JP2016161507A5 - - Google Patents

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JP2016161507A5
JP2016161507A5 JP2015042773A JP2015042773A JP2016161507A5 JP 2016161507 A5 JP2016161507 A5 JP 2016161507A5 JP 2015042773 A JP2015042773 A JP 2015042773A JP 2015042773 A JP2015042773 A JP 2015042773A JP 2016161507 A5 JP2016161507 A5 JP 2016161507A5
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hydrogen gas
gas sensitive
sensitive film
producing
film according
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JP2016161507A (en
JP6501110B2 (en
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酸化タングステンからなる調光層上に触媒層を与えた水素ガス感応性膜であって、前記触媒層境界への不規則連通孔を前記調光層に有することを特徴とする水素ガス感応性膜。 A hydrogen gas sensitive film gave a catalyst layer on the light control layer consisting of tungsten oxide, hydrogen gas sensitive to irregular communication hole Previous Symbol catalyst layer boundary, characterized in that it has on the light control layer film. 前記不規則連通孔は、不規則な方向に延びていることを特徴とする請求項1記載の水素ガス感応性膜。2. The hydrogen gas sensitive membrane according to claim 1, wherein the irregular communication hole extends in an irregular direction. 前記調光層は、前記不規則連通孔により多孔化されていることを特徴とする請求項1又は2記載の水素ガス感応性膜。3. The hydrogen gas sensitive film according to claim 1, wherein the light control layer is made porous by the irregular communication holes. 前記触媒層が、白金、及び/又はパラジウムであることを特徴とする請求項1乃至3のうちの1つに記載の水素ガス感応性膜。The hydrogen gas-sensitive membrane according to claim 1, wherein the catalyst layer is platinum and / or palladium. 前記調光層の膜厚は、100nm〜2μmであることを特徴とする請求項1乃至4のうちの1つに記載の水素ガス感応性膜。5. The hydrogen gas sensitive film according to claim 1, wherein the light control layer has a thickness of 100 nm to 2 μm. 酸化タングステンからなる調光層上に触媒層を与えた水素ガス感応性膜の製造方法であって、
ハロゲン化タングステンと炭素数を1〜4とするアルコールとを混合して調製した溶液を基板上に塗布して乾燥させる基層形成工程と、
この上に白金族金属化合物と有機溶媒とを混合して調製した溶液を塗布する保護層形成工程と、
還元性ガス雰囲気下で紫外線を照射し前記ハロゲン化タングステンを酸化タングステンに、前記白金族金属化合物を白金族金属にする紫外線処理工程と、を含むことを特徴とする水素ガス感応性膜の製造方法。
A method for producing a hydrogen gas sensitive film in which a catalyst layer is provided on a light control layer made of tungsten oxide,
A base layer forming step in which a solution prepared by mixing tungsten halide and an alcohol having 1 to 4 carbon atoms is applied on a substrate and dried;
A protective layer forming step of applying a solution prepared by mixing a platinum group metal compound and an organic solvent thereon,
A process for producing a hydrogen gas sensitive film, comprising: an ultraviolet treatment step of irradiating ultraviolet rays in a reducing gas atmosphere to convert the tungsten halide into tungsten oxide and the platinum group metal compound into a platinum group metal. .
前記紫外線処理工程は前記アルコール及び前記ハロゲン化タングステン由来の有機物及びハロゲン化物の脱離による前記触媒層境界への不規則連通孔を前記調光層に与えることを特徴とする請求項記載の水素ガス感応性膜の製造方法。 7. The hydrogen according to claim 6, wherein in the ultraviolet treatment step, the light control layer is provided with irregular communication holes to the catalyst layer boundary due to desorption of the alcohol and tungsten halide-derived organic substances and halides. Method for producing a gas sensitive membrane. 前記ハロゲン化タングステンは六塩化タングステンであって、前記白金族金属化合物は六塩化白金酸、ビス(アセチルアセトナト)白金(Pt(acac))、二塩化パラジウム、ビス(アセチルアセトナト)パラジウム(Pd(acac))のいずれか1つを含むことを特徴とする請求項記載の水素ガス感応性膜の製造方法。 The tungsten halide is tungsten hexachloride, and the platinum group metal compound is hexachloroplatinic acid, bis (acetylacetonato) platinum (Pt (acac) 2 ), palladium dichloride, bis (acetylacetonato) palladium ( The method for producing a hydrogen gas-sensitive film according to claim 7 , comprising any one of Pd (acac) 2 ). 前記アルコールは、メタノール、エタノール、n−プロピルアルコール、i−プロピルアルコールの1又は複数からなることを特徴とする請求項乃至のうちの1つに記載の水素ガス感応性膜の製造方法。 The alcohols include methanol, ethanol, n- propyl alcohol, the production method of a hydrogen gas sensitive film according to one of claims 6 to 8, characterized in that it consists of one or more i- propyl alcohol. 前記アルコールは、i−プロピルアルコールに対してエタノールを体積比で2〜6倍の範囲で混合したものであることを特徴とする請求項記載の水素ガス感応性膜の製造方法。 The method for producing a hydrogen gas sensitive film according to claim 9 , wherein the alcohol is a mixture of ethanol and i-propyl alcohol in a volume ratio of 2 to 6 times. 前記有機溶媒は、エチレングリコールモノメチルエーテル及び/又はエタノールであることを特徴とする請求項乃至10のうちの1つに記載の水素ガス感応性膜の製造方法。 The organic solvent, the production method of a hydrogen gas sensitive film according to one of claims 6 to 10, characterized in that ethylene glycol monomethyl ether and / or ethanol. 前記ハロゲン化タングステン及び前記アルコールの混合は、少なくとも1体積%以下の酸素濃度の不活性ガス雰囲気下で行われることを特徴とする請求項乃至11のうちの1つに記載の水素ガス感応性膜の製造方法。 Mixing the tungsten halide and said alcohol are hydrogen gas sensitive according to one of claims 6 to 11, characterized in that is carried out in an inert gas atmosphere of at least 1% by volume of oxygen concentration A method for producing a membrane. 前記基層形成工程は、アモルファス相で成膜させることを特徴とする請求項乃至12のうちの1つに記載の水素ガス感応性膜の製造方法。 The base layer forming step, the production method of a hydrogen gas sensitive film according to one of claims 6 to 12, characterized in that deposited in the amorphous phase. 前記還元性ガス雰囲気は水素ガス雰囲気であることを特徴とする請求項乃至13のうちの1つに記載の水素ガス感応性膜の製造方法。 Method for producing a hydrogen gas sensitive film according to one of claims 6 to 13 wherein the reducing gas atmosphere is characterized by a hydrogen gas atmosphere.
JP2015042773A 2015-03-04 2015-03-04 Hydrogen gas sensitive film and method for producing the same Active JP6501110B2 (en)

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WO2019031383A1 (en) * 2017-08-08 2019-02-14 日東電工株式会社 Gas detection element
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JP6892152B2 (en) * 2017-11-06 2021-06-23 国立研究開発法人産業技術総合研究所 Coating liquid, manufacturing method of coating liquid, and manufacturing method of hydrogen gas sensitive film
CN114813724B (en) * 2022-06-28 2022-10-11 安徽维纳物联科技有限公司 Nitrogen oxide detection system and preparation method thereof

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