JP2013207509A - Piezoelectric vibration piece and manufacturing method thereof - Google Patents

Piezoelectric vibration piece and manufacturing method thereof Download PDF

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JP2013207509A
JP2013207509A JP2012073697A JP2012073697A JP2013207509A JP 2013207509 A JP2013207509 A JP 2013207509A JP 2012073697 A JP2012073697 A JP 2012073697A JP 2012073697 A JP2012073697 A JP 2012073697A JP 2013207509 A JP2013207509 A JP 2013207509A
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vibrating piece
piezoelectric
piece
wafer
connecting portion
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JP5877746B2 (en
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Takashi Iwashita
貴司 岩下
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Citizen Holdings Co Ltd
Citizen Finetech Miyota Co Ltd
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Citizen Holdings Co Ltd
Citizen Finetech Miyota Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a piezoelectric vibration piece processing method in which it is difficult to generate fragments from a connection portion of a piezoelectric vibrator piece and a wafer when the piezoelectric vibrator piece is cut away from the wafer.SOLUTION: In a piezoelectric vibrator piece manufacturing method, by photo-etching a wafer 11 made of a piezoelectric material, a piezoelectric vibrator piece 12 having an outer shape of a piezoelectric vibration piece, a frame section 15 for supporting the piezoelectric vibrator piece, and a coupling section 13 for coupling the piezoelectric vibrator piece and the frame section are formed. By cutting the coupling section, the piezoelectric vibration piece is cut away from the frame section. An etching residual section 14 generated in photo-etching the wafer is formed on at least one part of an outer shape of the coupling section, and the coupling section is cut on a line passing through a portion, at which a size of the etching residual section is minimum or the etching residual section is not generated.

Description

本発明は、圧電振動子の圧電デバイスに搭載される圧電振動片及びその製造方法に関し、特に水晶等の圧電材料からなるウエハをフォトエッチングすることにより圧電振動片の外形を加工する技術に関する。   The present invention relates to a piezoelectric vibrating piece mounted on a piezoelectric device of a piezoelectric vibrator and a manufacturing method thereof, and more particularly to a technique for processing the outer shape of a piezoelectric vibrating piece by photoetching a wafer made of a piezoelectric material such as quartz.

従来より、様々な圧電デバイスに搭載される音叉型水晶振動片やATカット水晶振動片等の圧電振動片は、水晶等の圧電ウエハにフォトエッチングで外形を加工しかつその表面に電極膜をパターニングすることにより製造される(例えば、特許文献1参照。)。具体的には、図3に例示するように、所定の厚さに研磨加工した水晶ウエハ1に多数の水晶振動片2を、その基端部2aで連結部3により該水晶ウエハの残部即ち枠部4と一体に連結・支持されるように、所望の音叉型水晶振動片の外形に加工する。次に、この状態で各水晶振動片2の表面に電極膜を形成した後、個々の水晶振動片2を連結部3から折り取って切り離す。一般に連結部3は、所望の箇所で折れ易くなるように、水晶振動片2との接続部分を最も狭幅とする楔状に切り込み5を形成する(例えば、特許文献2参照。)。楔状の切り込み5は連結部3の2辺にそれぞれ形成され、水晶振動片2と枠部4を折り取って切り離す際に切り込み5において応力集中を起こり易くしており、連結部3の各辺に形成された切り込み5を結ぶ切断線5aにおいて連結部3が折れ易くなっている。水晶振動片の折り取りは、例えば上方から折り取りピン5を降下させ、水晶振動片を押し込む等により行う。   Conventionally, piezoelectric fork resonators such as tuning-fork crystal resonators and AT-cut crystal resonators mounted on various piezoelectric devices are processed by photoetching on crystal wafers such as quartz and patterned on the surface. (See, for example, Patent Document 1). Specifically, as illustrated in FIG. 3, a large number of crystal vibrating pieces 2 are attached to a crystal wafer 1 polished to a predetermined thickness, and the remainder of the crystal wafer, that is, a frame, is connected to the base end portion 2 a by a connecting portion 3. The outer shape of a desired tuning fork type crystal vibrating piece is processed so as to be connected and supported integrally with the portion 4. Next, after forming an electrode film on the surface of each crystal vibrating piece 2 in this state, each crystal vibrating piece 2 is broken off from the connecting portion 3 and separated. In general, the connecting portion 3 is formed in a wedge shape with a narrowest connection portion with the crystal vibrating piece 2 so as to be easily broken at a desired location (see, for example, Patent Document 2). The wedge-shaped notches 5 are formed on two sides of the connecting portion 3, respectively, and stress concentration is likely to occur at the notches 5 when the crystal vibrating piece 2 and the frame portion 4 are broken and separated. The connecting portion 3 is easily broken at a cutting line 5 a connecting the formed cuts 5. The crystal vibrating piece is broken, for example, by lowering the folding pin 5 from above and pushing the crystal vibrating piece.

特開2011−45119号公報JP 2011-45119 A 実願平1−131245号(実開平3−70421号)のマイクロフィルムMicrofilm of Japanese Utility Model Application No. 1-113145 (Japanese Utility Model Application Publication No. 3-70421)

しかしながら、連結部3には、フォトエッチングによる外形加工時に材料の異方性によるエッチング残渣10が形成されている。エッチング残渣10は非常に薄く、エッチング残渣10に応力がかかるとエッチング残渣10は破損して破片が発生することとなる。このようにして発生した破片が水晶振動片2に付着すると水晶振動片2の発振周波数やCI値等の特性を悪くし、水晶振動片の信頼性や歩留り低下の原因となる虜がある。また例えば音叉型水晶振動片の場合、このエッチング残渣10は、先に説明した連結部3の切り込み5とは別に、連結部3の一辺においてエッチング残渣よりなる楔状の切り込み10aとして形成されることがある。このようなエッチング残渣10が形成された状態で水晶振動片2の折り取りを行うと、切り込み5と切り込み10aに応力集中が起こることになる。ここで、切り込み5とエッチング残渣10の切り込み10aが切断線5aと同一線上でない場合、エッチング残渣10の面にねじれの応力が発生し、エッチング残渣10の破損による破片の発生が特に多くなり、水晶振動片2の特性悪化の虞が高い。   However, an etching residue 10 due to material anisotropy is formed in the connecting portion 3 during external processing by photoetching. The etching residue 10 is very thin. When stress is applied to the etching residue 10, the etching residue 10 is damaged and fragments are generated. When the generated fragments adhere to the crystal vibrating piece 2, there are some prisoners that deteriorate the characteristics of the crystal vibrating piece 2, such as the oscillation frequency and the CI value, and cause the reliability and yield reduction of the crystal vibrating piece. Further, for example, in the case of a tuning fork type crystal vibrating piece, the etching residue 10 may be formed as a wedge-shaped cut 10a made of an etching residue on one side of the connecting portion 3 separately from the notch 5 of the connecting portion 3 described above. is there. When the crystal vibrating piece 2 is folded in a state where such an etching residue 10 is formed, stress concentration occurs in the cuts 5 and 10a. Here, when the notch 5 and the notch 10a of the etching residue 10 are not on the same line as the cutting line 5a, a torsional stress is generated on the surface of the etching residue 10, and the generation of fragments due to the damage of the etching residue 10 is particularly increased. There is a high risk of deterioration of the characteristics of the resonator element 2.

そこで本発明は、上述した従来の問題点に鑑みてなされたものであり、その目的は、圧電振動片をウエハから折り取る際に生じやすいエッチング残渣の破片を低減することができ、それにより歩留りや信頼性の向上を実現し得る圧電振動片及びその製造方法を提供することにある。   Accordingly, the present invention has been made in view of the above-described conventional problems, and an object of the present invention is to reduce etching residue fragments that are likely to occur when the piezoelectric vibrating piece is folded from the wafer, thereby improving the yield. Another object of the present invention is to provide a piezoelectric vibrating piece and a method for manufacturing the same that can improve reliability.

本発明によれば、上記目的を達成するために、圧電材料からなるウエハをフォトエッチングすることにより、圧電振動片の外形を有する圧電振動子片と、この圧電振動子片を支持するための枠部と、前記圧電振動子片と前記枠部と連結する連結部を形成し、前記連結部を切断することにより前記圧電振動片を前記枠部から切り離した圧電振動片の製造方法において、前記連結部の外形の少なくとも一部には前記ウエハをフォトエッチングした際に発生するエッチング残渣部が形成されており、前記エッチング残渣部の大きさが最小、または前記エッチング残渣部が発生していない部分を通る線上にて前記連結部を切断した圧電振動片の製造方法とする。   According to the present invention, in order to achieve the above object, a piezoelectric vibrator piece having an outer shape of a piezoelectric vibrating piece and a frame for supporting the piezoelectric vibrator piece by photoetching a wafer made of a piezoelectric material. In the method of manufacturing a piezoelectric vibrating piece in which the piezoelectric vibrating piece is separated from the frame portion by forming a connecting portion that connects the portion, the piezoelectric vibrator piece and the frame portion, and cutting the connecting portion. An etching residue portion generated when the wafer is photoetched is formed on at least a part of the outer shape of the portion, and the size of the etching residue portion is the smallest or the portion where the etching residue portion is not generated A method of manufacturing a piezoelectric vibrating piece in which the connecting portion is cut on a passing line is provided.

これにより、前記連結部を切断した際に発生する破片を低減することができる。   Thereby, the piece which generate | occur | produces when cut | disconnecting the said connection part can be reduced.

さらに、前記連結部の切断線上にあたる前記圧電振動片表面の少なくとも一部に溝が形成することにより、前記エッチング残渣部が最小または発生していない部分で正確に容易に切断することができる。   Furthermore, by forming a groove on at least a part of the surface of the piezoelectric vibrating reed on the cutting line of the connecting portion, it is possible to cut accurately and easily at a portion where the etching residue portion is minimal or not generated.

さらに、前記溝が前記連結部の表裏両主面に設けられることにより、所望する部分で確実に切断することができる。   Furthermore, by providing the groove on the front and back main surfaces of the connecting portion, it is possible to reliably cut at a desired portion.

また、前記ウエハをハーフエッチングすることにより、前記溝を簡単に形成することができる。   Further, the groove can be easily formed by half-etching the wafer.

また、本発明の別の側面によれば、上述した本発明の方法により加工された圧電振動子片が提供される。   According to another aspect of the present invention, there is provided a piezoelectric vibrator piece processed by the above-described method of the present invention.

本発明は、上述したように圧電材料のウエハにフォトエッチングで外形加工した圧電振動子片を、ウエハとの連結部に形成されたエッチング残渣部が最小または発生していない部分を通る線上にて前記連結部を切断するため、エッチング残渣が切断時に破片となる可能性を低減することができる。このため、破片が圧電振動片に付着することにより生じる発振周波数やCI値等の特性悪化を低減でき、歩留りや信頼性の向上を実現することができる。   In the present invention, as described above, a piezoelectric vibrator piece that has been externally processed by photoetching on a wafer of piezoelectric material is placed on a line that passes through a portion where the etching residue portion formed at the connecting portion with the wafer is minimal or has not occurred. Since the connecting portion is cut, the possibility that the etching residue becomes a fragment at the time of cutting can be reduced. For this reason, it is possible to reduce the deterioration of characteristics such as the oscillation frequency and CI value caused by the fragments adhering to the piezoelectric vibrating piece, and it is possible to improve the yield and reliability.

本発明の圧電振動片の製造方法を説明するための図。The figure for demonstrating the manufacturing method of the piezoelectric vibrating piece of this invention. 本発明の圧電振動片を説明するための図。The figure for demonstrating the piezoelectric vibrating piece of this invention. 従来の水晶振動片の製造方法を説明するための図。The figure for demonstrating the manufacturing method of the conventional quartz crystal vibrating piece.

以下に、添付図面を参照しつつ、本発明の実施例を詳細に説明する。   Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

図1は、本発明の圧電振動片の製造方法を説明するための図である。水晶ウエハ11にはフォトエッチングにより形成された水晶振動片12、連結部13、エッチング残渣14、枠部15の形状を示している。ただし、エッチング残渣については、本発明に関連している連結部周辺のみを図1(B)に拡大図として示している。水晶振動子12は、連結部13と接続されている。連結部13には前記ウエハをフォトエッチングした際に発生するエッチング残渣14が形成されている。エッチング残渣14は水晶の異方性により片側の側面や、隅部に大きく残る傾向がある。本発明ではエッチング残渣が最小、または無い部分で切断するため、エッチング残渣が小さくなる部分ができるように、水晶振動片12の基端部12aから延びた直線状の連結部13としている。更に、基端部12aと切断部が離れると、水晶振動片12の外形形状が大きくなてしまうため、基端部12aと連結部13の接続部分の幅方向両端の各隅部には、凹部16を設けている。これによって、基端部12aからエッチング残渣14が最小、または無い部分までの距離が短くなり、基端部12aと切断部の距離が離れるのを最小限に抑えることができる。また、エッチング残渣14が最小、または無い部分を通る線上には、ハーフエッチングすることで直線状の溝13aが形成されている。   FIG. 1 is a diagram for explaining a method of manufacturing a piezoelectric vibrating piece according to the present invention. The quartz wafer 11 shows the shape of the quartz crystal vibrating piece 12, the connecting portion 13, the etching residue 14, and the frame portion 15 formed by photoetching. However, as for the etching residue, only the periphery of the connecting portion related to the present invention is shown as an enlarged view in FIG. The crystal resonator 12 is connected to the connecting portion 13. An etching residue 14 generated when the wafer is photo-etched is formed in the connecting portion 13. Etching residue 14 tends to remain largely on one side or corner due to crystal anisotropy. In the present invention, since cutting is performed at a portion where the etching residue is minimal or absent, the linear connecting portion 13 extending from the base end portion 12a of the quartz crystal vibrating piece 12 is formed so that a portion where the etching residue becomes small can be formed. Further, if the base end portion 12a and the cut portion are separated from each other, the outer shape of the crystal vibrating piece 12 becomes large. 16 is provided. As a result, the distance from the base end portion 12a to the portion where the etching residue 14 is minimum or absent is shortened, and the distance between the base end portion 12a and the cut portion can be minimized. In addition, a straight groove 13a is formed by half-etching on a line passing through a portion where the etching residue 14 is minimal or absent.

本実施例の水晶振動片は、次のようにフォトエッチングを用いて加工する。先ず、両面を研磨した所定厚さの水晶ウエハ11の表面に、耐蝕膜としてCr、Au等からなる金属薄膜を蒸着、スパッタリング等により被着し、その上にレジスト膜を塗布してフォトリソグラフィ技術により所望の音叉型水晶振動片の外形をパターニングした後、フッ酸、フッ化アンモニウム等の適当なエッチング液でエッチングし、枠部14との連結部13を残した状態で、図1(A)に示すように多数の水晶振動片12を加工する。   The quartz crystal resonator element of this example is processed using photoetching as follows. First, a metal thin film made of Cr, Au or the like is deposited as a corrosion-resistant film on the surface of a quartz wafer 11 having a predetermined thickness polished on both sides by deposition, sputtering, etc., and a resist film is applied thereon to apply a photolithography technique. After patterning the outer shape of the desired tuning-fork type crystal vibrating piece by the above, etching is performed with an appropriate etching solution such as hydrofluoric acid or ammonium fluoride to leave the connecting portion 13 with the frame portion 14 in FIG. A large number of crystal vibrating pieces 12 are processed as shown in FIG.

次に、前記レジスト膜を残したまま、同様に水晶ウエハ11両面に溝13aの形状をそれぞれパターニングし、適当なエッチング液を用いて適当な深さにハーフエッチングして溝13aを形成する。このようにしてフォトエッチングした水晶振動片12の表面に電極材料を蒸着、スパッタリング等により成膜し、フォトリソグラフィ技術によりパターニングして所望の電極膜を形成すると、多数の水晶振動片12を並べた水晶ウエハ11が完成する。   Next, while leaving the resist film, the shape of the groove 13a is similarly patterned on both surfaces of the quartz wafer 11, and the groove 13a is formed by half-etching to an appropriate depth using an appropriate etching solution. When a desired electrode film is formed by depositing an electrode material on the surface of the quartz-crystal vibrating piece 12 thus photo-etched by vapor deposition, sputtering, etc., and patterning by a photolithography technique, a large number of quartz-crystal vibrating pieces 12 are arranged. The crystal wafer 11 is completed.

この水晶ウエハ11から、例えば従来技術に関して上述したように、図3に示すような折り取りピンを用いて折り取ることにより、個々の水晶振動片12を分離させる。当然のことながら、ピンによる折り取りに限らず、吸着ノズルにより水晶振動片12を引き上げて折り取ってもよいし、レーザ等による切断でもよい。そのようにして、水晶振動片12は、前記切断部に設けた溝13aに沿って切り離される。   For example, as described above with reference to the prior art, each crystal vibrating piece 12 is separated from the quartz wafer 11 by being broken using a folding pin as shown in FIG. As a matter of course, the present invention is not limited to folding with a pin, and the quartz vibrating piece 12 may be pulled up by a suction nozzle and broken, or may be cut with a laser or the like. As such, the crystal vibrating piece 12 is cut along the groove 13a provided in the cutting portion.

本実施例では、図1に示すように、連結部13にエッチング残渣14が形成されていない部分があり、そこを通る線上で水晶片ウエハ11から折り取ることによって、折り取り時に発生するエッチング残渣14の破片を最小限に抑えている。また、例えば図3に示されるように連結部にエッチング残渣が形成されていない部分がない場合には、エッチング残渣が最小となる部分を通る線上にて連結部を切断すればエッチング残渣14の破片を最小限に抑えることができる。ただしこのような場合は、あくまでもエッチング残渣が最小となる部分を通る線上にて切断することが重要であり、図3に示されるように連結部に切り込みがある場合は、エッチング残渣と前記切り込みが一つの線上に位置するよう前記切り込みを形成する位置等を適宜決定することが必要となる。   In this embodiment, as shown in FIG. 1, there is a portion where the etching residue 14 is not formed in the connecting portion 13, and the etching residue generated at the time of folding by folding from the crystal wafer 11 on the line passing therethrough. 14 pieces are kept to a minimum. Further, for example, as shown in FIG. 3, if there is no portion where no etching residue is formed in the connecting portion, fragments of the etching residue 14 can be obtained by cutting the connecting portion on a line passing through the portion where the etching residue is minimized. Can be minimized. However, in such a case, it is important to cut on the line passing through the portion where the etching residue is minimized, and when there is a cut in the connecting portion as shown in FIG. It is necessary to appropriately determine the position or the like for forming the cut so as to be located on one line.

図2は、図1に関連して上述した本発明の第1実施例に従って加工されかつ個片に切り離された水晶振動片12を搭載した水晶振動子を示している。パッケージ20は、例えばセラミック薄板を積層した矩形箱状のベース21を有し、その内部に画定される空所22の底部には、一方の端部付近に1対の接続端子23が設けられている。水晶振動片12は、その基端部12aに設けられた電極をそれぞれ対応する接続端子23に整合させて、導電性接着剤25で機械的・電気的に接続されている。パッケージ20は、ベース21上端に薄板状の蓋26を接合することにより気密に封止される。   FIG. 2 shows a crystal resonator on which a crystal resonator element 12 processed according to the first embodiment of the present invention described above with reference to FIG. 1 and separated into individual pieces is mounted. The package 20 has, for example, a rectangular box-shaped base 21 in which ceramic thin plates are laminated, and a pair of connection terminals 23 are provided near one end at the bottom of a space 22 defined therein. Yes. The quartz crystal resonator element 12 is mechanically and electrically connected with a conductive adhesive 25 by aligning the electrodes provided on the base end portion 12 a with the corresponding connection terminals 23. The package 20 is hermetically sealed by bonding a thin plate-like lid 26 to the upper end of the base 21.

本実施例の水晶振動片12は、上述したように基端部12aと切断部の距離が離れるのを最小限に抑えているため、パッケージのより一層の小型化に対応することが可能である。   As described above, the quartz crystal resonator element 12 according to the present embodiment minimizes the distance between the base end portion 12a and the cut portion, and thus can cope with further downsizing of the package. .

以上、本発明の好適な実施例について詳細に説明したが、当業者に明らかなように、本発明はその技術的範囲内において上記実施例に様々な変更・変形を加えて実施することができる。例えば、直線状に連続する小さな凹みのように溝13a以外の様々な形状・構造のものにより、基端部12aと連結部13との前記接続部分に薄肉部を設け、連結部13との接続部分を常に略一定の形状で折り取ることができる。更に、本発明は、音叉型以外の水晶振動片、及びフォトエッチングにより外形加工される限り、水晶以外の圧電振動片についても同様に適用することができる。   The preferred embodiments of the present invention have been described in detail above. However, as will be apparent to those skilled in the art, the present invention can be carried out with various modifications and variations within the technical scope thereof. . For example, a thin wall portion is provided at the connecting portion between the base end portion 12a and the connecting portion 13 with various shapes and structures other than the groove 13a, such as a linearly continuous small dent, and the connecting portion 13 is connected. The part can always be folded in a substantially constant shape. Furthermore, the present invention can be similarly applied to a crystal vibrating piece other than a tuning fork type and a piezoelectric vibrating piece other than quartz as long as the outer shape is processed by photoetching.

1 水晶ウエハ
2 水晶振動片
2a 基端部
3 連結部
4 枠部
5 切り込み
5a 切断線
10 エッチング残渣
10a 切り込み
11 水晶ウエハ
12 水晶振動片
12a 基端部
13 連結部
13a 溝
14 エッチング残渣
15 枠部
16 凹部
20 パッケージ
21 ベース
22 空所
23 接続端子
25 導電性接着剤
26 蓋
DESCRIPTION OF SYMBOLS 1 Crystal wafer 2 Crystal vibration piece 2a Base end part 3 Connection part 4 Frame part 5 Cut 5a Cutting line 10 Etching residue 10a Cut 11 Crystal wafer 12 Crystal vibration piece 12a Base end part 13 Connection part 13a Groove 14 Etch residue 15 Frame part 16 Recess 20 Package 21 Base 22 Space 23 Connection terminal 25 Conductive adhesive 26 Lid

Claims (6)

圧電材料からなるウエハをフォトエッチングすることにより、圧電振動片の外形を有する圧電振動子片と、この圧電振動子片を支持するための枠部と、前記圧電振動子片と前記枠部と連結する連結部を形成し、前記連結部を切断することにより前記圧電振動片を前記枠部から切り離した圧電振動片の製造方法において、前記連結部の外形の少なくとも一部には前記ウエハをフォトエッチングした際に発生するエッチング残渣部が形成されており、前記エッチング残渣部の大きさが最小、または前記エッチング残渣部が発生していない部分を通る線上にて前記連結部を切断したことを特徴とする圧電振動片の製造方法。   A piezoelectric vibrator piece having an outer shape of a piezoelectric vibrating piece, a frame portion for supporting the piezoelectric vibrator piece, and a connection between the piezoelectric vibrator piece and the frame portion by photoetching a wafer made of a piezoelectric material In the method for manufacturing a piezoelectric vibrating piece in which the piezoelectric vibrating piece is separated from the frame by cutting the connecting portion, the wafer is photoetched on at least a part of the outer shape of the connecting portion. An etching residue portion generated when the etching residue portion is formed, and the connecting portion is cut on a line passing through a portion where the size of the etching residue portion is minimum or the etching residue portion is not generated. A method for manufacturing a piezoelectric vibrating piece. 前記連結部の切断線上にあたる前記圧電振動片表面の少なくとも一部に溝が形成されていることを特徴とする請求項1に記載の圧電振動片の製造方法。   The method for manufacturing a piezoelectric vibrating piece according to claim 1, wherein a groove is formed on at least a part of the surface of the piezoelectric vibrating piece corresponding to the cutting line of the connecting portion. 前記溝は、前記連結部の表裏両主面に設けられることを特徴とする請求項2に記載の圧電振動片の製造方法。   The method for manufacturing a piezoelectric vibrating piece according to claim 2, wherein the groove is provided on both front and back main surfaces of the connecting portion. 前記溝が、前記ウエハをハーフエッチングすることにより形成されることを特徴とする請求項2または3に記載の圧電振動片の製造方法。   The method for manufacturing a piezoelectric vibrating piece according to claim 2, wherein the groove is formed by half-etching the wafer. 前記圧電材料が水晶であることを特徴とする請求項1から4のいずれかに記載の圧電振動片の製造方法。   The method for manufacturing a piezoelectric vibrating piece according to claim 1, wherein the piezoelectric material is quartz. 請求項1から5までのいずれかに記載の方法により製造されたことを特徴とする圧電振動片。   A piezoelectric vibrating piece manufactured by the method according to claim 1.
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