within the above-described ranges, it is possible to make it difficult for water vapor or gas that has penetrated from the outside to penetrate into the core material inside the vacuum heat insulating material.
Here, the inorganic layer alone (one layer) refers to one inorganic layer. When the inorganic layer has a laminated structure, one inorganic layer having a laminated structure is provided.

  In addition, the said oxygen permeability can be made into the value measured using the oxygen permeability measuring apparatus on the conditions of temperature 23 degreeC and humidity 60% RH based on JISK7126-2: 2006. Examples of the oxygen permeability measuring device include OXTRAN manufactured by MOCON (USA). The water vapor permeability can be measured according to JIS K7129 using a water vapor permeability measuring device under conditions of a temperature of 40 ° C. and a humidity of 90% RH. As the water vapor transmission rate measuring apparatus, Permatran manufactured by MOCON (USA) can be used.

For details on the measurement of oxygen permeability, see JIS K7126-2: 2006 (Plastics-Film and Sheet-Gas permeability test method-Part 2: Isobaric method, Appendix A: Test method of oxygen gas permeability by electrolytic sensor method ), The state of the carrier gas and the test gas can be measured under the conditions of a temperature of 23 ° C. and a humidity of 60% RH using an oxygen permeability measuring device. Examples of the oxygen permeability measuring device include OXTRAN manufactured by MOCON (USA). The measurement is cut out to a desired size and mounted in the above-mentioned apparatus, and the condition of the carrier gas and the test gas is a temperature of 23 ° C. and a humidity of 60% RH with a permeation area of about 50 cm ² (permeation region: a circle of 8 cm in diameter). Do. During the measurement, the carrier gas is purged by supplying the carrier gas at a flow rate of 10 cc / min for 60 minutes or more. As the carrier gas, nitrogen gas containing about 5% hydrogen can be used. After purging, the test gas is allowed to flow through the apparatus, and measurement is performed after 12 hours have been secured as the time from the start of flowing until the equilibrium state is reached. As the test gas, for example, at least 99.5% of dry oxygen can be used. As for the oxygen permeability, at least three samples can be measured under one condition, and the average of the measured values can be used as the value of oxygen permeability under the condition.

The details of the measurement of water vapor transmission rate are based on JIS K7129: 2008 (Appendix B: Infrared sensor method, the same shall apply hereinafter) using a water vapor transmission rate measuring device at a temperature of 40 ° C. and a relative humidity difference. It can be measured under the condition of 90% RH. Measurement is performed by cutting to a desired size and mounting between the upper chamber and the lower chamber of the above apparatus, with a permeation area of about 50 cm ² (permeation region: a circle with a diameter of 8 cm), a temperature of 40 ° C., and a relative humidity difference of 90% RH. Measure with. For example, “PERMATRAN” manufactured by MOCON, USA can be used as the water vapor transmission rate measuring apparatus. For the water vapor transmission rate, at least three samples can be measured under one condition, and the average of the measured values can be used as the value of the water vapor transmission rate under that condition.

(2) Second resin base material Regarding the second resin base material that can be used for the film with the outer inorganic layer, in the section “1. Film with metal oxide phosphoric acid layer, (2) First resin base material”. Since it is the same as that of description, description here is abbreviate | omitted.

  The second resin base material preferably has an indentation elastic modulus of 1.5 GPa or more, more preferably 2.0 GPa or more, and particularly preferably 2.5 GPa or more. The upper limit of the indentation elastic modulus is not particularly limited, but is preferably 6.0 GPa or less, and preferably 5.0 GPa or less. By setting the indentation elastic modulus of the second resin base material within the above range, the same effect as that obtained by defining the indentation elastic modulus of the first resin base material can be obtained.

(3) Film with outer inorganic layer The film with outer inorganic layer may have an overcoat layer on the surface of the inorganic layer opposite to the second resin substrate. This is because the gas barrier properties of the film with the outer inorganic layer can be improved. The overcoat layer is the same as the description in the section of “(II) Second mode, 2. Film with overcoat layer, (1) Overcoat layer”, which will be described later.

  Moreover, the positional relationship between the inorganic layer and the second resin base material is not particularly limited, and any of the inorganic layers and the second resin base material may be disposed on the heat-weldable film side. In this aspect, in order to protect an inorganic layer from the water vapor which permeate | transmitted the film with a metal oxide phosphoric acid layer mentioned above, an inorganic layer is arrange | positioned rather than the said 2nd resin base material at the film side which can be heat-welded. It is preferable.

3. Film with inner inorganic layer (third film)
The film with an inner inorganic layer in this aspect has a third resin base and an inorganic layer disposed on at least one surface side of the third resin base. Since the film with the inner inorganic layer is disposed inside the film with the metal oxide phosphoric acid layer and the film with the outer inorganic layer described above, the influence of water vapor or the like is greatly suppressed even in a high-temperature and high-humidity environment. And high gas barrier properties similar to the initial value can be exhibited.

(1) Inorganic layer An inorganic layer is arrange | positioned at the at least one surface side of a 3rd resin base material, and mainly contributes to the gas-barrier property of a film with an inner side inorganic layer. The inorganic layer is not particularly limited as long as it can exhibit a desired gas barrier property, and may or may not have transparency. The inorganic layer of the film with an inner inorganic layer is the same as that described in the section of “2. Film with outer inorganic layer, (1) Inorganic layer”, and the description thereof is omitted here.

(2) Third resin base material The types of resins that can be used for the third resin base material, additives, surface treatment for the third resin base material, thickness of the third resin base material, etc. are described in “1. Since it is the same as the description in the section of “film with oxide phosphoric acid layer, (2) first resin base material”, description here is omitted.

Among those listed as the types of resins that can be used for the first resin substrate, the third resin substrate includes polyvinyl alcohol (PVA), polyvinyl such as ethylene-vinyl alcohol copolymer (EVOH). It is preferable to use hydrophilic group-containing resins such as natural polymers such as alcohol resins, acrylic resins, methyl cellulose, carboxymethyl cellulose, cellulose nanofibers, and polysaccharides. Among them, polyvinyl alcohol resins such as PVA and EVOH, in particular EVOH is preferably used. This is because the hydrophilic group-containing resin exhibits a high barrier property against oxygen even at a high temperature, so that the barrier property against oxygen as a film with an inner inorganic layer can be improved. In the outer packaging material of this aspect, since the film with the inner inorganic layer is protected by the above-described film with the metal oxide phosphate layer and the film with the outer inorganic layer, the influence of water vapor or the like is greatly affected even in a high-temperature and high-humidity environment. Is suppressed. Therefore, even if it is a hydrophilic group-containing resin that is easily deteriorated by water vapor, if it is used as the third resin base material, it is possible to maintain a high barrier property against oxygen even in a high-temperature and high-humidity environment. In the present specification, the “hydrophilic group” refers to an atomic group that forms a weak bond with a water molecule by electrostatic interaction or hydrogen bond, and has an affinity for water. -OH), carboxy group (-COOH), a amino group _(-NH 2), represent an atomic group whose properties, including polar group or leaving group such as a carbonyl group (> CO), a sulfo group _(-SO 3 H) .

  The third resin base material preferably has an indentation elastic modulus of 1.5 GPa or more, more preferably 2.0 GPa or more, and particularly preferably 2.5 GPa or more. The upper limit of the indentation elastic modulus is not particularly limited, but is preferably 6.0 GPa or less, and preferably 5.0 GPa or less. By setting the indentation elastic modulus of the third resin base material within the above range, the same effect as that obtained by defining the indentation elastic modulus of the first resin base material can be obtained.

  The positional relationship between the inorganic layer and the third resin substrate in the film with the inner inorganic layer is not particularly limited, and any of them may be arranged on the heat-weldable film side. In the case where a hydrophilic group-containing resin is used, the third resin base material is preferably disposed on the thermally weldable film side of the inorganic layer of the film with the inner inorganic layer. This is because the third resin base material containing the hydrophilic group-containing resin can be protected from water vapor by the inorganic layer of the film with the inner inorganic layer, and the barrier property against oxygen of the hydrophilic group-containing resin can be maintained high. .

(3) Film with an inner inorganic layer The film with an inner inorganic layer may have an overcoat layer on the surface side opposite to the third resin substrate of the inorganic layer. This is because the gas barrier property of the film with the inner inorganic layer can be improved. The overcoat layer is the same as the description in the section of “(II) Second mode, 2. Film with overcoat layer, (1) Overcoat layer”, which will be described later.

  Moreover, the outer packaging material of this aspect may have a plurality of films with an inner inorganic layer as described above. This is because the gas barrier property of the outer packaging material can be improved. When the outer packaging material has a plurality of films with an inner inorganic layer, the configuration of each film with an inner inorganic layer may be the same or different.

4). Heat-weldable film The heat-weldable film in this embodiment is a layer that can be heat-welded, and is a part that comes into contact with the core material when the vacuum heat insulating material is formed using the outer packaging material. Moreover, it is a site | part which forms the heat welding surface which heat-welds the edge part of the outer packaging materials which oppose.

  The heat-weldable film material is preferably a thermoplastic resin because it can be melted and fused by heating. For example, polyethylene such as linear short-chain branched polyethylene (LLDPE) or unstretched polypropylene Polyolefin resins such as (CPP), polyester resins such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), polyvinyl acetate resins, polyvinyl chloride resins, poly (meth) An acrylic resin, a urethane resin, etc. are mentioned.

  In this embodiment, among the above resins, a film in which polyethylene such as linear short chain branched polyethylene (LLDPE), polyolefin resin such as unstretched polypropylene (CPP), polybutylene terephthalate (PBT), or the like can be heat-welded. It is preferable to be used as a material. When the above-mentioned material is the above-mentioned resin, when the vacuum heat insulating material is formed, at the end where the outer packaging materials are bonded to each other, on the outside of the heat-weldable film such as the above-mentioned film with an inner inorganic layer. It is because generation | occurrence | production of the crack to each arrange | positioned film can be suppressed.

  The melting point of the heat-weldable film is preferably, for example, in the range of 80 ° C. or higher and 300 ° C. or lower, and more preferably in the range of 100 ° C. or higher and 250 ° C. or lower. If the melting point of the heat-weldable film is less than the above range, the sealing surface of the outer packaging material may be peeled off in the usage environment of the vacuum heat insulating material formed using the outer packaging material of this aspect. Also, if the melting point of the heat-weldable film exceeds the above range, it is necessary to heat-weld the outer packaging material at a high temperature, so the film with the inner inorganic layer used together as the outer packaging material may be deteriorated by heat. is there.

  The melting point of the heat-weldable film can be measured by the following method using a differential scanning calorimeter (DSC). First, a heat-weldable film is peeled off from the outer packaging material to obtain a measurement sample of about 10 mg. This measurement sample was placed in an aluminum cell, and the temperature was raised from 20 ° C. to 300 ° C. at a heating rate of 10 ° C./minute in a nitrogen atmosphere using a differential scanning calorimeter (DSC204 manufactured by NETZSCH). Hold for 10 minutes. Further, the temperature is lowered to 20 ° C. at a temperature lowering rate of 10 ° C./min, held at that temperature for 10 minutes, and then heated again to 300 ° C. at a temperature raising rate of 10 ° C./min (second temperature increase). The intersection of the tangent at the melting point observed at the second temperature rise and the base line of the DSC curve on the lower temperature side than the melting point can be set as the melting point of the heat-weldable film.

  The heat-weldable film may contain other materials such as an antiblocking agent, a lubricant, a flame retardant, and an organic filler in addition to the above-described resin.

  The thickness of the heat-weldable film is preferably in the range of, for example, 15 μm or more and 100 μm or less, more preferably in the range of 25 μm or more and 90 μm or less, and particularly preferably in the range of 30 μm or more and 80 μm or less. When the thickness of the heat-weldable film is larger than the above range, the gas barrier property of the outer packaging material may be lowered. When the thickness is smaller than the above range, a desired adhesive force may not be obtained.

5. Protective film The outer packaging material of this aspect may have a protective film in addition to the above-described film with a metal oxide phosphate layer, a film with an outer inorganic layer, a film with an inner inorganic layer, and a film that can be heat welded. . It is because each film used together as an outer packaging material such as a film with a metal oxide phosphate layer can be protected from damage and deterioration. The protective film can be distinguished from the above-described films in that no layer having a gas barrier property is disposed on either side of the protective film. The arrangement position of the protective film in the outer packaging material is not particularly limited, but when forming a vacuum heat insulating material, such as the surface opposite to the heat-weldable film of the film with the metal oxide phosphate layer. It is preferable that a protective film is disposed at a position to be the outermost layer (outermost layer).

  The protective film may be any film using a resin having a higher melting point than a heat-weldable film, and may be in the form of a sheet or film. As such a protective film, for example, thermosetting such as nylon resin, polyester resin, polyamide resin, polypropylene resin, polyurethane resin, amino resin, silicone resin, epoxy resin, polyimide (PI), etc. Resin, polyvinyl chloride (PVC), polycarbonate (PC), polystyrene (PS), polyvinyl alcohol (PVA), ethylene-vinyl acetate copolymer (EVAL), polyacrylonitrile (PAN), cellulose nanofiber (CNF), etc. Examples thereof include sheets or films. Among them, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), biaxially oriented polypropylene (OPP), polyvinyl chloride (PVC), and the like are preferably used.

  The protective film has sufficient strength to protect the inside of the vacuum heat insulating material when the vacuum heat insulating material is formed using the outer packaging material of this aspect, and has heat resistance, pin hole resistance, and puncture resistance. It is preferable that it is excellent in property etc. The protective film preferably has gas barrier properties such as oxygen barrier properties and water vapor barrier properties.

  The protective film may be a single layer or may be a multilayer formed by laminating layers made of the same material or layers made of different materials. The protective film may be subjected to a surface treatment such as a corona discharge treatment from the viewpoint that the adhesion with other layers can be improved. The thickness of the protective film is not particularly limited as long as it is a thickness capable of protecting other films used together for the outer packaging material, but generally within a range of 5 μm or more and 80 μm or less. Degree.

  The protective film preferably has an indentation elastic modulus of 1.5 GPa or more, more preferably 2.0 GPa or more, and particularly preferably 2.5 GPa or more. The upper limit of the indentation elastic modulus is not particularly limited, but is preferably 6.0 GPa or less, and preferably 5.0 GPa or less. By setting the indentation elastic modulus of the protective film within the above range, the same effect as that obtained by defining the indentation elastic modulus of the first resin substrate can be obtained.

6). The outer packaging material for vacuum heat insulating material is not particularly limited as long as the desired gas barrier property and strength can be obtained, for example, within the range of 30 μm or more and 200 μm or less. In particular, it is preferably in the range of 50 μm or more and 150 μm or less. Further, the tensile strength of the outer packaging material is preferably 50 N / 15 mm or more, and more preferably 80 N / 15 mm or more. This is because breakage or the like is less likely to occur when the vacuum heat insulating material formed using the outer packaging material of this aspect is bent. The tensile strength is a value measured based on JIS-Z-1707.

  The method for laminating the outer packaging material is not particularly limited as long as an outer packaging material having a desired configuration can be obtained, and a known method can be used. For example, it can be obtained by extruding and pasting materials such as a dry lamination method in which each film formed in advance is bonded using an adhesive, and a film with an inner inorganic layer that is heat-melted using a T-die. And a method of bonding a heat-weldable film to the laminated body through an adhesive.

  The outer packaging material may have a configuration other than the above-described films. For example, you may have the layer which has gas-barrier property between the said film with an inner side inorganic layer, and the film which can be heat-welded. Such layers include polyvinyl alcohol resins such as polyvinyl alcohol (PVA) and ethylene-vinyl alcohol copolymer (EVOH), acrylic resins, methyl cellulose, carboxymethyl cellulose, cellulose nanofibers, polysaccharides and other natural polymers. A layer containing a hydrophilic group-containing resin such as a molecule is preferably used, and among them, a polyvinyl alcohol resin such as PVA or EVOH, particularly a layer containing EVOH is preferably used. Since the hydrophilic group-containing resin is excellent in physical properties such as oxygen barrier properties and bending resistance, the provision of such a layer can improve the gas barrier properties of the outer packaging material, particularly the oxygen barrier properties. Because it can.

  Moreover, the outer packaging material of this aspect has the film with the other inorganic layer which has the structure similar to these films with an inorganic layer other than the film with an outer side inorganic layer and the film with an inner side inorganic layer mentioned above. Also good. This is because the gas barrier property of the outer packaging material can be improved. One or more of the other films with inorganic layers are arranged between the film with the metal oxide phosphate layer and the film with the outer inorganic layer, or between the film with the outer inorganic layer and the film with the inner inorganic layer. Can do. The film with the outer inorganic layer, the film with the inner inorganic layer, and the film with the other inorganic layer may have the same configuration or different configurations.

The outer material is oxygen permeability ^{0.1cc / (m 2 · day ·} atm) or less, is preferably Among them ^{0.05cc / (m 2 · day ·} atm) or less. Further, the vacuum heat insulating material for outer material water vapor permeability of 0.5g ^/ (m 2 · day) or less, preferably 0.1g ^/ (m 2 · day) or less, particularly 0.05g / ^{(m 2} · day) or less. This is because, since the outer packaging material has gas barrier properties within the above range, a vacuum heat insulating material having high heat insulating performance can be formed even when exposed to a high temperature and high humidity environment for a long time. In addition, the measuring method of the oxygen permeability and water vapor permeability of the outer packaging material is the same as the measuring method of each permeability of the inorganic layer described in “2. Film with outer inorganic layer, (1) Inorganic layer”. Therefore, the description here is omitted. The measurement of the water vapor transmission rate is that the outermost surface layer located on the opposite side to the heat-weldable film, which is one outermost surface layer in the thickness direction of the outer packaging material, of the surface of the outer packaging material cut to a desired size is high. It is carried out by mounting between the upper chamber and the lower chamber of the water vapor transmission rate measuring device so as to be on the humidity side (water vapor supply side).

  The outer packaging material of this aspect preferably has three or more resin layers having an indentation elastic modulus of 1.0 Pa or more, and particularly preferably three or more resin layers having an indentation elastic modulus of 1.5 Pa or more. It is preferable to have three or more resin layers having an elastic modulus of 2.0 Pa or more. Moreover, although it is preferable to have three or more resin layers which show a desired indentation elastic modulus, it is preferable to have four or more among them. The upper limit of the number of resin layers in the outer packaging material of this aspect is not particularly limited as long as the desired gas barrier property can be exhibited, but may be, for example, 8 or less. By having such a configuration, the outer packaging material of this aspect can have a portion that becomes a hard “core” inside the configuration of the outer packaging material. The outer packaging material is at least a heat-weldable film that is easily stretched by heat in a high-temperature environment. However, by having a hard “core” part inside the outer packaging material structure, the strength of the heat-weldable film is inorganic. It can be difficult to convey to the layer. Thereby, it becomes hard and is hard to extend also in a high temperature, high humidity environment, and the crack which generate | occur | produced in the inorganic layer contained in the 2nd film or the 3rd film by bending can be made hard to be extended in a high temperature, high humidity environment. Thereby, an increase in oxygen permeability under a high temperature and high humidity environment is suppressed, and good gas barrier performance can be exhibited for a long period of time in a high temperature and high humidity environment.

  Here, the resin layer in the outer packaging material of this aspect is, for example, the first resin base material of the first film, the second resin base material of the second film, the third resin base material of the third film, the protective film, and the like. Can be mentioned. Further, the resin layer excludes a heat-weldable film and an adhesive layer that adheres the layers of the layers constituting the outer packaging material. Especially, it is preferable that the resin layer in which at least the inorganic layer is directly arranged among the resin layers in the outer packaging material of this aspect, that is, the resin base material exhibits a predetermined indentation elastic modulus.

  Specifically, when the outer packaging material of this aspect has a five-layer configuration of a protective film, a first film, a second film, a third film, and a heat-weldable film, the protective film, the first film of the first film It is preferable that at least three of the first resin base material, the second resin base material of the second film, and the third resin base material of the third film have an indentation elastic modulus equal to or higher than the predetermined value described above. Preferably, the first resin base material of the film, the second resin base material of the second film, and the third resin base material of the third film have an indentation elastic modulus equal to or higher than the predetermined value described above, and all four More preferably, the indentation elastic modulus is equal to or greater than the predetermined value described above.

(II) Second Aspect The outer packaging material of the second aspect of the present disclosure is an outer packaging material for a vacuum heat insulating material having at least a first film, a film with an overcoat layer, and a heat-weldable film in this order. The first film is disposed on at least one surface side of the first resin base material and the first resin base material, and is at least a M-O-P bond (where M represents a metal atom, and O represents A metal oxide phosphoric acid layer having an oxygen atom and P represents a phosphorus atom. The film with an overcoat layer is disposed on at least one surface side of the resin substrate and the resin substrate. And an overcoat layer disposed on the surface of the inorganic layer opposite to the resin substrate. The overcoat layer contains a hydrophilic group-containing resin and constitutes the overcoat layer. In the carbon atom The ratio of the metal atoms to be performed is in the range of 0.1 or more and 2 or less.

  The outer packaging material of this aspect is demonstrated with reference to figures. FIG. 4 is a schematic cross-sectional view showing an example of the outer packaging material of this aspect. As illustrated in FIG. 4, the outer packaging material 10 </ b> B of this embodiment includes the film 1 with a metal oxide phosphate layer, the film 13 with an overcoat layer, and the film 4 that can be thermally welded in this order. The metal oxide phosphate layer-equipped film 1 includes a first resin base material 5 and a metal oxide phosphate layer 6 disposed on at least one surface side of the first resin base material 5. The film 13 with an overcoat layer is disposed on the surface of the resin substrate 14, the inorganic layer 8c disposed on at least one surface of the resin substrate 14, and the surface of the inorganic layer 8c opposite to the resin substrate 14. And an overcoat layer 15.

  In this aspect, similarly to the first aspect described above, by using a film with a metal oxide phosphoric acid layer having a feature of being less deteriorated when exposed to a high-temperature and high-humidity environment on the outside of the outer packaging material. The inner film is prevented from being deteriorated, and the outer packaging material as a whole maintains a high gas barrier property in a high temperature and high humidity environment. In this embodiment, the vacuum inside the vacuum heat insulating material formed using such an outer packaging material by using a film with an overcoat layer on the heat-weldable film side of the film with the metal oxide phosphate layer. The degree can be kept high. This is because the film with an overcoat layer can maintain its gas barrier property high even when it is exposed to water vapor to the extent that it penetrates the film with a metal oxide phosphate layer in a high-temperature and high-humidity environment. Because.

  The outer packaging material of this aspect has a metal oxide phosphate layer-attached film, an overcoat layer-attached film, and a heat-weldable film in this order. Hereinafter, each structure of the outer packaging material of this aspect is demonstrated.

1. Film with metal oxide phosphate layer (first film)
Since the film with a metal oxide phosphate layer in this embodiment can be the same as that described in the section of “(I) First embodiment, 1. Film with metal oxide phosphate layer” described above, The description here is omitted.

2. Film with overcoat layer The film with an overcoat layer in this embodiment is a resin substrate, an inorganic layer disposed on at least one surface of the resin substrate, and a surface of the inorganic layer opposite to the resin substrate. And an overcoat layer disposed thereon.

(1) Overcoat layer The overcoat layer in this aspect is arrange | positioned on the surface side opposite to the said resin substrate of the said inorganic layer, and contains hydrophilic group containing resin. The presence or absence of the hydrophilic group-containing resin can be determined by, for example, an infrared absorption spectrum. The ratio of metal atoms to carbon atoms (number of metal atoms / number of carbon atoms) in the atoms constituting the overcoat layer is in the range of 0.1 or more and 2 or less, and more preferably 0.5 or more, 1 It is preferably within a range of .9 or less, particularly within a range of 0.8 or more and 1.6 or less. If the ratio is less than the above range, the brittleness of the overcoat layer increases, and the water resistance and weather resistance of the resulting overcoat layer may be lowered. On the other hand, if the ratio exceeds the above range, the gas barrier properties of the obtained overcoat layer may be lowered.

  The overcoat layer having the above-described ratio is, for example, a content of the hydrophilic group-containing resin in the overcoat layer forming composition of 5 parts by mass or more and 500 parts by mass with respect to 100 parts by mass of the total amount of alkoxide described below. In a range of 20 parts by mass or less, in particular in a range of 20 parts by mass or more and 200 parts by mass or less. As an example of the composition for forming the overcoat layer, liquid B (mixed liquid composed of polyvinyl alcohol (PVA), isopropyl alcohol and ion-exchanged water), liquid B (tetraethoxysilane (TEOS), isopropyl alcohol) prepared in advance are used. , A hydrolyzate composed of hydrochloric acid and ion-exchanged water) is added so that PVA is in a specific ratio with respect to 100 parts by mass of TEOS, and is stirred to obtain a colorless and transparent overcoat layer composition. Can be mentioned.

  The method for measuring the ratio of metal atoms to carbon atoms in the overcoat layer is not particularly limited. For example, the measurement is performed by X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy (EDX) from the cross section of the outer packaging material, or the like. can do. Moreover, when measuring by the said X-ray photoelectron spectroscopy, you may etch and may evaluate the inside of an overcoat layer.

  Using the above-mentioned A liquid and B liquid, it was produced using an overcoat layer forming composition prepared such that PVA was within the range of 5 parts by mass or more and 500 parts by mass or less with respect to 100 parts by mass of TEOS. The ratio of metal atoms to carbon atoms in the overcoat layer is shown in Table 1 below. The atomic ratio was measured by X-ray photoelectron spectroscopy using ESCA 5600 (manufactured by ULVAC-PHI) as a measuring device. In Table 1, the ratio of silicon (Si) as a metal atom to carbon atom (C) is shown.

As such a layer containing a hydrophilic group-containing resin and having a ratio of metal atoms to carbon atoms in the atoms constituting the overcoat layer within a specific range, a general formula R ¹ _n M ² (OR ² ) _m (wherein, R ¹ and R ² represent an organic group having 1 to 8 carbon atoms, M ² represents a metal atom, n represents an integer of 0 or more, and m represents A layer containing a sol-gel compound containing at least one alkoxide represented by the formula (1) represents an integer of 1 or more, and n + m represents a valence of M ² and a hydrophilic group-containing resin. In particular, a layer containing the sol-gel compound as a main component is preferable. This is because the sol-gel compound has high adhesive strength at the interface, and the film-forming process can be performed at a relatively low temperature, so that deterioration of the resin substrate or the like due to heat can be suppressed.

The sol-gel compound is applied, for example, on the inorganic layer of the film with an overcoat layer, and is within a range of 20 ° C. or higher and 180 ° C. or lower and at a temperature not higher than the melting point of the resin substrate for 30 seconds or longer and 10 minutes. The overcoat layer can be formed so as to cover the surface of the inorganic layer opposite to the resin substrate by heat treatment. In addition, the sol-gel compound is applied twice or more on the inorganic layer, and is heat-treated at a temperature within a range of 20 ° C. or higher and 180 ° C. or lower and at a temperature not higher than the melting point of the resin substrate for 30 seconds or longer and 10 minutes or shorter. By doing so, two or more overcoat layers may be formed.
Hereinafter, the overcoat layer containing the sol-gel compound as a main component will be described.

(A) Metal oxide component of sol-gel compound As the alkoxide represented by the general formula R ¹ _n M ² (OR ² ) _m , at least one kind of a partial hydrolyzate of alkoxide and a hydrolyzed condensate of alkoxide is used. In addition, the partial hydrolyzate of the alkoxide is not limited to the one in which all of the alkoxy groups are hydrolyzed, but one in which one or more are hydrolyzed, and a mixture thereof. Furthermore, as the hydrolysis condensate, a dimer or more of a partially hydrolyzed alkoxide, specifically, a dimer or more and a hexamer or less may be used. Good.

In the general formula R ¹ _n M ² (OR ² ) _m , R ¹ may have a branched carbon number of 1 or more and 8 or less, preferably 1 or more and 5 or less, more preferably 1 or more. 4 or less alkyl groups, for example, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, sec-butyl group, t-butyl group, n-hexyl group , N-octyl group and the like.

In the above general formula R ¹ _n M ² (OR ² ) _m , R ² may have 1 to 8 carbon atoms which may have a branch, more preferably 1 or more, 5 or less, and particularly preferably 1 or more. 4 or less alkyl groups, for example, methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, sec-butyl group, and the like. When a plurality of (OR ² ) are present in the same molecule, (OR ² ) may be the same or different.

Examples of the metal atom represented by M ² in the general formula R ¹ _n M ² (OR ² ) _m include silicon, zirconium, titanium, aluminum, and the like. In this embodiment, the metal atom is preferably silicon. In this case, as an alkoxide that can be preferably used in this embodiment, when n = 0 in the general formula R ¹ _n M ² (OR ² ) _m , the general formula Si (ORa) ₄ (wherein Ra represents Represents an alkyl group having 1 to 5 carbon atoms. In the above, Ra includes a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and the like. Specific examples of such an alkoxysilane include tetramethoxysilane Si (OCH ₃ ) ₄ , tetraethoxysilane Si (OC ₂ H ₅ ) ₄ , tetrapropoxysilane Si (OC ₃ H ₇ ) ₄ , tetrabutoxysilane Si ( OC ₄ H ₉₎ can be exemplified ₄ like. Silicon may be classified as a semimetal, but in this specification, silicon is included in the metal.

When n is 1 or more, the general formula Rb _n Si (ORc) _4-m (wherein m represents an integer of 1, 2, 3; Rb and Rc are methyl, ethyl, Group, n-propyl group, n-butyl group, etc.) can be used. Examples of such an alkylalkoxysilane include methyltrimethoxysilane CH ₃ Si (OCH ₃ ) ₃ , methyltriethoxysilane CH ₃ Si (OC ₂ H ₅ ) ₃ , dimethyldimethoxysilane (CH ₃ ) ₂ Si (OCH). _{3) 2,} dimethyl diethoxy silane _{(CH 3) 2 Si (OC} 2 H 5) 2, may use other like. In this embodiment, the above alkoxysilane, alkylalkoxysilane, etc. may be used alone or in combination of two or more.

  In this embodiment, a polycondensation product of the above alkoxysilane can also be used. Specifically, for example, polytetramethoxysilane, polytetraethoxysilane, and the like can be used.

In this embodiment, zirconium alkoxide in which M ² is Zr can also be suitably used as the alkoxide represented by the general formula R ¹ _n M ² (OR ² ) _m . For example, tetramethoxy zirconium Zr (OCH _{3) 4,} tetraethoxy zirconium _{Zr (OC 2 H 5) 4} , tetraisopropoxy zirconium _{Zr (iso-OC 3 H 7} ) 4, tetra-n-butoxy zirconium Zr (OC ₄ H _{9) 4} , etc. can be exemplified.

Further, as the alkoxide represented by the general formula R ¹ _n M ² (OR ² ) _m , a titanium alkoxide in which M ² is Ti can be preferably used. For example, tetramethoxytitanium Ti (OCH ₃ ) ₄ , Tetraethoxytitanium Ti (OC ₂ H ₅ ) ₄ , tetraisopropoxytitanium Ti (iso-OC ₃ H ₇ ) ₄ , tetra nbutoxytitanium Ti (OC ₄ H ₉ ) ₄ , and the like.

As the alkoxide represented by the general formula R ¹ _n M ² (OR ² ) _m , an aluminum alkoxide in which M ² is Al can be used. For example, tetramethoxyaluminum Al (OCH ₃ ) ₄ , tetra ethoxy aluminum _{Al (OC 2 H 5) 4} , tetraisopropoxy aluminum _{Al (iso-OC 3 H 7} ) 4, tetra-n-butoxy aluminum _{Al (OC 4 H 9) 4} , may use other like.

  In this embodiment, the alkoxide may be used in combination of two or more. For example, when alkoxysilane and zirconium alkoxide are mixed and used, the toughness and heat resistance of the resulting overcoat layer can be improved, and a decrease in the retort resistance of the film during stretching can be avoided. At this time, the amount of zirconium alkoxide used is preferably in the range of 10 parts by mass or less with respect to 100 parts by mass of the alkoxysilane. When the amount exceeds 10 parts by mass, the overcoat layer to be formed is easily gelled, the brittleness of the film increases, and the overcoat layer tends to peel off when the inorganic layer is coated. It is not preferable.

  Moreover, when alkoxysilane and titanium alkoxide are mixed and used, the thermal conductivity of the obtained overcoat layer will become low, and heat resistance will improve remarkably. Under the present circumstances, it is preferable that the usage-amount of titanium alkoxide exists in the range of 5 mass parts or less with respect to 100 mass parts of said alkoxysilane. When the amount exceeds 5 parts by mass, the overcoat layer formed becomes brittle, and the overcoat layer may be easily peeled off when the inorganic layer is coated.

(B) Organic polymer component of sol-gel compound As the hydrophilic group-containing resin used in this embodiment, polyvinyl alcohol resin, ethylene / vinyl alcohol copolymer, acrylic resin, natural polymer methylcellulose, carboxymethylcellulose, cellulose Examples thereof include nanofibers and polysaccharides, and these may be used alone or in combination of two or more. In this embodiment, by using a hydrophilic group-containing resin, physical properties such as gas barrier properties, water resistance, weather resistance, and the like can be significantly improved. As described above, in the present specification, the “hydrophilic group” refers to an atomic group that forms a weak bond with a water molecule by electrostatic interaction or hydrogen bond, and has an affinity for water. For example, an atomic group containing a polar group or a dissociating group such as a hydroxy group (—OH), a carboxy group (—COOH), an amino group (—NH ₂ ), a carbonyl group (> CO), or a sulfo group (—SO ₃ H) Its properties are shown.

  When the polyvinyl alcohol resin and the ethylene / vinyl alcohol copolymer are used in combination, the blending ratio of each is polyvinyl alcohol resin: ethylene / vinyl alcohol copolymer = 10: 0. It is preferably in the range of 05 or more and 10: 6 or less.

  In the hydrophilic group-containing resin, as the polyvinyl alcohol-based resin, generally, a resin obtained by saponifying polyvinyl acetate can be used. The polyvinyl alcohol resin may be a partially saponified polyvinyl alcohol resin in which several tens of percent of acetate groups remain, or a completely saponified polyvinyl alcohol in which no acetate groups remain, or a modified polyvinyl alcohol resin in which OH groups have been modified. Resin may be used and is not particularly limited. Examples of such a polyvinyl alcohol resin include “RS-110 (degree of saponification = 99%, degree of polymerization = 1,000)” manufactured by Kuraray Co., Ltd., and “Kuraray Poval LM-20SO ( “Saponification degree = 40%, polymerization degree = 2,000)”, “GOHSENOL NM-14 (degree of saponification = 99%, polymerization degree = 1,400)” manufactured by Nippon Synthetic Chemical Industry Co., Ltd. Can do.

  As the ethylene / vinyl alcohol copolymer, a saponified product of a copolymer of ethylene and vinyl acetate, that is, a product obtained by saponifying an ethylene-vinyl acetate random copolymer can be used. For example, it is not particularly limited, and includes a partially saponified product in which several tens mol% of acetic acid groups remain to a complete saponified product in which only several mol% of acetic acid groups remain or no acetic acid groups remain. However, it is preferable to use a saponification degree that is preferably 80 mol% or more, more preferably 90 mol% or more, and still more preferably 95 mol% or more from the viewpoint of gas barrier properties. The content of repeating units derived from ethylene in the ethylene / vinyl alcohol copolymer (hereinafter also referred to as “ethylene content”) is usually in the range of 0 mol% or more and 50 mol% or less, particularly 20 mol%. As described above, it is preferably within the range of 45 mol% or less. Examples of such an ethylene / vinyl alcohol copolymer include “Eval EP-F101 (ethylene content; 32 mol%)” manufactured by Kuraray Co., Ltd., “Soarnol D2908 (ethylene content; 29 mol) manufactured by Nippon Synthetic Chemical Industry Co., Ltd.” %) "And the like.

(C) Others In preparing the raw material liquid for forming the overcoat layer containing the sol-gel compound as a main component, a silane coupling agent or the like may be added.

  As the silane coupling agent that can be suitably used in the present embodiment, known organic reactive group-containing organoalkoxysilanes can be widely used. For example, an organoalkoxysilane having an epoxy group is suitable. For example, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, or β- (3,4-epoxy). (Cyclohexyl) ethyltrimethoxysilane or the like can be used. Such silane coupling agents may be used alone or in combination of two or more. In addition, it is preferable that the usage-amount of a silane coupling agent exists in the range of 1 to 20 mass parts with respect to 100 mass parts of said alkoxysilanes. When the amount exceeds 20 parts by mass, the rigidity and brittleness of the overcoat layer to be formed increase, and the insulation and workability of the overcoat layer may be deteriorated.

  The sol-gel catalyst is a catalyst mainly used as a polycondensation catalyst, and a basic substance such as a tertiary amine that is substantially insoluble in water and soluble in an organic solvent is used. . For example, N, N-dimethylbenzylamine, tripropylamine, tributylamine, tripentylamine, etc. can be used. In this embodiment, N, N-dimethylbenzylamine is particularly suitable. The amount used is preferably in the range of 0.01 parts by mass or more and 1.0 parts by mass or less per 100 parts by mass of the total amount of alkoxide and silane coupling agent.

  The “acid” used in the preparation of the sol-gel compound is mainly used as a catalyst for hydrolysis of an alkoxide, a silane coupling agent or the like in the sol-gel method. For example, mineral acids such as sulfuric acid, hydrochloric acid and nitric acid, organic acids such as acetic acid and tartaric acid, and the like can be used. The amount of the acid used is preferably in the range of 0.001 mol or more and 0.05 mol or less with respect to the total molar amount of the alkoxide and the alkoxide content of the silane coupling agent (for example, silicate moiety).

  Furthermore, in the preparation of the sol-gel compound, the range of 0.1 mol or more and 100 mol or less, preferably 0.8 mol or more and 2 mol or less, with respect to 1 mol of the total molar amount of the alkoxide. You can use the proportion of water. When the amount of water exceeds 2 mol, the polymer obtained from the alkoxysilane and the metal alkoxide becomes spherical particles, and the spherical particles are three-dimensionally cross-linked to become a low-density, porous polymer, Such a porous polymer cannot improve the gas barrier properties of the overcoat layer. Moreover, when the amount of the water is less than 0.8 mol, the hydrolysis reaction may hardly proceed.

  Furthermore, as an organic solvent used in preparation of said sol-gel compound, methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, n-butanol, etc. can be used, for example. In addition, it is preferable that the said hydrophilic group containing resin is handled in the state melt | dissolved in the coating liquid containing the said alkoxide, a silane coupling agent, etc., and can be suitably selected from the said organic solvent. For example, when using a combination of a polyvinyl alcohol resin and an ethylene / vinyl alcohol copolymer, it is preferable to use n-butanol. An ethylene / vinyl alcohol copolymer solubilized in a solvent can also be used. For example, trade name “Soarnol” manufactured by Nippon Synthetic Chemical Industry Co., Ltd. can be preferably used. The amount of the organic solvent used is usually 30 parts by mass or more and 500 parts by mass or less with respect to 100 parts by mass of the total amount of the alkoxide, silane coupling agent, hydrophilic group-containing resin, acid and sol-gel method catalyst. It is preferable to be within the range.

(D) Method for forming overcoat layer containing sol-gel compound as main component In this embodiment, the overcoat layer containing the sol-gel compound as a main component can be manufactured by the following method.
First, an alkoxide such as alkoxysilane, a silane coupling agent, a hydrophilic group-containing resin, a sol-gel method catalyst, an acid, water, an organic solvent, and, if necessary, a metal alkoxide are mixed, and a raw material liquid is mixed. Prepare. By mixing, the polycondensation reaction starts and proceeds in the raw material liquid.

  Next, the raw material liquid is applied onto the inorganic layer by a conventional method and dried. By this drying step, polycondensation of the alkoxide such as alkoxysilane, metal alkoxide, silane coupling agent and hydrophilic group-containing resin further proceeds, and a coating film is formed. On the first coating film, the above coating operation may be further repeated to form a plurality of coating films composed of two or more.

  Next, the resin substrate on which the raw material liquid has been applied has a temperature within the range of 50 ° C. or higher and 300 ° C. or lower and a temperature not higher than the melting point of the resin substrate, preferably 70 ° C. or higher and 200 ° C. or lower. Heat treatment is performed for 05 minutes or more and 60 minutes or less. As a result, a film with an overcoat layer in which one or more overcoat layers of the raw material liquid are formed on the inorganic layer can be produced.

  An overcoat layer obtained by using an ethylene / vinyl alcohol copolymer alone or a mixed composition of a polyvinyl alcohol-based resin and an ethylene / vinyl alcohol copolymer is excellent in gas barrier properties after hydrothermal treatment. On the other hand, when an overcoat layer mainly composed of a polyvinyl alcohol-based resin is provided, if an overcoat layer containing an ethylene / vinyl alcohol copolymer is laminated on the overcoat layer, Gas barrier properties can be improved.

  Further, both or any of an overcoat layer mainly composed of an ethylene / vinyl alcohol copolymer and an overcoat layer mainly composed of a mixed composition of a polyvinyl alcohol-based resin and an ethylene / vinyl alcohol copolymer. Even if a plurality of these are laminated, it becomes an effective means for improving the gas barrier property.

(2) Inorganic layer The inorganic layer of the film with an overcoat layer in this embodiment is not particularly limited as long as it can exhibit a desired gas barrier property. As such an inorganic layer, the thing similar to what is demonstrated in the term of "(I) 1st aspect, 2. a film with an outer side inorganic layer, (1) inorganic layer" can be used. In this embodiment, a layer mainly composed of an inorganic compound is preferably used from the viewpoint of initial gas barrier properties and deterioration resistance, and more specifically, silicon oxide, aluminum oxide, magnesium oxide, Examples include layers mainly composed of titanium oxide, tin oxide, silicon zinc alloy oxide, indium alloy oxide, silicon nitride, aluminum nitride, titanium nitride, silicon oxynitride, and the like. The said inorganic compound may be used independently, and the said material may be mixed and used for arbitrary ratios.

  The thickness, formation method, gas barrier property and the like relating to the inorganic layer in this embodiment are the same as those described in the section “(I) First embodiment, 2. Film with outer inorganic layer, (1) Inorganic layer”. The description in is omitted.

(3) Resin substrate The resin substrate is not particularly limited as long as it can support the inorganic layer and the overcoat layer. Since such a resin substrate is the same as the description in the section of “(I) First aspect, 1. Film with metal oxide phosphate layer, (2) First resin base material”, description here. Is omitted.

  The resin substrate preferably has an indentation elastic modulus of 1.5 GPa or more, more preferably 2.0 GPa or more, and particularly preferably 2.5 GPa or more. The upper limit of the indentation elastic modulus is not particularly limited, but is preferably 6.0 GPa or less, and preferably 5.0 GPa or less. By setting the indentation elastic modulus of the resin substrate within the above range, the same effect as that obtained by defining the indentation elastic modulus of the first resin base material described in the above-mentioned section “(I) First aspect”. Can be played.

(4) Film with overcoat layer In the film with an overcoat layer, the positional relationship between the inorganic layer and the resin substrate is not particularly limited, and any of them may be disposed on the heat-weldable film side. . In this embodiment, in order to protect the inorganic layer and the overcoat layer from water vapor that has passed through the above-described film with the metal oxide phosphoric acid layer, the film in which the inorganic layer and the overcoat layer can be thermally welded than the resin substrate. It is preferable to arrange on the side.

  Moreover, the outer packaging material of this aspect may have a plurality of films with an overcoat layer as described above. This is because the gas barrier property of the outer packaging material can be improved. When the outer packaging material has a plurality of films with overcoat layers, the configuration of each film with overcoat layers may be the same or different.

3. Heat-weldable film The heat-weldable film in this embodiment is a layer that can be heat-welded, and is a part that comes into contact with the core material when the vacuum heat insulating material is formed using the outer packaging material. Moreover, it is a site | part which forms the heat welding surface which heat-welds the edge part of the outer packaging materials which oppose. Such a heat-weldable film is the same as the description in the section of “(I) First aspect, 4. Heat-weldable film”, and thus the description thereof is omitted here.

4). Protective film The outer packaging material of this aspect may have a protective film other than the film with a metal oxide phosphoric acid layer, the film with an overcoat layer, and the film that can be thermally welded. It is because each film used together as an outer packaging material such as a film with a metal oxide phosphate layer can be protected from damage and deterioration. About such a protective film, since it is the same as that of the description in the section of "(I) 1st aspect, 5. protective film", description here is abbreviate | omitted.

5. The outer packaging material for vacuum heat insulating material The other points regarding the outer packaging material of this aspect are the same as those described in the section of “(I) First aspect, 6. Outer packaging material for vacuum heat insulating material”. Omitted.

B. Next, the vacuum heat insulating material of the present disclosure will be described. The vacuum heat insulating material of the present disclosure is a vacuum heat insulating material having a core material and an outer packaging material for vacuum heat insulating material that encloses the core material, and the outer packaging material for vacuum heat insulating material described above is an outer packaging material for vacuum heat insulating material. It is characterized by being.

  About the vacuum heat insulating material of this indication, it can be set to be the same as that of what was already illustrated in FIG. According to the present disclosure, the vacuum insulation material can be maintained for a long period of time in a high-temperature and high-humidity environment because the vacuum insulation material is the above-described vacuum insulation material. Can do.

The vacuum heat insulating material of the present disclosure has at least a vacuum heat insulating material envelope and a core material.
Hereinafter, the vacuum heat insulating material of the present disclosure will be described for each configuration.

1. Outer packaging material for vacuum heat insulating material The outer packaging material for vacuum heat insulating material of the present disclosure encloses the core material. Moreover, the said outer packaging material for vacuum heat insulating materials is the above-mentioned outer packaging material for vacuum heat insulating materials of this indication. Such an outer packaging material for a vacuum heat insulating material can be the same as the contents described in the section of “A. Outer packaging material for a vacuum heat insulating material”, and thus description thereof is omitted here.
In addition, enclosing means sealing inside the bag formed using the said outer packaging material.

2. Core material The core material in this indication is enclosed with the above-mentioned outer packaging material for vacuum heat insulating materials.
The core material preferably has a low thermal conductivity. The core material is preferably a porous material having a porosity of 50% or more, particularly 90% or more.

As a material constituting the core material, powder, foam, fiber, or the like can be used.
The powder may be either inorganic or organic, and for example, dry silica, wet silica, agglomerated silica powder, conductive powder, calcium carbonate powder, perlite, clay, talc and the like can be used. Among these, a mixture of dry silica and conductive powder is advantageous when used in a temperature range in which an increase in internal pressure occurs because deterioration in heat insulation performance associated with an increase in internal pressure of the vacuum heat insulating material is small. Furthermore, when a substance having a small infrared absorptance such as titanium oxide, aluminum oxide or indium-doped tin oxide is added as a radiation suppressing material to the above-described material, the infrared absorptivity of the core material can be reduced.

  Examples of the foam include urethane foam, styrene foam, phenol foam, and the like. Among these, a foam that forms open cells is preferable.

  The fiber body may be inorganic fiber or organic fiber, but it is preferable to use inorganic fiber from the viewpoint of heat insulation performance. Examples of such inorganic fibers include glass fibers such as glass wool and glass fibers, alumina fibers, silica alumina fibers, silica fibers, ceramic fibers, and rock wool. These inorganic fibers are preferable in that they have low thermal conductivity and are easier to handle than powders.

  The core material may be the above-mentioned material alone or a composite material in which two or more materials are mixed.

3. Vacuum heat insulating material The vacuum heat insulating material of this indication seals the inside enclosed with the said outer packaging material for vacuum heat insulating materials under reduced pressure, and makes it a vacuum state. The degree of vacuum inside the vacuum heat insulating material is preferably 5 Pa or less. By setting the degree of vacuum inside the vacuum heat insulating material within the above range, heat conduction due to convection of air remaining inside can be reduced, and excellent heat insulation can be exhibited.

  The vacuum heat insulating material preferably has a low thermal conductivity. For example, the thermal conductivity (initial thermal conductivity) is preferably 15 mW / m · K or less, particularly 10 mW / m · K or less. It is preferable that there is especially 5 mW / m · K or less. This is because by setting the heat conductivity of the vacuum heat insulating material within the above range, the vacuum heat insulating material is less likely to conduct heat to the outside, and therefore, a high heat insulating effect can be achieved. In addition, the said heat conductivity can be made into the value measured by the heat flow meter method using the heat conductivity measuring apparatus according to JIS-A-1412-2. Examples of the thermal conductivity measuring device include a thermal conductivity measuring device Auto Lambda (product name HC-074, manufactured by Eihiro Seiki Co., Ltd.).

Specifically, the thermal conductivity is measured by a method in accordance with JIS A1412-2: 1999 (Measurement method of thermal resistance and thermal conductivity of thermal insulation material-Part 2: Heat flow meter method (HFM method)). It can be measured using a thermal conductivity measuring device. The measurement is performed under the following conditions so that both main surfaces of the vacuum heat insulating material, which is a measurement sample, are directed in the vertical direction. Before the measurement, it is preferable to measure in advance using a heat flow meter or the like whether the temperature of the measurement sample is equal to the measurement environment temperature. Under one condition, at least three samples are measured, and the average of the measured values is taken as the thermal conductivity value of the condition.
(Measurement conditions for thermal conductivity)
・ Measurement sample: width 29cm ± 0.5cm, length 30cm ± 0.5cm
・ Time required for steady state of test: 15 minutes or more ・ Type of standard plate: EPS
・ Hot surface temperature: 30 ℃
・ Cold surface temperature: 10 ℃
-Average temperature of measurement sample: 20 ° C

  The vacuum heat insulating material preferably has a high gas barrier property. This is because it is possible to prevent a decrease in the degree of vacuum due to intrusion of moisture, oxygen, and the like from the outside. Regarding the gas barrier property of the vacuum heat insulating material, the oxygen permeability and water vapor permeability described in the above section “A. Outer packaging material for vacuum heat insulating material, (I) First aspect, 6. Outer packaging material for vacuum heat insulating material” Since it is the same, description here is abbreviate | omitted.

4). Manufacturing method As a manufacturing method of the vacuum heat insulating material of this indication, a general method can be used. For example, the outer packaging material described above is prepared in advance, the two outer packaging materials are opposed to each other so that the respective heat-weldable films face each other, and the core material is disposed therebetween, and the core is formed by a bag making machine or the like. One end of the outer periphery of the material is an opening, and the end portions of the remaining three outer packaging materials are thermally welded to prepare a bag body formed of the two outer packaging materials and having the core material disposed therein. Next, the bag body is mounted on a vacuum sealing machine, and the opening is sealed in a state where the internal pressure of the bag body is reduced, whereby a vacuum heat insulating material in which the core material is sealed with the outer packaging material is obtained. can get.

  In addition, the above manufacturing method is such that one outer packaging material is opposed so that a heat-weldable film faces the inside, and the core material is arranged therebetween, and one of the outer circumferences of the core material is placed by a bag making machine or the like. By forming the opening and thermally welding the ends of the remaining two outer packaging materials, a bag body is prepared which is formed of one outer packaging material and in which the core material is arranged, and then The bag body is attached to a vacuum sealing machine, and the opening is sealed in a state in which the internal pressure of the bag body is reduced, thereby obtaining a vacuum heat insulating material in which the core material is sealed with the outer packaging material. May be.

5. Applications The vacuum heat insulating material of the present disclosure has a low thermal conductivity and is excellent in heat insulating performance and durability performance even in a high temperature and high humidity environment. Therefore, the said vacuum heat insulating material can be used for the site | part which has a heat source and generate | occur | produces heat | fever, or the site | part which becomes high temperature by being heated from the outside. Applications of the present disclosure include, for example, equipment described in “C. Article with Vacuum Insulation”, cooler box, transport container, hydrogen fuel tank, system bath, hot water tank, heat storage, residential wall, automobile, An airplane, a ship, a train, etc. are mentioned.

C. Next, an article with a vacuum heat insulating material of the present disclosure will be described. An article with a vacuum heat insulating material of the present disclosure is an article with a heat insulating region and an article with a vacuum heat insulating material provided with a vacuum heat insulating material, wherein the vacuum heat insulating material includes a core material and a vacuum heat insulating material that encloses the core material. The outer packaging material for a vacuum heat insulating material is the above-described outer packaging material for a vacuum heat insulating material.

  According to the present disclosure, the vacuum heat insulating material provided in the article is a vacuum heat insulating material using the outer packaging material described in the section “A. Outer packaging material for vacuum heat insulating material”, and is long in a high temperature and high humidity environment. Since the period heat insulation performance can be maintained, an article having good heat insulation performance can be obtained.

  Here, the heat insulating region is a region thermally insulated by a vacuum heat insulating material, for example, a region where heat is kept or cooled, a region surrounding a heat source or a cooling source, a region isolated from a heat source or a cooling source. It is. These areas may be spaces or objects.

  As articles, for example, electric devices such as refrigerators, freezers, heat insulators, and coolers, heat insulation containers, cold insulation containers, transport containers, containers, containers for storage containers, vehicles, aircraft, ships and other vehicles, houses, warehouses, etc. Examples include building materials such as buildings, wall materials, and flooring materials.

  Specific examples of the article with a vacuum heat insulating material of the present disclosure include a device having a heat source part or a heat retaining part inside the main body or inside, and a device with a vacuum heat insulating material provided with a vacuum heat insulating material.

  Here, the “heat source section” refers to a portion that generates heat in the device main body or inside the device when the device itself is driven, and refers to, for example, a power source or a motor. The “insulated part” refers to a part that does not have a heat source part in the apparatus main body or inside, but the apparatus is heated by receiving heat from an external heat source.

  According to the present disclosure, the vacuum heat insulating material is the above-described vacuum heat insulating material, and the heat insulating performance can be maintained for a long time even in a high-temperature and high-humidity environment. Insulates heat from the heat source part to prevent the temperature of the entire apparatus from becoming high, while in an apparatus having a heat insulation part, the temperature state of the heat insulation part can be maintained by the vacuum heat insulating material. it can. Thereby, it can be set as the apparatus which has the high energy saving characteristic which suppressed power consumption.

  About the vacuum heat insulating material in this indication, since it is the same as that of the contents explained by the above-mentioned item of "B. Vacuum heat insulating material", explanation here is omitted.

  The device in the present disclosure includes a main body or a heat source section or a heat retaining section inside the main body. Examples of devices in the present disclosure include natural refrigerant heat pump water heaters (registered trademark “Ecocute”), refrigerators, vending machines, rice cookers, pots, microwave ovens, commercial ovens, IH cooking heaters, electrical appliances such as OA devices, Examples include automobiles, residential walls, and shipping containers. Among them, in the present disclosure, the above devices are natural refrigerant heat pump water heaters, commercial ovens, microwave ovens, automobiles, residential walls, and containers for transportation, and the vacuum heat insulating material of the present disclosure described above may be used for these devices. preferable.

  As an aspect of mounting the vacuum heat insulating material on a device, a vacuum heat insulating material may be directly attached to a heat source portion or a heat retaining portion of the device, and a vacuum heat insulating material between the heat retaining portion and the heat source portion or an external heat source. It may be mounted so as to sandwich it.

  In addition, this indication is not limited to the said embodiment. The above-described embodiment is an exemplification, and the present invention has the same configuration as the technical idea described in the claims of the present disclosure and has the same function and effect regardless of the present embodiment. It is included in the technical scope of the disclosure.

  Hereinafter, the present disclosure will be described more specifically with reference to examples and comparative examples. In addition, “/” in the layer structure of the outer packaging material of the example and the comparative example indicates a lamination interface. In addition, “A / B / C” in the above layer structure indicates that A, B, and C are laminated in this order from the first film of the outer packaging material toward the heat-weldable film.

[Example 1]
(Preparation of adhesive)
Two-component curing by mixing a main component mainly composed of polyester, a curing agent containing an aliphatic polyisocyanate, and ethyl acetate such that the weight ratio is main agent: curing agent: ethyl acetate = 10: 1: 14. A mold adhesive was prepared.

(Preparation of outer packaging material for vacuum insulation)
Film with metal oxide phosphate layer (first resin substrate / metal oxide phosphate layer) / film with outer inorganic layer (second resin substrate / inorganic layer) / film with inner inorganic layer (inorganic layer / third Resin substrate) / Outer packaging material having a layer structure of heat-weldable film was prepared. As the film with a metal oxide phosphate layer, a polyethylene terephthalate (PET) film (Kuraray Co., Ltd., Clarista CF) having a metal oxide phosphate layer on one side is used as a film with an outer inorganic layer, A PET film (VM-PET1519, manufactured by Toray Film Processing Co., Ltd.) having an aluminum vapor deposition layer with a thickness of 65 nm on the surface side is used as a film with an inner inorganic layer, and has an aluminum vapor deposition layer with a thickness of 55 nm on one surface side, and a thickness of 15 μm. An unstretched polypropylene film (manufactured by Mitsui Chemicals Tosero Co., Ltd., SC) was used as a heat-weldable film of an ethylene-vinyl alcohol copolymer (EVOH) film (manufactured by Kuraray Co., Ltd., TMXL). In each of the above layers, the adhesive prepared at the above-mentioned blending ratio was laminated on the surface of the lower layer by a dry laminating method so that the coating amount was 3.5 g / m ² .

  That is, in Example 1, the first film (PET film / metal oxide phosphate layer) / second film (PET film / aluminum vapor deposition layer) / third film (aluminum vapor deposition layer / EVOH film) / heat-weldable film An outer packaging material having a layer structure laminated in the order of (CPP film) was obtained.

[Example 2]
An outer packaging material in the same manner as in Example 1 except that an EVOH film (VMXL, manufactured by Kuraray Co., Ltd.) having a thickness of 12 μm and having an aluminum vapor deposition layer having a thickness of 40 nm on one side is used as the film with an inner inorganic layer. Got.

  That is, in Example 2, the first film (PET film / metal oxide phosphate layer) / second film (PET film / aluminum vapor deposition layer) / third film (aluminum vapor deposition layer / EVOH film) / heat-weldable film An outer packaging material having a layer structure laminated in the order of (CPP film) was obtained.

[Example 3]
As in Example 2, except that an unstretched linear short-chain branched polyethylene film (product name: TUX-HCE, manufactured by Mitsui Chemicals, Inc.) having a thickness of 50 μm was used as the heat-weldable film. The material was obtained.

  That is, in Example 3, the first film (PET film / metal oxide phosphate layer) / second film (PET film / aluminum vapor deposition layer) / third film (aluminum vapor deposition layer / EVOH film) / heat-weldable film An outer packaging material having a layer structure laminated in the order of (LLDPE film) was obtained.

[Example 4]
A film with a metal oxide phosphate layer is used as the first film, and a PET film having a thickness of 12 μm having a SiO ₂ vapor deposition layer having a thickness of 20 nm on one side as the second film and the third film (manufactured by Mitsubishi Plastics, Inc. (Tech Barrier LX) Using an SiO ₂ vapor-deposited layer on the SiO ₂ vapor-deposited layer, as a heat-weldable film, an unstretched polypropylene film having a thickness of 50 μm (manufactured by Mitsui Chemicals, Inc., SC) is used. An outer packaging material was prepared in the same manner as in Example 1.
As the film with the metal oxide phosphate layer of the first film, a polyethylene terephthalate (PET) film (Kuraray Co., Ltd., Clarista CF) having a metal oxide phosphate layer on one side was used. The overcoat layer in the second film and the third film is described in the section of “A. Outer packaging material for vacuum heat insulating material, (II) second embodiment, 2. film with overcoat layer, (1) overcoat layer”. The overcoat layer was prepared such that the content of the hydrophilic group-containing resin in the overcoat layer-forming composition using the liquid A and liquid B was 50 parts by mass with respect to 100 parts by mass of the total amount of alkoxide. Using the layer forming composition, the overcoat layer forming composition was applied on the SiO ₂ vapor deposition layer and dried. In addition, the overcoat layer formed with the said composition for overcoat layer formation is made into a PVA-TEOS layer. The same shall apply hereinafter.

That is, in Example 4, the first film (PET film / metal oxide phosphate layer) / second film (PET film / SiO ₂ vapor deposition layer / PVA-TEOS layer) / third film (PVA-TEOS layer / SiO _2). An outer packaging material having a layer structure laminated in the order of vapor deposition layer / PET film) / heat-weldable film (CPP film) was obtained.

  Table 2 shows the layer structure of each outer packaging material of Examples 1 to 4. In the column showing the configuration of each film of the first film to the third film in Table 2, the layer described in the right column is a layer on the heat-weldable film side in the layer configuration of the outer packaging material.

[Example 5]
(Preparation of outer packaging material for vacuum insulation)
Film with metal oxide phosphoric acid layer (first resin substrate / metal oxide phosphoric acid layer) / film with overcoat layer (resin substrate / inorganic layer / overcoat layer) / having heat-bondable film An outer packaging material was prepared. The same thing as the said Example 1 was used for the said film with a metal oxide phosphate layer and the film which can be heat-seal | fused. As the film with an overcoat layer, a film having a silica vapor deposition layer on one surface side of the PET film and having an overcoat layer on the surface side opposite to the PET film of the silica vapor deposition layer was used. For each of the above layers, an adhesive prepared at the same blending ratio as in Example 1 was laminated on the surface of the lower layer by a dry laminating method so that the coating amount was 3.5 g / m ² . The overcoat layer is a liquid A described in the section of “A. Outer packaging material for vacuum heat insulating material, (II) second embodiment, 2. film with overcoat layer, (1) overcoat layer”. And the composition for forming an overcoat layer prepared so that the content of the hydrophilic group-containing resin in the composition for forming an overcoat layer using liquid B is 50 parts by mass with respect to 100 parts by mass of the total amount of alkoxide. It was produced using. The same applies to the overcoat layers in the following examples and comparative examples.

  That is, in Example 5, the first film (PET film / metal oxide phosphate layer) / film with overcoat layer (PET film / silica vapor deposition layer / PVA-TEOS layer) / heat-weldable film (CPP film) An outer packaging material having a layer structure laminated in order was obtained.

[Example 6]
As the film with an overcoat layer, except that a film having an aluminum deposited layer on one side of the PET film and having an overcoat layer on the side opposite to the PET film of the aluminum deposited layer was used. An outer packaging material was obtained in the same manner as in Example 5.

  That is, in Example 6, the first film (PET film / metal oxide phosphate layer) / film with overcoat layer (PET film / aluminum deposition layer / PVA-TEOS layer) / heat-weldable film (CPP film) An outer packaging material having a layer structure laminated in order was obtained.

  Table 3 shows the layer structure of each outer packaging material of Examples 5-6. In the column which shows the structure of each film of the 1st film in Table 3, and the film with an overcoat layer, the layer as described in the right column is a layer used as the film side which can be heat-welded in the layer structure of an outer packaging material.

[Comparative Example 1]
Instead of a film with a metal oxide phosphate layer, a PET film (VM-PET1519, manufactured by Toray Film Processing Co., Ltd.) having an aluminum vapor deposition layer with a thickness of 65 nm on one side is the most outer layer (from a film that can be thermally welded). An outer packaging material was obtained in the same manner as in Example 1 except that it was used as a separate layer.

  That is, in Comparative Example 1, the first film (PET film / aluminum vapor deposition layer) / second film (PET film / aluminum vapor deposition layer) / third film (metal aluminum vapor deposition layer / EVOH film) / heat-weldable film (CPP) An outer packaging material having a layer configuration laminated in the order of (film) was obtained.

[Comparative Example 2]
Instead of a film with a metal oxide phosphoric acid layer, an outermost layer is a film having a silica vapor deposition layer on one side of a nylon film and an overcoat layer on the opposite side of the silica vapor deposition layer from the nylon film. Example 1 except that a polyethylene terephthalate (PET) film (manufactured by Kuraray Co., Ltd., Clarista CF) having a metal oxide phosphate layer on one side is used instead of a film with an outer inorganic layer. An outer packaging material was obtained in the same manner.

  That is, in Comparative Example 2, the first film (nylon film / silica vapor deposition layer / PVA-TEOS coat layer) / second film (PET film / metal oxide phosphate layer) / third film (metal aluminum vapor deposition layer / EVOH film) ) / Outer packaging material having a layer structure laminated in the order of heat-weldable film (CPP film).

[Comparative Example 3]
Comparative example, except that a film laminated in the order of overcoat layer / aluminum oxide vapor deposition layer / overcoat layer / aluminum oxide vapor deposition layer / PET film was used as the outermost layer from the inside (heat-weldable film side) In the same manner as in Example 2, an outer packaging material was obtained.

  That is, in Comparative Example 3, the first film (PET film / alumina deposited layer / PVA-TEOS coat layer) / second film (PET film / metal oxide phosphate layer) / third film (metal aluminum deposited layer / EVOH film) ) / Outer packaging material having a layer structure laminated in the order of heat-weldable film (CPP film).

[Comparative Example 4]
As an inner inorganic layer-attached film (third film), a 15 μm-thick ethylene-vinyl alcohol copolymer (EVOH) film (Kuraray Co., Ltd., TMXL) having a 55 nm thick aluminum vapor deposition layer on one surface side is used. An outer packaging material was obtained in the same manner as in Comparative Example 2 except that a polyethylene terephthalate (PET) film (Kuraray Co., Ltd., Clarista CF) having a metal oxide phosphate layer on one side was used.

  That is, in Comparative Example 4, the first film (nylon film / silica vapor deposition layer / PVA-TEOS coat layer) / second film (PET film / metal oxide phosphate layer) / third film (metal oxide phosphate layer / An outer packaging material having a layer structure laminated in the order of PET film) / heat-weldable film (CPP film) was obtained.

[Comparative Example 5]
As a film with an outer inorganic layer (second film), instead of a polyethylene terephthalate (PET) film (Kuraray Co., Ltd., Clarista CF) having a metal oxide phosphate layer on one side, one side of the PET film Using a film having a silica vapor deposition layer on the side and an overcoat layer on the surface opposite to the PET film of the silica vapor deposition layer, a film with an inner inorganic layer (third film) has a thickness on one surface side. Instead of a 15 μm-thick ethylene-vinyl alcohol copolymer (EVOH) film (manufactured by Kuraray Co., Ltd., TMXL) having a 55 nm aluminum vapor-deposited layer, it has a silica vapor-deposited layer on one side of the PET film, and Except for using a film having an overcoat layer on the side opposite to the PET film of the silica vapor deposition layer, To obtain an external packaging material in the same manner as in Comparative Examples 2.

  That is, in Comparative Example 5, the first film (nylon film / silica vapor deposition layer / PVA-TEOS coat layer) / second film (PET film / silica vapor deposition layer / PVA-TEOS coat layer) / third film (PVA-TEOS coat) An outer packaging material having a layer structure laminated in the order of layer / silica vapor deposition layer / PET film) / heat-weldable film (CPP film) was obtained.

  About Examples 1-5 and Comparative Examples 1-5, the presence or absence of a metal oxide phosphate layer, the position of the metal oxide phosphate layer, the number of resin layers (resin base material, resin substrate) excluding heat-weldable films Table 4 shows.

[Evaluation]
1. Measurement of indentation elastic modulus For each of the outer packaging materials of Examples 1 to 4 and Comparative Examples 1 to 5, the first resin substrate of the first film, the second resin substrate of the second film, and the third resin of the third film The indentation elastic modulus of the base material and the heat-welded layer was measured. Moreover, about each outer packaging material of Examples 5-6, the indentation elasticity modulus of the 1st resin base material of a 1st film and the resin substrate of a film with an overcoat layer was measured, respectively.
The indentation elastic modulus is a very small load in which a sample of a desired size is cut out from the outer packaging material, and a Vickers indenter (a diamond indenter having a regular square pyramid with a facing angle of 136 °) is attached to the layer to be measured on its cross section or surface. It measured by the method based on ISO14577: 2015 using the hardness tester (Picodenter HM500, Fischer Instruments company make). Measurement is performed in an atmosphere of a temperature of 23 ° C. ± 2 ° C. and a humidity of 60% RH ± 5% RH under the conditions of an indentation speed of 0.1 μm / second, an indentation depth of 2 μm, a holding time of 5 seconds, and an extraction speed of 0.1 μm / second. I went there. When measuring the cross section of the sample of the outer packaging material, the outer periphery of the sample was fixed with a cured resin adhesive, and the exposed sample was measured by cutting the fixed sample in the thickness direction with a diamond knife. Moreover, when measuring the surface of the sample of the outer packaging material, the surface opposite to the surface to be measured was fixed to a flat glass plate having a thickness of 1.1 mm with a cured resin adhesive, and the surface was measured. The thickness of each resin layer at the time of calculating the indentation elastic index was measured by measuring the cut cross section with an optical microscope. Under one condition, in one sample cut out from each outer packaging material, measurement was performed at at least five different points with respect to the layer to be measured, and the average of those measured values was used as the value of the indentation elastic modulus of the condition. The results are shown in Table 4.

2. Measurement of initial oxygen permeability With respect to the outer packaging materials obtained in the above examples and comparative examples before the bending treatment, the initial oxygen permeability was measured under conditions of a carrier gas and a test gas at a temperature of 70 ° C. and a humidity of 80% RH. did. The measurement of oxygen permeability in the above environment is JIS K7126-2: 2006 (Plastics-Film and Sheet-Gas Permeability Test Method-Part 2: Isobaric Method, Appendix A: Oxygen Gas Permeability by Electrolytic Sensor Method With reference to the test method), Oxtran (OXTRAN 2/20, manufactured by MOCON, an American company) is used as an oxygen transmission rate measuring device under conditions of a carrier gas and a test gas at a temperature of 70 ° C. and a humidity of 80% RH. It was performed using. In the above measurement, the outermost surface facing in the thickness direction of the outer packaging material was attached to the apparatus so that the outermost surface opposite to the heat-weldable film was in contact with oxygen gas, and the permeation area was about 50 cm ² (permeation region). : 8 cm diameter circle). After supplying nitrogen gas containing at least about 5% hydrogen as a carrier gas at a flow rate of 10 cc / min for 60 minutes or more and purging, at least 99.5% of dry oxygen is flowed into the apparatus as a test gas, and flow begins. The measurement was started after securing 12 hours as the time from the start to the equilibrium state. Under one condition, three samples were measured, and the average of the measured values was used as the oxygen permeability value for that condition. The results are shown in Table 5.

3. Measurement of oxygen permeability after bending treatment About the outer packaging material obtained in each of the above examples and comparative examples, after performing bending treatment three times by a gelbo flex tester, the state of the carrier gas and the test gas was 23 ° C, Under conditions of humidity 60% RH, oxygen permeability was measured and evaluated with a measuring instrument (model name, OX-TRAN) manufactured by MOCON, USA. Further, instead of the temperature and humidity conditions, the oxygen permeability was similarly measured and evaluated under the conditions that the state of the carrier gas and the test gas was a temperature of 70 ° C. and a humidity of 80% RH. The bending process was performed according to the following method. Further, the oxygen permeability under each condition was performed according to the operation described in “2. Measurement of initial oxygen permeability”. Table 5 shows the measurement results.

(Bending treatment)
In accordance with ASTM F392, a rectangular test piece having a width of 210 mm × length of 297 mm (A4 size) was cut out from each outer packaging material obtained in each of the above Examples and Comparative Examples, and Gelboflex tester (manufactured by Tester Sangyo Co., Ltd.). Using the model name: BE1006), the test piece was subjected to refraction treatment. In the bending process, both short sides of the test piece are attached to the gripping tool of the gelboflex tester, and the test piece is shortened by 3.5 inches while twisting so that the maximum twist angle is 440 °. The test piece was further shrunk by 2.5 inches without being twisted, and then the test piece was returned to the initial state in the reverse process as one cycle, and three cycles were performed for each test piece.

4). Deterioration rate of oxygen permeability due to bending treatment For the outer packaging materials obtained in each of the above examples and comparative examples, the initial oxygen permeability under the conditions of a carrier gas and a test gas at a temperature of 70 ° C. and a humidity of 80% RH, The deterioration rate was calculated according to the following formula (1) from the oxygen permeability after bending under the conditions of the carrier gas and the test gas at a temperature of 70 ° C. and a humidity of 80% RH. Table 5 shows the measurement results.
Deterioration rate (%) = [Oxygen permeability after bending treatment under conditions of temperature 70 ° C. and humidity 80% RH] / [Initial oxygen permeability under conditions of temperature 70 ° C. and humidity 80% RH] × 100 ( 1)

5. Measurement of Initial Water Vapor Permeability The outer packaging materials obtained in each of the examples and the comparative examples are based on JIS K7129: 2008 (Appendix B: Infrared sensor method, the same shall apply hereinafter), temperature 40 ° C., relative humidity. The initial water vapor permeability was measured under the condition of a difference of 90% RH. Measurement is carried out using a water vapor transmission rate measuring device (DELTAPERM manufactured by Technolox in the UK), and on the outermost surface facing in the thickness direction (stacking direction) of the outer packaging material, on the side opposite to the thermally weldable film that is one outermost layer The outermost surface layer located on the upper side is on the high humidity side (water vapor supply side), and is mounted between the upper chamber and the lower chamber of the apparatus, and the permeation area is about 50 cm ² (permeation area: circular with a diameter of 8 cm). As described above, the measurement was performed under the temperature and humidity conditions described above. Three samples were measured under one condition per outer packaging material, and the average of the measured values was taken as the value of the initial water vapor transmission rate under that condition of the outer packaging material. Table 5 shows the measurement results.

6). Measurement of water vapor permeability after storage at high temperature and high humidity About the outer packaging material obtained in each of the above examples and comparative examples, the water vapor permeability after storage for 1000 hours in an atmosphere at a temperature of 70 ° C. and a humidity of 90% RH was measured according to JIS K7129. : According to 2008 (Appendix B: Infrared sensor method, the same shall apply hereinafter), measurement was performed under conditions of a temperature of 40 ° C. and a relative humidity difference of 90% RH. First, prepare two rectangular sections each having a width of 21.0 cm and a length of 29.7 cm from each outer packaging material, and stack them so that the respective heat-weldable films face each other. The end portion (region having a width of 10 mm at a position 1 cm from the outer edge of the outer packaging material) was bonded by thermal welding at a heating temperature of 170 ° C. in an atmospheric pressure to obtain a test piece. The test piece was in a state in which nothing was contained inside and the pressure was not reduced. This test piece was stored in an atmosphere at a temperature of 70 ° C. and a humidity of 90% RH for 1000 hours, and the non-heat-welded region of the test piece after storage was cut out in a size of 9 cm wide × 9 cm long. The water vapor permeability of the outer packaging material was measured by the method and conditions described in the section “5. Measurement of initial water vapor permeability”. Three samples were measured under one condition per outer packaging material, and the average of the measured values was taken as the value of water vapor permeability after high-temperature and high-humidity storage of the outer packaging material under that condition. Table 5 shows the measurement results.

7). Deterioration rate of water vapor permeability before and after high-temperature and high-humidity storage For the outer packaging materials obtained in the above examples and comparative examples, the initial water vapor permeability and the temperature after storage for 1000 hours in an atmosphere at a temperature of 70 ° C. and a humidity of 90% RH From the water vapor transmission rate, the deterioration rate was calculated according to the following formula (2). Table 5 shows the measurement results.
Degradation rate (%) = [water vapor permeability after storage for 500 hours in an atmosphere of temperature 70 ° C. and humidity 90% RH] / [initial water vapor permeability] × 100 (2)

8). Measurement of thermal conductivity over time of vacuum heat insulating material Two outer packaging materials obtained in each of the above examples and comparative examples were stacked, and a bag body in which only one direction was opened by heat-sealing three rectangular directions was created. A glass wool of 290 mm × 300 mm × 30 mm was used as a core material, and after drying, 10 g of calcium oxide was stored in the bag body as the core material and a desiccant, and the inside of the bag body was evacuated. Then, the opening part of the said bag body was sealed by heat sealing, and the vacuum heat insulating material was obtained. The ultimate pressure was 0.05 Pa. The obtained vacuum heat insulating material was stored in an atmosphere of a temperature of 70 ° C. and a humidity of 90% RH for 500 hours, and then the thermal conductivity was measured. The thermal conductivity was measured by a heat flow meter method using a thermal conductivity measuring device Auto Lambda (HC-074, manufactured by Eihiro Seiki Co.) according to JIS A1412-2: 1999. The measurement was performed according to the details of the measurement method described in the above-mentioned section “B. Vacuum heat insulating material 3. Vacuum heat insulating material”. Table 5 below shows the measurement results of thermal conductivity after storage for 500 hours in an atmosphere at a temperature of 70 ° C. and a humidity of 90% RH.

(Discussion)
The outer packaging materials of Examples 1 to 4 had lower water vapor permeability and its deterioration rate after long-term storage in a high temperature and high humidity environment than the outer packaging materials of Comparative Examples 1 to 5. This is presumed to be due to the fact that the film outer packaging material with a metal oxide phosphate layer is located on the outermost side of the outer packaging material. In particular, the outer packaging material of Example 1 and the outer packaging material of Comparative Example 3 differ only in whether the film with the metal oxide phosphate layer is used as the first film or the second film in the layer configuration. Since the water vapor permeability after high-temperature and high-humidity storage and its deterioration rate differ greatly, the outer packaging after high-temperature and high-humidity storage can be obtained by placing the film outer packaging material with metal oxide phosphate layer on the outermost side of the outer packaging material. It was confirmed that the water vapor permeability of the material and its deterioration rate can be lowered.

  Since the outer packaging materials of Examples 1 to 4 were low in water vapor permeability after high-temperature and high-humidity storage and the deterioration rate thereof as compared with the outer packaging materials of Comparative Examples 1 to 5, each outer packaging of Examples 1 to 4 The heat conductivity of the vacuum heat insulating material formed using the material after storage for 500 hours in an atmosphere at a temperature of 70 ° C. and a humidity of 90% RH is the temperature of the vacuum heat insulating material using the outer packaging material of Comparative Examples 1 to 5. It was lower than the thermal conductivity after storage for 500 hours in an atmosphere of 70 ° C. and humidity 90% RH.

  The outer packaging material of Example 4 has a deterioration rate of oxygen permeability after bending treatment under the conditions of the carrier gas and the test gas at a temperature of 70 ° C. and a humidity of 80% RH, as compared with the outer packaging materials of Examples 1-3. It showed a low trend. This seems to be because the outer packaging material of Example 4 has more resin base material having a larger indentation elastic modulus than the outer packaging materials of Examples 1 to 3. In other words, since the outer packaging material has many resin base materials having a large indentation elastic modulus, even when cracks occur in the inorganic layer due to bending, the outer packaging material becomes hard and difficult to stretch in a high-temperature and high-humidity environment. It is estimated that expansion is suppressed and deterioration of oxygen permeability is suppressed.

  The outer packaging materials of Examples 5 to 6 had lower water vapor permeability and deterioration rate after high-temperature and high-humidity storage than the outer packaging materials of Comparative Examples 1 to 5. This is because the outer packaging material obtained in Examples 5 to 6 has a film with a metal oxide phosphate layer on the outermost side, and has a film with an overcoat layer. It is presumed that the water vapor barrier property of the film with an overcoat layer was exhibited despite the fact that the number of films having a gas barrier property was smaller than that of the outer packaging material.

(Summary)
In the outer packaging material, the vacuum heat insulating material formed using the outer packaging material obtained in Examples 1 to 6, in which the film with the metal oxide phosphoric acid layer is disposed outside the other film having gas barrier properties, It can be seen that extremely low thermal conductivity is maintained even after being stored for 500 hours in a high temperature and high humidity environment. On the other hand, even if it is the outer packaging material which has the same layer structure as the comparative examples 1 and 5 which do not have a film with a metal oxide phosphoric acid layer, and said each Example, it is metal rather than the other film which has gas barrier property. It turns out that the vacuum heat insulating material formed using the outer packaging material obtained by Comparative Examples 2-4 by which the film with an oxide phosphoric acid layer is arrange | positioned inside has high thermal conductivity with time. From these results, by disposing a film with a metal oxide phosphoric acid layer on the outside of other films having gas barrier properties, deterioration of the other films having gas barrier properties can be suppressed, and high gas barrier properties can be maintained. I guess that.

  In addition, it can be seen that the outer packaging materials of Examples 1 to 3 and Comparative Examples 1 to 3 in which the EVOH base material is used inside the outer packaging material have low oxygen permeability even after the bending test. Each layer that contributes to gas barrier properties such as an inorganic layer is presumed to have been deteriorated to some extent by the above bending test, but nonetheless, each of the outer packaging materials maintains a low oxygen permeability, and the base material It is presumed that EVOH used as the above contributes to the maintenance of oxygen permeability.

1 ... 1st film (film with metal oxide phosphate layer)
2 ... 2nd film (film with outer inorganic layer)
3 ... 3rd film (film with inner inorganic layer)
DESCRIPTION OF SYMBOLS 4 ... Film which can be heat-welded 5 ... 1st resin base material 6 ... Metal oxide phosphate layer 7 ... 2nd resin base material 8a, 8b, 8c ... Inorganic layer 9 ... 3rd resin base material 10, 10A, 10B ... Outer packaging material for vacuum heat insulating material 11 ... Core material 13 ... Film with overcoat layer 14 ... Resin substrate 15 ... Overcoat layer 20 ... Vacuum heat insulating material

Claims (7)

It is an outer packaging material for a vacuum heat insulating material having at least a first film, a second film, a third film, and a heat-weldable film in this order,
The first film is disposed on at least one surface side of the first resin base material and the first resin base material, and at least a M-O-P bond (where M represents a metal atom, and O represents oxygen) A metal oxide phosphoric acid layer having an atom and P is a phosphorus atom)
The second film has a second resin base material and an inorganic layer arranged on at least one surface side of the second resin base material,
The said 3rd film has a 3rd resin base material and the inorganic layer arrange | positioned at the at least one surface side of the said 3rd resin base material, The packaging material for vacuum heat insulating materials characterized by the above-mentioned. The third resin substrate contains a hydrophilic group-containing resin;
The outer packaging material for a vacuum heat insulating material according to claim 1, wherein the third resin base material is disposed on the heat-weldable film side of the inorganic layer of the third film. An outer packaging material for a vacuum heat insulating material having at least a first film, a film with an overcoat layer, and a heat-weldable film in this order,
The first film is disposed on at least one surface side of the first resin base material and the first resin base material, and at least a M-O-P bond (where M represents a metal atom, and O represents oxygen) A metal oxide phosphoric acid layer having an atom and P is a phosphorus atom)
The film with an overcoat layer includes a resin substrate, an inorganic layer disposed on at least one surface of the resin substrate, and an overcoat layer disposed on the surface of the inorganic layer opposite to the resin substrate. Have
The overcoat layer includes a hydrophilic group-containing resin,
An outer packaging material for a vacuum heat insulating material, wherein a ratio of a metal atom to a carbon atom in atoms constituting the overcoat layer is in a range of 0.1 or more and 2 or less. A vacuum heat insulating material having a core material and a vacuum heat insulating material encapsulating the core material,
The outer packaging material for a vacuum heat insulating material has at least a first film, a second film, a third film, and a heat-weldable film in this order,
The first film is disposed on at least one surface side of the first resin base material and the first resin base material, and at least a M-O-P bond (where M represents a metal atom, and O represents oxygen) A metal oxide phosphoric acid layer having an atom and P is a phosphorus atom)
The second film has a second resin base material and an inorganic layer arranged on at least one surface side of the second resin base material,
The said 3rd film has a 3rd resin base material and the inorganic layer arrange | positioned at the at least one surface side of the said 3rd resin base material, The vacuum heat insulating material characterized by the above-mentioned. A vacuum heat insulating material having a core material and a vacuum heat insulating material encapsulating the core material,
The outer packaging material for vacuum heat insulating material has at least a first film, a film with an overcoat layer, and a heat-weldable film in this order,
The first film is disposed on at least one surface side of the first resin base material and the first resin base material, and at least a M-O-P bond (where M represents a metal atom, and O represents oxygen) A metal oxide phosphoric acid layer having an atom and P is a phosphorus atom)
The film with an overcoat layer includes a resin substrate, an inorganic layer disposed on at least one surface of the resin substrate, and an overcoat layer disposed on the surface of the inorganic layer opposite to the resin substrate. Have
The overcoat layer includes a hydrophilic group-containing resin,
A vacuum heat insulating material, wherein a ratio of a metal atom to a carbon atom in atoms constituting the overcoat layer is in a range of 0.1 or more and 2 or less. An article with a vacuum insulation comprising an article having a thermal insulation region and a vacuum insulation,
The vacuum heat insulating material has a core material and an outer packaging material for a vacuum heat insulating material that encloses the core material,
The outer packaging material for a vacuum heat insulating material has at least a first film, a second film, a third film, and a heat-weldable film in this order,
The first film is disposed on at least one surface side of the first resin base material and the first resin base material, and at least a M-O-P bond (where M represents a metal atom, and O represents oxygen) A metal oxide phosphoric acid layer having an atom and P is a phosphorus atom)
The second film has a second resin base material and an inorganic layer arranged on at least one surface side of the second resin base material,
The said 3rd film has a 3rd resin base material and the inorganic layer arrange | positioned at the at least one surface side of the said 3rd resin base material, The article with a vacuum heat insulating material characterized by the above-mentioned. An article with a vacuum insulation comprising an article having a thermal insulation region and a vacuum insulation,
The vacuum heat insulating material has a core material and an outer packaging material for a vacuum heat insulating material that encloses the core material,
The outer packaging material for vacuum heat insulating material has at least a first film, a film with an overcoat layer, and a heat-weldable film in this order,
The first film is disposed on at least one surface side of the first resin base material and the first resin base material, and at least a M-O-P bond (where M represents a metal atom, and O represents oxygen) A metal oxide phosphoric acid layer having an atom and P is a phosphorus atom)
The film with an overcoat layer includes a resin substrate, an inorganic layer disposed on at least one surface of the resin substrate, and an overcoat layer disposed on the surface of the inorganic layer opposite to the resin substrate. Have
The overcoat layer includes a hydrophilic group-containing resin,
An article with a vacuum heat insulating material, wherein a ratio of a metal atom to a carbon atom in atoms constituting the overcoat layer is in a range of 0.1 or more and 2 or less.