JP2016096276A - Wavelength conversion member and backlight unit having the same, liquid crystal display device, and method for manufacturing wavelength conversion member - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide: a wavelength conversion member arranged so that the occurrence of curl: a method for manufacturing such a wavelength conversion member; a device for manufacturing a wavelength conversion member; a backlight unit having such a wavelength conversion member; and a liquid crystal display device.SOLUTION: A method for manufacturing a wavelength conversion member 1 comprises the steps of: applying a polymerizable composition including quantum dots onto one face of a first base material 10, thereby forming a coating film 30M; putting a second base material 20 on the coating film 30M, thereby using the first base material 10 and the second base material 20 to hold the coating film 30M therebetween; and casting activation energy rays Eon the coating film 30M from one face thereof to cure the coating film and casting activation energy rays Eon the coating film 30M from the other face to cure the coating film 30M, thereby forming a wavelength conversion layer 30. In the wavelength conversion member, the indentation hardness N1 of the wavelength conversion layer 30 on the side of the first base material 10 and the indentation hardness N2 on the side of the second base material 20 are in the relation given by: |N1-N2|≤20 MPa.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a wavelength conversion member having a wavelength conversion layer including quantum dots that emit fluorescence when irradiated with excitation light, a backlight unit including the wavelength conversion layer, a liquid crystal display device, and a method for manufacturing the wavelength conversion member.

  Flat panel displays such as liquid crystal display devices (hereinafter also referred to as LCDs) have low power consumption and are increasingly used as space-saving image display devices year by year. The liquid crystal display device is composed of at least a backlight and a liquid crystal cell, and usually further includes members such as a backlight side polarizing plate and a viewing side polarizing plate.

  In recent years, for the purpose of improving the color reproducibility of LCDs, the wavelength conversion member of a backlight unit has a configuration including a wavelength conversion layer containing quantum dots (also referred to as Quantum Dot, QD, quantum dots) as a light emitting material. It is attracting attention (see Patent Document 1). The wavelength conversion member is a member that converts the wavelength of light incident from the light source unit and emits it as white light. In the wavelength conversion layer containing the quantum dots as the light emitting material, two or three types having different light emission characteristics are used. The white light can be realized using fluorescence emitted from the quantum dots excited by light incident from the light source unit.

  Fluorescence due to quantum dots has high luminance and a small half-value width, so that LCDs using quantum dots are excellent in color reproducibility. With the progress of the three-wavelength light source technology using such quantum dots, the color gamut has been expanded from the current TV standard (FHD, NTSC (National Television System Committee) ratio of 72% to 100%.

  Quantum dots have a problem that when oxygen comes into contact, the light emission intensity decreases due to a photo-oxidation reaction. In this regard, Patent Document 1 proposes a structure in which a wavelength conversion layer including quantum dots is sandwiched between base materials (barrier films) having high oxygen barrier properties in order to protect the quantum dots from oxygen and the like. Yes.

  As a method of sandwiching the wavelength conversion layer between the base materials, the other base material is attached to the sheet prepared by applying and curing a coating solution of a polymerizable composition containing quantum dots on the base material via an adhesive or the like. The attaching (laminating) method is common.

  Although this is a completely different field from the field of the present invention, as a method for forming plastic into a sheet, a photosensitive composition in which a photosensitive composition is spread on a metal roll surface and cured by irradiation with light. The molding method is disclosed in Permissible Literatures 2 to 4 and the like. A plastic film laminating method is disclosed in Patent Document 5 and the like.

US Patent Application Publication No. 2012/0113672 JP-A-2-214622 Japanese Patent Laid-Open No. 2-229011 JP-A-1-123709 JP-A-1-174435

Since the method of sandwiching the wavelength conversion layer between the base materials using the method described in Patent Document 1 attaches (laminates) the base material using an adhesive, the thickness increases by the amount of the adhesive. There is a problem that only relatively thick sheets can be made. In addition, since the step of attaching the quantum dot sheet and the base material is necessary separately from the coating step, there is a problem that the cost is high, and defects due to adhesion of dust and the like tend to increase as the number of steps increases.
As a novel method for solving such problems, a wavelength conversion layer containing quantum dots is applied to a base material, and then the other base material is bonded to the front of the wavelength conversion layer, followed by curing. Thus, a manufacturing method can be considered.

  The diligent research of the present inventors has revealed a problem that when the wavelength conversion member is produced using the production method as described above, the wavelength conversion member may be curled. If the wavelength conversion member has a curl, peeling may occur between the base material and the wavelength conversion layer due to the distortion. Further, when the curled wavelength conversion member is incorporated in a backlight unit in a liquid crystal display device, display unevenness may occur due to optical contact with other members.

This invention is made | formed in view of the said situation, and it aims at providing the wavelength conversion member which suppressed generation | occurrence | production of curl, and its manufacturing method.
Another object of the present invention is to provide a backlight and a liquid crystal display device provided with a wavelength conversion member.

The present inventors have found that the above problem is caused by a configuration peculiar to the wavelength conversion layer containing quantum dots. When producing a wavelength conversion layer containing quantum dots, in order to efficiently obtain the quantum dot effect, the polymerization that constitutes the wavelength conversion layer is aimed at increasing the efficiency by scattering the light and lengthening the optical path. In order not to impair the uniformity of the film when the scattering composition is included in the adhesive composition or the substrate is bonded to the coating film, inorganic particles or the like are added to increase the viscosity. Furthermore, as a base material, the barrier film which provided the barrier layer to various plastic films may be used, or the laminated film provided with the layer which provided the scattering layer and the slipping agent may be used. It has been found that the addition of these functional particles and the addition of a functional layer significantly reduce the hardening efficiency (polymerization reactivity) of the polymerizable composition by irradiation with active energy rays typified by ultraviolet rays. In the conventional wavelength conversion member manufacturing apparatus, the curing process is configured to irradiate the active energy ray only from one surface side of the coating film, so that the uncured portion of the coating film remains on the other surface side. As a result, it was found that there was a difference in the rate of hardening between the front and back surfaces of the coating film, resulting in curling.
The present invention has been made based on the above findings.

  In addition, the problem by the uncured part remaining in the coating film is not only that the wavelength conversion member is curled, but also the phenomenon that the adhesion between the wavelength conversion layer and the substrate is reduced, or the presence of an uncured part. Film stability of the wavelength conversion layer, such as various types of durability degradation, internal layer flow, and non-uniform film thickness. In severe cases, film cracks may occur. It becomes a factor to reduce.

The wavelength conversion member of the present invention includes a first base material, a second base material, a first base material, and one surface between the first base material and the second base material. A wavelength conversion member provided with a wavelength conversion layer including quantum dots that are excited by excitation light and emit fluorescent light, which are disposed in contact with each other on the base material of 2;
The wavelength conversion layer is a cured layer obtained by irradiating an active energy ray to a coating film made of a polymerizable composition containing quantum dots and a polymerizable compound,
In the wavelength conversion member, the first base material side indentation hardness N1 and the second base material side indentation hardness N2 of the wavelength conversion layer are in the relationship of the following formula.
| N1-N2 | ≦ 20MPa

  The indentation hardness on the first base material side and the indentation hardness on the second base material side of the wavelength conversion layer are measured by the measurement method described in the paragraph [Mode for Carrying Out the Invention] below. Shall. In addition, the 1st base material side is the predetermined position near the interface with a 1st base material from the center of thickness in the thickness direction of a wavelength conversion layer, and the 2nd base material side is the thickness of a wavelength conversion layer. The indentation hardness is the same as the distance from the interface with the first substrate and the distance from the interface with the second substrate. Measure at position.

  The polymerizable composition for constituting the wavelength conversion layer preferably contains at least one radically polymerizable compound.

The quantum dot is a quantum dot having an emission center wavelength in a wavelength band of 600 nm to 680 nm, a quantum dot having an emission center wavelength in a wavelength band of 520 nm to 560 nm, and a quantum having an emission center wavelength in a wavelength band of 430 nm to 480 nm. It is preferable that at least one kind is selected from the group consisting of dots.
The half width of the emission peak of the quantum dots is preferably 70 nm or less, more preferably 60 nm or less, and further preferably 50 nm or less.

  In the present specification, the “half-value width” of the emission peak means the width of the peak at the peak height ½. Further, light having an emission center wavelength in the wavelength band of 430 to 480 nm is called blue light, light having an emission center wavelength in the wavelength band of 500 to 600 nm is called green light, and the emission center wavelength is in the wavelength band of 600 to 680 nm. The light having a color is called red light.

  The backlight unit of the present invention includes at least the wavelength conversion member of the present invention and a light source composed of a blue light emitting diode or an ultraviolet light emitting diode that emits excitation light.

  The liquid crystal display device of the present invention includes at least the backlight unit of the present invention and a liquid crystal cell.

The method for producing a wavelength conversion member of the present invention is a method for producing a wavelength conversion member having a wavelength conversion layer including quantum dots that are excited by excitation light and emit fluorescence.
Applying a polymerizable composition containing quantum dots on one side of the first substrate to form a coating film,
Overlaying the second base material on the coating film to sandwich the coating film between the first base material and the second base material,
A wavelength conversion member that forms a wavelength conversion layer by irradiating an active energy ray from one side of the coating to cure the coating, and irradiating an active energy ray from the other side of the coating to cure the coating. It is a manufacturing method.

  According to the method for manufacturing a wavelength conversion member of the present invention, the wavelength conversion member of the present invention can be easily manufactured.

  In the manufacturing method of the wavelength conversion member of this invention, after irradiating an active energy ray to a coating film in the process of hardening a coating film, you may heat a coating film.

The wavelength conversion member manufacturing apparatus of the present invention is a roll-to-roll wavelength conversion member manufacturing apparatus that implements the above-described method of manufacturing a wavelength conversion member of the present invention,
An application part for applying a polymerizable composition containing quantum dots on one side of the first substrate to form a coating film, and a second substrate superimposed on the coating film to overlap the first substrate and the second substrate Applying the active energy ray from one side of the coating film to cure the coating film, and applying the active energy ray from the other side of the coating film A curing treatment unit that cures to form a wavelength conversion layer,
In the curing processing unit, a first active energy ray irradiating device that irradiates an active energy ray on one surface side of the coating film sandwiched between the first base material and the second base material conveyed as a workpiece. A second active energy ray irradiating device for irradiating active energy rays on the other surface side of the coating film,
It is a wavelength conversion member manufacturing apparatus which irradiates one surface and the other surface of a coating film with an active energy ray simultaneously or sequentially.

In the wavelength conversion member manufacturing apparatus of the present invention, at least one of the first active energy ray irradiation device and the second active energy ray irradiation device is provided with a back roll at a position facing through the coating film,
Active energy by the first or second active energy ray irradiation device disposed at a position facing the back roll in a state where the non-coating surface of the substrate on one or the other side of the coating is in contact with the back roll It is good also as a structure which irradiates a line | wire.

  The diameter of the back roll is preferably 300 mm or more.

In the curing processing unit of the wavelength conversion member manufacturing apparatus of the present invention, at least one of the first active energy ray irradiation device and the second active energy ray irradiation device is in a region where the coating film is linearly supported and conveyed. Has been placed,
It is good also as a structure which irradiates an active energy ray to the coating film supported linearly.

  In the wavelength conversion member manufacturing apparatus of this invention, the heating part which heats a coating film may be provided in the downstream of the hardening process part.

The wavelength conversion member of the present invention includes a first base material, a second base material, a first base material, and one surface between the first base material and the second base material. A wavelength conversion member including a quantum dot that is excited by excitation light and emits fluorescence when the other surface is in contact with the other substrate, wherein the wavelength conversion layer is a quantum conversion layer It is a cured layer obtained by irradiating an active energy ray to a coating film composed of a polymerizable composition containing dots and a polymerizable compound, and has an indentation hardness N1 on the first substrate side of the wavelength conversion layer and a second The substrate side indentation hardness N2 is
| N1-N2 | ≦ 20MPa
Since the difference in the indentation hardness between the first substrate side and the second substrate side of the wavelength conversion layer is small, the occurrence of curling can be suppressed. Since the occurrence of curling is suppressed, the occurrence of problems due to curling such as delamination between layers can be suppressed.

It is a cross-sectional schematic diagram of the wavelength conversion member which concerns on embodiment of this invention. It is a schematic diagram for demonstrating the measuring method of induration hardness. It is a cross-sectional schematic diagram of the wavelength conversion member of another form. It is a schematic diagram which shows the manufacturing process of the wavelength conversion member shown in FIG. It is a schematic block diagram of the wavelength conversion member manufacturing apparatus which concerns on embodiment of this invention. It is an enlarged view of the hardening process part of the wavelength conversion member manufacturing apparatus of FIG. It is the structural variation (the 1) of the hardening process part of the wavelength conversion member manufacturing apparatus. It is a structural variation (the 2) of the hardening process part of the wavelength conversion member manufacturing apparatus. It is a structural variation (the 3) of the hardening process part of the wavelength conversion member manufacturing apparatus. It is a structural variation (the 4) of the hardening process part of the wavelength conversion member manufacturing apparatus. It is a structural variation (the 5) of the hardening process part of the wavelength conversion member manufacturing apparatus. It is a structural variation (the 6) of the hardening process part of the wavelength conversion member manufacturing apparatus. It is a structural variation (the 7) of the hardening process part of the wavelength conversion member manufacturing apparatus. It is a schematic diagram which shows the manufacturing process of the wavelength conversion member shown in FIG. It is a schematic block diagram of the wavelength conversion member manufacturing apparatus which concerns on embodiment of this invention. It is a schematic block diagram of a backlight unit. It is a schematic block diagram of a liquid crystal display device.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the drawings of this specification, the scale of each part is appropriately changed and shown for easy visual recognition. In the present specification, a numerical range represented by using “to” means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.

[Wavelength conversion member]
FIG. 1 is a schematic cross-sectional view of a wavelength conversion member 1 according to the first embodiment of the present invention.
The wavelength conversion member 1 of this embodiment is excited by excitation light between the first base material 10, the second base material 20, and the first base material 10 and the second base material 20. And a wavelength conversion layer 30 including quantum dots 31 that emit fluorescence.
The wavelength conversion layer 30 is a cured layer obtained by irradiating a coating film made of a polymerizable composition containing quantum dots 31 and a polymerizable compound with active energy rays, and an organic matrix 32 formed by polymerizing the polymerizable compound. This is a layer in which the quantum dots 31 are dispersed. And the foundation hardness N1 by the side of the 1st base material 10 side of the wavelength conversion layer 30 and the foundation hardness N2 by the side of the 2nd base material 20 have the relationship of the following formula.
| N1-N2 | ≦ 20MPa

  Here, it is preferable that the 1st base material 10 and the 2nd base material 20 have oxygen barrier property. Details of the substrate will be described later.

The indentation hardness N1 and N2 are measured by the following method.
First, a thin piece as shown in FIG. 2, for example, as shown in FIG. 2, in which an arbitrary position of the wavelength conversion member 1 is cut by a cross-section using a microtome (for example, an ultra microtome UC6 manufactured by LEICA), Is made. The interface 10B between the first base material 10 and the wavelength conversion layer 30 and the interface 20B between the second base material 20 and the wavelength conversion layer 30 on the cut surface are confirmed by an optical microscope. The thickness of the flakes is 5 μm. The indentation hardness is measured at a position P _{1 at} a predetermined distance x from the interface 10B to the inside of the wavelength conversion layer and at a position P _{2 at a} predetermined distance x from the interface 20B to the inside of the wavelength conversion layer. In-retardation hardness at the position P ₁ of the first substrate side N1, the indentation hardness at the position P ₂ of the second substrate side and N2. The indentation hardness can be measured with a micro indentation tester (for example, TI950 Tribodenter (manufactured by HYSITRON)) using a Barcovic indenter.
The distance x from the interface with the substrate of each of the measurement positions P ₁ and P ₂ of the indentation hardness on one surface side and the other surface side of the wavelength conversion layer 30 is equal. The distance x is preferably 1 to 5 μm, particularly preferably about 3 μm.

The smaller the difference between the indentation hardness N1 and N2 is 20 MPa or less, the more preferable curling can be suppressed.
The range of the foundation hardness N1 and N2 is preferably 100 to 700 MPa, more preferably 200 to 600 MPa, and particularly preferably 250 to 550 MPa. If the indentation hardness N1 or N2 is too low, the cohesive force of the film will be insufficient, so that the adhesion to the substrate will be inferior. If N1 and N2 are too high, the film will become hard and brittle, and cracks will occur during cutting. Can fail. When it exists in the said range, since the film | membrane is fully hardened | cured and a cured film is equipped with appropriate cohesion force and a softness | flexibility, it is preferable.

FIG. 3 is a schematic cross-sectional view of another form of the wavelength conversion member 11.
The wavelength conversion member 11 of this embodiment includes an adhesive layer 21 between the second base material 20 and the wavelength conversion layer 30 in the wavelength conversion member 11 according to the first embodiment shown in FIG. Although different in point, other configurations are the same as those of the wavelength conversion member 1 of the first embodiment.
Also in the wavelength conversion member 11, the foundation hardness N <b> 1 on the first base material 10 side of the wavelength conversion layer 30 and the foundation hardness N <b> 2 on the second base material 20 side have the following relationship.
| N1-N2 | ≦ 20MPa
In the case of the configuration of the present embodiment, in the above-described method for measuring the hardness of the indentation, the indentation hardness N2 on the second substrate side in the wavelength conversion layer 30 is the interface between the adhesive layer 21 and the wavelength conversion layer 30. It is assumed that measurement is performed at a position at a predetermined distance x.

  Below, each layer which comprises the wavelength conversion members 1 and 11 is explained in full detail.

-Wavelength conversion layer-
As already described, the wavelength conversion layer 30 is a cured layer formed by irradiating a polymerizable composition with active energy rays, and is a quantum dot that generates fluorescence when irradiated with excitation light in the organic matrix 32. 31 is distributed. The shape of the wavelength conversion layer is not particularly limited, and can be an arbitrary shape. In FIG. 1, the quantum dots 31 are greatly illustrated for easy viewing. Actually, for example, the diameter of the quantum dots 31 is about 2 to 10 nm with respect to the thickness 30 to 100 μm of the wavelength conversion layer 30. is there.

  The thickness of the wavelength conversion layer 30 is preferably in the range of 1 to 500 μm, more preferably in the range of 10 to 250 μm, and still more preferably in the range of 20 to 150 μm. A thickness of 1 μm or more is preferable because a high wavelength conversion effect can be obtained. Further, it is preferable that the thickness is 500 μm or less because the backlight unit can be thinned when incorporated in the backlight unit.

(Quantum dot)
The quantum dots 31 are excited by incident excitation light and emit fluorescence. Known quantum dots include quantum dots (A) having an emission center wavelength in the wavelength band of 600 nm to 680 nm, quantum dots (B) having an emission center wavelength in the wavelength band of 500 nm to 600 nm, and 400 nm to 500 nm. There is a quantum dot (C) having a light emission center wavelength in the wavelength band, and the quantum dot (A) is excited by excitation light to emit red light, the quantum dot (B) emits green light, and the quantum dot (C). Emits blue light.
In particular, quantum dots (A), (B), and (C) preferably have a half-value width of an emission peak of 70 nm or less, more preferably 60 nm or less, and even more preferably 50 nm or less.

  For example, when blue light is incident as excitation light on a wavelength conversion member including quantum dots (A) and quantum dots (B), red light emitted from the quantum dots (A) and light emitted from the quantum dots (B) White light can be realized by green light and blue light transmitted through the wavelength conversion member. Alternatively, by making ultraviolet light incident on the wavelength conversion member including the quantum dots (A), (B), and (C) as excitation light, the red light emitted from the quantum dots (A) and the quantum dots (B) White light can be realized by the emitted green light and the blue light emitted by the quantum dots (C).

  Regarding quantum dots, for example, JP 2012-169271 A paragraphs 0060 to 0066 can be referred to, but are not limited to those described here. As the quantum dots, commercially available products can be used without any limitation.

Quantum dots may be added to the polymerizable composition in the form of particles, or may be added in the form of a dispersion dispersed in a solvent. The addition in the state of a dispersion is preferable from the viewpoint of suppressing the aggregation of the quantum dot particles. The solvent used here is not particularly limited. However, since it is preferable that the polymerizable composition does not contain a substantially volatile organic solvent, when the polymerizable composition is added to the polymerizable composition in a state of dispersion in which the quantum dots are dispersed in the solvent, the polymerizable composition is the first. It is preferable to include a step of drying the solvent in the polymerizable composition before coating on the base material to form a coating film. From the viewpoint of reducing the step of drying the solvent, it is also preferable to add the quantum dots in the form of particles to the polymerizable composition.
Note that the volatile organic solvent means a compound that has a boiling point of 160 ° C. or lower and is liquid at 20 ° C. and does not cure due to an external stimulus. The boiling point of the volatile organic solvent is 160 ° C. or lower, more preferably 115 ° C. or lower, and most preferably 30 ° C. or higher and 100 ° C. or lower.

When the polymerizable composition does not contain a substantially volatile organic solvent, the ratio of the volatile organic solvent in the polymerizable composition is preferably 10,000 ppm or less, and more preferably 1000 ppm or less.
A quantum dot can be added about 0.01-10 mass parts with respect to 100 mass parts of whole quantity of polymeric composition, for example.

(Polymerizable compound)
As the polymerizable compound, an actinic radiation curable polymerizable compound is included. An actinic radiation curable polymerizable compound refers to a compound that becomes a resin by being cured through a crosslinking reaction and a polymerization reaction when irradiated with active energy rays. Active energy rays refer to electromagnetic waves such as ultraviolet rays, electron beams, radiation (α rays, β rays, γ rays, etc.). As the active ray curable polymerizable compound, for example, a compound having a functional group such as light (ultraviolet ray), electron beam, radiation curable polyfunctional monomer or polyfunctional oligomer is used, and includes at least one radical polymerizable compound. It is preferable. The functional group contained in the polymerizable compound is preferably a photopolymerizable functional group. Examples of the photopolymerizable functional group include unsaturated polymerizable functional groups such as a (meth) acryloyl group, a vinyl group, a styryl group, and an allyl group.

(Thixotropic agent)
It is preferable to add a thixotropic agent to the polymerizable composition. The thixotropic agent is an inorganic compound or an organic compound.
In the case of an inorganic thixotropic agent, it is preferably an inorganic particle having an aspect ratio of 1.2 to 300, more preferably an inorganic particle of 2 to 200, particularly preferably an inorganic particle of 5 to 200, 5 to 100 inorganic particles are more preferable, and 5 to 50 inorganic particles are even more particularly preferable. By setting this range, it is possible to control the presence state of the quantum dots to be used together, to reduce unnecessary internal scattering caused by the inorganic thixotropic agent, and to improve the contrast.
The long-axis length of the inorganic thixotropic agent is preferably 5 nm or more and 1 μm or less, and more preferably 5 nm or more and 300 nm or less.

  Any inorganic thixotropic agent that satisfies the above aspect ratio can be used without any particular limitation. For example, acicular compounds, chain compounds, flat compounds, and layer compounds can be preferably used. Of these, a layered compound is preferable.

  There are no particular restrictions on the layered compound, but talc, mica, feldspar, kaolinite (kaolin clay), pyrophyllite (waxite clay), sericite (sericite), bentonite, smectite vermiculites (montmorillonite, beidellite, Nontronite, saponite, etc.), organic bentonite, organic smectite and the like.

  As the inorganic thixotropic agent, silica, alumina, silicon nitride, titanium dioxide, calcium carbonate, zinc oxide, or the like can be used regardless of the aspect ratio. If necessary, these compounds can be subjected to a treatment for adjusting hydrophilicity or hydrophobicity on the surface.

  Examples of organic thixotropic agents include polyolefin oxide and modified urea.

  The content of the thixotropic agent is preferably 0.1 to 20 parts by mass, more preferably 0.2 to 10 parts by mass with respect to 100 parts by mass of the curable compound in the polymerizable composition. 2 to 8 parts by mass is particularly preferable. In particular, in the case of an inorganic thixotropic agent, brittleness tends to be improved when it is 20 parts by mass or less with respect to 100 parts by mass of the curable compound.

(Polymerization initiator)
The polymerizable composition used in the present invention can contain a known photopolymerization initiator as a polymerization initiator. JP, 2013-043382, A paragraph 0037 can be referred to for a polymerization initiator, for example. The polymerization initiator is preferably 0.1 mol% or more, more preferably 0.5 to 2 mol% of the total amount of the polymerizable compounds contained in the polymerizable composition. Moreover, it is preferable to contain 0.1 mass%-10 mass% with respect to the total polymerizable composition except a volatile organic solvent, More preferably, it is 0.2 mass%-8 mass%.

(Silane coupling agent)
Since the wavelength conversion layer formed from the polymerizable composition containing a silane coupling agent has strong adhesion to an adjacent layer by the silane coupling agent, it can exhibit excellent light resistance. This is mainly due to the fact that the silane coupling agent contained in the wavelength conversion layer forms a covalent bond with the surface of the adjacent layer and the components of the wavelength conversion layer by hydrolysis reaction or condensation reaction. In addition, when the silane coupling agent has a reactive functional group such as a radical polymerizable group, a monomer component constituting the wavelength conversion layer and a cross-linked structure can also be formed, thereby improving the adhesion between the wavelength conversion layer and the adjacent layer. Can contribute.
As the silane coupling agent, a known silane coupling agent can be used without any limitation. As a preferable silane coupling agent from the viewpoint of adhesion, a silane coupling agent represented by the following general formula (1) described in JP2013-43382A can be exemplified.

General formula (1)
(In General Formula (1), R _{1 to} R ₆ are each independently a substituted or unsubstituted alkyl group or aryl group, provided that at least one of R _{1 to} R ₆ is a radical polymerizable group. This is a substituent containing a carbon-carbon double bond.)

-1st base material, 2nd base material-
As long as the 1st base material 10 and the 2nd base material 20 can support the coating film for wavelength conversion layers, even if it is a single layer or a laminated body which consists of a plurality of layers, In order to protect the conversion layer from oxygen, a structure including a barrier layer is particularly preferable.
In the wavelength conversion member manufacturing method of the present invention, it is preferable that at least one of the first base material and the second base material is a flexible film.
As a flexible film having a barrier function, a barrier film comprising a barrier layer on at least one surface of a flexible support is preferably used.

It is preferable that the thickness of the 1st base material 10 and the 2nd base material 20 is 10-100 micrometers. The thicknesses of the first base material 10 and the second base material 20 are more preferably 15 μm to 60 μm from the viewpoint of reducing the thickness of the applied product and preventing wrinkles. Moreover, the 1st base material 10 and the 2nd base material 20 have a width | variety of 300-1500 mm, for example. The thickness and width of each of the first base material 10 and the second base material 20 are appropriately selected depending on the product to be applied.
In addition, it is preferable to apply the polymerizable composition with a width narrower than the width (base material width) of the first base material and the second base material. The coating width of the polymerizable composition is preferably 10 to 200 mm narrower than the width of the first base material and the second base material (base material width).

The barrier film is not particularly limited, but generally oxygen or moisture on at least one surface of a flexible support such as cellulose acylate, cyclic olefin, acrylic resin, polyethylene terephthalate resin, and polycarbonate resin. The structure provided with the barrier layer which contains the inorganic layer which has the barrier property with respect to 1 layer or more is common.
The barrier film may include a barrier layer having a laminated structure including at least one inorganic layer and at least one organic layer of a flexible support. Laminating a plurality of layers in this manner is preferable from the viewpoint of improving the weather resistance because the barrier property can be further enhanced. On the other hand, as the number of layers to be stacked increases, the light transmittance of the wavelength conversion member tends to decrease. Therefore, it is desirable to increase the number of layers within a range in which good light transmittance can be maintained. Specifically, the barrier film preferably has a total light transmittance in the visible light region of 80% or more and an oxygen permeability of 5.00 cm ³ / (m ² · day · atm) or less. preferable. The total light transmittance is an average value of light transmittance over the visible light region.
The oxygen permeability of the barrier film is more preferably 1 cm ³ / (m ² · day · atm) or less, particularly preferably 0.1 cm ³ / (m ² · day · atm) or less, and more particularly preferably 0. .01 cm ³ / (m ² · day · atm) or less

The inorganic layer and the organic layer constituting the barrier layer will be described.
Here, the “inorganic layer” is a layer mainly composed of an inorganic material, and is preferably a layer formed only from an inorganic material. On the other hand, the “organic layer” is a layer mainly composed of an organic material, and preferably refers to a layer in which the organic material occupies 50% by mass or more, more preferably 80% by mass or more, particularly 90% by mass or more. Shall.

(Inorganic layer)
The inorganic material constituting the inorganic layer is not particularly limited, and for example, various inorganic compounds such as metals or inorganic oxides, nitrides, oxynitrides, and the like can be used. As an element constituting the inorganic material, silicon, aluminum, magnesium, titanium, tin, indium and cerium are preferable, and one or two or more of these may be included. Specific examples of the inorganic compound include silicon oxide, silicon oxynitride, aluminum oxide, magnesium oxide, titanium oxide, tin oxide, indium oxide alloy, silicon nitride, aluminum nitride, and titanium nitride. As the inorganic layer, a metal film such as an aluminum film, a silver film, a tin film, a chromium film, a nickel film, or a titanium film may be provided. An organic layer may be provided adjacent to the inorganic layer. The organic layer is mainly composed of an acrylate as a main component, but is not limited. Other materials may be used as long as they protect the inorganic layer.

  Among the above materials, the inorganic layer having the barrier property is particularly preferably an inorganic layer containing at least one compound selected from silicon nitride, silicon oxynitride, silicon oxide, and aluminum oxide. Since the inorganic layer made of these materials has good adhesion to the organic layer, even when the inorganic layer has pinholes, the organic layer can effectively fill the pinholes and suppress breakage. In addition, it is possible to form an extremely excellent inorganic layer film even in a case where an inorganic layer is further laminated, and to further increase the barrier property.

  A method for forming the inorganic layer is not particularly limited, and various film forming methods that can evaporate or scatter the film forming material and deposit it on the deposition surface can be used.

  Examples of the method for forming the inorganic layer include a vacuum evaporation method in which an inorganic material such as an inorganic oxide, an inorganic nitride, an inorganic oxynitride, or a metal is heated and evaporated; an inorganic material is used as a raw material, and oxygen gas is introduced. Oxidation reaction vapor deposition method for oxidizing and vapor-depositing; Sputtering method for vapor deposition by introducing and sputtering argon gas and oxygen gas using an inorganic material as a target raw material; When a vapor deposition film of silicon oxide or silicon nitride is formed by using a physical vapor deposition method (physical vapor deposition method) such as an ion plating method, which is heated by a plasma beam and deposited, an organic silicon compound is used as a raw material. Plasma Chemical Vapor Deposition (Chemical Vapor Deposition) ), And the like.

  The silicon oxide film can also be formed by using a low temperature plasma chemical vapor deposition method using an organosilicon compound as a raw material. Specific examples of the organosilicon compound include 1,1,3,3-tetramethyldisiloxane, hexamethyldisiloxane, vinyltrimethylsilane, hexamethyldisilane, methylsilane, dimethylsilane, trimethylsilane, diethylsilane, and propyl. Examples thereof include silane, phenylsilane, vinyltriethoxysilane, tetramethoxysilane, phenyltriethoxysilane, methyltriethoxysilane, and octamethylcyclotetrasiloxane. Among the organosilicon compounds, tetramethoxysilane (TMOS) and hexamethyldisiloxane (HMDSO) are preferably used. This is because these are excellent in handleability and vapor deposition film characteristics.

  The thickness of the inorganic layer is preferably 10 nm to 500 nm, more preferably 10 nm to 300 nm, and particularly preferably 10 nm to 150 nm. When the film thickness of the inorganic layer is within the above-described range, it is possible to suppress the reflection in the inorganic layer while realizing good barrier properties, and to provide a light conversion member with higher light transmittance. Because it can.

(Organic layer)
JP, 2007-290369, A paragraphs 0020-0042 and JP, 2005-096108, A paragraphs 0074-0105 can be referred to as an organic layer. The organic layer preferably contains a cardo polymer. Thereby, the adhesiveness between the organic layer and the adjacent layer, particularly the adhesiveness with the inorganic layer is improved, and a further excellent gas barrier property can be realized. For details of the cardo polymer, reference can be made to paragraphs 0085 to 0095 of the above-mentioned JP-A-2005-096108. The thickness of the organic layer is preferably in the range of 0.05 μm to 10 μm, and more preferably in the range of 0.5 to 10 μm. When the organic layer is formed by a wet coating method, the film thickness of the organic layer is preferably in the range of 0.5 to 10 μm, and more preferably in the range of 1 μm to 5 μm. Moreover, when formed by the dry coating method, it is preferable that it exists in the range of 0.05 micrometer-5 micrometers, especially in the range of 0.05 micrometer-1 micrometer. This is because when the film thickness of the organic layer formed by the wet coating method or the dry coating method is within the above-described range, the adhesion with the inorganic layer can be further improved.

  As for other details of the inorganic layer and the organic layer, reference can be made to the descriptions in JP-A-2007-290369, JP-A-2005-096108, and US2012 / 0113672A1.

In addition, if necessary for the barrier film, a scattering layer, a slipperiness-imparting layer, a Newton ring prevention layer, and various light reflecting layers on the opposite side of the barrier layer composed of the above-mentioned inorganic layer and organic layer with the substrate interposed therebetween, A light absorption layer, a light selective reflection layer, or the like may be provided. The scattering layer is preferably a layer in which organic and inorganic particles are supported on various binders. The slipperiness-imparting layer may be one in which organic or inorganic particles are supported on various binders, or a binder layer containing fluorine or silicon. The light reflection layer, light absorption layer, and light selective reflection layer are those that provide scattering and reflection functions by inorganic and organic particles, those that have absorption and reflection functions by fine nanostructures, and reflection functions by the arrangement structure of liquid crystals. It may be configured to have
The scattering layer, the slipperiness-imparting layer, the Newton ring prevention layer, and various light reflecting layers, light absorbing layers, light selective reflecting layers, etc. may be formed on the same surface as the barrier layer if necessary. May be.

"Method and apparatus for manufacturing wavelength conversion member"
Hereinafter, embodiments of the method and apparatus for manufacturing a wavelength conversion member of the present invention will be described.
FIG. 4 is a schematic view showing a manufacturing process of the wavelength conversion member 1 having the cross section shown in FIG. As shown in FIG. 4, according to the method for manufacturing a wavelength conversion member of this embodiment, a polymerizable composition containing quantum dots is applied to one surface of the first substrate 10 to form a coating film 30M. The first laminated film 13 is formed (application process), the second base material 20 is overlapped with the coating film 30M, and the first base material 10 and the second base material 20 sandwich the coating film 30M. The laminated film 14 of _No. 2 is formed (sticking step), the active energy ray E ₁ is irradiated from one side (one substrate side) of the coating film 30M to cure the coating film 30M, and the other side of the coating film by irradiation with active energy rays E ₂ from (other substrate side) to cure the coating 30M to form a wavelength converting layer 30 (curing step) to produce the wavelength conversion member 1.
The irradiation of the active energy rays E ₁ and E ₂ may be simultaneous or may be sequential.

In the production method of the present invention, active energy rays are irradiated from both sides to the coating film 30M in the curing step, so that scattering particles are added to the coating film, or a function such as a light scattering layer is applied to the substrate. Even if it includes a factor that reduces the hardening efficiency due to irradiation of active energy rays, the coating film of the polymerizable composition can be sufficiently cured, and the first substrate The wavelength conversion layer 30 which has the following formula | equation can be obtained for the 10th side indentation hardness N1 and the 2nd base material 20 side indentation hardness N2.
| N1-N2 | ≦ 20MPa

FIG. 5 is a schematic configuration diagram of an example of the wavelength conversion member manufacturing apparatus 100 for manufacturing the wavelength conversion member 1 having the cross section shown in FIG.
The wavelength conversion member manufacturing apparatus 100 supports the first base material 10 in a roll state, and feeds out a feeding machine 60, a plurality of transport rolls 61 for transporting a film-like workpiece, and each processing step. A roll-to-roll manufacturing apparatus including a winder 65 that winds the wavelength conversion member 1 in a roll shape, and the first base material 10 is interposed between the feeder 60 and the winder 65. The coating part 70 which coats the polymerizable composition coating liquid on one surface to form the coating film 30M and the coating film 30M of the laminated film 13 in which the coating film 30M is formed on the first base material 10 are coated. A coating film 30M is provided between the first base material 10 and the second base material 20 and a pasting part (laminate) 80 for attaching the second base material 20 that sandwiches the film 30 together with the first base material 10. The laminated film 14 sandwiched is irradiated with UV light as the active energy ray E. And a curing treatment unit 90 for curing the coating film 30M by. Further, in the present embodiment, a dust remover 102 that removes dust from the application surface of the first base material 10 is provided between the feeder 60 and the application unit 70. In addition, you may provide the heating part which heats the film | membrane hardened | cured by the hardening process part 90 in the downstream of the hardening process part 90, ie, between the hardening process part 90 and the winder 65.

  6A is an enlarged view of the curing processing unit 90 of the wavelength conversion member manufacturing apparatus 100 shown in FIG. Lamination processing unit 90, that is, a laminate composed of coating film 30 </ b> M sandwiched between first base material 10 and second base material 20, which is conveyed as a workpiece in a processing region where a process of curing the coating film is performed. A first active energy ray irradiator 90A (hereinafter referred to as a first light irradiator 90A) that irradiates ultraviolet rays onto one surface side of the coating film 30M of the film 14 (in this example, the second substrate 20 side). The second active energy ray irradiation device 90B (hereinafter referred to as second light) irradiates ultraviolet rays on the other surface side (the first base material 10 side in this example) of the coating film 30M. An irradiation device 90B) is disposed. Here, the ultraviolet light refers to light having a wavelength of 280 to 400 nm. As a light source that generates ultraviolet rays, for example, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, or the like can be used.

  In the example shown in FIG. 5, backup rolls 91 </ b> A and 91 </ b> B are provided at positions facing the first and second light irradiation devices 90 </ b> A and 90 </ b> B, and the laminated film 14 includes the backup roll 91 </ b> A and the first light irradiation. Continuously conveyed between the apparatus 90A, the backup roll 91B and the second light irradiation apparatus 90B, and laminated on one surface of the laminated film 14 by the first light irradiation apparatus 90A and by the second light irradiation apparatus 90B. Ultraviolet rays are irradiated from the other surface of the film 14 toward the coating film 30M.

  With reference to FIG. 5, one Embodiment of the manufacturing method of the wavelength conversion member of this embodiment using the wavelength conversion member manufacturing apparatus 100 is described in order for every process.

(Coating process)
The specific aspect of the application | coating process in the application part 70 of the manufacturing apparatus 100 is demonstrated.
First, the first base material 10 is continuously conveyed from the feeder 66 to the coating unit 70 at a conveyance speed of 1 to 50 m / min. However, it is not limited to this conveyance speed. When delivered, for example, a tension of 20 to 150 N / m, preferably a tension of 30 to 100 N / m is applied to the first substrate 10. Thereafter, if necessary, various pretreatments for coating may be performed on the front and back surfaces of the substrate. Pre-coating is a heat treatment process to correct wrinkles and elongation of the substrate, press process, various discharge treatments and flame treatment processes to improve surface wettability, and also improve wettability. For primary coating and so on. In addition, when the protective sheet is bonded to the substrate, the pretreatment includes a step of peeling and removing the protective sheet. In this example, the dust remover 102 removes dust from the application surface of the first base material 10 and then transports the first base material 10 to the application unit 70.

In the coating unit 70, a polymerizable composition coating liquid (hereinafter also referred to as “coating liquid”) is applied to the surface of the first substrate 10 that is continuously conveyed to form a coating film 30 </ b> M (see FIG. 3). Is done.
The coating liquid is supplied through a pipe connected to the die coater 74 of the coating unit 70 using a liquid feeding device not shown in FIG. In the liquid feeder, it is preferable to remove the coarse particles by filtering the polymerizable composition. Although there is no restriction | limiting in particular as a filtration precision, A filter with a filtration precision of 1-200 micrometers can be used, It is preferable to use a filter with a filtration precision of 5-150 micrometers. As the filter, for example, PALL profile II having a filtration accuracy of 100 μm can be used.

  In the coating unit 70, for example, a die coater 74 and a backup roll 76 disposed to face the die coater 74 are installed. The surface opposite to the surface on which the coating film 30M of the first substrate 10 is formed is wound around the backup roll 76, and the coating liquid is applied from the discharge port of the die coater 74 to the surface of the first substrate 10 that is continuously conveyed. Is applied to form a coating film 30M. The die coater 74 is provided with a decompression chamber 78, and a coating thin film (referred to as a bead) bridging between the die coater 74 and the substrate 10 wound around the backup roll 76 is formed on the substrate 10. A negative pressure can be applied in order to suppress instability due to being pulled by the conveyance. The negative pressure is appropriately adjusted depending on the coating speed, the coating thickness, and the viscosity of the coating solution.

  In the present embodiment, the die coater 74 to which the extrusion coating method is applied is shown as the coating apparatus, but the present invention is not limited to this. For example, a coating apparatus to which various methods such as a curtain coating method, a rod coating method, or a roll coating method are applied can be used.

(Attaching process)
The specific aspect of the sticking process in the sticking part 80 of the manufacturing apparatus 100 is demonstrated.
The laminated film 13 that has passed through the application unit 70 and has the coating film 30 </ b> M formed on the first substrate 10 is continuously conveyed to the application unit 80. In the pasting unit 80, the second base material 20 that is continuously conveyed is laminated on the coating film 30 </ b> M, and the coating film 30 </ b> M is sandwiched between the first base material 10 and the second base material 20.

  The sticking unit 80 is provided with a laminate roll 82 and a temperature control chamber (not shown) surrounding the laminate roll 82.

  A backup roll 62 is disposed at a position facing the laminate roll 82. In the laminated film 13 of the coating film 30M and the first base material 10, the surface opposite to the surface on which the coating film 30M is formed (that is, the first base material 10 side) is wound around the backup roll 62, and the laminating position is reached. And continuously conveyed. The laminating position means a position where the contact between the second substrate 20 and the coating film 30M starts. The first substrate 10 is preferably wound around the backup roll 62 before reaching the laminating position. This is because even if wrinkles occur in the first base material 10, the wrinkles are corrected and removed by the backup roll 62 before reaching the laminate position.

  The second base material 20 sent out from the second base material delivery machine 81 which is wound around the second base material 20 in a roll shape and sent to the affixing unit 80 is wound around the laminating roll 82 via the transport roll 83. It is applied and continuously conveyed between the laminating roll 82 and the backup roll 62. The second base material 20 is laminated on the coating film 30M formed on the first base material 10 at the laminating position. Thereby, the coating film 30 </ b> M is sandwiched between the first base material 10 and the second base material 20.

  The rotational accuracy of the laminating roll 82 and the backup roll 62 is 0.05 mm or less, preferably 0.01 mm or less in radial runout. The smaller the radial runout, the smaller the thickness distribution of the coating film 30M.

The backup roll 62 includes a columnar main body and rotating shafts arranged at both ends of the main body. Although there is no restriction | limiting in the diameter of the backup roll 62, Usually, it has a diameter of 100-1000 mm. In addition, the diameter of the backup roll is preferably 300 mm or more in order to suppress bending stress at the time of curing described later on the substrate and to suppress deformation such as curling. More preferably, it is 450 mm or more. However, in the case where the diameter is larger, the upper limit is determined by restrictions on installation space, cost, and roll accuracy. Therefore, considering the curl deformation of the wavelength conversion member, the equipment cost, and the rotation accuracy, the diameter is preferably 300 to 850 mm.
Further, the temperature of the backup roll 62 can be adjusted by attaching a temperature controller to the main body of the backup roll 62.

  In order to suppress thermal deformation after the coating film 30M is sandwiched between the first base material 10 and the second base material 20, the difference between the temperature of the backup roll 62 and the temperature of the first base material 10, and the backup The difference between the temperature of the roll 62 and the temperature of the second substrate 50 is preferably 30 ° C. or less, more preferably 15 ° C. or less, and most preferably the same.

  In order to reduce the difference from the temperature of the backup roll 62, it is preferable to heat or cool the first base material 10 and the second base material 20 in the temperature control chamber. For example, the temperature control chamber can be configured to be supplied with a temperature-controlled air from a hot air generator or a cold air generator and to adjust the temperature of the first base material 10 and the second base material 20.

The first base material 10 may be heated by the backup roll 62 by being wound around the temperature-controlled backup roll 62.
On the other hand, about the 2nd base material 20, the temperature of the 2nd base material 20 can be adjusted with the lamination roll 82 by making the lamination roll 82 into a heat roll. In addition, it is possible to adjust the temperature using the transport roll 83.
However, the temperature control chamber and the heat roll are not essential and can be provided as necessary.

(Curing process)
The specific aspect of the hardening process in the hardening process part 90 of the manufacturing apparatus 100 is demonstrated.
Here, a curing method by ultraviolet irradiation is shown, but various active rays may be used.
The laminated film 14 (see FIG. 6A), which is laminated by the pasting step and has the coating film 30 </ b> M sandwiched between the first base material 10 and the second base material 20, is continuously conveyed to the curing processing unit 90. .

First, the laminated film 14 is conveyed between the first backup roll 91A and the first light irradiation device 90A, and the laminated film 14 is conveyed with the first substrate 10 side wound around the first backup roll 91A. While being done, the coating film 30M is irradiated with ultraviolet rays from the second substrate 20 side. Thereafter, the laminated film 14 is conveyed between the second backup roll 91B and the second light irradiation device 90B, and the laminated film 14 is wound around the second backup roll 91B on the second substrate 20 side. While being transported, the coating film 30M is irradiated with ultraviolet rays from the first substrate 10 side. That is, the second light irradiating device irradiates the laminated film 14 with light on the surface opposite to the surface irradiated with light by the first light irradiating device.
By the irradiation of ultraviolet rays by the first and second light irradiation devices, the polymerization reaction of the polymerizable compound in the coating film 30 </ b> M proceeds and becomes a hard film to become the wavelength conversion layer 30.

  When the laminated film 14 is wound around the backup rolls 91A and 91B, one of the first base material 10 and the second base material 20 is in contact with the surfaces of the backup rolls 91A and 92B at a certain wrap angle. Say. Therefore, during the continuous conveyance, the first base material 10 and the second base material 20 move in synchronization with the rotation of the backup rolls 91A and 91B.

What is necessary is just to set the irradiation amount of the light irradiated by each light irradiation apparatus in the range which can advance the polymerization reaction of a coating film, for example, the ultraviolet rays of the irradiation amount of 100-10000mJ / cm < ² > are directed to the coating film 30M as an example. It is preferable to set it as 100-2000 mJ / cm < ² >, and it is more preferable to set it as 100-1000 mJ / cm < ² >. Light irradiation intensity of the coating film (illuminance) is an example 30~2000mW / cm ² and it is possible to as, preferably to 50~1000mW / cm ^2, and more preferably a 100~500mW / cm ² .

  The temperatures of the first and second backup rolls 91A and 91B are as follows: heat generation during light irradiation, curing efficiency of the coating film 30M, and the backup rolls 91A and 91B of the first base material 10 and the second base material 20 It can be determined in consideration of the occurrence of wrinkle deformation at For example, the backup rolls 91A and 91B are preferably set to a temperature range of 10 to 95 ° C, and more preferably 15 to 85 ° C. Here, the roll temperature refers to the surface temperature of the roll.

  In the said hardening process, the wavelength conversion member 1 which consists of a laminated body of the wavelength conversion layer 30 which consists of the 1st base material 10, the cured layer, and the 2nd base material 20 is manufactured by hardening the coating film 30M. . The wavelength conversion member 1 is subjected to a heat treatment or the like in a subsequent process if necessary, and is continuously conveyed to the winder 65 and wound into a roll by the winder 65.

  Through the above steps, the wavelength conversion member 1 in which the occurrence of curling is suppressed can be obtained.

  The arrangement configuration of the first and second light irradiation devices 90A and 90B in the curing processing unit 90 of the wavelength conversion member manufacturing apparatus 100 and the form of the coating film during ultraviolet irradiation are not limited to those shown in FIG. Various aspects can be employed. In the above embodiment, the ultraviolet irradiation from the second substrate side is performed first, and then the ultraviolet irradiation from the first substrate side is performed. However, the ultraviolet irradiation from the first substrate side is performed. May be performed first, and ultraviolet irradiation from the second substrate side may be performed later, or ultraviolet irradiation from the first substrate side and ultraviolet irradiation from the second substrate side may be performed simultaneously. Good.

  6B to 6H are schematic diagrams illustrating variations in the configuration of the curing processing unit 90 of the manufacturing apparatus 100. FIG.

As illustrated in FIG. 6B, the curing processing unit 90 may include a plurality of first and second light irradiation devices 90A and 90B.
Further, as shown in FIG. 6C, the first light irradiation device 90A and the second light irradiation device 90B are not at positions facing the first back roll 91A and the second back roll 91B, respectively, but before and after them. The laminated film 14 may be disposed so as to irradiate one surface or the other surface thereof with active energy rays in a state where the laminated film 14 is supported linearly.

  As shown in FIG. 6D, each includes a plurality of first and second light irradiation devices 90A and 90B, one for irradiating active energy rays in a region where the laminated film is supported and conveyed in a straight line. May be arranged so as to irradiate active energy rays in a region that is wound around a back roll and rotated and conveyed.

  As shown in FIG. 6E, the curing processing unit 90 includes only one back roll 91, and one of the first and second light irradiation devices 90A and 90B (the first light irradiation device 90A in the illustrated example). Is disposed at a position facing the back roll 91 across the laminated film 14, and the other (second light irradiation device 90B in the illustrated example) is arranged in a region where the laminated film 14 is supported and conveyed linearly. May be.

  As shown in FIG. 6F, a plurality of back rolls 91 are provided, a plurality of first and second light irradiation devices 90A and 90B are provided, and a plurality of first light irradiation devices 90A are provided on the plurality of back rolls 91 by 1: 1. The plurality of second light irradiation devices 90B may be arranged in a region where the laminated film 14 is supported and conveyed in a straight line.

  As shown in FIG. 6G, only one back roll 91 is provided in the curing processing unit 90, and both the first and second light irradiation devices 90A and 90B are provided in a region where the laminated film 14 is supported and conveyed linearly. It may be arranged.

  Further, as shown in FIG. 6H, the curing processing unit 90 includes only one back roll 91, and includes a plurality of first and second light irradiation devices 90A and 90B, and one of the light irradiation devices (illustrated). In this example, one of the first light irradiation devices 90A) is disposed at a position facing the back roll 91 with the laminated film 14 interposed therebetween, and the remaining light irradiation devices are supported and conveyed in a straight line by the laminated film 14. It may be arranged in each area.

  As described above, the curing processing unit 90 may be configured to irradiate the laminated film 14 with active energy rays from one surface and the other surface (front and back surfaces).

  Next, a method for manufacturing the wavelength conversion member 11 having another configuration shown in FIG. 3 will be described. FIG. 7 is a schematic view showing a manufacturing process of the wavelength conversion member 11 having the cross section shown in FIG. According to the other method for producing a wavelength conversion member shown in FIG. 7, a polymerizable composition containing quantum dots is applied to one surface of the first base material 10 to form a coating film 30M (application process). Before the second base material is bonded to the film, the active energy ray is irradiated from one side (one base side) of the coating film 30M to cure the coating film 30M, and the other side of the coating film (the other side) The wavelength conversion layer 30 is formed by irradiating active energy rays from the base material side) to cure the coating film (curing step), and the second base material 20 having the adhesive layer 21 on the wavelength conversion layer 30. The wavelength conversion layer 30 is sandwiched between the first base material 10 and the second base material 20 so that the adhesive layer 21 is in contact with the wavelength conversion layer 30 (sticking step). To manufacture.

Even if it is the said manufacturing method, since the active energy ray is irradiated from both surfaces with respect to the coating film 30M at a hardening process, the scattering particle | grains in a coating film are added, or functions, such as a light-scattering layer, to a base material Even if it contains a factor that reduces the hardening efficiency by irradiation of active energy rays, the coating film of the polymerizable composition can be sufficiently cured, and the wavelength conversion layer 30 The indentation hardness N1 on the first base material 10 side and the indentation hardness N2 on the second base material 20 side can be represented by the following formula.
| N1-N2 | ≦ 20MPa

FIG. 8 is a schematic configuration diagram of an example of the wavelength conversion member manufacturing apparatus 110 for manufacturing the wavelength conversion member 11 having the cross section shown in FIG. 3.
The wavelength conversion member manufacturing apparatus 110 supports the first base material 10 in a roll state, and feeds out a feeding machine 60, a plurality of transport rolls 61 for transporting a film-like workpiece, and each processing step. A roll-to-roll manufacturing apparatus including a winder 65 that winds the wavelength conversion member 1 in a roll shape, and the first base material 10 is interposed between the feeder 60 and the winder 65. The coating part 70 which forms the coating film 30M by applying the polymerizable composition coating liquid on one surface, and a laminate in which the coating film 30M is sandwiched between the first base material 10 and the second base material 20 The film 14 is irradiated with UV light as an active energy ray E to cure the coating film 30M, and the coating film 30M of the laminated film 13 in which the coating film 30M is formed on the first substrate 10 In addition, the second base for sandwiching the coating film 30 together with the first base material 10. Pasting unit for pasting the 20 and (laminate) 80 is provided in this order. Further, a dust remover 102 that removes dust from the application surface of the first base material 10 between the delivery device 60 and the application unit 70 is disposed on the curing processing unit 90 side between the application unit 70 and the curing processing unit 90. A drying device 103 for volatilizing volatile components contained in the polymerizable composition is provided between the sticking unit 80 and the winder 65 and an annealing unit 104 that performs a drying and annealing process.

In the manufacturing apparatus shown in FIG. 8, elements having the same functions as those in the manufacturing apparatus shown in FIG.
In this manufacturing apparatus, before applying the second base material 20 to the coating film 30M, the curing unit 90 irradiates the exposed surface of the coating film 30M with ultraviolet rays by the first light irradiation device 90A. Subsequently, the second light irradiation device 90B irradiates ultraviolet rays from the first base material 10 which is the opposite surface of the exposed surface of the coating film 30M. In the curing processing unit 90, the coating film 30 </ b> M is cured to become the wavelength conversion layer 30, and the laminated film 15 in which the wavelength conversion layer 30 is formed on the first substrate 10 is conveyed to the pasting unit 80. In the affixing unit 80, the second base material 20 coated with the adhesive 21 on one side is laminated to the wavelength conversion layer 30 via the adhesive 21.

  As a manufacturing method, after forming the coating film 30M on the first base material 10 in the coating process in addition to the above-described form, as a first curing process, one of the coating films 30M is applied by the first active energy ray irradiation device. Then, an active energy ray is irradiated from the surface, and then, as a pasting step, a second substrate is laminated on the surface of the coating film 30M cured by the irradiation of the active energy ray via an adhesive, and then the second substrate As the curing step, the wavelength conversion layer 30 is formed by further curing the coating film 30M by irradiating the active energy ray from the surface opposite to the active energy ray irradiation surface in the first curing step by the second active energy ray irradiation device. It is also possible to do.

[Backlight unit]
The backlight unit according to one embodiment of the present invention includes at least the wavelength conversion member of the present invention and a light source. The details of the wavelength conversion member are as described above.

FIG. 9 is a schematic cross-sectional view of an example of the backlight unit 2 including the wavelength conversion member 1 according to an aspect of the present invention.
As shown in FIG. 9, the backlight unit 2, a planar light source unit 1C for a surface-emitting blue light L _B as an excitation light, the blue light L _B emitted from the planar light source unit 1C is incident, to convert some of the blue light L _B in the green light L _G and the red light L _R, the sheet-type wavelength conversion member 1 which transmits part of the blue light L _B, the light guide plate described later across the wavelength conversion member 1 A retroreflective member group 2B disposed opposite to 1B and a reflector 2A disposed opposite to the wavelength conversion member 1 with the light guide plate 1B interposed therebetween.
The planar light source unit 1C includes a sheet-like light guide plate 1B and a light source 1A that emits blue light and is disposed at the edge of the light guide plate 1B so that excitation light enters from the edge of the light guide plate 1B. ing.
Here, the wavelength conversion member 1 includes the quantum dot 31 in the wavelength conversion layer 30 as a quantum dot 31 and a quantum dot that emits red light LR when irradiated with blue light LB and a quantum dot that emits green light LG.

In the backlight unit 2 of FIG. 9, the primary light L _B emitted from the planar light source unit 1C is incident on the wavelength conversion member 1, in the wavelength conversion member 1, by exciting light at least a portion of the primary light L _B emits secondary light composed of red light and green light, L _B emitted from the wavelength conversion member _1, L _G, L _R is incident on the retroreflective member 2B, the light incident is retroreflective The reflection is repeated between the member 2B and the reflecting plate 2A, and passes through the wavelength conversion member 1 a plurality of times. As a result, in the wavelength conversion member 1, a sufficient amount of excitation light (blue light L _B ) is absorbed by the quantum dots 31, and a necessary amount of fluorescence (L _G , L _R ) is emitted, from the retroreflective member 2B. That is, the white light _LW is embodied and emitted from the backlight unit 2.

As the light source 1A, a light emitting diode or a laser light source that emits blue light having a light emission center wavelength in a wavelength band of 430 nm to 480 nm can be used.
As the light source 1A, a light emitting diode that emits ultraviolet light can also be used. In this case, the quantum dot 31 in the wavelength conversion layer 30 of the wavelength conversion member 1 emits blue light LB by ultraviolet light. The quantum dots that emit red light LR and the quantum dots that emit green light LG may be included.

  As shown in FIG. 9, the planar light source unit 1 </ b> C may be a light source unit including a light source 1 </ b> A and a light guide plate 1 </ b> B that guides and emits primary light emitted from the light source 1 </ b> A. The light source unit may be arranged in a plane parallel to the wavelength conversion layer 1D and provided with a diffusion plate 1E instead of the light guide plate 1B. The former planar light source unit is generally called an edge light system, and the latter planar light source unit is generally called a direct type.

  Further, the reflecting plate 2A is not particularly limited, and known ones can be used, and are described in Japanese Patent No. 3416302, Japanese Patent No. 3363565, Japanese Patent No. 4091978, Japanese Patent No. 3448626, etc. Incorporated into the present invention.

  The retroreflective member 2B may be configured by a known diffusion plate, diffusion sheet, prism sheet (for example, BEF series manufactured by Sumitomo 3M Limited), a light guide, or the like. The configuration of the retroreflective member 2B is described in Japanese Patent No. 3416302, Japanese Patent No. 3363565, Japanese Patent No. 4091978, Japanese Patent No. 3448626, and the contents of these publications are incorporated in the present invention.

"Liquid Crystal Display"
The backlight unit 2 described above can be applied to a liquid crystal display device. As shown in FIG. 10, the liquid crystal display device 50 includes the backlight unit 2 according to the above-described embodiment and the liquid crystal unit 6 disposed to face the retroreflective member of the backlight unit 2.

  As shown in FIG. 10, the liquid crystal cell unit 6 has a configuration in which the liquid crystal cell 5 is sandwiched between polarizing plates 3 and 4. The polarizing plates 3 and 4 have both main surfaces of the polarizers 32 and 42, respectively. The polarizing plate protective films 31 and 33 and 41 and 43 are used for the protection.

  There are no particular limitations on the liquid crystal cell 5, the polarizing plates 3 and 4 and the components constituting the liquid crystal display device 50, and those produced by known methods and commercially available products can be used without any limitation. It is of course possible to provide a known intermediate layer such as an adhesive layer between the layers.

  The driving mode of the liquid crystal cell 5 is not particularly limited, and is twisted nematic (TN), super twisted nematic (STN), vertical alignment (VA), in-plane switching (IPS), optically compensated bend cell (OCB). ) And other modes can be used. The liquid crystal cell is preferably VA mode, OCB mode, IPS mode, or TN mode, but is not limited thereto. As an example of the configuration of the VA mode liquid crystal display device, the configuration shown in FIG. 2 of Japanese Patent Application Laid-Open No. 2008-262161 is given as an example. However, the specific configuration of the liquid crystal display device is not particularly limited, and a known configuration can be adopted.

  The liquid crystal display device 50 further includes an accompanying functional layer such as an optical compensation member that performs optical compensation and an adhesive layer as necessary. Along with (or instead of) a color filter substrate, thin layer transistor substrate, lens film, diffusion sheet, hard coat layer, antireflection layer, low reflection layer, antiglare layer, etc., forward scattering layer, primer layer, antistatic layer Further, a surface layer such as an undercoat layer may be disposed.

  The liquid crystal display device according to one embodiment of the present invention described above includes the backlight unit including the wavelength conversion member in which curling is suppressed according to the present invention, and thus achieves high luminance and high color reproducibility with high stability. Is something that can be done.

  Hereinafter, the wavelength conversion member of the Example of this invention and a comparative example and its manufacturing method are demonstrated.

(Preparation of barrier film)
Using a polyethylene terephthalate film (PET film, manufactured by Toyobo Co., Ltd., trade name: Cosmo Shine (registered trademark) A4300, thickness 50 μm) as a support, an organic layer and an inorganic layer are sequentially formed on one side of the support by the following procedure. Formed.

Trimethylolpropane triacrylate (manufactured by Daicel Cytec Co., Ltd., TMPTA) and a photopolymerization initiator (Lamberti Co., Ltd., ESACURE KTO46) are prepared and weighed to a mass ratio of 95: 5, and these are dissolved in methyl ethyl ketone. A coating solution having a solid content concentration of 15% was obtained. This coating solution was applied onto the PET film with a roll toe roll using a die coater, and passed through a drying zone at 50 ° C. for 3 minutes. Thereafter, the sample was irradiated with ultraviolet rays (integrated irradiation amount: about 600 mJ / cm ² ) in a nitrogen atmosphere, cured by ultraviolet curing, and wound up. The thickness of the first organic layer formed on the support was 1 μm.

  Next, an inorganic layer (silicon nitride layer) was formed on the surface of the organic layer using a roll-to-roll CVD apparatus. Silane gas (flow rate 160 sccm), ammonia gas (flow rate 370 sccm), hydrogen gas (flow rate 590 sccm), and nitrogen gas (flow rate 240 sccm) were used as source gases. A high frequency power supply having a frequency of 13.56 MHz was used as the power supply. The film forming pressure was 40 Pa, and the reached film thickness was 50 nm.

  A barrier film in which an organic layer and an inorganic layer were sequentially laminated on one side of the support was prepared by the above procedure. In the following, this barrier film was used as a first substrate and a second substrate.

(Polymerizable composition coating solution)
A polymerizable composition having the following components was prepared, filtered through a polypropylene filter having a pore size of 0.2 μm, dried under reduced pressure for 30 minutes, and used as a coating solution.
[Polymerizable composition]
Toluene dispersion of quantum dots 1 (emission maximum: 520 nm) 10 parts by mass Toluene dispersion of quantum dots 2 (emission maximum: 630 nm) 1 part by mass Alicyclic epoxy compound: Celoxide 2021P (manufactured by Daicel Corporation) 60 parts by mass Monofunctional acrylate compound: AMP-10G (manufactured by Shin-Nakamura Chemical Co., Ltd.) 40 parts by weight Photocationic polymerization initiator CPI-110P (manufactured by San Apro) 3 parts by weight Photopolymerization initiator Irgacure 819 (manufactured by BASF) 3 parts by mass Viscosity modifier: AEROSIL R972 (manufactured by Nippon Aerosil Co., Ltd.) 3 parts by mass (in the above, the quantum dot concentration of the toluene dispersion of quantum dots 1 and 2 is 1% by mass)

[Example 1]
The wavelength conversion member was produced by the manufacturing process described with reference to FIG. Hereinafter, a specific manufacturing method will be described in the order of each step.

<Application process>
The above-described polymerizable composition coating solution is sent by a diaphragm pump using a pipe length of about 2.5 m, and a filter with a filtration member height of 1 inch and a filtration accuracy of 100 μm (PALL 100 μm Profile II). ) Was used to remove coarse particles, and the solution was fed to a die coater (74 in FIG. 5). The coating liquid is applied at a coating width of 600 mm to the barrier film (thickness meter 50 μm, base material width 700 mm), which is the above-described first base material 10, fed from a delivery machine (60 in FIG. 5). did.
Here, the viscosity of the coating solution extruded from the die coater was maintained and adjusted to 3 to 100 mPa · s by adjusting the stirring at the time of preparation, ultrasonic treatment, and the lip clearance of the die coater to appropriate ranges.
The coating speed was adjusted and changed as needed, but here it was 3 m / min. The thickness of the coating film was adjusted to 50 μm.

<Pasting (lamination) process>
After the coating step, a barrier film (thickness meter 50 μm) having the same substrate width 700 mm as the first substrate is used as a second substrate (reference numeral 20 in FIG. 5). In FIG. 5, the second base material was laminated on the coating film by drawing from 81). Specifically, immediately before the UV curing step for forming the wavelength conversion layer, a metal roll (diameter 200 mm, backup roll 62 in FIG. 5) and a natural rubber nip roll (diameter 200 mm, hardness 75 degrees, in FIG. 5). The minimum gap between the metal roll and the natural rubber nip roll was set to 3 mm using a laminate roll 82), and the barrier film as the second substrate was adhered to the coating film. At this time, the peripheral speeds of the two rolls were controlled so that the ratio of the peripheral speed of the backup roll 62 to the peripheral speed of the backup roll 82 was 100.0% ± 1%.
Further, the temperature of the first substrate is controlled to be 50 ° C. in the region from immediately before the second substrate is laminated on the coating film to just before the coating film is cured, and the second substrate The temperature of was controlled to be 60 ° C. The substrate tension just before the first base sticking part was set to 60 N / width, and the substrate tension just before the second base sticking part was set to 60 N / width.

<Curing process>
After the sticking step, the first substrate side comes into contact with the first backup roll for UV irradiation (reference numeral 91A in FIG. 5), and the first backup roll is transported and moved with the rotation of the first backup roll. The coating film sandwiched between the first base material and the second base material is irradiated with a first active energy ray irradiation device from the second base material side under the conditions of an irradiation amount of 300 mJ / cm ² and an illuminance of 300 mW / cm ² . Irradiate UV light, and then the second base material side comes into contact with the second backup roll and is transported and moved with the rotation of the second backup roll. With an active energy ray irradiation apparatus, the wavelength conversion layer is formed by irradiating UV light under the conditions of an irradiation amount of 300 mJ / cm ² and an illuminance of 300 mW / cm ² to cure the coating film, and has a cross section shown in FIG. The wavelength conversion member of Example 1 was produced. The roll diameter of the backup roll at the time of UV light irradiation was 300 mm, and the backup roll temperature was 30 ° C.

[Examples 2 to 4, Comparative Example 1]
Wavelength conversion members of Examples 2 to 5 and Comparative Example 1 were prepared in the same manner as in Example 1 except that the UV irradiation conditions in the curing step were as described in Table 1. In Comparative Example 1, the first UV light and the second UV light were irradiated from the same surface side of the coating surface.

[Example 5]
In the curing step, the wavelength of Example 5 is the same as Example 2 except that the roll diameter of the backup roll supporting the coating film sandwiched between the first base material and the second base material is 600 mm. A conversion member was produced.

[Example 6]
In the curing step, UV light irradiation was performed by the second active energy ray irradiation apparatus in a state where the coating film sandwiched between the first base material and the second base material was supported linearly (flatly). A wavelength conversion member of Example 6 was produced in the same manner as in Example 2 except for the above.

[Example 7]
After performing UV light irradiation in the second active energy ray irradiation device in the curing process, a metal casing is provided in the middle of conveyance until winding, and heating air adjusted to 60 ° C. is supplied inside at 5 m ³ / min. A wavelength conversion member of Example 7 was produced in the same manner as in Example 2 except that it was passed through the apparatus for 1 minute.

[Comparative Example 2]
In the curing step, the first active energy ray irradiation device was irradiated with UV light under the conditions of an irradiation amount of 1000 mJ / cm ² and an illuminance of 300 mW / cm ² , and the second active energy ray irradiation device was not irradiated. Except for the above, a wavelength conversion member of Comparative Example 2 was produced in the same manner as in Example 1.

  The following evaluation was performed about Examples 1-7 and Comparative Examples 1 and 2 which were produced as mentioned above.

(Measurement of the hardness of the foundation)
The indentation hardness of the wavelength conversion member of each Example and Comparative Example was measured by the following procedure.
First, a cross section of an arbitrary position of the produced wavelength conversion member is cut using a microtome (LEICA ultra-microtome UC6), and a thin piece having a cut surface as a main surface is cut out. The conversion layer and the second substrate interface were confirmed. Then, at a position of about 3 μm from each interface to the wavelength conversion layer side, a TI950 Triboindenter (manufactured by HYSITRON) was used to measure the indentation hardness N1 and N2 by indentation measurement with a 50 μN load using a Barcovic indenter. Table 1 shows the difference | N1−N2 | obtained from the obtained N1 and N2.

(Measurement of curl)
The curl of the wavelength conversion member produced in each example and comparative example was measured by the following procedure.
First, the center part of the produced wavelength conversion member in the width direction (direction perpendicular to the conveying direction in the roll-to-roll manufacturing apparatus) is cut into a square of 210 mm × 150 mm, and flat in an environment of 25 ° C. and 60% relative humidity. The humidity was adjusted for 24 hours on a glass table. And the floating of the four corners of the wavelength conversion member was measured with a caliper.
Table 1 shows the average values of the floating at the four corners.

  In the comprehensive evaluation of Table 1, in Examples 1 to 7 and Comparative Example 1, if the curl is 3 mm or less, good VG (Very Good), if it exceeds 3 mm and less than 7 mm, Good (G), if it is 7 or more. It was evaluated as bad NG (No Good).

  As shown in Table 1, the wavelength conversion member of Examples 1 to 7 in which the wavelength conversion layer was formed by irradiating UV light from the front and back to the coating film sandwiched between the first base material and the second base material. The curl was as small as 4 mm or less, whereas in the wavelength conversion members of Comparative Examples 1 and 2, the curl was as large as over 4 mm. In Examples 1 to 7 in which the difference in the indentation hardness between the front and back of the wavelength conversion layer was 20 MPa or less, the curl was 4 mm or less. The difference in the indentation hardness is 16 MPa or less, the curl is 4 mm or less, the difference in the indentation hardness is 10 MPa or less, the curl is 3 mm or less, the difference in the indentation hardness is 5 MPa or less, and the curl is 2 mm. Obtained.

DESCRIPTION OF SYMBOLS 1 Wavelength conversion member 1A Light source 1B Light guide plate 1C Planar light source part 2 Backlight unit 2A Reflective plate 2B Retroreflective member 10 1st base material 20 2nd base material 30 Wavelength conversion layer 30M Coating film 50 Liquid crystal display device 61 Conveying roll 70 Application unit 74 Die coater 76 Backup roll 78 Depressurization chamber 80 Pasting unit 82 Laminating roll 90 Curing unit 90A, 90B Active energy ray irradiation devices 91A, 91B Backup roll 100 Wavelength conversion member manufacturing apparatus

Claims (12)

Between the first base material, the second base material, and the first base material and the second base material, the first base material and one surface are the second base material. A wavelength conversion member including a quantum dot that is arranged in contact with the other surface and includes quantum dots that are excited by excitation light and emit fluorescence.
The wavelength conversion layer is a cured layer obtained by irradiating an active energy ray to a coating film made of a polymerizable composition containing the quantum dots and a polymerizable compound,
A wavelength conversion member in which the first base material side indentation hardness N1 of the wavelength conversion layer and the second base material side indentation hardness N2 are in the relationship of the following formula.
| N1-N2 | ≦ 20MPa   The wavelength conversion member according to claim 1, wherein the polymerizable composition contains at least one radical polymerizable compound.   The quantum dot has an emission center wavelength in a wavelength band of 600 nm to 680 nm, a quantum dot having an emission center wavelength in a wavelength band of 520 nm to 560 nm, and a quantum dot having an emission center wavelength in a wavelength band of 430 nm to 480 nm The wavelength conversion member according to claim 1 or 2, wherein at least one kind is selected from the group consisting of:   A backlight unit comprising at least the wavelength conversion member according to any one of claims 1 to 3 and a light source composed of a blue light emitting diode or an ultraviolet light emitting diode that emits the excitation light.   A liquid crystal display device comprising at least the backlight unit according to claim 4 and a liquid crystal cell. A method for producing a wavelength conversion member having a wavelength conversion layer including quantum dots that are excited by excitation light to emit fluorescence,
Applying a polymerizable composition containing the quantum dots on one side of the first substrate to form a coating film,
A second substrate is superimposed on the coating film, and the coating film is sandwiched between the first substrate and the second substrate,
Irradiating active energy rays from one surface of the coating film to cure the coating film, irradiating the active energy rays from the other surface of the coating film to cure the coating film, The manufacturing method of the wavelength conversion member to form.   The manufacturing method of Claim 6 which heats the said coating film after irradiating the said active energy ray to the said coating film in the process of hardening the said coating film. A roll-to-roll wavelength conversion member manufacturing apparatus that implements the method of manufacturing a wavelength conversion member according to claim 6 or 7,
An application part for applying a polymerizable composition containing the quantum dots to one surface of the first base material to form a coating film, and a second base material on the coating film to overlap the first base material And an adhesive portion for sandwiching the coating film between the second substrate and the active energy ray from one surface of the coating film to cure the coating film, and from the other surface of the coating film A curing treatment unit that irradiates an active energy ray to cure the coating film to form the wavelength conversion layer;
1st activity which irradiates the said active energy ray to the one surface side of the said coating film pinched | interposed by the said 1st base material conveyed as a workpiece | work and the said 2nd base material in the said hardening process part. An energy ray irradiation device is arranged, and on the other surface side of the coating film, a second active energy ray irradiation device that irradiates the active energy ray is arranged,
The wavelength conversion member manufacturing apparatus which irradiates the said active energy ray to the one surface and the other surface of the said coating film simultaneously or sequentially. At least one of the first active energy ray irradiation device and the second active energy ray irradiation device is provided with a back roll at a position facing through the coating film,
The first or second active energy ray disposed at a position facing the back roll in a state where the non-coating surface of the substrate on one or the other side of the coating is in contact with the back roll. The wavelength conversion member manufacturing apparatus of Claim 8 which irradiates the said active energy ray with an irradiation apparatus.   The wavelength conversion member manufacturing apparatus according to claim 9, wherein the back roll has a diameter of 300 mm or more. In the curing processing unit, at least one of the first active energy ray irradiation device and the second active energy ray irradiation device is disposed in a region in which the coating film is linearly supported and conveyed,
The wavelength conversion member manufacturing apparatus of any one of Claim 8 to 10 which irradiates the said active energy ray to the said coating film supported by the said linear form.   The wavelength conversion member manufacturing apparatus according to any one of claims 8 to 11, further comprising a heating unit that heats the coating film on a downstream side of the curing processing unit.