JP2014120595A5 - - Google Patents
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- JP2014120595A5 JP2014120595A5 JP2012274278A JP2012274278A JP2014120595A5 JP 2014120595 A5 JP2014120595 A5 JP 2014120595A5 JP 2012274278 A JP2012274278 A JP 2012274278A JP 2012274278 A JP2012274278 A JP 2012274278A JP 2014120595 A5 JP2014120595 A5 JP 2014120595A5
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- side wall
- sorting
- wafer
- detection section
- collision detection
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- 238000001514 detection method Methods 0.000 claims description 8
- 239000000969 carrier Substances 0.000 claims description 4
- 230000002093 peripheral Effects 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000005755 formation reaction Methods 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 description 2
Description
この発明に係る請求項1記載のウエハ収納キャリアは、互い対向して立設される第1の側壁と第2の側壁との間に少なくとも一枚のウエハを立設状態で収納するウエハ収納キャリアであって、前記第1の側壁から第2の側壁を向かう方向が第1の方向、前記第2の側壁から第1の側壁を向かう方向が第2の方向として規定され、前記第1及び第2の側壁は立設方向に垂直な側壁形成方向に沿って形成される複数の第1及び第2の仕分用突出部を有し、前記複数の第1の仕分用突出部はそれぞれ前記第1の方向に突出しつつ前記立設方向に延びて形成され、前記複数の第2の仕分用突出部はそれぞれ前記第2の方向に突出しつつ前記立設方向に延びて形成され、前記複数の第1の仕分用突出部のうち前記側壁形成方向において隣接形成される前記第1の仕分用突出部間に少なくとも一つの第1の溝が形成され、前記複数の第2の仕分用突出部のうち前記側壁形成方向において隣接形成される前記第2の仕分用突出部間に少なくとも一つの第2の溝が形成され、前記少なくとも一つの第1及び第2の溝のうち、互いに対向する位置関係にある前記第1及び第2の溝によって立設状態の前記ウエハの外周領域を保持することができ、前記複数の第1及び第2の仕分用突出部の先端領域はそれぞれ、前記第1及び第2の溝部間で前記ウエハを保持した際、前記ウエハの外周領域の形状に合致した形状で前記第2及び第1の方向に窪んで形成される第1及び第2の窪み部分を有することを特徴とする。 According to a first aspect of the present invention, there is provided a wafer storage carrier for storing at least one wafer in a standing state between a first side wall and a second side wall which are erected opposite to each other. The direction from the first side wall toward the second side wall is defined as the first direction, and the direction from the second side wall toward the first side wall is defined as the second direction. second sidewall has a first and second sorting for collision detection section of the plurality being formed along the vertical side wall forming direction in the upright direction, said plurality of first sorting protrusions are respectively the The plurality of second sorting projections are formed to extend in the standing direction while projecting in the second direction, respectively, and protrude in the standing direction. before being formed adjacent the first side wall forming direction of a classification collision detection section At least one first groove is formed in the second sorting for collision flanked formed in the sidewall formation direction of the plurality of second sorting for collision detecting section between the first sorting for collision detection section At least one second groove is formed between the projecting portions, and the first and second grooves in the positional relationship facing each other out of the at least one first and second grooves are in a standing state. can hold the outer peripheral region of the wafer, when holding the wafer between respective tip region of said plurality of first and second sorting for collision detection section, the first and second grooves, said wafer It has the shape which matched the shape of the outer periphery area | region of this, and has the 1st and 2nd hollow part formed hollow in the said 2nd and 1st direction, It is characterized by the above-mentioned.
請求項1記載の本願発明のウエハ収納キャリアにおいて、複数の第1及び第2の仕分用突出部の先端領域はそれぞれ、第1及び第2の溝部間で前記ウエハを保持した際、ウエハの外周領域の形状に合致した形状で第2及び第1の方向に窪んで形成される第1及び第2の窪み部分を有することを特徴としている。 In wafer storage carrier of the present invention of claim 1 wherein, each of the plurality of distal end region of the first and second sorting for collision output unit, upon holding the wafer between the first and second grooves, the wafer It is characterized by having a first and second recess portions fraction which is formed in a shape that matches the shape of the outer peripheral region recessed in a second and the first direction.
請求項1記載の本願発明は、上記特徴を有することにより、第1及び第2の窪み部分により先端領域を窪ませた領域分、第1及び第2の溝部間でウエハを保持した際の第1及び第2の仕分用突出部とウエハとの接触面積を軽減することができる。 The present invention according to claim 1 has the above-described feature, so that when the wafer is held between the first and second groove portions by the region where the tip region is recessed by the first and second recessed portions. The contact area between the first and second sorting protrusions and the wafer can be reduced.
このため、第1及び第2の溝部間で立設したウエハを保持したウエハの収納状態でウエハを洗浄する際、上記のように第1及び第2の仕分用突出部とウエハとの接触面積を軽減できる分、洗浄効率の向上を図ることができる。
For this reason, when the wafer is cleaned in the state in which the wafer holding the wafer erected between the first and second grooves is stored, the contact area between the first and second sorting protrusions and the wafer as described above. Therefore, the cleaning efficiency can be improved.
Claims (1)
前記第1及び第2の側壁は立設方向に垂直な側壁形成方向に沿って形成される複数の第1及び第2の仕分用突出部を有し、前記複数の第1の仕分用突出部はそれぞれ前記第1の方向に突出しつつ前記立設方向に延びて形成され、前記複数の第2の仕分用突出部はそれぞれ前記第2の方向に突出しつつ前記立設方向に延びて形成され、
前記複数の第1の仕分用突出部のうち前記側壁形成方向において隣接形成される前記第1の仕分用突出部間に少なくとも一つの第1の溝が形成され、前記複数の第2の仕分用突出部のうち前記側壁形成方向において隣接形成される前記第2の仕分用突出部間に少なくとも一つの第2の溝が形成され、前記少なくとも一つの第1及び第2の溝のうち、互いに対向する位置関係にある前記第1及び第2の溝によって立設状態の前記ウエハの外周領域を保持することができ、
前記複数の第1及び第2の仕分用突出部の先端領域はそれぞれ、前記第1及び第2の溝部間で前記ウエハを保持した際、前記ウエハの外周領域の形状に合致した形状で前記第2及び第1の方向に窪んで形成される第1及び第2の窪み部分を有することを特徴とする、
ウエハ収納キャリア。 A wafer storage carrier for storing at least one wafer in an erected state between a first side wall and a second side wall that are erected in opposition to each other, the first side wall to the second side wall The direction toward the first side is defined as the first direction, the direction from the second side wall toward the first side wall is defined as the second direction,
Said first and second side wall has a first and second sorting for collision detection section of the plurality being formed along the vertical side wall forming direction in the standing direction, projecting a plurality of first sorting The portions are formed to extend in the standing direction while projecting in the first direction, respectively, and the plurality of second sorting projections are respectively formed to extend in the standing direction while projecting in the second direction. ,
At least one first groove is formed between the first sorting for collision detection section which is formed adjacent the side walls forming direction of the plurality of first a classification collision detection section, a second of said plurality at least one second groove is formed in the sidewall formation direction of the sorting for collision detecting section between the second sorting for collision detection section flanked formed, of the at least one first and second grooves Among them, the outer peripheral region of the wafer in an upright state can be held by the first and second grooves in a positional relationship facing each other,
Each distal region of said plurality of first and second sorting for collision output unit, upon holding the first and second of said between groove wafer, the shape that matches the shape of the outer peripheral region of the wafer It has the 1st and 2nd hollow part formed hollow in the 2nd and 1st directions, It is characterized by the above-mentioned.
Wafer storage carrier.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012274278A JP2014120595A (en) | 2012-12-17 | 2012-12-17 | Wafer housing carrier |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012274278A JP2014120595A (en) | 2012-12-17 | 2012-12-17 | Wafer housing carrier |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014120595A JP2014120595A (en) | 2014-06-30 |
JP2014120595A5 true JP2014120595A5 (en) | 2015-02-12 |
Family
ID=51175193
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2012274278A Pending JP2014120595A (en) | 2012-12-17 | 2012-12-17 | Wafer housing carrier |
Country Status (1)
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JP (1) | JP2014120595A (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3291108B2 (en) * | 1994-02-10 | 2002-06-10 | 富士通株式会社 | Substrate processing method and apparatus |
JPH11111659A (en) * | 1997-10-01 | 1999-04-23 | Sugai:Kk | Method and device for preventing substrate electrification, and substrate cleaning device |
KR100460309B1 (en) * | 1998-02-06 | 2004-12-04 | 미라이얼 가부시키가이샤 | Sheet support container |
JP2010192801A (en) * | 2009-02-20 | 2010-09-02 | Shin Etsu Polymer Co Ltd | Substrate storing container |
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2012
- 2012-12-17 JP JP2012274278A patent/JP2014120595A/en active Pending
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