JP2017061151A - Method for producing forgery prevention medium - Google Patents

Method for producing forgery prevention medium Download PDF

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Publication number
JP2017061151A
JP2017061151A JP2016190950A JP2016190950A JP2017061151A JP 2017061151 A JP2017061151 A JP 2017061151A JP 2016190950 A JP2016190950 A JP 2016190950A JP 2016190950 A JP2016190950 A JP 2016190950A JP 2017061151 A JP2017061151 A JP 2017061151A
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Prior art keywords
marker
resin layer
photosensitive resin
substrate
curable resin
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Japanese (ja)
Inventor
陽子 小澤
Yoko Ozawa
陽子 小澤
伸子 老川
Nobuko Oikawa
伸子 老川
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大日本印刷株式会社
Dainippon Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a forgery prevention medium manufacturing method capable of forming a marker having a desired size and contour shape on a thin support substrate. A marker 12 is formed on a peeling substrate 14, and the marker 12 is transferred from the peeling substrate 14 on which the marker 12 is formed to a support substrate 11 having a thickness smaller than that of the peeling substrate 14, thereby peeling. A marker 12 having a desired size and contour shape is formed on a support substrate 11 that is thinner than the substrate 14. [Selection] Figure 3

Description

  The present invention relates to a method for manufacturing an anti-counterfeit medium.

  Conventionally, an anti-counterfeit additive called taggant (also referred to as taggent) has been used in articles such as securities that require anti-counterfeiting. The taggant is required to be highly difficult to counterfeit, to be able to easily and quickly perform authenticity determination, and to be inexpensive.

  As such a taggant, Patent Document 1 discloses a minute marker that is configured to be observable using an optical magnifying device and is patterned. The marker is formed by a lithography technique in the integrated circuit technical field or a technique in the micromachining technical field. The marker has a design such as a figure, a logo, a personal signature, a date, and a word, and is configured to be recognized as having information based on the contents of the design. The marker is uniformly mixed in the liquid adhesive, and the marker can be fixed by attaching the liquid adhesive mixed with the marker to the surface of a document or the like and drying it.

  However, in the conventional method in which a marker is mixed in a liquid adhesive and applied and dried, the identification part for authenticity determination does not include a marker, or includes only a few markers, or has a plurality of contours. However, it is difficult to read because markers with a specific contour shape are included, the distribution of markers is biased within the identification area, or the markers overlap each other. There is a problem that it is difficult to produce an identification part for authenticity determination including an appropriate number and types of markers without bias.

  Regarding this problem, use photolithography or printing to create a marker sheet with the marker directly formed on the base film, and form an adhesive layer or the like on the front or back surface of this marker sheet and attach it to the article. Thus, there is a method in which an appropriate number and type of markers can be included without bias.

Japanese Patent No. 3665282

  In general, when forming a marker directly on a substrate, tension is applied to the substrate to prevent formation of a marker different from the desired size or contour shape, such as wrinkling on the substrate. Need to be flat. However, when a marker sheet (also referred to as an anti-counterfeit medium in the present invention) is attached to an article such as a card or securities, the portion where the marker sheet is attached and the marker sheet are not attached. Since the step in the thickness direction is large at the portion and the object is easily caught by the step, the marker sheet may be peeled off from the article. Therefore, a thinner marker sheet is required. When a marker is formed on a thin base material in order to produce a thinner marker sheet, the marker is formed in a state where the base material is expanded or contracted depending on the magnitude of the applied tension. For this reason, there is a problem that the produced marker is different from a desired size and contour shape, and it is difficult to use the marker for authenticity determination.

  In order to solve the above problem, the present invention forms a marker on a thick substrate, and transfers the marker from the substrate on which the marker is formed to a thin substrate, thereby reducing the thickness. Provided is a method for producing an anti-counterfeit medium capable of forming a marker having a desired size or contour shape on a substrate.

  The present invention provides a marker-forming base material preparation step in which a marker whose contour shape is identifiable by magnifying observation is prepared on one surface, and a thicker thickness than the release base material. A supporting substrate preparing step for preparing a thin supporting substrate, and a curable resin layer forming material containing a curable resin on the one surface of the peeling substrate or the one surface of the supporting substrate. Then, a curable resin layer forming step for forming a curable resin layer, a laminating step for laminating the release substrate and the support substrate to face each other via the curable resin layer, and the curable resin A curing step of bonding the curable resin layer and the support substrate by curing a layer; and peeling the support substrate having the marker from the release substrate; And a transfer process for transferring to the material. To provide a method of manufacturing the anti-counterfeit medium.

  According to the present invention, a marker is formed on a release substrate, and the marker is transferred from the release substrate on which the marker is formed to a support substrate that is thinner than the release substrate. A marker having a desired size or shape can be formed on a thin support substrate.

  Moreover, the said marker formation base material preparation process arrange | positions the photosensitive resin layer forming material containing photosensitive resin in the one surface of the said peeling base material, and forms the photosensitive resin layer formation process And a marker forming step of forming the marker on the release substrate by exposing the photosensitive resin layer and developing the exposed photosensitive resin layer.

  According to the present invention, since markers are directly formed on a peeling substrate by photolithography or the like, an appropriate number and type of markers can be included in the identification part for authenticity determination without any bias.

  Further, in the marker forming step, there may be a plurality of types of contour shapes of the marker formed on the peeling substrate.

  According to the present invention, the number of forgery prevention media that can be distinguished can be increased by using a plurality of types of marker sizes and contour shapes.

  The marker has a plurality of colors, and the photosensitive resin layer forming step and the marker forming step are repeated for each color using the photosensitive resin layer forming material colored in the marker color. You may do it.

  By using a plurality of marker colors, the number of anti-counterfeit media that can be distinguished can be increased.

  According to the present invention, a marker having a desired size and contour shape can be formed on a thin substrate.

It is a schematic plan view which shows an example of the medium for forgery prevention which concerns on this invention. It is a schematic sectional drawing which shows an example of the medium for forgery prevention which concerns on this invention. It is a schematic sectional drawing which shows an example of the manufacturing method of the medium for forgery prevention which concerns on this invention. It is a schematic sectional drawing which shows another example of the manufacturing method of the medium for forgery prevention which concerns on this invention. It is a schematic sectional drawing which shows another example of the manufacturing method of the medium for forgery prevention which concerns on this invention.

1. Forgery Prevention Medium A forgery prevention medium 10 manufactured by the manufacturing method of the present embodiment will be described below with reference to the drawings. FIG. 1 is a schematic plan view showing a forgery prevention medium 10, and FIGS. 2A and 2B are schematic sectional views of the forgery prevention medium 10. The anti-counterfeit medium 10 includes a support substrate 11, a marker 12 formed on the support substrate 11, and a cured curable resin layer 13. The contour shape of the marker 12 can be identified by observing it in an enlarged manner, and the arrangement of the marker 12 on the support base 11 is random. Further, the marker may be formed in contact with the support base 11 as shown in FIG. 2 (a), or through a cured curable resin layer 13 as shown in FIG. 2 (b). Although it may be formed, it is preferable that the cured curable resin layer 13 is formed through the cured curable resin layer 13 of FIG.

  The anti-counterfeit medium 10 of the present embodiment forms markers directly on a peeling substrate, which will be described later, by photolithography or the like, so that an appropriate number and type of markers can be included in the identification part for authenticity determination without bias. it can.

(1) Support base material Although the support base material 11 is not specifically limited, In order to cut and use the produced forgery prevention medium 10 according to a use, it is preferable to use a plastic base material especially. .

  Moreover, the support base material 11 may have transparency to the extent that it can affix on an article | item and can read the marker 12, and does not need to have transparency. In FIG. 2B, when the support base material 11 is closer to the side to be visually recognized than the marker 12, the support base material 11 preferably has transparency. On the other hand, when the marker 12 is closer to the side of visual recognition than the support base material 11, the support base material 11 does not have to be particularly transparent as long as the marker 12 can be read. Here, “support” of the support base material in the present embodiment means that the marker 12 and the cured curable resin layer 13 are supported.

  Specific materials for the support substrate 11 include polyethylene, polypropylene, polyvinyl fluoride, polyvinylidene fluoride, polyvinyl chloride, polyvinylidene chloride, ethylene-vinyl alcohol copolymer, polyvinyl alcohol, polymethyl methacrylate, polyether sulfone. Polyester ether ketone, polyamide, tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer, polyethylene terephthalate and other polyester resins, polyimide resin resins, etc., among which polyester resins are used. It is preferable to use polyethylene terephthalate among the polyester resins. Moreover, as the support base material 11, only one type of the above-described materials may be used, or a mixture of two or more types may be used.

  Moreover, the support base material 11 may contain the pigment and dye, or may be colored by providing the colored layer.

  In addition, the “adhesiveness” between the support substrate 11 and the marker 12 and the cured curable resin layer 13 is such that the marker 12 and the cured curable resin layer 13 can be transferred to the support substrate 11 in the transfer step described later. It is preferable to have. Here, “adhesiveness” in the present embodiment can be defined by the peel strength when the marker 12 and the cured curable resin layer 13 are peeled off from the support substrate 11. “Peel strength” is a value measured according to the 180-degree peeling method of JIS Z0237. The tensile tester used is, for example, an Instron 5565 type material tester. The test piece was obtained by cutting the anti-counterfeit medium 10 into a width of 25 mm and a length of 150 mm, and applying a double-sided tape of the same size on the surface of the marker 12 and the curable resin layer 13 opposite to the surface in contact with the support substrate 11. Bonding and bonding to a SUS plate for further fixing, the support substrate 11 is peeled off at a speed of 300 mm per minute, and the tensile load (gf) in a state where the peeling is stably performed is 25 mm wide. Measured as peel strength at. For samples with a width of less than 25 mm, assuming that the width is a mm, a value obtained by multiplying the peel strength measured in the same manner by the width of a mm by 25 / a is regarded as the peel strength at a width of 25 mm.

  Moreover, the preferable value of the adhesiveness in this embodiment is 5 gf / 25 mm or more, preferably 25 gf / 25 mm or more in terms of peel strength when the marker 12 and the curable resin layer 13 are peeled off from the support substrate 11. . When the value is smaller than 5 gf / 25 mm, the marker 12 and the curable resin layer 13 provided on the support base material 11 can be easily separated in a cutting process after the anti-counterfeit medium 10 is manufactured. There is a possibility that problems such as wrinkles due to peeling off of parts occur. In addition, when the value is smaller than 25 gf / 25 mm, when stress such as pressure, heat pressure, shearing force is applied during the process of applying the anti-counterfeit medium 10 on the article or embedding it in the article, a part of There is a risk that defects such as wrinkles, bubbles, and wrinkles due to peeling may occur.

  As for the thickness of the support base material 11, it is desirable that it is thinner than the peeling base material mentioned later, ie, the peeling base material is thicker than the support base material 11. FIG. When the marker 12 is directly formed on the support substrate 11 having a small thickness, when a tension is applied to make the support substrate 11 flat, the support substrate 11 expands and contracts, and a desired size or contour shape is obtained. The marker 12 may not be formed. In this embodiment, since the marker 12 is formed on the release substrate thicker than the support substrate 11, the release substrate is less likely to expand and contract even if tension is applied when the marker 12 is formed. The marker 12 having a size or contour shape can be formed. Furthermore, by transferring the marker 12 on the peeling base material formed in a desired size and contour shape onto the supporting base material 11, the desired size is formed on the supporting substrate 11 having a thickness smaller than that of the peeling base material. Alternatively, the marker 12 having a contour shape can be formed. Accordingly, the size and contour of the marker 12 can be obtained without finely controlling the tension applied to the support substrate 11 at the time of forming the marker so that the size of the marker 12 and the shape of the contour do not differ from the desired size and contour. Shaped markers 12 can be formed.

  Moreover, although the thickness of the support base material 11 is based also on the material of the support base material 11, it is preferable that it is 2 micrometers-50 micrometers, and 6 micrometers-25 micrometers are especially more preferable. When the thickness of the support substrate 11 is greater than 50 μm, when the anti-counterfeit medium 10 is manufactured and attached to an article or the like, the portion where the anti-counterfeit medium 10 is attached and the anti-counterfeit medium 10 are Since the step in the thickness direction is large between the portion not attached and the object is easily caught by the step, the forgery prevention medium 10 may be easily peeled off from the article. In addition, when the marker 12 is formed on the support base material 11, the support base material 11 is less likely to expand and contract even if tension is applied to the support base material 11. Thus, the advantage of transferring the marker 12 to the support base 11 becomes poor. Further, when the anti-counterfeit medium 10 is embedded in an article or the like, the flatness of the article or the like may be impaired. Moreover, when the thickness of the support base material 11 is less than 2 μm, the support base material 11 may be deformed or damaged by the conveyance.

  Further, in order to further improve the adhesion between the support substrate 11, the marker 12 and the cured curable resin layer 13, an adhesion treatment is performed on the surfaces where the support substrate 11 and the cured curable resin layer 13 are in contact with each other. May be. Adhesion treatment is not particularly limited, for example, physical treatment such as plasma treatment, corona discharge treatment, glow discharge treatment, flame treatment, or chemical treatment using chromic acid, silane coupling agent, primer agent, etc. Can be mentioned. In the present invention, it is preferable to use chemical treatment using a primer agent. The primer agent is suitable for both the case where the primer is processed during the production of the support base 11 and the case where the primer is processed on the support base 11 after the production. As the support substrate 11 treated with such a primer agent, a commercially available product can be used. Specifically, Toyobo Co., Ltd. PET film with easy adhesion layer, A4100, T4100, Teijin DuPont Films Co., Ltd. Teijin (registered trademark) Tetron (registered trademark) film, HPE, Unitika Ltd. ) Emblet (registered trademark), S, PTM, PET, Easy-adhesive material manufactured by Panac Co., Ltd., AC-X, AC-L, AC-W, Lumirror (registered trademark) manufactured by Toray Industries, Inc. U34, T11S, etc. are mentioned. In addition, the primer agent to be processed on the support substrate 11 after manufacture is not particularly limited as long as it is a material that adheres to the material of the marker 12 or the cured curable resin layer 13. For example, polyurethane, polyester , Polyvinyl chloride resin, polyvinyl acetate resin, vinyl chloride-vinyl acetate copolymer, acrylic resin, polyvinyl alcohol resin, polyvinyl acetal resin, copolymer of ethylene and vinyl acetate or acrylic acid, epoxy resin, etc. be able to. In particular, an acrylic resin material is preferable, and a material including a methacrylic resin such as polymethyl methacrylate as a main component and a material having a low glass transition point that improves adhesion is preferable. In addition to the acrylic resin, a mixture of a polyurethane material and a curing agent can also be suitably used. In the support base material 11 treated with the primer agent, the thickness when the primer agent is present as a layer is not particularly limited as long as the adhesive property is obtained, and is within a range of 0.1 μm to 10 μm. Can be set.

(2) Marker The marker 12 can be identified by observing an enlarged shape of the contour. As shown in FIG. 1, the contour shape of the marker 12 when the anti-counterfeit medium 10 is viewed in plan is a marker 12 a having a circular contour shape, a marker 12 b having a triangular contour shape, and a quadrangular contour shape. It has a marker 12c. The outline of the marker 12 is not limited to these shapes, but various shapes such as an ellipse, a polygon, a star, a heart, an outline of an animal, an outline of a character, an outline of a number, an outline of a symbol, and an outline of a figure. The contour shape can be adopted.

  Further, the size and contour shape of the marker 12 formed on the forgery prevention medium 10 may all be the same or different. When the marker 12 has a plurality of sizes and contour shapes, the number of forgery prevention media 10 that can be distinguished can be increased.

  Further, the markers 12a, 12b, and 12c may have different colors or the same color. When the marker 12 has a plurality of colors, the number of forgery prevention media 10 that can be distinguished can be increased.

  In the present embodiment, “the contour shape is identifiable” means that an artificial contour shape is formed and can be distinguished from a contour shape that is naturally formed without intention. Therefore, when forging an article provided with the marker 12, even if the outer shape of the article can be duplicated, it is difficult to duplicate the marker 12, so it is possible to discriminate between a genuine article and a forged article. Further, since the shape of the contour can be identified, it is possible to discriminate the manufacturing time, the usage, and the like even between genuine articles by changing the shape of the contour of the marker 12 to be applied.

  As shown in FIG. 1, when the anti-counterfeit medium 10 is viewed in plan, the arrangement of the markers 12 is random. Here, “random” in the present embodiment means that the markers 12 are arranged irregularly in the direction, the positional relationship, and the number density. As will be described later, the markers 12 are arranged to be irregular by photolithography or the like. In this embodiment, the markers 12 having a random distribution are formed on the support substrate 11 using a photomask or the like having a pattern in which the arrangement of the markers 12 is random.

  In addition, in the case of the marker 12 that is difficult to identify if the front and back sides are different, such as the outline of the marker 12 is the outer shape of the character, in the conventional method of applying a dispersion liquid in which the marker is dispersed, In some cases, it was difficult to identify. However, in this embodiment, the marker 12 is not formed facing the back side by lithography or the like, and characters and the like can be easily identified.

  The marker 12 is colored with a pigment, a dye, or the like. The type of color of the marker 12 may be one type or a plurality of types, but by forming the marker 12 with a plurality of types of colors, the design and anti-counterfeiting effect are improved.

  The thickness of the marker 12 is preferably 0.1 μm to 25 μm. When the thickness of the marker 12 is less than 0.1 μm, it is difficult to form the marker 12. Moreover, when the thickness of the marker 12 is greater than 25 μm, it is difficult to form the marker on the support base material 11. Moreover, even if the marker 12 can be formed on the support base material 11, the marker 12 is easily peeled off.

  The size of the marker 12 is preferably 50 μm to 300 μm. When the size of the marker 12 is smaller than 50 μm, it becomes difficult to observe the marker 12 using a simple magnifying instrument such as a loupe, and authentication cannot be performed unless a more complicated device such as a microscope is used. There is a fear. Moreover, when the size of the marker 12 is larger than 300 μm, the marker 12 can be identified with the naked eye without using a magnifying device, and the forgery prevention effect may be reduced. In addition, since the marker 12 is flat form, it is preferable that thickness is below half of a size. Here, the “size” in the present embodiment is the longest length when the marker 12 is viewed in plan. For example, if the marker has a rectangular outline shape, the length of the diagonal line is the size of the marker. In the case of a marker having an elliptical outline shape, the length of the major axis is the size of this marker.

  The details of the photosensitive resin layer forming material and the marker forming method used as the marker material will be described later in the photosensitive resin layer forming step and the marker forming step.

(3) Hardened curable resin layer The hardened curable resin layer 13 should just be formed on the support base material 11 at least, and may be formed on the support base material 11 and the marker 12. FIG. The material of the cured curable resin layer 13 is formed of a curable resin layer forming material. The curable resin layer forming material will be described in detail in the curable resin layer forming step described later.

  The thickness of the cured curable resin layer 13 is not particularly limited, but may be the same as or greater than the thickness of the marker 12, and specifically, 0.1 μm to 50 μm is preferable. When the thickness of the marker 12 is smaller than the thickness of the marker 12, there is a possibility that the marker 12 is easily peeled off, or that the forgery prevention medium 10 has a problem such as twisting or wrinkling. In addition, when the thickness of the cured curable resin layer 13 is thinner than 0.1 μm, the cured curable resin layer 13 becomes thinner than the marker 12, and thus the above-described problem may occur. Further, when the cured curable resin layer 13 is thicker than 50 μm, when the anti-counterfeit medium 10 is prepared and attached to an article, the anti-counterfeit medium 10 is attached to the anti-counterfeit medium. Since the step in the thickness direction is large at the portion where the working medium 10 is not affixed, and an object is likely to get caught in the step, the forgery prevention medium 10 may be easily peeled off from the article. Moreover, when embedding in articles | goods, there exists a possibility of impairing the flatness of the surface of articles | goods. Here, the “thickness of the curable resin layer 13” in the present embodiment refers to the area where the marker 12 and the curable resin layer 13 do not overlap in FIGS. 2A and 2B. The thickness in the direction perpendicular to the surface of the formed support substrate 11 is said.

(4) Other Configurations The anti-counterfeit medium 10 is not limited to the above configuration, and for example, an adhesive layer or the like may be provided on the marker 12 and the cured curable resin layer 13.

2. First Manufacturing Method for Anti-Counterfeit Medium Next, a first manufacturing method for the anti-counterfeit medium of this embodiment will be described.

  In the first method for producing a forgery prevention medium according to the present embodiment, a photosensitive resin layer forming material including a photosensitive resin is disposed on one surface of the peeling substrate 14 to form the photosensitive resin layer 15. By exposing the photosensitive resin layer 15 to the photosensitive resin layer forming step and developing the exposed photosensitive resin layer 15a, the marker 12 whose outline shape can be identified by being enlarged is peeled off. A marker-forming base material preparation step including at least a marker-forming step formed on the base material 14, a support base material preparation step for preparing a support base material 11 having a thickness smaller than that of the release base material 14, A curable resin layer forming material including a curable resin is disposed on the surface on which the marker 12 is formed, and a curable resin layer forming step for forming the curable resin layer 18 is supported via the curable resin layer 18. The base material 11 and the peeling base material 14 are opposed to each other. Laminating step of laminating, curing step of adhering curable resin layer 13 and supporting substrate 11 by curing curable resin layer 18, and curable resin layer cured from marker 12 from release substrate 14 And a transfer step of transferring the marker 12 and the cured curable resin layer 13 to the support substrate 11.

  Hereafter, each process in the 1st manufacturing method of the forgery prevention medium of this embodiment is demonstrated using Fig.3 (a)-FIG.3 (g).

  In the present embodiment, the marker forming substrate preparation step is a step including at least a photosensitive resin layer forming step and a marker forming step. Hereinafter, the photosensitive resin layer forming step and the marker forming step will be described.

(1) Photosensitive resin layer formation process Fig.3 (a) shows the photosensitive resin layer formation process. The photosensitive resin layer forming step is a step of forming the photosensitive resin layer 15 by disposing a photosensitive resin layer forming material containing a photosensitive resin on one surface of the peeling substrate 14.

a. Release substrate The release substrate 14 is not particularly limited as long as it is thicker than the support substrate 11. Moreover, the peeling base material 14 may have transparency and does not need to have it.

  The material of the release substrate 14 is not particularly limited, but specific materials include a glass substrate, a metal substrate, polyethylene terephthalate (PET), polypropylene (PP), polycarbonate (PC), and polystyrene (PS). Examples thereof include a plastic substrate. In particular, when producing the anti-counterfeit medium 10 by a single wafer process, it is preferable to use a glass substrate. By using the glass substrate, the glass release substrate 14 can be washed after being peeled off in the transfer step described later and used again as the release substrate 14. Manufacturing cost can be reduced by reusing the release substrate. Moreover, when producing the medium 10 for forgery prevention by roll-to-roll, it is preferable to use a plastic base material. This is because the release substrate 14 in a roll shape is used, and therefore it is necessary to have flexibility so that the release substrate 14 is not damaged even if it is rolled.

  Moreover, the peeling base material 14 is the marker 12 and the hardened | cured curable resin layer 13 to such an extent that the support base material 11 which formed the marker 12 and the hardened curable resin layer 13 in the transfer process mentioned later can be peeled from the peeling base material 14. It is preferable to have “peelability”. Here, “peelability” in the present embodiment can be defined by the peel strength when the marker 12 and the cured curable resin layer 13 are peeled from the peelable substrate 14, and this value is A. Further, if the peel strength when the marker 12 and the cured curable resin layer 13 are peeled from the support substrate 11, which is the aforementioned “adhesiveness”, is B, it is necessary that A <B. The peel strength that defines the peelability is also a value measured according to the 180-degree peeling method of JIS Z0237 as described above. In addition, in the case of A ≧ B, it is difficult to safely peel off the marker 12 and the cured curable resin layer 13 from the release substrate 14, and a part of the marker 12 and the cured curable resin layer 13 at the time of peeling. May cause problems such as damage.

  The thickness of the release substrate 14 is not particularly limited as long as the marker 12 can be formed, and an optimum thickness can be selected as appropriate.

  Moreover, in order to make it easy to peel the peeling base material 14, you may perform a peeling process to the surface in which the marker 12 of the peeling base material 14 is formed. Examples of the peeling treatment may include providing a peeling layer by washing or coating the peeling substrate as necessary. Examples of the cleaning include wet cleaning using a cleaning liquid, UV cleaning by ultraviolet irradiation, and the like. The material of the release layer when providing the release layer by coating is acrylic and methacrylic resins such as polymethyl acrylate and polymethyl methacrylate, polyvinyl chloride resin, cellulose resin, silicone resin, fluorine resin, chlorinated rubber, Examples include casein, various surfactants, and one or a mixture of two or more of metal oxides.

b. Photosensitive resin Although there is no limitation in particular as photosensitive resin contained in the material for photosensitive resin layer formation, Specifically, UV curable resin, EB curable resin, etc. can be mentioned, Especially UV curable. It is preferable to use a resin. By using the UV curable resin, a photolithography method exemplified as a method for manufacturing the forgery prevention medium 10 described later can be used, and productivity can be improved. Further, the photosensitive resin may be a negative photosensitive resin or a positive photosensitive resin, but in particular, a negative photosensitive resin is preferably used. In the present embodiment, a case where the photosensitive resin layer 15 is formed using a negative photosensitive resin layer forming material containing a negative photosensitive resin will be described.

  The negative photosensitive resin is not particularly limited, and those generally used can be used. For example, a chemically amplified photosensitive resin based on a crosslinked resin can be mentioned, and more specifically, a chemically amplified photosensitive resin in which a crosslinking agent is added to polyvinylphenol and an acid generator is further added. It is done. Also, for example, as an acrylic negative photosensitive resin, it has a photopolymerization initiator that generates at least a radical component when irradiated with ultraviolet rays, and has an acrylic group of C = C in the molecule. And a functional group capable of dissolving the unexposed portion by subsequent development, for example, a component having an acidic group in the case of development with an alkaline solution. Among the above-mentioned components having an acrylic group, dipentaerythritol hexaacrylate (DPHA), dipentaerythritol pentaacrylate (DPPA), tetramethylpentatriacrylate (TMPTA), etc. are used as relatively low molecular weight polyfunctional acrylic molecules. Can be mentioned. Moreover, as a high molecular weight polyfunctional acrylic molecule, the polymer etc. which introduce | transduced the acrylic group through the epoxy group to the one part carboxylic acid group part of a styrene-acrylic acid-benzylmethacrylate copolymer can be mentioned.

  Moreover, it does not specifically limit as positive type photosensitive resin, What is generally used can be used. Specifically, a chemically amplified photosensitive resin using a novolak resin as a base resin can be used.

c. Photosensitive resin layer forming material As the photosensitive resin layer forming material, in addition to the above-mentioned photosensitive resin, it has a colorant such as a pigment or a dye. In the present embodiment, the number of colors of the colorant is not particularly limited. Further, the colorant can be used by being dispersed or dissolved in the photosensitive resin.

  Although the specific example of a coloring agent is given to the following, a coloring agent is not limited to the following.

  Examples of the red colorant include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments. These pigments may be used alone or in combination of two or more.

  Examples of the green colorant include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, isoindoline pigments, and isoindolinone pigments. It is done. These pigments or dyes may be used alone or in combination of two or more.

  Examples of the blue colorant include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like. These pigments may be used alone or in combination of two or more.

d. Photosensitive resin layer The photosensitive resin layer 15 can be formed by disposing the photosensitive resin layer forming material on at least the peeling substrate 14 and drying it.

  In addition, as a method for arranging the photosensitive resin layer forming material, spin coating method, casting method, dipping method, bar coating method, blade coating method, roll coating method, gravure coating method, flexographic printing method, spray coating method, etc. Can be mentioned.

  Moreover, as thickness of the formed photosensitive resin layer 15, it is preferable that they are 0.1 micrometer-25 micrometers. If the thickness of the formed photosensitive resin layer 18 is less than 0.1 μm, it is difficult to form a film, and if the thickness of the formed photosensitive resin layer 18 is greater than 25 μm, the coating film has a uniform thickness in the plane. This is because it becomes difficult to ensure the sex.

(2) Marker formation process FIG.3 (b) and FIG.3 (c) show a marker formation process. In this step, the photosensitive resin layer 15 formed on the release substrate 14 is exposed, and the exposed photosensitive resin layer 15a is developed to form the marker 12 on the release substrate 14.

  Examples of the method for exposing the photosensitive resin layer 15 include a method using a photomask 20, a method using a digital micromirror device, and a method of directly drawing.

  As a method using the photomask 20, the photosensitive resin layer 15 is exposed through the photomask 20 as shown in FIG. The photomask 20 has a transmission part 20a through which exposure light is transmitted and a light shielding part 20b through which exposure light is hardly transmitted. In FIG. 3B, since the negative photosensitive resin layer 15 is used, the transmission part 20a of the photomask 20 has the shape of the outline of the marker 12, and the transmitted light transmitted through the transmission part 20a is photosensitive. The functional resin layer 15 is cured.

  Further, the shape of the transmissive portion 20a of the photomask 20 may be one type or a plurality of types, but the number of the forgery prevention medium 10 that can be distinguished by a plurality of types can be increased. . When a positive type photosensitive resin layer is used, the light shielding part 20b and the transmission part 20a of the photomask 20 are interchanged, and the light shielding part 20b of the photomask 20 has the shape of the outline of the marker 12.

  In addition, exposure may be performed without using the photomask 20 by using a digital micromirror device. A digital micromirror device (also referred to as a digital mirror device or DMD) is an element in which a number of micromirror surfaces (micromirrors) that can be individually driven are arranged on a plane. By individually driving each mirror, the projection of light can be controlled for each surface element, so that the contour shape of the marker 12 can be exposed without using the photomask 20. Further, in the method using one photomask, the contour shape of the marker 12 obtained by exposure and the arrangement pattern of the marker 12 are all the same. For example, when a forgery prevention medium (A) formed by exposure with one photomask is cut into a plurality of pieces, the forgery prevention medium can be distinguished from each other. When another anti-counterfeit medium (referred to as “B”) formed by exposure using the same is cut into a plurality of pieces, the anti-counterfeit medium cut from A and the anti-counterfeit medium cut from B are distinguished. It becomes difficult to do. On the other hand, when the DMD is used, the arrangement pattern of the markers to be recorded can be changed every time, so that the number of forgery prevention media that can be distinguished increases.

  Note that the number of forgery prevention media 10 that can be distinguished by the above-described method using the photomask 20 can be increased. For example, when a single photomask is used, the forgery prevention medium 10 that can be identified can be increased by performing exposure multiple times by changing the angle and position of the photomask in the marker forming step. In addition, when using a plurality of photomasks, after exposing using one photomask, using another photomask, by changing the angle and position with respect to the first photomask each time, Exposure can be performed with different marker arrangement patterns, and the number of forgery prevention media 10 that can be distinguished can be increased. Note that the shape of the transmissive part and the arrangement pattern of the transmissive part of each photomask may be the same or different.

  Furthermore, as a method of direct drawing, the contour shape of the marker can be exposed by irradiating the photosensitive resin layer 15 with a laser or an electron beam and directly drawing.

  Further, in the case of the marker 12 that is difficult to identify when the front and back sides are different, such as the outline of the marker to be exposed is the outline of the character, the shape of the outline of the marker according to the viewing direction of the forgery prevention medium 10 to be produced Is preferably exposed. That is, in FIG. 3G, when the anti-counterfeit medium 10 is viewed from the side of the support base 11 on which the marker 12 is formed, in the exposure of FIG. When the peeling substrate 14 is visually recognized, exposure is performed so that the outer shape of the character of the marker can be read normally. On the other hand, in FIG. 3G, when the anti-counterfeit medium 10 is viewed from the side where the marker 12 of the support base 11 is not formed, the side where the photomask 20 is present in the exposure of FIG. When the peeling base material 14 is visually recognized, exposure is performed so that the outer shape of the character of the marker can be read normally.

  Moreover, when exposing the photosensitive resin layer 15, the tension | tensile_strength applied to the peeling base material 14 in which the photosensitive resin layer 15 was formed can be suitably determined according to the material, thickness, etc. of the peeling base material 14. FIG.

  Next, as shown in FIG. 3C, as a method of developing the exposed photosensitive resin layer 15a, the negative photosensitive resin layer that has not been exposed is dissolved with an alkaline developer, and a release substrate is obtained. A marker 12 can be formed on 14. Moreover, as a developing solution of a positive photosensitive resin layer, strong alkaline aqueous solution, for example, TMAH (TeraMethyl Ammonium Hydroxide) aqueous solution etc. can be mentioned.

  Further, when developing the exposed photosensitive resin layer 15a, the magnitude of tension applied to flatten the release substrate 14 can be appropriately determined according to the material and thickness of the release substrate 14. it can.

  Since the detailed description of the formed marker 12 is as described above, it is omitted here.

(3) Support base material preparation process Next, although not shown in figure, a support base material preparation process is a process of preparing the support base material 11 thinner than the peeling base material 14. FIG.

a. Since the detailed description about the support base material 11 is as above-mentioned, it abbreviate | omits here.

(4) Curable resin layer formation process FIG.3 (d) shows a curable resin layer formation process. The curable resin layer forming step is a step of forming a curable resin layer 18 by arranging a curable resin layer forming material containing a curable resin on the marker 12 of the release substrate 14.

a. Curable resin The curable resin contained in the curable resin layer forming material is not particularly limited, and specific examples include thermosetting resins, UV curable resins, and EB curable resins. In particular, it is preferable to use a thermosetting resin or a UV curable resin.

  There is no particular limitation on the material of the thermosetting resin, but it is preferable that the temperature at which the curable resin layer 18 is formed and cured is lower than the temperature at which the release substrate 14 is deformed by heat. Specific examples include phenolic resins, epoxy resins, melamine resins, urea resins (urea resins), unsaturated polyester resins, alkyd resins, polyurethane, thermosetting polyimides, and other reactive monomers that can be cross-linked three-dimensionally. Can be suitably used. In particular, a two-component curable epoxy resin in which a curing agent is added to the epoxy resin is preferable because the reaction proceeds at room temperature. Moreover, the polymer which has a thermosetting group may be sufficient. Specific examples include glycidyl group-containing polymers and oxetanyl group-containing polymers of polyacrylic acid esters. An organic-inorganic hybrid polymer having a thermosetting hydroxyl group or the like can also be suitably used. Specifically, an organometallic compound containing a metal element such as Si, Ti, Zr, Zn, In, Sn, Al, or Sn.

  Moreover, there is no limitation in particular as UV curable resin, A well-known UV curable resin can be used. Specifically, it is not particularly limited as long as it can be cured by UV irradiation, but generally, a monomer, oligomer or polymer having a radically polymerizable active group in its structure is mainly used as a film forming component. Examples of the component include those containing a photopolymerization initiator. Examples of the monomer include (meth) acrylic acid ester derivatives, and examples of the oligomer include urethane acrylate and polyester acrylate. Although it does not specifically limit as a polymer, As an example, an epoxy modified acrylate resin, a urethane modified acrylate resin, an acryl modified polyester etc. can be mentioned. Examples of photopolymerization initiators include phosphorus, acetophenone, benzoin ether, phosphine oxide, benzophenone, thioxanthone, and amine photopolymerization initiators.

  Further, when the photopolymerization initiator is removed from the UV curable resin, it can be used as an EB curable resin.

b. Curable resin layer forming material The curable resin layer forming material has a solvent or the like in addition to the curable resin. It does not specifically limit as a solvent, The well-known solvent used for coating can be used.

c. Curable Resin Layer The curable resin layer 18 can be formed by disposing and drying the curable resin layer forming material on at least the release substrate 14. Further, the curable resin layer 18 may be formed at least on the release substrate 14, but for ease of arrangement of the material for forming the curable resin layer, as shown in FIG. 14 and the marker 12 are preferably formed.

  Examples of the method for disposing the curable resin layer forming material include bar coating, spin coating, dipping coating, screen printing, roll coating coating, and gravure printing.

(5) Lamination process FIG.3 (e) shows a lamination process. The laminating step is a step of laminating the supporting base material 11 and the peeling base material 14 so as to face each other through the curable resin layer 18.

(6) Curing Step FIG. 3 (f) shows the curing step. The curing step is a step of bonding the marker 12 or the curable resin layer 13 and the support substrate 11 by curing the curable resin layer 18.

  As a method of curing the curable resin layer 18 to form the cured curable resin layer 13, a known curing method can be used according to the curable resin to be used. Specifically, when the curable resin layer 18 includes a thermosetting resin, it is heated or left at room temperature (aging). When it contains, electron beam irradiation etc. can be used. Here, the direction in which the curable resin layer 18 is cured may be cured from the support base material 11 side or from the release base material 14 side in FIG.

(7) Transfer Process FIG. 3 (g) shows the transfer process. In the transfer step, the support substrate 11 having the marker 12 and the cured curable resin layer 13 is separated from the release substrate 14, and the marker 12 and the cured curable resin layer 13 are transferred to the support substrate 11. To do. In the present embodiment, “peeling the support substrate 11 having the marker 12 and the cured curable resin layer 13 from the release substrate 14” means that the marker 12 and the cured curable resin layer 13 are separated. It also includes peeling the peeling base material 14 from the supporting base material 11 it has.

(8) Other steps Not limited to the above steps, other steps such as a step of forming an adhesive layer on the marker 12 and the cured curable resin layer 13 may be added as necessary.

3. Second Manufacturing Method of Anti-Counterfeit Medium Next, a second manufacturing method of the anti-counterfeit medium according to the present embodiment will be described with reference to FIGS. In the second production method, the marker 12 formed on the release substrate 14 by forming the curable resin layer 18 on one surface of the support substrate 11 in the curable resin layer forming step of the first production method. The possibility of damaging the marker 12 can be reduced when the material for forming the curable resin layer is disposed on the surface. In the present embodiment, a case where a photosensitive resin layer is formed using a negative photosensitive resin layer forming material will be described, but a positive photosensitive resin layer forming material can also be used.

  First, as shown in FIG. 4A, a photosensitive resin layer forming material is disposed on the release substrate 14 to form a photosensitive resin layer 15.

  Next, as shown in FIG. 4B, the photosensitive resin layer 15 is exposed through a photomask 20 having a transmission part 20a and a light-shielding part 20b, and then developed as shown in FIG. 4C. The marker 12 is formed by removing the photosensitive resin layer 15 other than the exposed photosensitive resin layer 15a with a liquid.

  Next, although not shown, a support base material 11 having a thickness smaller than that of the peeling base material 14 is prepared.

  Next, as shown in FIG. 4D, a curable resin layer forming material is disposed on one surface of the support base 11 to form the curable resin layer 18.

  Examples of the method for disposing the curable resin layer forming material include bar coating, spin coating, dipping coating, screen printing, roll coating coating, and gravure printing.

  Next, as shown in FIG. 4E, the support base material 11 and the release base material 14 are laminated so that the marker 12 and the curable resin layer 18 face each other.

  Next, as shown in FIG.4 (f), the curable resin layer 13 which exposed and hardened the curable resin layer 18 is formed. The direction in which the curable resin layer 18 is cured may be cured from the support substrate 11 side or may be cured from the release substrate 14 side in FIG.

  Next, as shown in FIG. 4G, the marker 12 is peeled from the peeling substrate 14, and the marker 12 is transferred to the supporting substrate 11. Moreover, in this embodiment, "peeling the support base material 11 which has the marker 12 from the peeling base material 14" includes peeling the peeling base material 14 from the support base material 11 which has the marker 12. Yes.

  In addition, you may add not only said process but another process, for example, the process of forming the contact bonding layer on the marker 12 and the hardened | cured curable resin layer 13, etc. as needed.

4). Third Manufacturing Method of Anti-Counterfeit Medium Next, a third manufacturing method of the anti-counterfeit medium according to the present embodiment will be described with reference to FIGS. In the third manufacturing method, the photosensitive resin layer forming step and the marker forming step of the first manufacturing method and the second manufacturing method are repeated for each color by changing the color of the photosensitive resin layer forming material. The anti-counterfeit medium 10 having a plurality of color markers 12 can be obtained. In the present embodiment, a case where a photosensitive resin layer is formed using a negative photosensitive resin layer forming material will be described, but a positive photosensitive resin layer forming material can also be used.

  First, as shown in FIG. 5A, a first photosensitive resin layer forming material is disposed on a release substrate 14 to form a first photosensitive resin layer 15.

  Next, as shown in FIG.5 (b), the 1st photosensitive resin layer 15 is exposed through the photomask 21 which has the transmission part 21a and the light-shielding part 21b, and after that, as shown in FIG.5 (c). In addition, the photosensitive resin layer 15 other than the exposed photosensitive resin layer 15a is removed with a developer to form the marker 12a.

  Next, as shown in FIG. 5D, a second photosensitive resin layer-forming material having a color different from that of the first photosensitive resin layer-forming material is disposed on the release substrate 14, and the second The photosensitive resin layer 16 is formed.

  Next, as shown in FIG. 5E, the second photosensitive resin layer 16 is exposed through a photomask 22, and then exposed to light with a developer as shown in FIG. 5F. The photosensitive resin layer 16 other than the photosensitive resin layer 16a is removed to form the marker 12b. Further, the arrangement pattern of the transmissive portions 22a of the photomask 22 and the shape of the transmissive portions 22a corresponding to the shape of the marker outline may be the same as or different from those of the photomask 21. When the photomask 21 and the photomask 22 are the same photomask, the number of photomasks used for exposure can be reduced, so that the cost of the photomask can be reduced and management of the photomask is facilitated. Can do. Further, when the exposure using the photomask 22 is performed, the pattern to be exposed can be changed every time by changing the angle and position of the photomask 22, and the number of forgery prevention media 10 that can be distinguished can be increased.

  Next, as shown in FIG. 5G, a third photosensitive resin having a color different from that of the first photosensitive resin layer forming material and the second photosensitive resin forming material on the peeling substrate 14. A layer forming material is disposed to form the third photosensitive resin layer 17.

  Next, as shown in FIG. 5 (h), the third photosensitive resin layer 17 is exposed through a photomask 23, and then exposed to light with a developer as shown in FIG. 5 (i). The photosensitive resin layer 17 other than the photosensitive resin layer 17a is removed to form the marker 12c. Further, the shape of the transmissive portions 23a corresponding to the arrangement pattern of the transmissive portions 23a of the photomask 23 and the contour shape of the marker may be the same as or different from those of the photomasks 21 and 22. When the photomasks 21 and 22 and the photomask 23 are the same photomask, the number of photomasks used for exposure can be reduced, so that the cost of the photomask can be reduced and the management of the photomask is easy. can do. Further, when the exposure using the photomask 23 is performed, by changing the angle and position of the photomask 23, the pattern to be exposed can be changed every time, and the number of forgery prevention media 10 that can be distinguished can be increased.

  Next, although not shown, a support base material 11 having a thickness smaller than that of the peeling base material 14 is prepared.

  Next, as shown in FIG. 5 (j), a curable resin layer forming material is disposed on the release substrate 14 and the marker 12 to form the curable resin layer 18.

  Next, as shown in FIG. 5 (k), the supporting base material 11 and the peeling base material 14 are laminated to face each other with the curable resin layer 18 interposed therebetween.

  Next, as shown in FIG. 5L, the curable resin layer 13 is formed by exposing and curing the curable resin layer 18. The direction in which the curable resin layer 18 is cured may be cured from the support substrate 11 side or may be cured from the release substrate 14 side in FIG.

  Next, as shown in FIG. 5 (m), the support substrate 11 having the marker 12 and the cured curable resin layer 13 is separated from the release substrate 14, and the marker 12 and the cured curable resin layer 13 are separated. Are transferred to the support substrate 11. In the present embodiment, “peeling the support substrate 11 having the marker 12 and the cured curable resin layer 13 from the release substrate 14” means that the marker 12 and the cured curable resin layer 13 are separated. It also includes peeling the peeling base material 14 from the supporting base material 11 it has.

  By producing the anti-counterfeit medium 10 having the plurality of color markers 12 as described above, the anti-counterfeit medium 10 that is more difficult to counterfeit can be obtained.

  In addition, you may add not only said process but another process, for example, the process of forming the contact bonding layer on the marker 12 and the hardened | cured curable resin layer 13, etc. as needed.

5. Other Embodiments In the first manufacturing method, the second manufacturing method, and the third manufacturing method of the present embodiment, a photosensitive resin layer is formed on one surface of the release substrate 14 as a marker forming substrate preparation step. A photosensitive resin layer forming step to be performed, and a marker forming step of forming the marker 12 on the release substrate 14 by exposing the photosensitive resin layer and developing the exposed photosensitive resin layer. The marker 12 may be formed by a printing method, an inkjet method, or the like.

  Even when the marker 12 is formed on the release substrate 14 by printing or inkjet, when the marker 12 is directly formed on the support substrate 11, if the tension is applied to flatten the support substrate 11, the support is performed. There is a possibility that the base material 11 expands and contracts and the marker 12 having a desired size or shape cannot be formed. Therefore, as in the case of using a photomask or the like, the marker 12 is formed on the peeling substrate 14, and the marker 12 is transferred onto the supporting substrate 11, so that the marker 12 having a desired size or shape can be obtained. It can be formed on the support substrate 11.

  In the first manufacturing method, the second manufacturing method, and the third manufacturing method, a roll-to-roll photolithography apparatus can also be used. The roll-to-roll photolithography apparatus is a process of forming a photosensitive resin layer while the peeling substrate 14 and the support substrate 11 are unwound from the unwinding roll and continuously flowed to the winding roll. , A marker forming step, a curable resin layer forming step, a laminating step, a curing step, a transfer step, and the like. By using a roll-to-roll photolithography apparatus, the productivity of the anti-counterfeit medium 10 can be improved.

  Hereinafter, the present invention will be described in more detail with reference to examples. The present invention is not limited to the contents obtained in the following examples.

Example 1
A sheet-like glass base material (non-alkali glass, Asahi Glass Co., Ltd., AN-100) having a thickness of 100 mm × 100 mm and a thickness of 0.7 mm was used as a peeling base material. On this glass substrate, a red negative photosensitive resin layer forming material (DNP Fine Chemical Co., IT-GR) is spin-coated at 500 rpm for 10 seconds, dried at 50 ° C. for 2 minutes, A negative photosensitive resin layer was formed.

  Next, the negative photosensitive resin layer formed on the glass substrate was exposed to 300 mJ through a photomask provided with a transmission portion in which markers having a plurality of types of contour shapes were randomly arranged. Thereafter, the exposed negative photosensitive resin layer was developed with a developer (manufactured by Henkel, Disperse H, diluted 100 times) for 1 minute to obtain a red marker.

  Next, a blue negative photosensitive resin layer forming material (DNP Fine Chemical Co., IT-GB) is spin-coated at 500 rpm for 10 seconds on a glass substrate on which a red marker is formed, and 50 ° C. Drying for 2 minutes was performed to form a negative photosensitive resin layer.

  Next, the negative photosensitive resin layer was exposed to 300 mJ through a photomask capable of producing a marker different from the outline shape and arrangement pattern of the red marker. Thereafter, the exposed negative photosensitive resin layer was developed with a developer (manufactured by Henkel, Disperse H, diluted 100 times) for 1 minute to obtain a blue marker.

  Next, on a glass substrate on which red and blue markers are formed, a green negative photosensitive resin layer forming material (DNP Fine Chemical Co., IT-GG) is spin-coated at 500 rpm for 10 seconds, Drying was performed at 50 ° C. for 2 minutes to form a negative photosensitive resin layer.

  Next, the negative photosensitive resin layer was exposed to 300 mJ through a photomask capable of producing a marker different from the outline shape and arrangement pattern of the red and blue markers. Then, the green marker was obtained by developing the exposed negative photosensitive resin layer for 1 minute with the developing solution (Henkel company make, Disperse H, 100 time dilution).

Next, using a bar coater on a glass substrate on which red, blue, and green markers are formed, the following curable resin layer forming material is placed, dried at 90 ° C. for 30 seconds, and cured. A resin layer was formed.
-Nippon Synthetic Chemical Co., Ltd. urethane acrylate resin (trade name: Purple light UV-7620EA) ... 60 parts by weight-Nippon Synthetic Chemical Co., Ltd. urethane acrylate resin (trade name: purple light UV-3500BA) ... 40 parts by weight-Dipentaerythritol hexaacrylate (DPHA): 85 parts by weight-Irgacure 184 ... 6 parts by weight manufactured by Ciba Specialty Chemicals Co., Ltd.-Methyl ethyl ketone ... 120 parts by weight-Toluene: 120 parts by weight

  Next, an easy-adhesion-treated PET film (Teijin (registered trademark) Tetron (registered trademark) film, HPE-16) having a thickness of 16 μm was prepared as a supporting substrate. The easy-adhesion surface side of the easy-adhesion-treated PET film was laminated and laminated on the curable resin layer side of the glass substrate on which the curable resin layer was formed.

  Next, 1500 mJ UV irradiation was performed to the glass base material which laminated | stacked the easily bonding process PET film from the easily bonding process PET film side.

  Next, when the easy-adhesion-treated PET film was peeled from the glass substrate, all the markers formed on the glass substrate were transferred to the support substrate, and a forgery prevention medium could be obtained.

  When the obtained medium for preventing forgery was enlarged and observed using a magnifying glass, it was confirmed that a marker having a desired size and shape was formed.

(Example 2)
A glass substrate on which red, blue and green markers similar to those in Example 1 were formed was prepared.

  Next, an easy-adhesion-treated PET film having a thickness of 25 μm (manufactured by Toray Industries, Inc., Lumirror (registered trademark), T11S) was prepared as a supporting substrate. Using a bar coater on the easy-adhesion surface side of the easy-adhesion-treated PET film, the same curable resin-forming material as in Example 1 is placed and dried at 90 ° C. for 30 seconds to form a curable resin layer. did.

  Next, the easy adhesion processing PET film in which the curable resin layer was formed was laminated | stacked on the side in which the marker of the glass base material was formed.

  Next, 1500 mJ UV irradiation was performed to the glass base material which laminated | stacked the easily bonding process PET film from the easily bonding process PET film side.

  Next, when the easy-adhesion-treated PET film was peeled from the glass substrate, all the markers formed on the glass substrate were transferred to the easy-adhesion-treated PET film, and an anti-counterfeit medium could be obtained.

  When the obtained medium for preventing forgery was enlarged and observed using a magnifying glass, it was confirmed that a marker having a desired size and shape was formed.

(Example 3)
Roll negative PET film (Toyobo Co., Ltd., Toyobo Ester Film (registered trademark), E5001 (peeling substrate)) on a 250 μm thick red negative photosensitive resin layer forming material (DNP Fine Chemical Co., Ltd.) , IT-LR) was applied with a bar coater and dried at 50 ° C. for 2 minutes to form a negative photosensitive resin layer.

  Next, the negative photosensitive resin layer formed on the peeling substrate was exposed to 300 mJ through a photomask provided with a transmission portion in which markers having a plurality of types of contour shapes were randomly arranged. Thereafter, the exposed negative photosensitive resin layer was developed with a developer (manufactured by Henkel, Disperse H, diluted 100 times) for 1 minute to obtain a red marker.

  Next, a blue negative photosensitive resin layer forming material (DNP Fine Chemical Co., Ltd., IT-LB) was applied on a peeling substrate on which a red marker was formed, using a bar coater, and the coating was performed at 50 ° C. for 2 minutes. Drying was performed to form a negative photosensitive resin layer.

  Next, the negative photosensitive resin layer was exposed to 300 mJ through a photomask capable of producing a marker different from the outline shape and arrangement pattern of the red marker. Thereafter, the exposed negative photosensitive resin layer was developed with a developer (manufactured by Henkel, Disperse H, diluted 100 times) for 1 minute to obtain a blue marker.

  Next, a green negative photosensitive resin layer forming material (DNP Fine Chemical Co., Ltd., IT-LG) is applied on a peeling substrate on which red and blue markers are formed with a bar coater. A negative photosensitive resin layer was formed by drying for a minute.

  Next, the negative photosensitive resin layer was exposed to 300 mJ through a photomask capable of producing a marker different from the outline shape and arrangement pattern of the red and blue markers. Thereafter, the exposed negative photosensitive resin layer was developed with a developer (Henkel, Disperse H, diluted 100 times) for 1 minute, whereby a green marker was obtained.

Next, the following curable resin layer forming material is placed on a release substrate on which red, blue, and green markers are formed using a bar coater, and dried at 90 ° C. for 30 seconds to be curable. A resin layer was formed.
-Nippon Synthetic Chemical Co., Ltd. urethane acrylate resin (trade name: Purple light UV-7620EA) ... 60 parts by weight-Nippon Synthetic Chemical Co., Ltd. urethane acrylate resin (trade name: purple light UV-3500BA) ... 40 parts by weight-Dipentaerythritol hexaacrylate (DPHA): 260 parts by weight • Irgacure 184 manufactured by Ciba Specialty Chemicals Co., Ltd .: 6 parts by weight • Methyl ethyl ketone: 120 parts by weight • Toluene: 120 parts by weight

  Next, an easy-adhesion-treated PET film having a thickness of 16 μm (manufactured by Teijin DuPont Films, Teijin (registered trademark) Tetron (registered trademark) film, HPE-16) was prepared as a supporting substrate. On the curable resin layer side of the PET film, the easy adhesion surface side of the easy adhesion treatment PET film was laminated and laminated.

  Moreover, 1500 mJ UV irradiation was performed to the PET film which laminated | stacked the easy adhesion treatment PET film from the easy adhesion treatment PET film side.

  Next, when the easy-adhesion-treated PET film was peeled from the PET film, all the markers formed on the PET film were transferred to the easy-adhesion-treated PET film, and a forgery prevention medium could be obtained.

  When the obtained medium for preventing forgery was enlarged and observed using a magnifying glass, it was confirmed that a marker having a desired size and shape was formed.

Example 4
A PET film on which red, blue, and green markers similar to those in Example 3 were formed was prepared as a release substrate.

  Next, an easy-adhesion-treated PET film having a thickness of 25 μm (manufactured by Toray Industries, Inc., Lumirror (registered trademark), T11S) was prepared as a supporting substrate. A curable resin-forming material similar to that in Example 3 was placed on the easily adhesive surface side of the support substrate, and dried at 90 ° C. for 30 seconds to form a curable resin layer.

  Next, the support base material on which the curable resin layer was formed was laminated on the side of the release base material on which the marker was formed.

  Next, 1500 mJ UV irradiation was performed to the PET film which laminated | stacked the support base material from the easy adhesion process PET film side.

  Next, when the easy-adhesion-treated PET film was peeled from the release substrate, all the markers formed on the PET film were transferred to the support substrate, and a forgery prevention medium could be obtained.

  When the obtained medium for preventing forgery was enlarged and observed using a magnifying glass, it was confirmed that a marker having a desired size and shape was formed.

DESCRIPTION OF SYMBOLS 10 Anti-counterfeit medium 11 Support base material 12, 12a, 12b, 12c Marker 13 Hardened curable resin layer 14 Peeling base material 15, 16, 17 Photosensitive resin layer 15a, 16a, 17a Exposed photosensitive resin layer 18 Cured Resin layer 20, 21, 22, 23 Photomask 20a, 21a, 22a, 23a Transmission part 20b, 21b Light shielding part

Claims (4)

  1. A marker forming base material preparing step for preparing a peelable base material formed on one surface of a marker whose contour shape is identifiable by magnifying and being observed,
    A support substrate preparation step of preparing a support substrate having a thickness smaller than that of the release substrate;
    A curable resin layer forming step of forming a curable resin layer by disposing a curable resin layer forming material containing a curable resin on the one surface of the release substrate or the one surface of the support substrate. When,
    A laminating step of laminating the release substrate and the support substrate to face each other through the curable resin layer;
    A curing step of bonding the curable resin layer and the support substrate by curing the curable resin layer;
    A method for producing an anti-counterfeit medium, comprising: a transfer step of peeling the support substrate having the marker from the release substrate and transferring the marker to the support substrate.
  2. The marker-forming substrate preparation step includes
    A photosensitive resin layer forming step of forming a photosensitive resin layer by disposing a photosensitive resin layer forming material containing a photosensitive resin on one surface of the release substrate;
    2. The marker forming step of forming the marker on the release substrate by exposing the photosensitive resin layer in a pattern and developing the exposed photosensitive resin layer. Manufacturing method of anti-counterfeit medium.
  3.   The method for producing a medium for preventing forgery according to claim 2, wherein, in the marker forming step, there are a plurality of types of contour shapes of the marker formed on the release substrate.
  4.   The marker has a plurality of colors, and the photosensitive resin layer forming step and the marker forming step are repeated for each color using the photosensitive resin layer forming material colored in the marker color. The method for producing a medium for preventing forgery according to claim 2 or 3, characterized in that:
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JPS58173655A (en) * 1982-04-05 1983-10-12 Toppan Printing Co Ltd Manufacture of decorative material
JPS6198599A (en) * 1984-10-19 1986-05-16 Dainippon Printing Co Ltd Transfer sheet and patterning method using said sheet
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JPH04156399A (en) * 1990-10-19 1992-05-28 Dainippon Printing Co Ltd Transfer sheet
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58173655A (en) * 1982-04-05 1983-10-12 Toppan Printing Co Ltd Manufacture of decorative material
JPS6198599A (en) * 1984-10-19 1986-05-16 Dainippon Printing Co Ltd Transfer sheet and patterning method using said sheet
JPH03202398A (en) * 1989-12-28 1991-09-04 Dainippon Printing Co Ltd Minute image data recording card
JPH04156399A (en) * 1990-10-19 1992-05-28 Dainippon Printing Co Ltd Transfer sheet
JPH05208478A (en) * 1992-08-20 1993-08-20 Dainippon Printing Co Ltd Production of decorative laminate
JPH06191195A (en) * 1992-09-11 1994-07-12 Dainippon Printing Co Ltd Transfer sheet and production of decorative material using this sheet
JPH106696A (en) * 1996-06-19 1998-01-13 Dainippon Printing Co Ltd Pattern transfer method to column base
JPH10301299A (en) * 1997-04-25 1998-11-13 Showa Denko Kk Image forming method and image display
JP2003520986A (en) * 2000-01-21 2003-07-08 フレックス プロダクツ インコーポレイテッド Optical modulation security device
WO2011104551A1 (en) * 2010-02-24 2011-09-01 De La Rue International Limited Security device
WO2012003592A1 (en) * 2010-07-07 2012-01-12 Orell Füssli Sicherheitsdruck Ag Security document with holographic foil and printed machine-readable markings
JP2014054767A (en) * 2012-09-12 2014-03-27 Dainippon Printing Co Ltd Method for producing forgery prevention medium

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