JP2016175815A5 - - Google Patents

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Publication number
JP2016175815A5
JP2016175815A5 JP2015059204A JP2015059204A JP2016175815A5 JP 2016175815 A5 JP2016175815 A5 JP 2016175815A5 JP 2015059204 A JP2015059204 A JP 2015059204A JP 2015059204 A JP2015059204 A JP 2015059204A JP 2016175815 A5 JP2016175815 A5 JP 2016175815A5
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JP
Japan
Prior art keywords
gas
flow rate
control device
helium
adsorption tower
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JP2015059204A
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Japanese (ja)
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JP2016175815A (en
JP6384960B2 (en
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Priority to JP2015059204A priority Critical patent/JP6384960B2/en
Priority claimed from JP2015059204A external-priority patent/JP6384960B2/en
Priority to TW105106553A priority patent/TWI680791B/en
Priority to KR1020160028236A priority patent/KR102446032B1/en
Priority to CN201610150583.5A priority patent/CN105983296A/en
Publication of JP2016175815A publication Critical patent/JP2016175815A/en
Publication of JP2016175815A5 publication Critical patent/JP2016175815A5/ja
Application granted granted Critical
Publication of JP6384960B2 publication Critical patent/JP6384960B2/en
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Claims (1)

前記連通流路を流れるガス流量を調節する流量制御弁を備え、
前記流量制御弁は、流量調節動作ができるように流量調節用アクチュエータを有する自動弁とされると共に前記制御装置に接続され、
前記原料ヘリウムガスのヘリウム濃度を検出すると共に前記制御装置に接続されるセンサを備え、
前記第1ガス送出工程および前記第1ガス導入工程の予め定めた一定の実行時間が前記制御装置に記憶され、
前記第1ガス送出工程にある前記吸着塔から送出されて前記第1ガス導入工程にある前記吸着塔に導入されるガスの前記連通流路における流量と、前記原料ヘリウムガスのヘリウム濃度との間の予め定められた対応関係が前記制御装置に記憶され、
前記第1ガス送出工程にある前記吸着塔から送出されて前記第1ガス導入工程にある前記吸着塔に導入されるガス量が、前記センサにより検出されたヘリウム濃度が高い程に多くなるように、前記制御装置により記憶された前記実行時間だけ前記第1ガス送出工程および前記第1ガス導入工程を実行するため前記開閉弁が制御されると共に、前記対応関係に基づき前記流量制御弁により前記連通流路の開度が変更される請求項7に記載のヘリウムガスの精製システム
A flow control valve for adjusting the flow rate of the gas flowing through the communication channel;
The flow rate control valve is an automatic valve having a flow rate adjusting actuator so that a flow rate adjusting operation can be performed, and is connected to the control device,
A sensor for detecting a helium concentration of the raw material helium gas and connected to the control device;
A predetermined execution time of the first gas delivery step and the first gas introduction step is stored in the control device;
Between the flow rate of the gas sent from the adsorption tower in the first gas delivery step and introduced into the adsorption tower in the first gas introduction step in the communication channel and the helium concentration of the raw helium gas Is stored in the control device,
The amount of gas delivered from the adsorption tower in the first gas delivery process and introduced into the adsorption tower in the first gas introduction process is increased as the helium concentration detected by the sensor increases. The on-off valve is controlled to execute the first gas delivery step and the first gas introduction step for the execution time stored by the control device, and the communication is performed by the flow rate control valve based on the correspondence relationship. The helium gas purification system according to claim 7, wherein the opening degree of the flow path is changed.
JP2015059204A 2015-03-23 2015-03-23 Helium gas purification method and purification system Active JP6384960B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015059204A JP6384960B2 (en) 2015-03-23 2015-03-23 Helium gas purification method and purification system
TW105106553A TWI680791B (en) 2015-03-23 2016-03-03 Purification method and purification system for helium gas
KR1020160028236A KR102446032B1 (en) 2015-03-23 2016-03-09 Purification method and purification system for helium gas
CN201610150583.5A CN105983296A (en) 2015-03-23 2016-03-16 Purification method and purification system for helium gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015059204A JP6384960B2 (en) 2015-03-23 2015-03-23 Helium gas purification method and purification system

Publications (3)

Publication Number Publication Date
JP2016175815A JP2016175815A (en) 2016-10-06
JP2016175815A5 true JP2016175815A5 (en) 2018-02-01
JP6384960B2 JP6384960B2 (en) 2018-09-05

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Family Applications (1)

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JP2015059204A Active JP6384960B2 (en) 2015-03-23 2015-03-23 Helium gas purification method and purification system

Country Status (4)

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JP (1) JP6384960B2 (en)
KR (1) KR102446032B1 (en)
CN (1) CN105983296A (en)
TW (1) TWI680791B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108217616A (en) * 2018-01-16 2018-06-29 中科睿凌江苏低温设备有限公司 One kind is used for the liquefied foreign gas cylinder of cryogenic magnet helium
CN108355416A (en) * 2018-04-19 2018-08-03 合肥硕朗自动化科技有限公司 A kind of helium recovery purifier for vacuum tank leak detection system
CN109883623B (en) * 2019-03-04 2021-06-22 浙江工业职业技术学院 Helium recovery and purification device based on vacuum box leak detection
CN110748788A (en) * 2019-10-18 2020-02-04 Tcl空调器(中山)有限公司 Gas recovery system and gas recovery method
KR102667907B1 (en) * 2023-11-29 2024-05-22 주식회사 케이와이테크 High-purity gas purification system, control device and control method for this

Family Cites Families (10)

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Publication number Priority date Publication date Assignee Title
US3564816A (en) 1968-12-30 1971-02-23 Union Carbide Corp Selective adsorption process
US3986849A (en) 1975-11-07 1976-10-19 Union Carbide Corporation Selective adsorption process
DE3716898A1 (en) * 1987-05-20 1988-12-15 Bergwerksverband Gmbh METHOD AND DEVICE FOR HELIUM ENHANCEMENT
US5707425A (en) * 1994-10-21 1998-01-13 Nitrotec Corporation Helium recovery from higher helium content streams
US5542966A (en) * 1994-10-21 1996-08-06 Nitrotec Corporation Helium recovery
US6699307B1 (en) * 2002-10-11 2004-03-02 H2Gen Innovations, Inc. High recovery PSA cycles and apparatus with reduced complexity
JP5372607B2 (en) * 2009-05-29 2013-12-18 住友精化株式会社 Helium purification method and helium purification apparatus
JP5846641B2 (en) * 2012-07-02 2016-01-20 住友精化株式会社 Helium gas purification method and purification apparatus
WO2014104196A1 (en) * 2012-12-28 2014-07-03 大阪瓦斯株式会社 Gas refining apparatus
JP2014189480A (en) * 2013-03-28 2014-10-06 Sumitomo Seika Chem Co Ltd Method and apparatus for purifying hydrogen gas

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