JP2013158701A - Oxidation treatment system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an oxidation treatment system capable of the generation of hydrogen peroxide gas not supplied to a treatment chamber.SOLUTION: An oxidation treatment system 1 includes a treatment chamber 2, an ozone gas generator 3 for generating ozone gas and a hydrogen peroxide gas generator 4 for generating hydrogen peroxide gas, and the hydrogen peroxide gas and ozone gas are used to perform the surface oxidation treatment of a treatment object in the treatment chamber 2. The hydrogen peroxide gas generator 4 is arranged in the treatment chamber 2.

Description

  The present invention relates to a technology of an oxidation treatment system.

2. Description of the Related Art Conventionally, various techniques for oxidation treatment systems that oxidize a treatment target and sterilize, wash, or deodorize the treatment target are known.
In the oxidation treatment system, for example, a solid surface such as a medical device, an operating room, a clean room, an electronic component, or an electrical product is treated, and the treatment target surface is oxidized using ozone, hydrogen peroxide, or the like. There is a thing (refer patent document 1).

  In addition, the oxidation treatment system includes an oxidation treatment (promoted oxidation) of a treatment target in a treatment chamber by radicals generated by a reaction between ozone and hydrogen peroxide in water (for example, OH radical (hydroxycal radical)). There is something to do.

  Here, it is known that accelerated oxidation (AOP (Advanced Oxidation Process)) decomposes organic substances or other substances on the surface to be treated using OH radicals. It is known that the OH radical has higher oxidizing power than ozone or hydrogen peroxide and is highly reactive with organic substances.

Japanese Patent Laid-Open No. 63-59961

However, the oxidation system that performs the oxidation treatment of the object to be treated by the radical includes a treatment chamber, an ozone gas generation device, and a hydrogen peroxide gas generation device, and the hydrogen peroxide gas generation device is disposed outside the treatment chamber. In addition, it is conceivable to include a supply pipe for supplying hydrogen peroxide gas from the hydrogen peroxide gas generator into the processing chamber.
In addition, the hydrogen peroxide gas generator of the oxidation treatment system is configured to generate hydrogen peroxide gas by evaporating hydrogen peroxide water.

In the oxidation processing system, when the hydrogen peroxide gas is cooled in a supply pipe that supplies the hydrogen peroxide gas from the hydrogen peroxide gas generator into the processing chamber, hydrogen peroxide gas (evaporated hydrogen peroxide water) Some of them may condense in the supply pipe.
Thus, in the oxidation treatment system, hydrogen peroxide gas that is not supplied into the processing chamber is generated from the hydrogen peroxide gas generated by the hydrogen peroxide gas generator due to condensation of the hydrogen peroxide gas in the supply pipe. There is a case.

  This invention is made | formed in view of the above situations, and makes it a subject to provide the oxidation treatment system which can prevent that the hydrogen peroxide gas which is not supplied in a process chamber arises.

  The problem to be solved by the present invention is as described above. Next, means for solving the problem will be described.

  That is, in claim 1, a treatment chamber, an ozone gas generator that generates ozone gas, and a hydrogen peroxide gas generator that generates hydrogen peroxide gas are provided, and the hydrogen peroxide gas and the ozone gas are provided. An oxidation treatment system is used to oxidize the surface of the treatment target in the treatment chamber, wherein the hydrogen peroxide gas generator is disposed in the treatment chamber.

  According to a second aspect of the present invention, the ozone gas generator is disposed in the processing chamber.

  As effects of the present invention, the following effects can be obtained.

  That is, according to the present invention, it is possible to prevent the generation of hydrogen peroxide gas that is not supplied into the processing chamber.

The schematic diagram which showed the whole structure of the oxidation treatment system which concerns on 1st embodiment of this invention. The schematic diagram which showed the whole structure of the oxidation treatment system which concerns on 2nd embodiment of this invention.

  Next, the oxidation treatment system 1 according to the first embodiment of the present invention will be described with reference to FIG.

  As shown in FIG. 1, the oxidation treatment system 1 includes a treatment chamber 2, an ozone gas generator 3, a hydrogen peroxide gas generator 4, and a fan 5, and includes hydrogen peroxide (H 2 O 2) gas and ozone. (O3) Gas is used to oxidize the surface to be processed in the processing chamber 2. The surface to be treated is oxidized by the oxidation treatment system 1 so that the surface to be treated is sterilized, washed, deodorized, or the like.

In the processing chamber 2 of the oxidation processing system 1, the surface to be processed is oxidized using hydrogen peroxide gas and ozone gas.
The treatment room 2 of the oxidation treatment system 1 includes, for example, manufacturing equipment in the precision machinery industry, semiconductor industry, pharmaceutical industry, etc., clean rooms and isolators in research facilities, operating rooms, sterilization rooms for sterilizers, and clinics such as dentistry and ophthalmologists. Living rooms, cleaning rooms for cleaning equipment, food manufacturing factories, hotel rooms, nursing care facilities, various facilities where unspecified people gather, kitchens for restaurants, restaurants, etc., or facilities where harmful chemical substances or microorganisms remain There is.
The processing chamber 2 of the oxidation processing system 1 has an exhaust port 2a. The treatment chamber 2 of the oxidation treatment system 1 is configured by providing a hydrogen peroxide decomposition catalyst and an ozone decomposition catalyst at the exhaust port 2a.

The treatment target indicates that the surface is oxidized using hydrogen peroxide gas and ozone gas.
The surface to be treated includes the surface of the inner wall of the clean room and isolator of manufacturing equipment and research facilities in the precision machinery industry, semiconductor industry, pharmaceutical industry, etc., the inner wall surface of the operating room, the inner wall surface of the sterilization room of the sterilizer, Surfaces of interior walls of ophthalmological clinics, interior walls of cleaning rooms of cleaning equipment, interior walls of food manufacturing factories, interior walls of hotel rooms, interior walls of various facilities such as nursing care facilities or hospitals , Such as the inner wall surface of a kitchen such as a canteen or restaurant, or the inner wall surface of a facility where harmful chemical substances or microorganisms remain. In addition, the surfaces to be treated include clean rooms and isolators, operating rooms, sterilization rooms for sterilizers, dentistry and ophthalmology clinics, cleaning rooms for cleaning equipment, food manufacturing factories, hotel rooms, nursing care Equipment installed in various facilities such as facilities or hospitals, kitchens such as canteens / restaurants, etc., or facilities where harmful chemicals or microorganisms remain, such as equipment in clean rooms or isolators Surfaces of tools and tools, surfaces of surgical tools in operating rooms, surfaces of clothes and containers in the sterilization chamber of sterilizers, surfaces of installed items and equipment in dentistry and ophthalmology clinics, and electronics in cleaning chambers of cleaning devices Surfaces of parts and electrical products, manufacturing equipment installed in food manufacturing factories, airborne bacteria in the atmosphere in food factories, jigs, raw materials such as cakes, pies, or soba, cars in hotel rooms Furniture such as beds and beds, furniture in various facilities where unspecified large numbers such as nursing care facilities or hospitals gather, furniture in kitchens such as canteens and restaurants, the surface of dishes and odorous substances exhausted, or There are surfaces of installations in facilities where harmful chemical substances and microorganisms remain.
As described above, in the oxidation treatment system 1, the treatment target surface itself (oxidation treatment) is performed like a semiconductor surface treatment. Further, in the oxidation treatment system 1, chemical substances or microorganisms attached to the treatment target surface are treated (oxidation treatment) to reduce odorous substances on the treatment target surface (deodorization), and detoxify harmful substances on the treatment target surface. The microorganisms on the surface to be treated are sterilized.

It is known that ozone is a strong oxidant and exhibits a strong inactivation effect on bacteria and viruses that are microorganisms. It is also known that by adding moisture to ozone by a method such as humidification, OH radicals having a stronger oxidizing power are generated and a stronger sterilizing effect can be obtained.
Deodorization using ozone is also used as an air pollution process in exhaust deodorization, smoke removal, indoor air purification, bathrooms, hospitals, elderly facilities, and the like. The deodorization principle is to decompose sulfides, organic acids, and the like constituting odorous substances by utilizing a strong oxidation reaction of ozone. In general, ozone is highly reactive with compounds having —SH, ═S, —NH 2, ═NH, —OH, and —CHO. Since many offensive odor substances have these groups, deodorization with ozone has an effect on many offensive odor substances.
It is known that ozone is decomposed by a strong oxidizing power with various persistent chemical substances. For example, there are reports on treatment in water for chlorinated pesticides, organophosphorus pesticides, urea pesticides, and the like.

The ozone gas generator 3 of the oxidation treatment system 1 is a device that generates ozone gas.
The ozone gas generating device 3 of the oxidation treatment system 1 generates ozone gas by discharging to oxygen (discharge type ozone gas generating device), or generates ozone gas by irradiating oxygen to ultraviolet rays (ultraviolet ozone gas). Generator).
The ozone gas generator 3 of the oxidation treatment system 1 is disposed outside the treatment chamber 2.
The oxidation treatment system 1 is configured by connecting an ozone gas generator 3 and the inside of a treatment chamber 2 via an ozone gas supply pipe 6.

The hydrogen peroxide gas generator 4 of the oxidation treatment system 1 is an apparatus that generates hydrogen peroxide gas.
The hydrogen peroxide gas generator 4 of the oxidation treatment system 1 is configured to generate hydrogen peroxide gas by evaporating hydrogen peroxide water (for example, 35 wt% hydrogen peroxide water). In the oxidation treatment system 1, an excess of hydrogen peroxide gas used to generate hydrogen peroxide gas in the hydrogen peroxide gas generator 4 according to required effects, applications, specifications of the hydrogen peroxide gas generator 4, or the like. The concentration of the hydrogen oxide water is determined.
The hydrogen peroxide gas generator 4 of the oxidation treatment system 1 is disposed in the treatment chamber 2.
The hydrogen peroxide gas generator 4 of the oxidation treatment system 1 is configured to have ozone resistance and hydrogen peroxide resistance.

The fan 5 of the oxidation processing system 1 supplies outside air to the hydrogen peroxide gas generator 4 and supplies hydrogen peroxide gas together with the outside air from the hydrogen peroxide gas generator 4 into the processing chamber 2. .
The fan 5 of the oxidation processing system 1 is disposed outside the processing chamber 2. The fan 5 of the oxidation treatment system 1 is disposed on the upstream side of the hydrogen peroxide gas generator 4.
The oxidation treatment system 1 is configured by connecting a fan 5 and a hydrogen peroxide gas generator 4 via a pipe 8.

In the oxidation treatment system 1, when the fan 5 is operated, outside air is supplied from the fan 5 to the hydrogen peroxide gas generator 4 through the pipe 8, and the hydrogen peroxide gas generator 4 in the treatment chamber 2 supplies hydrogen peroxide. When the gas is generated, the hydrogen peroxide gas generated in the hydrogen peroxide gas generator 4 together with the outside air is supplied into the processing chamber 2.
Further, in the oxidation treatment system 1, the ozone pump generated by the ozone gas generator 3 is supplied from the ozone gas generator 3 through the ozone gas supply pipe 6 to the treatment chamber 2 by operating the supply pump and the oxygen generator of the ozone gas generator 3. Configured to be fed into.
In the oxidation processing system 1, the gas (hydrogen peroxide, ozone, oxygen, etc.) in the processing chamber 2 is exhausted from the exhaust port 2 a of the processing chamber 2 by supplying hydrogen peroxide gas or ozone gas into the processing chamber 2. Configured to be.

The oxidation treatment system 1 is configured to oxidize the surface to be treated in the treatment chamber 2 with hydrogen peroxide gas or ozone gas supplied into the treatment chamber 2.
Further, the oxidation treatment system 1 generates hydrogen radicals in the treatment chamber 2 by reacting hydrogen peroxide gas and ozone gas supplied into the treatment chamber 2, so that the surface to be treated is accelerated and oxidized by the radicals. Configured.
A radical generated by the reaction between ozone and hydrogen peroxide includes an OH radical (hydroxycal radical). Accelerated oxidation indicates that organic substances on the surface to be treated are decomposed using radicals.

As described above, the oxidation treatment system 1 is configured by arranging the hydrogen peroxide gas generator 4 in the treatment chamber 2.
For this reason, the oxidation treatment system 1 does not require a supply pipe (hydrogen peroxide gas supply pipe) for supplying the hydrogen peroxide gas from the hydrogen peroxide gas generator 4 into the processing chamber 2. The hydrogen peroxide gas generated in 4 is not condensed in the supply pipe.
Thus, in the oxidation processing system 1, the hydrogen peroxide gas generated by the hydrogen peroxide gas generator 4 can be supplied into the processing chamber 2 without waste.
Therefore, according to the oxidation treatment system 1, it is possible to prevent the generation of hydrogen peroxide gas that is not supplied into the treatment chamber 2.

The oxidation treatment system 1 is configured by arranging a hydrogen peroxide gas generator 4 in the treatment chamber 2.
For this reason, the oxidation treatment system 1 does not require a supply pipe for supplying hydrogen peroxide gas from the hydrogen peroxide gas generator 4 into the treatment chamber 2.
Therefore, according to the oxidation treatment system 1, the overall configuration of the oxidation treatment system 1 can be made compact.

Next, the oxidation treatment system 1 according to the second embodiment of the present invention will be described with reference to FIG.
Note that in the description of the oxidation processing system 1 according to the second embodiment, the same configuration as the oxidation processing system 1 according to the first embodiment is omitted as appropriate, and the configuration of the oxidation processing system 1 according to the first embodiment is omitted. It demonstrates centering on a different part.

The ozone gas generator 3 of the oxidation treatment system 1 is disposed in the treatment chamber 2 as shown in FIG.
For this reason, the oxidation treatment system 1 does not require the ozone gas supply pipe 6 and does not include the ozone gas supply pipe 6.
Therefore, according to the oxidation treatment system 1, the overall configuration of the oxidation treatment system 1 can be made compact.
In addition, the ozone gas generator 3 of the oxidation treatment system 1 is configured to have ozone resistance and hydrogen peroxide resistance.

  When the ozone gas generating device 3 of the oxidation treatment system 1 is an ultraviolet ozone gas generating device, the pressure loss is less than that of the other, so that the ozone gas generating device 3 can be configured using a fan instead of the supply pump. In addition, the ozone gas generator 3 can be easily configured to have ozone resistance and hydrogen peroxide resistance.

DESCRIPTION OF SYMBOLS 1 Oxidation processing system 2 Processing chamber 3 Ozone gas generator 4 Hydrogen peroxide gas generator 5 Fan

Claims (2)

A treatment chamber, an ozone gas generation device for generating ozone gas, and a hydrogen peroxide gas generation device for generating hydrogen peroxide gas, the processing target in the processing chamber using the hydrogen peroxide gas and the ozone gas An oxidation treatment system that performs surface oxidation treatment,
The hydrogen peroxide gas generator is disposed in the processing chamber;
Oxidation treatment system. The ozone gas generator is disposed in the processing chamber;
The oxidation treatment system according to claim 1.

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