JP2017119869A - Composition for producing polyimide film, production method of the composition, and production method of polyimide film using the composition - Google Patents

Composition for producing polyimide film, production method of the composition, and production method of polyimide film using the composition Download PDF

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JP2017119869A
JP2017119869A JP2016255918A JP2016255918A JP2017119869A JP 2017119869 A JP2017119869 A JP 2017119869A JP 2016255918 A JP2016255918 A JP 2016255918A JP 2016255918 A JP2016255918 A JP 2016255918A JP 2017119869 A JP2017119869 A JP 2017119869A
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polyimide precursor
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precursor composition
anhydride
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JP6928447B2 (en
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ヨンチョル チャ
Young Chul Cha
ヨンチョル チャ
セジュ パク
Se Joo Park
セジュ パク
ミンシ アン
Min Shi An
ミンシ アン
スンジュン イ
Seung Jun Lee
スンジュン イ
ジャフン ピョン
Ja Hun Byeon
ジャフン ピョン
ウスン ホン
Woo Sung Hong
ウスン ホン
スンヨン パク
Sun Yong Park
スンヨン パク
ジェフン チョン
Jaehoon Chung
ジェフン チョン
ミニョン ペ
Min Young Bae
ミニョン ペ
ギソク ヤン
Ki Seok Yang
ギソク ヤン
サンジュン イ
Sang Jun Lee
サンジュン イ
ドンミン キム
Dong Min Kim
ドンミン キム
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Dongjin Semichem Co Ltd
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/24Crosslinking, e.g. vulcanising, of macromolecules
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/17Amines; Quaternary ammonium compounds
    • C08K5/18Amines; Quaternary ammonium compounds with aromatically bound amino groups
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

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Abstract

PROBLEM TO BE SOLVED: To provide a polyimide precursor and a production method of the polyimide precursor, and a production method of a polyimide film using the precursor.SOLUTION: The production method of a polyimide precursor relating to the present invention includes: a step of adding an anhydride monomer to a polymerization solvent containing a diamine monomer to react; a step of adding a terminal-capping formulation to the reaction solution to react to synthesize a polyamic acid; and a step of adding and mixing a crosslinking agent with the polyamide acid.SELECTED DRAWING: Figure 1

Description

本発明は、ポリイミド前駆体を含むポリイミドフィルム製造用組成物、その製造方法及びそれを用いたポリイミドフィルムの製造方法に関する。   The present invention relates to a composition for producing a polyimide film containing a polyimide precursor, a method for producing the same, and a method for producing a polyimide film using the composition.

ポリイミド素材は、耐熱特性及び耐化学性に優れて、柔軟なディスプレイの基板用度で適用可能性の高い素材である。   The polyimide material is excellent in heat resistance characteristics and chemical resistance, and is a material with high applicability for a flexible display substrate.

ポリイミド基板素材は、一般的に、キャリアグラス(carrier glass)にポリアミック酸(polyamic acid;PAA)を、塗布器(applicator)またはスリットコータを用いてコーティングしてから、高温の熱的イミド反応によってシートタイプで製作する。しかし、連続工程ではない、バッチタイプ(batch type)の工程でコンベンションオーブンでキュアリング工程(即ち、熱的イミド化工程)を行うことができる生産量は限られており、400℃以上の高温工程であるため、長い工程時間を要する。   In general, a polyimide substrate material is coated with polyamic acid (PAA) on a carrier glass using an applicator or a slit coater, and then heated by a high-temperature thermal imide reaction. Produced by type. However, the amount of production that can be performed in a convention oven in a batch type process (ie, thermal imidization process), which is not a continuous process, is limited, and a high temperature process of 400 ° C. or higher. Therefore, a long process time is required.

コンベンションオーブンにおいてのキュアリング工程によって左右される生産CAPA(capacity)は、速い工程速度のために、オーブンが完全に冷却されていない120℃以上の高温でコーティングされた基板を入れて熱的イミド化を進ませる。この時、溶媒の急速な揮発により、フィルム表面のレベリング(leveling)特性が減少する。このため、架橋剤を用いてこのような問題点を改善しようとする研究が多く行われている(下記特許文献1)。   Production CAPA (capacity), which depends on the curing process in convention ovens, is due to the high process speed, thermal imidization with the substrate coated at a high temperature above 120 ° C where the oven is not completely cooled To advance. At this time, the leveling characteristic of the film surface decreases due to the rapid volatilization of the solvent. For this reason, many studies have been conducted to improve such problems using a crosslinking agent (Patent Document 1 below).

大韓民国登録特許第10−0889910号Korean Registered Patent No. 10-0889910

本発明は、上記従来技術による問題点を解決するためになされたもので、特定含量の架橋剤を含むポリイミド前駆体を用いて、高温でのイミド化でもポリイミドフィルム表面の特性を改善することにより、本発明を完成した。   The present invention was made to solve the above-mentioned problems caused by the prior art, and by using a polyimide precursor containing a specific content of a cross-linking agent, by improving the properties of the polyimide film surface even at imidization at a high temperature. The present invention has been completed.

本発明の一側面は、ジアミン単量体を含有する重合溶媒にアンハイドライド(anhydride)単量体を加えて反応させるステップ;前記反応溶液に末端−キャッピング製剤を加えてから反応させてポリアミック酸を合成するステップ;及び前記ポリアミック酸に架橋剤を加えて混合するステップ;を含む、ポリイミド前駆体の製造方法を提供する。   One aspect of the present invention is a step of adding an hydride monomer to a polymerization solvent containing a diamine monomer and reacting; adding a terminal-capping preparation to the reaction solution, and then reacting the polyamic acid. And a step of adding and mixing a crosslinking agent to the polyamic acid.

本発明の他の側面は、ジアミン単量体を含有する重合溶媒にアンハイドライド単量体を加えて反応させるステップ;前記反応溶液に末端−キャッピング製剤を加えてから反応させてポリアミック酸を合成するステップ;前記ポリアミック酸に架橋剤を加えて混合するステップ;前記架橋剤が加えられたポリアミック酸を含む組成物を支持体上にコーティングするステップ;及び100℃以上の温度で、前記支持体上にコーティングされたポリイミド前駆体を熱的イミド化するステップ;を含む、ポリイミドフィルムの製造方法を提供する。   Another aspect of the present invention is a step of adding an hydride monomer to a polymerization solvent containing a diamine monomer and reacting the resultant; adding a terminal-capping preparation to the reaction solution, and then reacting to synthesize a polyamic acid. Adding a crosslinking agent to the polyamic acid and mixing; coating a composition comprising the polyamic acid to which the crosslinking agent has been added on the support; and on the support at a temperature of 100 ° C. or higher. Thermally imidizing a coated polyimide precursor. A method for producing a polyimide film is provided.

本発明によるポリイミド前駆体は、特定含量の架橋剤をポリアミック酸に追加して形成されたもので、高温のイミド化でもポリイミドフィルムの表面特性を改善することができる。特に、ポリイミドフィルムの表面のレベリング特性を改善し、透過度の損失を減少させることができる。   The polyimide precursor according to the present invention is formed by adding a specific content of a crosslinking agent to polyamic acid, and can improve the surface characteristics of the polyimide film even at high temperature imidization. In particular, the leveling characteristics of the surface of the polyimide film can be improved and the loss of transmittance can be reduced.

本発明の一実施例によるポリイミドフィルムのイメージである。1 is an image of a polyimide film according to an embodiment of the present invention. 本発明の一実施例によるポリイミドフィルムのイメージである。1 is an image of a polyimide film according to an embodiment of the present invention. 本発明の一実施例によるポリイミドフィルムのイメージである。1 is an image of a polyimide film according to an embodiment of the present invention. 本発明の比較例によるポリイミドフィルムのイメージである。It is an image of the polyimide film by the comparative example of this invention. 本発明の比較例によるポリイミドフィルムのイメージである。It is an image of the polyimide film by the comparative example of this invention. 本発明の比較例によるポリイミドフィルムのイメージである。It is an image of the polyimide film by the comparative example of this invention. 本発明の比較例によるポリイミドフィルムのイメージである。It is an image of the polyimide film by the comparative example of this invention.

以下、添付の図面を参照して、本発明の属する技術分野における通常の知識を有する者が容易に実施できるように、本発明の具現例及び実施例について詳細に説明する。   Hereinafter, embodiments and embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art to which the present invention pertains can easily implement the present invention.

しかし、本発明は、さまざまに異なる形態に具現され、ここで説明する具現例及び実施例に限定されるものではない。そして、図面で、本発明を明確に説明するために、説明と係わりのない部分は省略し、明細書全体を通じて、類似した部分については類似した図面符号を付けた。   However, the present invention may be embodied in various different forms and is not limited to the embodiments and examples described herein. In the drawings, in order to clearly describe the present invention, parts not related to the description are omitted, and like parts are denoted by like reference numerals throughout the specification.

本発明の一側面は、ジアミン単量体を含有する重合溶媒にアンハイドライド単量体を加えて反応させるステップ;前記反応溶液に末端−キャッピング製剤(end capping agent)を加えてから反応させてポリアミック酸を合成するステップ;及び前記ポリアミック酸に架橋剤を加えて混合するステップ;を含む、ポリイミド前駆体の製造方法を提供する。   One aspect of the present invention is a step of adding an hydride monomer to a polymerization solvent containing a diamine monomer and reacting it; adding an end-capping agent to the reaction solution, and then reacting the polyamic A method for producing a polyimide precursor, comprising: synthesizing an acid; and adding and mixing a crosslinking agent to the polyamic acid.

本発明の一具現例において、前記ジアミン単量体は、PPDA(p−フェニレンジアミン)、ODA(4,4’−オキシジアニリン)、MDA(4,4’−メチレンジアニリン)、m−トリジン(2,2’−ジメチル−4,4’−ジアミノビフェニル)、TPE−R(1,3−ビス(4’−アミノフェノキシ)ベンゼン)、TFMB(2,2’−ビス(トリフルオロメチル)ベンジジン)、HFBAPP(2,2’−ビス[4−(4−アミノフェノキシ)フェニル]ヘキサフルオロプロパン)、BIS−AP−AF(2,2’−ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン)、DRFB(1,3−ジアミノ−2,4,5,6−テトラフルオロベンゼン)、DDS(3,3’−ジアミノジフェニルスルホン)、ASD(4,4’−ジアミノジフェニルスルフィド)、BAPS(ビス[4−(4−アミノフェノキシ)フェニル]スルホン)、m−BAPS(2,2’−ビス[4−(3−アミノフェノキシ)ベンゼン]スルホン)及びこれらの組合せからなる群から選択されたものを含むことができ、好ましくはPPDAであり得る。前記PPDAは、芳香族構造の単量体で、高い耐熱特性を提供することができる。   In one embodiment of the present invention, the diamine monomer may be PPDA (p-phenylenediamine), ODA (4,4′-oxydianiline), MDA (4,4′-methylenedianiline), m-tolidine. (2,2′-dimethyl-4,4′-diaminobiphenyl), TPE-R (1,3-bis (4′-aminophenoxy) benzene), TFMB (2,2′-bis (trifluoromethyl) benzidine ), HFBAPP (2,2′-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane), BIS-AP-AF (2,2′-bis (3-amino-4-hydroxyphenyl) hexafluoro Propane), DRFB (1,3-diamino-2,4,5,6-tetrafluorobenzene), DDS (3,3′-diaminodiphenylsulfone), ASD 4,4′-diaminodiphenyl sulfide), BAPS (bis [4- (4-aminophenoxy) phenyl] sulfone), m-BAPS (2,2′-bis [4- (3-aminophenoxy) benzene] sulfone) And a group selected from the group consisting of these, and may preferably be PPDA. PPDA is an aromatic monomer and can provide high heat resistance.

本発明の一具現例において、前記アンハイドライド単量体は、芳香族ジアンハイドライド単量体であり得、例えば、BTDA(3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物)、PMDA(ピロメリト酸無水物)、BPDA(3,3’,4,4’−ビフェニルテトラカルボン酸二無水物)、6FDA(2,2−ビス(3,4−アンヒドロジカルボキシフェニル)−ヘキサフルオロプロパン二無水物)、a−BPDA(2,3,3’,4’−ビフェニルテトラカルボン酸二無水物)、ODPA(4,4’−オキシジフタル酸無水物)、DSDA(3,3’,4,4’−ジフェニルスルホンテトラカルボン酸二無水物)、BPADA(5,5’−[1−メチル−1,1−エタンジイルビス(1,4−フェニレン)ビスオキシ]ビス(イソベンゾフラン−1,3−ジオン)、HQDA(ハイドロキノンジフタル酸無水物)及びこれらの組合せからなる群から選択されたものを含むことができる。前記芳香族ジアンハイドライド単量体は、1つ以上、例えば、少なくとも2つの単量体を用いることができる。   In one embodiment of the present invention, the anhydride monomer may be an aromatic dianhydride monomer, such as BTDA (3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride), PMDA (pyromellitic anhydride), BPDA (3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride), 6FDA (2,2-bis (3,4-anhydrodicarboxyphenyl) -hexafluoro Propane dianhydride), a-BPDA (2,3,3 ′, 4′-biphenyltetracarboxylic dianhydride), ODPA (4,4′-oxydiphthalic anhydride), DSDA (3,3 ′, 4 , 4'-diphenylsulfonetetracarboxylic dianhydride), BPADA (5,5 '-[1-methyl-1,1-ethanediylbis (1,4-phenylene) bisoxy] bi (Isobenzofuran-1,3-dione), HQDA (hydroquinone diphthalic anhydride), and combinations thereof may include one aromatic dianhydride monomer. As described above, for example, at least two monomers can be used.

本発明の一具現例において、前記合成溶媒は、本分野において用いられる溶媒なら制限なく用いることができ、例えば、アミド系溶媒、ケトン系溶媒、エーテル系溶媒、エステル系溶媒、対称グリコールジエーテル類溶媒、エーテル類溶媒及びこれらの組合せからなる群から選択されたものを含むことができる。前記アミド系溶媒は、ジメチルホルムアミド(DMF)、ジメチルアセトアミド(DMAC)、n−メチルピロリドン(NMP)などを含むことができ、前記ケトン系溶媒は、アセトン、メチルエチルケトン(MEK)、メチルイソブチルケトン(MIBK)、シクロペンタノン、シクロヘキサノンなどを含むことができる。前記エーテル系溶媒は、テトラヒドロフラン(THF)、1,3−ジオキソラン、1,4−ジオキサンなどを含むことができ、前記エステル系溶媒は、酢酸メチル、酢酸エチル、酢酸ブチル、γ−ブチロラクトン、α−アセトラクトン、β−プロピオラクトン、δ−バレロラクトンなどを含むことができる。前記対称グリコールジエーテル類溶媒は、メチルモノグリム(1,2−ジメトキシエタン)、メチルジグリム(ビス(2−メトキシエチル)エーテル)、メチルトリグリム(1,2−ビス(2−メトキシエトキシ)エタン)、メチルテトラグリム(ビス[2−(2−メトキシエトキシエチル)]エーテル)、エチルモノグリム(1,2−ジエトキシエタン)、エチルジグリム(ビス(2−エトキシエチル)エーテル)、ブチルジグリム(ビス(2−ブトキシエチル)エーテル)などを含むことができ、前記エーテル類溶媒は、グリコールジエーテル類、ジプロピレングリコールメチルエーテル、トリプロピレングリコールメチルエーテル、プロピレングリコールn−プロピルエーテル、ジプロピレングリコールn−プロピルエーテル、プロピレングリコールn−ブチルエーテル、ジプロピレングリコールn−ブチルエーテル、トリピレングリコールn−プロピルエーテル、プロピレングリコールペニルエーテル、ジプロピレングリコールジメチルエーテル、1,3−ジオキソラン、エチレングリコールモノブチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、エチレングリコールモノエチルエーテルなどを含むことができる。前記重合溶媒は、少なくとも1つ以上の溶媒が用いられることが好ましく、例えば、NMPを用いることができる。   In one embodiment of the present invention, the synthetic solvent can be used without limitation as long as it is a solvent used in this field. For example, amide solvents, ketone solvents, ether solvents, ester solvents, symmetric glycol diethers Those selected from the group consisting of solvents, ether solvents and combinations thereof can be included. The amide solvent may include dimethylformamide (DMF), dimethylacetamide (DMAC), n-methylpyrrolidone (NMP), and the ketone solvent may be acetone, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK). ), Cyclopentanone, cyclohexanone, and the like. The ether solvent may include tetrahydrofuran (THF), 1,3-dioxolane, 1,4-dioxane, and the ester solvent may include methyl acetate, ethyl acetate, butyl acetate, γ-butyrolactone, α- Acetolactone, β-propiolactone, δ-valerolactone and the like can be included. The symmetric glycol diether solvents are methyl monoglyme (1,2-dimethoxyethane), methyl diglyme (bis (2-methoxyethyl) ether), methyltriglyme (1,2-bis (2-methoxyethoxy) ethane) , Methyl tetraglyme (bis [2- (2-methoxyethoxyethyl)] ether), ethyl monoglyme (1,2-diethoxyethane), ethyl diglyme (bis (2-ethoxyethyl) ether), butyl diglyme (bis (2 -Butoxyethyl) ether) and the like, and the ether solvents include glycol diethers, dipropylene glycol methyl ether, tripropylene glycol methyl ether, propylene glycol n-propyl ether, dipropylene glycol n-propyl ether. , Propi Glycol n-butyl ether, dipropylene glycol n-butyl ether, tripylene glycol n-propyl ether, propylene glycol phenyl ether, dipropylene glycol dimethyl ether, 1,3-dioxolane, ethylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether , Ethylene glycol monoethyl ether, and the like. As the polymerization solvent, at least one solvent is preferably used. For example, NMP can be used.

本発明の一具現例において、前記末端−キャッピング製剤は、重合反応を調節するために用いられるもので、アンハイドライド形態の単量体を用いることができる。前記アンハイドライド形態の単量体は、例えば、PA(無水フタル酸)、TSA(n−テトラデシルコハク酸無水物)、HAS(ヘキサデシルこはく酸無水物)、OSA(オクタデシルこはく酸無水物)及びこれらの組合せからなる群から選択されたものであり得、好ましくはPAであり得る。前記末端−キャッピング製剤は、モノ−アンハイドライド形態で高分子の分子量を調節し、未反応物の含量を減少させ、保管安定性を向上させることができる。   In one embodiment of the present invention, the end-capping preparation is used to control the polymerization reaction, and an unhydride monomer can be used. Examples of the monomer of the anhydride form include PA (phthalic anhydride), TSA (n-tetradecyl succinic anhydride), HAS (hexadecyl succinic anhydride), OSA (octadecyl succinic anhydride), and these. And may be selected from the group consisting of: PA, preferably PA. The end-capping formulation can adjust the molecular weight of the polymer in a mono-anhydride form, reduce the content of unreacted substances, and improve storage stability.

本発明の一具現例において、前記ポリアミック酸を合成してから、製造しようとする製品の基準を満たす固形粉と、粘度調節のために溶媒を加えるステップをさらに含むことができる。前記溶媒は、前記合成溶媒と同じ溶媒を用いることができ、物性改善のために違う種類の溶媒を用いることもできる。   In one embodiment of the present invention, the method may further include a step of adding a solvent for adjusting viscosity and a solid powder satisfying the standard of the product to be manufactured after synthesizing the polyamic acid. As the solvent, the same solvent as the synthesis solvent can be used, and a different type of solvent can be used for improving physical properties.

本発明の一具現例において、前記加橋剤は4,4’−メチレンビス(N,N−ジグリシジルアニリン)を含むことができる。前記架橋剤は、好ましくは、下記化学式を有する4,4’−メチレンビス(N,N−ジグリシジルアニリン)であり得る:
In one embodiment of the present invention, the bridging agent may include 4,4′-methylenebis (N, N-diglycidylaniline). The cross-linking agent may preferably be 4,4′-methylenebis (N, N-diglycidylaniline) having the following chemical formula:

本発明の一具現例において、前記架橋剤は、単量体対比約2000〜約4000ppmの量で加えることができる。前記架橋剤が2000ppm未満の含量で加えられる場合、ポリイミドフィルムの表面が不良状態となる恐れがあり、4000ppmを超える含量で加えられる場合、ポリイミドフィルムの透過度が低くなる恐れがある。   In one embodiment of the present invention, the crosslinking agent may be added in an amount of about 2000 to about 4000 ppm relative to the monomer. When the cross-linking agent is added in a content of less than 2000 ppm, the surface of the polyimide film may be in a poor state, and when it is added in a content of over 4000 ppm, the transparency of the polyimide film may be lowered.

本発明の他の側面は、本願によるポリイミド前駆体の製造方法によって製造されたポリイミド前駆体を含むポリイミドフィルム製造用組成物を提供する。   The other side surface of this invention provides the composition for polyimide film manufacture containing the polyimide precursor manufactured by the manufacturing method of the polyimide precursor by this application.

本発明の一具現例において、前記ポリイミド前駆体は、ポリアミック酸重合体形態を含むことができる。   In an exemplary embodiment of the present invention, the polyimide precursor may include a polyamic acid polymer form.

本発明の一具現例において、前記ポリイミド前駆体は、特定含量の架橋剤をポリアミック酸に追加して形成されたもので、高温のイミド化でもポリイミドフィルムの表面特性を改善することができる。特に、ポリイミドフィルムの表面のレベリング特性を改善し、透過度損失を減少させることができる。   In one embodiment of the present invention, the polyimide precursor is formed by adding a specific content of a crosslinking agent to polyamic acid, and can improve the surface characteristics of the polyimide film even at high temperature imidization. In particular, the leveling characteristics of the surface of the polyimide film can be improved and the transmission loss can be reduced.

本発明のまた他の側面は、ジアミン単量体を含有する重合溶媒にアンハイドライド単量体を加えて反応させるステップ;前記反応溶液に末端−キャッピング製剤を加えてから反応させてポリアミック酸を合成するステップ;及び前記ポリアミック酸に架橋剤を加えて混合するステップ;前記架橋剤が加えられたポリアミック酸を含む組成物を支持体上にコーティングするステップ;及び100℃以上の温度で、前記支持体上にコーティングされたポリイミド前駆体を熱的イミド化するステップ;を含む、ポリイミドフィルムの製造方法を提供する。   According to another aspect of the present invention, a step of adding an hydride monomer to a polymerization solvent containing a diamine monomer and reacting the mixture; adding a terminal-capping preparation to the reaction solution and reacting the resultant to synthesize a polyamic acid And a step of adding a crosslinking agent to the polyamic acid and mixing; coating a composition containing the polyamic acid to which the crosslinking agent has been added on a support; and the support at a temperature of 100 ° C. or higher. Thermally imidizing a polyimide precursor coated thereon; and a method for producing a polyimide film.

本願の一具現例において、前記熱的イミド化は、例えば、約100℃〜約500℃、約100℃〜約400℃、約100℃〜約300℃、約100℃〜約200℃、約200℃〜約500℃、約300℃〜約500℃、約400℃〜約500℃で実行することができるが、必ずこれに制限されるものではない。   In one embodiment of the present application, the thermal imidization may be performed at, for example, about 100 ° C to about 500 ° C, about 100 ° C to about 400 ° C, about 100 ° C to about 300 ° C, about 100 ° C to about 200 ° C, about 200 ° C. However, the present invention is not limited to this.

以下、本発明の実施例を通じてより具体的に説明することにするが、本実施例によって本発明の範囲が制限されるものではない。   Hereinafter, the present invention will be described in more detail through examples, but the scope of the present invention is not limited by these examples.

実施例1
常温に保たれたNMP529.2gにPPDA21.62g(0.2mol)を完全に溶解させてから、BPDA52.96g(0.18mol)及びPMDA4.36g(0.02mol)を順番に投入した。完全に溶解されて1時間経過後、PA0.43g(0.0029mol)を投入して16時間反応させ、PAA重合を完了した。それから、単量体(PPDA、BPDA及びPMDA)含量の2000ppmの4,4’−メチレンビス(N,N−ジグリシジルアニリン)(0.15874g)を同一反応溶媒であるNMPに溶解させた後、前記PAAに加えて混合した。
Example 1
After PPDA 21.62 g (0.2 mol) was completely dissolved in 529.2 g of NMP kept at room temperature, 52.96 g (0.18 mol) of BPDA and 4.36 g (0.02 mol) of PMDA were sequentially added. After 1 hour had been completely dissolved, 0.43 g (0.0029 mol) of PA was added and reacted for 16 hours to complete the PAA polymerization. Then, 2000 ppm of 4,4′-methylenebis (N, N-diglycidylaniline) (0.15874 g) having a monomer (PPDA, BPDA and PMDA) content was dissolved in NMP which is the same reaction solvent, Added to PAA and mixed.

実施例2
常温に保たれたNMP529.2gにPPDA21.62g(0.2mol)を完全に溶解させてから、BPDA52.96g(0.18mol)及びPMDA4.36g(0.02mol)を順番に投入した。完全に溶解されて1時間経過後、PA0.43g(0.0029mol)を投入した。16時間の反応後、単量体(PPDA、BPDA及びPMDA)含量の3000ppmの4,4’−メチレンビス(N,N−ジグリシジルアニリン)(0.23811g)を同一反応溶媒であるNMPに溶解させた後、前記PAAに加えてさらなる混合を行った。
Example 2
After PPDA 21.62 g (0.2 mol) was completely dissolved in 529.2 g of NMP kept at room temperature, 52.96 g (0.18 mol) of BPDA and 4.36 g (0.02 mol) of PMDA were sequentially added. After 1 hour had elapsed after complete dissolution, 0.43 g (0.0029 mol) of PA was added. After the reaction for 16 hours, monomer (PPDA, BPDA and PMDA) content of 3000 ppm of 4,4′-methylenebis (N, N-diglycidylaniline) (0.23811 g) was dissolved in the same reaction solvent NMP. Then, in addition to the PAA, further mixing was performed.

実施例3
常温に保たれたNMP529.2gにPPDA21.62g(0.2mol)を完全に溶解させてから、BPDA52.96g(0.18mol)及びPMDA4.36g(0.02mol)を順番に投入した。完全に溶解されて1時間経過後、PA0.43g(0.0029mol)を投入した。16時間の反応後、単量体(PPDA、BPDA及びPMDA)含量の4000ppmの4,4’−メチレンビス(N,N−ジグリシジルアニリン)(0.31748g)を溶媒に溶解させ、反応の終わったPAAに加えてさらなる混合を行った。
Example 3
After PPDA 21.62 g (0.2 mol) was completely dissolved in 529.2 g of NMP kept at room temperature, 52.96 g (0.18 mol) of BPDA and 4.36 g (0.02 mol) of PMDA were sequentially added. After 1 hour had elapsed after complete dissolution, 0.43 g (0.0029 mol) of PA was added. After the reaction for 16 hours, 4000 ppm of 4,4′-methylenebis (N, N-diglycidylaniline) (0.31748 g) having a monomer (PPDA, BPDA and PMDA) content was dissolved in the solvent, and the reaction was completed. Further mixing was performed in addition to PAA.

比較例1
常温に保たれたNMP529.2gにPPDA21.62g(0.2mol)を完全に溶解させてから、BPDA52.96g(0.18mol)及びPMDA4.36g(0.02mol)を順番に投入した。完全に溶解されて1時間経過後、PA0.43g(0.0029mol)を投入して16時間反応させ、PAA重合を完了した。それから、実施例1と同じ量の溶媒NMPを、反応の終わった前記PAAに加えてさらなる混合を行った。
Comparative Example 1
After PPDA 21.62 g (0.2 mol) was completely dissolved in 529.2 g of NMP kept at room temperature, 52.96 g (0.18 mol) of BPDA and 4.36 g (0.02 mol) of PMDA were sequentially added. After 1 hour had been completely dissolved, 0.43 g (0.0029 mol) of PA was added and reacted for 16 hours to complete the PAA polymerization. Then, the same amount of solvent NMP as in Example 1 was added to the PAA after the reaction, and further mixing was performed.

比較例2
常温に保たれたNMP529.2gにPPDA21.62g(0.2mol)を完全に溶解させてから、BPDA52.96g(0.18mol)及びPMDA4.36g(0.02mol)を順番に投入した。完全に溶解されて1時間経過後、PA0.43g(0.0029mol)を投入して16時間反応させ、PAA重合を完了した。それから、単量体(PPDA、BPDA及びPMDA)含量の1000ppmの4,4’−メチレンビス(N,N−ジグリシジルアニリン)(0.07937g)を同一反応溶媒であるNMPに溶解させ、前記PAAに加えて混合した。
Comparative Example 2
After PPDA 21.62 g (0.2 mol) was completely dissolved in 529.2 g of NMP kept at room temperature, 52.96 g (0.18 mol) of BPDA and 4.36 g (0.02 mol) of PMDA were sequentially added. After 1 hour had been completely dissolved, 0.43 g (0.0029 mol) of PA was added and reacted for 16 hours to complete the PAA polymerization. Then, 1000 ppm of 4,4′-methylenebis (N, N-diglycidylaniline) (0.07937 g) having a monomer (PPDA, BPDA, and PMDA) content was dissolved in NMP, which is the same reaction solvent, and dissolved in the PAA. Added and mixed.

比較例3
常温に保たれたNMP529.2gにPPDA21.62g(0.2mol)を完全に溶解させてから、BPDA52.96g(0.18mol)及びPMDA4.36g(0.02mol)を順番に投入した。完全に溶解されて1時間経過後、PA0.43g(0.0029mol)を投入して16時間反応させ、PAA重合を完了した。それから、単量体(PPDA、BPDA及びPMDA)含量の1500ppmの4,4’−メチレンビス(N,N−ジグリシジルアニリン)(0.119055g)を同一反応溶媒であるNMPに溶解させ、前記PAAに加えて混合した。
Comparative Example 3
After PPDA 21.62 g (0.2 mol) was completely dissolved in 529.2 g of NMP kept at room temperature, 52.96 g (0.18 mol) of BPDA and 4.36 g (0.02 mol) of PMDA were sequentially added. After 1 hour had been completely dissolved, 0.43 g (0.0029 mol) of PA was added and reacted for 16 hours to complete the PAA polymerization. Then, 1500 ppm of 4,4′-methylenebis (N, N-diglycidylaniline) (0.119055 g) having a monomer (PPDA, BPDA, and PMDA) content was dissolved in NMP, which is the same reaction solvent, and dissolved in the PAA. Added and mixed.

比較例4
常温に保たれたNMP529.2gにPPDA21.62g(0.2mol)を完全に溶解させてから、BPDA52.96g(0.18mol)及びPMDA4.36g(0.02mol)を順番に投入した。完全に溶解されて1時間経過後、PA0.43g(0.0029mol)を投入した。16時間の反応後、単量体(PPDA、BPDA及びPMDA)含量の5000ppmの4,4’−メチレンビス(N,N−ジグリシジルアニリン)(0.39685g)を同一反応溶媒であるNMPに溶解させた後、反応の終わったPAAに加えてさらなる混合を行った。
Comparative Example 4
After PPDA 21.62 g (0.2 mol) was completely dissolved in 529.2 g of NMP kept at room temperature, 52.96 g (0.18 mol) of BPDA and 4.36 g (0.02 mol) of PMDA were sequentially added. After 1 hour had elapsed after complete dissolution, 0.43 g (0.0029 mol) of PA was added. After the reaction for 16 hours, 5000 ppm of 4,4′-methylenebis (N, N-diglycidylaniline) (0.39685 g) having a monomer (PPDA, BPDA and PMDA) content was dissolved in NMP as the same reaction solvent. After that, further mixing was performed in addition to the PAA after the reaction.

実験例1
実施例1〜3及び比較例1〜4のポリイミド前駆体を、LCD Glass SM TECH,new glass(200*200*0.63)に、塗布器(Baker applicator,YBA−4)を用いてwet厚さ400μmにコーティングしてから、120℃に過熱されたコンベンションオーブンに入れて熱的イミド反応を進ませた。それから、1分当たり3℃で昇温し、最大450℃で1時間保ってから徐冷させた。冷却後、回収して、フィルムの外部形態と光学的特性などを分析し、その結果を図1〜4及び表1及び2に示した。
Experimental example 1
Using the applicator (Baker applicator, YBA-4), the thickness of the polyimide precursors of Examples 1 to 3 and Comparative Examples 1 to 4 was changed to LCD Glass SM TECH, new glass (200 * 200 * 0.63). After coating to 400 μm, it was placed in a convention oven heated to 120 ° C. to allow the thermal imide reaction to proceed. Then, the temperature was raised at 3 ° C. per minute, kept at a maximum of 450 ° C. for 1 hour, and then gradually cooled. After cooling, the film was collected and analyzed for the external form and optical characteristics of the film. The results are shown in FIGS.

図1〜7で見られるように、2000ppm〜4000ppm含量の4,4’−メチレンビス(N,N−ジグリシジルアニリン)を加えた場合(図1〜3)、フィルム表面のレベリング状態が良好であるが、4,4’−メチレンビス(N,N−ジグリシジルアニリン)を加えなかった場合(図4)、及び1000ppmまたは5000ppmの含量で加えた場合(図5〜7)、フィルム表面のレベリング状態が不良であることを確認できる。   As can be seen in FIGS. 1 to 7, when the 4,4′-methylenebis (N, N-diglycidylaniline) having a content of 2000 ppm to 4000 ppm is added (FIGS. 1 to 3), the leveling state of the film surface is good. However, when 4,4′-methylenebis (N, N-diglycidylaniline) was not added (FIG. 4), and when it was added at a content of 1000 ppm or 5000 ppm (FIGS. 5-7), the leveling state of the film surface was It can be confirmed that it is defective.

また、表1及び表2で見られるように、2000ppm未満または5000ppm以上加えた場合、透過度が急激に低くなることを確認できる。   Moreover, as can be seen from Tables 1 and 2, it can be confirmed that when the content is less than 2000 ppm or 5000 ppm or more, the transmittance decreases rapidly.

前述した本発明の説明は例示のためのものであり、本発明が属する技術分野の通常の知識を持った者は、本発明の技術的思想や必須特徴を変更することなく、他の具体的な形態に容易に変形可能であるということを理解できるであろう。よって、以上で記述した実施例は、全ての面で例示的なことであり、限定的ではないことを理解すべきである。例えば、単一型で説明されている各構成要素は、分散して実施してもよく、同様に分散して説明されている構成要素も、結合された形態で実施してもよい。   The above description of the present invention is given for illustrative purposes only, and those having ordinary knowledge in the technical field to which the present invention pertains can be used without changing the technical idea and essential features of the present invention. It will be understood that it can be easily transformed into various forms. Thus, it should be understood that the embodiments described above are illustrative in all aspects and not limiting. For example, each component described as a single type may be implemented in a distributed manner, and similarly, components described in a distributed manner may be implemented in a combined form.

本発明の範囲は、上記詳細な説明よりも、後述する特許請求の範囲によって示され、特許請求の範囲の意味及び範囲並びにその均等概念から導出される全ての変更、または変形された形態が本発明の範囲に含まれるものと解釈すべきである。   The scope of the present invention is indicated by the following claims rather than the above detailed description, and all changes or modifications derived from the meaning and scope of the claims and the equivalent concept thereof are described in the present invention. It should be construed as included in the scope of the invention.

Claims (13)

ポリアミック酸;及び
ポリアミック酸対比2000〜4000ppm含量の架橋剤;を含む、ポリイミド前駆体組成物。
A polyimide precursor composition comprising: a polyamic acid; and a cross-linking agent having a content of 2000 to 4000 ppm relative to the polyamic acid.
前記架橋剤は、4,4’−メチレンビス(N,N−ジグリシジルアニリン)を含むものである、請求項1に記載のポリイミド前駆体組成物。   The polyimide precursor composition according to claim 1, wherein the cross-linking agent includes 4,4′-methylenebis (N, N-diglycidylaniline). アミド系溶媒、ケトン系溶媒、エーテル系溶媒、エステル系溶媒、対称グリコールジエーテル類溶媒、エーテル類溶媒及びこれらの組合せからなる群から選択された溶媒を含む、請求項1に記載のポリイミド前駆体組成物。   The polyimide precursor according to claim 1, comprising a solvent selected from the group consisting of an amide solvent, a ketone solvent, an ether solvent, an ester solvent, a symmetric glycol diether solvent, an ether solvent, and combinations thereof. Composition. ジアミン単量体を含有する重合溶媒にアンハイドライド単量体を加えて反応させるステップ;
前記反応溶液に末端−キャッピング製剤を加えてから反応させてポリアミック酸を合成するステップ;及び
前記ポリアミック酸に架橋剤を加えて混合するステップ;を含む、ポリイミド前駆体組成物の製造方法。
Adding an hydride monomer to a polymerization solvent containing a diamine monomer and reacting;
A method for producing a polyimide precursor composition, comprising: adding a terminal-capping preparation to the reaction solution and then reacting to synthesize a polyamic acid; and adding a crosslinking agent to the polyamic acid and mixing.
前記アンハイドライド単量体は、芳香族ジアンハイドライド単量体である、請求項4に記載のポリイミド前駆体組成物の製造方法。   The method for producing a polyimide precursor composition according to claim 4, wherein the anhydride monomer is an aromatic dianhydride monomer. 前記芳香族ジアンハイドライド単量体は、BTDA(3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物)、PMDA(ピロメリト酸無水物)、BPDA(3,3’,4,4’−ビフェニルテトラカルボン酸二無水物)、6FDA(2,2−ビス(3,4−アンヒドロジカルボキシフェニル)−ヘキサフルオロプロパン二無水物)、a−BPDA(2,3,3’,4’−ビフェニルテトラカルボン酸二無水物)、ODPA(4,4’−オキシジフタル酸無水物)、DSDA(3,3’,4,4’−ジフェニルスルホンテトラカルボン酸二無水物)、BPADA(5,5’−[1−メチル−1,1−エタンジイルビス(1,4−フェニレン)ビスオキシ]ビス(イソベンゾフラン−1,3−ジオン)、HQDA(ハイドロキノンジフタル酸無水物)及びこれらの組合せからなる群から選択されたものを含むものである、請求項4に記載のポリイミド前駆体組成物の製造方法。   The aromatic dianhydride monomer includes BTDA (3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride), PMDA (pyromellitic anhydride), BPDA (3,3 ′, 4,4 ′). -Biphenyltetracarboxylic dianhydride), 6FDA (2,2-bis (3,4-anhydrodicarboxyphenyl) -hexafluoropropane dianhydride), a-BPDA (2,3,3 ', 4' -Biphenyltetracarboxylic dianhydride), ODPA (4,4'-oxydiphthalic anhydride), DSDA (3,3 ', 4,4'-diphenylsulfonetetracarboxylic dianhydride), BPADA (5,5 '-[1-Methyl-1,1-ethanediylbis (1,4-phenylene) bisoxy] bis (isobenzofuran-1,3-dione), HQDA (hydroquinonedi) Tal anhydride) and is intended to include those selected from the group consisting of, producing a polyimide precursor composition according to claim 4. 前記ジアミン単量体は、PPDA(p−フェニレンジアミン)、ODA(4,4’−オキシジアニリン)、MDA(4,4’−メチレンジアニリン)、m−トリジン(2,2’−ジメチル−4,4’−ジアミノビフェニル)、TPE−R(1,3−ビス(4’−アミノフェノキシ)ベンゼン)、TFMB(2,2’−ビス(トリフルオロメチル)ベンジジン)、HFBAPP(2,2’−ビス[4−(4−アミノフェノキシ)フェニル]ヘキサフルオロプロパン)、BIS−AP−AF(2,2’−ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン)、DRFB(1,3−ジアミノ−2,4,5,6−テトラフルオロベンゼン)、DDS(3,3’−ジアミノジフェニルスルホン)、ASD(4,4’−ジアミノジフェニルスルフィド)、BAPS(ビス[4−(4−アミノフェノキシ)フェニル]スルホン)、m−BAPS(2,2’−ビス[4−(3−アミノフェノキシ)ベンゼン]スルホン)及びこれらの組合せからなる群から選択されたものである、請求項4に記載のポリイミド前駆体組成物の製造方法。   The diamine monomer is PPDA (p-phenylenediamine), ODA (4,4′-oxydianiline), MDA (4,4′-methylenedianiline), m-tolidine (2,2′-dimethyl-). 4,4′-diaminobiphenyl), TPE-R (1,3-bis (4′-aminophenoxy) benzene), TFMB (2,2′-bis (trifluoromethyl) benzidine), HFBAPP (2,2 ′ -Bis [4- (4-aminophenoxy) phenyl] hexafluoropropane), BIS-AP-AF (2,2′-bis (3-amino-4-hydroxyphenyl) hexafluoropropane), DRFB (1,3 -Diamino-2,4,5,6-tetrafluorobenzene), DDS (3,3'-diaminodiphenylsulfone), ASD (4,4'-diaminodiphe) Sulfido), BAPS (bis [4- (4-aminophenoxy) phenyl] sulfone), m-BAPS (2,2′-bis [4- (3-aminophenoxy) benzene] sulfone) and combinations thereof The manufacturing method of the polyimide precursor composition of Claim 4 which is selected from these. 少なくとも2つのアンハイドライド単量体を加えるものである、請求項4に記載のポリイミド前駆体組成物の製造方法。   The method for producing a polyimide precursor composition according to claim 4, wherein at least two anhydride monomers are added. 前記重合溶媒は、アミド系溶媒、ケトン系溶媒、エーテル系溶媒、エステル系溶媒、対称グリコールジエーテル類溶媒、エーテル類溶媒及びこれらの組合せからなる群から選択されたものを含むものである、請求項4に記載のポリイミド前駆体組成物の製造方法。   The polymerization solvent includes one selected from the group consisting of an amide solvent, a ketone solvent, an ether solvent, an ester solvent, a symmetric glycol diether solvent, an ether solvent, and combinations thereof. The manufacturing method of the polyimide precursor composition of description. 前記末端−キャッピング製剤は、PA(無水フタル酸)、TSA(n−テトラデシルコハク酸無水物)、HAS(ヘキサデシルこはく酸無水物)、OSA(オクタデシルこはく酸無水物)及びこれらの組合せからなる群から選択されたものである、請求項4に記載のポリイミド前駆体組成物の製造方法。   The end-capping formulation comprises PA (phthalic anhydride), TSA (n-tetradecyl succinic anhydride), HAS (hexadecyl succinic anhydride), OSA (octadecyl succinic anhydride), and combinations thereof The manufacturing method of the polyimide precursor composition of Claim 4 which is selected from these. 前記架橋剤は、4,4’−メチレンビス(N,N−ジグリシジルアニリン)を含むものである、請求項4に記載のポリイミド前駆体組成物の製造方法。   The method for producing a polyimide precursor composition according to claim 4, wherein the crosslinking agent contains 4,4′-methylenebis (N, N-diglycidylaniline). 前記架橋剤は、ポリアミック酸対比2000ppm〜4000ppmの量で加えられるものである、請求項4に記載のポリイミド前駆体の製造方法。   The said crosslinking agent is a manufacturing method of the polyimide precursor of Claim 4 added by the quantity of 2000 ppm-4000 ppm with respect to polyamic acid. 請求項1のポリイミド前駆体組成物を支持体上にコーティングするステップ;及び
100℃以上の温度で、前記支持体上にコーティングされたポリイミド前駆体を熱的イミド化するステップ;を含む、ポリイミドフィルムの製造方法。
A polyimide film comprising: coating a polyimide precursor composition of claim 1 on a support; and thermally imidizing the polyimide precursor coated on the support at a temperature of 100 ° C. or higher. Manufacturing method.
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