JP2014199555A - Electrode member for touch panel, manufacturing method of electrode member for touch panel, touch panel and image display article - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an electrode member for a touch panel having improved adhesive properties of a metal layer to a transparent insulation base material while securing excellent external appearance without haze or the like, a manufacturing method thereof, a touch panel equipped with the electrode member for a touch panel and an image display article having the touch panel.SOLUTION: An electrode member for a touch panel comprises a sensor electrode including a metal layer having a specified pattern shape at least on one surface of a transparent insulation base material. The sensor electrode is formed on the transparent insulation base material via a silicon oxide layer deposited by a sol-gel method. Along with the electrode member for a touch panel, a manufacturing method thereof, a touch panel equipped with the electrode member for a touch panel and an image display article having the touch panel are also provided.

Description

  The present invention relates to an electrode member for a touch panel, a method for manufacturing the electrode member for a touch panel, a touch panel, and an image display article.

In recent years, touch panels (touch screens) have become widespread as input means for various electronic devices. In many cases, touch panels are used together with display devices as input means for various devices (for example, ticket machines, ATM devices, mobile phones, game machines) in which display devices such as liquid crystal displays and plasma displays are incorporated. . In these devices, the touch panel is disposed on the display surface of the display device, and enables extremely direct input to the display device.
As the touch panel, various types of position detection methods have been put into practical use. In particular, the electrostatic capacity method is attracting attention because it allows multi-touch (multi-point simultaneous input). A capacitive touch panel is a position input device that detects a fingertip position by detecting a change in capacitance between a human fingertip and a conductive layer (electrode). And a sensor electrode made of a conductive layer provided on the transparent insulating substrate.
The capacitive touch panel has, for example, a second direction (for example, Y) in which a first sensor electrode having a substantially line shape extending in a first direction (for example, the X-axis direction) intersects the first direction. It has an array structure arranged in parallel in the axial direction), and can sense a position in the first direction. Further, the second sensor electrodes having a substantially line shape extending in the second direction (for example, the Y-axis direction) are arranged in parallel in the first direction, so that the second sensor electrode is positioned along with the position in the first direction. The position in the direction can be sensed.

In order to ensure the transparency of the touch panel, sensor electrodes have been conventionally formed using transparent conductive materials such as ITO. However, the demand for larger touch panels and higher sensitivity has increased, and gold, silver, copper Sensor electrodes using metal materials such as aluminum have also been proposed (for example, Patent Documents 1 to 3). Since these metal materials are non-transparent, they are patterned into thin lines having a line width that ensures the transparency of the touch panel, and sensor electrodes are formed.
For example, Patent Document 1 includes a transparent substrate and a sensor electrode array in which conductive metal fine wires are patterned, and a touch panel having at least one easy-adhesion layer between the conductive metal fine wires and the transparent substrate. Is disclosed. In Patent Document 1, the transparent substrate is formed using a polyester resin, and the easy-adhesion layer is formed using a polymer such as an acrylic resin, a polyurethane resin, a polyester resin, or a rubber resin.

JP 2012-79238 A JP 2011-70536 A JP 2011-76200 A

When a sensor electrode made of a metal layer is directly formed on a transparent insulating substrate, there is a problem that the adhesiveness between the transparent insulating substrate and the metal layer is low.
Then, like patent document 1, by forming the sensor electrode which consists of a metal layer on a transparent insulating base material via the adhesion layer containing resin, such as an acrylic resin, a transparent insulating base material and a metal layer are formed. It is possible to improve adhesiveness. However, an adhesive layer formed using a resin such as an acrylic resin is soft and insufficient in hardness because it is made of an organic material. Therefore, after forming a metal layer on a contact bonding layer by dry processes, such as vapor deposition, there exists a problem that an indentation is easily attached to the surface of a metal layer with the external force in the manufacturing process of the electrode member for touch panels. As a result, the electrode member for touch panel has a problem that haze is generated and the appearance is deteriorated. Moreover, the thin line of the metal layer pattern may occur and the position detection capability may be reduced.

  The present invention has been made in view of the above problems, and while ensuring an excellent appearance without haze and the like, an electrode member for a touch panel with improved adhesion of a metal layer to a transparent insulating substrate, a method for producing the same, It aims at providing a touch panel provided with this electrode member for touch panels, and an image display article provided with this touch panel.

An electrode member for a touch panel according to the present invention is an electrode member for a touch panel in which a sensor electrode made of a metal layer having a predetermined pattern shape is provided on at least one surface of a transparent insulating substrate,
The sensor electrode is formed on the transparent insulating substrate through a silicon oxide layer formed by a sol-gel method.

  In the method for producing an electrode member for a touch panel according to the present invention, a silicon oxide layer is formed on a transparent insulating base material by applying and curing a sol-gel reaction coating liquid of alkoxysilane, and then dried on the silicon oxide layer. A metal layer is formed by a process, and the metal layer is formed in a predetermined pattern.

The touch panel according to the present invention comprises the electrode member for a touch panel according to the present invention.
The image display article of the present invention is obtained by arranging the touch panel of the present invention on the image display surface of an article having an image on the surface.

  According to the present invention, an electrode member for a touch panel in which the adhesiveness of a metal layer to a transparent insulating base material is improved while ensuring an excellent appearance without haze and the like, a manufacturing method thereof, a touch panel provided with the electrode member for a touch panel, And an image display article provided with this touch panel can be provided.

FIG. 1A is a plan view schematically showing an example of an electrode member for a touch panel according to the present invention, FIG. 1B is a sectional view, and FIG. 1C is a partially enlarged plan view of a sensor electrode 2. It is. It is sectional drawing which shows typically an example of the electrode member for touchscreens which concerns on this invention. It is the top view (Drawing 3 (a)) and sectional view (Drawing 3 (b)-Drawing 3 (d)) showing typically an example of the electrode member for touchscreens concerning the present invention. It is an exploded sectional view showing typically an example of an image display article concerning the present invention.

Hereinafter, embodiments of the present invention will be described in detail. However, the present invention is not limited to the following embodiments, and various modifications can be made within the scope of the present invention.
[Electrode member for touch panel]
An electrode member for a touch panel according to the present invention is an electrode member for a touch panel in which a sensor electrode made of a metal layer having a predetermined pattern shape is provided on at least one surface of a transparent insulating substrate, and the sensor electrode is formed by a sol-gel method. It is characterized by being formed on the transparent insulating substrate through a silicon oxide layer.

Hereinafter, the electrode member for a touch panel according to the present invention will be described with reference to FIG. 1A and 1B are schematic views showing an example of an electrode member for a touch panel according to the present invention. FIG. 1A is a plan view, FIG. 1B is a cross-sectional view taken along line AA ′ of FIG. 1 (c) is an enlarged view of a circle B in FIG. 1 (a).
An electrode member 101 for a touch panel shown in FIG. 1 has a transparent insulating substrate 1 and a plurality of sensor electrodes 2 formed on one surface of the transparent insulating substrate 1. As shown in FIG. 1B, the sensor electrode 2 is formed on the transparent insulating substrate 1 via a silicon oxide layer 3 formed by a sol-gel method.
As shown in FIG. 1A, each sensor electrode 2 has a substantially line shape extending in a predetermined direction. The plurality of sensor electrodes 2 are arranged in parallel in a direction intersecting with the extending predetermined direction to form a sensor electrode array, thereby forming sensor electrodes that sense positions in the predetermined direction. In FIG. 1, the predetermined direction in which the sensor electrode 2 extends is the X-axis direction in the left-right direction of the drawing, and the direction intersecting the predetermined direction is the direction perpendicular to the predetermined direction, that is, the Y-axis direction. .
Each sensor electrode 2 has a pattern shape in which a plurality of sensor electrode elements 2E arranged in the X-axis direction that is the extending direction are electrically connected by an electrode element connection portion 2C. The sensor electrode element 2E and the electrode element connection portion 2C are formed of a copper layer (metal layer). As shown in FIG. 1C, the sensor electrode element 2E is formed in a mesh shape having a line portion 4 made of a copper layer which is an opaque material and an opening 4a provided between the line portions 4. Therefore, transparency is ensured.

  In the touch panel electrode member 101 according to the present embodiment shown in FIG. 1, the sensor electrode 2 extends in the X-axis direction, and extends in the Y-axis direction orthogonal to the X-axis on the transparent insulating substrate. By combining with a separate touch panel electrode member in which a plurality of sensor electrodes are arranged in parallel in the X-axis direction, a position on the touch panel having a two-dimensional spread can be sensed.

In the electrode member for a touch panel according to the present invention, the silicon oxide layer formed by the sol-gel method functions as an adhesive layer between the transparent insulating substrate and the sensor electrode made of the metal layer, and the metal layer has high adhesion to the transparent insulating layer. Moreover, the silicon oxide layer formed by the sol-gel method is harder than an adhesive layer formed of an organic material such as a resin. Therefore, in the manufacturing process after the metal layer is formed on the silicon oxide layer by a dry process, the surface of the metal layer is hardly indented. Therefore, compared to the case where an adhesive layer formed of an organic material such as a resin is provided, the surface of the metal layer is less likely to be indented due to external force in the manufacturing process of the electrode member for touch panel, and appearance deterioration such as haze or metal It is possible to suppress the occurrence of thin line breaks in the layer pattern.
On the other hand, since the silicon oxide layer formed by the sol-gel method has appropriate flexibility, the electrode member for a touch panel of the present invention is applied to a flexible touch panel using a flexible transparent insulating substrate. It can be used suitably also as a suitable electrode member.

Hereafter, the component of the electrode member for touchscreens of this invention is demonstrated.
(Transparent insulating substrate)
The transparent insulating substrate is not particularly limited as long as it has electrical insulation and transparency. For example, from polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate, polyolefin resins such as polyethylene, polypropylene, and polystyrene, cyclopolyolefin resins, polyetheretherketone, acrylic resins, polycarbonate resins, and other resin materials A resin film or a resin sheet can be used. An inorganic material film or an inorganic material sheet made of an inorganic material such as glass can also be used as the transparent insulating substrate.

  The thickness of the transparent insulating substrate is not particularly limited as long as it can stably support the sensor electrode and the like, and may be a flexible film, a sheet or a plate. Also good. Although it depends on the screen size, for example, it is 15 to 1000 μm, usually 25 to 1000 μm. This is because if the thickness of the transparent insulating substrate is less than the above range, the mechanical strength and handleability may be reduced, and if it exceeds the above range, it may hinder the thinning of the touch panel. In the case of a flexible film made of a resin material, the thickness is preferably 50 to 300 μm.

In the present invention, the transparency of the transparent insulating substrate means that when it is a touch panel, it is transparent to the extent that the visibility of display on the image display surface viewed through the touch panel can be secured, and is colorless and transparent. However, it may be colored and transparent as long as various properties required for individual touch panel applications, in particular, visibility of the display is not practically hindered.
Moreover, the structure of a transparent insulating base material is not restricted to the structure which consists of a single layer, You may have the structure by which the several layer was laminated | stacked. When it has the structure by which the several layer was laminated | stacked, the layer of the same composition may be laminated | stacked, and the several layer which has a different composition may be laminated | stacked.

(Silicon oxide layer)
The silicon oxide layer is interposed between the transparent insulating substrate and the sensor electrode made of a metal layer, and is formed by a sol-gel method.
The sol-gel method is a sol containing silicon oxide or a hydrolyzate thereof by hydrolysis and polycondensation reaction in a sol-gel reaction coating liquid of alkoxysilane. This is a method of curing by heating.
In the present invention, the silicon oxide layer is formed by a sol-gel method, and SiO _x R _y (x is a positive number, R is a monovalent organic group, y is 0 or a positive number, 1 ≦ x + y ≦ It has an average composition represented by 4). The silicon oxide layer mainly contains silicon dioxide (SiO ₂ ), but may contain other oxides such as silicon monoxide (SiO), and a part of oxygen bonded to silicon is monovalent. The structure substituted by the organic group R may be included.

Further, in the average composition formula SiO _x R _y, R is a monovalent organic group, with the content thereof, the refractive index of the silicon oxide layer is adjusted. Specific examples of R include a monovalent hydrocarbon group having 1 to 10 carbon atoms. In the hydrocarbon group, part or all of the hydrogen atoms bonded to the carbon atom may be substituted (substituted hydrocarbon). Moreover, only 1 type may be sufficient as organic group R, and 2 or more types may be sufficient as it.
Examples of the monovalent hydrocarbon group include an alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, and a decyl group, a cycloalkyl group such as a cyclohexyl group, and an aryl group such as a phenyl group. , An alkenyl group such as a vinyl group, an aralkyl group, and the like.
In addition, as the monovalent substituted hydrocarbon group, part or all of the hydrogen atoms bonded to the carbon atom of the monovalent hydrocarbon group may be (i) a halogen atom such as fluorine or chlorine, (ii) a glycidyloxy group, Epoxy functional groups such as epoxycyclohexyl groups, (iii) amino groups such as amino groups, aminoethylamino groups, phenylamino groups, dibutylamino groups, (iv) sulfur-containing functional groups such as mercapto groups, tetrasulfide groups, (v ) (Polyoxyalkylene) alkyl ether groups such as alkyl ether groups, (vi) anionic groups such as carboxyl groups and sulfonyl groups, (vii) quaternary ammonium salt structure-containing groups, etc. Things.
Specific examples of the monovalent substituted hydrocarbon group include trifluoropropyl group, perfluorobutylethyl group, perfluorooctylethyl group, 3-chloropropyl group, 2- (chloromethylphenyl) ethyl group, 3- Glycidyloxypropyl group, 2- (3,4-epoxycyclohexyl) ethyl group, 5,6-epoxyhexyl group, 9,10-epoxydecyl group, 3-aminopropyl group, N- (2-aminoethyl) amino Propyl group, 3- (N-phenylamino) propyl group, 3-dibutylaminopropyl group, 3-mercaptopropyl group, 2- (4-mercaptomethylphenyl) ethyl group, polyoxyethyleneoxypropyl group, 3-hydroxycarbonyl Examples thereof include a propyl group and a 3-tributylammonium propyl group.

The thickness of the silicon oxide layer is not particularly limited as long as adhesion between the transparent insulating substrate and the metal layer can be secured. For example, it may be in the range of 30 nm to 5 μm, and preferably in the range of 100 nm to 1000 nm. If it is less than the above range, sufficient adhesion may not be obtained, and if it exceeds the above range, the silicon oxide layer may be coherently broken.
The silicon oxide layer 3 only needs to be interposed between the transparent insulating substrate and the metal layer, and may have the same pattern shape as the metal layer 2 as shown in FIG. As shown in FIG. 2, it may be provided on the entire surface of one surface of the transparent insulating substrate 1 on which the metal layer 2 is provided. FIG. 2 is a cross-sectional view schematically showing a touch panel electrode member 102 which is an example of the touch panel electrode member of the present invention.
The method for forming the silicon oxide layer by the sol-gel method will be described in detail in “Method for manufacturing sensor electrode for touch panel” described later.

(Sensor electrode)
The sensor electrode is provided on at least one surface of the transparent insulating substrate and is made of a metal layer having a predetermined pattern shape.
A plurality of sensor electrodes having a substantially line shape extending in a predetermined direction are arranged in parallel in a direction crossing the extending predetermined direction, thereby functioning as sensor electrodes for sensing positions in the predetermined direction.

In the present invention, the sensor electrode is formed of a metal layer that is an opaque material. Therefore, the pattern shape of the metal layer constituting the sensor electrode is a shape in which the metal layer functions as the sensor electrode and the transparency of the touch panel can be ensured.
For example, in the electrode member 101 for a touch panel shown in FIG. 1, a plurality of sensor electrode elements 2E that are separated from each other in the X-axis direction are linearly arranged, and adjacent sensor electrodes 2E are linear electrode element connection portions 2C. Thus, the sensor electrode 2 having a substantially line shape extending in the X-axis direction is formed. Each sensor electrode 2 has a triangular sensor electrode element 2E disposed at both ends in the X-axis direction, and a diamond-shaped sensor electrode element 2E disposed therebetween.

In FIG. 1, the sensor electrode 2 is composed of a sensor electrode element 2E having a certain area and having transparency, and a thin-line electrode element connection portion 2C for connecting them, but the transparency of the touch panel is shown. And if the sensitivity of a sensor electrode can be ensured, the pattern shape of the metal layer which is a sensor electrode will not be specifically limited. Further, the shape and size of the sensor electrode element and the electrode element connection portion are not particularly limited. For example, examples of the outer shape of the sensor electrode element include a square or a rhombus whose one side is 100 to 2000 μm. Moreover, as a shape of an electrode element connection part, the linear shape of 600-3000 micrometers can be mentioned.
In order to arrange the sensor electrode that senses the position in the X-axis direction and the sensor electrode that senses the position in the Y-axis direction so as not to overlap each other, the sensor electrode generally has a planar extension as shown in FIG. The sensor electrode element 2E having the shape and the electrode element connection portion 2C that connects these sensor electrode elements 2E are formed in a pattern shape.
In FIG. 1, the sensor electrode element 2 </ b> E having a planar extension has a space portion provided between the line portion 4 made of a metal layer and the line portion 4 so as not to hinder the visual recognition of the image display surface. (Opening 4a) is formed in a pattern shape (for example, mesh shape), and transparency is ensured (see FIG. 1C). Similarly, the electrode element connecting portion that connects the sensor electrode element 2E also has a line width that does not hinder the visual recognition of the image display surface, and the transparency of the metal layer is ensured.

Here, the transparency of the metal layer means that the display of the article having an image can be visually observed to the extent that the visibility of the display of the article (for example, an image display panel) having an image viewed through the touch panel is not impaired. In the present invention, the sensor electrode is provided with a space (metal layer non-formed part) between the opaque metal layers, so that the sensor electrode is apparently transparent when viewed globally.
That is, the pattern shape of the sensor electrode element having a planar spread is not particularly limited as long as the transparency is ensured. For example, as a specific form of the mesh shape, in addition to the square lattice shown in FIG. 1, a regular pattern having a periodicity such as a triangular lattice, a rectangular lattice, a pentagonal lattice, a hexagonal lattice, or an opening having a random shape is used. It may be an irregular pattern containing. Moreover, a stripe shape may be sufficient.
Further, the line portion of the metal layer forming the mesh pattern may be linear, curved, or a combination thereof. The line width of the line part can be set as appropriate depending on the invisibility according to the viewing distance and the required surface resistivity, within the position detection region of the sensor electrode. For example, the line width of the line portion is 50 μm or less, preferably 30 μm or less, more preferably 15 μm or less, and even more preferably 10 μm or less. From the viewpoint of ensuring the electrical conductivity required for the sensor electrode and avoiding disconnection, the line width of the line portion is preferably 1 μm or more, particularly 3 μm or more.
Moreover, the magnitude | size of the opening part which is a space part in a mesh pattern is 40-2000 micrometers, for example. In the present invention, the size of the opening is the diameter of a circle circumscribing the opening. Since the size of the opening in the metal layer, the line width of the line part, the thickness, the volume resistivity, etc. affect the surface resistivity, it is preferable to adjust these according to the surface resistance required for the sensor electrode. .
Further, the electrode element connection portion may be linear or curved. The line width of the electrode element connection portion can be appropriately set depending on the invisibility and the required surface resistivity, and is, for example, 15 μm or less, preferably 10 μm or less, more preferably 5 μm or less. From the viewpoint of ensuring the electrical conductivity required for the sensor electrode and avoiding disconnection, it is preferable that the line width of the electrode element connection portion is equal to the line width of the line portion.

Examples of the conductive metal forming the metal layer include metals such as copper, gold, silver, platinum, tin, aluminum, nickel, molybdenum, and chromium, and alloys containing at least one of these metals. Copper and an alloy containing silver, palladium and copper (APC alloy) are preferable.
The configuration of the metal layer is not limited to a configuration composed of a single layer, and may have a configuration in which a plurality of layers are stacked. When it has the structure by which the several layer was laminated | stacked, the layer of the same composition may be laminated | stacked, and the several layer which has a different composition may be laminated | stacked.
The thickness of the metal layer is preferably in the range of 100 nm to 1000 nm, particularly 100 nm to 500 nm, particularly 100 nm to 300 nm, from the viewpoints of transparency and conductivity. When the thickness of the metal layer is less than the above range, the conductivity is lowered and the position detection sensitivity may be lowered. Moreover, when the thickness of a metal layer exceeds the said range, the aspect ratio of the thickness with respect to line width becomes large, and it becomes difficult to form a thin line stably.
From the viewpoint of conductivity, the metal layer preferably has a surface resistance of 1 Ω / □ (Ω / sq) or less, particularly preferably 0.3 Ω / □ (Ω / sq) or less.

The metal layer is formed by patterning a metal film formed by etching, for example, a metal foil, a metal vapor-deposited film by vapor deposition or sputtering, a metal plating film by electrolytic plating or electroless plating, or a combination thereof. Can do. Dry processes such as vapor deposition and sputtering are suitable for forming a metal thin film pattern.
Further, the surface of the metal layer (toucher side) may be subjected to low reflection treatment. This is because reflection of external light or the like by the sensor electrode can be reduced. Although it does not specifically limit as a low reflection processing method, For example, a blackening process etc. can be mentioned. Any blackening treatment may be used as long as the surface of the metal material is blackened, and a commonly used treatment can be used. Specifically, a method of performing blackening treatment on the surface of silver, copper, gold and their alloys with a mixed solution of tellurium oxide, hydrochloric acid, acetic acid and water disclosed in JP-A-2006-233327, or international publication The method described in the publication 2009-054273 etc. can be mentioned.

As described above, the sensor electrode can sense a position on the touch panel having a two-dimensional spread by pairing two sets of sensor electrodes having different extending directions. For example, the touch panel electrode member 101 shown in FIG. 1 is combined with a separate touch panel electrode member in which a plurality of sensor electrodes extending in the Y axis direction are arranged in parallel in the X axis direction. The sensor electrodes of the touch panel electrode member function as a scanning line for positioning in the X-axis direction and a scanning line for positioning in the Y-axis direction, respectively, and function as a touch panel that can sense coordinates on a plane.
The touch panel electrode member of the present invention is paired not only with a form having one set of sensor electrodes as in the touch panel electrode member 101 shown in FIG. 1, but also as a touch panel electrode member 103 as shown in FIG. It can be set as the form which has two sets of sensor electrodes.

3A and 3B are schematic views showing an example of an electrode member for a touch panel according to the present invention, FIG. 3A is a plan view, and FIG. 3B is a cross-sectional view taken along line AA ′ of FIG. It is.
The electrode member 103 for a touch panel shown in FIG. 3 is formed on the other surface of the transparent insulating substrate 1, the plurality of sensor electrodes 2x formed on one surface of the transparent insulating substrate 1, and the transparent insulating substrate 1. And a plurality of sensor electrodes 2y. As shown in FIG. 3B, the sensor electrodes 2x and 2y are respectively formed on the transparent insulating substrate 1 via the silicon oxide layer 3 formed by the sol-gel method.
As shown in FIG. 3A, the sensor electrode 2x and the sensor electrode 2y have different extending directions and sense a position on the touch panel as a pair. That is, each sensor electrode 2x has a substantially line shape extending in the X-axis direction, and a plurality of sensor electrodes 2x are arranged in parallel in the Y-axis direction to form a sensor electrode array. Can detect the position in the X-axis direction. On the other hand, each sensor electrode 2y has a substantially line shape extending in the Y-axis direction, and a plurality of sensor electrodes 2y are arranged in parallel in the X-axis direction to constitute a sensor electrode array. Thus, the position in the Y-axis direction can be sensed.

Each sensor electrode 2x has a pattern shape in which a plurality of sensor electrode elements 2xE that are arranged apart from each other in the X-axis direction that is an extending direction are electrically connected by an electrode element connection portion 2xC. In addition, each sensor electrode 2y has a pattern shape in which a plurality of sensor electrode elements 2yE arranged in the Y-axis direction that is the extending direction are electrically connected by an electrode element connection portion 2yC. . The sensor electrode elements 2xE and 2yE are formed in a mesh shape having a line portion made of a metal layer that is an opaque material and an opening provided between the line portions, thereby ensuring transparency. .
The sensor electrode 2x and the sensor electrode 2y are arranged so that the sensor electrode element 2xE and the sensor electrode element 2yE do not overlap in the Z-axis direction.
In FIG. 3, the extending directions of the sensor electrode 2x and the sensor electrode 2y are orthogonal to each other, but the intersecting direction of the extending directions of the paired sensor electrodes is not limited to orthogonal. The configuration of the sensor electrode 2x can be the same as that of the sensor electrode 2. The configuration of the sensor electrode 2y can be the same as that of the sensor electrode 2 except for the extending direction of the sensor electrode.

In addition, the touch panel electrode member having two pairs of sensor electrodes has a planar structure shown in FIG. 3A and a cross-sectional structure shown in FIG. 3C or 3D. Can be mentioned. 3C and 3D are cross-sectional views taken along the line AA ′ of FIG.
The electrode member for a touch panel having the cross-sectional structure shown in FIG. 3C includes a transparent insulating substrate 1 (1x) provided with a sensor electrode 2 (2x) extending in the X-axis direction on one surface, A transparent insulating base material 1 (1y) provided with a sensor electrode 2 (2y) extending in the Y-axis direction on the surface. The transparent insulating base material 1x and the transparent insulating base material 1y are sensor electrodes. The surfaces provided with 2 are laminated in the same direction in the Z-axis direction. The transparent insulating substrate 1x and the transparent insulating substrate 1y are laminated via the transparent adhesive layer 9, and are insulated from each other.
The electrode member for a touch panel shown in FIG. 3D includes a transparent insulating substrate 1 (1x) provided with a sensor electrode 2 (2x) extending in the X-axis direction on one surface, and a Y-axis on one surface. A transparent insulating base material 1 (1y) provided with a sensor electrode 2 (2y) extending in the direction, and the transparent insulating base material 1x and the transparent insulating base material 1y include the sensor electrodes 2x, The layers are stacked so that 2y faces each other. The transparent insulating substrate 1x and the transparent insulating substrate 1y are laminated via the transparent adhesive layer 9, and are insulated from each other. The transparent adhesive layer will be described later.
3 (c) and 3 (d), as shown in FIG. 3 (a), the sensor electrode 2x and the sensor electrode 2y each have a sensor electrode element 2xE in the Z-axis direction. The sensor electrode element 2yE is disposed so as not to overlap.

(Other configurations)
The electrode member for a touch panel of the present invention may have components other than the transparent insulating substrate, the sensor electrode made of a metal layer, and the silicon oxide layer. For example, for the purpose of surface protection, adhesion improvement, antireflection, etc. on the extraction circuit for connecting each sensor electrode to an external circuit, each layer of transparent insulating base material, silicon oxide layer and metal layer, surface, etc. Known components such as a functional layer can be included.

<Extraction circuit>
The material and shape of the extraction circuit are not particularly limited as long as each sensor electrode can be electrically connected to an external circuit. For example, as shown in FIG. 1, the extraction circuit 5 for connecting each sensor electrode to an external circuit has one end portion electrically connected to each sensor electrode 2. The other end of the extraction circuit is electrically connected to an external circuit. The extraction circuit can be formed simultaneously with the same material as the sensor electrode. The extraction circuit can include a wiring, an electrode, a connection terminal, and the like. The pattern of the extraction circuit can be designed as appropriate.

<Functional layer>
It does not specifically limit as a functional layer, The various layer which has a desired function can be arrange | positioned in each interlayer, surface, etc. which comprise the electrode member for touchscreens.
For example, the silicon oxide layer may be formed directly on the transparent insulating substrate (see FIG. 1), but may be formed on the transparent insulating substrate via the functional layer (see FIG. 2). Similarly, the sensor electrode may be formed directly on the silicon oxide layer (see FIG. 1), but may be formed on the silicon oxide layer via the functional layer (see FIG. 2). Specifically, the electrode member 102 for a touch panel shown in FIG. 2 includes a hard coat layer 6 between the transparent insulating substrate 1 and the silicon oxide layer 3, and a sensor electrode 2 made of the silicon oxide layer 3 and the APC alloy layer. The adhesion adjusting layer 7 made of a MoNb alloy is provided between the two. Furthermore, a surface protective layer 8 made of an amorphous ITO layer is provided on the surface of the sensor electrode 2 made of an APC alloy layer.
Moreover, when the electrode member for touch panels of this invention has a structure which laminated | stacked two transparent insulation base materials which have a sensor electrode from which an extending direction differs as shown in FIG.3 (c), (d). The transparent insulating substrate 1x and the transparent insulating substrate 1y can be laminated via the transparent adhesive layer 9.
Hereinafter, the hard coat layer, the adhesion adjusting layer, the surface protective layer, and the transparent adhesive layer will be described.

For the purpose of preventing damage to the metal layer, the hard coat layer 6 can be provided between the transparent insulating substrate 1 and the silicon oxide layer 3 as in the touch panel electrode member 102 shown in FIG. In particular, it is effective to prevent damage to the metal layer when the metal layer is formed by a dry process. Moreover, a hard-coat layer can also be provided in the surface of the electrode member for touchscreens for the purpose of improving the abrasion resistance of the touchscreen surface.
As a hard-coat layer, what is generally used for the electrode member for touch panels can be used, and as a forming material, ionizing radiation curable resin can be used, for example. Examples of the ionizing radiation curable resin include those having an acrylate-based functional group. Specific examples include relatively low molecular weight polyester resins, polyether resins, acrylic resins, epoxy resins, urethane resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiol polyether resins, polyhydric alcohols, and fluorene resins. be able to. Also, di (meth) acrylates such as ethylene glycol di (meth) acrylate and pentaerythritol di (meth) acrylate monostearate; tri (meth) such as trimethylolpropane tri (meth) acrylate and pentaerythritol tri (meth) acrylate Acrylates; Polyfunctional (meth) acrylates such as pentaerythritol tetra (meth) acrylate derivatives and dipentaerythritol penta (meth) acrylate; Monomers of polyfunctional compounds such as, or oligomers such as epoxy acrylate and urethane acrylate You can also.

The hard coat layer may contain organic fine particles or inorganic fine particles. Among these, inorganic fine particles such as silica are preferable because of their high hardness. Further, inorganic fine particles having a reactive functional group capable of forming a crosslink with the ionizing radiation curable resin are more preferable because the film strength can be further increased.
The film thickness of the hard coat layer is preferably in the range of 0.1 to 30 μm, and more preferably in the range of 5 to 15 μm.
The formation method of a hard-coat layer is not specifically limited, For example, the coating method using the coating liquid for hard-coat layers, and the transfer method which transfers a hard-coat layer are mentioned.

For the purpose of improving the adhesion between the metal layer and the silicon oxide layer, the adhesion adjusting layer 7 is formed of, for example, an electrode member 102 for a touch panel shown in FIG. It can be provided in between.
The adhesion adjusting layer can be formed of, for example, molybdenum niobium alloy (MoNb alloy), niobium pentoxide (Nb ₂ O ₅ ), or the like. Among these, an adhesion adjusting layer made of a molybdenum niobium alloy is preferable. The adhesion adjusting layer is particularly effective when, for example, a metal layer that is a sensor electrode is formed using an APC alloy or the like.
The thickness of the adhesion adjusting layer is not particularly limited, and is preferably in the range of 5 nm to 10 nm, particularly 5 nm, for example.
The adhesion adjusting layer can be formed, for example, by forming a film using a dry process such as vacuum deposition, sputtering, CVD, ion plating, etc., and forming and etching a patterned resist.

When the surface protective layer 8 rolls up the electrode member for touch panels, especially the electrode member for touch panels in which the sensor electrode 2 was provided on both surfaces of the transparent insulating base material 1 as shown in FIG. For the purpose of suppressing blocking of the metal layer 2, it can be provided on the surface of the metal layer 2 (on the opposite side to the transparent insulating substrate 1 side), for example, as a touch panel electrode member 102 shown in FIG. 2.
The surface protective layer is, for example, ITO (indium tin oxide), zinc oxide, indium oxide, antimony-added tin oxide, fluorine-added tin oxide, aluminum-added zinc oxide, potassium-added zinc oxide, silicon-added zinc oxide, zinc oxide-tin oxide. It can be formed from inorganic oxides such as a zinc oxide, an indium oxide-tin oxide system, and a zinc oxide-indium oxide-magnesium oxide system. Such a surface protective layer made of an inorganic oxide is excellent in adhesion to an etching resist as compared with a metal layer as a sensor electrode. Therefore, when the etching resist is exposed and developed on the surface of the metal layer and patterned to form an etching mask, high-definition patterning of the etching resist is possible. As a result, the patterning of the metal layer performed using the resist mask can be performed with high definition.
The surface protective layer is preferably one that can be etched with the same etchant as the metal layer. This is because the patterning of the surface protective layer and the metal layer can be performed simultaneously with the patterning of the metal layer. For example, when the metal layer is an APC alloy or the like, it is preferable to provide a surface protective layer made of ITO, aluminum-added zinc oxide or the like, and in particular, a surface protective layer made of ITO is preferably provided. This is because the same etching solution as that for the electrode layer can be used, so that productivity can be improved.

The inorganic oxide material may be crystalline or amorphous (amorphous), but is preferably amorphous. This is because an amorphous inorganic oxide material can be easily etched and a metal layer can be easily formed. In particular, when the inorganic oxide material is amorphous ITO, the etching can be easily performed with a weak acid, and the etching can be performed with a strong acid in a short time. Therefore, productivity can be improved by shortening the etching time. In addition, since etching with a weak acid is possible, there is a margin in resist etchant durability, and quality improvement in terms of defects and the like can be expected. In addition, when performing a blackening treatment using an acidic treatment liquid containing hydrochloric acid or the like as a low reflection treatment of the sensor electrode described later, an amorphous material on the metal layer is formed prior to the blackening treatment of the metal layer that is the sensor electrode. Since ITO is dissolved and peeled off by the blackening treatment liquid, and then the blackening treatment of the metal layer surface proceeds, there is an advantage that the blackening treatment of the metal layer can be easily performed.
Note that whether the inorganic oxide material is amorphous can be determined by a diffraction pattern obtained by X-ray analysis or electron beam analysis. In the present invention, when the maximum peak height (maximum diffraction intensity) of the diffraction pattern when the inorganic oxide material is in a crystalline state is 1, it corresponds to the maximum peak measured under the same conditions. When the diffraction intensity at the position is smaller than 1, it can be determined to be amorphous. In the present invention, it is preferable that the ratio of the diffraction intensity at the maximum peak is 0.5 or less. This is because etching becomes easier.

The thickness of the surface protective layer is not particularly limited and can be set as appropriate. For example, when the surface protective layer is formed by a dry process such as a vacuum deposition method, it is preferably in the range of 1 nm to 50 nm, particularly preferably in the range of 1 nm to 30 nm. It is preferably within a range of 5 nm to 10 nm. When the thickness of the surface protective layer is within the above range, the surface protective layer can be easily formed by etching, and the surface of the metal layer can be sufficiently protected.
When the surface protective layer has a member formed of a metal such as a take-out circuit in addition to the metal layer as the sensor electrode, the surface protective layer may also be formed on such a metal member. The surface protective layer is formed, for example, by forming an inorganic oxide layer made of an inorganic oxide material using a dry process such as vacuum deposition, sputtering, CVD, or ion plating, and forming a pattern on the inorganic oxide layer. It can be formed by forming a resist and etching. Examples of the method for forming the surface protective layer from the crystalline inorganic oxide material include a general method such as a method of heat-treating the inorganic oxide material layer formed by the dry process. Further, as a method for forming a surface protective layer from an amorphous inorganic oxide material, a method based on the dry process described above, or a water vapor partial pressure during film formation described in Japanese Patent Laid-Open No. 2003-16858 is increased. A method can be mentioned.
Note that the etching solution used for etching is appropriately set according to the inorganic oxide material constituting the inorganic oxide layer and its state. Specifically, when the inorganic oxide layer is made of amorphous ITO, phosphorous nitric acid or the like can be used.

The transparent adhesive layer 9 is formed using a non-conductive resin so as to ensure insulation between sensor electrodes that are transparent and have different extending directions so as not to hinder image display. The transparent adhesive layer can be formed of a sheet having adhesiveness or tackiness such as an acrylic resin, a polyester resin, a silicone resin, or an epoxy resin.
The thickness of the transparent adhesive layer is not particularly limited and can be set as appropriate.

[Method for manufacturing electrode member for touch panel]
In the method for producing an electrode member for a touch panel according to the present invention, a silicon oxide layer is formed on a transparent insulating base material by applying and curing a sol-gel reaction coating liquid of alkoxysilane, and then dried on the silicon oxide layer. A metal layer is formed by a process, and the metal layer is formed in a predetermined pattern.
The transparent insulating base material is the same as the transparent insulating base material described in the above “electrode member for touch panel”, and thus the description thereof is omitted here.
The manufacturing method of the electrode member for touch panels of this invention has the big characteristic in the point that a silicon oxide layer is formed by apply | coating the sol-gel reaction coating liquid of alkoxysilane on a transparent insulating base material, and making it harden | cure. Specifically, a sol containing silicon oxide or a hydrolyzate thereof by hydrolysis and condensation polymerization reaction in a sol-gel reaction coating solution of alkoxysilane, further gelling by further reaction, and heating the gel Then, the silicon oxide layer is formed by curing. The silicon oxide layer has an average composition represented by SiO _x R _y as described above.

Examples of the silane compound used as a starting material for the sol-gel reaction coating liquid of alkoxysilane include various hydrolyzable silane compounds having the following structures and partial hydrolysis / condensates thereof.
Si (OX) ₄ , RSi (OX) ₃ , R ₂ Si (OX) ₂ , R ₃ Si (OX)
In the hydrolyzable silane compound, the OX group represents a condensable silanol group or a hydrolyzable group. Accordingly, the X group represents a hydrogen atom or a monovalent organic group having 1 to 4 carbon atoms, such as an alkyl group, an alkenyl group, an alkoxyalkyl group, an acyl group, an alkenyloxy group, and the like. Examples thereof include a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group, an isopropenoxy group, and an acetoxy group. R is the same as above.
The hydrolyzable silane compounds can be used alone or in combination of two or more.
The ratio of Si, O and R in SiO _x R _y representing the average composition of the silicon oxide layer after curing is adjusted by adjusting the ratio of Si, O and R as the total hydrolyzable silane used. Is possible.

  The sol-gel reaction coating liquid of alkoxysilane usually contains the hydrolyzable silane compound and water for hydrolyzing the hydrolyzable silane compound. Moreover, the organic solvent, the hydrolysis catalyst, etc. may be included as needed. A part of the hydrolyzable silane compound in the sol-gel reaction coating liquid may be a hydrolyzate or a partial condensate.

The amount of water charged during the preparation of the alkoxysilane sol-gel reaction coating solution preferably satisfies the range of 0.1 to 50 in terms of the molar ratio of (H ₂ O / Si—OX). When the said molar ratio is less than 0.1, there exists a possibility that the coating property of a sol gel reaction coating liquid may worsen. If the molar ratio exceeds 50, the productivity of the silicon oxide layer may be reduced.

  Usable organic solvents include alcohols such as methanol, ethanol, isopropanol, n-butanol, isobutanol, t-butanol, t-amyl alcohol, butyl cellosolve, 3-methyl-3-methoxybutanol and diacetone alcohol, acetone , Ketones such as methyl ethyl ketone, methyl isobutyl ketone and acetyl acetone, ethers such as propylene glycol monomethyl ether, dipropylene glycol monomethyl ether and diisopropyl ether, esters such as ethyl acetate and isobutyl acetate, aromatics such as toluene and xylene, Examples include amides such as dimethylformamide and solvents such as dimethyl sulfoxide, but are not limited thereto.

  As the hydrolysis catalyst, a conventionally known catalyst can be used. (A) Mineral acids such as acetic acid, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid and hydrogen fluoride, (b) carboxylic acids such as oxalic acid and maleic acid Acid, (c) sulfonic acid such as methanesulfonic acid, (d) acidic or weakly acidic inorganic salt such as KF, (e) solid acid such as ion exchange resin having sulfonic acid group or carboxylic acid group on the surface, ( f) Basic substances such as lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium methylate, (g) Organic acid salts such as sodium acetate and sodium formate, (h) Ammonia, butylamine, n-hexylamine, triethylamine Amine compounds such as diazabicycloundecene, (i) tetraisopropyl titanate, tetrabutyl titanate, aluminum triiso Toxide, Aluminum triisopropoxide, Aluminum acetylacetonate, Aluminum perchlorate, Aluminum chloride, Cobalt octylate, Cobalt acetylacetonate, Zinc octylate, Zinc acetylacetonate, Iron acetylacetonate, Tin acetylacetonate, Dibutyltin octet Examples thereof include metal-containing compounds such as rate and dibutyltin laurate. A plurality of these catalysts may be used in combination. The amount of the hydrolysis catalyst is preferably in the range of 0.001 to 10 mol% with respect to 1 mol of the hydrolyzable group on the silicon atom.

The sol-gel reaction coating liquid preferably further contains a silanol condensation catalyst from the viewpoint of promoting the hydrolysis polycondensation reaction of silanol groups.
Conventionally known silanol condensation catalysts can be used, such as lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium methylate, sodium acetate, sodium formate, n-hexylamine, tributylamine, diazabicycloundecene. Basic compounds such as: tetraisopropyl titanate, tetrabutyl titanate, aluminum triisobutoxide, aluminum triisopropoxide, aluminum acetylacetonate, aluminum perchlorate, aluminum chloride, cobalt octylate, cobalt acetylacetonate, zinc octylate Metal-containing compounds such as zinc acetylacetonate, iron acetylacetonate, tin acetylacetonate, dibutyltin octylate, dibutyltin laurate; Nsuruhon acid, such as acidic compounds of trichloroacetic acid and the like.

The sol-gel reaction coating solution of alkoxysilane may further contain components other than those described above.
The method for applying the alkoxysilane sol-gel reaction coating solution on the transparent insulating substrate is not particularly limited, and a known method can be employed. Examples of the method include gravure coating, gravure reverse coating, roll coating, spray coating, spin coating, and knife coating. What is necessary is just to adjust a coating amount suitably according to the thickness of the silicon oxide layer to form. In addition, when forming a silicon oxide layer on a transparent insulating base material through a functional layer, the sol-gel reaction coating liquid of alkoxysilane is apply | coated on the transparent insulating base material in which the functional layer was formed.

The sol-gel reaction coating liquid of alkoxysilane coated on the transparent insulating substrate is gelled and cured by hydrolysis and condensation polymerization reaction through a sol containing silicon oxide or a hydrolyzate thereof to form a silicon oxide layer. It is formed.
The sol-gel reaction coating liquid of alkoxysilane applied on the transparent insulating substrate may be heated for the purpose of drying, the purpose of promoting the reaction, and the purpose of completing the reaction. Specifically, after applying the sol-gel reaction coating solution of alkoxysilane, it can be heated to 50 ° C. to 150 ° C., particularly 80 ° C. to 120 ° C.

Next, a metal layer is formed on the silicon oxide layer by a dry process, and the metal layer is formed in a predetermined pattern. Thereby, a sensor electrode is formed on the silicon oxide layer.
Here, the dry process is a process for forming a thin film by depositing a coating material on a surface to be coated in a vapor state. As the dry process for forming the metal layer, a known method can be used, and examples thereof include methods such as vapor deposition, sputtering, and ion plating.
As a method for patterning the metal layer, a known method can be employed. For example, a method using an evaporation mask or an etching mask formed by applying and developing an etching resist on the metal layer is used. A method can be mentioned. Specifically, the etching resist is coated on the metal layer by a known method, dried, then exposed through a photomask, and developed with a developer to form a pattern. A resist film is formed. Using this resist film as an etching mask, the exposed metal layer is etched with an etching solution (for example, ferric chloride aqueous solution), whereby the metal layer is patterned. Thereafter, the resist film is dissolved and removed using an alkaline aqueous solution or the like.

In addition, since the predetermined pattern of the metal layer was described in the item “electrode member for touch panel”, description thereof is omitted here.
When the metal layer is formed on the silicon oxide layer via the functional layer, the metal layer may be formed as described above after the functional layer is formed on the silicon oxide layer. Further, as described above, when a functional layer such as a surface protective layer is provided on the surface of the metal layer, the patterning of the metal layer can be performed together with the patterning of the functional layer.

[Touch panel]
The touch panel according to the present invention includes the touch panel electrode member according to the present invention.
Since the electrode member for a touch panel of the present invention has already been described, the description thereof is omitted here.
In the touch panel of the present invention, at least one touch panel electrode member is used, and two touch panel electrode members may be used. For example, in the case of a touch panel that can sense and operate a position on a touch panel having a two-dimensional extent, a first sensor electrode that extends in a predetermined direction and a first sensor electrode that extends in a direction intersecting the predetermined direction. 2 sensor electrodes need to be incorporated. For this purpose, for example, as shown in FIG. 1, when using an electrode member for a touch panel having only the sensor electrode 2 (first sensor electrode) extending in the X-axis direction, the direction intersecting the X-axis ( For example, it is combined with a separate touch panel electrode member having a sensor electrode (second sensor electrode) extending in the Y-axis direction. Alternatively, as shown in FIG. 3, a touch panel electrode having a sensor electrode 2 x (first sensor electrode) extending in the X-axis direction and a sensor electrode 2 y (second sensor electrode) extending in the Y-axis direction. Use members.
When two separate touch panel electrode members are combined, the touch panel electrode members can be stacked via a transparent adhesive layer. As a transparent contact bonding layer, it can be set as the structure similar to the transparent contact bonding layer which comprises the electrode member for touchscreens.
The touch panel of the present invention can include known components such as a take-out circuit for connecting the sensor electrode to an external circuit, a flexible printed board, and a touch panel drive circuit in addition to the touch panel electrode member of the present invention.

[Image display article]
The image display article according to the present invention is obtained by arranging the touch panel according to the present invention on the image display surface of an article having an image on the surface.
FIG. 4 is an exploded sectional view schematically showing an example of the image display article of the present invention. In FIG. 4, the image display article 300 has a touch panel 200 arranged on the image display surface 10a of the article 10 having an image on the surface. A front protective plate 11 is disposed on the surface of the touch panel 200.
Since the touch panel of the present invention has already been described, the description thereof is omitted here.
The article having an image on the surface is not particularly limited, and examples thereof include an image display panel, black and white or color printed matter represented by halftone dots, and a photograph formed on photographic paper. Examples of the image display panel include a liquid crystal display panel, a plasma display panel, an EL (electroluminescence) panel, various image display panels such as electronic paper, and a cathode ray tube.

The image display article of the present invention may have a front protective plate on the surface of the touch panel for the purpose of protecting the surface of the touch panel. As the front protective plate, for example, a glass plate, a resin plate, or the like can be used.
Further, an adhesive sheet, a transparent resin layer, or the like may be interposed between the touch panel, the article having an image on the surface, and the front protective plate, respectively.
Further, the image display article of the present invention may include components known in the image display article such as various control circuits, tuning circuits, power supply circuits, backlights, and casings depending on the application.

  The image display article of the present invention includes, for example, a portable information terminal such as a tablet computer, various telephones such as a smartphone, a television receiver, a personal computer, an electronic book terminal, a monitor display, a digital camera, a digital photo frame, a measuring instrument, and a medical device. The present invention can be widely applied to an image display device provided with position input means such as a business device, a game machine, an office machine, a cash dispenser, an electronic blackboard, and a vending machine. Further, it can be used for an image display article on which a fixed image such as an advertisement is displayed.

[Example 1]
A polyethylene terephthalate (PET) film (thickness: 100 μm) was prepared as a transparent insulating substrate.
A polyester resin solution was applied to both sides of the PET film, dried, and then irradiated with UV to form a hard coat layer (thickness 5 μm).
Subsequently, a sol-gel reaction coating solution containing alkoxysilane is applied on the hard coat layers on both sides by the gravure reverse method, and then heated at 100 ° C. to form a silicon oxide layer (thickness: 100 nm). did.
Next, a MoNb alloy layer (adhesion adjusting layer, thickness 5 nm) was formed on both silicon oxide layers by sputtering.
Subsequently, an APC alloy layer (metal layer, thickness 100 nm) was formed on the MoNb alloy layers on both sides by sputtering.
Furthermore, an amorphous ITO layer (surface protective layer, thickness 5 nm) was formed on both APC alloy layers by sputtering.
Next, a positive photosensitive resin (etching resist) was applied on the amorphous ITO layers on both sides, and patterned by a photolithography method. Here, the resist pattern is a rhombus whose outer shape has a side length of 600 μm, a sensor electrode element having a mesh pattern including a line portion having a line width of 5 μm and an opening portion having a length of 595 μm, a line width of 5 μm and a length. The electrode element connecting portion having 3000 μm and the opening corresponding to the extraction line having a width of 0.02 to 0.05 mm were provided.
Thereafter, the aqueous solution of ferric chloride was used as an etching solution, and the amorphous ITO layer and the APC alloy layer were patterned. Subsequently, the resist was stripped with an aqueous sodium hydroxide solution.
Furthermore, a blackening treatment was performed using a tellurium oxide-based mixed solution, and the amorphous ITO layer was dissolved and peeled, and a blackening treatment (reflection reduction treatment) on the surface of the APC alloy layer was performed to obtain an electrode member for a touch panel. .

[Example 2]
A polyethylene terephthalate (PET) film (thickness: 100 μm) was prepared as a transparent insulating substrate.
A sol-gel reaction coating liquid containing alkoxysilane was applied to both surfaces of the PET film by a clavia reverse method, and then heated at 100 ° C. to form a silicon oxide layer (thickness 150 nm).
Next, a copper layer (metal layer, thickness 250 nm) was formed on the silicon oxide layers on both sides by sputtering.
Subsequently, a negative photosensitive resin (etching resist) was applied on the copper layers on both sides and patterned by a photolithography method. Here, the resist pattern is a rhombus whose outer shape has a side length of 600 μm, a sensor electrode element having a mesh pattern including a line portion having a line width of 5 μm and an opening portion having a length of 595 μm, a line width of 5 μm and a length. The electrode element connecting portion having 3000 μm and the opening corresponding to the extraction line having a width of 0.02 to 0.05 mm were provided.
Thereafter, the copper layer was patterned using an aqueous ferric chloride solution as an etchant. Subsequently, the resist was stripped with an aqueous sodium hydroxide solution.
Furthermore, the blackening process was performed using the tellurium oxide type mixed liquid, the blackening process (reflection reduction process) of the copper layer surface was performed, and the electrode member for touchscreens was obtained.

[Comparative Example 1]
A polyethylene terephthalate (PET) film (thickness: 100 μm) was prepared as a transparent insulating substrate.
On one side of the PET film, an acrylic resin solution was applied and dried, and an acrylic resin layer was laminated. Then, the metal pattern layer was laminated | stacked similarly to Example 2, and the electrode member for touchscreens was obtained.

[Evaluation]
After affixing an adhesive tape (trade name cellophane tape (registered trademark)) to the surface of the electrode member for touch panel of Example 1 and Example 2 produced above, a peeling test was performed to remove the adhesive tape. When the peeled adhesive tape was confirmed by visual observation, the metal derived from the metal layer was not adhered to the adhesive tape, and any of the touch panel electrode members of Examples 1 and 2 had the metal layer sufficiently adhered. It was confirmed that
Moreover, when the external appearance was visually observed about the touchscreen electrode of Example 1 and Example 2, there was no generation | occurrence | production of a partial haze and it had the outstanding external appearance.
On the other hand, when the external appearance of the electrode member for a touch panel of Comparative Example 1 was visually observed, haze was partially generated and the appearance was inferior.

DESCRIPTION OF SYMBOLS 1 ... Transparent insulation base material 2 ... Sensor electrode (metal layer)
2E ... Sensor electrode element 2C ... Electrode element connection part 3 ... Silicon oxide layer 4 ... Line part 4a ... Opening part 5 ... Lead-out line 6 ... Hard coat layer 7 ... Adhesion adjusting layer 8 ... Surface protective layer 9 ... Transparent adhesive layer 10 ... Article having image on surface 10a ... Image display surface 11 ... Front protective plate 101 ... Electrode member for touch panel 102 ... Electrode member for touch panel 103 ... Electrode member for touch panel 200 ... Touch panel 300 ... Image display article

Claims (4)

An electrode member for a touch panel provided with a sensor electrode made of a metal layer having a predetermined pattern shape on at least one surface of a transparent insulating substrate,
The electrode member for a touch panel, wherein the sensor electrode is formed on the transparent insulating substrate through a silicon oxide layer formed by a sol-gel method.   A silicon oxide layer is formed by applying and curing a sol-gel reaction coating liquid of alkoxysilane on a transparent insulating substrate, and a metal layer is formed on the silicon oxide layer by a dry process. A method for producing an electrode member for a touch panel, which is formed in a pattern.   A touch panel comprising the touch panel electrode member according to claim 1.   An image display article obtained by arranging the touch panel according to claim 3 on an image display surface of an article having an image on a surface.