JP2015103547A - Semiconductor device - Google Patents

Semiconductor device Download PDF

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JP2015103547A
JP2015103547A JP2013240788A JP2013240788A JP2015103547A JP 2015103547 A JP2015103547 A JP 2015103547A JP 2013240788 A JP2013240788 A JP 2013240788A JP 2013240788 A JP2013240788 A JP 2013240788A JP 2015103547 A JP2015103547 A JP 2015103547A
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memory chip
semiconductor device
wiring board
electrode pads
semiconductor
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行敏 廣瀬
Yukitoshi Hirose
行敏 廣瀬
裕士 井上
Yuji Inoue
裕士 井上
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Micron Technology Inc
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Micron Technology Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/023Redistribution layers [RDL] for bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05554Shape in top view being square
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49175Parallel arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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  • Semiconductor Memories (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce a size of a semiconductor device mounting a plurality of semiconductor chips.SOLUTION: In a semiconductor device, a memory chip 102a and a memory chip 102b are mounted on a wiring board 106. On the memory chip 102a, a plurality of electrode pads 116 are arranged along a first side L1 and a third side L3. On the memory chip 102b, a plurality of electrode pads 116 are arranged along a fifth side L5 and a seventh side L7. The electrode pad 116 is connected with a connection pad 110 provided on the wiring board 106 via a bonding wire 118. On the wiring board 106, the memory chip 102a and the memory chip 102b are arranged in directions reverse to each other so that a second side L2 and a sixth side L6 are facing each other. In addition, the memory chip 102a and the memory chip 102b are arranged while being offset in a y-direction.

Description

本発明は、複数の半導体チップが搭載される半導体装置に関する。   The present invention relates to a semiconductor device on which a plurality of semiconductor chips are mounted.

DRAM(Dynamic Random Access Memory)などの半導体装置に要求される記憶容量は年々増大している。近年においては、1枚のパッケージ基板に複数の半導体チップ(メモリチップ)を搭載する方法も提案されている。複数の半導体チップはパッケージ基板の上に積層されることもあれば、並置されることもある(特許文献1〜3参照)。   The storage capacity required for semiconductor devices such as DRAM (Dynamic Random Access Memory) is increasing year by year. In recent years, a method of mounting a plurality of semiconductor chips (memory chips) on a single package substrate has also been proposed. A plurality of semiconductor chips may be stacked on the package substrate or may be juxtaposed (see Patent Documents 1 to 3).

特開2008−130998号公報JP 2008-130998 A 特開2009−088083号公報JP 2009-088083 A 特開2009−260373号公報JP 2009-260373 A

通常、半導体チップにおいては、2つの長辺または短辺に沿って複数の電極パッドが配列される。これらの電極パッドは、ボンディングワイヤによりパッケージ基板の接続パッドと接続される。複数の接続パッドをパッケージ基板に形成する必要があるため、半導体チップが配置される領域の周囲にある程度のマージン領域を形成する必要がある。このマージン領域は半導体装置のサイズを増加させる要因である。   Usually, in a semiconductor chip, a plurality of electrode pads are arranged along two long sides or short sides. These electrode pads are connected to connection pads on the package substrate by bonding wires. Since it is necessary to form a plurality of connection pads on the package substrate, it is necessary to form a certain margin area around the area where the semiconductor chip is arranged. This margin region is a factor that increases the size of the semiconductor device.

本実施形態における半導体装置は、第1方向に延在する第1辺及び第2辺と、第1方向と交差する第2方向に延在する第3辺及び第4辺と、第1辺と第3辺それぞれに沿って配列された複数の第1の電極パッドとを有する第1の半導体チップと、第1方向に延在する第5辺及び第6辺と、第2方向に延在する第7辺及び第8辺と、第5辺と第7辺それぞれに沿って配列された複数の第2の電極パッドとを有する第2の半導体チップと、第1及び第2の電極パッドとボンディングワイヤを介して接続される複数の接続パッドを有するパッケージ基板と、を備える。第1および第2の半導体チップは、第2辺および第6辺が対向するようにパッケージ基板上に搭載される。   The semiconductor device according to the present embodiment includes a first side and a second side extending in a first direction, a third side and a fourth side extending in a second direction intersecting the first direction, a first side, A first semiconductor chip having a plurality of first electrode pads arranged along each of the third sides, a fifth side and a sixth side extending in the first direction, and extending in the second direction A second semiconductor chip having a seventh side and an eighth side, and a plurality of second electrode pads arranged along the fifth side and the seventh side, and bonding with the first and second electrode pads; A package substrate having a plurality of connection pads connected via wires. The first and second semiconductor chips are mounted on the package substrate so that the second side and the sixth side face each other.

本発明によれば、複数の半導体チップを搭載する半導体装置の平面サイズを縮小できる。   According to the present invention, the planar size of a semiconductor device on which a plurality of semiconductor chips are mounted can be reduced.

本実施形態における半導体装置の断面図である。It is sectional drawing of the semiconductor device in this embodiment. 本実施形態における配線基板に2つのメモリチップを並置させたときの概略平面図である。It is a schematic plan view when two memory chips are juxtaposed on the wiring board in the present embodiment. 比較例1におけるメモリチップの配置を示す概略平面図である。7 is a schematic plan view showing the arrangement of memory chips in Comparative Example 1. FIG. 比較例2におけるメモリチップの配置を示す概略平面図である。12 is a schematic plan view showing the arrangement of memory chips in Comparative Example 2. FIG. 再配線層の断面図である。It is sectional drawing of a rewiring layer. 再配線をしたときの第1の平面図である。It is a 1st top view when rewiring is carried out. 再配線をしたときの第2の平面図である。It is a 2nd top view when rewiring is carried out. 本実施形態の第1の変形例において、配線基板に2枚のメモリチップを並置させたときの概略平面図である。In the 1st modification of this embodiment, it is a schematic plan view when two memory chips are juxtaposed on a wiring board. 本実施形態の第2の変形例において、配線基板に2枚のメモリチップを並置させたときの概略平面図である。In the 2nd modification of this embodiment, it is a schematic plan view when two memory chips are juxtaposed on a wiring board. 本実施形態の第3の変形例において、複数の配電基板を結合させたときの概略平面図である。In the 3rd modification of this embodiment, it is a schematic plan view when a some power distribution board is combined.

以下、添付図面を参照しながら、本発明の好ましい実施形態について詳細に説明する。   Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

図1は、本実施形態における半導体装置100の断面図である。半導体装置100は、配線基板106とその上に搭載される2つのメモリチップ102a(第1の半導体チップ)とメモリチップ102b(第2の半導体チップ)を含む。配線基板106(パッケージ基板)は、ガラスエポキシ基板などの絶縁基材104の表面に配線パターンが形成された厚さ90μm程度の基板である。絶縁基材104の両面は絶縁膜108(ソルダーレジスト膜)に覆われる。配線パターンのほとんどは絶縁膜108により覆われるが、一部は露出する。この露出した配線パターンが接続パッド110およびランド112である。接続パッド110は、メモリチップ102a,102bが配置される領域を囲むように配置される(図2等も参照)。絶縁基材104を貫通するスルーホール導体(図示せず)により、接続パッド110とランド112は電気的に接続される。ランド114には、はんだボール114(外部端子)が接続される。   FIG. 1 is a cross-sectional view of a semiconductor device 100 according to this embodiment. The semiconductor device 100 includes a wiring board 106, two memory chips 102a (first semiconductor chip) and a memory chip 102b (second semiconductor chip) mounted thereon. The wiring substrate 106 (package substrate) is a substrate having a thickness of about 90 μm in which a wiring pattern is formed on the surface of an insulating base material 104 such as a glass epoxy substrate. Both surfaces of the insulating substrate 104 are covered with an insulating film 108 (solder resist film). Most of the wiring pattern is covered with the insulating film 108, but a part is exposed. The exposed wiring pattern is the connection pad 110 and the land 112. The connection pad 110 is disposed so as to surround a region where the memory chips 102a and 102b are disposed (see also FIG. 2 and the like). The connection pad 110 and the land 112 are electrically connected by a through-hole conductor (not shown) penetrating the insulating substrate 104. Solder balls 114 (external terminals) are connected to the lands 114.

メモリチップ102a,102bは、配線基板106の中央部に並置され、接着部材122により配線基板106に接着される。本実施形態におけるこれらのメモリチップは、サイズも記憶容量も同じDRAM(Dynamic Random Access Memory)のメモリチップであるとする。メモリチップ102a,102bはいずれも長方形面を有する板状のチップである。また、メモリチップ102a,102bは、いずれもシリコン基板の一面にメモリ回路が形成され、複数の電極パッド116が配列される。   The memory chips 102 a and 102 b are juxtaposed at the center of the wiring board 106 and bonded to the wiring board 106 by an adhesive member 122. These memory chips in this embodiment are assumed to be DRAM (Dynamic Random Access Memory) memory chips having the same size and storage capacity. Each of the memory chips 102a and 102b is a plate-shaped chip having a rectangular surface. In each of the memory chips 102a and 102b, a memory circuit is formed on one surface of a silicon substrate, and a plurality of electrode pads 116 are arranged.

各メモリチップ102の電極パッド116は、ボンディングワイヤ118により接続パッド110と接続され、更に、スルーホール導体やランド112を介してはんだボール114とも電気的に接続される。メモリチップ102は、熱硬化性樹脂である封止樹脂120により覆われる。封止樹脂120は、たとえば、MUF(Mold Underfill)である。封止樹脂120は、10μm未満の大きさのフィラーを含むエポキシ樹脂であってもよい。   The electrode pads 116 of each memory chip 102 are connected to the connection pads 110 by bonding wires 118 and are also electrically connected to the solder balls 114 through through-hole conductors and lands 112. The memory chip 102 is covered with a sealing resin 120 that is a thermosetting resin. The sealing resin 120 is, for example, MUF (Mold Underfill). The sealing resin 120 may be an epoxy resin including a filler having a size of less than 10 μm.

図2は、本実施形態における配線基板106にメモリチップ102a,102bを並置させたときの概略平面図である。メモリチップ102aは、長辺として第1辺L1と第2辺L2を有し、短辺として第3辺L3、第4辺L4を有する。第1辺L1と第3辺L3に沿って複数の電極パッド116が配列される。電極パッド116は、配線基板106からの電源電圧の供給や各種制御信号、データ信号の送受を行うためのものである。同様に、メモリチップ102bは長辺として第5辺L5、第6辺L6を有し、短辺として第7辺L7、第8辺L8を有する。第5辺L5と第7辺L7に沿って複数の電極パッド116が配列される。このように、メモリチップ102a,102bを平置きすることによりパッケージを薄くできる。   FIG. 2 is a schematic plan view when the memory chips 102a and 102b are juxtaposed on the wiring board 106 in the present embodiment. The memory chip 102a has a first side L1 and a second side L2 as long sides, and has a third side L3 and a fourth side L4 as short sides. A plurality of electrode pads 116 are arranged along the first side L1 and the third side L3. The electrode pad 116 is used for supplying a power supply voltage from the wiring board 106 and transmitting / receiving various control signals and data signals. Similarly, the memory chip 102b has a fifth side L5 and a sixth side L6 as long sides, and has a seventh side L7 and an eighth side L8 as short sides. A plurality of electrode pads 116 are arranged along the fifth side L5 and the seventh side L7. In this way, the package can be thinned by placing the memory chips 102a and 102b flat.

電極パッド116は、配線基板106上に形成される接続パッド110とボンディングワイヤ118を介して接続される。メモリチップ102aとメモリチップ102bは同サイズ、同形状であるため、メモリチップ102bはメモリチップ102aに対して180度回転させた向きに載置される。   The electrode pad 116 is connected to a connection pad 110 formed on the wiring substrate 106 via a bonding wire 118. Since the memory chip 102a and the memory chip 102b have the same size and shape, the memory chip 102b is placed in a direction rotated by 180 degrees with respect to the memory chip 102a.

接続パッド110の配列に必要なマージンをMとすると、メモリチップ102aとメモリチップ102bはy軸方向にMだけずらされている。ずれの大きさはM未満でもM以上でもよいが、後述の理由によりMだけずらすのが好適である。このため第3辺L3と第8辺L8は一直線上に並ばない。同様の理由から、第4辺L4と第7辺L7も一直線上に並ばない。メモリチップ102aはメモリチップ102bに比べると第4辺L4側にずらされているともいえる。   When the margin necessary for the arrangement of the connection pads 110 is M, the memory chip 102a and the memory chip 102b are shifted by M in the y-axis direction. The magnitude of the shift may be less than M or greater than or equal to M, but it is preferable to shift by M for reasons described later. For this reason, the third side L3 and the eighth side L8 are not aligned on a straight line. For the same reason, the fourth side L4 and the seventh side L7 are not aligned on a straight line. It can be said that the memory chip 102a is shifted toward the fourth side L4 as compared with the memory chip 102b.

図3は、比較例1におけるメモリチップ102の配置を示す概略平面図である。図3においては、メモリチップ102aの2つの長辺である第1辺L1と第2辺L2に沿って電極パッド116が配列されている。同様に、メモリチップ102bにおいても2つの長辺である第5辺L5、第6辺L6に沿って電極パッド116が配置されている。このため、メモリチップ102aとメモリチップ102bの間に接続パッド110を2列分配列する必要がある。図3の配置例の場合、y方向においてはマージンの確保は不要であるが、x方向においては4Mのマージンが必要となる。   FIG. 3 is a schematic plan view showing the arrangement of the memory chip 102 in the first comparative example. In FIG. 3, electrode pads 116 are arranged along the first side L1 and the second side L2, which are the two long sides of the memory chip 102a. Similarly, in the memory chip 102b, electrode pads 116 are arranged along the fifth side L5 and the sixth side L6, which are two long sides. Therefore, it is necessary to arrange the connection pads 110 for two columns between the memory chip 102a and the memory chip 102b. In the arrangement example of FIG. 3, it is not necessary to secure a margin in the y direction, but a margin of 4M is required in the x direction.

図4は、比較例2におけるメモリチップ102の配置を示す概略平面図である。図4においては、本実施形態と同じく、メモリチップ102aの第1辺L1と第2辺L2に沿って電極パッド116が配列され、メモリチップ102bの第5辺L5と第7辺L7に沿って電極パッド116が配列される。本実施形態と異なり、メモリチップ102aとメモリチップ102bはy方向にずらされていない。このため、図4の配置例の場合、y方向とx方向の双方において2Mのマージンが必要となる。   FIG. 4 is a schematic plan view showing the arrangement of the memory chip 102 in the second comparative example. In FIG. 4, as in the present embodiment, electrode pads 116 are arranged along the first side L1 and the second side L2 of the memory chip 102a, and along the fifth side L5 and the seventh side L7 of the memory chip 102b. Electrode pads 116 are arranged. Unlike the present embodiment, the memory chip 102a and the memory chip 102b are not shifted in the y direction. For this reason, in the arrangement example of FIG. 4, a 2M margin is required in both the y direction and the x direction.

なお、図3では、メモリチップ102の長辺の両サイドに電極パッド116が設けられているため、配線基板106の中央付近、すなわち、半導体パッケージの中央付近に複数の電極パッド116が配置される。一方、パッケージのはんだボール114が、パッケージの外周部に設けられていた場合、電極パッド116とはんだボール114とを接続する配線が長くなるという問題がある。   In FIG. 3, since the electrode pads 116 are provided on both long sides of the memory chip 102, a plurality of electrode pads 116 are arranged near the center of the wiring substrate 106, that is, near the center of the semiconductor package. . On the other hand, when the solder balls 114 of the package are provided on the outer peripheral portion of the package, there is a problem that the wiring connecting the electrode pads 116 and the solder balls 114 becomes long.

これに対して、図4では、メモリチップ102aの辺L1、L3に沿って電極パッド116が配置されている。すなわち、電極パッド116はL字状にメモリチップ102に配置されており、メモリチップ102a、102bの一方を180度反転させ、図4に示すように、それらのメモリチップを対向させると、半導体パッケージの中央付近に電極パッド116は配置されなくなる。したがって、図4のレイアウトによれば、電極パッド116とはんだボール114とを接続する配線を短くできる。図2においても同様である。信号配線、電源、グランド配線等の配線を短くすることにより、信号波形品質を維持でき、高速化の要求を満たすことができる。したがって、図2や図4によれば、薄型、高速化の要求を満たせる半導体メモリ装置を提供できる。   On the other hand, in FIG. 4, electrode pads 116 are arranged along the sides L1 and L3 of the memory chip 102a. That is, the electrode pad 116 is arranged in an L shape on the memory chip 102. When one of the memory chips 102a and 102b is inverted 180 degrees and the memory chips are opposed to each other as shown in FIG. The electrode pad 116 is not disposed in the vicinity of the center. Therefore, according to the layout of FIG. 4, the wiring connecting the electrode pad 116 and the solder ball 114 can be shortened. The same applies to FIG. By shortening the wiring such as the signal wiring, the power supply, and the ground wiring, the signal waveform quality can be maintained and the demand for high speed can be satisfied. Therefore, according to FIG. 2 and FIG. 4, it is possible to provide a semiconductor memory device that can satisfy the demand for thinness and high speed.

図2に戻る。図2においては、メモリチップ102aとメモリチップ102bがy方向にMだけずらされている。このため、メモリチップ102aの第3辺L3に沿って配列される接続パッド110が、メモリチップ102bの第8辺L8よりも下方向(y軸負方向)に突出することはない。同様に、メモリチップ102bの第7辺L7に沿って配列される接続パッド110も、第4辺L4よりも上方向(y軸正方向)に突出することはない。この結果、図2の本実施形態における配置方法では、y方向に必要なマージンはM、x方向に必要なマージンは2Mとなる。   Returning to FIG. In FIG. 2, the memory chip 102a and the memory chip 102b are shifted by M in the y direction. For this reason, the connection pads 110 arranged along the third side L3 of the memory chip 102a do not protrude downward (y-axis negative direction) from the eighth side L8 of the memory chip 102b. Similarly, the connection pads 110 arranged along the seventh side L7 of the memory chip 102b do not protrude upward (y-axis positive direction) from the fourth side L4. As a result, in the arrangement method in this embodiment of FIG. 2, the margin required in the y direction is M, and the margin required in the x direction is 2M.

長辺である第1辺L1の長さをLL,短辺である第3辺L3の長さをLSとすると、本実施形態における配線基板106が必要最小限確保すべき面積は(2LS+2M)×(LL+M)となる。図2の比較例1の場合は(2LS+4M)×LL、図3の比較例2の場合は(2LS+2M)×(LL+2M)となる。したがって、本実施形態における配置方法は比較例2よりも配線基板106のサイズを常に小さくでき、Mが極端に大きくなることがなければ(LS+M>LLとならなければ)比較例1よりも配線基板106のサイズを小さくできる。通常、LSに比べてMは充分に小さいため、本実施形態の配置方法は比較例1よりも配線基板106のサイズを小さくできる。   Assuming that the length of the first side L1 that is the long side is LL and the length of the third side L3 that is the short side is LS, the area that the wiring board 106 according to the present embodiment should secure to the minimum is (2LS + 2M) × (LL + M). In the case of the comparative example 1 in FIG. 2, (2LS + 4M) × LL, and in the case of the comparative example 2 in FIG. 3, (2LS + 2M) × (LL + 2M). Therefore, the arrangement method in the present embodiment can always reduce the size of the wiring board 106 as compared with the comparative example 2, and if M does not become extremely large (if LS + M> LL is not satisfied), the wiring board as compared with the comparative example 1. The size of 106 can be reduced. Usually, M is sufficiently smaller than LS, and therefore the arrangement method of the present embodiment can reduce the size of the wiring board 106 as compared with Comparative Example 1.

図5は、再配線層126の断面図である。本実施形態のメモリチップ102は、電極パッド116がL字型に配置されているが、一般的にはメモリチップ102の電極パッド(内部電極128)は、2つの長辺または短辺に沿って配置されるか、中央部に配置されることが多い。このような場合には、再配線層126により電極パッド116の平面位置を移動させればよい。   FIG. 5 is a cross-sectional view of the rewiring layer 126. In the memory chip 102 of this embodiment, the electrode pads 116 are arranged in an L shape, but generally the electrode pads (internal electrodes 128) of the memory chip 102 are along two long sides or short sides. It is often arranged or arranged in the center. In such a case, the planar position of the electrode pad 116 may be moved by the rewiring layer 126.

図5に示すメモリチップ102は、回路層124の上に再配線層126が形成される。そして、回路層124に設置される内部電極128を、再配線層126の配線130により別の位置の電極パッド116と接続することで、ボンディングワイヤ118と接続すべ
平面位置を内部電極128とは異なる平面位置に移動させている。
In the memory chip 102 illustrated in FIG. 5, a rewiring layer 126 is formed on the circuit layer 124. Then, the internal electrode 128 installed in the circuit layer 124 is connected to the electrode pad 116 at another position by the wiring 130 of the rewiring layer 126, so that the planar position for connecting to the bonding wire 118 is different from that of the internal electrode 128. It is moved to the plane position.

図6は、再配線をしたときの第1の平面図である。図6の場合、第1辺L1と第2辺L2に沿って内部電極128が配列されている。モバイルに搭載されるDRAMではこのように2つの長辺に沿って内部電極128を配置することがある。この場合には、第2辺L2に配列される内部電極128を配線130により第3辺L3側に再配線すればよい。第1辺L1側の内部電極128はそのまま第1辺L1側の電極パッド116に再配線接続される。   FIG. 6 is a first plan view when rewiring is performed. In the case of FIG. 6, the internal electrodes 128 are arranged along the first side L1 and the second side L2. In a DRAM mounted on a mobile, the internal electrode 128 may be arranged along the two long sides as described above. In this case, the internal electrodes 128 arranged on the second side L2 may be rewired to the third side L3 side by the wiring 130. The internal electrode 128 on the first side L1 side is rewired to the electrode pad 116 on the first side L1 side as it is.

図7は、再配線をしたときの第2の平面図である。図7の場合、y軸方向に沿って、メモリチップ102aの中央部に内部電極128が2列に配列されている。この場合には、中央部の内部電極128をそれぞれ第1辺L1側と第3辺L3側に再配線する必要がある。   FIG. 7 is a second plan view when rewiring is performed. In the case of FIG. 7, the internal electrodes 128 are arranged in two rows at the center of the memory chip 102a along the y-axis direction. In this case, it is necessary to redistribute the central internal electrode 128 on the first side L1 side and the third side L3 side, respectively.

図8は、本実施形態の第1の変形例において、配線基板106にメモリチップ102a,102bを並置させたときの概略平面図である。図8に示すように、メモリチップ102aをメモリチップ102bに対して下方向(y軸負方向)にずらしてもよい。このような配置方法により、第4辺L4の上や第8辺L8の下にスペース132を確保し、ここにディスクリート型の受動素子など各種の回路素子を配置してもよい。   FIG. 8 is a schematic plan view when the memory chips 102a and 102b are juxtaposed on the wiring board 106 in the first modification of the present embodiment. As shown in FIG. 8, the memory chip 102a may be shifted downward (y-axis negative direction) with respect to the memory chip 102b. With such an arrangement method, the space 132 may be secured above the fourth side L4 or below the eighth side L8, and various circuit elements such as discrete passive elements may be arranged here.

図9は、本実施形態の第2の変形例において、配線基板106にメモリチップ102a,102bを並置させたときの概略平面図である。図9では、メモリチップ102の長辺ではなく短辺が向かい合うように2つのメモリチップ102を配置している。配線基板106がx方向に長い形状のときには、このような配置方法も可能である。   FIG. 9 is a schematic plan view when the memory chips 102a and 102b are juxtaposed on the wiring board 106 in the second modification of the present embodiment. In FIG. 9, the two memory chips 102 are arranged so that the short sides rather than the long sides of the memory chip 102 face each other. Such an arrangement method is also possible when the wiring board 106 has a shape that is long in the x direction.

図10は、本実施形態の第3の変形例において、2つの配線基板106a,102bにメモリチップ102a,102bをそれぞれ配置させたときの概略平面図およびその断面図である。配線基板106aにはメモリチップ102aが搭載され、別の配線基板106bにはメモリチップ102bが搭載される。また、配線基板106cにはコントローラチップ134が搭載され、配線基板106aと配線基板106c、配線基板106bと配線基板106cはバンプ136または図示しないボンディングワイヤにより接続される。コントローラチップ134は、配線基板106cに対してフェイスアップにて搭載されてもよいし、フェイスダウンで搭載されてもよい。   FIG. 10 is a schematic plan view and a cross-sectional view when the memory chips 102a and 102b are respectively arranged on the two wiring boards 106a and 102b in the third modification of the present embodiment. The memory chip 102a is mounted on the wiring board 106a, and the memory chip 102b is mounted on another wiring board 106b. A controller chip 134 is mounted on the wiring board 106c, and the wiring board 106a and the wiring board 106c, and the wiring board 106b and the wiring board 106c are connected by a bump 136 or a bonding wire (not shown). The controller chip 134 may be mounted face up on the wiring board 106c or may be mounted face down.

配線基板106a,106bにそれぞれ1チャンネルのFPGA(Field-Programmable Gate Array)を形成し、これらを結合して2つのFPGAを実装してもよい。1つの配線基板106に2チャンネル分の回路を形成する場合、どちらか一つのチャンネルに不具合があると、他方のチャンネルが良品であっても2チャンネルパッケージとしては不良品になってしまう。しかし、1チャンネルに対応する配線基板106を2つ組み合わせる場合には、このような問題が発生しないので、コスト低減が可能である。   A single-channel FPGA (Field-Programmable Gate Array) may be formed on each of the wiring boards 106a and 106b, and these may be combined to mount two FPGAs. When a circuit for two channels is formed on one wiring board 106, if any one of the channels is defective, the two-channel package becomes defective even if the other channel is non-defective. However, when two wiring boards 106 corresponding to one channel are combined, such a problem does not occur, and the cost can be reduced.

以上、本発明の好ましい実施形態について説明したが、本発明は、上記の実施形態に限定されることなく、本発明の主旨を逸脱しない範囲で種々の変更が可能であり、それらも本発明の範囲内に包含されるものであることはいうまでもない。   The preferred embodiments of the present invention have been described above, but the present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit of the present invention. Needless to say, it is included in the range.

100 半導体装置
102 メモリチップ
104 絶縁基材
106 配線基板
108 絶縁膜
110 接続パッド
112 ランド
114 はんだボール
116 電極パッド
118 ボンディングワイヤ
120 封止樹脂
122 接着部材
124 回路層
126 再配線層
128 内部電極
130 配線
132 スペース
DESCRIPTION OF SYMBOLS 100 Semiconductor device 102 Memory chip 104 Insulating base material 106 Wiring board 108 Insulating film 110 Connection pad 112 Land 114 Solder ball 116 Electrode pad 118 Bonding wire 120 Sealing resin 122 Adhesive member 124 Circuit layer 126 Rewiring layer 128 Internal electrode 130 Wiring 132 space

Claims (6)

第1方向に延在する第1辺及び第2辺と、前記第1方向と交差する第2方向に延在する第3辺及び第4辺と、前記第1辺と前記第3辺それぞれに沿って配列された複数の第1の電極パッドとを有する第1の半導体チップと、
前記第1方向に延在する第5辺及び第6辺と、前記第2方向に延在する第7辺及び第8辺と、前記第5辺と前記第7辺それぞれに沿って配列された複数の第2の電極パッドとを有する第2の半導体チップと、
前記第1及び第2の電極パッドとボンディングワイヤを介して接続される複数の接続パッドを有するパッケージ基板と、を備え、
前記第1および第2の半導体チップは、前記第2辺および前記第6辺が対向するように前記パッケージ基板上に搭載されることを特徴とする半導体装置。
A first side and a second side extending in a first direction; a third side and a fourth side extending in a second direction intersecting the first direction; and the first side and the third side, respectively. A first semiconductor chip having a plurality of first electrode pads arranged along;
The fifth side and the sixth side extending in the first direction, the seventh side and the eighth side extending in the second direction, and the fifth side and the seventh side, respectively. A second semiconductor chip having a plurality of second electrode pads;
A package substrate having a plurality of connection pads connected to the first and second electrode pads via bonding wires;
The semiconductor device, wherein the first and second semiconductor chips are mounted on the package substrate so that the second side and the sixth side face each other.
前記第1および第2の半導体チップは、前記第1方向においてずらして設置されることを特徴とする請求項1に記載の半導体装置。   2. The semiconductor device according to claim 1, wherein the first and second semiconductor chips are shifted from each other in the first direction. 前記第1の半導体チップは前記第4辺側、前記第2の半導体チップは前記第8辺側にずらして配置されることを特徴とする請求項2に記載の半導体装置。   3. The semiconductor device according to claim 2, wherein the first semiconductor chip is arranged to be shifted to the fourth side, and the second semiconductor chip is shifted to the eighth side. 前記第3辺に沿って複数の前記接続パッドの一部が配列され、前記接続パッドの一部は前記第8辺よりも前記第1方向において突出しないように配列されることを特徴とする請求項3に記載の半導体装置。   A part of the plurality of connection pads is arranged along the third side, and a part of the connection pad is arranged so as not to protrude in the first direction from the eighth side. Item 4. The semiconductor device according to Item 3. 前記第1方向は、前記第1および第2の半導体チップの長辺方向であることを特徴とする請求項1から4のいずれかに記載の半導体装置。   The semiconductor device according to claim 1, wherein the first direction is a long side direction of the first and second semiconductor chips. 前記第1の半導体チップは、複数の内部電極を前記第1辺と前記第3辺に沿って配列される前記複数の第1の電極パッドと接続するための再配線層を含むことを特徴とする請求項1から5のいずれかに記載の半導体装置。   The first semiconductor chip includes a redistribution layer for connecting a plurality of internal electrodes to the plurality of first electrode pads arranged along the first side and the third side. The semiconductor device according to claim 1.
JP2013240788A 2013-11-21 2013-11-21 Semiconductor device Pending JP2015103547A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112242387A (en) * 2019-07-16 2021-01-19 Tdk株式会社 Electronic component package
CN112908970A (en) * 2019-12-03 2021-06-04 铠侠股份有限公司 Semiconductor memory device with a plurality of memory cells

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112242387A (en) * 2019-07-16 2021-01-19 Tdk株式会社 Electronic component package
JP2021015936A (en) * 2019-07-16 2021-02-12 Tdk株式会社 Electronic component package
JP7192688B2 (en) 2019-07-16 2022-12-20 Tdk株式会社 electronic component package
US11721618B2 (en) 2019-07-16 2023-08-08 Tdk Corporation Electronic component package
CN112242387B (en) * 2019-07-16 2024-05-28 Tdk株式会社 Electronic component package
CN112908970A (en) * 2019-12-03 2021-06-04 铠侠股份有限公司 Semiconductor memory device with a plurality of memory cells
CN112908970B (en) * 2019-12-03 2024-05-28 铠侠股份有限公司 Semiconductor memory device with a memory cell having a memory cell with a memory cell having a memory cell

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