JP2014163834A - Macroparticle measurement method and measurement device, and substrate surface treatment method and surface treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a macroparticle measurement technique which evaluates a macroparticle to be generated during surface treatment more severely and quantitatively, to manage influence of the macroparticle on a substrate surface, thereby forming a thin film with excellent surface roughness.SOLUTION: A macroparticle measurement method includes: detecting optical signals from macroparticles passing through a predetermined real space area corresponding to a deposition area of a substrate, by means of optical detection means; image-processing the optical signals detected in the macroparticles to measure velocity component in a substrate direction of the macroparticles; determining the number of macroparticles passing through a unit cross section in parallel with the substrate surface in a unit time, on the basis of the measured velocity component of the macroparticles and volume of the real space area; and calculating the total sum of the number of macroparticles determined for each macroparticle, to measure occurrence state of the macroparticles.

Description

  The present invention relates to a method and an apparatus for measuring macro particles generated in a surface treatment technique, and a surface treatment method and a surface treatment apparatus for a substrate.

  In a surface treatment technique for forming a film on a substrate, a vapor deposition method such as a PVD method or a CVD method is often used.

  For example, the vacuum arc deposition method, which is a kind of PVD method, can easily control the film stress because of the high plasma density, and forms a mixed layer of the substrate and the film at the interface between the substrate and the film. Therefore, it is possible to form a film with extremely high adhesion.

  The film formation using this vacuum arc vapor deposition method will be described with reference to FIG. 10 schematically showing the configuration of a conventional vacuum arc vapor deposition apparatus. As shown in FIG. 10, in the vacuum chamber 1, a cathode 2 made of a film forming material is held and fixed on a backing plate 3, while a base material 4 a is held and fixed on a base material holder 4. Yes.

  First, the inside of the vacuum chamber 1 is evacuated to a predetermined degree of vacuum by an exhaust system such as a turbo molecular pump or a rotary pump (not shown). Thereafter, an arc discharge is started by applying a negative potential to the cathode 2 and a positive potential to the vacuum chamber 1 from a DC power source (not shown). Plasma 6 is generated in the vacuum chamber 1 by arc discharge, and the film forming material evaporates from the surface of the cathode 2 and jumps out. The evaporated film forming material reaches the base material 4a to which a negative potential is applied by the power source 5, and is formed on the surface of the base material 4a.

  At this time, when a material composed of a sintered material such as carbon or a high melting point sublimable material such as tungsten is used for the cathode 2, it is observed that a spark is generated from the cathode 2 and flies in the region of the plasma 6. It has been observed that the surface roughness of the film formed on the surface of the base material 4a by the film forming material deteriorates as the amount of sparks increases.

  This spark is generated when macroparticles 7 (also referred to as “droplets” in the case of metal materials), which are huge particles of several microns or more, are generated in the cathode 2 and are mixed with the plasma 6 as the film forming material evaporates. It is considered that the surface roughness of the film was deteriorated by the macro particles 7 flying on the surface of the substrate 4a.

  On the other hand, when a material composed of titanium, chromium, or the like is used for the cathode 2, the occurrence of sparks as described above is hardly observed, but the film formed as the discharge current in the arc discharge increases. Since deterioration of the surface roughness is observed, it is considered that macro particles that do not emit sparks are generated in the same manner in these film-forming materials that do not generate sparks.

  When a film having such a deteriorated surface roughness is used as a sliding material for machine parts, the mating material may be damaged.

  For this reason, by constantly monitoring the occurrence status of macro particles, according to the occurrence status, by appropriately closing the base shutter or stopping the discharge to control and manage the operating conditions of the device, It is necessary to prevent the macro particles from flying to the base material and suppress the deterioration of the surface roughness of the film, and various techniques have been proposed.

  For example, in Patent Document 1, in a film forming apparatus having a film forming source and an ion beam generating unit, macro particles that irradiate two laser beams and pass through an intersection thereof are formed using an optical method or the like. A technique is disclosed in which the flying speed of macro particles generated from a source is detected, and the surface of the film formation surface is subjected to ion beam etching according to the detected flying speed of the macro particles to prevent defect formation.

  However, in the case of this technique, the detection area remains in a very narrow area of several tens of μm level. As a result, strict evaluation cannot be performed for all macroparticles flying in the direction of the substrate, which is not sufficient as a technique for suppressing the deterioration of the surface roughness of the film.

  Therefore, in Patent Document 2, in a plasma processing apparatus using high-frequency plasma, the exhaust gas flowing through the gas exhaust line is irradiated with laser light, and scattered light from macro particles is imaged over a wide area with an I-CCD camera. However, there is shown a technique for detecting the number of macro particles in an imaging region by performing image processing on imaging data, and controlling and managing the operating conditions of the apparatus based on the result.

  However, even with this technique, it cannot be said that it is sufficient as a method for strictly and quantitatively evaluating the influence of macro particles on the substrate surface.

JP 2007-63577 A JP 2011-129749 A

  Therefore, the present invention more strictly and quantitatively evaluates the occurrence state of the macro particles generated when the surface treatment is performed by a vacuum arc vapor deposition method or the like, and manages the influence of the macro particles on the substrate surface. It is an object of the present invention to provide a macroparticle measurement method and measurement apparatus, and a substrate surface treatment method and surface treatment apparatus capable of obtaining a thin film with extremely excellent surface roughness.

  The present inventor examined why the generation state of macro particles could not be evaluated strictly and quantitatively by the conventional technique in examining the solution of the above-mentioned problem.

  As a result, the technique disclosed in Patent Document 2 basically assumes that the speed of the macro particles in the imaging region is constant, and the total number of macro particles based on the density and speed of the macro particles and the volume of the imaging region, Alternatively, since the number of macro particles per unit cross section was obtained, it was found that the generation state of the macro particles could not be sufficiently evaluated.

  That is, the macro particles generated from the cathode fly toward the base material at a speed of, for example, about several tens of m / h, but the flying speed is different for each macro particle. For this reason, even for macro particles measured simultaneously in the imaging region, the time to reach the surface of the substrate differs depending on the flight speed, and the amount of macro particles that reach the surface of the substrate changes per unit time To do.

  Then, since the surface roughness of the film changes with the change of the arrival amount, it has been found that the flight speed of each macro particle needs to be taken into account when measuring the macro particle.

  That is, for each macro particle measured in a predetermined real space region corresponding to the film formation region of the substrate, each macro particle passing through the unit cross section parallel to the substrate surface in unit time by considering the velocity component You can know the number of particles accurately.

  Then, a thin film with extremely excellent surface roughness can be obtained by strictly and quantitatively evaluating the generation state of the macro particles, and controlling and managing the operating conditions of the surface treatment apparatus based on the evaluation.

Specifically, the i-th macro particles in a real space domain, based on the velocity component v _i of the volume V and the macro particles in the real space domain, by applying equation (1), the unit time, based on The number F _i of each macro particle passing through a unit cross section parallel to the material surface is obtained as an index considering the velocity component.

  Then, when the number of macro particles is calculated for each of all the macro particles measured in the real space region, the sum (in the present invention, this is defined as “flux”) The total number of macro particles that pass through a unit cross section parallel to.

Specifically, the flux F is obtained by calculating the equation (2) the sum of F _i obtained in the above equation (1).

  Since the obtained flux F is an accurate total number of macro particles that pass through a unit cross section parallel to the substrate surface per unit time in consideration of the velocity component, the generation of macro particles is calculated by calculating the flux F. The situation can be accurately measured, and as a result, the influence of the macro particles on the substrate surface can be accurately evaluated and managed.

  The inventor has formed a thin film having a surface roughness that is deteriorated as the flux F is increased by various experiments, while a thin film having an excellent surface roughness is obtained as the flack F is decreased. It was confirmed that a film was formed.

The invention according to claim 1 is an invention based on the above findings,
A macro particle measuring method for measuring the occurrence state of macro particles generated when performing surface treatment of a substrate using a surface treatment apparatus,
Detecting a light signal from each of the macro particles passing through a predetermined real space region corresponding to the film formation region of the substrate using a light detection means,
Measure the velocity component of each macro particle in the substrate direction by image processing the optical signal detected in each macro particle,
Based on the measured velocity component of each macro particle and the volume of the real space region, the number of each macro particle passing through a unit cross section parallel to the substrate surface is determined per unit time,
Furthermore, by calculating the total number of macro particles determined for each macro particle,
It is a measuring method of a macro particle characterized by measuring the generation situation of the macro particle.

  In the present invention, as described above, the image processing is performed by detecting the optical signal from each macro particle in the predetermined real space region corresponding to the film forming region of the base material. All macro particles that affect film formation are targeted. Then, in a unit time, the number of each macro particle passing through the unit cross section parallel to the substrate surface is obtained based on the volume of the real space region and the velocity component of each macro particle, and the sum (flux) is calculated. Yes. In this way, the total number of macro particles that reach the substrate is calculated by taking into account the velocity component of each macro particle. By managing this flux, the occurrence of macro particles compared to the conventional technology Can be measured more accurately, and the influence of macro particles on the substrate surface can be more accurately evaluated and managed.

  In the invention of this claim, the “optical signal” is not only a visible light signal from a macro particle that shines in a spark shape, but also an irradiation with an infrared light signal or laser emitted from the non-lighting macro particle. Also includes scattered light signals that are emitted.

  Next, the inventors further studied, and the technique shown in the above invention can be applied without problems when the particle size of the macro particles is substantially the same or when the particle size distribution is substantially constant. It has been found that it is not enough when the particle size distribution of macro particles changes.

  That is, when macroparticles with large particle size adhere to the substrate, a thin film with a deteriorated surface roughness is formed as compared to when macroparticles with small particle size adhere to the substrate. In such a case, it is necessary to consider the particle size of each macro particle in addition to the macro particle velocity component described above.

  Therefore, first, for each macro particle measured in a predetermined real space region corresponding to the film formation region of the base material, a unit cross section parallel to the surface of the base material in a unit time in consideration of the velocity component as described above. Is obtained, and the product of the number of the obtained macro particles and the diameter of the macro particle is obtained.

Specifically, for the i-th macroparticle in the real space region, by applying Equation (3) based on the volume V of the real space region, the velocity component v _i and the diameter d _i of each macroparticle, the particle size distribution in the macro particles also considering the index VF _i is determined.

Then, VF _i (the product of the number of each macro particle and the diameter) obtained for each of all the macro particles measured in the real space region is summed, and the sum (in the present invention, this is referred to as “volume flux”). ”).

Specifically, the volume flux VF is obtained by obtaining the total sum of VF _i obtained by the above equation (3) by the equation (4).

  When the volume flux VF obtained above is used, if the number of generated macro particles is the same, the larger the macro particles are contained, the larger the volume flux VF and the worse the surface roughness. Is deposited. On the other hand, the smaller the macroparticle, the smaller the volume flux VF, and a thin film having excellent surface roughness is formed.

Invention of Claim 2 is invention based on said knowledge, Comprising:
A macro particle measuring method for measuring the occurrence state of macro particles generated when performing surface treatment of a substrate using a surface treatment apparatus,
Detecting a light signal from each of the macro particles passing through a predetermined real space region corresponding to the film formation region of the substrate using a light detection means,
Measure the diameter component of each macro particle and the velocity component in the substrate direction by image processing the optical signal detected in each macro particle,
Based on the measured diameter and velocity components of each macro particle and the volume of the real space region, the number of each macro particle passing through a unit cross section parallel to the substrate surface per unit time and the diameter Find the product
Furthermore, by calculating the sum of the product of the number of macro particles and the diameter obtained for each macro particle,
It is a measuring method of a macro particle characterized by measuring the generation situation of the macro particle.

  In the invention of this claim as well, since the same image processing as that of the invention of claim 1 is performed, substantially all macro particles that affect film formation are targeted. As described above, for each macro particle passing through a unit cross section parallel to the substrate surface per unit time, the volume flux is finally calculated by taking into account not only the velocity component but also the particle size distribution. Therefore, by managing this volume flux, it is possible to accurately measure the occurrence state of macro particles whose particle size distribution changes, and to accurately evaluate and manage the influence of macro particles on the substrate surface.

  In the invention of this claim, the diameter of each macro particle is used in calculating the volume flux, but the function is a function that monotonously increases / decreases with respect to the increase / decrease of the diameter, such as radius and volume related to the diameter of the macro particle. It is also included in the invention of this claim that the physical quantity that can be expressed is used in place of the diameter to perform the same calculation as the volume flux described above.

The invention according to claim 3
3. The macro particle measuring method according to claim 1, wherein a velocity component orthogonal to the surface of the substrate is used as a velocity component of the macro particles in the substrate direction.

  Each macro particle usually flies with an inclination with respect to the surface of the substrate. However, the velocity component that affects the film formation of each macro particle is a velocity component that is orthogonal to the surface of the substrate. Therefore, by using a velocity component orthogonal to the surface of the substrate as a velocity component in the substrate direction of each macro particle, it is possible to more accurately evaluate and manage the influence of the macro particles on the substrate surface. it can.

  In the present invention, the “velocity component orthogonal to the surface of the substrate” is not strictly limited to the velocity component orthogonal to the surface of the substrate, and the film is formed even if it is slightly inclined. Since the influence on the surface of the substrate can be regarded as substantially the same, it may be “a velocity component substantially orthogonal to the surface of the substrate”.

The invention according to claim 4
The macro particle measuring method according to claim 1, wherein a camera equipped with an image sensor is used as the light detection means.

  A camera equipped with an image sensor such as a CCD or CMOS has high sensitivity to light and low noise, and can detect an optical signal with high accuracy. In addition, these cameras are preferable as the light detection means because a wide real space region corresponding to the film formation region of the base material can be ensured reliably and easily.

  In addition, when the intensity of the optical signal of the macro particle is insufficient, a camera to which a light multiplication function is added can be used.

The invention described in claim 5
The generation state of the macro particles generated when the surface treatment of the base material is performed using a vacuum arc vapor deposition apparatus that forms a film by evaporating the cathode material by electric discharge. 5. The macro particle measurement method according to any one of items 4 to 5.

  Examples of the surface treatment method of the substrate to which the present invention is applied include various surface treatment methods such as a vacuum arc deposition method, an ion implantation method, an etching method, and a cleaning method. In the case of a vacuum arc vapor deposition method using a vacuum arc vapor deposition apparatus that forms a film by evaporating a material, the effect of the present invention can be exhibited particularly remarkably.

The invention described in claim 6
Using the macro particle measuring method according to any one of claims 1 to 5, the occurrence of macro particles is measured,
It is a substrate surface treatment method characterized by controlling and managing the operation status of the surface treatment apparatus based on the measurement result.

  By using the above macro particle measurement method, it is possible to accurately measure the occurrence of macro particles, and by controlling and managing the operation status of the surface treatment device based on the results, the surface roughness However, an extremely excellent thin film can be formed.

The invention described in claim 7
A macro particle measuring device that measures the occurrence state of macro particles generated when performing surface treatment of a substrate using a surface treatment device,
A light detection means for detecting a light signal from each of the macro particles passing through a predetermined real space region corresponding to a film formation region of the substrate;
Image processing means for measuring the velocity component of each macro particle by image processing the optical signal detected in each macro particle;
Based on the measured velocity component of each macro particle and the volume of the real space region, the number of each macro particle passing through the unit cross section parallel to the substrate surface is obtained per unit time, and further, for each macro particle. And a calculating means for calculating the total number of macroparticles determined in (1) above.

The invention according to claim 8 provides:
A macro particle measuring device that measures the occurrence state of macro particles generated when performing surface treatment of a substrate using a surface treatment device,
A light detection means for detecting a light signal from each of the macro particles passing through a predetermined real space region corresponding to a film formation region of the substrate;
Image processing means for measuring the diameter component of each macro particle and the velocity component in the substrate direction by image processing the optical signal detected in each macro particle;
Based on the measured diameter and velocity components of each macro particle and the volume of the real space region, the number of each macro particle passing through a unit cross section parallel to the substrate surface per unit time and the diameter A macro particle measuring apparatus comprising: a calculating unit that calculates a product, and further calculates a sum of products of the number and diameter of macro particles determined for each macro particle.

  The inventions described in the seventh and eighth aspects are the inventions of the method according to the first and second aspects of the present invention, which are captured from the viewpoint of the apparatus, and use these macro particle measuring apparatuses. Thus, as described above, the influence of the macro particles on the substrate surface can be more accurately evaluated and managed, and a thin film having extremely excellent surface roughness can be obtained.

The invention according to claim 9 is:
A substrate surface treatment apparatus comprising the macroparticle measurement apparatus according to claim 7 or 8.

  By providing the above macro particle measuring device, when the surface treatment of the substrate, it is possible to measure the occurrence of macro particles, and more accurately evaluate and manage the influence on the substrate surface, It is possible to provide a base material on which a thin film having an extremely excellent surface roughness is formed.

  According to the present invention, it is possible to more strictly and quantitatively evaluate the occurrence state of the macro particles generated when the surface treatment is performed by a vacuum arc deposition method or the like, and to manage the influence of the macro particles on the substrate surface. In addition, it is possible to provide a macro particle measurement method and measurement apparatus, and a substrate surface treatment method and surface treatment apparatus capable of obtaining a thin film with extremely excellent surface roughness.

It is a figure which shows typically the structure of the vacuum arc vapor deposition apparatus which concerns on embodiment of this invention. In the 1st Embodiment of this invention, it is a figure which shows typically the mode of the macro particle which passes an imaging region. It is a figure which shows the captured image which imaged the imaging area in the 1st Embodiment of this invention. In the 1st Embodiment of this invention, it is a figure which shows typically the mode of the macro particle which passes an imaging region. It is a figure which shows the captured image which imaged the imaging area in the 1st Embodiment of this invention. In the 2nd Embodiment of this invention, it is a figure which shows typically the mode of the macro particle which passes an imaging region. In the 2nd Embodiment of this invention, it is a figure which shows the captured image which imaged the imaging area. In the 2nd Embodiment of this invention, it is a figure which shows typically the mode of the macro particle which passes an imaging region. In the 2nd Embodiment of this invention, it is a figure which shows the captured image which imaged the imaging area. It is a figure which shows typically the structure of the conventional vacuum arc vapor deposition apparatus.

  Hereinafter, embodiments of the present invention will be specifically described. In the following, the surface treatment method of the substrate will be described by taking a vacuum arc deposition method as an example, but as described above, other surface treatment methods such as an ion implantation method, an etching method, a cleaning method, etc. Similarly, the present invention can be applied.

  FIG. 1 schematically shows a configuration of a vacuum arc vapor deposition apparatus according to the present embodiment. As shown in FIG. 1, the vacuum arc vapor deposition apparatus according to the present embodiment basically has the same configuration as the conventional vacuum arc vapor deposition apparatus shown in FIG. However, based on the image captured as an optical signal in the imaging region 11 by the camera 9, it differs from the conventional vacuum arc deposition apparatus in that it includes any of the calculation means shown in the following two embodiments. Yes.

1. First Embodiment In the first embodiment, the number of macro particles passing through a predetermined real space region corresponding to the film formation region of the base material is calculated in consideration of the velocity component of each macro particle, The vacuum arc vapor deposition apparatus has a calculation means for calculating the total number (flux) of the number of macro particles obtained for each macro particle. As described above, when the particle size of the macro particles is almost the same, or the particle size distribution It is preferable to apply in the case where is substantially constant.

FIG. 2 schematically shows the state of the macro particles 7 passing through the imaging region 11 in the present embodiment. Each macro _{particles, v 1, v 2, v} 3, ···, ( indicating the i-th macro particles) _v i, at a different velocity components as ..., based on the imaging area 11 Flying perpendicular to the surface of the material.

  For this reason, as described above, even when macro particles are simultaneously measured in the imaging region, the time to reach the surface of the base material varies depending on the velocity component, and the macro particle unit time is set to the surface of the base material. The amount reached will change.

  Therefore, in the present embodiment, the number of each macro particle passing through a unit cross section parallel to the substrate surface is accurately measured in unit time in consideration of the velocity component of each macro particle. .

Specifically, in FIG. 2, the volume of the imaging area 11 V, the sectional area of a cross section parallel to the substrate surface S, the i th component of velocity macro particles When v _i, the unit time, the base material The number of i-th macro particles passing through the cross section of the cross-sectional area S parallel to the surface is v _i S / V.

Accordingly, if the number of i-th macroparticles passing through a unit cross section parallel to the substrate surface per unit time is F _i , this F _i can be expressed as in equation (5), and F _i is obtained. Thus, it is possible to accurately know the number of each macro particle in consideration of the velocity component.

Then, when the number F _i of macro particles is obtained for each of all the macro particles measured in the real space region using the equation (5), the sum, that is, the flux F defined in this specification is expressed in units. In time, the total number of macro particles passing through a unit cross section parallel to the substrate surface is obtained, and can be expressed as in Equation (6).

At this time, since each F _i is obtained by detecting the optical signal from each macro particle in a predetermined real space region corresponding to the film formation region of the substrate, the calculation of the flux F is substantially This means that all macro particles that affect film formation are captured.

Then, the flux F is calculated by summing each F _i obtained in consideration of the velocity component of each macro particles, since the occurrence of macro particles has been accurately measured, based on the obtained flux F By controlling and managing the operating condition of the film forming apparatus, it is possible to accurately evaluate and manage the influence of the macro particles on the substrate surface, and to provide a thin film with excellent surface roughness.

Note that the velocity component v _i of each macro particle in Expression (5) and Expression (6) can be obtained using a captured image obtained by capturing the imaging region shown in FIG.

Specifically, assuming that the captured image 12 shown in FIG. 3 is obtained with an exposure time (so-called shutter time) t, the flight distance l _i of each macro particle flying within the exposure time, that is, FIG. each line segment length in the order is different depending on the respective speed component v _i, the velocity component of the i-th macro particles v _i, based on the exposure time t and flight distance l _i, equation (7) Can be obtained by using.

  Although specific imaging is usually performed at a frame rate of 30 frames / second, the present invention is not limited to this.

By applying equation (7) to v _i shown in equation (6), the flux F can be shown as equation (8).

Thus, in the above description, the velocity component of each macro particle can be easily obtained based on the exposure time t and the flight distance l _{i of} each macro particle.

  In the above description, it is assumed that each macro particle is flying in a direction perpendicular to the surface of the base material. Normally, however, each macro particle is as shown in FIG. The flying image is inclined with respect to the surface of the base material, and the captured image also shows a flight trajectory inclined with respect to the surface of the base material as shown in FIG.

  At this time, since the velocity component that affects the film formation of each macro particle is a velocity component orthogonal to the surface of the substrate, the velocity component of each macro particle in the substrate direction is the surface of the substrate. It is preferable to use a velocity component that is orthogonal to.

Specifically, when the i-th macro particle is flying at a velocity component v _i at a flight angle θ _i with respect to the substrate direction, the cross section of the cross-sectional area S parallel to the substrate surface per unit time. The number of i-th macro particles that pass through the unit is v _i · cos θ _i · S / V, and therefore, the number F _i of the i-th macro particles that pass through the unit cross section parallel to the substrate surface per unit time is given by It can be shown as (9).

  And the flux F which is the sum total can be shown like Formula (10) and Formula (11).

  As described above, the flux F calculated in the present embodiment accurately measures the occurrence state of the macro particles and accurately indicates the number of macro particles reaching the base material. As the flux F increases, the number of macroparticles that reach the substrate increases and a thin film whose surface roughness deteriorates is formed. On the other hand, the macroparticles that reach the substrate as the flux F decreases A thin film having a small number and excellent surface roughness is formed.

  For this reason, it is possible to strictly evaluate the influence of macro particles on the substrate surface based on the size of the flux, and based on the evaluation, control the operating conditions of the surface treatment device, such as opening and closing the substrate shutter. By controlling, it is possible to prevent the macro particles from flying to the base material and to form a thin film with extremely good surface roughness.

2. Second Embodiment In the second embodiment, not only the velocity component of each macro particle but also the particle size distribution is taken into account, and the macro particles passing through a predetermined real space region corresponding to the film forming region of the base material. The vacuum arc vapor deposition apparatus is provided with a calculation means for calculating a product of the number and the diameter, and further calculating a sum (volume flux) of the product of the number and the diameter of the macro particles determined for each macro particle, as described above. Furthermore, it is preferable to apply when the particle size of the macro particles changes.

FIG. 6 schematically shows a state of the macro particle 7 that passes through the imaging region 11 in the present embodiment. _{d 1, d 2, d 3} , ···, ( indicating the i-th macro particles) _d i, each macro particles of different diameters as ... _{is, v 1, v 2, v} 3 ,..., V _i ,... Fly at right angles to the surface of the base material in the imaging region 11 with different velocity components.

  As described above, when macro particles having a large particle size adhere to the substrate, a thin film having a deteriorated surface roughness is formed as compared with a case where macro particles having a small particle size adhere to the substrate. It is necessary to consider not only the velocity component of particles but also the size of macro particles.

  Therefore, in the present embodiment, in addition to the velocity component of each macro particle, the size (diameter) of each macro particle is also taken into account, and the occurrence state of the macro particle is measured.

Specifically, in FIG. 6, volume V of the imaging region 11, the cross-sectional area of a cross section parallel to the substrate surface S, i th diameter d _i of macro _particles, the velocity components and v _i, the unit time, the number and diameter of the product of the i-th macro particles pass through a unit cross section parallel cross-sectional area S on the substrate surface becomes d _{i v} i S _{/ V.}

Therefore, if the product of the number of macro particles and the diameter of the i-th macro particle passing through the unit cross section parallel to the substrate surface per unit time is VF _i , this VF _i is expressed as in equation (12). By obtaining VF _i , it is possible to measure the occurrence state of macro particles in consideration of the particle size distribution in addition to the velocity component.

Then, when the product of the number of macro particles and the diameter, that is, VF _i is obtained for each of all the macro particles measured in the real space region using the equation (12), the sum, ie, the present specification, is obtained. The volume flux VF defined in (1) can be expressed as in Equation (13).

At this time, since each VF _i is obtained by detecting an optical signal from each macro particle in a predetermined real space region corresponding to the film formation region of the substrate, the calculation of the volume flux VF is substantially performed. In other words, all the macro particles that affect the film formation are captured.

The volume flux VF was obtained by summing up each VF _i obtained by taking the velocity component and particle size distribution of each macro particle into account, and accurately measuring the occurrence of macro particles. By controlling and managing the operating condition of the film forming apparatus based on the volume flux VF, it is possible to accurately evaluate and manage the influence of macro particles on the substrate surface, and to provide a thin film with excellent surface roughness. it can.

Note that the velocity component v _i and the diameter d _i of each macro particle in Expression (12) and Expression (13) can be obtained using a captured image obtained by capturing the imaging region shown in FIG.

Specifically, assuming that the captured image 12 shown in FIG. 7 is obtained with an exposure time (so-called shutter time) t, the flight distance l _i of each macro particle flying within the exposure time, that is, FIG. each line segment length in the order is different depending on the respective speed component v _i, the velocity component of the i-th macro particles v _i, based on the exposure time t and flight distance l _i, equation (14) Can be obtained by using. The diameter d _i of the i-th macro particle can be obtained from the thickness of each line segment.

By applying equation (14) _{v i} shown in equation (13), the volume flux VF can be represented by the equation (15).

Thus, in the above, based on the exposure time t, the flight distance l _i and the diameter d _i of each macroparticle, the velocity component and the particle size distribution of each macroparticle are taken into account, and the number and diameter of each macroparticle are determined. The product can be obtained.

  In the above description, it is assumed that each macro particle is flying in a direction perpendicular to the surface of the base material. However, as described above, each macro particle is usually a figure. As shown in FIG. 8, the aircraft flies while being inclined with respect to the surface of the base material, and the captured image also shows a flight trajectory inclined with respect to the surface of the base material as shown in FIG. 9.

  At this time, since the velocity component that influences the film formation of each macro particle is a velocity component orthogonal to the surface of the substrate, the substrate of each macro particle is the same as in the case of the first embodiment. As the speed component in the direction, a speed component orthogonal to the surface of the substrate is preferably used.

Specifically, when the i-th macroparticle (diameter d _i ) is flying at a velocity component v _i at an angle θ _i with respect to the substrate direction, a break parallel to the substrate surface is taken per unit time. i th diameter and the product of the number of macro particles that pass through the cross section of the area S for the _{d i · v i · cosθ i} · S / V, in unit time, through a unit cross section parallel to the substrate surface The product of the diameter and the number of macro particles in the i-th macro particle, that is, VFi can be expressed as in Expression (16).

  And the volume flux VF which is the sum total can be shown like Formula (17) and Formula (18).

  As described above, since the volume flux calculated in the present embodiment accurately measures the generation state of macro particles, as described above, the thin film whose surface roughness deteriorates as the volume flux VF increases. On the other hand, as the volume flux VF is smaller, a thin film having a higher surface roughness is formed.

  For this reason, it is possible to strictly evaluate the influence of macro particles on the substrate surface based on the volume flux, and based on the evaluation, the operating conditions of the surface treatment device such as opening / closing of the substrate shutter can be determined. By controlling and managing, it is possible to prevent the macro particles from flying to the base material and form a thin film with extremely good surface roughness.

  In the above, the volume flux is calculated using the diameter of each macro particle. However, as described above, the radius and volume related to the diameter of the macro particle increase and decrease monotonously with the increase and decrease of the diameter. Using the physical quantity that can be expressed by the function to perform the same calculation as the above-described volume flux can be performed.

  For example, when the volume flux is calculated using the volume, Equation (15) becomes Equation (19), and Equation (18) becomes Equation (20).

When the volume flux is calculated using the physical quantity f (d _i ) that can be expressed by a function that increases and decreases monotonously with respect to the increase and decrease of the diameter, the expression (15) is expressed as the expression (21), Moreover, Formula (18) becomes like Formula (22).

  As mentioned above, although embodiment of this invention was described, this invention is not limited to said embodiment. Various modifications can be made to the above-described embodiment within the same and equivalent scope as the present invention.

1 vacuum chamber 2 cathode 3 the backing plate 4 substrate holder 4a substrate 5 Power 6 plasma 7 macro particles 8 window 9 camera 10 image processing apparatus 11 imaging area 12 captured images theta _i (the i-th macro particles) flight angle V imaging Region volume S Cross-sectional area

Claims (9)

A macro particle measuring method for measuring the occurrence state of macro particles generated when performing surface treatment of a substrate using a surface treatment apparatus,
Detecting a light signal from each of the macro particles passing through a predetermined real space region corresponding to the film formation region of the substrate using a light detection means,
Measure the velocity component of each macro particle in the substrate direction by image processing the optical signal detected in each macro particle,
Based on the measured velocity component of each macro particle and the volume of the real space region, the number of each macro particle passing through a unit cross section parallel to the substrate surface is determined per unit time,
Furthermore, by calculating the total number of macro particles determined for each macro particle,
A method for measuring macro particles, characterized by measuring a generation state of the macro particles. A macro particle measuring method for measuring the occurrence state of macro particles generated when performing surface treatment of a substrate using a surface treatment apparatus,
Detecting a light signal from each of the macro particles passing through a predetermined real space region corresponding to the film formation region of the substrate using a light detection means,
Measure the diameter component of each macro particle and the velocity component in the substrate direction by image processing the optical signal detected in each macro particle,
Based on the measured diameter and velocity components of each macro particle and the volume of the real space region, the number of each macro particle passing through a unit cross section parallel to the substrate surface per unit time and the diameter Find the product
Furthermore, by calculating the sum of the product of the number of macro particles and the diameter obtained for each macro particle,
A method for measuring macro particles, characterized by measuring a generation state of the macro particles.   3. The macro particle measuring method according to claim 1, wherein a velocity component orthogonal to the surface of the substrate is used as a velocity component of the macro particles in the substrate direction.   The macro particle measuring method according to claim 1, wherein a camera equipped with an image sensor is used as the light detection means.   The generation state of the macro particles generated when the surface treatment of the base material is performed using a vacuum arc vapor deposition apparatus that forms a film by evaporating the cathode material by electric discharge. Item 5. The method of measuring a macroparticle according to any one of Items4. Using the macro particle measuring method according to any one of claims 1 to 5, the occurrence of macro particles is measured,
A substrate surface treatment method characterized by controlling and managing an operating state of a surface treatment apparatus based on a measurement result. A macro particle measuring device that measures the occurrence state of macro particles generated when performing surface treatment of a substrate using a surface treatment device,
A light detection means for detecting a light signal from each of the macro particles passing through a predetermined real space region corresponding to a film formation region of the substrate;
Image processing means for measuring the velocity component of each macro particle by image processing the optical signal detected in each macro particle;
Based on the measured velocity component of each macro particle and the volume of the real space region, the number of each macro particle passing through the unit cross section parallel to the substrate surface is obtained per unit time, and further, for each macro particle. And a calculating means for calculating the total number of macro particles determined in step (b). A macro particle measuring device that measures the occurrence state of macro particles generated when performing surface treatment of a substrate using a surface treatment device,
A light detection means for detecting a light signal from each of the macro particles passing through a predetermined real space region corresponding to a film formation region of the substrate;
Image processing means for measuring the diameter component of each macro particle and the velocity component in the substrate direction by image processing the optical signal detected in each macro particle;
Based on the measured diameter and velocity components of each macro particle and the volume of the real space region, the number of each macro particle passing through a unit cross section parallel to the substrate surface per unit time and the diameter An apparatus for measuring a macro particle, comprising: a calculating unit that calculates a product, and further calculates a sum of products of the number and diameter of macro particles determined for each macro particle.   A surface treatment apparatus for a substrate, comprising the macro particle measurement apparatus according to claim 7.

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