JP2014189534A - Salt, resist composition and production method of resist pattern - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having an excellent mask error factor (MEF) can be produced, and to provide an acid generator to be incorporated into the resist composition.SOLUTION: A salt expressed by formula (I) is provided. In formula (I), Rand Reach independently represent an aliphatic hydrocarbon group having 1 to 12 carbon atoms which may have a substituent or Rand Rare bonded to form a ring having 5 to 20 carbon atoms together with a carbon atom bonded to the groups; Rand Reach independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Xrepresents a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, in which a hydrogen atom included in the saturated hydrocarbon group may be replaced by a fluorine atom, and -CH- included in the saturated hydrocarbon group may be replaced by -O- or -CO-; and Z1represents an organic cation.

Description

  The present invention relates to a salt for an acid generator used for microfabrication of a semiconductor, a resist composition, and a method for producing a resist pattern.

Patent Document 1 describes a salt represented by the following formula and a resist composition containing the salt as an acid generator.

JP 2010-248174 A

  Conventional resist compositions containing the above-described acid generators may not always satisfy the mask error factor (MEF) obtained.

［式（Ｉ）中、
Ｒ^１及びＲ^２は、それぞれ独立に、置換基を有してもよい炭素数１〜１２の脂肪族炭化水素基を表すか、Ｒ^１及びＲ^２が一緒になってこれらが結合する炭素原子と共に炭素数５〜２０の環を形成する。
Ｒ^３及びＲ^４は、それぞれ独立に、フッ素原子又は炭素数１〜６のペルフルオロアルキル基を表す。
Ｘ^１は、炭素数１〜１７の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子で置換されていてもよく、該飽和炭化水素基に含まれる−ＣＨ_２−は、−Ｏ−又は−ＣＯ−で置き換わっていてもよい。
Ｚ１^＋は、有機カチオンを表す。］
［２］ ［１］記載の塩を含有する酸発生剤。
［３］ ［２］記載の酸発生剤と樹脂とを含有するレジスト組成物。
［４］ 樹脂が、酸に不安定な基を有し、かつアルカリ水溶液に不溶又は難溶であり、酸の作用によりアルカリ水溶液で溶解し得る樹脂である［３］記載のレジスト組成物。
［５］ （１）［３］又は［４］記載のレジスト組成物を基板上に塗布する工程；
（２）塗布後の組成物を乾燥させて組成物層を形成する工程；
（３）組成物層に露光する工程；
（４）露光後の組成物層を加熱する工程；
（５）加熱後の組成物層を現像する工程；
を含むレジストパターンの製造方法。 The present invention includes the following inventions.
[1] A salt represented by the formula (I).

[In the formula (I),
R ¹ and R ² each independently represents an optionally substituted aliphatic hydrocarbon group having 1 to 12 carbon atoms, or a carbon atom to which R ¹ and R ² are bonded together And forms a ring having 5 to 20 carbon atoms.
R ³ and R ⁴ each independently represents a fluorine atom or a C 1-6 perfluoroalkyl group.
X ¹ represents a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, and is contained in the saturated hydrocarbon group —CH ₂ — may be replaced by —O— or —CO—.
Z1 ⁺ represents an organic cation. ]
[2] An acid generator containing the salt according to [1].
[3] A resist composition comprising the acid generator according to [2] and a resin.
[4] The resist composition according to [3], wherein the resin is a resin having an acid labile group, insoluble or hardly soluble in an alkaline aqueous solution, and soluble in an alkaline aqueous solution by the action of an acid.
[5] (1) A step of applying the resist composition according to [3] or [4] on a substrate;
(2) The process of drying the composition after application | coating and forming a composition layer;
(3) a step of exposing the composition layer;
(4) A step of heating the composition layer after exposure;
(5) A step of developing the composition layer after heating;
A method for producing a resist pattern including:

  According to the salt of the present invention, a resist pattern having a good mask error factor (MEF) can be produced from a resist composition containing the salt as an acid generator.

In the present specification, unless otherwise specified, in the description of the structural formula of a compound, “aliphatic hydrocarbon group” means a linear or branched hydrocarbon group, and “alicyclic hydrocarbon group” means A group obtained by removing a number of hydrogen atoms corresponding to the valence from the ring of an alicyclic hydrocarbon. The “aromatic hydrocarbon group” also includes a group in which a hydrocarbon group is bonded to an aromatic ring. When stereoisomers exist, all stereoisomers are included.
Further, "(meth) acrylic monomer" means at least one monomer having a structure of "CH ₂ = CH-CO-" or _{"CH 2 = C (CH 3)} -CO- ". Similarly, “(meth) acrylate” and “(meth) acrylic acid” mean “at least one of acrylate and methacrylate” and “at least one of acrylic acid and methacrylic acid”, respectively.

［式（Ｉ）中、
Ｒ^１及びＲ^２は、それぞれ独立に、置換基を有してもよい炭素数１〜１２の脂肪族炭化水素基を表すか、Ｒ^１及びＲ^２が一緒になってこれらが結合する炭素原子と共に炭素数５〜２０の環を形成する。
Ｒ^３及びＲ^４は、互いに独立に、フッ素原子又は炭素数１〜６のペルフルオロアルキル基を表す。
Ｘ^１は、炭素数１〜１７の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子で置換されていてもよく、該飽和炭化水素基に含まれる−ＣＨ_２−は、−Ｏ−又は−ＣＯ−で置き換わっていてもよい。
Ｚ１^＋は、有機カチオンを表す。］ <Salt (I)>
The salt of the present invention is a salt represented by the formula (I) (hereinafter sometimes referred to as “salt (I)”).

[In the formula (I),
R ¹ and R ² each independently represents an optionally substituted aliphatic hydrocarbon group having 1 to 12 carbon atoms, or a carbon atom to which R ¹ and R ² are bonded together And forms a ring having 5 to 20 carbon atoms.
R ³ and R ⁴ each independently represent a fluorine atom or a C 1-6 perfluoroalkyl group.
X ¹ represents a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, and is contained in the saturated hydrocarbon group —CH ₂ — may be replaced by —O— or —CO—.
Z1 ⁺ represents an organic cation. ]

  In the following description, the side having a negative charge in the salt (I) may be referred to as “anion (I)”.

Examples of the aliphatic hydrocarbon group having 1 to 12 carbon atoms represented by R ¹ and R ² include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, and a tert-butyl group. And alkyl groups such as a group, a pentyl group, a hexyl group, an octyl group and a 2-ethylhexyl group.
R ¹ and R ² may be different or the same. R ¹ and R ² are preferably the same.

Examples of the substituent that the aliphatic hydrocarbon group represented by R ¹ and R ² may have include a halogen atom such as a fluorine atom, a chlorine atom, or a bromine atom; a C ¹ -C 1 such as a methoxy group or an ethoxy group 10 alkoxy groups; a hydroxy group and the like.

The ring having 5 to 20 carbon atoms formed by R ¹ and R ² together includes a monocyclic alicyclic hydrocarbon ring such as cyclopentane ring, cyclohexane ring, cycloheptane ring, cyclooctane, etc .; norbornane Examples thereof include polycyclic alicyclic hydrocarbon rings such as a ring, adamantane ring, tricyclodecane, tetracyclodecane and isobornyl. A cyclohexane ring, a norbornane ring or an adamantane ring is preferred, and an adamantane ring is more preferred.
The ring may be bonded to a substituent that the aliphatic hydrocarbon group having 1 to 10 carbon atoms or the aliphatic hydrocarbon group represented by R ¹ and R ² may have. Examples of the aliphatic hydrocarbon group include the same groups as the aliphatic hydrocarbon groups representing R ¹ and R ² . When the aliphatic hydrocarbon group or the substituent is bonded to the ring, the ring has 5 to 20 carbon atoms including the aliphatic hydrocarbon group or the substituent.

As R ¹ and R ^2, it is preferable that R ¹ and R ² together form a ring having 5 to 20 carbon atoms together with the carbon atom to which they are bonded.

Examples of the C 1-6 perfluoroalkyl group represented by R ³ and R ⁴ include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluoro sec-butyl group, perfluoro tert. -A butyl group, a perfluoropentyl group, a perfluorohexyl group, etc. are mentioned.
R ³ and R ⁴ are each independently preferably a fluorine atom or a trifluoromethyl group, and more preferably a fluorine atom.
R ³ and R ⁴ may be different from each other, may be the same, and are preferably the same.

Examples of the divalent saturated hydrocarbon group represented by X ¹ include a linear alkanediyl group, a branched alkanediyl group, and a monocyclic or polycyclic divalent alicyclic saturated hydrocarbon group. A combination of two or more of these groups may be used. Methylene group, ethylene group, propane-1,3-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1,7-diyl group , Octane-1,8-diyl group, nonane-1,9-diyl group, decane-1,10-diyl group, undecane-1,11-diyl group, dodecane-1,12-diyl group, tridecane-1, Linear alkanediyl groups such as 13-diyl group, tetradecane-1,14-diyl group, pentadecane-1,15-diyl group, hexadecane-1,16-diyl group and heptadecane-1,17-diyl group;
Ethane-1,1-diyl group, propane-1,1-diyl group, propane-1,2-diyl group, propane-2,2-diyl group, 1-methylbutane-1,3-diyl group, 2-methyl Branched alkanediyl groups such as propane-1,3-diyl group, 2-methylpropane-1,2-diyl group, pentane-1,4-diyl group, 2-methylbutane-1,4-diyl group;
Monocyclic 2 which is a cycloalkanediyl group such as cyclobutane-1,3-diyl group, cyclopentane-1,3-diyl group, cyclohexane-1,4-diyl group, cyclooctane-1,5-diyl group Valent alicyclic saturated hydrocarbon group;
Polycyclic divalent alicyclic saturated hydrocarbon such as norbornane-1,4-diyl group, norbornane-2,5-diyl group, adamantane-1,5-diyl group, adamantane-2,6-diyl group, etc. Groups and the like.

The group in which —CH ₂ — contained in the divalent saturated hydrocarbon group of X ¹ is replaced by —O— or —CO— is represented by —CO— or any one of formulas (x1) to (x16). And the like. * Represents a bond with an oxygen atom.

式（ｘ１）〜式（ｘ１６）中、
Ｘ²は、炭素数１〜１５の２価の飽和炭化水素基を表す。
Ｘ³は、炭素数１〜１２の２価の飽和炭化水素基を表す。
Ｘ⁴は、単結合又は炭素数１〜１２の２価の飽和炭化水素基を表す。但しＸ³及びＸ⁴の合計炭素数の上限は１４である。
Ｘ^５及びＸ^６は、それぞれ独立に、単結合又は炭素数１〜１５の２価の飽和炭化水素基を表す。但しＸ⁵及びＸ⁶の合計炭素数の上限は１５である。
Ｘ^７は、炭素数１〜１６の２価の飽和炭化水素基を表す。
Ｘ^８は、単結合又は炭素数１〜１５の２価の飽和炭化水素基を表す。但しＸ^７及びＸ^８の合計炭素数の上限は１６である。
Ｘ⁹は、炭素数１〜１４の２価の飽和炭化水素基を表す。
Ｘ¹⁰は、炭素数１〜１４の２価の飽和炭化水素基を表す。但しＸ⁹及びＸ¹⁰の合計炭素数の上限は１５である。
Ｘ¹²は、単結合又は炭素数１〜１１の２価の飽和炭化水素基を表す。
Ｘ¹¹及びＸ¹³は、それぞれ独立に、炭素数１〜１２の２価の飽和炭化水素基を表す。但しＸ¹¹、Ｘ¹²及びＸ¹³の合計炭素数の上限は１４である。
Ｘ¹⁵は、単結合又は炭素数１〜１３の２価の飽和炭化水素基を表す。
Ｘ¹⁴及びＸ¹⁶は、それぞれ独立に、炭素数１〜１４の２価の飽和炭化水素基を表す。但しＸ¹⁴、Ｘ¹⁵及びＸ¹⁶の合計炭素数の上限は１５である。
Ｘ¹⁷及びＸ¹⁸は、それぞれ独立に、炭素数１〜１１の２価の飽和炭化水素基を表す。
Ｘ¹⁹は、単結合又は炭素数１〜１２の２価の飽和炭化水素基を表す。但しＸ¹⁷、Ｘ¹⁸及びＸ¹⁹の合計炭素数の上限は１４である。
Ｘ²⁰は、単結合又は炭素数１〜１４の２価の飽和炭化水素基を表す。
Ｘ²¹は、単結合又は炭素数１〜１２の２価の飽和炭化水素基を表す。
Ｘ²²は、単結合又は炭素数１〜１２の２価の飽和炭化水素基を表す。但しＸ²¹及びＸ²²の合計炭素数の上限は１３である。
Ｘ²³及びＸ²⁴は、それぞれ独立に、単結合又は炭素数１〜１４の２価の飽和炭化水素基を表す。但しＸ²³及びＸ²⁴の合計炭素数の上限は１４である。
Ｘ²⁵は、単結合又は炭素数１〜１５の２価の飽和炭化水素基を表す。
Ｘ²⁶は、単結合又は炭素数１〜１５の２価の飽和炭化水素基を表す。但しＸ²⁵及びＸ²⁶の合計炭素数の上限は１５である。
Ｘ²⁷は、単結合又は炭素数１〜１３の２価の飽和炭化水素基を表す。
Ｘ²⁸は、炭素数１〜１４の２価の飽和炭化水素基を表す。但しＸ²⁷及びＸ²⁸の合計炭素数の上限は１４である。
Ｘ²⁹及びＸ³⁰は、それぞれ独立に、単結合又は炭素数１〜１１の２価の飽和炭化水素基を表す。
Ｘ³¹は、炭素数１〜１２の２価の飽和炭化水素基を表す。但しＸ²⁹、Ｘ³⁰及びＸ³¹の合計炭素数の上限は１３である。
Ｘ³³は、単結合又は炭素数１〜１３の２価の飽和炭化水素基を表す。
Ｘ³²及びＸ³⁴は、それぞれ独立に、単結合又は炭素数１〜１４の２価の飽和炭化水素基を表す。但しＸ³²、Ｘ³³及びＸ³⁴の合計炭素数の上限は１４である。
Ｘ³⁵は、単結合又は炭素数１〜１１の２価の飽和炭化水素基を表す。
Ｘ³⁶は、炭素数１〜１２の２価の飽和炭化水素基を表す。
Ｘ³⁷は、単結合又は炭素数１〜１２の２価の飽和炭化水素基を表す。但しＸ³⁵、Ｘ³⁶及びＸ³⁷の合計炭素数の上限は１３である。

In formula (x1)-formula (x16),
X ² represents a divalent saturated hydrocarbon group having 1 to 15 carbon atoms.
X ³ represents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
X ⁴ represents a single bond or a divalent saturated hydrocarbon group having 1 to 12 carbon atoms. However, the upper limit of the total carbon number of X ³ and X ⁴ is 14.
X ⁵ and X ⁶ each independently represent a single bond or a divalent saturated hydrocarbon group having 1 to 15 carbon atoms. However, the upper limit of the total carbon number of X ⁵ and X ⁶ is 15.
X ⁷ represents a divalent saturated hydrocarbon group having 1 to 16 carbon atoms.
X ⁸ represents a single bond or a divalent saturated hydrocarbon group having 1 to 15 carbon atoms. However, the upper limit of the total carbon number of X ⁷ and X ⁸ is 16.
X ⁹ represents a divalent saturated hydrocarbon group having 1 to 14 carbon atoms.
X ¹⁰ represents a divalent saturated hydrocarbon group having 1 to 14 carbon atoms. However, the upper limit of the total carbon number of X ⁹ and X ¹⁰ is 15.
X ¹² represents a single bond or a divalent saturated hydrocarbon group having 1 to 11 carbon atoms.
X ¹¹ and X ¹³ each independently represent a divalent saturated hydrocarbon group having 1 to 12 carbon atoms. However, the upper limit of the total carbon number of X ¹¹ , X ¹² and X ¹³ is 14.
X ¹⁵ represents a single bond or a divalent saturated hydrocarbon group having 1 to 13 carbon atoms.
X ¹⁴ and X ¹⁶ each independently represent a divalent saturated hydrocarbon group having 1 to 14 carbon atoms. However, the upper limit of the total carbon number of X ¹⁴ , X ¹⁵ and X ¹⁶ is 15.
X ¹⁷ and X ¹⁸ each independently represent a divalent saturated hydrocarbon group having 1 to 11 carbon atoms.
X ¹⁹ represents a single bond or a divalent saturated hydrocarbon group having 1 to 12 carbon atoms. However, the upper limit of the total carbon number of X ¹⁷ , X ¹⁸ and X ¹⁹ is 14.
X ²⁰ represents a single bond or a divalent saturated hydrocarbon group having 1 to 14 carbon atoms.
X ²¹ represents a single bond or a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
X ²² represents a single bond or a divalent saturated hydrocarbon group having 1 to 12 carbon atoms. However, the upper limit of the total carbon number of X ²¹ and X ²² is 13.
X ²³ and X ²⁴ each independently represent a single bond or a divalent saturated hydrocarbon group having 1 to 14 carbon atoms. However, the upper limit of the total carbon number of X ²³ and X ²⁴ is 14.
X ²⁵ represents a single bond or a divalent saturated hydrocarbon group having 1 to 15 carbon atoms.
X ²⁶ represents a single bond or a divalent saturated hydrocarbon group having 1 to 15 carbon atoms. However, the upper limit of the total carbon number of X ²⁵ and X ²⁶ is 15.
X ²⁷ represents a single bond or a divalent saturated hydrocarbon group having a carbon number of 1 to 13.
X ²⁸ represents a divalent saturated hydrocarbon group having 1 to 14 carbon atoms. However the upper limit of the total number of carbon atoms of X ²⁷ and X ²⁸ is 14.
X ²⁹ and X ³⁰ each independently represent a single bond or a divalent saturated hydrocarbon group having 1 to 11 carbon atoms.
X ³¹ represents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms. However, the upper limit of the total carbon number of X ²⁹ , X ³⁰ and X ³¹ is 13.
X ³³ represents a single bond or a divalent saturated hydrocarbon group having 1 to 13 carbon atoms.
X ³² and X ³⁴ each independently represent a single bond or a divalent saturated hydrocarbon group having 1 to 14 carbon atoms. However, the upper limit of the total carbon number of X ³² , X ³³ and X ³⁴ is 14.
X ³⁵ represents a single bond or a divalent saturated hydrocarbon group having 1 to 11 carbon atoms.
X ³⁶ represents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
X ³⁷ represents a single bond or a divalent saturated hydrocarbon group having 1 to 12 carbon atoms. However, the upper limit of the total carbon number of X ³⁵ , X ³⁶ and X ³⁷ is 13.

Examples of the group represented by the formula (x1) include the following.

Examples of the group represented by the formula (x2) include the following.

Examples of the group represented by the formula (x3) include the following.

Examples of the group represented by the formula (x4) include the following.

Examples of the group represented by the formula (x5) include the following.

Examples of the group represented by the formula (x6) include the following.

Examples of the group represented by the formula (x7) include the following.

Examples of the group represented by the formula (x8) include the following.

Examples of the group represented by the formula (x9) include the following.

Examples of the group represented by the formula (x10) include the following.

Examples of the group represented by the formula (x11) include the following.

Examples of the group represented by the formula (x12) include the following.

Examples of the group represented by the formula (x13) include the following.

Examples of the group represented by the formula (x14) include the following.

Examples of the group represented by the formula (x15) include the following.

Examples of the group represented by the formula (x16) include the following.

Furthermore, -CH ₂ contained in the divalent saturated hydrocarbon group of ^{X 1} - group is replaced by -O- or -CO-, and a hydrogen atom contained in the divalent saturated hydrocarbon group of X ¹ Examples of the group substituted with a fluorine atom include the following.

X ¹ is preferably —CO—, an alkanediyl group having 1 to 17 carbon atoms, a group represented by any one of formulas (x1) to (x4) and (x8), and more preferably A single bond, -CO-, an alkanediyl group having 1 to 17 carbon atoms, a group represented by formula (x1), formula (x3) or formula (x8), more preferably a single bond, -CO-, Or it is a C1-C17 alkanediyl group, Especially preferably, it is -CO-.

Examples of the organic cation (Z1 ⁺ ) contained in the salt (I) include organic onium cations such as organic sulfonium cation, organic iodonium cation, organic ammonium cation, benzothiazolium cation, and organic phosphonium cation, and preferably organic sulfonium. It is a cation or an organic iodonium cation, and more preferably a cation represented by any one of formulas (b2-1) to (b2-4).

In formula (b2-1) to formula (b2-4),
R ^{b4 to} R ^b6 each independently represents an alkyl group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or an aromatic hydrocarbon group having 6 to 36 carbon atoms, or R ^b4 And R ^b5 together form a ring containing a sulfur atom. The hydrogen atom contained in the alkyl group is substituted with a hydroxy group, an alkoxy group having 1 to 12 carbon atoms, an alicyclic saturated hydrocarbon group having 3 to 12 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms. The hydrogen atom contained in the alicyclic hydrocarbon group may be substituted with a halogen atom, an acyl group having 2 to 4 carbon atoms, or a glycidyloxy group, and is contained in the aromatic hydrocarbon group. The hydrogen atom to be substituted may be substituted with a halogen atom, a hydroxy group or an alkoxy group having 1 to 12 carbon atoms.
R ^b7 and R ^b8 each independently represent a hydroxy group, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
m2 and n2 each independently represent an integer of 0 to 5. When m2 is 2 or more, the plurality of R ^b7 are the same or different from each other, and when n2 is 2 or more, the plurality of R ^b8 are the same or different from each other.
R ^b9 and R ^b10 each independently represent an alkyl group having 1 to 18 carbon atoms or an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or R ^b9 and R ^b10 are A 3-membered to 12-membered ring (preferably a 3-membered to 7-membered ring) is formed together with the sulfur atom to be bonded. —CH ₂ — constituting the ring may be replaced with an oxygen atom, —SO— or a carbonyl group.
R ^b11 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms.
R ^b12 represents an alkyl group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms. The hydrogen atom contained in the alkyl group may be substituted with an aromatic hydrocarbon group having 6 to 18 carbon atoms, and the hydrogen atom contained in the aromatic hydrocarbon group is an alkoxy group having 1 to 12 carbon atoms. Alternatively, it may be substituted with an alkylcarbonyloxy group having 1 to 12 carbon atoms.
R ^b11 and R ^b12 may form a 3- to 12-membered ring (preferably a 3- to 7-membered ring) together with —CH—CO— to which they are bonded. —CH ₂ — constituting the ring may be replaced with an oxygen atom, —SO— or a carbonyl group.
R ^{b13 to} R ^b18 each independently represent a hydroxy group, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
L ^b11 represents a sulfur atom or an oxygen atom.
o2, p2, s2, and t2 each independently represents an integer of 0 to 5.
q2 and r2 each independently represents an integer of 0 to 4.
u2 represents 0 or 1.
When o2 is 2 or more, multiple R ^b13 are the same or different, when p2 is 2 or more, multiple R ^b14 are the same or different, and when q2 is 2 or more, multiple R ^b15 are the same or different , When r2 is 2 or more, a plurality of R ^b16 are the same or different, when s2 is 2 or more, a plurality of R ^b17 are the same or different, and when t2 is 2 or more, a plurality of R ^b18 are the same or different Different.

R ^b4 and R ^b5 may together form a 3- to 12-membered ring (preferably a 3- to 7-membered ring) with the sulfur atom to which they are bonded.

特に、Ｒ^b9〜Ｒ^b12の脂環式炭化水素基は、好ましくは炭素数４〜１２である。 Examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, octyl group and 2-ethylhexyl group. . In particular, the alkyl group of R ^{b9 to} R ^b12 preferably has 1 to 12 carbon atoms.
Examples of the alkyl group in which a hydrogen atom is substituted with an alicyclic hydrocarbon group include a 1- (adamantan-1-yl) alkane-1-yl group.
The alicyclic hydrocarbon group may be monocyclic or polycyclic, and the hydrogen atom contained in the alicyclic hydrocarbon group may be substituted with an alkyl group. In this case, the carbon number of the alicyclic hydrocarbon group is 20 or less including the carbon number of the alkyl group. Examples of the monocyclic alicyclic hydrocarbon group include cycloalkyl groups such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, and a cyclodecyl group. Examples of the polycyclic alicyclic hydrocarbon group include decahydronaphthyl group, adamantyl group, norbornyl group, and the following groups.

In particular, the alicyclic hydrocarbon group of R ^{b9 to} R ^b12 preferably has 4 to 12 carbon atoms.

  Examples of the alicyclic hydrocarbon group in which a hydrogen atom is substituted with an alkyl group include a methylcyclohexyl group, a dimethylcyclohexyl group, a 2-alkyladamantan-2-yl group, a methylnorbornyl group, and an isobornyl group. .

As the aromatic hydrocarbon group, phenyl group, tolyl group, xylyl group, cumenyl group, mesityl group, 4-ethylphenyl group, 4-tert-butylphenyl group, 4-cyclohexylphenyl group, 4-adamantylphenyl group And substituted or unsubstituted phenyl groups such as 2,6-diethylphenyl group and 2-methyl-6-ethylphenyl group; biphenylyl group, naphthyl group, phenanthryl group and the like.
Examples of the aromatic hydrocarbon group in which a hydrogen atom is substituted with an alkoxy group include a 4-methoxyphenyl group.
Examples of the alkyl group in which a hydrogen atom is substituted with an aromatic hydrocarbon group, that is, an aralkyl group, include a benzyl group, a phenethyl group, a phenylpropyl group, a trityl group, a naphthylmethyl group, and a naphthylethyl group.
In addition, when an alkyl group or an alicyclic hydrocarbon group is contained in an aromatic hydrocarbon group, a C1-C12 alkyl group and a C3-C18 alicyclic hydrocarbon group are preferable.

Examples of the alkoxy group include methoxy group, ethoxy group, propoxy group, butoxy group, pentyloxy group, hexyloxy group, heptyloxy group, octyloxy group, decyloxy group and dodecyloxy group.
Examples of the acyl group include an acetyl group, a propionyl group, and a butyryl group.
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
Examples of the alkylcarbonyloxy group include a methylcarbonyloxy group, an ethylcarbonyloxy group, an n-propylcarbonyloxy group, an isopropylcarbonyloxy group, an n-butylcarbonyloxy group, a sec-butylcarbonyloxy group, a tert-butylcarbonyloxy group, Examples thereof include a pentylcarbonyloxy group, a hexylcarbonyloxy group, an octylcarbonyloxy group, and a 2-ethylhexylcarbonyloxy group.

The ring containing a sulfur atom which may be formed by combining R ^b4 and R ^b5 is any of monocyclic, polycyclic, aromatic, non-aromatic, saturated and unsaturated rings. If it contains one or more sulfur atoms, it may further contain one or more sulfur atoms and / or one or more oxygen atoms. As the ring, a ring having 3 to 18 carbon atoms is preferable, and a ring having 4 to 18 carbon atoms is more preferable.

Examples of the ring formed together with the sulfur atom to which R ^b9 and R ^b10 are bonded include a thiolane-1-ium ring (tetrahydrothiophenium ring), a thian-1-ium ring, and a 1,4-oxathian-4-ium ring. Is mentioned.
^{Examples of} the ring formed with —CH—CO— in which R ^b11 and R ^b12 are bonded include an oxocycloheptane ring, an oxocyclohexane ring, an oxonorbornane ring, and an oxoadamantane ring.

Among the cation (b2-1) to cation (b2-4), the cation (b2-1) is preferable, more preferably a cation represented by the formula (b2-1-1) (hereinafter referred to as “cation ( more preferably triphenylsulfonium cation (in formula (b2-1-1), v2 = w2 = x2 = 0), diphenyltolylsulfonium cation (formula ( b2-1-1), v2 = w2 = 0, x2 = 1, R ^b21 is a methyl group) or a tolylsulfonium cation (in formula (b2-1-1), v2 = w2 = x2 = 1 and R ^b19 , R ^b20 and R ^b21 are all methyl groups).

式（ｂ２−１−１）中、
Ｒ^b19、Ｒ^b20及びＲ^b21は、それぞれ独立に、ハロゲン原子（より好ましくはフッ素原子）、ヒドロキシ基、炭素数１〜１２のアルキル基、炭素数１〜１２のアルコキシ基又は炭素数３〜１８の脂環式炭化水素基を表す。また、Ｒ^b19〜Ｒ^b21から選ばれる２つが一緒になって硫黄原子を含む環を形成してもよい。
ｖ２、ｗ２及びｘ２は、それぞれ独立に０〜５の整数（好ましくは０又は１）を表す。
ｖ２が２以上のとき、複数のＲ^b19は互いに同一又は相異なり、ｗ２が２以上のとき、複数のＲ^b20は互いに同一又は相異なり、ｘ２が２以上のとき、複数のＲ^b21は互いに同一又は相異なる。

In formula (b2-1-1),
R ^b19 , R ^b20 and R ^b21 each independently represent a halogen atom (more preferably a fluorine atom), a hydroxy group, an alkyl group having 1 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, or 3 to 18 carbon atoms. Represents an alicyclic hydrocarbon group. It is also possible that two selected from R ^b19 to R ^b21 together form a ring containing a sulfur atom.
v2, w2 and x2 each independently represent an integer of 0 to 5 (preferably 0 or 1).
When v2 is 2 or more, the plurality of R ^b19 are the same or different from each other. When w2 is 2 or more, the plurality of R ^b20 are the same or different from each other. When x2 is 2 or more, the plurality of R ^b21 are the same. Or different.

Among them, R ^b19 , R ^b20 and R ^b21 are preferably each independently a halogen atom (more preferably a fluorine atom), a hydroxy group, an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms. It is.

Examples of the cation represented by the formula (b2-1-1) include cations described in JP2010-204646A.

Among these, preferred salts (I) include the following.

上式中、全ての符号は前記と同義である。
この反応の第１段階は、式（Ｉ−１ａ−Ａ）で表される化合物と、式（Ｉ−１ａ−Ｂ）で表される化合物とを酸触媒条件下で反応させることにより式（Ｉ−１ａ−Ｃ）で表される化合物を製造する。
式（Ｉ−１ａ−Ａ）で表される化合物および式（Ｉ−１ａ−Ｂ）で表される化合物は、市販のものを用いてもよい。
次いで、第２段階では、式（Ｉ−１ａ−Ｃ）で表される化合物と、式（Ｉ−１ａ−Ｄ）で表される化合物とを反応させることにより塩（Ｉ−１ａ）は製造できる。この第２段階の反応は、１−エチル−３−（３−ジメチルアミノプロピル）カルボジイミド塩酸塩、ジシクロヘキシルカルボジイミド又は１，１’−カルボニルジイミダゾールの存在下、有機溶媒中で実施できる。該有機溶媒としてはクロロホルム、ジクロロメタン、ジクロロエタン、ジメチルホルムアミド及びアセトニトリルなどが挙げられる。
式（Ｉ−１ａ−Ｃ）で表される化合物は、特開２００８−１２７３６７号公報に記載された方法により製造することができる。 A method for producing the salt (I) will be described. Among salts (I), for example, salt (I) represented by formula (I-1a) [salt (I) in which X ^{2 in} formula (I) is carbonyl, hereinafter “salt (I-1a)” " Is prepared by preparing a compound having a hydroxy group [compound represented by formula (1-1a-C)], a compound having this compound, a sulfonic acid group, and a carboxy group [formula (1- And a compound represented by 1a-D)]. An example of such a production method is shown below in the form of a reaction formula.

In the above formula, all symbols are as defined above.
The first stage of this reaction comprises reacting a compound represented by formula (I-1a-A) with a compound represented by formula (I-1a-B) under acid catalyst conditions. 1a-C) is produced.
Commercially available compounds may be used as the compound represented by the formula (I-1a-A) and the compound represented by the formula (I-1a-B).
Next, in the second step, the salt (I-1a) can be produced by reacting the compound represented by the formula (I-1a-C) with the compound represented by the formula (I-1a-D). . This second stage reaction can be carried out in an organic solvent in the presence of 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride, dicyclohexylcarbodiimide or 1,1′-carbonyldiimidazole. Examples of the organic solvent include chloroform, dichloromethane, dichloroethane, dimethylformamide, and acetonitrile.
The compound represented by the formula (I-1a-C) can be produced by the method described in JP 2008-127367 A.

<Acid generator>
The acid generator of the present invention contains salt (I) which is a salt of the present invention. The acid generator of the present invention may further contain an acid generator other than the salt (I) (hereinafter sometimes referred to as “acid generator (B)”).
As the acid generator (B), a known acid generator can be used, and an ionic acid generator or a nonionic generator may be used, but an ionic acid generator is preferable. Examples of the ionic acid generator include an ionic acid generator composed of an anion other than the anion (I) constituting the salt (I) and an organic cation.

Examples of the acid generator (B) include salts represented by any of the formulas (B1-1) to (B1-24). Among them, those containing a triarylsulfonium cation are preferable. Formula (B1-1), Formula (B1-2), Formula (B1-3), Formula (B1-6), Formula (B1-7), Formula (B1- 11), formula (B1-12), formula (B1-13), formula (B1-14), formula (B1-21), formula (B1-22), formula (B1-23) and formula (B1-24) ) Is more preferable.

  In the acid generator of the present invention, the content of the salt (I) is preferably 10% by mass or more, more preferably 30% by mass or more, and further preferably 50% by mass with respect to the total amount of the acid generator of the present invention. It is above and is 100 weight or less. .

<Resist composition>
The resist composition of the present invention contains the acid generator of the present invention and a resin having an acid labile group (hereinafter sometimes referred to as “resin (A)”).
The resist composition of the present invention preferably further contains a solvent (D).
The resist composition of the present invention preferably further contains a basic compound (C).

<Acid generator>
The content of the acid generator of the present invention is preferably 1 part by mass or more (more preferably 3 parts by mass or more), preferably 30 parts by mass or less (more preferably 25 parts by mass) with respect to 100 parts by mass of the resin (A). Part or less).

<Resin (A)>
The resin (A) has a structural unit having an acid labile group (hereinafter sometimes referred to as “structural unit (a1)”). The structural unit (a1) is derived from a monomer having an acid labile group (hereinafter sometimes referred to as “monomer (a1)”).
The resin (A) may further have a structural unit having no acid labile group (hereinafter sometimes referred to as “structural unit (s)”).

［式（１）中、Ｒ^a1〜Ｒ^a3は、それぞれ独立に、炭素数１〜８のアルキル基、炭素数３〜２０の脂環式炭化水素基又はこれらを組合わせた基を表すか、Ｒ^a1及びＲ^a2は互いに結合して炭素数２〜２０の２価の炭化水素基を形成する。＊は結合手を表す。］

［式（２）中、Ｒ^a1'及びＲ^a2'は、それぞれ独立に、水素原子又は炭素数１〜１２の１価の炭化水素基を表し、Ｒ^a3'は、炭素数１〜２０の炭化水素基を表すか、Ｒ^a2'及びＲ^a3'は互いに結合して炭素数２〜２０の２価の炭化水素基を形成し、該１価の炭化水素基及び該２価の炭化水素基に含まれる−ＣＨ_２−は、−Ｏ−又は−Ｓ−で置き換わってもよい。］ <Acid labile group>
The “acid labile group” means a group having a leaving group and forming a hydrophilic group (for example, a hydroxy group or a carboxy group) by leaving the leaving group by contact with an acid. Examples of the acid labile group include a group represented by the formula (1) or a group represented by the formula (2).

[In Formula (1), R ^<a1 > -R < ^a3 > respectively independently represents a C1-C8 alkyl group, a C3-C20 alicyclic hydrocarbon group, or the group which combined these, R ^a1 and R ^a2 are bonded to each other to form a divalent hydrocarbon group having 2 to 20 carbon atoms. * Represents a bond. ]

[In Formula (2), R ^{a1 ′} and R ^{a2 ′} each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 12 carbon atoms, and R ^{a3 ′} represents a carbon atom having 1 to 20 carbon atoms. R ^{a2 ′} and R ^{a3 ′} are bonded to each other to form a divalent hydrocarbon group having 2 to 20 carbon atoms, and the monovalent hydrocarbon group and the divalent hydrocarbon group The —CH ₂ — contained may be replaced by —O— or —S—. ]

アルキル基と脂環式炭化水素基とを組合わせた基としては、メチルシクロヘキシル基、ジメチルシクロへキシル基、メチルノルボルニル基等が挙げられ、好ましくは炭素数２０以下である。 ^Examples of the alkyl group represented by R ^{a1 to} R ^a3 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group.
The alicyclic hydrocarbon group for R ^{a1 to} R ^a3 may be monocyclic or polycyclic. Examples of the monocyclic alicyclic hydrocarbon group include cycloalkyl groups such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Examples of the polycyclic alicyclic hydrocarbon group include decahydronaphthyl group, adamantyl group, norbornyl group, and the following groups (* represents a bond). The alicyclic hydrocarbon group preferably has 3 to 16 carbon atoms.

Examples of the group in which an alkyl group and an alicyclic hydrocarbon group are combined include a methylcyclohexyl group, a dimethylcyclohexyl group, and a methylnorbornyl group, and preferably have 20 or less carbon atoms.

Examples of —C (R ^a1 ) (R ^a2 ) (R ^a3 ) in the case where R ^a1 and R ^a2 are bonded to each other to form a divalent hydrocarbon group include the following groups. The divalent hydrocarbon group preferably has 3 to 12 carbon atoms. * Represents a bond with -O-.

Examples of the group represented by the formula (1) include a 1,1-dialkylalkoxycarbonyl group (in the formula (1), R ^{a1 to} R ^a3 are alkyl groups, preferably a tert-butoxycarbonyl group), 2-alkyladamantan-2-yloxycarbonyl group (in the formula (1), R ^a1 , R ^a2 and a carbon atom form an adamantyl group, and R ^a3 is an alkyl group) and 1- (adamantane-1- Yl) -1-alkylalkoxycarbonyl group (in the formula (1), R ^a1 and R ^a2 are alkyl groups, and R ^a3 is an adamantyl group).

Examples of the hydrocarbon group of R ^{a1 ′ to} R ^{a3 ′} include an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and the like.
Examples of the aliphatic hydrocarbon group include alkyl groups such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group.
Examples of the alicyclic hydrocarbon group are the same as those described above.
Aromatic hydrocarbon groups include phenyl, naphthyl, anthryl, p-methylphenyl, p-tert-butylphenyl, p-adamantylphenyl, tolyl, xylyl, cumenyl, mesityl, biphenyl Groups, phenanthryl groups, 2,6-diethylphenyl groups, aryl groups such as 2-methyl-6-ethylphenyl, and the like.
When R ^{a2 ′} and R ^{a3 ′} are bonded to each other to form a divalent hydrocarbon group, * —C (R ^{a1 ′} ) (R ^{a2 ′} ) (OR ^{a3 ′} ) is the following group (in the formula: , * Represents a bond.). The divalent hydrocarbon group preferably has 3 to 12 carbon atoms.

In Formula (2), it is preferable that at least one of R ^{a1 ′} and R ^{a2 ′} is a hydrogen atom.
Specific examples of the group represented by the formula (2) include the following groups. * Represents a bond.

<Structural unit (a1)>
The monomer (a1) leading to the structural unit (a1) is preferably a monomer having an acid labile group and an ethylenically unsaturated bond, and more preferably a (meth) acrylic monomer having an acid labile group.

  Among the (meth) acrylic monomers having an acid labile group, those having an alicyclic hydrocarbon group having 5 to 20 carbon atoms are preferable. If the resin (A) having a structural unit derived from the monomer (a1) having a bulky structure such as an alicyclic hydrocarbon group is used in the resist composition, the resolution of the resist pattern can be improved.

  As the structural unit (a1) having a group represented by the formula (1), a structural unit represented by the formula (a1-1) to the formula (a1-3) (hereinafter, “structural unit (a1-1)” or the like) In some cases).

［式（ａ１−１）中、
Ｌ^a1は、酸素原子又は^＊−Ｏ−（ＣＨ₂）_h1−ＣＯ−Ｏ−を表し、ｈ１は１〜７の整数を表し、＊はカルボニル基との結合手を表す。
Ｒ^a4は、水素原子又はメチル基を表す。
Ｒ^a6は、炭素数１〜８のアルキル基、炭素数３〜１８の脂環式炭化水素基又はこれらを組合わせた基を表す。
ｍ１は、０〜１４の整数を表す。］

[In the formula (a1-1),
L ^a1 represents an oxygen atom or ^* —O— (CH ₂ ) _h1 —CO—O—, h1 represents an integer of 1 to 7, and * represents a bond to a carbonyl group.
R ^a4 represents a hydrogen atom or a methyl group.
R ^a6 represents an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a group obtained by combining these.
m1 represents the integer of 0-14. ]

アルキル基と脂環式炭化水素基とを組合わせた基としては、メチルシクロヘキシル基、ジメチルシクロへキシル基、メチルノルボルニル基等が挙げられる。 h1 is preferably an integer of 1 to 4, more preferably 1.
L ^a1 is preferably an oxygen atom.
R ^a4 is preferably a methyl group.
^Examples of the alkyl group for R ^a6 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group. The alkyl group preferably has 6 or less carbon atoms.
The alicyclic hydrocarbon group for R ^a6 may be monocyclic or polycyclic. Examples of the monocyclic alicyclic hydrocarbon group include cycloalkyl groups such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. Examples of the polycyclic alicyclic hydrocarbon group include decahydronaphthyl group, adamantyl group, norbornyl group, and the following groups (* represents a bond). The alicyclic hydrocarbon group preferably has 3 to 16 carbon atoms, more preferably 3 to 8 carbon atoms, and still more preferably 3 to 6 carbon atoms.

Examples of the group in which an alkyl group and an alicyclic hydrocarbon group are combined include a methylcyclohexyl group, a dimethylcyclohexyl group, and a methylnorbornyl group.

  m1 is preferably an integer of 0 to 3, more preferably 0 or 1.

As a monomer (a1-1), the monomer described in Unexamined-Japanese-Patent No. 2010-204646 is mentioned. Among these, a monomer represented by any one of formula (a1-1-1) to formula (a1-1-8) is preferable, and any one of formula (a1-1-1) to formula (a1-1-4) is preferable. The monomer represented by is more preferable.

  When the resin (A) includes the structural unit (a1-1), the content is preferably 20 to 70 mol%, more preferably 25 to 65, based on all the structural units of the resin (A). Mol%.

［式（ａ１−２）中、
Ｌ^a2は、酸素原子又は^＊−Ｏ−（ＣＨ₂）_h2−ＣＯ−Ｏ−を表し、ｈ２は１〜７の整数を表し、＊はカルボニル基との結合手を表す。
Ｒ^a5は、水素原子又はメチル基を表す。
Ｒ^a7は、炭素数１〜８のアルキル基、炭素数３〜１８の脂環式炭化水素基又はこれらを組合わせた基を表す。
ｎ１は、０〜１０の整数を表す。
ｎ１’は、０〜３の整数を表す。］

[In the formula (a1-2),
L ^a2 represents an oxygen atom or ^* —O— (CH ₂ ) _h2 —CO—O—, h2 represents an integer of 1 to 7, and * represents a bond with a carbonyl group.
R ^a5 represents a hydrogen atom or a methyl group.
R ^a7 represents an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a group obtained by combining these.
n1 represents the integer of 0-10.
n1 ′ represents an integer of 0 to 3. ]

h2 is preferably an integer of 1 to 4, more preferably 1.
L ^a2 is preferably an oxygen atom.
R ^a5 is preferably a methyl group.
Examples of the alkyl group for R ^a7 , the alicyclic hydrocarbon group, and a group obtained by combining these include the same groups as those ^exemplified for R ^a6 .
The alkyl group for R ^a7 preferably has 6 or less carbon atoms.
The alicyclic hydrocarbon group for R ^a7 preferably has 8 or less carbon atoms, more preferably 6 or less.
n1 is preferably an integer of 0 to 3, more preferably 0 or 1.
n1 ′ is preferably 0 or 1.

As the monomer (a1-2), 1-ethylcyclopentan-1-yl (meth) acrylate, 1-ethylcyclohexane-1-yl (meth) acrylate, 1-ethylcycloheptan-1-yl (meth) acrylate, 1-methylcyclopentan-1-yl (meth) acrylate, 1-methylcyclohexane-1-yl (meth) acrylate, 1-isopropylcyclopentan-1-yl (meth) acrylate, 1-isopropylcyclohexane-1-yl ( And (meth) acrylate, 1-isopropylcycloheptan-1-yl (meth) acrylate, and the like. A monomer represented by any one of formula (a1-2-1) to formula (a1-2-12) is preferred, and formula (a1-2-3) to formula (a1-2-4) or formula (a1- The monomer represented by any one of 2-9) to formula (a1-2-10) is more preferred, and the monomer represented by formula (a1-2-3) or formula (a1-2-9) is more preferred. .

  When the resin (A) includes the structural unit (a1-2), the content is preferably 3 to 35 mol%, more preferably 5 to 30% with respect to all the structural units of the resin (A). Mol%.

式（ａ１−３）中、
Ｒ^a13は、ヒドロキシ基を有していてもよい炭素数１〜３の脂肪族炭化水素基、カルボキシ基、シアノ基、水素原子又は−ＣＯＯＲ^aeを表す。
Ｒ^aeは、炭素数１〜８の脂肪族炭化水素基、炭素数３〜２０の脂環式炭化水素基、又はこれらを組み合わせた基を表し、該脂肪族炭化水素基及び該脂環式炭化水素基に含まれる水素原子は、ヒドロキシ基で置換されていてもよく、該脂肪族炭化水素基及び該脂環式炭化水素基に含まれる−ＣＨ_２−は、酸素原子又はカルボニル基で置き換わっていてもよい。
Ｒ^a10、Ｒ^a11及びＲ^a12は、それぞれ独立に、炭素数１〜８のアルキル基、炭素数３〜２０の脂環式炭化水素基又はこれらを組合わせた基を表すか、Ｒ^a10及びＲ^a11は互いに結合して炭素数２〜２０の２価の炭化水素基を形成する。

In formula (a1-3),
R ^a13 represents an aliphatic hydrocarbon group having 1 to 3 carbon atoms which may have a hydroxy group, a carboxy group, a cyano group, a hydrogen atom, or —COOR ^ae .
R ^ae represents an aliphatic hydrocarbon group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, or a combination thereof, and the aliphatic hydrocarbon group and the alicyclic carbon group. A hydrogen atom contained in the hydrogen group may be substituted with a hydroxy group, and —CH ₂ — contained in the aliphatic hydrocarbon group and the alicyclic hydrocarbon group is replaced with an oxygen atom or a carbonyl group. May be.
R ^a10, R ^a11 and R ^a12 are each independently an alkyl group having 1 to 8 carbon atoms, or an alicyclic hydrocarbon group or a group obtained by combining these C3-20, R ^a10 and R ^a11 are bonded to each other to form a divalent hydrocarbon group having 2 to 20 carbon atoms.

Here, -COOR ^ae of R ^a13 includes a group in which a carbonyl group is bonded to an alkoxy group such as a methoxycarbonyl group and an ethoxycarbonyl group.

^Examples of the aliphatic hydrocarbon group which may have a hydroxyl group for R ^a13 include a methyl group, an ethyl group, a propyl group, a hydroxymethyl group and a 2-hydroxyethyl group.
Examples of the group consisting of an aliphatic hydrocarbon group of R ^ae , an alicyclic hydrocarbon group, and an aliphatic hydrocarbon group having 1 to 8 carbon atoms and an alicyclic hydrocarbon group having 3 to 20 carbon atoms include a methyl group, Ethyl group, propyl group, cyclopentyl group, cyclopropyl group, adamantyl group, adamantylmethyl group, 1-adamantyl-1-methylethyl group, 2-oxo-oxolan-3-yl group and 2-oxo-oxolan-4-yl Groups and the like.
^{Examples of} R ^{a10 to} R ^a12 include the same groups as R ^{a1 to} R ^a3 in formula (1).
As —C (R ^a10 ) (R ^a11 ) (R ^a12 ) when R ^a10 and R ^a11 are bonded to each other to form a divalent hydrocarbon group, the following groups are preferred.

  Monomer (a1-3) includes 5-norbornene-2-carboxylic acid-tert-butyl, 5-norbornene-2-carboxylic acid 1-cyclohexyl-1-methylethyl, 5-norbornene-2-carboxylic acid 1-methylcyclohexyl 2-methyl-2-adamantyl 5-norbornene-2-carboxylate, 2-ethyl-2-adamantyl 5-norbornene-2-carboxylate, 1- (4-methylcyclohexyl) -norbornene-2-carboxylic acid 1-methylethyl, 5-norbornene-2-carboxylic acid 1- (4-hydroxycyclohexyl) -1-methylethyl, 5-norbornene-2-carboxylic acid 1-methyl-1- (4-oxocyclohexyl) ethyl and 5 -Norbornene-2-carboxylic acid 1- (1-adamantyl) -1-methylethyl It is.

  Since the resin (A) containing the structural unit (a1-3) includes a sterically bulky structural unit, the resist composition of the present invention containing such a resin (A) is more expensive. A resist pattern can be obtained with resolution. Further, since a rigid norbornane ring is introduced into the main chain, the resulting resist pattern tends to be excellent in dry etching resistance.

  When the resin (A) contains the structural unit (a1-3), the content thereof is preferably 10 to 95 mol%, more preferably 15 to 90 mol%, based on all the structural units of the resin (A). 20-85 mol% is more preferable.

［式（ａ１−４）中、
Ｒ^a32は、水素原子、ハロゲン原子、又は、ハロゲン原子を有してもよい炭素数１〜６のアルキル基を表す。
Ｒ^a33は、ハロゲン原子、ヒドロキシ基、炭素数１〜６のアルキル基、炭素数１〜６のアルコキシ基、炭素数２〜４のアシル基、炭素数２〜４のアシルオキシ基、アクリロイルオキシ基又はメタクリロイルオキシ基を表す。
ｌａは０〜４の整数を表す。ｌａが２以上である場合、複数のＲ^a33は互いに同一であっても異なってもよい。
Ｒ^a34及びＲ^a35は、それぞれ独立に、水素原子又は炭素数１〜１２の炭化水素基を表し、Ｒ^a36は、炭素数１〜２０の炭化水素基を表すか、Ｒ^a35及びＲ^a36は互いに結合して炭素数２〜２０の２価の炭化水素基を形成し、該炭化水素基及び該２価の炭化水素基に含まれる−ＣＨ_２−は、−Ｏ−又は−Ｓ−に置き換わってもよい。］ The structural unit (a1) having the group (2) may be referred to as a structural unit represented by the formula (a1-4) or the formula (a1-5) (hereinafter “structural unit (a1-4)”). ).

[In the formula (a1-4),
R ^a32 represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom.
R ^a33 is a halogen atom, a hydroxy group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an acyl group having 2 to 4 carbon atoms, an acyloxy group having 2 to 4 carbon atoms, an acryloyloxy group, or Represents a methacryloyloxy group.
la represents an integer of 0 to 4. When la is 2 or more, the plurality of R ^a33 may be the same as or different from each other.
R ^a34 and R ^a35 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R ^a36 may represent a hydrocarbon group having 1 to 20 carbon atoms, R ^a35 and R ^a36 are each To form a divalent hydrocarbon group having 2 to 20 carbon atoms, and —CH ₂ — contained in the hydrocarbon group and the divalent hydrocarbon group is replaced by —O— or —S—. Also good. ]

^Examples of the alkyl group for R ^a32 and R ^a33 include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a pentyl group, and a hexyl group. The alkyl group is preferably an alkyl group having 1 to 4 carbon atoms, more preferably a methyl group or an ethyl group, and further preferably a methyl group.
Examples of the halogen atom for R ^a32 and R ^a33 include a fluorine atom, a chlorine atom and a bromine atom.
Examples of the hydrocarbon group R ^a34, R ^a35 and R ^a36, aliphatic hydrocarbon group, an alicyclic hydrocarbon group and aromatic hydrocarbon group, and R ^{a1 '~R a3'} of formula (2) Similar groups are mentioned.
Of these, the hydrocarbon group of R ^a34, R ^a35 and R ^a36, isopropyl group, n- butyl group, sec- butyl group, tert- butyl group, a pentyl group, a hexyl group, an octyl group, a 2-ethylhexyl group, A cyclohexyl group, an adamantyl group, a 2-alkyladamantan-2-yl group, a 1- (adamantan-1-yl) alkane-1-yl group, an isobornyl group, and the like are preferable.

In formula (a1-4), R ^a32 is preferably a hydrogen atom.
R ^a33 is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably a methoxy group or an ethoxy group, and further preferably a methoxy group.
la is preferably 0 or 1, more preferably 0.
R ^a34 is preferably a hydrogen atom.
R ^a35 is preferably a hydrocarbon group having 1 to 12 carbon atoms, more preferably a methyl group or an ethyl group.
The hydrocarbon group for R ^a36 is preferably an aliphatic hydrocarbon group having 1 to 18 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, or these. A combined group, more preferably an alkyl group having 1 to 18 carbon atoms, an alicyclic aliphatic hydrocarbon group having 3 to 18 carbon atoms, or an aralkyl group having 7 to 18 carbon atoms.

Examples of the monomer that leads to the structural unit (a1-4) include monomers described in JP 2010-204646 A. Among these, monomers represented by formula (a1-4-1) to formula (a1-4-7) are preferable, and monomers represented by formula (a1-4-1) to formula (a1-4-5) are preferable. Is more preferable.

  When the resin (A) includes the structural unit (a1-4), the content is preferably 10 to 95 mol%, more preferably 15 to 90 mol%, based on all the structural units of the resin (A). 20 to 85 mol% is more preferable.

［式（ａ１−５）中、
Ｒ^a8は、ハロゲン原子を有してもよい炭素数１〜６のアルキル基、水素原子又はハロゲン原子を表す。
Ｚ^ａ１は、単結合又は＊−（ＣＨ₂）_h3−ＣＯ−Ｌ^ａ６−を表し、ｈ３は１〜４の整数を表し、＊は、Ｌ^ａ１との結合手を表す。
Ｌ^ａ３、Ｌ^ａ４、Ｌ^ａ５及びＬ^ａ６は、それぞれ独立に、酸素原子又は硫黄原子を表す。
ｓ１は、１〜３の整数を表す。
ｓ１’は、０〜３の整数を表す。］

[In the formula (a1-5),
R ^a8 represents a C 1-6 alkyl group optionally having a halogen atom, a hydrogen atom, or a halogen atom.
Z ^a1 represents a single bond or * — (CH ₂ ) _h3 —CO—L ^a6 —, h3 represents an integer of 1 to 4, and * represents a bond to L ^a1 .
L ^a3 , L ^a4 , L ^a5 and L ^a6 each independently represent an oxygen atom or a sulfur atom.
s1 represents an integer of 1 to 3.
s1 ′ represents an integer of 0 to 3. ]

In formula (a1-5), R ^a8 is preferably a hydrogen atom, a methyl group or a trifluoromethyl group.
L ^a5 is preferably an oxygen atom.
One of L ^a3 and L ^a4 is preferably an oxygen atom and the other is a sulfur atom.
s1 is preferably 1.
s1 ′ is preferably an integer of 0 to 2.
Z ^a1 is preferably a single bond or * —CH ₂ —CO—O—.

As a monomer (a1-5), the monomer described in Unexamined-Japanese-Patent No. 2010-61117 is mentioned. Among these, monomers represented by formulas (a1-5-1) to (a1-5-4) are preferable, and monomers represented by formula (a1-5-1) or formula (a1-5-2) are preferable. Is more preferable.

  When the resin (A) contains the structural unit (a1-5), the content is preferably from 1 to 50 mol%, more preferably from 3 to 45 mol%, based on all the structural units of the resin (A). 5 to 40 mol% is more preferable.

<Structural unit (s)>
The structural unit (s) is derived from a monomer having no acid labile group (hereinafter sometimes referred to as “monomer (s)”). The monomer for deriving the structural unit (s) is not particularly limited as long as it does not have an acid labile group, and monomers known in the resist field can be used.
As the structural unit (s), a structural unit having a hydroxy group or a lactone ring and having no acid labile group is preferable. A structure having a hydroxy group and having no acid labile group (hereinafter sometimes referred to as “structural unit (a2)”) and / or a lactone ring and having no acid labile group If a resin having a unit (hereinafter sometimes referred to as “structural unit (a3)”) is used for the resist composition, the resolution of the resist pattern and the adhesion to the substrate can be improved.
The structural unit (s) is preferably a structural unit (s) having a halogen atom (hereinafter sometimes referred to as “structural unit (a4)”).

<Structural unit (a2)>
The hydroxy group contained in the structural unit (a2) may be an alcoholic hydroxy group or a phenolic hydroxy group.
When the resist composition is used for high energy beam exposure such as KrF excimer laser exposure (248 nm), electron beam or EUV (extreme ultraviolet light), the structural unit (a2) is preferably a structural unit having a phenolic hydroxy group. When ArF excimer laser exposure (193 nm) or the like is used, the structural unit (a2) is preferably a structural unit having an alcoholic hydroxy group.

［式（ａ２−０）中、
Ｒ^a30は、水素原子、ハロゲン原子又はハロゲン原子を有してもよい炭素数１〜６のアルキル基を表す。
Ｒ^a31は、ハロゲン原子、ヒドロキシ基、炭素数１〜６のアルキル基、炭素数１〜６のアルコキシ基、炭素数２〜４のアシル基、炭素数２〜４のアシルオキシ基、アクリロイルオキシ基又はメタクリロイルオキシ基を表す。
ｍａは０〜４の整数を表す。ｍａが２以上の整数である場合、複数のＲ^a31は同一又は相異なる。］ Examples of the structural unit (a2) having a phenolic hydroxy group include a structural unit represented by the formula (a2-0) (hereinafter sometimes referred to as “structural unit (a2-0)”).

[In the formula (a2-0),
R ^a30 represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom.
R ^a31 is a halogen atom, a hydroxy group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an acyl group having 2 to 4 carbon atoms, an acyloxy group having 2 to 4 carbon atoms, an acryloyloxy group, or Represents a methacryloyloxy group.
ma represents an integer of 0 to 4. When ma is an integer of 2 or more, the plurality of R ^a31 are the same or different. ]

The R ^a30, include the same groups as R ^a32 of formula (a1-4). Among them, R ^a30 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group or an ethyl group, and even more preferably a hydrogen atom or a methyl group.
The alkoxy group of R ^a31 is preferably an alkoxy group having 1 to 4 carbon atoms, more preferably a methoxy group or an ethoxy group, and further preferably a methoxy group.
ma is preferably 0, 1 or 2, more preferably 0 or 1, and particularly preferably 0.

Examples of the monomer for deriving the structural unit (a2-0) include monomers described in JP 2010-204634 A.
Among them, the structural unit (a2-0) is represented by formula (a2-0-1), formula (a2-0-2), formula (a2-0-3), and formula (a2-0-4), respectively. What is represented is preferable, and what is represented by a formula (a2-0-1) or a formula (a2-0-2) is more preferable.

  Resin (A) containing the structural unit (a2-0) is polymerized using a monomer in which the phenolic hydroxy group of the monomer that derives the structural unit (a2-0) is protected with a protective group such as an acetyl group. And then deprotecting. However, when the deprotection treatment is performed, the acid labile group of the structural unit (a1) needs to be not significantly impaired.

  When the resin (A) has the structural unit (a2-0), the content is preferably from 5 to 95 mol%, more preferably from 10 to 80 mol%, based on all the structural units of the resin (A). 15-80 mol% is more preferable.

式（ａ２−１）中、
Ｌ^a3は、−Ｏ−又は^＊−Ｏ−（ＣＨ₂）_k2−ＣＯ−Ｏ−を表し、
ｋ２は１〜７の整数を表す。＊は−ＣＯ−との結合手を表す。
Ｒ^a14は、水素原子又はメチル基を表す。
Ｒ^a15及びＲ^a16は、互いに独立に、水素原子、メチル基又はヒドロキシ基を表す。
ｏ１は、０〜１０の整数を表す。 Examples of the structural unit (a2) having an alcoholic hydroxy group include a structural unit represented by the formula (a2-1) (hereinafter sometimes referred to as “structural unit (a2-1)”).

In formula (a2-1),
L ^a3 represents —O— or ^* —O— (CH ₂ ) _k2 —CO—O—,
k2 represents an integer of 1 to 7. * Represents a bond with -CO-.
R ^a14 represents a hydrogen atom or a methyl group.
R ^a15 and R ^a16 each independently represent a hydrogen atom, a methyl group or a hydroxy group.
o1 represents an integer of 0 to 10.

In the formula (a2-1), L ^a3 is preferably, -O -, - O- (CH 2) f1 -CO-O- and is (wherein f1 is an integer from 1 to 4), more preferably Is —O—.
R ^a14 is preferably a methyl group.
R ^a15 is preferably a hydrogen atom.
R ^a16 is preferably a hydrogen atom or a hydroxy group.
o1 is preferably an integer of 0 to 3, more preferably 0 or 1.

Examples of the monomer for deriving the structural unit (a2-1) include monomers described in JP 2010-204646 A. A monomer represented by any one of formula (a2-1-1) to formula (a2-1-6) is preferable, and represented by any one of formula (a2-1-1) to formula (a2-1-4). The monomer represented by Formula (a2-1-1) or Formula (a2-1-3) is more preferable.

  When the resin (A) contains the structural unit (a2), the content is usually 1 to 45 mol%, preferably 1 to 40 mol%, based on all structural units of the resin (A). More preferably, it is 1-35 mol%, More preferably, it is 2-20 mol%.

<Structural unit (a3)>
The lactone ring of the structural unit (a3) may be a monocycle such as a β-propiolactone ring, γ-butyrolactone ring, or δ-valerolactone ring, or a condensed ring of a monocyclic lactone ring and another ring. But you can. Among these lactone rings, a bridged ring containing a γ-butyrolactone ring or a γ-butyrolactone ring structure is preferable.

  The structural unit (a3) is preferably a structural unit represented by the formula (a3-1), the formula (a3-2), the formula (a3-3) or the formula (a3-4).

［式（ａ３−１）中、
Ｌ^a4は、酸素原子又は^＊−Ｏ−（ＣＨ₂）_k3−ＣＯ−Ｏ−（ｋ３は１〜７の整数を表す。）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^a18は、水素原子又はメチル基を表す。
Ｒ^a21は炭素数１〜４の脂肪族炭化水素基を表す。
ｐ１は０〜５の整数を表す。ｐ１が２以上のとき、複数のＲ^a21は互いに同一又は相異なる。
式（ａ３−２）中、
Ｌ^a5は、酸素原子又は^＊−Ｏ−（ＣＨ₂）_k3−ＣＯ−Ｏ−（ｋ３は１〜７の整数を表す。）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^a19は、水素原子又はメチル基を表す。
Ｒ^a22は、カルボキシ基、シアノ基又は炭素数１〜４の脂肪族炭化水素基を表す。
ｑ１は、０〜３の整数を表す。ｑ１が２以上のとき、複数のＲ^a22は互いに同一又は相異なる。
式（ａ３−３）中、
Ｌ^a6は、酸素原子又は^＊−Ｏ−（ＣＨ₂）_k3−ＣＯ−Ｏ−（ｋ３は１〜７の整数を表す。）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^a20は、水素原子又はメチル基を表す。
Ｒ^a23は、カルボキシ基、シアノ基又は炭素数１〜４の脂肪族炭化水素基を表す。
ｒ１は、０〜３の整数を表す。ｒ１が２以上のとき、複数のＲ^a23は互いに同一又は相異なる。
式（ａ３−４）中、
Ｒ^a24は、ハロゲン原子を有してもよい炭素数１〜６のアルキル基、水素原子又はハロゲン原子を表す。
Ｌ^a7は、単結合、^＊−Ｌ^a8−Ｏ−、^＊−Ｌ^a8−ＣＯ−Ｏ−、^＊−Ｌ^a8−ＣＯ−Ｏ−Ｌ^a9−ＣＯ−Ｏ−又は^＊−Ｌ^a8−Ｏ−ＣＯ−Ｌ^a9−Ｏ−を表す。
＊は−Ｏ−との結合手を表す。
Ｌ^a8及びＬ^a9は、互いに独立に、炭素数１〜６のアルカンジイル基を表す。］

[In the formula (a3-1),
L ^a4 represents an oxygen atom or a group represented by ^* —O— (CH ₂ ) _k3 —CO—O— (k3 represents an integer of 1 to 7). * Represents a bond with a carbonyl group.
R ^a18 represents a hydrogen atom or a methyl group.
R ^a21 represents an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
p1 represents an integer of 0 to 5. When p1 is 2 or more, the plurality of R ^a21 are the same or different from each other.
In formula (a3-2),
L ^a5 represents an oxygen atom or a group represented by ^* —O— (CH ₂ ) _k3 —CO—O— (k3 represents an integer of 1 to 7). * Represents a bond with a carbonyl group.
R ^a19 represents a hydrogen atom or a methyl group.
R ^a22 represents a carboxy group, a cyano group, or an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
q1 represents an integer of 0 to 3. When q1 is 2 or more, the plurality of R ^a22 are the same or different from each other.
In formula (a3-3),
L ^a6 represents an oxygen atom or a group represented by ^* —O— (CH ₂ ) _k3 —CO—O— (k3 represents an integer of 1 to 7). * Represents a bond with a carbonyl group.
R ^a20 represents a hydrogen atom or a methyl group.
R ^a23 represents a carboxy group, a cyano group, or an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
r1 represents an integer of 0 to 3. When r1 is 2 or more, the plurality of R ^a23 are the same or different from each other.
In formula (a3-4),
R ^a24 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom.
L ^a7 is a single bond, ^* —L ^a8 —O—, ^* —L ^a8 —CO—O—, ^* —L ^a8 —CO—O—L ^a9 —CO—O— or ^* —L ^a8 —O—CO —L ^a9 —O— is represented.
* Represents a bond with -O-.
L ^a8 and L ^a9 each independently represent an alkanediyl group having 1 to 6 carbon atoms. ]

Examples of the halogen atom for R ^a24 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
^Examples of the alkyl group for R ^a24 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, and n-hexyl group. , Preferably it is a C1-C4 alkyl group, More preferably, it is a methyl group or an ethyl group.
Examples of the alkyl group having a halogen atom of R ^a24 include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl group, perfluorotert-butyl group, perfluoropentyl group, perfluoro group. A hexyl group, a trichloromethyl group, a tribromomethyl group, a triiodomethyl group, etc. are mentioned.

^Examples of the alkanediyl group represented by L ^a8 and L ^a9 include a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,2-diyl group, a butane-1,4-diyl group, and a pentane-1,5. -Diyl group and hexane-1,6-diyl group, butane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2-diyl group, pentane-1, 4-diyl group, 2-methylbutane-1,4-diyl group, etc. are mentioned.

In the formula (a3-1) to the formula (a3-3), L ^{a4 to} L ^a6 are independently of each other preferably an oxygen atom or k- is an integer of 1 to 4 * —O— (CH ₂ ). A group represented by _{k 3} —CO—O—, more preferably an oxygen atom and * —O—CH ₂ —CO—O—, still more preferably an oxygen atom.
R ^{a18 to} R ^a21 are preferably methyl groups.
R ^a22 and R ^a23 are independently of each other preferably a carboxy group, a cyano group or a methyl group.
p1, q1 and r1 are each independently preferably an integer of 0-2.

In formula (a3-4),
R ^a24 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group or an ethyl group, and still more preferably a hydrogen atom or a methyl group.
L ^a7 is preferably a single bond or ^* -L ^a8 —CO—O—, and more preferably a single bond, —CH ₂ —CO—O— or —C ₂ H ₄ —CO—O—. .

  As the monomer for deriving the structural unit (a3), a monomer described in JP2010-204646A, a monomer described in JP2000-122294A, a monomer described in JP2012-41274A, Formula (a3-1-1) to Formula (a3-1-6), Formula (a3-2-1) to Formula (a3-2-4), Formula (a3-3-1) to Formula (a3-3) -4) and a monomer represented by any one of formulas (a3-4-1) to (a3-4-6). Among them, the formula (a3-1-1), the formula (a3-1-2), the formula (a3-2-3), the formula (a3-2-4), the formula (a3-4-1), or the formula ( The structural unit derived from the monomer represented by a3-4-2) is more preferable, and represented by the formula (a3-1-1), the formula (a3-2-3), or the formula (a3-4-2). More preferred are structural units derived from monomers.

In the above structural unit, a compound in which a methyl group corresponding to R ^a24 is replaced with a hydrogen atom can also be given as a specific example of a monomer that leads to the structural unit (a3-4).

  Among structural units (a3), formula (a3-1-1), formula (a3-1-2), formula (a3-2-3), formula (a3-2-4), formula (a3-4-) 1) or a structural unit derived from a monomer represented by the formula (a3-4-2) is more preferable, and the formula (a3-1-1), the formula (a3-2-3) or the formula (a3-4-2) The structural unit derived from a monomer represented by

When the resin (A) includes the structural unit (a3), the total content is usually 5 to 70 mol%, preferably 10 to 65 mol%, based on all the structural units of the resin (A). More preferably, it is 10-60 mol%.
Moreover, content of a structural unit (a3-1), a structural unit (a3-2), a structural unit (a3-3), and a structural unit (a3-4) is respectively with respect to all the structural units of resin (A). 5 to 60 mol% is preferable, 5 to 50 mol% is more preferable, and 10 to 50 mol% is more preferable.

［式（ａ４−１）中、
Ｒ^a41は、ハロゲン原子を有してもよい炭素数１〜６のアルキル基、水素原子又はハロゲン原子を表す。
Ａ^a41は、置換基を有していてもよい炭素数１〜６のアルカンジイル基又は式（ａ−ｇ１）

〔式（ａ−ｇ１）中、
ｓは０又は１を表す。
Ａ^a42及びＡ^a44は、互いに独立に、置換基を有していてもよい炭素数１〜５の２価の脂肪族炭化水素基を表す。
Ａ^a43は、単結合又は置換基を有していてもよい炭素数１〜５の２価の脂肪族炭化水素基を表す。
Ｘ^a41及びＸ^a42は、互いに独立に、−Ｏ−、−ＣＯ−、−ＣＯ−Ｏ−又は−Ｏ−ＣＯ−を表す。
ただし、Ａ^a42、Ａ^a43及びＡ^a44の炭素数の合計は７以下である。〕
で表される基を表す。
Ｒ^a42は、置換基を有していてもよい炭素数１〜２０の炭化水素基を表し、該炭化水素基に含まれる−ＣＨ_２−は、酸素原子又はカルボニル基に置き換わっていてもよい。
ただし、Ａ^a41及びＲ^a42のうち少なくとも一方は、ハロゲン原子を有する基である。］ <Structural unit (a4)>
Examples of the halogen atom that the structural unit (a4) has include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Especially, it is preferable that the structural unit (a4) has a fluorine atom.
As the structural unit (a4), a structural unit represented by formula (a4-1) can be given.

[In the formula (a4-1),
R ^a41 represents a C 1-6 alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom.
A ^a41 is an alkanediyl group having 1 to 6 carbon atoms which may have a substituent or a formula (a-g1).

[In the formula (a-g1),
s represents 0 or 1.
A ^a42 and A ^a44 each independently represent a ^C 1-5 divalent aliphatic hydrocarbon group which may have a substituent.
A ^a43 represents a ^C1-C5 divalent aliphatic hydrocarbon group which may have a single bond or a substituent.
X ^a41 and X ^a42 each independently represent —O—, —CO—, ^—CO —O— or —O—CO—.
However, the total number of carbon atoms of A ^a42 , A ^a43 and A ^a44 is 7 or less. ]
Represents a group represented by
R ^a42 represents an ^optionally substituted hydrocarbon group having 1 to 20 carbon atoms, and —CH ₂ — contained in the hydrocarbon group may be replaced with an oxygen atom or a carbonyl group.
However, at least one of A ^a41 and R ^a42 is a group having a halogen atom. ]

脂肪族炭化水素基と脂環式炭化水素基とを組み合わせた基としては、シクロプロピルメチル基、シクロブチルメチル基、アダマンチルメチル基、ノルボルニルメチル基等が挙げられる。
芳香族炭化水素基としては、フェニル基、トリル基、キシリル基、ナフチル基、アントリル基、ビフェニリル基、フェナントリル基、フルオレニル基等が挙げられる。 R ^a41 includes the same group as R ^a24 in formula (a3-4). Of these, R ^a41 is preferably a hydrogen atom or a methyl group.
^Examples of the hydrocarbon group for R ^a42 include an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a group obtained by combining these. The aliphatic hydrocarbon group may have a carbon-carbon unsaturated bond, but is preferably an aliphatic saturated hydrocarbon group. Similarly, the alicyclic hydrocarbon group is preferably an alicyclic saturated hydrocarbon group. .
Aliphatic hydrocarbon groups include methyl, ethyl, propyl, isopropyl, butyl, pentyl, hexyl, heptyl, octyl, decyl, dodecyl, hexadecyl, pentadecyl, hexyldecyl , Alkyl groups such as heptadecyl group and octadecyl group.
The alicyclic aliphatic hydrocarbon group includes a cycloalkyl group such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group; a decahydronaphthyl group, an adamantyl group, a norbornyl group, and the following group (* represents a bond) And a polycyclic alicyclic hydrocarbon group such as).

Examples of the group obtained by combining an aliphatic hydrocarbon group and an alicyclic hydrocarbon group include a cyclopropylmethyl group, a cyclobutylmethyl group, an adamantylmethyl group, and a norbornylmethyl group.
Examples of the aromatic hydrocarbon group include a phenyl group, a tolyl group, a xylyl group, a naphthyl group, an anthryl group, a biphenylyl group, a phenanthryl group, and a fluorenyl group.

^As the hydrocarbon group for R ^a42 , an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, or a group obtained by combining these is preferable, and an aliphatic saturated hydrocarbon group, an alicyclic saturated hydrocarbon group, or a combination thereof. Groups are more preferred.

As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are mentioned, Preferably it is a fluorine atom.
The hydrocarbon group having a halogen atom is preferably a hydrocarbon group having a fluorine atom, more preferably an aliphatic hydrocarbon group having a fluorine atom, an alicyclic hydrocarbon group having a fluorine atom, or a combination thereof. It is a group.

Examples of the aliphatic hydrocarbon group having a fluorine atom include difluoromethyl group, trifluoromethyl group, 1,1-difluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, perfluoroethyl. Group, 1,1,2,2-tetrafluoropropyl group, 1,1,2,2,3,3-hexafluoropropyl group, perfluoroethylmethyl group, 1- (trifluoromethyl) -1,2,2 , 2-tetrafluoroethyl group, perfluoropropyl group, 1,1,2,2-tetrafluorobutyl group, 1,1,2,2,3,3-hexafluorobutyl group, 1,1,2,2, 3,3,4,4-octafluorobutyl group, perfluorobutyl group, 1,1-bis (trifluoro) methyl-2,2,2-trifluoroethyl group, 2- (perfluoropropyl group) Pyr) ethyl group, 1,1,2,2,3,3,4,4-octafluoropentyl group, perfluoropentyl group, 1,1,2,2,3,3,4,4,5,5- Decafluoropentyl group, 1,1-bis (trifluoromethyl) -2,2,3,3,3-pentafluoropropyl group, perfluoropentyl group, 2- (perfluorobutyl) ethyl group, 1,1,2, 2,3,3,4,4,5,5-decafluorohexyl group, 1,1,2,2,3,3,4,4,5,5,6,6-dodecafluorohexyl group, perfluoropentyl Fluorinated alkyl groups such as a methyl group, a perfluorohexyl group, a perfluoroheptyl group, and a perfluorooctyl group are exemplified, and among them, a perfluoroalkyl group is preferable.
Examples of the alicyclic hydrocarbon group having a fluorine atom include a perfluorocycloalkyl group such as a perfluorocyclohexyl group; a perfluoroadamantyl group.
The hydrocarbon group having a halogen atom preferably has 1 to 6 carbon atoms, more preferably 1 to 3 carbon atoms.
Examples of the group having a fluorine atom in which an aliphatic hydrocarbon group and an alicyclic hydrocarbon group are combined include a perfluoroadamantylmethyl group.

^Examples of the substituent that the hydrocarbon group of R ^a42 may have include a halogen atom, —O—R ^h1 , —CO—R ^h2 , —O—CO—R ^h3 and —CO—O—R ^h4. Can be mentioned.
R ^{h1 to} R ^h4 each independently represent a hydrocarbon group optionally having a halogen atom having 1 to 18 carbon atoms. However, the ^sum of the carbon number of the hydrocarbon group of R ^a42 , the carbon number of the substituent, and the number of —O— and —CO— contained in the substituent is 20 or less, preferably 15 or less. More preferably, it is 12 or less.

When R ^a42 is a group having a halogen atom, the hydrocarbon group of R ^a42 is, as a substituent, a halogen atom, —O—R ^h1 , —CO—R ^h2 , —O—CO—R ^h3 and —CO—. It is preferable to have at least one selected from the group consisting of O—R ^h4 .
^When the hydrocarbon group of R ^a42 has —O—R ^h1 , —CO—R ^h2 , —O—CO—R ^h3 or —CO—O—R ^h4 , the number is preferably one.
R ^{h1 to} R ^h4 each independently represent a hydrocarbon group having a halogen atom having 1 to 18 carbon atoms. However, the ^sum of the carbon number of the hydrocarbon group of R ^a42 , the carbon number of the substituent, and the number of —O— and —CO— contained in the substituent is 20 or less, preferably 15 or less. More preferably, it is 12 or less.
The hydrocarbon group of R ^{h1 to} R ^h4 is preferably an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, or a group obtained by combining these. The hydrocarbon group having a halogen atom is preferably a hydrocarbon group having a fluorine atom, more preferably an aliphatic hydrocarbon group having a fluorine atom, an alicyclic hydrocarbon group having a fluorine atom, or a combination thereof. Specific examples thereof include the above-described groups.

［式（ａ−ｇ２）中、
Ａ^a46は、ハロゲン原子を有していてもよい炭素数１〜１７の２価の炭化水素基を表す。
Ｘ^a44は、カルボニルオキシ基又はオキシカルボニル基を表す。
Ａ^a47は、ハロゲン原子を有していてもよい炭素数１〜１７の１価の炭化水素基を表す。
ただし、Ａ^a46及びＡ^a47の炭素数の合計は１８以下であり、Ａ^a46及びＡ^a47のうち、少なくとも一方は、少なくとも１つのハロゲン原子を有する。］ When R ^a42 is a group having a halogen atom, R ^a42 is preferably a group represented by the formula (a-g2).

[In the formula (a-g2),
A ^a46 represents a C ^1-17 divalent hydrocarbon group which may have a halogen atom.
X ^a44 represents a carbonyloxy group or an oxycarbonyl group.
A ^a47 represents a monovalent hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom.
However, the total number of carbon atoms of A ^a46 and A ^a47 is 18 or less, and at least one of A ^a46 and A ^a47 has at least one halogen atom. ]

Of A ^a46 and A ^a47 , both may be a group having a halogen atom, but A ^a46 is preferably a group having a halogen atom.
A ^a46 is preferably a divalent aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom, or a divalent alicyclic group having 3 to 17 carbon atoms which may have a halogen atom. Or a divalent group having 4 to 17 carbon atoms, or a combination thereof, more preferably a divalent aliphatic hydrocarbon group having 1 to 6 carbon atoms which may have a halogen atom. More preferably, it is a C 1-3 divalent aliphatic hydrocarbon group which may have a halogen atom.
A ^a47 is preferably a monovalent aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom, or a monovalent alicyclic group having 3 to 17 carbon atoms which may have a halogen atom. A monovalent group having 4 to 17 carbon atoms or a combination thereof, more preferably a monovalent aliphatic hydrocarbon group having 1 to 15 carbon atoms which may have a halogen atom, halogen A monovalent alicyclic hydrocarbon group having 3 to 15 carbon atoms which may have atoms, or a monovalent group having 4 to 15 carbon atoms in combination thereof, more preferably a halogen atom. And a monovalent alicyclic hydrocarbon group having 5 to 12 carbon atoms.
A ^a47 is particularly preferably a cyclohexyl group or an adamantyl group.

Examples of the group represented by the formula (a-g2) include the following structures.

^As the alkanediyl group of ^Aa41 , a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,2-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group , A straight-chain alkanediyl group such as hexane-1,6-diyl group; 1-methylpropane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2 -Branched alkanediyl groups such as a diyl group, 1-methylbutane-1,4-diyl group, 2-methylbutane-1,4-diyl group.
^Examples of the substituent in the alkanediyl group of A ^a41 include a halogen atom, a hydroxy group, and an alkoxy group having 1 to 6 carbon atoms.
A ^a41 is preferably an alkanediyl group having 1 to 4 carbon atoms, more preferably an alkanediyl group having 2 to 4 carbon atoms, and still more preferably an ethylene group.

In the group represented by the formula (a-g1) of A ^a41 (hereinafter sometimes referred to as “group (a-g1)”), A ^a44 is ^bonded to —O—CO—R ^a42 .
As the aliphatic hydrocarbon group for A ^a42 , A ^a43 and A ^{a44 in} the group (a-g1), a methylene group, an ethylene group, a propane-1,3-diyl group, a propane-1,2-diyl group, a butane- Examples include alkanediyl groups such as 1,4-diyl group, 1-methylpropane-1,3-diyl group, 2-methylpropane-1,3-diyl group, and 2-methylpropane-1,2-diyl group. . Examples of these substituents include a hydroxy group and an alkoxy group having 1 to 6 carbon atoms.
s is preferably 0.

^Examples of the group (a-g1) in which X ^a42 is an oxygen atom include the following groups. In the following examples, * is a bond with —O—CO—R ^a42 .

Examples of the group (a-g1) in which X ^a42 is a carbonyl group include the following groups.

Examples of the group (a-g1) in which X ^a42 is a carbonyloxy group include the following groups.

Examples of the group (a-g1) in which X ^a42 is an oxycarbonyl group include the following groups.

［式（ａ４−２）中、
Ｒ^ｆ1は、水素原子又はメチル基を表す。
Ａ^ｆ1は、炭素数１〜６のアルカンジイル基を表す。
Ｒ^ｆ2は、フッ素原子を有する炭素数１〜１０の炭化水素基を表す。］ As the structural unit represented by the formula (a4-1), a structural unit represented by the formula (a4-2) or the formula (a4-3) is preferable.

[In the formula (a4-2),
R ^f1 represents a hydrogen atom or a methyl group.
A ^f1 represents an alkanediyl group having 1 to 6 carbon atoms.
R ^f2 represents a C 1-10 hydrocarbon group having a fluorine atom. ]

As the alkanediyl group of A ^f1 , a methylene group, an ethylene group, a propane-1,3-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, a hexane-1,6-diyl group Linear alkanediyl group such as propane-1,2-diyl group, 1-methylpropane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2 -Branched alkanediyl groups such as a diyl group, 1-methylbutane-1,4-diyl group, 2-methylbutane-1,4-diyl group.

The hydrocarbon group for R ^f2 includes an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, and a group obtained by combining these. The aliphatic hydrocarbon group is preferably an aliphatic saturated hydrocarbon group, and the alicyclic hydrocarbon group is preferably an alicyclic saturated hydrocarbon group. As the hydrocarbon group for R ^f2, the same groups as the hydrocarbon groups for R ^a42 in formula (a4-1) can be mentioned.

Examples of the hydrocarbon group having a fluorine atom of R ^f2 include the same groups as the aliphatic hydrocarbon group having a fluorine atom and the alicyclic hydrocarbon group having a fluorine atom, which are mentioned as the group representing R ^a42 .

In formula (a4-2), as A ^f1 , an alkanediyl group having 2 to 4 carbon atoms is preferable, and an ethylene group is more preferable.
R ^f2 is preferably a C 1-10 aliphatic hydrocarbon group having a fluorine atom or a C 3-10 alicyclic hydrocarbon group having a fluorine atom, and a C 1-6 fluorinated alkyl group. Is more preferable.

［式（ａ４−３）中、
Ｒ^ｆ11は、水素原子又はメチル基を表す。
Ａ^ｆ11は、炭素数１〜６のアルカンジイル基を表す。
Ａ^ｆ13は、フッ素原子を有していてもよい炭素数１〜１７の２価の脂肪族炭化水素基、フッ素原子を有していてもよい炭素数３〜１７の２価の脂環式炭化水素基又はこれらを組み合わせた２価の基を表す。
Ｘ^ｆ12は、カルボニルオキシ基又はオキシカルボニル基を表す。
Ａ^ｆ14は、フッ素原子を有していてもよい炭素数１〜１７の脂肪族炭化水素基、フッ素原子を有していてもよい炭素数３〜１７の脂環式炭化水素基又はこれらを組み合わせた基を表す。
ただし、Ａ^ｆ13及びＡ^ｆ14のうち少なくとも一方は、フッ素原子を有する基を表す。］

[In the formula (a4-3),
R ^f11 represents a hydrogen atom or a methyl group.
A ^f11 represents an alkanediyl group having 1 to 6 carbon atoms.
A ^f13 is a divalent aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a fluorine atom, or a divalent alicyclic carbon group having 3 to 17 carbon atoms which may have a fluorine atom. A hydrogen group or a divalent group in which these are combined is represented.
X ^f12 represents a carbonyloxy group or an oxycarbonyl group.
A ^f14 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a fluorine atom, an alicyclic hydrocarbon group having 3 to 17 carbon atoms which may have a fluorine atom, or a combination thereof. Represents a group.
However, at least one of A ^f13 and A ^f14 represents a group having a fluorine atom. ]

^Examples of the alkanediyl group for A ^f11 include the same groups as the alkanediyl group for A ^f1 , and an ethylene group is preferable.

As the divalent aliphatic hydrocarbon group which may have a fluorine atom of A ^{f13 and} the divalent alicyclic hydrocarbon group which may have a fluorine atom, the same groups as those in R ^a42 may be used. And a group in which one hydrogen atom or fluorine atom has been removed.
A ^f13 is preferably an aliphatic saturated hydrocarbon group which may have a fluorine atom, and more preferably a perfluoroalkanediyl group.
Examples of the divalent aliphatic hydrocarbon group which may have a fluorine atom include alkanediyl groups such as methylene group, ethylene group, propanediyl group, butanediyl group and pentanediyl group; difluoromethylene group, perfluoroethylene group, perfluoro Examples thereof include perfluoroalkanediyl groups such as propanediyl group, perfluorobutanediyl group and perfluoropentanediyl group.
The divalent alicyclic hydrocarbon group which may have a fluorine atom may be monocyclic or polycyclic. Examples of the monocyclic alicyclic hydrocarbon group include a cyclohexanediyl group and a perfluorocyclohexanediyl group. Examples of the polycyclic divalent aliphatic hydrocarbon group include an adamantanediyl group, a norbornanediyl group, a perfluoroadamantanediyl group, and the like.
The divalent group formed by combining the divalent aliphatic hydrocarbon group which may have a fluorine atom and the divalent alicyclic hydrocarbon group which may have a fluorine atom has a total carbon number of 17 It is as follows.
A ^f13 is preferably a C 1-6 divalent aliphatic hydrocarbon group which may have a fluorine atom, or a C 3-6 divalent fat which may have a fluorine atom. A cyclic hydrocarbon group or a divalent group having 4 to 6 carbon atoms, or a combination thereof, more preferably a divalent aliphatic hydrocarbon group having 1 to 6 carbon atoms which may have a fluorine atom. More preferably, it is a C2-C3 bivalent aliphatic hydrocarbon group which may have a fluorine atom.

As the aliphatic hydrocarbon group which may have a fluorine atom of A ^{f14 and} the alicyclic hydrocarbon group which may have a fluorine atom, the same groups as those in R ^a42 may be mentioned. The aliphatic hydrocarbon group which may have a fluorine atom is preferably an aliphatic saturated hydrocarbon group which may have a fluorine atom, and the alicyclic hydrocarbon group which may have a fluorine atom is An alicyclic saturated hydrocarbon group which may have a fluorine atom is preferred. The group combining the aliphatic hydrocarbon group which may have a fluorine atom and the alicyclic hydrocarbon group which may have a fluorine atom has a total carbon number of 17 or less.
A ^f14 is preferably an aliphatic hydrocarbon group having 1 to 12 carbon atoms which may have a fluorine atom, an alicyclic hydrocarbon group having 3 to 12 carbon atoms which may have a fluorine atom, or C4-12 group which combined these, More preferably, C1-C10 aliphatic hydrocarbon group, C3-C10 alicyclic hydrocarbon group, or carbon number 4 which combined these -12 groups, more preferably an alicyclic hydrocarbon group having 3 to 10 carbon atoms, or a group having 4 to 10 carbon atoms in which an aliphatic hydrocarbon group and an alicyclic hydrocarbon group are combined. . A ^f14 is particularly preferably a cyclopropylmethyl group, a cyclopentyl group, a cyclohexyl group, a norbornyl group or an adamantyl group.

At least one of A ^f13 and A ^f14 is a group having a fluorine atom, and preferably A ^f13 is a group having a fluorine atom.

Examples of the monomer for deriving the structural unit represented by formula (a4-2) include monomers represented by formula (a4-1-1) to formula (a4-1-22).

Examples of the monomer for deriving the structural unit represented by formula (a4-3) include monomers represented by formula (a4-1′-1) to formula (a4-1′-22), respectively.

［式（ａ４−４）中、
Ｒ^f21は、水素原子又はメチル基を表す。
Ａ^f21は、−（ＣＨ_２）_ｊ１−、−（ＣＨ_２）_ｊ２−Ｏ−（ＣＨ_２）_ｊ３−又は−（ＣＨ_２）_ｊ４−ＣＯ−Ｏ−（ＣＨ_２）_ｊ５−を表す。
ｊ１〜ｊ５は、互いに独立に、１〜６の整数を表す。
Ｒ^f22は、フッ素原子を有する炭素数１〜１０の炭化水素基を表す。］ Examples of the structural unit (a4) include a structural unit represented by the formula (a4-4).

[In the formula (a4-4),
R ^f21 represents a hydrogen atom or a methyl group.
A ^f21 represents — (CH ₂ ) _j1 —, — (CH ₂ ) _j2 —O— (CH ₂ ) _j3 — or — (CH ₂ ) _j4 —CO—O— (CH ₂ ) _j5 —.
j1 to j5 each independently represent an integer of 1 to 6.
R ^f22 represents a C 1-10 hydrocarbon group having a fluorine atom. ]

^Examples of the hydrocarbon group having a fluorine atom of R ^f22 include the same hydrocarbon groups as R ^f2 in formula (a4-2).

In Formula (a4-4), as A ^f21 , — (CH ₂ ) _j1 — is preferable, an ethylene group or a methylene group is more preferable, and a methylene group is further preferable.
R ^f22 is preferably a ^C 1-10 aliphatic hydrocarbon group having a fluorine atom or a C 1-10 alicyclic hydrocarbon group having a fluorine atom, and a C 1-10 aliphatic having a fluorine atom. An aromatic saturated hydrocarbon group is more preferable, and an aliphatic saturated hydrocarbon group having 1 to 6 carbon atoms having a fluorine atom is more preferable.

Examples of the monomer that derives the structural unit represented by the formula (a4-4) include the following monomers.

  When the resin (A) has a structural unit (a4), the content is preferably 1 to 20 mol%, more preferably 2 to 15 mol%, based on all structural units of the resin (A). More preferably, it is 10 mol%.

  The resin (A) may further have a structural unit other than the above-described structural unit, and examples of such a structural unit include structural units well known in the art.

The resin (A) is preferably a resin composed of the structural unit (a1) and the structural unit (s), that is, a copolymer of the monomer (a1) and the monomer (s).
The structural unit (a1) is preferably at least one of the structural unit (a1-1) and the structural unit (a1-2) (preferably the structural unit having a cyclohexyl group or a cyclopentyl group), more preferably the structural unit (a1- 1).
The structural unit (s) is preferably at least one of the structural unit (a2) and the structural unit (a3). The structural unit (a2) is preferably the structural unit (a2-1). The structural unit (a3) is preferably at least one of the structural unit (a3-1), the structural unit (a3-2), and the structural unit (a3-4).

  The resin (A) preferably contains 15 mol% or more of a structural unit derived from a monomer having an adamantyl group. When the content of the structural unit having an adamantyl group is increased, the dry etching resistance of the resist pattern is improved.

Each structural unit constituting the resin (A) may be contained alone or in combination of two or more, and a known polymerization method (for example, radical polymerization method) using a monomer that derives these structural units. Can be manufactured by.
The weight average molecular weight of the resin (A) is preferably 2,500 or more (more preferably 3,000 or more, more preferably 4,000 or more), 50,000 or less (more preferably 30,000 or less, and further preferably 15,000 or less).

<Resin other than resin (A)>
The resist composition of the present invention may contain a resin other than the resin (A). An example of such a resin is a resin composed of only the structural unit (s).
Especially, as resin other than resin (A), resin (henceforth "resin (X)") which has structural unit (a4) is preferable. In the resin (X), the content ratio of the structural unit (a4) is preferably 80 mol% or more, more preferably 85 mol% or more, and still more preferably 90 mol% or more with respect to all the structural units of the resin (X). .
Examples of the structural unit that the resin (X) may further include a structural unit derived from the structural unit (a2), the structural unit (a3), and other known monomers.
The weight average molecular weight of the resin (X) is preferably 8,000 or more (more preferably 10,000 or more) and 80,000 or less (more preferably 60,000 or less). The means for measuring the weight average molecular weight of the resin (X) is the same as that for the resin (A).

  When the resist composition of this invention contains resin (X), the content becomes like this. Preferably it is 1-60 mass parts with respect to 100 mass parts of resin (A), More preferably, it is 3-50 mass parts More preferably, it is 5-40 mass parts, Most preferably, it is 7-30 mass parts.

  The resin content in the resist composition of the present invention is preferably 80% by mass or more and 99% by mass or less with respect to the solid content of the resist composition. In the present specification, the “solid content of the resist composition” means the total of components excluding the solvent (D) described later from the total amount of the resist composition. The solid content of the resist composition and the resin content relative thereto can be measured by a known analysis means such as liquid chromatography or gas chromatography.

<Solvent (D)>
The content of the solvent (D) in the resist composition is 90% by mass or more, preferably 92% by mass or more, more preferably 94% by mass or more, and 99.9% by mass or less, preferably 99% by mass or less. . The content rate of a solvent (D) can be measured with well-known analysis means, such as a liquid chromatography or a gas chromatography.

  Examples of the solvent (D) include glycol ether esters such as ethyl cellosolve acetate, methyl cellosolve acetate and propylene glycol monomethyl ether acetate; glycol ethers such as propylene glycol monomethyl ether; ethyl lactate, butyl acetate, amyl acetate and ethyl pyruvate Esters such as acetone, methyl isobutyl ketone, ketones such as 2-heptanone and cyclohexanone; cyclic esters such as γ-butyrolactone; and the like. A solvent (D) may contain individually by 1 type and may contain 2 or more types.

<Basic compound (C)>
The basic compound (C) is preferably a basic nitrogen-containing organic compound, and examples thereof include amines and ammonium salts. The basic compound (C) is used as a quencher in the resist composition of the present invention. A quencher is a compound having an action of capturing an acid generated from an acid generator upon exposure. Amines include aliphatic and aromatic amines; primary amines, secondary amines and tertiary amines. The basic compound (C) is preferably a compound represented by any one of formulas (C1) to (C8), more preferably a compound represented by formula (C1), and more preferably It is a compound represented by a formula (C1-1).

［式（Ｃ１）中、Ｒ^c1、Ｒ^c2及びＲ^c3は、それぞれ独立に、水素原子、炭素数１〜６のアルキル基、炭素数５〜１０の脂環式炭化水素基又は炭素数６〜２０の芳香族炭化水素基を表し、該アルキル基及び該脂環式炭化水素基に含まれる水素原子は、ヒドロキシ基、アミノ基又は炭素数１〜６のアルコキシ基で置換されていてもよく、該芳香族炭化水素基に含まれる水素原子は、炭素数１〜６のアルコキシ基で置換されていてもよい。］

[In formula (C1), R ^c1 , R ^c2 and R ^c3 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alicyclic hydrocarbon group having 5 to 10 carbon atoms, or 6 to 6 carbon atoms. 20 represents an aromatic hydrocarbon group, the hydrogen atom contained in the alkyl group and the alicyclic hydrocarbon group may be substituted with a hydroxy group, an amino group or an alkoxy group having 1 to 6 carbon atoms, The hydrogen atom contained in the aromatic hydrocarbon group may be substituted with an alkoxy group having 1 to 6 carbon atoms. ]

［式（Ｃ１−１）中、Ｒ^c2及びＲ^c3は、上記と同じ意味を表す。
Ｒ^c4は、炭素数１〜６のアルキル基、炭素数１〜６のアルコキシ基、炭素数５〜１０の脂環式炭化水素又は炭素数６〜１０の芳香族炭化水素基を表す。
ｍ３は０〜３の整数を表し、ｍ３が２以上のとき、複数のＲ^c4は同一又は相異なる。］ The compound represented by the formula (C1) is preferably a compound represented by the formula (C1-1).

[In Formula (C1-1), R ^c2 and R ^c3 represent the same meaning as described above.
R ^c4 represents an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alicyclic hydrocarbon having 5 to 10 carbon atoms, or an aromatic hydrocarbon group having 6 to 10 carbon atoms.
m3 represents an integer of 0 to 3, and when m3 is 2 or more, the plurality of R ^c4 are the same or different. ]

［式（Ｃ２）、式（Ｃ３）及び式（Ｃ４）中、Ｒ^c5、Ｒ^c6、Ｒ^c7及びＲ^c8は、それぞれ独立に、Ｒ^c1と同じ意味を表す。
Ｒ^c9は、炭素数１〜６のアルキル基、炭素数３〜６の脂環式炭化水素基又は炭素数２〜７のアシル基を表す。
ｎ３は０〜８の整数を表し、ｎ３が２以上のとき、複数のＲ^c9は同一又は相異なる。］

[In Formula (C2), Formula (C3) and Formula (C4), R ^c5 , R ^c6 , R ^c7 and R ^c8 each independently represent the same meaning as R ^c1 .
R ^c9 represents an alkyl group having 1 to 6 carbon atoms, an alicyclic hydrocarbon group having 3 to 6 carbon atoms, or an acyl group having 2 to 7 carbon atoms.
n3 represents an integer of 0 to 8, and when n3 is 2 or more, the plurality of R ^c9 are the same or different. ]

［式（Ｃ５）及び式（Ｃ６）中、Ｒ^c10、Ｒ^c11、Ｒ^c12、Ｒ^c13及びＲ^c16は、それぞれ独立に、Ｒ^c1と同じ意味を表す。
Ｒ^c14、Ｒ^c15及びＲ^c17は、それぞれ独立に、Ｒ^c4と同じ意味を表す。
ｏ３及びｐ３は、それぞれ独立に、０〜３の整数を表し、ｏ３が２以上のとき、複数のＲ^c1４は同一又は相異なり、ｐ３が２以上のとき、複数のＲ^c15は同一又は相異なる。
Ｌ^c1は、炭素数１〜６のアルカンジイル基、−ＣＯ−、−Ｃ（＝ＮＨ）−、−Ｓ−又はこれらを組合せた２価の基を表す。］

[In Formula (C5) and Formula (C6), R ^c10 , R ^c11 , R ^c12 , R ^c13 and R ^c16 each independently represent the same meaning as R ^c1 .
R ^c14 , R ^c15 and R ^c17 each independently represent the same meaning as R ^c4 .
o3 and p3 each independently represent an integer of 0 to 3, when o3 is 2 or more, the plurality of R ^c14 are the same or different, and when p3 is 2 or more, the plurality of R ^c15 are the same or different. .
L ^c1 represents an alkanediyl group having 1 to 6 carbon atoms, —CO—, —C (═NH) —, —S—, or a divalent group obtained by combining these. ]

［式（Ｃ７）及び式（Ｃ８）中、Ｒ^c18、Ｒ^c19及びＲ^c20は、それぞれ独立に、Ｒ^c4と同じ意味を表す。
ｑ３、ｒ３及びｓ３は、それぞれ独立に０〜３の整数を表し、ｑ３が２以上のとき、複数のＲ^c18は同一又は相異なり、ｒ３が２以上のとき、複数のＲ^c1９は同一又は相異なり、ｓ３が２以上のとき、複数のＲ^c20は同一又は相異なる。
Ｌ^c2は、単結合又は炭素数１〜６のアルカンジイル基、−ＣＯ−、−Ｃ（＝ＮＨ）−、−Ｓ−又はこれらを組合せた２価の基を表す。］

Wherein (C7) and formula ^{(C8), R c18, R} c19 and R ^c20 in each occurrence independently represent the same meaning as R ^c4.
q3, r3 and s3 each independently represents an integer of 0 to 3, and when q3 is 2 or more, a plurality of R ^c18 are the same or different, and when r3 is 2 or more, a plurality of R ^c19 are the same or different. In contrast, when s3 is 2 or more, the plurality of R ^c20 are the same or different.
L ^c2 represents a single bond or an alkanediyl group having 1 to 6 carbon atoms, —CO—, —C (═NH) —, —S—, or a divalent group obtained by combining these. ]

In formula (C1) to formula (C8) and formula (C1-1), the alkyl group, alicyclic hydrocarbon group, aromatic hydrocarbon group, alkoxy group, alkanediyl group are the same as those described above. Is mentioned.
Examples of the acyl group include acetyl group, 2-methylacetyl group, 2,2-dimethylacetyl group, propionyl group, butyryl group, isobutyryl group, pentanoyl group, and 2,2-dimethylpropionyl group.

  Examples of the compound represented by the formula (C1) include 1-naphthylamine, 2-naphthylamine, aniline, diisopropylaniline, 2-, 3- or 4-methylaniline, 4-nitroaniline, N-methylaniline, N, N- Dimethylaniline, diphenylamine, hexylamine, heptylamine, octylamine, nonylamine, decylamine, dibutylamine, dipentylamine, dihexylamine, diheptylamine, dioctylamine, dinonylamine, didecylamine, triethylamine, trimethylamine, tripropylamine, tributylamine, tri Pentylamine, trihexylamine, triheptylamine, trioctylamine, trinonylamine, tridecylamine, methyldibutylamine, methyldipentylamine, methyl Hexylamine, methyldicyclohexylamine, methyldiheptylamine, methyldioctylamine, methyldinonylamine, methyldidecylamine, ethyldibutylamine, ethyldipentylamine, ethyldihexylamine, ethyldiheptylamine, ethyldioctylamine, ethyldinonyl Amine, ethyldidecylamine, dicyclohexylmethylamine, tris [2- (2-methoxyethoxy) ethyl] amine, triisopropanolamine, ethylenediamine, tetramethylenediamine, hexamethylenediamine, 4,4′-diamino-1,2- Examples include diphenylethane, 4,4′-diamino-3,3′-dimethyldiphenylmethane, 4,4′-diamino-3,3′-diethyldiphenylmethane, and preferably diisopropyl. Piruanirin. Particularly preferred include 2,6-diisopropylaniline.

Examples of the compound represented by the formula (C2) include piperazine.
Examples of the compound represented by the formula (C3) include morpholine.
Examples of the compound represented by the formula (C4) include piperidine and hindered amine compounds having a piperidine skeleton described in JP-A No. 11-52575.
Examples of the compound represented by the formula (C5) include 2,2′-methylenebisaniline.
Examples of the compound represented by the formula (C6) include imidazole and 4-methylimidazole.
Examples of the compound represented by the formula (C7) include pyridine and 4-methylpyridine.
Examples of the compound represented by the formula (C8) include 1,2-di (2-pyridyl) ethane, 1,2-di (4-pyridyl) ethane, 1,2-di (2-pyridyl) ethene, 1, 2-di (4-pyridyl) ethene, 1,3-di (4-pyridyl) propane, 1,2-di (4-pyridyloxy) ethane, di (2-pyridyl) ketone, 4,4′-dipyridyl sulfide 4,4′-dipyridyl disulfide, 2,2′-dipyridylamine, 2,2′-dipiconylamine, bipyridine and the like.

  As ammonium salts, tetramethylammonium hydroxide, tetraisopropylammonium hydroxide, tetrabutylammonium hydroxide, tetrahexylammonium hydroxide, tetraoctylammonium hydroxide, phenyltrimethylammonium hydroxide, 3- (trifluoromethyl) phenyltrimethyl Ammonium hydroxide, tetra-n-butylammonium salicylate, choline and the like can be mentioned.

  The content of the basic compound (C) in the solid content of the resist composition is preferably about 0.01 to 5% by mass, more preferably about 0.01 to 3% by mass, and particularly preferably 0.8. It is about 01 to 1% by mass.

<Other ingredients>
The resist composition of the present invention may contain other components (hereinafter sometimes referred to as “other components (F)”) other than the above-described components, if necessary. The other component (F) is not particularly limited, and additives, sensitizers, dissolution inhibitors, surfactants, stabilizers, dyes, and the like known in the resist field can be used.

<Preparation of resist composition>
The resist composition of the present invention comprises a resin (A), an acid generator (B), a resin other than the resin (A) used as necessary, a solvent (D), a basic compound (C), and other components. It can be prepared by mixing (F). The mixing order is arbitrary and is not particularly limited. The temperature at the time of mixing can select an appropriate temperature range from the range of 10-40 degreeC according to the kind etc. of resin etc., the solubility with respect to solvents (D), such as resin. An appropriate mixing time can be selected from 0.5 to 24 hours depending on the mixing temperature. The mixing means is not particularly limited, and stirring and mixing can be used.
After mixing each component, it is preferable to filter using a filter having a pore size of about 0.003 to 0.2 μm.

<Method for producing resist pattern>
The method for producing a resist pattern of the present invention comprises:
(1) The process of apply | coating the resist composition of this invention on a board | substrate,
(2) The process of drying the composition after application | coating and forming a composition layer,
(3) a step of exposing the composition layer;
(4) The process of heating the composition layer after exposure, (5) The process of developing the composition layer after a heating is included.

  Application of the resist composition onto the substrate can be performed by a commonly used apparatus such as a spin coater. By adjusting the conditions of the coating apparatus, the film thickness of the composition after coating can be adjusted. An example of the substrate is a silicon wafer. Before applying the resist composition, this substrate may be washed or an antireflection film may be formed using a commercially available composition for organic antireflection film.

By drying the composition after coating, the solvent is removed and a composition layer is formed. Drying is performed by evaporating the solvent using a heating device such as a hot plate (so-called pre-baking), or using a decompression device. The heating temperature is preferably 50 to 200 ° C., and the heating time is preferably 10 to 180 seconds. Moreover, the pressure at the time of drying under reduced pressure is preferably 1 to 1.0 × 10 ⁵ Pa.

The obtained composition layer is usually exposed using an exposure machine. The exposure machine may be an immersion exposure machine. At this time, exposure is usually performed through a mask corresponding to a required pattern. Exposure light sources include those that emit laser light in the ultraviolet region, such as KrF excimer laser (wavelength 248 nm), ArF excimer laser (wavelength 193 nm), F ₂ excimer laser (wavelength 157 nm), solid-state laser light source (YAG or semiconductor laser) Etc.) Using various types of laser light such as those that convert wavelength of laser light from the laser and emit harmonic laser light in the far ultraviolet region or vacuum ultraviolet region, those that irradiate electron beams or extreme ultraviolet light (EUV), etc. Can do. In this specification, irradiating these radiations may be collectively referred to as “exposure”. The exposure is usually performed through a mask corresponding to a desired resist pattern. When the exposure light source is an electron beam, a desired pattern may be directly drawn without using a photomask.

  The composition layer after exposure is subjected to heat treatment (so-called post-exposure baking) in order to promote the deprotection reaction of the resin (A). The heating temperature is usually 50 to 200 ° C, preferably 70 to 150 ° C.

  The heated composition layer is usually developed using a developer using a developing device. Examples of the developing method include a dipping method, a paddle method, a spray method, and a dynamic dispensing method. The development temperature is preferably 5 to 60 ° C., and the development time is preferably 5 to 300 seconds.

By selecting the type of developer, a positive resist pattern or a negative resist pattern can be produced.
When producing a positive resist pattern from the resist composition of the present invention, an alkaline developer is used as the developer. The alkaline developer may be various alkaline aqueous solutions used in this field. Examples thereof include an aqueous solution of tetramethylammonium hydroxide and (2-hydroxyethyl) trimethylammonium hydroxide (commonly known as choline). The alkali developer may contain a surfactant.
It is preferable to wash the resist pattern with ultrapure water after development, and then remove the water remaining on the substrate and the pattern.

In the case of producing a negative resist pattern from the resist composition of the present invention, a developer containing an organic solvent as a developer (hereinafter sometimes referred to as “organic developer”) is used.
Organic solvents contained in the organic developer include ketone solvents such as 2-hexanone and 2-heptanone; glycol ether ester solvents such as propylene glycol monomethyl ether acetate; ester solvents such as butyl acetate; glycols such as propylene glycol monomethyl ether Examples include ether solvents; amide solvents such as N, N-dimethylacetamide; aromatic hydrocarbon solvents such as anisole.
In the organic developer, the content of the organic solvent is preferably 90% by mass or more, more preferably 95% by mass or more, and still more preferably only the organic solvent.
Among them, the organic developer is preferably a developer containing butyl acetate and / or 2-heptanone. In the organic developer, the total content of butyl acetate and 2-heptanone is preferably 50% by mass or more, more preferably 90% by mass or more, and substantially only butyl acetate and / or 2-heptanone. preferable.
The organic developer may contain a surfactant. The organic developer may contain a trace amount of water.
At the time of development, the development may be stopped by substituting a solvent of a different type from the organic developer.

It is preferable to wash the developed resist pattern with a rinse solution. The rinsing liquid is not particularly limited as long as it does not dissolve the resist pattern, and a solution containing a general organic solvent can be used, and an alcohol solvent or an ester solvent is preferable.
After the cleaning, it is preferable to remove the rinse solution remaining on the substrate and the pattern.

<Application>
The resist composition of the present invention is a resist composition for KrF excimer laser exposure, a resist composition for ArF excimer laser exposure, a resist composition for electron beam (EB) exposure, or a resist composition for EUV exposure, particularly a liquid. It is suitable as a resist composition for immersion exposure and useful for fine processing of semiconductors.

The present invention will be described more specifically with reference to examples. In the examples, “%” and “parts” representing the content or amount used are based on mass unless otherwise specified.
The structure of the compound was confirmed by NMR (GX-270 type or EX-270 type; manufactured by JEOL), mass spectrometry (LC; Agilent 1100 type, MASS; Agilent LC / MSD type or LC / MSD TOF type). .
The weight average molecular weight is a value determined by gel permeation chromatography under the following conditions.
Apparatus: HLC-8120GPC type (manufactured by Tosoh Corporation)
Column: TSKgel Multipore HXL-M x 3 + guardcolumn (manufactured by Tosoh Corporation)
Eluent: Tetrahydrofuran Flow rate: 1.0 mL / min
Detector: RI detector Column temperature: 40 ° C
Injection volume: 100 μl
Molecular weight standard: Standard polystyrene (manufactured by Tosoh Corporation)

式（Ｉ−１−ａ）で表される化合物３０．０部と式（Ｉ−１−ｂ）で表される化合物２８．２部とアセトニトリル１２０．０部とを混合した溶液に、硫酸１．６部を加えた。得られた混合物を、８０℃で２時間攪拌した。反応混合物に５％重曹溶液２００部を加えた。得られた混合物に酢酸エチルを加えて抽出操作し、酢酸エチル層を分離した。得られた酢酸エチル層をイオン交換水で洗浄した。水洗後の酢酸エチル層を減圧濃縮し、得られた残渣にアセトニトリルと2-メトキシ-2-メチルプロパンとの混合溶液を加えて攪拌した。得られた反応混合物の上澄みを除去し、残渣を乾燥することで、式（Ｉ−１−ｃ）で表される化合物２１．４５部を得た。


Example 1: Synthesis of salt (I) represented by formula (I-1)

To a solution obtained by mixing 30.0 parts of the compound represented by the formula (I-1-a), 28.2 parts of the compound represented by the formula (I-1-b), and 120.0 parts of acetonitrile, .6 parts were added. The resulting mixture was stirred at 80 ° C. for 2 hours. To the reaction mixture, 200 parts of 5% sodium bicarbonate solution was added. Ethyl acetate was added to the resulting mixture for extraction, and the ethyl acetate layer was separated. The obtained ethyl acetate layer was washed with ion exchange water. The ethyl acetate layer after washing with water was concentrated under reduced pressure, and a mixed solution of acetonitrile and 2-methoxy-2-methylpropane was added to the resulting residue and stirred. The supernatant of the obtained reaction mixture was removed, and the residue was dried to obtain 21.45 parts of a compound represented by the formula (I-1-c).

¹ H-NMR (DMSO-d ₆ ): δ = 6.2-5.9 (2H, m), 4.9-4.7 (3H, m),) 4.6-4.4 (1H, m), 2.0-1.6 (14H, m)

式（Ｉ−１−ｄ）で表される塩７部と、ジメチルホルムアミド３５部とを混合した溶液に、１，１’−カルボニルジイミダゾール２．８６部を加えた。得られた混合物を、室温で１時間攪拌した。反応混合物に、式（Ｉ−１−ｃ）で表される化合物５．４１部を加え、さらに室温で１時間攪拌した。反応混合物に５％炭酸水素ナトリウム水溶液３０部を加えた。得られた混合物にクロロホルムを加えて抽出操作し、クロロホルム層を分離した。得られたクロロホルム層をイオン交換水で洗浄した。水洗後のクロロホルム層を減圧濃縮し、得られた残渣にアセトニトリルと2-メトキシ-2-メチルプロパンとの混合溶液を加えて攪拌した。得られた反応混合物の上澄みを除去し、残渣を乾燥することで、式（Ｉ−１）で表される塩５．５９部を得た。

To a solution obtained by mixing 7 parts of the salt represented by the formula (I-1-d) and 35 parts of dimethylformamide, 2.86 parts of 1,1′-carbonyldiimidazole was added. The resulting mixture was stirred at room temperature for 1 hour. To the reaction mixture, 5.41 parts of a compound represented by the formula (I-1-c) was added, and the mixture was further stirred at room temperature for 1 hour. To the reaction mixture, 30 parts of 5% aqueous sodium hydrogen carbonate solution was added. Chloroform was added to the resulting mixture to perform extraction, and the chloroform layer was separated. The obtained chloroform layer was washed with ion exchange water. The chloroform layer after washing with water was concentrated under reduced pressure, and a mixed solution of acetonitrile and 2-methoxy-2-methylpropane was added to the resulting residue and stirred. The supernatant of the obtained reaction mixture was removed, and the residue was dried to obtain 5.59 parts of the salt represented by the formula (I-1).

MS (ESI (+) Spectrum): M ⁺ = 263.1 (C ₁₈ H ₁₅ S ⁺ = 263.1)
MS (ESI (−) Spectrum): M ⁻ = 465.1 (C ₁₈ H ₁₉ F ₂ O ₁₀
S ⁻ = 465.1)

式（Ｉ−２−ａ）で表される化合物２０部と、式（Ｉ−２−ｂ）で表される化合物２８．３部とアセトニトリル８０部とを混合した溶液に、硫酸１１．１部を加えた。得られた混合物を、室温で１８時間攪拌した。反応混合溶液に重曹９５部を加え、室温で１時間攪拌した。得られた反応混合溶液を濾過した後、ろ液を減圧濃縮した。得られた残渣に５％重曹水溶液２００ｇと酢酸エチルとを加えて抽出操作を行った。酢酸エチル層を分離し、得られた酢酸エチル層をイオン交換水で洗浄した。水洗後の酢酸エチル層を減圧濃縮し、得られた残渣にアセトニトリルと2-メトキシ-2-メチルプロパンとの混合溶液を加えて攪拌した。得られた反応混合物の上澄みを除去し、残渣を乾燥することで、式（Ｉ−２−ｃ）で表される化合物８．１５部を得た。 Example 2: Synthesis of salt (I) represented by formula (I-2)

To a solution obtained by mixing 20 parts of the compound represented by the formula (I-2-a), 28.3 parts of the compound represented by the formula (I-2-b) and 80 parts of acetonitrile, 11.1 parts of sulfuric acid Was added. The resulting mixture was stirred at room temperature for 18 hours. 95 parts of sodium bicarbonate was added to the reaction mixture and stirred at room temperature for 1 hour. The obtained reaction mixture solution was filtered, and the filtrate was concentrated under reduced pressure. An extraction operation was performed by adding 200 g of 5% aqueous sodium bicarbonate solution and ethyl acetate to the obtained residue. The ethyl acetate layer was separated, and the resulting ethyl acetate layer was washed with ion exchange water. The ethyl acetate layer after washing with water was concentrated under reduced pressure, and a mixed solution of acetonitrile and 2-methoxy-2-methylpropane was added to the resulting residue and stirred. The supernatant of the obtained reaction mixture was removed, and the residue was dried to obtain 8.15 parts of a compound represented by the formula (I-2-c).

¹ H-NMR (DMSO-d ₆ ): δ = 6.2-5.9 (2H, m), 4.9-4.6 (4H, m),) 4.5-4.4 (1H, m), 2.0-1.3 (13H, m)

式（Ｉ−２−ｄ）で表される塩７部と、ジメチルホルムアミド３５部とを混合した溶液に、１，１’−カルボニルジイミダゾール２．８６部を加えた。得られた混合物を、室温で１時間攪拌した。反応混合溶液に、式（Ｉ−２−ｃ）で表される化合物４．９２部を加え、さらに室温で１時間攪拌した。得られた反応混合溶液に５％炭酸水素ナトリウム水溶液３０部とクロロホルムとを加えて抽出操作を行った。クロロホルム層を分離し、得られたクロロホルム層をイオン交換水で洗浄した。水洗後のクロロホルム層を減圧濃縮し、得られた残渣にアセトニトリルと2-メトキシ-2-メチルプロパンとの混合溶液を加えて攪拌した。得られた反応混合物の上澄みを除去し、残渣を乾燥することで、式（Ｉ−２）で表される塩３．１５部を得た。

To a solution obtained by mixing 7 parts of the salt represented by the formula (I-2-d) and 35 parts of dimethylformamide, 2.86 parts of 1,1′-carbonyldiimidazole was added. The resulting mixture was stirred at room temperature for 1 hour. To the reaction mixture solution, 4.92 parts of the compound represented by the formula (I-2-c) was added, and the mixture was further stirred at room temperature for 1 hour. Extraction operation was performed by adding 30 parts of 5% aqueous sodium hydrogen carbonate solution and chloroform to the resulting reaction mixture. The chloroform layer was separated, and the resulting chloroform layer was washed with ion exchange water. The chloroform layer after washing with water was concentrated under reduced pressure, and a mixed solution of acetonitrile and 2-methoxy-2-methylpropane was added to the resulting residue and stirred. The supernatant of the obtained reaction mixture was removed, and the residue was dried to obtain 3.15 parts of the salt represented by the formula (I-2).

MS (ESI (+) Spectrum): M ⁺ = 263.1 (C ₁₈ H ₁₅ S ⁺ = 263.1)
MS (ESI (−) Spectrum): M ⁻ = 481.1 (C ₁₈ H ₁₉ F ₂ O ₁₁
S ⁻ = 481.1

Comparative Example 1 Synthesis of Salt Represented by Formula B3 Synthesized with reference to Example 5 of JP2010-248174A.

Synthesis of Resin (A) The compound (monomer) used for the synthesis of resin (A) is shown below. Hereinafter, these monomers are referred to as “monomer (M-1)” according to the formula number.

Synthesis Example 1: Synthesis of Resin A1 Monomer (M-1), Monomer (M-2), Monomer (M-4), and Monomer (M-3) have a molar ratio of 60: 4: 4: 32. It mixed so that it might become. To the obtained mixture, 1.5 mass times dioxane was added and mixed with respect to the total mass of all monomers. Into the obtained reaction mixture, azobisisobutyronitrile and azobis (2,4-dimethylvaleronitrile) as initiators were 1.7 mol% and 5.1 mol%, respectively, with respect to the total number of moles of all monomers. The ratio was added. The resulting mixture was heated at 73 ° C. for about 5 hours. The obtained reaction solution was poured into a large amount of a mixed solvent of methanol and water for precipitation, and filtered to obtain a resin. The obtained resin was dissolved again in dioxane, and the obtained solution was poured into a methanol / water mixed solvent to precipitate the resin, and purified by performing a reprecipitation operation twice to obtain the resin by filtration. A resin A1 (copolymer) having a weight average molecular weight of 6.6 × 10 ³ was obtained in a yield of 64%. Resin A1 has the following structural units.

Synthesis Example 2: Synthesis of Resin (F) 1.2 mass times of methyl isobutyl ketone was added to the monomer (MF-1) with respect to the mass of the monomer (MF-1). To the obtained mixture, 4 mol% of azobis (2,4-dimethylvaleronitrile) was added as an initiator based on the mass of the monomer (MF-1). The resulting mixture was heated at 75 ° C. for about 5 hours. The obtained reaction mixture was poured into a large amount of heptane to precipitate the resin and filtered to obtain the resin. The obtained resin was dissolved again in methyl isobutyl ketone, and the obtained solution was poured into heptane to precipitate the resin, followed by purification by performing the reprecipitation operation twice to obtain the resin by filtration. A resin F1 having a weight average molecular weight of 2.2 × 10 ⁴ was obtained with a yield of 89%. Resin (F) has the following structural units.

Synthesis of Resin A2 Synthesis was performed with reference to Example 5 of JP2010-248174A.
In a four-necked flask equipped with a condenser, a stirrer, and a thermometer, 29.6 g of 1,4-dioxane was charged and the temperature was adjusted to 73 ° C. Thereto, 12.8 g of the compound represented by the formula (E1), 6.0 g of the compound represented by the formula (E2), 16.0 g of the compound represented by the formula (E3), 3-hydroxy-1-adamantyl methacrylate (Compound represented by formula (E4)) 3.1 g, α-methacryloyloxy-γ-butyrolactone (compound represented by formula (E5)) 11.5 g, 2,2′-azobis (isobutyronitrile) ) A solution prepared by dissolving 0.36 g and 1.62 g of 2,2′-azobis (2,4-dimethylvaleronitrile) in 44.4 g of 1,4-dioxane was added dropwise over 2 hours. Thereafter, the temperature was kept for 5 hours while maintaining 73 ° C. After cooling to room temperature, the reaction product was poured into a mixed solution of 128 g of water and 514 g of methanol while stirring, and the resin was filtered off. The obtained resin was washed with methanol and then dried under reduced pressure to obtain a resin having the following structural units. This resin is designated as A2. In the obtained resin B1, the weight average molecular weight was 8,900 and the dispersity was 1.6.

Examples 3 and 4 and Comparative Example 1
<Preparation of resist composition>
Each of the components shown below was dissolved in the following solvent in parts by mass shown in Table 1, and further filtered through a fluororesin filter having a pore size of 0.2 μm to prepare a resist composition.

Ｂ２：式（Ｉ−２）で表される塩

Ｂ３：下記式で表される塩

＜塩基性化合物：クエンチャー＞
Ｃ１：２，６−ジイソプロピルアニリン（東京化成工業（株）製）
＜溶剤＞
溶剤Ｙ１：
プロピレングリコールモノメチルエーテルアセテート ６０部
シクロヘキサノン ２００部
γ−ブチロラクトン ３．５部
溶剤Ｙ２：
プロピレングリコールモノメチルエーテル ２４０部
２−ヘプタノン ２０部
プロピレングリコールモノメチルエーテルアセテート ２０部
γ−ブチロラクトン ３．５部 <Resin>
A1: Resin A1
A2: Resin A2
F1: Resin F1
<Acid generator>
B1: Salt represented by the formula (I-1)

B2: salt represented by formula (I-2)

B3: salt represented by the following formula

<Basic compound: Quencher>
C1: 2,6-diisopropylaniline (manufactured by Tokyo Chemical Industry Co., Ltd.)
<Solvent>
Solvent Y1:
Propylene glycol monomethyl ether acetate 60 parts Cyclohexanone 200 parts γ-butyrolactone 3.5 parts Solvent Y2:
Propylene glycol monomethyl ether 240 parts 2-heptanone 20 parts Propylene glycol monomethyl ether acetate 20 parts γ-butyrolactone 3.5 parts

<Manufacture of resist pattern>
An organic antireflective coating composition [ARC-29; manufactured by Nissan Chemical Industries, Ltd.] was applied onto a 12-inch silicon wafer, and baked under the conditions of 205 ° C. and 60 seconds, whereby an organic layer having a thickness of 78 nm was obtained. An antireflection film was formed. On the obtained organic antireflection film, the above resist composition was spin-coated so that the film thickness of the composition layer after drying (pre-baking) was 110 nm. After the coating, this silicon wafer was pre-baked on a direct hot plate at the temperature described in the “PB” column of Table 1 for 60 seconds to form a composition layer on the silicon wafer. An ArF excimer laser stepper for immersion exposure (XT: 1900 Gi; manufactured by ASML, NA = 1.35, Annular illumination, XY polarized light) is used as a hole pattern (pitch 110 nm) on the composition layer formed on the silicon wafer. Using a mask for forming (hole diameter 73 nm), exposure was performed while changing the exposure amount stepwise. Note that ultrapure water was used as the immersion medium.
After the exposure, post-exposure baking was performed for 60 seconds on the hot plate at the temperature described in the “PEB” column of Table 1. Next, the composition layer on the silicon wafer was subjected to paddle development for 60 seconds with a 2.38% tetramethylammonium hydroxide aqueous solution to obtain a resist pattern.
In the obtained resist pattern, the exposure amount at which the hole pattern diameter was 62 nm was defined as the effective sensitivity.

<Evaluation of mask error factor (MEF)>
In terms of effective sensitivity, a resist pattern was formed using masks having mask hole diameters (hole diameters of light transmitting portions of the mask) of 75 nm, 74 nm, 73 nm, and 72 nm (all hole pitches were 110 nm), respectively. The slope of the regression line when the mask hole diameter was plotted on the horizontal axis and the hole diameter of the resist pattern formed (transferred) on the substrate by exposure was plotted on the vertical axis was calculated as MEF.
The results are shown in Table 2.
Values in parentheses in the table indicate MEF values.
A sample having a MEF of 3.0 or less was indicated as ◯ as a good MEF.
A MEF exceeding 3.0 was expressed as x as an unsatisfactory MEF.

  From the above results, it can be seen that according to the resist composition of the present invention, a good MEF resist pattern can be produced.

  According to the salt of the present invention, a good MEF resist pattern can be produced from a resist composition containing the salt as an acid generator.

Claims (5)

A salt represented by the formula (I).

[In the formula (I),
R ¹ and R ² each independently represents an optionally substituted aliphatic hydrocarbon group having 1 to 12 carbon atoms, or a carbon atom to which R ¹ and R ² are bonded together And forms a ring having 5 to 20 carbon atoms.
R ³ and R ⁴ each independently represent a fluorine atom or a C 1-6 perfluoroalkyl group.
X ¹ represents a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and the hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, and is contained in the saturated hydrocarbon group —CH ₂ — may be replaced by —O— or —CO—.
Z1 ⁺ represents an organic cation. ]   An acid generator containing the salt according to claim 1.   A resist composition comprising the acid generator according to claim 2 and a resin.   4. The resist composition according to claim 3, wherein the resin is a resin having an acid labile group, insoluble or hardly soluble in an alkaline aqueous solution, and soluble in an alkaline aqueous solution by the action of an acid. (1) The process of apply | coating the resist composition of Claim 3 or 4 on a board | substrate;
(2) The process of drying the composition after application | coating and forming a composition layer;
(3) a step of exposing the composition layer;
(4) A step of heating the composition layer after exposure;
(5) A step of developing the composition layer after heating;
A method for producing a resist pattern including: