JP2017011268A - Imprint apparatus, imprint method, and method of manufacturing article - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technique advantageous for allowing a rotation error in a pattern region of a mold.SOLUTION: An imprint apparatus brings a pattern region of a mold that is held by a mold holder into contact with an imprint material supplied onto a substrate held by a substrate holder and cures the imprint material. The apparatus includes a rotation mechanism configured to rotate the substrate, and a conveying mechanism configured to convey the substrate from the rotation mechanism to the substrate holder. The conveying mechanism conveys the substrate to the substrate holder after the rotation mechanism rotates the substrate, according to a rotation error in the pattern region while the mold holder holds the mold.SELECTED DRAWING: Figure 5

Description

  The present invention relates to an imprint apparatus, an imprint method, and an article manufacturing method.

  An imprint apparatus has attracted attention as a new lithography apparatus for manufacturing articles such as semiconductor devices. In the imprint apparatus, an imprint material is supplied onto a substrate, and a pattern is formed by forming the imprint material using a mold. When there is a rotation error in the pattern area of the mold in a state where the mold is held by holding the mold, a rotation error occurs in a pattern formed on the substrate using the mold.

  Patent Document 1 is not a document related to an imprint apparatus, but the document describes a rotary table that rotates a substrate. Although Patent Document 2 is not a document related to the imprint apparatus, it describes that a mask or a photosensitive substrate is slightly rotated during scanning exposure.

Japanese Patent Laid-Open No. 10-70174 JP-A-8-55796

  The rotation error of the pattern area in a state where the mold is held by the mold holding unit may be caused by, for example, the pattern area of the mold rotating with respect to the reference plane of the mold. The rotation of the pattern area with respect to the reference surface of the mold may occur due to a manufacturing error of the mold or a deformation of the mold after the manufacturing. Alternatively, the rotation error of the pattern region in a state where the mold is held by the mold holding unit may be caused by an attachment error when the mold is held by the mold holding unit.

  When there is a rotation error of the pattern area in a state where the mold is held by the mold holding unit, it is necessary to rotate the substrate accordingly. The substrate can be rotated by rotating a substrate holding unit that holds the substrate. However, if the rotation error is large, the Abbe error caused by the rotation of the substrate holder cannot be ignored. Alternatively, when the rotation error exceeds the rotation limit of the substrate holding unit, it is necessary to replace the substrate on the substrate holding unit, which may cause a decrease in throughput.

  The present invention has been made in light of the above problem recognition, and an object thereof is to provide an advantageous technique for allowing a rotation error in a pattern region of a mold.

  One aspect of the present invention is an imprint in which an imprint material supplied on a substrate held by a substrate holding unit is brought into contact with a pattern region of the mold held by the mold holding unit to cure the imprint material. The imprint apparatus includes: a rotation mechanism that rotates the substrate; and a conveyance mechanism that conveys the substrate from the rotation mechanism to the substrate holding unit. The mold holding unit holds the mold. After the substrate is rotated by the rotation mechanism in accordance with the rotation error of the pattern area in the state where the substrate is held, the substrate is transferred to the substrate holder by the transfer mechanism.

  According to the present invention, an advantageous technique is provided for allowing a rotation error in a pattern region of a mold.

The figure which shows the structure of the imprint apparatus of one Embodiment of this invention. The figure which shows the example of the rotation error of the pattern area | region in a mold. The figure explaining transfer of the board | substrate to a board | substrate holding part. The figure explaining Abbe error. The figure explaining operation | movement of an imprint apparatus. The figure which shows the example which shares the rotation error component of a pattern area | region with several imprint apparatus. The figure explaining operation | movement of an imprint apparatus. The figure explaining operation | movement of an imprint apparatus.

  Hereinafter, the present invention will be described through exemplary embodiments thereof with reference to the accompanying drawings.

  FIG. 1A shows a configuration of an imprint apparatus 100 according to one embodiment of the present invention. FIG. 1B shows the mold 111 held by the mold holding unit 113 and its periphery. The imprint apparatus 100 causes the pattern region 111a of the mold 111 held by the mold holding unit 113 to contact the imprint material 122 supplied on the substrate 101 held by the substrate holding unit 102 so that the imprint material 122 is used. Harden. In this example, the imprint material 122 is cured by irradiating the imprint material 122 with light. However, the imprint material 122 may be cured by other methods such as temperature control. The directions in the following description are made in an xyz coordinate system in which a plane parallel to a plane on which the substrate 101 is to be arranged is an xy plane.

  The imprint apparatus 100 includes an illumination unit 142 that irradiates light onto the imprint material 122, a mold holding unit 113 (head mount) that holds the mold 111, a substrate driving unit 106 that drives the substrate 101, and an application unit 121 ( Dispenser). The illumination unit 142 cures the imprint material 122 by irradiating the imprint material 122 with light such as ultraviolet rays. The illumination unit 142 can include, for example, a light source 141 and a mirror 143 that bends the light so that light emitted from the light source 141 enters the imprint material 122 on the substrate 101 via the mold 111. The mold 111 has a pattern region 111 a in which a concavo-convex pattern (for example, a circuit pattern) is formed on the surface facing the substrate 101. The mold 111 can be made of a material that transmits light, such as quartz.

  The mold holding unit 113 may include a shape correction unit 112 that changes the shape of the mold 111 (pattern region 111a) by holding each side of the mold 111 and applying a force. The mold holding unit 113 is driven by a mold driving unit (not shown). The mold driving unit can include, for example, an actuator that drives the mold 111 in each of the z, ωx, and ωy directions to bring the pattern region 111a of the mold 111 into contact with the imprint material 122 supplied on the substrate 101. . Here, ωx is a rotation around an axis parallel to the x direction, and ωy is a rotation around an axis parallel to the y direction. As the actuator, for example, a linear motor or an air cylinder can be raised.

  FIG. 1B schematically shows the shape correction unit 112. The mold 111 includes a plurality of end surfaces 111e and a pattern region 111a. The shape correcting unit 112 includes an actuator 112 a that applies a force to each end surface 111 e of the mold 111. The actuator 112a can include, for example, at least one of a linear motor, an air cylinder, and a piezo actuator. In the example shown in FIG. 1B, the mold 111 has a rectangular shape having four end faces 111e, and four actuators 112a are provided for each end face 111e.

  The imprint apparatus 100 may include a scope 114 (measuring instrument) for observing the mark on the mold 111, the mark on the substrate 101, and the reference mark 160 disposed on the substrate holding unit 102. Here, by measuring the relative positions of the plurality of marks on the mold 111 and the plurality of marks on the substrate 101 based on the image obtained by the scope 114, the relative position between the mold 111 and the substrate 101 and Relative rotation can be detected. Further, the position and rotation of the mold 111 with respect to the reference coordinates of the imprint apparatus 100 are measured by measuring the relative positions of the plurality of marks on the mold 111 and the reference marks 160 based on the image obtained by the scope 114. Can be detected. The relative positions of the plurality of marks on the mold 111 and the plurality of marks on the substrate 101 are detected by measuring the respective positions of the plurality of marks on the mold 111 and the plurality of marks on the substrate 101 within the field of view of the scope 114. sell. Alternatively, the relative positions of the plurality of marks on the mold 111 and the plurality of marks on the substrate 101 are determined by interference patterns or moire formed by the marks on the mold 111 and the corresponding marks on the substrate 101 in the field of view of the scope 114. May be detected based on. The relative positions of the plurality of marks on the mold 111 and the reference mark 160 can be detected by measuring the respective positions of the plurality of marks on the mold 111 and the reference mark 160 within the field of view of the scope 114.

  The substrate 101 is a member made of a material such as single crystal silicon. An imprint material 122 such as a photo-curing resin is applied or supplied onto the substrate 101 by the application unit 121. The substrate holding unit 102 includes a chuck such as an electrostatic chuck or a vacuum chuck that attracts the substrate 101. The substrate holding unit 102 can be, for example, a fine movement stage supported by a coarse movement stage 104. The fine movement stage as the substrate holding unit 102 can be finely driven by the fine movement actuator 103 in each of the x, y, ωx, ωy, and ωz directions. Here, ωz is rotation around an axis parallel to the z-axis. The coarse movement stage 104 can be driven in the x, y, and ωz directions by the coarse movement actuator 105. The coarse movement stage 104 is installed on a stage surface plate 107 placed on the floor surface. In this example, the substrate driving unit 106 includes a substrate holding unit 102 as a fine movement stage, a fine movement actuator 103, a coarse movement stage 104, and a coarse movement actuator 105. In other examples, the fine movement stage and the coarse movement stage Can be integrated.

  The imprint apparatus 100 further includes an alignment detection system for positioning the substrate 101, an operation system for operating the mold 111 and the substrate 101, and a control unit CNT. The alignment detection system includes an alignment scope 131. The alignment scope 131 can detect the mark on the substrate 101 without using the mold 111 and measures the position and rotation of the substrate 101. The operation system can include a mold transport mechanism (not shown) that transports the mold 111, a substrate transport mechanism 151 that transports the substrate 101, and a rotation mechanism 152 that rotates the substrate 101. The rotation mechanism 152, together with a sensor (not shown), can constitute a pre-aligner that measures the orientation of the substrate 101 and directs the orientation in the reference direction. The orientation of the substrate 101 can be specified by the position of the notch or the orientation flat.

  The substrate carried into the imprint apparatus 100 is rotated by the rotation mechanism 152, and then transferred to the substrate holding unit 102 of the substrate driving unit 106 by the substrate transfer mechanism 151 and delivered to the substrate holding unit 102. As schematically illustrated in FIG. 3B, the substrate driving unit 106 includes pins 180 that support the substrate 101 when the substrate 101 is delivered. The substrate transport mechanism 151 places the substrate 101 on the pins 180 when passing the substrate 101 to the substrate driving unit 106, and receives the substrate 101 on the pins 180 when receiving the substrate 101 from the substrate driving unit 106. After receiving the substrate 101 with the pins 180, the substrate driving unit 106 then holds the substrate 101 with the substrate holding unit 102 by lowering the pins 180. Here, instead of lowering the pin 180, the substrate holding unit 102 may be raised.

  The control unit CNT is, for example, a PLD (abbreviation of programmable logic device) such as an FPGA (Field Programmable Gate Array), an ASIC (abbreviation of Application Specific Integrated Circuit, or an abbreviation of a computer, or a general purpose computer program). , Or a combination of all or part thereof.

  Hereinafter, the operation of the imprint apparatus 100 will be described. The imprint apparatus 100 can be configured to have a first mode and a second mode as operation modes. The first mode is a mode in which the substrate 101 is rotated by rotating the substrate holder 102 in accordance with the rotation error of the pattern region 111a of the mold 111 in a state where the mold 111 is held by the mold holder 113. The second mode is a characteristic mode in this embodiment. The second mode is a mode in which the substrate 101 is transported to the substrate holder 102 by the substrate transport mechanism 151 after the substrate 101 is rotated by the rotation mechanism 152 in accordance with the rotation error of the pattern region 111 a of the mold 111. Here, since the substrate holding unit 102 only needs to hold the substrate 101 while the substrate 101 is rotated, the mechanism for rotating the substrate 101 is not limited to the rotation mechanism 152. For example, the substrate transport mechanism 151 may be provided with a function of rotating the substrate, and the substrate 101 may be rotated during the transport of the substrate 101 by the substrate transport mechanism 151 according to the rotation error of the pattern region 111a of the mold 111. The imprint apparatus 100 may be configured to always operate in the second mode without the first mode.

  Hereinafter, the rotation error of the pattern region 111a of the mold 111 in a state where the mold 111 is held by the mold holding unit 113 is also simply referred to as a rotation error of the pattern region 111a. The rotation error of the pattern region 111a can be caused by, for example, a manufacturing error of the mold 111 or a deformation of the mold 111 after manufacturing. Alternatively, the rotation error of the pattern region 111a may be caused by an attachment error when the mold holding unit 113 holds the mold 111.

  First, the operation of the imprint apparatus 100 in the first mode will be described. In the first mode, under the control of the control unit CNT, the substrate 101 is rotated by the rotation mechanism 152 so as to face the reference direction, and then transferred to the substrate holding unit 102 by the substrate transfer mechanism 151. Retained. Further, the mold 111 is conveyed to the mold holding unit 113 by a mold conveyance unit (not shown) and is held by the mold holding unit 113. For example, the mold 111 can be positioned with respect to the mold holding unit 113 with at least one of the four end faces 111e as a positioning target.

  2A to 2C show examples of the rotation error of the pattern region 111a in the mold 111. FIG. In the example of FIG. 2A, the rotation error of the pattern region 111a of the mold 111 with respect to the end surface 111e of the mold 111 is 0 (zero). In the example of FIG. 2B, a rotation error (rotation amount θ: large) occurs in the pattern region 111a of the mold 111 with respect to the end surface 111e of the mold 111. In the example of FIG. 2B, a rotation error occurs in the pattern region 111 a of the mold 111 with respect to the outer shape (outer peripheral shape) of the mold 111. The rotation error of the pattern region 111a of the mold 111 with respect to the end surface 111e of the mold 111 (the outer shape of the mold 111) is large. In the example of FIG. 2C, a rotation error (rotation amount θ: small) occurs in the pattern region 111a of the mold 111 with respect to the end surface 111e of the mold 111. In the example of FIG. 2C, the rotation error of the pattern region 111a of the mold 111 with respect to the end surface 111e of the mold 111 is small, but is not 0 (zero). A rotation error of the pattern region 111a of the mold 111 with respect to the end surface 111e of the mold 111 may be caused by a manufacturing error of the mold 111 or a deformation of the mold 111 after the manufacturing. When the mold 111 having a rotation error is positioned with respect to the mold holder 113 with the at least one end surface 111e as a positioning target, the pattern region 111a has a rotation error with respect to the reference coordinates of the imprint apparatus 100. Become.

  Next, the relative position and relative rotation between the mold 111 and each shot area of the substrate 101 are detected under the control of the control unit CNT. Specifically, the positions of a plurality of marks on the mold 111 are detected using the scope 114. The positions of the plurality of marks on the mold 111 detected using the scope 114 are positions at the reference coordinates of the imprint apparatus 100. On the other hand, the positions of a plurality of marks formed on the substrate 101 are detected using the alignment scope 131. At this time, the substrate driving unit 106 drives the substrate 101 so that the mark to be detected on the substrate 101 enters the field of view of the alignment scope 131.

  Next, imprinting is performed on each shot area of the substrate 101 under the control of the control unit CNT. In the imprint, the imprint material 122 is supplied to the shot area by the application unit 121, the pattern area 111 a of the mold 111 is brought into contact with the imprint material 122, and the imprint material 122 is cured by light irradiation from the illumination unit 142. It is. Precise alignment between the mold 111 and each shot area can be performed by a die-by-die alignment method. In the die-by-die alignment method, the mark on the substrate 101 and the mark on the mold 111 are simultaneously observed using the scope 114. Based on the result of this observation, a relative displacement and a relative rotation between the shot region of the substrate 101 and the pattern region 111a of the mold 111 are detected. Then, the substrate driving unit 106 and the shape correcting unit 112 are driven so that the relative position and relative rotation error between the shot region of the substrate 101 and the pattern region 111a of the mold 111 are within an allowable range. In the die-by-die alignment method, alignment is performed in a state where the substrate 101 and the mold 111 are in contact with each other via the imprint material 122, so that the amount that can be aligned is limited and for alignment. Takes a long time. Therefore, before the start of alignment by the die-by-die alignment method, the shot area of the substrate 101 and the pattern area 111a of the mold 111 should be aligned as accurately as possible.

  In the alignment by the die-by-die alignment method, if the rotation center RC of the substrate holding part 102 and the center SC of the substrate 101 coincide with each other, as shown in FIG. An Abbe error does not occur even if the substrate holder 102 is rotated. However, when the rotation center RC of the substrate holding portion 102 and the center SC of the substrate 101 do not coincide with each other, when the substrate holding portion 102 is rotated to rotate the substrate 101, as shown in FIG. Abbe error 202 occurs. If the Abbe error 202 is large, the mark on the substrate 101 may deviate from the field of view of the scope 114 when the substrate holding unit 102 is rotated to rotate the substrate 101. If the amount by which the substrate 101 should be rotated exceeds the rotation range of the substrate holding unit 102, it is necessary to replace the substrate 101 in the substrate driving unit 106. Here, the replacement of the substrate 101 will be described with reference to FIG. The mounting of the substrate 101 is changed from the state (a) in which the substrate 101 is held by the substrate holding unit 102 to the state (b) in which the substrate 101 is held by the pins 180 and the substrate holding unit 102 is rotated in this state. The operation returns to the state (a) in which the substrate 101 is held by the substrate holding unit 102. When such a replacement occurs, it takes a long time to complete alignment between the shot area of the substrate 101 and the pattern area 111a of the mold 111, and the throughput decreases.

  The second mode described below is advantageous for suppressing the occurrence of Abbe error 202 and the replacement of the substrate 101 as in the first mode. The operation of the imprint apparatus 100 in the second mode will be described with reference to FIG. First, in step S510, the control unit CNT acquires a rotation error of the pattern region 111a of the mold 111 in a state where the mold 111 is held by the mold holding unit 113. The rotation error of the pattern region 111a can be acquired by detecting the positions of a plurality of marks on the mold 111 using a scope 114 (measuring instrument), for example. Alternatively, the rotation error of the pattern region 111 a can be acquired by detecting the relative positions of the plurality of marks on the mold 111 and the reference marks 160 on the substrate holding unit 102 using the scope 114, for example.

  Alternatively, the rotation error of the pattern region 111a can include, for example, a rotation error component of the pattern region 111a with the end surface 111e of the mold 111 as a reference. Here, as illustrated in FIG. 6, information 192 indicating a rotation error component in each mold 111 can be stored in a storage device 190 accessible by one or a plurality of imprint apparatuses 100. The control unit CNT can acquire from the storage device 190 the rotation error component of the pattern region 111a of the mold 111 used in the imprint apparatus 100. When the mold 111 is positioned with respect to the mold holder 113 with the end surface 111e as a positioning target, the rotation error component can be regarded as a rotation error of the pattern region 111a. When a plurality of imprint apparatuses 100 can access the storage device 190, the rotation error component is measured by one imprint apparatus 100, and information 192 indicating the rotation error component is stored in the storage apparatus 190. Can use the information 192. This is useful when a plurality of imprint apparatuses 100 use the same mold 111.

  Alternatively, the rotation error of the pattern region 111a includes the rotation error component of the pattern region 111a with the end surface 111e of the mold 111 as a reference, and the rotation of the end surface 111e of the mold 111 with respect to the reference coordinates (or reference surface) of the imprint apparatus 100. May be included. The control unit CNT can acquire information 192 indicating the rotation error component from the storage device 190. Further, the control unit CNT can detect the rotation of the end surface 111e by measuring the position of the end surface 111e of the mold 111 at a plurality of locations using the measuring instrument 115. The control unit CNT can determine the rotation error of the pattern region 111a based on the rotation error component of the pattern surface 111a acquired from the storage device 190 and the rotation of the end surface 111e of the mold 111 detected using the measuring instrument 115. it can. That is, the sum of the rotation error component of the pattern surface 111a and the rotation of the end surface 111e of the mold 111 is the rotation error of the pattern region 111a.

  Next, in step S520, the control unit CNT controls the substrate transport mechanism 151 to transport the substrate 101 to the rotation mechanism 152. Next, in step S530, the control unit CNT controls the rotation mechanism 152 to rotate the substrate 101 according to the rotation error of the pattern region 111a. That is, the control unit CNT causes the rotation mechanism 152 to rotate the substrate 101 so that the rotation error of the pattern region 111a is offset. For example, if the rotation error of the pattern region 111a is + θ, the control unit CNT rotates the substrate 101 by + θ so that the rotation error of the pattern region 111a is offset.

  Next, in step S540, the control unit CNT controls the substrate transport mechanism 151 so that the substrate 101 is transported from the rotation mechanism 152 to the substrate holding unit 102 and delivered to the substrate holding unit 102. Thus, the substrate 101 delivered to the substrate holding unit 102 has already been rotated in accordance with the rotation error of the pattern region 111a. That is, the substrate 101 passed to the substrate holding unit 102 has already been rotated so as to cancel the rotation error of the pattern region 111a. Therefore, it is not necessary for the substrate driving unit 106 to rotate the substrate 101 (substrate holding unit 102) according to the rotation error of the pattern region 111a, and it is not necessary to replace the substrate 101. Therefore, the second mode is advantageous for reducing Abbe error and suppressing the replacement of the substrate 101. By reducing the Abbe error, the possibility that the mark on the substrate 101 deviates from the field of view of the scope 114 is reduced. Further, the throughput is improved by suppressing the replacement of the substrate 101.

  Next, in step S550, the control unit CNT controls execution of imprint. In the imprint, the imprint material 122 is supplied to the shot area by the application unit 121, the pattern area 111 a of the mold 111 is brought into contact with the imprint material 122, and the imprint material 122 is cured by light irradiation from the illumination unit 142. It is.

  The imprint apparatus 100 may have a third mode instead of the second mode or in addition to the first mode and the second mode. Hereinafter, the operation of the imprint apparatus 100 in the third mode will be described with reference to FIG. In the third mode, the rotation error of the pattern region 111a is measured while the first substrate is being operated or before the first substrate is transferred to the substrate holding unit 102. Here, a 1st board | substrate is a board | substrate processed first in the lot which consists of a several board | substrate. The substrate to be processed after the first substrate will be referred to as the second substrate. In the third mode, the first substrate is rotated by the substrate driving unit 106 in accordance with the rotation error of the pattern region 111a.

  First, in step S700, the control unit CNT determines whether or not the substrate 101 to be processed is the first substrate. If the substrate is the first substrate, the process proceeds to step S702. The process proceeds to S714. In step S <b> 702, the control unit CNT controls the substrate transport mechanism 151 to transport the first substrate to the rotation mechanism 152. In step S704, the control unit CNT controls the rotation mechanism 152 so that the first substrate rotates so that the first substrate faces the reference direction. In step S706, the control unit CNT measures the rotation error of the pattern region 111a of the mold 111 in a state where the mold 111 is held by the mold holding unit 113 by any of the above methods. In step S <b> 708, the control unit CNT controls the substrate transport mechanism 151 to transport the first substrate from the rotation mechanism 152 to the substrate holding unit 102 and pass it to the substrate holding unit 102. In step S710, the control unit CNT controls the substrate driving unit 106 to rotate the first substrate in accordance with the rotation error of the pattern region 111a. That is, the control unit CNT causes the substrate driving unit 106 to rotate the first substrate so that the rotation error of the pattern region 111a is offset. For example, if the rotation error of the pattern region 111a is + θ, the control unit CNT rotates the substrate driving unit 106 by the first substrate + θ so that the rotation error of the pattern region 111a is offset. When the first substrate is rotated by the substrate driving unit 106, a transfer operation may occur. In step S712, the control unit CNT controls execution of imprinting on the first substrate.

  In step S714, the control unit CNT controls the substrate transport mechanism 151 so as to transport the second substrate to the rotation mechanism 152. Next, in step S716, the control unit CNT controls the rotation mechanism 152 to rotate the second substrate in accordance with the rotation error of the pattern region 111a measured in step S706. Next, in step S718, the control unit CNT controls the substrate transport mechanism 151 so that the second substrate is transported from the rotation mechanism 152 to the substrate holding unit 102 and delivered to the substrate holding unit 102. The second substrate thus transferred to the substrate holding unit 102 has already been rotated in accordance with the rotation error of the pattern region 111a. That is, the substrate 101 passed to the substrate holding unit 102 has already been rotated so as to cancel the rotation error of the pattern region 111a. Therefore, it is not necessary to rotate the second substrate (substrate holding unit 102) according to the rotation error of the pattern area 111a by the substrate driving unit 106, and it is not necessary to replace the second substrate. Next, in step S720, the control unit CNT controls execution of imprinting on the second substrate. In step S722, the control unit CNT determines whether the imprint process has been completed for all the substrates, and if not, returns the process to step S714.

  The imprint apparatus 100 may have a fourth mode instead of the second or third mode or in addition to the first to third modes. Hereinafter, the operation of the imprint apparatus 100 in the fourth mode will be described with reference to FIG. In the fourth mode, by measuring the relative position between the mark on the mold 111 and the mark on the first substrate by the scope 114 (measuring instrument), the relative rotation error between the pattern region 111a and the first substrate is changed to the pattern region. It is detected as a rotation error 111a. The rotation of the second substrate by the rotation mechanism 152 is performed according to the rotation error of the pattern region 111a detected by the scope 114 (measurement device) using the first substrate. In the fourth mode, the first substrate is rotated by the substrate driving unit 106 in accordance with the rotation error of the pattern region 111a.

  In FIG. 8, steps similar to those in the process shown in FIG. In the fourth mode, there is no step S706 in the third mode, and step S706 'is performed after the first substrate is transferred to the substrate holding unit 102 and held by the substrate holding unit 102 in step S708. In step S706 ', the control unit CNT measures the relative positions of the plurality of marks on the mold 111 and the plurality of marks on the first substrate using the scope 114 (measuring instrument). Accordingly, the control unit CNT detects a relative rotation error between the pattern region 111a and the first substrate. This rotation error can be determined as a rotation error of the pattern area 111a. The rotation error of the pattern region 111a determined in this way includes a transport error when the substrate transport mechanism 151 passes the first substrate (substrate 101) to the substrate holder 102. This transport error is considered to be substantially constant during transport of a plurality of substrates. Therefore, the transport error by the substrate transport mechanism 151 can be canceled in advance by rotating the second substrate by the rotation mechanism 152 in step S716 according to the rotation error of the pattern region 111a determined in this way.

  In the above mode, the rotation error of the pattern area 111a once determined is continuously used. The rotation error is caused by imprint repetition, that is, contact / separation between the imprint material and the mold 111, light irradiation, etc. It can change by repetition. Therefore, the rotation error of the pattern region 111a may be updated based on the measurement result obtained by die-by-die alignment when imprinting each shot region.

  A method for manufacturing a device (semiconductor integrated circuit element, liquid crystal display element, etc.) as an article includes a step of forming a pattern on a substrate (wafer, glass plate, film-like substrate) using the above-described imprint apparatus. Further, the manufacturing method may include a step of processing (for example, etching) the substrate on which the pattern is formed. In the case of manufacturing other articles such as patterned media (recording media) and optical elements, the manufacturing method may include other processes for processing a substrate on which a pattern is formed instead of etching. The article manufacturing method of this embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

101: Substrate, 102: Substrate holder (fine movement stage), 103: Fine movement actuator, 104: Coarse movement stage, 105: Coarse movement actuator, 106: Substrate drive unit, 111: Mold, 111a: Pattern area, 111e: End face 112: Shape correction unit, 114: Scope (measuring instrument), 115: Measuring instrument, 121: Application unit, 122: Imprint material, 131: Alignment scope, 151: Substrate transport mechanism, 152: Rotation mechanism, CNT: Control unit , 180: pin, 100: imprint apparatus

Claims (9)

An imprint apparatus for curing the imprint material by bringing the pattern area of the mold held by the mold holding unit into contact with the imprint material supplied on the substrate held by the substrate holding unit,
A rotating mechanism for rotating the substrate;
A transport mechanism for transporting the substrate from the rotating mechanism to the substrate holding unit,
The substrate is transported to the substrate holder by the transport mechanism after the substrate is rotated by the rotation mechanism in accordance with a rotation error of the pattern region in a state where the mold is held by the mold holder;
An imprint apparatus characterized by that. A measuring instrument for detecting the rotation error;
The imprint apparatus according to claim 1. The measuring instrument measures the positions of a plurality of marks formed on the mold,
The rotation error is detected based on the positions of the plurality of marks.
The imprint apparatus according to claim 2. The substrate holding part has a reference mark,
The measuring instrument measures a relative position between a plurality of marks formed on the mold and the reference mark,
The rotational error is detected based on the relative position;
The imprint apparatus according to claim 2. The rotation error includes a rotation error component of the pattern region with respect to an end face of the mold,
The rotational error component is obtained from a storage device;
The substrate is transported to the substrate holder by the transport mechanism after the substrate is rotated by the rotation mechanism according to the rotation error component;
The imprint apparatus according to claim 1. A measuring instrument for detecting rotation of the end face of the mold;
The rotation error includes a rotation error component of the pattern region with respect to the end face, and rotation of the end face,
The rotational error component is obtained from a storage device;
The rotation error is determined based on the rotation error component and the rotation of the end face detected using the measuring instrument.
The imprint apparatus according to claim 1. After the first substrate is processed, the second substrate is processed,
The measuring instrument measures a relative position between a plurality of marks formed on the mold and a plurality of marks formed on the first substrate;
The rotational error is determined based on the relative position;
The imprint apparatus according to claim 2. A rotation step of rotating the substrate by a rotation mechanism;
A transporting step of transporting the substrate rotated by the rotating mechanism to a substrate holding unit and holding the substrate on the substrate holding unit;
An imprint process of supplying an imprint material onto the substrate held by the substrate holding unit, and bringing the pattern area of the mold held by the mold holding unit into contact with the imprint material to cure the imprint material And including
In the rotation step, the substrate is rotated by the rotation mechanism according to a rotation error of the pattern region in a state where the mold is held by the mold holding unit.
An imprint method characterized by the above. Using the imprint apparatus according to any one of claims 1 to 7 to form a pattern on an imprint material on a substrate;
Processing the substrate using a pattern formed on the imprint material; and
An article manufacturing method comprising:

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