JP2015178683A5 - X-ray absorption grating and Talbot interferometer - Google Patents
X-ray absorption grating and Talbot interferometer Download PDFInfo
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- JP2015178683A5 JP2015178683A5 JP2015133971A JP2015133971A JP2015178683A5 JP 2015178683 A5 JP2015178683 A5 JP 2015178683A5 JP 2015133971 A JP2015133971 A JP 2015133971A JP 2015133971 A JP2015133971 A JP 2015133971A JP 2015178683 A5 JP2015178683 A5 JP 2015178683A5
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- ray absorption
- absorption grating
- disposed
- grating
- metal
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- 238000010521 absorption reaction Methods 0.000 title claims description 11
- LFEUVBZXUFMACD-UHFFFAOYSA-H lead(2+);trioxido(oxo)-$l^{5}-arsane Chemical compound [Pb+2].[Pb+2].[Pb+2].[O-][As]([O-])([O-])=O.[O-][As]([O-])([O-])=O LFEUVBZXUFMACD-UHFFFAOYSA-H 0.000 title claims description 3
- 239000002184 metal Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 4
Description
本発明はＸ線吸収格子及びタルボ干渉計に関する。 The present invention relates to an X-ray absorption grating and a Talbot interferometer .
本発明の一側面としてのＸ線吸収格子はＳｉ基板に配置された凹部に金属が配置された格子領域を有し、前記格子領域の外形が円形であることを特徴とする。 An X-ray absorption grating according to one aspect of the present invention has a lattice region in which a metal is disposed in a recess disposed in a Si substrate, and the outer shape of the lattice region is circular.
Claims (5)
前記格子領域の外形が円形であることを特徴とするＸ線吸収格子。 Having a lattice region in which a metal is disposed in a recess disposed in the Si substrate;
An X-ray absorption grating, wherein the outer shape of the grating region is circular.
前記絶縁膜は前記凹部の底面の少なくとも一部には配置されておらず。
前記底面のうち、前記絶縁膜が配置されていない領域において前記Ｓｉ基板のＳｉ表面と前記金属とが接していることを特徴とする請求項１に記載のＸ線吸収格子。 Having an insulating film disposed between the side wall of the recess and the metal ;
The insulating film is not arranged in at least part of the bottom surface of the recess.
2. The X-ray absorption grating according to claim 1, wherein an Si surface of the Si substrate is in contact with the metal in a region of the bottom surface where the insulating film is not disposed .
前記絶縁膜は前記凹部の底面の少なくとも一部には配置されておらず。
前記底面のうち、前記絶縁膜が配置されていない領域において前記Ｓｉ基板のＳｉ表面と前記金属との間に金属膜が配置されていることを特徴とする請求項１に記載のＸ線吸収格子。 Having an insulating film disposed between the side wall of the recess and the metal ;
The insulating film is not arranged in at least part of the bottom surface of the recess.
2. The X-ray absorption grating according to claim 1, wherein a metal film is disposed between the Si surface of the Si substrate and the metal in a region of the bottom surface where the insulating film is not disposed. 3. .
前記回折格子によって回折された前記Ｘ線の一部を吸収するＸ線吸収格子と、
前記吸収格子を経たＸ線を検出する検出器と、を備え、
前記Ｘ線吸収格子は、請求項１乃至４のいずれか１項に記載のＸ線吸収格子であることを特徴とするタルボ干渉計。 A diffraction grating for diffracting X-rays from an X-ray source;
An X-ray absorption grating that absorbs part of the X-rays diffracted by the diffraction grating;
A detector that detects X-rays that have passed through the absorption grating,
The X-ray absorption grating Talbot interferometer, which is a X-ray absorption grating according to any one of claims 1 to 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015133971A JP2015178683A (en) | 2010-01-08 | 2015-07-02 | metal absorption grating and Talbot interferometer |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010003327 | 2010-01-08 | ||
| JP2010003327 | 2010-01-08 | ||
| JP2015133971A JP2015178683A (en) | 2010-01-08 | 2015-07-02 | metal absorption grating and Talbot interferometer |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010265093A Division JP5773624B2 (en) | 2010-01-08 | 2010-11-29 | Manufacturing method of fine structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015178683A JP2015178683A (en) | 2015-10-08 |
| JP2015178683A5 true JP2015178683A5 (en) | 2015-11-19 |
Family
ID=54262922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015133971A Withdrawn JP2015178683A (en) | 2010-01-08 | 2015-07-02 | metal absorption grating and Talbot interferometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2015178683A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017116475A (en) * | 2015-12-25 | 2017-06-29 | キヤノン株式会社 | X-ray shield grating, method for forming x-ray shield grating, and x-ray talbot interferometer with x-ray shield grating |
| EP3654075A1 (en) * | 2018-11-13 | 2020-05-20 | Koninklijke Philips N.V. | Structured grating component, imaging system and manufacturing method |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL109143A (en) * | 1993-04-05 | 1999-03-12 | Cardiac Mariners Inc | X-ray detector for a low dosage scanning beam digital x-ray imaging system |
| US6018566A (en) * | 1997-10-24 | 2000-01-25 | Trw Inc. | Grid formed with silicon substrate |
| JP2002110897A (en) * | 2000-09-28 | 2002-04-12 | Toshiba Corp | Semiconductor device and its manufacturing method |
| TW200527123A (en) * | 2004-02-02 | 2005-08-16 | Tech Media Corp U | Method of fabricating a metal mask |
| JP4608679B2 (en) * | 2005-03-17 | 2011-01-12 | 財団法人新産業創造研究機構 | Manufacturing method of phase type diffraction grating and amplitude type diffraction grating used in X-ray Talbot interferometer |
| JP4642818B2 (en) * | 2007-08-02 | 2011-03-02 | 株式会社ナノクリエート | Manufacturing method of diffraction grating |
| JP5339975B2 (en) * | 2008-03-13 | 2013-11-13 | キヤノン株式会社 | Phase grating used for X-ray phase imaging, X-ray phase contrast image imaging apparatus using the phase grating, X-ray computed tomography system |
| JP5773624B2 (en) * | 2010-01-08 | 2015-09-02 | キヤノン株式会社 | Manufacturing method of fine structure |
-
2015
- 2015-07-02 JP JP2015133971A patent/JP2015178683A/en not_active Withdrawn
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