JP2016175815A5 - - Google Patents
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- Publication number
- JP2016175815A5 JP2016175815A5 JP2015059204A JP2015059204A JP2016175815A5 JP 2016175815 A5 JP2016175815 A5 JP 2016175815A5 JP 2015059204 A JP2015059204 A JP 2015059204A JP 2015059204 A JP2015059204 A JP 2015059204A JP 2016175815 A5 JP2016175815 A5 JP 2016175815A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- flow rate
- control device
- helium
- adsorption tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims 14
- 239000001307 helium Substances 0.000 claims 6
- 229910052734 helium Inorganic materials 0.000 claims 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium(0) Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 6
- 238000000034 method Methods 0.000 claims 2
- 229910004682 ON-OFF Inorganic materials 0.000 claims 1
- 238000000746 purification Methods 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
Claims (1)
前記流量制御弁は、流量調節動作ができるように流量調節用アクチュエータを有する自動弁とされると共に前記制御装置に接続され、
前記原料ヘリウムガスのヘリウム濃度を検出すると共に前記制御装置に接続されるセンサを備え、
前記第1ガス送出工程および前記第1ガス導入工程の予め定めた一定の実行時間が前記制御装置に記憶され、
前記第1ガス送出工程にある前記吸着塔から送出されて前記第1ガス導入工程にある前記吸着塔に導入されるガスの前記連通流路における流量と、前記原料ヘリウムガスのヘリウム濃度との間の予め定められた対応関係が前記制御装置に記憶され、
前記第1ガス送出工程にある前記吸着塔から送出されて前記第1ガス導入工程にある前記吸着塔に導入されるガス量が、前記センサにより検出されたヘリウム濃度が高い程に多くなるように、前記制御装置により記憶された前記実行時間だけ前記第1ガス送出工程および前記第1ガス導入工程を実行するため前記開閉弁が制御されると共に、前記対応関係に基づき前記流量制御弁により前記連通流路の開度が変更される請求項7に記載のヘリウムガスの精製システム。
A flow control valve for adjusting the flow rate of the gas flowing through the communication channel;
The flow rate control valve is an automatic valve having a flow rate adjusting actuator so that a flow rate adjusting operation can be performed, and is connected to the control device,
A sensor for detecting a helium concentration of the raw material helium gas and connected to the control device;
A predetermined execution time of the first gas delivery step and the first gas introduction step is stored in the control device;
Between the flow rate of the gas sent from the adsorption tower in the first gas delivery step and introduced into the adsorption tower in the first gas introduction step in the communication channel and the helium concentration of the raw helium gas Is stored in the control device,
The amount of gas delivered from the adsorption tower in the first gas delivery process and introduced into the adsorption tower in the first gas introduction process is increased as the helium concentration detected by the sensor increases. The on-off valve is controlled to execute the first gas delivery step and the first gas introduction step for the execution time stored by the control device, and the communication is performed by the flow rate control valve based on the correspondence relationship. The helium gas purification system according to claim 7, wherein the opening degree of the flow path is changed.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015059204A JP6384960B2 (en) | 2015-03-23 | 2015-03-23 | Helium gas purification method and purification system |
TW105106553A TWI680791B (en) | 2015-03-23 | 2016-03-03 | Purification method and purification system for helium gas |
KR1020160028236A KR102446032B1 (en) | 2015-03-23 | 2016-03-09 | Purification method and purification system for helium gas |
CN201610150583.5A CN105983296A (en) | 2015-03-23 | 2016-03-16 | Purification method and purification system for helium gas |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015059204A JP6384960B2 (en) | 2015-03-23 | 2015-03-23 | Helium gas purification method and purification system |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016175815A JP2016175815A (en) | 2016-10-06 |
JP2016175815A5 true JP2016175815A5 (en) | 2018-02-01 |
JP6384960B2 JP6384960B2 (en) | 2018-09-05 |
Family
ID=57043939
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015059204A Active JP6384960B2 (en) | 2015-03-23 | 2015-03-23 | Helium gas purification method and purification system |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6384960B2 (en) |
KR (1) | KR102446032B1 (en) |
CN (1) | CN105983296A (en) |
TW (1) | TWI680791B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108217616A (en) * | 2018-01-16 | 2018-06-29 | 中科睿凌江苏低温设备有限公司 | One kind is used for the liquefied foreign gas cylinder of cryogenic magnet helium |
CN108355416A (en) * | 2018-04-19 | 2018-08-03 | 合肥硕朗自动化科技有限公司 | A kind of helium recovery purifier for vacuum tank leak detection system |
CN109883623B (en) * | 2019-03-04 | 2021-06-22 | 浙江工业职业技术学院 | Helium recovery and purification device based on vacuum box leak detection |
CN110748788A (en) * | 2019-10-18 | 2020-02-04 | Tcl空调器(中山)有限公司 | Gas recovery system and gas recovery method |
KR102667907B1 (en) * | 2023-11-29 | 2024-05-22 | 주식회사 케이와이테크 | High-purity gas purification system, control device and control method for this |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3564816A (en) | 1968-12-30 | 1971-02-23 | Union Carbide Corp | Selective adsorption process |
US3986849A (en) | 1975-11-07 | 1976-10-19 | Union Carbide Corporation | Selective adsorption process |
DE3716898A1 (en) * | 1987-05-20 | 1988-12-15 | Bergwerksverband Gmbh | METHOD AND DEVICE FOR HELIUM ENHANCEMENT |
US5707425A (en) * | 1994-10-21 | 1998-01-13 | Nitrotec Corporation | Helium recovery from higher helium content streams |
US5542966A (en) * | 1994-10-21 | 1996-08-06 | Nitrotec Corporation | Helium recovery |
US6699307B1 (en) * | 2002-10-11 | 2004-03-02 | H2Gen Innovations, Inc. | High recovery PSA cycles and apparatus with reduced complexity |
JP5372607B2 (en) * | 2009-05-29 | 2013-12-18 | 住友精化株式会社 | Helium purification method and helium purification apparatus |
JP5846641B2 (en) * | 2012-07-02 | 2016-01-20 | 住友精化株式会社 | Helium gas purification method and purification apparatus |
WO2014104196A1 (en) * | 2012-12-28 | 2014-07-03 | 大阪瓦斯株式会社 | Gas refining apparatus |
JP2014189480A (en) * | 2013-03-28 | 2014-10-06 | Sumitomo Seika Chem Co Ltd | Method and apparatus for purifying hydrogen gas |
-
2015
- 2015-03-23 JP JP2015059204A patent/JP6384960B2/en active Active
-
2016
- 2016-03-03 TW TW105106553A patent/TWI680791B/en active
- 2016-03-09 KR KR1020160028236A patent/KR102446032B1/en active IP Right Grant
- 2016-03-16 CN CN201610150583.5A patent/CN105983296A/en active Pending
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