JP2015020323A5 - - Google Patents

Claims (8)

A plurality of recording head substrates having electrothermal conversion elements as ejection energy generating elements for ejecting ink from ejection ports are held on a spinner table, and the spinner table is rotated while jetting cleaning liquid. A cleaning method for cleaning the plurality of recording head substrates by reciprocating a cleaning nozzle that moves through a rotation center,
A method of cleaning a recording head substrate, wherein the plurality of recording head substrates are held on a spinner table so that the electrothermal transducer is not positioned on the rotation center. The plurality of recording head substrates are separated on the spinner table while being held on the spinner table by cutting the wafer held on the spinner table along a predetermined cutting line after being configured on a common wafer. And
2. The method for cleaning a recording head substrate according to claim 1, wherein the wafer is held on the spinner table so that the electrothermal transducer is not positioned on the rotation center.   The method of cleaning a recording head substrate according to claim 2, wherein the wafer is held on the spinner table via a dicing tape.   4. The recording head substrate according to claim 2, wherein the wafer is held on the spinner table so that the rotation center is positioned between the recording head substrates on which the cutting line is positioned. 5. Cleaning method.   4. The recording head according to claim 2, wherein the wafer is held on the spinner table so that the rotation center is located between the recording head substrates on which the intersections of the cutting lines are located. Substrate cleaning method.   6. The method for cleaning a recording head substrate according to claim 2, wherein the center of the wafer is positioned between the recording head substrates where the intersections of the cutting lines are located. Around the rotation center, the first, second, third, and fourth recording head substrates are positioned so as to be sequentially arranged in the rotation direction of the spinner table,
An imaginary line connecting the electrothermal conversion element closest to the rotation center on the first recording head substrate and the electrothermal conversion element closest to the rotation center on the third recording head substrate. Is the first connection, and the electrothermal conversion element at the position closest to the rotation center in the second recording head substrate and the electrothermal conversion at the position closest to the rotation center in the fourth recording head substrate. The intersection of the said 1st and 2nd connection is located on the said rotation center, when the virtual line which connects an element is made into a 2nd connection, The rotation point in any one of Claim 1 to 6 characterized by the above-mentioned. Cleaning method for recording head substrate.   The cleaning nozzle is ejected per unit time and the moving speed of the cleaning nozzle and the cleaning nozzle so as to equalize the amount of cleaning liquid sprayed per unit area to each of the plurality of recording head substrates from the cleaning nozzle. 8. The method for cleaning a recording head substrate according to claim 1, wherein at least one of the amounts of the cleaning liquid is controlled.