JP2014142394A - Display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve viewing angle characteristics in a MEMS display.SOLUTION: An opposing substrate 54 includes, corresponding to pixels, a plurality of openings 72 capable of transmitting light used for image display. A TFT substrate 52 is provided for each of the openings 72, and includes a shutter part 74 that can be driven to open and close the opening 72. The shutter part 74 includes an incident surface formed into a concave shape that receives incidence of light from a backlight unit 82 when the opening 72 is closed.

Description

  The present invention relates to a display device using a mechanical shutter.

  A MEMS display (Micro Electro Mechanical System Display) is a display expected to replace a liquid crystal display (see Patent Document 1). Unlike a liquid crystal shutter system using polarized light, this display opens and closes an opening through which light is transmitted by a mechanical shutter system. Specifically, a TFT substrate on which a TFT (Thin Film Transistor) is formed is provided with a shutter for each pixel. By operating the shutter in the horizontal direction, a light shielding film on a substrate disposed opposite to the TFT substrate is provided. An image is displayed by opening and closing the formed opening (fixed opening).

  The shutter can be driven by being arranged with a gap between it and a light shielding film in which a fixed opening is formed. Since the distance that the shutter can be displaced is small, the fixed opening is elongated and the shutter is moved in the short direction.

JP 2008-197668 A

  As described above, a gap is provided between the fixed opening and the shutter. Therefore, when the shutter is in the closed state, if the overlap between the shutter and the light shielding film at the fixed opening edge is not sufficiently secured, the light incident obliquely on the light shielding film surface from a light source such as a backlight is Can pass through the gap. Due to this influence, there is a problem of viewing angle characteristics that the luminance varies depending on the viewing direction. Further, this problem is more affected in the shorter direction than in the longitudinal direction of the shutter because the ratio of light that can pass is larger.

  Furthermore, since the amount of displacement of the shutter is limited, the retreat distance from the edge of the fixed opening cannot be increased when the shutter is open. Therefore, in the open state where the shutter is retracted from the position where the fixed opening is closed, the light traveling perpendicularly to the screen or the light traveling obliquely along the longitudinal direction passes through the opening, but along the lateral direction. The light traveling obliquely is easily blocked by the shutter retracted to the side of the fixed opening, and this phenomenon also has a great influence on the viewing angle characteristics.

  18 and 19 are schematic views of a vertical section of a conventional MEMS display showing this state, and are cross sections along the short direction of the fixed opening. In FIG. 18, the shutter 2 supported on the TFT substrate 1 with a beam or the like (not shown) is in a position to close the opening 5 (fixed opening) provided in the light shielding film 4 of the counter substrate 3. Light enters the opening 5 from a backlight unit (not shown) disposed on the counter substrate 3, and when the shutter 2 is in an open state, the light is transmitted downward through the TFT substrate 1 in FIG. Exits from. On the other hand, as shown in FIG. 18, in the closed state, basically, light incident on the opening 5 from the backlight unit is blocked from being transmitted to the display surface by the shutter 2 (light ray 10a). However, the light beam 10b having an inclination from the perpendicular of the opening 5 is reflected by the shutter 2 or the light shielding film 4 through the gap between the light shielding film 4 and the shutter 2, or directly passes through and leaks to the TFT substrate 1 side and stray light. 10c. Due to the stray light 10c, the brightness of the pixel changes depending on the viewing direction, and the viewing angle characteristics can be deteriorated. For example, in the transmissive MEMS display shown in FIG. 18, pixels that are originally closed by the shutter 2 and are supposed to be displayed in black appear bright from an oblique direction due to the stray light 10 c, causing a reduction in image contrast. In addition, the light reflected by the light shielding film 4 includes a scattered light component, and for example, when the screen is viewed from the front, the contrast may be lowered due to black floating. Further, the leaked light is not returned to the backlight unit and is not reused as display light, so that the light use efficiency is lowered.

  FIG. 19 shows a problem when the shutter 2 is open. The light 10d vertically incident on the opening 5 from the backlight unit (not shown) is transmitted to the TFT substrate 1 side as it is, but the light beam 10e incident with an inclination from the perpendicular of the opening 5 is blocked by the shutter 2. , It cannot transmit to the TFT substrate 1 side. This problem also deteriorates viewing angle characteristics.

  The present invention has been made to solve the above-described problems, and is intended to improve viewing angle characteristics and contrast in a MEMS display, or to improve the utilization efficiency of light generated by a backlight unit in a transmissive MEMS display. The purpose is to improve.

  (1) A display device according to the present invention includes a substrate on which a plurality of openings that can transmit light used for image display are formed corresponding to pixels, and is provided for each of the openings, and is driven to open the openings. A shutter that can be opened and closed, and the shutter has a concave incident surface on which the light is incident.

  (2) In the display device described in (1) above, each of the openings has an elongated planar shape having a longitudinal direction and a lateral direction, and the incident surface of the shutter is at least along the lateral direction. It may be characterized by being recessed.

  (3) In the display device described in (2) above, the entrance surface of the shutter may be recessed along the longitudinal direction of the opening with a smaller curvature than the transversal direction. .

  (4) In the display device described in (3), the shutter may include a groove or a beam extending in the longitudinal direction.

  (5) In the display device described in the above (1) to (4), the display device further includes a light source disposed behind the substrate as viewed from the image display surface and emitting the light toward the substrate. The shutter may be arranged in front of the substrate as viewed from the display surface with the incident surface facing the light source.

  (6) In the display device described in (1) to (4) above, external light incident on a display surface of an image is used as the light, and the shutter is disposed behind the substrate when viewed from the display surface. In addition, when the opening is closed, the extraneous light passing through the opening may be reflected.

  The present invention provides a MEMS display with improved viewing angle characteristics and contrast. Further, in the transmissive MEMS display, utilization efficiency of light generated by the backlight unit can be improved.

It is a typical perspective view of the display apparatus which is embodiment of this invention. It is a typical top view of a display which is an embodiment of the present invention. It is a typical top view of a display field of a display which is an embodiment of the present invention. 1 is a schematic circuit block diagram of a display device according to an embodiment of the present invention. It is a typical perspective view of the shutter mechanism provided for every pixel of the display apparatus which is embodiment of this invention. It is a typical top view of the shutter mechanism provided for every pixel of the display which is an embodiment of the present invention. FIG. 7 is a schematic vertical sectional view of a TFT substrate along the line VII-VII in FIG. 6. FIG. 8 is a schematic vertical sectional view of the display device taken along line VIII-VIII in FIG. 6. It is a typical vertical sectional view of the opening part and shutter part in the display apparatus which is embodiment of this invention. It is a typical perspective view of an example of a shutter part in a display which is an embodiment of the present invention. It is a typical perspective view of the other example of the shutter part in the display apparatus which is embodiment of this invention. It is a typical perspective view which shows an example of the shutter part which extended the groove | channel in the longitudinal direction. It is a typical perspective view which shows an example of the shutter part which extended the beam to the longitudinal direction. It is a general process flow figure explaining a method of manufacturing a display which is an embodiment of the present invention. It is a general process flow figure explaining a method of manufacturing a display which is an embodiment of the present invention. It is a typical vertical sectional view of the modification of the display apparatus which concerns on this invention. 1 is a schematic vertical sectional view of a reflective display device according to the present invention. It is a schematic diagram of the vertical cross section of the conventional MEMS display. It is a schematic diagram of the vertical cross section of the conventional MEMS display.

  Hereinafter, embodiments of the present invention (hereinafter referred to as embodiments) will be described with reference to the drawings.

  FIG. 1 is a schematic perspective view of a display device 50 according to the embodiment, and FIG. 2 is a schematic plan view of the display device 50.

  The display device 50 is a transmissive MEMS display, and includes a TFT substrate 52, a counter substrate 54, and a backlight unit (not shown). The TFT substrate 52, the counter substrate 54, and the backlight unit are superposed in this order. The TFT substrate 52 and the counter substrate 54 are made of a transparent base material such as glass. A display portion 52a, drive circuits 52b and 52c, and a terminal portion 52d are formed on the surface of the TFT substrate 52 on the counter substrate 54 side.

  FIG. 3 is a schematic plan view of the display area of the display device 50, as viewed from the counter substrate 54 side. The display part 52a of the TFT substrate 52 is provided corresponding to the display area. In the display unit 52a, a plurality of shutter mechanisms made of MEMS are arranged in a matrix corresponding to the pixels. On the other hand, a light shielding film 70 is laminated on the surface of the counter substrate 54 on the TFT substrate 52 side, and the light shielding film 70 has a plurality of openings 72 arranged in a matrix corresponding to the pixels in the display region. The shutter mechanism includes a shutter portion 74 that can open and close the opening 72, and drives and displaces the shutter portion 74 in accordance with drive signals from the drive circuits 52b, 52c, and 52d.

  In FIG. 3, the x direction is the displacement direction of the shutter unit 74, and the direction orthogonal to this is the y direction. The opening 72 and the shutter portion 74 have an elongated planar shape in which the x direction is the short direction and the y direction is the long direction, and the shapes can be rectangular. The shutter portion 74 has a larger planar shape than the opening 72 so that the opening 72 can be closed. Note that the dimensions in the short direction of the opening 72 and the shutter part 74 are restricted due to the driving width of the shutter part 74. For example, the dimension in the longitudinal direction can be about 100 μm, whereas the dimension in the short direction is The dimension is about 10 μm.

  In FIG. 3, the shutter portion 74a is retracted to the side of the opening 72, and the opening 72 is in an open state, and allows light from the backlight unit to pass to the display surface side. On the other hand, the shutter part 74b closes the opening part 72 and prevents light from the backlight unit from passing to the display surface side.

  FIG. 4 is a schematic circuit block diagram of the display device 50. For example, the control unit 80 is connected to the display device 50 by a terminal 56 of the terminal unit 52d and a flexible printed circuit (FPC) (not shown), and driving circuits 52b and 52c formed on the TFT substrate 52, and a backlight unit. A control signal for controlling driving and a power source are supplied to 82.

  A shutter and drive mechanism 84, a TFT 86, and a storage capacitor 88 are arranged for each pixel on the display unit 52 a of the TFT substrate 52. A gate line 90 is provided for each pixel group (pixel row) arranged in the horizontal direction, and a data line 92 is provided for each pixel group (pixel column) arranged in the vertical direction. Each gate line 90 is commonly connected to the gate of each TFT 86 arranged in the corresponding pixel row, and applies a gate signal from the gate line drive circuit (drive circuit 52b) to the TFT 86. Each data line 92 is commonly connected to one of the drain and the source of each TFT 86 arranged in the corresponding pixel column, and supplies a data signal from the data line driving circuit (driving circuit 52c) to the TFT 86. The gate line driving circuit controls on / off of the TFT 86 by a gate signal output to the gate line, and the on-state TFT 86 applies a data signal supplied from the data line driving circuit to the shutter and the driving mechanism 84.

  FIG. 5 is a schematic perspective view of the shutter and drive mechanism 84 provided for each pixel, and FIG. 6 is a schematic plan view of the shutter and drive mechanism 84. In the figure, the displacement direction of the shutter portion 74 is defined as the x direction, and the direction orthogonal thereto is defined as the y direction. The shutter and drive mechanism 84 includes a shutter unit 74, a first actuator unit 100a, and a second actuator unit 100b.

  The shutter unit 74 moves to open and close the opening 72 and transmit or block light from the backlight unit 82 to the display surface.

  A pair of first actuator unit 100a and second actuator unit 100b are arranged symmetrically in the y direction across the shutter unit 74 along the x direction, and each draws the shutter unit 74. The first actuator unit 100a and the second actuator unit 100b each include a first beam unit 102, a second beam unit 104, a first anchor unit 106, and a second anchor unit 108.

  The first beam portion 102 has one end connected to the shutter portion 74 and the other end connected to the first anchor portion 106 erected on the TFT substrate 52. The first anchor unit 106 supports the shutter unit 74 and the first beam unit 102 while floating from the TFT substrate 52. The first beam portion 102 has a bent planar shape, and includes an action portion 110 whose position in the x direction is between the second anchor portion 108 and the shutter portion 74 and extends in the y direction.

  The second beam portion 104 has a planar shape like a hairpin having both ends connected to the second anchor portion 108, extends opposite to the action portion 110, and is disposed so that the folded portion is closest to the action portion 110. The The second anchor portion 108 supports the second beam portion 104 while floating from the TFT substrate 52.

  At the time of driving, different voltages are applied to the first beam unit 102 and the second beam unit 104 from the first anchor unit 106 and the second anchor unit 108, respectively. The first beam unit 102 and the second beam unit 104 are attracted by an electrostatic force generated by a potential difference between them. When the first beam unit 102 is attracted to the second beam unit 104, the shutter unit 74 fixed to the first beam unit 102 moves in the x direction.

  FIG. 7 is a schematic vertical sectional view of the TFT substrate 52 taken along line VII-VII in FIG. The shutter unit 74 includes, for example, a stacked body of the structure 120 and the metal film 122 and the insulating film 124. The structure 120 is made of, for example, amorphous silicon (α-Si). The metal film 122 is formed of a material having a light shielding function. For example, an AlSi alloy obtained by mixing a small amount of silicon (Si) with aluminum (Al) can be used. The insulating film 124 is provided to prevent an electrical short circuit among the shutter unit 74, the first beam unit 102, the second beam unit 104, and the first anchor unit 106.

  FIG. 8 is a schematic vertical sectional view of the display device 50 taken along line VIII-VIII in FIG. The display device 50 according to the present invention is characterized in that the shutter unit 74 has a concave incident surface on which light from the backlight unit 82 is incident when the opening 72 is closed. In the examples shown in FIGS. 7 and 8, the vertical cross section of the incident surface is smoothly curved like a parabola or an arc.

  FIG. 9 is a schematic vertical sectional view of the opening 72 and the shutter 74, and the shutter 74 closes the opening 72. Incident light 130 from the backlight unit 82 that has passed through the opening 72 strikes the shutter 74 and is reflected. If the reflected light 132 passes through the opening 72 and returns to the backlight unit 82, it is reflected by a reflective film or the like in the backlight unit 82, passes through the opening 72 again, and can be used for image display.

  Here, the surface of the shutter unit 74 facing the backlight unit 82 is formed as a concave surface, and has a function of reflecting the incident light of the parallel rays on the surface of the shutter unit 74 so as to collect it, for example. The surface also reflects oblique incident light in a direction closer to the center of the opening 72 than when the surface is a plane parallel to the light shielding film 70. Therefore, the reflected light 132 from the shutter portion 74 having the concave incident surface is easily returned to the opening 72, and the reuse efficiency of the light emitted from the backlight unit 82 is improved. In other words, leakage of light from the gap between the light shielding film 70 and the shutter portion 74 is reduced in a state where the shutter portion 74 closes the opening 72, and stray light emitted from the display surface is reduced unexpectedly. Therefore, it is possible to reduce the deterioration of the above-described viewing angle characteristics, which has been regarded as a conventional problem.

  FIG. 10 is a schematic perspective view of an example of the shutter unit 74. In FIGS. 10 and 11, the white arrow indicates the displacement direction of the shutter unit 74. In this example, the incident surface of the shutter portion 74 is a concave surface curved with the same curvature in the short side direction (x direction) and the long side direction (y direction). As will be described later, the shutter unit 74 is formed through a process of removing the sacrificial layer after forming the structure 120 and the metal film 122 on the sacrificial layer stacked on the substrate by CVD or the like and patterning them. The curve of the shutter portion 74 can be generated by the stress in the laminated film of the structure 120 and the metal film 122, and the curve can be controlled by the film forming conditions. The stress in the film generated at the time of film formation is basically isotropic. In this case, the shutter portion 74 is bent with basically the same curvature in the lateral direction and the longitudinal direction as in this example.

  FIG. 11 is a schematic perspective view of another example of the shutter unit 74. In this example, the incident surface of the shutter portion 74 is recessed along the longitudinal direction with a smaller curvature than the short direction. The shutter portion 74 curved with the same curvature in the short side direction and the long side direction shown in FIG. 10 has a depression at the central portion in the long side direction as the value of the ratio R of the long side direction to the short side direction increases. The amount (depth of the dent) becomes larger than the amount of dent (depth of the dent) at the center in the short direction. That is, the gap between the light shielding film 70 and the shutter portion 74 is enlarged at the center of the long side of the shutter portion 74. For this reason, incident light that is inclined in the lateral direction tends to leak out of the gap and become stray light. Therefore, when the ratio R is large, it is preferable to reduce the amount of depression at the center in the longitudinal direction and reduce stray light by making the curvature in the longitudinal direction smaller than the lateral direction as shown in FIG. It is.

  For the same reason, the incident surface of the shutter unit 74 may be a concave surface that is curved only in the short direction and not curved in the longitudinal direction.

  Providing a difference in curvature between the short side direction and the long side direction of the incident surface of the shutter unit 74 extends a groove or a beam in the long side direction of the shutter unit 74 and makes the shutter unit 74 strong against bending in the long axis direction. This is possible by increasing. FIG. 12 is a schematic perspective view showing an example of the shutter part 74 in which the groove 140 extends in the longitudinal direction. FIG. 13 is a schematic perspective view showing an example of the shutter portion 74 in which the beam 142 extends in the longitudinal direction. 12 and 13 show an example in which only one groove 140 and beam 142 are provided, a plurality of grooves 140 and beams 142 may be provided. The strength in the longitudinal direction of the shutter portion 74 can be changed depending on the cross-sectional shape and the number of the grooves 140 and the beams 142, and thereby the curvature in the longitudinal direction can be adjusted.

  14 and 15 are schematic process flow diagrams for explaining a method of manufacturing the display device 50. FIG. 14 and 15 are schematic vertical sectional views in the main manufacturing process of the display device 50 having the groove 140 in the shutter portion 74. The vertical sectional views show the TFT substrate 52 and the counter substrate 54 of the display device 50. FIG. The cross section of the part along the VII-VII line of FIG. 6 is included. The TFT substrate 52 is coated with a resist to be the first sacrificial layer 150 on the surface (step a). The resist is patterned by an exposure / development process, and the resist is removed from a portion where an anchor portion is formed (step b). A resist to be the second sacrificial layer 152 is applied thereon (step c), the resist is patterned by an exposure / development step, and the resist is removed from a portion where the groove 140 is formed (step d).

  The CVD film 154 constituting the structure 120 and the metal film 156 to be the metal film 122 in FIG. 7 are sequentially stacked on the surface of the sacrificial layers 150 and 152 having the two-layer structure thus formed (step e). . For example, an α-Si film is formed as the CVD film 154 by a chemical vapor deposition (CVD) method. An AlSi film is deposited as the metal film 156.

  Further, a resist 158 is applied thereon (step f), the resist 158 is patterned by an exposure / development step, and the resist is removed from the portions where the first beam portion 102 and the second beam portion 104 are formed (step S). Step g).

  Using the patterned resist 158 as a mask, the metal film 156 is first removed by etching (step h), and the CVD film 154 is further etched (step i). Here, the etching method and the etching amount of the CVD film 154 are the same as the second sacrificial layer 152 while removing the CVD film 154 laminated on the upper surface of the first sacrificial layer 150 and the upper surface of the second sacrificial layer 152. The CVD film 154 laminated on the side surface of the step portion is designed to remain. For example, the CVD film 154 can be left on the side surface of the step portion of the second sacrificial layer 152 by anisotropic etching.

  The remaining portion 160 of the CVD film 154 in the opening region of the etching mask made of the resist 158 becomes the first beam portion 102 and the second beam portion 104. On the other hand, portions that become the shutter portion 74 and the first anchor portion 106 are covered with a resist 158, and the CVD film 154 and the metal film 156 remain without being etched.

  Thereafter, an ashing process is performed to remove the resist for forming the first sacrificial layer 150 and the second sacrificial layer 152 (step j). Further, although not shown in the drawing, an insulating film 124 is formed by a CVD method.

  Through the above steps, the first beam portion 102, the second beam portion 104, the first anchor portion 106, the second anchor portion 108, and the spacer 162 are formed on the TFT substrate 52. Here, when the first sacrificial layer 150 and the second sacrificial layer 152 thereunder are removed, the shutter portion 74 is deformed by its own stress. The film forming conditions for the CVD film 154 and the metal film 156 are set so that the incident surface of the shutter unit 74 is concave due to this deformation. For example, the metal film 156 is formed so as to generate a tensile stress, and thus the shutter portion 74 can be warped to a concave surface. Further, by forming the groove 140 extending in the longitudinal direction of the shutter portion 74, the warpage in the longitudinal direction can be made smaller than the lateral direction.

  On the other hand, the counter substrate 54 has a light shielding film 70 and an antireflection film 164 laminated on its surface, and an opening 72 is formed in these films. The counter substrate 54 in which the opening 72 is formed is bonded to the TFT substrate 52 (step k). A space is provided between the TFT substrate 52 and the counter substrate 54 by spacers 162 and 166, and the shutter and drive mechanism 84 operates in the space between the TFT substrate 52 and the counter substrate 54, and the shutter unit 74 is moved. Displace.

[Modification]
(1) In the above-described embodiment, the groove 140 and the beam 142 are provided only in the longitudinal direction of the shutter portion 74, but the groove 140 and the beam extending in the short direction to control the curvature of the warp in the short direction. 142 may be provided.

  (2) In the above-described embodiment, the shutter and drive mechanism 84 includes a pair of the first actuator unit 100 a and the second actuator unit 100 b, and each pair of the first beam units 102 is the central part of the long side of the shutter unit 74. It was the composition connected to. However, the shutter and drive mechanism 84 are not limited to this configuration. For example, the shutter and drive mechanism 84 may include a first actuator unit 100a and a second actuator unit 100b, and the first beam unit 102 may be connected to one short side of the shutter unit 74. Good.

  (3) FIG. 16 is a schematic vertical sectional view of a modification of the display device 50 according to the present invention. In the above-described embodiment, the backlight unit 82 is disposed on the counter substrate 54 side. On the other hand, in the configuration shown in FIG. 16, the backlight unit 82 is disposed on the TFT substrate 52 side. That is, light from the backlight unit 82 enters the TFT substrate 52 from the surface opposite to the surface on which the shutter and the driving mechanism 84 of the TFT substrate 52 are formed, and passes through the opening 72 of the counter substrate 54. The light is emitted from the display surface.

  Also in this configuration, the incident surface of the shutter unit 74 on which light from the backlight unit 82 is incident is formed as a concave surface. However, it differs from the above-described embodiment in that the incident surface faces the TFT substrate 52 side.

  (4) The display device 50 according to the above-described embodiment is a transmissive display device that uses light emitted from the backlight unit 82 for image display. On the other hand, the present invention can also be applied to a reflection type display device that uses light from the outside rather than light from the backlight unit 82 for image display.

  FIG. 17 is a schematic vertical sectional view of a display device 200 which is a reflective MEMS display according to the present invention. In the display device 200, the same components as those of the display device 50 are denoted by the same reference numerals. In the display device 200, the counter substrate 54 is disposed on the image display surface side, and the TFT substrate 52 is disposed on the back surface side. In the pixel in which the opening 72 is closed by the shutter part 74, the extraneous light 202 that has passed through the opening 72 is reflected by the shutter part 74 and passes through the opening 72 again to become emitted light 204 from the display surface. The light incident surface of the shutter unit 74, that is, the surface facing the counter substrate 54 is formed as a concave surface. Accordingly, the extraneous light 202 incident from the opening 72 is easily returned to the opening 72 and effectively used for image display, and the contrast is improved.

  In the embodiment of the transmissive display device 50 described above, the incident surface of the shutter unit 74 is formed as a concave surface so that the oblique incident light 130 from the backlight unit 82 is less likely to become stray light and the reflected light 132 returns to the opening 72. I explained that it was easy to be done. From a different viewpoint, this means that light incident from the direction of the reflected light 132 is reflected in the direction in which the incident light 130 comes. Therefore, in the reflective display device 200, when the incident surface of the shutter portion 74 is a concave surface, the incident light to the opening 72 is emitted from the opening 72 in an oblique direction as compared with the case where the incident surface is a flat surface. It can be said that it is easy. That is, the viewing angle characteristic is improved by making the incident surface of the shutter portion 74 concave.

  17, the arrangement of the TFT substrate 52 and the counter substrate 54 is reversed, and the surface of the TFT substrate 52 opposite to the surface on which the shutter and the drive mechanism 84 are formed is displayed as an image. A reflection type display device arranged toward the surface side is also conceivable. In this configuration, extraneous light is incident on the surface of the shutter portion 74 facing the TFT substrate 52, and this incident surface is formed as a concave surface.

  50, 200 display device, 52 TFT substrate, 52a display unit, 52b, 52c drive circuit, 52d terminal unit, 54 counter substrate, 56 terminal, 70 light shielding film, 72 opening, 74 shutter unit, 80 control unit, 82 backlight Unit, 84 shutter and driving mechanism, 90 gate line, 92 data line, 100a first actuator part, 100b second actuator part, 102 first beam part, 104 second beam part, 106 first anchor part, 108 second anchor Part, 110 working part, 120 structure, 122 metal film, 124 insulating film, 140 groove, 142 beam, 150 first sacrificial layer, 152 second sacrificial layer, 154 CVD film, 156 metal film, 158 resist.

Claims (6)

A substrate on which a plurality of openings capable of transmitting light used for image display are formed corresponding to pixels;
A shutter that is provided for each opening and is driven to open and close the opening;
Have
The shutter has a concave incident surface on which the light is incident,
A display device. The display device according to claim 1,
Each of the openings has an elongated planar shape having a longitudinal direction and a lateral direction,
The incident surface of the shutter is recessed at least along the short direction;
A display device. The display device according to claim 2,
The display device, wherein the entrance surface of the shutter is recessed along the longitudinal direction of the opening with a smaller curvature than the lateral direction. The display device according to claim 3,
The display device, wherein the shutter has a groove or a beam extending in the longitudinal direction. In the display device according to any one of claims 1 to 4,
A light source disposed behind the substrate as viewed from the image display surface and emitting the light toward the substrate;
The shutter is disposed in front of the substrate when viewed from the display surface with the incident surface facing the light source;
A display device. In the display device according to any one of claims 1 to 4,
Using extraneous light incident on the display surface of the image as the light,
The shutter is disposed behind the substrate when viewed from the display surface, and reflects the extraneous light passing through the opening when the opening is closed;
A display device.

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