JP2016098398A - Metal surface treatment method, and silver clad copper and composite metal body treated by the method - Google Patents
Metal surface treatment method, and silver clad copper and composite metal body treated by the method Download PDFInfo
- Publication number
- JP2016098398A JP2016098398A JP2014235893A JP2014235893A JP2016098398A JP 2016098398 A JP2016098398 A JP 2016098398A JP 2014235893 A JP2014235893 A JP 2014235893A JP 2014235893 A JP2014235893 A JP 2014235893A JP 2016098398 A JP2016098398 A JP 2016098398A
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- Prior art keywords
- silver
- copper
- fine particles
- compound
- alkylamine
- Prior art date
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 407
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 392
- 239000010949 copper Substances 0.000 title claims abstract description 392
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 311
- 239000004332 silver Substances 0.000 title claims abstract description 293
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 128
- 239000002184 metal Substances 0.000 title claims abstract description 128
- 238000004381 surface treatment Methods 0.000 title claims abstract description 112
- 238000000034 method Methods 0.000 title claims abstract description 104
- 239000002131 composite material Substances 0.000 title claims abstract description 51
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims description 326
- 150000003973 alkyl amines Chemical class 0.000 claims abstract description 142
- 150000001412 amines Chemical class 0.000 claims abstract description 89
- 229940100890 silver compound Drugs 0.000 claims abstract description 71
- 150000003379 silver compounds Chemical class 0.000 claims abstract description 71
- 238000010438 heat treatment Methods 0.000 claims abstract description 36
- 239000010419 fine particle Substances 0.000 claims description 253
- 150000001875 compounds Chemical class 0.000 claims description 165
- 238000000576 coating method Methods 0.000 claims description 41
- 239000011248 coating agent Substances 0.000 claims description 40
- 239000002245 particle Substances 0.000 claims description 38
- XNGYKPINNDWGGF-UHFFFAOYSA-L silver oxalate Chemical compound [Ag+].[Ag+].[O-]C(=O)C([O-])=O XNGYKPINNDWGGF-UHFFFAOYSA-L 0.000 claims description 27
- 150000003378 silver Chemical group 0.000 claims description 19
- 229940071536 silver acetate Drugs 0.000 claims description 16
- CQLFBEKRDQMJLZ-UHFFFAOYSA-M silver acetate Chemical compound [Ag+].CC([O-])=O CQLFBEKRDQMJLZ-UHFFFAOYSA-M 0.000 claims description 13
- 239000006185 dispersion Substances 0.000 claims description 12
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 7
- 239000002612 dispersion medium Substances 0.000 claims description 5
- 229910001111 Fine metal Inorganic materials 0.000 claims description 3
- 230000004927 fusion Effects 0.000 abstract description 43
- 229910000881 Cu alloy Inorganic materials 0.000 abstract description 9
- 229910045601 alloy Inorganic materials 0.000 abstract description 9
- 239000000956 alloy Substances 0.000 abstract description 9
- 241001124569 Lycaenidae Species 0.000 abstract description 2
- 235000014987 copper Nutrition 0.000 abstract description 2
- -1 silver oxalate Chemical class 0.000 description 59
- 239000010408 film Substances 0.000 description 57
- 230000015572 biosynthetic process Effects 0.000 description 40
- 238000005755 formation reaction Methods 0.000 description 40
- 238000005979 thermal decomposition reaction Methods 0.000 description 40
- 230000000052 comparative effect Effects 0.000 description 39
- 239000012298 atmosphere Substances 0.000 description 33
- 125000000217 alkyl group Chemical group 0.000 description 32
- 239000002244 precipitate Substances 0.000 description 32
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 30
- 239000010410 layer Substances 0.000 description 30
- 239000000843 powder Substances 0.000 description 26
- 238000006243 chemical reaction Methods 0.000 description 24
- 238000000354 decomposition reaction Methods 0.000 description 23
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 230000001603 reducing effect Effects 0.000 description 21
- 238000005245 sintering Methods 0.000 description 21
- 239000000203 mixture Substances 0.000 description 20
- 230000003647 oxidation Effects 0.000 description 19
- 238000007254 oxidation reaction Methods 0.000 description 19
- 239000012071 phase Substances 0.000 description 18
- 230000001681 protective effect Effects 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 16
- 238000011282 treatment Methods 0.000 description 16
- 125000003277 amino group Chemical group 0.000 description 14
- 125000004432 carbon atom Chemical group C* 0.000 description 14
- 239000000463 material Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 13
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 12
- 235000014113 dietary fatty acids Nutrition 0.000 description 12
- 229930195729 fatty acid Natural products 0.000 description 12
- 239000000194 fatty acid Substances 0.000 description 12
- 238000010304 firing Methods 0.000 description 11
- 238000001000 micrograph Methods 0.000 description 11
- 239000012429 reaction media Substances 0.000 description 11
- 239000013078 crystal Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
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- 150000004665 fatty acids Chemical class 0.000 description 10
- 238000002156 mixing Methods 0.000 description 10
- 239000003960 organic solvent Substances 0.000 description 10
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 239000003638 chemical reducing agent Substances 0.000 description 9
- YCKOAAUKSGOOJH-UHFFFAOYSA-N copper silver Chemical compound [Cu].[Ag].[Ag] YCKOAAUKSGOOJH-UHFFFAOYSA-N 0.000 description 9
- 238000000349 field-emission scanning electron micrograph Methods 0.000 description 9
- 125000005842 heteroatom Chemical group 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 238000006722 reduction reaction Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 8
- 239000005751 Copper oxide Substances 0.000 description 8
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 8
- 238000005119 centrifugation Methods 0.000 description 8
- 229910000431 copper oxide Inorganic materials 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 230000001737 promoting effect Effects 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 230000009918 complex formation Effects 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 239000001569 carbon dioxide Substances 0.000 description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 238000005304 joining Methods 0.000 description 6
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- 238000002411 thermogravimetry Methods 0.000 description 6
- 239000012752 auxiliary agent Substances 0.000 description 5
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 239000010946 fine silver Substances 0.000 description 5
- 238000000634 powder X-ray diffraction Methods 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 229910001961 silver nitrate Inorganic materials 0.000 description 5
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 4
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- QYCVHILLJSYYBD-UHFFFAOYSA-L copper;oxalate Chemical compound [Cu+2].[O-]C(=O)C([O-])=O QYCVHILLJSYYBD-UHFFFAOYSA-L 0.000 description 4
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 239000002609 medium Substances 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
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- 238000000197 pyrolysis Methods 0.000 description 4
- 230000002269 spontaneous effect Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 3
- 235000021360 Myristic acid Nutrition 0.000 description 3
- TUNFSRHWOTWDNC-UHFFFAOYSA-N Myristic acid Natural products CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- NEIHULKJZQTQKJ-UHFFFAOYSA-N [Cu].[Ag] Chemical compound [Cu].[Ag] NEIHULKJZQTQKJ-UHFFFAOYSA-N 0.000 description 3
- 238000004220 aggregation Methods 0.000 description 3
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- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
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- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- OHGHHPYRRURLHR-UHFFFAOYSA-M silver;tetradecanoate Chemical compound [Ag+].CCCCCCCCCCCCCC([O-])=O OHGHHPYRRURLHR-UHFFFAOYSA-M 0.000 description 3
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- FTZILAQGHINQQR-UHFFFAOYSA-N 2-Methylpentanal Chemical compound CCCC(C)C=O FTZILAQGHINQQR-UHFFFAOYSA-N 0.000 description 2
- TWJNQYPJQDRXPH-UHFFFAOYSA-N 2-cyanobenzohydrazide Chemical compound NNC(=O)C1=CC=CC=C1C#N TWJNQYPJQDRXPH-UHFFFAOYSA-N 0.000 description 2
- MBDOYVRWFFCFHM-UHFFFAOYSA-N 2-hexenal Chemical compound CCCC=CC=O MBDOYVRWFFCFHM-UHFFFAOYSA-N 0.000 description 2
- GBHCABUWWQUMAJ-UHFFFAOYSA-N 2-hydrazinoethanol Chemical compound NNCCO GBHCABUWWQUMAJ-UHFFFAOYSA-N 0.000 description 2
- BYGQBDHUGHBGMD-UHFFFAOYSA-N 2-methylbutanal Chemical compound CCC(C)C=O BYGQBDHUGHBGMD-UHFFFAOYSA-N 0.000 description 2
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- DVFGEIYOLIFSRX-UHFFFAOYSA-N 3-(2-ethylhexoxy)propan-1-amine Chemical compound CCCCC(CC)COCCCN DVFGEIYOLIFSRX-UHFFFAOYSA-N 0.000 description 2
- HCFAJYNVAYBARA-UHFFFAOYSA-N 4-heptanone Chemical compound CCCC(=O)CCC HCFAJYNVAYBARA-UHFFFAOYSA-N 0.000 description 2
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- 239000011593 sulfur Substances 0.000 description 1
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- 238000003786 synthesis reaction Methods 0.000 description 1
- KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
- B22F1/102—Metallic powder coated with organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/30—Making metallic powder or suspensions thereof using chemical processes with decomposition of metal compounds, e.g. by pyrolysis
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Dispersion Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Chemically Coating (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
本発明は、銅などの金属基体の少なくとも一部表面で、加熱により分解して金属銀を生成しうる銀化合物とアルキルアミンとのアミン錯体をアルキルアミンの存在下に加熱して、前記金属表面に銀を析出させる金属表面の処理方法、並びに当該方法により処理された銀被着銅、さらにこれを焼結して得られる複合金属体に関する。 In the present invention, an amine complex of a silver compound capable of being decomposed by heating to form metallic silver and an alkylamine is heated in the presence of an alkylamine on at least a part of the surface of a metal substrate such as copper, and the metal surface The present invention relates to a method for treating a metal surface on which silver is deposited, silver-coated copper treated by the method, and a composite metal body obtained by sintering this.
金属銅は、電気伝導性が良く比較的安価であることから、従来から配線材料として最も一般的に使用される素材である。また、近年では、金属銅が有する高い耐エレクトロマイグレーション性を活かして、LSIの内部配線にも使用されている。一方、金属銅同士の接合は一般に困難であり、従来より、半田付け等の蝋付けに代表される異種金属を介した接合が行われてきた。更に、接合される金属銅表面における酸化物の生成の防止等により接合を容易にするため、予め銅表面に接合に適した異種金属を複合化する技術が広く知られている。例えば、特許文献1には、銅表面に貴金属によるメッキを施すことで、その後の拡散接合を容易に行う技術が開示されている。
一方、近年、金属微粒子を含む導電性インクやペーストを、電子デバイスを簡単な印刷・塗布工程で作製する次世代のプロセス技術であるプリンテッドエレクトロニクス(PE)における配線材料として使用することが注目されている。特に、PEにおいては、電子デバイスが搭載された基板にフレキシビリティを付与する目的で、その基板として各種の樹脂を使用することが望まれている。これらの要望を実現するためには、配線材料である金属微粒子を含む導電性インクやペーストについても、比較的安価な樹脂の耐熱温度である120℃程度以下で容易に焼結して、良好な導電性を示すことが求められている。
Metallic copper has been the most commonly used material for wiring since it has good electrical conductivity and is relatively inexpensive. In recent years, it has also been used for LSI internal wiring by taking advantage of the high electromigration resistance of metallic copper. On the other hand, joining of copper metal is generally difficult, and conventionally, joining via dissimilar metals represented by brazing such as soldering has been performed. Furthermore, in order to facilitate the joining by preventing the formation of oxides on the surface of the metallic copper to be joined, a technique for previously combining different metals suitable for joining on the copper surface is widely known. For example, Patent Document 1 discloses a technique for easily performing subsequent diffusion bonding by plating a copper surface with a noble metal.
On the other hand, in recent years, conductive ink and paste containing fine metal particles have been attracting attention as a wiring material in printed electronics (PE), which is the next generation process technology for producing electronic devices through simple printing and coating processes. ing. In particular, in PE, it is desired to use various resins as a substrate for the purpose of providing flexibility to the substrate on which the electronic device is mounted. In order to realize these demands, conductive ink and paste containing fine metal particles, which are wiring materials, can be easily sintered at about 120 ° C. or less, which is a heat resistant temperature of a relatively inexpensive resin. It is required to show conductivity.
上記要求を満たす配線材料に使用する金属微粒子として、これまでは特に金属銀微粒子が注目されてきた。金属銀は、高い電気伝導率や耐酸化安定性を有することに加え、微粒子にすることで比較的低い温度で焼結して金属銀被膜を生成可能であること等が知られており、PEにおける配線材料として最も実用化に近い材料と考えられている。
銀微粒子はさまざまな方法で製造することが可能であるが、製造された銀微粒子の凝集防止や溶媒への分散性向上等の特性付加の点から、銀微粒子の製造と同時に粒子表面に各種の保護膜を生成させた被覆銀微粒子として製造する方法が一般的である。そのような被覆銀微粒子の製造方法としては、銀を含む化合物(銀化合物)と保護被膜となる有機分子等が共存する環境において、還元剤を用いて銀化合物を還元して銀原子を生成させ、この銀原子の凝集により銀微粒子が生成すると同時に、当該銀微粒子の表面に共存する有機分子等により保護被膜を生成させる方法が一般的である。例えば、特許文献2には、硝酸銀とアミンの錯体を還元剤であるアスコルビン酸等に滴下して硝酸銀を還元して被覆銀微粒子を製造する技術が記載されている。また、特許文献3には、硝酸銀等の銀塩を有機保護剤および還元補助剤の共存下で加熱して還元することで有機保護剤が被着した銀微粒子を製造する技術が記載されている。
上記、従来の銀微粒子の製造方法によれば、銀微粒子を構成する銀原子を生成するために銀化合物と還元剤間の酸化還元反応が必須であるが、銀化合物と還元剤の両成分を均一に混合することは必ずしも容易でなく、系内において濃度の部分的な揺らぎを生じることが避けられない。このために、従来の銀微粒子の製造方法においては系内において均一な酸化還元反応を生じることが困難であり、この結果、生成する銀微粒子の粒径等にばらつきが生じることが避けられない問題を有していた。
As metal fine particles used for wiring materials that satisfy the above requirements, metal silver fine particles have attracted particular attention so far. In addition to having high electrical conductivity and oxidation resistance stability, metallic silver is known to be capable of forming a metallic silver coating by sintering at a relatively low temperature by making fine particles. It is considered to be the most practical material for wiring in Japan.
The silver fine particles can be produced by various methods. From the viewpoint of adding characteristics such as prevention of aggregation of the produced silver fine particles and improved dispersibility in a solvent, various kinds of silver fine particles are produced on the particle surface simultaneously with the production of the silver fine particles. A method of manufacturing as coated silver fine particles in which a protective film is formed is common. As a method for producing such coated fine silver particles, a silver atom is generated by reducing a silver compound using a reducing agent in an environment where a compound containing silver (silver compound) and an organic molecule serving as a protective film coexist. In general, silver fine particles are produced by the aggregation of silver atoms, and at the same time, a protective film is produced by organic molecules or the like coexisting on the surface of the silver fine particles. For example, Patent Document 2 describes a technique for producing coated silver fine particles by dropping a silver nitrate / amine complex onto ascorbic acid or the like as a reducing agent to reduce silver nitrate. Patent Document 3 describes a technique for producing silver fine particles coated with an organic protective agent by heating and reducing a silver salt such as silver nitrate in the presence of an organic protective agent and a reducing auxiliary agent. .
According to the above conventional method for producing silver fine particles, an oxidation-reduction reaction between the silver compound and the reducing agent is essential to produce silver atoms constituting the silver fine particles. Uniform mixing is not always easy, and it is inevitable that partial fluctuations in concentration occur in the system. For this reason, it is difficult to produce a uniform oxidation-reduction reaction in the system in the conventional method for producing silver fine particles, and as a result, it is inevitable that the particle diameters of the produced silver fine particles vary. Had.
このような問題を生じることなく、被覆銀微粒子を効率的に製造する方法として、本発明者らは、アルキルアミンをシュウ酸銀等の銀化合物に被着させて錯化合物を形成させた後、生成した錯化合物を加熱して熱分解することで、被覆銀微粒子を得る技術(以下「アミン錯体熱分解法」、又は場合により「アミン錯体分解法」ともいう)の開発を行っている(例えば、特許文献4〜7参照)。アミン錯体熱分解法によれば、銀微粒子を生成する際の反応として、一成分であるアミン錯体が複数成分に熱分解する反応を利用するため、複数成分間で生じる還元反応と比較して濃度等の揺らぎによる不均一が生じ難く、均一な特性を持つ銀微粒子を得られやすく、また、一般に有機溶媒等を必要とせず、無溶媒でも銀微粒子を得ることができる。更に、アルキルアミンとの錯化合物を形成することにより銀化合物が化学的に不安定になり、本来の熱分解の温度よりも低い温度で熱分解を生じる結果、典型的には100℃程度、又はそれ以下の比較的温和な条件で銀微粒子を生成可能になり、特に容易に低温焼結を生じる被覆銀微粒子の製造に適している。 As a method for efficiently producing coated silver fine particles without causing such problems, the present inventors formed a complex compound by depositing alkylamine on a silver compound such as silver oxalate, Development of technology to obtain coated silver fine particles by heating and thermal decomposition of the complex compound produced (hereinafter also referred to as “amine complex thermal decomposition method” or in some cases “amine complex decomposition method”) (for example, And Patent Documents 4 to 7). According to the amine complex thermal decomposition method, the reaction when the silver complex is generated uses a reaction in which an amine complex, which is a single component, is thermally decomposed into multiple components. Therefore, silver fine particles having uniform characteristics are easily obtained, and generally no organic solvent is required, and silver fine particles can be obtained without a solvent. Furthermore, the formation of a complex compound with an alkylamine makes the silver compound chemically unstable, resulting in thermal decomposition at a temperature lower than the original thermal decomposition temperature, typically about 100 ° C., or Silver fine particles can be produced under relatively mild conditions below that, and are particularly suitable for the production of coated silver fine particles that easily cause low-temperature sintering.
他方、金属銀は金属銅に比べて素材の価格が高く、且つ、耐エレクトロマイグレーションの点で金属銅に劣るため、次世代のプリンテッドエレクトロニクスにおける配線材料として銅微粒子を用いることが広く検討されており、各種の銅微粒子の製造方法が提案されている。しかしながら、微粒子とした場合でも、金属銅の焼結温度(融着温度)は金属銀に比べて高くなることから、依然として樹脂基板上での配線形成が可能な程度の焼結性を持つ銅微粒子は見出されていない。また、銅微粒子においては、その比表面積の増大により製造や使用の工程における酸化が大きな問題となり、一般に不活性ガス雰囲気での製造や、還元雰囲気や光照射といった特殊な焼結環境が必要となるなど、銀微粒子と比べてむしろ高コストとなる問題を有している。 On the other hand, since metallic silver is expensive compared to metallic copper and inferior to metallic copper in terms of electromigration resistance, the use of copper fine particles as a wiring material in next-generation printed electronics has been widely studied. Various methods for producing copper fine particles have been proposed. However, even when fine particles are used, the sintering temperature (fusion temperature) of metallic copper is higher than that of metallic silver, so that the copper fine particles still have sinterability that allows wiring to be formed on the resin substrate. Has not been found. In addition, in copper fine particles, oxidation in manufacturing and use processes becomes a big problem due to an increase in specific surface area, and generally a special sintering environment such as manufacturing in an inert gas atmosphere, a reducing atmosphere or light irradiation is required. Such a problem is rather expensive as compared with silver fine particles.
上記銅微粒子における問題を解決する手段として、特許文献1等に記載されるような比較的マクロな接合の場合と同様に、銅の表面に銀等の貴金属を複合化した微粒子の使用が検討されている。特許文献8には、アミン錯体熱分解法で製造した銀微粒子をコアとして、その表面にアルキルアミン中で生成させた銅原子によりシェルを形成してなる複合微粒子(銀コア銀銅合金シェルナノ微粒子)が記載されている。当該複合微粒子については、還元雰囲気で80℃程度の低温で焼結して導電性を示すことが記載されると共に、当該複合微粒子のシェル部は、平衡状態では存在しない銀銅合金相を含むと共に、主に銅のみからなる部分においても、その格子定数が銀相の格子定数と同様であるなど、準平衡な銅を含む相から構成されることが記載されている。また、当該複合微粒子は、大気中で120℃程度まで加熱した場合にも、実質的に酸化を生じないことが確認されており、銀との複合化により銅の耐酸化性を向上する可能性を示すものである。
また、特許文献9には、銅をコアとして、その周囲に貴金属のアルカノエート(特に、脂肪酸銀)で薄膜層を形成した金属ナノ粒子が記載され、銅のコアを銀の薄膜層でコートした金属ナノ粒子においては、銀薄膜層の存在により131℃まで銅コアの酸化が防止されたことが記載されているが、その焼結性に関しては評価がされていない。
As a means for solving the problems in the copper fine particles, the use of fine particles in which a noble metal such as silver is combined on the surface of copper has been studied, as in the case of relatively macro bonding as described in Patent Document 1 and the like. ing. Patent Document 8 discloses a composite fine particle (silver core silver copper alloy shell nanoparticle) in which a silver fine particle produced by an amine complex thermal decomposition method is used as a core and a shell is formed on the surface by copper atoms generated in an alkylamine. Is described. The composite fine particles are described as being electrically conductive by sintering at a low temperature of about 80 ° C. in a reducing atmosphere, and the shell portion of the composite fine particles contains a silver-copper alloy phase that does not exist in an equilibrium state. In addition, it is described that even a portion mainly made of copper is composed of a phase containing quasi-equilibrium copper such that the lattice constant thereof is the same as that of the silver phase. In addition, it has been confirmed that the composite fine particles do not substantially oxidize even when heated to about 120 ° C. in the atmosphere, and there is a possibility of improving the oxidation resistance of copper by combining with silver. Is shown.
Patent Document 9 describes metal nanoparticles in which a thin film layer is formed with copper as a core and a noble metal alkanoate (especially fatty acid silver) around the core, and the copper core is coated with a silver thin film layer. In nanoparticles, it is described that the oxidation of the copper core was prevented up to 131 ° C. due to the presence of the silver thin film layer, but the sinterability has not been evaluated.
特許文献10には、第1金属前駆体と有機溶媒とを含む溶液を加熱することにより、第1金属前駆体を還元させ、第1金属前駆体に由来する第1金属成分から構成される第1金属コアを生成させる工程と、第1金属コアを含む溶液に第2金属前駆体を加え、この溶液を加熱することにより、第2金属前駆体を還元させ、第2金属前駆体に由来する第2金属成分から構成される第2金属シェルを第1金属コアの周囲に生成させる工程とを有する金属ナノ粒子の製造方法が記載され、具体的には銀のコアを銅のシェルで覆った微粒子を製造したことが記載されている。 In Patent Document 10, a solution containing a first metal precursor and an organic solvent is heated to reduce the first metal precursor, and is composed of a first metal component derived from the first metal precursor. A step of generating one metal core, a second metal precursor is added to a solution containing the first metal core, and the solution is heated to reduce the second metal precursor, resulting from the second metal precursor Forming a second metal shell composed of a second metal component around the first metal core, and a method for producing metal nanoparticles, specifically covering a silver core with a copper shell It is described that fine particles were produced.
上記のように、配線用等の材料として金属銀に比べて素材の価格が低く、耐エレクトロマイグレーションに優れた金属銅を用いることについて広く需要が存在する一方で、金属銅間の融着性が低いために、低温で金属銅を容易に融着させる技術は明らかにされていない。特にフレキシブル基板の耐熱温度範囲において焼結可能な銅を含む微粒子、及びその製造方法などは未だに明らかにされていない。また、銀微粒子を混合することで銅微粒子を焼結する技術や、各種の方法で銅の表面に銀を析出させる等の表面処理を行って銅に銀を複合化した微粒子についても、必ずしも良好な焼結性を示すに至っていない。
そこで、本発明は、特に金属銀が有する低温融着性(焼結性)を利用し、金属銅及びその合金の表面に金属銀を介在させて表面処理して複合化することにより、金属銅(合金)間の融着による接合を比較的低温で生じさせる金属銅の表面処理方法を提供することを課題とする。また、特に銅を含む微粒子の表面を処理することにより、印刷法による金属配線の形成に適した銅(合金)微粒子とするための表面処理方法を提供することを課題とする。更に、金属銅(合金)を上記方法により処理して得られる銅銀複合体を提供することを課題とする。
As mentioned above, while there is a wide demand for using metal copper having a lower material price than metal silver as a material for wiring and the like and excellent in electromigration resistance, it has a fusion property between metal copper. Due to the low temperature, a technique for easily fusing metal copper at a low temperature has not been clarified. In particular, the fine particles containing copper that can be sintered in the heat-resistant temperature range of the flexible substrate and the production method thereof have not yet been clarified. In addition, the technology that sinters copper fine particles by mixing silver fine particles and the fine particles in which silver is combined with copper by surface treatment such as precipitation of silver on the surface of copper by various methods are not necessarily good. Has not yet shown good sinterability.
Therefore, the present invention particularly utilizes the low-temperature fusibility (sinterability) possessed by metallic silver, and composites the metallic copper and its alloy by interposing metallic silver on the surface to form a composite. It is an object of the present invention to provide a surface treatment method for metallic copper that causes bonding by fusion between (alloys) at a relatively low temperature. It is another object of the present invention to provide a surface treatment method for obtaining copper (alloy) fine particles suitable for forming metal wiring by a printing method, particularly by treating the surface of fine particles containing copper. Furthermore, it makes it a subject to provide the copper silver composite obtained by processing metal copper (alloy) by the said method.
本発明者らは、上記課題を解決するために鋭意検討したところ、加熱により分解して金属銀を生成しうる銀化合物とアルキルアミンとを混合して生成させた錯化合物であるアミン錯体を、アルキルアミンの存在下に、金属銅を含む金属表面で加熱して金属銀を析出させることにより、前記金属表面に効率よく銀被覆を形成し、一定の環境耐酸化能を付与可能であること、また当該方法により形成した銀被覆の低温融着を介して金属表面を接合できることを見出し、本発明を完成した。 The present inventors diligently studied to solve the above-mentioned problems. As a result, an amine complex, which is a complex compound formed by mixing a silver compound capable of being decomposed by heating to form metallic silver and an alkylamine, In the presence of alkylamine, by heating on a metal surface containing metallic copper to deposit metallic silver, it is possible to efficiently form a silver coating on the metallic surface and to impart a certain environmental oxidation resistance, Moreover, it discovered that a metal surface could be joined through the low temperature melt | fusion of the silver coating formed by the said method, and completed this invention.
すなわち、本発明の第一の視点における金属表面の処理方法は、加熱により分解して金属銀を生成しうる銀化合物とアルキルアミンとのアミン錯体を、アルキルアミンの存在下に金属銅又は銅合金を含む金属表面で加熱して、当該金属表面に銀を析出させることを特徴とする。本発明の異なる視点では上記表面処理方法により得られるアルキルアミンで被覆された銀被着銅を提供するものであって、この銀被着銅は、金属銅又は銅合金の少なくとも一部表面で、加熱により分解して金属銀を生成しうる銀化合物とアルキルアミンとのアミン錯体をアルキルアミンの存在下に加熱して、前記銅表面に金属銀を析出させてなることを特徴とする。 That is, the method for treating a metal surface according to the first aspect of the present invention includes an amine complex of a silver compound that can be decomposed by heating to form metallic silver and an alkylamine, and metal copper or a copper alloy in the presence of the alkylamine. It heats on the metal surface containing and deposits silver on the said metal surface, It is characterized by the above-mentioned. In a different aspect of the present invention, there is provided a silver-coated copper coated with an alkylamine obtained by the above surface treatment method, and this silver-coated copper is at least a part of the surface of metal copper or a copper alloy, An amine complex of a silver compound capable of being decomposed by heating to form metallic silver and an alkylamine is heated in the presence of alkylamine to deposit metallic silver on the copper surface.
さらに本発明の他の視点では、上記銀被着銅を焼結して得られる複合金属体が提供され、この複合金属体は、銀のマトリクス中に、銅の分散相を含み、3.0×10−3Ω・cm以下の体積抵抗率を示すことを特徴とする。 In still another aspect of the present invention, there is provided a composite metal body obtained by sintering the silver-coated copper, the composite metal body including a copper dispersed phase in a silver matrix, 3.0 It exhibits a volume resistivity of × 10 −3 Ω · cm or less.
本発明の金属表面の処理方法によれば、複雑な設備や不活性ガス雰囲気のような特殊の条件を必要とせず、基体表面の一部あるいは全面に効率よく金属銀を被着させることができる。基体として金属銅を用いた場合には、金属銅の表面に銀の原子層が準安定状態で析出するため、処理された銅表面を低温で融着により接合することができる。例えば、銅板等の表面に本発明に係る処理方法により銀の原子層を被着させることで、当該表面同士の融着性を向上することが可能である。特に、銅微粉末に対して本発明に係る処理方法により銀の原子層を被着させることにより、相互に融着し易く、低温で焼結して配線等を形成可能な銅微粉末とすることが可能となる。また、本発明により表面処理を行って得られる銀被着銅微粉末を分散媒に分散させることで、印刷法により配線等を形成するためのインクやペースト等の分散体等を得ることが可能であり、更に銀被着銅微粉末を相互に融着することで良好な導電性を有する複合金属体を得ることが可能となる。 According to the method for treating a metal surface of the present invention, metal silver can be efficiently deposited on a part of or the entire surface of the substrate without requiring special conditions such as complicated equipment and an inert gas atmosphere. . When metallic copper is used as the substrate, an atomic layer of silver is deposited in a metastable state on the surface of metallic copper, so that the treated copper surfaces can be joined by fusion at a low temperature. For example, the adhesion of the surfaces can be improved by depositing a silver atomic layer on the surface of a copper plate or the like by the treatment method according to the present invention. In particular, by applying a silver atomic layer to the copper fine powder by the processing method according to the present invention, the copper fine powder is easily fused to each other and sintered at a low temperature to form a wiring or the like. It becomes possible. In addition, by dispersing the silver-coated copper fine powder obtained by surface treatment according to the present invention in a dispersion medium, it is possible to obtain a dispersion such as an ink or paste for forming wiring or the like by a printing method. In addition, it is possible to obtain a composite metal body having good conductivity by fusing the silver-coated copper fine powder to each other.
以下、本発明に係る金属銅の表面に対して金属銀の介在を伴う表面処理を行う表面処理方法、並びに当該方法を用いて得られる金属銅の表面に金属銀が被着した銀被着銅について説明する。また、特に金属銀を被着させた銅微粉末と、当該銅微粉末を分散媒に分散させた分散体、及び当該銅微粉末を接合してなる複合金属体について説明する。なお、本発明に係る方法で処理される金属銅は、不可避の不純物のみを含む純銅であってもよく、また、銅を主成分として適宜の合金元素を含有する銅合金であってもよい。以下、本明細書において「金属銅」、又は単に「銅」と記載するものは、純銅の他に銅を主成分とする銅合金を含むものとする。 Hereinafter, a surface treatment method for performing surface treatment involving the intervention of metallic silver on the surface of metallic copper according to the present invention, and silver-coated copper in which metallic silver is deposited on the surface of metallic copper obtained by using the method Will be described. In particular, a copper fine powder coated with metallic silver, a dispersion in which the copper fine powder is dispersed in a dispersion medium, and a composite metal body formed by joining the copper fine powder will be described. The copper metal to be treated by the method according to the present invention may be pure copper containing only inevitable impurities, or may be a copper alloy containing copper as a main component and an appropriate alloy element. Hereinafter, what is described as “metallic copper” or simply “copper” in the present specification includes a copper alloy containing copper as a main component in addition to pure copper.
金属銅間の融着性を向上するための金属銅の表面処理のうち、特に金属銀が介在する表面処理方法について本発明者が種々検討を行ったところ、意外にも、これまでに本発明者らが銀微粒子の製造のために開発してきたアミン錯体熱分解法において生成した銀原子を金属銅の表面に被着させる処理を行うことにより、処理後の表面間の融着が低温でも容易に生じることを見出して、本発明に至ったものである。また、特に銅微粒子に対してアミン錯体熱分解法により銀を被着させることにより、室温付近でも微粒子間の融着による接合が生じて良導体を形成可能であることが見出された。アミン錯体熱分解法により生成した銀原子が金属銅の表面に被着することにより、当該表面間の融着が低温でも容易に生じるようになる理由は明らかではないが、本発明の実施例で示された金属銅の融着性は、通常の金属銀や従来知られた方法により銅表面に設けられた銀被覆と比較しても顕著であり、本発明に係る方法により析出した金属銀は下地の金属銅と良好な金属結合を形成し、且つ析出した金属銀の被覆層が活性な状態にあるためと推察される。 Among the surface treatments of metallic copper for improving the fusion property between metallic coppers, the present inventor made various studies on the surface treatment method in which metallic silver is intervened. By applying silver atoms generated in the amine complex pyrolysis method that has been developed for the production of silver fine particles to the surface of metallic copper, fusion between the surfaces after treatment is easy even at low temperatures. The present invention has been found out. It has also been found that, particularly by applying silver to a copper fine particle by an amine complex pyrolysis method, bonding due to fusion between the fine particles occurs even near room temperature and a good conductor can be formed. Although it is not clear why the silver atoms generated by the amine complex pyrolysis method adhere to the surface of metallic copper, the fusion between the surfaces easily occurs even at a low temperature. The fusion property of the metal copper shown is remarkable even when compared with ordinary metal silver or a silver coating provided on the copper surface by a conventionally known method, and the metal silver deposited by the method according to the present invention is It is presumed that a good metallic bond was formed with the underlying metallic copper and the deposited metallic silver coating layer was in an active state.
特許文献4〜7に記載されるアミン錯体熱分解法においては、銀原子の供給源となる銀化合物と、種々のアルキルアミンとの錯化合物を予め生成させることを特徴とする。当該錯化合物においてはアルキルアミンに含まれるアミノ基が銀化合物に含まれる銀原子に配位結合をしているものと考えられ、これによって銀化合物の構造が不安定になり、本来の分解温度よりも低い温度で銀化合物の分解を生じることが明らかになっている。そして、その錯化合物(以下、「アミン錯体」と称する場合がある。)を加熱することで、比較的低温で銀化合物を分解させて、アルキルアミンが被着した状態の銀原子が生成されるために、生成した銀原子が有するポテンシャルが低く、また被着したアルキルアミンによって運動性が制限されるものと考えられている。この結果として、アミン錯体熱分解法を用いた銀微粒子の製造においては、実質的に反応媒である有機溶媒などが存在せずに銀原子の密度が非常に高い条件においても製造される銀微粒子が粗大化せず、微細で均一な粒径分布が得られるものと考えられている(特許文献4〜7)。 The amine complex thermal decomposition methods described in Patent Documents 4 to 7 are characterized in that a complex compound of a silver compound serving as a silver atom supply source and various alkylamines is generated in advance. In the complex compound, it is considered that the amino group contained in the alkylamine has a coordinate bond to the silver atom contained in the silver compound, which makes the structure of the silver compound unstable, which is higher than the original decomposition temperature. It has been found that decomposition of silver compounds occurs at lower temperatures. Then, by heating the complex compound (hereinafter sometimes referred to as “amine complex”), the silver compound is decomposed at a relatively low temperature, and a silver atom having an alkylamine deposited thereon is generated. Therefore, it is considered that the generated silver atom has a low potential and the mobility is limited by the deposited alkylamine. As a result, in the production of silver fine particles using the amine complex thermal decomposition method, the silver fine particles produced under the condition that the density of silver atoms is very high without the presence of an organic solvent which is substantially a reaction medium. Is not coarsened and a fine and uniform particle size distribution is considered to be obtained (Patent Documents 4 to 7).
本発明に係る検討においては、金属銅の表面が系内に存在する状態で銀化合物とアルキルアミンの錯化合物を熱分解させた際には、金属銅の表面に銀が優先的に析出して銀の原子層からなる被覆を形成することが明らかになった。格子定数の違い等により金属銅と金属銀は平衡状態では合金相を生成せず親和性が低く、例えば以下の比較例3にも示すように、銅微粒子に対して特許文献4〜7に記載の方法で製造した焼結の極めて高い被覆銀微粒子を混合して焼成を行った場合でも得られる焼結体の導電性が低いなど、金属銅と金属銀を良好に接合することが困難であることが一般に知られている。それにも関わらず、本発明によって金属銅の表面に銀の原子層からなる被覆が生成し、また当該銀の被覆を有することで金属銅が高い融着性を示す機構は、アミン錯体熱分解法において生成した銀原子の状態に関係するものと推察される。つまり、一般に知られるような銀を含む化合物を還元剤による駆動力により還元することで銀原子を生成させる場合と比較して、アミン錯体熱分解法において生成した銀原子の化学的ポテンシャルが低いことが予想され、このために核生成等を伴う安定相の形成が困難になる結果、銅の表面に銀の原子層が準安定的に結合して析出したものと考えられる。そして、この銀の原子層が銅の表面との良好な結合を維持しつつバインダーとして機能することで、処理された表面間の融着による接合が低温でも容易に生じるものと考えられる。また、銀の析出と同時に、析出した銀の表面にアルキルアミンの被覆が生成し、銀イオンなどの不純物を表面に含まないため、析出した銀の表面が清浄に維持されることも低温での融着に寄与するものと考えられる。一方、非特許文献1に記載された長鎖脂肪酸イオンで保護された銀微粒子に製法においては、長鎖脂肪酸イオンが銀の電荷補償をするため、銀微粒子表面には銀イオンが不純物として含有すると考えられる。このため、比較例2に示すように、そのような方法により金属銅の表面処理を行った場合には、銀イオンが不純物として作用し、銅の表面へ析出した銀原子層が、必ずしも金属銅との間に良好な結合を形成しないものと推測される。 In the study according to the present invention, when the complex compound of the silver compound and the alkylamine is thermally decomposed in a state where the surface of the metallic copper exists in the system, silver is preferentially deposited on the surface of the metallic copper. It was found to form a coating consisting of an atomic layer of silver. Due to the difference in lattice constant, etc., metallic copper and metallic silver do not produce an alloy phase in an equilibrium state and have low affinity. For example, as shown in Comparative Example 3 below, the copper fine particles are described in Patent Documents 4 to 7 It is difficult to satisfactorily join metallic copper and metallic silver, for example, when the sintered body obtained by this method is mixed and sintered, and the sintered body obtained has low conductivity. It is generally known. Nevertheless, according to the present invention, a coating composed of an atomic layer of silver is formed on the surface of metallic copper, and the mechanism in which metallic copper has a high fusing property by having the coating of silver is based on the amine complex thermal decomposition method. It is inferred to be related to the state of the silver atoms generated in In other words, the chemical potential of silver atoms generated in the amine complex pyrolysis method is low compared to the case where silver atoms are generated by reducing a compound containing silver, which is generally known, by the driving force of a reducing agent. As a result, formation of a stable phase accompanied by nucleation or the like becomes difficult, and as a result, a silver atomic layer is considered to be metastable bonded and deposited on the surface of copper. The silver atomic layer functions as a binder while maintaining a good bond with the copper surface, so that it is considered that bonding between the treated surfaces easily occurs even at low temperatures. At the same time as the deposition of silver, a coating of alkylamine is formed on the surface of the deposited silver and does not contain impurities such as silver ions on the surface, so that the surface of the deposited silver can be kept clean at low temperatures. It is thought that it contributes to fusion. On the other hand, in the method for producing silver fine particles protected with long-chain fatty acid ions described in Non-Patent Document 1, since the long-chain fatty acid ions compensate for the charge of silver, the silver fine particle surface contains silver ions as impurities. Conceivable. For this reason, as shown in Comparative Example 2, when the surface treatment of metallic copper is performed by such a method, silver ions act as impurities, and the silver atomic layer deposited on the copper surface is not necessarily metallic copper. It is presumed that no good bond is formed between the two.
本発明に係る処理方法により処理される金属銅の形態に特に制限はなく、融着性を付与しようとする金属銅の表面にアミン錯体熱分解法により生成した銀原子により銀の原子層を被着させることにより高い融着性を付与することができる。例えば、銅板等の表面に本発明に係る処理方法により銀の原子層を被着させることで、当該表面同士の融着による接合性を向上することが可能である。特に、銅微粒子に対して本発明に係る処理方法により銀の原子層を被着させることにより、相互に融着し易く、低温で焼結して配線等を形成可能な銅微粉末とすることが可能となる。
以下、本発明の実施の形態などについて具体的に説明する。
There is no particular limitation on the form of metallic copper to be treated by the treatment method according to the present invention, and a silver atomic layer is covered with silver atoms generated by an amine complex thermal decomposition method on the surface of the metallic copper to be provided with fusibility. High fusing property can be imparted by attaching. For example, by attaching a silver atomic layer to the surface of a copper plate or the like by the treatment method according to the present invention, it is possible to improve the bondability by fusing the surfaces together. In particular, by applying a silver atomic layer to the copper fine particles by the processing method according to the present invention, a copper fine powder that is easy to fuse with each other and can be sintered at a low temperature to form a wiring or the like. Is possible.
Hereinafter, embodiments of the present invention will be specifically described.
(表面処理される基体)
本発明に係る表面処理により処理される基体について、以下において不可避の不純物のみを含む純銅や、銅を主成分として適宜の合金元素を含有する銅合金を含む金属銅を基体とする場合について詳しく説明するが、本発明に係る表面処理により処理される基体はこれに限定されず、アミン錯体熱分解法により生成した銀原子が被着して原子層を形成する材質であれば、本発明に係る表面処理により処理を行うことができる。つまり、例えば、鉄、鉄鋼、ステンレス鋼、ニッケル基合金、銅、アルミニウム及びそれらの合金や、導電性を有しないセラミックス等の無機化合物や樹脂の表面に対しても本発明を適用することが可能である。
(Substrate to be surface treated)
The substrate treated by the surface treatment according to the present invention will be described in detail below with reference to pure copper containing only inevitable impurities and metallic copper containing copper alloy containing copper as a main component and an appropriate alloy element. However, the substrate to be treated by the surface treatment according to the present invention is not limited to this, and any material can be used as long as it is a material in which silver atoms generated by the amine complex thermal decomposition method are deposited to form an atomic layer. Processing can be performed by surface treatment. That is, for example, the present invention can be applied to the surface of inorganic compounds and resins such as iron, steel, stainless steel, nickel-base alloys, copper, aluminum, and alloys thereof, and ceramics that are not conductive. It is.
本発明に係る表面処理により処理される金属銅の形態や大きさは特に限定されず、板状、箔状、線状(ワイヤー)、粉末状等の適宜の形態のものを一般に用いられる脱脂工程や、酸洗浄、アルカリ洗浄等、適宜の前処理を行うことで清浄化して使用することができる。また、本発明に係る表面処理により銀の原子層が被着する表面については、酸化層等が存在せずに金属相が露出していることが望ましいが、金属銅の表面に生成した酸化銅は本発明に係る表面処理において使用するアルキルアミン浴に溶解して除去されるため、処理を行う金属銅の表面に酸化銅が存在しても本発明に係る表面処理を行うことができる。但し、アルキルアミン浴の清浄性を維持するためには、処理の開始以前に表面の酸化銅が除去されることが望ましいことは言うまでもない。
また、配線形成等に用いる目的で銅微粉末に対して本発明に係る表面処理を行う場合には、銅ペースト等の形態で使用した際に好ましい特性を有するための各種属性を予め具備した銅微粉末を用いることが好ましい。そのような銅微粉末の例として、特開2005−314755号公報に開示された、湿式還元法を用いて製造された銅微粉末や、特開2005−222737号公報に開示された、水アトマイズ法により得られた銅微粉末等が挙げられる。
The form and size of the metallic copper to be treated by the surface treatment according to the present invention are not particularly limited, and a degreasing process in which an appropriate form such as a plate shape, a foil shape, a wire shape (wire), or a powder shape is generally used. Alternatively, it can be used after being cleaned by performing an appropriate pretreatment such as acid cleaning or alkali cleaning. In addition, regarding the surface on which the silver atomic layer is deposited by the surface treatment according to the present invention, it is desirable that the metal phase is exposed without the presence of an oxide layer or the like, but the copper oxide formed on the surface of the metal copper Since it is dissolved and removed in the alkylamine bath used in the surface treatment according to the present invention, the surface treatment according to the present invention can be performed even if copper oxide is present on the surface of the metal copper to be treated. However, it goes without saying that in order to maintain the cleanliness of the alkylamine bath, it is desirable to remove the surface copper oxide before the start of the treatment.
Moreover, when performing the surface treatment which concerns on this invention with respect to copper fine powder for the purpose of using for wiring formation etc., the copper which was previously provided with various attributes for having a desirable characteristic when used in the form of copper paste etc. It is preferable to use a fine powder. Examples of such copper fine powder include copper fine powder produced by using a wet reduction method disclosed in JP-A-2005-314755, and water atomization disclosed in JP-A-2005-222737. Examples thereof include fine copper powder obtained by the method.
一方、本発明の1つの好ましい実施形態においては、本発明に係る表面処理を行う銅微粉末として、アルキルアミン浴中で銅を含む化合物を還元することにより作製された銅微粉末を用いることが挙げられる。これらの銅微粉末においては、予め銅微粉末の表面が保護被膜としてのアルキルアミンで被覆されているため、本発明に係る表面処理を行うアルキルアミン浴に分散しやすく良好に使用することができる。また、特に特開2012−072418及び特開2014−148732号公報等に記載されている方法で製造された銅微粉末においては、実質的に反応系内の酸素ポテンシャルが無視できる(除酸素された)状態で製造され、且つアルキルアミンにより良好に被覆されているために、微粉末の表面に実質的に酸化層が存在しないことから、配線形成等に用いる目的で本発明に係る表面処理を行うことにより、更に良好な焼結性を付与することが可能である。更に、上記公報に記載の銅微粉末においては、銅微粉末内に固溶して存在する酸素原子の密度も低いと推察されることから、以下に説明するように、本発明に係る表面処理を行った後の銅微粉末を焼結する際の酸化層の生成に対する耐性が高いと考えられる点からも好ましく使用することができる。
上記公報に記載の銅微粒子の製造においては、銅とその他の原子(又は、原子群)が結合して構成される含銅化合物を銅原子の供給源としてアルキルアミンにより被覆された銅微粒子を製造する。使用される含銅化合物としては、後述する還元性化合物との間で錯体等の複合化合物を生成可能な化合物であれば銅微粒子の金属源として使用することができる。
On the other hand, in one preferable embodiment of the present invention, a copper fine powder produced by reducing a compound containing copper in an alkylamine bath is used as the copper fine powder for performing the surface treatment according to the present invention. Can be mentioned. In these copper fine powders, since the surface of the copper fine powder is previously coated with an alkylamine as a protective film, the copper fine powder can be used easily and easily dispersed in the alkylamine bath for performing the surface treatment according to the present invention. . In particular, in the copper fine powder produced by the method described in JP2012-072418A and JP2014-148732A, the oxygen potential in the reaction system can be substantially ignored (deoxygenated). The surface treatment according to the present invention is performed for the purpose of wiring formation and the like because the surface of the fine powder is substantially free from an oxide layer because it is coated in a good condition with alkylamine. By this, it is possible to give further better sinterability. Further, in the copper fine powder described in the above publication, it is presumed that the density of oxygen atoms present in a solid solution in the copper fine powder is also low, so that the surface treatment according to the present invention will be described below. It can be preferably used also from the point of being considered to have high resistance to the formation of an oxide layer when sintering the copper fine powder after the sinter.
In the production of copper fine particles described in the above publication, copper fine particles coated with an alkylamine are produced using a copper-containing compound formed by bonding copper and other atoms (or atomic groups) as a supply source of copper atoms. To do. As a copper-containing compound to be used, any compound that can form a complex compound such as a complex with a reducing compound described later can be used as a metal source of copper fine particles.
このような含銅化合物としては、例えば、シュウ酸銅、ギ酸銅、酢酸銅、プロピオン酸銅、酪酸銅、イソ酪酸銅、吉草酸銅、イソ吉草酸銅、ピバリン酸銅、マロン酸銅、コハク酸銅、マレイン酸銅、安息香酸銅、クエン酸銅、酒石酸銅、硝酸銅、亜硝酸銅、亜硫酸銅、硫酸銅、リン酸銅のような銅の有機酸塩や無機酸塩等が例示される他、アセチルアセトンが配位結合したアセチルアセトナト銅に代表される錯化合物が例示される。 Examples of such copper-containing compounds include copper oxalate, copper formate, copper acetate, copper propionate, copper butyrate, copper isobutyrate, copper valerate, copper isovalerate, copper pivalate, copper malonate, and succinate. Examples include organic acid salts and inorganic acid salts of copper such as copper oxide, copper maleate, copper benzoate, copper citrate, copper tartrate, copper nitrate, copper nitrite, copper sulfite, copper sulfate, and copper phosphate. In addition, complex compounds represented by acetylacetonato copper coordinated with acetylacetone are exemplified.
上記銅微粒子の製造方法においては、まず上記含銅化合物に対して、還元作用を有する還元性化合物を混合して、金属化合物と還元性化合物との複合化合物を生成させる。このような複合化合物においては、還元性化合物が含銅化合物中の銅イオンに対する電子のドナーとなり銅イオンの還元を生じ易いため、使用した含銅化合物と比較して自発的な熱分解による銅原子の遊離を生じ易い。このため、このような複合化合物を銅原子の供給のための直接の原料とすることで、反応に関与する物質の供給に律速されることがなく、温度や圧力などの条件の設定により複合化合物の自発的な分解反応を生じさせることで銅原子が供給され、銅微粒子を製造することが可能となる。 In the method for producing copper fine particles, first, a reducing compound having a reducing action is mixed with the copper-containing compound to produce a composite compound of a metal compound and a reducing compound. In such a composite compound, since the reducing compound becomes an electron donor to the copper ion in the copper-containing compound and easily causes reduction of the copper ion, the copper atom is spontaneously decomposed compared with the copper-containing compound used. Is likely to occur. For this reason, by using such a composite compound as a direct raw material for supplying copper atoms, it is not limited by the supply of substances involved in the reaction, and the composite compound can be set by setting conditions such as temperature and pressure. By causing a spontaneous decomposition reaction, copper atoms are supplied, and copper fine particles can be produced.
この際に使用される還元性化合物としては、アミノ基を有するものが好ましい。アミノ基を有する還元剤は含銅化合物中の銅原子等に対して配位結合を形成し易く、含銅化合物の構造を維持した状態で容易に含銅化合物との複合化合物を生成すると共に、銅の還元反応を生じるためである。このような還元性化合物としては、反応媒とするアルキルアミンの蒸発や分解を生じない温度範囲において、自発的な分解反応により銅原子の還元・遊離を生じる複合化合物を形成するものであれば特に限定されないが、典型的には、ヒドラジン、ヒドロキシルアミン及びこれらの誘導体からなる群から選ばれる化合物を特に好ましく挙げられる。これらの化合物は、骨格を成す窒素原子が配位結合により含銅化合物中の銅原子に結合して複合化合物を生成する。また、一般にアルキルアミンと比較して還元力が強いため、生成した複合化合物が比較的穏和な条件で自発的な分解を生じて銅原子を還元・遊離して、アルキルアミンで被覆された銅微粒子を生成することができる。 As the reducing compound used in this case, those having an amino group are preferable. The reducing agent having an amino group easily forms a coordinate bond with a copper atom or the like in the copper-containing compound, and easily forms a composite compound with the copper-containing compound while maintaining the structure of the copper-containing compound. This is because a reduction reaction of copper occurs. As such a reducing compound, in particular, as long as it forms a composite compound that causes reduction / release of a copper atom by a spontaneous decomposition reaction in a temperature range in which evaporation or decomposition of the alkylamine as a reaction medium does not occur. Although not limited, typically, a compound selected from the group consisting of hydrazine, hydroxylamine, and derivatives thereof is particularly preferable. In these compounds, a nitrogen atom constituting the skeleton is bonded to a copper atom in the copper-containing compound by a coordination bond to form a composite compound. In addition, since the reducing power is generally stronger than that of alkylamine, the resulting composite compound undergoes spontaneous decomposition under relatively mild conditions to reduce and release copper atoms, and copper fine particles coated with alkylamine Can be generated.
ここで、ヒドラジンの誘導体とは、ヒドラジンに含まれる水素の1〜3個を所定のアルキル基等で置換したものをいう。また、ヒドロキシルアミンの誘導体とは、ヒドロキシルアミンに含まれる水素の1個を所定のアルキル基等で置換したものをいう。ヒドラジン、ヒドロキシルアミンの使用に代えてその誘導体を適宜選択して使用することで、含銅化合物との反応性を調整することが可能であり、使用する含銅化合物に応じて適切な条件で自発分解を生じる複合化合物を生成することができる。特にヒドラジンと混合した際に複合化合物を生じることなく還元反応を生じやすい含銅化合物を用いる際には、適宜選択されるヒドラジン誘導体を使用して複合化合物の生成を促進することが有効である。 Here, the hydrazine derivative means one obtained by substituting 1-3 of hydrogen contained in hydrazine with a predetermined alkyl group or the like. Further, the hydroxylamine derivative means one obtained by substituting one of hydrogen contained in hydroxylamine with a predetermined alkyl group or the like. It is possible to adjust the reactivity with the copper-containing compound by appropriately selecting and using its derivatives instead of hydrazine and hydroxylamine, and spontaneously under appropriate conditions depending on the copper-containing compound used. Complex compounds that produce degradation can be produced. In particular, when using a copper-containing compound that easily causes a reduction reaction without generating a composite compound when mixed with hydrazine, it is effective to promote the formation of the composite compound by using an appropriately selected hydrazine derivative.
次に、上記で生成した複合化合物を、十分な量のアルキルアミンの存在下で加熱して複合化合物の自発的分解反応により銅原子が生成して凝集することで、使用したアルキルアミンからなる保護膜で被覆された銅微粒子を得ることができる。 Next, the composite compound produced above is heated in the presence of a sufficient amount of alkylamine, and copper atoms are formed and aggregated by the spontaneous decomposition reaction of the composite compound, thereby protecting the alkylamine used. Copper fine particles coated with a film can be obtained.
上記で説明したとおり、本発明に係る表面処理を行うことにより、金属銅の表面に形成される銀の原子層が融着(焼結)の際のバインダーとして機能し、金属銅の表面同士を融着させる際と比較して融着温度を著しく低下することが可能であり、金属銅の酸化防止の点からも有用である。また、銀の原子層が金属銅への酸素の侵入を抑制するために、特に本発明に係る表面処理を行った銅微粒子においては焼結雰囲気からの酸素による酸化耐性を向上することができる。このような酸化耐性に関する相乗効果により、特に本発明は焼結の際の酸化が問題となる銅微粒子において特に有効である。
つまり、本発明に係る表面処理を行う銅微粒子の粒子径は特に限定されないが、特に平均粒子径が50nm以下の微細な銅微粒子を用いた場合にも焼結の際に還元雰囲気は特に必要とされず、不活性ガス雰囲気等の非酸化雰囲気下において酸化相の生成を抑制して良好な伝導体を形成することができる。また、平均粒子径が50nm以上、更に100nm以上の銅微粒子を使用すると、本発明に係る表面処理を行うことで大気雰囲気下での焼結を行った場合でも実質的に酸化相が生成する以前に焼結を完了して、良好な導電体を得ることが可能である。酸化が問題となる金属銅の微粒子を大気雰囲気下で容易に焼結できる理由は、上記のような本発明による焼結温度の低下、銅微粒子への酸素の侵入の抑制効果に加えて、銅微粒子の粒径が大きくなるに従って銅微粒子の比表面積が低下し、単位体積当たりの酸素の侵入量が低減できるためと考えられる。一方、微細印刷配線を形成する観点からは、その用途に応じて銅微粒子の平均粒子径を10μm以下、好ましくは1000nm以下、更に好ましくは500nm以下、更になお好ましくは300nm以下とすることが望ましい。
As described above, by performing the surface treatment according to the present invention, the silver atomic layer formed on the surface of the metallic copper functions as a binder at the time of fusion (sintering), and the surfaces of the metallic copper are bonded to each other. Compared with the fusion, the fusion temperature can be remarkably lowered, which is also useful from the viewpoint of preventing the oxidation of metallic copper. In addition, since the silver atomic layer suppresses the intrusion of oxygen into the metallic copper, the oxidation resistance due to oxygen from the sintering atmosphere can be improved particularly in the copper fine particles subjected to the surface treatment according to the present invention. Due to such a synergistic effect on oxidation resistance, the present invention is particularly effective for copper fine particles in which oxidation during sintering is a problem.
That is, the particle diameter of the copper fine particles to be surface-treated according to the present invention is not particularly limited, but a reducing atmosphere is particularly necessary during sintering even when fine copper fine particles having an average particle diameter of 50 nm or less are used. However, a good conductor can be formed by suppressing generation of an oxidized phase in a non-oxidizing atmosphere such as an inert gas atmosphere. In addition, when copper fine particles having an average particle diameter of 50 nm or more, and further 100 nm or more are used, before the oxidation phase is substantially generated even when sintering is performed in an air atmosphere by performing the surface treatment according to the present invention. It is possible to obtain a good conductor by completing the sintering. The reason why the fine particles of metal copper, which is a problem of oxidation, can be easily sintered in the atmosphere, is that in addition to the above-described effect of reducing the sintering temperature according to the present invention and the effect of suppressing the entry of oxygen into the copper fine particles, copper It is considered that the specific surface area of the copper fine particles decreases as the particle size of the fine particles increases, and the amount of oxygen permeation per unit volume can be reduced. On the other hand, from the viewpoint of forming fine printed wiring, it is desirable that the average particle diameter of the copper fine particles is 10 μm or less, preferably 1000 nm or less, more preferably 500 nm or less, and still more preferably 300 nm or less, depending on the application.
(表面処理において銀原子を供給するためのアミン錯体)
本発明に係る表面処理方法は、銀を含む化合物とアルキルアミンからなる所定のアミン錯体を加熱して熱分解させる際に金属銅を介在させることで、その表面にアミン錯体の分解によって生成する銀原子を被着させて銀の原子層を形成させることを特徴とする。本発明において使用する当該アミン錯体としては、例えば、特許文献4〜7において銀微粒子を生成するために使用されるアミン錯体が使用される。
(Amine complex for supplying silver atoms in surface treatment)
In the surface treatment method according to the present invention, when a predetermined amine complex composed of a silver-containing compound and an alkylamine is heated and thermally decomposed, metallic copper is interposed, so that silver generated by decomposition of the amine complex on the surface Atom is deposited to form an atomic layer of silver. As the said amine complex used in this invention, the amine complex used in order to produce | generate silver fine particles in patent documents 4-7 is used, for example.
アミン錯体の分解によって銀原子を生成し供給する方法は、銀を含む化合物とアルキルアミンが錯化合物を生成することで、銀を含む化合物の構造が不安定になって熱分解温度が一般に低下することを利用するものである。つまり、アミン錯体を経由することで、通常の湿式還元反応で必須とされる還元剤を使用することなく比較的低温で銀を含む化合物を熱分解して銀原子を生成するために、反応の系内で組成の揺らぎに起因する反応の不均一を生じにくく、比較的ポテンシャルが低い銀原子を供給することが可能となる。また、錯化合物を形成したアルキルアミンは、銀を含む化合物が熱分解した後にも銀原子に被着しているものと考えられ、銀原子の運動性を抑制すると共に、銀原子が凝集した際の表面保護被膜を形成するために、銀原子が粗大に凝集することを防止する機能を果たすと考えられる。 A method of generating and supplying silver atoms by decomposing an amine complex is that a compound containing silver and an alkylamine form a complex compound, which makes the structure of the compound containing silver unstable and generally lowers the thermal decomposition temperature. Is to use that. In other words, via an amine complex, a compound containing silver is thermally decomposed at a relatively low temperature without using a reducing agent that is essential in a normal wet reduction reaction. It is possible to supply silver atoms having a relatively low potential, which is less likely to cause nonuniform reaction due to fluctuations in composition in the system. In addition, the alkylamine that formed the complex compound is considered to be attached to the silver atom even after the silver-containing compound is thermally decomposed. When the silver atom aggregates while suppressing the mobility of the silver atom In order to form the surface protective film, it is considered that the silver atom functions to prevent coarse aggregation of silver atoms.
(アミン錯体に用いられる銀化合物)
アミン錯体を形成して銀原子を生成するために使用される銀の化合物としては、各種のアルキルアミンとの間で錯体を形成可能であり、加熱により容易に分解して原子状の銀を生成する銀化合物が好ましく使用される。このような銀化合物として、典型的には、ギ酸、酢酸、シュウ酸、マロン酸、安息香酸、フタル酸などのカルボン酸と銀原子が化合したカルボン酸銀の他、塩化銀、硝酸銀、炭酸銀等が挙げられ、その一種、又は二種以上を混合して使用することができる。また、銀化合物としては、熱分解後に反応系内に不純物として残留する成分を生じないものが特に好ましい。例えば、長鎖・中鎖のアルキル基を有するカルボン酸である脂肪酸を用いた場合には、熱分解によって生じるアルキル鎖を含む化合物が保護被膜に取り込まれることで、保護被膜の脱離性が低下する傾向が見られる。この観点からは、熱分解後の反応系内に実質的に副生成物が残留しないシュウ酸銀が好ましく用いられる。シュウ酸銀は、銀含量が高く、また通常は200℃程度の低温で分解しやすく、また分解の際にシュウ酸イオンが二酸化炭素として除去され金属銀が得られるため、不純物が残留しにくい点で有利である。本発明の方法に用いられるシュウ酸銀は、例えば、市販のシュウ酸銀を用いることができる。また、シュウ酸銀のシュウ酸イオンを、20モル%以下の炭酸イオン、硝酸イオン、酸化物イオンの1種以上で置換した銀化合物を使用してもよい。特に、シュウ酸イオンの20モル%以下が炭酸イオンで置換されたシュウ酸銀は熱安定性が高まるが、置換量が20モル%を超えると、これを用いて生成した錯化合物が熱分解しにくくなる場合がある。その他、必要に応じて2種以上の銀化合物を混合して使用することも可能である。
(Silver compounds used in amine complexes)
As a silver compound used to form an amine complex to form silver atoms, it can form complexes with various alkylamines and easily decomposes by heating to produce atomic silver A silver compound is preferably used. Typical examples of such silver compounds include silver carboxylates in which silver atoms are combined with carboxylic acids such as formic acid, acetic acid, oxalic acid, malonic acid, benzoic acid, and phthalic acid, as well as silver chloride, silver nitrate, and silver carbonate. These can be used, and one or two or more of them can be mixed and used. Moreover, as a silver compound, the thing which does not produce the component which remains as an impurity in a reaction system after thermal decomposition is especially preferable. For example, when a fatty acid, which is a carboxylic acid having a long-chain or medium-chain alkyl group, is used, a compound containing an alkyl chain generated by thermal decomposition is incorporated into the protective film, thereby reducing the detachability of the protective film. The tendency to do is seen. From this point of view, silver oxalate is preferably used in which no by-product remains substantially in the reaction system after thermal decomposition. Silver oxalate has a high silver content and is usually easily decomposed at a low temperature of about 200 ° C. In addition, since oxalate ions are removed as carbon dioxide during decomposition, metal silver is obtained, so that impurities hardly remain. Is advantageous. As the silver oxalate used in the method of the present invention, for example, commercially available silver oxalate can be used. Moreover, you may use the silver compound which substituted the oxalate ion of silver oxalate by 1 or more types of 20 mol% or less of carbonate ion, nitrate ion, and oxide ion. In particular, silver oxalate in which 20 mol% or less of the oxalate ions are substituted with carbonate ions has improved thermal stability. However, when the substitution amount exceeds 20 mol%, the complex compound formed using the oxalate ions is thermally decomposed. It may be difficult. In addition, two or more kinds of silver compounds can be mixed and used as necessary.
(アミン錯体に用いられるアルキルアミン)
本発明においてはアルキルアミンとして、アルキル基の一部にアミノ基が結合したアルキルモノアミン、アルキルジアミン等が望ましく使用される。本明細書において、アルキルアミンとは、アルキル基に対して一つのアミノ基が結合したアルキルモノアミン、及び、アルキル基に対して二つのアミノ基が結合したアルキルジアミンを含むものとする。また、両者を区別する場合には、それぞれアルキルモノアミン、アルキルジアミンと記載する。
本発明においては、アルキルアミンとして主にアルキルモノアミンを使用するが、表面処理の目的等に応じて、適宜アルキルジアミンを混合して使用することができる。
(Alkylamine used for amine complex)
In the present invention, alkyl monoamines, alkyl diamines and the like in which an amino group is bonded to a part of the alkyl group are desirably used as the alkyl amine. In this specification, an alkylamine includes an alkyl monoamine in which one amino group is bonded to an alkyl group, and an alkyl diamine in which two amino groups are bonded to an alkyl group. Moreover, when distinguishing both, it describes as alkyl monoamine and alkyldiamine, respectively.
In the present invention, alkyl monoamines are mainly used as alkyl amines, but alkyl diamines can be appropriately mixed and used according to the purpose of surface treatment.
本発明に使用しうるアルキルアミンは、銀原子の表面に対してアミノ基を介した配位結合を形成可能とするために、アミン部分に含まれるアミノ基が、一級アミノ基であるアルキルアミンRNH2又は二級アミノ基であるアルキルアミンR1R2NHであることが好ましい。本明細書において、上記R、R1及びR2は、互いに独立して炭化水素基を示すが、これらの炭化水素基は酸素原子、窒素原子、硫黄原子又は珪素原子等のヘテロ原子を含んでいてもよい。一級又は二級のアミノ基を含むことにより、アミノ基中の窒素原子が有する非共有電子対により金属原子に配位結合を生じることで、アミン部分と金属化合物の錯化合物が形成可能であり、これにより銀原子の表面に対してアルキルアミンの被膜を形成することができる。 The alkylamine that can be used in the present invention is capable of forming a coordination bond via an amino group to the surface of a silver atom, so that the amino group contained in the amine moiety is a primary amino group. a is preferably an alkyl amine R 1 R 2 NH 2 or secondary amino group. In the present specification, R, R 1 and R 2 each independently represent a hydrocarbon group, and these hydrocarbon groups contain a hetero atom such as an oxygen atom, a nitrogen atom, a sulfur atom or a silicon atom. May be. By including a primary or secondary amino group, a complex bond between the amine moiety and the metal compound can be formed by generating a coordinate bond to the metal atom by the unshared electron pair of the nitrogen atom in the amino group, As a result, an alkylamine film can be formed on the surface of silver atoms.
上記のように、本発明においてアルキルアミンは銀を含む化合物の熱分解を容易にすると共に、熱分解によって生成する銀の原子層や銀微粒子の表面保護被膜として機能するものである。このため、銀を含む化合物の熱分解の際に反応系内に安定して存在すると共に、保護被膜として生成した銀の原子層に被着した際に望ましい特性を示すアルキルアミンを適宜選択して使用することが望ましい。アルキルアミン等においては、一般にアルキル基の分子量が大きくなり長鎖になるに従い蒸気圧が低下して沸点が上昇する傾向が見られる。一方、アルキル基の分子量が小さく短鎖であるものは蒸気圧が高いとともに、極性が強くなる傾向が見られる。また、一分子内に二つのアミノ基を有するアルキルジアミンでは、一分子内に一つのアミノ基を有するアルキルモノアミンより極性が強くなる傾向が見られる。本発明によれば、これら任意のアルキルアミンを使用することができるが、そのアルキル基に含まれる炭素数が2〜5のものを短鎖、炭素数が6〜12のものを中鎖、炭素数が13以上のものを長鎖と定義し、それらの特徴について以下に説明する。 As described above, in the present invention, an alkylamine facilitates thermal decomposition of a compound containing silver and functions as a surface protective film for silver atomic layers and silver fine particles generated by thermal decomposition. For this reason, an alkylamine that is stably present in the reaction system during thermal decomposition of a compound containing silver and that exhibits desirable characteristics when deposited on a silver atomic layer produced as a protective coating is appropriately selected. It is desirable to use it. In alkylamines and the like, generally, as the molecular weight of an alkyl group increases and becomes a long chain, the vapor pressure tends to decrease and the boiling point tends to increase. On the other hand, when the alkyl group has a small molecular weight and a short chain, the vapor pressure is high and the polarity tends to be strong. In addition, alkyldiamines having two amino groups in one molecule tend to be more polar than alkylmonoamines having one amino group in one molecule. According to the present invention, these arbitrary alkylamines can be used, and those alkyl groups containing 2 to 5 carbon atoms are short chain, those having 6 to 12 carbon atoms are medium chain, carbon Those having a number of 13 or more are defined as long chains, and their characteristics will be described below.
長鎖・中鎖のアルキルモノアミンは一般に蒸気圧が低く蒸発を生じ難いと共に、有機溶媒と親和性が高いために、これらのアルキルモノアミンや、これらを含有成分とするアミン混合物を使用することで、表面処理によって生成する銀の原子層の表面に所定の割合で長鎖・中鎖のアルキルモノアミンが含まれた被膜が生成することとなり、保存性が向上すると共に、無極性の有機溶媒中への分散性を向上することができる。この点で、例えば、本発明により表面処理された銅微粉末を適宜の有機溶媒に分散させてインク等として使用する場合には、使用するアルキルアミンに長鎖・中鎖のアルキルモノアミンが含まれることが望ましい。 Long- and medium-chain alkyl monoamines generally have low vapor pressures and are unlikely to evaporate, and because they have a high affinity with organic solvents, these alkyl monoamines and amine mixtures containing them can be used. A film containing a long-chain / medium-chain alkyl monoamine at a predetermined ratio on the surface of the silver atomic layer generated by the surface treatment will be generated, and the storage stability will be improved and the coating into a nonpolar organic solvent will be achieved. Dispersibility can be improved. In this regard, for example, when the copper fine powder surface-treated according to the present invention is dispersed in an appropriate organic solvent and used as an ink or the like, the alkylamine used includes a long-chain / medium-chain alkyl monoamine. It is desirable.
このような長鎖・中鎖のアルキルモノアミンとしては、例えば、ジプロピルアミン(107℃)、ジブチルアミン(159℃)、ヘキシルアミン(131℃)、シクロヘキシルアミン(134℃)、ヘプチルアミン(155℃)、3−ブトキシプロピルアミン(170℃)、オクチルアミン(176℃)、ノニルアミン(201℃)、デシルアミン(217℃)、3−アミノプロピルトリエトキシシラン(217℃)、ドデシルアミン(248℃)、ヘキサデシルアミン(330℃)、オレイルアミン(349℃)、オクタデシルアミン(232℃(32mmHgで))等のアルキルモノアミンは入手が容易な点で実用的であるが、これに限定されることはなく、炭素数が6以上の他の長鎖・中鎖のアルキルモノアミンについても、適宜、目的に応じて使用することができる。 Examples of such long and medium chain alkyl monoamines include dipropylamine (107 ° C), dibutylamine (159 ° C), hexylamine (131 ° C), cyclohexylamine (134 ° C), heptylamine (155 ° C). ), 3-butoxypropylamine (170 ° C), octylamine (176 ° C), nonylamine (201 ° C), decylamine (217 ° C), 3-aminopropyltriethoxysilane (217 ° C), dodecylamine (248 ° C), Alkylmonoamines such as hexadecylamine (330 ° C), oleylamine (349 ° C), octadecylamine (232 ° C (at 32 mmHg)) are practical in terms of easy availability, but are not limited thereto. For other long and medium chain alkyl monoamines having 6 or more carbon atoms, It can be used depending on.
一方、一般に、アルキルモノアミンのアルキル鎖が長くなるに従い、銀化合物との間での錯化合物を形成する傾向の低下が見られ、一般に長鎖・中鎖のアルキルモノアミンを単に銀化合物と混合することによっては錯化合物の生成が困難となる。 On the other hand, generally, as the alkyl chain of the alkyl monoamine becomes longer, the tendency of forming a complex compound with the silver compound decreases. Generally, long- and medium-chain alkyl monoamines are simply mixed with the silver compound. In some cases, it is difficult to form a complex compound.
これに対し、アルキルジアミンや炭素数が5以下の短鎖のアルキルモノアミンを用いた場合には、銀化合物との間での錯化合物を比較的容易に形成することが可能である。このため、アミン錯体の分解により銀原子を生成する場合に、アルキルアミンとしてこのようなアルキルジアミンや炭素数が5以下の短鎖のアルキルモノアミンを用いることも有効である。一方、特に炭素数が5以下の短鎖のアルキルモノアミンは高い蒸気圧を有するため、アミン錯体を加熱して銀化合物を分解させる際の蒸発が問題となる。また、アルキルジアミンを多く使用した際には、銀の表面に生成する保護皮膜が焼結時などに脱離しにくくなる傾向が見られる。これは、アルキルジアミンが二つのアミノ基を含むことに起因して、保護被膜の構造が複雑になるためと推察される。
以上のような各種のアルキルアミンの特性を考慮して、銀原子の生成時の安定性と良好な保護皮膜の形成が期待される長鎖・中鎖のアルキルモノアミンを主成分として、アルキルジアミンや炭素数が5以下の短鎖のアルキルモノアミンを主に錯化合物の生成のための補助助剤として所定の割合で混合して用いることにより、両者の長所を生かすことが可能となる。つまり、両者を適宜の割合で混合したアルキルアミンを含む混合物を用いることで、銀化合物との錯化合物を良好に形成し、且つ、良好な表面処理が可能になると共に、表面処理後の金属銅に望ましい融着性を付与することが可能となる。
On the other hand, when an alkyl diamine or a short-chain alkyl monoamine having 5 or less carbon atoms is used, a complex compound with a silver compound can be formed relatively easily. For this reason, when producing | generating a silver atom by decomposition | disassembly of an amine complex, it is also effective to use such an alkyldiamine and a short-chain alkylmonoamine with 5 or less carbon atoms as an alkylamine. On the other hand, short-chain alkyl monoamines having 5 or less carbon atoms have a high vapor pressure. Therefore, evaporation when heating the amine complex to decompose the silver compound becomes a problem. Further, when a large amount of alkyldiamine is used, the protective film formed on the silver surface tends to be difficult to be detached during sintering. This is presumably because the structure of the protective coating is complicated due to the fact that the alkyldiamine contains two amino groups.
Considering the characteristics of various alkylamines as described above, the main components are long- and medium-chain alkyl monoamines, which are expected to be stable when silver atoms are formed and to form a good protective film. By using a short-chain alkyl monoamine having 5 or less carbon atoms in a predetermined ratio mainly as an auxiliary aid for the formation of the complex compound, the advantages of both can be utilized. That is, by using a mixture containing an alkylamine in which both are mixed at an appropriate ratio, a complex compound with a silver compound can be formed well, and a good surface treatment can be performed, and the metallic copper after the surface treatment can be obtained. It is possible to impart desirable fusing properties to the film.
上記の短鎖のアルキルモノアミンとしては、アミルアミン(沸点104℃)、2−エトキシエチルアミン(105℃)、4−メトキシブチルアミン、ジイソプロピルアミン(84℃)、ブチルアミン(78℃)、ジエチルアミン(55℃)、プロピルアミン(48℃)、イソプロピルアミン(34℃)、エチルアミン(17℃)、ジメチルアミン(7℃)等が工業的に入手可能であり、望ましく使用される。 Examples of the short-chain alkyl monoamine include amylamine (boiling point 104 ° C.), 2-ethoxyethylamine (105 ° C.), 4-methoxybutylamine, diisopropylamine (84 ° C.), butylamine (78 ° C.), diethylamine (55 ° C.), Propylamine (48 ° C.), isopropylamine (34 ° C.), ethylamine (17 ° C.), dimethylamine (7 ° C.) and the like are commercially available and are desirably used.
アルキルジアミンとしては、前記錯化合物の熱分解温度を考慮すれば100℃以上の沸点であること、また、表面処理後の金属銅の低温での融着性や焼結性を考慮すれば、250℃以下の沸点であることが考慮される。例えば、エチレンジアミン(118℃)、N,N−ジメチルエチレンジアミン(105℃)、N,N’−ジメチルエチレンジアミン(119℃)、N,N-ジエチルエチレンジアミン(146℃)、N,N’−ジエチルエチレンジアミン(153℃)、1,3−プロパンジアミン(140℃)、2,2-ジメチル−1,3−プロパンジアミン(153℃)、N,N−ジメチル−1,3−ジアミノプロパン(136℃)、N,N’−ジメチル−1,3−ジアミノプロパン(145℃)、N,N−ジエチル−1,3−ジアミノプロパン(171℃)、1,4−ジアミノブタン(159℃)、1,5−ジアミノ−2−メチルペンタン(193℃)、1,6−ジアミノヘキサン(204℃)、N,N’−ジメチル−1,6−ジアミノヘキサン(228℃)、1,7−ジアミノヘプタン(224℃)、1,8−ジアミノオクタン(225℃)等が挙げられるが、これらに限定されるものではない。 The alkyl diamine has a boiling point of 100 ° C. or higher if the thermal decomposition temperature of the complex compound is taken into consideration, and 250% if the fusion or sinterability of the metallic copper after the surface treatment is taken into consideration at a low temperature. It is considered that the boiling point is not higher than ° C. For example, ethylenediamine (118 ° C), N, N-dimethylethylenediamine (105 ° C), N, N'-dimethylethylenediamine (119 ° C), N, N-diethylethylenediamine (146 ° C), N, N'-diethylethylenediamine ( 153 ° C.), 1,3-propanediamine (140 ° C.), 2,2-dimethyl-1,3-propanediamine (153 ° C.), N, N-dimethyl-1,3-diaminopropane (136 ° C.), N , N′-dimethyl-1,3-diaminopropane (145 ° C.), N, N-diethyl-1,3-diaminopropane (171 ° C.), 1,4-diaminobutane (159 ° C.), 1,5-diamino 2-methylpentane (193 ° C.), 1,6-diaminohexane (204 ° C.), N, N′-dimethyl-1,6-diaminohexane (228 ° C.) , 1,7-diaminoheptane (224 ° C.), 1,8-but-diamino octane (225 ° C.), and the like, but is not limited thereto.
(その他の錯化合物の生成補助剤)
上記のように、一般に銀化合物との錯化合物に長鎖・中鎖のアルキルモノアミンを含むことにより、銀化合物の良好な熱分解を生じることが可能となると共に、これにより生成する銀の原子層表面に良好な保護皮膜を形成することが可能である。その一方で、長鎖・中鎖のアルキルモノアミンのみによっては銀化合物との錯化合物が生成し難いため、上記のように錯化合物の生成補助剤としてアルキルジアミンや炭素数が5以下の短鎖のアルキルモノアミンを用いることが有効である。このような錯化合物の生成補助剤に加えて、銀化合物とアルキルアミンの錯化合物を生成する際に、一定程度以上の極性を示すアルコール化合物、及び/又は分子内に炭素原子とヘテロ原子との多重結合や、ヘテロ原子同士の多重結合を含む化合物を介在させることにより、銀化合物とアルキルアミンの錯化合物の生成を円滑に行うことが明らかにされている。このような添加成分の示す具体的な作用は必ずしも明らかではないが、固体状態の銀化合物においては当該銀化合物である銀を含む分子やイオン等が結晶等を形成して凝集し、特に長鎖・中鎖のアルキルアミン等による銀原子への配位が良好に進まないのに対して、当該化合物がアルキルアミンと混合されて存在する場合には、アルキルアミン等による銀化合物への配位結合が進展し効率的に錯化合物が生成すると考えられる。このような効果は、当該化合物が銀化合物の結晶等を効率的に解砕し、アルキルアミン等が銀化合物に接触する頻度が高まるためと考えられる。また、このような効果を更に高めるために、当該添加成分からなる化合物は、アルキルアミンとの相溶性に優れた溶媒であることが好ましい。
(Additional aid for other complex compounds)
As described above, the inclusion of a long-chain / medium-chain alkyl monoamine in a complex compound with a silver compound generally makes it possible to cause good thermal decomposition of the silver compound, and the atomic layer of silver produced thereby It is possible to form a good protective film on the surface. On the other hand, since it is difficult to form a complex compound with a silver compound only by a long chain / medium chain alkyl monoamine, alkyldiamine or a short chain having 5 or less carbon atoms as a complex compound formation aid as described above. It is effective to use an alkyl monoamine. In addition to such complex compound formation aids, when forming a complex compound of a silver compound and an alkylamine, an alcohol compound having a certain degree of polarity and / or carbon atoms and heteroatoms in the molecule. It has been clarified that the formation of a complex compound of a silver compound and an alkylamine is facilitated by interposing a compound containing multiple bonds or multiple bonds of heteroatoms. The specific action of such an additive component is not necessarily clear, but in a silver compound in a solid state, molecules or ions containing silver as the silver compound aggregate to form crystals and the like.・ Coordination to silver atoms by medium-chain alkylamines, etc. does not proceed well, but when the compound is mixed with alkylamines, coordination bonds to silver compounds by alkylamines, etc. It is considered that complex compounds are formed efficiently. Such an effect is considered to be due to the fact that the compound efficiently disintegrates crystals of the silver compound and the like, and the frequency with which the alkylamine or the like contacts the silver compound is increased. In order to further enhance such effects, the compound comprising the additive component is preferably a solvent having excellent compatibility with the alkylamine.
上記一定程度以上の極性を示すアルコール化合物としては、典型的には水に対する溶解度を示すアルコール化合物であって、1個のOH基を有する直鎖のアルキルアルコールとして、炭素数1のメタノールから、炭素数8のオクタノールが挙げられる。一方、炭素数が9以上になると水に対して実質的に溶解せず、このようなアルコール化合物を錯化合物の形成の際に介在させても、錯化合物の形成促進作用が観察されない。また、アルキルアルコールの他に、フェノールや、分子内にエーテル結合を有する適宜の炭化水素の水素原子をOH基で置換したもの等を用いることができる。 The alcohol compound having a certain degree of polarity or more is typically an alcohol compound exhibiting solubility in water, and as a linear alkyl alcohol having one OH group, from methanol having 1 carbon atom to carbon The octanol of number 8 is mentioned. On the other hand, when the number of carbon atoms is 9 or more, it does not substantially dissolve in water, and even if such an alcohol compound is interposed during the formation of the complex compound, the formation promoting effect of the complex compound is not observed. In addition to alkyl alcohols, phenols or those obtained by substituting hydrogen atoms of appropriate hydrocarbons having an ether bond in the molecule with OH groups can be used.
アルコール化合物においては、一分子内に含まれるOH基の数が増加するに伴って強い極性が発現し、本発明においても2個のOH基を含むグリコール類や、3個のOH基を含むグリセリン、4個のOH基を含むペンタエリトリトール等が好ましく使用される。
このようなアルコール化合物としては、メタノール、エタノール、プロパノール、ブタノール、ペンタノール、ヘキサノール、ヘプタノール、オクタノール、アリルアルコール、ベンジルアルコール、ピナコール、プロピレングリコール、メントール、カテコール、ヒドロキノン、サリチルアルコール、ペンタエリトリトール、スクロース、グルコース、キシリトール、メトキシエタノール、トリエチレングリコールモノメチルエーテル、ペンタエリトリトール等、及び、エチレングリコール、トリエチレングリコール、テトラエチレングリコール、ペンタエチレングリコールを含むポリエチレングリコール類が挙げられる。
In an alcohol compound, strong polarity develops as the number of OH groups contained in one molecule increases, and in the present invention, glycols containing two OH groups and glycerin containing three OH groups are also present. Pentaerythritol containing 4 OH groups is preferably used.
Examples of such alcohol compounds include methanol, ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, allyl alcohol, benzyl alcohol, pinacol, propylene glycol, menthol, catechol, hydroquinone, salicyl alcohol, pentaerythritol, sucrose, Examples thereof include glucose, xylitol, methoxyethanol, triethylene glycol monomethyl ether, pentaerythritol, and the like, and polyethylene glycols including ethylene glycol, triethylene glycol, tetraethylene glycol, and pentaethylene glycol.
錯化合物を生成する際のアルコール化合物の使用量は、錯化合物の生成の際に用いるアルキルアミンに対して5モル%〜500モル%程度とすることが好ましい。アルコール化合物の使用量がアルキルアミンに対してモル比で5モル%以下になると、錯化合物の生成促進作用が十分でなくなる傾向が見られる。一方、アルコール化合物の使用量がアルキルアミンに対してモル比で500モル%以上になると、アルキルアミンの活性が低下して錯化合物の生成が阻害される傾向が見られる。 The amount of the alcohol compound used when forming the complex compound is preferably about 5 mol% to 500 mol% with respect to the alkylamine used when generating the complex compound. When the amount of the alcohol compound used is 5 mol% or less with respect to the alkylamine, there is a tendency that the complex compound formation promoting action is not sufficient. On the other hand, when the amount of the alcohol compound used is 500 mol% or more with respect to the alkylamine, the activity of the alkylamine tends to be reduced and the formation of the complex compound tends to be inhibited.
特に、アルコール化合物の使用量をアルキルアミンに対して10モル%〜300モル%程度とすることで、錯化合物の生成が良好に促進されると共に、良好な錯化合物を生成することが可能となる。また、この範囲の割合においてアルコール化合物の割合が増加すると、一般に錯化合物の生成時間が短縮すると共に、錯化合物に含まれるアルコール化合物の割合が増加するために、錯化合物の熱分解により生じる被覆銀微粒子の粒径が拡大すると共に、生じた被覆銀微粒子の極性溶媒への分散性を向上することができる。一方、アルコール化合物の割合を減少させることで、錯化合物や被覆銀微粒子の被覆に含まれるアルコール化合物が減少し、微細で緻密な被覆を有する被覆銀微粒子が得られる傾向が見られる。 In particular, when the amount of the alcohol compound used is about 10 mol% to 300 mol% with respect to the alkylamine, the formation of the complex compound is favorably promoted and a good complex compound can be produced. . Further, when the proportion of the alcohol compound is increased within this range, the formation time of the complex compound is generally shortened, and the proportion of the alcohol compound contained in the complex compound is increased, so that the coated silver generated by the thermal decomposition of the complex compound. As the particle diameter of the fine particles increases, the dispersibility of the resulting coated silver fine particles in a polar solvent can be improved. On the other hand, by decreasing the proportion of the alcohol compound, the alcohol compound contained in the complex compound or the coating of the coated silver fine particles is decreased, and a tendency to obtain coated silver fine particles having a fine and dense coating is observed.
最も典型的には、アルコール化合物の量をアルキルアミンに対して25モル%〜100モル%程度とすることが好ましいが、具体的に使用するアルコール化合物の種類や使用割合は、製造する被覆銀微粒子に求められる特性等に応じて、適宜調整がされることが好ましい。
また、銀化合物とアルキルアミンとの錯化合物の生成を促進させる補助剤として、アルコール化合物の他に分子内に炭素原子とヘテロ原子との多重結合や、ヘテロ原子同士の多重結合を含む化合物がある。このような化合物においては、多重結合をなすヘテロ原子に属する結合に係る電子の分布が多重結合により偏った状態となり、当該ヘテロ原子が持つ非共有電子対が露出する傾向にあるため、当該非共有電子対が関係する反応についての活性が向上する傾向にあることが知られている。上記所定の多重結合を有する化合物を銀化合物とアルキルアミンの錯化合物を生成する際に介在させることで、当該錯化合物の生成が促進される具体的理由は明らかでないが、当該化合物が上記のように活性な非共有電子対を有するヘテロ原子を含むことが、錯化合物の生成が促進されることに関係するものと推察される。
Most typically, the amount of the alcohol compound is preferably about 25 mol% to 100 mol% with respect to the alkylamine, but the type and proportion of the alcohol compound to be specifically used are the coated silver fine particles to be produced. It is preferable to adjust appropriately according to the characteristics required for the above.
In addition to alcohol compounds, auxiliary agents that promote the formation of complex compounds of silver compounds and alkylamines include compounds that contain multiple bonds of carbon atoms and heteroatoms in the molecule or multiple bonds of heteroatoms. . In such compounds, the distribution of electrons related to the bonds belonging to the heteroatoms that form multiple bonds is biased by the multiple bonds, and the unshared electron pairs of the heteroatoms tend to be exposed. It is known that activity for reactions involving electron pairs tends to improve. Although the specific reason why the formation of the complex compound is promoted by interposing the compound having the predetermined multiple bond in forming the complex compound of the silver compound and the alkylamine is not clear, the compound is as described above. It is presumed that the inclusion of a hetero atom having an active unshared electron pair is related to the promotion of the formation of a complex compound.
当該目的のために使用される化合物としては、より具体的には、炭素と酸素の二重結合を含むカルボニル化合物やイソシアナート化合物、炭素と窒素の多重結合を含むオキシム化合物、シッフ塩基化合物やニトリル化合物、酸素と窒素の多重結合を含むニトロ化合物やニトロソ化合物、及び、窒素原子同士の多重結合を含むアゾ化合物、ジアゾ化合物、アジ化物等が例示される。また、ヘテロ原子としての硫黄、リン等が関係する多重結合を含む化合物によっても銀化合物とアルキルアミンの錯化合物を促進することができる。但し、例えば導電性の配線を形成するために使用される銀微粒子の製造においては、当該硫黄原子やリン原子が残留して悪影響を生じる傾向が見られるため、製造される銀微粒子の用途等に応じて使用が検討されることが望ましい。 More specifically, the compounds used for this purpose include carbonyl compounds and isocyanate compounds containing carbon and oxygen double bonds, oxime compounds containing multiple bonds of carbon and nitrogen, Schiff base compounds and nitriles. Examples include compounds, nitro compounds and nitroso compounds containing multiple bonds of oxygen and nitrogen, and azo compounds, diazo compounds and azides containing multiple bonds of nitrogen atoms. A complex compound of a silver compound and an alkylamine can also be promoted by a compound containing a multiple bond related to sulfur, phosphorus or the like as a hetero atom. However, for example, in the production of silver fine particles used to form conductive wiring, since the sulfur atoms and phosphorus atoms tend to be adversely affected, the use of the produced silver fine particles It is desirable to consider use accordingly.
また、当該目的のために使用される化合物について、当該化合物に含まれる炭素の数や、化合物内の各官能基に含まれる炭素の数が大きくなるに従い、錯化合物の生成を促進する作用が低下する傾向が観察される。炭素数が錯化合物の生成を促進する作用に与える影響は化合物の基本構造により変化するが、例えば、含まれる多重結合が一つの化合物においては、概ね化合物に含まれる炭素数が14を超える場合に錯化合物の生成促進効果が低下する傾向が見られる。一方、化合物に含まれる炭素数が7以下である場合には、一般に顕著な錯化合物の生成促進効果が観察される。 In addition, for compounds used for this purpose, the effect of promoting the formation of complex compounds decreases as the number of carbons contained in the compound and the number of carbons contained in each functional group in the compound increase. The tendency to do is observed. The effect of the number of carbons on the action of promoting the formation of complex compounds varies depending on the basic structure of the compound. For example, in a compound having one multiple bond, the number of carbons contained in the compound generally exceeds 14. There is a tendency for the effect of promoting the formation of complex compounds to decrease. On the other hand, when the number of carbon atoms contained in the compound is 7 or less, generally a remarkable effect of promoting the formation of complex compounds is observed.
本発明で銀化合物とアルキルアミンの錯化合物の生成の際に介在させて用いられる化合物としてのカルボニル化合物の一例として、ケトン類化合物を挙げることができ、その非限定的な例として、アセトン、メチルエチルケトン、アセチルアセトン、2−ブタノン、3−ペンタノン、4−ヘプタノン、4−メチル−3−ペンテン−2−オン(メシチルオキシド)、4−メチル−2−ペンタノン、ジアセチル、ピナコリン、2,4−ジメチルペンタノン、2,6−ジメチルー3−ヘプタノン、イソアミルメチルケトン、3−メチル−2−ブタノン、5−メチル-―ヘプタノン、4-メチル−2−ペンタノン、エチニルイソプロピルケトン、2−オクタノン、等の脂肪族ケトン、シクロペンタノン、シクロヘキサノン、2−シクロヘキセノン、イソホロン、ジシクロヘキシルケトン、等の脂環式ケトン、並びにアセトフェノン、ベンゾフェノン、4−フェニル−2−ブタノン、イソブチロフェノン、ベンザルアセトン、プロピオフェノン等の芳香族ケトンが挙げられる。 As an example of a carbonyl compound as a compound used in the formation of a complex compound of a silver compound and an alkylamine in the present invention, a ketone compound can be mentioned, and non-limiting examples thereof include acetone, methyl ethyl ketone. Acetylacetone, 2-butanone, 3-pentanone, 4-heptanone, 4-methyl-3-penten-2-one (mesityl oxide), 4-methyl-2-pentanone, diacetyl, pinacholine, 2,4-dimethylpenta Non, aliphatic such as 2,6-dimethyl-3-heptanone, isoamyl methyl ketone, 3-methyl-2-butanone, 5-methyl-heptanone, 4-methyl-2-pentanone, ethynyl isopropyl ketone, 2-octanone, etc. Ketone, cyclopentanone, cyclohexanone, 2-cyclohexenone, iso Ron, dicyclohexyl ketone, alicyclic ketones etc., as well as acetophenone, benzophenone, 4-phenyl-2-butanone, isobutyrophenone phenone, benzalacetone, aromatic ketones such as propiophenone.
さらに、ケトン類化合物としては、メチルアセトアセテート、エチルアセトアセテート、アセチル琥珀酸ジメチル、α−アセチル−γ−ブチロラクトン、アセト酢酸、ピルビン酸メチル、ピルビン酸、N,N−ジメチルアセトアセトアミド、アセトアセトアニリド、N−アセトアセチルモルホリン等の酸素原子を含むケト酸化合物を挙げることができる。
また、本発明で錯化合物の生成の際に用いられるカルボニル化合物の一例として、カルボニル炭素に一つの水素原子が結合したアルデヒド類化合物を挙げることができ、その非限定的な例として、プロピオンアルデヒド、n−ブチルアルデヒド、イソブチルアルデヒド、n−ペンチルアルデヒド、2−メチルブチルアルデヒド、n−ヘキシルアルデヒド、2−メチルペンタナール、n−ヘプチルアルデヒド、2−ヘキセナール、n−オクチルアルデヒド、ベンズアルデヒド、クミンアルデヒド、アニスアルデヒド、クロロベンズアルデヒド、シンナムアルデヒド、クロトンアルデヒド、イソブチルアルデヒド、ブチルアルデヒド、ピルビンアルデヒド、テレフタルアルデヒド、トルアルデヒド、エチニルフェニルケトン、フルフラール又はこれらの任意の2種以上の混合物などが挙げられるが、特に好ましいアルデヒド類化合物は、炭素原子数が3〜14の脂肪族又は芳香族アルデヒドであり、さらに好ましくは、炭素原子数が3〜7の脂肪族アルデヒドである。
Further, as ketone compounds, methyl acetoacetate, ethyl acetoacetate, dimethyl acetylsuccinate, α-acetyl-γ-butyrolactone, acetoacetate, methyl pyruvate, pyruvate, N, N-dimethylacetoacetamide, acetoacetanilide, Examples thereof include keto acid compounds containing an oxygen atom such as N-acetoacetylmorpholine.
In addition, as an example of the carbonyl compound used in the formation of the complex compound in the present invention, an aldehyde compound in which one hydrogen atom is bonded to the carbonyl carbon can be given, and non-limiting examples thereof include propionaldehyde, n-butyraldehyde, isobutyraldehyde, n-pentylaldehyde, 2-methylbutyraldehyde, n-hexylaldehyde, 2-methylpentanal, n-heptylaldehyde, 2-hexenal, n-octylaldehyde, benzaldehyde, cuminaldehyde, anise Aldehyde, chlorobenzaldehyde, cinnamaldehyde, crotonaldehyde, isobutyraldehyde, butyraldehyde, pyrubinaldehyde, terephthalaldehyde, tolualdehyde, ethynyl phenyl ketone, furfural Among these, a particularly preferable aldehyde compound is an aliphatic or aromatic aldehyde having 3 to 14 carbon atoms, and more preferably 3 to 7 carbon atoms. Is an aliphatic aldehyde.
その他、エステル類化合物、アミド類化合物、カルボン酸アミド類化合物、イソシアネート化合物(R−N=C=O)、オキシム化合物は(>C=N−OH)、ニトリル化合物、アゾ化合物、ジアゾ化合物及びアジ化物等も挙げることができる。これらの具体的な態様は、特開2014−31542号公報又は特開2014−40630号公報に記載されており、参照により本願明細書に組み込まれるものとする。 In addition, ester compounds, amide compounds, carboxylic acid amide compounds, isocyanate compounds (R—N═C═O), oxime compounds (> C═N—OH), nitrile compounds, azo compounds, diazo compounds and azides A compound etc. can also be mentioned. These specific modes are described in JP 2014-31542 A or JP 2014-40630 A, and are incorporated herein by reference.
上記説明したようなアルコール化合物や所定の多重結合を含む化合物は、使用するアルキルアミンの種類や、製造される銅銀複合体に期待される特性等に応じて適宜選択して用いることができる。また、複数種の化合物を組み合わせて用いることができ、錯体生成の反応時間のみならず、アルキルアミンの種類とともに銀の収率や表面処理された金属銅に期待される特性を考慮した組み合わせを行うことも可能である。
特に、錯化合物の生成を補助する化合物は、生成する錯化合物や、それを熱分解することで生成する銀の原子層の被覆部分にも含まれため、本発明において各種の化合物を適宜に選択して用いることにより、表面処理がされる金属銅に対して各種の機能を付加することも可能である。このため、短鎖のアルキルアミンやアルキルジアミンが存在する場合においても、錯化合物の生成補助と共に、表面処理がされる金属銅に所定の特徴を付与する手段として当該化合物を介在させることができる。
The alcohol compound and the compound containing a predetermined multiple bond as described above can be appropriately selected and used according to the type of alkylamine used, the properties expected of the copper-silver composite to be produced, and the like. In addition, it is possible to use a combination of a plurality of types of compounds. In addition to the reaction time for complex formation, the combination of the types of alkylamines and the characteristics expected of silver copper and surface-treated metallic copper are considered. It is also possible.
In particular, compounds that assist in the formation of complex compounds are also included in the complex compounds that are produced and in the covering portion of the silver atomic layer that is produced by thermally decomposing them, so various compounds are appropriately selected in the present invention. By using these, various functions can be added to the metal copper to be surface-treated. For this reason, even when a short-chain alkylamine or alkyldiamine is present, the compound can be interposed as a means for imparting a predetermined characteristic to the metal copper to be surface-treated, together with the aid of the formation of the complex compound.
(アミン錯体の生成工程)
アミン錯体の生成は、一般的には粉状の銀化合物に対して所定量のアルキルアミンを混合することで行う。この際に、上記説明したアミン錯体の生成を補助する所定の化合物や少量の水をアミン錯体の生成補助剤として介在させることにより、アミン錯体の生成を促進させることが有効である。アミン錯体の生成補助剤を反応系に介在させる手法としては、予め調製したアルキルアミンとアミン錯体の生成補助剤の混合物に銀化合物を加えてもよく、また、主にアミン錯体の生成補助剤を銀化合物と混合して銀化合物を解砕等した後にアルキルアミンを加えてアミン錯体とするなど、適宜の手法を用いることができる。
(Amine complex formation process)
In general, the amine complex is formed by mixing a predetermined amount of an alkylamine with a powdery silver compound. At this time, it is effective to promote the formation of the amine complex by interposing a predetermined compound for assisting the formation of the amine complex described above and a small amount of water as an auxiliary agent for the formation of the amine complex. As a method of interposing an amine complex formation aid in the reaction system, a silver compound may be added to a mixture of an alkylamine and an amine complex formation aid prepared in advance, and an amine complex formation aid is mainly used. An appropriate method can be used such as mixing with a silver compound and crushing the silver compound and then adding an alkylamine to form an amine complex.
アミン錯体の生成過程は、例えば、銀化合物の結晶等が解砕すると共に、生成する錯化合物が一般にその構成成分に応じた色を呈することを利用して、反応による混合物の色の変化の終了を適宜の分光法等により検出することにより、アミン錯体の生成反応の終点を検知することができる。また、以下の実施例で主に使用するシュウ酸銀が形成する錯化合物は一般に無色(白色)であるが、この場合でも混合液の粘性が変化するなどの形態変化に基づいて錯化合物の生成状態を検知することができる。 The formation process of the amine complex is, for example, by utilizing the fact that the crystal of the silver compound etc. is crushed and the generated complex compound generally exhibits a color corresponding to its constituent components, thereby completing the color change of the mixture by the reaction. Can be detected by an appropriate spectroscopic method or the like to detect the end point of the amine complex formation reaction. In addition, the complex compound formed by silver oxalate, which is mainly used in the following examples, is generally colorless (white), but even in this case, the formation of the complex compound is based on the change in form such as the viscosity of the mixed solution is changed. The state can be detected.
本発明においては、アミン錯体の熱分解の加熱を行う前に、必ずしもアミン錯体の生成が完了する必要はなく、アミン錯体の生成過程においても適宜加熱を行うことで、アミン錯体の生成を促進することができる。アミン錯体の生成は、銀化合物の分解反応の発生やアルキルアミンやアミン錯体の生成補助剤の蒸発を抑制可能な温度範囲で行うことが好ましい。典型的には、室温付近での撹拌により錯化合物の生成が可能であるが、錯化合物の生成促進の点で、銀化合物の分解反応の発生等を生じない範囲で加熱することも可能である。また、銀化合物に対するアミンの配位反応は発熱を伴うため、銀化合物の分解反応等を抑制するために必要に応じて室温以下に冷却して撹拌を行うことも好ましい。 In the present invention, it is not always necessary to complete the generation of the amine complex before heating for thermal decomposition of the amine complex, and the generation of the amine complex is promoted by appropriately heating in the process of forming the amine complex. be able to. The generation of the amine complex is preferably performed in a temperature range in which the generation of the decomposition reaction of the silver compound and the evaporation of the alkylamine and the amine complex generation auxiliary agent can be suppressed. Typically, the complex compound can be produced by stirring at around room temperature, but it is also possible to heat the complex compound in a range that does not cause the decomposition reaction of the silver compound in terms of promoting the formation of the complex compound. . Moreover, since the coordination reaction of the amine with respect to the silver compound is accompanied by heat generation, it is also preferable to carry out stirring while cooling to room temperature or lower as necessary in order to suppress the decomposition reaction of the silver compound.
銀化合物とアルキルアミンの錯化合物の生成において、使用するアルキルアミンの総量は銀化合物に含まれる銀原子の化学量論量(等モル)以上とすることが望ましい。アルキルアミンの総量が銀原子との化学量論量以下の量であると、錯化合物とならない銀化合物が生じるため、その後の銀微粒子の生成の際にその肥大化が生じたり、熱分解せずに残留する銀化合物が発生するために好ましくない。典型的には、錯化合物の生成の際に銀原子の2倍モル量以上のアルキルアミンを混合することで、均一な粒径の銀微粒子を安定して得ることができる。また、銀化合物と錯化合物を形成しない過剰分のアルキルアミンは反応系に残留するため、次工程で金属銅の表面処理を行う際の反応媒としてそのまま使用することも可能である。また、生成した錯化合物を過剰分のアルキルアミンと分離して、別の溶媒を反応媒として加えて金属銅の表面処理を行うことも可能である。 In the formation of a complex compound of a silver compound and an alkylamine, it is desirable that the total amount of alkylamine to be used is greater than or equal to the stoichiometric amount (equal mole) of silver atoms contained in the silver compound. If the total amount of alkylamine is less than the stoichiometric amount with the silver atom, a silver compound that does not become a complex compound is generated, so that enlargement or subsequent thermal decomposition does not occur during the formation of silver fine particles. This is not preferable because a silver compound remaining in the substrate is generated. Typically, silver fine particles having a uniform particle diameter can be stably obtained by mixing an alkylamine having a molar amount of 2 times or more of silver atoms when a complex compound is formed. Moreover, since the excess alkylamine which does not form a complex compound with a silver compound remains in a reaction system, it can be used as it is as a reaction medium when performing surface treatment of metallic copper in the next step. It is also possible to separate the produced complex compound from an excess of alkylamine and add another solvent as a reaction medium to perform the surface treatment of metallic copper.
1つの実施形態において、銀化合物としてカルボン酸銀、例えばシュウ酸銀や酢酸銀を用いる場合は、カルボン酸に由来する酸素原子と、アルキルアミンに由来する窒素原子の両方が銀原子に配位結合した銀錯体を形成することができ、本発明に用いる錯化合物として好ましい。銀原子に配位する酸素原子数と窒素原子数の割合は特に限定されないが、銀原子に対して酸素原子数と窒素原子数が2:1の割合で配位している銀錯体が特に好ましい。 In one embodiment, when silver carboxylate such as silver oxalate or silver acetate is used as the silver compound, both the oxygen atom derived from the carboxylic acid and the nitrogen atom derived from the alkylamine are coordinated to the silver atom. It is preferable as a complex compound used in the present invention. The ratio of the number of oxygen atoms and the number of nitrogen atoms coordinated to silver atoms is not particularly limited, but a silver complex in which the number of oxygen atoms and nitrogen atoms is coordinated at a ratio of 2: 1 to silver atoms is particularly preferable. .
使用する錯化合物により、銀原子を生成する反応は相違するが、例えば、銀化合物としてシュウ酸銀を使用した場合には、アルキルアミン中で加熱することで、100℃程度あるいはそれ以下の低温においても炭酸ガスを発生しながら銀原子が生成する。これは、錯化合物の熱分解により原子状の銀が生成すると共に、シュウ酸イオンが炭酸ガスに変化する反応が進展するためである。当該錯化合物の熱分解においては、発生する炭酸ガスにより反応雰囲気が不活性に維持されるため、大気中で錯化合物の熱分解を行って金属銅の表面処理を行う場合においても金属銅の酸化が効果的に抑制され、安定した金属銅の表面処理が可能である。 Depending on the complex compound used, the reaction for generating silver atoms is different. For example, when silver oxalate is used as the silver compound, it is heated at about 100 ° C. or lower by heating in an alkylamine. Silver atoms are generated while generating carbon dioxide. This is because atomic silver is generated by thermal decomposition of the complex compound, and a reaction in which the oxalate ion is changed to carbon dioxide gas progresses. In the thermal decomposition of the complex compound, the reaction atmosphere is maintained inactive by the generated carbon dioxide gas. Therefore, even when the surface treatment of the metallic copper is performed by thermal decomposition of the complex compound in the air, the oxidation of the metallic copper is performed. Is effectively suppressed, and stable surface treatment of metallic copper is possible.
(アミン錯体の加熱分解による銀原子の生成と、金属銅表面への析出工程)
上記により生成した銀化合物とアミン混合物との錯化合物を加熱して、錯化合物に含まれる銀化合物を分解することで銀原子を遊離させ、これらがアルキルアミンの存在下で金属銅の表面と接触することで金属銅の表面に銀の被膜が形成される。金属銅と金属銀の二元系状態図は典型的な共晶型であり、特に200℃以下においてはいずれの相においても他方が固溶する固溶域が存在しないことが知られている。また、本発明の比較例3として示すように、アミン錯体分解法により製造した銀微粒子と銅微粒子とを混合して焼結した場合にも、相互の融着を生じ難く、良好な導電体とならない等からも、固相状態での銅−銀間の親和性が低いことが推察される。それにも関わらず、本発明により金属銅の表面に銀の被膜が密着して生成する機構は明らかでないが、アミン錯体の加熱分解により生成する銀原子においては、そのポテンシャルが金属銀の核生成には必ずしも十分でなく、反応系内に存在する金属銅の表面に準安定な状態で銀原子が析出する状態変化が競合して生じている等の機構が考えられる。これに対して、上記のように銀微粒子と銅微粒子とを混合して焼結した場合には、親和性の低い銅−銀間での原子の移動を生じ難く、融着を生じにくいものと考えられる。
また、本発明で使用するアミン錯体熱分解法による銀原子の生成過程においては、予め生成した単一成分(錯化合物)の熱分解反応により原子状銀が供給されるため、還元剤を用いた複数成分間の化学反応による場合に比べて、各成分の濃度の揺らぎ等に起因した反応のムラを生じ難く、被覆される金属表面に均一な銀の被膜を形成しうるものと推察される。このため、アミン錯体分解法による本発明の方法は、特に反応に関与する複数の成分を均一に混合することが困難な大規模な工業的生産過程においても有利であると考えられる。
(Generation of silver atoms by thermal decomposition of amine complexes and deposition on metallic copper surfaces)
By heating the complex compound of the silver compound and amine mixture produced as described above, the silver compound contained in the complex compound is decomposed to liberate silver atoms, and these come into contact with the surface of metallic copper in the presence of alkylamine. As a result, a silver film is formed on the surface of the metallic copper. The binary phase diagram of metallic copper and metallic silver is a typical eutectic type, and it is known that there is no solid solution region where the other forms a solid solution in any phase particularly at 200 ° C. or lower. Further, as shown as Comparative Example 3 of the present invention, even when silver fine particles and copper fine particles produced by an amine complex decomposition method are mixed and sintered, mutual fusion hardly occurs, and a good conductor and For example, it is presumed that the affinity between copper and silver in the solid phase is low. Nevertheless, although the mechanism by which the silver film is formed in close contact with the surface of the metallic copper according to the present invention is not clear, the potential of the silver atom produced by thermal decomposition of the amine complex is responsible for the nucleation of metallic silver. Is not necessarily sufficient, and a mechanism such as a state change in which silver atoms precipitate in a metastable state on the surface of metallic copper existing in the reaction system may be considered. On the other hand, when silver fine particles and copper fine particles are mixed and sintered as described above, it is difficult to cause movement of atoms between copper and silver having low affinity and hardly cause fusion. Conceivable.
In addition, in the process of generating silver atoms by the amine complex thermal decomposition method used in the present invention, atomic silver is supplied by the thermal decomposition reaction of a single component (complex compound) generated in advance, so a reducing agent was used. Compared to the case of a chemical reaction between a plurality of components, it is presumed that unevenness of the reaction due to fluctuations in the concentration of each component is less likely to occur, and a uniform silver film can be formed on the coated metal surface. For this reason, the method of the present invention by the amine complex decomposition method is considered to be advantageous particularly in a large-scale industrial production process in which it is difficult to uniformly mix a plurality of components involved in the reaction.
アルキルアミンが配位結合することで錯化合物化された銀化合物を、適切な条件下で加熱分解等して原子状の銀を遊離した場合には、当該遊離した原子状銀に対してアルキルアミン分子がアミノ基を介した配位結合を維持するものと推察される。このため、遊離した原子状銀が相互に凝集して凝集体を作る際に、凝集体の周囲にはアミノ基の配位結合により固定されたアルキル鎖が高密度で存在して被膜を形成することで、生成する銀原子が所定の厚さや大きさ以上に成長することが抑制される結果、例えば、銅微粒子の表面で銀のアミン錯体を加熱分解した場合は、銅微粒子をコアとして、その表面に銀のシェルが形成され、さらにその表面がアルキルアミンで被覆された微粒子が生成する。 When a silver compound complexed by coordination of alkylamine is released by thermal decomposition etc. under appropriate conditions to release atomic silver, the alkylamine is released with respect to the released atomic silver. It is inferred that the molecule maintains a coordinate bond via the amino group. For this reason, when free atomic silver aggregates with each other to form an aggregate, an alkyl chain fixed by a coordinate bond of an amino group is present at a high density around the aggregate to form a film. As a result, the generated silver atoms are prevented from growing beyond a predetermined thickness or size.For example, when the silver amine complex is thermally decomposed on the surface of the copper fine particles, A silver shell is formed on the surface, and fine particles whose surface is coated with an alkylamine are formed.
アミン錯体熱分解法により生成した銀原子を金属銅表面に析出させる工程は、上述のように生成したアミン錯体を、アルキルアミンを含む反応媒中で加熱して行うことが望ましい。つまり、銀化合物に対して過剰のアルキルアミンやアルコール化合物等のアミン錯体の生成補助剤を混合しアミン錯体を形成させた後、残留するアルキルアミン等を反応媒として、表面処理を行う金属銅を投入してそのまま加熱しても良く、必要に応じて適宜のアルキルアミン等を更に混合して反応媒とすることも可能である。また、生成したアミン錯体を含む混合物から遠心分離等の方法でアミン錯体を分離した後、適宜のアルキルアミン等を含む反応媒、及び表面処理を行う金属銅と再混合した状態で加熱することで、アミン錯体を形成するアルキルアミン等の一部を他のアルキルアミンに置換して金属銅の表面処理を行うことも可能である。また、表面処理を行う金属銅がアミン錯体を形成する各成分との間で意図しない反応を生じない場合には、アミン錯体を形成するための反応系に金属銅を投入しておき、アミン錯体を形成した後にそのまま加熱して表面処理を行うことも可能である。 The step of precipitating silver atoms generated by the amine complex thermal decomposition method on the surface of the metallic copper is desirably performed by heating the amine complex generated as described above in a reaction medium containing an alkylamine. In other words, after forming an amine complex by mixing an amine complex formation auxiliary agent such as an excess of alkylamine or alcohol compound with respect to the silver compound, the metal copper to be subjected to surface treatment using the remaining alkylamine or the like as a reaction medium. It may be added and heated as it is, and if necessary, an appropriate alkylamine or the like may be further mixed to form a reaction medium. Also, after separating the amine complex from the mixture containing the produced amine complex by a method such as centrifugation, the mixture is heated in a state of being remixed with a reaction medium containing an appropriate alkylamine or the like and metal copper for surface treatment. It is also possible to perform surface treatment of metallic copper by substituting a part of alkylamine or the like forming an amine complex with another alkylamine. In addition, when the copper metal to be surface-treated does not cause an unintended reaction with each component forming the amine complex, the metal copper is put into the reaction system for forming the amine complex, It is also possible to carry out the surface treatment by heating as it is after forming.
アミン錯体を熱分解して原子状の銀を遊離させる際の温度は、使用するアミン錯体の種類により変化するが、一般に当該原子状銀の遊離が開始する温度の直上の温度域で行うことが好ましい。一方、過度の加熱を行った場合には、銀に対するアルキルアミンの配位結合が外れ易くなるために、金属銅表面への銀の析出行程が不安定となり、粗大粒子等が生成しやすくなる点で好ましくない。また、反応媒を成すアルキルアミン等の蒸発が活発になる点からもアミン錯体から原子状銀を遊離させる際の温度は、原子状銀の遊離が生じる範囲内でなるべく低温であることが好ましい。具体的には、70〜150℃の温度範囲、更に典型的には80〜120℃の温度範囲に加熱することで、アミン錯体に含まれる銀化合物を分解させることが好ましい。 The temperature at which the amine complex is thermally decomposed to liberate atomic silver varies depending on the type of amine complex to be used, but in general, it should be performed in the temperature range immediately above the temperature at which the liberation of the atomic silver starts. preferable. On the other hand, when excessive heating is performed, the coordination bond of the alkylamine to the silver is easily released, so that the silver deposition process on the metal copper surface becomes unstable and coarse particles are easily generated. It is not preferable. In view of active evaporation of alkylamine or the like constituting the reaction medium, the temperature at which atomic silver is liberated from the amine complex is preferably as low as possible within the range in which atomic silver is liberated. Specifically, it is preferable to decompose the silver compound contained in the amine complex by heating to a temperature range of 70 to 150 ° C., more typically 80 to 120 ° C.
本発明においては、銀化合物としてカルボン酸銀が好ましく使用され、特にシュウ酸銀・酢酸銀が好ましく用いられる。シュウ酸銀は、通常は200℃程度で分解を生じて、シュウ酸イオンが二酸化炭素として除去されて金属銀が残留する。一方、本発明に係る方法によりアミン錯体とすることによりシュウ酸銀の部分の熱分解温度が低下し、100℃程度の温度において熱分解を生じて金属銀を遊離可能とすることができる。この温度は、上記と同様に、シュウ酸イオンの熱分解を生じる範囲で低い温度に設定されることが望ましいが、温度の上昇と共に熱分解の速度が向上するため、金属銅の表面に良好な銀の被膜が得られる範囲で適宜加熱温度を上昇させることができる。
また、本発明においてアミン錯体の熱分解により表面処理を行う際には、本発明の趣旨を逸脱しない範囲で、他の成分を介在させることも可能である。例えば、銀化合物の分解により生じる副生成物と反応して表面処理に影響を与えない物質に変換するための還元性物質や吸着性の物質等を反応系に含むことも有効である。
In the present invention, silver carboxylate is preferably used as the silver compound, and silver oxalate / silver acetate is particularly preferably used. Silver oxalate usually decomposes at about 200 ° C., and oxalate ions are removed as carbon dioxide, leaving metallic silver. On the other hand, by using an amine complex by the method according to the present invention, the thermal decomposition temperature of the silver oxalate portion is lowered, and thermal decomposition occurs at a temperature of about 100 ° C., thereby making it possible to liberate metallic silver. Similar to the above, this temperature is desirably set to a low temperature within a range in which thermal decomposition of oxalate ions occurs. However, since the rate of thermal decomposition increases as the temperature rises, it is good for the surface of metallic copper. The heating temperature can be appropriately increased within a range where a silver film can be obtained.
In the present invention, when surface treatment is performed by thermal decomposition of an amine complex, other components can be interposed without departing from the spirit of the present invention. For example, it is also effective to include a reducing substance or an adsorbing substance in the reaction system for converting into a substance that does not affect the surface treatment by reacting with a by-product generated by decomposition of the silver compound.
(分散媒)
本発明に係る方法で表面処理された金属銅は、表面処理により最表面に形成されるアルキルアミンを含む保護被膜が脱離しない条件で保存することが望ましい。特に、銅微粒子の表面処理を行った場合には、その使用される用途に応じて、主に使用するアルキルアミンの選択により、例えば、アルコールやエステル溶剤等の極性溶媒や、オクタン等の非極性溶剤、又はそれらの混合溶剤等の適宜の有機溶媒に高濃度で分散させた分散液として使用することが可能である。また、ペースト状の組成物とすることが可能である。本発明に係る方法で表面処理がされた銅微粒子を分散液やペーストとすることで、特に低温で配線を形成するための材料として好ましく使用することができる。
本発明に係る方法で表面処理がされた銅微粒子を分散させて分散液とする場合に使用する有機溶媒は、銅微粒子の保護膜に含まれるアルキルアミン等の脱離を生じさせ難くいものが好ましく用いられる。
(Dispersion medium)
It is desirable to store the metallic copper surface-treated by the method according to the present invention under the condition that the protective film containing alkylamine formed on the outermost surface by the surface treatment is not detached. In particular, when the surface treatment of copper fine particles is performed, depending on the application used, the selection of the alkylamine used mainly, for example, polar solvents such as alcohol and ester solvents, nonpolar such as octane It can be used as a dispersion liquid dispersed at a high concentration in an appropriate organic solvent such as a solvent or a mixed solvent thereof. Moreover, it can be set as a paste-form composition. By using the copper fine particles subjected to the surface treatment by the method according to the present invention as a dispersion or paste, it can be preferably used as a material for forming wirings at a particularly low temperature.
The organic solvent used in the case of dispersing the copper fine particles that have been surface-treated by the method according to the present invention to form a dispersion is one that hardly causes desorption of alkylamine or the like contained in the protective film of the copper fine particles. Preferably used.
(銀被着銅)
本発明の方法により表面処理された銀被着銅の一例を図1に示す。図1は、市販の銅板の表面に本発明に係る方法で銀を被着させたものであり、金属銀で被覆された銅板表面に主に数10nm程度の粒径の銀微粒子が付着した表面を有することが示される。このような状態の金属銅の表面同士を大気雰囲気下で密着させることにより、図2に示すように、室温においても金属銅の表面が融着して接合することが可能である。
また、図7は、実施例2(2.1)等で製造したアルキルアミン被覆銅微粒子に本発明に係る方法で銀を被着させたものであり、表面が金属銀で被覆された銅微粒子と微細な銀微粒子の混合物が得られることが示される。このような銀被着銅微粒子は、コアとなる銅微粒子の粒子径をその使用目的等に応じて選択することによって銀被着銅微粒子としての粒径を選択可能である。銀被着銅微粒子の粒径は、典型的には約50nm〜10μm程度、好ましくは約100nm〜1μmであり、さらに好ましくはおおよそ100nm〜500nm程度の範囲で調節することが可能である。その粒子表面には、銀の生成量に応じて数nm〜数10nm程度の厚さで銀の原子層が設けられると共に、100nm以下の粒子径の銀微粒子が混在して存在することで、相互の融着によって緻密な焼結組織を有する銅−銀複合体を得ることができる。また、これらの粒子表面が厚さ数nm程度のアルキルアミンを含む保護膜で覆われることで、図7に示すように、それぞれの銀被着銅微粒子が独立して安定に存在することができる。
(Silver coated copper)
An example of the silver-coated copper surface-treated by the method of the present invention is shown in FIG. FIG. 1 shows a surface obtained by depositing silver on the surface of a commercially available copper plate by the method according to the present invention, in which silver fine particles mainly having a particle size of about several tens of nanometers adhere to the surface of the copper plate coated with metallic silver Is shown. By bringing the surfaces of the metal copper in such a state into close contact with each other under an air atmosphere, the surfaces of the metal copper can be fused and joined even at room temperature, as shown in FIG.
FIG. 7 shows the copper fine particles coated with silver by the method according to the present invention on the alkylamine-coated copper fine particles produced in Example 2 (2.1) and the like, and the surface is coated with metallic silver. And a mixture of fine silver particles is shown. For such silver-coated copper fine particles, the particle size of the silver-coated copper fine particles can be selected by selecting the particle size of the copper fine particles as the core according to the purpose of use. The particle size of the silver-coated copper fine particles is typically about 50 nm to 10 μm, preferably about 100 nm to 1 μm, more preferably about 100 nm to 500 nm. The surface of the particles is provided with a silver atomic layer having a thickness of about several nm to several tens of nm depending on the amount of silver produced, and silver fine particles having a particle diameter of 100 nm or less are present together. A copper-silver composite having a dense sintered structure can be obtained by fusing. Further, by covering these particle surfaces with a protective film containing an alkylamine having a thickness of about several nanometers, each silver-coated copper fine particle can exist independently and stably as shown in FIG. .
(銀被着銅の融着処理)
本発明により表面処理を行った金属銅表面間の融着による接合は、処理後の表面に形成されるアルキルアミンを含む保護膜を除去等することで、金属銀同士を直接に接触させることにより行うことができる。例えば、表面処理を行った銅板を融着させる際には、表面処理を行った面同士を押圧することで、表面に付着したアルキルアミン分子等が排除されて金属銀間の接触を生じ、大気雰囲気下でも室温程度の温度で融着を生じさせることができる。また、予め融着させる表面に付着したアルキルアミン分子等を適宜の溶媒で洗浄して除去することで金属銀間の接触を促進させることも好ましい。表面処理を行った銅微粒子等の場合には、適宜の溶媒に分散させた銅微粒子を塗布した後に、溶媒を蒸発除去することで融着(焼結)を開始させることができる。また、適宜の加熱を行うことで、溶媒やアルキルアミン分子等の蒸発を促進すると共に銀原子の相互拡散が促進され、融着の程度を高めることができる。銀被着銅微粒子における銅と銀の存在比率は、金属銅の表面の少なくても一部が金属銀で被覆されている限り特に限定されないが、特に銀被着銅微粒子を焼結させて得られる銅−銀複合体における銀の割合を低下させる観点からは、金属銅に対する金属銀の重量比で1/2以下であればよく、好ましくは1/5以下、さらに好ましくは1/10程度とすることができる。金属銀の割合をこの程度まで低下させることによって、製造コストの低減に寄与すると共に、特に銀被着銅微粒子を焼結させて得られる銅−銀複合体を配線材料として使用する際の耐エレクトロマイグレーション性を向上することができる。
(Fusion treatment of silver-coated copper)
Joining by fusion between copper surfaces that have been surface-treated according to the present invention is performed by directly contacting metal silver with each other by removing a protective film containing alkylamine formed on the surface after the treatment. It can be carried out. For example, when fusing a surface-treated copper plate, by pressing the surfaces that have been surface-treated, alkylamine molecules attached to the surface are eliminated, causing contact between the metallic silver and the atmosphere. Even in an atmosphere, fusion can be caused at a temperature of about room temperature. In addition, it is also preferable to promote contact between metallic silver by washing and removing alkylamine molecules and the like attached to the surface to be fused in advance with an appropriate solvent. In the case of a copper fine particle or the like that has been subjected to surface treatment, fusion (sintering) can be started by applying a copper fine particle dispersed in an appropriate solvent and then evaporating and removing the solvent. In addition, by performing appropriate heating, evaporation of the solvent, alkylamine molecules, and the like is promoted and interdiffusion of silver atoms is promoted, so that the degree of fusion can be increased. The abundance ratio of copper and silver in the silver-coated copper fine particles is not particularly limited as long as at least a part of the surface of the metal copper is coated with metal silver, but is obtained by sintering the silver-coated copper fine particles. From the viewpoint of reducing the ratio of silver in the obtained copper-silver composite, the weight ratio of metal silver to metal copper may be ½ or less, preferably 1/5 or less, more preferably about 1/10. can do. By reducing the ratio of metallic silver to this level, it contributes to the reduction of manufacturing costs, and in particular, the resistance to electrolysis when a copper-silver composite obtained by sintering silver-coated copper fine particles is used as a wiring material. Migration can be improved.
本発明に係る表面処理方法は、特に導電性の確保を期待して接合される金属銅の表面に好ましく適用される。例えば、本発明に係る表面処理方法で表面処理された銅板を圧着素子等に使用することで、従来よりも低い接続抵抗とすることができる。また、従来のロウ付け(半田付け)に代えて、本発明により表面処理された銅板を使用することができる。また、ワイヤーボンディングに使用するコンタクトパッドとワイヤーの表面に本発明による表面処理を適用することもできる。特に、本発明により表面処理された銅微粒子は、その特性や用途に応じて適宜の態様にして使用される。例えば、銀被着銅微粒子をインクジェット等により所定形状に塗布して、低温焼結により銅銀複合体皮膜とする場合には、所望の有機溶剤で反応媒としたアミンを置換することで、銀被着銅微粒子を有機溶剤中に分散させたインク状の分散体(分散液)とすることにより、銀被着銅微粒子の被覆が除去されにくい状態で保存・使用することが望ましい。また、銀被着銅微粒子を適宜のテルピン油等の分散媒と混合して分散させ、ペーストとして用いることも可能である。また、比較的長鎖のアルキルアミンを主成分とする皮膜を設けた銀被着銅微粒子の場合には、反応媒としたアミンを除去した粉末状物として銀被着銅微粒子を保存可能である。 The surface treatment method according to the present invention is preferably applied particularly to the surface of metallic copper to be joined with the expectation of ensuring conductivity. For example, by using a copper plate surface-treated by the surface treatment method according to the present invention for a crimping element or the like, the connection resistance can be made lower than before. Moreover, it can replace with the conventional brazing (soldering) and can use the copper plate surface-treated by this invention. Further, the surface treatment according to the present invention can be applied to the contact pad used for wire bonding and the surface of the wire. In particular, the copper fine particles surface-treated according to the present invention are used in an appropriate form according to the characteristics and applications. For example, when silver-coated copper fine particles are applied in a predetermined shape by ink jet or the like to form a copper-silver composite film by low-temperature sintering, silver as a reaction medium is replaced with a desired organic solvent. It is desirable to store and use in a state in which the coating of the silver-coated copper fine particles is difficult to be removed by using an ink-like dispersion (dispersion) in which the copper-coated fine particles are dispersed in an organic solvent. Further, the silver-coated copper fine particles can be mixed and dispersed with an appropriate dispersion medium such as terpin oil and used as a paste. Further, in the case of silver-coated copper fine particles provided with a film mainly composed of a relatively long chain alkylamine, the silver-coated copper fine particles can be stored as a powdery product from which the amine as a reaction medium has been removed. .
(焼結により形成された複合金属体)
本発明により表面処理された銀被着銅微粒子を使用することで、特に雰囲気を調整することなく、大気中、室温においても金属銅を主成分として十分な導電性を有する複合金属体を得ることができる。本発明により表面処理された銀被着銅微粒子を融着(焼結)させて得られる複合金属体においては、銅微粒子が分散相となり、銅微粒子同士が表面の金属銀をバインダーとして融着し、又は、銅微粒子が銀微粒子を介して融着することで銀のマトリクス中に銅の分散相を含む構造を有することで、極めて良好な導電性が得ることができる。特に、銀の配合割合を高めると共に、融着の際の温度を高めることにより複合金属体の密度を高めることが可能であり、高い導電性が得ることができる。本発明に係る複合金属体は、本発明により製造される銀被着銅微粒子を含むインクやペーストを各種の基板に所望の形態で塗布し、銀被着銅微粒子間の融着により接合させることで、各種の電子デバイス等を構成する配線として好適に使用される。
(Composite metal body formed by sintering)
By using the silver-coated copper fine particles surface-treated according to the present invention, it is possible to obtain a composite metal body having sufficient conductivity with metallic copper as a main component even in the air and at room temperature without particularly adjusting the atmosphere. Can do. In the composite metal body obtained by fusing (sintering) the silver-coated copper fine particles surface-treated according to the present invention, the copper fine particles become a dispersed phase, and the copper fine particles are fused with the metallic silver on the surface as a binder. Alternatively, extremely good conductivity can be obtained by having a structure in which the copper fine particles are fused via the silver fine particles so that the silver matrix contains a copper dispersed phase. In particular, the density of the composite metal body can be increased by increasing the blending ratio of silver and increasing the temperature at the time of fusion, and high conductivity can be obtained. In the composite metal body according to the present invention, an ink or paste containing the silver-coated copper fine particles produced according to the present invention is applied to various substrates in a desired form and bonded by fusion between the silver-coated copper fine particles. Therefore, it is preferably used as a wiring constituting various electronic devices.
本発明に係る複合金属体を得る際の融着(焼成)は、その目的に応じて決定される許容温度の範囲内で、なるべく高い温度で行うことが良好な導電性と処理時間の短縮の点で好ましい。融着温度の上限は特に限定がないが、特に大気中での処理では140℃以上の温度域において銅の酸化が顕著になるため、140℃以下での処理を行うことが好ましい。一方、特に耐熱性の低い樹脂基板表面での融着を行う場合には、120℃以下での処理が好ましく、特に100℃以下での処理が好ましい。また、以下の実施例で示すように、本発明に係る複合金属体は、室温においても融着を生じて良好な導電性を示すことが可能である。
本発明に係る銀被着銅微粒子を融着して複合金属体を得る際の雰囲気は特に限定されず、大気雰囲気下での処理が可能であるが、特に配線素材としての複合金属体の信頼性を向上する観点からは、不活性ガス雰囲気や還元ガス雰囲気で融着を行うことも好ましい。また、融着を促進する観点からは、特に水蒸気を多く含む雰囲気での融着処理が好ましい。
本発明に係る複合金属体においては、使用する銀被着銅微粒子において銅微粒子表面が金属銀で被覆されている範囲内において、銅に対する銀の割合を低くすることがコストや耐エレクトロマイグレーションの観点から望ましい。使用する銅微粒子の粒子径によっても変化するが、例えば、銅微粒子の表面処理をして銀被着銅微粒子とする際の金属銅に対する金属銀の重量比を1/2程度とすれば、銅微粒子が十分な量の銀で被覆されると共に微細な銀微粒子が生成するために、特に高い融着性を得ることができる。また、金属銅に対する金属銀の重量比を1/5程度以下、さらに好ましくは1/10程度としても、良好な導電性を有する複合金属体を得ることができる。
The fusion (firing) in obtaining the composite metal body according to the present invention is preferably performed at a temperature as high as possible within the allowable temperature range determined according to the purpose, and the conductivity and the processing time can be shortened. This is preferable. The upper limit of the fusing temperature is not particularly limited, but it is preferable to perform the treatment at 140 ° C. or lower because the oxidation of copper becomes remarkable in the temperature range of 140 ° C. or higher particularly in the treatment in the atmosphere. On the other hand, when performing fusion on the surface of a resin substrate having particularly low heat resistance, treatment at 120 ° C. or lower is preferable, and treatment at 100 ° C. or lower is particularly preferable. Further, as shown in the following examples, the composite metal body according to the present invention can exhibit good conductivity by causing fusion even at room temperature.
The atmosphere at the time of fusing the silver-coated copper fine particles according to the present invention to obtain a composite metal body is not particularly limited and can be treated in an air atmosphere, but in particular the reliability of the composite metal body as a wiring material From the viewpoint of improving the properties, it is also preferable to perform fusion in an inert gas atmosphere or a reducing gas atmosphere. Further, from the viewpoint of promoting fusion, fusion treatment in an atmosphere containing a large amount of water vapor is particularly preferable.
In the composite metal body according to the present invention, in the silver-coated copper fine particles to be used, in the range where the surface of the copper fine particles is coated with metallic silver, it is possible to reduce the ratio of silver to copper in terms of cost and electromigration resistance. Is desirable. Depending on the particle size of the copper fine particles used, for example, if the weight ratio of metal silver to metal copper when the copper fine particles are surface-treated to form silver-coated copper fine particles is about 1/2, copper Since the fine particles are covered with a sufficient amount of silver and fine silver fine particles are formed, particularly high fusing property can be obtained. Moreover, even if the weight ratio of metallic silver to metallic copper is about 1/5 or less, more preferably about 1/10, a composite metal body having good conductivity can be obtained.
本発明に係る複合金属体の導電率は、その用途等に応じて決定されるが、典型的には3.0×10−3Ω・cm以下の体積抵抗率の複合金属体を容易に得ることができる。また、室温付近での融着処理によっても、金属銀の含有量に応じて、1.0×10−3Ω・cm〜1.0×10−4Ω・cm程度以下の体積抵抗率の複合金属体を得ることができる。更に、100℃程度での融着処理を行うことで、2.0×10−5Ω・cm程度以下の体積抵抗率の複合金属体を得ることができる。 The electrical conductivity of the composite metal body according to the present invention is determined according to its use and the like, but typically a composite metal body having a volume resistivity of 3.0 × 10 −3 Ω · cm or less is easily obtained. be able to. In addition, a composite having a volume resistivity of about 1.0 × 10 −3 Ω · cm to 1.0 × 10 −4 Ω · cm or less is also obtained by the fusion treatment near room temperature, depending on the content of metallic silver. A metal body can be obtained. Furthermore, a composite metal body having a volume resistivity of about 2.0 × 10 −5 Ω · cm or less can be obtained by performing a fusion treatment at about 100 ° C.
一方、比較例2として記載した長鎖脂肪酸銀を用いて表面処理を行った銅微粒子を焼結させた図12(c)においては、銅の表面上に銀微粒子が残存していることが観察された。これは、表面処理後の銅と銀の界面での結合形成が不十分であるために銀がバインダーとして機能せず、また、保護分子となっている脂肪酸イオンの除去が困難であるために金属粒子の融着が進行せず、焼結後の複合金属体の電気伝導性が向上しなかったものと考えられる。 On the other hand, in FIG. 12C in which the copper fine particles subjected to the surface treatment using the long-chain fatty acid silver described as Comparative Example 2 were sintered, it was observed that the silver fine particles remained on the copper surface. It was done. This is because the bond formation at the interface between copper and silver after surface treatment is insufficient, so silver does not function as a binder, and it is difficult to remove fatty acid ions that are protective molecules. It is considered that the fusion of the particles did not proceed and the electrical conductivity of the sintered composite metal body was not improved.
[実施例1]銅板表面に対する表面処理
以下に示す方法で、銅板に対して本発明に係る表面処理方法で表面処理を行い、処理後の銅板の融着性を評価した。
(1.1)アミン錯体の調製
i)アルキルアミン−シュウ酸銀錯化合物
銀原子を供給するための銀化合物としてシュウ酸銀を使用し、アミン錯体を調製した。シュウ酸銀は、硝酸銀(関東化学株式会社、一級)とシュウ酸・二水和物(関東化学、特級)を混合して合成して使用した。特許文献4に従って、n−ヘキシルアミン(東京化成株式会社、特級)3.0g(30mmol)、n−ドデシルアミン(関東化学、特級)0.25g(1.3mmol)、N,N−ジメチル−1,3−ジアミノプロパン(東京化成株式会社、特級)0.75g(7.3mmol)を混合した溶液に、シュウ酸銀0.50g(1.6mmol)を加えて室温で撹拌することで、過剰量のアルキルアミン中にアルキルアミン−シュウ酸銀錯化合物を生成させた。
[Example 1] Surface treatment on the surface of a copper plate Surface treatment was performed on the copper plate by the surface treatment method according to the present invention by the method shown below, and the fusion property of the copper plate after the treatment was evaluated.
(1.1) Preparation of Amine Complex i) Alkylamine-Silver Oxalate Complex Compound An amine complex was prepared using silver oxalate as a silver compound for supplying silver atoms. Silver oxalate was synthesized by mixing silver nitrate (Kanto Chemical Co., Ltd., first grade) and oxalic acid dihydrate (Kanto Chemical, special grade). According to Patent Document 4, n-hexylamine (Tokyo Kasei Co., Ltd., special grade) 3.0 g (30 mmol), n-dodecylamine (Kanto Chemical, special grade) 0.25 g (1.3 mmol), N, N-dimethyl-1 , 3-Diaminopropane (Tokyo Kasei Co., Ltd., special grade) 0.75 g (7.3 mmol) mixed solution was added with 0.50 g (1.6 mmol) of silver oxalate and stirred at room temperature. An alkylamine-silver oxalate complex compound was formed in the alkylamine.
ii)アルキルアミン−酢酸銀錯化合物
シュウ酸銀0.50g(1.6mmol)に代えて酢酸銀(和光純薬、一級)0.55g(3.3mmol)を用いた以外は、上記と同様の方法で過剰量のアルキルアミン中にアルキルアミン−酢酸銀錯化合物を生成させた。なお、シュウ酸銀は一分子当たり2個の銀原子を含むのに対して、酢酸銀は一分子当たり1個の銀原子を含むため、使用した酢酸銀に含まれる銀原子の量は上記のシュウ酸銀と同一である。
ii) Alkylamine-silver acetate complex compound The same as above except that 0.55 g (3.3 mmol) of silver acetate (Wako Pure Chemical Industries, Ltd.) was used instead of 0.50 g (1.6 mmol) of silver oxalate. The process produced alkylamine-silver acetate complex in excess of alkylamine. Silver oxalate contains 2 silver atoms per molecule, whereas silver acetate contains 1 silver atom per molecule, so the amount of silver atoms contained in the silver acetate used is Same as silver oxalate.
(1.2)銅板の表面処理
上記で生成させたアルキルアミンとアミン錯体の各混合物に、脱脂洗浄を行った厚さ0.3mmの銅板(HIKARI、HC0316)1.0g(金属銅として15.9mmol)を8片に分けてそれぞれ投入し、80℃で加熱攪拌した。加熱により二酸化炭素の発生を伴う錯化合物の分解を生じた。2時間の加熱攪拌後、表面処理された銅板を取り出し、アセトン、トルエンで洗浄した。
また、比較のため、アミン錯体を使用せずに銀微粒子を合成する公知の方法(非特許文献1)を応用し、当該方法で銀微粒子を合成する際に銅板を介在させて、銅板の表面処理を行った(比較例1)。当該文献には、脂肪酸銀であるミリスチン酸銀(C13H27COOAg)を、還元剤であるトリエチルアミン中で加熱して還元・分解することで、ミリスチン酸イオンにより銀微粒子の表面が保護されたミリスチン酸保護銀微粒子の製造方法が記載されている。比較例1においては、トリエチルアミン(東京化成、特級)7.26g(71.7mmol)とミリスチン酸銀1.19g(3.55mmol)を加えた混合物に、上記と同様に脱脂洗浄を行った厚さ0.3mmの銅板1.0gを8片に分けて投入し、90℃で加熱攪拌した。3時間の加熱攪拌後、銅板を取り出し、アセトン、トルエンで洗浄した。
(1.2) Surface treatment of copper plate 1.0 g of a 0.3 mm-thick copper plate (HIKARI, HC0316) obtained by degreasing and washing each mixture of the alkylamine and amine complex produced above (15. as metallic copper). 9 mmol) was divided into 8 pieces, and each was added and heated and stirred at 80 ° C. Decomposition of the complex compound accompanied by generation of carbon dioxide was caused by heating. After heating and stirring for 2 hours, the surface-treated copper plate was taken out and washed with acetone and toluene.
In addition, for comparison, a known method (Non-patent Document 1) for synthesizing silver fine particles without using an amine complex is applied, and a copper plate is interposed when synthesizing silver fine particles by the method. Processing was performed (Comparative Example 1). In this document, silver myristate (C 13 H 27 COOAg), which is fatty acid silver, is reduced and decomposed by heating in triethylamine, which is a reducing agent, so that the surface of silver fine particles is protected by myristic acid ions. A method for producing myristic acid-protected silver fine particles is described. In Comparative Example 1, a thickness obtained by performing degreasing washing in the same manner as described above to a mixture obtained by adding 7.26 g (71.7 mmol) of triethylamine (Tokyo Kasei, special grade) and 1.19 g (3.55 mmol) of silver myristate. A 0.3 mm copper plate (1.0 g) was divided into 8 pieces, and the mixture was heated and stirred at 90 ° C. After heating and stirring for 3 hours, the copper plate was taken out and washed with acetone and toluene.
図1(a)〜(c)には、上記で表面処理を行った各銅板の電界放出型走査電子顕微鏡(FE−SEM、(日本電子株式会社、JFM−7600F))像を示す。シュウ酸銀を含むアミン錯体を用いて表面処理した銅板の表面(図1(a))には、金属銀の被覆が形成されると共に、数10nm程度の銀微粒子が全面に付着している様子が観察された。また、酢酸酸銀を含むアミン錯体を用いて表面処理した銅板の表面(図1(b))においても、金属銀の被覆が形成されると共に、やや粗大な銀微粒子が全面に付着している様子が観察された。また、脂肪酸銀の還元分解により表面処理した銅板の表面(図1(c))においても、微細な銀微粒子が均一に析出していることが観察された。以上のように、アミン錯体の熱分解を生じる反応系内や、脂肪酸銀の還元反応の系内に銅板を置くことにより、金属銅の表面に金属銀を析出させることができた。 1A to 1C show images of a field emission scanning electron microscope (FE-SEM, (JEOL Ltd., JFM-7600F)) of each copper plate subjected to surface treatment as described above. On the surface of the copper plate surface-treated with an amine complex containing silver oxalate (FIG. 1 (a)), a metallic silver coating is formed and silver particles of about several tens of nanometers are attached to the entire surface. Was observed. In addition, on the surface of the copper plate surface-treated with an amine complex containing silver acetate (FIG. 1 (b)), a coating of metallic silver is formed and slightly coarse silver particles are attached to the entire surface. The situation was observed. Further, it was observed that fine silver fine particles were uniformly deposited on the surface of the copper plate (FIG. 1 (c)) surface-treated by reductive decomposition of fatty acid silver. As described above, metallic silver could be deposited on the surface of metallic copper by placing a copper plate in a reaction system that causes thermal decomposition of an amine complex or in a system for reduction reaction of fatty acid silver.
(1.3)表面処理を行った銅板の融着試験
上記で表面処理を行った銅板同士の融着性を調べるため、上記で表面処理を行った銅板同士を大気中、室温下で圧着する試験を行った。圧着は、上記で表面処理を行った銅板を重ね、大気下、室温、荷重2kN(約200kgf/cm2)で10秒間プレスして行った(島津、ハンドプレスSSP10A)。
図2(a)〜(c)には、上記の条件で圧着した各銅板の写真を示す。シュウ酸銀又は酢酸銀を含むアミン錯体を用いて表面処理を行った銅板はプレスにより接合可能であることが分かった(図2(a),(b))。一方、脂肪酸の還元分解により表面処理を行った銅板は、上記条件のプレスによって、加圧された部分の変色が生じるのみで、接合を生じさせることはできなかった(図2(c))。また、参考のために、表面処理を行っていない銅板同士や、表面処理を行っていない銅板間に、特許文献4に従って生成した融着性の高い銀微粒子を介在させてプレスした場合にも銅板間に接合は生じなかった。
(1.3) Fusing test of copper plates subjected to surface treatment In order to examine the fusing property between the copper plates subjected to surface treatment as described above, the copper plates subjected to surface treatment as described above are pressure-bonded at room temperature in the atmosphere. A test was conducted. The crimping was performed by stacking the copper plates that had been surface-treated as described above and pressing them in the atmosphere at room temperature and a load of 2 kN (about 200 kgf / cm 2 ) for 10 seconds (Shimadzu, hand press SSP10A).
FIGS. 2A to 2C show photographs of the copper plates that have been pressure-bonded under the above conditions. It turned out that the copper plate which surface-treated using the amine complex containing silver oxalate or silver acetate can be joined by press (FIG. 2 (a), (b)). On the other hand, the copper plate subjected to the surface treatment by reductive decomposition of the fatty acid only caused discoloration of the pressurized portion by the pressing under the above conditions, and could not be joined (FIG. 2 (c)). In addition, for reference, the copper plates are also subjected to pressing between the copper plates that are not subjected to surface treatment or between the copper plates that are not subjected to surface treatment by interposing silver fine particles having high fusibility generated according to Patent Document 4. There was no bonding between them.
以上のことから、本発明に係る表面処理方法により、金属銅の表面に銀を析出させて予め銅−銀微粒子間に界面接合を形成させることで、その金属銅表面の銀被覆や銀微粒子をバインダーとして容易に金属銅同士を接合可能であることが示された。本発明に係る表面処理方法により処理された金属銅が容易に融着して接合を生じる機構は、表面処理により析出した金属銀と金属銅の間に実質的な接合が存在すること、及び、析出した金属銀が活性であることを示すものである。金属銅と金属銀の間では濡れ性が低いにも関わらず、特に表面処理により析出した金属銀と金属銅の間に実質的な接合を生じる機構は、アミン錯体の熱分解で生じた銀原子のポテンシャルが低いために必ずしも銀の核発生等が容易でなく、準安定な状態で銅表面に結合して析出を生じるためと推察される。 From the above, by the surface treatment method according to the present invention, silver is deposited on the surface of the metallic copper and an interfacial bond is formed between the copper-silver fine particles in advance, so that the silver coating or silver fine particles on the surface of the metallic copper is formed. It was shown that metallic copper can be easily joined as a binder. The mechanism in which the metallic copper treated by the surface treatment method according to the present invention is easily fused to form a bond is that a substantial bond exists between the metallic silver deposited by the surface treatment and the metallic copper, and This shows that the deposited silver metal is active. Despite the low wettability between metallic copper and metallic silver, the mechanism that causes substantial bonding between metallic silver and metallic copper deposited by surface treatment is the silver atom produced by the thermal decomposition of the amine complex. It is presumed that the generation of silver nuclei is not always easy because of the low potential, and precipitates by binding to the copper surface in a metastable state.
[実施例2]
以下に示す方法で、アルキルアミン被覆を有する銅微粒子に対して本発明に係る表面処理方法で表面処理を行い、処理後の銅微粒子について評価した。
(2.1)アルキルアミン被覆を有する銅微粒子の合成
以下、特開2012−072418号公報に記載の方法で、アルキルアミン被覆を有する銅微粒子を合成した。3−(2−エチルヘキシルオキシ)プロピルアミン(東京化成、特級)10g(53mmol)、2−ヒドラジノエタノール(東京化成、特級)3.0g(39mmol)及び、シュウ酸銅・0.5水和物(硫酸銅・五水和物(関東化学、特級)とシュウ酸・二水和物(関東化学、特級)から合成したもの)3.00g(18.7mmol)を混合し0℃で数分間攪拌すると、白色から淡い黄色の粘性混合物へと変化し、シュウ酸銅と2−ヒドラジノエタノール等からなる錯化合物を生成した。次に、170℃に加熱して2時間攪拌することで、3−(2−エチルヘキシルオキシ)プロピルアミンの存在下で錯化合物が分解して銅原子が生成・凝集し、アルキルアミン被覆を有する銅微粒子を含む赤色の懸濁液へと変化した。この反応混合物にアセトン(和光純薬工業株式会社、特級)5mL)を加え、遠心分離(4000rpm、1分間)により得られた沈殿物を分離し、もう一度、アセトン5mLを加え、沈殿物を攪拌し、遠心分離によりアルキルアミン被覆を有する銅微粒子を得た(1.10g)。特開2012−072418に記載の通り、上記方法で合成されるアルキルアミン被覆を有する銅微粒子は、実質的に酸化相を含まず、比較的高い相互融着性(焼結性)を有するものである。
[Example 2]
By the method shown below, surface treatment was performed on the copper fine particles having an alkylamine coating by the surface treatment method according to the present invention, and the treated copper fine particles were evaluated.
(2.1) Synthesis of copper fine particles having alkylamine coating Copper fine particles having an alkylamine coating were synthesized by the method described in JP2012-072418A. 3- (2-ethylhexyloxy) propylamine (Tokyo Kasei, special grade) 10 g (53 mmol), 2-hydrazinoethanol (Tokyo Kasei, special grade) 3.0 g (39 mmol) and copper oxalate 0.5 hydrate (Synthesized from copper sulfate pentahydrate (Kanto Chemical, special grade) and oxalic acid dihydrate (Kanto chemical, special grade)) 3.00 g (18.7 mmol) was mixed and stirred at 0 ° C. for several minutes. Then, it changed from white to a pale yellow viscous mixture, and the complex compound which consists of copper oxalate, 2-hydrazinoethanol, etc. was produced | generated. Next, by heating to 170 ° C. and stirring for 2 hours, the complex compound decomposes in the presence of 3- (2-ethylhexyloxy) propylamine to form and aggregate copper atoms, and copper having an alkylamine coating It changed to a red suspension containing fine particles. Acetone (Wako Pure Chemical Industries, Ltd., 5 mL) is added to the reaction mixture, the precipitate obtained by centrifugation (4000 rpm, 1 minute) is separated, 5 mL of acetone is added again, and the precipitate is stirred. Then, copper fine particles having an alkylamine coating were obtained by centrifugation (1.10 g). As described in JP2012-0772418, the copper fine particles having an alkylamine coating synthesized by the above method are substantially free of an oxidation phase and have a relatively high mutual fusion property (sinterability). is there.
(2.2)アルキルアミン被覆を有する銅微粒子の解析
図3(a)に、(2.1)で得られた銅微粒子をカーボン製水平試料載台に付着させて観察したFE−SEM像を示した。図3(b)に示した粒子径分布から、銅微粒子の平均粒子径は224±112nmであり、平滑な結晶面に囲まれた結晶性の銅微粒子が生成したことが示された。図4には、(2.1)で得られた銅微粒子の粉末X線回折パターン(株式会社リガク、SmartLab)を示す。観測されたシグナルは全て金属銅に由来するものであり、酸化銅の成分は検出されなかった。
(2.2) Analysis of Copper Fine Particles Having Alkylamine Coating FIG. 3 (a) shows an FE-SEM image observed by attaching the copper fine particles obtained in (2.1) to a carbon horizontal sample stage. Indicated. From the particle size distribution shown in FIG. 3B, the average particle size of the copper fine particles was 224 ± 112 nm, indicating that crystalline copper fine particles surrounded by a smooth crystal plane were generated. FIG. 4 shows a powder X-ray diffraction pattern (Rigaku Corporation, SmartLab) of the copper fine particles obtained in (2.1). All the observed signals were derived from metallic copper, and no component of copper oxide was detected.
(2.3)アルキルアミン被覆を有する銅微粒子の熱重量分析
図5(a)には、(2.1)で得られた銅微粒子について不活性雰囲気での熱重量分析(TA instruments、SDT Q600、200mL/分のヘリウム気流中、昇温速度10℃/分)を行った結果を示す。保護分子の脱離に由来する0.5重量%の重量減少が観測された。当該重量減少は、銅微粒子の被覆を形成しているアルキルアミンの脱離に伴うものである。得られたアルキルアミン被覆を有する銅微粒子における銅含有量は99.5重量%であり、原料として使用したシュウ酸銅を基準とした銅微粒子の収率は90.7%である。
図5(b)には、(2.1)で得られた銅微粒子について大気下での熱重量分析(島津、TGA−50、40mL/分の合成空気気流中、140℃で1時間保持した後、10℃/分で昇温)を行った結果を示す。合成空気中で、140℃で1時間保持してもなお、銅の酸化(酸化銅の生成)に由来する重量増加は0.5%以下であり、(2.1)で得られた銅微粒子は140℃以下においては、所定の酸化耐性を示す。一方で、(2.1)で得られた銅微粒子は、140℃以上では、空気酸化による重量増加が顕著になる。
(2.3) Thermogravimetric analysis of copper fine particles having an alkylamine coating FIG. 5 (a) shows the thermogravimetric analysis (TA instruments, SDT Q600) in an inert atmosphere of the copper fine particles obtained in (2.1). The results of performing a heating rate of 10 ° C./min in a helium stream at 200 mL / min) are shown. A weight loss of 0.5% by weight resulting from the elimination of the protective molecule was observed. The weight reduction is accompanied by the elimination of the alkylamine forming the copper fine particle coating. The copper content in the obtained copper fine particles having an alkylamine coating is 99.5% by weight, and the yield of copper fine particles based on the copper oxalate used as a raw material is 90.7%.
FIG. 5 (b) shows the thermogravimetric analysis (Shimadzu, TGA-50, 40 mL / min synthetic air stream) held at 140 ° C. for 1 hour for the copper fine particles obtained in (2.1). Thereafter, the results are shown in FIG. Even when kept at 140 ° C. for 1 hour in synthetic air, the weight increase derived from copper oxidation (formation of copper oxide) is 0.5% or less, and the copper fine particles obtained in (2.1) Shows a predetermined oxidation resistance at 140 ° C. or lower. On the other hand, the copper fine particles obtained in (2.1) have a significant increase in weight due to air oxidation at 140 ° C. or higher.
(2.4)銅微粒子の表面処理
(2.1)で合成したアルキルアミン被覆を有する銅微粒子1.10g(銅として17.2mmol)に対して、(1.1)と同様の条件で生成させたアルキルアミン−シュウ酸銀錯化合物と過剰量のアルキルアミンの混合物を加え、80℃で2時間加熱攪拌して当該錯化合物を分解させることで赤茶色懸濁液を得た。これにアセトン5mLを加え、遠心分離により得られた沈殿物を分離し、更にヘキサン(関東化学、特級)5mLを加え、沈殿物を攪拌し、遠心分離することにより1.40g(シュウ酸銀に対しての銀の収率(銀基準収率)は約82%)の沈殿物を分離した。
分離した沈殿物について、不活性雰囲気で熱重量−質量分析(TG−MS:TA instruments、SDT Q600から発生した気体を日本電子JMS−Q1050GCで質量分析)を行った結果、1.1重量%の重量減少が観測され、この重量減少に対応してアルキルアミン分子(ヘキシルアミンやN,N−ジメチル−1,3−ジアミノプロパン)が検出されたことから、得られた沈殿物はアルキルアミンの被覆を有する金属微粒子であることが確認された。
(2.4) Surface treatment of copper fine particles 1.10 g of copper fine particles having an alkylamine coating synthesized in (2.1) (17.2 mmol as copper) are produced under the same conditions as in (1.1). A mixture of the alkylamine-silver oxalate complex compound and an excess amount of the alkylamine was added, and the complex compound was decomposed by heating and stirring at 80 ° C. for 2 hours to obtain a red-brown suspension. 5 mL of acetone is added to this, and the precipitate obtained by centrifugation is separated. Further, 5 mL of hexane (Kanto Chemical Co., Ltd.) is added, and the precipitate is stirred and centrifuged to obtain 1.40 g (to silver oxalate). In contrast, a precipitate having a silver yield (silver reference yield of about 82%) was separated.
The separated precipitate was subjected to thermogravimetry-mass analysis (TG-MS: gas generated from SDT Q600 by mass spectrometry using JEOL JMS-Q1050GC) in an inert atmosphere. As a result, 1.1 wt% A decrease in weight was observed, and alkylamine molecules (hexylamine and N, N-dimethyl-1,3-diaminopropane) were detected corresponding to this weight decrease, and the resulting precipitate was coated with alkylamine. It was confirmed that the metal fine particles had.
(2.5)表面処理を行った銅微粒子の評価
図6には、(2.4)で表面処理を行って得られた金属微粒子の粉末X線パターンを、他の結果と併せて示した。(2.4)で得られた金属微粒子には、金属銅相と金属銀相の両方が含まれているがこと分かった。また、図7(a)には、(2.4)で得られた金属微粒子のFE−SEM像を示した。(2.4)で得られた金属微粒子中にはサブミクロン程度の粒径を有する粒子と、数10nm程度の粒径を有する粒子が混在して存在することが示された。また、サブミクロン程度の粒子においては、平坦な結晶面上に微細な凹凸が均一に生じていることが分かった。図8には、(2.4)で得られた金属微粒子をトルエンに分散させて電子顕微鏡用カーボン支持膜(イーエムジャパン、モリブデン200メッシュ)に塗布し、これを走査透過電子顕微鏡像(日本電子、JEM2100F)で観察した像を示した。エネルギー分散型蛍光X線測定分析(EDS)による元素マッピングから、サブミクロン程度の粒子のコアの部分には銅が、その周囲には銀が分布していることが分かった。これらの結果より、(2.4)で得られた金属微粒子に含まれるサブミクロン程度の粒子は、表面処理に供した銅微粒子の表面に銀が析出したものと考えられた。つまり、図7(a)で示したサブミクロン粒子の平坦な結晶面上で生じた微細で均一な凹凸は、銅結晶表面に析出した銀原子によるものであり、金属銅の表面で銅−銀微粒子の界面接合が形成されていることを示している。また、数10nm程度の粒子は表面処理中に独立して生じた銀微粒子である。
(2.5) Evaluation of surface-treated copper fine particles FIG. 6 shows a powder X-ray pattern of metal fine particles obtained by performing the surface treatment in (2.4) together with other results. . It was found that the metal fine particles obtained in (2.4) contained both a metal copper phase and a metal silver phase. FIG. 7A shows an FE-SEM image of the metal fine particles obtained in (2.4). It was shown that particles having a particle size of about submicron and particles having a particle size of about several tens of nanometers exist in the metal fine particles obtained in (2.4). In addition, it was found that fine irregularities are uniformly formed on a flat crystal surface in particles of about submicron. In FIG. 8, the metal fine particles obtained in (2.4) are dispersed in toluene and applied to a carbon support film for electron microscope (EM Japan, molybdenum 200 mesh). , JEM2100F) shows an image observed. From elemental mapping by energy dispersive X-ray fluorescence analysis (EDS), it was found that copper was distributed in the core portion of the submicron particles and silver was distributed around the core. From these results, it was considered that the submicron particles contained in the metal fine particles obtained in (2.4) had silver deposited on the surface of the copper fine particles subjected to the surface treatment. That is, the fine and uniform irregularities generated on the flat crystal surface of the submicron particles shown in FIG. 7A are due to silver atoms deposited on the surface of the copper crystal. It shows that interfacial bonding of fine particles is formed. Further, the particles of about several tens of nanometers are silver fine particles generated independently during the surface treatment.
[実施例3]
以下に示す方法で、アルキルアミン被覆を有する銅微粒子に対して本発明に係る表面処理方法で表面処理を行い、処理後の銅微粒子を評価した。
(3.1)アルキルアミンと酢酸銀からなる錯化合物の生成
(1.1)と同様の条件で、アルキルアミン−酢酸銀錯化合物と過剰量のアルキルアミンの混合物を生成させた。なお、シュウ酸銀は一分子当たり2個の銀原子を含むのに対して、酢酸銀は一分子当たり1個の銀原子を含むため、本実施例で使用した酢酸銀に含まれる銀原子の量は実施例2と同一である。
[Example 3]
By the method shown below, surface treatment was performed on the copper fine particles having an alkylamine coating by the surface treatment method according to the present invention, and the treated copper fine particles were evaluated.
(3.1) Formation of Complex Compound Composed of Alkylamine and Silver Acetate A mixture of an alkylamine-silver acetate complex compound and an excess amount of alkylamine was formed under the same conditions as in (1.1). In addition, since silver oxalate contains two silver atoms per molecule, silver acetate contains one silver atom per molecule. Therefore, silver oxalate contains silver atoms contained in the silver acetate used in this example. The amount is the same as in Example 2.
(3.2)銅微粒子の表面処理
(2.1)で合成したアルキルアミン被覆を有する銅微粒子1.10g(銅として17.2mmol)に対して、(3.1)で生成させた錯化合物と過剰量のアルキルアミンの混合物を加えて、80℃で2時間加熱攪拌して錯化合物を分解させることで赤茶色懸濁液を得た。これにアセトン5mLを加え、遠心分離により得られた沈殿物を分離し、更にヘキサン5mLを加え、沈殿物を攪拌し、遠心分離することにより1.38g(銀基準の収率は約41%)の沈殿物を分離した。
(3.2) Surface treatment of copper fine particles The complex compound produced in (3.1) with respect to 1.10 g (17.2 mmol as copper) of the copper fine particles having an alkylamine coating synthesized in (2.1). And an excess amount of alkylamine were added, and the complex compound was decomposed by heating and stirring at 80 ° C. for 2 hours to obtain a red-brown suspension. To this, 5 mL of acetone is added, and the precipitate obtained by centrifugation is separated. Further, 5 mL of hexane is added, and the precipitate is stirred and centrifuged to obtain 1.38 g (yield based on silver is about 41%). The precipitate was separated.
(3.3)表面処理を行った銅微粒子の評価
図7(b)に、(3.2)で得られた沈殿物のFE−SEM像を示した。表面処理に使用する錯化合物に含まれる銀化合物として酢酸銀を用いた場合にも、シュウ酸銀の場合と同様に、銅微粒子の表面に銀が析出すると共に、単独で生じた銀微粒子が観察された。
(3.3) Evaluation of surface-treated copper fine particles FIG. 7B shows an FE-SEM image of the precipitate obtained in (3.2). Even when silver acetate is used as the silver compound contained in the complex compound used for the surface treatment, silver is precipitated on the surface of the copper fine particles as well as silver oxalate. It was done.
[実施例4]
以下に示す方法で、アトマイズ法により作製されたフレーク状銅微粒子に対して本発明に係る表面処理方法で表面処理を行い、処理後の銅微粒子を評価した。
(4.1)銅アトマイズ微粒子の表面処理
市販のアトマイズ法により作製されたフレーク状銅微粒子1.10g(銅として17.2mmol)に対して、(1.1)と同様の条件で生成させたアルキルアミン−シュウ酸銀錯化合物と過剰量のアルキルアミンの混合物を加えて、80℃で2時間加熱攪拌して錯化合物を分解させることで赤茶色懸濁液を得た。これにアセトン5mLを加え、遠心分離により得られた沈殿物を分離し、更にヘキサン5mLを加え、沈殿物を攪拌し、遠心分離することにより1.25g(銀基準の収率は約76%)の沈殿物を分離した。分離した沈殿物を不活性雰囲気で熱重量分析をした結果、分離した沈殿物について、不活性雰囲気で熱重量−質量分析(TG−MS)を行った結果、1.6重量%の重量減少が観測され、この重量減少に対応してアルキルアミン分子(ヘキシルアミンやN,N−ジメチル−1,3−ジアミノプロパン)が検出されたことから、得られた沈殿物はアルキルアミンの被覆を有する金属微粒子である。
[Example 4]
By the method shown below, surface treatment was performed on the flaky copper fine particles produced by the atomizing method by the surface treatment method according to the present invention, and the treated copper fine particles were evaluated.
(4.1) Surface treatment of copper atomized fine particles 1.10 g (17.2 mmol as copper) of flaky copper fine particles produced by a commercially available atomizing method was produced under the same conditions as (1.1). A mixture of an alkylamine-silver oxalate complex compound and an excess amount of an alkylamine was added, and the complex compound was decomposed by heating and stirring at 80 ° C. for 2 hours to obtain a red-brown suspension. To this, 5 mL of acetone is added, and the precipitate obtained by centrifugation is separated. Further, 5 mL of hexane is added, and the precipitate is stirred and centrifuged to obtain 1.25 g (yield based on silver is about 76%). The precipitate was separated. As a result of thermogravimetric analysis of the separated precipitate in an inert atmosphere, the separated precipitate was subjected to thermogravimetric-mass spectrometry (TG-MS) in an inert atmosphere. Observed and alkylamine molecules (hexylamine and N, N-dimethyl-1,3-diaminopropane) were detected in response to this weight loss, the resulting precipitate was a metal with an alkylamine coating. Fine particles.
(4.2)表面処理を行った銅アトマイズ微粒子の評価
図6には、本実施例で表面処理を行って得られた沈殿物の粉末X線回折結果を他の実施例等と比較して示した。本実施例で表面処理を行って得られた沈殿物には、金属銅相と金属銀相の両方が含まれているがこと分かった。図7(c)に、(4.1)で得られた沈殿物のFE−SEM像を示した。表面処理により直径10μm程度の銅アトマイズ微粒子の表面に銀が析出している様子が観察された。また、実施例2(2.4)(図7(a))や実施例3(3.2)(図7(b))と比較して、独立して生じた銀微粒子の数が少ないことが分かった。フレーク状であるために比表面積の大きな銅アトマイズ微粒子の表面処理においては、アルキルアミン−シュウ酸銀錯化合物の熱分解で生じる銀原子が、より優先して金属銅の表面に析出するものと推察される。
(4.2) Evaluation of surface-treated copper atomized fine particles FIG. 6 shows the result of the powder X-ray diffraction of the precipitate obtained by performing the surface treatment in this example compared with other examples. Indicated. It was found that the precipitate obtained by performing the surface treatment in this example contained both a metallic copper phase and a metallic silver phase. FIG. 7C shows an FE-SEM image of the precipitate obtained in (4.1). It was observed that silver was deposited on the surface of the copper atomized fine particles having a diameter of about 10 μm by the surface treatment. In addition, the number of silver fine particles generated independently is small compared to Example 2 (2.4) (FIG. 7A) and Example 3 (3.2) (FIG. 7B). I understood. In the surface treatment of copper atomized fine particles having a large specific surface area due to the flake shape, it is presumed that silver atoms generated by thermal decomposition of alkylamine-silver oxalate complex compound are preferentially deposited on the surface of metallic copper. Is done.
[比較例2]
本発明に係る表面処理方法についての比較例として、アルキルアミンと銀化合物の錯化合物を使用しない以下の方法で銅微粒子の表面処理を行った。
(5.1)脂肪酸銀の分解による銅微粒子の表面処理
本比較例2においては、(1.2)における脂肪酸銀の還元分解による銅板の表面処理と同様の方法により、銅微粒子の表面処理を行った。
具体的には、(2.1)で合成したアルキルアミン被覆を有する銅微粒子1.10g(銅として17.2mmol)に対して、トリエチルアミン(東京化成、特級)7.26g(71.7mmol)とミリスチン酸銀1.19g(3.55mmol)を加えた混合物を、90℃で3時間加熱攪拌することで黒色の懸濁液を得た。これにアセトン5mLを加え、遠心分離により得られた沈殿物を分離し、もう一度アセトン5mLを加え、沈殿物を攪拌し、遠心分離により1.49gの沈殿物を分離した。分離した沈殿物について、不活性雰囲気で熱重量−質量分析(TG−MS)を行った結果、2.3重量%の重量減少が観測され、この重量減少に対応してミリスチン酸が検出されたことから、得られた沈殿物はミリスチン酸の被覆を有する金属微粒子である。
[Comparative Example 2]
As a comparative example of the surface treatment method according to the present invention, the copper fine particles were surface-treated by the following method without using a complex compound of an alkylamine and a silver compound.
(5.1) Surface treatment of copper fine particles by decomposition of fatty acid silver In this Comparative Example 2, the surface treatment of copper fine particles was carried out by the same method as the surface treatment of copper plates by reductive decomposition of fatty acid silver in (1.2). went.
Specifically, 7.26 g (71.7 mmol) of triethylamine (Tokyo Kasei, special grade) with respect to 1.10 g of copper fine particles having an alkylamine coating synthesized in (2.1) (17.2 mmol as copper) A black suspension was obtained by heating and stirring the mixture to which 1.19 g (3.55 mmol) of silver myristate was added at 90 ° C. for 3 hours. Acetone 5 mL was added to this, the precipitate obtained by centrifugation was separated, acetone 5 mL was added once more, the precipitate was stirred, and 1.49 g of precipitate was separated by centrifugation. The separated precipitate was subjected to thermogravimetric-mass spectrometry (TG-MS) in an inert atmosphere. As a result, a 2.3% weight loss was observed, and myristic acid was detected corresponding to this weight reduction. Therefore, the obtained precipitate is metal fine particles having a myristic acid coating.
(5.2)脂肪酸銀を用いた表面処理を行った銅微粒子の評価
図6には、本比較例で表面処理を行って得られた沈殿物の粉末X線回折結果を他の実施例と比較して示した。本比較例によっても金属銅相と金属銀相の両方が含まれているがこと分かった。図9に、(5.1)で得られた沈殿物のFE−SEM像を示した。表面処理により銅微粒子の表面に数nm〜数10nmの銀微粒子が析出すると共に、その周囲にも銀微粒子が析出して銅微粒子間が充填される様子が観察された。
(5.2) Evaluation of copper fine particles subjected to surface treatment using fatty acid silver FIG. 6 shows the results of the powder X-ray diffraction of the precipitates obtained by performing the surface treatment in this comparative example and other examples. Shown in comparison. It was found that both the metallic copper phase and the metallic silver phase were also contained in this comparative example. FIG. 9 shows an FE-SEM image of the precipitate obtained in (5.1). It was observed that silver fine particles of several nanometers to several tens of nanometers were deposited on the surface of the copper fine particles by the surface treatment, and silver fine particles were also deposited around the copper fine particles and filled between the copper fine particles.
[実施例5]表面処理を行った銅微粒子の焼結性の評価
以下に示す方法で、実施例2,4及び比較例2で表面処理を行った銅微粒子の焼結性を評価した。
(6.1)表面処理された銅微粒子の分散・懸濁液の調製と焼成処理
実施例2,4及び比較例2で得られた沈殿物に対して、沈殿物が50重量%となるようにそれぞれトルエン(関東化学、特級)を加えて沈殿物が分散・懸濁したペーストを調製した。また、比較例3として、(2.1)で合成したままで表面処理を行っていなアルキルアミン被覆を有する銅微粒子1.10g(銅として17.2mmol)と、特許文献4(実施例10)に記載の方法で合成したアルキルアミン被覆を有する銀微粒子0.35g(銀として2.99mmol)とを混合してトルエン1.40mLに分散・懸濁させてペーストを調製した。使用したアルキルアミン被覆を有する銀微粒子は、100℃、60分の焼成で10μΩ・cm程度以下の低い抵抗値を示し、高い相互融着性を有することが確認されているものである。次に調製した各ペーストをスライドガラス(松浪硝子工業株式会社、S1127)の片面にバーコーターを用いて塗布し、トルエンが揮発するまで放置することで塗布膜を得た。塗布膜を設けたスライドガラスをYamatoDK240S送風恒温器(YamatoDK240S)により、大気下で100℃、30〜120分間の焼成処理を行った。
[Example 5] Evaluation of sinterability of copper fine particles subjected to surface treatment The sinterability of copper fine particles subjected to surface treatment in Examples 2 and 4 and Comparative Example 2 was evaluated by the following method.
(6.1) Preparation of dispersion / suspension of surface-treated copper fine particles and baking treatment The precipitates were 50% by weight with respect to the precipitates obtained in Examples 2 and 4 and Comparative Example 2. Toluene (Kanto Chemical Co., Ltd., special grade) was added to each to prepare a paste in which the precipitate was dispersed and suspended. Further, as Comparative Example 3, 1.10 g of copper fine particles having an alkylamine coating that was not subjected to surface treatment as synthesized in (2.1) (17.2 mmol as copper), and Patent Document 4 (Example 10) A paste was prepared by mixing 0.35 g (2.99 mmol as silver) of silver fine particles having an alkylamine coating synthesized by the method described in 1. and dispersing and suspending in 1.40 mL of toluene. The silver fine particles having an alkylamine coating used show a low resistance value of about 10 μΩ · cm or less when baked at 100 ° C. for 60 minutes, and have been confirmed to have high mutual fusion properties. Next, each prepared paste was applied to one side of a slide glass (Matsunami Glass Industrial Co., Ltd., S1127) using a bar coater, and allowed to stand until toluene was volatilized to obtain a coating film. The slide glass provided with the coating film was baked at 100 ° C. for 30 to 120 minutes in the atmosphere with a Yamato DK240S blower thermostat (Yamato DK240S).
(6.2)焼成膜の評価(X線回折)
図10に、実施例2、4、及び、比較例2で表面処理された銅微粒子を焼成して得られた膜のX線回折パターンを示した。いずれの回折パターンも、金属銅と金属銀の存在を示すと共に、大気下での焼成にも関わらず酸化銅等に起因する回折パターンは観察されなかった。一般に、金属銅は容易に酸化されて酸化銅を生じることから、実施例2、4及び比較例2で表面処理を行うことにより表面に銀を析出させた銅微粒子においては、当該銀の被膜により酸化の進行が抑制されていると考えられる。また、実施例2、4の金属銀のシグナルは、比較例2に比べてシャープであり、実施例2,4では銀微粒子の焼結による結晶成長が比較例2に比べて顕著であることが分かる。
(6.2) Evaluation of fired film (X-ray diffraction)
FIG. 10 shows X-ray diffraction patterns of films obtained by firing the copper fine particles surface-treated in Examples 2, 4 and Comparative Example 2. All diffraction patterns showed the presence of metallic copper and metallic silver, and no diffraction pattern due to copper oxide or the like was observed despite firing in the atmosphere. In general, since copper metal is easily oxidized to produce copper oxide, in the copper fine particles in which silver is deposited on the surface by performing surface treatment in Examples 2, 4 and Comparative Example 2, It is considered that the progress of oxidation is suppressed. Further, the signals of metallic silver in Examples 2 and 4 are sharper than those in Comparative Example 2, and in Examples 2 and 4, crystal growth due to the sintering of silver fine particles is more remarkable than in Comparative Example 2. I understand.
(6.3)焼成膜の評価(蛍光X線分析)
表1に、実施例2(2.4)、4(4.1)、及び、比較例2(5.1)で表面処理された銅微粒子を焼成して得られた膜、及び、比較例3で作製したペーストを焼成した膜について、デスクトップ波長分散型蛍光X線装置(リガク Primini)により求めた銀と銅の組成比(重量比)を表1に示した。
(6.3) Evaluation of fired film (X-ray fluorescence analysis)
Table 1 shows films obtained by firing the copper fine particles surface-treated in Examples 2 (2.4), 4 (4.1), and Comparative Example 2 (5.1), and Comparative Examples Table 1 shows the composition ratio (weight ratio) of silver and copper obtained by a desktop wavelength dispersion type fluorescent X-ray apparatus (Rigaku Primini) for the film obtained by firing the paste prepared in 3.
(7.4)焼成膜の評価(電気抵抗値測定)
表2に、実施例2(2.4)、4(4.1)、及び、比較例2(5.1)で表面処理された銅微粒子、及び比較例3に係るペーストについて、焼成の前後での電気抵抗を示した。面抵抗値は四探針法(共和理研K−705RS)により測定した。また、体積抵抗値は触針段差計(ブルカー、DektakXT)で測定した膜厚を面抵抗値に乗じて換算した。なお、表2中において、「塗布膜」はペーストを塗布後にトルエンを揮発させた状態、「焼成膜」はそれぞれの条件(加熱温度、加熱時間)で焼成処理を行った膜について測定を行った結果である。
(7.4) Evaluation of fired film (electric resistance measurement)
Table 2 shows the copper fine particles surface-treated in Examples 2 (2.4), 4 (4.1), and Comparative Example 2 (5.1), and the paste according to Comparative Example 3 before and after firing. The electrical resistance was shown. The sheet resistance value was measured by the four probe method (Kyowa Riken K-705RS). The volume resistance value was converted by multiplying the surface resistance value by the film thickness measured with a stylus profilometer (Bruker, DektakXT). In Table 2, “applied film” was measured for a state in which toluene was volatilized after applying the paste, and “fired film” was measured for a film that was baked under the respective conditions (heating temperature, heating time). It is a result.
表2に示す通り、実施例2(2.4)、及び、実施例4(4.1)で表面処理された銅微粒子は、比較例2(5.1)や比較例3のそれに比べて極めて良好な導電性を示した。このことは、実施例2,4で表面処理された銅微粒子が相互に融着して電気的にも接合を生じていることを示す。一方、比較例2,3においては各粒子間の接合が十分でなく、主に銀微粒子間の接合や、単なる銅微粒子間の接触などによって導電パスが形成されているものと推察される。 As shown in Table 2, the copper fine particles surface-treated in Example 2 (2.4) and Example 4 (4.1) were compared with those in Comparative Example 2 (5.1) and Comparative Example 3. It showed very good conductivity. This indicates that the copper fine particles surface-treated in Examples 2 and 4 are fused to each other to form an electrical connection. On the other hand, in Comparative Examples 2 and 3, the bonding between the particles is not sufficient, and it is assumed that the conductive path is formed mainly by the bonding between the silver fine particles or the simple contact between the copper fine particles.
(7.5)焼成膜の評価(焼成膜の観察1、紫外可視拡散反射スペクトル)
各ペーストの焼成膜の体積抵抗率に違いを生じる理由を明らかにするため、焼成膜の表面状態を紫外可視拡散反射スペクトル(島津 UV−3600)で調べた(図11)。シュウ酸銀を含む錯化合物を用いて表面処理をした実施例2(2.4)、及び、酢酸銀を含む錯化合物を用いて表面処理をした実施例3(3.2)の銅微粒子を焼成した焼成膜に対して、脂肪酸銀の還元による表面処理をした比較例2の焼成膜では、実施例2、3には見られない500nmより長波長側の特徴的な光吸収帯が観測され、目視でも青色を呈していた。この500nmより長波長側の光吸収帯は未焼結状態の銀ナノ微粒子粉の表面プラズモンによる吸収と類似している。このことは、比較例2(5.1)で表面処理された銅微粒子においては、100℃、120分の加熱後にも、図9のFE−SEM像で示した銅微粒子表面を覆っている銀微粒子の融着が殆ど起こっていないこと示している。
(7.5) Evaluation of fired film (observation 1 of fired film, UV-visible diffuse reflection spectrum)
In order to clarify the reason for the difference in the volume resistivity of the fired film of each paste, the surface state of the fired film was examined with an ultraviolet-visible diffuse reflectance spectrum (Shimadzu UV-3600) (FIG. 11). The copper fine particles of Example 2 (2.4) surface-treated with a complex compound containing silver oxalate and Example 3 (3.2) surface-treated with a complex compound containing silver acetate were used. In the fired film of Comparative Example 2 in which the surface treatment by reduction of fatty acid silver was performed on the fired fired film, a characteristic light absorption band on the longer wavelength side than 500 nm that was not seen in Examples 2 and 3 was observed. Visually, it was blue. This light absorption band longer than 500 nm is similar to the absorption by the surface plasmons of the unsintered silver nanoparticle powder. This is because, in the copper fine particles surface-treated in Comparative Example 2 (5.1), the silver covering the copper fine particle surface shown in the FE-SEM image of FIG. 9 even after heating at 100 ° C. for 120 minutes. It shows that there is almost no fusion of fine particles.
(7.6)焼成膜の評価(焼成膜の観察2、FE−SEM像)
図12に、実施例2(2.4)(図12(a))、実施例4(4.1)(図12(b))、及び、比較例2(5.1)(図12(c))で表面処理された銅微粒子の焼成膜のFE−SEM像を示した。実施例2、及び実施例4では、焼成前(図7(a)、(c))に比べて、明らかに銅微粒子表面への銀微粒子の融着が進むと共に、銀微粒子同士の融着を生じており、銀で被覆された銅微粒子同士が融着した銀微粒子によって接合されている様子が観察された。一方で、比較例2(図12(c))では、その焼成前(図9)と比較すると、銀微粒子が独立した形状を維持すると共に、金属銅の結晶表面と思われる平坦な面が露出する様子が観察され、銅微粒子と銀微粒子の融着や銀微粒子同士の融着が顕著には起こっていない様子が観察された。
以上、紫外可視拡散反射スペクトルやFE−SEM像の結果から、比較例2で表面処理された銅微粒子では、銅微粒子の表面に銀微粒子が被着しているものの、必ずしも銀による安定した被覆は生じておらず、その融着性が本発明の実施例に比べて劣っていることが分かる。比較例2では、銅微粒子の表面処理を行う際の銀原子の生成機構が異なると共に、生成する銀微粒子の表面に脂肪酸イオンが付着している。このような違いによって、表面処理時の銅−銀の接合界面の形成や、焼成時の銅−銀微粒子や銀微粒子間の界面接合が妨げられる結果、銅微粒子間の融着による接合を生じ難いものと推測される。
(7.6) Evaluation of fired film (Observation of fired film 2, FE-SEM image)
FIG. 12 shows Example 2 (2.4) (FIG. 12A), Example 4 (4.1) (FIG. 12B), and Comparative Example 2 (5.1) (FIG. 12 ( The FE-SEM image of the fired film | membrane of the copper fine particle surface-treated by c)) was shown. In Example 2 and Example 4, as compared with before firing (FIGS. 7A and 7C), the fusion of the silver fine particles to the surface of the copper fine particles clearly proceeds, and the silver fine particles are fused. It was observed that the copper fine particles coated with silver were joined together by the fused silver fine particles. On the other hand, in Comparative Example 2 (FIG. 12C), the silver fine particles maintain an independent shape as compared with that before firing (FIG. 9), and a flat surface that seems to be a crystal surface of metallic copper is exposed. It was observed that the fusion between the copper fine particles and the silver fine particles and the fusion between the silver fine particles did not occur remarkably.
As described above, from the results of the UV-visible diffuse reflection spectrum and the FE-SEM image, in the copper fine particles surface-treated in Comparative Example 2, although the silver fine particles are deposited on the surface of the copper fine particles, the stable coating with silver is not necessarily performed. It does not occur, and it can be seen that the fusion property is inferior to the example of the present invention. In Comparative Example 2, the generation mechanism of silver atoms during the surface treatment of copper fine particles is different, and fatty acid ions are attached to the surface of the generated silver fine particles. Due to such differences, the formation of a copper-silver bonding interface during surface treatment and the interfacial bonding between copper-silver fine particles and silver fine particles during firing are hindered. Presumed to be.
(比較例3について)
比較例3は、実施例2で銅微粒子の表面処理を行う代わりに、金属銅を介在させない以外は同様の条件で生成させた銀微粒子を混合して焼成を行ったものである。それにも関わらず、実施例2と比較して焼成後の体積抵抗率が大きい理由は、実施例2での表面処理の際に銅微粒子表面に生じる銀被膜の有無によるものと考えられる。つまり、本発明に係る表面処理方法により、金属銅の結晶表面にアミン錯体の分解により銀の原子層を析出させることで、金属銅の表面に銅−銀の界面接合が良好に形成され、当該銀の原子層をバインダーとして金属銅の融着が促進されるものと考えられる。
(Comparative Example 3)
In Comparative Example 3, instead of performing the surface treatment of the copper fine particles in Example 2, silver fine particles produced under the same conditions except that metal copper is not interposed are mixed and fired. Nevertheless, the reason why the volume resistivity after firing is larger than that in Example 2 is considered to be due to the presence or absence of a silver coating formed on the surface of the copper fine particles during the surface treatment in Example 2. That is, by the surface treatment method according to the present invention, by depositing an atomic layer of silver by decomposition of an amine complex on the crystal surface of metal copper, a copper-silver interface junction is favorably formed on the surface of metal copper. It is considered that the fusion of metallic copper is promoted using a silver atomic layer as a binder.
[実施例6]
(耐環境試験)
実施例2(2.4)で表面処理して得られた銅微粒子の塗布膜を、大気下、100℃で焼成して得た焼成膜(実施例5(6.1))について、耐環境試験を行った。具体的には、温度85℃・相対湿度85%に設定した環境試験機(エスペック、LHL−113)内に焼成膜を置いた。少なくとも2週間、その焼成膜を温度85℃・相対湿度85%に曝した場合においては、体積低効率の顕著な増大は観測されず、銅粒子の耐酸化性が保持されることが分かった。
[Example 6]
(Environmental resistance test)
With respect to the fired film (Example 5 (6.1)) obtained by firing the coating film of copper fine particles obtained by surface treatment in Example 2 (2.4) at 100 ° C. in the atmosphere, the environment resistance A test was conducted. Specifically, the fired film was placed in an environmental tester (ESPEC, LHL-113) set at a temperature of 85 ° C. and a relative humidity of 85%. When the fired film was exposed to a temperature of 85 ° C. and a relative humidity of 85% for at least 2 weeks, no significant increase in volumetric efficiency was observed, indicating that the oxidation resistance of the copper particles was maintained.
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JP2016129101A (en) * | 2015-01-09 | 2016-07-14 | 日立化成株式会社 | Composite particle and manufacturing method thereof, electric conductive paste, sintered compact and semiconductor device |
JP2017201052A (en) * | 2016-05-06 | 2017-11-09 | 株式会社村田製作所 | Metal powder production method |
JP7568891B2 (en) | 2020-10-28 | 2024-10-17 | 学校法人 関西大学 | Mixed ink, its manufacturing method, and sintering method for mixed ink |
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JPH1072673A (en) * | 1996-04-30 | 1998-03-17 | Nippon Terupen Kagaku Kk | Production of metallic paste and metallic coating |
JP2008111175A (en) * | 2006-10-31 | 2008-05-15 | Fujikura Kasei Co Ltd | Composite metal powder, its production method, and electrically conductive paste |
JP2009024193A (en) * | 2007-07-17 | 2009-02-05 | Nippon Shokubai Co Ltd | Method for producing metallic nanoparticle, metallic nanoparticle, dispersion of metallic nanoparticle, and metallic coating film |
JP2010275638A (en) * | 2010-07-12 | 2010-12-09 | Dowa Holdings Co Ltd | Silver-coated copper powder and conductive paste |
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JPH1072673A (en) * | 1996-04-30 | 1998-03-17 | Nippon Terupen Kagaku Kk | Production of metallic paste and metallic coating |
JP2008111175A (en) * | 2006-10-31 | 2008-05-15 | Fujikura Kasei Co Ltd | Composite metal powder, its production method, and electrically conductive paste |
JP2009024193A (en) * | 2007-07-17 | 2009-02-05 | Nippon Shokubai Co Ltd | Method for producing metallic nanoparticle, metallic nanoparticle, dispersion of metallic nanoparticle, and metallic coating film |
JP2010275638A (en) * | 2010-07-12 | 2010-12-09 | Dowa Holdings Co Ltd | Silver-coated copper powder and conductive paste |
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JP2016129101A (en) * | 2015-01-09 | 2016-07-14 | 日立化成株式会社 | Composite particle and manufacturing method thereof, electric conductive paste, sintered compact and semiconductor device |
JP2017201052A (en) * | 2016-05-06 | 2017-11-09 | 株式会社村田製作所 | Metal powder production method |
JP7568891B2 (en) | 2020-10-28 | 2024-10-17 | 学校法人 関西大学 | Mixed ink, its manufacturing method, and sintering method for mixed ink |
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