JP2015132636A5

JP2015132636A5 -

Info

Publication number: JP2015132636A5
Application number: JP2014002301A
Authority: JP
Filing date: 2014-01-09
Publication date: 2017-02-09
Anticipated expiration: 2034-01-09

Description

本発明の一側面としての光学膜は、基材上に形成される。該光学膜は、基材側から順に積層された第１層乃至第５層を有する。波長がλ＝５５０ｎｍである光に対する、基材の屈折率をｎs、第１層乃至第５層の屈折率をｎ１〜ｎ５、第１層乃至第５層の光学膜厚をｄ１（ｎｍ）〜ｄ５（ｎｍ）とするとき、以下の条件を満足することを特徴とする。
１．４０≦ｎs≦２．０５
１．３≦ｎ１≦１．８
１．８≦ｎ２≦２．２
１．６≦ｎ３≦１．８
１．３≦ｎ４≦１．６
１．０５≦ｎ５≦１．３０
０．０２λ≦ｄ１≦０．３３λ
０．０２λ≦ｄ２≦０．１０λ
０．０２λ≦ｄ３≦０．３３λ
０．０２λ≦ｄ４≦０．１６λ
０．１４λ≦ｄ５≦０．３０λ
なお、上記光学膜を、基材としての光学部材の表面に形成した光学素子および該光学素子を含む光学系を有する光学機器も、本発明の他の一側面を構成する。

The optical film as one aspect of the present invention is formed on a substrate. Optical film has a first layer to the fifth layer which are laminated from the substrate side. That the wave length against the light is lambda = 550 nm, the refractive index of the substrate n s, a refractive index of the first layer to the fifth layer n1 ~n5, the optical thickness of the first layer to the fifth layer d1 (nm) ~d5 (nm) and be Rutoki, and satisfies the following condition.
1.40 ≦ ns ≦ 2.05
1.3 ≦ n1 ≦ 1.8
1.8 ≦ n2 ≦ 2.2
1.6 ≦ n3 ≦ 1.8
1.3 ≦ n4 ≦ 1.6
1.05 ≦ n5 ≦ 1.30
0.02λ ≦ d1 ≦ 0.33λ
0.02λ ≦ d2 ≦ 0.10λ
0.02λ ≦ d3 ≦ 0.33λ
0.02λ ≦ d4 ≦ 0.16λ
0.14λ ≦ d5 ≦ 0.30λ
Note that an optical device having the optical film formed on the surface of an optical member as a base material and an optical apparatus including an optical system including the optical element also constitute another aspect of the present invention.

Claims

On the substrate, an optical film having a first layer to the fifth layer, which are sequentially stacked from the substrate side,
Wave length against the light is lambda = 550 nm, the refractive index of the substrate n s, the first layer to the refractive index of the fifth layer n1 ~n5, optical film of the first layer to the fifth layer When the thickness is d1 (nm) to d5 (nm) ,
An optical film characterized by satisfying the following conditions.
1.40 ≦ n s ≦ 2.05
1.3 ≦ n1 ≦ 1.8
1.8 ≦ n2 ≦ 2.2
1.6 ≦ n3 ≦ 1.8
1.3 ≦ n4 ≦ 1.6
1.05 ≦ n5 ≦ 1.30
0.02 λ ≦ d1 ≦ 0.33 λ
0.02 λ ≦ d2 ≦ 0.10 λ
0.02 λ ≦ d3 ≦ 0.33 λ
0.02 λ ≦ d4 ≦ 0.16 λ
0.14 λ ≦ d5 ≦ 0.30 λ

The optical film according to claim 1, wherein the following condition is satisfied.
n1 <n2
n5 <n4 <n3 <n 2

Wherein the fifth layer, the optical film according to claim 1 or 2, characterized in the early days including the hollow fine particles.

The hollow fine particles, optical film according to claim 3, characterized in that consists of silicon oxide or magnesium fluoride.

It said fourth layer, the optical film according to claim 1, any one of 4, wherein the early days containing silicon oxide.

And the second layer, either titanium, tantalum, zirconium, chromium, niobium, cerium, hafnium, from claim 1, characterized in that consists of a single or a mixture of any of these oxides of yttrium 5 The optical film according to one item.

An optical member as the base material,
Optical element characterized by having an optical film according to any one of claims 1 formed on the surface of the optical faculty member 6.

An optical apparatus comprising an optical system including the optical element according to claim 7 .