JP2015026656A5 - - Google Patents

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Publication number
JP2015026656A5
JP2015026656A5 JP2013154087A JP2013154087A JP2015026656A5 JP 2015026656 A5 JP2015026656 A5 JP 2015026656A5 JP 2013154087 A JP2013154087 A JP 2013154087A JP 2013154087 A JP2013154087 A JP 2013154087A JP 2015026656 A5 JP2015026656 A5 JP 2015026656A5
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JP
Japan
Prior art keywords
light emitting
layer
emitting device
oxide insulating
insulating layer
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JP2013154087A
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Japanese (ja)
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JP2015026656A (en
JP6257203B2 (en
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Priority to JP2013154087A priority Critical patent/JP6257203B2/en
Priority claimed from JP2013154087A external-priority patent/JP6257203B2/en
Publication of JP2015026656A publication Critical patent/JP2015026656A/en
Publication of JP2015026656A5 publication Critical patent/JP2015026656A5/ja
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Publication of JP6257203B2 publication Critical patent/JP6257203B2/en
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Claims (10)

発光素子であって、
能動層を含む発光スタック層と、
前記発光スタック層に接続される非酸化物絶縁層と、を含み、
前記非酸化物絶縁層の屈折率は、1.4よりも小さく、
前記非酸化物絶縁層の材料は、ハロゲン化物、又は、IIA族及びVIIA族の化合物を含む、発光素子。
A light emitting device,
A light emitting stack layer including an active layer;
A non-oxide insulating layer connected to the light emitting stack layer,
The refractive index of the non-oxide insulating layer is rather smaller than 1.4,
The light-emitting element in which the material of the non-oxide insulating layer includes a halide or a Group IIA and Group VIIA compound .
請求項1に記載の発光素子であって、
前記能動層と、前記非酸化物絶縁層との間に位置するウィンドウ層を更に含み、
前記ウィンドウ層の屈折率は、前記非酸化物絶縁層の屈折率よりも大きい、発光素子。
The light-emitting device according to claim 1,
A window layer positioned between the active layer and the non-oxide insulating layer;
The light emitting element whose refractive index of the said window layer is larger than the refractive index of the said non-oxide insulating layer.
請求項1に記載の発光素子であって、
前記非酸化物絶縁層の真上に位置する電気接触層を更に含む、発光素子。
The light-emitting device according to claim 1,
The light emitting device further comprising an electrical contact layer located immediately above the non-oxide insulating layer.
請求項3に記載の発光素子であって、
前記電気接触層は、半導体材料を含む、発光素子。
The light emitting device according to claim 3,
The electrical contact layer is a light emitting device including a semiconductor material.
請求項3に記載の発光素子であって、
前記発光スタック層の上に位置する第一電極を更に含む、発光素子。
The light emitting device according to claim 3,
The light emitting device further comprising a first electrode positioned on the light emitting stack layer.
請求項5に記載の発光素子であって、
前記第一電極は、前記電気接触層の上に位置する突部を含み、及び/又は、前記第一電極は、前記電気接触層を覆う延伸部を含む、発光素子。
The light emitting device according to claim 5,
The first electrode includes a protrusion located on the electrical contact layer, and / or the first electrode includes an extending portion that covers the electrical contact layer.
請求項1に記載の発光素子であって、  The light-emitting device according to claim 1,
前記非酸化物絶縁層の一つの表面を覆う透明導電構造を更に含む、発光素子。  The light emitting device further comprising a transparent conductive structure covering one surface of the non-oxide insulating layer.
請求項7に記載の発光素子であって、  The light emitting device according to claim 7,
前記非酸化物絶縁層を貫通する複数の孔隙を更に含み、  A plurality of pores penetrating the non-oxide insulating layer;
前記透明導電構造は、前記複数の孔隙に充填される、発光素子。  The transparent conductive structure is a light emitting device filled in the plurality of pores.
請求項7に記載の発光素子であって、  The light emitting device according to claim 7,
前記非酸化物絶縁層の厚さは、前記透明導電構造の厚さの1/5よりも小さく、  The thickness of the non-oxide insulating layer is less than 1/5 of the thickness of the transparent conductive structure,
前記透明導電構造は、  The transparent conductive structure is
前記非酸化物絶縁層の下に位置する第一導電酸化層と、  A first conductive oxide layer located under the non-oxide insulating layer;
前記発光スタック層と、前記第一導電酸化層との間に位置する第二導電酸化層と、を含み、  A second conductive oxide layer located between the light emitting stack layer and the first conductive oxide layer;
前記第一導電酸化層及び前記第二導電酸化層の材料は、少なくとも一つの構成元素が異なる、発光素子。  The light emitting device, wherein the first conductive oxide layer and the second conductive oxide layer are made of different materials.
請求項1に記載の発光素子であって、  The light-emitting device according to claim 1,
前記非酸化物絶縁層の下に位置する基板と、  A substrate located under the non-oxide insulating layer;
前記基板と、前記非酸化物絶縁層との間に位置する導電性接着層と、を更に含む、発光素子。  The light emitting device further comprising: a conductive adhesive layer positioned between the substrate and the non-oxide insulating layer.
JP2013154087A 2013-07-25 2013-07-25 Light emitting element Active JP6257203B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013154087A JP6257203B2 (en) 2013-07-25 2013-07-25 Light emitting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013154087A JP6257203B2 (en) 2013-07-25 2013-07-25 Light emitting element

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017233059A Division JP2018037690A (en) 2017-12-05 2017-12-05 Light-emitting element

Publications (3)

Publication Number Publication Date
JP2015026656A JP2015026656A (en) 2015-02-05
JP2015026656A5 true JP2015026656A5 (en) 2016-09-01
JP6257203B2 JP6257203B2 (en) 2018-01-10

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013154087A Active JP6257203B2 (en) 2013-07-25 2013-07-25 Light emitting element

Country Status (1)

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JP (1) JP6257203B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6826395B2 (en) * 2016-08-26 2021-02-03 ローム株式会社 Semiconductor light emitting device
JP2018037690A (en) * 2017-12-05 2018-03-08 晶元光電股▲ふん▼有限公司Epistar Corporation Light-emitting element

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3697609B2 (en) * 2001-05-23 2005-09-21 日立電線株式会社 Semiconductor light emitting device
US6784462B2 (en) * 2001-12-13 2004-08-31 Rensselaer Polytechnic Institute Light-emitting diode with planar omni-directional reflector
JP2006179618A (en) * 2004-12-21 2006-07-06 Fujikura Ltd Semiconductor light emitting device and its manufacturing method
GB2451334B (en) * 2007-07-19 2011-07-13 Photonstar Led Ltd Vertical led with conductive vias
JP2009200178A (en) * 2008-02-20 2009-09-03 Hitachi Cable Ltd Semiconductor light-emitting device
JP5095848B1 (en) * 2011-05-18 2012-12-12 株式会社東芝 Semiconductor light emitting device

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