JP2016033979A - 撮像装置、撮像システムおよび撮像装置の製造方法 - Google Patents
撮像装置、撮像システムおよび撮像装置の製造方法 Download PDFInfo
- Publication number
- JP2016033979A JP2016033979A JP2014156787A JP2014156787A JP2016033979A JP 2016033979 A JP2016033979 A JP 2016033979A JP 2014156787 A JP2014156787 A JP 2014156787A JP 2014156787 A JP2014156787 A JP 2014156787A JP 2016033979 A JP2016033979 A JP 2016033979A
- Authority
- JP
- Japan
- Prior art keywords
- pixel electrode
- photoelectric conversion
- film
- pixel
- imaging device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003384 imaging method Methods 0.000 title claims abstract description 66
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 238000006243 chemical reaction Methods 0.000 claims abstract description 162
- 239000004065 semiconductor Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 20
- 238000005530 etching Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 16
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 10
- 239000002096 quantum dot Substances 0.000 claims description 7
- 206010047571 Visual impairment Diseases 0.000 abstract description 15
- 230000035945 sensitivity Effects 0.000 abstract description 14
- 239000010408 film Substances 0.000 description 210
- 239000010410 layer Substances 0.000 description 53
- 239000000463 material Substances 0.000 description 16
- 239000012535 impurity Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 6
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000011147 inorganic material Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000003321 amplification Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000003199 nucleic acid amplification method Methods 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011669 selenium Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 239000007790 solid phase Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- VYXSBFYARXAAKO-WTKGSRSZSA-N chembl402140 Chemical compound Cl.C1=2C=C(C)C(NCC)=CC=2OC2=C\C(=N/CC)C(C)=CC2=C1C1=CC=CC=C1C(=O)OCC VYXSBFYARXAAKO-WTKGSRSZSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 229910017115 AlSb Inorganic materials 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910002665 PbTe Inorganic materials 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- VBVAVBCYMYWNOU-UHFFFAOYSA-N coumarin 6 Chemical compound C1=CC=C2SC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 VBVAVBCYMYWNOU-UHFFFAOYSA-N 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical compound N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14689—MOS based technologies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
- H01L27/14612—Pixel-elements with integrated switching, control, storage or amplification elements involving a transistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1463—Pixel isolation structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14636—Interconnect structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14685—Process for coatings or optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14687—Wafer level processing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14621—Colour filter arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
- H10K39/30—Devices controlled by radiation
- H10K39/32—Organic image sensors
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
【解決手段】 画素回路に接続された第1画素電極と、第1画素電極に隣り合い、画素回路に接続された第2画素電極と、第1画素電極および第2画素電極を連続的に覆う光電変換膜と、を備える撮像装置であって、光電変換膜は、第1画素電極および第2画素電極の側とは反対側の面に、第1画素電極と第2画素電極の間の部分に向かって凹んだ凹部を有しており、凹部の深さが第1画素電極の厚さよりも大きく、かつ、第1画素電極から凹部までの距離が第1画素電極から第2画素電極までの距離よりも大きい。
【選択図】 図2
Description
図2(a)、(b)を用いて第1実施形態に係る撮像装置1000を説明する。図2(a)は、図1(b)のA―A’線における画素領域1の断面および、周辺領域2の断面を示している。図2(b)は光電変換膜50の近傍を拡大した断面図である。図2(a)に示すように、p型ウェルが形成された半導体基板10内には、STI(Shallow Trench Isoration)などによる素子分離部9が形成されている。また、半導体基板10には、例えば画素回路110の各トランジスタのソースまたはドレインとして機能する不純物領域(不図示)が設けられている。半導体基板10の上には、ゲート絶縁膜(不図示)を介して、ゲート18および他の不図示のゲート14、19を成すゲート電極層が設けられている。これらの構造は第1画素101、第2画素102、第3画素103に共通である。
画素電極41、42、43は、アルミニウム、銅、タングステン、チタン、タンタルなどの金属および窒化チタンや窒化タンタルなどの金属化合物の少なくともいずれかで構成されている。例えば、アルミニウム、銅およびタングステンの何れか金属を主成分とする導電層と、チタン、タンタル、窒化チタンおよび窒化タンタルの何れかを主成分とするバリアメタル層と、を有する複層膜で有り得る。画素電極41、42、43は単層膜であってもよい。厚さTは例えば0.01μm以上であり、1μm以下である。画素電極41、42、43の主成分がアルミニウムである場合には、厚さTは例えば0.1μm以上であり、1μm以下である。画素電極41、42、43の主成分がタングステンである場合には、厚さTは例えば0.01μm以上であり、0.1μm未満である。しかし、画素電極41、42、43の主成分がアルミニウムであっても厚さTは0.1μm未満であってもよいし、画素電極41、42、43の主成分がタングステンであっても厚さTは0.1μm以上であってもよい。厚さTは導電部材30を構成する配線層36、37、38の厚さよりも小さくてもよい。
次に、図5(a)、(b)を用いて第2実施形態に係る撮像装置1000を説明する。図5(a)は、図1(b)のA―A’線における画素領域1の断面および、周辺領域2の断面を示している。図5(b)は光電変換膜50の近傍を拡大した断面図である。第2実施形態では、絶縁部材20の上面の形状と、光電変換膜50の上面501および下面502の形状が第1実施形態と異なる。他の点は第1実施形態と同様であるので詳細な説明を省略する。
次に、図7(a)〜(c)を用いて第3実施形態に係る撮像装置の製造方法を説明する。第3実施形態は、電極層40および絶縁膜46の形成方法が第2実施形態と異なる。他の点は第2実施形態と同様であるので説明を省略する。
図8(a)、(b)を用いて第4実施形態に係る撮像装置1000を説明する。図8(a)は、図1(b)ののA―A’線における画素領域1の断面および、周辺領域2の断面を示している。図8(b)は光電変換膜50の近傍を拡大した断面図である。第4実施形態は、光電変換膜50の画素電極41、42、43側の構造および対向電極60側の構造が第1実施形態と主に異なる。第1実施形態と同様の事項については説明を省略する。
110 画素回路
41、42、43 画素電極
50 光電変換膜
501 上面
55 凹部
D 深さ
T 厚さ
G、L 距離
Claims (17)
- 第1画素電極と、前記第1画素電極に隣り合う第2画素電極と、前記第1画素電極および前記第2画素電極を連続的に覆う光電変換膜と、を備える撮像装置であって、
前記光電変換膜は、前記第1画素電極および前記第2画素電極の側とは反対側の面に、前記第1画素電極と前記第2画素電極の間の部分に向かって凹んだ凹部を有しており、
前記凹部の深さが前記第1画素電極の厚さよりも大きく、かつ、前記第1画素電極から前記凹部までの最短距離が前記第1画素電極から前記第2画素電極までの最短距離よりも大きいことを特徴とする撮像装置。 - 前記凹部の幅が、前記第1画素電極から前記第2画素電極までの前記最短距離よりも大きい、請求項1に記載の撮像装置。
- 前記光電変換膜を介して前記第1画素電極および前記第2画素電極に対向する対向電極が、前記面に沿って連続的に設けられており、前記対向電極の一部が前記凹部に囲まれている、請求項1または2に記載の撮像装置。
- 前記対向電極は前記凹部に接触している、請求項3に記載の撮像装置。
- 前記凹部の前記深さ、前記第1画素電極から前記凹部までの前記最短距離、および、前記第1画素電極から前記第2画素電極までの前記最短距離が0.5μm未満である、請求項1乃至4のいずれか1項に記載の撮像装置。
- 前記光電変換膜を介して前記第1画素電極および前記第2画素電極に対向し、前記光電変換膜の屈折率よりも低い屈折率を有する誘電体膜が、前記面に沿って連続的に設けられており、前記誘電体膜の一部は前記凹部に囲まれている、請求項1乃至5のいずれか1項に記載の撮像装置。
- 前記第1画素電極と前記光電変換膜の間には絶縁膜が設けられている、請求項1乃至6のいずれか1項に記載の撮像装置。
- 前記第1画素電極の厚さが、前記第1画素電極から前記第2画素電極までの前記最短距離よりも小さい、請求項1乃至7のいずれか1項に記載の撮像装置。
- 前記第1画素電極と前記第2画素電極は共通の絶縁部材の上に配されており、前記絶縁部材の前記第1画素電極および前記第2画素電極の側の面は、前記第1画素電極と前記第2画素電極の間の部分から離れるように凹んだ溝を有している、請求項1乃至8のいずれか1項に記載の撮像装置。
- 前記光電変換膜は量子ドット膜である、請求項1乃至9のいずれか1項に記載の撮像装置。
- 請求項1乃至10のいずれか1項に記載の撮像装置と、前記撮像装置から得られた信号を処理する信号処理装置と、を備える撮像システム。
- 複数のトランジスタが設けられた半導体基板の上に、第1接続部および第2接続部を有する導電部材と、前記第1接続部と前記第2接続部の間に溝を有する絶縁部材と、前記第1接続部の上に配された前記第1画素電極と、前記第2接続部の上に配された前記第2画素電極と、を有する部品を用意し、
前記第1画素電極、前記第2画素電極および前記溝を覆う光電変換膜を、前記光電変換膜の前記第1画素電極および前記第2画素電極の側とは反対側の面に、前記溝に対応した凹部が形成されるように成膜することを特徴とする撮像装置の製造方法。 - 前記溝を、前記半導体基板の上に設けられた絶縁部材の、前記第1接続部と前記第2接続部の間に位置する部分の少なくとも一部を除去することにより形成する、請求項12に記載の撮像装置の製造方法。
- 前記第1画素電極および前記第2画素電極を形成した後に、前記溝を形成する、請求項12または13に記載の撮像装置の製造方法。
- 前記第1画素電極および前記第2画素電極を形成する工程では、前記絶縁部材の上に導電膜を形成し、前記導電膜の上にマスクを形成し、前記マスクを用いて前記導電膜をエッチングすることにより前記第1画素電極および前記第2画素電極を形成し、前記マスクを用いて前記絶縁部材をエッチングすることにより前記溝を形成する、請求項11乃至14のいずれか1項に記載の撮像装置の製造方法。
- 前記第1画素電極から前記凹部までの最短距離が前記第1画素電極から前記第2画素電極までの最短距離よりも大きくなるように前記溝および前記光電変換膜を形成する、請求項11乃至15のいずれか1項に記載の撮像装置の製造方法。
- 請求項1乃至10のいずれか1項に記載の撮像装置を製造する製造方法であって、
前記第1画素電極および前記第2画素電極を覆う第1光電変換層を形成し、前記第1画素電極と前記第2画素電極の間の部分に対応して、前記第1光電変換層に溝を形成することにより、前記第1画素電極の上に位置する第1光電変換部と、前記第1光電変換部に前記溝を介して隣り合う、前記第2画素電極の上に位置する第2光電変換部と、を形成し、
前記第1光電変換部および前記第2光電変換部を覆う第2光電変換層を、前記第2光電変換層の前記第1画素電極および前記第2画素電極の側とは反対側の面に、前記溝に対応した凹部が形成されるように成膜することを特徴とする撮像装置の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014156787A JP6429525B2 (ja) | 2014-07-31 | 2014-07-31 | 撮像装置、撮像システムおよび撮像装置の製造方法 |
US14/810,285 US9825086B2 (en) | 2014-07-31 | 2015-07-27 | Image pickup apparatus, image pickup system, and method for manufacturing image pickup apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014156787A JP6429525B2 (ja) | 2014-07-31 | 2014-07-31 | 撮像装置、撮像システムおよび撮像装置の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016033979A true JP2016033979A (ja) | 2016-03-10 |
JP2016033979A5 JP2016033979A5 (ja) | 2017-09-07 |
JP6429525B2 JP6429525B2 (ja) | 2018-11-28 |
Family
ID=55180850
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014156787A Expired - Fee Related JP6429525B2 (ja) | 2014-07-31 | 2014-07-31 | 撮像装置、撮像システムおよび撮像装置の製造方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US9825086B2 (ja) |
JP (1) | JP6429525B2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018235895A1 (ja) * | 2017-06-21 | 2018-12-27 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子、積層型撮像素子及び固体撮像装置 |
JP2019009437A (ja) * | 2017-06-21 | 2019-01-17 | ソニー株式会社 | 撮像素子、積層型撮像素子及び固体撮像装置 |
WO2021149413A1 (ja) * | 2020-01-23 | 2021-07-29 | パナソニックIpマネジメント株式会社 | 撮像装置 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6303803B2 (ja) | 2013-07-03 | 2018-04-04 | ソニー株式会社 | 固体撮像装置およびその製造方法 |
KR20180117601A (ko) * | 2016-02-29 | 2018-10-29 | 소니 주식회사 | 고체 촬상 소자 |
US10700780B2 (en) | 2018-05-30 | 2020-06-30 | Apple Inc. | Systems and methods for adjusting movable lenses in directional free-space optical communication systems for portable electronic devices |
US11303355B2 (en) | 2018-05-30 | 2022-04-12 | Apple Inc. | Optical structures in directional free-space optical communication systems for portable electronic devices |
US10705347B2 (en) * | 2018-05-30 | 2020-07-07 | Apple Inc. | Wafer-level high aspect ratio beam shaping |
US11549799B2 (en) | 2019-07-01 | 2023-01-10 | Apple Inc. | Self-mixing interference device for sensing applications |
US11843022B2 (en) * | 2020-12-03 | 2023-12-12 | Sharp Kabushiki Kaisha | X-ray imaging panel and method of manufacturing X-ray imaging panel |
US11916094B2 (en) * | 2021-08-02 | 2024-02-27 | Sharp Display Technology Corporation | Photoelectric conversion panel and method for manufacturing photoelectric conversion panel |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6292365A (ja) * | 1985-10-18 | 1987-04-27 | Fuji Photo Film Co Ltd | 半導体装置およびその製造方法 |
JPS62117367A (ja) * | 1985-11-18 | 1987-05-28 | Toshiba Corp | 固体撮像装置 |
JPS62122268A (ja) * | 1985-11-22 | 1987-06-03 | Fuji Photo Film Co Ltd | 固体撮像素子 |
JPH03278458A (ja) * | 1990-03-08 | 1991-12-10 | Sharp Corp | 薄膜受光装置 |
US20090218650A1 (en) * | 2008-02-28 | 2009-09-03 | Hsiao-Wen Lee | Image sensor device with submicron structure |
JP2010177392A (ja) * | 2009-01-29 | 2010-08-12 | Sony Corp | 固体撮像装置、その製造方法および撮像装置 |
JP2012094810A (ja) * | 2010-09-30 | 2012-05-17 | Fujifilm Corp | 光電変換素子、光電変換素子の製造方法、及び撮像素子 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5694840B2 (ja) * | 2011-04-20 | 2015-04-01 | 富士フイルム株式会社 | 有機撮像素子および有機撮像素子の製造方法 |
JPWO2014027588A1 (ja) * | 2012-08-14 | 2016-07-25 | ソニー株式会社 | 固体撮像装置および電子機器 |
-
2014
- 2014-07-31 JP JP2014156787A patent/JP6429525B2/ja not_active Expired - Fee Related
-
2015
- 2015-07-27 US US14/810,285 patent/US9825086B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6292365A (ja) * | 1985-10-18 | 1987-04-27 | Fuji Photo Film Co Ltd | 半導体装置およびその製造方法 |
JPS62117367A (ja) * | 1985-11-18 | 1987-05-28 | Toshiba Corp | 固体撮像装置 |
JPS62122268A (ja) * | 1985-11-22 | 1987-06-03 | Fuji Photo Film Co Ltd | 固体撮像素子 |
JPH03278458A (ja) * | 1990-03-08 | 1991-12-10 | Sharp Corp | 薄膜受光装置 |
US20090218650A1 (en) * | 2008-02-28 | 2009-09-03 | Hsiao-Wen Lee | Image sensor device with submicron structure |
JP2010177392A (ja) * | 2009-01-29 | 2010-08-12 | Sony Corp | 固体撮像装置、その製造方法および撮像装置 |
JP2012094810A (ja) * | 2010-09-30 | 2012-05-17 | Fujifilm Corp | 光電変換素子、光電変換素子の製造方法、及び撮像素子 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018235895A1 (ja) * | 2017-06-21 | 2018-12-27 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子、積層型撮像素子及び固体撮像装置 |
JP2019009437A (ja) * | 2017-06-21 | 2019-01-17 | ソニー株式会社 | 撮像素子、積層型撮像素子及び固体撮像装置 |
JP7099073B2 (ja) | 2017-06-21 | 2022-07-12 | ソニーグループ株式会社 | 撮像素子、積層型撮像素子及び固体撮像装置 |
US11670659B2 (en) | 2017-06-21 | 2023-06-06 | Sony Semiconductor Solutions Corporation | Imaging element, stacked imaging element, and solid-state imaging apparatus |
WO2021149413A1 (ja) * | 2020-01-23 | 2021-07-29 | パナソニックIpマネジメント株式会社 | 撮像装置 |
Also Published As
Publication number | Publication date |
---|---|
US9825086B2 (en) | 2017-11-21 |
US20160035768A1 (en) | 2016-02-04 |
JP6429525B2 (ja) | 2018-11-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6429525B2 (ja) | 撮像装置、撮像システムおよび撮像装置の製造方法 | |
US10903279B2 (en) | Solid state image sensor pixel electrode below a photoelectric conversion film | |
US20220190022A1 (en) | Image sensors | |
US10134792B2 (en) | Semiconductor devices | |
US11430822B2 (en) | Photoelectric conversion apparatus and camera | |
US9991305B2 (en) | Stacked type solid state imaging apparatus and imaging system | |
US11233087B2 (en) | Image sensor | |
US20160301882A1 (en) | Solid-state imaging device and method of manufacturing the solid-state imaging device | |
US20200395397A1 (en) | Image sensor and image-capturing device | |
US11393854B2 (en) | Image sensor with photoelectric part and transfer gate on opposite sides of the substrate | |
US10964734B2 (en) | Image sensor | |
KR20210016272A (ko) | 후면 정렬 마크가 있는 bsi 칩 | |
US10269849B2 (en) | Imaging device including photoelectric conversion film for continuously covering electrodes having a distance between a counter electrode and a pixel electrode or an intermediate electrode is smaller than a distance between the counter electrode and an insulating member | |
US20190378865A1 (en) | Image sensor | |
US20220246666A1 (en) | Imaging element and imaging device | |
US9086577B2 (en) | Solid-state imaging apparatus and imaging system | |
US20140110771A1 (en) | Solid-state imaging device and semiconductor device | |
JP2010045083A (ja) | 固体撮像素子 | |
US11843020B2 (en) | Image sensor | |
US20230005971A1 (en) | Image sensor and method of fabricating the same | |
US20220216250A1 (en) | Image sensor with pixel separation structure | |
KR20060108956A (ko) | 크로스 토크를 억제하기 위한 광차단 패턴을 갖는 cmos이미지 센서 및 그 제조방법 | |
US20140285694A1 (en) | Solid-state imaging apparatus and imaging system | |
KR20220029072A (ko) | 이미지 센서 및 그 제조 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170728 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20170728 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180807 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20180913 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20181002 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20181030 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 6429525 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
LAPS | Cancellation because of no payment of annual fees |