JP2017206491A - Method for producing 2'-fluoro-5-methyl-4'-thioarabinouridine and method comprising some steps thereof - Google Patents
Method for producing 2'-fluoro-5-methyl-4'-thioarabinouridine and method comprising some steps thereof Download PDFInfo
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- JP2017206491A JP2017206491A JP2016232156A JP2016232156A JP2017206491A JP 2017206491 A JP2017206491 A JP 2017206491A JP 2016232156 A JP2016232156 A JP 2016232156A JP 2016232156 A JP2016232156 A JP 2016232156A JP 2017206491 A JP2017206491 A JP 2017206491A
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- 238000001195 ultra high performance liquid chromatography Methods 0.000 description 1
- 238000004704 ultra performance liquid chromatography Methods 0.000 description 1
- DRTQHJPVMGBUCF-UHFFFAOYSA-N uracil arabinoside Natural products OC1C(O)C(CO)OC1N1C(=O)NC(=O)C=C1 DRTQHJPVMGBUCF-UHFFFAOYSA-N 0.000 description 1
- 229940045145 uridine Drugs 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000004474 valine Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Saccharide Compounds (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
本発明は、チオアラビノースと保護基を有するチミンとの反応を含む保護された2’−フルオロ−5−メチル−4’−チオアラビノウリジンの製造方法に関する。本発明は、保護された2’−フルオロ−5−メチル−4’−チオアラビノウリジンを再結晶し、脱保護することを含む、2’−フルオロ−5−メチル−4’−チオアラビノウリジンの製造方法に関する。さらに本発明は、保護された2’−フルオロ−5−メチル−4’−チオアラビノウリジンを再結晶する方法にも関する。 The present invention relates to a method for producing a protected 2'-fluoro-5-methyl-4'-thioarabinouridine comprising the reaction of thioarabinose with a thymine having a protecting group. The present invention relates to 2′-fluoro-5-methyl-4′-thioarabino comprising recrystallizing and deprotecting protected 2′-fluoro-5-methyl-4′-thioarabinouridine. The present invention relates to a method for producing uridine. The invention further relates to a method for recrystallizing protected 2'-fluoro-5-methyl-4'-thioarabinouridine.
2’−フルオロ−5−メチル−4’−チオアラビノウリジン(以下、化合物Aとも言う)は抗エプスタイン・バール(EB)ウイルス活性を発揮し、EBウイルス関連疾患の予防もしくは治療剤として有効である(特許文献1)。化合物Aの製造方法として、非特許文献1には、アセチル基を有するチオアラビノースと保護基を有するチミンとを反応させることによってグリコシル化体を製造する方法が記載されている。 2′-Fluoro-5-methyl-4′-thioarabinouridine (hereinafter also referred to as Compound A) exhibits anti-Epstein-Barr (EB) virus activity and is effective as a preventive or therapeutic agent for EB virus-related diseases. Yes (Patent Document 1). As a method for producing Compound A, Non-Patent Document 1 describes a method for producing a glycosylated product by reacting thioarabinose having an acetyl group with thymine having a protecting group.
一方、非特許文献2には、臭素原子で置換されたチオアラビノースと、シリル化されたN−アセチルシトシンとを反応させてグリコシル化体を製造する方法が記載されている。また、特許文献2には、ハロゲンで置換されたチオアラビノースと、保護されたシトシンまたは保護されたN4−アシルシトシンとを反応させることを含む1−(2−デオキシ−2−フルオロ−4−チオ−β−D−アラビノフラノシル)シトシンの製造方法が記載されている。 On the other hand, Non-Patent Document 2 describes a method for producing a glycosylated product by reacting thioarabinose substituted with a bromine atom and silylated N-acetylcytosine. Patent Document 2 also includes reacting thioarabinose substituted with a halogen with protected cytosine or protected N 4 -acylcytosine. A process for the preparation of thio-β-D-arabinofuranosyl) cytosine is described.
非特許文献1に記載されているグリコシル化体の製造方法では、アセチル基で置換されたチオアラビノースと、保護基を有するチミンとを反応させており、また触媒としてTMSOTf(トリフルオロメタンスルホン酸トリメチルシリル)を使用している。非特許文献1におけるβグリコシル化体の選択性は低く、βグリコシル化体を高い選択性で製造できる方法が望まれている。また、1−(2−デオキシ−2−フルオロ−4−チオ−β−D−アラビノフラノシル)シトシンについてはαグリコシル化体とβグリコシル化体の溶解度の差異が小さいことから、カラムクロマトグラフィーを用いてβグリコシル化体を分離精製することが一般的であったが、工業的な製造方法としてはカラムクロマトグラフィーを用いることなくβグリコシル化体を分離精製する方法が望まれている。 In the method for producing a glycosylated product described in Non-Patent Document 1, thioarabinose substituted with an acetyl group is reacted with thymine having a protecting group, and TMSOTf (trimethylsilyl trifluoromethanesulfonate) is used as a catalyst. Is used. The selectivity of β-glycosylated products in Non-Patent Document 1 is low, and a method capable of producing β-glycosylated products with high selectivity is desired. Since 1- (2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl) cytosine has a small difference in solubility between α-glycosylated and β-glycosylated, column chromatography In general, a β-glycosylated product is separated and purified by using an enzyme. However, as an industrial production method, a method for separating and purifying a β-glycosylated product without using column chromatography is desired.
非特許文献2には、臭素原子で置換されたチオアラビノースと、シリル化されたN−アセチルシトシンとを反応させてグリコシル化体を製造することが記載されているが、チオアラビノースと保護基を有するチミンとの反応については記載がない。特許文献1には、1−(2−デオキシ−2−フルオロ−4−チオ−β−D−アラビノフラノシル)シトシンの製造に有用な化合物及びそれらの製造方法が記載されているが、チオアラビノースと保護基を有するチミンとの反応については記載がない。 Non-Patent Document 2 describes the production of a glycosylated product by reacting thioarabinose substituted with a bromine atom and silylated N-acetylcytosine. There is no description about the reaction with thymine. Patent Document 1 describes compounds useful for the production of 1- (2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl) cytosine and methods for their production. There is no description of the reaction between arabinose and thymine having a protecting group.
本発明は、チオアラビノースと保護基を有するチミンとの反応を含むグリコシル化工程においてβグリコシル化体を高い選択性で製造できるグリコシル化体の製造方法を提供することを解決すべき課題とした。さらに本発明は、上記のグリコシル化体の製造方法を含む化合物Aの製造方法を提供することを解決すべき課題とした。さらに本発明は、αグリコシル化体とβグリコシル化体との混合物からβグリコシル化体を再結晶により分離精製する方法を提供することを解決すべき課題とした。 An object of the present invention is to provide a method for producing a glycosylated product capable of producing a β-glycosylated product with high selectivity in a glycosylation step including a reaction between thioarabinose and thymine having a protecting group. Furthermore, another object of the present invention is to provide a method for producing Compound A including the above-mentioned method for producing a glycosylated product. Furthermore, another object of the present invention is to provide a method for separating and purifying a β-glycosylated product from a mixture of an α-glycosylated product and a β-glycosylated product by recrystallization.
本発明者らは上記課題を解決するために鋭意検討した結果、臭素原子で置換されたチオアラビノースと保護基を有するチミンとを溶媒としてのクロロホルムを含む溶媒中で反応させることによって、βグリコシル化体を高い選択性で製造できることを見出した。さらに本発明者らは、保護された2’−フルオロ−5−メチル−4’−チオアラビノウリジンについてβグリコシル化体とαグリコシル化体の混合物(以下、混合物とも言う)を再結晶して、βグリコシル化体を分離精製する際に、溶媒としてメチルエチルケトンを使用することによって、βグリコシル化体を高純度に分離精製できることを見出した。本発明はこれらの知見に基づいて完成したものである。 As a result of intensive studies to solve the above problems, the present inventors have made β-glycosylation by reacting thioarabinose substituted with a bromine atom with thymine having a protecting group in a solvent containing chloroform as a solvent. It has been found that the body can be produced with high selectivity. Furthermore, the present inventors recrystallized a mixture of a β-glycosylated product and an α-glycosylated product (hereinafter also referred to as a mixture) for the protected 2′-fluoro-5-methyl-4′-thioarabinouridine. The present inventors have found that β-glycosylated products can be separated and purified with high purity by using methyl ethyl ketone as a solvent when separating and purifying β-glycosylated products. The present invention has been completed based on these findings.
即ち、本発明によれば、以下の発明が提供される。
[1] クロロホルムを含む溶媒中において、下記式(1):
で示される化合物と、下記式(2):
で示される化合物とを反応させる工程を含む、下記式(3):
で示される化合物の製造方法。
That is, according to the present invention, the following inventions are provided.
[1] In a solvent containing chloroform, the following formula (1):
And a compound represented by the following formula (2):
Including the step of reacting the compound represented by formula (3):
The manufacturing method of the compound shown by these.
[2] 上記式(1)で示される化合物と、上記式(2)で示される化合物との反応の反応温度が40〜100℃である、[1]に記載の方法。
[3] 上記式(1)で示される化合物と、上記式(2)で示される化合物との反応の反応温度が55〜80℃である、[1]に記載の方法。
[4] 上記式(1)で示される化合物と、上記式(2)で示される化合物との反応を、窒素雰囲気下で行う、[1]から[3]の何れか一に記載の方法。
[2] The method according to [1], wherein the reaction temperature of the reaction between the compound represented by the formula (1) and the compound represented by the formula (2) is 40 to 100 ° C.
[3] The method according to [1], wherein the reaction temperature of the reaction of the compound represented by the formula (1) and the compound represented by the formula (2) is 55 to 80 ° C.
[4] The method according to any one of [1] to [3], wherein the reaction of the compound represented by the formula (1) and the compound represented by the formula (2) is performed in a nitrogen atmosphere.
[5] [1]から[4]の何れか一に記載の方法により、式(3):
で示される化合物をαグリコシル化体とβグリコシル化体との混合物として製造するグリコシル化反応工程:
上記のαグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において再結晶化し、αグリコシル化体を除去する分離精製工程:及び、
上記のβグリコシル化体を脱保護する脱保護工程:
を含む2’−フルオロ−5−メチル−4’−チオアラビノウリジンの製造方法。
[5] By the method according to any one of [1] to [4], the formula (3):
A glycosylation reaction step for producing a compound represented by the following as a mixture of α-glycosylated and β-glycosylated:
Separation and purification step of recrystallizing the mixture of the α-glycosylated product and the β-glycosylated product in a solvent containing methyl ethyl ketone to remove the α-glycosylated product:
Deprotection step for deprotecting the β-glycosylated product:
Of 2′-fluoro-5-methyl-4′-thioarabinouridine containing
[6] 上記分離精製工程のメチルエチルケトンを含む溶媒の使用量が、上記のαグリコシル化体とβグリコシル化体との混合物の質量の40倍量以下である、[5]に記載の方法。
[7] 上記分離精製工程のメチルエチルケトンを含む溶媒の使用量が、上記のαグリコシル化体とβグリコシル化体との混合物の質量の20倍量以下である、[5]又は[6]に記載の方法。
[8] 上記分離精製工程において、上記のαグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において60℃以上の温度で溶解した後、得られた溶液を冷却することによって、再結晶化を行う、[5]から[7]の何れか一に記載の方法。
[6] The method according to [5], wherein the amount of the solvent containing methyl ethyl ketone used in the separation and purification step is 40 times or less the mass of the mixture of the α-glycosylated product and the β-glycosylated product.
[7] The method according to [5] or [6], wherein the amount of the solvent containing methyl ethyl ketone used in the separation and purification step is 20 times or less the mass of the mixture of the α-glycosylated product and the β-glycosylated product. the method of.
[8] In the separation and purification step, the mixture of the α-glycosylated product and the β-glycosylated product is dissolved in a solvent containing methyl ethyl ketone at a temperature of 60 ° C. or higher, and then the resulting solution is cooled. The method according to any one of [5] to [7], wherein recrystallization is performed.
[9] 式(3):
で示される化合物であるαグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において再結晶化する工程を含む、上記のαグリコシル化体とβグリコシル化体との混合物からαグリコシル化体を除去する方法。
[9] Formula (3):
A mixture of an α-glycosylated product and a β-glycosylated product, which is a compound represented by the above formula: A method for removing glycosylated products.
[10] メチルエチルケトンを含む溶媒の使用量が、上記のαグリコシル化体とβグリコシル化体との混合物の質量の40倍量以下である、[9]に記載の方法。
[11] メチルエチルケトンを含む溶媒の使用量が、上記のαグリコシル化体とβグリコシル化体との混合物の質量の20倍量以下である、[9]又は[10]に記載の方法。
[12] 上記のαグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において60℃以上の温度で溶解した後、得られた溶液を冷却することによって、再結晶化を行う、[9]から[11]の何れか一に記載の方法。
[10] The method according to [9], wherein the amount of the solvent containing methyl ethyl ketone is 40 times or less the mass of the mixture of the α-glycosylated product and the β-glycosylated product.
[11] The method according to [9] or [10], wherein the amount of the solvent containing methyl ethyl ketone is 20 times or less the mass of the mixture of the α-glycosylated product and the β-glycosylated product.
[12] The mixture of the above α-glycosylated product and β-glycosylated product is dissolved in a solvent containing methyl ethyl ketone at a temperature of 60 ° C. or higher, and then the resulting solution is cooled to perform recrystallization. [9] The method according to any one of [11].
本発明によるグリコシル化体の製造方法によれば、チオアラビノースと保護基を有するチミンとの反応を含むグリコシル化工程においてβグリコシル化体を高い選択性で製造することができる。本発明によれば、グリコシル化工程においてβグリコシル化体を高い選択性で製造できることにより、効率よく化合物Aを製造することができる。さらに本発明によれば、αグリコシル化体とβグリコシル化体との混合物からβグリコシル化体を再結晶により分離精製することができる。 According to the method for producing a glycosylated product of the present invention, a β-glycosylated product can be produced with high selectivity in a glycosylation step including a reaction between thioarabinose and thymine having a protecting group. According to the present invention, a compound A can be produced efficiently because a β-glycosylated product can be produced with high selectivity in the glycosylation step. Furthermore, according to the present invention, a β-glycosylated product can be separated and purified by recrystallization from a mixture of an α-glycosylated product and a β-glycosylated product.
以下、本発明の実施の形態について詳細に説明する。
本発明において、特にことわらない限り、各用語は、次の意味を有する。
ハロゲン原子とは、フッ素原子、塩素原子、臭素原子又はヨウ素原子である。
C1-6アルキル基とは、メチル、エチル、プロピル、イソプロピル、ブチル、sec−ブチル、イソブチル、tert−ブチル、ペンチル及びヘキシル基などの直鎖状又は分枝鎖状のC1-6アルキル基を意味する。
C2-6アルケニル基とは、ビニル、アリル、プロペニル、イソプロペニル、ブテニル、イソブテニル、1,3−ブタジエニル、ペンテニル及びヘキセニル基などの直鎖状又は分枝鎖状のC2-6アルケニル基を意味する。
C2-6アルキニル基とは、エチニル、プロピニル、ブチニル、ペンチニル及びヘキシニル基などの直鎖状又は分枝鎖状のC2-6アルキニル基を意味する。
Hereinafter, embodiments of the present invention will be described in detail.
In the present invention, unless otherwise specified, each term has the following meaning.
The halogen atom is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
The C 1-6 alkyl group is a linear or branched C 1-6 alkyl group such as methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, isobutyl, tert-butyl, pentyl and hexyl groups. Means.
The C 2-6 alkenyl group is a linear or branched C 2-6 alkenyl group such as vinyl, allyl, propenyl, isopropenyl, butenyl, isobutenyl, 1,3-butadienyl, pentenyl and hexenyl groups. means.
The C 2-6 alkynyl group means a linear or branched C 2-6 alkynyl group such as an ethynyl, propynyl, butynyl, pentynyl and hexynyl group.
C3-8シクロアルキル基とは、シクロプロピル、シクロブチル、シクロペンチル及びシクロヘキシル基などのC3-8シクロアルキル基を意味する。
アリール基とは、フェニル又はナフチル基などを意味する。
アルC1-6アルキル基とは、ベンジル、ジフェニルメチル、トリチル、フェネチル及びナフチルメチル基などのアルC1-6アルキル基を意味する。
The C 3-8 cycloalkyl group means a C 3-8 cycloalkyl group such as cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl group.
An aryl group means a phenyl or naphthyl group.
An ar C 1-6 alkyl group means an ar C 1-6 alkyl group such as benzyl, diphenylmethyl, trityl, phenethyl and naphthylmethyl groups.
C1-6アルコキシ基とは、メトキシ、エトキシ、プロポキシ、イソプロポキシ、ブトキシ、イソブトキシ、sec−ブトキシ、tert−ブトキシ、ペンチルオキシ及びヘキシルオキシ基などの直鎖状又は分枝鎖状のC1-6アルキルオキシ基を意味する。
アリールオキシ基とは、フェノキシ又はナフチルオキシ基などを意味する。
C1-6アルコキシC1-6アルキル基とは、メトキシメチル及び1−エトキシエチル基などのC1-6アルキルオキシC1-6アルキル基を意味する。
The C 1-6 alkoxy group is a linear or branched C 1- group such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy, pentyloxy and hexyloxy groups. 6 means an alkyloxy group.
An aryloxy group means a phenoxy or naphthyloxy group.
The C 1-6 alkoxy C 1-6 alkyl group means a C 1-6 alkyloxy C 1-6 alkyl group such as methoxymethyl and 1-ethoxyethyl group.
C2-6アルカノイル基とは、アセチル、プロピオニル、バレリル、イソバレリル及びピバロイル基などの直鎖状又は分枝鎖状のC2-6アルカノイル基を意味する。
アロイル基とは、ベンゾイル又はナフトイル基などを意味する。
複素環式カルボニル基とは、ニコチノイル、テノイル、ピロリジノカルボニル又はフロイル基などを意味する。
(α−置換)アミノアセチル基とは、アミノ酸(グリシン、アラニン、バリン、ロイシン、イソロイシン、セリン、トレオニン、システイン、メチオニン、アスパラギン酸、グルタミン酸、アスパラギン、グルタミン、アルギニン、リジン、ヒスチジン、ヒドロキシリジン、フェニルアラニン、チロシン、トリプトファン、プロリン及びヒドロキシプロリンなどのアミノ酸が挙げられる。)から誘導されるN末端が保護されていてもよい(α−置換)アミノアセチル基を意味する。
アシル基とは、ホルミル基、スクシニル基、グルタリル基、マレオイル基、フタロイル基、C2-6アルカノイル基、アロイル基、複素環式カルボニル基又は(α−置換)アミノアセチル基などを意味する。
The C 2-6 alkanoyl group means a linear or branched C 2-6 alkanoyl group such as acetyl, propionyl, valeryl, isovaleryl and pivaloyl groups.
An aroyl group means a benzoyl or naphthoyl group.
The heterocyclic carbonyl group means nicotinoyl, thenoyl, pyrrolidinocarbonyl or furoyl group.
The (α-substituted) aminoacetyl group is an amino acid (glycine, alanine, valine, leucine, isoleucine, serine, threonine, cysteine, methionine, aspartic acid, glutamic acid, asparagine, glutamine, arginine, lysine, histidine, hydroxylysine, phenylalanine. , Tyrosine, tryptophan, proline, hydroxyproline, and the like.) The N-terminus derived from (α-substituted) aminoacetyl group may be protected.
An acyl group means a formyl group, a succinyl group, a glutaryl group, a maleoyl group, a phthaloyl group, a C 2-6 alkanoyl group, an aroyl group, a heterocyclic carbonyl group, or an (α-substituted) aminoacetyl group.
C2-6アルカノイルオキシ基とは、アセチルオキシ及びプロピオニルオキシ基などの直鎖状又は分枝鎖状のC2-6アルカノイルオキシ基を意味する。
アロイルオキシ基とは、ベンゾイルオキシ又はナフトイルオキシ基などを意味する。
アシルオキシ基とは、C2-6アルカノイルオキシ基又はアロイルオキシ基を意味する。
C1-6アルコキシカルボニル基とは、メトキシカルボニル、エトキシカルボニル、イソプロポキシカルボニル、tert−ブトキシカルボニル及び1,1−ジメチルプロポキシカルボニル基などの直鎖状又は分枝鎖状のC1-6アルキルオキシカルボニル基を意味する。
アリールオキシカルボニル基とは、フェニルオキシカルボニル又はナフチルオキシカルボニル基などを意味する。
アルC1-6アルコキシカルボニル基とは、ベンジルオキシカルボニル、フェネチルオキシカルボニル及びナフチルメチルオキシカルボニル基などのアルC1-6アルキルオキシカルボニル基を意味する。
C1-6アルコキシカルボニルオキシ基とは、メトキシカルボニルオキシ、エトキシカルボニルオキシ、イソプロポキシカルボニルオキシ、tert−ブトキシカルボニルオキシ及び1,1−ジメチルプロポキシカルボニルオキシ基などの直鎖状又は分枝鎖状のC1-6アルキルオキシカルボニルオキシ基を意味する。
The C 2-6 alkanoyloxy group means a linear or branched C 2-6 alkanoyloxy group such as acetyloxy and propionyloxy groups.
An aroyloxy group means a benzoyloxy or naphthoyloxy group.
The acyloxy group means a C 2-6 alkanoyloxy group or an aroyloxy group.
The C 1-6 alkoxycarbonyl group is a linear or branched C 1-6 alkyloxy group such as methoxycarbonyl, ethoxycarbonyl, isopropoxycarbonyl, tert-butoxycarbonyl, and 1,1-dimethylpropoxycarbonyl group. Means a carbonyl group.
An aryloxycarbonyl group means a phenyloxycarbonyl or naphthyloxycarbonyl group.
The al C 1-6 alkoxycarbonyl group means an al C 1-6 alkyloxycarbonyl group such as benzyloxycarbonyl, phenethyloxycarbonyl and naphthylmethyloxycarbonyl groups.
The C 1-6 alkoxycarbonyloxy group is a linear or branched chain such as methoxycarbonyloxy, ethoxycarbonyloxy, isopropoxycarbonyloxy, tert-butoxycarbonyloxy and 1,1-dimethylpropoxycarbonyloxy groups. C 1-6 means an alkyloxycarbonyloxy group.
C1-6アルキルアミノ基とは、メチルアミノ、エチルアミノ、プロピルアミノ、イソプロピルアミノ、ブチルアミノ、sec−ブチルアミノ、tert−ブチルアミノ、ペンチルアミノ及びヘキシルアミノ基などの直鎖状又は分枝鎖状のC1-6アルキルアミノ基を意味する。
ジ(C1-6アルキル)アミノ基とは、ジメチルアミノ、ジエチルアミノ、ジプロピルアミノ、ジイソプロピルアミノ、ジブチルアミノ、ジ(tert−ブチル)アミノ、ジペンチルアミノ、ジヘキシルアミノ、(エチル)(メチル)アミノ及び(メチル)(プロピル)アミノ基などの直鎖状又は分枝鎖状のジ(C1-6アルキル)アミノ基を意味する。
The C 1-6 alkylamino group is a linear or branched chain such as methylamino, ethylamino, propylamino, isopropylamino, butylamino, sec-butylamino, tert-butylamino, pentylamino and hexylamino groups. Mean C 1-6 alkylamino group.
Di (C 1-6 alkyl) amino group means dimethylamino, diethylamino, dipropylamino, diisopropylamino, dibutylamino, di (tert-butyl) amino, dipentylamino, dihexylamino, (ethyl) (methyl) amino and It means a linear or branched di (C 1-6 alkyl) amino group such as (methyl) (propyl) amino group.
C1-6アルキルチオ基とは、メチルチオ、エチルチオ及びプロピルチオ基などのC1-6アルキルチオ基を意味する。
C1-6アルキルスルホニル基とは、メチルスルホニル、エチルスルホニル及びプロピルスルホニル基などのC1-6アルキルスルホニル基を意味する。
アリールスルホニル基とは、ベンゼンスルホニル、p−トルエンスルホニル又はナフタレンスルホニル基などを意味する。
C1-6アルキルスルホニルオキシ基とは、メチルスルホニルオキシ、エチルスルホニルオキシ及びプロピルスルホニルオキシ基などのC1-6アルキルスルホニルオキシ基を意味する。
The C 1-6 alkylthio group means a C 1-6 alkylthio group such as methylthio, ethylthio and propylthio groups.
The C 1-6 alkylsulfonyl group means a C 1-6 alkylsulfonyl group such as methylsulfonyl, ethylsulfonyl and propylsulfonyl groups.
An arylsulfonyl group means a benzenesulfonyl, p-toluenesulfonyl or naphthalenesulfonyl group.
The C 1-6 alkylsulfonyloxy group means a C 1-6 alkylsulfonyloxy group such as methylsulfonyloxy, ethylsulfonyloxy and propylsulfonyloxy groups.
単環の含窒素複素環式基とは、アゼチジニル、ピロリジニル、ピロリニル、ピロリル、ピペリジル、テトラヒドロピリジル、ピリジル、ホモピペリジニル、オクタヒドロアゾシニル、イミダゾリジニル、イミダゾリニル、イミダゾリル、ピラゾリジニル、ピラゾリニル、ピラゾリル、ピペラジニル、ピラジニル、ピリダジニル、ピリミジニル、ホモピペラジニル、トリアゾリル及びテトラゾリル基などの環を形成する異項原子として窒素原子のみを含む単環の含窒素複素環式基を意味する。
単環の含酸素複素環式基とは、テトラヒドロフラニル、フラニル、テトラヒドロピラニル又はピラニル基などを意味する。
単環の含硫黄複素環式基とは、チエニル基などを意味する。
単環の含窒素・酸素複素環式基とは、オキサゾリル、イソオキサゾリル、オキサジアゾリル及びモルホリニル基などの環を形成する異項原子として窒素原子及び酸素原子のみを含む単環の含窒素・酸素複素環式基を意味する。
単環の含窒素・硫黄複素環式基とは、チアゾリル、イソチアゾリル、チアジアゾリル、チオモルホリニル、1−オキシドチオモルホリニル及び1,1−ジオキシドチオモルホリニル基などの環を形成する異項原子として窒素原子及び硫黄原子のみを含む単環の含窒素・硫黄複素環式基を意味する。
単環の複素環式基とは、単環の含窒素複素環式基、単環の含酸素複素環式基、単環の含硫黄複素環式基、単環の含窒素・酸素複素環式基又は単環の含窒素・硫黄複素環式基などを意味する。
Monocyclic nitrogen-containing heterocyclic groups include azetidinyl, pyrrolidinyl, pyrrolinyl, pyrrolyl, piperidyl, tetrahydropyridyl, pyridyl, homopiperidinyl, octahydroazosinyl, imidazolidinyl, imidazolinyl, imidazolyl, pyrazolidinyl, pyrazolinyl, pyrazolyl, piperazinyl, pyrazylyl This means a monocyclic nitrogen-containing heterocyclic group containing only a nitrogen atom as a hetero atom forming a ring such as pyridazinyl, pyrimidinyl, homopiperazinyl, triazolyl and tetrazolyl groups.
The monocyclic oxygen-containing heterocyclic group means a tetrahydrofuranyl, furanyl, tetrahydropyranyl or pyranyl group.
The monocyclic sulfur-containing heterocyclic group means a thienyl group and the like.
A monocyclic nitrogen-containing / oxygen heterocyclic group is a monocyclic nitrogen-containing / oxygen heterocyclic group containing only a nitrogen atom and an oxygen atom as heterogeneous atoms forming a ring such as oxazolyl, isoxazolyl, oxadiazolyl and morpholinyl groups. Means group.
A monocyclic nitrogen-containing / sulfur heterocyclic group is a hetero atom forming a ring such as thiazolyl, isothiazolyl, thiadiazolyl, thiomorpholinyl, 1-oxidethiomorpholinyl and 1,1-dioxidethiomorpholinyl groups. Means a monocyclic nitrogen-containing / sulfur heterocyclic group containing only nitrogen and sulfur atoms.
Monocyclic heterocyclic group means monocyclic nitrogen-containing heterocyclic group, monocyclic oxygen-containing heterocyclic group, monocyclic sulfur-containing heterocyclic group, monocyclic nitrogen-containing / oxygen heterocyclic group It means a group or a monocyclic nitrogen-containing / sulfur heterocyclic group.
二環式の含窒素複素環式基とは、インドリニル、インドリル、イソインドリニル、イソインドリル、ベンズイミダゾリル、インダゾリル、ベンゾトリアゾリル、キノリル、テトラヒドロキノリニル、キノリル、テトラヒドロイソキノリニル、イソキノリニル、キノリジニル、シンノリニル、フタラジニル、キナゾリニル、ジヒドロキノキサリニル、キノキサリニル、ナフチリジニル、プリニル、プテリジニル及びキヌクリジニル基などの環を形成する異項原子として窒素原子のみを含む二環式の含窒素複素環式基を意味する。
二環式の含酸素複素環式基とは、2,3−ジヒドロベンゾフラニル、ベンゾフラニル、イソベンゾフラニル、クロマニル、クロメニル、イソクロマニル、1,3−ベンゾジオキソリル、1,3−ベンゾジオキサニル及び1,4−ベンゾジオキサニル基などの環を形成する異項原子として酸素原子のみを含む二環式の含酸素複素環式基を意味する。
Bicyclic nitrogen-containing heterocyclic group includes indolinyl, indolyl, isoindolinyl, isoindolyl, benzimidazolyl, indazolyl, benzotriazolyl, quinolyl, tetrahydroquinolinyl, quinolyl, tetrahydroisoquinolinyl, isoquinolinyl, quinolidinyl, Means a bicyclic nitrogen-containing heterocyclic group containing only a nitrogen atom as a hetero atom forming a ring such as cinnolinyl, phthalazinyl, quinazolinyl, dihydroquinoxalinyl, quinoxalinyl, naphthyridinyl, purinyl, pteridinyl and quinuclidinyl groups .
Bicyclic oxygen-containing heterocyclic groups include 2,3-dihydrobenzofuranyl, benzofuranyl, isobenzofuranyl, chromanyl, chromenyl, isochromanyl, 1,3-benzodioxolyl, 1,3-benzodi It means a bicyclic oxygen-containing heterocyclic group containing only an oxygen atom as a hetero atom forming a ring such as oxanyl and 1,4-benzodioxanyl group.
二環式の含硫黄複素環式基とは、2,3−ジヒドロベンゾチエニル及びベンゾチエニル基などの環を形成する異項原子として硫黄原子のみを含む二環式の含硫黄複素環式基を意味する。
二環式の含窒素・酸素複素環式基とは、ベンゾオキサゾリル、ベンゾイソオキサゾリル、ベンゾオキサジアゾリル、ベンゾモルホリニル、ジヒドロピラノピリジル、ジヒドロジオキシノピリジル及びジヒドロピリドオキサジニル基などの環を形成する異項原子として窒素原子及び酸素原子のみを含む二環式の含窒素・酸素複素環式基を意味する。
The bicyclic sulfur-containing heterocyclic group is a bicyclic sulfur-containing heterocyclic group containing only a sulfur atom as a hetero atom forming a ring such as 2,3-dihydrobenzothienyl and benzothienyl groups. means.
Bicyclic nitrogen-containing / oxygen heterocyclic groups include benzoxazolyl, benzisoxazolyl, benzooxadiazolyl, benzomorpholinyl, dihydropyranopyridyl, dihydrodioxynopyridyl and dihydropyridoxoxa It means a bicyclic nitrogen-containing / oxygen heterocyclic group containing only a nitrogen atom and an oxygen atom as a hetero atom forming a ring such as a dinyl group.
二環式の含窒素・硫黄複素環式基とは、ベンゾチアゾリル、ベンゾイソチアゾリル及びベンゾチアジアゾリル基などの環を形成する異項原子として窒素原子及び硫黄原子を含む二環式の含窒素・硫黄複素環式基を意味する。
二環式の複素環式基とは、二環式の含窒素複素環式基、二環式の含酸素複素環式基、二環式の含硫黄複素環式基、二環式の含窒素・酸素複素環式基又は二環式の含窒素・硫黄複素環式基などを意味する。
複素環式基とは、単環の複素環式基又は二環式の複素環式基を意味する。
Bicyclic nitrogen-containing / sulfur heterocyclic group means bicyclic nitrogen-containing nitrogen atom and sulfur atom as heterogeneous atoms forming a ring such as benzothiazolyl, benzisothiazolyl and benzothiadiazolyl group. Means a sulfur heterocyclic group.
A bicyclic heterocyclic group is a bicyclic nitrogen-containing heterocyclic group, a bicyclic oxygen-containing heterocyclic group, a bicyclic sulfur-containing heterocyclic group, or a bicyclic nitrogen-containing group. -An oxygen heterocyclic group or a bicyclic nitrogen-containing / sulfur heterocyclic group.
The heterocyclic group means a monocyclic heterocyclic group or a bicyclic heterocyclic group.
シリル基とは、トリメチルシリル、トリエチルシリル、トリイソプロピルシリル、トリブチルシリル、tert−ブチルジメチルシリル又はtert−ブチルジフェニルシリル基などC1-18シリル基を意味する。 The silyl group means a C 1-18 silyl group such as trimethylsilyl, triethylsilyl, triisopropylsilyl, tributylsilyl, tert-butyldimethylsilyl or tert-butyldiphenylsilyl group.
脂肪族炭化水素類としては、ペンタン、ヘキサン又はシクロヘキサンなどが挙げられる。
ハロゲン化炭化水素類としては、塩化メチレン、クロロホルム又は1,2−ジクロロエタンなどが挙げられる。
アルコール類としては、メタノール、エタノール、プロパノール、2−プロパノール、ブタノール又は2−メチル−2−プロパノールなどが挙げられる。
Examples of the aliphatic hydrocarbons include pentane, hexane, and cyclohexane.
Examples of halogenated hydrocarbons include methylene chloride, chloroform, or 1,2-dichloroethane.
Examples of alcohols include methanol, ethanol, propanol, 2-propanol, butanol, and 2-methyl-2-propanol.
エーテル類としては、ジエチルエーテル、ジイソプロピルエーテル、ジオキサン、テトラヒドロフラン、アニソール、エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル又はジエチレングリコールジエチルエーテルなどが挙げられる。
エステル類としては、酢酸メチル、酢酸エチル、酢酸プロピル、酢酸イソプロピル又は酢酸ブチルなどが挙げられる。
ケトン類としては、アセトン、2−ブタノン又は4−メチル−2−ペンタノンなどが挙げられる。
ニトリル類としては、アセトニトリルなどが挙げられる。
Examples of ethers include diethyl ether, diisopropyl ether, dioxane, tetrahydrofuran, anisole, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, and diethylene glycol diethyl ether.
Examples of the esters include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, and butyl acetate.
Examples of ketones include acetone, 2-butanone and 4-methyl-2-pentanone.
Examples of nitriles include acetonitrile.
アミド類としては、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド又はN−メチルピロリドンなどが挙げられる。
スルホキシド類としては、ジメチルスルホキシドなどが挙げられる。
カルボン酸としては、酢酸などが挙げられる。
芳香族炭化水素類としては、ベンゼン、クロロベンゼン、ジクロロベンゼン、ニトロベンゼン、トルエン又はキシレンなどが挙げられる。
尿素類としては、1,3−ジメチル−2−イミダゾリジノンなどが挙げられる。
Examples of amides include N, N-dimethylformamide, N, N-dimethylacetamide, and N-methylpyrrolidone.
Examples of the sulfoxides include dimethyl sulfoxide.
Examples of the carboxylic acid include acetic acid.
Aromatic hydrocarbons include benzene, chlorobenzene, dichlorobenzene, nitrobenzene, toluene or xylene.
Examples of ureas include 1,3-dimethyl-2-imidazolidinone.
本発明における式(1)、式(2)及び式(3)において、R1及びR2はそれぞれ独立に水酸基の保護基を示し、R3及びR4はそれぞれ独立に水酸基の保護基を示す。
水酸基の保護基としては、通常の水酸基の保護基として使用し得るすべての基を含み、たとえば、W.グリーン(W.Greene)ら、プロテクティブ・グループス・イン・オーガニック・シンセシス(Protective Groups in Organic Synthesis)第4版、16〜366頁、2007年、ジョン・ウィリイ・アンド・サンズ社(John Wiley & Sons,INC.)に記載されている基が挙げられる。
具体例としては、C1-6アルキル基、C2-6アルケニル基、アルC1-6アルキル基、C1-6アルコキシC1-6アルキル基、アシル基、C1-6アルコキシカルボニル基、アルC1-6アルコキシカルボニル基、C1-6アルキルスルホニル基、アリールスルホニル基、テトラヒドロフラニル基、テトラヒドロピラニル基又はシリル基などが挙げられる。これらの基は、下記の置換基群Aから選ばれる一つ以上の基で置換されてもよい。
In the formula (1), formula (2) and formula (3) in the present invention, R 1 and R 2 each independently represent a hydroxyl protecting group, and R 3 and R 4 each independently represent a hydroxyl protecting group. .
Examples of the hydroxyl-protecting group include all groups that can be used as ordinary hydroxyl-protecting groups. W. Greene et al., Protective Groups in Organic Synthesis, 4th edition, pages 16-366, 2007, John Wiley & Sons , INC.).
Specific examples include a C 1-6 alkyl group, a C 2-6 alkenyl group, an al C 1-6 alkyl group, a C 1-6 alkoxy C 1-6 alkyl group, an acyl group, a C 1-6 alkoxycarbonyl group, Al C 1-6 alkoxycarbonyl group, C 1-6 alkylsulfonyl group, arylsulfonyl group, tetrahydrofuranyl group, tetrahydropyranyl group, silyl group and the like can be mentioned. These groups may be substituted with one or more groups selected from the following substituent group A.
置換基群A:ハロゲン原子、シアノ基、ニトロ基、保護されてもよいアミノ基、保護されてもよい水酸基、保護されてもよいカルボキシル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいカルバモイル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいスルファモイル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アルキル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC2-6アルケニル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC2-6アルキニル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC3-8シクロアルキル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいアリール基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アルコキシ基、置換基群Bから選ばれる一つ以上の基で置換されてもよいアリールオキシ基、置換基群Bから選ばれる一つ以上の基で置換されてもよいアシル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アシルオキシ基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アルコキシカルボニル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいアリールオキシカルボニル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アルコキシカルボニルオキシ基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アルキルアミノ基、置換基群Bから選ばれる一つ以上の基で置換されてもよいジ(C1-6アルキル)アミノ基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アルキルチオ基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アルキルスルホニル基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-6アルキルスルホニルオキシ基、置換基群Bから選ばれる一つ以上の基で置換されてもよいC1-18シリル基、置換基群Bから選ばれる一つ以上の基で置換されてもよい複素環式基、オキソ基。 Substituent group A: one or more groups selected from a halogen atom, a cyano group, a nitro group, an amino group that may be protected, a hydroxyl group that may be protected, a carboxyl group that may be protected, and a substituent group B A carbamoyl group which may be substituted, a sulfamoyl group which may be substituted with one or more groups selected from substituent group B, and a C 1- which may be substituted with one or more groups selected from substituent group B C 2-6 alkenyl group which may be substituted with one or more groups selected from 6 alkyl groups and substituent group B, C 2− which may be substituted with one or more groups selected from substituent group B 6 an alkynyl group, a C 3-8 cycloalkyl group which may be substituted with one or more groups selected from substituent group B, and an aryl group which may be substituted with one or more groups selected from substituent group B , May be substituted with one or more groups selected from substituent group B A C 1-6 alkoxy group, an aryloxy group which may be substituted with one or more groups selected from substituent group B, an acyl group which may be substituted with one or more groups selected from substituent group B, C 1-6 acyloxy group which may be substituted with one or more groups selected from substituent group B, C 1-6 alkoxycarbonyl group which may be substituted with one or more groups selected from substituent group B An aryloxycarbonyl group which may be substituted with one or more groups selected from substituent group B, a C 1-6 alkoxycarbonyloxy group which may be substituted with one or more groups selected from substituent group B A C 1-6 alkylamino group which may be substituted with one or more groups selected from Substituent Group B, and a di (C 1-) which may be substituted with one or more groups selected from Substituent Group B 6 alkyl) amino group, substituted with one or more groups selected from substituent group B A C 1-6 alkylthio group optionally may be substituted with one or more groups selected from Substituent Group B C 1-6 alkylsulfonyl group, at least one group selected from substituent group B C 1-6 alkylsulfonyloxy group which may be substituted, C 1-18 silyl group which may be substituted with one or more groups selected from substituent group B, one or more selected from substituent group B A heterocyclic group optionally substituted by a group, an oxo group.
置換基群B:ハロゲン原子、シアノ基、ニトロ基、保護されてもよいアミノ基、保護されてもよい水酸基、保護されてもよいカルボキシル基、C1-6アルキル基、アリール基、C1-6アルコキシ基、複素環式基、オキソ基。 Substituent group B: halogen atom, cyano group, nitro group, amino group which may be protected, hydroxyl group which may be protected, carboxyl group which may be protected, C 1-6 alkyl group, aryl group, C 1- 6 alkoxy group, heterocyclic group, oxo group.
R1又はR2が示す水酸基の保護基としては、置換基群Aから選ばれる一つ以上の基で置換されてもよいC1-6アルキル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアルC1-6アルキル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアシル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいC1-6アルコキシカルボニル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアルC1-6アルコキシカルボニル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいシリル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいシンナモイル基、テトラヒドロフラニル基又はテトラヒドロピラニル基が好ましい。 As the hydroxyl-protecting group represented by R 1 or R 2, one or more C 1-6 alkyl groups optionally substituted with one or more groups selected from Substituent Group A, one or more selected from Substituent Group A Substituted with one or more groups selected from substituents A, an acyl group optionally substituted with one or more groups selected from substituent group A, an al C 1-6 alkyl group optionally substituted with groups which may be C 1-6 alkoxycarbonyl group, substituted with one or more groups selected from the substituent group a which may be Al C 1-6 alkoxycarbonyl group, more than one selected from the substituent group a A silyl group which may be substituted with a group, a cinnamoyl group, a tetrahydrofuranyl group or a tetrahydropyranyl group which may be substituted with one or more groups selected from substituent group A are preferred.
R1又はR2が示す水酸基の保護基としては、置換基群Aから選ばれる一つ以上の基で置換されてもよいアルC1-6アルキル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアシル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいC1-6アルコキシカルボニル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアルC1-6アルコキシカルボニル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいシリル基又は置換基群Aから選ばれる一つ以上の基で置換されてもよいシンナモイル基がより好ましい。 As the hydroxyl-protecting group represented by R 1 or R 2 , an al C 1-6 alkyl group which may be substituted with one or more groups selected from substituent group A, one or more selected from substituent group A An acyl group which may be substituted with a group, a C 1-6 alkoxycarbonyl group which may be substituted with one or more groups selected from substituent group A, and one or more groups selected from substituent group A An optionally substituted al C 1-6 alkoxycarbonyl group, a silyl group optionally substituted with one or more groups selected from substituent group A, or a substituent substituted with one or more groups selected from substituent group A An optional cinnamoyl group is more preferable.
R1又はR2が示す水酸基の保護基としては、置換基群Aから選ばれる一つ以上の基で置換されてもよいC2-6アルカノイル基又は置換基群Aから選ばれる一つ以上の基で置換されてもよいアロイル基がさらに好ましい。 The hydroxyl protecting group represented by R 1 or R 2 is a C 2-6 alkanoyl group which may be substituted with one or more groups selected from the substituent group A or one or more groups selected from the substituent group A. More preferred is an aroyl group which may be substituted with a group.
R1又はR2が示す水酸基の保護基としては、アセチル基、ピバロイル基又は置換基群Aから選ばれる一つ以上の基で置換されてもよいベンゾイル基が一層好ましい。
R1又はR2が示す水酸基の保護基としては、置換基群Aから選ばれる一つ以上の基で置換されてもよいベンゾイル基がより一層好ましい。
R1又はR2が示す水酸基の保護基としては、ベンゾイル基、4−クロロベンゾイル基、2,4−ジクロロベンゾイル基、4−ニトロベンゾイル基、4−メトキシベンゾイル基、4−(トリフルオロメチル)ベンゾイル基、4−フェニルベンゾイル基、3,5ジメチルベンゾイル基又は4−メチルベンゾイル基が特に好ましく、ベンゾイル基が最も好ましい。
As the hydroxyl-protecting group represented by R 1 or R 2 , a benzoyl group which may be substituted with one or more groups selected from an acetyl group, a pivaloyl group or a substituent group A is more preferable.
As the hydroxyl-protecting group represented by R 1 or R 2 , a benzoyl group which may be substituted with one or more groups selected from the substituent group A is even more preferable.
Examples of the hydroxyl protecting group represented by R 1 or R 2 include benzoyl group, 4-chlorobenzoyl group, 2,4-dichlorobenzoyl group, 4-nitrobenzoyl group, 4-methoxybenzoyl group, 4- (trifluoromethyl). A benzoyl group, a 4-phenylbenzoyl group, a 3,5 dimethylbenzoyl group or a 4-methylbenzoyl group is particularly preferred, and a benzoyl group is most preferred.
水酸基の保護基としてのベンゾイル基は、脱保護が容易であり、本発明の製造方法の反応条件に耐えるという利点を有する。 A benzoyl group as a hydroxyl-protecting group is easy to deprotect and has the advantage of withstanding the reaction conditions of the production method of the present invention.
R3又はR4が示す水酸基の保護基としては、置換基群Aから選ばれる一つ以上の基で置換されてもよいC1-6アルキル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアルC1-6アルキル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアシル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいC1-6アルコキシカルボニル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアルC1-6アルコキシカルボニル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいシリル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいシンナモイル基、テトラヒドロフラニル基又はテトラヒドロピラニル基が好ましい。 As the hydroxyl-protecting group represented by R 3 or R 4, one or more C 1-6 alkyl groups optionally substituted with one or more groups selected from Substituent Group A, one or more selected from Substituent Group A Substituted with one or more groups selected from substituents A, an acyl group optionally substituted with one or more groups selected from substituent group A, an al C 1-6 alkyl group optionally substituted with groups which may be C 1-6 alkoxycarbonyl group, substituted with one or more groups selected from the substituent group a which may be Al C 1-6 alkoxycarbonyl group, more than one selected from the substituent group a A silyl group which may be substituted with a group, a cinnamoyl group, a tetrahydrofuranyl group or a tetrahydropyranyl group which may be substituted with one or more groups selected from substituent group A are preferred.
R3又はR4が示す水酸基の保護基としては、置換基群Aから選ばれる一つ以上の基で置換されてもよいアルC1-6アルキル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアシル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいC1-6アルコキシカルボニル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいアルC1-6アルコキシカルボニル基、置換基群Aから選ばれる一つ以上の基で置換されてもよいシリル基又は置換基群Aから選ばれる一つ以上の基で置換されてもよいシンナモイル基がより好ましい。 As the hydroxyl-protecting group represented by R 3 or R 4, one or more selected from an ar C 1-6 alkyl group which may be substituted with one or more groups selected from Substituent Group A, and Substituent Group A An acyl group which may be substituted with a group, a C 1-6 alkoxycarbonyl group which may be substituted with one or more groups selected from substituent group A, and one or more groups selected from substituent group A An optionally substituted al C 1-6 alkoxycarbonyl group, a silyl group optionally substituted with one or more groups selected from substituent group A, or a substituent substituted with one or more groups selected from substituent group A An optional cinnamoyl group is more preferable.
R3又はR4が示す水酸基の保護基としては、置換基群Aから選ばれる一つ以上の基で置換されてもよいシリル基がさらに好ましく、シリル基が一層好ましい。
R3又はR4が示す水酸基の保護基としては、トリメチルシリル基が特に好ましい。
As the hydroxyl-protecting group represented by R 3 or R 4 , a silyl group which may be substituted with one or more groups selected from the substituent group A is more preferable, and a silyl group is more preferable.
As the hydroxyl-protecting group represented by R 3 or R 4 , a trimethylsilyl group is particularly preferred.
次に本発明の製造方法について説明する。
[1]チオアラビノースと保護基を有するチミンとの反応を含む保護された2’−フルオロ−5−メチル−4’−チオアラビノウリジンの製造
本発明においては、クロロホルムを含む溶媒中において、下記式(1):
で示される化合物と、下記式(2):
で示される化合物とを反応させることによって、下記式(3):
で示される化合物を製造する。
Next, the manufacturing method of this invention is demonstrated.
[1] Production of protected 2′-fluoro-5-methyl-4′-thioarabinouridine comprising reaction of thioarabinose with thymine having a protecting group In the present invention, in a solvent containing chloroform, Formula (1):
And a compound represented by the following formula (2):
Is reacted with a compound represented by the following formula (3):
Is produced.
上記式(3)で示される化合物は、αグリコシル化体とβグリコシル化体との混合物として製造されるが、本発明の方法によれば、βグリコシル化体を高い選択性で製造することができる。
式(3)で示される化合物をαグリコシル化体とβグリコシル化体との混合物として製造する工程をグリコシル化反応工程とも言う。
The compound represented by the above formula (3) is produced as a mixture of an α-glycosylated product and a β-glycosylated product. According to the method of the present invention, a β-glycosylated product can be produced with high selectivity. it can.
The step of producing the compound represented by the formula (3) as a mixture of an α-glycosylated product and a β-glycosylated product is also referred to as a glycosylation reaction step.
クロロホルムを含む溶媒とは、クロロホルムを主成分とする溶媒であればよく、クロロホルム以外の他の溶媒が含まれていてもよいことを意味する。クロロホルムを含む溶媒におけるクロロホルムの含有量は、好ましくは60質量%以上であり、より好ましくは70質量%以上であり、より一層好ましくは80質量%以上であり、さらに好ましくは90質量%以上であり、さらに一層好ましくは95質量%以上であり、特に好ましくは98質量%以上である。 The solvent containing chloroform only needs to be a solvent containing chloroform as a main component, and means that a solvent other than chloroform may be contained. The content of chloroform in the solvent containing chloroform is preferably 60% by mass or more, more preferably 70% by mass or more, still more preferably 80% by mass or more, and further preferably 90% by mass or more. Still more preferably, it is 95 mass% or more, Most preferably, it is 98 mass% or more.
クロロホルムを含む溶媒に、クロロホルム以外の他の溶媒が含まれる場合、他の溶媒の種類は特に限定されないが、例えば、脂肪族炭化水素類、ハロゲン化炭化水素類(クロロホルムを除く)、アルコール類、エーテル類、エステル類、ケトン類、ニトリル類、アミド類、スルホキシド類、カルボン酸、芳香族炭化水素類及び尿素類などが挙げられる。
溶媒の使用量は、特に限定されないが、式(2)で示される化合物に対して、1.0〜50倍量(v/w)であればよく、1.0〜15倍量(v/w)が好ましい。
When the solvent containing chloroform includes a solvent other than chloroform, the type of the other solvent is not particularly limited. For example, aliphatic hydrocarbons, halogenated hydrocarbons (excluding chloroform), alcohols, Examples include ethers, esters, ketones, nitriles, amides, sulfoxides, carboxylic acids, aromatic hydrocarbons, and ureas.
Although the usage-amount of a solvent is not specifically limited, It should just be 1.0-50 times amount (v / w) with respect to the compound shown by Formula (2), and 1.0-15 times amount (v / w) w) is preferred.
式(1)で示される化合物は、下記式(10):
式(2)で示される化合物は、適当な溶媒(例えば、トルエン)及び(NH4)2SO4の存在下において、チミンと、シリル化剤(例えば、1,1,1,3,3,3−ヘキサメチルジシラザン)とを反応させることにより製造することができる。上記反応により得られる式(2)で示される化合物は、反応後そのまま精製せずに次の反応に使用してもよいし、精製後に次の反応に使用してもよい。
式(2)で示される化合物の使用量は、式(1)で示される化合物に対して、1〜10倍モル量であればよく、1〜5倍モル量が好ましく,1〜3倍モル量がより好ましい。
The compound represented by the formula (2) is prepared by reacting thymine with a silylating agent (for example, 1,1,1,3,3, for example) in the presence of a suitable solvent (for example, toluene) and (NH 4 ) 2 SO 4 . 3-hexamethyldisilazane) can be reacted. The compound represented by the formula (2) obtained by the above reaction may be used for the next reaction without being purified as it is after the reaction, or may be used for the next reaction after the purification.
The usage-amount of the compound shown by Formula (2) should just be 1-10 times mole amount with respect to the compound shown by Formula (1), 1-5 times mole amount is preferable, and 1-3 times mole. The amount is more preferred.
式(1)で示される化合物と式(2)で示される化合物との反応の反応温度は、反応が進行する限り特に限定されないが、40℃以上が好ましく、45℃以上がより好ましい。反応温度は、より具体的には、好ましくは40〜100℃であり、より好ましくは50〜100℃であり、より一層好ましくは55〜100℃であり、さらに好ましくは55〜85℃であり、特に好ましくは55〜80℃である。
式(1)で示される化合物と式(2)で示される化合物との反応の反応時間は、10分間〜50時間であればよく、1時間〜24時間が好ましく、2時間〜24時間がより好ましい。
反応温度は、反応時間中で変化させてもよい。低温(例えば、45℃)で反応を開始し、徐々に昇温して所定の温度(例えば、70〜80℃の所定の温度)で維持して反応を完結させてもよい。
式(1)で示される化合物と式(2)で示される化合物との反応は、不活性気体(たとえば、窒素、アルゴン)雰囲気下で行うことが好ましく、窒素雰囲気下で行うことが特に好ましい。
The reaction temperature of the reaction between the compound represented by the formula (1) and the compound represented by the formula (2) is not particularly limited as long as the reaction proceeds, but is preferably 40 ° C. or higher, more preferably 45 ° C. or higher. More specifically, the reaction temperature is preferably 40 to 100 ° C, more preferably 50 to 100 ° C, still more preferably 55 to 100 ° C, further preferably 55 to 85 ° C, Especially preferably, it is 55-80 degreeC.
The reaction time of the reaction of the compound represented by the formula (1) and the compound represented by the formula (2) may be 10 minutes to 50 hours, preferably 1 hour to 24 hours, more preferably 2 hours to 24 hours. preferable.
The reaction temperature may be changed during the reaction time. The reaction may be started at a low temperature (for example, 45 ° C.), gradually raised in temperature, and maintained at a predetermined temperature (for example, a predetermined temperature of 70 to 80 ° C.) to complete the reaction.
The reaction between the compound represented by the formula (1) and the compound represented by the formula (2) is preferably performed in an inert gas (for example, nitrogen or argon) atmosphere, and particularly preferably performed in a nitrogen atmosphere.
[2]αグリコシル化体を除去する分離精製
上記[1]の方法において、式(3)で示される化合物は、αグリコシル化体とβグリコシル化体との混合物として得られる。本発明においては、上記混合物を、メチルエチルケトンを含む溶媒中において再結晶化する工程によって、上記混合物からαグリコシル化体を除去することができる。上記の通りαグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において再結晶化し、αグリコシル化体を除去する工程のことを、分離精製工程とも言う。
[2] Separation and purification to remove α-glycosylated product In the method of [1] above, the compound represented by the formula (3) is obtained as a mixture of an α-glycosylated product and a β-glycosylated product. In the present invention, the α-glycosylated form can be removed from the mixture by a step of recrystallizing the mixture in a solvent containing methyl ethyl ketone. As described above, the step of recrystallizing a mixture of an α-glycosylated product and a β-glycosylated product in a solvent containing methyl ethyl ketone to remove the α-glycosylated product is also referred to as a separation and purification step.
メチルエチルケトンを含む溶媒とは、メチルエチルケトンを主成分とする溶媒であればよく、メチルエチルケトン以外の他の溶媒が含まれていてもよいことを意味する。メチルエチルケトンを含む溶媒におけるメチルエチルケトンの含有量は、好ましくは60質量%以上であり、より好ましくは70質量%以上であり、より一層好ましくは80質量%以上であり、さらに好ましくは90質量%以上であり、さらに一層好ましくは95質量%以上であり、特に好ましくは98質量%以上である。 The solvent containing methyl ethyl ketone only needs to be a solvent containing methyl ethyl ketone as a main component, and means that a solvent other than methyl ethyl ketone may be contained. The content of methyl ethyl ketone in the solvent containing methyl ethyl ketone is preferably 60% by mass or more, more preferably 70% by mass or more, still more preferably 80% by mass or more, and further preferably 90% by mass or more. Still more preferably, it is 95 mass% or more, Most preferably, it is 98 mass% or more.
メチルエチルケトンを含む溶媒に、メチルエチルケトン以外の他の溶媒が含まれる場合、他の溶媒の種類は特に限定されないが、例えば、脂肪族炭化水素類、ハロゲン化炭化水素類、アルコール類、エーテル類、エステル類、ケトン類(メチルエチルケトンを除く)、ニトリル類、アミド類、スルホキシド類、カルボン酸、芳香族炭化水素類及び尿素類などが挙げられる。 When the solvent containing methyl ethyl ketone includes a solvent other than methyl ethyl ketone, the type of the other solvent is not particularly limited. For example, aliphatic hydrocarbons, halogenated hydrocarbons, alcohols, ethers, esters , Ketones (excluding methyl ethyl ketone), nitriles, amides, sulfoxides, carboxylic acids, aromatic hydrocarbons and ureas.
メチルエチルケトンを含む溶媒の使用量は、特に限定されないが、好ましくは、αグリコシル化体とβグリコシル化体との混合物の質量の40倍量以下であり、より好ましくは上記混合物の質量の30倍量以下であり、さらに好ましくは上記混合物の質量の20倍量以下であり、さらに一層好ましくは上記混合物の質量の15倍量以下であり、特に好ましくは上記混合物の質量の10倍量以下である。メチルエチルケトンを溶媒として使用することによって、少ない溶媒の使用量であっても、αグリコシル化体を除去することができ、高純度のβグリコシル化体を得ることができる。 The amount of the solvent containing methyl ethyl ketone is not particularly limited, but is preferably 40 times or less the mass of the mixture of α-glycosylated product and β-glycosylated product, more preferably 30 times the mass of the above mixture. Or less, more preferably 20 times or less the mass of the mixture, even more preferably 15 times or less the mass of the mixture, and particularly preferably 10 or less the mass of the mixture. By using methyl ethyl ketone as the solvent, the α-glycosylated product can be removed even with a small amount of the solvent used, and a highly pure β-glycosylated product can be obtained.
本発明においては、αグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において溶解した後、得られた溶液を冷却することによって、再結晶化を行うことができる。
αグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において溶解させるため、上記混合物と溶媒の温度を上げることが好ましい。本発明においては、上記混合物を、好ましくは60℃以上100℃以下(より好ましくは70℃以上、さらに好ましくは80℃以上)の温度で溶解した後、得られた溶液を冷却することによって、再結晶化を行うことが好ましい。溶液を冷却する際には、溶液を、好ましくは25℃以下の温度、例えば5〜10℃の温度まで冷却することができる。
上記の再結晶により得られる式(3)で示される化合物は、そのまま精製せずに次の反応に使用してもよいし、精製後に次の反応に使用してもよい。
In the present invention, recrystallization can be performed by dissolving a mixture of an α-glycosylated product and a β-glycosylated product in a solvent containing methyl ethyl ketone, and then cooling the resulting solution.
In order to dissolve the mixture of the α-glycosylated product and the β-glycosylated product in a solvent containing methyl ethyl ketone, it is preferable to raise the temperature of the mixture and the solvent. In the present invention, the above mixture is dissolved at a temperature of preferably 60 ° C. or higher and 100 ° C. or lower (more preferably 70 ° C. or higher, more preferably 80 ° C. or higher), and then the obtained solution is cooled to re-recycle. It is preferable to perform crystallization. When cooling the solution, the solution can be cooled to a temperature of preferably 25 ° C. or lower, for example, 5 to 10 ° C.
The compound represented by the formula (3) obtained by the above recrystallization may be used for the next reaction without being purified as it is, or may be used for the next reaction after the purification.
[3]βグリコシル化体の脱保護
上記の[2]において得られるβグリコシル化体は、式(3)で示される化合物であり、水酸基が保護されている化合物である。
本発明においては、上記のβグリコシル化体の脱保護を行うことにより、化合物Aを製造することができる。βグリコシル化体を脱保護する工程を、脱保護工程とも言う。
[3] Deprotection of β-glycosylated product The β-glycosylated product obtained in the above [2] is a compound represented by the formula (3), in which a hydroxyl group is protected.
In the present invention, compound A can be produced by deprotecting the β-glycosylated form described above. The step of deprotecting a β-glycosylated product is also referred to as a deprotection step.
脱保護の方法は、例えば国際公開WO1997/038001号又はプロテクティブ・グループス・イン・オーガニック・シンセシス(Protective Groups in Organic Synthesis)第4版、696〜926頁、2007年、ジョン・ウィリイ・アンド・サンズ社(John Wiley & Sons,INC.)に記載された方法に準じて行えばよい。 The method of deprotection is, for example, International Publication No. WO1997 / 038001 or Protective Groups in Organic Synthesis, 4th edition, pages 696-926, 2007, John Willy and Sons. The method described in the company (John Wiley & Sons, INC.) May be used.
好ましい脱保護としては、塩基を用いる方法が挙げられる。
この反応に使用される溶媒としては、反応に影響を及ぼさないものであれば特に限定されないが、例えば、脂肪族炭化水素類、ハロゲン化炭化水素類、アルコール類、エーテル類及び水が挙げられ、これらの溶媒は混合して使用してもよい。
好ましい溶媒としては、アルコール類及び水が挙げられ、アルコール類がより好ましい。
溶媒の使用量は、特に限定されないが、式(3)で示される化合物に対して、1.0〜50倍量(v/w)であればよく、1.0〜15倍量(v/w)が好ましい。
Preferable deprotection includes a method using a base.
The solvent used in this reaction is not particularly limited as long as it does not affect the reaction, and examples thereof include aliphatic hydrocarbons, halogenated hydrocarbons, alcohols, ethers, and water. These solvents may be used as a mixture.
Preferred solvents include alcohols and water, with alcohols being more preferred.
Although the usage-amount of a solvent is not specifically limited, It should just be 1.0-50 times amount (v / w) with respect to the compound shown by Formula (3), and 1.0-15 times amount (v / w). w) is preferred.
この反応に使用される塩基としては、アンモニア、水酸化ナトリウム及び水酸化カリウムなどの無機塩基、及びアミン類などの有機塩基が挙げられる。
好ましい塩基としては、ジエチルアミン又はジメチルアミン等のアミン類が挙げられる。
塩基の使用量は、特に限定されないが、式(3)で表される化合物に対して、0.1〜50倍モルであればよく、1.0〜20倍モルがより好ましい。
Examples of the base used in this reaction include inorganic bases such as ammonia, sodium hydroxide and potassium hydroxide, and organic bases such as amines.
Preferred bases include amines such as diethylamine or dimethylamine.
Although the usage-amount of a base is not specifically limited, It should just be 0.1-50 times mole with respect to the compound represented by Formula (3), and 1.0-20 times mole is more preferable.
反応温度は、0〜100℃であればよく、10〜70℃が好ましい。
反応時間は、5分間〜7日間であればよく、1〜24時間が好ましい。
上記の製造方法によって得られる化合物Aは、抽出、晶出などの通常の方法によって、単離精製することができる。
本発明による化合物Aの製造方法は、特に、工業的な大規模の合成に適している。
The reaction temperature should just be 0-100 degreeC, and 10-70 degreeC is preferable.
The reaction time may be 5 minutes to 7 days, and preferably 1 to 24 hours.
Compound A obtained by the above production method can be isolated and purified by a usual method such as extraction or crystallization.
The process for producing compound A according to the invention is particularly suitable for industrial large-scale synthesis.
上記の方法によって得られる化合物には、水加物又はアルコール付加体が存在する場合があるが、本発明における化合物は、それらの何れでもよい。
上記の方法によって得られる化合物には、互変異性体又は鏡像異性体が存在する場合があるが、本発明における化合物は、それらの何れでもよい。
また、本発明における化合物について、結晶多形、塩、水和物又は溶媒和物が存在する場合、本発明における化合物は、それらの何れでもよい。
The compound obtained by the above method may contain a hydrate or an alcohol adduct, and the compound in the present invention may be any of them.
The compound obtained by the above method may have a tautomer or an enantiomer, and the compound in the present invention may be any of them.
Moreover, about the compound in this invention, when a crystal polymorph, a salt, a hydrate, or a solvate exists, any of those may be sufficient as the compound in this invention.
以下の実施例により本発明をさらに具体的に説明するが、本発明は実施例によって限定されるものではない。 The following examples further illustrate the present invention, but the present invention is not limited to the examples.
略号は以下を示す。
TMS:トリメチルシリル
Ac:アセチル
Bz:ベンゾイル
MEK:メチルエチルケトン
Cat:触媒
Ca:約
AcOH:酢酸
AcOEt:酢酸エチル
MeOH:メタノール
Et2NH:ジエチルアミン
NMR:核磁気共鳴
CDCl3:重クロロホルム
DMSO:ジメチルスルホキシド
v/w:容量/重量
Abbreviations indicate the following:
TMS: Trimethylsilyl Ac: Acetyl Bz: Benzoyl MEK: Methyl ethyl ketone Cat: Catalyst Ca: About AcOH: Acetic acid AcOEt: Ethyl acetate MeOH: Methanol Et 2 NH: Diethylamine NMR: Nuclear magnetic resonance CDCl 3 : Deuterated chloroform DMSO: Dimethyl sulfoxide v / w : Capacity / weight
本実施例における化合物Aの合成経路をスキーム1に示す。化合物1及び化合物3を出発原料として全5工程で化合物Aを合成した。化合物2と化合物4のグリコシル化反応により生成する化合物5はβ/α混合物となる。β/α混合物を精製してαグリコシル化体を除去して化合物6を得た後、脱保護を行って化合物Aを得た。 The synthesis route of Compound A in this example is shown in Scheme 1. Compound A was synthesized in 5 steps using Compound 1 and Compound 3 as starting materials. Compound 5 produced by the glycosylation reaction of Compound 2 and Compound 4 becomes a β / α mixture. The β / α mixture was purified to remove the α-glycosylated product to obtain Compound 6, followed by deprotection to obtain Compound A.
スキーム1:
(使用分析機器及び分析条件)
<化合物5及び化合物6の合成>
(1)高速液体クロマトグラフィー(HPLC)測定装置:LC−10(島津製作所)
カラム:ODS−100Z(4.6×150mm)(東ソー)
カラム温度:40℃
溶離液A:H2O/HCOOH=1000/1
溶離液B:アセトニトリル/HCOOH=1000/1
勾配条件:溶離液Bの濃度:0−0.01 分(60%),0.01−17.5分(60%→95%),17.5−22.5分(95%)
流速:1.0mL/分
波長:260nm
注入量:20μL
(2)超高速液体クロマトグラフィー 測定装置:ACQUITY UPLC (Waters)
カラム:BEH C18(2.1×30mm)(Waters)
カラム温度:40℃
溶離液A:H2O/HCOOH=1000/1
溶離液B:アセトニトリル/HCOOH=1000/1
勾配条件:溶離液Bの濃度:0−2 分(5%→95%),2−3分(95%)
流速:0.5mL/分
波長:254nm
注入量:1μL
(3)核磁気共鳴装置: AV400(BRUKER)
(Analytical instruments used and analysis conditions)
<Synthesis of Compound 5 and Compound 6>
(1) High performance liquid chromatography (HPLC) measuring device: LC-10 (Shimadzu Corporation)
Column: ODS-100Z (4.6 × 150 mm) (Tosoh)
Column temperature: 40 ° C
Eluent A: H 2 O / HCOOH = 1000/1
Eluent B: Acetonitrile / HCOOH = 1000/1
Gradient conditions: Concentration of eluent B: 0-0.01 min (60%), 0.01-17.5 min (60% → 95%), 17.5-22.5 min (95%)
Flow rate: 1.0 mL / min Wavelength: 260 nm
Injection volume: 20 μL
(2) Ultra-high performance liquid chromatography Measuring device: ACQUITY UPLC (Waters)
Column: BEH C18 (2.1 x 30 mm) (Waters)
Column temperature: 40 ° C
Eluent A: H 2 O / HCOOH = 1000/1
Eluent B: Acetonitrile / HCOOH = 1000/1
Gradient conditions: Concentration of eluent B: 0-2 minutes (5% → 95%), 2-3 minutes (95%)
Flow rate: 0.5 mL / min Wavelength: 254 nm
Injection volume: 1 μL
(3) Nuclear magnetic resonance apparatus: AV400 (BRUKER)
<化合物Aの合成>
(1)HPLC解析装置:LC−10(島津製作所)
UV検出器:LC−10AMT/SPD−M10A
カラム:ODS−100Z(4.6×150 mm)(東ソー)
カラム温度:40 ℃
溶離液A:H2O/HCOOH=1000/1
溶離液B:アセトニトリル/HCOOH=1000/1
勾配条件:溶離液B濃度:0−0.01分(60%)→17.50分(95%)→22.5分(95%)
流速:1.0mL/分
波長:260nm
注入量:20μL
(2)核磁気共鳴装置: AV30(BRUKER)
<Synthesis of Compound A>
(1) HPLC analyzer: LC-10 (Shimadzu Corporation)
UV detector: LC-10AMT / SPD-M10A
Column: ODS-100Z (4.6 × 150 mm) (Tosoh)
Column temperature: 40 ° C
Eluent A: H 2 O / HCOOH = 1000/1
Eluent B: Acetonitrile / HCOOH = 1000/1
Gradient condition: Eluent B concentration: 0-0.01 min (60%) → 17.50 min (95%) → 22.5 min (95%)
Flow rate: 1.0 mL / min Wavelength: 260 nm
Injection volume: 20 μL
(2) Nuclear magnetic resonance apparatus: AV30 (BRUKER)
合成例1:化合物2の合成
5Lフラスコ中、メカニカルスターラーで撹拌しながら化合物1(国際公開WO2014/027658号公報の実施例22に記載)(350.0g、0.8365mol)をCH2Cl2(1400mL)に溶解させ、10℃以下に冷却した。この溶液に対し、30%HBr in AcOH(451.2g、1.673mol)を滴下漏斗から1時間以上かけて添加した後、15〜25℃で1時間反応を行った。1H NMRによる反応終点確認後、反応液を10℃以下に冷却し、水道水(2800mL)を加えた。反応液を5分間以上撹拌した後、5L分液ロートに移液、静置し、有機層(下層)を元の5Lフラスコに抜き取った。5L分液ロートに残った水層(上層)にCH2Cl2(700mL)を加えて再抽出を行い、有機層(下層)を抜き取って先の有機層と合わせた。この有機層に対してNaHCO3(123.0g、1.464mol)と水道水(2800mL)から調製した炭酸水素ナトリウム水溶液を添加し、5分間以上撹拌した後、5L分液ロートに移液、静置した後、有機層(下層)を元の5Lフラスコに抜き取った。この有機層に対し水道水(2800mL)を加え、5分間以上撹拌した後、5L分液ロートに移液、静置した。有機層(下層)を風袋重量1625.6gの3Lフラスコに抜き取り、この有機層を内温38℃以下を維持しながら液重量が704.4gになるまで減圧濃縮した。この濃縮液にCHCl3(1050mL)を加えた後、内温38℃以下を維持しながら液重量が905.4gになるまで再度減圧濃縮した。この濃縮液にCHCl3を適量加えることで、化合物2の淡黄褐色溶液(1040.8g)を得た(化合物2のα/β=82/18、1H NMR)。この化合物2の溶液はそのまま化合物5の合成に用いた。
Synthesis Example 1 Synthesis of Compound 2 Compound 1 (described in Example 22 of International Publication WO2014 / 027658) (350.0 g, 0.8365 mol) was added to CH 2 Cl 2 (with a mechanical stirrer in a 5 L flask while stirring with a mechanical stirrer. 1400 mL) and cooled to 10 ° C. or lower. To this solution, 30% HBr in AcOH (451.2 g, 1.673 mol) was added from a dropping funnel over 1 hour or more, followed by reaction at 15 to 25 ° C. for 1 hour. After confirming the reaction end point by 1 H NMR, the reaction solution was cooled to 10 ° C. or lower, and tap water (2800 mL) was added. The reaction solution was stirred for 5 minutes or more, then transferred to a 5 L separatory funnel and allowed to stand, and the organic layer (lower layer) was extracted into the original 5 L flask. CH 2 Cl 2 (700 mL) was added to the aqueous layer (upper layer) remaining in the 5 L separatory funnel to perform re-extraction, and the organic layer (lower layer) was extracted and combined with the previous organic layer. To this organic layer was added an aqueous sodium hydrogen carbonate solution prepared from NaHCO 3 (123.0 g, 1.464 mol) and tap water (2800 mL), and the mixture was stirred for 5 minutes or more, then transferred to a 5 L separatory funnel. After placing, the organic layer (lower layer) was extracted into the original 5 L flask. Tap water (2800 mL) was added to the organic layer, and the mixture was stirred for 5 minutes or more, then transferred to a 5 L separatory funnel and allowed to stand. The organic layer (lower layer) was extracted into a 3 L flask having a tare weight of 1625.6 g, and this organic layer was concentrated under reduced pressure until the liquid weight reached 704.4 g while maintaining the internal temperature at 38 ° C. or lower. CHCl 3 (1050 mL) was added to the concentrated solution, and the solution was concentrated again under reduced pressure until the weight of the solution reached 905.4 g while maintaining the internal temperature at 38 ° C. or lower. An appropriate amount of CHCl 3 was added to this concentrated liquid to obtain a light tan solution (1040.8 g) of compound 2 (α / β of compound 2 = 82/18, 1 H NMR). The solution of Compound 2 was used for the synthesis of Compound 5 as it was.
合成例2:化合物4の合成
メカニカルスターラーと水冷コンデンサーを備えた3Lフラスコ中で、1,1,1,3,3,3−ヘキサメチルジシラザン(HMDS;486.0g、3.011mol)、チミン(化合物3)(Aldrich社)(189.9g、1.506mol)、トルエン(700mL)及び(NH4)2SO4(5.53g、41.8mmol)の懸濁液を窒素気流(140±70mL/分)下、外温120℃で透明溶液になるまで加熱撹拌した。透明溶液になってから更に0.5時間反応を行い、フラスコ内の残存物重量が420g以下になるまで減圧濃縮を行った後、室温に冷却することで、393.4g(収率96.6%)の化合物4(淡黄褐色油状物)を得た。
Synthesis Example 2: Synthesis of Compound 4 In a 3 L flask equipped with a mechanical stirrer and a water-cooled condenser, 1,1,1,3,3,3-hexamethyldisilazane (HMDS; 486.0 g, 3.011 mol), thymine A suspension of (Compound 3) (Aldrich) (189.9 g, 1.506 mol), toluene (700 mL) and (NH 4 ) 2 SO 4 (5.53 g, 41.8 mmol) was subjected to a nitrogen stream (140 ± 70 mL). / Min) and stirred at an external temperature of 120 ° C. until a clear solution was obtained. The reaction was further continued for 0.5 hours after becoming a transparent solution, and after concentration under reduced pressure until the weight of the residue in the flask became 420 g or less, 393.4 g (yield 96.6) was obtained by cooling to room temperature. %) Of compound 4 (light tan oil).
実施例A1:化合物5の合成(グリコシル化反応)
合成例2で合成した化合物4に対し、合成例1で合成した化合物2の溶液を添加し、更に化合物2の溶液が入っていたフラスコをCHCl3(70mL)で洗浄し、この洗浄液を添加した。この溶液を窒素気流(140±70mL/分)下、63℃で22時間反応を行った。なお、化合物2の合成では、CH2Cl2を用いることからそのような溶媒が僅かに入ることもあるが、63℃で加熱することでCH2Cl2は揮発することから、本発明のグリコシル化反応はCHCl3溶媒中で進行していると言える。反応終点の確認後、この反応液を冷却し、CH2Cl2(1750mL)を加え、内温15℃に冷却した。
Example A1: Synthesis of compound 5 (glycosylation reaction)
To the compound 4 synthesized in Synthesis Example 2, the solution of Compound 2 synthesized in Synthesis Example 1 was added, and the flask containing the solution of Compound 2 was washed with CHCl 3 (70 mL), and this washing solution was added. . This solution was reacted at 63 ° C. for 22 hours under a nitrogen stream (140 ± 70 mL / min). In addition, in the synthesis of Compound 2, such a solvent may enter a little because CH 2 Cl 2 is used, but CH 2 Cl 2 volatilizes when heated at 63 ° C. It can be said that the conversion reaction proceeds in a CHCl 3 solvent. After confirming the reaction end point, the reaction solution was cooled, CH 2 Cl 2 (1750 mL) was added, and the internal temperature was cooled to 15 ° C.
反応終点の確認は、
(化合物2の面積値)/[(化合物2の面積値)+(化合物5の面積値)]≦2.0%(HPLC)
を満たすことを確認することで行った。
Confirmation of reaction end point
(Area value of Compound 2) / [(Area value of Compound 2) + (Area value of Compound 5)] ≦ 2.0% (HPLC)
It was done by confirming that
反応液に水道水(105mL)を滴下した後、加熱還流を5分間以上行い、化合物5を溶解させた。この溶液を30±5℃になるまで冷却し、185mmヌッチェにて不溶物を濾別した。この不溶物をCH2Cl2(700mL×2)で洗浄し、濾過母液と洗浄液をあわせ、化合物5のCH2Cl2溶液を得た。この濾過母液にCH2Cl2(700mL)及び水道水(945mL)を加えて固体の溶解を確認した後、5分間以上撹拌し、溶液を5L分液ロートに移液し、静置した。有機層(下層)を元の5Lフラスコに抜き取り、この有機層に水道水(2800mL)を加えた後、重曹水(NaHCO3(1.5g)と水道水(30mL)から調製)で水層のpHを6.0〜8.0に調整した。溶液を5分間以上撹拌し、5L分液ロートに移液し、静置した。有機層(下層)を元の5Lフラスコに抜き取り、この有機層に水道水(2800mL)を加え、5分以上撹拌し、溶液を5L分液ロートに移液し、静置した。有機層(下層)を晶析用の5Lフラスコに抜き取り、内温が50℃に到達するまで常圧濃縮した。この濃縮液にAcOEt(2100mL)を添加し(添加途中で結晶が析出)、フラスコ内の液重量が1505.2gになるまで常圧濃縮した後、適量のAcOEtを加え1664gの懸濁液を得た。この懸濁液を5分間以上加熱還流した後、1時間以上かけて内温10℃まで徐冷却し、氷浴上で更に1時間以上撹拌した。析出した結晶を150mmヌッチェにて濾取し、5℃以下に冷却したAcOEt(525mL)で洗浄して化合物5の湿固体328.4gを得た。この湿固体を減圧乾燥器(50℃)にて4時間以上乾燥することで、化合物5を白色粉末(325.7g)として得た(収率80.4%)。β体及びα体のHPLC面積比(260nm)は74:26であった。
上記した化合物5の合成を全部で5バッチ行い、1636gの化合物5を得た(収率80.8%)。
Tap water (105 mL) was added dropwise to the reaction solution, followed by heating under reflux for 5 minutes or more to dissolve compound 5. This solution was cooled to 30 ± 5 ° C., and insoluble matters were filtered off with a 185 mm Nutsche. This insoluble material was washed with CH 2 Cl 2 (700 mL × 2), and the filtrate mother liquor and the washing solution were combined to obtain a CH 2 Cl 2 solution of compound 5. CH 2 Cl 2 (700 mL) and tap water (945 mL) were added to this filtered mother liquor to confirm dissolution of the solid, and the mixture was stirred for 5 minutes or more. The solution was transferred to a 5 L separatory funnel and allowed to stand. Extract the organic layer (lower layer) into the original 5 L flask, add tap water (2800 mL) to this organic layer, and then add the aqueous layer with sodium bicarbonate water (prepared from NaHCO 3 (1.5 g) and tap water (30 mL)). The pH was adjusted to 6.0-8.0. The solution was stirred for 5 minutes or more, transferred to a 5 L separatory funnel, and allowed to stand. The organic layer (lower layer) was extracted into the original 5 L flask, tap water (2800 mL) was added to the organic layer, and the mixture was stirred for 5 minutes or more. The solution was transferred to a 5 L separatory funnel and allowed to stand. The organic layer (lower layer) was extracted into a 5 L flask for crystallization and concentrated at normal pressure until the internal temperature reached 50 ° C. AcOEt (2100 mL) was added to this concentrated solution (crystals were precipitated during the addition), and after concentration at atmospheric pressure until the liquid weight in the flask became 1505.2 g, an appropriate amount of AcOEt was added to obtain 1664 g of a suspension. It was. The suspension was heated to reflux for 5 minutes or more, then slowly cooled to an internal temperature of 10 ° C. over 1 hour, and further stirred on an ice bath for 1 hour or more. The precipitated crystals were collected by filtration with a 150 mm Nutsche, and washed with AcOEt (525 mL) cooled to 5 ° C. or lower to obtain 328.4 g of Compound 5 as a wet solid. This wet solid was dried in a vacuum dryer (50 ° C.) for 4 hours or longer to obtain Compound 5 as a white powder (325.7 g) (yield 80.4%). The HPLC area ratio (260 nm) of β-form and α-form was 74:26.
A total of 5 batches of the above compound 5 were synthesized to obtain 1636 g of compound 5 (yield 80.8%).
実施例B1:化合物6の生成(分離精製、脱保護)
冷却管を備えた5Lフラスコ中、メカニカルスターラーで撹拌しながら実施例A1で合成された化合物5(460g、0.949mol)に対し2−ブタノン(MEK(メチルエチルケトン)とも言う;4600mL、10v/w)を加え、80〜82℃で加熱還流して結晶を完全に溶解させた。この溶液を64℃まで冷却し、化合物6の種結晶(0.46g、0.1質量%)を加え、内温56〜64℃で20分間以上撹拌した。この晶析溶液を1時間以上かけて内温10℃まで徐冷却し、内温5〜10℃で更に1時間以上撹拌した。析出した結晶を150mmヌッチェを用いて濾取し、10℃以下に冷却したAcOEt(960ml)で結晶を洗浄することで、化合物6の湿結晶325.9gを得た。この湿結晶を4時間以上真空乾燥(50℃、≦20mmHg)(101325パスカル=760mmHg)することにより、化合物6を無色結晶(276.9g)として得た(収率60.2%)。本結晶中の化合物6のHPLC面積%(波長λ=260nm)は99.4%であった。
Example B1: Formation of compound 6 (separation, purification, deprotection)
2-butanone (also referred to as MEK (methyl ethyl ketone); 4600 mL, 10 v / w) against compound 5 (460 g, 0.949 mol) synthesized in Example A1 while stirring with a mechanical stirrer in a 5 L flask equipped with a condenser. And heated to reflux at 80 to 82 ° C. to completely dissolve the crystals. The solution was cooled to 64 ° C., seed crystals of compound 6 (0.46 g, 0.1% by mass) were added, and the mixture was stirred at an internal temperature of 56 to 64 ° C. for 20 minutes or more. This crystallization solution was gradually cooled to an internal temperature of 10 ° C. over 1 hour or more, and further stirred at an internal temperature of 5 to 10 ° C. for 1 hour or more. The precipitated crystals were collected by filtration using a 150 mm Nutsche, and washed with AcOEt (960 ml) cooled to 10 ° C. or lower to obtain 325.9 g of wet crystals of Compound 6. The wet crystals were vacuum-dried (50 ° C., ≦ 20 mmHg) for 4 hours or longer (101325 Pascal = 760 mmHg) to obtain Compound 6 as colorless crystals (276.9 g) (yield 60.2%). The HPLC area% (wavelength λ = 260 nm) of Compound 6 in the crystals was 99.4%.
化合物6のデータ:
1H NMR (CDCl3) δ: 8.30 (br, 1H), 8.14-8.01 (m, 4H), 7.74-7.70 (m, 1H), 7.67-7.57 (m, 2H), 7.53-7.44 (m, 4H), 6.79 (dd, J1 = 24.6 Hz, J2 = 3.6 Hz, 1H), 5.91-5.84 (m, 1H), 5.29 (ddd,5.92 (1H, ddd, J1 = 49.5 Hz, J2 = 3.6 Hz, J3 = 2.1 Hz), 4.79-4.63 (m, 2H), 4.02 (dd, J1 = 7.5 Hz, J2 = 7.5 Hz, 1H), 1.96 (s, 3H).
上記した化合物6の合成を合計3バッチ行い、808gの化合物6を得た(収率59.0%)。
Data for Compound 6:
1 H NMR (CDCl 3 ) δ: 8.30 (br, 1H), 8.14-8.01 (m, 4H), 7.74-7.70 (m, 1H), 7.67-7.57 (m, 2H), 7.53-7.44 (m, 4H ), 6.79 (dd, J 1 = 24.6 Hz, J 2 = 3.6 Hz, 1H), 5.91-5.84 (m, 1H), 5.29 (ddd, 5.92 (1H, ddd, J 1 = 49.5 Hz, J 2 = 3.6 Hz, J 3 = 2.1 Hz), 4.79-4.63 (m, 2H), 4.02 (dd, J 1 = 7.5 Hz, J 2 = 7.5 Hz, 1H), 1.96 (s, 3H).
A total of three batches of the above-described compound 6 were synthesized to obtain 808 g of compound 6 (yield 59.0%).
実施例C1:化合物Aの合成
メカニカルスターラーと冷却管を備えた3Lフラスコ中、化合物6(350g、0.722mol)、MeOH(2100mL)、Et2NH(528g、7.22mol)を混合し懸濁液とし、窒素気流下で5時間以上加熱還流させた。反応終点の確認後、均一となった反応液を28℃まで冷却し、125mmヌッチェにて除塵濾過を行った。
反応終点の確認は、
(化合物Aの面積値)/[(化合物Aの面積値)+(反応中間体の面積値)+(化合物6の面積値)]≧99.0%(HPLC)
を満たすことを確認することで行った。
Example C1: Synthesis of Compound A Compound 6 (350 g, 0.722 mol), MeOH (2100 mL), Et 2 NH (528 g, 7.22 mol) were mixed and suspended in a 3 L flask equipped with a mechanical stirrer and a condenser. The solution was heated to reflux for 5 hours or more under a nitrogen stream. After confirming the end point of the reaction, the uniform reaction solution was cooled to 28 ° C. and subjected to dust removal filtration with a 125 mm Nutsche.
Confirmation of reaction end point
(Area value of compound A) / [(Area value of compound A) + (Area value of reaction intermediate) + (Area value of compound 6)] ≧ 99.0% (HPLC)
It was done by confirming that
反応に用いたフラスコ及びヌッチェをMeOH(175mL)で洗浄し、濾過母液と合わせた。この溶液重量が786.7gになるまで減圧濃縮を行った後、AcOEt(3500mL)を添加し、化合物Aの結晶の析出が始まるまで常圧濃縮を行った(結晶析出時の液重量は1464.7g)。この懸濁液を10分間加熱還流した後、1時間以上かけて内温10℃まで徐冷却を行い、内温が10℃に到達してから更に1時間撹拌した。析出した結晶を125mmヌッチェにて濾取し、10℃以下に冷却したAcOEt(350mL)で洗浄することで化合物Aの湿結晶(194.3g)を得た。この湿結晶を4時間真空乾燥(設定温度:50℃)することにより、化合物Aを淡黄褐色結晶(178.5g)として得た(収率89.4%)。 The flask and Nutsche used for the reaction were washed with MeOH (175 mL) and combined with the filtered mother liquor. After concentration under reduced pressure until the weight of the solution reached 786.7 g, AcOEt (3500 mL) was added, and atmospheric pressure concentration was performed until precipitation of Compound A crystals began (the liquid weight at the time of crystal precipitation was 1464.). 7g). The suspension was heated to reflux for 10 minutes and then gradually cooled to an internal temperature of 10 ° C. over 1 hour. After the internal temperature reached 10 ° C., the suspension was further stirred for 1 hour. The precipitated crystals were collected by filtration with a 125 mm Nutsche and washed with AcOEt (350 mL) cooled to 10 ° C. or lower to obtain wet crystals (194.3 g) of Compound A. The wet crystals were vacuum dried (set temperature: 50 ° C.) for 4 hours to obtain Compound A as pale tan crystals (178.5 g) (yield 89.4%).
化合物Aのデータ:
1H NMR (DMSO-d6) δ: 11.41 (br, 1H), 8.09 (s, 1H), 6.24 (dd, J1 = 8.7 Hz, J2 = 5.7 Hz, 1H), 5.92 (d, J = 4.2 Hz, 1H), 5.44 (t, J = 4.8 Hz, 1H), 5.00 (ddd, J1 = 50.1 Hz, J2 = 6.9 Hz, J3 = 6.9 Hz, 1H), 4.30-4.18 (m, 1H), 3.76-3.66 (m, 2H), 3.17 (dd, J1 = 10.8 Hz, J2 = 5.4 Hz, 1H), 1.79 (s, 3H).
上記した化合物Aの合成を合計2バッチ行い、化合物Aを無色結晶として合計359.9g得た(収率90.2%)。
Data for Compound A:
1 H NMR (DMSO-d 6 ) δ: 11.41 (br, 1H), 8.09 (s, 1H), 6.24 (dd, J 1 = 8.7 Hz, J 2 = 5.7 Hz, 1H), 5.92 (d, J = 4.2 Hz, 1H), 5.44 (t, J = 4.8 Hz, 1H), 5.00 (ddd, J 1 = 50.1 Hz, J 2 = 6.9 Hz, J 3 = 6.9 Hz, 1H), 4.30-4.18 (m, 1H ), 3.76-3.66 (m, 2H), 3.17 (dd, J 1 = 10.8 Hz, J 2 = 5.4 Hz, 1H), 1.79 (s, 3H).
A total of two batches of the synthesis of Compound A described above were carried out to obtain a total of 359.9 g of Compound A as colorless crystals (yield 90.2%).
実施例A2(グリコシル化反応)
実施例A1において化合物2と化合物4との反応の反応時間を22時間から15時間に変更したこと以外は、実施例A1と同様にして、化合物5を合成した。
化合物5の収率は、48%であった。β体及びα体のHPLC面積比(260nm)は74:26であった。
Example A2 (glycosylation reaction)
Compound 5 was synthesized in the same manner as in Example A1, except that the reaction time of the reaction between Compound 2 and Compound 4 in Example A1 was changed from 22 hours to 15 hours.
The yield of compound 5 was 48%. The HPLC area ratio (260 nm) of β-form and α-form was 74:26.
実施例A3
実施例A1において化合物2と化合物4との反応の反応温度を63℃から55℃に変更し,反応時間を48時間に変更したこと以外は、実施例A1と同様にして、化合物5を合成した。
化合物5の収率は、100%であった。β体及びα体のHPLC面積比(254nm)は74:26であった。
Example A3
Compound 5 was synthesized in the same manner as in Example A1, except that the reaction temperature of the reaction between Compound 2 and Compound 4 in Example A1 was changed from 63 ° C. to 55 ° C., and the reaction time was changed to 48 hours. .
The yield of compound 5 was 100%. The HPLC area ratio (254 nm) of β-form and α-form was 74:26.
実施例A4
実施例A1において化合物2と化合物4との反応の反応温度を63℃から75℃に変更したこと以外は、実施例A1と同様にして、化合物5を合成した。
化合物5の収率は、97%であった。β体及びα体のHPLC面積比(254 nm) は62:38であった。
Example A4
Compound 5 was synthesized in the same manner as in Example A1, except that the reaction temperature of the reaction between Compound 2 and Compound 4 in Example A1 was changed from 63 ° C. to 75 ° C.
The yield of compound 5 was 97%. The HPLC area ratio (254 nm) of β-form and α-form was 62:38.
実施例A5
実施例A1において化合物2と化合物4との反応の反応温度を63℃から85℃に変更し、反応時間を14時間に変更したこと以外は、実施例A1と同様にして、化合物5を合成した。
化合物5の収率は、97%であった。β体及びα体のHPLC面積比(254nm)は65:35であった。
Example A5
Compound 5 was synthesized in the same manner as in Example A1, except that the reaction temperature of the reaction between Compound 2 and Compound 4 in Example A1 was changed from 63 ° C. to 85 ° C. and the reaction time was changed to 14 hours. .
The yield of compound 5 was 97%. The HPLC area ratio (254 nm) of β-form and α-form was 65:35.
実施例A6:化合物5の合成(グリコシル化反応)
実施例A1における化合物2と化合物4との反応において、反応条件を次のように変更したこと以外は、実施例A1と同様にして、化合物5を合成した。即ち、実施例A6においては、反応温度を段階的に昇温(50℃で3時間、60℃で3時間、70℃で4時間、75℃で6時間、80℃で5時間)して反応させた。反応終点をHPLCで確認し、実施例A1と同様の方法で後処理を行って化合物5を単離したところ、β体及びα体のHPLC面積比(260nm)は7:3であった。
Example A6: Synthesis of compound 5 (glycosylation reaction)
Compound 5 was synthesized in the same manner as in Example A1, except that the reaction conditions were changed as follows in the reaction of Compound 2 and Compound 4 in Example A1. That is, in Example A6, the reaction temperature was raised stepwise (50 ° C. for 3 hours, 60 ° C. for 3 hours, 70 ° C. for 4 hours, 75 ° C. for 6 hours, 80 ° C. for 5 hours). I let you. The reaction end point was confirmed by HPLC, and post-treatment was performed in the same manner as in Example A1 to isolate Compound 5. As a result, the HPLC area ratio (260 nm) of β-form and α-form was 7: 3.
実施例A7:化合物5の合成(グリコシル化反応)
実施例A1における化合物2と化合物4との反応において、反応条件を次のように変更したこと以外は、実施例A1と同様にして、化合物5を合成した。即ち、実施例A7においては、45℃から70℃まで徐々に昇温して14時間反応させた後、70〜75℃で更に8時間反応させた。反応終点をHPLCで確認し,実施例A1と同様の方法で後処理を行って化合物5を単離したところ,β体及びα体のHPLC面積比(260nm)は7:3であった。
Example A7: Synthesis of compound 5 (glycosylation reaction)
Compound 5 was synthesized in the same manner as in Example A1, except that the reaction conditions were changed as follows in the reaction of Compound 2 and Compound 4 in Example A1. That is, in Example A7, the temperature was gradually raised from 45 ° C. to 70 ° C. and reacted for 14 hours, and then reacted at 70 to 75 ° C. for 8 hours. The reaction end point was confirmed by HPLC, and post-treatment was performed in the same manner as in Example A1 to isolate compound 5. As a result, the HPLC area ratio (260 nm) of β-form and α-form was 7: 3.
比較例A1
実施例A1において化合物2と化合物4との反応の溶媒をCHCl3からトルエンに変更し、反応温度を85℃、反応時間を14時間に変更したこと以外は、実施例A1と同様にして、化合物5を合成した。
化合物5の収率は、27%であった。β体及びα体のHPLC面積比(260nm)は48:52であった。
Comparative Example A1
In the same manner as in Example A1, except that the solvent for the reaction between Compound 2 and Compound 4 in Example A1 was changed from CHCl 3 to toluene, the reaction temperature was changed to 85 ° C., and the reaction time was changed to 14 hours. 5 was synthesized.
The yield of compound 5 was 27%. The HPLC area ratio (260 nm) of β-form and α-form was 48:52.
比較例A2
実施例A1において化合物2と化合物4との反応の溶媒をCHCl3からトルエンに変更し、反応温度を100℃、反応時間を8時間に変更したこと以外は、実施例A1と同様にして、化合物5を合成した。
化合物5の収率は定量的であったが,β体及びα体のHPLC面積比(260nm)は33:67であった。
Comparative Example A2
In the same manner as in Example A1, except that the solvent for the reaction between Compound 2 and Compound 4 in Example A1 was changed from CHCl 3 to toluene, the reaction temperature was changed to 100 ° C., and the reaction time was changed to 8 hours. 5 was synthesized.
The yield of Compound 5 was quantitative, but the HPLC area ratio (260 nm) of β-form and α-form was 33:67.
比較例A3
実施例A1において化合物2と化合物4との反応の溶媒をCHCl3から1,3−ジメチル−2−イミダゾリジノン(DMI)に変更し、反応温度を75℃、反応時間を9時間に変更したこと以外は、実施例A1と同様にして、化合物5を合成した。
化合物5の収率は、35%であった。β体及びα体のHPLC面積比(260nm)は57:43であった。
Comparative Example A3
In Example A1, the solvent for the reaction between Compound 2 and Compound 4 was changed from CHCl 3 to 1,3-dimethyl-2-imidazolidinone (DMI), the reaction temperature was changed to 75 ° C., and the reaction time was changed to 9 hours. Except for this, compound 5 was synthesized in the same manner as in Example A1.
The yield of compound 5 was 35%. The HPLC area ratio (260 nm) of β-form and α-form was 57:43.
比較例A4
実施例A1において化合物2と化合物4との反応の溶媒をジクロロメタンに変更し、反応温度を42℃に変更したこと以外は、実施例A1と同様にして、化合物5の合成を試みたが、反応は進行しなかった。
Comparative Example A4
Synthesis of Compound 5 was attempted in the same manner as in Example A1, except that the solvent for the reaction between Compound 2 and Compound 4 in Example A1 was changed to dichloromethane and the reaction temperature was changed to 42 ° C. Did not progress.
比較例B1(分離精製、脱保護)
冷却管を備えたフラスコ中、磁気スターラーで撹拌しながら化合物5(2.00g,4.13mmol、β体:α体=74:26)に対しアセトン(20mL、10v/w)を加え、55℃で加熱還流したが、化合物5は完全には溶解しなかった。
Comparative Example B1 (separation and purification, deprotection)
Acetone (20 mL, 10 v / w) was added to Compound 5 (2.00 g, 4.13 mmol, β-form: α-form = 74: 26) while stirring with a magnetic stirrer in a flask equipped with a condenser, and 55 ° C. However, Compound 5 was not completely dissolved.
比較例B2
冷却管を備えたフラスコ中、磁気スターラーで撹拌しながら化合物5(2.00g,4.13mmol、β体:α体=74:26)に対しアセトン(30mL、15v/w)を加え、55℃で加熱還流したが、化合物5は完全には溶解しなかった。
Comparative Example B2
Acetone (30 mL, 15 v / w) was added to Compound 5 (2.00 g, 4.13 mmol, β-form: α-form = 74: 26) in a flask equipped with a cooling tube while stirring with a magnetic stirrer, and 55 ° C. However, Compound 5 was not completely dissolved.
比較例B3
冷却管を備えたフラスコ中、磁気スターラーで撹拌しながら化合物5(2.00g、4.13mmol、β体:α体=74:26)に対し多量のアセトン(40mL、20v/w)を加え、55℃で加熱還流し、化合物5を完全に溶解させた。この溶液を氷浴上で冷却し,30分間熟成させた後に、得られた結晶を濾過して乾燥させることで,化合物6を無色結晶として0.88g得た(収率41%)。本結晶中の化合物6のHPLC面積%(波長λ=260nm)は99.6%であった。
Comparative Example B3
A large amount of acetone (40 mL, 20 v / w) was added to compound 5 (2.00 g, 4.13 mmol, β form: α form = 74: 26) while stirring with a magnetic stirrer in a flask equipped with a condenser. The mixture was heated to reflux at 55 ° C. to completely dissolve compound 5. The solution was cooled on an ice bath and aged for 30 minutes, and then the obtained crystals were filtered and dried to obtain 0.88 g of Compound 6 as colorless crystals (yield 41%). The HPLC area% (wavelength λ = 260 nm) of Compound 6 in the crystals was 99.6%.
比較例B4
冷却管を備えたフラスコ中、磁気スターラーで撹拌しながら化合物5(500mg、1.03mmol、β体:α体=74:26)に対しアセトニトリル(5.0mL、10v/w)を加え、82℃で加熱還流したが、化合物5は完全には溶解しなかった。
Comparative Example B4
In a flask equipped with a condenser tube, acetonitrile (5.0 mL, 10 v / w) was added to Compound 5 (500 mg, 1.03 mmol, β form: α form = 74: 26) while stirring with a magnetic stirrer, and the temperature was 82 ° C. However, Compound 5 was not completely dissolved.
比較例B5
冷却管を備えたフラスコ中、磁気スターラーで撹拌しながら化合物5(500mg、1.03mmol、β体:α体=74:26)に対しアセトニトリル(5.5mL、11v/w)を加え、82℃で加熱還流し、化合物5を完全に溶解させた。この溶液を室温まで冷却し,一晩熟成させた後に析出した固体を濾過して乾燥させることで,化合物6を無色結晶として370mg得た。β体及びα体のHPLC面積比(254nm)は74:26であった。この場合、β体の純度を高めることができなかった。
Comparative Example B5
In a flask equipped with a condenser tube, acetonitrile (5.5 mL, 11 v / w) was added to Compound 5 (500 mg, 1.03 mmol, β form: α form = 74: 26) while stirring with a magnetic stirrer, and the mixture was heated to 82 ° C. The compound 5 was completely dissolved by heating at reflux. The solution was cooled to room temperature, aged overnight, and the precipitated solid was filtered and dried to obtain 370 mg of Compound 6 as colorless crystals. The HPLC area ratio (254 nm) of β-form and α-form was 74:26. In this case, the purity of the β isomer could not be increased.
比較例B6
冷却管を備えたフラスコ中、磁気スターラーで撹拌しながら化合物5(500mg、1.03mmol、β体:α体=74:26)に対し酢酸エチル(5.0mL、10v/w)を加え、77℃で加熱還流したが、化合物5は完全には溶解しなかった。
Comparative Example B6
In a flask equipped with a condenser tube, ethyl acetate (5.0 mL, 10 v / w) was added to Compound 5 (500 mg, 1.03 mmol, β-form: α-form = 74: 26) while stirring with a magnetic stirrer. Although it heated and refluxed at 0 degreeC, the compound 5 did not melt | dissolve completely.
比較例B7
冷却管を備えたフラスコ中、磁気スターラーで撹拌しながら化合物5(500mg、1.03mmol、β体:α体=74:26)に対し酢酸エチル(9.5mL、19v/w)を加え、77℃で加熱還流し、化合物5を完全に溶解させた。この溶液を室温まで冷却し,一晩熟成させた後に析出した固体を濾過して乾燥させることで,化合物6を無色結晶として260mg得た(収率52%)。β体及びα体のHPLC面積比(254nm)は100:0であった。
Comparative Example B7
In a flask equipped with a condenser tube, ethyl acetate (9.5 mL, 19 v / w) was added to Compound 5 (500 mg, 1.03 mmol, β-form: α-form = 74: 26) while stirring with a magnetic stirrer. The mixture was heated to reflux at 0 ° C. to completely dissolve the compound 5. The solution was cooled to room temperature, aged overnight, and the precipitated solid was filtered and dried to obtain 260 mg of Compound 6 as colorless crystals (yield 52%). The HPLC area ratio (254 nm) of β-form and α-form was 100: 0.
Claims (12)
で示される化合物と、下記式(2):
で示される化合物とを反応させる工程を含む、下記式(3):
で示される化合物の製造方法。 In a solvent containing chloroform, the following formula (1):
And a compound represented by the following formula (2):
Including the step of reacting the compound represented by formula (3):
The manufacturing method of the compound shown by these.
で示される化合物をαグリコシル化体とβグリコシル化体との混合物として製造するグリコシル化反応工程:
前記のαグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において再結晶化し、αグリコシル化体を除去する分離精製工程:及び、
前記のβグリコシル化体を脱保護する脱保護工程:
を含む2’−フルオロ−5−メチル−4’−チオアラビノウリジンの製造方法。 According to the method of any one of claims 1 to 4, the formula (3):
A glycosylation reaction step for producing a compound represented by the following as a mixture of α-glycosylated and β-glycosylated:
Separation and purification step of recrystallization of the mixture of the α-glycosylated product and the β-glycosylated product in a solvent containing methyl ethyl ketone to remove the α-glycosylated product:
Deprotection step for deprotecting the β-glycosylated product:
Of 2′-fluoro-5-methyl-4′-thioarabinouridine containing
で示される化合物であるαグリコシル化体とβグリコシル化体との混合物を、メチルエチルケトンを含む溶媒中において再結晶化する工程を含む、前記のαグリコシル化体とβグリコシル化体との混合物からαグリコシル化体を除去する方法。 Formula (3):
A mixture of an α-glycosylated product and a β-glycosylated product, which is a compound represented by the above formula, from the mixture of the α-glycosylated product and the β-glycosylated product, wherein the mixture is recrystallized in a solvent containing methyl ethyl ketone. A method for removing glycosylated products.
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WO2007068113A1 (en) * | 2005-12-16 | 2007-06-21 | Mcgill University | 4'-thioarabinonucleotide-containing oligonucleotides, compounds and methods for their preparation and uses thereof |
WO2009034945A1 (en) * | 2007-09-10 | 2009-03-19 | Yamasa Corporation | Medicinal agent for disease associated with epstein-barr virus, and method for screening of the medicinal agent |
WO2014027658A1 (en) * | 2012-08-13 | 2014-02-20 | 富士フイルム株式会社 | INTERMEDIATE FOR SYNTHESIS OF 1-(2-DEOXY-2-FLUORO-4-THIO-β-D-ARABINOFURANOSYL) CYTOSINE, INTERMEDIATE FOR SYNTHESIS OF THIONUCLEOSIDE, AND METHODS FOR PRODUCING THESE INTERMEDIATES |
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WO2007068113A1 (en) * | 2005-12-16 | 2007-06-21 | Mcgill University | 4'-thioarabinonucleotide-containing oligonucleotides, compounds and methods for their preparation and uses thereof |
WO2009034945A1 (en) * | 2007-09-10 | 2009-03-19 | Yamasa Corporation | Medicinal agent for disease associated with epstein-barr virus, and method for screening of the medicinal agent |
WO2014027658A1 (en) * | 2012-08-13 | 2014-02-20 | 富士フイルム株式会社 | INTERMEDIATE FOR SYNTHESIS OF 1-(2-DEOXY-2-FLUORO-4-THIO-β-D-ARABINOFURANOSYL) CYTOSINE, INTERMEDIATE FOR SYNTHESIS OF THIONUCLEOSIDE, AND METHODS FOR PRODUCING THESE INTERMEDIATES |
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Title |
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JONATHAN K. WATTS, KASHINATH SADALAPURE, NILOUFAR CHOUBDAR, B. MARIO PINTO, AND MASAD J. DAMHA: "Synthesis and Conformational Analysis of 2'-Fluoro-5-methyl-4'-thioarabinouridine(4'S-FMAU)", THE JOURNAL OF ORGANIC CHEMISTRY, vol. 71, JPN6019022314, 2006, pages 921 - 925, XP002606716, ISSN: 0004148551, DOI: 10.1021/JO051844+ * |
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