JP2014076415A - Slurry feeding nozzle and manufacturing apparatus and manufacturing method of exhaust gas cleaning catalyst using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a slurry feeding nozzle capable of feeding, even in a state where the viscosity of a catalyst slurry is high, the catalyst slurry virtually homogeneously into an entire monolithic substrate based on a simple constitution and of homogenizing catalyst coat layers formed on the respective flow channels of the monolithic substrate; and a manufacturing apparatus and a manufacturing method of an exhaust gas cleaning catalyst.SOLUTION: The provided nozzle includes an introduction unit 1 consisting of a cylindrical body, a width-expanded portion 2 having an internal space whose width expands progressively as the distance therein from the introduction unit 1 increases along the central axis 1L of the introduction unit 1, and a discharge unit 3 consisting of a plate-shaped component on which multiple discharge orifices 3a for discharging a slurry S onto a monolithic substrate M are configured in dispersed manners; the outer circumferential plane 3b of the portion of the discharge unit 3 on which the discharge orifices 3a are formed has a shape whose normal direction 3aL is tilted outward from the central axis 1L.

Description

  TECHNICAL FIELD The present invention relates to a slurry supply nozzle and an apparatus and method for manufacturing an exhaust gas purification catalyst using the same, for example, a slurry supply nozzle and an exhaust gas purification catalyst for supplying catalyst slurry to a monolith substrate having a plurality of flow paths. The present invention relates to a manufacturing apparatus and a manufacturing method.

  Exhaust gas emitted from internal combustion engines of vehicles such as automobiles contains harmful components such as hydrocarbons (HC), carbon monoxide (CO), and nitrogen oxides (NOx). Since exhaust gas containing such harmful components causes pollution and environmental degradation, it is exhausted to the outside after being purified to a certain level via an exhaust gas purification catalyst mounted on the vehicle. Yes.

  The exhaust gas purifying catalyst described above includes a catalyst carrier having a predetermined shape made of a heat-resistant material, a porous carrier layer made of an inorganic oxide or the like and formed on the surface of the catalyst carrier, and a catalyst carried on the carrier layer. And classified into a monolith catalyst, a pipe catalyst, a pellet catalyst, and the like depending on the shape of the catalyst carrier.

  Among the exhaust gas purification catalysts described above, the monolithic catalyst has an axial tubular passage through which exhaust gas flows, has a smaller pressure loss than other exhaust gas purification catalysts, and has a load on the internal combustion engine. Since it is small, it is applied in various fields.

  As a method of coating the catalyst slurry on the inner wall of a tubular flow path such as a honeycomb formed on a catalyst carrier substrate (also referred to as a monolith substrate) constituting the monolith catalyst, for example, a wash coat method can be exemplified.

  FIG. 10 shows a conventional coating apparatus using a wash coat method. In this coating apparatus A, the upper end side of the monolith substrate M arranged in parallel so that the honeycomb-shaped flow paths L are opened in the axial direction. The catalyst slurry S is supplied from the slurry supply nozzle N, and pressurized air is supplied from the upper end side or air is sucked from the lower end side, whereby the catalyst slurry S flows into or extends into the flow path L, and the flow path The inner wall of L is coated with the catalyst slurry S. Then, by drying and firing the catalyst slurry S applied to the inner wall of the flow path L, an exhaust gas purifying catalyst can be obtained. In recent years, the catalyst slurry S contains a noble metal such as platinum, and the catalyst slurry S is supplied from the slurry supply nozzle N to the upper end side of the monolith substrate M by an amount necessary for coating the monolith substrate M. I am doing so.

  By the way, the viscosity of the slurry generally used as the catalyst slurry is about 200 to 15000 mPa · s, and there is a very high viscosity. When such a highly viscous catalyst slurry is supplied from the conventional slurry supply nozzle to the upper end side of the monolith substrate, the slurry discharged from the slurry supply nozzle may decrease from the central axis of the nozzle toward the outside. There is. That is, as shown in FIG. 10, a large amount of catalyst slurry is supplied to the monolith substrate near the center axis of the nozzle, and the amount of catalyst slurry supplied may decrease as the distance from the center axis increases. . In particular, as shown in the figure, when the internal space of the slurry supply nozzle is widened, the flow amount of the catalyst slurry to a region separated from the central axis is reduced, and the internal pressure in that region is lower than the vicinity of the central axis. Therefore, there is a possibility that the difference between the amount of the catalyst slurry supplied to the vicinity of the center axis of the nozzle and the amount of the catalyst slurry supplied to the region separated from the center axis may increase. Under such circumstances, when pressurized air is supplied from the upper end side of the monolith base material or air is sucked from the lower end side and the catalyst slurry flows into or extends into the flow path, the monolith base material is formed. There is a problem that the thickness of the catalyst coat layer becomes uneven throughout the monolith substrate.

  With respect to such a problem, Patent Document 1 discloses a substrate coating apparatus in which the liquid level of the slurry stored on the upper surface of the substrate is made uniform and then the slurry is advanced into the flow path of the substrate. .

  Further, Patent Document 2 discloses a slurry supply in which the diameter of the discharge port is increased at the peripheral portion of the array of the plurality of discharge ports as compared with the central portion of the array of the plurality of discharge ports provided in the slurry supply nozzle. A nozzle is disclosed.

JP 2006-506720 A International Publication No. 2010/114132

  According to the base material coating apparatus disclosed in Patent Document 1, before the catalyst slurry is extended into the flow path, centrifugal force and vibration are applied to the catalyst slurry by the liquid level homogenizing mechanism. The liquid level of the stored catalyst slurry can be made uniform, the amount of catalyst slurry in each channel of the base material can be made uniform, and the thickness of the catalyst coat layer formed in each channel is made uniform can do.

  Further, according to the nozzle disclosed in Patent Document 2, the discharge amount of the catalyst slurry at the peripheral portion of the nozzle is increased by increasing the diameter of the discharge port at the peripheral portion of the array of the plurality of discharge ports. Can do.

  However, in the substrate coating apparatus disclosed in Patent Document 1, it is necessary to rotate or vibrate the entire monolith substrate, and there is a problem that the configuration of the entire apparatus becomes complicated and large.

  Further, in the nozzle disclosed in Patent Document 2, when the outer shape of the monolith substrate is increased, it is necessary to increase the outer shape of the nozzle and the diameter of the discharge port at the peripheral portion accordingly. As described above, it has been confirmed by the present inventors that when the diameter of the discharge port becomes large, the slurry cannot be stably discharged from the discharge port, and the thickness of the catalyst coat layer formed in each flow path becomes non-uniform. ing.

  The present invention has been made in view of the above-described problems. For example, even in a situation where the viscosity of the catalyst slurry is high, the catalyst slurry can be supplied substantially uniformly over the entire monolith substrate with a simple configuration. An object of the present invention is to provide a slurry supply nozzle, an exhaust gas purifying catalyst manufacturing apparatus, and a manufacturing method capable of uniformizing a catalyst coating layer formed in each flow path of a monolith substrate.

  In order to achieve the above object, a slurry supply nozzle according to the present invention includes an introduction portion comprising a cylindrical body for introducing slurry, and is connected to the introduction portion and spaced apart from the introduction portion along the central axis of the introduction portion. A plate formed by dispersing a plurality of discharge holes for discharging slurry onto a monolith substrate, connected to the widened portion having an internal space that widens as it goes, and an end portion of the widened portion that is spaced apart from the introduction portion. A discharge nozzle comprising a discharge member, and the outer peripheral surface of the discharge portion in which the discharge hole is formed has a normal direction with respect to the central axis of the introduction portion. It has a shape that is inclined outward.

  According to the embodiment described above, the outer peripheral surface of the portion where the discharge hole is formed in the discharge portion has a shape in which the normal direction is inclined outward with respect to the central axis of the introduction portion. Since the slurry can be discharged from the discharge hole formed in the discharge portion in a direction inclined outward with respect to the central axis of the introduction portion, the outer shape of the discharge portion with respect to the monolith substrate can be reduced. Therefore, for example, the slurry supply nozzle has an internal space that widens along the central axis of the introducing portion as it moves away from the introducing portion, and the flow rate of the catalyst slurry to the region separated from the central axis of the introducing portion decreases. Even if the internal pressure in the region is smaller than that in the vicinity of the central axis, the external shape of the discharge portion, that is, the entire size of the slurry supply nozzle including the widened portion having the internal space can be reduced in size. The pressure inside the slurry supply nozzle can be increased over the whole, and the pressure inside the slurry supply nozzle can be made uniform. Therefore, the discharge pressure of the slurry discharged from the discharge hole of the discharge portion can be increased, the discharge speed of the slurry can be increased, and the slurry is discharged more reliably in a direction inclined outward from the central axis of the introduction portion. In addition, the discharge speed and the discharge amount of the slurry discharged from each discharge hole of the discharge unit can be made more uniform.

  Examples of the shape of the outer peripheral surface of the discharge portion include a curved shape, a conical shape, and a step shape that are convex toward the central axis direction of the introduction portion.

  In addition, the slurry supply nozzle described above has an inclination adjustment in which the discharge part is made of an elastic member, and the discharge part is elastically deformed to adjust the normal direction inclination of the outer peripheral surface of the discharge part with respect to the central axis of the introduction part. It is preferable to provide the part.

  According to the embodiment described above, the slurry is supplied to a monolith substrate having different outer diameters, for example, by adjusting the inclination in the normal direction of the outer peripheral surface of the discharge section with respect to the central axis of the introduction section by the inclination adjustment section. Even when the relative distance between the slurry supply nozzle and the monolith substrate is changed, the discharge is performed in the direction corresponding to the outer diameter of the monolith substrate and the relative distance between the slurry supply nozzle and the monolith substrate. Slurry can be discharged from the holes. Further, the physique of the whole slurry supply nozzle including the widened portion having the internal space can be adjusted by adjusting the inclination in the normal direction of the outer peripheral surface of the discharge portion with respect to the central axis of the introduction portion by the inclination adjusting portion. Therefore, the size of the internal space of the slurry supply nozzle can be adjusted, and the discharge pressure and discharge speed can be adjusted together with the discharge direction of the slurry.

  Further, in the slurry supply nozzle described above, the inclination adjusting unit applies a pressing force or a pulling force to the inner peripheral surface or the outer peripheral surface of the slurry supply nozzle to elastically deform the discharge unit, thereby It is preferable to adjust the inclination in the normal direction of the outer peripheral surface of the discharge portion with respect to the central axis.

  According to the embodiment described above, the inclination of the normal direction of the outer peripheral surface of the discharge unit with respect to the central axis of the introduction unit is set with a simple configuration in which a pressing force or a pullback force is applied to the inner peripheral surface or outer peripheral surface of the slurry supply nozzle. Can be adjusted.

  In the slurry supply nozzle described above, it is preferable that the inclination adjusting unit is detachably attached to the slurry supply nozzle.

  Here, examples of the material for forming the ejection portion having elasticity include silicon rubber, polyurethane rubber, and nitrile rubber.

  Further, in the slurry supply nozzle described above, it is preferable that the hole diameter of the plurality of discharge holes of the discharge part increases as the distance from the central axis of the introduction part increases.

  According to the embodiment described above, by increasing the hole diameter of the discharge hole as the distance from the central axis of the introducing portion increases, for example, the internal pressure in the region separated from the central axis of the introducing portion is greater than the vicinity of the central axis as described above. Even when the discharge pressure or discharge speed of the slurry discharged from the discharge hole decreases as the distance from the central axis of the introduction portion decreases, the discharge amount of the slurry discharged from the discharge hole is made uniform. Can do.

  In the slurry supply nozzle described above, it is preferable that a plurality of discharge holes of the discharge unit are formed concentrically.

  According to the embodiment described above, the plurality of discharge holes of the discharge unit are formed concentrically on a circle formed in the discharge unit, thereby uniformly distributing the discharge holes in the discharge unit with a simple configuration. The discharge amount of the slurry discharged from the discharge holes can be made substantially uniform over the entire discharge portion.

  The slurry supply nozzle described above preferably includes a speed adjusting unit that adjusts the discharge speed of the slurry discharged from the discharge hole of the discharge unit.

  According to the embodiment described above, by adjusting the discharge speed of the slurry discharged from the discharge hole of the discharge unit by the speed adjusting unit, for example, when supplying slurry to a monolith substrate having different outer diameters or a slurry supply nozzle Even when the relative distance between the monolith substrate and the monolith substrate is changed, the slurry is discharged from the discharge hole at a speed corresponding to the outer diameter of the monolith substrate and the relative distance between the slurry supply nozzle and the monolith substrate. It can be discharged.

  The apparatus for producing an exhaust gas purifying catalyst of the present invention is the slurry supply nozzle described above, and supplies the slurry to the axial ends of the monolith substrates arranged in parallel so that the flow paths open in the axial direction. A slurry supply nozzle, a device for flowing or extending the slurry supplied to the axial end of the monolith substrate into the flow path of the monolith substrate, and a slurry flowing or extending into the flow path of the monolith substrate And a firing device.

  In the method for producing an exhaust gas purifying catalyst of the present invention, the slurry is supplied to the axial ends of the monolith substrates arranged in parallel so that the flow paths open in the axial direction using the slurry supply nozzle described above. A step of flowing or extending the slurry supplied to the axial end of the monolith substrate into the flow path of the monolith substrate to coat the inner wall of the flow path with the slurry, and the inner wall of the flow path. And drying the slurry to be coated, followed by firing.

  As can be understood from the above description, according to the slurry supply nozzle of the present invention and the exhaust gas purifying catalyst manufacturing apparatus and method using the same, the method of the outer peripheral surface of the portion of the discharge portion where the discharge hole is formed With a very simple configuration in which the linear direction is inclined outward with respect to the central axis of the introduction portion, for example, even in a situation where the viscosity of the catalyst slurry is high, the catalyst slurry is substantially uniformly distributed over the entire monolith substrate. The catalyst coating layer formed in each flow path of the monolith substrate can be made uniform.

It is the figure which showed typically the whole structure of the coating apparatus to which Embodiment 1 of the slurry supply nozzle of this invention was applied, Comprising: It is the figure explaining the process of introduce | transducing a slurry into a cylinder. It is the figure which showed typically the whole structure of the coating apparatus to which Embodiment 1 of the slurry supply nozzle of this invention was applied, Comprising: After the process shown in FIG. It is a figure explaining the process of supplying a slurry. FIG. 3 is a diagram schematically showing the overall configuration of a coating apparatus to which the first embodiment of the slurry supply nozzle of the present invention is applied, and the supply of slurry to the monolith substrate is completed following the step shown in FIG. 2. It is a figure explaining the process. FIG. 4 is a diagram schematically illustrating the overall configuration of a coating apparatus to which the first embodiment of the slurry supply nozzle of the present invention is applied, and is a diagram illustrating a step of pulling back slurry dripping from the nozzle following the step illustrated in FIG. 3. It is. It is the figure which showed typically the slurry supply nozzle shown in FIGS. 1-4, Comprising: (a) is the longitudinal cross-sectional view, (b) is an AA arrow line view of Fig.5 (a). . It is the longitudinal cross-sectional view which showed Embodiment 2 of the slurry supply nozzle of this invention typically, Comprising: (a) is the figure which showed the state with the small curvature of the discharge part of a nozzle, (b) is a figure of a nozzle. It is the figure which showed the state with the large curvature of a discharge part. It is the longitudinal cross-sectional view which showed Embodiment 3 of the slurry supply nozzle of this invention typically. It is the longitudinal cross-sectional view which showed Embodiment 4 of the slurry supply nozzle of this invention typically. It is the figure which showed typically Embodiment of the manufacturing apparatus of the catalyst for exhaust gas purification of this invention. It is the figure which showed the coating apparatus using the conventional slurry supply nozzle.

  DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments of a slurry supply nozzle and an exhaust gas purifying catalyst manufacturing apparatus and manufacturing method according to the present invention will be described with reference to the drawings.

[Embodiment 1 of slurry supply nozzle]
First, with reference to FIGS. 1 to 4, the overall configuration of a coating apparatus to which the first embodiment of the slurry supply nozzle of the present invention is applied and its operation mode will be outlined.

  1 to 4 are diagrams schematically showing the entire configuration of a coating apparatus to which the first embodiment of the slurry supply nozzle of the present invention is applied, and FIG. 1 shows a step of introducing slurry into a cylinder. FIG. 2 is a diagram illustrating a process of introducing slurry into the nozzle and supplying the slurry to the monolith substrate following the process illustrated in FIG. 1, and FIG. 3 is illustrated in FIG. 2. FIG. 4 is a diagram illustrating a step of completing the supply of the slurry to the monolith substrate following the step, and FIG. 4 is a diagram illustrating a step of pulling back the slurry dripping from the nozzle following the step illustrated in FIG. 3. .

  The illustrated coating apparatus 100 includes a lower holding portion 14 for fixing and holding the lower end Mb side of the monolith substrate M arranged in parallel so that the flow path L opens in the axial direction, and an upper end Ma of the monolith substrate M. An upper holding portion 15 for guiding the slurry S supplied to the upper end Ma side to the flow path L of the monolith substrate M while fixing and holding the side, a slurry tank 11 for storing the slurry, and the slurry tank 11 is connected to the slurry tank 11 via the three-way valve 17, and a syringe 12 having a piston 18 inserted therein, and the piston 18 in the syringe 12 is driven. The slurry tank 11 and the syringe 12 are communicated with each other via a drive mechanism 19, a controller 20 for controlling the drive of the drive mechanism 19, and a three-way valve 17, A slurry supply nozzle (hereinafter referred to as a nozzle) 16 that is arranged vertically above the upper end Ma of the monolith substrate M held by the lower holding unit 14 and the upper holding unit 15 and supplies the slurry S to the upper end Ma; The suction device 30 generally includes a suction device 30 that sucks air from the lower end Mb side of the monolith substrate M and flows or extends the slurry S supplied to the upper end Ma side into the flow path L of the monolith substrate M.

  The controller 20 controls the drive of the drive mechanism 19 and, in synchronization with the drive of the drive mechanism 19, a suction device 30 that sucks air from below the monolith substrate M and a transport device that transports the monolith substrate M. (Not shown) or the like is controlled.

  The slurry supply nozzle 16 is connected to the introduction portion 1 made of a substantially cylindrical body communicating with the slurry tank 11 and the syringe 12 via a three-way valve 17, and concentrically connected to the introduction portion 1. Connected to the widened portion 2 having an internal space that widens as the distance from the introducing portion 1 increases along the central axis 1L, and the lower end 2b of the widened portion 2 for discharging the slurry S to the monolith substrate M And a discharge portion 3 made of a disk-like member formed by dispersing a plurality of discharge holes 3a.

  More specifically, the widened portion 2 is such that the upper end 2a connected to the introducing portion 1 expands by a predetermined length in a direction substantially perpendicular to the central axis 1L of the introducing portion 1, and then the body portion 2c. Gradually expands along the central axis 1L of the introduction part 1 as the distance from the introduction part 1 increases, and the lower end 2b connected to the discharge part 3 has a predetermined length relative to the central axis 1L of the introduction part 1. It has a shape that is substantially parallel.

  Here, the outer peripheral surface 3b of the discharge part 3 is a direction in which the normal direction thereof is inclined outward with respect to the center axis 1L of the introduction part 1, that is, the center axis of the discharge part 3, except for the center part. In the first embodiment, the outer peripheral surface 3b of the discharge unit 3 is convex toward the direction of the monolith substrate M (vertically downward in the drawing) in the direction of the central axis 1L of the introduction unit 1 in the first embodiment. It has a curved surface shape.

  Further, the outer diameter 3D of the discharge part 3 is designed to be smaller than the outer diameter MD of the upper end Ma of the monolith substrate M held by the lower holding part 14 and the upper holding part 15, more specifically. The discharge hole 3a formed on the outermost side among the plurality of discharge holes 3a formed in the discharge unit 3 is disposed on the inner side of the outer shape of the upper end Ma of the monolith substrate M.

  The plurality of discharge holes 3a formed in the discharge unit 3 are formed so as to perforate a disk-like member constituting the discharge unit 3 in a direction substantially perpendicular to the outer peripheral surface 3b of the discharge unit 3. The slurry discharged from the discharge holes 3 a is distributed and arranged in the discharge unit 3 so as to be substantially uniform over the entire discharge unit 3.

  When the catalyst coat layer is formed on the inner wall of the flow path L of the monolith substrate M using the illustrated coating apparatus 100, first, the monolith substrate M is fixed and held by the lower holding portion 14 and the upper holding portion 15. The nozzle 16 is disposed vertically below the nozzle 16. Specifically, the nozzle 16 is disposed vertically below the nozzle 16 so that the center axis 1 L of the nozzle 16 and the center axis of the monolith substrate M are substantially coincident with each other. In a state where the tank 11 and the syringe 12 are in communication, the slurry S is supplied into the slurry tank 11.

  The slurry S is made of, for example, an inorganic oxide such as activated alumina, silica, titania, zirconia, a binder, and water, and is coated on the surface of the catalyst carrier to form a support layer. The viscosity of the slurry S can be adjusted by changing the particle size of powders such as activated alumina and silica, the amount of water and the like, and is, for example, about 200 to 30000 mPa · s.

  After supplying the slurry S into the slurry tank 11 as described above, as shown in FIG. 1, the drive mechanism 19 is used to move the piston 18 away from the three-way valve 17 (in the direction indicated by the arrow X1 in the figure). The slurry S in the slurry tank 11 is introduced into the syringe 12.

  Next, as shown in FIG. 2, the three-way valve 17 is rotated to cause the syringe 12 and the nozzle 16 to communicate with each other, and the piston 18 is moved in the direction of the three-way valve 17 and the nozzle 16 using the drive mechanism 19 (in the direction of arrow X2 in the figure). The slurry S introduced into the syringe 12 is introduced into the introduction part 1 of the nozzle 16. The slurry S introduced into the introduction portion 1 is guided to the widening portion 2 along the central axis 1L, and from the discharge holes 3a formed in the discharge portion 3 while spreading in the vertical direction with respect to the central axis 1L at the widening portion 2. Discharged.

  Here, according to the viscosity of the slurry S, the outer diameter MD of the monolith substrate M, the relative distance ML between the nozzle 16 and the monolith substrate M, the driving speed of the piston (speed adjusting unit) 18 in the syringe 12 is determined. By adjusting, the pressure in the nozzle 16 can be adjusted, the discharge pressure and the discharge speed of the slurry S discharged from the discharge hole 3a can be adjusted, and the entire upper end Ma side of the monolith substrate M can be adjusted. Thus, the slurry S can be supplied substantially uniformly.

  As shown in FIG. 3, when the piston 18 in the syringe 12 contacts the bottom surface of the syringe 12 on the nozzle 16 side, the supply of the slurry S to the monolith substrate M is completed, and the upper end of the monolith substrate M is completed. A predetermined amount of slurry S is supplied to the Ma side.

  After supplying the slurry S to the upper end Ma side of the monolith substrate M as described above, or while supplying the slurry S to the upper end Ma side of the monolith substrate M, the suction device 30 uses the lower end Mb side of the monolith substrate M. Then, air is sucked in, and the slurry S supplied to the upper end Ma side of the monolith substrate M flows into or extends into the flow path L of the monolith substrate M, and the inner wall of the flow path L is covered with the slurry S. The unnecessary slurry S is discharged from the lower end Mb side of the monolith substrate M to the outside.

  In addition, after the slurry S is supplied to the upper end Ma side of the monolith substrate M, a part of the slurry S remaining in the nozzle 16 may hang down from the discharge hole 3 a of the discharge unit 3. Therefore, as shown in FIG. 4, the piston 18 is pulled back by a predetermined amount in the direction away from the three-way valve 17 in the syringe 12 (in the direction of the arrow X <b> 1 in the drawing) using the drive mechanism 19. Then, the slurry S is pulled back to suppress dripping of the slurry S in the discharge holes 3a.

  The monolith base material M in which the inner wall of the flow path L of the monolith base material M is coated with the slurry S is transported to a drying and firing process by a transport device (not shown), and the new monolith base material is held on the lower holding unit 14 and the upper side. It is conveyed and held between the sections 15. By repeating such an operation, the slurry S can be applied to the inner walls of the flow paths of the plurality of monolith substrates.

  In addition, instead of the suction device 30 described above, for example, the upper end of the monolith substrate M is used as an apparatus for flowing or extending the slurry S supplied to the upper end Ma of the monolith substrate M into the flow path L of the monolith substrate M. A device for supplying pressurized air from the Ma side to flow or extend the slurry S into the flow path L of the monolith substrate M, or to flow the slurry S into the flow path L of the monolith substrate M using gravity or An extension device or the like can also be applied.

  Next, the slurry supply nozzle 16 of the coating apparatus 100 shown in FIGS. 1 to 4 will be described in detail with reference to FIG.

  FIG. 5 is a view schematically showing the slurry supply nozzle shown in FIGS. 1 to 4, wherein FIG. 5 (a) is a longitudinal sectional view thereof, and FIG. 5 (b) is a view of FIG. 5 (a). It is an AA arrow line view.

  As shown in FIG. 5 (a), the slurry supply nozzle 16 is connected to the introduction portion 1 composed of a substantially cylindrical body for introducing the slurry S along the central axis 1L, and is connected to the introduction portion 1. Connected to the widened portion 2 having an internal space that widens as it moves away from the introduced portion 1 along the central axis 1L of the introduced portion 1, and the lower end 2b of the widened portion 2, and a plurality of discharge holes 3a are dispersed. And a discharge portion 3 made of a formed disk-shaped member.

  In the widened portion 2, the upper end 2 a connected to the introducing portion 1 extends in a direction substantially perpendicular to the central axis 1 </ b> L of the introducing portion 1, and the body portion 2 c subsequent thereto extends along the central axis 1 </ b> L of the introducing portion 1. As the distance from the introducing portion 1 increases, the width gradually increases, and the lower end 2b connected to the discharge portion 3 has a shape that is substantially parallel to the central axis 1L of the introducing portion 1.

  The plurality of discharge holes 3a formed in the discharge unit 3 are discs in a direction substantially perpendicular to the outer peripheral surface 3b of the discharge unit 3 (normal direction 3aL of the outer peripheral surface 3b of the discharge unit 3). It is formed to perforate the shaped member.

  Further, the outer peripheral surface 3b of the discharge unit 3 has a curved surface shape that protrudes toward the direction of the monolith substrate M (vertically downward in the drawing) in the direction of the central axis 1L of the introduction unit 1, and in particular, The normal direction 3aL of the outer peripheral surface 3b (the outer peripheral surface 3b at the intersection of the central axis of the discharge hole 3a and the outer peripheral surface 3b) of the portion where the discharge hole 3a is formed except for the central discharge hole 3a. However, it has a shape that is inclined outward with respect to the central axis 1 </ b> L of the introduction part 1 and the discharge part 3.

  Further, since the outer peripheral surface 3b of the discharge part 3 has a curved surface shape that is convex toward the direction of the monolith substrate M in the direction of the central axis 1L of the introduction part 1, the portion of the discharge hole 3a is formed. The crossing angles θ2 to θ4 between the normal direction 3aL of the outer peripheral surface 3b and the central axis 1L increase as the distance from the central axis 1L increases (towards the horizontal direction in the figure), and the center increases as the distance from the central axis 1L increases. The slurry S is discharged from the discharge hole 3a in a direction inclined more outward with respect to the axis 1L.

  Further, as shown in FIG. 5B, one discharge hole 3a formed in the discharge portion 3 is formed in the center portion C1, and 36 holes are three in the center portion C1. Concentric circles are formed on the arcs C2 to C4. More specifically, the discharge holes 3a1 are formed in the center portion C1 of the discharge portion 3, and the six discharge holes 3a2 are formed at equal intervals on the arc C2 centered on the center portion C1. The discharge holes 3a3 are formed at equal intervals on the arc C3 having a larger diameter than the arc C2, and 18 discharge holes 3a4 are formed at equal intervals on the arc C4 having a larger diameter than the arc C3. In the illustrated example, the distance between the center portion 1C and the arc C2, the distance between the arc C2 and the arc C3, and the distance between the arc C3 and the arc C4 are substantially the same.

  Further, the diameter of the discharge hole 3a formed in the discharge part 3 increases as the distance from the central axis 1L increases. In the illustrated example, the discharge hole 3a is formed with respect to the discharge hole 3a1 formed in the central part C1 of the discharge part 3. The discharge hole 3a2 formed on the arc C2 has a hole diameter approximately 1.2 times that of the discharge hole 3a2 formed on the arc C2 and the discharge hole 3a3 formed on the arc C3. The discharge hole 3a4 formed on the arc C4 is substantially the same as the discharge hole 3a3 formed on the arc C3.

  Note that the inclination in the normal direction 3aL of the outer peripheral surface 3b of the portion where the discharge hole 3a is formed with respect to the central axis 1L, the radix of the discharge hole 3a formed in the discharge part 3, the distribution in the discharge part 3, and each discharge hole 3a If the amount of the slurry S supplied to the upper end Ma side of the monolith substrate M is substantially uniform over the entire monolith substrate M, for example, discharge holes having the same hole diameter can be provided. It is also possible to increase the distribution of the ejection holes in the region formed and spaced from the central axis 1L.

Table 1 shows that in the nozzle 16 of the first embodiment shown in FIG. 5, the diameter of the discharge hole 3a1 formed in the central part C1 of the discharge part 3 is φ2.9 mm, and the discharge hole 3a2 formed on the arcs C2 and C3. 3a3 has a hole diameter of φ3.4 mm, discharge hole 3a4 formed on arc C4 has a diameter of 5.0 mm, and slurry S is discharged from discharge hole 3a4 (for example, the solid content is 35% by mass, the viscosity is Normal speed of the outer peripheral surface 3b at the discharge hole 3a4 with respect to the central axis 1L when the discharge speed is 30000mPa · s at a shear rate of 0.4s- ¹ and 300mPa · s at a shear rate of 200s- ¹ ) The monolith substrate M that can be supplied by the slurry S discharged from the discharge hole 3a4 and the like, the inclination θ4 in the direction 3aL, the relative distance ML (see FIG. 2) between the discharge unit 3 and the upper end Ma of the monolith substrate M, and the like. It shows an example of the relationship with the outer diameter MD. In Table 1, the unit of the outer diameter MD of the monolith substrate M is [mm].

  As described above, for example, in the conventional nozzle shown in FIG. 10, in order to supply the slurry S to the monolith substrate M having an outer diameter MD of about 180 mm, the outer diameter 3D of the nozzle (see FIG. 1) is 180 mm or more. Then, the internal pressure in the region away from the central axis is reduced from the vicinity of the central axis, the discharge speed and the discharge amount of the slurry S discharged from the discharge holes of the nozzles become non-uniform throughout the discharge unit, and the monolith substrate M It has been confirmed by the present inventors that the supply amount of the slurry S supplied to the upper end Ma side is non-uniform throughout the monolith substrate M.

  On the other hand, in the nozzle of the first embodiment, as shown in Table 1, for example, the inclination θ4 in the normal direction 3aL of the outer peripheral surface 3b at the discharge hole 3a4 with respect to the central axis 1L is 30 degrees, the discharge unit 3 and the monolith base By setting the relative distance KL from the upper end Ma of the material M to 250 mm, the highly viscous slurry S can be supplied to the monolith substrate M having a diameter of 309 mm and a circular cross section substantially uniformly.

  As described above, according to the first embodiment, the outer peripheral surface 3b of the discharge unit 3 is formed into a curved shape that is convex toward the monolith substrate M in the direction of the central axis 1L, and the discharge hole 3a is formed. By setting the normal direction 3aL of the outer peripheral surface 3b of the portion to be the direction inclined outward with respect to the central axis 1L, the outer shape of the discharge unit 3 with respect to the monolith substrate M can be reduced. For this reason, the pressure inside the nozzle 16 can be made uniform while increasing the pressure over the whole. For example, the nozzle 16 has an internal space that widens as the nozzle 16 moves away from the introduction portion 1 along the central axis 1L. Even in this case, it is possible to increase the discharge pressure of the slurry S discharged from the discharge holes 3a of the discharge unit 3 and increase the discharge speed of the slurry S, while making the discharge speed and discharge amount of the slurry S uniform. it can. Further, the normal direction 3aL of the outer peripheral surface 3b of the portion where the discharge hole 3a is formed can be brought close to the flow direction of the slurry S in the internal space of the widened portion 2 (the direction of the arrow SL in FIG. 5A). Therefore, the slurry S can be smoothly and reliably discharged in a direction inclined outward with respect to the central axis 1L, and the slurry S can be discharged more uniformly from each discharge hole 3a of the discharge unit 3, The supply amount of the slurry S supplied to the upper end Ma side of the monolith substrate M can be made uniform over the entire monolith substrate M, and a catalyst coat layer formed in each flow path L of the monolith substrate M It can be made uniform.

[Embodiment 2 of slurry supply nozzle]
Next, a second embodiment of the slurry supply nozzle of the present invention will be described with reference to FIG. FIG. 6 is a longitudinal sectional view schematically showing Embodiment 2 of the slurry supply nozzle of the present invention, and FIG. 6 (a) is a view showing a state in which the curvature of the discharge portion of the nozzle is small, FIG. 6B is a diagram showing a state in which the curvature of the discharge portion of the nozzle is large.

  The nozzle 116 according to the second embodiment shown in FIG. 6 adjusts the inclination in the normal direction of the outer peripheral surface of the discharge portion with respect to the central axis of the introduction portion with respect to the nozzle 16 according to the first embodiment shown in FIG. The other points are the same as those of the nozzle 16 of the first embodiment shown in FIG. Therefore, about the structure similar to the nozzle 16 of Embodiment 1 shown in FIG. 5, the same code | symbol is attached | subjected and the detailed description is abbreviate | omitted.

  As shown in the figure, the slurry supply nozzle 116 is connected to the introduction portion 101, which is a substantially cylindrical body for introducing the slurry S along the central axis 101L, and is connected to the introduction portion 101 along the central axis 101L. A widened portion 102 having an internal space that widens as the distance from the introducing portion 101 increases, and a disk that is connected to the lower end portion 102b of the widened portion 102 and has a curved shape formed by dispersing a plurality of discharge holes 103a And a discharge portion 103 made of a member.

  In the widened portion 102, the upper end portion 102a connected to the introducing portion 101 extends in a substantially vertical direction with respect to the central axis 101L of the introducing portion 101, and the body portion 102c subsequent thereto extends from the introducing portion 101 along the central axis 101L. As the distance increases, the width gradually increases, and the lower end 102b connected to the discharge unit 103 has a shape that is substantially parallel to the central axis 101L.

  A through hole 102d is formed in the vicinity of the upper end 102a of the body portion 102c of the widened portion 102, and an adjusting member (tilt adjusting portion) 104 is inserted through the through hole 102d and inserted into the nozzle 116. The end 104a of the adjusted member 104 is located on the inner peripheral surface 103c of the discharge portion 103 opposite to the central axis 101L of the introduction portion 101, more specifically, the central axis 101L of the plurality of discharge holes 103a. On the other hand, it is connected to the inner peripheral surface 103c in the region between the arc where the most distant discharge hole 103a4 is formed and the arc where the discharge hole 103a3 inside the discharge hole 103a4 is formed. That is, the adjustment member 104 inserted into the nozzle 116 through the through hole 102d is arranged so as to intersect at a position where the movement of the nozzle 116 is not hindered.

  Further, a sealing material 105 made of, for example, resin is disposed between the through hole 102d of the body portion 102c and the adjustment member 104, and the slurry S introduced into the nozzle 116 does not leak to the outside of the nozzle 116. It is like that. Further, the adjustment member 104 can move relative to the sealing material 105, the body portion 102c, and the like, and presses the inner peripheral surface 103c of the discharge portion 103 with the end portion 104a of the adjustment member 104 to discharge the discharge portion 103. The inclination θ102 to θ104 in the normal direction 103aL at the discharge hole 103a of the outer peripheral surface 103b of the discharge portion 103 with respect to the central axis 101L can be changed.

  Here, the discharge unit 103 is composed of an elastic member that is not deformed by the pressure of the slurry S introduced into the nozzle 116 and has a strength that can be relatively easily deformed by the pressing force of the adjustment member 104. Examples of the forming material include silicon rubber, polyurethane rubber, and nitrile rubber.

  In the illustrated example, the two adjustment members 104 are disposed at positions symmetrical with respect to the central axis 101L of the introduction portion 101. However, the shape and radix of the adjustment member 104, the positions where the adjustment members 104 are disposed, and the like. If the inclination of the normal direction 103aL in the discharge hole 103a of the outer peripheral surface 103b of the discharge part 103 with respect to the central axis 101L can be changed by changing the shape of the discharge part 103, for example, each adjustment The member 104 may be disposed at an asymmetrical position, or the end 104a of each adjustment member 104 inserted into the nozzle 116 is connected to the inner peripheral surface 103c of the discharge unit 103 on the same side with respect to the central axis 101L. May be. Further, the adjustment member 104 is detachably attached to the nozzle 116, and for example, the end 104a of each adjustment member 104 inserted into the nozzle 116 is brought into contact with the inner peripheral surface 103c of the discharge unit 103, so that the adjustment member 104 is unnecessary. In such a case, the adjustment member 104 may be pulled out through the through hole 102d and the through hole 102d may be sealed with the sealing material 105.

  As shown in FIG. 6A, the curvature of the discharge portion 103 of the nozzle 116 is small, and the inclinations θ102 to θ104 in the normal direction 103aL at the discharge hole 103a of the outer peripheral surface 103b of the discharge portion 103 with respect to the central axis 101L are relatively relatively large. When the adjustment member 104 is pushed into the nozzle 106 from a small state and the inner peripheral surface 103c of the discharge portion 103 is pressed, the discharge portion 103 is elastically deformed so as to extend, and as shown in FIG. The shape of the discharge portion 103 changes so that the curvature of the 103 increases (projects toward the monolith substrate M), and the normal direction of the outer peripheral surface 103b of the discharge portion 103 with respect to the central axis 101L at the discharge hole 103a The inclination θ102 to θ104 of 103aL is increased, and the slurry S is discharged from the discharge hole 103a in a direction inclined more outward with respect to the central axis 101L. It becomes so that.

  Further, when the pressing force of the adjustment member 104 is released or the inner peripheral surface 103c of the discharge portion 103 is pulled back by the adjustment member 104, the curvature of the discharge portion 103 of the nozzle 116 is reduced, and the discharge portion 103 has a central axis 101L. The inclinations θ102 to θ104 in the normal direction 103aL at the discharge hole 103a of the outer peripheral surface 103b can be reduced again.

  As described above, according to the second embodiment, the inclination θ102 in the normal direction 103aL of the outer peripheral surface 103b of the discharge hole 103a with respect to the central axis 101L is adjusted by adjusting the movement amount of the adjustment member (tilt adjustment unit) 104. .About..theta.104 and the relative distance ML (see FIG. 2) between the discharge portion 103 and the upper end Ma of the monolith substrate M can be adjusted, and as described based on Table 1, have various outer diameters. Since the slurry S can be supplied to the monolith substrate M, for example, when the slurry S is supplied to the monolith substrate M having different outer diameters, or relative to the nozzle 116 and the monolith substrate M by a coating apparatus or the like. Even if the general distance ML is changed, the slurry S can be supplied substantially uniformly to the upper end Ma side of the monolith substrate M, and is formed in each flow path L of the monolith substrate M. The formed catalyst coat layer can be made uniform.

  In the second embodiment described above, the adjustment member 104 is disposed in the nozzle 116, and the end surface 104 a of the adjustment member 104 presses or pulls back the inner peripheral surface 103 c of the discharge unit 103 to change the shape of the discharge unit 103. Although the form to change was demonstrated, an adjustment member may be arrange | positioned outside a nozzle and the outer peripheral surface of a nozzle may be pressed by the edge part of an adjustment member, or it may pull back and the shape of a discharge part may be changed. For example, the widened portion and the discharge portion of the nozzle may be made of an elastic member, and the outer peripheral surface of the widened portion of the nozzle may be pressed or pulled back to change the shape of the discharge portion. Also, the discharge part is composed of a member that can be expanded and contracted by heat, the shape of the discharge part is changed using the thermal expansion and contraction of the discharge part, and the normal line at the discharge hole on the outer peripheral surface of the discharge part with respect to the central axis You may adjust the inclination of a direction. With such a configuration, the flow of the slurry in the nozzle can be smoothed, and the discharge speed and discharge amount of the slurry can be increased while increasing the discharge speed of the slurry discharged from the discharge hole of the discharge portion. It can be made uniform.

[Embodiment 3 of slurry supply nozzle]
Next, Embodiment 3 of the slurry supply nozzle of the present invention will be described with reference to FIG. FIG. 7 is a longitudinal sectional view schematically showing Embodiment 3 of the slurry supply nozzle of the present invention.

  The nozzle 216 of the third embodiment shown in FIG. 7 is different from the nozzle 16 of the first embodiment shown in FIG. 5 in the shape of the discharge section, and the other configuration is the first embodiment shown in FIG. This is the same as the nozzle 16. Therefore, about the structure similar to the nozzle 16 of Embodiment 1 shown in FIG. 5, the same code | symbol is attached | subjected and the detailed description is abbreviate | omitted.

  As shown in the figure, the slurry supply nozzle 216 is connected to the introduction portion 201 and is connected to the introduction portion 201 along the central axis 201L along the central axis 201L. And a widened portion 202 having an internal space that widens as the distance from the introducing portion 201 increases, and a disk-shaped member that is connected to the lower end portion 202b of the widened portion 202 and has a plurality of discharge holes 203a dispersed therein. And a discharge unit 203.

  Here, the outer peripheral surface 203b of the discharge unit 203 has a substantially conical shape that protrudes toward the direction of the monolith substrate M (vertically below in the drawing) in the direction of the central axis 201L of the introduction unit 201, The normal line direction 203aL of the outer peripheral surface 203b of the portion where the discharge hole 203a is formed except for the discharge hole 203a at the center is a direction inclined outward with respect to the central axis 201L of the introduction part 201 and the discharge part 203. It has a shape.

  In Embodiment 3, since the outer peripheral surface 203b of the discharge part 203 has a conical shape that protrudes toward the monolith substrate M in the direction of the central axis 201L, the portion of the discharge hole 203a is formed. Crossing angles θ202 to θ204 (excluding the central discharge hole 203a) between the normal direction 203aL of the outer peripheral surface 203b and the central axis 201L are substantially the same over the entire discharge unit 203, and extend over the entire discharge unit 203. Thus, the slurry S is discharged from the discharge holes 203a in substantially the same direction.

  Thus, according to the third embodiment, the slurry S can be discharged from the discharge holes 203a in substantially the same direction over the entire discharge unit 203. For example, compared to the first embodiment, the central axis line Since the slurry S can be discharged in the direction inclined more outward with respect to the central axis 201L in the vicinity of 201L, the outer shape of the discharge unit 203 with respect to the monolith substrate M can be further reduced, and the discharge hole of the discharge unit 203 While increasing the discharge pressure of the slurry S discharged from 203a to increase the discharge speed of the slurry S, the discharge speed and the discharge amount of the slurry S can be made uniform and supplied to the upper end Ma side of the monolith substrate M. The supply amount of the slurry S can be made more uniform over the entire monolith substrate M.

  For example, when the supply amount of the slurry S in the vicinity of the central axis 201L is insufficient, the number and distribution of the discharge holes 203a in the vicinity of the central axis 201L, the hole diameter of each discharge hole 3a, and the like may be adjusted as appropriate.

[Embodiment 4 of slurry supply nozzle]
Next, a fourth embodiment of the slurry supply nozzle of the present invention will be described with reference to FIG. FIG. 8 is a longitudinal sectional view schematically showing Embodiment 4 of the slurry supply nozzle of the present invention.

  The nozzle 316 of the fourth embodiment shown in FIG. 8 is different from the nozzle 16 of the first embodiment shown in FIG. 5 and the nozzle 216 of the third embodiment shown in FIG. Other configurations are the same as the nozzle 16 of the first embodiment shown in FIG. 5 and the nozzle 216 of the third embodiment shown in FIG. Therefore, components similar to those of the nozzle 16 of the first embodiment shown in FIG. 5 and the nozzle 216 of the third embodiment shown in FIG. 7 are denoted by the same reference numerals, and detailed description thereof is omitted.

  As shown in the figure, the slurry supply nozzle 316 is connected to the introduction portion 301 that is a substantially cylindrical body for introducing the slurry S along the central axis 301L, and is connected to the introduction portion 301 along the central axis 301L. And a widened portion 302 having an internal space that widens as the distance from the introducing portion 301 increases, and a disk-shaped member that is connected to the lower end portion 302b of the widened portion 302 and has a plurality of discharge holes 303a dispersed therein. A discharge unit 303.

  Here, the outer peripheral surface 303b of the discharge portion 303 has a substantially staircase shape that is convex toward the direction of the monolith substrate M (vertically downward in the drawing) in the direction of the central axis 301L of the introduction portion 301. The normal line direction 303aL of the outer peripheral surface 303b of the portion where the discharge hole 303a is formed except for the discharge hole 303a at the center is a direction inclined outward with respect to the central axis 301L of the introduction part 301 and the discharge part 303. It has a shape.

  More specifically, the outer peripheral surface 303b of the discharge section 303 is a plane 303b1 perpendicular to the center axis 301L in the vicinity of the center axis 301L, and an inclined surface 303b2 that is inclined with respect to the center axis 301L connected to the outside of the plane 303b1. A plane 303b3 perpendicular to the central axis 301L connected to the outside of the inclined surface 303b2, an inclined surface 303b4 inclined to the central axis 301L connected to the outside of the flat surface 303b3, and an outside of the inclined surface 303b4. A flat surface 303b5 perpendicular to the central axis 301L and an inclined surface 303b6 inclined with respect to the central axis 301L connected to the outside of the flat surface 303b5, and a discharge hole 303a1 is formed at the center of the flat surface 303b1; The discharge holes 303a2, 30 are formed in the inclined surfaces 303b2, 303b4, 303b6, respectively. a3,303a4 is formed.

  In the fourth embodiment, the outer peripheral surface 303b of the discharge unit 303 has a stepped shape that is convex toward the monolith substrate M in the direction of the central axis 301L, and the outer peripheral surface 303b of the discharge unit 303 is a part thereof. In this case, the inclination of the inclined surface constituting the outer peripheral surface 303b of the discharge portion 303 is increased, and the intersection angle θ302 between the normal direction 303aL of the outer peripheral surface 303b of the portion where the discharge hole 303a is formed and the central axis 301L. .About..theta.304 (excluding the central discharge hole 303a) is increased, and the slurry S is discharged from the discharge hole 303a in a direction inclined more outward with respect to the central axis 301L.

  In addition, the radix of the flat surface and the inclined surface forming the outer peripheral surface 303b of the discharge unit 303, the inclination and size of each flat surface and the inclined surface, and the like can be appropriately changed. In addition, the number and position of the discharge holes 303a formed on each inclined surface, the hole diameter of each discharge hole 303a, and the like can be changed as appropriate. In the illustrated example, the inclination of the normal direction 303aL of the outer peripheral surface 303b of the portion where the discharge hole 303a is formed with respect to the central axis 301L is substantially the same, but for example the portion of the portion where the discharge hole 303a is formed with respect to the central axis 301L You may change the inclination of the normal direction 303aL of the outer peripheral surface 303b for every inclined surface.

  As described above, according to the fourth embodiment, the crossing angles θ302 to θ304 between the normal direction 303aL of the outer peripheral surface 303b of the portion where the discharge hole 303a is formed and the central axis 301L are increased. In comparison (especially when the length of the discharge portion in the central axis direction is the same), the slurry S can be discharged from the discharge hole 303a in a direction inclined more outward with respect to the central axis 301L. The outer shape of the discharge portion 303 with respect to the material M can be further reduced, and the discharge pressure of the slurry S discharged from the discharge hole 303a of the discharge portion 303 is increased to increase the discharge speed of the slurry S, while the discharge speed of the slurry S is increased. The discharge amount of the slurry S supplied to the upper end Ma side of the monolith substrate M can be made more uniform over the entire monolith substrate M. You can. Moreover, the inclination of the normal direction 303aL of the outer peripheral surface 303b of the portion where the discharge hole 303a is formed with respect to the central axis line 301L can be changed for each inclined surface, for example, to the viscosity of the slurry S and the outer diameter of the monolith substrate M. The slurry S can be discharged from the discharge hole 303a in the corresponding direction.

[Embodiment of Manufacturing Apparatus and Manufacturing Method for Exhaust Gas Purification Catalyst]
Next, with reference to FIG. 9, an outline of a manufacturing apparatus and a manufacturing method of an exhaust gas purifying catalyst using the slurry supply nozzles of the first to fourth embodiments will be described. FIG. 9 is a diagram schematically showing an embodiment of an apparatus for producing an exhaust gas purifying catalyst of the present invention. FIG. 9 shows an apparatus for producing an exhaust gas purifying catalyst using the slurry supply nozzle of the first embodiment.

  The exhaust gas purification catalyst manufacturing apparatus 1000 shown in the figure includes a coating apparatus 100 that applies slurry S to the inner wall of the flow path L of the monolith substrate M that is arranged in parallel so that the flow path L opens in the axial direction, and the monolith. And a firing apparatus 500 that dries and fires the slurry S applied to the inner wall of the flow path L of the substrate M.

  As described above, the coating apparatus 100 includes the slurry supply nozzle 16 that supplies the slurry S to the upper end Ma of the monolith substrate M, and the slurry S that is supplied to the upper end Ma of the monolith substrate M. In order to flow in or extend into the L, a suction device 30 that sucks air from the lower end Mb side of the monolith substrate M is configured.

  The manufacturing method of the exhaust gas purifying catalyst by the exhaust gas purifying catalyst manufacturing apparatus 1000 described above will be outlined. First, the slurry S is supplied to the upper end Ma side of the monolith substrate M arranged vertically below the nozzle 16. .

  After supplying the slurry S to the upper end Ma side of the monolith substrate M, or while supplying the slurry S to the upper end Ma side of the monolith substrate M, the suction device 30 sucks air from the lower end Mb side of the monolith substrate M Then, the slurry S supplied to the upper end Ma side of the monolith substrate M is caused to flow or extend into the flow path L of the monolith substrate M, and the inner wall of the flow path L is covered with the slurry S.

  After the inner wall of the flow path L of the monolith substrate M is coated with the slurry S, the monolith substrate M is transferred to the baking apparatus 500 by a transfer device (not shown), and the baking apparatus 500 uses the flow path L of the monolith substrate M. The slurry S covering the inner wall is dried and baked to form a catalyst coat layer on the inner wall of the flow path L. Thereby, an exhaust gas purifying catalyst in which a catalyst coat layer having a substantially uniform thickness is formed on the inner wall of the flow path L can be produced.

  In the above-described embodiment, the embodiment has been described in which the discharge portion of the nozzle has a perfect circle shape in plan view, but the shape of the discharge portion, introduction portion, widening portion, etc. of the nozzle depends on the outer shape of the monolith substrate. For example, the discharge portion of the nozzle may be oval or polygonal in plan view. In addition, the discharge part, the introduction part, and the widening part of the nozzle are made of different members, and the discharge part, the introduction part, and the widening part are connected to each other by an appropriate joining means such as a bonding agent, bolt, or screw. Alternatively, the discharge part, the introduction part, and the widening part of the nozzle may be formed by integral molding.

  In the above-described embodiment, the mode in which the piston driving speed is adjusted to adjust the internal pressure of the nozzle has been described. However, for example, a rectifying plate or the like is provided in the internal space of the nozzle, and the slurry in the internal space of the nozzle You may adjust the flow direction and flow velocity.

Further, the slurry supply nozzle and the exhaust gas purifying catalyst manufacturing apparatus and manufacturing method according to the above-described embodiment should be used for manufacturing various catalysts such as an oxidation catalyst, a reduction catalyst, a three-way catalyst, and a NO _X storage catalyst. Can do. In addition to exhaust gas purification catalysts for automobile engines, motorcycle engines, general-purpose engines, etc., for example, deodorizing catalysts for general industries, catalytic combustion catalysts for primary energy generation, for denitration of nitride oxide It can also be applied to the production of catalysts and the like.

  The embodiment of the present invention has been described in detail with reference to the drawings. However, the specific configuration is not limited to this embodiment, and there are design changes and the like without departing from the gist of the present invention. They are also included in the present invention.

DESCRIPTION OF SYMBOLS 1 ... Introduction part, 1L ... Center axis line, 2 ... Widening part, 2a ... Upper end part of widening part, 2b ... Lower side edge part of widening part, 2c ... Body part of widening part, 3 ... Discharge part, 3a ... Discharge Hole, 3aL ... Normal direction, 3b ... Outer peripheral surface of discharge part, 3D ... Outer diameter of discharge part, 11 ... Slurry tank, 12 ... Syringe, 14 ... Lower holding part, 15 ... Upper holding part, 16 ... Slurry supply Nozzle, 17 ... Three-way valve, 18 ... Piston (speed adjusting unit), 19 ... Drive mechanism, 20 ... Controller, 30 ... Suction device, 100 ... Coating device, 500 ... Firing device, 1000 ... Manufacturing apparatus for exhaust gas purification catalyst, L ... flow path of monolith substrate, M ... monolith substrate, Ma ... upper end (axial end) of monolith substrate, Mb ... lower end of monolith substrate, MD ... outer diameter of monolith substrate, ML ... nozzle and Monolith substrate distance, S ... catalyst slurry, SL ... The direction of flow of the medium slurry

Claims (11)

An introduction part comprising a cylinder for introducing slurry;
A widened portion connected to the introduction portion and having an internal space that widens as the distance from the introduction portion increases along the central axis of the introduction portion;
A slurry comprising: a discharge portion that is connected to an end portion of the widening portion that is spaced from the introduction portion, and is formed of a plate-like member formed by dispersing a plurality of discharge holes for discharging the slurry to the monolith substrate. A supply nozzle,
A slurry supply nozzle in which an outer peripheral surface of a portion of the discharge portion where the discharge hole is formed has a shape in which a normal direction is inclined outward with respect to a central axis of the introduction portion.   2. The slurry supply nozzle according to claim 1, wherein the outer peripheral surface of the discharge portion is formed of any one of a curved shape, a conical shape, and a step shape that are convex toward the central axis direction of the introduction portion. The discharge part is made of an elastic member,
The said slurry supply nozzle is provided with the inclination adjustment part which adjusts the inclination of the normal direction of the outer peripheral surface of the said discharge part with respect to the central axis of the said introduction part by elastically deforming the said discharge part. Slurry supply nozzle.   The inclination adjustment unit elastically deforms the discharge unit by applying a pressing force or a pullback force to an inner peripheral surface or an outer peripheral surface of the slurry supply nozzle, so that the outer peripheral surface of the discharge unit with respect to the central axis of the introduction unit The slurry supply nozzle according to claim 3, wherein the inclination in the normal direction is adjusted.   The slurry supply nozzle according to claim 3 or 4, wherein the inclination adjusting unit is detachably attached to the slurry supply nozzle.   The slurry supply nozzle according to any one of claims 3 to 5, wherein the discharge unit is made of at least one of silicon rubber, polyurethane rubber, and nitrile rubber.   The slurry supply nozzle according to any one of claims 1 to 6, wherein the plurality of discharge holes of the discharge unit have a hole diameter that increases with distance from a central axis of the introduction unit.   The slurry supply nozzle according to any one of claims 1 to 7, wherein the plurality of discharge holes of the discharge unit are formed concentrically.   The slurry supply nozzle according to any one of claims 1 to 8, wherein the slurry supply nozzle includes a speed adjusting unit that adjusts a discharge speed of the slurry discharged from the discharge hole of the discharge unit. The slurry supply nozzle according to any one of claims 1 to 9, wherein the slurry supply nozzle supplies slurry to an axial end portion of a monolith substrate arranged in parallel so that the flow path opens in the axial direction. When,
An apparatus for flowing or extending the slurry supplied to the axial end of the monolith substrate into the flow path of the monolith substrate;
An apparatus for producing an exhaust gas purifying catalyst, comprising: an apparatus for drying and calcining a slurry that has flowed into or extended into a flow path of a monolith substrate. Using the slurry supply nozzle according to any one of claims 1 to 9, supplying a slurry to an axial end of a monolith substrate arranged in parallel so that the flow path opens in the axial direction;
Injecting or extending the slurry supplied to the axial end of the monolith substrate into the flow path of the monolith substrate, and coating the inner wall of the flow path with the slurry; and
A method for producing an exhaust gas purifying catalyst, comprising: drying and firing a slurry covering an inner wall of the flow path.

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