JP2017200882A - Organic tellurium compound and method for producing the same, and living radical polymerization initiator and method for producing vinyl polymer using the same - Google Patents
Organic tellurium compound and method for producing the same, and living radical polymerization initiator and method for producing vinyl polymer using the same Download PDFInfo
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- JP2017200882A JP2017200882A JP2016092423A JP2016092423A JP2017200882A JP 2017200882 A JP2017200882 A JP 2017200882A JP 2016092423 A JP2016092423 A JP 2016092423A JP 2016092423 A JP2016092423 A JP 2016092423A JP 2017200882 A JP2017200882 A JP 2017200882A
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- 229920002554 vinyl polymer Polymers 0.000 title claims abstract description 81
- 150000003498 tellurium compounds Chemical class 0.000 title claims abstract description 74
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 41
- 238000010526 radical polymerization reaction Methods 0.000 title claims abstract description 36
- 239000007870 radical polymerization initiator Substances 0.000 title claims abstract description 16
- -1 ditellurium compound Chemical class 0.000 claims abstract description 88
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 54
- 239000000178 monomer Substances 0.000 claims abstract description 37
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 29
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000011737 fluorine Substances 0.000 claims abstract description 28
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 25
- 125000003118 aryl group Chemical group 0.000 claims abstract description 20
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 14
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 claims abstract description 14
- 125000002252 acyl group Chemical group 0.000 claims abstract description 13
- 125000003368 amide group Chemical group 0.000 claims abstract description 13
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 13
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims abstract description 12
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 claims abstract description 12
- 125000003107 substituted aryl group Chemical group 0.000 claims abstract description 12
- 239000002904 solvent Substances 0.000 claims description 66
- 238000006243 chemical reaction Methods 0.000 claims description 52
- 125000004432 carbon atom Chemical group C* 0.000 claims description 45
- 238000000034 method Methods 0.000 claims description 44
- 150000001875 compounds Chemical class 0.000 claims description 43
- 239000003638 chemical reducing agent Substances 0.000 claims description 21
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 18
- 238000005406 washing Methods 0.000 claims description 17
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 16
- 229910052714 tellurium Inorganic materials 0.000 claims description 12
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 11
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 9
- 238000004140 cleaning Methods 0.000 claims description 7
- 238000006116 polymerization reaction Methods 0.000 abstract description 22
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 abstract description 3
- 125000000623 heterocyclic group Chemical group 0.000 abstract description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 69
- 239000000243 solution Substances 0.000 description 54
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 36
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 35
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 34
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 30
- 239000000203 mixture Substances 0.000 description 25
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 21
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 15
- 238000003756 stirring Methods 0.000 description 14
- 239000007869 azo polymerization initiator Substances 0.000 description 13
- 229920000642 polymer Polymers 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 11
- JPIIVHIVGGOMMV-UHFFFAOYSA-N ditellurium Chemical compound [Te]=[Te] JPIIVHIVGGOMMV-UHFFFAOYSA-N 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 230000035484 reaction time Effects 0.000 description 11
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 10
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 10
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 8
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000005160 1H NMR spectroscopy Methods 0.000 description 7
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 7
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 7
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 7
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 7
- 229910052794 bromium Inorganic materials 0.000 description 7
- 235000011089 carbon dioxide Nutrition 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 230000001603 reducing effect Effects 0.000 description 7
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000004210 ether based solvent Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 229910052744 lithium Inorganic materials 0.000 description 5
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 5
- 235000019341 magnesium sulphate Nutrition 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000012074 organic phase Substances 0.000 description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 229910052700 potassium Inorganic materials 0.000 description 5
- 239000011591 potassium Substances 0.000 description 5
- 238000011084 recovery Methods 0.000 description 5
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 229910000033 sodium borohydride Inorganic materials 0.000 description 5
- 239000012279 sodium borohydride Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- TULWUZJYDBGXMY-UHFFFAOYSA-N tellurophene Chemical compound [Te]1C=CC=C1 TULWUZJYDBGXMY-UHFFFAOYSA-N 0.000 description 5
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 4
- 235000019270 ammonium chloride Nutrition 0.000 description 4
- 239000000010 aprotic solvent Substances 0.000 description 4
- 239000003849 aromatic solvent Substances 0.000 description 4
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 4
- BHIWKHZACMWKOJ-UHFFFAOYSA-N methyl isobutyrate Chemical compound COC(=O)C(C)C BHIWKHZACMWKOJ-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 239000002798 polar solvent Substances 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 239000003586 protic polar solvent Substances 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 238000001953 recrystallisation Methods 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 239000011780 sodium chloride Substances 0.000 description 4
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- 238000005292 vacuum distillation Methods 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- QIROQPWSJUXOJC-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6-undecafluoro-6-(trifluoromethyl)cyclohexane Chemical compound FC(F)(F)C1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F QIROQPWSJUXOJC-UHFFFAOYSA-N 0.000 description 3
- CRRUGYDDEMGVDY-UHFFFAOYSA-N 1-bromoethylbenzene Chemical compound CC(Br)C1=CC=CC=C1 CRRUGYDDEMGVDY-UHFFFAOYSA-N 0.000 description 3
- CKZPMYDFTCDDTB-UHFFFAOYSA-N 1h-naphthalen-1-ide Chemical compound [C-]1=CC=CC2=CC=CC=C21 CKZPMYDFTCDDTB-UHFFFAOYSA-N 0.000 description 3
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- 239000012448 Lithium borohydride Substances 0.000 description 3
- 235000019502 Orange oil Nutrition 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- IYYIVELXUANFED-UHFFFAOYSA-N bromo(trimethyl)silane Chemical compound C[Si](C)(C)Br IYYIVELXUANFED-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229940043279 diisopropylamine Drugs 0.000 description 3
- 230000002140 halogenating effect Effects 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000010502 orange oil Substances 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- 125000004343 1-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C([H])([H])[H] 0.000 description 2
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 2
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 2
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 2
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910000085 borane Inorganic materials 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 150000001993 dienes Chemical class 0.000 description 2
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- IOLQWGVDEFWYNP-UHFFFAOYSA-N ethyl 2-bromo-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)Br IOLQWGVDEFWYNP-UHFFFAOYSA-N 0.000 description 2
- WDAXFOBOLVPGLV-UHFFFAOYSA-N ethyl isobutyrate Chemical compound CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 2
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- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- CYTJMBLSQUBVMS-UHFFFAOYSA-N n-[[2-cyanopropan-2-yl(formyl)amino]hydrazinylidene]formamide Chemical compound N#CC(C)(C)N(C=O)NN=NC=O CYTJMBLSQUBVMS-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- WMRNGPYHLQSTDL-UHFFFAOYSA-N n-cyclohexyl-2-[[1-(cyclohexylamino)-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound C1CCCCC1NC(=O)C(C)(C)N=NC(C)(C)C(=O)NC1CCCCC1 WMRNGPYHLQSTDL-UHFFFAOYSA-N 0.000 description 1
- RQAKESSLMFZVMC-UHFFFAOYSA-N n-ethenylacetamide Chemical compound CC(=O)NC=C RQAKESSLMFZVMC-UHFFFAOYSA-N 0.000 description 1
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- HTKPDYSCAPSXIR-UHFFFAOYSA-N octyltrimethylammonium ion Chemical compound CCCCCCCC[N+](C)(C)C HTKPDYSCAPSXIR-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000434 poly[(mercaptopropyl)methylsiloxane] polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- ZMJJCODMIXQWCQ-UHFFFAOYSA-N potassium;di(propan-2-yl)azanide Chemical compound [K+].CC(C)[N-]C(C)C ZMJJCODMIXQWCQ-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 125000005920 sec-butoxy group Chemical group 0.000 description 1
- 125000005930 sec-butyloxycarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 239000012419 sodium bis(2-methoxyethoxy)aluminum hydride Substances 0.000 description 1
- OAUIDYPYFUIPIE-UHFFFAOYSA-N sodium propan-2-ylazanide Chemical compound [Na+].CC(C)[NH-] OAUIDYPYFUIPIE-UHFFFAOYSA-N 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229940066769 systemic antihistamines substituted alkylamines Drugs 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Abstract
Description
本発明は、有機テルル化合物及びその製造方法並びにリビングラジカル重合開始剤及びそれを用いたビニル重合体の製造方法に関する。 The present invention relates to an organic tellurium compound, a method for producing the same, a living radical polymerization initiator, and a method for producing a vinyl polymer using the same.
リビングラジカル重合法は、従来のラジカル重合法の簡便性と汎用性を保ちながら、分子構造の精密制御及び均一な組成の重合体の製造を可能とする重合法で、新しい高分子材料の製造に大きな威力を発揮する。そのため、近年、リビングラジカル重合技術の発達はめざましく、様々な手法を用いたリビングラジカル重合法が報告されている。その中でも有機テルル化合物を用いるリビングラジカル重合法であるTERP(organotellurium−mediated living radical polymerization)法は、様々な種類のビニルモノマーの重合に適用できる汎用性と、通常のラジカル重合と変わらぬ実用的な反応条件で重合体の分子量及び分子量分布を高度に制御できる点で特に注目されている重合法である(特許文献1〜4参照)。 The living radical polymerization method is a polymerization method that enables precise control of the molecular structure and the production of a polymer with a uniform composition while maintaining the simplicity and versatility of the conventional radical polymerization method. Demonstrate great power. Therefore, in recent years, the development of living radical polymerization technology has been remarkable, and living radical polymerization methods using various techniques have been reported. Among them, TERP (organotellium-mediated radical polymerization), which is a living radical polymerization method using an organic tellurium compound, is versatile and applicable to polymerization of various types of vinyl monomers, and practically the same as ordinary radical polymerization. This is a polymerization method that has attracted particular attention in that the molecular weight and molecular weight distribution of the polymer can be highly controlled under reaction conditions (see Patent Documents 1 to 4).
一般に、リビングラジカル重合法により得られる重合体の成長末端は、ラジカルが適当な保護基で可逆的に保護されたドーマント末端と称されており、TERP法により得られる重合体の成長末端はPolymer−Te−Rの形態である。このドーマント末端を化学的に除去した重合体が製品として用いられている。 In general, the growth terminal of a polymer obtained by a living radical polymerization method is called a dormant terminal in which a radical is reversibly protected with an appropriate protecting group, and the growth terminal of a polymer obtained by a TERP method is polymer- Te-R form. A polymer obtained by chemically removing the dormant end is used as a product.
一方で、テルルはクラーク数2×10-7%の希少元素であることから、重合末端から除去したテルルを回収することが求められている。例えば、特許文献5では、TERP法で合成したリビングラジカルポリマーにジエン共存下で光照射することで、重合末端ラジカルのカップリング反応が選択的に進行すると共に、有機ジテルル化合物が定量的に副生して回収できることが開示されている。また、特許文献2において有機ジテルル化合物をTERP法に用いることが開示されている。 On the other hand, since tellurium is a rare element having a Clark number of 2 × 10 −7 %, it is required to recover the tellurium removed from the polymerization terminal. For example, in Patent Document 5, when a living radical polymer synthesized by the TERP method is irradiated with light in the presence of a diene, a coupling reaction of polymerization terminal radicals selectively proceeds and an organic ditellurium compound is quantitatively produced as a by-product. It is disclosed that it can be recovered. Patent Document 2 discloses the use of an organic ditellurium compound in the TERP method.
しかし、特許文献5は有機ジテルル化合物の具体的な回収方法について何ら検討が行われていない。また、重合体の二量化反応を必須とするため、重合体の設計が制限されるという問題がある。 However, Patent Document 5 does not discuss any specific method for recovering the organic ditellurium compound. Further, since the polymer dimerization reaction is essential, there is a problem that the design of the polymer is limited.
本発明の目的は、リビングラジカル重合開始剤として用いた場合に、様々な種類のビニルモノマーの重合に適用できる汎用性を有し、かつ重合反応後に高効率で有機ジテルル化合物として回収することができる有機テルル化合物及びその製造方法、並びに該有機テルル化合物を用いたリビングラジカル重合開始剤及びそれを用いたビニル重合体の製造方法を提供することにある。 It is an object of the present invention to have versatility applicable to the polymerization of various types of vinyl monomers when used as a living radical polymerization initiator, and can be recovered as an organic ditellurium compound with high efficiency after the polymerization reaction. An organic tellurium compound and a method for producing the same, and a living radical polymerization initiator using the organic tellurium compound and a method for producing a vinyl polymer using the same.
本発明者らは、フッ素含有アルキル基がテルル原子に結合した構造を有するテルル化合物をリビングラジカル重合開始剤として用いることで、使用した有機テルル化合物を高効率で有機ジテルル化合物として回収できることを見出し、本発明の完成するに至った。 The present inventors have found that by using a tellurium compound having a structure in which a fluorine-containing alkyl group is bonded to a tellurium atom as a living radical polymerization initiator, the used organic tellurium compound can be recovered as an organic ditellurium compound with high efficiency. The present invention has been completed.
すなわち、本発明は、以下の有機テルル化合物及びその製造方法、並びにリビングラジカル重合開始剤、それを用いたビニル重合体の製造方法及びビニル重合体を提供する。 That is, the present invention provides the following organic tellurium compound and a method for producing the same, a living radical polymerization initiator, a method for producing a vinyl polymer using the same, and a vinyl polymer.
項1 下記一般式(1)で表される有機テルル化合物。 Item 1 An organic tellurium compound represented by the following general formula (1).
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。R2及びR3は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基を表す。R4は炭素数1〜8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基又はプロパルギル基を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. R 2 and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. R 4 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group, or a propargyl group. ]
項2 項1に記載の有機テルル化合物を製造する方法であって、下記一般式(4)で表される化合物と塩基とを反応させる工程と、前記反応により得られた化合物と下記一般式(5)で表される化合物とを反応させる工程とを含む、有機テルル化合物の製造方法。 Item 2 A method for producing the organic tellurium compound according to Item 1, wherein the compound represented by the following general formula (4) is reacted with a base, the compound obtained by the reaction and the following general formula ( A process for reacting the compound represented by 5) with a method for producing an organic tellurium compound.
〔式中、R2及びR3は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基を表す。R4は炭素数1〜8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基又はプロパルギル基を表す。〕 [Wherein, R 2 and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. R 4 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group, or a propargyl group. ]
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。Xはハロゲン原子を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. X represents a halogen atom. ]
項3 項1に記載の有機テルル化合物を製造する方法であって、下記一般式(6)で表される有機ジテルル化合物と還元剤とを反応させる工程と、前記反応工程により得られた化合物と下記一般式(7)で表される化合物とを反応させる工程とを含む、有機テルル化合物の製造方法。 Item 3 A method for producing the organic tellurium compound according to Item 1, wherein the organic ditellurium compound represented by the following general formula (6) is reacted with a reducing agent, and the compound obtained by the reaction step: The manufacturing method of an organic tellurium compound including the process with which the compound represented by following General formula (7) is made to react.
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. ]
〔式中、R2及びR3は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基を表す。R4は炭素数1〜8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基又はプロパルギル基を表す。Xはハロゲン原子を表す。〕 [Wherein, R 2 and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. R 4 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group, or a propargyl group. X represents a halogen atom. ]
項4 項1に記載の有機テルル化合物からなるリビングラジカル重合開始剤。 Item 4 A living radical polymerization initiator comprising the organic tellurium compound according to Item 1.
項5 項1に記載の有機テルル化合物を用いてビニルモノマーをリビングラジカル重合し、ビニル重合体を合成する工程(A)と、
前記工程(A)で得られたビニル重合体に還元剤を作用させる工程(B)と、
前記工程(B)で得られたビニル重合体をフッ素系溶媒で洗浄する工程(C)とを備える、ビニル重合体の製造方法。
Item 5: A step of living radical polymerization of a vinyl monomer using the organic tellurium compound of Item 1 to synthesize a vinyl polymer (A);
A step (B) in which a reducing agent is allowed to act on the vinyl polymer obtained in the step (A);
And (C) a step of washing the vinyl polymer obtained in the step (B) with a fluorinated solvent.
項6 前記工程(C)の洗浄が分液洗浄であることを特徴とする、項5に記載のビニル重合体の製造方法。 Item 6. The method for producing a vinyl polymer according to Item 5, wherein the cleaning in the step (C) is a separation cleaning.
項7 項5又は6に記載の方法で製造されたビニル重合体。 Item 7 A vinyl polymer produced by the method according to Item 5 or 6.
本発明によれば、リビングラジカル重合開始剤として用いた場合に、様々な種類のビニルモノマーの重合に適用できる汎用性を有し、かつ重合反応後に高効率で有機ジテルル化合物として回収することができる有機テルル化合物及びその製造方法、並びに該有機テルル化合物を用いたリビングラジカル重合開始剤及びそれを用いたビニル重合体の製造方法を提供することができる。 According to the present invention, when used as a living radical polymerization initiator, it has versatility applicable to the polymerization of various types of vinyl monomers and can be recovered as an organic ditellurium compound with high efficiency after the polymerization reaction. An organic tellurium compound and a method for producing the same, a living radical polymerization initiator using the organic tellurium compound, and a method for producing a vinyl polymer using the same can be provided.
希少元素であるテルルを含む回収した有機ジテルル化合物は、リビングラジカル重合に再利用することもできる。 The recovered organic ditellurium compound containing the rare element tellurium can be reused for living radical polymerization.
以下、本発明を実施した好ましい形態の一例について説明する。但し、以下の実施形態は単なる例示である。本発明は以下の実施形態に何ら限定されない。 Hereinafter, an example of the preferable form which implemented this invention is demonstrated. However, the following embodiments are merely examples. The present invention is not limited to the following embodiments.
<有機テルル化合物>
本発明の有機テルル化合物は、下記一般式(1)で表される。
<Organic tellurium compound>
The organic tellurium compound of the present invention is represented by the following general formula (1).
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。R2及びR3は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基を表す。R4は炭素数1〜8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基又はプロパルギル基を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. R 2 and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. R 4 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group, or a propargyl group. ]
R1で表される基は、具体的には次の通りである。 Specific examples of the group represented by R 1 are as follows.
炭素数1〜20のフッ素含有アルキル基とは、直鎖、分岐又は環状の、炭素数1〜20のアルキル基を構成する炭素原子に結合した水素原子の一部又は全部がフッ素原子で置換されたものであり、好適な具体例としては、例えば、以下の一般式(2)で表される基、一般式(3)で表される基等を挙げることができる。 In the fluorine-containing alkyl group having 1 to 20 carbon atoms, part or all of the hydrogen atoms bonded to the carbon atoms constituting the linear, branched or cyclic alkyl group having 1 to 20 carbon atoms are substituted with fluorine atoms. Suitable specific examples include, for example, a group represented by the following general formula (2), a group represented by the general formula (3), and the like.
〔式中、nは0〜5の整数、mは1〜15の整数を表す。〕 [In formula, n represents the integer of 0-5, m represents the integer of 1-15. ]
nは好ましくは0〜3を示し、mは好ましくは6〜10を示す。 n preferably represents 0 to 3, and m preferably represents 6 to 10.
上記一般式(2)で表される基としては、例えば、(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8−セプタデカフルオロオクチル)基、(2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9−セプタデカフルオロノニル)基、(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)基、(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル)基、(4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11−セプタデカフルオロウンデシル)基、(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13−ヘンエイコサカフルオロドデシル)基を挙げることができる。好ましくは(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル)基、(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル)基であり、更に好ましくは(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル)基である。 Examples of the group represented by the general formula (2) include (1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8). -Septadecafluorooctyl) group, (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-septadecafluorononyl) group, (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) group, (3,3,4,4,5,5,6,6) , 7,7,8,8,9,9,10,10,10-septadecafluorodecyl) group, (4,4,5,5,6,6,7,7,8,8,9,9) , 10,10,11,11,11-septadecafluoroundecyl) group, (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10, 10, 11, 11, 12, 12, 13, 13, 13-f It can be exemplified Eiko Saka fluoro dodecyl) groups. Preferably, (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl) group, (3,3,4,4,5,5,6) , 6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl) group, more preferably (3,3,4,4,5,5,6,6, 7, 7, 8, 8, 9, 9, 10, 10, 10-septadecafluorodecyl) group.
〔式中、qは0〜3の整数、pは1〜9の整数を表す。〕 [In formula, q represents the integer of 0-3, p represents the integer of 1-9. ]
上記一般式(3)で表される基としては、例えば、(1,2,2,3,3,4,4,5,5,6,6−ウンデカフルオロシクロヘキシル)エチル基を挙げることができる。 Examples of the group represented by the general formula (3) include (1,2,2,3,3,4,4,5,5,6,6-undecafluorocyclohexyl) ethyl group. it can.
R2及びR3で表される基は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基であり、各基は、具体的には次の通りである。 The groups represented by R 2 and R 3 are each independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and each group is specifically as follows.
炭素数1〜8のアルキル基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等の直鎖又は分岐鎖アルキル基、シクロヘキシル基等の環状アルキル基等を挙げることができる。好ましくは炭素数1〜4の直鎖又は分岐鎖アルキル基であり、更に好ましくはメチル基又はエチル基である。 Examples of the alkyl group having 1 to 8 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, heptyl. Group, a linear or branched alkyl group such as an octyl group, and a cyclic alkyl group such as a cyclohexyl group. Preferably it is a C1-C4 linear or branched alkyl group, More preferably, it is a methyl group or an ethyl group.
R4で表される基は、炭素数1〜8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基又はプロパルギル基であり、具体的には次の通りである。 The group represented by R 4 is a C 1-8 alkyl group, aryl group, substituted aryl group, aromatic heterocyclic group, alkoxy group, acyl group, amide group, oxycarbonyl group, cyano group, allyl group or A propargyl group, specifically as follows.
炭素数1〜8のアルキル基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等の直鎖又は分岐鎖アルキル基、シクロヘキシル基等の環状アルキル基等を挙げることができる。好ましくは炭素数1〜4の直鎖又は分岐鎖アルキル基であり、更に好ましくはメチル基又はエチル基である。 Examples of the alkyl group having 1 to 8 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, heptyl. Group, a linear or branched alkyl group such as an octyl group, and a cyclic alkyl group such as a cyclohexyl group. Preferably it is a C1-C4 linear or branched alkyl group, More preferably, it is a methyl group or an ethyl group.
アリール基としては、フェニル基、ナフチル基等を挙げることができる。好ましくはフェニル基である。 Examples of the aryl group include a phenyl group and a naphthyl group. A phenyl group is preferred.
置換アリール基としては、置換基を有しているフェニル基、置換基を有しているナフチル基等を挙げることができる。上記置換基を有しているアリール基の置換基としては、例えば、ハロゲン原子、水酸基、アルコキシ基、アミノ基、ニトロ基、シアノ基、−COR41で示されるカルボニル含有基(R41は炭素数1〜8のアルキル基、アリール基、炭素数1〜8のアルコキシ基又はアリーロキシ基)、スルホニル基、トリフルオロメチル基等を挙げることができる。また、これらの置換基は、1個又は2個置換しているのが良い。 Examples of the substituted aryl group include a phenyl group having a substituent and a naphthyl group having a substituent. Examples of the substituent of the aryl group having the above substituent include a halogen atom, a hydroxyl group, an alkoxy group, an amino group, a nitro group, a cyano group, and a carbonyl-containing group represented by —COR 41 (R 41 is the number of carbon atoms). 1-8 alkyl groups, aryl groups, C1-C8 alkoxy groups or aryloxy groups), sulfonyl groups, trifluoromethyl groups, and the like. These substituents may be substituted by one or two.
芳香族ヘテロ環基としては、ピリジル基、フリル基、チエニル基等を挙げることができる。 Examples of the aromatic heterocyclic group include a pyridyl group, a furyl group, and a thienyl group.
アルコキシ基としては、炭素数1〜8のアルキル基が酸素原子に結合した基が好ましく、例えば、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、n−ブトキシ基、sec−ブトキシ基、tet−ブトキシ基、ペンチロキシ基、ヘキシロキシ基、ヘプチロキシ基、オクチロキシ基等を挙げることができる。 The alkoxy group is preferably a group in which an alkyl group having 1 to 8 carbon atoms is bonded to an oxygen atom. For example, methoxy group, ethoxy group, propoxy group, isopropoxy group, n-butoxy group, sec-butoxy group, tet- A butoxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, and the like can be given.
アシル基としては、アセチル基、プロピオニル基、ベンゾイル基等を挙げることができる。 Examples of the acyl group include an acetyl group, a propionyl group, and a benzoyl group.
アミド基としては、−CONR421R422(R421、R422は、それぞれ独立に水素原子、炭素数1〜8のアルキル基又はアリール基)を挙げることがきる。 As the amide group, —CONR 421 R 422 (R 421 and R 422 are each independently a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group) can be exemplified.
オキシカルボニル基としては、−COOR43(R43は水素原子、炭素数1〜8のアルキル基又はアリール基)で表される基が好ましく、例えばカルボキシル基、メトキシカルボニル基、エトキシカルボニル基、プロピキシカルボニル基、n−ブトキシカルボニル基、sec−ブトキシカルボニル基、ter−ブトキシカルボニル基、n−ペントキシカルボニル基、フェノキシカルボニル基等を挙げることができる。好ましいオキシカルボニル基としては、メトキシカルボニル基、エトキシカルボニル基がよい。 As the oxycarbonyl group, a group represented by —COOR 43 (R 43 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group) is preferable. For example, a carboxyl group, a methoxycarbonyl group, an ethoxycarbonyl group, propoxy A carbonyl group, n-butoxycarbonyl group, sec-butoxycarbonyl group, ter-butoxycarbonyl group, n-pentoxycarbonyl group, phenoxycarbonyl group, and the like can be given. Preferred oxycarbonyl groups are a methoxycarbonyl group and an ethoxycarbonyl group.
アリル基としては、−CR441R442−CR443=CR444R445(R441、R442は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基、R443、R444、R445は、それぞれ独立に水素原子、炭素数1〜8のアルキル基又はアリール基であり、それぞれの置換基が環状構造で繋がっていてもよい)等を挙げることができる。 As an allyl group, —CR 441 R 442 —CR 443 = CR 444 R 445 (R 441 and R 442 are each independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, R 443 , R 444 and R 445 are And each independently a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group, and each substituent may be linked by a cyclic structure).
プロパルギル基としては、−CR451R452−C≡CR453(R451、R452は、水素原子又は炭素数1〜8のアルキル基、R453は、水素原子、炭素数1〜8のアルキル基、アリール基又はシリル基)等を挙げることができる。 As the propargyl group, —CR 451 R 452 —C≡CR 453 (R 451 and R 452 are a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, R 453 is a hydrogen atom and an alkyl group having 1 to 8 carbon atoms) , Aryl group or silyl group).
一般式(1)で表される有機テルル化合物は、具体的にはエチル−2−メチル−2−(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8−セプタデカフルオロオクチルテラニル)−プロピオネート、エチル−2−メチル−2−(2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9−セプタデカフルオロノニルテラニル)−プロピオネート、エチル−2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチルテラニル)−プロピオネート、エチル−2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)プロピオネート、エチル−2−メチル−2−(4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11−セプタデカフルオロウンデシルテラニル)−プロピオネート、メチル−2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)−プロピオネート、ジエチルアミノ−2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)−プロピオネート、2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)ル−プロピオニトリル、メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)プロピオネート、1−フェニルエチル 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル テルリド、3−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)−2−メチル−1−プロペン、4−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)−3−メチル−1−ブチン等を挙げることができる。好ましくは、エチル−2−メチル−(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチルテラニル)−プロピオネート、エチル−2−メチル−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)−プロピオネートであり、更に好ましくはエチル−2−メチル−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)−プロピオネートである。 Specifically, the organic tellurium compound represented by the general formula (1) is ethyl-2-methyl-2- (1,1,2,2,3,3,4,4,5,5,6,6). , 7,7,8,8,8-septadecafluorooctylteranyl) -propionate, ethyl-2-methyl-2- (2,2,3,3,4,4,5,5,6,6) 7,7,8,8,9,9,9-septadecafluorononylterranyl) -propionate, ethyl-2-methyl-2- (3,3,4,4,5,5,6,6,7 , 7,8,8,8-tridecafluorooctylterranyl) -propionate, ethyl-2-methyl-2- (3,3,4,4,5,5,6,6,7,7,8, 8,9,9,10,10,10-septadecafluorodecylterranyl) propionate, ethyl-2-methyl-2- (4,4,5,5 6,6,7,7,8,8,9,9,10,10,11,11,11-septadecafluoroundecylteranyl) -propionate, methyl-2-methyl-2- (3,3 4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranyl) -propionate, diethylamino-2-methyl-2- (3 , 3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranyl) -propionate, 2-methyl-2- ( 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylteranyl) ru-propionitrile, methyl-2 -(3, 3, 4, 4, 5, 5, 6, 6, 7, 7, 8, 8, 9, 9, 10, 10, 10 Septadecafluorodecylterranyl) propionate, 1-phenylethyl 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluoro Decyl telluride, 3- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranyl) -2- Methyl-1-propene, 4- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranyl) Examples include -3-methyl-1-butyne. Preferably, ethyl-2-methyl- (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctylterranyl) -propionate, ethyl-2- Methyl- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranyl) -propionate, Preferably ethyl-2-methyl- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylteranyl) -Propionate.
(有機テルル化合物の製造方法1)
一般式(1)で表される有機テルル化合物は、例えば、下記一般式(4)で表される化合物と塩基とを反応させる工程と、上記反応により得られた化合物と下記一般式(5)で表される化合物とを反応させる工程とを含む第1の方法から製造することができる。
(Method 1 for producing organic tellurium compound)
The organic tellurium compound represented by the general formula (1) includes, for example, a step of reacting a compound represented by the following general formula (4) and a base, a compound obtained by the above reaction, and the following general formula (5) It can manufacture from the 1st method including the process with which the compound represented by these is made to react.
〔式中、R2及びR3は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基を表す。R4は炭素数1〜8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基又はプロパルギル基を表す。〕 [Wherein, R 2 and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. R 4 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group, or a propargyl group. ]
R2、R3及びR4で表される各基は、上記に示した通りである。好ましくは本発明の上記第1の製造方法においてR4は、アシル基、アミド基、オキシカルボニル基又はシアノ基である。 Each group represented by R 2 , R 3 and R 4 is as described above. Preferably, in the first production method of the present invention, R 4 is an acyl group, an amide group, an oxycarbonyl group or a cyano group.
一般式(4)で表される化合物の具体例としては、エチル−2−メチル−プロピオネート、メチル−2−メチル−プロピオネート、ジエチルアミノ−2−メチル−プロピオネート等を挙げることができる。 Specific examples of the compound represented by the general formula (4) include ethyl-2-methyl-propionate, methyl-2-methyl-propionate, diethylamino-2-methyl-propionate and the like.
上記一般式(5)で表される化合物は、次の通りである。 The compound represented by the general formula (5) is as follows.
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。Xはハロゲン原子を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. X represents a halogen atom. ]
R1で表される各基は、上記に示した通りである。 Each group represented by R 1 is as described above.
Xで示される基としては、フッ素原子、塩素、臭素又はヨウ素等のハロゲン原子を挙げることができる。好ましくは、塩素、臭素がよい。 Examples of the group represented by X include a halogen atom such as a fluorine atom, chlorine, bromine or iodine. Of these, chlorine and bromine are preferable.
一般式(5)で表される化合物の具体例としては、(1,1,2,2,3,3、4,4,5,5,6,6,7,7,8,8,8−セプタデカフルオロオクチルテラニル)クロライド、(2,2、3,3,4,4,5,5,6,6,7,7,8,8,9,9,9−セプタデカフルオロノニルテラニル)ブロマイド、(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチルテラニル)ブロマイド、(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)クロライド、(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)ブロマイド、(4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11−セプタデカフルオロウンデシルテラニル)ルブロマイド、(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13−ヘンエイコサカフルオロドデシルテラニル)ブロマイド等を挙げることができる。好ましくは、(3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチルテラニル)ブロマイド、(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)ブロマイドがよい。 Specific examples of the compound represented by the general formula (5) include (1, 1, 2, 2, 3, 3, 4, 4, 5, 5, 6, 6, 7, 7, 8, 8, 8 -Septadecafluorooctylterranyl) chloride, (2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-Septadecafluorononylterra) Nyl) bromide, (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctylterranyl) bromide, (3,3,4,4,5) , 5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranyl) chloride, (3,3,4,4,5,5,6,6) , 7,7,8,8,9,9,10,10,10-septadecafluorodecylteranyl) bromide, (4,4,5,5,6,6,7,7,8,8, , 9,10,10,11,11,11-septadecafluoroundecylteranyl) rubromide, (3,3,4,4,5,5,6,6,7,7,8,8,9) , 9, 10, 10, 11, 11, 12, 12, 13, 13, 13-heneicosacafluorododecyl teranyl) bromide. Preferably, (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctylteranyl) bromide, (3,3,4,4,5,5) 5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluorodecylteranyl) bromide is preferred.
塩基としては、リチウムジイソプロピルアミド、ヘキサメチルジシラザンリチウム、リチウムテトラメチルピペリジン、リチウムアミド、カリウムジイソプロピルアミド、カリウムアミド、ナトリウムイソプロピルアミド、ナトリウムアミド等を用いることができる。この中でもリチウムジイソプロピルアミドが好ましい。 As the base, lithium diisopropylamide, hexamethyldisilazane lithium, lithium tetramethylpiperidine, lithium amide, potassium diisopropylamide, potassium amide, sodium isopropylamide, sodium amide and the like can be used. Among these, lithium diisopropylamide is preferable.
上記一般式(1)で表される有機テルル化合物の第1の製造方法としては、具体的には次の通りである。 The first production method of the organic tellurium compound represented by the general formula (1) is specifically as follows.
溶媒中において塩基を調製する。使用できる溶媒としては、ジメチルホルムアミド(DMF)等の極性溶媒、トルエン、キシレン等の芳香族溶媒、ヘキサン、ジメトキシエタン等の脂肪族炭化水素、ジエチルエーテル、テトラヒドロフラン(THF)等のエーテル系溶媒等が挙げられる。好ましくは、THFがよい。溶媒の使用量としては適宜調整すればよいが、通常、塩基1gに対して5〜500mlがよく、好ましくは10〜100mlがよい。 The base is prepared in a solvent. Solvents that can be used include polar solvents such as dimethylformamide (DMF), aromatic solvents such as toluene and xylene, aliphatic hydrocarbons such as hexane and dimethoxyethane, and ether solvents such as diethyl ether and tetrahydrofuran (THF). Can be mentioned. Preferably, THF is good. The amount of the solvent used may be adjusted as appropriate, but is usually 5 to 500 ml, preferably 10 to 100 ml, with respect to 1 g of the base.
上記にて調製した塩基に一般式(4)で表される化合物をゆっくりと滴下し、攪拌する。反応時間は、反応温度により異なるが、通常、5分〜24時間がよく、好ましくは10分〜3時間がよい。反応温度としては−150〜50℃がよく、好ましくは−80〜0℃がよい。 The compound represented by the general formula (4) is slowly added dropwise to the base prepared above and stirred. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 3 hours. The reaction temperature is preferably −150 to 50 ° C., and preferably −80 to 0 ° C.
次に、この反応液に一般式(5)で表される化合物を加え、攪拌する。反応時間は、反応温度により異なるが、通常、5分〜24時間がよく、好ましくは10分〜3時間がよい。反応温度としては−150〜50℃がよく、好ましくは−80〜20℃がよい。 Next, the compound represented by the general formula (5) is added to the reaction solution and stirred. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 3 hours. The reaction temperature is −150 to 50 ° C., preferably −80 to 20 ° C.
反応終了後、溶媒を濃縮し、目的物を単離精製する。溶媒濃縮の前に、適宜、水、食塩水等にて洗浄を行ってもよい。精製方法としては、化合物により適宜選択できるが、通常、減圧蒸留や再結晶等が好ましい。 After completion of the reaction, the solvent is concentrated and the desired product is isolated and purified. Prior to solvent concentration, washing with water, saline, or the like may be performed as appropriate. The purification method can be appropriately selected depending on the compound, but vacuum distillation, recrystallization and the like are usually preferred.
(有機テルル化合物の製造方法2)
一般式(1)で表される有機テルル化合物は、下記一般式(6)で表される有機ジテルル化合物と還元剤とを反応させる工程と、上記反応工程により得られた化合物と下記一般式(7)で表される化合物とを反応する工程とを含む第2の方法からも製造することができる。
(Method 2 for producing organic tellurium compound)
The organic tellurium compound represented by the general formula (1) includes a step of reacting an organic ditellurium compound represented by the following general formula (6) with a reducing agent, a compound obtained by the above reaction step, and the following general formula ( It can also manufacture from the 2nd method including the process of reacting with the compound represented by 7).
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. ]
〔式中、R2及びR3は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基を表す。R4は炭素数1〜8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基又はプロパルギル基を表す。Xはハロゲン原子を表す。〕 [Wherein, R 2 and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. R 4 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group, or a propargyl group. X represents a halogen atom. ]
R1、R2、R3、R4及びXで表される各基は、上記に示した通りである。 Each group represented by R 1 , R 2 , R 3 , R 4 and X is as described above.
一般式(7)で表される化合物の具体例としては、エチル−2−メチル−2−クロロ−プロピオネート、エチル−2−メチル−2−ブロモ−プロピオネート、エチル−2−メチル−2−ヨード−プロピオネート、メチル−2−メチル−2−ブロモ−プロピオネート、ジエチルアミノ−2−メチル−2−ブロモ−プロピオネート、2−メチル−2−ブロモ−プロピオニトリル、(1−ブロモ−エチル)ベンゼン、1−ブロモ―1−メトキシヘキサン、4−ブロモ―2−ペンテン、臭化クロチル、3−ブロモ−2−メチル−1−プロペン、3−ブロモ―1−トリメチルシリルプロピン、4−ブロモ−3−メチル−1−ブチン等を挙げることができる。好ましくは、エチル−2−メチル−2−ブロモ−プロピオネート、(1−ブロモ−エチル)ベンゼンである。 Specific examples of the compound represented by the general formula (7) include ethyl-2-methyl-2-chloro-propionate, ethyl-2-methyl-2-bromo-propionate, ethyl-2-methyl-2-iodo- Propionate, methyl-2-methyl-2-bromo-propionate, diethylamino-2-methyl-2-bromo-propionate, 2-methyl-2-bromo-propionitrile, (1-bromo-ethyl) benzene, 1-bromo -1-methoxyhexane, 4-bromo-2-pentene, crotyl bromide, 3-bromo-2-methyl-1-propene, 3-bromo-1-trimethylsilylpropyne, 4-bromo-3-methyl-1- Butin and the like can be mentioned. Preferred are ethyl-2-methyl-2-bromo-propionate and (1-bromo-ethyl) benzene.
一般式(7)で表される化合物を製造するために用いる還元剤としては、リチウム金属、ナトリウム金属、カリウム金属及びこれらの金属のナフタレニド、水素化ホウ素ナトリウム、水素化ホウ素リチウム、水素化ホウ素カリウム、水素化トリエチルホウ素リチウム、リチウムナフタレニド等を用いることができる。この中でも水素化トリエチルホウ素リチウムが好ましい。 Examples of the reducing agent used for producing the compound represented by the general formula (7) include lithium metal, sodium metal, potassium metal, naphthalenide of these metals, sodium borohydride, lithium borohydride, and potassium borohydride. , Lithium triethylborohydride, lithium naphthalenide, or the like can be used. Among these, lithium triethylborohydride is preferable.
上記一般式(1)で表される有機テルル化合物の第2の製造方法としては、具体的には次の通りである。 The second production method of the organic tellurium compound represented by the general formula (1) is specifically as follows.
一般式(6)で表される有機ジテルル化合物を溶媒に溶解させる。使用できる溶媒としては、ジメチルホルムアミド(DMF)等の極性溶媒、トルエン、キシレン等の芳香族溶媒、ヘキサン、ジメトキシエタン等の脂肪族炭化水素、ジエチルエーテル、テトラヒドロフラン(THF)等のエーテル系溶媒等が挙げられる。好ましくは、THFがよい。溶媒の使用量としては適宜調製すればよいが、通常、有機ジテルル化合物1gに対して5〜500mlがよく、好ましくは10〜100mlがよい。 The organic ditellurium compound represented by the general formula (6) is dissolved in a solvent. Solvents that can be used include polar solvents such as dimethylformamide (DMF), aromatic solvents such as toluene and xylene, aliphatic hydrocarbons such as hexane and dimethoxyethane, and ether solvents such as diethyl ether and tetrahydrofuran (THF). Can be mentioned. Preferably, THF is good. The amount of the solvent used may be appropriately adjusted, but is usually 5 to 500 ml, preferably 10 to 100 ml, with respect to 1 g of the organic ditellurium compound.
上記溶媒に有機還元剤をゆっくりと滴下し、攪拌する。反応時間は、反応温度により異なるが、通常、5分〜24時間がよく、好ましくは10分〜3時間がよい。反応温度としては−40〜80℃がよく、好ましくは0〜50℃がよい。 An organic reducing agent is slowly dropped into the solvent and stirred. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 3 hours. As reaction temperature, -40-80 degreeC is good, Preferably 0-50 degreeC is good.
次に、この反応液に一般式(7)で表される化合物を加え、攪拌する。反応時間は、反応温度により異なるが、通常、5分〜24時間がよく、好ましくは10分〜3時間がよい。反応温度としては−40〜100℃がよく、好ましくは0〜50℃がよい。 Next, the compound represented by the general formula (7) is added to the reaction solution and stirred. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 3 hours. As reaction temperature, -40-100 degreeC is good, Preferably 0-50 degreeC is good.
反応終了後、溶媒を濃縮し、目的物を単離精製する。溶媒濃縮の前に、適宜、水、食塩水等にて洗浄を行ってもよい。精製方法としては、化合物により適宜選択できるが、通常、減圧蒸留や再結晶等が好ましい。 After completion of the reaction, the solvent is concentrated and the desired product is isolated and purified. Prior to solvent concentration, washing with water, saline, or the like may be performed as appropriate. The purification method can be appropriately selected depending on the compound, but vacuum distillation, recrystallization and the like are usually preferred.
(一般式(5)で表される化合物の製造方法)
上記一般式(5)で表される化合物は、下記一般式(6)で表される有機ジテルル化合物とハロゲン化剤とを反応させることにより製造することができる。
(Method for producing compound represented by general formula (5))
The compound represented by the general formula (5) can be produced by reacting an organic ditellurium compound represented by the following general formula (6) with a halogenating agent.
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. ]
R1で表される各基は、上記に示した通りである。 Each group represented by R 1 is as described above.
一般式(6)で表される有機ジテルル化合物の具体例としては、ジ−1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8−セプタデカフルオロオクチルジテルリド、ジ−2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9−セプタデカフルオロノニルジテルリド、ジ−3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチルジテルリド、ジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリド、ジ−4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11−セプタデカフルオロウンデシルテラニル)ルジテルリド、ジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13−ヘンエイコサカフルオロドデシルジテルリド等を挙げることができる。好ましくは、ジ−3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチルジテルリド、ジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリドがよい。 Specific examples of the organic ditellurium compound represented by the general formula (6) include di-1,1,2,2,3,3,4,4,5,5,6,6,7,7,8, 8,8-septadecafluorooctyl ditelluride, di-2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-septadeca Fluorononyl ditelluride, di-3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl ditelluride, di-3,3,4, 4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl ditelluride, di-4,4,5,5,6,6 7,7,8,8,9,9,10,10,11,11,11-septadecafluoroundecylteranyl) ruditelluride, di-3,3,4,4,5,5,6,6 7, 7, 8, 8 9,9,10,10,11,11,12,12,13,13,13- can be mentioned Heng Eiko Saka fluoro dodecyl ditelluride like. Preferably, di-3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl ditelluride, di-3,3,4,4,5 5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl ditelluride.
ハロゲン化剤としては、塩素、臭素、ヨウ素等を挙げることができる。好ましくは臭素がよい。 Examples of the halogenating agent include chlorine, bromine and iodine. Bromine is preferable.
上記一般式(5)で表される化合物の製造方法としては、具体的には次の通りである。 The method for producing the compound represented by the general formula (5) is specifically as follows.
一般式(6)で表される有機ジテルル化合物を溶媒に溶解させる。使用できる溶媒としては、ジメチルホルムアミド(DMF)等の極性溶媒、トルエン、キシレン等の芳香族溶媒、ヘキサン、ジメトキシエタン等の脂肪族炭化水素、ジエチルエーテル、テトラヒドロフラン(THF)等のエーテル系溶媒等を挙げることができる。好ましくは、THFがよい。溶媒の使用量としては適宜調製すればよいが、通常、一般式(6)で表される有機ジテルル化合物1gに対して5〜500mlがよく、好ましくは10〜100mlがよい。 The organic ditellurium compound represented by the general formula (6) is dissolved in a solvent. Solvents that can be used include polar solvents such as dimethylformamide (DMF), aromatic solvents such as toluene and xylene, aliphatic hydrocarbons such as hexane and dimethoxyethane, and ether solvents such as diethyl ether and tetrahydrofuran (THF). Can be mentioned. Preferably, THF is good. The amount of the solvent used may be appropriately adjusted, but is usually 5 to 500 ml, preferably 10 to 100 ml, with respect to 1 g of the organic ditellurium compound represented by the general formula (6).
上記溶媒にハロゲン化剤を加え、攪拌する。反応時間は、反応温度により異なるが、通常、5分〜24時間がよく、好ましくは10分〜3時間がよい。反応温度としては−50〜50℃がよく、好ましくは−20〜30℃がよい。 Add the halogenating agent to the solvent and stir. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 3 hours. As reaction temperature, -50-50 degreeC is good, Preferably -20-30 degreeC is good.
上記のように得られた一般式(5)で表される化合物の溶液をそのまま、一般式(1)で表される有機テルル化合物の製造に用いてもよいし、単離精製して用いてもよい。 The solution of the compound represented by the general formula (5) obtained as described above may be used as it is for the production of the organic tellurium compound represented by the general formula (1), or may be used after being isolated and purified. Also good.
(有機ジテルル化合物の製造方法)
一般式(6)で表される有機ジテルル化合物は、金属テルルを還元することにより得られるジテルリドジアニオンと、化合物R1−X(式中、R1は炭素数1〜20のフッ素含有アルキル基、Xはハロゲン原子を表す。)を反応させることにより、製造することができる。
(Method for producing organic ditellurium compound)
The organic ditellurium compound represented by the general formula (6) includes a ditelluride dianion obtained by reducing metal tellurium and a compound R 1 -X (wherein R 1 is a fluorine-containing alkyl having 1 to 20 carbon atoms). And a group X represents a halogen atom).
使用できる還元剤としては、金属ナトリウム、金属リチウム、金属カリウム及びこれら金属のナフタレニド等を挙げることができる。好ましくは金属ナトリウムが良い。 Examples of the reducing agent that can be used include metallic sodium, metallic lithium, metallic potassium, naphthalenide of these metals, and the like. Metal sodium is preferable.
金属テルルを溶媒に懸濁する。使用できる溶媒としてはテトラヒドロフラン(THF)等のエーテル系溶媒、エチレンジアミン等を挙げることができる。好ましくはエチレンジアミンが良い。溶媒の使用量としては、適宜調整すればよいが、通常、金属テルル1gに対して、5〜500mlがよく、好ましくは10〜100mlがよい。 Metal tellurium is suspended in a solvent. Examples of the solvent that can be used include ether solvents such as tetrahydrofuran (THF), ethylenediamine, and the like. Ethylenediamine is preferable. The amount of the solvent used may be adjusted as appropriate, but is usually 5 to 500 ml, preferably 10 to 100 ml, with respect to 1 g of metal tellurium.
上記懸濁液に還元剤を加え、攪拌する。反応時間は、反応温度により異なるが、通常5分〜24時間がよく、好ましくは10分〜6時間がよい。反応温度としては0〜150℃がよく、好ましくは60〜130℃がよい。 Add the reducing agent to the suspension and stir. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 6 hours. The reaction temperature is preferably 0 to 150 ° C, and preferably 60 to 130 ° C.
得られたジテルリドジアニオン溶液に、化合物R1−Xをゆっくり滴下し、攪拌する。反応時間は、反応温度により異なるが、通常5分〜24時間がよく、好ましくは10分〜3時間がよい。反応温度としては−50〜50℃がよく、好ましくは−20〜20℃がよい。 To the resulting Tae Ruri blunder anion solution was slowly added dropwise a compound R 1 -X, stirred. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 3 hours. As reaction temperature, -50-50 degreeC is good, Preferably -20-20 degreeC is good.
反応終了後、溶媒を濃縮し、目的物を単離精製する。溶媒濃縮の前に、適宜、水、食塩水等にて洗浄を行ってもよい。精製方法としては、化合物により適宜選択できるが、通常、減圧蒸留や再結晶等が好ましい。 After completion of the reaction, the solvent is concentrated and the desired product is isolated and purified. Prior to solvent concentration, washing with water, saline, or the like may be performed as appropriate. The purification method can be appropriately selected depending on the compound, but vacuum distillation, recrystallization and the like are usually preferred.
<ビニル重合体の製造>
本発明のビニル重合体の製造方法は、ビニルモノマーを、上述の一般式(1)で表される有機テルル化合物を用いてリビングラジカル重合し、ビニル重合体を合成する工程(A)と、前記工程(A)で得られたビニル重合体に還元剤を作用させる工程(B)と、前記工程(B)で得られたビニル重合体をフッ素系溶媒で洗浄する工程(C)とを備える、製造方法である。
<Manufacture of vinyl polymer>
The method for producing a vinyl polymer of the present invention includes a step (A) of synthesizing a vinyl polymer by subjecting a vinyl monomer to living radical polymerization using the organic tellurium compound represented by the above general formula (1), A step (B) in which a reducing agent is allowed to act on the vinyl polymer obtained in the step (A), and a step (C) in which the vinyl polymer obtained in the step (B) is washed with a fluorine-based solvent. It is a manufacturing method.
前述の工程(A)のリビングラジカル重合は、一般式(1)で表される有機テルル化合物をリビングラジカル重合開始剤として用いるリビングラジカル重合であり、ビニルモノマーの種類に応じ反応促進、分子量の制御等の目的で、さらにアゾ系重合開始剤及び/又は一般式(6)で表される有機ジテルル化合物を加えて重合を行ってもよい。 The living radical polymerization in the above-mentioned step (A) is a living radical polymerization using the organic tellurium compound represented by the general formula (1) as a living radical polymerization initiator, promoting the reaction according to the type of vinyl monomer, and controlling the molecular weight. For the purpose of, for example, an azo polymerization initiator and / or an organic ditellurium compound represented by the general formula (6) may be added for polymerization.
具体的には、ビニルモノマーを、下記(a)〜(d)のいずれかを用いて重合し、ビニル重合体を製造する方法が挙げられる。 Specifically, a method of producing a vinyl polymer by polymerizing a vinyl monomer using any of the following (a) to (d) can be mentioned.
(a)一般式(1)で表される有機テルル化合物。
(b)一般式(1)で表される有機テルル化合物とアゾ系重合開始剤との混合物。
(c)一般式(1)で表される有機テルル化合物と一般式(6)で表される有機ジテルル化合物との混合物。
(d)一般式(1)で表される有機テルル化合物とアゾ系重合開始剤と一般式(6)で表される有機ジテルル化合物との混合物。
(A) An organic tellurium compound represented by the general formula (1).
(B) A mixture of an organic tellurium compound represented by the general formula (1) and an azo polymerization initiator.
(C) A mixture of an organic tellurium compound represented by the general formula (1) and an organic ditellurium compound represented by the general formula (6).
(D) A mixture of an organic tellurium compound represented by the general formula (1), an azo polymerization initiator, and an organic ditellurium compound represented by the general formula (6).
工程(A)で使用する一般式(1)で表される有機テルル化合物は、上記に示した通りである。 The organic tellurium compound represented by the general formula (1) used in the step (A) is as described above.
工程(A)で使用する一般式(6)で表される有機ジテルル化合物は、上記に示した通りである。 The organic ditellurium compound represented by the general formula (6) used in the step (A) is as described above.
工程(A)で使用するアゾ系重合開始剤は、通常のラジカル重合で使用するアゾ系重合開始剤であれば特に制限なく使用することができる。例えば2,2’−アゾビス(イソブチロニトリル)(AIBN)、2,2’−アゾビス(2−メチルブチロニトリル)(AMBN)、2,2’−アゾビス(2,4−ジメチルバレロニトリル)(ADVN)、1,1’−アゾビス(1−シクロヘキサンカルボニトリル)(ACHN)、ジメチル−2,2’−アゾビスイソブチレート(MAIB)、4,4’−アゾビス(4−シアノバレリアン酸)(ACVA)、1,1’−アゾビス(1−アセトキシ−1−フェニルエタン)、2,2’−アゾビス(2−メチルブチルアミド)、2,2’−アゾビス(4−メトキシ−2,4−ジメチルバレロニトリル)(V−70)、2,2’−アゾビス(2−メチルアミジノプロパン)二塩酸塩、2,2’−アゾビス[2−(2−イミダゾリン−2−イル)プロパン]、2,2’−アゾビス[2−メチル−N−(2−ヒドロキシエチル)プロピオンアミド]、2,2’−アゾビス(2,4,4−トリメチルペンタン)、2−シアノ−2−プロピルアゾホルムアミド、2,2’−アゾビス(N−ブチル−2−メチルプロピオンアミド)、2,2’−アゾビス(N−シクロヘキシル−2−メチルプロピオンアミド)等を挙げることができる。 The azo polymerization initiator used in the step (A) can be used without particular limitation as long as it is an azo polymerization initiator used in normal radical polymerization. For example, 2,2′-azobis (isobutyronitrile) (AIBN), 2,2′-azobis (2-methylbutyronitrile) (AMBN), 2,2′-azobis (2,4-dimethylvaleronitrile) (ADVN), 1,1′-azobis (1-cyclohexanecarbonitrile) (ACHN), dimethyl-2,2′-azobisisobutyrate (MAIB), 4,4′-azobis (4-cyanovaleric acid) (ACVA), 1,1′-azobis (1-acetoxy-1-phenylethane), 2,2′-azobis (2-methylbutyramide), 2,2′-azobis (4-methoxy-2,4- Dimethylvaleronitrile) (V-70), 2,2′-azobis (2-methylamidinopropane) dihydrochloride, 2,2′-azobis [2- (2-imidazolin-2-yl) propyl Pan], 2,2′-azobis [2-methyl-N- (2-hydroxyethyl) propionamide], 2,2′-azobis (2,4,4-trimethylpentane), 2-cyano-2-propyl Azoformamide, 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like can be mentioned.
工程(A)で使用するビニルモノマーは、ラジカル重合可能なものであれば特に制限はないが、具体的には下記のビニルモノマーを挙げることができる。 The vinyl monomer used in the step (A) is not particularly limited as long as it can be radically polymerized, and specific examples thereof include the following vinyl monomers.
また、本発明の製造方法で得られるビニル重合体は、下記ビニルモノマーを含む複数のビニルモノマーからなる共重合体であってもよい。なお、本発明において、「ビニルモノマー」とは分子中にラジカル重合可能な炭素−炭素二重結合を有するモノマーのことをいう。「(メタ)アクリル」とは「アクリル及びメタクリルの少なくとも一方」をいい、「(メタ)アクリル酸」とは「アクリル酸及びメタクリル酸の少なくとも一方」をいい、「(メタ)アクリレート」とは「アクリレート及びメタクリレートの少なくとも一方」をいう。 Further, the vinyl polymer obtained by the production method of the present invention may be a copolymer composed of a plurality of vinyl monomers including the following vinyl monomers. In the present invention, the “vinyl monomer” refers to a monomer having a carbon-carbon double bond capable of radical polymerization in the molecule. “(Meth) acryl” means “at least one of acrylic and methacrylic”, “(meth) acrylic acid” means “at least one of acrylic acid and methacrylic acid”, and “(meth) acrylate” means “ “At least one of acrylate and methacrylate”.
(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n−プロピル、(メタ)アクリル酸n−ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸sec−ブチル、(メタ)アクリル酸tert−ブチル、(メタ)アクリル酸2−エチルヘキシル等の脂肪族アルキル基を有する(メタ)アクリレート。 Methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, sec-butyl (meth) acrylate, (meth ) (Meth) acrylates having an aliphatic alkyl group such as tert-butyl acrylate and 2-ethylhexyl (meth) acrylate.
(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸メチルシクロヘキシル、(メタ)アクリル酸シクロドデシル、(メタ)アクリル酸ボルニル、(メタ)アクリル酸イソボルニル等の脂環族アルキル基を有する(メタ)アクリレート。 (Meth) acrylates having an alicyclic alkyl group such as (meth) acrylic acid cyclohexyl, (meth) acrylic acid methylcyclohexyl, (meth) acrylic acid cyclododecyl, (meth) acrylic acid bornyl, (meth) acrylic acid isobornyl.
(メタ)アクリル酸ベンジル、(メタ)アクリル酸フェニル、(メタ)アクリル酸フェノキシエチル等の芳香環基を有する(メタ)アクリレート。 (Meth) acrylate having an aromatic ring group such as benzyl (meth) acrylate, phenyl (meth) acrylate, and phenoxyethyl (meth) acrylate.
(メタ)アクリル酸2−ヒドロキシエチル、(メタ)アクリル酸3−ヒドロキシプロピル、(メタ)アクリル酸2−ヒドロキシプロピル、(メタ)アクリル酸4−ヒドロキシブチル等の水酸基を有する(メタ)アクリレート。 (Meth) acrylate having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and the like.
ジエチレングリコールモノ(メタ)アクリレート、トリエチレングリコールモノ(メタ)アクリレート、テトラエチレングリコールモノ(メタ)アクリレート、ポリエチレングリコールモノ(メタ)アクリレート、メトキシジエチレングリコール(メタ)アクリレート、メトキシトリエチレングリコール(メタ)アクリレート、メトキシテトラエチレングリコール(メタ)アクリレート、メトキシポリエチレングリコール(メタ)アクリレート等のポリエチレングリコール構造単位を有する(メタ)アクリレート。 Diethylene glycol mono (meth) acrylate, triethylene glycol mono (meth) acrylate, tetraethylene glycol mono (meth) acrylate, polyethylene glycol mono (meth) acrylate, methoxydiethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxy (Meth) acrylate having a polyethylene glycol structural unit such as tetraethylene glycol (meth) acrylate and methoxypolyethylene glycol (meth) acrylate.
スチレン、α−メチルスチレン、4−メチルスチレン、2−メチルスチレン、3−メチルスチレン、4−メトキシスチレン、2−ヒドロキシメチルスチレン、1−ビニルナフタレン等の芳香族ビニルモノマー。 Aromatic vinyl monomers such as styrene, α-methylstyrene, 4-methylstyrene, 2-methylstyrene, 3-methylstyrene, 4-methoxystyrene, 2-hydroxymethylstyrene and 1-vinylnaphthalene.
(メタ)アクリル酸、クロトン酸、マレイン酸、イタコン酸、2−ヒドロキシエチル(メタ)アクリレートや4−ヒドロキシブチル(メタ)アクリレート等のヒドロキシアルキル(メタ)アクリレートに無水マレイン酸、無水コハク酸、無水フタル酸等の酸無水物を反応させたモノマー等のカルボキシル基を有するビニルモノマー。 (Meth) acrylic acid, crotonic acid, maleic acid, itaconic acid, hydroxyalkyl (meth) acrylates such as 2-hydroxyethyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate, maleic anhydride, succinic anhydride, anhydrous A vinyl monomer having a carboxyl group, such as a monomer obtained by reacting an acid anhydride such as phthalic acid.
スチレンスルホン酸、ジメチルプロピルスルホン酸(メタ)アクリルアミド、スルホン酸エチル(メタ)アクリレート、スルホン酸エチル(メタ)アクリルアミド、ビニルスルホン酸等のスルホン酸基を有するビニルモノマー。 Vinyl monomers having a sulfonic acid group such as styrene sulfonic acid, dimethylpropyl sulfonic acid (meth) acrylamide, ethyl sulfonate (meth) acrylate, ethyl sulfonate (meth) acrylamide, and vinyl sulfonic acid.
メタクリロイロキシエチルリン酸エステル等のリン酸基を有するビニルモノマー。 Vinyl monomers having a phosphate group such as methacryloyloxyethyl phosphate.
(メタ)アクリルアミド、N−メチル(メタ)アクリルアミド、N−イソプロピル(メタ)アクリルアミド、N,N−ジメチル(メタ)アクリルアミド等の(メタ)アクリルアミド。 (Meth) acrylamides such as (meth) acrylamide, N-methyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide and the like.
N,N−ジメチルアミノプロピル(メタ)アクリルアミド、N,N−ジメチルアミノエチル(メタ)アクリルアミド、2−(ジメチルアミノ)エチル(メタ)アクリレート、N,N−ジメチルアミノプロピル(メタ)アクリレート等の3級アミン含有不飽和モノマー。 3 such as N, N-dimethylaminopropyl (meth) acrylamide, N, N-dimethylaminoethyl (meth) acrylamide, 2- (dimethylamino) ethyl (meth) acrylate, N, N-dimethylaminopropyl (meth) acrylate, etc. Secondary amine-containing unsaturated monomer.
N−2−ヒドロキシ−3−アクリロイルオキシプロピル−N,N,N−トリメチルアンモニウムクロライド、N−メタクリロイルアミノエチル−N,N,N−ジメチルベンジルアンモニウムクロライド等の4級アンモニウム塩基含有不飽和モノマー。 Quaternary ammonium base-containing unsaturated monomers such as N-2-hydroxy-3-acryloyloxypropyl-N, N, N-trimethylammonium chloride and N-methacryloylaminoethyl-N, N, N-dimethylbenzylammonium chloride.
(メタ)アクリル酸グリシジル等のエポキシ基含有不飽和モノマー。 Epoxy group-containing unsaturated monomers such as (meth) glycidyl acrylate.
2−ビニルチオフェン、N−メチル−2−ビニルピロール、1−ビニル−2−ピロリドン、2−ビニルピリジン、4−ビニルピリジン等のヘテロ環含有不飽和モノマー。 Heterocycle-containing unsaturated monomers such as 2-vinylthiophene, N-methyl-2-vinylpyrrole, 1-vinyl-2-pyrrolidone, 2-vinylpyridine and 4-vinylpyridine.
N−ビニルホルムアミド、N−ビニルアセトアミド、N−ビニル−ε―カプトラクタム等のビニルアミド。 Vinylamides such as N-vinylformamide, N-vinylacetamide, N-vinyl-ε-captolactam.
酢酸ビニル、ピバル酸ビニル、安息香酸ビニルなどのカルボン酸ビニル。 1−ヘキセン、1−オクテン、1−デセン等のα−オレフィン。 Vinyl carboxylates such as vinyl acetate, vinyl pivalate and vinyl benzoate. Α-olefins such as 1-hexene, 1-octene and 1-decene.
ブタジエン、イソプレン、4−メチル−1,4−ヘキサジエン、7−メチル−1,6−オクタジエン等のジエン類。 Dienes such as butadiene, isoprene, 4-methyl-1,4-hexadiene and 7-methyl-1,6-octadiene.
これらの中でも、好ましくは脂肪族アルキル基を有する(メタ)アクリレート、脂環族アルキル基を有する(メタ)アクリレート、水酸基を有する(メタ)アクリレート、芳香族ビニルモノマー、(メタ)アクリルアミド、3級アミン含有不飽和モノマー、ヘテロ環含有不飽和モノマー、ビニルアミドモノマーがよい。 Among these, (meth) acrylate having an aliphatic alkyl group, (meth) acrylate having an alicyclic alkyl group, (meth) acrylate having a hydroxyl group, aromatic vinyl monomer, (meth) acrylamide, tertiary amine Containing unsaturated monomers, heterocyclic containing unsaturated monomers, and vinylamide monomers are preferred.
工程(A)は、不活性ガスで置換した容器で、ビニルモノマーと一般式(1)で表される有機テルル化合物、ビニルモノマーの種類に応じ、反応促進、分子量の制御等の目的で、さらにアゾ系重合開始剤及び/又は一般式(6)で表される有機ジテルル化合物を混合する。この時、不活性ガスとしては、窒素、アルゴン、ヘリウム等を挙げることができる。好ましくは、アルゴン、窒素が良い。特に好ましくは、窒素が良い。 The step (A) is a container substituted with an inert gas. For the purpose of promoting the reaction, controlling the molecular weight, etc., depending on the type of the vinyl monomer and the organic tellurium compound represented by the general formula (1) and the vinyl monomer, An azo polymerization initiator and / or an organic ditellurium compound represented by the general formula (6) is mixed. At this time, examples of the inert gas include nitrogen, argon, helium, and the like. Argon and nitrogen are preferable. Nitrogen is particularly preferable.
上記(a)、(b)、(c)及び(d)におけるビニルモノマーの使用量としては、目的とするビニル重合体の物性により適宜調節することができる。通常、一般式(1)で表される有機テルル化合物1molに対して、ビニルモノマーを5〜10,000molとすることができる。好ましくは、50〜5,000molとするのがよい。 The amount of vinyl monomer used in the above (a), (b), (c) and (d) can be appropriately adjusted depending on the physical properties of the intended vinyl polymer. Usually, a vinyl monomer can be 5-10,000 mol with respect to 1 mol of organic tellurium compounds represented by General formula (1). Preferably, the amount is 50 to 5,000 mol.
一般式(1)で表される有機テルル化合物とアゾ系重合開始剤とを併用する場合、アゾ系重合開始剤の使用量としては、通常、一般式(1)で表される有機テルル化合物1molに対して、アゾ系重合開始剤を0.01〜10molとすることができる。好ましくは、0.05〜2molとするのがよい。 When the organic tellurium compound represented by the general formula (1) and the azo polymerization initiator are used in combination, the amount of the azo polymerization initiator used is usually 1 mol of the organic tellurium compound represented by the general formula (1). On the other hand, an azo polymerization initiator can be 0.01-10 mol. Preferably, it is 0.05-2 mol.
一般式(1)で表される有機テルル化合物と一般式(6)で表される有機ジテルル化合物とを併用する場合、一般式(6)で表される有機ジテルル化合物の使用量としては、通常、一般式(1)で表される有機テルル化合物1molに対して、一般式(6)で表される有機ジテルル化合物を0.01〜100molとすることができる。好ましくは、0.1〜10molとするのがよい。 When the organic tellurium compound represented by the general formula (1) and the organic ditellurium compound represented by the general formula (6) are used in combination, the amount of the organic ditellurium compound represented by the general formula (6) is usually used. The organic ditellurium compound represented by the general formula (6) can be 0.01 to 100 mol per 1 mol of the organic tellurium compound represented by the general formula (1). Preferably, it is 0.1-10 mol.
一般式(1)で表される有機テルル化合物と一般式(6)で表される有機ジテルル化合物とアゾ系重合開始剤とを併用する場合、アゾ系重合開始剤の使用量としては、通常、一般式(1)で表される有機テルル化合物と一般式(6)で表される有機ジテルル化合物の合計1molに対して、アゾ系重合開始剤を0.01〜100molとすることができる。好ましくは、0.05〜2molとするのがよい。 When the organic tellurium compound represented by the general formula (1), the organic ditellurium compound represented by the general formula (6) and the azo polymerization initiator are used in combination, An azo polymerization initiator can be 0.01-100 mol with respect to 1 mol in total of the organic tellurium compound represented by General formula (1) and the organic ditellurium compound represented by General formula (6). Preferably, it is 0.05-2 mol.
工程(A)は、無溶剤でも行うことができるが、ラジカル重合で一般に使用される溶媒の中でフッ素系溶媒と相分離可能な非プロトン性溶媒又はプロトン性溶媒を使用することが好ましく上記混合物を撹拌して行われる。 The step (A) can be performed without a solvent, but it is preferable to use an aprotic solvent or a protic solvent that can be phase-separated from a fluorine-based solvent among solvents generally used in radical polymerization. Is carried out with stirring.
使用できる非プロトン性溶媒としては、例えば、ベンゼン、トルエン、N,N−ジメチルホルムアミド(DMF)、ジメチルスルホキシド(DMSO)、アセトン、2−ブタノン(メチルエチルケトン)、ジオキサン、ヘキサフルオロイソプロパオール、クロロホルム、四塩化炭素、テトラヒドロフラン(THF)、酢酸エチル、トリフルオロメチルベンゼン、プロピレングリコールモノメチルエーテルアセテート等を挙げることができる。 Examples of aprotic solvents that can be used include benzene, toluene, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), acetone, 2-butanone (methyl ethyl ketone), dioxane, hexafluoroisopropaol, chloroform, Examples thereof include carbon tetrachloride, tetrahydrofuran (THF), ethyl acetate, trifluoromethylbenzene, propylene glycol monomethyl ether acetate and the like.
使用できるプロトン性溶媒としては、例えば、水、メタノール、エタノール、イソプロパノール、n−ブタノール、エチルセロソルブ、ブチルセロソルブ、1−メトキシ−2−プロパノール、ジアセトンアルコール等を挙げることができる。 Examples of protic solvents that can be used include water, methanol, ethanol, isopropanol, n-butanol, ethyl cellosolve, butyl cellosolve, 1-methoxy-2-propanol, diacetone alcohol, and the like.
上述の溶媒は混合して用いてもよく、また、重合の時点で後述するフッ素系溶媒を混合して用いてもよい。 The above-mentioned solvents may be used as a mixture, or a fluorine-based solvent described later may be used as a mixture at the time of polymerization.
溶媒の使用量としては、適宜調節すればよく、例えば、ビニルモノマー1gに対して、通常0.01〜100mlの範囲であり、好ましくは0.05〜10mlの範囲であり、より好ましくは0.1〜5mlの範囲である。 What is necessary is just to adjust suitably the usage-amount of a solvent, for example, it is the range of 0.01-100 ml normally with respect to 1g of vinyl monomers, Preferably it is the range of 0.05-10 ml, More preferably, it is 0.00. It is in the range of 1-5 ml.
反応温度及び反応時間は、目的とするビニル重合体の分子量又は分子量分布により適宜調節すればよく、通常、0℃〜150℃の範囲で、1分〜100時間撹拌する。 What is necessary is just to adjust reaction temperature and reaction time suitably with the molecular weight or molecular weight distribution of the target vinyl polymer, and it normally stirs in the range of 0 degreeC-150 degreeC for 1 minute-100 hours.
上記工程(A)により得られるビニル重合体の成長末端は、一般式(1)で表される有機テルル化合物由来の−TeR1(式中、R1は上記と同じであり、以下テルル基という。)の形態であることから、マクロリビングラジカル重合開始剤として用いることができる。すなわち、マクロリビングラジカル重合開始剤を用いてA−Bブロック共重合体、A−B−Aトリブロック共重合体、A−B−Cトリブロック共重合体等を製造することができる。 The growth terminal of the vinyl polymer obtained by the step (A) is -TeR 1 derived from an organic tellurium compound represented by the general formula (1) (wherein R 1 is the same as above, and hereinafter referred to as a tellurium group). .)), It can be used as a macro-living radical polymerization initiator. In other words, an AB block copolymer, an ABA triblock copolymer, an ABC triblock copolymer, and the like can be produced using a macro living radical polymerization initiator.
工程(A)の終了後、重合溶液から使用溶媒や残存モノマーを減圧下除去して目的とするビニル重合体を取り出したり、不溶溶媒を使用して再沈殿処理により目的とするビニル重合体を単離することができる。 After completion of the step (A), the solvent or residual monomer is removed from the polymerization solution under reduced pressure to take out the target vinyl polymer, or the target vinyl polymer is simply removed by reprecipitation using an insoluble solvent. Can be separated.
工程(A)の終了後、得られたビニル重合体の成長末端は、重合反応の終了後、ビニル重合体に還元剤を作用させる工程(B)により、ビニル重合体の成長末端のテルル基に作用し、テルル基が有機ジテルル化合物としてビニル重合体の成長末端より除去される。その後の工程(C)の洗浄により有機ジテルル化合物として高効率で回収することができる。 After the completion of the step (A), the growth end of the obtained vinyl polymer is converted into a tellurium group at the growth end of the vinyl polymer by the step (B) in which a reducing agent is allowed to act on the vinyl polymer after the completion of the polymerization reaction. The tellurium group is removed from the growing terminal of the vinyl polymer as an organic ditellurium compound. By subsequent washing in step (C), it can be recovered with high efficiency as an organic ditellurium compound.
工程(B)は、工程(A)終了後の重合溶液からビニル重合体を単離しフッ素系溶媒と相分離可能な適当な溶媒に溶解させて行っても、リビングラジカル重合後の溶液について行ってもよいが、工程短縮の観点から工程(A)終了後の重合溶液に還元剤を添加し、反応させることが好ましい。また、重合時にフッ素系溶媒を混合してビニル重合体を得た場合も、リビングラジカル重合後の溶液に還元剤を添加し、反応させることができる。 The step (B) can be performed on the solution after the living radical polymerization, even if the vinyl polymer is isolated from the polymerization solution after the completion of the step (A) and dissolved in an appropriate solvent capable of phase separation with the fluorinated solvent. However, from the viewpoint of shortening the process, it is preferable to add a reducing agent to the polymerization solution after the completion of the process (A) to cause the reaction. Further, when a vinyl polymer is obtained by mixing a fluorinated solvent at the time of polymerization, a reducing agent can be added to the solution after living radical polymerization and reacted.
工程(B)で用いることができる還元剤としては、ビニル重合体成長末端のテルル基に対し還元性を示す化合物で、一般に還元剤として知られるものを用いることができる。例えば、水素化ホウ素化合物、水素化アルミニウム化合物及び有機テルロール化合物から選ばれる少なくとも1種を用いることができる。 As a reducing agent that can be used in the step (B), a compound that exhibits a reducing property with respect to a tellurium group at the vinyl polymer growth terminal, and generally known as a reducing agent can be used. For example, at least one selected from a borohydride compound, an aluminum hydride compound, and an organic tellurol compound can be used.
水素化ホウ素化合物として、例えば、ボラン錯体(ボラン・ジメチルスフィド錯体、ボラン・テトラヒドロフラン錯体等)、ジボラン、水素化ホウ素リチウム、水素化ホウ素ナトリウム、水素化ホウ素カリウム、水素化ホウ素カルシウム、トリアセトキシ水素化ホウ素ナトリウム、シアノ水素化ホウ素ナトリウム、トリ(sec−ブチル)水素化ホウ素リチウム、トリ(sec−ブチル)水素化ホウ素カリウム、水素化トリエチルホウ素リチウム、水素化ホウ素亜鉛、水素化ホウ素テトラメチルアンモニウム、水素化ホウ素テトラエチルアンモニウム、水素化ホウ素テトラブチルアンモニウム、水素化ホウ素トリメチルオクチルアンモニウム、水素化ホウ素トリメチルベンジルアンモニウム等を挙げることができる。これらの中でも、安全面や経済面、取扱い性等から、水素化ホウ素ナトリウム、水素化トリエチルホウ素リチウムが好ましい。 Examples of borohydride compounds include borane complexes (borane / dimethyl sulfide complex, borane / tetrahydrofuran complex), diborane, lithium borohydride, sodium borohydride, potassium borohydride, calcium borohydride, triacetoxy hydrogen Sodium borohydride, sodium cyanoborohydride, lithium tri (sec-butyl) borohydride, potassium tri (sec-butyl) borohydride, lithium triethylborohydride, zinc borohydride, tetramethylammonium borohydride, Examples thereof include tetraethylammonium borohydride, tetrabutylammonium borohydride, trimethyloctylammonium borohydride, trimethylbenzylammonium borohydride, and the like. Among these, sodium borohydride and lithium triethylborohydride are preferable from the viewpoints of safety, economy, and handleability.
水素化アルミニウム化合物としては、例えば、水素化アルミニウムリチウム、水素化ビス(2−メトキシエトキシ)アルミニウムナトリウム等を挙げることができる。 Examples of the aluminum hydride compound include lithium aluminum hydride, sodium bis (2-methoxyethoxy) aluminum hydride, and the like.
有機テルロール化合物としては、例えば、下記一般式(8)で表される有機テルロール化合物等を挙げることができる。 Examples of the organic tellurol compound include an organic tellurium compound represented by the following general formula (8).
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. ]
R1で表される各基は、上記に示した通りである。 Each group represented by R 1 is as described above.
一般式(8)で表される有機テルロール化合物としては、1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8−セプタデカフルオロオクチルテルロール、2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9−セプタデカフルオロノニルテルロール、3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチルテルロール、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテルロール、4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11−セプタデカフルオロウンデシルテルロール、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13−ヘンエイコサカフルオロドデシルテルロール等が挙げられる。好ましくは3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチルテルロール、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテルロールであり、更に好ましくは3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテルロールである。 Examples of the organic tellurol compound represented by the general formula (8) include 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-ceptor. Decafluorooctyl tellurol, 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-septadecafluorononyl tellurol, 3,3 , 4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl tellurol, 3,3,4,4,5,5,6,6,7,7, 8,8,9,9,10,10,10-septadecafluorodecyl tellurol, 4,4,5,5,6,6,7,7,8,8,9,9,10,10,11 , 11,11-Septadecafluoroundecylterol, 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12 , 1 , 13,13,13- Heng Eiko Saka fluoro dodecyl ether roll, and the like. Preferably 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl tellurol, 3,3,4,4,5,5,6,6 , 7,7,8,8,9,9,10,10,10-septadecafluorodecyl tellurol, more preferably 3,3,4,4,5,5,6,6,7,7. , 8,8,9,9,10,10,10-septadecafluorodecyl tellurol.
一般式(8)で表される有機テルロール化合物は、一般式(6)で表される有機ジテルル化合物を水素化ホウ素化合物等により還元することにより製造することができる。 The organic tellurium compound represented by the general formula (8) can be produced by reducing the organic ditellurium compound represented by the general formula (6) with a borohydride compound or the like.
一般式(8)で表される有機テルロール化合物は反応系中において生成させてもよい。例えば、下記一般式(9)で表されるテルル化合物とアルコールとの混合物、一般式(6)で表される有機ジテルル化合物と水素化ホウ素化合物との混合物等を用いることで反応系中において、一般式(8)で表される有機テルロール化合物を発生させる方法がある。 The organic tellurol compound represented by the general formula (8) may be produced in the reaction system. For example, in a reaction system by using a mixture of a tellurium compound and an alcohol represented by the following general formula (9), a mixture of an organic ditellurium compound and a borohydride compound represented by the general formula (6), There is a method of generating an organic tellurol compound represented by the general formula (8).
〔式中、R1は炭素数1〜20のフッ素含有アルキル基を表す。Yは脱離基を表す。〕 [Wherein, R 1 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. Y represents a leaving group. ]
R1で表される各基は、上記に示した通りである。 Each group represented by R 1 is as described above.
Yで表される脱離基は、重合体溶液中で脱離して一般式(8)で表される有機テルロール化合物を生成し得るものであればよく、例えばトリメチルシリル(TMS)基が挙げられ、メタノール等のアルコールとの反応によりTMS基が脱離して一般式(8)で表される有機テルロール化合物を生成することができる。 The leaving group represented by Y is not particularly limited as long as it can be eliminated in the polymer solution to produce the organic tellurol compound represented by the general formula (8), such as a trimethylsilyl (TMS) group. An organic tellurium compound represented by the general formula (8) can be generated by elimination of the TMS group by reaction with an alcohol such as methanol.
一般式(9)で表されるテルル化合物としては、例えば、1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8−セプタデカフルオロオクチル−トリメチルシリルテルリド、2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9−セプタデカフルオロノニル−トリメチルシリルテルリド、3,3,4,4,5,5,6,6,7,7,8,8,8−トリデカフルオロオクチル−トリメチルシリルテルリド、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル−トリメチルシリルテルリド、4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11−セプタデカフルオロウンデシル−トリメチルシリルテルリド、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13−ヘンエイコサカフルオロドデシル−トリメチルシリルテルリド等を挙げることができる。好ましくは3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル−トリメチルシリルテルリドがよい。 Examples of the tellurium compound represented by the general formula (9) include 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8- Septadecafluorooctyl-trimethylsilyl telluride, 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,9-septadecafluorononyl-trimethylsilyl telluride Lido, 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl-trimethylsilyl telluride, 3,3,4,4,5,5,6 , 6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl-trimethylsilyl telluride, 4,4,5,5,6,6,7,7,8,8, 9,9,10,10,11,11,11-septadecafluoroundecyl-trimethylsilyl telluride, 3,3 4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,13-heneicosacafluorododecyl-trimethylsilyl telluride Etc. Preferred is 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl-trimethylsilyl telluride.
一般式(9)で表されるテルル化合物は、一般式(6)で表される有機ジテルル化合物に還元剤を反応させ、続いてシリル化剤と反応させることにより製造することができる。 The tellurium compound represented by the general formula (9) can be produced by reacting the organic ditellurium compound represented by the general formula (6) with a reducing agent and subsequently reacting with a silylating agent.
一般式(9)で表されるテルル化合物を製造するために用いる還元剤としては、リチウム金属、ナトリウム金属、カリウム金属及びこれらの金属のナフタレニド、水素化ホウ素ナトリウム、水素化ホウ素リチウム、水素化ホウ素カリウム、水素化トリエチルホウ素リチウム、水素化シアノホウ素ナトリウム等の金属ヒドリド等を用いることができる。この中でも水素化トリエチルホウ素リチウムが好ましい。 Examples of the reducing agent used for producing the tellurium compound represented by the general formula (9) include lithium metal, sodium metal, potassium metal and naphthalenide of these metals, sodium borohydride, lithium borohydride, borohydride. Metal hydrides such as potassium, lithium triethylborohydride, sodium cyanoborohydride and the like can be used. Among these, lithium triethylborohydride is preferable.
シリル化剤としては、トリメチルシリルクロライド、トリメチルシリルブロマイド、トリエチルシリルブロマイド等が挙げられるが、好ましくはトリメチルシリルブロマイドがよい。 Examples of the silylating agent include trimethylsilyl chloride, trimethylsilyl bromide, triethylsilyl bromide, and the like, preferably trimethylsilyl bromide.
上記一般式(9)で表されるテルル化合物を製造する方法としては、具体的には下記である。 The method for producing the tellurium compound represented by the general formula (9) is specifically as follows.
一般式(6)で表される有機ジテルル化合物を溶媒に溶解させる。使用できる溶媒としては、ジメチルホルムアミド(DMF)等の極性溶媒、トルエン、キシレン等の芳香族溶媒、ヘキサン、ジメトキシエタン等の脂肪族炭化水素、ジエチルエーテル、テトラヒドロフラン(THF)等のエーテル系溶媒等を挙げることができる。好ましくは、THFがよい。溶媒の使用量としては適宜調整すればよいが、通常、一般式(6)で表される有機ジテルル化合物1gに対して1〜500mlがよく、好ましくは10〜100mlがよい。 The organic ditellurium compound represented by the general formula (6) is dissolved in a solvent. Solvents that can be used include polar solvents such as dimethylformamide (DMF), aromatic solvents such as toluene and xylene, aliphatic hydrocarbons such as hexane and dimethoxyethane, and ether solvents such as diethyl ether and tetrahydrofuran (THF). Can be mentioned. Preferably, THF is good. The amount of the solvent used may be appropriately adjusted, but is usually 1 to 500 ml, preferably 10 to 100 ml, based on 1 g of the organic ditellurium compound represented by the general formula (6).
上記溶媒に還元剤をゆっくりと滴下し、攪拌する。反応時間は、反応温度により異なるが、通常、5分〜24時間がよく、好ましくは10分〜3時間がよい。反応温度としては−20〜80℃がよく、好ましくは0〜50℃がよい。 A reducing agent is slowly dropped into the solvent and stirred. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 3 hours. As reaction temperature, -20-80 degreeC is good, Preferably 0-50 degreeC is good.
次に、この反応液にシリル化剤を加え、攪拌する。反応時間は、反応温度により異なるが、通常、5分〜24時間がよく、好ましくは10分〜3時間がよい。反応温度としては0〜80℃がよく、好ましくは10〜50℃がよい。 Next, a silylating agent is added to the reaction solution and stirred. While the reaction time varies depending on the reaction temperature, it is usually 5 minutes to 24 hours, preferably 10 minutes to 3 hours. As reaction temperature, 0-80 degreeC is good, Preferably 10-50 degreeC is good.
反応終了後、溶媒を濃縮し、目的物を単離精製する。溶媒濃縮の前に、適宜、水、食塩水等にて洗浄を行ってもよい。精製方法としては、化合物により適宜選択できるが、通常、減圧蒸留や再結晶等が好ましい。 After completion of the reaction, the solvent is concentrated and the desired product is isolated and purified. Prior to solvent concentration, washing with water, saline, or the like may be performed as appropriate. The purification method can be appropriately selected depending on the compound, but vacuum distillation, recrystallization and the like are usually preferred.
工程(B)における溶媒の使用量としては、適宜調節すればよく、例えば、ビニル重合体1gに対して、通常0.01〜100mlの範囲であり、好ましくは0.1〜10mlがよい。 What is necessary is just to adjust suitably as the usage-amount of the solvent in a process (B), for example, it is the range of 0.01-100 ml normally with respect to 1 g of vinyl polymers, Preferably 0.1-10 ml is good.
工程(B)の温度及び時間は、通常、0〜100℃の範囲で、5分〜24時間撹拌する。好ましくは、20〜80℃で、10分〜3時間がよい。 The temperature and time of a process (B) are normally 5-100 minutes in the range of 0-100 degreeC. Preferably, it is 20 to 80 ° C. and 10 minutes to 3 hours is good.
工程(B)における還元剤の使用量は、一般式(1)で表される有機テルル化合物1molに対して0.5〜10.0molとすることができる。好ましくは、1.0〜3.0molがよい。 The usage-amount of the reducing agent in a process (B) can be 0.5-10.0 mol with respect to 1 mol of organic tellurium compounds represented by General formula (1). Preferably, 1.0-3.0 mol is good.
本発明の製造方法においては、工程(B)で得られたビニル重合体をフッ素系溶媒で洗浄する工程(C)を備える。前記洗浄としては、公知の洗浄方法を用いることができるが、分液洗浄であることが好ましく、工程(B)終了後の溶液からビニル重合体を単離しフッ素系溶媒と相分離可能な適当な溶媒に溶解させた溶液、又は工程(B)終了後の溶液を用いて行う。 The production method of the present invention includes a step (C) of washing the vinyl polymer obtained in the step (B) with a fluorinated solvent. As the washing, a known washing method can be used, but separation washing is preferable, and an appropriate polymer capable of isolating the vinyl polymer from the solution after the completion of the step (B) and phase-separating with the fluorinated solvent can be used. A solution dissolved in a solvent or a solution after completion of the step (B) is used.
上記分液洗浄の具体例としては、ビニル重合体を溶解した溶液と、フッ素系溶媒とを混合後、分離したフッ素系溶媒を抜き取る。この操作によりビニル重合体中から有機ジテルル化合物を除去することが可能であり、分液洗浄を繰り返すことで一層の効果がある。ビニル重合体から除去される有機ジテルル化合物はフッ素含有アルキル基を有していることから、フッ素系溶媒を用いてビニル重合体溶液を分液洗浄することで、フッ素系溶媒に有機ジテルル化合物を選択に抽出回収することができる。分液洗浄後、それぞれの相の溶媒を減圧下除去することで、ビニル重合体と有機ジテルル化合物とを分離し、回収することができる。 As a specific example of the liquid separation cleaning, a solution in which a vinyl polymer is dissolved and a fluorinated solvent are mixed, and then the separated fluorinated solvent is extracted. By this operation, it is possible to remove the organic ditellurium compound from the vinyl polymer, and there is a further effect by repeating the liquid separation washing. Since the organic ditellurium compound removed from the vinyl polymer has a fluorine-containing alkyl group, the organic ditellurium compound is selected as the fluorine-based solvent by separating and washing the vinyl polymer solution using the fluorine-based solvent. It can be extracted and recovered. After separating and washing, the solvent of each phase is removed under reduced pressure, whereby the vinyl polymer and the organic ditellurium compound can be separated and recovered.
上述のフッ素系溶媒と相分離可能な溶媒は、ビニル重合体を溶解すことができる非プロトン性溶媒、プロトン性溶媒又はその混合溶媒であればよい。 The solvent that can be phase-separated from the above-described fluorine-based solvent may be an aprotic solvent, a protic solvent, or a mixed solvent thereof that can dissolve the vinyl polymer.
使用できる非プロトン性溶媒としては、例えば、ベンゼン、トルエン、N,N−ジメチルホルムアミド(DMF)、ジメチルスルホキシド(DMSO)、アセトン、2−ブタノン(メチルエチルケトン)、ジオキサン、ヘキサフルオロイソプロパオール、クロロホルム、四塩化炭素、テトラヒドロフラン(THF)、酢酸エチル、トリフルオロメチルベンゼン、プロピレングリコールモノメチルエーテルアセテート等を挙げることができる。 Examples of aprotic solvents that can be used include benzene, toluene, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), acetone, 2-butanone (methyl ethyl ketone), dioxane, hexafluoroisopropaol, chloroform, Examples thereof include carbon tetrachloride, tetrahydrofuran (THF), ethyl acetate, trifluoromethylbenzene, propylene glycol monomethyl ether acetate and the like.
使用できるプロトン性溶媒としては、例えば、水、メタノール、エタノール、イソプロパノール、n−ブタノール、エチルセロソルブ、ブチルセロソルブ、1−メトキシ−2−プロパノール、ジアセトンアルコール等を挙げることができる。 Examples of protic solvents that can be used include water, methanol, ethanol, isopropanol, n-butanol, ethyl cellosolve, butyl cellosolve, 1-methoxy-2-propanol, diacetone alcohol, and the like.
フッ素系溶媒としては、直鎖や分岐状のフッ素原子置換アルカン、フッ素原子置換アルキルアミン、フッ素原子置換シクロアルカン、フッ素原子置換芳香族等を用いることができる。具体的には、2H,3H−デカフルオロペンタン、テトラデカフルオロヘキサン、オクタデカフルロロオクタン、エイコサフルオロノナン、ヘキサコサフルオロドデカン、ヘキサフルオロイソプロピルメチルエーテル、ヘプタコサフルオロトリブチルアミン、ペンタデカフルオロトリトリエチルアミン、オクタデカフルオロシクロペンタン、テトラデカフルオロメチルシクロヘキサン、ヘキサフルオロベンゼン、オクタフルオロトルエン、オクタデカフルオロデカナフタレン等を挙げることができる。好ましくは、テトラデカフルオロヘキサン、テトラデカフルオロメチルシクロヘキサンが良い。 As the fluorine-based solvent, linear or branched fluorine atom-substituted alkanes, fluorine atom-substituted alkylamines, fluorine atom-substituted cycloalkanes, fluorine atom-substituted aromatics, and the like can be used. Specifically, 2H, 3H-decafluoropentane, tetradecafluorohexane, octadecafluorofluorooctane, eicosafluorononane, hexacosafluorododecane, hexafluoroisopropyl methyl ether, heptacosafluorotributylamine, pentadecafluorotri Examples include triethylamine, octadecafluorocyclopentane, tetradecafluoromethylcyclohexane, hexafluorobenzene, octafluorotoluene, octadecafluorodecanaphthalene and the like. Tetradecafluorohexane and tetradecafluoromethylcyclohexane are preferable.
上記分液洗浄において、フッ素系溶媒は、有機溶媒、水性溶媒又はその混合溶媒に対して、通常0.1〜10倍量添加するが、好ましくは0.5〜3倍量である。分液洗浄は、通常10〜60℃で行うが、好ましくは室温(20℃)が良い。また、その他の溶媒や水を適宜添加しても良い。 In the liquid separation washing, the fluorinated solvent is usually added in an amount of 0.1 to 10 times, preferably 0.5 to 3 times the amount of the organic solvent, the aqueous solvent or the mixed solvent thereof. Separation washing is usually performed at 10 to 60 ° C., preferably room temperature (20 ° C.). Moreover, you may add another solvent and water suitably.
本発明の製造方法で得られるビニル重合体の分子量は、反応時間及び有機テルル化合物の量により適宜調整可能であるが、数平均分子量(Mn)が500〜1,000,000のビニル重合体を得ることができる。特にMnが1,000〜50,000のビニル重合体を得るのに好適である。Mnはゲルパーミエーションクロマトグラフィー(以下「GPC」という)法により測定することができる。 The molecular weight of the vinyl polymer obtained by the production method of the present invention can be appropriately adjusted depending on the reaction time and the amount of the organic tellurium compound, but a vinyl polymer having a number average molecular weight (Mn) of 500 to 1,000,000 is used. Can be obtained. It is particularly suitable for obtaining a vinyl polymer having Mn of 1,000 to 50,000. Mn can be measured by a gel permeation chromatography (hereinafter referred to as “GPC”) method.
本発明の製造方法で得られるビニル重合体の分子量分布(PDI)は1.5以下に制御することができる。分子量分布(PDI)とは、(ビニル重合体の重量平均分子量(Mw))/(ビニル重合体の数平均分子量(Mn))によって求められるものであり、PDIは小さいほど分子量分布の幅が狭い、分子量のそろったビニル重合体となり、その値が1.0のとき最も分子量分布の幅が狭い。反対に、PDIが大きいほど設計したビニル重合体の分子量に比べて、分子量が小さいものや、分子量の大きいものが含まれることになる。 The molecular weight distribution (PDI) of the vinyl polymer obtained by the production method of the present invention can be controlled to 1.5 or less. The molecular weight distribution (PDI) is obtained by (weight average molecular weight (Mw) of vinyl polymer) / (number average molecular weight (Mn) of vinyl polymer). The smaller the PDI, the narrower the molecular weight distribution. When the value is 1.0, the width of the molecular weight distribution is the narrowest. Conversely, the larger the PDI, the smaller the molecular weight and the larger the molecular weight of the vinyl polymer designed.
本発明の製造方法では、使用した有機テルル化合物を高効率で有機ジテルル化合物として高効率で回収することができることから、得られるビニル重合体はテルル含有量が少なく、例えば光学用途、医療用途、電気・電子用途、エネルギー材料用途等で好適に用いることができる。 In the production method of the present invention, since the used organic tellurium compound can be recovered with high efficiency as an organic ditellurium compound, the resulting vinyl polymer has a low tellurium content. For example, optical use, medical use, electrical use -It can be suitably used for electronic applications, energy material applications, and the like.
以下、本発明について、具体的な実施例に基づいて、さらに詳細に説明する。本発明は、以下の実施例に何ら限定されるものではなく、その要旨を変更しない範囲において適宜変更して実施することが可能である。 Hereinafter, the present invention will be described in more detail based on specific examples. The present invention is not limited to the following examples, and can be implemented with appropriate modifications without departing from the scope of the invention.
<有機ジテルル化合物の合成>
(合成例1)
ジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリドを以下の方法で合成した。
<Synthesis of organic ditellurium compound>
(Synthesis Example 1)
Di-3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl ditelluride was synthesized by the following method. .
200mLの3つ口ガラス容器に金属テルル(2.55g、20mmol)と金属ナトリウム(0.51g、22mmol)に、エチレンジアミン(75mL)を加え、混合物を攪拌しながら3時間還流させた。この反応溶液を室温まで放冷したのち、C8F17C2H4I(11.5g、20mmol)とTHF(25mL)の混合溶液を30分かけて滴下し、この反応溶液を室温で1時間攪拌した。反応溶液を氷浴で冷却し、30mLの水をゆっくりと加えたのち、ジエチルエーテルで抽出した。有機相を硫酸マグネシウムにより脱水したのち、セライトの短カラムに通した。溶媒を留去して得られた粗生成物をメタノールにより洗浄し、クロロホルムを溶媒に用いて再結晶することで、オレンジ色の固体を得た(7.3g、収率65%)。1H−NMR、19F−NMR、13C−NMRにより目的物であることを確認した。 Ethylenediamine (75 mL) was added to metal tellurium (2.55 g, 20 mmol) and metal sodium (0.51 g, 22 mmol) in a 200 mL three-necked glass container, and the mixture was refluxed for 3 hours with stirring. The reaction solution was allowed to cool to room temperature, and then a mixed solution of C 8 F 17 C 2 H 4 I (11.5 g, 20 mmol) and THF (25 mL) was added dropwise over 30 minutes. Stir for hours. The reaction solution was cooled in an ice bath, and 30 mL of water was slowly added, followed by extraction with diethyl ether. The organic phase was dehydrated with magnesium sulfate and then passed through a short column of celite. The crude product obtained by distilling off the solvent was washed with methanol, and recrystallized using chloroform as a solvent to obtain an orange solid (7.3 g, yield 65%). 1 H-NMR, 19 F-NMR, and 13 C-NMR confirmed the desired product.
<有機テルル化合物(リビングラジカル重合開始剤)の合成>
(実施例1)
エチル−2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)プロピオネートを、以下の方法で合成した。
<Synthesis of organic tellurium compound (living radical polymerization initiator)>
Example 1
Ethyl-2-methyl-2- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranil) Propionate was synthesized by the following method.
500mLの3つ口ガラス容器に、ジイソプロピルアミン(2.5mL、18mmol)とTHF(50mL)を加え、この溶液を攪拌しながら氷浴で冷却した。ここにブチルリチウム−ヘキサン溶液(10.5mL、16.5mmol)を10分かけて滴下し、氷浴につけたまま20分間攪拌した。この溶液をドライアイス/アセトン浴で冷却したのち、エチル−2−メチルプロピオネート(2.22mL、16.5mmol)をゆっくり滴下し、さらに1時間半攪拌した。 Diisopropylamine (2.5 mL, 18 mmol) and THF (50 mL) were added to a 500 mL three-necked glass container, and the solution was cooled in an ice bath with stirring. A butyllithium-hexane solution (10.5 mL, 16.5 mmol) was added dropwise thereto over 10 minutes, and the mixture was stirred for 20 minutes while attached to an ice bath. After cooling this solution with a dry ice / acetone bath, ethyl-2-methylpropionate (2.22 mL, 16.5 mmol) was slowly added dropwise, and the mixture was further stirred for 1.5 hours.
200mLの3つ口ガラス容器にジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリド(8.4g、7.5mmol)とTHF(150mL)を加え、攪拌しながら氷浴で冷却した。この溶液に臭素(0.403mL、7.9mmol)を滴下し、さらに1時間攪拌した。この反応溶液を、ドライアイス/アセトン浴で冷却している500mL3つ口ガラス容器で調製した溶液に滴下した。冷却浴を氷浴に交換し、反応溶液を昇温させたのち、さらに30分攪拌した。反応溶液を飽和塩化アンモニウム水溶液と飽和塩水で順に洗浄したのち、有機相を硫酸マグネシウムで脱水した。溶媒を留去したのち、減圧蒸留してオレンジ色オイル状物を得た(8.4g、収率82%)。1H−NMR、19F−NMR、13C−NMRにより目的物であることを確認した。 Di-3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluorodecyl ditel in a 200 mL 3-neck glass container Lido (8.4 g, 7.5 mmol) and THF (150 mL) were added and cooled in an ice bath with stirring. Bromine (0.403 mL, 7.9 mmol) was added dropwise to this solution, and the mixture was further stirred for 1 hour. This reaction solution was added dropwise to a solution prepared in a 500 mL three-necked glass vessel cooled in a dry ice / acetone bath. The cooling bath was replaced with an ice bath, the temperature of the reaction solution was raised, and the mixture was further stirred for 30 minutes. The reaction solution was washed successively with a saturated aqueous ammonium chloride solution and saturated brine, and then the organic phase was dehydrated with magnesium sulfate. After the solvent was distilled off, distillation under reduced pressure gave an orange oily product (8.4 g, yield 82%). 1 H-NMR, 19 F-NMR, and 13 C-NMR confirmed the desired product.
(実施例2)
メチル−2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)プロピオネートを、以下の方法で合成した。
(Example 2)
Methyl-2-methyl-2- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranil) Propionate was synthesized by the following method.
500mLの3つ口反応容器に、ジイソプロピルアミン(2.48mL、17.7mmol)とTHF(50mL)を加え、この溶液を攪拌しながらドライアイス/アセトン浴で冷却した。ここにブチルリチウム−ヘキサン溶液(10.1mL、16.1mmol)を20分かけて滴下し、ドライアイス/アセトン浴につけたまま20分間攪拌した。この溶液にメチル 2−メチルプロピオネート(1.85mL、16.1mmol)をゆっくり滴下し、さらに1時間半攪拌した。 Diisopropylamine (2.48 mL, 17.7 mmol) and THF (50 mL) were added to a 500 mL three-necked reaction vessel, and the solution was cooled in a dry ice / acetone bath with stirring. A butyllithium-hexane solution (10.1 mL, 16.1 mmol) was added dropwise thereto over 20 minutes, and the mixture was stirred for 20 minutes while attached to a dry ice / acetone bath. Methyl 2-methylpropionate (1.85 mL, 16.1 mmol) was slowly added dropwise to this solution, and the mixture was further stirred for 1.5 hours.
300mLの3つ口ガラス容器にジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリド(8.40g、7.31mmol)とTHF(150mL)を加え、攪拌しながら氷浴で冷却した。この溶液に臭素(0.40mL、7.67mmol)を滴下し、さらに45分間攪拌した。この反応溶液を、先に調製したドライアイス/アセトン浴で冷却している500mL反応容器へ滴下した。40分攪拌した後、冷却浴を氷浴に交換してさらに攪拌した。30分後、氷浴を除いてさらに10分攪拌した。反応溶液を飽和塩化アンモニウム水溶液と飽和塩水で順に洗浄したのち、有機相を硫酸マグネシウムで脱水した。溶媒を留去したのち、減圧蒸留してオレンジ色オイル状の目的化合物を得た(6.18g、収率64%)。1H−NMR、19F−NMR、13C−NMRにより目的物であることを確認した。 Di-3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluorodecyl ditel in a 300 mL three-necked glass container Lido (8.40 g, 7.31 mmol) and THF (150 mL) were added and cooled in an ice bath with stirring. Bromine (0.40 mL, 7.67 mmol) was added dropwise to this solution, and the mixture was further stirred for 45 minutes. This reaction solution was added dropwise to a 500 mL reaction vessel cooled in the previously prepared dry ice / acetone bath. After stirring for 40 minutes, the cooling bath was replaced with an ice bath and further stirred. After 30 minutes, the ice bath was removed and the mixture was further stirred for 10 minutes. The reaction solution was washed successively with a saturated aqueous ammonium chloride solution and saturated brine, and then the organic phase was dehydrated with magnesium sulfate. After the solvent was distilled off, distillation under reduced pressure gave the target compound as an orange oil (6.18 g, yield 64%). 1 H-NMR, 19 F-NMR, and 13 C-NMR confirmed the desired product.
(実施例3)
メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)プロピオネートを、以下の方法で合成した。
(Example 3)
Methyl-2- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecylterranyl) propionate The method was synthesized.
100mLの3つ口ガラス容器に、ジイソプロピルアミン(0.34mL、0.24mmol)とTHF(10mL)を加え、この溶液を攪拌しながら氷浴で冷却した。ここにブチルリチウム−ヘキサン溶液(1.42mL、0.26mmol)を10分かけて滴下し、氷浴につけたまま20分間攪拌した。この溶液をドライアイス/アセトン浴で冷却したのち、メチルプロピオネート(0.21mL、0.22mmol)をゆっくり滴下し、さらに1時間半攪拌した。 Diisopropylamine (0.34 mL, 0.24 mmol) and THF (10 mL) were added to a 100 mL three-necked glass container, and the solution was cooled in an ice bath with stirring. A butyllithium-hexane solution (1.42 mL, 0.26 mmol) was added dropwise thereto over 10 minutes, and the mixture was stirred for 20 minutes while attached to an ice bath. After this solution was cooled in a dry ice / acetone bath, methyl propionate (0.21 mL, 0.22 mmol) was slowly added dropwise, and the mixture was further stirred for 1.5 hours.
100mLの3つ口ガラス容器にジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリド(1.12g、1.0mmol)とTHF(30mL)を加え、攪拌しながら氷浴で冷却した。この溶液に臭素(0.052mL、1.0mmol)を滴下し、さらに30分間攪拌した。この反応溶液を、ドライアイス/アセトン浴で冷却している100mL3つ口ガラス容器で調製した溶液に滴下した。冷却浴を氷浴に交換し、反応溶液を昇温させたのち、さらに30分攪拌した。反応溶液を飽和塩化アンモニウム水溶液と飽和塩水で順に洗浄したのち、有機相を硫酸マグネシウムで脱水した。溶媒を留去したのち、減圧蒸留してオレンジ色オイル状の目的化合物を得た(0.56g、収率42%)。1H−NMR、19F−NMR、13C−NMRにより目的物であることを確認した。 Di-3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluorodecyl ditel in a 100 mL 3-neck glass container Lido (1.12 g, 1.0 mmol) and THF (30 mL) were added and cooled in an ice bath with stirring. Bromine (0.052 mL, 1.0 mmol) was added dropwise to this solution, and the mixture was further stirred for 30 minutes. This reaction solution was added dropwise to a solution prepared in a 100 mL three-necked glass vessel cooled in a dry ice / acetone bath. The cooling bath was replaced with an ice bath, the temperature of the reaction solution was raised, and the mixture was further stirred for 30 minutes. The reaction solution was washed successively with a saturated aqueous ammonium chloride solution and saturated brine, and then the organic phase was dehydrated with magnesium sulfate. After the solvent was distilled off, distillation under reduced pressure gave the target compound as an orange oil (0.56 g, yield 42%). 1 H-NMR, 19 F-NMR, and 13 C-NMR confirmed the desired product.
(実施例4)
1−フェニルエチル 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル テルリドを、以下の方法で合成した。
Example 4
1-Phenylethyl 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluorodecyl telluride was synthesized by the following method. did.
300mLの3つ口ガラス容器に、ジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリド(6.2g、5.39mmol)とTHF(100mL)を加えた。ここにリチウムトリエチルボロヒドリド―THF溶液(11.3mL、11.3っmol)を加え、室温で10分間攪拌した。1−フェニル−1−ブロモエタン(1.50mL、10.8mmol)を加えたのち、さらに1時間攪拌した。反応溶液を飽和塩化アンモニウム水溶液と飽和塩水で順に洗浄したのち、有機相を硫酸マグネシウムで脱水した。溶媒を減圧で留去した後、テトラデカフルオロシクロヘキサン(2mL)とメタノール(3mL)を加えて攪拌した後、二相が分離するまで静置した後、上層のメタノール溶液を取り除いた。ここにメタノール(3mL)を加えて撹拌、除く操作を合計4回繰り返した。テトラデカフルオロシクロヘキサン溶液の溶媒を減圧で留去し、オレンジ色オイル状物を得た(5.84g、収率78%)。1H−NMR、19F−NMR、13C−NMRにより目的物であることを確認した。 In a 300 mL three-necked glass container, di-3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluorodecyldi Telluride (6.2 g, 5.39 mmol) and THF (100 mL) were added. Lithium triethylborohydride-THF solution (11.3 mL, 11.3 mol) was added thereto, and the mixture was stirred at room temperature for 10 minutes. 1-Phenyl-1-bromoethane (1.50 mL, 10.8 mmol) was added, and the mixture was further stirred for 1 hr. The reaction solution was washed successively with a saturated aqueous ammonium chloride solution and saturated brine, and then the organic phase was dehydrated with magnesium sulfate. After the solvent was distilled off under reduced pressure, tetradecafluorocyclohexane (2 mL) and methanol (3 mL) were added and stirred, and then allowed to stand until the two phases separated, and then the upper layer methanol solution was removed. Methanol (3 mL) was added thereto, and the operation of stirring and removing was repeated 4 times in total. The solvent of the tetradecafluorocyclohexane solution was distilled off under reduced pressure to obtain an orange oil (5.84 g, yield 78%). 1 H-NMR, 19 F-NMR, and 13 C-NMR confirmed the desired product.
<還元剤の合成>
(合成例2)
3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル トリメチルシリルテルリドを、以下の方法で合成した。
<Synthesis of reducing agent>
(Synthesis Example 2)
3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl trimethylsilyl telluride was synthesized by the following method.
300mLの3つ口ガラス容器にジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリド(8.0g、6.8mmol)とTHF(150mL)を加えたのち、水素化トリエチルホウ素リチウムTHF溶液(15.6mL、15.6mmol)を加えた。この溶液にトリメチルシリルブロマイド(5.4mL、40.8mmol)を加え、室温(20℃)で5分間攪拌した。THFを減圧にて留去したのちにヘキサンを加えて、生じた固体をろ過で取り除いた。ろ液からヘキサンを減圧にて留去したのち、減圧蒸留して黄色液体を得た(5.9g、収率67%)。1H−NMR、19F−NMR、13C−NMRにより目的物であることを確認した。 Di-3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluorodecyl ditel in a 300 mL three-necked glass container Lido (8.0 g, 6.8 mmol) and THF (150 mL) were added, and then lithium triethylborohydride THF solution (15.6 mL, 15.6 mmol) was added. Trimethylsilyl bromide (5.4 mL, 40.8 mmol) was added to this solution, and the mixture was stirred at room temperature (20 ° C.) for 5 minutes. After THF was distilled off under reduced pressure, hexane was added, and the resulting solid was removed by filtration. Hexane was distilled off from the filtrate under reduced pressure, followed by distillation under reduced pressure to obtain a yellow liquid (5.9 g, yield 67%). 1 H-NMR, 19 F-NMR, and 13 C-NMR confirmed the desired product.
3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル トリメチルシリルテルリドに対して、重クロロホルム中でメタノールを加えたところ、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル−テルロールが生成した。この3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルが還元作用を示す。 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl trimethylsilyl telluride, methanol in deuterated chloroform As a result, 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadedecafluorodecyl-tellol was produced. This 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl shows a reducing action.
(実施例5〜10及び比較例1〜2)
以下の表1に示すように、工程(A)、工程(B)、及び工程(C)を行った。
(Examples 5-10 and Comparative Examples 1-2)
As shown in Table 1 below, Step (A), Step (B), and Step (C) were performed.
表1に示す、アゾ系重合開始剤、ビニルモノマー及び重合溶媒は、以下の通りである。 The azo polymerization initiator, vinyl monomer and polymerization solvent shown in Table 1 are as follows.
AIBN:2,2’−アゾビス(イソブチロニトリル)
MMA:メタクリル酸メチル
MA:アクリル酸メチル
St:スチレン
VP:N−ビニル−2−ピロリドン
DMAEMA:メタクリ酸2−(ジメチルアミノ)エチル
THF:テトラヒドロフラン
PMA:プロピレングリコールモノメチルエーテルアセテート
TFC:テトラデカフルオロメチルシクロヘキサン
AcOEt:酢酸エチル
AIBN: 2,2′-azobis (isobutyronitrile)
MMA: Methyl methacrylate MA: Methyl acrylate St: Styrene VP: N-Vinyl-2-pyrrolidone DMAEMA: 2- (dimethylamino) ethyl methacrylate THF: Tetrahydrofuran PMA: Propylene glycol monomethyl ether acetate TFC: Tetradecafluoromethylcyclohexane AcOEt: ethyl acetate
表1に示す化合物#1)〜#5)は、以下の通りである。 Compounds # 1) to # 5) shown in Table 1 are as follows.
#1) エチル−2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)プロピオネート
#2) エチル−2−メチル−2−n−ブチルテラニル−プロピオネート
#3) ジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリド
#4) ジブチルジテルリド
#5) 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル トリメチルシリルテルリド
# 1) Ethyl-2-methyl-2- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl Terranyl) propionate # 2) Ethyl-2-methyl-2-n-butylterranyl-propionate # 3) Di-3,3,4,4,5,5,6,6,7,7,8,8,9 , 9,10,10,10-septadecafluorodecyl ditelluride # 4) dibutyl ditelluride # 5) 3,3,4,4,5,5,6,6,7,7,8,8, 9,9,10,10,10-septadecafluorodecyl trimethylsilyl telluride
<工程(A)>
表1に示す有機テルル化合物、アゾ系重合開始剤、ビニルモノマー及び重合溶媒を用いて、表1に示す重合条件でビニルモノマーをリビングラジカル重合した。表1において、各当量は、有機テルル化合物に対する当量である。実施例5及び6並びに比較例2においては有機ジテルル化合物を併用している。
<Process (A)>
Using the organic tellurium compound, the azo polymerization initiator, the vinyl monomer, and the polymerization solvent shown in Table 1, the vinyl monomer was subjected to living radical polymerization under the polymerization conditions shown in Table 1. In Table 1, each equivalent is equivalent to the organic tellurium compound. In Examples 5 and 6 and Comparative Example 2, an organic ditellurium compound is used in combination.
<工程(B)>
重合終了後の溶液に、表1に示す処理剤を添加し、表1に示す処理条件で処理した。実施例5及び7〜10においては、還元作用を示す化合物#5)を処理剤として用いた。この場合、保護基の脱離剤としてメタノールを用いた。実施例6においては、還元作用を示すNaBH4を処理剤として用いた。比較例1及び2においては、実質的に還元作用を示さないチオフェノールを処理剤として用いた。なお、比較例1の処理条件における「6W LED」は、6WのLEDランプを照射したことを意味している。
<Process (B)>
The treatment agent shown in Table 1 was added to the solution after completion of the polymerization, and the solution was treated under the treatment conditions shown in Table 1. In Examples 5 and 7 to 10, compound # 5) showing a reducing action was used as a treating agent. In this case, methanol was used as the protecting group leaving agent. In Example 6, NaBH 4 showing a reducing action was used as a treating agent. In Comparative Examples 1 and 2, thiophenol which does not substantially exhibit a reducing action was used as a treating agent. Note that “6W LED” in the processing conditions of Comparative Example 1 means that a 6 W LED lamp was irradiated.
<工程(C)>
表1に示す洗浄溶媒を用いて、工程(B)で得られたビニル重合体を分液洗浄した。回収されたテルル化合物の回収率及び純度を表1に示している。回収率は、使用したテルル化合物(有機テルル化合物、有機ジテルル化合物及びテルル系還元剤)の総量に対する回収したテルル化合物の割合を示している。純度は、回収したテルル化合物中の有機ジテルル化合物の純度を示している。
<Process (C)>
Using the cleaning solvent shown in Table 1, the vinyl polymer obtained in the step (B) was subjected to liquid separation cleaning. The recovery rate and purity of the recovered tellurium compound are shown in Table 1. The recovery rate indicates the ratio of the recovered tellurium compound to the total amount of the tellurium compound (organic tellurium compound, organic ditelluride compound and tellurium-based reducing agent) used. The purity indicates the purity of the organic ditellurium compound in the recovered tellurium compound.
実施例5〜9の数平均分子量(Mn)及び分子量分布(PDI)は、GPC[Shodex GPC−104(カラム:Shodex LF−604x2)、Shodex GPC−101(カラム:Shodex LF804・K−805F・K−800RL)]を用いて、ポリメチルメタクリレート標準サンプル(Shodex PMMS Standard)の分子量を基準に求めた。 The number average molecular weight (Mn) and molecular weight distribution (PDI) of Examples 5 to 9 are GPC [Shodex GPC-104 (column: Shodex LF-604x2), Shodex GPC-101 (column: Shodex LF804 · K-805F · K). -800RL)] was determined based on the molecular weight of a polymethyl methacrylate standard sample (Shodex PMMS Standard).
実施例10、比較例1及び比較例2の数平均分子量(Mn)及び分子量分布(PDI)は、GPC[Shodex GPC−104(カラム:Shodex LF−604x2)、Shodex GPC−101(カラム:Shodex LF804・K−805F・K−800RL)]を用いて、ポリスチレン標準サンプル(東ソー社製TSK Standard)の分子量を基準に求めた。 The number average molecular weight (Mn) and molecular weight distribution (PDI) of Example 10, Comparative Example 1 and Comparative Example 2 are GPC [Shodex GPC-104 (column: Shodex LF-604x2), Shodex GPC-101 (column: Shodex LF804). · K-805F · K-800RL)] was used to determine the molecular weight of a polystyrene standard sample (TSK Standard manufactured by Tosoh Corporation).
代表例として、実施例5を下記に具体的に示す。 As a typical example, Example 5 is specifically shown below.
ガラス管に、エチル−2−メチル−2−(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルテラニル)プロピオネート(40μL、0.1mmol)、MMA(0.5mL、5mmol)、ジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリド(115mg、0.1mmol)、AIBN(3.3mg、0.02mmol)、THF(1mL)を加えた。この溶液を窒素雰囲気で60℃にて18時間攪拌し、有機テルル基を末端にもつポリメチルメタクリレートを得た。GPC分析(ポリメチルメタクリレート標準)よりMn=5200、Mw/Mn=1.12であった(0.45g、収率89%)。 In a glass tube, ethyl-2-methyl-2- (3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluoro Decylteranyl) propionate (40 μL, 0.1 mmol), MMA (0.5 mL, 5 mmol), di-3,3,4,4,5,5,6,6,7,7,8,8,9, 9,10,10,10-Septadecafluorodecyl ditelluride (115 mg, 0.1 mmol), AIBN (3.3 mg, 0.02 mmol), THF (1 mL) were added. This solution was stirred at 60 ° C. for 18 hours in a nitrogen atmosphere to obtain polymethyl methacrylate having an organic tellurium group at the end. From GPC analysis (polymethyl methacrylate standard), Mn = 5200 and Mw / Mn = 1.12 (0.45 g, yield 89%).
得られたポリマーに、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシル−トリメチルシリルテルリド(44μL、0.11mmol)、メタノール(49μL、1.2mmol)を加え、室温(20℃)で5分間攪拌した。 The obtained polymer was added to 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl-trimethylsilyl telluride (44 μL). 0.11 mmol) and methanol (49 μL, 1.2 mmol) were added, and the mixture was stirred at room temperature (20 ° C.) for 5 minutes.
この溶液にTFC(1mL)を加え、撹拌した。二相が分離するまで静置した後、TFC相を取り除いた。この分液洗浄操作を6回繰り返した。集めたTFC相から溶媒を留去してオレンジ色の固体を得た。1H−NMRよりジ−3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10−セプタデカフルオロデシルジテルリドであることを確認し、純度は100%であった。重量測定よりテルル化合物の回収率は93%であった。 To this solution was added TFC (1 mL) and stirred. After allowing to stand until the two phases separated, the TFC phase was removed. This separation washing operation was repeated 6 times. The solvent was distilled off from the collected TFC phase to obtain an orange solid. It is di-3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-septadecafluorodecyl ditelluride from 1 H-NMR. It was confirmed that the purity was 100%. From the weight measurement, the recovery rate of the tellurium compound was 93%.
一方、分離したTHF相から溶媒を留去して、ポリメチルメタクリレートを回収した。GPC分析(ポリメチルメタクリレート標準)よりMn=5100、Mw/Mn(PDI)=1.12であった。重量測定よりポリマーの回収率は99%であった。 On the other hand, the solvent was distilled off from the separated THF phase to recover polymethyl methacrylate. From GPC analysis (polymethyl methacrylate standard), Mn = 5100 and Mw / Mn (PDI) = 1.12. From the weight measurement, the polymer recovery rate was 99%.
表1に示すように、本発明に従う有機テルル化合物を用いた実施例5〜10においては、使用した有機テルル化合物を高い回収率及び高い純度で有機ジテルル化合物として回収できることがわかる。 As shown in Table 1, it can be seen that in Examples 5 to 10 using the organic tellurium compound according to the present invention, the used organic tellurium compound can be recovered as an organic ditellurium compound with a high recovery rate and high purity.
Claims (7)
下記一般式(4)で表される化合物と塩基とを反応させる工程と、前記反応により得られた化合物と下記一般式(5)で表される化合物とを反応させる工程とを含む、有機テルル化合物の製造方法。
An organic tellurium comprising a step of reacting a compound represented by the following general formula (4) with a base, and a step of reacting a compound obtained by the above reaction with a compound represented by the following general formula (5) Compound production method.
下記一般式(6)で表される有機ジテルル化合物と還元剤とを反応させる工程と、前記反応工程により得られた化合物と下記一般式(7)で表される化合物とを反応させる工程とを含む、有機テルル化合物の製造方法。
〔式中、R2及びR3は、それぞれ独立に水素原子又は炭素数1〜8のアルキル基を表す。R4は炭素数1〜8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基又はプロパルギル基を表す。Xはハロゲン原子を表す。〕 A method for producing the organic tellurium compound according to claim 1,
A step of reacting an organic ditellurium compound represented by the following general formula (6) with a reducing agent, and a step of reacting the compound obtained by the reaction step with a compound represented by the following general formula (7). A method for producing an organic tellurium compound.
[Wherein, R 2 and R 3 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. R 4 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group, or a propargyl group. X represents a halogen atom. ]
前記工程(A)で得られたビニル重合体に還元剤を作用させる工程(B)と、
前記工程(B)で得られたビニル重合体をフッ素系溶媒で洗浄する工程(C)とを備える、ビニル重合体の製造方法。 (A) a step of living radical polymerization of a vinyl monomer using the organic tellurium compound according to claim 1 to synthesize a vinyl polymer;
A step (B) in which a reducing agent is allowed to act on the vinyl polymer obtained in the step (A);
And (C) a step of washing the vinyl polymer obtained in the step (B) with a fluorinated solvent.
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CN116171287A (en) * | 2020-09-09 | 2023-05-26 | Agc株式会社 | Method for producing iodine-containing compound, and iodine-containing compound |
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JP2017200961A (en) * | 2016-05-02 | 2017-11-09 | 国立大学法人京都大学 | Method for producing vinyl polymer and vinyl polymer |
CN116171287A (en) * | 2020-09-09 | 2023-05-26 | Agc株式会社 | Method for producing iodine-containing compound, and iodine-containing compound |
CN116171287B (en) * | 2020-09-09 | 2024-04-02 | Agc株式会社 | Method for producing iodine-containing compound, and iodine-containing compound |
CN116082545A (en) * | 2023-02-07 | 2023-05-09 | 苏州大学 | Near infrared light induced tellurium regulation reversible-deactivated free radical polymerization method |
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