JP2014147909A5 - - Google Patents
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- JP2014147909A5 JP2014147909A5 JP2013019334A JP2013019334A JP2014147909A5 JP 2014147909 A5 JP2014147909 A5 JP 2014147909A5 JP 2013019334 A JP2013019334 A JP 2013019334A JP 2013019334 A JP2013019334 A JP 2013019334A JP 2014147909 A5 JP2014147909 A5 JP 2014147909A5
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- 239000011248 coating agent Substances 0.000 claims description 117
- 238000000576 coating method Methods 0.000 claims description 117
- 238000010438 heat treatment Methods 0.000 claims description 83
- 238000009826 distribution Methods 0.000 claims description 12
- 239000011261 inert gas Substances 0.000 claims description 12
- 238000009529 body temperature measurement Methods 0.000 claims description 10
- 230000001678 irradiating Effects 0.000 claims description 9
- 230000000875 corresponding Effects 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 239000007921 spray Substances 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 2
- 230000011218 segmentation Effects 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 11
- 239000010410 layer Substances 0.000 description 7
- 239000011247 coating layer Substances 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 230000004043 responsiveness Effects 0.000 description 1
Description
以上の通り、本明細書には次の事項が開示されている。
（１）電離放射線硬化性を有する樹脂が含まれる塗膜を帯状の支持体上に形成し、上記支持体を搬送しつつ電離放射線を照射して上記塗膜を硬化させる塗膜硬化方法であって、
上記塗膜を、設定された加熱温度設定値に基づき加熱する加熱工程と、
上記支持体の加熱後に、電離放射線を上記塗膜に照射する電離放射線照射工程と、
上記電離放射線の照射後に、上記塗膜の表面温度を測定する表面温度測定工程と、
測定された上記表面温度に応じて、上記加熱温度設定値を変更する加熱温度制御工程と、を含む塗膜硬化方法。
この塗膜硬化方法によれば、酸素濃度や電離放射線の照射強度分布等の処理装置特有の影響を受けることなく、均等な硬化度の塗膜が高効率で得られる。
（２） （１）記載の塗膜硬化方法であって、
上記加熱工程は、上記支持体の搬送方向に直交する支持体幅方向に沿った複数箇所の加熱領域を、それぞれに設定された上記加熱温度設定値に基づき個別に加熱し、
上記表面温度測定工程は、上記支持体幅方向に沿った上記塗膜の表面温度分布を測定し、
上記加熱温度制御工程は、測定された上記表面温度分布に応じて、上記加熱領域それぞれの上記加熱温度設定値を変更する塗膜硬化方法。
この塗膜硬化方法によれば、塗膜の表面温度が異なる場合に、加熱温度を補正することで塗膜の表面温度を均一にすることができ、これにより、支持体幅方向に均等な硬化度の塗膜が得られる。
（３） （２）記載の塗膜硬化方法であって、
上記加熱温度制御工程は、上記支持体幅方向の両端部における上記加熱領域に対して、他の加熱領域より高い上記加熱温度設定値に変更する塗膜硬化方法。
この塗膜硬化方法によれば、同伴エアの影響により酸素濃度が高い支持体の幅方向両端部に対し、この支持体幅方向両端部の加熱温度を高めることで、硬化度不足を解消でき、硬化度の均等性が高められる。
（４） （２）又は（３）記載の塗膜硬化方法であって、
上記加熱温度制御工程は、上記塗膜に電離放射線を出射する出射窓からの上記支持体幅方向距離に応じて、上記加熱温度設定値を変更する塗膜硬化方法。
この塗膜硬化方法によれば、支持体上の塗膜が、照射する電離放射線の強度分布に応じた加熱温度に加熱されることで、電離放射線の強度分布によらずに均等な硬化度となる。
（５） （４）記載の塗膜硬化方法であって、
上記加熱温度制御工程は、上記電離放射線の強度が相対的に高い領域に対しては上記加熱温度設定値を低くし、相対的に低い領域に対しては上記加熱温度設定値を高く変更する塗膜硬化方法。
この塗膜硬化方法によれば、電離放射線の強度に応じて加熱温度を変更することで、塗膜の硬化度を支持体幅方向で均等にできる。
（６） （１）乃至（５）のいずれか一項記載の塗膜硬化方法であって。
上記加熱工程は、上記加熱温度設定値に基づき温度制御された不活性ガスを上記塗膜に吹き付ける塗膜硬化方法。
この塗膜硬化方法によれば、加熱された不活性ガスを塗膜に吹き付けることにより、雰囲気中の酸素と塗膜中のラジカルとの反応を阻害しつつ均一に塗膜を加温させることができる。
（７） （６）記載の塗膜硬化方法であって、
上記不活性ガスが窒素ガスである塗膜硬化方法。
この塗膜硬化方法によれば、窒素ガスを用いることで装置構成が簡単化できる。また、電離放射線照射雰囲気中の酸素濃度を増減調整する際に、空気（空気中の酸素）との混合率を制御することで済み、酸素濃度の調整が容易になる。
（８） （１）乃至（７）のいずれか一項記載の塗膜硬化方法であって、
上記電離放射線は電子線である塗膜硬化方法。
この塗膜硬化方法によれば、非磁性塗布層に対する電離放射線のエネルギーが高いため、塗布速度を上げることができ、生産性が向上する。
（９） （１）乃至（８）のいずれか一項記載の塗膜硬化方法により硬化させた上記塗膜上に、磁性層を形成して磁気記録媒体を製造する磁気記録媒体製造方法。
この磁気記録媒体製造方法によれば、磁気記録媒体の非磁性層膜を、安定して均等な硬化度にすることができ、これにより、磁性層を高精度に平滑化でき、高品質の磁気記録媒体を製造できる。
（１０） 電離放射線硬化性を有する樹脂が含まれる塗膜を帯状の支持体上に形成し、上記支持体を搬送しつつ電離放射線を照射して上記塗膜を硬化させる塗膜硬化装置であって、
上記塗膜を、設定された加熱温度設定値に基づき加熱する加熱部と、
電離放射線を上記塗膜に照射する電離放射線照射部と、
上記電離放射線の照射後における上記塗膜の表面温度を測定する表面温度測定部と、
測定された上記表面温度に応じて、上記加熱温度設定値を変更する加熱温度制御部と、を備える塗膜硬化装置。
この塗膜硬化装置によれば、酸素濃度や電離放射線の照射強度分布等の処理装置特有の影響を受けることなく、均等な硬化度の塗膜が高効率で得られる。
（１１） （１０）記載の塗膜硬化装置であって、
上記加熱部は、上記支持体の搬送方向に直交する支持体幅方向に沿った複数箇所に配置され、それぞれに設定された上記加熱温度設定値に基づき個別に加熱する分割加熱器を有し、
上記表面温度測定部は、上記支持体幅方向に沿った上記塗膜の表面温度分布を測定する温度センサを有し、
上記加熱温度制御部は、測定された上記表面温度分布に応じて、上記分割加熱器それぞれの上記加熱温度設定値を変更する塗膜硬化装置。
この塗膜硬化装置によれば、塗膜の表面温度が異なる場合に、加熱温度を補正することで塗膜の表面温度を均一にすることができ、これにより、支持体幅方向に均等な硬化度の塗膜が得られる。
（１２） （１１）記載の塗膜硬化装置であって、
上記表面温度測定部は、上記支持体幅方向の異なる位置で上記塗膜の表面温度を測定する複数の温度センサを有する塗膜硬化装置。
この塗膜硬化装置によれば、複数の温度センサを用いることで温度の測定精度が向上し、これにより塗膜の硬化度をより均等にできる。
（１３） （１２）記載の塗膜硬化装置であって、
上記複数の温度センサは、上記分割加熱器の上記支持体幅方向に対する各配置位置に対応して配置され、
上記加熱温度制御部は、上記分割加熱器それぞれの上記加熱温度設定値を、その分割加熱器に対して上記支持体幅方向で対応する位置に配置された上記温度センサによる表面温度測定結果に応じて変更する塗膜硬化装置。
この塗膜硬化装置によれば、各分割加熱器の加熱温度設定値を、支持体幅方向に対応する位置となる温度センサの表面温度測定結果に応じて変更することで、高い応答性で簡単に温度制御が行える。
（１４） （１２）又は（１３）記載の塗膜硬化装置であって、
上記電離放射線照射部は、上記支持体幅方向に沿って、電離放射線が出射される複数の出射窓を有し、
上記出射窓の上記支持体幅方向の位置に対応して配置される上記分割加熱器を第１分割加熱器、上記第１分割加熱器同士の間に配置される上記分割加熱器を第２分割加熱器とした場合に、
上記加熱温度制御部は、上記第２分割加熱器に対する上記加熱温度設定値を、上記第１分割加熱器に対する上記加熱温度設定値より高くする塗膜硬化装置。
この塗膜硬化装置によれば、出射窓間の電離放射線照射強度の相対的に低い部分についても、この電離放射線強度の低い部分の加熱温度を高めることで硬化度不足を解消でき、硬化度の均等性が高められる。
（１５） （１１）乃至（１４）のいずれか一項記載の塗膜硬化装置であって、
上記分割加熱器は、上記加熱温度設定値に基づいて不活性ガスを加熱するヒータと、上記ヒータにより加熱された不活性ガスを上記支持体に向けて噴射供給するノズルと、を有する塗膜硬化装置。
この塗膜硬化装置によれば、加熱された不活性ガスを塗膜に吹き付けることにより、雰囲気中の酸素と塗膜中のラジカルとの反応を阻害しつつ均一に塗膜を加温させることができる。
（１６） （１５）記載の塗膜硬化装置であって、
上記不活性ガスが窒素ガスである塗膜硬化装置。
この塗膜硬化装置によれば、窒素ガスを用いることで装置構成が簡単化できる。また、電離放射線照射雰囲気中の酸素濃度を調整する際に、空気（空気中の酸素）との混合率を制御することで済み、酸素濃度の調整が容易になる。
（１７） （１０）乃至（１６）のいずれか一項記載の塗膜硬化装置であって、
上記電離放射線照射部は、電子線を照射する塗膜硬化装置。
この塗膜硬化装置によれば、非磁性塗布層に対する電離放射線のエネルギーが高いため、塗布速度を上げることができ、生産性が向上する。
（１８） 上記（１０）乃至（１７）のいずれか一項記載の塗膜硬化装置と、
上記支持体上に上記塗膜を形成する塗膜形成部と、
硬化させた上記塗膜上に、磁性層を形成する磁性層形成部と、
を備える磁気記録媒体製造装置。
この磁気記録媒体製造装置によれば、磁気記録媒体の非磁性層膜を、安定して均等な硬化度にすることができ、これにより、磁性層を高精度に平滑化でき、高品質の磁気記録媒体を製造できる。
As described above, the following items are disclosed in this specification.
(1) A coating film curing method in which a coating film containing a resin having ionizing radiation curability is formed on a belt-like support, and the coating film is cured by irradiating ionizing radiation while transporting the support. And
A heating step of heating the coating film based on a set heating temperature setting value;
An ionizing radiation irradiation step of irradiating the coating film with ionizing radiation after heating the support;
A surface temperature measuring step for measuring the surface temperature of the coating film after irradiation with the ionizing radiation;
A heating temperature control step of changing the heating temperature set value in accordance with the measured surface temperature.
According to this coating film curing method, a coating film having an even degree of curing can be obtained with high efficiency without being influenced by the processing apparatus such as the oxygen concentration and the irradiation intensity distribution of ionizing radiation.
(2) The coating film curing method according to (1),
The heating step individually heats a plurality of heating regions along the support width direction orthogonal to the transport direction of the support based on the heating temperature set value set for each,
The surface temperature measurement step measures the surface temperature distribution of the coating film along the support width direction,
The said heating temperature control process is a coating-film hardening method which changes the said heating temperature setting value of each said heating area | region according to the said measured surface temperature distribution.
According to this coating film curing method, when the surface temperature of the coating film is different, it is possible to make the surface temperature of the coating film uniform by correcting the heating temperature, and thereby uniform curing in the width direction of the support. Degree of coating film is obtained.
(3) The coating film curing method according to (2),
The said heating temperature control process is a coating-film hardening method which changes to the said heating temperature setting value higher than another heating area | region with respect to the said heating area | region in the both ends of the said support body width direction.
According to this coating film curing method, by increasing the heating temperature of both ends of the support in the width direction of the support in the width direction of the support having a high oxygen concentration due to the influence of entrained air, the lack of curing can be eliminated, The uniformity of the degree of cure is increased.
(4) The coating film curing method according to (2) or (3),
The said heating temperature control process is a coating-film hardening method which changes the said heating temperature setting value according to the said support body width direction distance from the exit window which radiate | emits ionizing radiation to the said coating film.
According to this coating film curing method, the coating film on the support is heated to a heating temperature corresponding to the intensity distribution of the ionizing radiation to be irradiated, so that the degree of cure is uniform regardless of the intensity distribution of the ionizing radiation. Become.
(5) The coating film curing method according to (4),
In the heating temperature control step, the heating temperature set value is lowered for a region where the intensity of the ionizing radiation is relatively high, and the heating temperature set value is changed high for a region where the intensity is relatively low. Film curing method.
According to this coating film curing method, the degree of curing of the coating film can be made uniform in the support width direction by changing the heating temperature according to the intensity of ionizing radiation.
(6) The coating film curing method according to any one of (1) to (5).
The said heating process is a coating-film hardening method which sprays the inert gas by which temperature control was carried out based on the said heating temperature setting value to the said coating film.
According to this coating film curing method, by heating a heated inert gas to the coating film, the coating film can be uniformly heated while inhibiting the reaction between oxygen in the atmosphere and radicals in the coating film. it can.
(7) The coating film curing method according to (6),
A coating film curing method wherein the inert gas is nitrogen gas.
According to this coating film curing method, the apparatus configuration can be simplified by using nitrogen gas. Further, when adjusting the oxygen concentration in the ionizing radiation irradiation atmosphere to increase or decrease, it is only necessary to control the mixing ratio with air (oxygen in the air), and the oxygen concentration can be easily adjusted.
(8) The coating film curing method according to any one of (1) to (7),
The coating ion curing method, wherein the ionizing radiation is an electron beam.
According to this coating film curing method, since the energy of ionizing radiation for the nonmagnetic coating layer is high, the coating speed can be increased and the productivity is improved.
(9) A magnetic recording medium manufacturing method for manufacturing a magnetic recording medium by forming a magnetic layer on the coating film cured by the coating film curing method according to any one of (1) to (8).
According to this method of manufacturing a magnetic recording medium, the nonmagnetic layer film of the magnetic recording medium can be stably made to have a uniform degree of cure, and thereby the magnetic layer can be smoothed with high accuracy and high quality magnetic A recording medium can be manufactured.
(10) A coating film curing apparatus that forms a coating film containing a resin having ionizing radiation curability on a belt-like support and irradiates ionizing radiation while transporting the support to cure the coating film. And
A heating unit that heats the coating film based on a set heating temperature setting value;
An ionizing radiation irradiating unit for irradiating the coating film with ionizing radiation;
A surface temperature measuring unit for measuring the surface temperature of the coating film after irradiation with the ionizing radiation;
A coating temperature curing device comprising: a heating temperature control unit that changes the heating temperature setting value according to the measured surface temperature.
According to this coating film curing apparatus, a coating film having an even degree of curing can be obtained with high efficiency without being influenced by the processing apparatus, such as oxygen concentration and irradiation intensity distribution of ionizing radiation.
(11) The coating film curing apparatus according to (10),
The heating unit is arranged at a plurality of locations along the support width direction orthogonal to the transport direction of the support, and has a divided heater that individually heats based on the heating temperature set value set for each,
The surface temperature measurement unit has a temperature sensor that measures the surface temperature distribution of the coating film along the support width direction,
The said heating temperature control part is a coating-film hardening apparatus which changes the said heating temperature setting value of each said division | segmentation heater according to the said measured surface temperature distribution.
According to this coating film curing apparatus, when the surface temperature of the coating film is different, it is possible to make the surface temperature of the coating film uniform by correcting the heating temperature, and thereby uniform curing in the support width direction. Degree of coating film is obtained.
(12) The coating film curing apparatus according to (11),
The said surface temperature measurement part is a coating-film hardening apparatus which has several temperature sensor which measures the surface temperature of the said coating film in the position from which the said support body width direction differs.
According to this coating film curing apparatus, the temperature measurement accuracy is improved by using a plurality of temperature sensors, and thereby the degree of curing of the coating film can be made more uniform.
(13) The coating film curing apparatus according to (12),
The plurality of temperature sensors are arranged corresponding to each arrangement position with respect to the support width direction of the divided heater,
The heating temperature control unit determines the heating temperature set value of each of the divided heaters according to a surface temperature measurement result by the temperature sensor disposed at a position corresponding to the divided heater in the width direction of the support. Coating device to change.
According to this coating film curing device, the heating temperature set value of each divided heater is changed according to the surface temperature measurement result of the temperature sensor at the position corresponding to the support width direction, and it is easy with high responsiveness. Temperature control.
(14) The coating film curing apparatus according to (12) or (13),
The ionizing radiation irradiation unit has a plurality of emission windows from which ionizing radiation is emitted along the width direction of the support,
The divided heater arranged corresponding to the position of the exit window in the width direction of the support is the first divided heater, and the divided heater arranged between the first divided heaters is divided into the second divided heater. When using a heater,
The coating temperature curing unit, wherein the heating temperature control unit makes the heating temperature set value for the second divided heater higher than the heating temperature set value for the first divided heater.
According to this coating film curing apparatus, even with a relatively low part of the ionizing radiation irradiation intensity between the exit windows, the insufficient curing degree can be eliminated by increasing the heating temperature of the part with the low ionizing radiation intensity. Uniformity is increased.
(15) The coating film curing apparatus according to any one of (11) to (14),
The divided heater includes a heater that heats an inert gas based on the heating temperature set value, and a nozzle that has a nozzle that sprays the inert gas heated by the heater toward the support. apparatus.
According to this coating film curing apparatus, by heating a heated inert gas to the coating film, the coating film can be uniformly heated while inhibiting the reaction between oxygen in the atmosphere and radicals in the coating film. it can.
(16) The coating film curing apparatus according to (15),
A coating film curing apparatus in which the inert gas is nitrogen gas.
According to this coating film curing apparatus, the apparatus configuration can be simplified by using nitrogen gas. Further, when adjusting the oxygen concentration in the ionizing radiation irradiation atmosphere, it is only necessary to control the mixing ratio with air (oxygen in the air), and the oxygen concentration can be easily adjusted.
(17) The coating film curing apparatus according to any one of (10) to (16),
The ionizing radiation irradiation unit is a coating film curing device that irradiates an electron beam.
According to this coating film curing apparatus, since the energy of ionizing radiation for the nonmagnetic coating layer is high, the coating speed can be increased and the productivity is improved.
(18) The coating film curing apparatus according to any one of (10) to (17),
A coating film forming part for forming the coating film on the support;
On the cured coating film, a magnetic layer forming part for forming a magnetic layer,
A magnetic recording medium manufacturing apparatus comprising:
According to this magnetic recording medium manufacturing apparatus, the non-magnetic layer film of the magnetic recording medium can be stably made to have a uniform degree of curing, whereby the magnetic layer can be smoothed with high accuracy and high quality magnetic A recording medium can be manufactured.
Claims (18)
前記塗膜を、設定された加熱温度設定値に基づき加熱する加熱工程と、
前記支持体の加熱後に、電離放射線を前記塗膜に照射する電離放射線照射工程と、
前記電離放射線の照射後に、前記塗膜の表面温度を測定する表面温度測定工程と、
測定された前記表面温度に応じて、前記加熱温度設定値を変更する加熱温度制御工程と、を含む塗膜硬化方法。 A coating film curing method comprising forming a coating film containing a resin having ionizing radiation curability on a belt-shaped support, and curing the coating film by irradiating ionizing radiation while transporting the support,
A heating step of heating the coating film based on a set heating temperature setting value;
An ionizing radiation irradiation step of irradiating the coating film with ionizing radiation after heating the support;
A surface temperature measuring step for measuring the surface temperature of the coating film after irradiation with the ionizing radiation;
A heating temperature control step of changing the heating temperature set value in accordance with the measured surface temperature.
前記加熱工程は、前記支持体の搬送方向に直交する支持体幅方向に沿った複数箇所の加熱領域を、それぞれに設定された前記加熱温度設定値に基づき個別に加熱し、
前記表面温度測定工程は、前記支持体幅方向に沿った前記塗膜の表面温度分布を測定し、
前記加熱温度制御工程は、測定された前記表面温度分布に応じて、前記加熱領域それぞれの前記加熱温度設定値を変更する塗膜硬化方法。 The coating film curing method according to claim 1,
The heating step individually heats a plurality of heating regions along a support width direction orthogonal to the transport direction of the support based on the heating temperature set value set for each,
The surface temperature measurement step measures the surface temperature distribution of the coating film along the support width direction,
The said heating temperature control process is a coating-film hardening method which changes the said heating temperature setting value of each said heating area | region according to the said surface temperature distribution measured.
前記加熱温度制御工程は、前記支持体幅方向の両端部における前記加熱領域に対して、他の加熱領域より高い前記加熱温度設定値に変更する塗膜硬化方法。 It is a coating-film hardening method of Claim 2, Comprising:
The said heating temperature control process is a coating-film hardening method which changes to the said heating temperature setting value higher than another heating area | region with respect to the said heating area | region in the both ends of the said support body width direction.
前記加熱温度制御工程は、前記塗膜に電離放射線を出射する出射窓からの前記支持体幅方向距離に応じて、前記加熱温度設定値を変更する塗膜硬化方法。 It is a coating-film hardening method of Claim 2 or Claim 3, Comprising:
The said heating temperature control process is a coating-film hardening method which changes the said heating temperature setting value according to the said support body width direction distance from the exit window which radiate | emits ionizing radiation to the said coating film.
前記加熱温度制御工程は、前記電離放射線の強度が相対的に高い領域に対しては前記加熱温度設定値を低くし、相対的に低い領域に対しては前記加熱温度設定値を高く変更する塗膜硬化方法。 It is a coating-film hardening method of Claim 4, Comprising:
In the heating temperature control step, the heating temperature setting value is lowered for a region where the intensity of the ionizing radiation is relatively high, and the heating temperature setting value is changed high for a region where the intensity is relatively low. Film curing method.
前記加熱工程は、前記加熱温度設定値に基づき温度制御された不活性ガスを前記塗膜に吹き付ける塗膜硬化方法。 It is a coating-film hardening method as described in any one of Claims 1 thru | or 5.
The said heating process is a coating-film hardening method which sprays the inert gas temperature-controlled based on the said heating temperature setting value on the said coating film.
前記不活性ガスが窒素ガスである塗膜硬化方法。 The coating film curing method according to claim 6,
A coating film curing method, wherein the inert gas is nitrogen gas.
前記電離放射線は電子線である塗膜硬化方法。 It is a coating-film hardening method as described in any one of Claim 1 thru | or 7, Comprising:
The coating ion curing method, wherein the ionizing radiation is an electron beam.
前記塗膜を、設定された加熱温度設定値に基づき加熱する加熱部と、
電離放射線を前記塗膜に照射する電離放射線照射部と、
前記電離放射線の照射後における前記塗膜の表面温度を測定する表面温度測定部と、
測定された前記表面温度に応じて、前記加熱温度設定値を変更する加熱温度制御部と、を備える塗膜硬化装置。 A coating film curing apparatus for forming a coating film containing a resin having ionizing radiation curability on a belt-shaped support, and curing the coating film by irradiating ionizing radiation while transporting the support,
A heating unit for heating the coating film based on a set heating temperature set value;
An ionizing radiation irradiating part for irradiating the coating film with ionizing radiation;
A surface temperature measuring unit for measuring the surface temperature of the coating film after irradiation with the ionizing radiation;
A coating temperature curing device comprising: a heating temperature control unit that changes the heating temperature setting value according to the measured surface temperature.
前記加熱部は、前記支持体の搬送方向に直交する支持体幅方向に沿った複数箇所に配置され、それぞれに設定された前記加熱温度設定値に基づき個別に加熱する分割加熱器を有し、
前記表面温度測定部は、前記支持体幅方向に沿った前記塗膜の表面温度分布を測定する温度センサを有し、
前記加熱温度制御部は、測定された前記表面温度分布に応じて、前記分割加熱器それぞれの前記加熱温度設定値を変更する塗膜硬化装置。 The coating film curing apparatus according to claim 10,
The heating unit is disposed at a plurality of locations along a support width direction orthogonal to the transport direction of the support, and has a divided heater that individually heats based on the heating temperature set value set for each,
The surface temperature measurement unit has a temperature sensor that measures a surface temperature distribution of the coating film along the support width direction,
The said heating temperature control part is a coating-film hardening apparatus which changes the said heating temperature setting value of each of the said division | segmentation heater according to the measured said surface temperature distribution.
前記表面温度測定部は、前記支持体幅方向の異なる位置で前記塗膜の表面温度を測定する複数の温度センサを有する塗膜硬化装置。 The coating film curing apparatus according to claim 11,
The said surface temperature measurement part is a coating-film hardening apparatus which has several temperature sensor which measures the surface temperature of the said coating film in the position where the said support body width direction differs.
前記複数の温度センサは、前記分割加熱器の前記支持体幅方向に対する各配置位置に対応して配置され、
前記加熱温度制御部は、前記分割加熱器それぞれの前記加熱温度設定値を、当該分割加熱器に対して前記支持体幅方向で対応する位置に配置された前記温度センサによる表面温度測定結果に応じて変更する塗膜硬化装置。 The coating film curing apparatus according to claim 12, wherein
The plurality of temperature sensors are arranged corresponding to the arrangement positions of the divided heaters with respect to the support width direction,
The heating temperature control unit responds to the surface temperature measurement result by the temperature sensor arranged at a position corresponding to the divided heater in the width direction of the support with respect to the divided heater. Coating device to change.
前記電離放射線照射部は、前記支持体幅方向に沿って、電離放射線が出射される複数の出射窓を有し、
前記出射窓の前記支持体幅方向の位置に対応して配置される前記分割加熱器を第１分割加熱器、前記第１分割加熱器同士の間に配置される前記分割加熱器を第２分割加熱器とした場合に、
前記加熱温度制御部は、前記第２分割加熱器に対する前記加熱温度設定値を、前記第１分割加熱器に対する前記加熱温度設定値より高くする塗膜硬化装置。 The coating film curing apparatus according to claim 12 or 13,
The ionizing radiation irradiation unit has a plurality of exit windows from which ionizing radiation is emitted along the width direction of the support,
The divided heater arranged corresponding to the position of the exit window in the width direction of the support is a first divided heater, and the divided heater arranged between the first divided heaters is divided into second parts. When using a heater,
The said heating temperature control part is a coating-film hardening apparatus which makes the said heating temperature setting value with respect to the said 2nd division heater higher than the said heating temperature setting value with respect to the said 1st division heater.
前記分割加熱器は、前記加熱温度設定値に基づいて不活性ガスを加熱するヒータと、前記ヒータにより加熱された不活性ガスを前記支持体に向けて噴射供給するノズルと、を有する塗膜硬化装置。 A coating film curing apparatus according to any one of claims 11 to 14,
The divided heater includes a heater that heats an inert gas based on the heating temperature set value, and a nozzle that has a nozzle that sprays the inert gas heated by the heater toward the support. apparatus.
前記不活性ガスが窒素ガスである塗膜硬化装置。 The coating film curing apparatus according to claim 15,
A coating film curing apparatus in which the inert gas is nitrogen gas.
前記電離放射線照射部は、電子線を照射する塗膜硬化装置。 The coating film curing apparatus according to any one of claims 10 to 16,
The ionizing radiation irradiation unit is a coating film curing device that irradiates an electron beam.
前記支持体上に前記塗膜を形成する塗膜形成部と、
硬化させた前記塗膜上に、磁性層を形成する磁性層形成部と、を備える磁気記録媒体製造装置。 A coating film curing apparatus according to any one of claims 10 to 17,
A coating film forming part for forming the coating film on the support;
A magnetic recording medium manufacturing apparatus comprising: a magnetic layer forming unit that forms a magnetic layer on the cured coating film.
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