JP2014126642A - Wavelength cut filter - Google Patents
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- JP2014126642A JP2014126642A JP2012282166A JP2012282166A JP2014126642A JP 2014126642 A JP2014126642 A JP 2014126642A JP 2012282166 A JP2012282166 A JP 2012282166A JP 2012282166 A JP2012282166 A JP 2012282166A JP 2014126642 A JP2014126642 A JP 2014126642A
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Images
Abstract
Description
本発明は、染料を含有するコーティング層、ガラス基板及び赤外線反射膜を積層してなる波長カットフィルタに関する。 The present invention relates to a wavelength cut filter formed by laminating a coating layer containing a dye, a glass substrate, and an infrared reflective film.
デジタルスチルカメラ、ビデオカメラ、携帯電話用カメラ等に使用される固体撮像素子（ＣＣＤやＣＭＯＳ等）の感度は、光の波長の紫外領域から赤外領域にわたっている。一方、人間の視感度は光の波長の可視領域のみである。そのため、撮像レンズと固体撮像素子との間に、赤外線カットフィルタを設けることで、人間の視感度に近づくように固体撮像素子の感度を補正している。（例えば、特許文献１〜３参照。）。 The sensitivity of a solid-state imaging device (CCD, CMOS, etc.) used for a digital still camera, a video camera, a mobile phone camera, etc. extends from the ultraviolet region to the infrared region of the light wavelength. On the other hand, human visibility is only in the visible region of the wavelength of light. Therefore, by providing an infrared cut filter between the imaging lens and the solid-state imaging device, the sensitivity of the solid-state imaging device is corrected so as to approach human visibility. (For example, refer patent documents 1-3.).
従来、赤外線カットフィルタは、吸収特性を持たない物質を含有する層を組み合わせて多層に積層しそれらの屈折率の差を利用した反射型フィルターか、光吸収剤を透明な基板に含有させるか又は結合させた吸収型フィルターであった。 Conventionally, an infrared cut filter is a reflection type filter using a combination of layers containing substances having no absorption characteristics and laminated in multiple layers and utilizing the difference in refractive index, or a light absorber is contained in a transparent substrate, or It was a combined absorption filter.
反射型フィルターは、光の入射角により特性が変化するため、画面の中心と周辺で色合いが変化するなどの弊害がある。また、反射された光が光路中において迷光となって解像度の低下や画像のシミ・ムラ、ゴーストと呼ばれる多重像等を引き起こす原因となる弊害がある。 The reflection type filter has a problem that the color changes between the center and the periphery of the screen because the characteristics change depending on the incident angle of light. In addition, the reflected light becomes stray light in the optical path, leading to a problem that causes a reduction in resolution, image spots, unevenness, multiple images called ghosts, and the like.
一方、吸収型フィルターは、光の入射角による特性の変化が無いものの、目的の特性を得るためにはかなりの厚さが必要になる。 On the other hand, although the absorption filter has no change in characteristics due to the incident angle of light, a considerable thickness is required to obtain the desired characteristics.
近年、様々な機器、装置に大幅な小型化の要求があり、従来の吸収型フィルターでは、その小型化の要求に応えられなくなっている。また、反射型フィルターでは、特に入射角依存性により要求される特性に到達することが難しくなっている。 In recent years, various devices and apparatuses have been required to be significantly reduced in size, and conventional absorption filters cannot meet the requirements for downsizing. In addition, it is difficult for the reflection type filter to reach the required characteristics, particularly due to the incident angle dependency.
従って、本発明の目的は、入射角依存性が低く、耐熱性が高く薄型化が可能な波長カットフィルタを提供することにある。 Accordingly, an object of the present invention is to provide a wavelength cut filter that has low incidence angle dependency, high heat resistance, and can be thinned.
本発明者は、鋭意検討を重ねた結果、ガラス基板（Ａ）、スクアリリウム染料を含有するコーティング層（Ｂ）及び赤外線反射膜（Ｃ）を積層してなることを特徴とする波長カットフィルタが、入射角依存性が低いことを知見し、本発明に到達した。 As a result of intensive studies, the inventor has obtained a wavelength cut filter characterized by laminating a glass substrate (A), a coating layer (B) containing squarylium dye, and an infrared reflective film (C), The inventors have found that the dependency on the incident angle is low, and have reached the present invention.
本発明は、ガラス基板（Ａ）、スクアリリウム染料を含有するコーティング層（Ｂ）及び赤外線反射膜（Ｃ）を積層してなることを特徴とする波長カットフィルタを提供するものである。 The present invention provides a wavelength cut filter comprising a glass substrate (A), a coating layer (B) containing a squarylium dye, and an infrared reflective film (C).
また、本発明は、上記波長カットフィルタを具備する固体撮像装置を提供するものである。 Moreover, this invention provides the solid-state imaging device which comprises the said wavelength cut filter.
また、本発明は、上記波長カットフィルタを具備するカメラモジュールを提供するものである。 Moreover, this invention provides the camera module which comprises the said wavelength cut filter.
本発明の波長カットフィルタは入射角依存性が低い点で優れるものである。また、本発明の波長カットフィルタは、固体撮像装置及びカメラモジュールに好適なものである。 The wavelength cut filter of the present invention is excellent in that the incident angle dependency is low. The wavelength cut filter of the present invention is suitable for a solid-state imaging device and a camera module.
以下、本発明の波長カットフィルタについて、好ましい実施形態に基づき説明する。 Hereinafter, the wavelength cut filter of the present invention will be described based on preferred embodiments.
本発明の波長カットフィルタは、図１ａ及び図１ｂに示すように、ガラス基板（Ａ）、染料を含有するコーティング層（Ｂ）及び赤外線反射膜（Ｃ）を積層してなるが、積層する順番には特に制限はない。以下、各層について順に説明する。 As shown in FIGS. 1a and 1b, the wavelength cut filter of the present invention is formed by laminating a glass substrate (A), a coating layer (B) containing a dye, and an infrared reflecting film (C). There are no particular restrictions. Hereinafter, each layer will be described in order.
＜ガラス基板（Ａ）＞
本発明の波長カットフィルタに用いられるガラス基板（Ａ）としては、可視域で透明なガラス材料から適宜選択して使用することができるが、ソーダ石灰ガラス、白板ガラス、硼珪酸ガラス、強化ガラス、石英ガラス、リン酸塩系ガラス等を用いることができ、中でもソーダ石灰ガラスは、安価で入手容易なため好ましく、白板ガラス、硼珪酸ガラス及び強化ガラスは、入手容易で硬度が高く加工性に優れるため好ましい。
<Glass substrate (A)>
As the glass substrate (A) used for the wavelength cut filter of the present invention, it can be used by appropriately selecting from a glass material transparent in the visible range, but soda lime glass, white plate glass, borosilicate glass, tempered glass, Quartz glass, phosphate glass, and the like can be used. Among them, soda lime glass is preferable because it is inexpensive and easily available. White plate glass, borosilicate glass, and tempered glass are easily available, have high hardness, and excellent workability. Therefore, it is preferable.
さらに、ガラス基板（Ａ）にシランカップリング剤等の前処理を施した後に、塗工液を塗布して後述のスクアリリウム染料を含有するコーティング層（Ｂ）を形成すると、塗工液乾燥後のスクアリリウム染料を含有するコーティング層（Ｂ）のガラス基板に対する密着性が高まる。 Furthermore, after pre-treating the glass substrate (A) with a silane coupling agent or the like, the coating liquid is applied to form a coating layer (B) containing a squarylium dye described later. The adhesion of the coating layer (B) containing the squarylium dye to the glass substrate is enhanced.
上記シランカップリング剤としては、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルメチルジエトキシシラン、β−（３，４−エポキシシクロヘキシル）エチルトリメトキシシラン等のエポキシ官能性アルコキシシラン、Ｎ−β（アミノエチル）−γ−アミノプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、Ｎ−フェニル−γ−アミノプロピルトリメトキシシラン等のアミノ官能性アルコキシシラン、γ−メルカプトプロピルトリメトキシシラン等のメルカプト官能性アルコキシシラン等が挙げられる。 Examples of the silane coupling agent include epoxy functional alkoxysilanes such as γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, and β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane. Amino-functional alkoxysilanes such as N-β (aminoethyl) -γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-mercaptopropyltrimethoxy Examples include mercapto functional alkoxysilanes such as silane.
ガラス基板（Ａ）の厚さは、特に限定されないが、０．０５〜８ｍｍが好ましく、軽量化及び強度の点から０．０５〜１ｍｍがさらに好ましい。 Although the thickness of a glass substrate (A) is not specifically limited, 0.05-8 mm is preferable and 0.05-1 mm is more preferable from the point of weight reduction and intensity | strength.
本発明では、基材がガラス板のため、基材上に直接塗工、乾燥した後切断加工することが可能であり、構造やプロセスが簡易となる。また、基板がガラス板のため、プラスチックである場合より耐熱性（２６０℃リフロー耐性）が高い。 In the present invention, since the base material is a glass plate, it can be directly coated on the base material, dried and then cut, and the structure and process are simplified. Moreover, since a board | substrate is a glass plate, heat resistance (260 degreeC reflow tolerance) is higher than the case where it is a plastic.
＜コーティング層（Ｂ）＞
本発明の波長カットフィルタに用いられるスクアリリウム染料を含有するコーティング層（Ｂ）は、スクアリリウム染料、バインダーとしての樹脂及び必要に応じて配合される他の成分を適当な溶媒に溶解又は分散させて塗工液を調整し、得られた塗工液をガラス基板（Ａ）上に塗布することにより形成することができる。
塗布方法としては、スピンコート法、ディップコート法、スプレーコート法、ビードコート法、エアーナイフコート法、カーテンコート法、ローラーコート法、ワイヤーバーコート法、グラビアコート法、ダイコート法、ホッパーを使用するエクストルージョンコート法等が挙げられる。
<Coating layer (B)>
The coating layer (B) containing the squarylium dye used in the wavelength cut filter of the present invention is applied by dissolving or dispersing the squarylium dye, the resin as the binder, and other components blended as necessary in an appropriate solvent. It can be formed by adjusting the working solution and applying the obtained coating solution on the glass substrate (A).
Application methods include spin coating, dip coating, spray coating, bead coating, air knife coating, curtain coating, roller coating, wire bar coating, gravure coating, die coating, and hopper. Examples include the extrusion coating method.
上記スクアリリウム染料としては、下記一般式（１）〜（３）で表される化合物が挙げられる。 As said squarylium dye, the compound represented by following General formula (1)-(3) is mentioned.
Ｒ1及びＲ1’は、水酸基、ハロゲン原子、ニトロ基、シアノ基、−ＳＯ3Ｈ、カルボキシル基、アミノ基、アミド基、フェロセニル基、炭素原子数６〜３０のアリール基、炭素原子数７〜３０のアリールアルキル基又は炭素原子数１〜８のアルキル基を表し、
該炭素原子数６〜３０のアリール基、炭素原子数７〜３０のアリールアルキル基及び炭素原子数１〜８のアルキル基は、水酸基、ハロゲン原子、ニトロ基、シアノ基、−ＳＯ3Ｈ、カルボキシル基、アミノ基、アミド基又はフェロセニル基で置換されていてもよく、−Ｏ−、−Ｓ−、−ＣＯ−、−ＣＯＯ−、−ＯＣＯ−、−ＳＯ2−、−ＮＨ−、−ＣＯＮＨ−、−ＮＨＣＯ−、−Ｎ＝ＣＨ−又は−ＣＨ＝ＣＨ−で中断されていてもよく、
Ｒ2〜Ｒ9及びＲ2’〜Ｒ9’は、Ｒ1及びＲ1’と同様の基又は水素原子を表し、
Ｘ及びＸ’は、酸素原子、硫黄原子、セレン原子、−ＣＲ51Ｒ52−、炭素原子数３〜６のシクロアルカン−１，１−ジイル基、−ＮＨ−又は−ＮＹ2−を表し、
Ｒ51及びＲ52は、Ｒ1及びＲ1’と同様の基又は水素原子を表し、
Ｙ、Ｙ’及びＹ2は、水素原子、又は水酸基、ハロゲン原子、シアノ基、カルボキシル基、アミノ基、アミド基、フェロセニル基、−ＳＯ3Ｈ若しくはニトロ基で置換されてもよい炭素原子数１〜２０のアルキル基、炭素原子数６〜３０のアリール基若しくは炭素原子数７〜３０のアリールアルキル基を表し、
該Ｙ、Ｙ’及びＹ2中のアルキル基、アリール基及びアリールアルキル基中のメチレン基は、−Ｏ−、−Ｓ−、−ＣＯ−、−ＣＯＯ−、−ＯＣＯ−、−ＳＯ2−、−ＮＨ−、−ＣＯＮＨ−、−ＮＨＣＯ−、−Ｎ＝ＣＨ−又は−ＣＨ＝ＣＨ−で中断されていてもよく、
ｒ及びｒ’は、０又は（ａ）〜（ｅ）、（ｇ）〜（ｊ）、（ｌ）、（ｍ）、（ａ’）〜（ｅ’）、（ｇ’）〜（ｊ’）、（ｌ’）及び（ｍ’）において置換可能な数を表す。）
R 1 and R 1 ′ are a hydroxyl group, a halogen atom, a nitro group, a cyano group, —SO 3 H, a carboxyl group, an amino group, an amide group, a ferrocenyl group, an aryl group having 6 to 30 carbon atoms, or a carbon atom number of 7 Represents an arylalkyl group of ˜30 or an alkyl group of 1 to 8 carbon atoms,
The aryl group having 6 to 30 carbon atoms, the arylalkyl group having 7 to 30 carbon atoms and the alkyl group having 1 to 8 carbon atoms are a hydroxyl group, a halogen atom, a nitro group, a cyano group, —SO 3 H, carboxyl Group, amino group, amide group or ferrocenyl group, which may be substituted, —O—, —S—, —CO—, —COO—, —OCO—, —SO 2 —, —NH—, —CONH— , -NHCO-, -N = CH- or -CH = CH-
R 2 to R 9 and R 2 ′ to R 9 ′ represent the same group or hydrogen atom as R 1 and R 1 ′,
X and X ′ represent an oxygen atom, a sulfur atom, a selenium atom, —CR 51 R 52 —, a cycloalkane-1,1-diyl group having 3 to 6 carbon atoms, —NH— or —NY 2 —;
R 51 and R 52 represent the same group or hydrogen atom as R 1 and R 1 ′,
Y, Y ′ and Y 2 are each a hydrogen atom, or a hydroxyl group, a halogen atom, a cyano group, a carboxyl group, an amino group, an amide group, a ferrocenyl group, —SO 3 H or a nitro group, which may be substituted with 1 carbon atom. Represents an alkyl group having ˜20, an aryl group having 6 to 30 carbon atoms, or an arylalkyl group having 7 to 30 carbon atoms,
The alkyl group, the aryl group and the methylene group in the arylalkyl group in Y, Y ′ and Y 2 are —O—, —S—, —CO—, —COO—, —OCO—, —SO 2 —, -NH-, -CONH-, -NHCO-, -N = CH- or -CH = CH- may be interrupted,
r and r ′ are 0 or (a) to (e), (g) to (j), (l), (m), (a ′) to (e ′), (g ′) to (j ′) ), (L ′) and (m ′) represent the number that can be substituted. )
上記一般式（１）〜（３）におけるＲ1〜Ｒ9及びＲ1’ 〜Ｒ9’並びにＸ及びＸ’中のＲ51及びＲ52で表されるハロゲン原子としては、フッ素、塩素、臭素、ヨウ素が挙げられ、
炭素原子数６〜３０のアリール基としては、フェニル、ナフチル、２−メチルフェニル、３−メチルフェニル、４−メチルフェニル、４−ビニルフェニル、３−ｉｓｏ−プロピルフェニル、４−ｉｓｏ−プロピルフェニル、４−ブチルフェニル、４−ｉｓｏ−ブチルフェニル、４−ｔｅｒｔ−ブチルフェニル、４−ヘキシルフェニル、４−シクロヘキシルフェニル、４−オクチルフェニル、４−（２−エチルヘキシル）フェニル、４−ステアリルフェニル、２，３−ジメチルフェニル、２，４−ジメチルフェニル、２，５−ジメチルフェニル、２，６−ジメチルフェニル、３，４−ジメチルフェニル、３，５−ジメチルフェニル、２，４−ジ−ｔｅｒｔ−ブチルフェニル、２，５−ジ−ｔｅｒｔ−ブチルフェニル、２，６−ジ−ｔｅｒｔ−ブチルフェニル、２，４−ジ−ｔｅｒｔ−ペンチルフェニル、２，５−ジ−ｔｅｒｔ−アミルフェニル、２，５−ジ−ｔｅｒｔ−オクチルフェニル、２，４−ジクミルフェニル、４−シクロヘキシルフェニル、（１，１’−ビフェニル）−４−イル、２，４，５−トリメチルフェニル、フェロセニル等が挙げられ、
炭素原子数７〜３０のアリールアルキル基としては、ベンジル、フェネチル、２−フェニルプロパン−２−イル、ジフェニルメチル、トリフェニルメチル、スチリル、シンナミル、フェロセニルメチル、フェロセニルプロピル等が挙げられ、
炭素原子数１〜８のアルキル基としては、メチル、エチル、プロピル、ｉｓｏ−プロピル、ブチル、ｓｅｃ−ブチル、ｔｅｒｔ−ブチル、ｉｓｏ−ブチル、アミル、ｉｓｏ−アミル、ｔｅｒｔ−アミル、ヘキシル、２−ヘキシル、３−ヘキシル、シクロヘキシル、１−メチルシクロヘキシル、ヘプチル、２−ヘプチル、３−ヘプチル、ｉｓｏ−ヘプチル、ｔｅｒｔ−ヘプチル、１−オクチル、ｉｓｏ−オクチル、ｔｅｒｔ−オクチル等が挙げられる。
上記炭素原子数６〜３０のアリール基、炭素原子数７〜３０のアリールアルキル基及び炭素原子数１〜８のアルキル基は、水酸基、ハロゲン原子、ニトロ基、シアノ基、−ＳＯ3Ｈ、カルボキシル基、アミノ基、アミド基又はフェロセニル基で置換されていてもよく
、−Ｏ−、−Ｓ−、−ＣＯ−、−ＣＯＯ−、−ＯＣＯ−、−ＳＯ2−、−ＮＨ−、−ＣＯＮＨ−、−ＮＨＣＯ−、−Ｎ＝ＣＨ−又は−ＣＨ＝ＣＨ−で中断されてもよく、これらの置換及び中断の数及び位置は任意である。
例えば、上記炭素原子数１〜８のアルキル基がハロゲン原子で置換された基としては、例えば、クロロメチル、ジクロロメチル、トリクロロメチル、フルオロメチル、ジフルオロメチル、トリフルオロメチル、ノナフルオロブチル等が挙げられ、
上記炭素原子数１〜８のアルキル基が、−Ｏ−で中断された基としては、メチルオキシ、エチルオキシ、ｉｓｏ−プロピルオキシ、プロピルオキシ、ブチルオキシ、ペンチルオキシ、ｉｓｏ−ペンチルオキシ、ヘキシルオキシ、ヘプチルオキシ、オクチルオキシ、２−エチルヘキシルオキシ等のアルコキシ基や、２−メトキシエチル、２−（２−メトキシ）エトキシエチル、２−エトキシエチル、２−ブトキシエチル、４−メトキシブチル、３−メトキシブチル等のアルコキシアルキル基等が挙げられ、
上記炭素原子数１〜８のアルキル基がハロゲン原子で置換され、且つ−Ｏ−で中断された基としては、例えば、クロロメチルオキシ、ジクロロメチルオキシ、トリクロロメチルオキシ、フルオロメチルオキシ、ジフルオロメチルオキシ、トリフルオロメチルオキシ、ノナフルオロブチルオキシ等が挙げられる。
In the general formulas (1) to (3), R 1 to R 9 and R 1 ′ to R 9 ′ and halogen atoms represented by R 51 and R 52 in X and X ′ include fluorine, chlorine, bromine , Iodine,
Examples of the aryl group having 6 to 30 carbon atoms include phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 4-vinylphenyl, 3-iso-propylphenyl, 4-iso-propylphenyl, 4-butylphenyl, 4-iso-butylphenyl, 4-tert-butylphenyl, 4-hexylphenyl, 4-cyclohexylphenyl, 4-octylphenyl, 4- (2-ethylhexyl) phenyl, 4-stearylphenyl, 2, 3-dimethylphenyl, 2,4-dimethylphenyl, 2,5-dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, 2,4-di-tert-
Examples of the arylalkyl group having 7 to 30 carbon atoms include benzyl, phenethyl, 2-phenylpropan-2-yl, diphenylmethyl, triphenylmethyl, styryl, cinnamyl, ferrocenylmethyl, ferrocenylpropyl and the like. ,
Examples of the alkyl group having 1 to 8 carbon atoms include methyl, ethyl, propyl, iso-propyl, butyl, sec-butyl, tert-butyl, iso-butyl, amyl, iso-amyl, tert-amyl, hexyl, 2- Examples include hexyl, 3-hexyl, cyclohexyl, 1-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, iso-heptyl, tert-heptyl, 1-octyl, iso-octyl, tert-octyl and the like.
The aryl group having 6 to 30 carbon atoms, the arylalkyl group having 7 to 30 carbon atoms and the alkyl group having 1 to 8 carbon atoms are a hydroxyl group, a halogen atom, a nitro group, a cyano group, —SO 3 H, carboxyl Group, amino group, amide group or ferrocenyl group, which may be substituted, —O—, —S—, —CO—, —COO—, —OCO—, —SO 2 —, —NH—, —CONH— , —NHCO—, —N═CH—, or —CH═CH—, and the number and position of these substitutions and interruptions are arbitrary.
For example, examples of the group in which the alkyl group having 1 to 8 carbon atoms is substituted with a halogen atom include chloromethyl, dichloromethyl, trichloromethyl, fluoromethyl, difluoromethyl, trifluoromethyl, and nonafluorobutyl. And
Examples of the group in which the alkyl group having 1 to 8 carbon atoms is interrupted by —O— include methyloxy, ethyloxy, iso-propyloxy, propyloxy, butyloxy, pentyloxy, iso-pentyloxy, hexyloxy, heptyl Alkoxy groups such as oxy, octyloxy, 2-ethylhexyloxy, 2-methoxyethyl, 2- (2-methoxy) ethoxyethyl, 2-ethoxyethyl, 2-butoxyethyl, 4-methoxybutyl, 3-methoxybutyl, etc. An alkoxyalkyl group of
Examples of the group in which the alkyl group having 1 to 8 carbon atoms is substituted with a halogen atom and interrupted by -O- include, for example, chloromethyloxy, dichloromethyloxy, trichloromethyloxy, fluoromethyloxy, difluoromethyloxy , Trifluoromethyloxy, nonafluorobutyloxy and the like.
上記一般式（１）〜（３）において、Ｘ及びＸ’で表される炭素原子数３〜６のシクロアルカン−１，１−ジイル基としては、シクロプロパン−１，１−ジイル、シクロブタン−１，１−ジイル、２，４−ジメチルシクロブタン−１，１−ジイル、３，３−ジメチルシクロブタン−１，１−ジイル、シクロペンタン−１，１−ジイル、シクロヘキサン−１，１−ジイル等が挙げられる。 In the general formulas (1) to (3), the cycloalkane-1,1-diyl group having 3 to 6 carbon atoms represented by X and X ′ includes cyclopropane-1,1-diyl, cyclobutane- 1,1-diyl, 2,4-dimethylcyclobutane-1,1-diyl, 3,3-dimethylcyclobutane-1,1-diyl, cyclopentane-1,1-diyl, cyclohexane-1,1-diyl, etc. Can be mentioned.
上記一般式（１）〜（３）において、Ｙ、Ｙ’及びＹ2で表されるハロゲン原子、炭素原子数１〜２０のアルキル基、炭素原子数６〜３０のアリール基及び炭素原子数７〜３０のアリールアルキル基としては、上記Ｒ1等の説明で例示した基が挙げられ、これらの置換基中の水素原子は、水酸基、ハロゲン原子、シアノ基、カルボキシル基、アミノ基、アミド基、フェロセニル基、−ＳＯ3Ｈ又はニトロ基で任意の数で置換されてもよい。
また、これらのＹ、Ｙ’、Ｙ2中のアルキル基、アリール基及びアリールアルキル基中のメチレン基は、−Ｏ−、−Ｓ−、−ＣＯ−、−ＣＯＯ−、−ＯＣＯ−、−ＳＯ2−、−ＮＨ−、−ＣＯＮＨ−、−ＮＨＣＯ−、−Ｎ＝ＣＨ−又は−ＣＨ＝ＣＨ−で中断されてもよい。例えば、メチル、エチル、プロピル、ｉｓｏ−プロピル、ブチル、ｓｅｃ−ブチル、ｔｅｒｔ−ブチル、ｉｓｏ−ブチル、アミル、ｉｓｏ−アミル、ｔｅｒｔ−アミル、ヘキシル、２−ヘキシル、３−ヘキシル、シクロヘキシル、１−メチルシクロヘキシル、ヘプチル、２−ヘプチル、３−ヘプチル、ｉｓｏ−ヘプチル、ｔｅｒｔ−ヘプチル、１−オクチル、ｉｓｏ−オクチル、ｔｅｒｔ−オクチル、２−エチルヘキシル、ノニル、ｉｓｏ−ノニル、デシル、ドデシル、トリデシル、テトラデシル、ペンタデシル、ヘキサデシル、ヘプタデシル、オクタデシル等のアルキル基；フェニル、ナフチル、２−メチルフェニル、３−メチルフェニル、４−メチルフェニル、４−ビニルフェニル、３−ｉｓｏ−プロピルフェニル、４−ｉｓｏ−プロピルフェニル、４−ブチルフェニル、４−ｉｓｏ−ブチルフェニル、４−ｔｅｒｔ−ブチルフェニル、４−ヘキシルフェニル、４−シクロヘキシルフェニル、４−オクチルフェニル、４−（２−エチルヘキシル）フェニル、４−ステアリルフェニル、２，３−ジメチルフェニル、２，４−ジメチルフェニル、２，５−ジメチルフェニル、２，６−ジメチルフェニル、３，４−ジメチルフェニル、３，５−ジメチルフェニル、２，４−ジ−ｔｅｒｔ−ブチルフェニル、シクロヘキシルフェニル等のアリール基；ベンジル、フェネチル、２−フェニルプロパン−２−イル、ジフェニルメチル、トリフェニルメチル、スチリル、シンナミル等のアリールアルキル基等が、エーテル結合、チオエーテル結合等で中断されたもの、例えば、２−メトキシエチル、３−メトキシプロピル、４−メトキシブチル、２−ブトキシエチル、メトキシエトキシエチル、メトキシエトキシエトキシエチル、３−メトキシブチル、２−フェノキシエチル、３−フェノキシプロピル、２−メチルチオエチル、２−フェニルチオエチル等が挙げられる。
In the general formulas (1) to (3), the halogen atom represented by Y, Y ′ and Y 2 , an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, and 7 carbon atoms. Examples of the arylalkyl group of ˜30 include the groups exemplified in the description of R 1 and the like, and the hydrogen atom in these substituents is a hydroxyl group, a halogen atom, a cyano group, a carboxyl group, an amino group, an amide group, It may be substituted with any number of ferrocenyl groups, —SO 3 H or nitro groups.
In addition, the alkyl group, the aryl group and the methylene group in the arylalkyl group in Y, Y ′, and Y 2 are —O—, —S—, —CO—, —COO—, —OCO—, —SO. 2- , -NH-, -CONH-, -NHCO-, -N = CH- or -CH = CH- may be interrupted. For example, methyl, ethyl, propyl, iso-propyl, butyl, sec-butyl, tert-butyl, iso-butyl, amyl, iso-amyl, tert-amyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 1- Methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, iso-heptyl, tert-heptyl, 1-octyl, iso-octyl, tert-octyl, 2-ethylhexyl, nonyl, iso-nonyl, decyl, dodecyl, tridecyl, tetradecyl Alkyl groups such as pentadecyl, hexadecyl, heptadecyl, octadecyl; phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 4-vinylphenyl, 3-iso-propylphenyl, 4-iso-propi Phenyl, 4-butylphenyl, 4-iso-butylphenyl, 4-tert-butylphenyl, 4-hexylphenyl, 4-cyclohexylphenyl, 4-octylphenyl, 4- (2-ethylhexyl) phenyl, 4-stearylphenyl, 2,3-dimethylphenyl, 2,4-dimethylphenyl, 2,5-dimethylphenyl, 2,6-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, 2,4-di-tert- Aryl groups such as butylphenyl and cyclohexylphenyl; arylalkyl groups such as benzyl, phenethyl, 2-phenylpropan-2-yl, diphenylmethyl, triphenylmethyl, styryl, and cinnamyl are interrupted by ether bonds, thioether bonds, etc. Such as 2-methoxye 3-methoxypropyl, 4-methoxybutyl, 2-butoxyethyl, methoxyethoxyethyl, methoxyethoxyethoxyethyl, 3-methoxybutyl, 2-phenoxyethyl, 3-phenoxypropyl, 2-methylthioethyl, 2-phenylthio And ethyl.
本発明で用いられるスクアリリウム染料の中でも、上記一般式（３）で表されるものが、目的の波長の光を効果的に遮断するので好ましく、上記一般式（３）においてＡが下記の群IIIの（ａ１）〜（ａ４）、（ｂ１）又は（ｅ１）〜（ｅ４）から選ばれる基であり、かつＡ’が下記の群IVの（ａ１’）〜（ａ４’）、（ｂ１’）又は（ｅ１’）〜（ｅ４’）から選ばれる基であるのが、波長の点から好ましい。 Among the squarylium dyes used in the present invention, those represented by the general formula (3) are preferable because they effectively block light having a target wavelength. In the general formula (3), A is the following group III: (A1) to (a4), (b1), or (e1) to (e4), and A ′ is a group (a1 ′) to (a4 ′) or (b1 ′) of the following group IV: Alternatively, a group selected from (e1 ′) to (e4 ′) is preferable from the viewpoint of wavelength.
（式中、Ｒ2、Ｒ2’、Ｘ、Ｘ’、Ｙ、Ｙ’は、上記群I及びIIと同じであり、
Ｒ11〜Ｒ38、Ｒ61〜Ｒ84及びＲ11'〜Ｒ38'、Ｒ61'〜Ｒ84'は、水素原子、水酸基、ハロゲン原子、ニトロ基、シアノ基、−ＳＯ3Ｈ、カルボキシル基、アミノ基、アミド基、フェロセニル基、炭素原子数６〜３０のアリール基、炭素原子数７〜３０のアリールアルキル基又は炭素原子数１〜８のアルキル基を表し、
該炭素原子数６〜３０のアリール基、炭素原子数７〜３０のアリールアルキル基及び炭素原子数１〜８のアルキル基は、水酸基、ハロゲン原子、ニトロ基、シアノ基、−ＳＯ3Ｈ、カルボキシル基、アミノ基、アミド基又はフェロセニル基で置換されていてもよく、−Ｏ−、−Ｓ−、−ＣＯ−、−ＣＯＯ−、−ＯＣＯ−、−ＳＯ2−、−ＮＨ−、−ＣＯＮＨ−、−ＮＨＣＯ−、−Ｎ＝ＣＨ−又は−ＣＨ＝ＣＨ−で中断されていてもよい。）
(Wherein R 2 , R 2 ′, X, X ′, Y, Y ′ are the same as those in the above groups I and II,
R 11 to R 38 , R 61 to R 84 and R 11 ′ to R 38 ′ and R 61 ′ to R 84 ′ are a hydrogen atom, a hydroxyl group, a halogen atom, a nitro group, a cyano group, —SO 3 H, a carboxyl group. , An amino group, an amide group, a ferrocenyl group, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or an alkyl group having 1 to 8 carbon atoms,
The aryl group having 6 to 30 carbon atoms, the arylalkyl group having 7 to 30 carbon atoms and the alkyl group having 1 to 8 carbon atoms are a hydroxyl group, a halogen atom, a nitro group, a cyano group, —SO 3 H, carboxyl Group, amino group, amide group or ferrocenyl group, which may be substituted, —O—, —S—, —CO—, —COO—, —OCO—, —SO 2 —, —NH—, —CONH— , -NHCO-, -N = CH- or -CH = CH-. )
本発明で用いられるスクアリリウム染料の具体例としては、下記化合物Ｎｏ．１〜２４が挙げられる。 Specific examples of the squarylium dye used in the present invention include the following compound No. 1-24 are mentioned.
上記一般式（３）で表される化合物は、その製造方法は特に限定されず、周知一般の反応を利用した方法で得ることができ、例えば、特開２００４−３１５７８９号公報、特開２００７−１９９４２１号公報に記載されているルートの如く、該当する構造を有する環構造を誘導する化合物とスクエア酸誘導体との反応により合成する方法が挙げられる。 The production method of the compound represented by the general formula (3) is not particularly limited and can be obtained by a method using a known general reaction. For example, JP 2004-315789 A, JP 2007- A method of synthesizing by reacting a compound that induces a ring structure having a corresponding structure with a squaric acid derivative, such as the route described in Japanese Patent No. 199421.
上記スクアリリウム染料は、塗膜の極大吸収波長（λｍａｘ）が６５０〜１２００ｎｍであるのが好ましく、６５０〜９００ｎｍがさらに好ましい。塗膜の極大吸収波長（λｍａｘ）が１２００ｎｍを超えると、本願発明の効果を発揮せず、６５０ｎｍ未満であると、可視光線を吸収するため好ましくない。 The squarylium dye preferably has a maximum absorption wavelength (λmax) of the coating film of 650 to 1200 nm, and more preferably 650 to 900 nm. When the maximum absorption wavelength (λmax) of the coating film exceeds 1200 nm, the effect of the present invention is not exhibited, and when it is less than 650 nm, visible light is absorbed, which is not preferable.
上記スクアリリウム染料を含有するコーティング層（Ｂ）において、スクアリリウム染料は、上記樹脂１００質量部に対して０．０１〜１０．０質量部含有されていることが好ましく、０．０１〜５．０質量部含有されていることが更に好ましい。樹脂１００質量部に対するスクアリリウム染料の含有量が０．０１質量部未満であると、特定波長を十分に吸収できず目的の機能が発現しない可能性があり、１０．０質量部を超えると、スクアリリウム染料が析出するため好ましくない。 In the coating layer (B) containing the squarylium dye, the squarylium dye is preferably contained in an amount of 0.01 to 10.0 parts by mass, and 0.01 to 5.0 parts by mass with respect to 100 parts by mass of the resin. More preferably, it is contained in part. If the content of the squarylium dye relative to 100 parts by mass of the resin is less than 0.01 parts by mass, the specific wavelength may not be sufficiently absorbed, and the intended function may not be exhibited. Since the dye is deposited, it is not preferable.
上記スクアリリウム染料は、単独又は複数種を組み合わせて用いることができる。また、上記一般式（１）〜（３）で表される化合物以外に公知の染料を用いることも可能である。公知の染料としては例えば、アゾ染料、アントラキノン染料、インジゴイド染料、シアニン染料、トリアリールメタン染料、キサンテン染料、アリザリン染料、アクリジン染料、スチルベン染料、チアゾール染料、ナフトール染料、キノリン染料、ニトロ染料、インダミン染料、オキサジン染料、フタロシアニン染料、シアニン染料等が挙げられ、これらは複数を混合して用いてもよい。 The said squarylium dye can be used individually or in combination of multiple types. In addition to the compounds represented by the general formulas (1) to (3), known dyes can be used. Known dyes include, for example, azo dyes, anthraquinone dyes, indigoid dyes, cyanine dyes, triarylmethane dyes, xanthene dyes, alizarin dyes, acridine dyes, stilbene dyes, thiazole dyes, naphthol dyes, quinoline dyes, nitro dyes, indamine dyes. , An oxazine dye, a phthalocyanine dye, a cyanine dye, and the like. These may be used in combination.
公知の染料を併用する場合、上記一般式（１）〜（３）で表わされる化合物の含有量（全染料中）は、好ましくは５０〜１００質量％、より好ましくは７０〜１００質量％である。上記一般式（１）〜（３）で表わされる化合物の含有量が５０質量％より小さいと、溶媒への溶解性が低下したり、耐熱性が低下したりする場合がある。 When a known dye is used in combination, the content of the compounds represented by the general formulas (1) to (3) (in the total dye) is preferably 50 to 100% by mass, more preferably 70 to 100% by mass. . When the content of the compounds represented by the general formulas (1) to (3) is less than 50% by mass, the solubility in a solvent may be lowered, or the heat resistance may be lowered.
上記スクアリリウム染料を含有するコーティング層（Ｂ）を形成するための塗工液において、染料の含有量は、単独又は複数種の合計で、好ましくは０．０１〜５０質量％、より好ましくは０．１〜３０質量％である。染料の含有量が０．０１質量％より小さいと、十分な特性が得られない場合があり、５０質量％より大きいと、コーティング層中で染料の析出が起こる場合がある。 In the coating liquid for forming the coating layer (B) containing the squarylium dye, the content of the dye is singly or in total of a plurality of types, preferably 0.01 to 50% by mass, more preferably 0.00. 1 to 30% by mass. When the content of the dye is less than 0.01% by mass, sufficient characteristics may not be obtained. When the content is more than 50% by mass, the dye may precipitate in the coating layer.
上記樹脂としては、例えば、ゼラチン、カゼイン、澱粉、セルロース誘導体、アルギン酸等の天然高分子材料、あるいは、ポリメチルメタクリレート、ポリビニルブチラール、ポリビニルピロリドン、ポリビニルアルコール、ポリ塩化ビニル、スチレン−ブタジエンコポリマー、ポリスチレン、ポリカーボネート、ポリアミド等の合成高分子材料が用いられる。 Examples of the resin include natural polymer materials such as gelatin, casein, starch, cellulose derivatives, and alginic acid, or polymethyl methacrylate, polyvinyl butyral, polyvinyl pyrrolidone, polyvinyl alcohol, polyvinyl chloride, styrene-butadiene copolymer, polystyrene, Synthetic polymer materials such as polycarbonate and polyamide are used.
上記必要に応じて配合される他の成分としては、ベンゾトリアゾール系、トリアジン系、ベンゾエート系の紫外線吸収剤；フェノール系、リン系、硫黄系酸化防止剤；カチオン系界面活性剤、アニオン系界面活性剤、ノニオン系界面活性剤、両性界面活性剤等からなる帯電防止剤；ハロゲン系化合物、リン酸エステル系化合物、リン酸アミド系化合物、メラミン系化合物、フッ素樹脂又は金属酸化物、（ポリ）リン酸メラミン、（ポリ）リン酸ピペラジン等の難燃剤；炭化水素系、脂肪酸系、脂肪族アルコール系、脂肪族エステル系、脂肪族アマイド系又は金属石けん系の滑剤；フュームドシリカ、微粒子シリカ、けい石、珪藻土類、クレー、カオリン、珪藻土、シリカゲル、珪酸カルシウム、セリサイト、カオリナイト、フリント、長石粉、蛭石、アタパルジャイト、タルク、マイカ、ミネソタイト、パイロフィライト、シリカ等の珪酸系無機添加剤；ガラス繊維、炭酸カルシウム等の充填剤；造核剤、結晶促進剤等の結晶化剤、シランカップリング剤、可撓性ポリマー等のゴム弾性付与剤等が挙げられる。これらの他の成分の使用量は、スクアリリウム染料を含有するコーティング層（Ｂ）を形成するための塗工液中、合計で、５０質量％以下とする。 Other components that may be blended as necessary include benzotriazole, triazine, and benzoate UV absorbers; phenol, phosphorus, and sulfur antioxidants; cationic surfactants and anionic surfactants Agents, nonionic surfactants, amphoteric surfactants, etc .; halogen compounds, phosphate ester compounds, phosphate amide compounds, melamine compounds, fluororesins or metal oxides, (poly) phosphorus Flame retardants such as melamine acid, piperazine phosphate (poly); hydrocarbon-based, fatty acid-based, aliphatic alcohol-based, aliphatic ester-based, aliphatic amide-based or metal soap-based lubricants; fumed silica, fine particle silica, silica Stone, diatomaceous earth, clay, kaolin, diatomaceous earth, silica gel, calcium silicate, sericite, kaolinite, flint, feldspar powder Silica-based inorganic additives such as meteorite, attapulgite, talc, mica, minnesite, pyrophyllite and silica; fillers such as glass fiber and calcium carbonate; crystallization agents such as nucleating agents and crystallization accelerators, silane couplings Examples thereof include rubber elasticity imparting agents such as agents and flexible polymers. The amount of these other components used is 50% by mass or less in total in the coating solution for forming the coating layer (B) containing the squarylium dye.
上記溶媒としては、特に限定されることなく公知の種々の溶媒を適宜用いることができ、例えば、イソプロパノール等のアルコール類；メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、ブチルジグリコール等のエーテルアルコール類；アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、ジアセトンアルコール等のケトン類、酢酸エチル、酢酸ブチル、酢酸メトキシエチル等のエステル類；アクリル酸エチル、アクリル酸ブチル等のアクリル酸エステル類、２，２，３，３−テトラフルオロプロパノール等のフッ化アルコール類；ヘキサン、ベンゼン、トルエン、キシレン等の炭化水素類；メチレンジクロライド、ジクロロエタン、クロロホルム等の塩素化炭化水素類、ジメチルホルムアミド、ジメチルアセトアミド（ＤＭＡｃ）等が挙げられる。これらの有機溶媒は、単独で又は混合して用いることができる。 The solvent is not particularly limited and various known solvents can be used as appropriate. Examples thereof include alcohols such as isopropanol; ether alcohols such as methyl cellosolve, ethyl cellosolve, butyl cellosolve, and butyl diglycol; acetone, Ketones such as methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and diacetone alcohol; esters such as ethyl acetate, butyl acetate and methoxyethyl acetate; acrylic acid esters such as ethyl acrylate and butyl acrylate; Fluorinated alcohols such as 3-tetrafluoropropanol; hydrocarbons such as hexane, benzene, toluene, xylene; chlorinated hydrocarbons such as methylene dichloride, dichloroethane, chloroform, dimethylformamide, dimethyl Acetamide (DMAc) and the like. These organic solvents can be used alone or in combination.
上記スクアリリウム染料を含有するコーティング層（Ｂ）の厚さは１〜２００μｍであるのが、均一な膜が得られ薄膜化に有利であるため好ましい。１μｍ未満だと機能を十分に発現することができず、２００μｍを超えると、塗布時に溶媒が残留する恐れがある。 The thickness of the coating layer (B) containing the squarylium dye is preferably 1 to 200 μm because a uniform film is obtained and is advantageous for thinning. If the thickness is less than 1 μm, the function cannot be sufficiently exhibited, and if it exceeds 200 μm, the solvent may remain during coating.
＜赤外線反射膜（Ｃ）＞
本発明のカットフィルタに用いられる赤外線反射膜は、７００〜１２００ｎｍの波長域の光を遮断する機能を有するものであり、低屈折率層と高屈折率層とが交互に積層された誘電体多層膜により形成される。
<Infrared reflective film (C)>
The infrared reflective film used in the cut filter of the present invention has a function of blocking light in the wavelength range of 700 to 1200 nm, and is a dielectric multilayer in which low refractive index layers and high refractive index layers are alternately stacked. It is formed by a film.
上記低屈折率層を構成する材料としては、屈折率１．２〜１．６の材料を用いることができ、例えば、シリカ、アルミナ、フッ化ランタン、フッ化マグネシウム、六フッ化アルミニウムナトリウム等が挙げられる。 As a material constituting the low refractive index layer, a material having a refractive index of 1.2 to 1.6 can be used. For example, silica, alumina, lanthanum fluoride, magnesium fluoride, aluminum hexafluoride sodium, etc. Can be mentioned.
上記高屈折率層を構成する材料としては、屈折率が１．７〜２．５の材料を用いることができ、例えば、酸化チタン、酸化ジルコニウム、五酸化タンタル、五酸化ニオブ、酸化ランタン、酸化イットリウム、酸化亜鉛、硫化亜鉛、酸化インジウム等が挙げられる他、これらを主成分とし、酸化チタン、酸化錫、酸化セリウム等を少量含有させたもの等が挙げられる。 As the material constituting the high refractive index layer, a material having a refractive index of 1.7 to 2.5 can be used. For example, titanium oxide, zirconium oxide, tantalum pentoxide, niobium pentoxide, lanthanum oxide, oxidation Examples thereof include yttrium, zinc oxide, zinc sulfide, indium oxide, and the like, and those containing these as main components and containing a small amount of titanium oxide, tin oxide, cerium oxide, and the like.
上記低屈折率層と高屈折率層を積層する方法については、これらの層を積層した誘電体多層膜が形成される限り特に制限はないが、例えば、ガラス基板上に、ＣＶＤ法、スパッタ法、真空蒸着法等により低屈折率層と高屈折率層を交互に積層した誘電体多層膜を形成する方法が挙げられる。また、あらかじめ誘電体多層膜を形成し、これをガラス基板に接着剤で貼り合わせることもできる。
積層数は、１０〜８０層であり、２５〜５０層であるのが、プロセス及び強度の点から好ましい。
The method for laminating the low refractive index layer and the high refractive index layer is not particularly limited as long as a dielectric multilayer film in which these layers are laminated is formed. For example, a CVD method, a sputtering method on a glass substrate. And a method of forming a dielectric multilayer film in which a low refractive index layer and a high refractive index layer are alternately laminated by a vacuum deposition method or the like. It is also possible to form a dielectric multilayer film in advance and attach it to the glass substrate with an adhesive.
The number of layers is 10 to 80, and 25 to 50 is preferable from the viewpoint of process and strength.
上記低屈折率層と高屈折率層の厚みは、それぞれ、通常、遮断しようとする光線の波長λ（ｎｍ）の１／１０〜１／２の厚みである。厚みが０．１λ未満あるいは０．５λより大きくなると、屈折率（ｎ）と物理膜厚（ｄ）との積（ｎｄ）がλ／４の倍数で表される光学膜厚と大きく異なって特定波長の遮断・透過ができない恐れがある。 The thicknesses of the low refractive index layer and the high refractive index layer are usually 1/10 to 1/2 of the wavelength λ (nm) of the light beam to be blocked. When the thickness is less than 0.1λ or greater than 0.5λ, the product (nd) of the refractive index (n) and the physical film thickness (d) is significantly different from the optical film thickness expressed as a multiple of λ / 4. There is a risk that the wavelength cannot be blocked or transmitted.
上記赤外線反射膜（Ｃ）としては、上記の誘電体多層膜の他、極大吸収波長が６５０〜１２００ｎｍの染料を含有する膜、高分子を積層させたもの、コレステリック液晶を塗布して形成した膜等の有機材料を用いたものを使用することもできる。 As the infrared reflective film (C), in addition to the dielectric multilayer film, a film containing a dye having a maximum absorption wavelength of 650 to 1200 nm, a film in which a polymer is laminated, or a film formed by applying a cholesteric liquid crystal The thing using organic materials, such as these, can also be used.
本発明の波長カットフィルタは、透過率が下記（ｉ）〜（ｉｉｉ）を満たすことが好ましい。尚、上透過率の測定は、日本分光（株）製紫外可視近赤外分光光度計Ｖ−５７０で測定した。
（ｉ）波長４３０〜５８０ｎｍの範囲において、波長カットフィルタの垂直方向から測定した場合の透過率の平均値が７５％以上である。
（ｉｉ）波長８００〜１０００ｎｍにおいて、波長カットフィルタの垂直方向から測定した場合の透過率の平均値が５％以下である。
（ｉｉｉ）波長５６０〜８００ｎｍの範囲において、波長カットフィルタの垂直方向から測定した場合の透過率が８０％となる波長の値（Ｙａ）と、波長カットフィルタの垂直方向に対して３５°の角度から測定した場合の透過率が８０％となる波長の値（Ｙｂ）の差の絶対値が３０ｎｍ以下である。
波長カットフィルタにおいて、上記（ｉ）の波長４３０〜５８０ｎｍの範囲における透過率の平均値が７５％未満であると、可視光領域における光をほとんど透過しないことになり、上記（ｉｉ）の波長８００〜１０００ｎｍにおける透過率の平均値が５％を超えると、赤外線領域における光をほとんどカットしないため、人間の視感度に近づくよう感度を補正することが困難になる恐れがある。
また、上記（ｉｉｉ）のＹａとＹｂの差の絶対値が３０ｎｍを超えると、光の入射角による依存性が高くなり、光の入射角によって波長カットフィルタの特性が変化するため、画面の中心と周辺で色合いが変化する等の弊害が生じる恐れがある。
The wavelength cut filter of the present invention preferably has a transmittance satisfying the following (i) to (iii). The upper transmittance was measured with an ultraviolet-visible near-infrared spectrophotometer V-570 manufactured by JASCO Corporation.
(I) In the wavelength range of 430 to 580 nm, the average value of the transmittance when measured from the vertical direction of the wavelength cut filter is 75% or more.
(Ii) At a wavelength of 800 to 1000 nm, the average value of transmittance when measured from the vertical direction of the wavelength cut filter is 5% or less.
(Iii) In the wavelength range of 560 to 800 nm, the wavelength value (Ya) at which the transmittance is 80% when measured from the vertical direction of the wavelength cut filter, and an angle of 35 ° with respect to the vertical direction of the wavelength cut filter The absolute value of the difference in wavelength value (Yb) at which the transmittance is 80% when measured from is 30 nm or less.
In the wavelength cut filter, when the average value of transmittance in the wavelength range of 430 to 580 nm of (i) is less than 75%, light in the visible light region is hardly transmitted, and the wavelength 800 of (ii) above. If the average value of transmittance at ˜1000 nm exceeds 5%, light in the infrared region is hardly cut, so that it may be difficult to correct the sensitivity to approach human visibility.
If the absolute value of the difference between Ya and Yb in (iii) exceeds 30 nm, the dependence on the incident angle of light increases, and the characteristics of the wavelength cut filter change depending on the incident angle of light. There is a risk of adverse effects such as a change in color around.
本発明の波長カットフィルタの具体的な用途としては、自動車や建物の窓ガラス等に装着される熱線カットフィルタ；デジタルスチルカメラ、デジタルビデオカメラ、監視カメラ、車載用カメラ、ウェブカメラ、携帯電話用カメラ等の固体撮像装置におけるＣＣＤやＣＭＯＳ等の固体撮像素子用視感度補正用；自動露出計；プラズマディスプレイ等の表示装置等を挙げることができる。 As a specific application of the wavelength cut filter of the present invention, a heat ray cut filter mounted on a window glass of an automobile or a building; a digital still camera, a digital video camera, a surveillance camera, an in-vehicle camera, a web camera, a mobile phone For example, for a visibility correction for a solid-state imaging device such as a CCD or CMOS in a solid-state imaging device such as a camera; an automatic exposure meter; a display device such as a plasma display.
次に、本発明の固体撮像装置及びカメラモジュールについて説明する。
本発明の固体撮像装置は、本発明の波長カットフィルタを撮像素子の前面に備えることにより作製できる。図３に示すように、本発明の波長カットフィルタ１は、撮像素子２の光入射側で撮像素子以外の部分に固定してもよいし、図２に示すように撮像素子の前面に直接固定してもよい。
Next, the solid-state imaging device and camera module of the present invention will be described.
The solid-state imaging device of the present invention can be manufactured by providing the wavelength cut filter of the present invention on the front surface of the imaging device. As shown in FIG. 3, the wavelength cut
本発明の固体撮像装置には、必要に応じて、光学ローパスフィルタ、反射防止フィルタ、カラーフィルタ等を配置することができ、これらを積層する順序に特に制限はない。 In the solid-state imaging device of the present invention, an optical low-pass filter, an antireflection filter, a color filter, and the like can be arranged as necessary, and the order of stacking these is not particularly limited.
以下、本発明の固体撮像装置の一つであるカメラモジュールに関し、本発明の波長カットフィルタ１が、固体撮像素子２の光入射側で固体撮像素子に直接固定されている場合について具体的に説明する。
図２は、本発明の固体撮像装置の一つであるカメラモジュールの構成の一形態を示す断面図である。カメラモジュールは、半導体基板に平面視矩形状に形成された固体撮像素子２と、固体撮像素子２の受光部３の反対側に、光入射側から染料を含有するコーティング層（Ｂ）・ガラス基板（Ａ）・赤外線反射膜（Ｃ）の順に積層された波長カットフィルタ１とを備えており、固体撮像素子２の一面において受光部３を除いた領域に形成された接着剤４によって、固体撮像素子２及び波長カットフィルタ１を接合する。固体撮像装置であるカメラモジュールは、波長カットフィルタ１を通して外部からの光を取り込み、固体撮像素子２の受光部３に配置された受光素子によって受光する。
Hereinafter, the case where the wavelength cut
FIG. 2 is a cross-sectional view showing an embodiment of the configuration of a camera module that is one of the solid-state imaging devices of the present invention. The camera module includes a solid-
接着剤４としては、アクリル系樹脂、エポキシ系樹脂等のＵＶ硬化性接着剤あるいは熱硬化性樹脂を用いることができ、該接着剤４を均一に塗布した後、必要に応じて周知のフォトリソグラフィ技術を用いて接着剤４をパターニングし、熱硬化により接合する。接合する際には、真空環境内で貼り合せ後に真空加圧を行ってもよい。 As the adhesive 4, a UV curable adhesive such as an acrylic resin or an epoxy resin, or a thermosetting resin can be used. After the adhesive 4 is uniformly applied, a known photolithography may be used as necessary. The adhesive 4 is patterned using a technique and bonded by thermosetting. When joining, vacuum pressurization may be performed after bonding in a vacuum environment.
実装基板８は、ガラスエポキシ基板やセラミック基板等を用いたリジッド基板であり、固体撮像素子２を制御する制御回路が設けられているものである。
実装基板８上に固体撮像素子２を配置し、続いて、実装基板８のレンズホルダ７が固着される位置に予め接着剤４を塗布しておく。
レンズキャップ６は、レンズ５を保護するものである。また、レンズホルダ７は、レンズ５を保持するものであり、実装基板８に取り付けられて固体撮像素子２を覆う箱状のベース部７ａと、レンズ５を保持する円筒形状の鏡筒部７ｂとを備えている。
The mounting
The solid-
The
続いて、レンズホルダ７の下端面が塗布された接着剤４に接するようにレンズホルダ７を実装基板８上に配置し、更に固体撮像素子２の受光部３とレンズホルダ７内のレンズ５との距離が、レンズ５の焦点距離に一致するようにレンズホルダ７の位置の調節を行う。
Subsequently, the
レンズホルダ７の位置調節を行った後、接着剤４に対して紫外線を照射し、接着剤４を硬化させ、カメラモジュールを製造することができる。
レンズホルダ７が固定された実装基板８全体を、約８５℃ で加熱して、熱硬化により更に接着剤４の硬化を十分に行ってもよい。
After adjusting the position of the
The
尚、カメラモジュールの製造方法においては、紫外線を照射する工程の後に、実装基板８全体を加熱する工程を含むため、レンズホルダ７、レンズ５及び波長カットフィルタ１はいずれも、耐熱性の高い材料を用いることが必要とされる。具体的には、前述のように接着剤４の熱硬化のための加熱の他、実装基板８の下面に配置される複数のはんだを、約２６０℃ で加熱溶融処理して他の基板にはんだ付けするため、リフロー耐性を持った材料で形成されていることが望ましい。
Since the camera module manufacturing method includes a step of heating the entire mounting
以下、実施例等を挙げて本発明を更に詳細に説明するが、本発明はこれらの実施例等に限定されるものではない。 Hereinafter, although an example etc. are given and the present invention is explained still in detail, the present invention is not limited to these examples.
製造例１〜５は、本発明のカットフィルタに用いられるスクアリリウム染料を含有するコーティング層（Ｂ）を形成するための塗工液の調整例を示し、比較製造例１〜４は、比較の波長カットフィルタに用いられる染料を含有するコーティング層（Ｂ）又は染料を含有しないコーティング層（Ｂ）を形成するための比較塗工液の調整例を示し、実施例１〜５は、本発明の波長カットフィルタの製造例を示し、比較例１〜４は、比較の波長カットフィルタの製造例を示し、評価例１〜５では、実施例１〜５で製造した本発明の波長カットフィルタを評価し、比較評価例１〜４では、比較例１〜４で製造した比較の波長カットフィルタを評価した。 Manufacture examples 1-5 show the adjustment example of the coating liquid for forming the coating layer (B) containing the squarylium dye used for the cut filter of this invention, and comparative manufacture examples 1-4 are the wavelengths of comparison. The adjustment example of the comparative coating liquid for forming the coating layer (B) containing the dye used for a cut filter, or the coating layer (B) which does not contain a dye is shown, Examples 1-5 are the wavelengths of this invention. The manufacture example of a cut filter is shown, Comparative Examples 1-4 shows the manufacture example of a comparative wavelength cut filter, In Evaluation Examples 1-5, the wavelength cut filter of this invention manufactured in Examples 1-5 was evaluated. In Comparative Evaluation Examples 1 to 4, the comparative wavelength cut filters manufactured in Comparative Examples 1 to 4 were evaluated.
［製造例１〜５及び比較製造例１〜４］塗工液Ｎｏ．１〜Ｎｏ．５及び比較塗工液Ｎｏ．１〜Ｎｏ．４の調製
[表１]及び[表２]に示す配合で各成分を混合し、塗工液Ｎｏ．１〜Ｎｏ．５及び比較塗工液Ｎｏ．１〜Ｎｏ．４を得た。
[Production Examples 1 to 5 and Comparative Production Examples 1 to 4] Coating liquid No. 1-No. 5 and comparative coating solution No. 1-No. Preparation of 4
Each component was mixed with the composition shown in [Table 1] and [Table 2]. 1-No. 5 and comparative coating solution No. 1-No. 4 was obtained.
［実施例１〜５及び比較例１〜４］波長カットフィルタＮｏ．１〜Ｎｏ．５及び比較の波長カットフィルタＮｏ．１〜Ｎｏ．４の製造
厚さ１００μｍのガラス基板（Ａ）の一方の面に、真空蒸着法によりシリカ（ＳｉＯ2）層と酸化チタン（ＴｉＯ2）層とを交互に積層して、全層数が３０層で厚さ約３μｍの赤外線反射膜（Ｃ）を形成した。
得られた赤外線反射膜（Ｃ）を形成したガラス基板（Ａ）の該赤外線反射膜（Ｃ）とは異なる面に、製造例１〜５で得られた塗工液Ｎｏ．１〜Ｎｏ．５を、バーコーター＃３０により塗布（膜厚１０μｍ）した後、１００℃で１０分間乾燥させてコーティング層（Ｂ）を形成し、本発明の波長カットフィルタＮｏ．１〜Ｎｏ．５を作製した。
また、厚さ１００μｍのガラス基板（Ａ）の一方の面に、比較塗工液Ｎｏ．１〜Ｎｏ．４を、バーコーター＃３０により塗布（膜厚１０μｍ）した後、１００℃で１０分間乾燥させてコーティング層（Ｂ）を形成し、比較の波長カットフィルタＮｏ．１〜Ｎｏ．４を作製した。
[Examples 1 to 5 and Comparative Examples 1 to 4] Wavelength cut filter No. 1-No. 5 and comparative wavelength cut filter No. 1-No. 4. Production of 4 A silica (SiO 2 ) layer and a titanium oxide (TiO 2 ) layer are alternately laminated on one surface of a glass substrate (A) having a thickness of 100 μm by a vacuum deposition method, and the total number of layers is 30. An infrared reflective film (C) having a thickness of about 3 μm was formed.
On the surface of the glass substrate (A) on which the obtained infrared reflective film (C) was formed, on the surface different from the infrared reflective film (C), the coating liquid No. 1-No. 5 was applied with a bar coater # 30 (
Further, on one surface of the glass substrate (A) having a thickness of 100 μm, a comparative coating solution No. 1-No. 4 was coated with a bar coater # 30 (
[評価例１〜５及び比較評価例１〜４]
実施例１〜５で得られた波長カットフィルタＮｏ．１〜Ｎｏ．５及び比較例１〜４で得られた比較の波長カットフィルタＮｏ．１〜Ｎｏ．４について、ｉ）波長４３０〜５８０ｎｍの範囲において、波長カットフィルタの垂直方向から測定した場合の透過率の平均値、ｉｉ）波長８００〜１０００ｎｍにおいて、波長カットフィルタの垂直方向から測定した場合の透過率の平均値及びｉｉｉ）波長５６０〜８００ｎｍの範囲において、波長カットフィルタの垂直方向から測定した場合の透過率が８０％となる波長の値（Ｙａ）と、波長カットフィルタの垂直方向に対して３５°の角度から測定した場合の透過率が８０％となる波長の値（Ｙｂ）の差の絶対値を求めた。結果を[表１]及び[表２]に示す。尚、上透過率の測定は、日本分光（株）製紫外可視近赤外分光光度計Ｖ−５７０で測定した。
[Evaluation Examples 1 to 5 and Comparative Evaluation Examples 1 to 4]
Wavelength cut filter No. obtained in Examples 1-5. 1-No. 5 and comparative wavelength cut filters No. 1 obtained in Comparative Examples 1 to 4. 1-No. 4) i) Average transmittance when measured from the vertical direction of the wavelength cut filter in the wavelength range of 430 to 580 nm, ii) Transmission when measured from the vertical direction of the wavelength cut filter at the wavelength of 800 to 1000 nm Average value of the rate and iii) With respect to the wavelength value (Ya) at which the transmittance is 80% when measured from the vertical direction of the wavelength cut filter in the wavelength range of 560 to 800 nm, and the vertical direction of the wavelength cut filter The absolute value of the difference in wavelength value (Yb) at which the transmittance was 80% when measured from an angle of 35 ° was determined. The results are shown in [Table 1] and [Table 2]. The upper transmittance was measured with an ultraviolet-visible near-infrared spectrophotometer V-570 manufactured by JASCO Corporation.
上記[表１]及び[表２]の結果より、染料を含有するコーティング層（Ｂ）を有しない比較例１の波長カットフィルタは入射角依存性が高く、赤外線反射膜（Ｃ）を有しない比較例２〜４の波長カットフィルタは、入射角依存性が低いものの、波長４３０〜５８０ｎｍの範囲において透過率が低いかあるいは波長８００〜１０００ｎｍにおいて透過率が高い、すなわち可視光領域においては光を透過せず、赤外線領域においては光をカットしないため人間の視感度に近づくよう感度を補正することができない。
一方、本発明の波長カットフィルタは、波長４３０〜５８０ｎｍの範囲において透過率が高く、波長８００〜１０００ｎｍにおいて透過率が低く、且つ入射角依存性が低い。
From the results of [Table 1] and [Table 2], the wavelength cut filter of Comparative Example 1 having no dye-containing coating layer (B) has high incident angle dependency and does not have an infrared reflection film (C). Although the wavelength cut filters of Comparative Examples 2 to 4 have low incident angle dependency, the transmittance is low in the wavelength range of 430 to 580 nm, or the transmittance is high in the wavelength range of 800 to 1000 nm, that is, light is transmitted in the visible light region. Since it does not transmit and does not cut light in the infrared region, the sensitivity cannot be corrected so as to approach human visibility.
On the other hand, the wavelength cut filter of the present invention has high transmittance in the wavelength range of 430 to 580 nm, low transmittance in the wavelength range of 800 to 1000 nm, and low incident angle dependency.
以上の結果より、ガラス基板（Ａ）、スクアリリウム染料を含有するコーティング層（Ｂ）及び赤外線反射膜（Ｃ）を積層してなることを特徴とする本発明の波長カットフィルタは、入射角依存性が低い。よって、本発明の波長カットフィルタは、固体撮像装置及びカメラモジュールに有用である。 From the above results, the wavelength cut filter according to the present invention, which is formed by laminating the glass substrate (A), the coating layer (B) containing the squarylium dye, and the infrared reflective film (C), has an incident angle dependency. Is low. Therefore, the wavelength cut filter of the present invention is useful for a solid-state imaging device and a camera module.
（Ａ）．ガラス基板
（Ｂ）．コーティング層
（Ｃ）．赤外線反射膜（蒸着膜）
１．波長カットフィルタ
２．固体撮像素子
３．受光部
４．接着剤
５．レンズ
６．レンズキャップ
７．レンズホルダ
７ａ．ベース部
７ｂ．鏡筒部
８．実装基板
(A). Glass substrate (B). Coating layer (C). Infrared reflective film (deposited film)
1. 1. Wavelength cut
Claims (6)
（ｉ）波長４３０〜５８０ｎｍの範囲において、波長カットフィルタの垂直方向から測定した場合の透過率の平均値が７５％以上
（ｉｉ）波長８００〜１０００ｎｍにおいて、波長カットフィルタの垂直方向から測定した場合の透過率の平均値が５％以下
（ｉｉｉ）波長５６０〜８００ｎｍの範囲において、波長カットフィルタの垂直方向から測定した場合の透過率が８０％となる波長の値（Ｙａ）と、波長カットフィルタの垂直方向に対して３５°の角度から測定した場合の透過率が８０％となる波長の値（Ｙｂ）の差の絶対値が３０ｎｍ以下 The wavelength cut filter according to claim 1, wherein the transmittance satisfies the following (i) to (iii).
(I) When the average value of transmittance when measured from the vertical direction of the wavelength cut filter in the wavelength range of 430 to 580 nm is 75% or more (ii) When measured from the vertical direction of the wavelength cut filter at the wavelength of 800 to 1000 nm The wavelength value (Ya) at which the transmittance is 80% when measured from the vertical direction of the wavelength cut filter in the range of 5% or less (iii) wavelength 560 to 800 nm, and the wavelength cut filter The absolute value of the difference in wavelength value (Yb) at which the transmittance is 80% when measured from an angle of 35 ° with respect to the vertical direction is 30 nm or less
Ｙ、Ｙ’及びＹ2は、水素原子、又は水酸基、ハロゲン原子、シアノ基、カルボキシル基、アミノ基、アミド基、フェロセニル基、−ＳＯ3Ｈ若しくはニトロ基で置換されてもよい炭素原子数１〜２０のアルキル基、炭素原子数６〜３０のアリール基若しくは炭素原子数７〜３０のアリールアルキル基を表し、
該Ｙ、Ｙ’及びＹ2中のアルキル基、アリール基及びアリールアルキル基中のメチレン基は、−Ｏ−、−Ｓ−、−ＣＯ−、−ＣＯＯ−、−ＯＣＯ−、−ＳＯ2−、−ＮＨ−、−ＣＯＮＨ−、−ＮＨＣＯ−、−Ｎ＝ＣＨ−又は−ＣＨ＝ＣＨ−で中断されていてもよく、
Ｒ51及びＲ52、Ｒ2及びＲ2’、Ｒ51及びＲ52、並びにＲ11〜Ｒ38、Ｒ61〜Ｒ84及びＲ11'〜Ｒ38'、Ｒ61'〜Ｒ84'は、水素原子、水酸基、ハロゲン原子、ニトロ基、シアノ基、−ＳＯ3Ｈ、カルボキシル基、アミノ基、アミド基、フェロセニル基、炭素原子数６〜３０のアリール基、炭素原子数７〜３０のアリールアルキル基又は炭素原子数１〜８のアルキル基を表し、
該炭素原子数６〜３０のアリール基、炭素原子数７〜３０のアリールアルキル基及び炭素原子数１〜８のアルキル基は、水酸基、ハロゲン原子、ニトロ基、シアノ基、−ＳＯ3Ｈ、カルボキシル基、アミノ基、アミド基又はフェロセニル基で置換されていてもよく、−Ｏ−、−Ｓ−、−ＣＯ−、−ＣＯＯ−、−ＯＣＯ−、−ＳＯ2−、−ＮＨ−、−ＣＯＮＨ−、−ＮＨＣＯ−、−Ｎ＝ＣＨ−又は−ＣＨ＝ＣＨ−で中断されていてもよい。） The wavelength cut filter according to any one of claims 1 to 3, wherein the squarylium dye is represented by the following general formula (I).
Y, Y ′ and Y 2 are each a hydrogen atom, or a hydroxyl group, a halogen atom, a cyano group, a carboxyl group, an amino group, an amide group, a ferrocenyl group, —SO 3 H or a nitro group, which may be substituted with 1 carbon atom. Represents an alkyl group having ˜20, an aryl group having 6 to 30 carbon atoms, or an arylalkyl group having 7 to 30 carbon atoms,
The alkyl group, the aryl group and the methylene group in the arylalkyl group in Y, Y ′ and Y 2 are —O—, —S—, —CO—, —COO—, —OCO—, —SO 2 —, -NH-, -CONH-, -NHCO-, -N = CH- or -CH = CH- may be interrupted,
R 51 and R 52 , R 2 and R 2 ′, R 51 and R 52 , and R 11 to R 38 , R 61 to R 84 and R 11 ′ to R 38 ′ , R 61 ′ to R 84 ′ are hydrogen. Atom, hydroxyl group, halogen atom, nitro group, cyano group, —SO 3 H, carboxyl group, amino group, amide group, ferrocenyl group, aryl group having 6 to 30 carbon atoms, arylalkyl group having 7 to 30 carbon atoms Or an alkyl group having 1 to 8 carbon atoms,
The aryl group having 6 to 30 carbon atoms, the arylalkyl group having 7 to 30 carbon atoms and the alkyl group having 1 to 8 carbon atoms are a hydroxyl group, a halogen atom, a nitro group, a cyano group, —SO 3 H, carboxyl Group, amino group, amide group or ferrocenyl group, which may be substituted, —O—, —S—, —CO—, —COO—, —OCO—, —SO 2 —, —NH—, —CONH— , -NHCO-, -N = CH- or -CH = CH-. )
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Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105503699A (en) * | 2014-10-08 | 2016-04-20 | 株式会社日本触媒 | Oxo carbon-based compounds, a resin composition comprising the same and a filter containing the resin composition |
| JP2016148764A (en) * | 2015-02-12 | 2016-08-18 | 株式会社日本触媒 | Near-infrared cut filter |
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| US10365417B2 (en) | 2015-01-14 | 2019-07-30 | AGC Inc. | Near-infrared cut filter and imaging device |
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| WO2019176409A1 (en) | 2018-03-13 | 2019-09-19 | 富士フイルム株式会社 | Method for manufacturing cured film, and method for manufacturing solid-state imaging element |
| WO2020049930A1 (en) | 2018-09-07 | 2020-03-12 | 富士フイルム株式会社 | Vehicular headlight unit, light-shielding film for headlight, and method for producing light-shielding film for headlight |
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| US11059977B2 (en) | 2016-02-02 | 2021-07-13 | AGC Inc. | Near-infrared-absorbing dye, optical filter, and imaging device |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006312710A (en) * | 2005-04-05 | 2006-11-16 | Adeka Corp | Cyanine compound, optical filter and optical recording material |
| JP2007271745A (en) * | 2006-03-30 | 2007-10-18 | Fujifilm Corp | Near-infrared absorbing dye-containing curable composition |
| JP2009227938A (en) * | 2008-03-25 | 2009-10-08 | Dainippon Printing Co Ltd | Near-infrared ray absorbing material |
| US20100025641A1 (en) * | 2008-08-04 | 2010-02-04 | Fujifilm Corporation | Infrared region selective reflection coat and infrared region selective reflection film |
| WO2011086785A1 (en) * | 2010-01-15 | 2011-07-21 | 株式会社Adeka | Color tone correcting agent, squarylium compound and optical filter |
| JP2012008532A (en) * | 2010-05-26 | 2012-01-12 | Jsr Corp | Near-infrared ray cut filter and device using near-infrared ray cut filter |
| WO2012029520A1 (en) * | 2010-09-03 | 2012-03-08 | 株式会社Adeka | Color conversion filter |
| JP2012103340A (en) * | 2010-11-08 | 2012-05-31 | Jsr Corp | Near-infrared cut filter, solid-state imaging sensor and solid-state imager equipped with the same |
| WO2012111400A1 (en) * | 2011-02-18 | 2012-08-23 | 株式会社Adeka | Photosensitive coloring composition |
| WO2013054864A1 (en) * | 2011-10-14 | 2013-04-18 | Jsr株式会社 | Optical filter, solid state image-capturing device using same, and camera module using same |
| WO2014002864A1 (en) * | 2012-06-25 | 2014-01-03 | Jsr株式会社 | Solid-state image capture element optical filter and application thereof |
| JP2014059550A (en) * | 2012-08-23 | 2014-04-03 | Asahi Glass Co Ltd | Near-infrared cut filter |
| JP2014130343A (en) * | 2012-11-30 | 2014-07-10 | Fujifilm Corp | Curable resin composition, and image sensor chip production method and image sensor chip using the same |
-
2012
- 2012-12-26 JP JP2012282166A patent/JP2014126642A/en active Pending
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006312710A (en) * | 2005-04-05 | 2006-11-16 | Adeka Corp | Cyanine compound, optical filter and optical recording material |
| JP2007271745A (en) * | 2006-03-30 | 2007-10-18 | Fujifilm Corp | Near-infrared absorbing dye-containing curable composition |
| JP2009227938A (en) * | 2008-03-25 | 2009-10-08 | Dainippon Printing Co Ltd | Near-infrared ray absorbing material |
| US20100025641A1 (en) * | 2008-08-04 | 2010-02-04 | Fujifilm Corporation | Infrared region selective reflection coat and infrared region selective reflection film |
| US20120197026A1 (en) * | 2010-01-15 | 2012-08-02 | Adeka Corporation | Color tone correcting agent, squarylium compound and optical filter |
| WO2011086785A1 (en) * | 2010-01-15 | 2011-07-21 | 株式会社Adeka | Color tone correcting agent, squarylium compound and optical filter |
| JP2012008532A (en) * | 2010-05-26 | 2012-01-12 | Jsr Corp | Near-infrared ray cut filter and device using near-infrared ray cut filter |
| WO2012029520A1 (en) * | 2010-09-03 | 2012-03-08 | 株式会社Adeka | Color conversion filter |
| JP2012103340A (en) * | 2010-11-08 | 2012-05-31 | Jsr Corp | Near-infrared cut filter, solid-state imaging sensor and solid-state imager equipped with the same |
| WO2012111400A1 (en) * | 2011-02-18 | 2012-08-23 | 株式会社Adeka | Photosensitive coloring composition |
| WO2013054864A1 (en) * | 2011-10-14 | 2013-04-18 | Jsr株式会社 | Optical filter, solid state image-capturing device using same, and camera module using same |
| WO2014002864A1 (en) * | 2012-06-25 | 2014-01-03 | Jsr株式会社 | Solid-state image capture element optical filter and application thereof |
| JP2014059550A (en) * | 2012-08-23 | 2014-04-03 | Asahi Glass Co Ltd | Near-infrared cut filter |
| JP2014130343A (en) * | 2012-11-30 | 2014-07-10 | Fujifilm Corp | Curable resin composition, and image sensor chip production method and image sensor chip using the same |
Cited By (21)
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| CN105503699B (en) * | 2014-10-08 | 2021-05-11 | 株式会社日本触媒 | Oxocarbon compound, resin composition containing the same, and filter containing the resin composition |
| CN105503699A (en) * | 2014-10-08 | 2016-04-20 | 株式会社日本触媒 | Oxo carbon-based compounds, a resin composition comprising the same and a filter containing the resin composition |
| US10365417B2 (en) | 2015-01-14 | 2019-07-30 | AGC Inc. | Near-infrared cut filter and imaging device |
| US10310150B2 (en) | 2015-01-14 | 2019-06-04 | AGC Inc. | Near-infrared cut filter and solid-state imaging device |
| JP2016148764A (en) * | 2015-02-12 | 2016-08-18 | 株式会社日本触媒 | Near-infrared cut filter |
| US10745572B2 (en) | 2015-02-18 | 2020-08-18 | AGC Inc. | Squarylium-based dye for near-infrared optical filter |
| US10351718B2 (en) | 2015-02-18 | 2019-07-16 | AGC Inc. | Optical filter and imaging device |
| JP2016166320A (en) * | 2015-03-05 | 2016-09-15 | 株式会社日本触媒 | Resin composition containing oxocarbon compound, and optical filter containing resin composition |
| US10228500B2 (en) | 2015-04-23 | 2019-03-12 | AGC Inc. | Optical filter and imaging device |
| JPWO2017022708A1 (en) * | 2015-08-06 | 2018-05-24 | 株式会社Adeka | Thermally reactive composition |
| CN107531857A (en) * | 2015-08-06 | 2018-01-02 | 株式会社艾迪科 | Heat reactivity composition |
| WO2017022708A1 (en) * | 2015-08-06 | 2017-02-09 | 株式会社Adeka | Thermally reactive composition |
| CN107531857B (en) * | 2015-08-06 | 2021-06-18 | 株式会社艾迪科 | Thermally reactive composition |
| US10598834B2 (en) | 2015-12-01 | 2020-03-24 | AGC Inc. | Near-infrared light blocking optical filter having high visible light transmission and an imaging device using the optical filter |
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