JP2014210861A - Mold releasability recovery liquid, mold releasability recovery method, and photomask - Google Patents

Mold releasability recovery liquid, mold releasability recovery method, and photomask Download PDF

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JP2014210861A
JP2014210861A JP2013088076A JP2013088076A JP2014210861A JP 2014210861 A JP2014210861 A JP 2014210861A JP 2013088076 A JP2013088076 A JP 2013088076A JP 2013088076 A JP2013088076 A JP 2013088076A JP 2014210861 A JP2014210861 A JP 2014210861A
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silicone oil
release performance
reactive silicone
photomask
performance
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朋子 根岸
Tomoko Negishi
朋子 根岸
中村 薫
Kaoru Nakamura
薫 中村
栗嶋 進
Susumu Kurishima
進 栗嶋
弘 平松
Hiroshi Hiramatsu
弘 平松
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Kimoto Co Ltd
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Kimoto Co Ltd
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Priority to JP2013088076A priority Critical patent/JP2014210861A/en
Priority to CN201480021181.4A priority patent/CN105121588A/en
Priority to KR1020157024746A priority patent/KR20160002708A/en
Priority to PCT/JP2014/059427 priority patent/WO2014171315A1/en
Priority to TW103112549A priority patent/TW201447510A/en
Publication of JP2014210861A publication Critical patent/JP2014210861A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/56Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/60Releasing, lubricating or separating agents
    • B29C33/62Releasing, lubricating or separating agents based on polymers or oligomers
    • B29C33/64Silicone
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48Protective coatings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Paints Or Removers (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Laminated Bodies (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a mold releasability recovery liquid which is useful for recovering deteriorated mold releasability of a coating film including silicone oil.SOLUTION: A mold releasability recovery liquid comprises only a releasability recovery component and a solvent, and the releasability recovery component comprises a reactive silicone oil and a non-reactive silicone oil. Preferably, 3-5 pts.wt. of the reactive silicone oil is contained with respect to 1 pt.wt. of the non-reactive silicone oil. Preferably, a weight ratio of the releasability recovery component to the solvent is 4:96 to 6:94.

Description

本発明は、シリコーンオイルを含む塗膜の離型性能が低下したときの使用に適した離型性能回復液と、該溶液を利用した離型性能回復方法と、該方法を利用し離型性能を回復させた保護膜をガラスマスクの薄膜パターン(画像)面に積層したフォトマスクとに関する。   The present invention relates to a release performance recovery liquid suitable for use when the release performance of a coating film containing silicone oil is lowered, a release performance recovery method using the solution, and a release performance using the method. The present invention relates to a photomask obtained by laminating a protective film that has been restored to a thin film pattern (image) surface of a glass mask.

プリント配線板や樹脂凸版を作製する場合、粘着性のあるフォトレジストに対して密着露光が終了したフォトマスクは、フォトレジストから引き離され、溶剤によりレジスト対向面を洗浄した後、別のフォトレジストに対して繰り返し利用に供される。従来から、この繰り返し利用時の露光精度の低下を防止する目的で、フォトマスクの薄膜パターン面に、離型性を有する塗膜を形成したり、そのような塗膜が設けられた表面保護フィルムを貼り合せることが行われている(特許文献1、2)。これにより、溶剤による洗浄後にフォトレジストがフォトマスクの薄膜パターン面に残存することが防止される。   When producing printed wiring boards and resin relief plates, the photomask that has been subjected to contact exposure to an adhesive photoresist is pulled away from the photoresist, and the resist facing surface is washed with a solvent, and then applied to another photoresist. In contrast, it is used repeatedly. Conventionally, for the purpose of preventing a reduction in exposure accuracy during repeated use, a coating film having releasability is formed on the thin film pattern surface of the photomask, or a surface protective film provided with such a coating film. (Patent Documents 1 and 2). This prevents the photoresist from remaining on the thin film pattern surface of the photomask after cleaning with a solvent.

特開2000−273412号公報(段落番号0008)Japanese Patent Laid-Open No. 2000-273412 (paragraph number 0008) 特開2005−181565号公報(段落番号0005)Japanese Patent Laying-Open No. 2005-181565 (paragraph number 0005)

離型性を有する塗膜は、バインダー樹脂に離型成分としてシリコーンオイルを含むものが多い。こうした塗膜は、フォトマスクの利用頻度が増えるにつれて離型性能が低下する。このため、ある程度繰り返し利用したところで、フォトマスク上に新たな塗膜を形成し直すか、あるいは同パターンのフォトマスクを別途、用意する必要があり、成果物(プリント配線板や樹脂凸版など。以下同じ)の生産性の面で課題を有していた。   Many coating films having releasability include silicone oil as a release component in a binder resin. In such a coating film, the mold release performance decreases as the use frequency of the photomask increases. For this reason, after repeated use to some extent, it is necessary to re-form a new coating film on the photomask, or to prepare a photomask having the same pattern separately, and a product (printed wiring board, resin letterpress, etc.). The same)) had a problem in terms of productivity.

本発明の一側面では、離型性を有する塗膜の低下した離型性能を回復させるのに有用な離型性能回復液を提供する。また他の側面では、離型性塗膜の低下した離型性能を効率よく回復させることができる離型性能回復方法と該方法を利用し低下した離型性能を回復させたフォトマスクも提供する。   In one aspect of the present invention, a release performance recovery liquid useful for recovering the reduced release performance of a releasable coating film is provided. In another aspect, there are also provided a mold release performance recovery method capable of efficiently recovering the mold release performance of the mold release coating film and a photomask having the mold release performance recovered using the method. .

本発明者らは、繰り返し利用後のフォトマスクに新たな塗膜を形成したり、あるいは該フォトマスクと同パターンのフォトマスクを別途、用意することなく、成果物の生産性を向上できる方策を検討した。その結果、低下した離型性能を回復させればよい、との新規な課題を着想した。そして、特定の性能回復成分を多量の溶媒で希釈した溶液が、離型性を有するシリコーンオイルを含む塗膜の、低下した離型性能の回復に有効であることを見出し、本発明を完成させた。   The inventors of the present invention have taken measures to improve the product productivity without forming a new coating film on the photomask after repeated use or separately preparing a photomask having the same pattern as the photomask. investigated. As a result, the inventor has conceived a new problem that it is only necessary to recover the degraded release performance. Then, a solution obtained by diluting a specific performance recovery component with a large amount of solvent is found to be effective in recovering the reduced release performance of the coating film containing silicone oil having release properties, and the present invention has been completed. It was.

なお本発明でいう、シリコーンオイルを含む塗膜は、離型性能を有し、例えば、プリント基板作製工程などにおいて、粘着性のあるフォトレジスト(液状フォトレジストなど)を露光する際の原稿(フォトマスク)の表面などに形成し、又は貼着される保護膜として利用される。   In addition, the coating film containing silicone oil in the present invention has a mold release performance, for example, a manuscript (photophotograph) when exposing a sticky photoresist (liquid photoresist or the like) in a printed circuit board manufacturing process or the like. It is used as a protective film formed on or attached to the surface of a mask).

本発明の離型性能回復液は、シリコーンオイルを含む塗膜の低下した離型性能を回復させるために用いられる。この回復液は、性能回復成分と溶媒のみで構成してあり、性能回復成分を反応性シリコーンオイル及び非反応性シリコーンオイルで構成したことを特徴とする。   The mold release performance recovery liquid of the present invention is used to recover the mold release performance of a coating film containing silicone oil. This recovery liquid is composed only of a performance recovery component and a solvent, and the performance recovery component is composed of a reactive silicone oil and a non-reactive silicone oil.

本発明の離型性能回復方法は、シリコーンオイルを含む塗膜の低下した離型性能を回復させる方法であって、本発明の離型性能回復液を対象塗膜(離型性能が低下した、シリコーンオイルを含む塗膜)に塗布し、下記条件で乾燥させることを特徴とする。温度:85℃以上130℃以下、時間:5分以上15分以下。   The release performance recovery method of the present invention is a method of recovering the reduced release performance of the coating film containing silicone oil, and the release performance recovery liquid of the present invention is the target coating film (release performance has been reduced, (Coating film containing silicone oil) and dried under the following conditions. Temperature: 85 ° C. to 130 ° C., Time: 5 minutes to 15 minutes.

本発明のフォトマスクは、ガラス基板上に薄膜パターンを有するガラスマスクの前記薄膜パターン面に積層された、シリコーンオイルを含む保護膜に対して本発明の離型性能回復方法を適用し、低下した離型性能を回復させたことを特徴とする。   The photomask of the present invention was deteriorated by applying the release performance recovery method of the present invention to a protective film containing silicone oil laminated on the thin film pattern surface of a glass mask having a thin film pattern on a glass substrate. It is characterized by having improved mold release performance.

本発明は、以下の態様を含む。
(1)離型性能回復液において、性能回復成分中の含有割合を、非反応性シリコーンオイル:1重量部に対して、反応性シリコーンオイル:1.5重量部以上7重量部以下(特に3重量部以上5重量部以下)とすることができる。
(2)離型性能回復液において、性能回復成分と溶媒の重量割合を2.5:97.5〜8:92(特に4:96〜6:94)とすることができる。
The present invention includes the following aspects.
(1) In the release performance recovery liquid, the content ratio in the performance recovery component is set such that the reactive silicone oil is 1.5 parts by weight or more and 7 parts by weight or less (particularly 3 parts by weight) with respect to 1 part by weight of the non-reactive silicone oil. Parts by weight or more and 5 parts by weight or less).
(2) In the release performance recovery liquid, the weight ratio of the performance recovery component and the solvent can be 2.5: 97.5 to 8:92 (particularly 4:96 to 6:94).

(3)離型性能回復方法において、乾燥条件を、温度:90℃以上120℃以下、時間:8分以上12分以下とすることができる。
(4)保護膜の形成に供されるガラスマスクとして、薄膜パターンがクロム材料で形成されたクロムマスクを用いることができる。
(3) In the mold release performance recovery method, the drying conditions can be set to temperature: 90 ° C. or more and 120 ° C. or less, and time: 8 minutes or more and 12 minutes or less.
(4) As a glass mask used for forming the protective film, a chromium mask in which a thin film pattern is formed of a chromium material can be used.

本発明の離型性能回復液は、特定の性能回復成分を含むので、離型性を有する塗膜の低下した離型性能を回復させるのに有用である。
本発明の離型性能回復方法は、特定の性能回復成分を含む溶液を対象塗膜に塗布するとともに特定の条件で乾燥させるので、離型性を有する塗膜の低下した離型性能を効果的に回復させることができる。
Since the release performance recovery liquid of the present invention contains a specific performance recovery component, it is useful for recovering the reduced release performance of a coating film having releasability.
In the release performance recovery method of the present invention, a solution containing a specific performance recovery component is applied to a target coating film and dried under specific conditions, so that the release performance of the coating film having releasability is effectively reduced. Can be recovered.

本発明のフォトマスクは、離型性能が低下した保護膜に対して本発明の離型性能回復方法を適用することで低下した離型性能を回復させてあるので、露光作業の繰り返し利用に供することができる。その結果、一つのフォトマスクの繰り返し使用耐性が増え、結果的に、成果物の生産性向上が達成される。   In the photomask of the present invention, the reduced release performance is recovered by applying the release performance recovery method of the present invention to the protective film having a reduced release performance, so that the exposure mask is used repeatedly. be able to. As a result, the repeated use resistance of one photomask is increased, and as a result, the productivity of the product is improved.

まず、本発明の離型性能回復液の構成例を説明する。
本例の離型性能回復液は、性能回復成分と希釈溶媒のみで構成され、いわゆるバインダー成分を含まない。バインダー成分を含まない為、薄膜としやすく、保護膜の性能(硬度や透過率など)を、維持したまま離型性のみを回復させることができる。
First, the structural example of the mold release performance recovery liquid of this invention is demonstrated.
The mold release performance recovery liquid of this example is composed only of a performance recovery component and a diluent solvent, and does not contain a so-called binder component. Since it does not contain a binder component, it is easy to form a thin film, and only the releasability can be recovered while maintaining the performance (hardness, transmittance, etc.) of the protective film.

本例の性能回復成分は、シリコーンオイルを含む塗膜の低下した離型性能を回復させるために用いられる。本成分は、反応性シリコーンオイルと非反応性シリコーンオイルの混合物で構成される。   The performance recovery component of this example is used to recover the reduced release performance of a coating film containing silicone oil. This component is composed of a mixture of reactive and non-reactive silicone oils.

本例の反応性シリコーンオイルは、ジメチルポリシロキサンのメチル基の一部を反応性の官能基で置換した変性シリコーンオイルを含む。反応性官能基としては、アルコキシ基、メルカプト基、カルビノール基、エポキシ基、アミン基、アクリル基、カルボキシル基などが挙げられる。これら反応性シリコーンオイルは、単独使用または2種類以上併用することができる。   The reactive silicone oil of this example includes a modified silicone oil in which a part of the methyl group of dimethylpolysiloxane is substituted with a reactive functional group. Examples of the reactive functional group include an alkoxy group, a mercapto group, a carbinol group, an epoxy group, an amine group, an acrylic group, and a carboxyl group. These reactive silicone oils can be used alone or in combination of two or more.

反応性シリコーンオイルとして、好ましくはシラノール基を有するもの、カルビノール基を有するものなどが挙げられ、より好ましくはシラノール基を有するものが挙げられる。シラノール基を有する反応性シリコーンオイルを含めた場合、より長期にわたり回復後の離型性能を持続させることが期待できる。   The reactive silicone oil preferably includes those having a silanol group, those having a carbinol group, and more preferably those having a silanol group. When a reactive silicone oil having a silanol group is included, it can be expected to maintain the release performance after recovery for a longer period.

反応性シリコーンオイルとしては、具体的には、信越化学工業社の商品名として、アミノ変性(KF393、KF8004、KF861、KF8010など)、エポキシ変性(KF101、X―22−4741、X―22−163、X−22−173DXなど)、カルビノール変性(X―22−4039、X―22−4015、X−22−160AS、KF6001、KF6003など)、ハイドロジェン変性(KF9901など)、メタクリル変性(X−22−164C、X−22−174DXなど)、カルボキシル変性(X−22−162Cなど)、シラノール変性(KF9701など)、側鎖アミノ−両末端メトキシ変性(KF857、KF858など)、などが挙げられる。   Specific examples of reactive silicone oils include amino-modified (KF393, KF8004, KF861, KF8010, etc.), epoxy-modified (KF101, X-22-4741, X-22-163) as trade names of Shin-Etsu Chemical Co., Ltd. , X-22-173DX, etc.), carbinol modification (X-22-4039, X-22-4015, X-22-160AS, KF6001, KF6003 etc.), hydrogen modification (KF9901 etc.), methacryl modification (X- 22-164C, X-22-174DX, etc.), carboxyl modification (X-22-162C etc.), silanol modification (KF9701 etc.), side chain amino-terminal methoxy modification (KF857, KF858 etc.), etc. are mentioned.

本例の非反応性シリコーンオイルは、ジメチルシリコーンオイルや、ジメチルポリシロキサンのメチル基の一部をポリエーテル基、フェニル基、アルキル基、アラルキル基、フッ素化アルキル基等で置換した、無官能の変性シリコーンオイルを含む。これら非反応性シリコーンオイルは、単独使用または2種類以上併用することができる。   The non-reactive silicone oil of this example is a non-functional silicone oil or a non-functional silicone resin in which a part of the methyl group of dimethylpolysiloxane is substituted with a polyether group, a phenyl group, an alkyl group, an aralkyl group, a fluorinated alkyl group, etc. Contains modified silicone oil. These non-reactive silicone oils can be used alone or in combination of two or more.

非反応性シリコーンオイルとして、好ましくは長鎖アルキル、ポリエーテルなどが挙げられ、より好ましくは長鎖アルキルが挙げられる。   Non-reactive silicone oils preferably include long chain alkyls and polyethers, and more preferably long chain alkyls.

非反応性シリコーンオイルとしては、具体的には、信越化学工業社の商品名として、ポリエーテル変性(KF352A、KF353、KF354L、KF355A、KF615A、KF643、KF6011、KF6012、KF6015)や、ジメチルシリコーンオイル(KF96など)、などが挙げられる。   Specific examples of the non-reactive silicone oil include polyether-modified (KF352A, KF353, KF354L, KF355A, KF615A, KF643, KF6011, KF6012, KF6012, KF6015), dimethylsilicone oil (trade name) of Shin-Etsu Chemical Co., Ltd. KF96, etc.).

本例では、反応性シリコーンオイルを、1重量部の非反応性シリコーンオイルに対して、好ましくは1.5重量部以上、より好ましくは3重量部以上であって、好ましくは7重量部以下、より好ましくは5重量部以下の量(反応性シリコーンオイルを複数種、含有させる場合、その合計量)で含有させるとよい。反応性シリコーンオイルを適量で含有させることにより、より長期にわたり回復後の離型性能を持続させることが期待できる。なお、反応性シリコーンオイルの含有量が多すぎると、反応しきらず、ブリードして転写する可能性があるものの、本発明では液中での反応性シリコーンオイルの含有量限定を必須とするものではない。   In this example, the reactive silicone oil is preferably 1.5 parts by weight or more, more preferably 3 parts by weight or more, preferably 7 parts by weight or less, with respect to 1 part by weight of the non-reactive silicone oil. More preferably, it may be contained in an amount of 5 parts by weight or less (when a plurality of types of reactive silicone oils are contained, the total amount). By containing an appropriate amount of the reactive silicone oil, it can be expected to maintain the release performance after recovery for a longer period of time. Note that if the content of the reactive silicone oil is too large, it may not react and may bleed and transfer, but the present invention does not necessarily limit the content of the reactive silicone oil in the liquid. Absent.

希釈溶媒としては、メチルエチルケトン、シクロヘキサノン、ブタノール、イソプロピルアルコールなどが挙げられる。これら溶媒は、単独使用または2種類以上併用することができる。   Examples of the dilution solvent include methyl ethyl ketone, cyclohexanone, butanol, isopropyl alcohol and the like. These solvents can be used alone or in combination of two or more.

本例では、性能回復成分と希釈溶媒の重量比を、好ましくは前者が2.5重量%以上8重量%以下、後者が92重量%以上97.5重量%以下とし、より好ましくは前者が4重量%以上6重量%以下、後者が94重量%以上96重量%以下にするとよい。性能回復成分を液中に適量で含有させることにより、離型性向上の効果が期待できる。なお、液中での性能回復成分の含有量が多すぎると、塗膜への干渉ムラができやすいと共に、レジストへ転写する傾向があるものの、本発明では液中での性能回復成分の含有量限定を必須とするものではない。   In this example, the weight ratio of the performance recovery component and the diluent solvent is preferably 2.5 wt% or more and 8 wt% or less for the former, 92 wt% or more and 97.5 wt% or less for the latter, and more preferably 4 wt% for the former. It is preferable that the weight is not less than 6% by weight and not more than 6% by weight, and the latter is not less than 94% by weight and not more than 96% by weight. By including a performance recovery component in an appropriate amount in the liquid, an effect of improving the releasability can be expected. In addition, when there is too much content of the performance recovery component in the liquid, interference unevenness to the coating film is likely to occur and there is a tendency to transfer to the resist, but in the present invention, the content of the performance recovery component in the liquid No limitation is essential.

本例の離型性能回復液は上述した特定の性能回復成分を含むので、離型性を有する塗膜の低下した離型性能を回復させるのに有用である。この回復液を利用することで、成果物の生産性向上(露光作業の効率化や費用削減など)が期待できる。   Since the release performance recovery liquid of this example contains the specific performance recovery component described above, it is useful for recovering the release performance of the coating film having release properties. By using this recovery liquid, it is possible to improve the productivity of the deliverables (exposure efficiency and cost reduction).

次に、本発明の離型性能回復液の適用例を説明する。
本例の離型性能回復液は、シリコーンオイルを含む保護膜が、例えばガラス基板上の薄膜パターン面に積層された、ガラスマスクに対して適用することができる。以下、このガラスマスクへの適用を例示して説明する。
Next, an application example of the release performance recovery liquid of the present invention will be described.
The mold release performance recovery liquid of this example can be applied to a glass mask in which a protective film containing silicone oil is laminated on a thin film pattern surface on a glass substrate, for example. Hereinafter, application to this glass mask will be described as an example.

本例の離型性能回復液が適用可能な一例としてのガラスマスクは、保護膜の形成に供されるマスク本体の薄膜パターン面に、所定組成の熱硬化型保護液(本例では、シリコーン樹脂、エポキシ樹脂及びシリコーンオイルを含む構成を例示する)を塗布し、これに熱を加えて硬化させた硬化物で構成される保護膜を有する。   A glass mask as an example to which the release performance recovery liquid of this example can be applied is a thermosetting protective liquid having a predetermined composition (in this example, a silicone resin) on the thin film pattern surface of the mask body used for forming the protective film. And a protective film composed of a cured product obtained by applying heat to this and curing it.

マスク本体は、ガラス基板に、プリント配線板や樹脂凸版に微細なパターンを形成するための薄膜パターンが形成されている。こうしたマスク本体としては、例えば、ガラス基板上にゼラチンとハロゲン化銀を混合したエマルジョンを塗布して薄膜パターン化したもの(エマルジョンマスク)や、ガラス基板上にクロム材料(クロムや酸化クロムなど)で構成される薄膜パターンを形成したもの(クロムマスク)などが挙げられる。本例では、マスク本体として特にクロムマスクを用いたときの適用に効果的である。
なお、本例で用いるマスク本体は、保護膜に対する接着性を向上させるための下引き層がガラス基板上に設けられているものを含む。
The mask main body is formed with a thin film pattern for forming a fine pattern on a printed wiring board or a resin relief plate on a glass substrate. Examples of such a mask main body include a thin film pattern formed by applying an emulsion of gelatin and silver halide on a glass substrate (emulsion mask), and a chromium material (such as chromium or chromium oxide) on the glass substrate. Examples include a thin film pattern (chrome mask) formed. This example is effective for application particularly when a chrome mask is used as the mask body.
In addition, the mask main body used in this example includes one in which an undercoat layer for improving adhesion to a protective film is provided on a glass substrate.

本例で適用するガラスマスクは、マスク本体の薄膜パターン面全面に熱硬化型保護液を塗布した後、これに熱を加えることで保護液の樹脂成分を重合(熱硬化)させて硬化物とし、これをハードコート性と離型性を有する保護膜として利用するものである。保護液中にシリコーン樹脂及びエポキシ樹脂を含むことによって、マスク本体との接着性、ハードコート性(JIS−K5600−5−4:1999に準拠した鉛筆硬度がH以上)及び耐光性に優れた保護膜を有するガラスマスクとされている。
ただし、フォトマスクとしての繰り返し使用(利用頻度)が増えるにつれ、徐々にではあっても、保護膜の離型性能が低下することは否めない。そこで本例では、本例の回復液を適用することで、保護膜の低下した離型性能を回復させることとしている。
The glass mask applied in this example is a cured product obtained by applying a thermosetting protective liquid to the entire surface of the thin film pattern surface of the mask body and then polymerizing (thermosetting) the resin component of the protective liquid by applying heat. This is used as a protective film having hard coat properties and releasability. Protection with excellent adhesion to mask body, hard coat property (pencil hardness according to JIS-K5600-5-4: 1999) and light resistance by including silicone resin and epoxy resin in protective liquid The glass mask has a film.
However, it cannot be denied that the release performance of the protective film is lowered gradually as the use (frequency of use) as a photomask increases. Therefore, in this example, by applying the recovery liquid of this example, the mold release performance with the reduced protective film is recovered.

次に、本発明の離型性能回復方法の一例を説明する。
本例の離型性能回復方法は、対象塗膜に対し、本例の離型性能回復液を塗布する。対象塗膜としては、本例では、シリコーン樹脂及びエポキシ樹脂の熱硬化物とシリコーンオイルを含む保護膜であり、かつ該膜の離型性能が低下したときに適用すればよい。
なお、離型性能の低下は、本例では、例えば、所定の洗浄(溶剤洗浄)後、フォトマスクの前記塗膜上にフォトレジストの残存が認められたとき、とする。
Next, an example of the release performance recovery method of the present invention will be described.
In the release performance recovery method of this example, the release performance recovery liquid of this example is applied to the target coating film. In this example, the target coating film is a protective film containing a thermosetting product of silicone resin and epoxy resin and silicone oil, and may be applied when the release performance of the film is deteriorated.
In this example, the deterioration of the mold release performance is assumed, for example, when the remaining of the photoresist is recognized on the coating film of the photomask after predetermined cleaning (solvent cleaning).

塗布方法は、限定されず、ディップコート、スピンコート、ダイコート、キャップコート、バーコートなどの公知の方法を用いることができる。塗布量は、離型性能の劣化程度に応じて増減させればよい。ただし塗布量が多すぎると、干渉ムラ、転写等の不都合を生じ、少なすぎると効果が得られにくい。そこで、乾燥膜厚が、例えば50〜300nm程度となる量で塗布するとよい。   The coating method is not limited, and known methods such as dip coating, spin coating, die coating, cap coating, and bar coating can be used. The coating amount may be increased or decreased according to the degree of degradation of the release performance. However, if the coating amount is too large, inconveniences such as uneven interference and transfer occur, and if it is too small, it is difficult to obtain the effect. Then, it is good to apply | coat with the quantity from which a dry film thickness will be about 50-300 nm, for example.

次に、塗布した回復液を特定条件で乾燥させる。乾燥温度は85℃以上130℃以下程度でよく、好ましくは90℃以上120℃以下程度とする。この温度が高すぎると基材のハードコート性能の不都合を生じ、低すぎると離型性能の不都合を生じうる。乾燥時間は5分以上15分以下程度でよく、好ましくは8分以上12分以下程度とする。乾燥時間が長すぎるとハンドリングの不都合を生じうる。   Next, the applied recovery liquid is dried under specific conditions. The drying temperature may be about 85 ° C. or higher and 130 ° C. or lower, and preferably 90 ° C. or higher and 120 ° C. or lower. If this temperature is too high, it may cause inconvenience in the hard coat performance of the substrate, and if it is too low, inconvenience in mold release performance may occur. The drying time may be about 5 minutes to 15 minutes, preferably about 8 minutes to 12 minutes. If the drying time is too long, handling problems may occur.

本例の離型性能回復方法は、特定の性能回復成分を含む溶液を対象塗膜に塗布するとともに特定の条件で乾燥させるので、保護膜の低下した離型性能が効果的に回復する。その結果、本方法適用後のガラスマスクは、露光作業の繰り返し利用に供することができる。その結果、一つのガラスマスクの繰り返し使用耐性が増え、結果的に、成果物の生産性向上が達成される。   In the release performance recovery method of this example, a solution containing a specific performance recovery component is applied to the target coating film and dried under specific conditions, so that the release performance with a reduced protective film is effectively recovered. As a result, the glass mask after application of the present method can be used for repeated exposure operations. As a result, the repeated use resistance of one glass mask increases, and as a result, the productivity improvement of a product is achieved.

以下、実施例により本発明を更に説明する。なお、「部」、「%」は特に示さない限り、重量基準とする。   The following examples further illustrate the present invention. “Parts” and “%” are based on weight unless otherwise specified.

<1.ガラスマスクの作製>
下記組成のガラスマスク用熱硬化型保護液を、パターン形成されたクロムマスク上に、スピンコートにより塗布し、150℃、70分で加熱硬化させ、厚み約2μmの保護膜を形成し、ガラスマスクを作製した。
<1. Production of glass mask>
A thermosetting protective liquid for glass mask having the following composition is applied onto a patterned chromium mask by spin coating, and heated and cured at 150 ° C. for 70 minutes to form a protective film having a thickness of about 2 μm. Was made.

<ガラスマスク用熱硬化型保護液の組成>
・シリコーン樹脂(固形分100%) 10部
(KR400:信越社製)
・エポキシ樹脂(固形分100%) 10部
(EPPN502H:日本化薬社製)
・シリコーンオイル(固形分100%) 0.3部
(X−22−4272:信越社製)
・メチルエチルケトン(希釈溶媒) 79.2部
・硬化剤(固形分100%) 0.5部
(IB2PZ:四国化成社製)
<Composition of thermosetting protective liquid for glass mask>
・ 10 parts of silicone resin (solid content 100%) (KR400: manufactured by Shin-Etsu Co., Ltd.)
・ 10 parts of epoxy resin (solid content: 100%) (EPPN502H: manufactured by Nippon Kayaku Co., Ltd.)
・ 0.3 parts of silicone oil (100% solid content) (X-22-4272: manufactured by Shin-Etsu Co., Ltd.)
・ Methyl ethyl ketone (diluting solvent) 79.2 parts ・ Curing agent (solid content 100%) 0.5 parts (IB2PZ: manufactured by Shikoku Chemicals)

<2.ガラスマスクの剥離性能の疑似評価>
2−1.剥離強度の変化
作製したガラスマスクの保護膜面に、紫外線硬化型樹脂で構成されたフォトレジストを密着させた(工程1)。次に、ガラスマスクの保護膜が形成されていない面(ガラスマスクの裏面)から紫外線を照射(密着露光)し、フォトレジストを所定パターンでUV硬化させた後、露光済みのフォトレジストをガラスマスクから剥離した(工程2)。次に、フォトレジストから引き離したガラスマスクの保護膜面を溶剤洗浄し、次の露光のためのガラスマスクを準備した(工程3)。
以上の工程1〜3の操作を100回行った後、ガラスマスクの保護膜に粘着テープ(セロテープCT405AP−18:ニチバン株式会社)を貼りつけた。この状態で、引張り試験(島津小型卓上試験機 EZ−L:株式会社島津製作所)を用いて、剥離速度300mm/minにおける180°剥離力を測定した。
その結果、剥離力が1N/18mm未満であった場合、「離型性あり」と判断した上で、工程1〜3の操作をさらに100回行い、再び、同じ条件で180°剥離力を測定した。そして、この測定結果が、1N/18mm以上となった時点で「離型性なし」、すなわち「離型性能が低下した」と判断した。本例では、通算で、工程1〜3の操作を500回行った後に、離型性能の低下が確認された。
<2. Pseudo-evaluation of glass mask peeling performance>
2-1. Change in peel strength A photoresist composed of an ultraviolet curable resin was brought into close contact with the protective film surface of the produced glass mask (step 1). Next, the surface of the glass mask on which the protective film is not formed (the back surface of the glass mask) is irradiated with ultraviolet rays (adhesion exposure), the photoresist is UV-cured in a predetermined pattern, and the exposed photoresist is then applied to the glass mask. (Step 2). Next, the protective film surface of the glass mask separated from the photoresist was washed with a solvent to prepare a glass mask for the next exposure (step 3).
After performing the operations in the above steps 1 to 3 100 times, an adhesive tape (Cellotape CT405AP-18: Nichiban Co., Ltd.) was attached to the protective film of the glass mask. In this state, a 180 ° peeling force at a peeling speed of 300 mm / min was measured using a tensile test (Shimadzu small tabletop testing machine EZ-L: Shimadzu Corporation).
As a result, when the peel force is less than 1 N / 18 mm, after determining that “there is a release property”, the operations of steps 1 to 3 are further performed 100 times, and the 180 ° peel force is measured again under the same conditions. did. And when this measurement result became 1N / 18mm or more, it was judged that "no mold release property", ie, "the mold release performance was lowered". In this example, after performing the operations of Steps 1 to 3 500 times, it was confirmed that the mold release performance was lowered.

2−2.接触角の変化
作製したガラスマスクの保護膜面の純水の接触角を、マスク作製直後、上記工程1〜3の操作を100回、200回、500回行った後のそれぞれのタイミングで測定した。そして接触角の値が90度以上であった場合を「防汚性あり」と判断し、90度未満となった時点で「防汚性なし」と判断した。なお、接触角の値は、純水滴下1分後の接触角の測定値について、滴下と測定を3回繰り返して得られた測定値の平均値とした。本例では、工程1〜3の操作を500回行った後に、防汚性能の低下が確認された。
2-2. Change in contact angle The contact angle of pure water on the protective film surface of the produced glass mask was measured immediately after the mask production, and at the respective timings after the operations of steps 1 to 3 were performed 100 times, 200 times, and 500 times. . And when the value of the contact angle was 90 degrees or more, it was judged as “antifouling”, and when it was less than 90 degrees, it was judged as “no antifouling”. In addition, the value of the contact angle was taken as the average value of the measured values obtained by repeating the dropping and the measurement three times for the measured value of the contact angle one minute after dropping pure water. In this example, the deterioration of the antifouling performance was confirmed after the operations of Steps 1 to 3 were performed 500 times.

<3.回復液の作製>
下記表1組成で各例の離型性能回復液を作製した。
<3. Preparation of recovery liquid>
The release performance recovery liquid of each example was produced with the composition of Table 1 below.

Figure 2014210861
Figure 2014210861

表1中、反応性シリコーンオイル(DMS−S15:Gelest社製、固形分100%、平均分子量2750、粘度(25℃)=65cSt)、非反応性シリコーンオイル(KF−96−100cs:信越社製、固形分100%、粘度(25℃)=1000×10cSt)、希釈溶媒(メチルエチルケトン)を用いた。 In Table 1, reactive silicone oil (DMS-S15: manufactured by Gelest, solid content 100%, average molecular weight 2750, viscosity (25 ° C.) = 65 cSt), non-reactive silicone oil (KF-96-100 cs: manufactured by Shin-Etsu) , Solid content 100%, viscosity (25 ° C.) = 1000 × 10 3 cSt), and diluting solvent (methyl ethyl ketone).

<4.回復液の評価>
各例で作製した離型性能回復液について、該各回復液を適用したときの離型性能の回復度合いを評価した。具体的には以下の手順で評価した。
上記2−1.の工程1〜3を500回行い、離型性能が低下した保護膜を持つガラスマスクを準備した。この準備したガラスマスクの保護膜に、作製した表1組成の各例の離型性能回復液を、乾燥膜厚が200nm程度となる量で塗布した後、表1記載の乾燥条件で乾燥させた。この乾燥後の保護膜を持つガラスマスクに対し、上記2−1.の工程1〜3を700回行った後、上記2−1.の「剥離強度の変化」と、上記2−2.の「接触角の変化」を評価した。
<4. Evaluation of recovery liquid>
About the release performance recovery liquid produced in each example, the recovery degree of the release performance when each recovery liquid was applied was evaluated. Specifically, the evaluation was performed according to the following procedure.
2-1. Steps 1 to 3 were repeated 500 times to prepare a glass mask having a protective film with reduced release performance. After applying the release performance recovery liquid of each example of the prepared composition of Table 1 to the prepared protective film of the glass mask in an amount such that the dry film thickness is about 200 nm, the liquid was dried under the drying conditions described in Table 1. . For the glass mask having a protective film after drying, the above 2-1. After performing Steps 1 to 3 in 700 times, the above 2-1. “Change in peel strength” and 2-2. The “change in contact angle” was evaluated.

具体的には、「剥離強度の変化」での剥離力が0.2N/18mm未満であったものを「◎」、0.2N/18mm以上0.7N/18mm未満であったものを「○」、0.7N/18mm以上1N/18mm未満であったものを「△」、1N/18mm以上であったものを「×」とした。また「接触角の変化」での接触角の値が98度以上であったものを「◎」、95度以上98度未満であったものを「〇」90度以上95度未満であったものを「△」、90度未満であった場合を「×」とした。結果を表1に示す。   Specifically, “◎” indicates that the peel force in the “change in peel strength” is less than 0.2 N / 18 mm, and “○” indicates that the peel force is 0.2 N / 18 mm or more and less than 0.7 N / 18 mm. ”, Those that were 0.7 N / 18 mm or more and less than 1 N / 18 mm were designated as“ Δ ”, and those that were 1 N / 18 mm or more were designated as“ X ”. Also, “◎” indicates that the contact angle value in the “change in contact angle” is 98 degrees or more, and “◯” indicates that the contact angle value is 95 degrees or more and less than 98 degrees, and “◯” is 90 degrees or more and less than 95 degrees. Is “Δ”, and the case of less than 90 degrees is “x”. The results are shown in Table 1.

<5.考察>
各例の離型性能回復液に、その有用性が確認された。特に実験例3〜5のものに優れた有用性が認められた。
<5. Discussion>
The usefulness of the release performance recovery liquid in each case was confirmed. In particular, the usefulness of the experimental examples 3 to 5 was recognized.

<6.他の実験例>
実験例1〜7で使用した反応性シリコーンオイルに代え、別の反応性シリコーンオイル(DMS−S21:Glest社製、固形分100%、平均分子量4200、粘度(25℃)=110cSt)を用いた場合も、表1と同様の結果が得られた。
<6. Other experimental examples>
Instead of the reactive silicone oil used in Experimental Examples 1 to 7, another reactive silicone oil (DMS-S21: manufactured by Glest, solid content 100%, average molecular weight 4200, viscosity (25 ° C.) = 110 cSt) was used. In this case, the same result as in Table 1 was obtained.

また、実験例1〜7で使用した非反応性シリコーンオイルに代え、別の非反応性シリコーンオイル(KF6001:信越社製、固形分100%、粘度(25℃)=45×10cSt)を用いた場合も、表1と同様の結果が得られた。 Further, instead of the non-reactive silicone oil used in Experimental Examples 1 to 7, another non-reactive silicone oil (KF6001: manufactured by Shin-Etsu Co., Ltd., solid content 100%, viscosity (25 ° C.) = 45 × 10 3 cSt) was used. When used, the same results as in Table 1 were obtained.

Claims (6)

シリコーンオイルを含む塗膜の、低下した離型性能を回復させるために用いる離型性能回復液であって、性能回復成分と溶媒のみで構成してあり、
前記性能回復成分を反応性シリコーンオイル及び非反応性シリコーンオイルで構成したことを特徴とする離型性能回復液。
A release performance recovery liquid used for recovering the reduced release performance of the coating film containing silicone oil, which is composed of only a performance recovery component and a solvent,
A release performance recovery liquid, wherein the performance recovery component is composed of a reactive silicone oil and a non-reactive silicone oil.
請求項1記載の回復液において、前記反応性シリコーンオイルを、1重量部の非反応性シリコーンオイルに対して3重量部以上5重量部以下の量で含有させたことを特徴とする離型性能回復液。   The release liquid according to claim 1, wherein the reactive silicone oil is contained in an amount of 3 parts by weight or more and 5 parts by weight or less based on 1 part by weight of the non-reactive silicone oil. Recovery liquid. 請求項1又は2記載の回復液において、前記性能回復成分と前記溶媒の重量割合を4:96〜6:94としたことを特徴とする離型性能回復液。   The recovery liquid according to claim 1 or 2, wherein a weight ratio of the performance recovery component and the solvent is set to 4:96 to 6:94. シリコーンオイルを含む塗膜の、低下した離型性能を回復させる方法であって、
請求項1〜3の何れかに記載の回復液を対象塗膜に塗布し、下記条件で乾燥させることを特徴とする離型性能回復方法。
温度:85℃以上130℃以下、
時間:5分以上15分以下。
A method for recovering the reduced release performance of a coating film containing silicone oil,
A method for recovering mold release performance, comprising applying the recovery liquid according to any one of claims 1 to 3 to a target coating film and drying it under the following conditions.
Temperature: 85 ° C. or higher and 130 ° C. or lower,
Time: 5 minutes or more and 15 minutes or less.
ガラス基板上に薄膜パターンを有するガラスマスクの前記薄膜パターン面に、シリコーンオイルを含む保護膜を積層したフォトマスクにおいて、前記保護膜に対して請求項4記載の方法を適用し、低下した離型性能を回復させたフォトマスク。   In a photomask in which a protective film containing silicone oil is laminated on the thin film pattern surface of a glass mask having a thin film pattern on a glass substrate, the method according to claim 4 is applied to the protective film to reduce mold release. Photomask with improved performance. 請求項5記載のフォトマスクにおいて、前記ガラスマスクとして、薄膜パターンがクロム材料で形成されたクロムマスクを用いたことを特徴とするフォトマスク。   6. The photomask according to claim 5, wherein a chromium mask in which a thin film pattern is formed of a chromium material is used as the glass mask.
JP2013088076A 2013-04-19 2013-04-19 Mold releasability recovery liquid, mold releasability recovery method, and photomask Pending JP2014210861A (en)

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KR1020157024746A KR20160002708A (en) 2013-04-19 2014-03-31 Mold release performance-restoring solution, mold release performance restoration method, and photomask
PCT/JP2014/059427 WO2014171315A1 (en) 2013-04-19 2014-03-31 Mold release performance-restoring solution, mold release performance restoration method, and photomask
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