JP2013092697A - Film conveying apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a film conveying apparatus capable of manufacturing a pattern retardation film including a region highly accurate in a shape and dimensions.SOLUTION: The film conveying apparatus which conveys a long film material having a liquid crystal composition layer and irradiates a predetermined region in the liquid crystal composition layer with light, comprises: an exhaust nozzle for blowing a gas onto the film material from below; a floating conveying apparatus for blowing the gas from the exhaust nozzle to float the film material; and an exposure device for irradiating through a mask the liquid crystal composition layer of the floated film material with light.

Description

  The present invention relates to a film transport device used for manufacturing a pattern retardation film.

  Among the display methods in stereoscopic image display devices that have been developed in recent years, one of the representative methods is a method called a passive method. In a passive stereoscopic image display device, a right-eye image and a left-eye image are usually displayed on the same screen, and these images are distributed to the left and right eyes using dedicated glasses. For this reason, in the passive stereoscopic display device, two or more kinds of in-plane retardations (in-plane retardations) are displayed in order to display images corresponding to the left and right eyes respectively in different polarization states. There may be provided a retardation film (ie, “pattern retardation film”) having regions at different positions in the plane.

  The pattern retardation film is manufactured using, for example, photolithography. In photolithography, a mask pattern is usually copied onto an object by irradiating the object with light through a mask having a predetermined pattern (also referred to as a “photomask”). For example, Patent Document 1 describes a method for producing a patterned retardation film, which includes irradiating a liquid crystal layer with ultraviolet rays through a mask (Patent Document 1, paragraphs [0047] to [0049], FIG. 11).

  In addition, techniques such as Patent Documents 2 to 8 are also known.

JP 2010-152296 A JP 2005-212954 A Japanese Patent Laid-Open No. 01-209256 Japanese Patent Application Laid-Open No. 2004-284751 JP 2010-195558 A No. 01-0381115 JP 2010-269889 A Japanese Patent Laid-Open No. 04-354751

  From the viewpoint of increasing the production efficiency, the pattern retardation film is preferably produced continuously using a long film material. Usually, a pattern retardation film is manufactured, conveying a long film material with the roll for conveyance. However, in the manufacturing method using photolithography, when the pattern retardation film is manufactured while the film material is conveyed by a roll, the accuracy of the shape and size of each region formed in the pattern retardation film may be lowered. .

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a film transport apparatus capable of producing a pattern retardation film having a region having a good shape and dimensional accuracy.

As a result of intensive studies to solve the above-mentioned problems, the present inventor irradiates a predetermined region of the liquid crystal composition layer with light while conveying a long film material provided with the liquid crystal composition layer, and forms a pattern retardation film. It is found that the accuracy of the shape and dimensions of each region can be improved in the produced pattern retardation film by levitation of the film material by jetting gas from below to the film material. Was completed.
That is, the present invention is as follows.

[1] A film transport apparatus capable of irradiating light to a predetermined region of the liquid crystal composition layer while transporting a long film material including the liquid crystal composition layer,
A levitation transport device capable of levitation of the film material by ejecting gas from the fountain, comprising an ejection port capable of ejecting gas from below the film material;
An exposure apparatus capable of irradiating light onto the liquid crystal composition layer of the film material that has floated through a mask.
[2] The levitation conveyance device can adjust the irradiation width of the light by the exposure device by controlling the distance between the film material and the mask by adjusting the flow rate of the gas ejected from the ejection port. [1] The film transport apparatus according to [1].
[3] The film transport apparatus according to [1] or [2], wherein a distance between the film material and the mask when irradiated with light is greater than 0 mm and 5 mm or less.
[4] The transport device includes a roll upstream of the exposure device,
The levitation conveyance apparatus according to any one of [1] to [3], wherein the levitation conveyance apparatus is disposed between the roll and the exposure apparatus in a conveyance direction of the film material.

  According to the film transport apparatus of the present invention, a pattern retardation film having a region having a good shape and dimensional accuracy can be produced.

FIG. 1 is a perspective view schematically showing a film transport apparatus according to the first embodiment of the present invention. FIG. 2 is a side view schematically showing the film transport apparatus according to the first embodiment of the present invention. FIG. 3 is a cross-sectional view schematically showing an enlarged cross section of the mask and the film material taken along a plane perpendicular to the transport direction in the vicinity of the mask. FIG. 4 is an exploded top view schematically illustrating an example of a stereoscopic display device. FIG. 5 is a side view schematically showing the configuration of the film transport apparatus used in Example 1. FIG. 6 is a diagram schematically showing the state of the sample when measuring the in-plane variation of the pattern retardation film. FIG. 7 is a side view schematically showing the configuration of the film transport apparatus used in Example 6.

  Hereinafter, the present invention will be described in detail with reference to embodiments and examples. However, the present invention is not limited to the embodiments and examples shown below, and may be arbitrarily modified and implemented without departing from the scope of the claims of the present invention and its equivalent scope.

In the following description, “long” means one having a length of usually 5 times or more, preferably 10 times or more, and specifically a roll shape. It has a length enough to be wound up and stored or transported.
The “polarizing plate” includes not only a rigid member but also a flexible member such as a resin film.

  Further, “phase difference” means in-plane retardation (in-plane retardation) unless otherwise specified. The in-plane retardation of the film is a direction perpendicular to the thickness direction of the film (in-plane direction) and has a refractive index nx in the direction giving the maximum refractive index, and is in the in-plane direction and perpendicular to the nx direction. The refractive index ny and the film thickness d of the film are values represented by (nx−ny) × d. The in-plane retardation can be measured using a commercially available retardation measuring device (for example, “KOBRA-21ADH” manufactured by Oji Scientific Instruments, “WPA-micro” manufactured by Photonic Lattice) or the Senarmon method.

Further, “(meth) acrylate” means “acrylate” and “methacrylate”, and “(meth) acryl” means “acryl” and “methacryl”.
“Ultraviolet light” means light having a wavelength of 1 nm or more and 400 nm or less.

  Further, unless the direction of the component is “parallel” or “vertical”, it may include an error within a range that does not impair the effect of the present invention, for example, within a range of ± 5 °, unless otherwise specified. Further, “along” in a certain direction means “in parallel” in a certain direction.

[1. Film transport device]
FIG. 1 is a perspective view schematically showing a film transport apparatus according to the first embodiment of the present invention. FIG. 2 is a front view schematically showing the film transport apparatus according to the first embodiment of the present invention. In FIG. 1 and FIG. 2, a gap is opened between the first levitation conveyance device, the exposure device, and the second levitation conveyance device in order to facilitate the distinction between members. This void may be eliminated as long as it is not damaged.

  As shown in FIG.1 and FIG.2, the film conveying apparatus 100 is an apparatus which can convey the elongate film material 200, Comprising: The 1st guide roll 110 in order from the upstream of the conveyance direction of the film material 200, The first levitating and conveying apparatus 120, the exposure apparatus 130, the second levitating and conveying apparatus 140, and the second guide roll 150 are provided. Moreover, in this embodiment, the film material 200 is a multilayer film provided with the base film which can permeate | transmit the light which the light source 131 of the exposure apparatus 130 permeate | transmits, and the liquid-crystal composition layer provided on this base film. Will be described as an example. However, as long as the liquid crystal composition layer is provided, the configuration of the film material 200 is arbitrary.

  The first guide roll 110 and the second guide roll 150 are rolls that guide the film material 200. The film material 200 supplied to the film transport apparatus 100 is sent out to the first levitation transport apparatus 120 via the first guide roll 110. In addition, the film material 200 sent out from the second levitation transport device 140 is sent out of the film transport device 100 via the second guide roll 150.

  As shown in FIG. 1, the first levitation transport device 120 includes a slit 121 as a spout from which gas can be spouted. The slit 121 is disposed under the film material 200 so that gas can be ejected from below into the film material 200. A gas layer 160 is formed under the film material 200 by ejecting gas from the slit 121 (see FIG. 2). Since the gas layer 160 supports the film material 200, the film material 200 to be conveyed can be levitated. In addition, since the gas jetted from the slit 121 flows to the exposure apparatus 130, not only between the first levitation transport apparatus 120 and the film material 200 but also between the exposure apparatus 130 and the film material 200. A gas layer 160 is also formed therebetween. For this reason, the film material 200 is supported by the gas layer 160 not only when passing through the first levitation transport device 120 but also when passing through the exposure device 130.

  In the first levitation transport device 120, the thickness of the gas layer 160 formed under the film material 200 is set by appropriately setting the flow rate of gas ejected by the slit 121 (particularly, the flow rate per unit time). It is stabilized in time without fluctuation. For this reason, in the film conveying apparatus 100, it is possible to maintain the position through which the conveyed film material 200 passes constant. In particular, the distance h between the mask 132 and the film material 200 when passing through the exposure apparatus 130 (hereinafter referred to as “film height” as appropriate) h can be kept constant, so that the region irradiated with light can be maintained. Since the fluctuation of the width (hereinafter referred to as “irradiation width” as appropriate. Here, the dimension in the TD direction) can be prevented, the accuracy of the shape and dimension of the region formed in the liquid crystal composition layer can be increased. Usually, the film height h can be kept constant by making the flow rate per unit time of the gas ejected from the slit 121 constant.

  Moreover, in this embodiment, the slit 121 is provided along the width direction of the film material 200, as shown in FIG. For this reason, since gas is supplied to the whole of the width direction, the whole film material 200 can be supported by the gas layer 160. Therefore, the film material 200 can be stably levitated over the entire width direction.

Furthermore, in the first levitation transport device 120, the flow rate of gas ejected by the slit 121 (particularly, the flow rate per unit time) can be changed. Therefore, when the film material 200 is conveyed, the film height h can be controlled by adjusting the flow rate of the gas ejected from the slit 121. Specifically, when the gas flow rate increases, the thickness of the gas layer 160 increases and the film height h increases, and when the gas flow rate decreases, the thickness of the gas layer 160 decreases and the film height increases. h becomes small.
The gas used here is preferably air in consideration of cost and the like, but an inert gas such as nitrogen may be used.

  As shown in FIG. 1, the exposure apparatus 130 includes a light source 131 and a detachable mask 132, and can irradiate light onto the liquid crystal composition layer of the film material 200 that has floated through the mask 132. It is like that. Therefore, the film transport apparatus 100 can irradiate a predetermined region of the liquid crystal composition layer of the film material 200 being transported by the exposure apparatus 130. In the present embodiment, the exposure apparatus 130 is disposed below the film material 200, but the exposure apparatus 130 may be disposed on the film material 200 as necessary.

  As the light source 131, what emits desired light may be used arbitrarily. Usually, a light source that emits light having a wavelength capable of curing the liquid crystal composition layer is used. An example of such light is ultraviolet light. Examples of the light source 131 include a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a chemical lamp, and a metal halide lamp.

Irradiation intensity (illuminance) is not particularly limited, it is preferable irradiation intensity of wavelength region effective for activation of the polymerization initiator is ^{0.1mW / cm 2 ~100mW / cm 2} . If the light irradiation intensity is less than 0.1 mW / cm ² , the reaction time becomes too long, and if it exceeds 100 mW / cm ² , the liquid crystal composition may turn yellow due to radiation heat from the light source, polymerization reaction heat, etc. The film material itself may be deformed.
The light irradiation time is appropriately selected according to the curing state and is not particularly limited. However, the integrated light amount expressed as the product of the irradiation intensity and the irradiation time is 10 mJ / cm ^{2 to} 10,000 mJ / cm. It is preferably set to be ² .

  A plurality of light sources may be used as the light source 131. The light source 131 may include a member that collimates light. Examples of such a member include a fly-eye lens and a lenticular lens. Further, the light source 131 may include a filter. Examples of such a filter include a band pass filter and a neutral density filter.

  The mask 132 includes a light-transmitting portion 133 that can transmit light emitted from the light source 131 and a light-shielding portion 134 that can block the light, and is installed between the light source 131 and the film material 200. The light emitted from the light source 131 is applied to the liquid crystal composition layer of the film material 200 that has floated on the mask 132 through the mask 132. For this reason, in the region of the liquid crystal composition layer, the region corresponding to the light shielding portion 134 is not irradiated with light, and the region corresponding to the light transmitting portion 133 is irradiated with light transmitted through the light transmitting portion 133. That is, light is selectively irradiated to the region of the liquid crystal composition layer corresponding to the light transmitting portion 133.

In the mask 132, the positions, shapes, and dimensions of the light transmitting portion 133 and the light shielding portion 134 are set according to the position, shape, and size of the region that is desired to be formed in the pattern retardation film.
In the present embodiment, each of the light transmitting portion 133 and the light shielding portion 134 is a band-like portion that extends in the conveyance direction of the film material 200. Further, the translucent part 133 and the light shielding part 134 have a constant width. Further, the light transmitting portions 133 and the light shielding portions 134 are alternately arranged in the width direction of the film material 200 and are arranged in a stripe shape as a whole.

  Further, the widths of the light transmitting portion 133 and the light shielding portion 134 may be set as appropriate in accordance with the size of pixels in the liquid crystal panel to be used and the horizontal and vertical resolutions. For example, the width may be 200 μm to 260 μm at 20 inches and the resolution (horizontal 1600 × 1200 pixels), and the width may be 280 μm to 340 μm, for example, at 27 inches and the resolution (horizontal 1920 × vertical 1200 pixels). Good. Usually, the widths of the light transmitting part 133 and the light shielding part 134 are the same width as one pixel of the stereoscopic image device and can be appropriately changed according to the screen size, but is generally 800 μm or less. Since the widths of the light transmitting portion 133 and the light shielding portion 134 are narrow in this way, a decrease in the accuracy of the shape and size tends to greatly affect the quality. However, if the film transport apparatus 100 is used, even when the widths of the light transmitting part 133 and the light shielding part 134 are narrow as described above, the light transmitting part 133 and the light shielding part 134 can be accurately copied onto the liquid crystal composition layer. .

  The film height (that is, the distance between the mask 132 and the film material 200 that passes through the exposure apparatus 130) h in the exposure apparatus 130 is the light irradiation width (that is, the light that has passed through each light transmitting portion 133). Is correlated with the width of each region of the liquid crystal composition layer to be irradiated. Moreover, the irradiation width of light respond | corresponds to the width | variety of the area | region formed in a pattern phase difference film. Therefore, the width of the pattern retardation film region can be adjusted by adjusting the film height h. Hereinafter, this point will be described with reference to the drawings.

FIG. 3 is a cross-sectional view schematically showing an enlarged cross section of the mask 132 and the film materials 210 and 220 taken along a plane perpendicular to the transport direction in the vicinity of the mask 132. Here, the film material 210 including the base film 211 and the liquid crystal composition layer 212 has a small distance (film height) h ₂₁₀ to the mask 132 and includes the base film 221 and the liquid crystal composition layer 222. The film material 220 has a large distance (film height) h ₂₂₀ to the mask 132.

As shown in FIG. 3, when light emitted from the light source 131 (see FIGS. 1 and 2) passes through the light transmitting portion 133 of the mask 132, diffraction occurs. For this reason, since the light A after passing through the mask 132 proceeds so as to spread, normally, the light irradiation width increases as the film height h in the exposure apparatus 130 increases. Therefore, in the example shown in FIG. 3, the irradiation width W ₂₂₀ when the far film material 220 is irradiated is wider than the irradiation width W ₂₁₀ when the light A is irradiated on the near film material 210.

  Therefore, the light irradiation width can be easily adjusted by utilizing the spread of light by this diffraction. Specifically, when it is desired to increase the light irradiation width, the film height h in the exposure apparatus 130 is increased, and when it is desired to reduce the light irradiation width, the film height h in the exposure apparatus 130 is decreased. As described above, the film height h can be controlled by adjusting the flow rate of the gas ejected by the slit 121 of the first levitation transport device 120. Therefore, in the film transport apparatus 100, the irradiation width of light can be easily adjusted by adjusting the flow rate of the gas ejected by the slit 121, and thus the width of the pattern retardation film region can be adjusted.

  However, if the film height h is too large, the influence of diffraction becomes large, and the boundary between the area irradiated with light and the area not irradiated may become unclear. Therefore, it is preferable that the film height h in the exposure apparatus 130 is not excessively increased. The specific range can be set according to the wavelength of light emitted from the light source 131, the size of the light transmitting portion 133, the degree of quality required for the pattern retardation film, and the like. For example, when producing a pattern retardation film for a stereoscopic image display device, the film height h when irradiated with light is usually greater than 0 mm, usually 5 mm or less, preferably 3 mm or less, more preferably 2 mm. It is as follows.

  As shown in FIG. 1, the second levitation transport device 140 assists the first levitation transport device 120 and includes a slit 141 as a spout from which gas can be ejected. Similar to the slit 121 of the first levitation transport device 120, the slit 141 is disposed under the film material 200 so that gas can be ejected from below into the film material 200. Accordingly, the gas layer 160 that supports the film material 200 is supplied with gas not only from the slit 121 of the first levitation conveyance device 120 but also from the slit 141 of the second levitation conveyance device 140. ing.

  For this reason, a stable gas layer 160 is formed in a wide range from the upstream to the downstream of the exposure apparatus 130, and therefore, when passing through the exposure apparatus 130, compared to the case where only the first levitation transport apparatus 120 is used. The fluctuation of the film material 200 can be further reduced to further stabilize the film height h in terms of time. Therefore, by providing both the first levitation conveyance device 120 and the second levitation conveyance device 140, the film conveyance device 100 can more reliably prevent the light irradiation width from changing over time. The accuracy of the shape and size of the area of the pattern retardation film can be further increased.

  Further, similarly to the first levitation conveyance device 120, the second levitation conveyance device 140 sets the flow rate of the gas ejected by the slit 141, thereby fixing the position through which the conveyed film material 200 passes. Can be maintained. Similarly to the first levitation transport device 120, the film height h in the exposure device 130 can be controlled by adjusting the flow rate of the gas ejected by the slit 141.

  The film transport apparatus according to the first embodiment of the present invention is configured as described above. Therefore, at the time of use, the film material 200 provided with the liquid crystal composition layer is supplied to the film transport apparatus 100 with the light source 131 of the exposure apparatus 130 illuminated. The supplied film material 200 is provided with a predetermined tension, and the first guide roll 110, the first levitation conveyance device 120, the exposure device 130, the second levitation conveyance device 140, and the second guide roll. 150 is conveyed so as to pass in this order.

  At this time, the film material 200 comes into contact with the first guide roll 110 and the second guide roll 150, but does not come into contact with the first levitation conveyance device 120, the exposure device 130, and the second levitation conveyance device 140. . It is because it is supported by the gas layer 160 ejected from the slit 121 of the first levitation conveyance device 120 and the slit 141 of the second levitation conveyance device 140 and is conveyed in a floating state.

  Further, the film material 200 is irradiated with light by the exposure device 130 while being conveyed. Specifically, light emitted from the light source 131 enters the film material 200 through the mask 132, passes through the base film, and is irradiated onto the liquid crystal composition layer. The light transmitting portion 133 of the mask 132 transmits light, but the light shielding portion 134 does not transmit light. Therefore, only the light transmitted through the light transmitting portion 133 of the mask 132 is irradiated to the liquid crystal composition layer. Thus, the same region as the light transmitting portion 133 is copied on the liquid crystal composition layer.

  At this time, by appropriately setting the flow rate of the gas ejected by the slit 121 of the first levitation transport device 120 and the slit 141 of the second levitation transport device 140, the position through which the film material 200 to be transported passes, It can be time stable. Therefore, since the film height h in the exposure apparatus 130 can be kept constant, the shape and size accuracy of the region irradiated with light in the liquid crystal composition layer can be increased.

  If the first levitation conveyance device 120 and the second levitation conveyance device 140 are not provided, the film material 200 bends by its own weight between the first guide roll 110 and the second guide roll 150. If it does so, the film material 200 will move easily in a height direction by a slight vibration, and a position may change. Further, when the accuracy such as the inclination and roundness of the first guide roll 110 and the second guide roll 150 is lowered, the film material 200 supported only by the first guide roll 110 and the second guide roll 150 is obtained. The tension is not uniform. As a result, the film material 200 may move by this, and may not remain at the position as designed. When these phenomena occur, the position of the film material 200 when passing through the exposure apparatus 130 fluctuates in the height direction and the width direction, so that the accuracy of the shape and size of each region formed in the pattern retardation film is improved. Sometimes it was lower.

  On the other hand, in the film transport apparatus 100 according to the present embodiment, the film material is formed by the gas layer 160 by using at least the first levitation transport apparatus 120, and preferably using the second levitation transport apparatus 140 in combination. 200 is supported. For this reason, since the movement of the film material 200 in the height direction due to vibration can be suppressed, the accuracy of the shape and size of each region formed in the pattern retardation film can be improved. In addition, since the film height h of the film material 200 is supported by the gas layer 160, it is difficult to be affected by the inclination and roundness of the first guide roll 110 and the second guide roll 150. Also by this, the precision of the shape and dimension of each area | region formed in a pattern phase difference film can be improved.

  In order to stabilize the behavior of the film material 200 and to keep the film height h more certain, the film material 200 is interposed between the first guide roll 110 and the second guide roll 150. It is preferable to be higher in the vertical direction than the roll 110 and the second guide roll 150. Therefore, it is preferable to increase the flow rate of the gas ejected from the slits 121 and 141 so that the film material 200 warps upward.

  Further, according to the film transport apparatus 100 according to the present embodiment, the film height h of the film material 200 in the exposure apparatus 130 is controlled by adjusting the flow rate of the gas ejected from the slit 121 or 141, thereby The irradiation width can be adjusted. For this reason, it is possible to control the shape and dimension of each area | region formed in a pattern phase difference film by simple control of adjusting the flow volume of the gas ejected from the slit 121 or 141.

The film transport apparatus 100 according to the first embodiment of the present invention is configured as described above, but may be further modified.
For example, in the first embodiment, the exposure apparatus 130 irradiates light from the lower side of the film material 200, but may irradiate light from the upper side.
For example, the shape of the jet port may be a shape other than the slit shape. Furthermore, the number and position of the jet nozzles are arbitrary as long as the effects of the present invention are not significantly impaired.
In addition, if a levitating conveyance device is provided between the first guide roll and the exposure device at least in the conveyance direction of the film material, the shape and size accuracy of the pattern retardation film region can be improved. Therefore, in the above-described embodiment, it is possible to improve the accuracy of the shape and size of the region of the pattern retardation film without providing the second levitation conveyance device.
Furthermore, for example, in addition to what was demonstrated in 1st embodiment, you may provide another component in a film conveyance apparatus. Specific examples include an aperture that can adjust the aperture of UV exposure, a chamber that controls the atmosphere in the system, a heater that heats the film material 200, a sensor that measures the film height h, a sensor that measures transport fluctuations, and the like. It may be provided.

[2. Pattern retardation film]
An example of the manufacturing method of the pattern phase difference film using the film conveyance apparatus of this invention is demonstrated. In this manufacturing method, the following steps are performed using a liquid crystal composition layer that can be cured by light irradiation by an exposure apparatus. Usually, all of the following steps are performed while continuously conveying the film in-line.
i. A step of forming a liquid crystal composition layer on a base film to obtain a long film material.
ii. The process of irradiating the predetermined area | region of a liquid-crystal composition layer with light while conveying a film material with the film conveyance apparatus of this invention, and hardening the one part area | region of a liquid-crystal composition layer.
iii. Changing the alignment state of the uncured region of the liquid crystal composition layer;
iv. A step of irradiating the pattern retardation film with light to cure an uncured region of the liquid crystal composition layer.

Furthermore, you may perform the following processes at an appropriate time as needed.
v. A step of forming an alignment film on the base film.
vi. A step of aligning a liquid crystal compound contained in the liquid crystal composition layer.
vii. A step of drying the liquid crystal composition layer.
As long as a desired pattern retardation film is obtained, the order of the above steps is arbitrary.

[2-1. Preparation of base film)
A base film is a long film used when manufacturing a pattern phase difference film.
As the material for the base film, a resin is usually used. When the liquid crystal composition layer is irradiated with light through the base film in the step of curing the uncured liquid crystal composition layer, a material that can transmit light to the extent that the liquid crystal composition can be cured should be used. preferable. Usually, a material having a thickness of 1 mm and a total light transmittance (based on JIS K7361-1997, using a turbidimeter (made by Nippon Denshoku Industries Co., Ltd., NDH-300A)) of 80% or more is suitable. is there.

  Furthermore, as a material for the base film, it is preferable to use a material having a high elastic modulus from the viewpoint of being resistant to heat and tension and reducing the shaking during line conveyance.

  Examples of the material of the base film include chain olefin polymer, cycloolefin polymer, polycarbonate, polyester, polysulfone, polyethersulfone, polystyrene, polyvinyl alcohol, cellulose acetate polymer, polyvinyl chloride, polymethacrylate and the like. . Among these, a chain olefin polymer and a cycloolefin polymer are preferable, and a cycloolefin polymer is particularly preferable from the viewpoint of transparency, low hygroscopicity, dimensional stability, lightness, and the like. In addition, these may be used individually by 1 type and may be used combining two or more types by arbitrary ratios. Moreover, unless the effect of this invention is impaired remarkably, you may include arbitrary compounding agents in the material of a base film. Specific examples of suitable materials include “Zeonor 1420” manufactured by Zeon Corporation.

  The thickness of the base film may be reduced from the viewpoint of handling properties at the time of manufacture and the cost of the material, but may be increased from the viewpoint of being strong against heat and tension and reducing fluctuation during line conveyance. Since the base film may be peeled off from the liquid crystal composition layer and not finally remain in the pattern retardation film, even if the thickness of the base film is increased, thinning of the pattern retardation film is not hindered. It is also possible. The specific range is preferably 50 μm or more, more preferably 80 μm or more, preferably 300 μm or less, more preferably 250 μm or less.

  The base film may be a non-stretched unstretched film or a stretched stretched film. Further, it may be an isotropic film or an anisotropic film. Furthermore, the base film may be a single-layer film composed of only one layer, or may be a multilayer film composed of two or more layers. Usually, from the viewpoint of productivity and cost, a film having a single layer structure is used.

The surface of the base film on which the liquid crystal composition layer is formed may be rubbed. By performing the rubbing treatment, the liquid crystal compound can be aligned in the liquid crystal composition layer without forming an alignment film. Usually, the conveyance direction of a base film and a rubbing direction become parallel.
The rubbing treatment of the surface of the base film is performed before the step of providing an uncured liquid crystal composition layer on the surface of the base film.

  The base film may have a surface treated on one side or both sides. By performing the surface treatment, the adhesion between the base film and another layer directly formed on the surface of the base film can be improved. Examples of the surface treatment include energy ray irradiation treatment and chemical treatment.

[2-2. (Alignment film formation process)
The liquid crystal composition layer may be directly formed on the surface of the base film, but may be indirectly applied to the surface of the base film via, for example, an alignment film. If the alignment film is used, the liquid crystal compound can be easily aligned in the liquid crystal composition layer. The alignment film forming step is performed before the step of providing an uncured liquid crystal composition layer on the surface of the base film.

  The alignment film may be formed using, for example, cellulose, silane coupling agent, polyimide, polyamide, polyvinyl alcohol, epoxy acrylate, silanol oligomer, polyacrylonitrile, phenol resin, polyoxazole, cyclized polyisoprene, or the like. One of these may be used alone, or two or more of these may be used in combination at any ratio.

  The thickness of the alignment film is set to a thickness that provides the desired alignment uniformity of the liquid crystal composition layer. The specific thickness is preferably 0.001 μm or more, more preferably 0.01 μm or more, preferably 5 μm or less, more preferably 2 μm or less. Further, for example, a photo-alignment film as shown in JP-A-6-289374, JP-A-2002-507872, JP-A-4022985, JP-A-4267080, JP-A-46477782, US Pat. No. 5,389,698, and the like. The liquid crystal compound may be aligned by a method using polarized UV light.

[2-3. Step of forming liquid crystal composition layer]
After preparing a base film and forming an alignment film as needed, a liquid crystal composition layer is formed on the base film directly or via an alignment film or the like.

  As the liquid crystal composition, a composition containing a liquid crystal compound can be used. As said liquid crystal compound, the liquid crystal compound which has a polymeric group, a side chain type liquid crystal polymer compound, etc. are mentioned, for example. Examples of the liquid crystal compound having a polymerizable group include JP-A No. 2002-030042, JP-A No. 2004-204190, JP-A No. 2005-263789, JP-A No. 2007-119415, and JP-A No. 2007-186430. Examples thereof include a rod-like liquid crystal compound having a polymerizable group described in a publication. Moreover, as a side chain type liquid crystal polymer compound, the side chain type liquid crystal polymer compound etc. which are described in Unexamined-Japanese-Patent No. 2003-177242 etc. are mentioned, for example. Further, examples of preferable liquid crystal compounds include “LC242” manufactured by BASF and the like. A liquid crystal compound may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios.

  The refractive index anisotropy Δn of the liquid crystal compound is preferably 0.05 or more, more preferably 0.10 or more, preferably 0.30 or less, more preferably 0.25 or less. If the refractive index anisotropy Δn is less than 0.05, the thickness of the liquid crystal composition layer may be increased in order to obtain a desired optical function, and the alignment uniformity may be lowered. It is. If the refractive index anisotropy Δn is greater than 0.30, the thickness of the liquid crystal composition layer becomes thin in order to obtain a desired optical function, which is disadvantageous for the thickness accuracy. When the refractive index anisotropy Δn is greater than 0.30, the absorption edge on the long wavelength side of the ultraviolet absorption spectrum of the liquid crystal composition layer may extend to the visible range, but the absorption edge of the spectrum extends to the visible range. However, it can be used as long as the desired optical performance is not adversely affected. When the liquid crystal composition contains only one type of liquid crystal compound, the refractive index anisotropy of the liquid crystal compound is directly used as the refractive index anisotropy of the liquid crystal compound in the liquid crystal composition. When the liquid crystal composition contains two or more types of liquid crystal compounds, the weighted average value obtained from the value of the refractive index anisotropy Δn of each liquid crystal compound and the content ratio of each liquid crystal compound is determined in the liquid crystal composition. The refractive index anisotropy of the liquid crystal compound is used. The value of the refractive index anisotropy Δn can be measured by the Senarmon method.

  Furthermore, the liquid crystal composition may contain an optional component in addition to the liquid crystal compound in order to impart proper physical properties to the production method and final performance. Examples thereof include an organic solvent, a surfactant, a chiral agent, a polymerization initiator, an ultraviolet absorber, a crosslinking agent, and an antioxidant. These components may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios.

Preferable examples of the organic solvent include ketones, alkyl halides, amides, sulfoxides, heterocyclic compounds, hydrocarbons, esters, ethers, and the like. Among these, cyclic ketones and cyclic ethers are preferable because they easily dissolve the liquid crystal compound. Examples of the cyclic ketone solvent include cyclopropanone, cyclopentanone, cyclohexanone, and the like, among which cyclopentanone is preferable. Examples of the cyclic ether solvent include tetrahydrofuran, 1,3-dioxolane, 1,4-dioxane, etc. Among them, 1,3-dioxolane is preferable. One kind of solvent may be used alone, or two or more kinds may be used in combination at any ratio, and the solvent may be optimized from the viewpoint of compatibility, viscosity, surface tension, etc. as a liquid crystal composition. preferable.
The content ratio of the organic solvent is usually 30% by weight or more and 95% by weight or less as a ratio with respect to the total solid content other than the organic solvent.

  As the surfactant, it is preferable to select and use one that does not inhibit the orientation. Examples of preferred surfactants include nonionic surfactants containing a siloxane and a fluorinated alkyl group in the hydrophobic group portion. Of these, oligomers having two or more hydrophobic group moieties in one molecule are particularly suitable. Examples of these surfactants are OMNOVA PolyFox's PF-151N, PF-636, PF-6320, PF-656, PF-6520, PF-3320, PF-651, PF-652; Examples include FTX-209F, FTX-208G, FTX-204D of Neos Corporation, and KH-40 of Surflon, Seimi Chemical Co., Ltd. One type of surfactant may be used, or two or more types may be used in combination at any ratio.

  The blending ratio of the surfactant is preferably such that the concentration of the surfactant in the liquid crystal composition layer after curing is 0.05% by weight or more and 3% by weight or less. By setting the blending ratio of the surfactant to 0.05% by weight or more, it is possible to increase the alignment regulating force at the air interface and make it difficult to cause alignment defects. On the other hand, by setting the content to 3% by weight or less, it is possible to increase the alignment uniformity by preventing excessive surfactant from entering between the molecules of the liquid crystal compound.

  The chiral agent may be a polymerizable compound or a non-polymerizable compound. As the chiral agent, a compound having a chiral carbon atom in the molecule and not disturbing the alignment of the liquid crystal compound is usually used. When an example of the chiral agent is given, “LC756” manufactured by BASF and the like may be mentioned as the polymerizable chiral agent. Moreover, for example, those described in JP-A-11-193287, JP-A-2003-13787 and the like can be mentioned. One type of chiral agent may be used, or two or more types may be used in combination at any ratio. A chiral agent is usually used in combination with a polymerizable liquid crystal compound when forming a region having a twisted nematic phase.

  As the polymerization initiator, for example, a thermal polymerization initiator may be used, but usually a photopolymerization initiator is used. As a photoinitiator, the compound which generate | occur | produces a radical or an acid with an ultraviolet-ray or visible light can be used, for example. Examples of photopolymerization initiators include benzoin, benzylmethyl ketal, benzophenone, biacetyl, acetophenone, Michler's ketone, benzyl, benzylisobutyl ether, tetramethylthiuram mono (di) sulfide, 2,2-azobisisobutyronitrile, 2,2-azobis-2,4-dimethylvaleronitrile, benzoyl peroxide, di-tert-butyl peroxide, 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one 1- (4-Isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2,4-diethylthioxanthone, methylbenzoyl formate 2,2-diethoxyacetophenone, β-ionone, β-bromostyrene, diazoaminobenzene, α-amylcinnacaldehyde, p-dimethylaminoacetophenone, p-dimethylaminopropiophenone, 2-chlorobenzophenone, pp′- Dichlorobenzophenone, pp'-bisdiethylaminobenzophenone, benzoin ethyl ether, benzoin isopropyl ether, benzoin n-propyl ether, benzoin n-butyl ether, diphenyl sulfide, bis (2,6-methoxybenzoyl) -2,4,4-trimethyl- Pentylphosphine oxide, 2,4,6-trimethylbenzoyldiphenyl-phosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, Anthracene benzophenone, α-chloroanthraquinone, diphenyl disulfide, hexachlorobutadiene, pentachlorobutadiene, octachlorobutene, 1-chloromethylnaphthalene, 1,2-octanedione, 1- [4- (phenylthio) -2- (o- Benzoyloxime)] and 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone 1- (o-acetyloxime), (4-methylphenyl) [4- (2-Methylpropyl) phenyl] iodonium hexafluoroph Sufeto, 3-methyl-2-butynyl tetramethyl hexafluoroantimonate, diphenyl - (p-phenylthiophenyl) sulfonium hexafluoroantimonate, and the like. One type of polymerization initiator may be used, or two or more types may be used in combination at any ratio. Furthermore, if necessary, the liquid crystal composition may contain a photosensitizer or a polymerization accelerator such as a tertiary amine compound to control the curability of the liquid crystal composition. In order to improve the photopolymerization efficiency, it is preferable to appropriately select the average molar extinction coefficient of the liquid crystal compound and the photopolymerization initiator.

  Examples of the ultraviolet absorber include 2,2,6,6-tetramethyl-4-piperidylbenzoate, bis (2,2,6,6-tetramethyl-4-piperidyl) sebacate, and bis (1,2,2). , 6,6-pentamethyl-4-piperidyl) -2- (3,5-di-t-butyl-4-hydroxybenzyl) -2-n-butyl malonate, 4- (3- (3,5-di) -T-butyl-4-hydroxyphenyl) propionyloxy) -1- (2- (3- (3,5-di-t-butyl-4-hydroxyphenyl) propionyloxy) ethyl) -2,2,6 Hindered amine ultraviolet absorbers such as 6-tetramethylpiperidine; 2- (2-hydroxy-5-methylphenyl) benzotriazole, 2- (3-t-butyl-2-hydroxy-5-methylphenyl) 5-chlorobenzotriazole, 2- (3,5-di-t-butyl-2-hydroxyphenyl) -5-chlorobenzotriazole, 2- (3,5-di-t-amyl-2-hydroxyphenyl) benzo Benzotriazole ultraviolet absorbers such as triazole; 2,4-di-t-butylphenyl-3,5-di-t-butyl-4-hydroxybenzoate, hexadecyl-3,5-di-t-butyl-4- Examples thereof include benzoate ultraviolet absorbers such as hydroxybenzoate; benzophenone ultraviolet absorbers, and acrylonitrile. These ultraviolet absorbers may be used alone or in combination of two or more at an arbitrary ratio in order to impart desired light resistance.

  The blending ratio of the ultraviolet absorber is usually 0.001 part by weight or more, preferably 0.01 part by weight or more, and usually 5 parts by weight or less, preferably 1 part by weight or less with respect to 100 parts by weight of the liquid crystal compound. . When the blending ratio of the ultraviolet absorber is 0.001 part by weight or more, the ultraviolet absorbing ability can be sufficiently increased and the light resistance can be increased. When curing with light, the curing sufficiently proceeds to increase the mechanical strength and heat resistance of the liquid crystal composition layer.

  The liquid crystal composition may contain a crosslinking agent according to the desired mechanical strength. Examples of cross-linking agents include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 2- (2-vinyloxyethoxy) Polyfunctional acrylate compounds such as ethyl acrylate; Epoxy compounds such as glycidyl (meth) acrylate, ethylene glycol diglycidyl ether, glycerin triglycidyl ether, pentaerythritol tetraglycidyl ether; 2,2-bishydroxymethylbutanol-tris [3- ( 1-aziridinyl) propionate], 4,4-bis (ethyleneiminocarbonylamino) diphenylmethane, trimethylolpropane-tri-β-aziridinylpropionate Aziridine compounds such as nates; Isocyanurate type isocyanates derived from hexamethylene diisocyanate, hexamethylene diisocyanate, isocyanurate type isocyanates, biuret type isocyanates, adduct type isocyanates, etc .; Polyoxazoline compounds having an oxazoline group in the side chain; N- (2-aminoethyl) 3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, N- (1 , 3-dimethylbutylidene) -3- (triethoxysilyl) -1-propanamine and the like alkoxysilane compounds; A crosslinking agent may be used individually by 1 type, and may be used combining two or more types by arbitrary ratios. Further, the liquid crystal composition may contain a known catalyst according to the reactivity of the cross-linking agent so as to improve productivity in addition to improving the film strength and durability.

  The blending ratio of the crosslinking agent is preferably such that the concentration of the crosslinking agent in the cured liquid crystal composition layer is 0.1 wt% or more and 20 wt% or less. By making the blending ratio of the crosslinking agent 0.1% by weight or more, the crosslinking density can be stably improved, and by making it 20% by weight or less, the stability of the liquid crystal composition layer after curing is increased. Can do.

  Antioxidants include, for example, phenolic antioxidants such as tetrakis (methylene-3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate) methane, phosphorus antioxidants, and thioether oxidations. Examples include inhibitors. An antioxidant may be used individually by 1 type and may be used combining two or more types by arbitrary ratios. The blending amount of the antioxidant can be within a range in which the transparency and adhesive strength of the adhesive layer are not lowered.

As a method for forming the liquid crystal composition layer, a coating method is usually used. Examples of the application method of the liquid crystal composition include a reverse gravure coating method, a direct gravure coating method, a die coating method, and a bar coating method.
By applying the liquid crystal composition to the substrate film, an uncured liquid crystal composition layer is formed as a coating film, and the substrate film and the uncured liquid crystal composition layer are provided, and further aligned as necessary. A film material comprising a membrane is obtained.

[2-4. Orientation process]
After performing the process of forming the liquid crystal composition layer in an uncured state, an alignment process for aligning the liquid crystal compound contained in the liquid crystal composition layer may be performed. As a specific operation in the alignment step, for example, an operation of heating an uncured liquid crystal composition layer to a predetermined temperature in an oven can be exemplified.

The temperature at which the liquid crystal composition layer is heated in the alignment step is usually 40 ° C. or higher, preferably 50 ° C. or higher, and is usually 200 ° C. or lower, preferably 140 ° C. or lower. The treatment time in the heat treatment is usually 1 second or longer, preferably 5 seconds or longer, usually 3 minutes or shorter, preferably 120 seconds or shorter. Thereby, the liquid crystal compound in the liquid crystal composition layer can be aligned.
Further, when the solvent is contained in the liquid crystal composition, the solvent is usually dried by the heating, and thus the solvent is removed from the liquid crystal composition layer. Therefore, when the alignment process is performed, a drying process for drying the liquid crystal composition layer usually proceeds simultaneously.
Usually, the alignment axis of the liquid crystal composition layer is parallel to the rubbing direction, and the alignment axis is the slow axis.

[2-5. Curing process using film transport device (first curing process)]
After performing the process of forming the liquid crystal composition layer in an uncured state, and after performing the alignment process as necessary, the film material is sent to the film transport apparatus of the present invention. In the film transport apparatus, while transporting the film material, a predetermined region of the liquid crystal composition layer is irradiated with light to cure a part of the liquid crystal composition layer.
The light emitted from the light source of the exposure apparatus is blocked by the light shielding portion of the mask. For this reason, in the liquid crystal resin layer, light is not irradiated to a region on the opposite side of the light shielding portion from the light source, so that the liquid crystal resin layer is not cured.
On the other hand, the light emitted from the light source is transmitted through the light transmitting portion of the mask. For this reason, in the liquid crystal resin layer, light that has passed through the light transmitting portion enters a region on the side opposite to the light source of the light transmitting portion, so that light is irradiated on this region and the liquid crystal resin layer is cured. . At this time, since the liquid crystal composition is cured while maintaining the alignment state in the region irradiated with light, a region having a predetermined in-plane retardation (hereinafter referred to as “anisotropic” as appropriate) is applied to the region irradiated with light. Region ") is formed.

In this manufacturing method, since the film transport apparatus of the present invention is used, the film height h in the exposure apparatus can be kept constant. For this reason, since the shape and width of the region irradiated with light in the liquid crystal composition layer can be precisely controlled, the accuracy of the shape and size of the anisotropic region can be increased.
Moreover, according to the film transport apparatus of the present invention, the film height h in the exposure apparatus can be controlled to adjust the irradiation width of light by adjusting the flow rate of the gas ejected from the slit of the levitation transport apparatus. it can. For this reason, it is possible to easily control the shape and size of the anisotropic region.

The irradiation time of light, the integrated light quantity, and other conditions in the first curing step can be appropriately set according to the composition of the liquid crystal composition, the thickness of the liquid crystal composition layer, and the like. The irradiation time is usually in the range of 0.01 seconds to 3 minutes, and the integrated light quantity is usually in the range of 0.01 mJ / cm ² to 50 mJ / cm ² . Further, the irradiation of ultraviolet rays may be performed in an inert gas such as nitrogen and argon, or may be performed in the air.
After forming the anisotropic region, the film material is sent out from the film transport device to the next step.

[2-6. (Orientation change process)
After the curing step using the film conveying device, a step of changing the alignment state in the region of the liquid crystal composition layer that has not been irradiated with light (that is, the uncured region of the liquid crystal composition layer) is performed.

In this step, the orientation state to be changed can be set according to the use of the pattern retardation film. In this example, the liquid crystal composition layer is heated above the clearing point (NI point) of the liquid crystal composition by a heater. As a result, the alignment state of the liquid crystal compound changes and becomes random, so that the uncured region of the liquid crystal composition layer becomes an isotropic region (hereinafter referred to as “isotropic region” as appropriate), and the like. The in-plane retardation of the anisotropic region is close to zero. Even when heated in this way, since the anisotropic region is cured and the orientation state is maintained, the in-plane retardation in the anisotropic region does not change.
However, as a means for changing the alignment state in the uncured region of the liquid crystal composition layer, a method other than heating may be employed.

[2-7. Second curing step)
After changing the orientation state of the uncured region to be an isotropic region, a second curing step is performed in which the isotropic region is cured. At this time, in the isotropic region, a polymerization reaction proceeds in the liquid crystal composition, and the liquid crystal compound molecules are fixed while the alignment state is maintained in a random state.

The second curing step may be performed by light irradiation. For example, you may use the light similar to the light used in order to harden an anisotropic area | region in the film conveyance apparatus of this invention. The light irradiation time, the integrated light amount, and the like can be appropriately set according to the composition of the liquid crystal composition, the thickness of the liquid crystal composition layer, and the like. Cumulative amount of light is usually in the range of 50 mJ / cm ² of 10,000 / cm ^2. Moreover, light irradiation may be performed in inert gas, such as nitrogen and argon, and may be performed in the air, for example. During irradiation, if necessary, heating with a heater may be continued, and irradiation may be performed while maintaining the alignment state (for example, isotropic phase) of the uncured liquid crystal composition layer.

  By the manufacturing method described above, a pattern retardation film including a liquid crystal composition layer having an anisotropic region and an isotropic region on a base film is obtained. These anisotropic regions and isotropic regions have shapes and dimensions obtained by accurately copying the light transmitting portion and the light shielding portion of the mask. Therefore, for example, when using a mask in which the light transmitting portions and the light shielding portions are arranged in stripes as in the first embodiment described above, a plurality of anisotropic regions and isotropic regions are alternately arranged in the width direction. Thus, a patterned retardation film having a striped arrangement as a whole is obtained.

  In the obtained pattern retardation film, the accuracy of the shape and dimension of the anisotropic region and the isotropic region formed in the pattern retardation film is high. In the case of this example, neither the anisotropic region nor the isotropic region is a belt-like region extending linearly without meandering or bending. In addition, the widths of the anisotropic region and the isotropic region are highly uniform, and the in-plane variation is reduced.

  Moreover, in the pattern retardation film obtained in this way, there is material continuity between the anisotropic region and the isotropic region having different retardations. Therefore, the patterned retardation film produced by the production method of this example is optically advantageous in that it does not cause reflection and scattering due to the gap between the anisotropic region and the isotropic region. This is also advantageous in terms of mechanical strength in that it does not cause breakage starting from the gap between the isotropic region and the isotropic region.

  The magnitude of the retardation Re possessed by the anisotropic region of the patterned retardation film is usually about ½ wavelength of transmitted light. That is, the anisotropic region is a region that can function as a half-wave plate. Specifically, the phase difference Re of the anisotropic region is usually 240 nm or more, preferably 245 nm or more, more preferably 250 nm or more, and usually 280 nm or less, preferably 275 nm or less, more preferably 270 nm or less. Here, the measurement wavelength of the phase difference Re is 546 nm.

  On the other hand, the isotropic region of the patterned retardation film has no retardation Re. Here, not having the phase difference Re includes not only the case where the phase difference is zero, but also the case where the phase difference Re is small enough that the phase difference can be regarded as substantially zero depending on the application. When the range of the specific phase difference Re is given, at the measurement wavelength of 546 nm, the phase difference Re is usually 0 to 65 nm, preferably 0 to 30 nm, more preferably 0 to 10 nm. Has no phase difference Re.

[2-8. Other processes]
You may make it perform processes other than the process mentioned above as needed.
For example, you may perform the process of providing another layer, such as a protective layer, on the opposite side to the base film of a pattern phase difference film.
For example, you may perform the process of peeling a liquid-crystal composition layer and a base film.

[3. Stereoscopic image display device]
The pattern retardation film manufactured using the film conveyance device of the present invention may be used as a constituent member of a stereoscopic image display device, for example. Hereinafter, a specific example of the stereoscopic display device will be described with reference to the drawings. In the following examples, the positive and negative directions of the optical axis such as the transmission axis and the slow axis are the positive and negative directions in the direction of viewing the image with the polarized glasses. Is expressed as a negative angle.

  FIG. 4 is an exploded top view schematically illustrating an example of a stereoscopic display device. FIG. 4 shows an example in which the observer visually observes the image with the right eye and the left eye from the direction perpendicular to the display surface of the stereoscopic display device. The stereoscopic display device is placed vertically on the left side in the drawing (that is, placed so that the display surface is parallel to the vertical direction), and thus the observation direction of the observer observing from the right side in the drawing is parallel to the horizontal direction. As shown in FIG. 4, the stereoscopic display device 300 includes a liquid crystal panel 310, a retardation film 320 that is a quarter-wave plate, and a pattern retardation film 330 in this order. In the mode of use, the liquid crystal panel 310, the phase difference film 320, and the pattern phase difference film 330 are usually in a state of being affixed, but in FIG.

The liquid crystal panel 310 includes, in order from the light source side, a light source side polarizing plate 311 that is a linear polarizing plate, a liquid crystal cell 312, and a viewing side polarizing plate 313 that is a linear polarizing plate. As a result, the light transmitted through the liquid crystal panel 310 is linearly polarized light. The transmission axis of the viewing side polarizing plate 313 is parallel to the vertical direction as indicated by an arrow A ₃₁₃ , and thus the polarization direction of light emitted from the viewing side polarizing plate 313 is also the vertical direction indicated by an arrow A ₃₁₃ .

  In the liquid crystal panel 310, a pixel region 314 for displaying a right-eye image and a pixel region 315 for displaying a left-eye image are set at different positions as viewed from the thickness direction. These pixel regions 314 and 315 are both strip-like regions extending in the horizontal direction. Further, the pixel region 314 for displaying the right-eye image and the pixel region 315 for displaying the left-eye image have a constant width, and the arrangement thereof includes the pixel region 314 for displaying the right-eye image and the left-eye image. Are arranged in stripes so that the pixel regions 315 for displaying are alternately arranged in the vertical direction.

The retardation film 320 is a film that can function as a substantially quarter-wave plate with respect to transmitted light, and has a uniform in-plane retardation in the plane. Specifically, the retardation of the retardation film 320 is within the range of 1/4 of the central value, usually ± 65 nm, preferably ± 30 nm, more preferably ± 10 nm, at the central value of the wavelength range of transmitted light. In this case, it can be said that it can function as a substantially quarter wavelength with respect to the transmitted light. Normally, the light used for image display is visible light, so that if the above requirement is satisfied with respect to the wavelength 546 nm which is the central value of the wavelength range of visible light, it can function as a substantially quarter-wave plate. .
The slow axis of the retardation film 320 is a direction that forms an angle of −45 ° with respect to the polarization transmission axis of the viewing-side polarizing plate 313 as indicated by an arrow A ₃₂₀ . The linearly polarized light transmitted through the viewing side polarizing plate 313 is converted into circularly polarized light having a rotation direction indicated by an arrow A ₃₄₀ by transmitting through the retardation film 320.

  For the retardation film 320, for example, a stretched film formed of a resin may be used. Usually, the resin contains a polymer (polymer). Examples of the polymer contained in the resin used as the material of the retardation film 320 include chain olefin polymer, cycloolefin polymer, polycarbonate, polyester, polysulfone, polyethersulfone, polystyrene, polyvinyl alcohol, cellulose acetate polymer, polyvinyl chloride. And polymethacrylate. Among these, a chain olefin polymer and a cycloolefin polymer are preferable, and a cycloolefin polymer is particularly preferable from the viewpoint of transparency, low hygroscopicity, dimensional stability, lightness, and the like.

In addition, the resin may include a single type of polymer, or may include a combination of two or more types of polymers in any ratio. Moreover, unless the effect of this invention is impaired remarkably, you may include arbitrary compounding agents in resin.
Furthermore, as the retardation film 320, a single layer structure film or a multilayer structure film may be used.
Examples of suitable retardation films 320 include commercially available long diagonally stretched films and laterally stretched films, for example, product names “obliquely stretched ZEONOR film” and “transversely stretched ZEONOR film” manufactured by ZEON Corporation. Can do.

  The pattern retardation film 330 includes a strip-shaped anisotropic region 331 and a strip-shaped isotropic region 332 that are provided in parallel and uniformly with respect to the horizontal direction. The anisotropic region 331 and the isotropic region 332 are arranged in stripes alternately arranged in the vertical direction. When viewed from the thickness direction, the anisotropic region 331 overlaps the pixel region 315 that displays the image for the left eye of the liquid crystal panel 310, and the isotropic region 332 overlaps the pixel region 314 that displays the image for the right eye of the liquid crystal panel. It is like that.

The in-plane retardation of the anisotropic region 331 is approximately ½ wavelength of transmitted light. The slow axis of the anisotropic region 331 is a direction perpendicular to the polarization transmission axis of the viewing-side polarizing plate 313 (that is, the horizontal direction) as indicated by an arrow A ₃₃₁ . Thereby, the light which permeate | transmitted the anisotropic area | region 331 among the circularly polarized light which permeate | transmitted the phase difference film 320 is converted into the circularly polarized light which has the reverse rotation direction shown by arrow _A351 . On the other hand, the in-plane retardation of the isotropic region 332 is substantially zero, and thus the light transmitted through the isotropic region 332 out of the circularly polarized light transmitted through the retardation film 320 is transmitted as shown by the arrow A _352. Circularly polarized light having the same rotational direction as before.

In this example, the observer observes the display surface of the stereoscopic display device 300 through the polarizing glasses 400. The polarizing glasses 400 include a half-wave plate 410, a quarter-wave plate 420, and a linear polarizing plate 430 in this order. The slow axis of the half-wave plate 410 is perpendicular to the slow axis of the anisotropic region 331 of the pattern retardation film 330 (that is, parallel to the vertical direction) as indicated by an arrow A ₄₁₀ . ). The slow axis of the quarter wavelength plate 420 is perpendicular to the slow axis of the retardation film 320 of the stereoscopic display device, as indicated by an arrow A ₄₂₀ . The polarization transmission axis of the linear polarizing plate 430 is a direction perpendicular to the polarization transmission axis of the viewing-side polarizing plate 313 of the stereoscopic display device 300 (that is, the horizontal direction) as indicated by an arrow A ₄₃₀ . Further, the half-wave plate 410 is provided in the portion corresponding to the right eye of the polarizing glasses 400, but is not provided in the portion corresponding to the left eye.

  By arranging the wave plates of the polarizing glasses 400 in this way, the configuration of the wave plates through which the light R reaching the right eye and the light L reaching the left eye have passed is between the stereoscopic display device 300 and the polarizing glasses 400. It becomes symmetrical about the boundary. As a result, the wavelength dispersion generated in each wave plate is eliminated, the wavelength dispersion of the light R reaching the right eye and the light L reaching the left eye is the same, and there is a difference in the color of the image seen by the right eye and the left eye. It does not occur.

  When the light L transmitted through the anisotropic region 331 enters the portion corresponding to the left eye of the polarizing glasses 400, the light L enters the quarter wavelength plate 420. The light transmitted through the quarter-wave plate 420 is converted into linearly polarized light having a polarization axis in the horizontal direction, and thus can pass through the linearly polarizing plate 430. Therefore, the light L transmitted through the anisotropic region 331 is visually recognized by the user's left eye.

On the other hand, when the light L transmitted through the anisotropic region 331 enters the portion corresponding to the right eye of the polarizing glasses 400, the light L is transmitted through the half-wave plate 410 and reversed in the rotation direction (that is, the arrow). The light is converted into circularly polarized light having a direction opposite to that of A ₄₄₀ and is incident on the quarter-wave plate 420. The light transmitted through the quarter wavelength plate 420 is converted into linearly polarized light having a polarization axis in the vertical direction, and therefore cannot be transmitted through the linearly polarizing plate 430. Therefore, the light L transmitted through the anisotropic region 331 is not visually recognized by the user's right eye.

Further, when the light R transmitted through the isotropic region 332 is incident on the portion corresponding to the right eye of the polarizing glasses 400, the light R is transmitted through the half-wave plate 410, as indicated by an arrow _A440 . It is converted into circularly polarized light having an inverted rotation direction and is incident on the quarter-wave plate 420. The light transmitted through the quarter-wave plate 420 is converted into linearly polarized light having a polarization axis in the horizontal direction, and thus can pass through the linearly polarizing plate 430. Therefore, the light R transmitted through the isotropic region 332 is visually recognized by the user's right eye.

  On the other hand, when the light R that has passed through the isotropic region 332 enters the portion corresponding to the left eye of the polarizing glasses 400, the light R enters the quarter-wave plate 420. The light transmitted through the quarter wavelength plate 420 is converted into linearly polarized light having a polarization axis in the vertical direction, and therefore cannot be transmitted through the linearly polarizing plate 430. Therefore, the light R transmitted through the isotropic region 332 is not visually recognized by the user's left eye.

  Thus, the user views the light transmitted through the anisotropic region 331 with the left eye and the light transmitted through the isotropic region 332 with the right eye. Therefore, the left eye image is displayed in the area corresponding to the anisotropic area 331 of the liquid crystal panel 310, and the right eye image is displayed in the area corresponding to the isotropic area 332 of the liquid crystal panel 310. Can visually recognize a stereoscopic image.

  Further, since the pattern retardation film 330 of the stereoscopic display device 300 is manufactured using the film transport device of the present invention, the accuracy of the shape and dimensions of the anisotropic region 331 and the isotropic region 332 is good. It is. Therefore, the stereoscopic image display device 300 can improve the image quality, or prevent an image to be displayed from being partially displayed depending on the position and angle at which the stereoscopic display device is viewed.

Note that the stereoscopic display device 300 may be further modified.
For example, the order of the phase difference film 320 and the pattern phase difference film 330 may be changed, and the phase difference film 320 may be provided on the viewing side with respect to the pattern phase difference film 330.
Further, for example, the stereoscopic display device 300 may be provided with an antireflection film, an antiglare film, an antiglare film, a hard coat film, a brightness enhancement film, an adhesive layer, an adhesive layer, a hard coat layer, an antireflection film, a protective layer, and the like. Good.
Further, the configuration of the part corresponding to the right eye and the part corresponding to the left eye of the polarizing glasses 400 is exchanged, and the image corresponding to the anisotropic region 331 of the liquid crystal panel 310 and the region corresponding to the isotropic region 332 This may be carried out by replacing the image.
Furthermore, as long as a stereoscopic image can be appropriately displayed, the direction of the optical axis such as the slow axis and the transmission axis of each optical element may be changed.

  EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples. However, the present invention is not limited to the examples described below, and does not depart from the scope of the claims of the present invention and the equivalents thereof. It may be carried out by arbitrarily changing in. In the following description, “%” and “parts” representing amounts are based on weight unless otherwise specified. Further, the operations described below were performed under normal temperature and normal pressure conditions unless otherwise specified.

[Example 1]
[Production of liquid crystal composition]
(A) 76 parts of LC242 (manufactured by BASF) which is a polymerizable liquid crystal compound, 15 parts of the following compound 1 which is (B) a polymerizable non-liquid crystal monomer, and ATMPT (trimethylolpropane triacrylate; manufactured by Shin-Nakamura Chemical Co., Ltd.) 9 parts, (C) 3 parts of Irgacure 379 (manufactured by BASF) which is a photopolymerization initiator, and 0.1 part of Megafac F-477 (manufactured by DIC) which is a surfactant containing fluorine (D) (E) 200 parts of methyl ethyl ketone as a solvent was mixed to produce a liquid crystal composition for a patterned retardation film.

[Manufacture of pattern retardation film]
As a base film, a long polyethylene terephthalate film (“PET film A4100” manufactured by Toyobo Co., Ltd .; width 1350 mm, thickness 100 μm) was prepared. The base film is attached to the feeding portion of the film transport device, the base film is rubbed in the longitudinal direction parallel to the transport direction while transporting the base film, and the liquid crystal prepared above is applied to the surface subjected to the rubbing process. The composition was applied using a die coater. Thus, an uncured liquid crystal composition layer was formed as a coating film on one surface of the base film. The multilayer film provided with the base film and the liquid crystal composition layer thus obtained is referred to as a film material.

  While continuing the conveyance, the liquid crystal composition layer was subjected to an alignment treatment at 40 ° C. for 2 minutes. Thereby, the (A) polymerizable liquid crystal compound in the liquid crystal composition layer was aligned.

  In FIG. 5, the structure of the film conveying apparatus used in Example 1 is shown typically. As shown in FIG. 5, a film transport apparatus 500 provided with a guide roll 510, a floating transport apparatus 520, an exposure apparatus 530, and a guide roll 540 in this order from the upstream side in the transport direction of the film material was prepared. The levitation conveyance device 520 is a device that ejects air from a slit (not shown), and can adjust the amount of air ejection. The exposure apparatus 530 includes a light source device 531 and a mask 532 so that the film material 550 can be irradiated with light from the light source device 531 through the mask 532.

  In Example 1, as the mask 532, a photomask printed so that the light shielding portions form a stripe pattern with a pitch of 320 μm was used. Therefore, in this mask 532, the light transmitting portions and the light shielding portions extending in the conveying direction of the film material 550 are formed in parallel and in stripes, and the widths of the light transmitting portions and the light shielding portions are both 320 μm. Met.

  The film material 550 that had been subjected to the orientation treatment was supplied to the film transport apparatus 500. At this time, the film material 550 was oriented such that the liquid crystal composition layer side was upward. The supplied film material 550 was conveyed in the order of the guide roll 510, the levitation conveyance apparatus 520, the exposure apparatus 530, and the guide roll 540 in a state where tension was applied in the conveyance direction from the guide rolls 510 and 540.

  When the film 550 passes through the film transport apparatus 500, the film material 550 is kept floating so that the film material 550 does not contact the lift transport apparatus 520 and the exposure apparatus 530 by continuously ejecting air from the float transport apparatus 520. It was. At this time, the flow rate of the air blown from the levitation conveyance device 520 was adjusted so that the film height h in the exposure device 530 was 0.2 mm.

Further, when passing through the exposure device 530, the film material 550 was irradiated with ultraviolet rays from the light source device 531 through the mask 532. The cumulative amount of ultraviolet light was 15.0 mJ / cm ² . The liquid crystal composition layer remains in an uncured state because ultraviolet rays were not irradiated at the position corresponding to the light shielding portion of the mask 532, but the liquid crystal composition was irradiated at the positions corresponding to the light transmitting portion of the mask 532. The material layer was cured.

  Thereafter, the film material was conveyed to an oven. While passing through the oven, the liquid crystal composition layer is heated at 90 ° C. for 3 seconds, and the liquid crystal phase of the uncured portion of the liquid crystal composition layer (the portion corresponding to the light shielding portion of the mask) is isotropic. Was transferred to.

Subsequently, the film material was conveyed to another exposure apparatus. In this exposure apparatus, an uncured portion of the liquid crystal composition layer is cured by irradiating the entire liquid crystal composition layer with ultraviolet rays having an integrated light amount of 300 mJ / cm ^{2 in} a nitrogen atmosphere from the liquid crystal composition layer side of the film material. I let you.

  Thus, on the base film, an anisotropic region having an in-plane retardation Re that can function as a half-wave plate and an isotropic region having a small in-plane retardation Re are arranged in the same plane. A liquid crystal composition layer was formed.

[Evaluation of in-plane variation of pattern]
FIG. 6 is a diagram schematically showing the state of the sample when measuring the in-plane variation of the pattern retardation film. In FIG. 6, each film is shown with its edges shifted, but in an actual sample, the edges of each film are aligned and overlapped.

As shown in FIG. 6, a light source side polarizing plate 610 and an observation side polarizing plate 640 which are linear polarizing plates were prepared. At this time, the transmission axis _{A 610} of light-source polarization plate 610, is in the vertical to the transmission axis _{A 620} of the viewing-side polarizing plate 640 was made to be crossed nicols. A quarter-wave plate 620 and a patterned retardation film 630 including an anisotropic region 631 and an isotropic region 632 were inserted between the light source side polarizing plate 610 and the observation side polarizing plate 640. Thereby, the sample provided with the light source side polarizing plate 610, the quarter wavelength plate 620, the pattern phase difference film 630, and the observation side polarizing plate 640 in this order was produced. At this time, in the direction of viewing from the observation side polarizing plate 640 side toward the light source side polarizing plate 610, the slow axis A of the anisotropic region of the pattern retardation film 630 with respect to the transmission axis A ₆₄₀ of the observation side polarizing plate 640. ₆₃₀ made an angle of 45 ° counterclockwise. In the same direction, the slow axis A ₆₂₀ of the quarter-wave plate ₆₂₀ was orthogonal or parallel to the transmission axis A ₆₄₀ of the observation-side polarizing plate 640. Although the slow axis _{A 620} of the transmission axis _{A 640} with respect to the quarter-wave plate 620 on the viewing side polarizing plate 640 in FIG. 6 is installed at an angle of 90 ° counterclockwise, the same polarization There is no problem in another aspect as long as the state can be obtained.

  The prepared sample was observed with a polarizing microscope (Nikon). As observation points, 12 locations are selected at a pitch of 50 mm in the conveyance direction of the pattern retardation film, and three locations of 300 mm, 700 mm and 1200 mm are selected at the width positions at these locations, and a total of 36 observations are made. The point was observed. During observation, light is transmitted through a portion corresponding to the anisotropic region of the pattern retardation film, and light is shielded from a portion corresponding to the isotropic region.

At each observation point, the width of the region through which light passes was measured as the width of the anisotropic region. And the average value of all the observation points was calculated, and the difference between the average value and the maximum value and the difference between the average value and the minimum value were obtained. These differences were regarded as in-plane variations of the pattern and evaluated in the following categories. In the examples and comparative examples described in this specification, “difference between average value and maximum value” and “difference between average value and minimum value” are in the same category. When “difference between” and “difference between average value and minimum value” fall into different categories, evaluation is made with reference to the result with the larger absolute value of the difference.
Minimal: The difference between the average value and the maximum or minimum value is less than ± 10 μm.
Small: The difference between the average value and the maximum or minimum value is not less than ± 10 μm and less than ± 20 μm.
Large: The difference between the average value and the maximum value or the minimum value is ± 20 μm or more.

  In the observed image, the clarity of the boundary (pattern boundary) between the anisotropic region and the isotropic region was also evaluated.

  As a result, it was observed that the anisotropic region transmitting light and the isotropic region blocking light became a strip-like region aligned in parallel to each other, forming a stripe pattern as a whole. . Moreover, the average value of the width | variety of the anisotropic area | region of all the observation points was 320 micrometers. Furthermore, in the observed image, there was almost no in-plane variation of the pattern, and the boundary between the anisotropic region and the isotropic region could be clearly identified.

[Example 2]
In Example 2, a pattern retardation film was produced and evaluated in the same manner as in Example 1 except that the flow rate of air from the levitation conveyance device was adjusted to set the film height h to 1 mm.
As a result of the observation, it was observed that the anisotropic region that transmits light and the isotropic region that blocks light became a band-like region aligned in parallel to each other, forming a stripe pattern as a whole. It was. Moreover, the average value of the width | variety of the anisotropic area | region of all the observation points was 328 micrometers. Furthermore, in the observed image, there was almost no in-plane variation of the pattern, and the boundary between the anisotropic region and the isotropic region could be clearly identified.

[Example 3]
In Example 3, a pattern retardation film was produced and evaluated in the same manner as in Example 1 except that the film flow rate h was adjusted to 2 mm by adjusting the flow rate of air blown from the levitation conveyance device.
As a result of the observation, it was observed that the anisotropic region that transmits light and the isotropic region that blocks light became a band-like region aligned in parallel to each other, forming a stripe pattern as a whole. It was. Moreover, the average value of the width | variety of the anisotropic area | region of all the observation points was 336 micrometers. Furthermore, in the observed image, there was almost no in-plane variation of the pattern, and the boundary between the anisotropic region and the isotropic region could be clearly identified.

[Example 4]
In Example 4, a pattern retardation film was produced and evaluated in the same manner as in Example 1 except that the flow rate of air from the levitation conveyance device was adjusted to set the film height h to 3 mm.
As a result of the observation, it was observed that the anisotropic region that transmits light and the isotropic region that blocks light became a band-like region aligned in parallel to each other, forming a stripe pattern as a whole. It was. Moreover, the average value of the width | variety of the anisotropic area | region of all the observation points was 344 micrometers. Furthermore, in the observed image, there was almost no in-plane variation of the pattern, and the boundary between the anisotropic region and the isotropic region could be clearly identified.

[Example 5]
In Example 5, a pattern retardation film was produced and evaluated in the same manner as in Example 1 except that the flow rate of air from the levitation conveyance device was adjusted to set the film height h to 5 mm.
As a result of the observation, it was observed that the anisotropic region that transmits light and the isotropic region that blocks light became a band-like region aligned in parallel to each other, forming a stripe pattern as a whole. It was. Moreover, the average value of the width | variety of the anisotropic area | region of all the observation points was 360 micrometers. Furthermore, in the observed image, there was almost no in-plane variation of the pattern, and the boundary between the anisotropic region and the isotropic region could be clearly identified.

[Example 6]
In FIG. 7, the structure of the film conveying apparatus used in Example 6 is shown typically. As shown in FIG. 7, in Example 6, instead of the film transport apparatus 500 (see FIG. 5) used in Example 1, another film transport apparatus 501 was used. The film transport apparatus 501 is the same as the film transport apparatus 500 used in the first embodiment except that a floating transport apparatus 560 is provided between the exposure apparatus 530 and the downstream guide roll 540.

In Example 6, except for this matter, a pattern retardation film was produced and evaluated in the same manner as in Example 1.
As a result of the observation, it was observed that the anisotropic region that transmits light and the isotropic region that blocks light became a band-like region aligned in parallel to each other, forming a stripe pattern as a whole. It was. Moreover, the average value of the width | variety of the anisotropic area | region of all the observation points was 320 micrometers. Furthermore, in the observed image, the in-plane variation of the pattern was further reduced as compared with Example 1, and the boundary between the anisotropic region and the isotropic region could be clearly identified.

[Example 7]
In Example 7, a pattern retardation film was produced and evaluated in the same manner as in Example 1 except that the flow rate of air from the levitation conveyance device was adjusted to set the film height h to 6 mm.
As a result of the observation, it was observed that the anisotropic region that transmits light and the isotropic region that blocks light became a band-like region aligned in parallel to each other, forming a stripe pattern as a whole. It was. Moreover, the average value of the width | variety of the anisotropic area | region of all the observation points was 368 micrometers. Furthermore, in the observed image, there was almost no in-plane variation of the pattern. However, the boundary between the anisotropic region and the isotropic region is blurred and cannot be clearly identified.

[Comparative Example 1]
In Comparative Example 1, a pattern retardation film was produced and evaluated in the same manner as in Example 1 except that the tension applied to the film material was adjusted and the film height h was 0 mm without providing a levitation conveyance device. did. Here, the film height h being 0 mm does not indicate that the film material is in contact with the mask, but indicates that the film material and the mask are not in contact with each other as close as possible.
As a result of the observation, it was observed that the anisotropic region that transmits light and the isotropic region that blocks light became a band-like region aligned in parallel to each other, forming a stripe pattern as a whole. It was. The average value of the widths of the anisotropic regions at all observation points was 320 μm, but the in-plane variation of the pattern was large in the observed image. Moreover, the boundary between the anisotropic region and the isotropic region could be clearly identified.

[Comparative Example 2]
In Comparative Example 2, a pattern retardation film was produced and evaluated in the same manner as in Example 1 except that the film height h was adjusted to 2 mm by adjusting the tension applied to the film material without providing a levitation conveyance device. did.
As a result of the observation, it was observed that the anisotropic region that transmits light and the isotropic region that blocks light became a band-like region aligned in parallel to each other, forming a stripe pattern as a whole. It was. Further, although the average value of the width of the anisotropic region at all the observation points was 336 μm, the in-plane variation of the pattern was large in the observed image. Moreover, the boundary between the anisotropic region and the isotropic region could be clearly identified.

[Consideration]
In the example, a pattern retardation film having a small in-plane variation was obtained, while in the comparative example, a pattern retardation film having a large in-plane variation was obtained. From this result, it was confirmed that the pattern retardation film provided with the area | region where the precision of a shape and a dimension was favorable can be manufactured by using the film conveyance apparatus of this invention.

  Moreover, it turns out that the average value of the width | variety of an anisotropic area | region becomes large, so that the change of the film height h becomes large from the result of an Example and a comparative example. From this, by adjusting the amount of air blown from the levitation conveyance device and controlling the film height h, the light irradiation width by the exposure device can be adjusted, and consequently the width of the anisotropic region and the isotropic region. It was confirmed that it can be adjusted.

  Furthermore, in Example 7, since the pattern boundary was more blurred than in the other examples, it was confirmed that the film height h had a suitable range for improving the quality of the pattern retardation film.

DESCRIPTION OF SYMBOLS 100 Film conveyance apparatus 110 1st guide roll 120 1st floating conveyance apparatus 121 Slit 130 Exposure apparatus 131 Light source 132 Mask 133 Translucent part 134 Light-shielding part 140 2nd floating conveyance apparatus 141 Slit 150 2nd guide roll 160 Gas Layer 200, 210, 220 Film material 211, 221 Base film 212, 222 Liquid crystal composition layer 300 Three-dimensional display device 310 Liquid crystal panel 311 Light source side polarizing plate 312 Liquid crystal cell 313 Viewing side polarizing plate 314 Pixel for displaying right eye image Region 315 Pixel region for displaying image for left eye 320 Retardation film 330 Pattern retardation film 331 Anisotropic region 332 Isotropic region 400 Polarized glasses 410 1/2 wavelength plate 420 1/4 wavelength plate 430 Linearly polarizing plate 500, 501 Phil Transport device 510, 540 Guide roll 520, 560 Levitation transport device 530 Exposure device 531 Light source device 532 Mask 550 Film material 610 Light source side polarizing plate 620 1/4 wavelength plate 630 Pattern retardation film 631 Anisotropic region 632 Isotropic region 640 Observation side polarizing plate

Claims (4)

A film transport apparatus capable of irradiating light to a predetermined region of the liquid crystal composition layer while transporting a long film material comprising a liquid crystal composition layer,
A levitation transport device capable of levitation of the film material by ejecting gas from the fountain, comprising an ejection port capable of ejecting gas from below the film material;
An exposure apparatus capable of irradiating light onto the liquid crystal composition layer of the film material that has floated through a mask.   The levitation conveyance device can adjust a light irradiation width by the exposure device by controlling a distance between the film material and the mask by adjusting a flow rate of a gas ejected from the ejection port. 1. The film conveying apparatus according to 1.   The film transport apparatus according to claim 1 or 2, wherein a distance between the film material and the mask when irradiated with light is greater than 0 mm and 5 mm or less. The transport device includes a roll upstream of the exposure device,
The said levitation conveyance apparatus is a film conveyance apparatus as described in any one of Claims 1-3 arrange | positioned between the said roll and the said exposure apparatus in the conveyance direction of the said film material.

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