JP2014048562A5 - - Google Patents
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- Publication number
- JP2014048562A5 JP2014048562A5 JP2012193009A JP2012193009A JP2014048562A5 JP 2014048562 A5 JP2014048562 A5 JP 2014048562A5 JP 2012193009 A JP2012193009 A JP 2012193009A JP 2012193009 A JP2012193009 A JP 2012193009A JP 2014048562 A5 JP2014048562 A5 JP 2014048562A5
- Authority
- JP
- Japan
- Prior art keywords
- acid dianhydride
- ratio
- resin composition
- composition according
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002253 acid Substances 0.000 claims 1
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 125000006159 dianhydride group Chemical group 0.000 claims 1
- 239000011342 resin composition Substances 0.000 claims 1
Claims (1)
The photosensitive resin composition according to claim 2, wherein a ratio (molar ratio) between the alicyclic acid dianhydride and the aromatic acid dianhydride is 8: 2 to 4 : 6 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012193009A JP6054104B2 (en) | 2012-09-03 | 2012-09-03 | Reaction development image forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012193009A JP6054104B2 (en) | 2012-09-03 | 2012-09-03 | Reaction development image forming method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014048562A JP2014048562A (en) | 2014-03-17 |
| JP2014048562A5 true JP2014048562A5 (en) | 2015-10-15 |
| JP6054104B2 JP6054104B2 (en) | 2016-12-27 |
Family
ID=50608275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012193009A Active JP6054104B2 (en) | 2012-09-03 | 2012-09-03 | Reaction development image forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6054104B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116082636A (en) * | 2022-12-13 | 2023-05-09 | 广东粤港澳大湾区黄埔材料研究院 | Polyamic acid resin, preparation method thereof and positive photosensitive resin composition |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003035950A (en) * | 2001-05-15 | 2003-02-07 | Hitachi Cable Ltd | Photosensitive polyimide resin composition |
| JP2005196130A (en) * | 2003-12-12 | 2005-07-21 | Hitachi Cable Ltd | Photosensitive polyimide resin composition, insulating film using the same, process for producing insulating film, and electronic component using the insulating film |
| JP5526766B2 (en) * | 2009-12-25 | 2014-06-18 | Ｊｓｒ株式会社 | Radiation-sensitive resin composition, interlayer insulating film and method for forming the same |
| JP2011221390A (en) * | 2010-04-13 | 2011-11-04 | Toyobo Co Ltd | Positive photosensitive polyimide resin composition |
-
2012
- 2012-09-03 JP JP2012193009A patent/JP6054104B2/en active Active
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