JP2014000804A5 - - Google Patents

Download PDF

Info

Publication number
JP2014000804A5
JP2014000804A5 JP2013109592A JP2013109592A JP2014000804A5 JP 2014000804 A5 JP2014000804 A5 JP 2014000804A5 JP 2013109592 A JP2013109592 A JP 2013109592A JP 2013109592 A JP2013109592 A JP 2013109592A JP 2014000804 A5 JP2014000804 A5 JP 2014000804A5
Authority
JP
Japan
Prior art keywords
micro
nanostructures
irregularities
grooves
uneven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013109592A
Other languages
Japanese (ja)
Other versions
JP6055718B2 (en
JP2014000804A (en
Filing date
Publication date
Priority claimed from US13/524,656 external-priority patent/US8931890B2/en
Application filed filed Critical
Publication of JP2014000804A publication Critical patent/JP2014000804A/en
Publication of JP2014000804A5 publication Critical patent/JP2014000804A5/ja
Application granted granted Critical
Publication of JP6055718B2 publication Critical patent/JP6055718B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (11)

印刷する際に使用される装置であって、
1つ以上のインクをはじくための凹凸のある少なくとも1つの表面を有し、媒体となる基材に塗布された画像を平滑化する接触部平滑化部材を備え、
前記凹凸のある少なくとも1つの表面は、前記凹凸のある少なくとも1つの表面が1つ以上のインクと接したときに、少なくとも部分的に、凹凸のある少なくとも1つの表面が、100°を超えるインク接触角と30°未満の転落角を有するような構成である1つ以上のマイクロ/ナノ構造を有し、
前記凹凸のある少なくとも1つの表面は、柱部、1つ以上の内側にへこんだ構造を有する柱部、及び凹凸のある側面を有する柱部のうちの1つ以上を有し、前記内側にへこんだ構造は、1つのマイクロ/ナノ構造と別のマイクロ/ナノ構造の間にある空間に、マイクロ/ナノ構造の表面から延びた突出構造である、装置
A device used for printing,
A contact portion smoothing member that has at least one surface having irregularities for repelling one or more inks, and smoothes an image applied to a substrate serving as a medium;
At least one surface of the irregularities, when at least one surface with the irregularities in contact with one or more ink, at least partially, at least one surface an uneven, ink contacts in excess of 100 ° Having one or more micro / nanostructures configured to have an angle and a tumbling angle of less than 30 ° ;
The at least one uneven surface has at least one of a pillar portion, a pillar portion having a concave structure on one or more insides, and a pillar portion having an uneven side surface, and is recessed on the inside. The device is a protruding structure that extends from the surface of the micro / nanostructure in a space between one micro / nanostructure and another micro / nanostructure .
前記1つ以上のマイクロ/ナノ構造は、高さが約100nm〜約10μmの柱部を有する、請求項1に記載の装置。The device of claim 1, wherein the one or more micro / nanostructures have pillars with a height of about 100 nm to about 10 μm. 前記凹凸のある少なくとも1つの表面は、直径が約100nm〜約10μm、中心から中心までの空間が約100nm〜約12μmの柱部を有する、請求項1に記載の装置。The apparatus according to claim 1, wherein the at least one uneven surface has a pillar having a diameter of about 100 nm to about 10 μm and a center-to-center space of about 100 nm to about 12 μm. 前記1つ以上のマイクロ/ナノ構造は、1つ以上の溝、1つ以上の内側にへこんだ構造を含む1つ以上の溝、凹凸のある側面を有する1つ以上の溝を形成している、請求項1に記載の装置。The one or more micro / nanostructures form one or more grooves, one or more grooves including one or more indented structures, one or more grooves having uneven sides. The apparatus of claim 1. 前記1つ以上のマイクロ/ナノ構造は、約100nm〜約10μmの高さを有する前記1つ以上の溝を形成している、請求項1に記載の装置。The device of claim 1, wherein the one or more micro / nanostructures form the one or more grooves having a height of about 100 nm to about 10 μm. 約100nm〜約10μmの幅、約100nm〜約12μmの中心から中心までの空間を有する前記1つ以上の溝を形成している、請求項4に記載の装置。The apparatus of claim 4, forming the one or more grooves having a width of about 100 nm to about 10 μm and a center-to-center space of about 100 nm to about 12 μm. 前記1つ以上のマイクロ/ナノ構造は、1つ以上の内側にへこんだ構造を有する、請求項1に記載の装置。The apparatus of claim 1, wherein the one or more micro / nanostructures have one or more indented structures. 前記1つ以上のマイクロ/ナノ構造は、1つ以上の光リソグラフィー及びe−ビーム技術によって形成される、請求項1に記載の装置。The apparatus of claim 1, wherein the one or more micro / nanostructures are formed by one or more optical lithography and e-beam techniques. 前記接触平滑化部材は、本体部を有し、前記凹凸のある少なくとも1つの表面は、前記本体部に塗布された基材上に形成されている、請求項1に記載の装置。The said contact smoothing member has a main-body part, The at least 1 surface with the said unevenness | corrugation is formed on the base material apply | coated to the said main-body part. 記凹凸のある少なくとも1つの表面、トリデカフルオロ−1,1,2,2−テトラヒドロオクチルトリクロロシラン、トリデカフルオロ−1,1,2,2−テトラヒドロオクチルトリメトキシシラン、トリデカフルオロ−1,1,2,2−テトラヒドロオクチルトリエトキシシラン、ヘプタデカフルオロ−1,1,2,2−テトラヒドロオクチルトリクロロシラン、ヘプタデカフルオロ−1,1,2,2−テトラヒドロオクチルトリメトキシシラン、ヘプタデカフルオロ−1,1,2,2−テトラヒドロオクチルトリエトキシシランのうち1つ以上から合成される1つ以上のフルオロシラン層を含む、請求項1に記載の装置At least one surface with a pre-Symbol irregularities, tridecafluoro-1,1,2,2-tetrahydrooctyl trichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl trimethoxysilane, tridecafluoro - 1,1,2,2-tetrahydrooctyltriethoxysilane, heptadecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane, heptadecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane, hepta The apparatus of claim 1, comprising one or more fluorosilane layers synthesized from one or more of decafluoro-1,1,2,2-tetrahydrooctyltriethoxysilane. 前記凹凸のある少なくとも1つの表面が、ケイ素とコーティングのうち1つ以上を含み、前記コーティングは、疎油性フルオロポリマーおよびペルフルオロポリエーテルポリマーのうち1つ以上を含む、請求項1に記載の装置At least one surface of the irregularities, include one or more of the silicic element and coating, the coating may include one or more of the oleophobic fluoropolymer and perfluoropolyether polymers, according to claim 1 Equipment .
JP2013109592A 2012-06-15 2013-05-24 Method and apparatus for smoothing a printed image and preventing image flipping Expired - Fee Related JP6055718B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/524,656 2012-06-15
US13/524,656 US8931890B2 (en) 2012-06-15 2012-06-15 Method and apparatus for leveling a printed image and preventing image offset

Publications (3)

Publication Number Publication Date
JP2014000804A JP2014000804A (en) 2014-01-09
JP2014000804A5 true JP2014000804A5 (en) 2016-07-07
JP6055718B2 JP6055718B2 (en) 2016-12-27

Family

ID=49754719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013109592A Expired - Fee Related JP6055718B2 (en) 2012-06-15 2013-05-24 Method and apparatus for smoothing a printed image and preventing image flipping

Country Status (4)

Country Link
US (1) US8931890B2 (en)
JP (1) JP6055718B2 (en)
KR (1) KR101912954B1 (en)
CN (1) CN103507464B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6357118B2 (en) * 2015-02-03 2018-07-11 三菱重工業株式会社 Surface structure with oil repellency
CN106835857A (en) * 2015-12-04 2017-06-13 陈宣达 A kind of cardboard with false-proof texture and the ink plate for the cardboard printing
CN112624032A (en) * 2020-12-14 2021-04-09 南京工业大学 Preparation method of composite reentrant angle micrometer structure with super-amphiphobicity

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6648467B1 (en) * 2002-06-20 2003-11-18 Xerox Corporation Phase change ink imaging component with polymer blend layer
US8268399B2 (en) * 2009-08-19 2012-09-18 Xerox Corporation Polyhedral oligomeric silsesquioxane image conditioning coating
US8506051B2 (en) * 2009-12-28 2013-08-13 Xerox Corporation Process for preparing an ink jet print head front face having a textured superoleophobic surface
US8382270B2 (en) * 2010-06-14 2013-02-26 Xerox Corporation Contact leveling using low surface tension aqueous solutions
US8910380B2 (en) * 2010-06-15 2014-12-16 Xerox Corporation Method of manufacturing inkjet printhead with self-clean ability
US8419179B2 (en) * 2011-06-30 2013-04-16 Xerox Corporation Methods for UV gel ink leveling and direct-to-substrate digital radiation curable gel ink printing, apparatus and systems having leveling member with a metal oxide surface

Similar Documents

Publication Publication Date Title
JP6126108B2 (en) Transfer of damascene templates and nano-elements for direct assembly
JP2012091454A5 (en)
JP2010517747A5 (en)
JP2010534132A5 (en)
JP2008518268A5 (en)
Bliznyuk et al. Initial spreading kinetics of high-viscosity droplets on anisotropic surfaces
JP2011508686A5 (en)
JP2016191053A5 (en)
JP2010533318A5 (en)
JP5320564B2 (en) Method for forming fine carbon monomolecular film, surface coating method, and coated body
JP2008018716A5 (en)
JP2008506152A5 (en)
JP2015016684A5 (en)
JP2010505264A5 (en)
JP2011136559A5 (en)
JP2015120345A5 (en)
JP2009501904A5 (en)
JP2014000804A5 (en)
JP2016524520A5 (en)
Jansen et al. Tuning kinetics to control droplet shapes on chemically striped patterned surfaces
JP2014502418A5 (en)
JP2008520082A5 (en)
JP2016159948A5 (en)
JP2012086484A5 (en)
JP2014028518A5 (en)