JP2013519624A5 - - Google Patents

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Publication number
JP2013519624A5
JP2013519624A5 JP2012553284A JP2012553284A JP2013519624A5 JP 2013519624 A5 JP2013519624 A5 JP 2013519624A5 JP 2012553284 A JP2012553284 A JP 2012553284A JP 2012553284 A JP2012553284 A JP 2012553284A JP 2013519624 A5 JP2013519624 A5 JP 2013519624A5
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JP
Japan
Prior art keywords
crucible
molded body
wall
compression molded
silica glass
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Pending
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JP2012553284A
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Japanese (ja)
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JP2013519624A (en
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Priority claimed from DE102010008162.0A external-priority patent/DE102010008162B4/en
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Publication of JP2013519624A publication Critical patent/JP2013519624A/en
Publication of JP2013519624A5 publication Critical patent/JP2013519624A5/ja
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Claims (16)

溶融鋳型(1)内に粒子層(12;14)を形成させ、かつ該粒子層(12;14)を石英ガラスるつぼの形成下に焼結又は溶融させることによる、単結晶引上げ用石英ガラスるつぼの製造法において、該粒子層(12;14)の少なくとも一部をシリカガラス顆粒から作製し、その製造が以下の方法工程:
(a)実質的に均一な回転楕円状のモルホロジーを有する圧縮成形体の形成下に、シリカ粉末をロールブリケッティング法を用いて機械的に圧密化する工程、及び
(b)該圧縮成形体又は該圧縮成形体の破片を熱的に圧密化し、シリカガラス顆粒にする工程
を含むことを特徴とする方法。
A quartz glass crucible for pulling a single crystal by forming a particle layer (12; 14) in a molten mold (1) and sintering or melting the particle layer (12; 14) under the formation of a quartz glass crucible. In the production method, at least a part of the particle layer (12; 14) is produced from silica glass granules, and the production is performed by the following method steps:
(A) a step of mechanically compacting silica powder using a roll briquetting method under the formation of a compression molded body having a substantially uniform spheroid morphology; and (b) the compression molded body. Alternatively, the method includes the step of thermally consolidating the fragments of the compression molded body into silica glass granules.
圧縮成形体が1〜5mmの範囲内の平均相当径を有する、請求項1記載の方法。   The method according to claim 1, wherein the compression molded body has an average equivalent diameter in the range of 1 to 5 mm. 個々の圧縮成形体が1〜100mm3の範囲内の平均体積を有する、請求項1又は2記載の方法。 Individual compression-molded body has an average volume in the range of 1 to 100 mm 3, Method according to claim 1 or 2. 個々の圧縮成形体が0.6〜1.3g/cm3の範囲内の平均密度を有する、請求項1から3までのいずれか1項記載の方法。 4. A method according to any one of claims 1 to 3, wherein the individual compression molded bodies have an average density in the range of 0.6 to 1.3 g / cm < 3 >. 圧縮成形体を焼結又は溶融の前に解砕する、請求項1から4までのいずれか1項記載の方法。   The method according to any one of claims 1 to 4, wherein the compression molded body is crushed before sintering or melting. 圧縮成形体を方法工程(b)による熱的な圧密化の前に解砕する、請求項5記載の方法。   The method according to claim 5, wherein the compacted body is crushed prior to thermal consolidation in method step (b). 解砕された圧縮成形体が、0.45g/cm3を上回る範囲内の嵩密度を有するSiO2顆粒を形成する、請求項5又は6記載の方法。 Disintegrated compressed molded body is formed of SiO 2 granules having a bulk density of within the limits excessive electrical 0.45 g / cm 3, claim 5 or 6 method described. 圧縮成形体又は該圧縮成形体の破片を、方法工程(b)による熱的な圧密化の前に塩素含有雰囲気中で処理する、請求項1から7までのいずれか1項記載の方法。   The method according to any one of claims 1 to 7, wherein the compression molded body or the fragments of the compression molded body are treated in a chlorine-containing atmosphere before the thermal consolidation according to method step (b). 方法工程(b)による圧縮成形体又は該圧縮成形体の破片からシリカガラス顆粒への熱的な圧密化を、ヘリウム少なくとも30体積%を含有する雰囲気下に、及び/又は0.5バール又はそれを下回る減圧下に行う、請求項1から8までのいずれか1項記載の方法。   The thermal compaction of the compression molded body or debris of the compression molded body from method step (b) to silica glass granules under an atmosphere containing at least 30% by volume of helium and / or 0.5 bar or more The process according to any one of claims 1 to 8, which is carried out under a reduced pressure below. 水素ドープされた石英ガラスからなるシリカガラス顆粒粒子を使用する、請求項1から9までのいずれか1項記載の方法。   The method according to any one of claims 1 to 9, wherein silica glass granule particles made of hydrogen-doped quartz glass are used. 方法工程(b)により熱的に圧密化されたシリカガラス顆粒を外部粒子層として溶融鋳型の内壁上に施与し、かつ焼結して、少なくとも部分的に不透明な石英ガラスからのるつぼ内壁外部層にする、請求項1から10までのいずれか1項記載の方法。   Silica glass granules thermally compacted by method step (b) are applied as an outer particle layer on the inner wall of the molten mold and sintered to provide a crucible inner wall exterior from at least partially opaque quartz glass. 11. A method according to any one of claims 1 to 10, wherein the method is layered. 方法工程(b)により熱的に圧密化されたシリカガラス顆粒を中間粒子層として外部粒子層上に施与し、かつ焼結して、るつぼ内壁中間層か、又は少なくとも部分的に不透明な石英ガラスからのるつぼ内壁外部層にする、請求項1から11までのいずれか1項記載の方法。   Silica glass granules thermally compacted by method step (b) are applied as an intermediate particle layer on the outer particle layer and sintered to form a crucible inner wall intermediate layer or at least partially opaque quartz The method according to claim 1, wherein the inner layer of the inner wall of the crucible is made of glass. 方法工程(b)により熱的に圧密化されたシリカガラス顆粒を、焼結又は溶融の際にアークに供し、この中で溶融させ、かつ石英ガラスからのるつぼ形の基体の内壁に、透明な石英ガラスからのるつぼ内壁内部層の形成下に衝突させる、請求項1から12までのいずれか1項記載の方法。   The silica glass granules thermally consolidated by method step (b) are subjected to an arc during sintering or melting, melted therein and transparent on the inner wall of the crucible-shaped substrate from quartz glass. The method according to any one of claims 1 to 12, wherein the collision is performed under formation of an inner wall of a crucible inner wall from quartz glass. 方法工程(b)により熱的に圧密化されたシリカガラス顆粒を、内部粒子層としてるつぼ形の基体の内壁上に施与し、かつ該基体上で溶融させて、透明な石英ガラスからのるつぼ内壁内部層にする、請求項1から12までのいずれか1項記載の方法。   Silica glass granules thermally compacted by method step (b) are applied as an internal particle layer onto the inner wall of a crucible-shaped substrate and melted on the substrate to obtain a crucible from transparent quartz glass. The method according to claim 1, wherein the inner wall is an inner layer. シリカガラス顆粒からの多孔質のるつぼ形の基体を使用し、かつ内部粒子層を減圧の適用下に焼結してるつぼ内壁内部層にする、請求項14記載の方法。   15. The method of claim 14, wherein a porous crucible-shaped substrate from silica glass granules is used, and the inner particle layer is sintered to the inner wall of the crucible wall under the application of reduced pressure. 直径が公称直径から最大で10%の偏差を示すシリカガラス顆粒粒子を使用する、請求項1から15までのいずれか1項記載の方法。   16. A process according to any one of the preceding claims, wherein silica glass granule particles are used whose diameter shows a deviation of at most 10% from the nominal diameter.
JP2012553284A 2010-02-16 2011-02-15 Manufacturing method of quartz glass crucible Pending JP2013519624A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102010008162.0 2010-02-16
DE102010008162.0A DE102010008162B4 (en) 2010-02-16 2010-02-16 Method for the production of quartz glass for a quartz glass crucible
PCT/EP2011/052177 WO2011101327A1 (en) 2010-02-16 2011-02-15 Method for producing a quartz glass crucible

Publications (2)

Publication Number Publication Date
JP2013519624A JP2013519624A (en) 2013-05-30
JP2013519624A5 true JP2013519624A5 (en) 2014-01-16

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JP (1) JP2013519624A (en)
CN (1) CN102753493A (en)
DE (1) DE102010008162B4 (en)
WO (1) WO2011101327A1 (en)

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