JP2016161507A5 - - Google Patents
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- JP2016161507A5 JP2016161507A5 JP2015042773A JP2015042773A JP2016161507A5 JP 2016161507 A5 JP2016161507 A5 JP 2016161507A5 JP 2015042773 A JP2015042773 A JP 2015042773A JP 2015042773 A JP2015042773 A JP 2015042773A JP 2016161507 A5 JP2016161507 A5 JP 2016161507A5
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- JP
- Japan
- Prior art keywords
- hydrogen gas
- gas sensitive
- sensitive film
- producing
- film according
- Prior art date
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 17
- 239000010410 layer Substances 0.000 claims 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 9
- 238000004519 manufacturing process Methods 0.000 claims 9
- -1 tungsten halide Chemical class 0.000 claims 8
- 239000003054 catalyst Substances 0.000 claims 5
- 230000001788 irregular Effects 0.000 claims 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 5
- 229910052721 tungsten Inorganic materials 0.000 claims 5
- 239000010937 tungsten Substances 0.000 claims 5
- 239000012528 membrane Substances 0.000 claims 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 4
- 239000007789 gas Substances 0.000 claims 3
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims 3
- 229910001930 tungsten oxide Inorganic materials 0.000 claims 3
- 125000005595 acetylacetonate group Chemical group 0.000 claims 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N iso-propanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 229910052763 palladium Inorganic materials 0.000 claims 2
- 229910052697 platinum Inorganic materials 0.000 claims 2
- BABLLCDZHABSRT-FDGPNNRMSA-N (Z)-4-hydroxypent-3-en-2-one;palladium Chemical compound [Pd].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O BABLLCDZHABSRT-FDGPNNRMSA-N 0.000 claims 1
- VEJOYRPGKZZTJW-FDGPNNRMSA-N (Z)-4-hydroxypent-3-en-2-one;platinum Chemical compound [Pt].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O VEJOYRPGKZZTJW-FDGPNNRMSA-N 0.000 claims 1
- KPGXUAIFQMJJFB-UHFFFAOYSA-H Tungsten hexachloride Chemical group Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 claims 1
- 150000001298 alcohols Chemical class 0.000 claims 1
- 125000004432 carbon atoms Chemical group C* 0.000 claims 1
- 238000003795 desorption Methods 0.000 claims 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N ethylene glycol monomethyl ether Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims 1
- 150000004820 halides Chemical class 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 230000001678 irradiating Effects 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims 1
- GBFHNZZOZWQQPA-UHFFFAOYSA-J platinum(4+);tetrachloride;dihydrochloride Chemical compound [H+].[H+].Cl[Pt-2](Cl)(Cl)(Cl)(Cl)Cl GBFHNZZOZWQQPA-UHFFFAOYSA-J 0.000 claims 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propanol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Claims (14)
ハロゲン化タングステンと炭素数を1〜4とするアルコールとを混合して調製した溶液を基板上に塗布して乾燥させる基層形成工程と、
この上に白金族金属化合物と有機溶媒とを混合して調製した溶液を塗布する保護層形成工程と、
還元性ガス雰囲気下で紫外線を照射し前記ハロゲン化タングステンを酸化タングステンに、前記白金族金属化合物を白金族金属にする紫外線処理工程と、を含むことを特徴とする水素ガス感応性膜の製造方法。 A method for producing a hydrogen gas sensitive film in which a catalyst layer is provided on a light control layer made of tungsten oxide,
A base layer forming step in which a solution prepared by mixing tungsten halide and an alcohol having 1 to 4 carbon atoms is applied on a substrate and dried;
A protective layer forming step of applying a solution prepared by mixing a platinum group metal compound and an organic solvent thereon,
A process for producing a hydrogen gas sensitive film, comprising: an ultraviolet treatment step of irradiating ultraviolet rays in a reducing gas atmosphere to convert the tungsten halide into tungsten oxide and the platinum group metal compound into a platinum group metal. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015042773A JP6501110B2 (en) | 2015-03-04 | 2015-03-04 | Hydrogen gas sensitive film and method for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015042773A JP6501110B2 (en) | 2015-03-04 | 2015-03-04 | Hydrogen gas sensitive film and method for producing the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016161507A JP2016161507A (en) | 2016-09-05 |
JP2016161507A5 true JP2016161507A5 (en) | 2017-12-07 |
JP6501110B2 JP6501110B2 (en) | 2019-04-17 |
Family
ID=56845000
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015042773A Active JP6501110B2 (en) | 2015-03-04 | 2015-03-04 | Hydrogen gas sensitive film and method for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6501110B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019031383A1 (en) * | 2017-08-08 | 2019-02-14 | 日東電工株式会社 | Gas detection element |
JP7017994B2 (en) | 2017-08-08 | 2022-02-09 | 日東電工株式会社 | Gas detection element |
JP6892152B2 (en) * | 2017-11-06 | 2021-06-23 | 国立研究開発法人産業技術総合研究所 | Coating liquid, manufacturing method of coating liquid, and manufacturing method of hydrogen gas sensitive film |
CN114813724B (en) * | 2022-06-28 | 2022-10-11 | 安徽维纳物联科技有限公司 | Nitrogen oxide detection system and preparation method thereof |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61123691A (en) * | 1984-11-20 | 1986-06-11 | Asahi Glass Co Ltd | Method of forming tungsten oxide film |
JPH02254172A (en) * | 1989-03-28 | 1990-10-12 | Hitachi Ltd | Production of thin film of metal or metal oxide |
US6535658B1 (en) * | 2000-08-15 | 2003-03-18 | Optech Ventures, Llc | Hydrogen sensor apparatus and method of fabrication |
JP3707053B2 (en) * | 2002-05-08 | 2005-10-19 | 慎司 岡崎 | Method for manufacturing a film for a gas sensor |
US20050081907A1 (en) * | 2003-10-20 | 2005-04-21 | Lewis Larry N. | Electro-active device having metal-containing layer |
JP2005345338A (en) * | 2004-06-04 | 2005-12-15 | Matsushita Electric Ind Co Ltd | Coating film pigment for hydrogen gas detection, coating film for hydrogen gas detection, and hydrogen gas detection tape |
JP2007071866A (en) * | 2005-08-10 | 2007-03-22 | Tokyo Univ Of Science | Film for gas sensor, element for gas sensor and method for manufacturing the element for gas sensor |
JP2007170946A (en) * | 2005-12-21 | 2007-07-05 | Three M Innovative Properties Co | Platinum composite tungsten oxide film and manufacturing method therefor |
JP5152797B2 (en) * | 2008-06-20 | 2013-02-27 | 国立大学法人横浜国立大学 | Method for producing platinum / tungsten oxide hydrogen-sensitive film |
WO2009154216A1 (en) * | 2008-06-20 | 2009-12-23 | 国立大学法人横浜国立大学 | Distributed optical-fiber hydrogen sensor, distributed optical-fiber hydrogen sensor for multipoint observation, hydrogen-sensitive film, and process for producing the same |
JP2010018503A (en) * | 2008-07-14 | 2010-01-28 | Hokkaido Univ | Tungsten oxide exhibiting high photocatalytic activity |
JP5453281B2 (en) * | 2008-09-16 | 2014-03-26 | 株式会社東芝 | Hydrophilic film and member and structure using the same |
JP2010071700A (en) * | 2008-09-16 | 2010-04-02 | Tokyo Univ Of Science | Gas detecting element, and gas detecting sensor having the same |
JP2012021938A (en) * | 2010-07-16 | 2012-02-02 | Japan Atomic Energy Agency | Cyclic saturated hydrocarbon compound detection element and optical detection device using the same |
JP2012140795A (en) * | 2010-12-28 | 2012-07-26 | Panahome Corp | Decorative material having photocatalytic function |
JP2013166122A (en) * | 2012-02-16 | 2013-08-29 | Sumitomo Chemical Co Ltd | Photocatalyst structure, and photocatalyst functional product using the same, and antiviral functional product |
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2015
- 2015-03-04 JP JP2015042773A patent/JP6501110B2/en active Active
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