JP2013073960A - Magnesium silicide, thermoelectric conversion material, sintered body, sintered body for thermoelectric conversion element, thermoelectric conversion element, and thermoelectric conversion module - Google Patents
Magnesium silicide, thermoelectric conversion material, sintered body, sintered body for thermoelectric conversion element, thermoelectric conversion element, and thermoelectric conversion module Download PDFInfo
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 110
- 229910021338 magnesium silicide Inorganic materials 0.000 title claims abstract description 67
- YTHCQFKNFVSQBC-UHFFFAOYSA-N magnesium silicide Chemical compound [Mg]=[Si]=[Mg] YTHCQFKNFVSQBC-UHFFFAOYSA-N 0.000 title claims abstract description 67
- 239000000463 material Substances 0.000 title claims abstract description 28
- 238000005245 sintering Methods 0.000 claims abstract description 44
- 239000002019 doping agent Substances 0.000 claims abstract description 42
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 16
- 229910052779 Neodymium Inorganic materials 0.000 claims abstract description 15
- 229910052772 Samarium Inorganic materials 0.000 claims abstract description 15
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 15
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 description 39
- 239000000523 sample Substances 0.000 description 29
- 238000010438 heat treatment Methods 0.000 description 19
- 229910052710 silicon Inorganic materials 0.000 description 19
- 239000011777 magnesium Substances 0.000 description 17
- 238000001816 cooling Methods 0.000 description 14
- 239000002994 raw material Substances 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- 230000008018 melting Effects 0.000 description 10
- 229910052749 magnesium Inorganic materials 0.000 description 9
- 229910002804 graphite Inorganic materials 0.000 description 8
- 239000010439 graphite Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000006835 compression Effects 0.000 description 6
- 238000007906 compression Methods 0.000 description 6
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- 239000002245 particle Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 239000002918 waste heat Substances 0.000 description 6
- 238000007747 plating Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 230000000630 rising effect Effects 0.000 description 4
- 238000001308 synthesis method Methods 0.000 description 4
- 238000004056 waste incineration Methods 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910019752 Mg2Si Inorganic materials 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
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- 230000003287 optical effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000005678 Seebeck effect Effects 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000002490 spark plasma sintering Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910019018 Mg 2 Si Inorganic materials 0.000 description 1
- 230000005679 Peltier effect Effects 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- VJTAZCKMHINUKO-UHFFFAOYSA-M chloro(2-methoxyethyl)mercury Chemical compound [Cl-].COCC[Hg+] VJTAZCKMHINUKO-UHFFFAOYSA-M 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
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- 238000007429 general method Methods 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
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Abstract
Description
本発明は、マグネシウムシリサイド、熱電変換材料、焼結体、熱電変換素子用焼結体、熱電変換素子、及び熱電変換モジュールに関する。 The present invention relates to magnesium silicide, a thermoelectric conversion material, a sintered body, a sintered body for a thermoelectric conversion element, a thermoelectric conversion element, and a thermoelectric conversion module.
近年、環境問題の高まりに応じて、各種のエネルギーを効率的に利用する様々な手段が検討されている。特に、産業廃棄物の増加等に伴って、これらを焼却する際に生じる廃熱の有効利用が課題となっている。例えば大型廃棄物焼却施設では、廃熱により高圧の蒸気を発生させ、この蒸気により蒸気タービンを回転させて発電することにより廃熱回収が行われている。しかし、廃棄物焼却施設の大多数を占める中型・小型廃棄物焼却施設では、廃熱の排出量が少ないため、蒸気タービン等により発電する廃熱の回収方法は採用できていない。 In recent years, various means for efficiently using various types of energy have been studied in accordance with the growing environmental problems. In particular, along with an increase in industrial waste and the like, effective utilization of waste heat generated when these are incinerated is a problem. For example, in a large-scale waste incineration facility, waste heat recovery is performed by generating high-pressure steam by waste heat and generating power by rotating a steam turbine with this steam. However, in the medium-sized and small-sized waste incineration facilities that occupy the majority of the waste incineration facilities, the amount of waste heat emitted is small, and therefore, a method for recovering waste heat generated by a steam turbine or the like cannot be adopted.
このような中型・小型の廃棄物焼却施設において採用することが可能な廃熱を利用した発電方法としては、例えば、ゼーベック効果或いはペルチェ効果を利用して可逆的に熱電変換を行う熱電変換材料・熱電変換素子・熱電変換モジュールを用いる方法が提案されている。 As a power generation method using waste heat that can be adopted in such medium-sized and small-sized waste incineration facilities, for example, a thermoelectric conversion material that performs reversible thermoelectric conversion using the Seebeck effect or the Peltier effect, A method using a thermoelectric conversion element / thermoelectric conversion module has been proposed.
例えば、環境負荷が少ないマグネシウムシリサイド(Mg2Si)が熱電変換材料として研究されている(例えば特許文献1〜2、非特許文献1〜3を参照)。
For example, magnesium silicide (Mg 2 Si) having a small environmental load has been studied as a thermoelectric conversion material (see, for example,
ところで、熱電変換材料が特定のドーパントを含有すれば、熱電変換材料を焼結してなる熱電変換素子の性能を高められる。具体的には、熱電変換材料がドーパントを含有することで、焼結体の熱伝導率が低下したり、電気伝導率が向上したり、ゼーベック係数が向上したりする結果、熱電変換素子の熱電変換性能を高めることができる。 By the way, if a thermoelectric conversion material contains a specific dopant, the performance of the thermoelectric conversion element formed by sintering a thermoelectric conversion material can be improved. Specifically, because the thermoelectric conversion material contains a dopant, the thermal conductivity of the sintered body is reduced, the electrical conductivity is improved, and the Seebeck coefficient is improved. As a result, the thermoelectric of the thermoelectric conversion element is increased. Conversion performance can be improved.
したがって、上記マグネシウムシリサイドを用いる熱電変換材料において、マグネシウムシリサイドと相性の良いドーパントが明らかになれば、これらのドーパントの単独又は複数での使用は、マグネシウムシリサイドの焼結体から構成される熱電変換素子の性能指数Zを高めたり、特別な性質を熱電変換素子に付与したりする可能性を広げる。ここで、特別な性質としては、例えば、マグネシウムシリサイドにSbをドープすることで熱電変換素子に付与される高温耐久性が挙げられる(特許文献3参照)。 Therefore, in the thermoelectric conversion material using magnesium silicide, if a dopant having compatibility with magnesium silicide is clarified, the use of these dopants alone or in combination is a thermoelectric conversion element composed of a sintered body of magnesium silicide. The possibility of increasing the figure of merit Z and imparting special properties to the thermoelectric conversion element is expanded. Here, as a special property, for example, high temperature durability imparted to the thermoelectric conversion element by doping Sb into magnesium silicide can be cited (see Patent Document 3).
本発明は、上記課題を解決するためになされたものであり、その目的はマグネシウムシリサイドとの相性が良好なドーパントを含有する新規な材料を提供することにある。 The present invention has been made to solve the above problems, and an object of the present invention is to provide a novel material containing a dopant having a good compatibility with magnesium silicide.
本発明者らは、上記課題を解決するために鋭意研究を重ねた。その結果、Co、Nb、Nd、Sm、Ta及びZnが、マグネシウムシリサイドとの相性が良好なドーパントであることを見出し、本発明を完成するに至った。より具体的には本発明は以下のものを提供する。 The inventors of the present invention have made extensive studies to solve the above problems. As a result, Co, Nb, Nd, Sm, Ta, and Zn were found to be dopants having good compatibility with magnesium silicide, and the present invention was completed. More specifically, the present invention provides the following.
[1] Co、Nb、Nd、Sm、Ta及びZnから選択される少なくとも一種をドーパントとして含むマグネシウムシリサイド。 [1] Magnesium silicide containing at least one selected from Co, Nb, Nd, Sm, Ta and Zn as a dopant.
[2] 前記ドーパントを原子量比で0.10〜2.00at%含む[1]に記載のマグネシウムシリサイド。 [2] The magnesium silicide according to [1], containing 0.10 to 2.00 at% of the dopant in terms of atomic weight ratio.
[3] [1]又は[2]に記載のマグネシウムシリサイドから構成される熱電変換材料。 [3] A thermoelectric conversion material comprising the magnesium silicide according to [1] or [2].
[4] [1]又は[2]に記載のマグネシウムシリサイドを焼結してなる焼結体。 [4] A sintered body obtained by sintering the magnesium silicide according to [1] or [2].
[5] [4]に記載の焼結体から構成される熱電変換素子用焼結体。 [5] A sintered body for a thermoelectric conversion element comprising the sintered body according to [4].
[6] 熱電変換部と、該熱電変換部に設けられた第1電極及び第2電極とを備え、前記熱電変換部が[5]に記載の熱電変換素子用焼結体を用いて製造される熱電変換素子。 [6] A thermoelectric conversion unit, and a first electrode and a second electrode provided on the thermoelectric conversion unit, wherein the thermoelectric conversion unit is manufactured using the thermoelectric conversion element sintered body according to [5]. Thermoelectric conversion element.
[7] [6]に記載の熱電変換素子を備える熱電変換モジュール。 [7] A thermoelectric conversion module comprising the thermoelectric conversion element according to [6].
本発明によれば、マグネシウムシリサイドとの相性が良好なドーパントを含有する新規な材料を提供できる。 ADVANTAGE OF THE INVENTION According to this invention, the novel material containing a dopant with favorable compatibility with magnesium silicide can be provided.
以下、本発明の実施形態について説明する。なお、本発明は以下の実施形態に限定されない。 Hereinafter, embodiments of the present invention will be described. In addition, this invention is not limited to the following embodiment.
<マグネシウムシリサイド>
本発明のマグネシウムシリサイドは、MgとSiとの原子量比がおよそ2:1の化合物であり、ドーパントとしてCo、Nb、Nd、Sm、Ta及びZnから選択される少なくとも一種を含む。Co、Nb、Nd、Sm、Ta、Znはマグネシウムシリサイドとの相性が良好であり、これらのドーパントを含むマグネシウムシリサイドから構成される熱電変換材料を焼結して熱電変換素子とすれば、熱電変換素子の電気伝導率が向上したり、熱伝導率が低下したりする。このため、これらのドーパントの単独又は複数での使用は、熱電変換素子の無次元性能指数ZTを高めたり、特別な性質を熱電変換素子に付与したりする可能性を広げる。なお、本発明は、公知のドーパントであるSb等とCo、Nb、Nd、Sm、Ta及びZnとを組み合わせて使用することを排除しない。
<Magnesium silicide>
The magnesium silicide of the present invention is a compound having an atomic weight ratio of Mg and Si of approximately 2: 1 and includes at least one selected from Co, Nb, Nd, Sm, Ta and Zn as a dopant. Co, Nb, Nd, Sm, Ta, and Zn have good compatibility with magnesium silicide. If a thermoelectric conversion material composed of magnesium silicide containing these dopants is sintered into a thermoelectric conversion element, thermoelectric conversion is achieved. The electrical conductivity of the element is improved or the thermal conductivity is lowered. For this reason, use of these dopants singly or in plurality increases the possibility of increasing the dimensionless figure of merit ZT of the thermoelectric conversion element or imparting special properties to the thermoelectric conversion element. In addition, this invention does not exclude using Sb etc. which are well-known dopants in combination with Co, Nb, Nd, Sm, Ta, and Zn.
熱電変換素子に付与可能な特別な性質としては、高温耐久性、安全性等が挙げられる。Nb、Nd、Sm、Ta、Znをドーパントとして含有すれば、熱電変換素子は、高温耐久性が高まる。また、Co、Nb、Nd、Sm、Ta、Znは毒性が低く、これらをドーパントとして含有してもマグネシウムシリサイドの安全性が低下する問題は生じない。 Special properties that can be imparted to the thermoelectric conversion element include high temperature durability and safety. If Nb, Nd, Sm, Ta, and Zn are contained as dopants, the thermoelectric conversion element has high temperature durability. Further, Co, Nb, Nd, Sm, Ta, and Zn are low in toxicity, and even if these are contained as dopants, there is no problem that the safety of magnesium silicide is lowered.
Co、Nb、Nd、Sm、Ta、Znの中でも、Co、Nb、Smは熱電変換素子の熱伝導率を低下させる効果が高く、また、Taは電気伝導率を向上させる効果が高い。また、Znは熱伝導率を低下させる効果が高い。そして、これらのドーパントを含有しても、ゼーベック係数の絶対値の低下による熱電変換素子の性能低下の問題が無い。 Among Co, Nb, Nd, Sm, Ta, and Zn, Co, Nb, and Sm have a high effect of reducing the thermal conductivity of the thermoelectric conversion element, and Ta has a high effect of improving the electrical conductivity. Further, Zn has a high effect of reducing the thermal conductivity. And even if it contains these dopants, there is no problem of the performance deterioration of the thermoelectric conversion element by the fall of the absolute value of Seebeck coefficient.
本発明のマグネシウムシリサイドにおける、ドーパントの含有量は特に限定されないが、原子量比で0.10〜2.00at%であることが好ましい。なお、複数のドーパントが使用される場合には、全てのドーパントの合計含有量が上記の範囲内であることが好ましい。 The content of the dopant in the magnesium silicide of the present invention is not particularly limited, but is preferably 0.10 to 2.00 at% in terms of atomic weight ratio. In addition, when a several dopant is used, it is preferable that the total content of all the dopants exists in said range.
本発明で用いられるマグネシウムシリサイドの製造方法は特に限定されないが、例えば、溶融合成法、メカニカルアロイ法を採用することができる。 Although the manufacturing method of the magnesium silicide used by this invention is not specifically limited, For example, a melt synthesis method and a mechanical alloy method are employable.
溶融合成法は、Mg、Si、ドーパントを混合して組成原料を得る混合工程と、この組成原料を加熱溶融する加熱溶融工程とを有する。 The melt synthesis method has a mixing step of mixing Mg, Si, and a dopant to obtain a composition raw material, and a heating and melting step of heating and melting the composition raw material.
組成原料を得るためのMgについて、その種類は特に限定されないが、純度の高いものが好ましい。純度が高いMgとは、99.5%程度以上の純度を有するMgを指す。 The Mg for obtaining the composition raw material is not particularly limited, but a high purity is preferable. High purity Mg refers to Mg having a purity of about 99.5% or more.
組成原料を得るためのSiについて、その種類は特に限定されず、シリコンスラッジの表面の酸化膜を除去したものも使用可能であるが、高純度シリコンの使用が好ましい。ここで、高純度シリコンとは、純度が99.9999%以上のもので、半導体や太陽電池等のシリコン製品の製造に用いられるものである。高純度シリコンとしては、具体的に、LSI用高純度シリコン原料、太陽電池用高純度シリコン原料、高純度金属シリコン、高純度シリコンインゴット、高純度シリコンウエハ等を挙げることができる。 The type of Si for obtaining the composition raw material is not particularly limited, and it is possible to use a silicon sludge from which an oxide film has been removed, but it is preferable to use high-purity silicon. Here, high-purity silicon has a purity of 99.9999% or higher and is used for manufacturing silicon products such as semiconductors and solar cells. Specific examples of high-purity silicon include high-purity silicon raw materials for LSI, high-purity silicon raw materials for solar cells, high-purity metal silicon, high-purity silicon ingots, and high-purity silicon wafers.
混合工程においては、MgとSiとドーパントとを混合して、MgとSiとの原子量比がおよそ2:1であり、ドーパントを原子量比で0.10〜2.00at%含む組成原料を調製する。 In the mixing step, Mg, Si and a dopant are mixed to prepare a composition raw material having an atomic weight ratio of Mg to Si of about 2: 1 and containing 0.10 to 2.00 at% of the dopant in atomic weight ratio. .
加熱溶融工程においては、例えば、混合工程にて得た組成原料を還元雰囲気下且つ好ましくは減圧下において、Mgの融点を超えSiの融点を下回る温度条件下で熱処理してマグネシウムシリサイドを溶融合成する。ここで、「還元雰囲気下」とは、特に水素ガスを5体積%以上含み、必要に応じてその他の成分として、不活性化ガスを含む雰囲気を指す。かかる還元雰囲気下で加熱溶融工程を行うことにより、MgとSiとを確実に反応させてマグネシウムシリサイドを合成することができる。また、加熱溶融工程における圧力条件としては、大気圧でもよいが、1.33×10−3Pa〜大気圧が好ましく、安全性を考慮すれば、例えば0.08MPa程度の減圧条件或いは真空条件で行うことが好ましい。また、加熱溶融工程における加熱条件としては、700℃以上1410℃未満、好ましくは1085℃以上1410℃未満で、例えば3時間程度熱処理することができる。ここで、熱処理の時間は、例えば2〜10時間である。熱処理を長時間のものとすることにより、得られるマグネシウムシリサイドをより均一化することができる。また、昇温条件としては、例えば、150℃に達するまでは150〜250℃/hの昇温条件、1100℃に達するまでは350〜450℃/hの昇温条件を挙げることができ、熱処理後の降温条件としては、900〜1000℃/hの降温条件を挙げることができる。 In the heating and melting step, for example, the composition raw material obtained in the mixing step is heat-treated under a reducing atmosphere and preferably under reduced pressure under a temperature condition that exceeds the melting point of Mg and lower than the melting point of Si to melt and synthesize magnesium silicide. . Here, “under a reducing atmosphere” refers to an atmosphere containing hydrogen gas in an amount of 5% by volume or more and optionally containing an inert gas as another component. By performing the heating and melting step in such a reducing atmosphere, magnesium silicide can be synthesized by reliably reacting Mg and Si. Further, the pressure condition in the heating and melting step may be atmospheric pressure, but is preferably 1.33 × 10 −3 Pa to atmospheric pressure, and considering safety, for example, under reduced pressure condition or vacuum condition of about 0.08 MPa. Preferably it is done. The heating conditions in the heating and melting step are 700 ° C. or higher and lower than 1410 ° C., preferably 1085 ° C. or higher and lower than 1410 ° C., for example, heat treatment can be performed for about 3 hours. Here, the heat treatment time is, for example, 2 to 10 hours. By making the heat treatment for a long time, the obtained magnesium silicide can be made more uniform. Examples of the temperature raising condition include a temperature raising condition of 150 to 250 ° C./h until reaching 150 ° C., and a temperature raising condition of 350 to 450 ° C./h until reaching 100 ° C. As the subsequent temperature lowering condition, a temperature lowering condition of 900 to 1000 ° C./h can be exemplified.
続いて、メカニカルアロイ法について説明する。メカニカルアロイ法によりマグネシウムシリサイドを製造する際の原料は特に限定されず、上記の溶融合成法で説明したMg、Siを利用できる。原料の粉末の大きさは特に限定されないが、一般的には数十ミクロンから数ミリである。MgとSiとドーパントとの原子比を上記溶融合成法の場合と同様に調整して、これらの原料に対して機械的合金化処理を施す。 Next, the mechanical alloy method will be described. The raw material for producing magnesium silicide by the mechanical alloy method is not particularly limited, and Mg and Si described in the above melt synthesis method can be used. The size of the raw material powder is not particularly limited, but is generally several tens of microns to several millimeters. The atomic ratio of Mg, Si and dopant is adjusted in the same manner as in the case of the melt synthesis method, and mechanical alloying treatment is performed on these raw materials.
機械的合金化処理には乾式の粉砕機が利用でき、具体的には、振動型ボールミル、遊星型ボールミル、転動型ボールミル、アトライター等が利用できる。機械的合金化処理時の雰囲気は粉末の酸化を防止するため、不活性ガス雰囲気や減圧雰囲気が好ましい。 A dry pulverizer can be used for the mechanical alloying treatment, and specifically, a vibration type ball mill, a planetary ball mill, a rolling ball mill, an attritor or the like can be used. The atmosphere during the mechanical alloying treatment is preferably an inert gas atmosphere or a reduced pressure atmosphere in order to prevent oxidation of the powder.
処理時間は特に限定されないが、50〜300時間が好ましい。50時間より短いと各元素の混合状態が不十分であり、微細混合には至っていない可能性がある。また300時間を超えると機械的合金化処理時に粉末の酸化或いは窒化が起こり、熱電材料の性能劣化をもたらす酸化物や窒化物が生成する。さらに、機械的合金化時の圧力伝達媒体としては、鋼球、セラミックス球、超硬球等の一般的な粉砕球が利用できる。 Although processing time is not specifically limited, 50 to 300 hours are preferable. If it is shorter than 50 hours, the mixing state of each element is insufficient, and fine mixing may not be achieved. When the time exceeds 300 hours, oxidation or nitridation of the powder occurs during the mechanical alloying treatment, and oxides and nitrides that cause performance deterioration of the thermoelectric material are generated. Furthermore, as a pressure transmission medium at the time of mechanical alloying, general pulverized balls such as steel balls, ceramic balls, and hard balls can be used.
上記の機械的合金化処理により合金化したマグネシウムシリサイドを得ることができる。なお、メカニカルアロイ法により得られるマグネシウムシリサイドは、通常、数マイクロメートル以下の微細な粉末状である。 Alloyed magnesium silicide can be obtained by the above mechanical alloying treatment. The magnesium silicide obtained by the mechanical alloy method is usually in the form of a fine powder of several micrometers or less.
<焼結体の製法>
本発明の焼結体は、上記マグネシウムシリサイドを焼結してなる。焼結されるマグネシウムシリサイドの形状は、微細で、狭い粒度分布を有することが好ましい。ここで、微細とは、例えば、数マイクロメートル以下である。また、粉末化する方法は特に限定されず、一般的な方法を採用できる。
<Sintered body manufacturing method>
The sintered body of the present invention is formed by sintering the magnesium silicide. The shape of the magnesium silicide to be sintered is fine and preferably has a narrow particle size distribution. Here, “fine” means, for example, a few micrometers or less. Moreover, the method to powderize is not specifically limited, A general method is employable.
焼結の条件は、特に限定されないが、本発明の焼結体を熱電変換素子に用いる場合、グラファイト製の焼結用冶具内、真空又は減圧雰囲気下、焼結圧力5〜60MPa、焼結温度600〜1000℃、加圧圧縮焼結法で焼結する条件が好ましい。 Sintering conditions are not particularly limited, but when the sintered body of the present invention is used for a thermoelectric conversion element, in a sintering jig made of graphite, in a vacuum or reduced pressure atmosphere, a sintering pressure of 5 to 60 MPa, a sintering temperature. 600-1000 degreeC and the conditions sintered by a pressure compression sintering method are preferable.
焼結圧力が5MPa未満である場合、理論密度の約70%以上の十分な密度を有する焼結体を得ることが難しくなり、得られた試料が強度的に実用に供することができないものとなるおそれがある。一方、焼結圧力が60MPaを超える場合、コストの面で好ましくなく、実用的でない。また、焼結温度が600℃未満では、粒子同士が接触する面の少なくとも一部が融着して焼成され理論密度の70%から理論密度に近い密度を有する焼結体を得ることが難しくなり、得られた試料が強度的に実用に供することができないものとなるおそれがある。また、焼結温度が1000℃を超える場合には、温度が高すぎるために試料の損傷が生じるばかりでなく、場合によってはMgが急激に蒸気となって、飛散するおそれがある。 When the sintering pressure is less than 5 MPa, it becomes difficult to obtain a sintered body having a sufficient density of about 70% or more of the theoretical density, and the obtained sample cannot be practically used in terms of strength. There is a fear. On the other hand, when the sintering pressure exceeds 60 MPa, it is not preferable in terms of cost and is not practical. If the sintering temperature is less than 600 ° C., it becomes difficult to obtain a sintered body having a density close to the theoretical density from 70% of the theoretical density by fusing and firing at least a part of the surfaces where the particles are in contact with each other. There is a risk that the obtained sample may not be practically usable in terms of strength. Further, when the sintering temperature exceeds 1000 ° C., the temperature is too high, so that not only the sample is damaged, but in some cases, Mg may rapidly become vapor and scatter.
また、焼結工程において、空気が存在する場合は、窒素やアルゴン等の不活性ガスを使用した雰囲気下で焼結することが好ましい。 In the sintering step, when air is present, it is preferable to sinter in an atmosphere using an inert gas such as nitrogen or argon.
焼結工程において、加圧圧縮焼結法を採用する場合、ホットプレス焼結法(HP)、熱間等方圧焼結法(HIP)、及び放電プラズマ焼結法を採用することができる。これらの中でも、放電プラズマ焼結法が好ましい。 When the pressure compression sintering method is employed in the sintering process, a hot press sintering method (HP), a hot isostatic sintering method (HIP), and a discharge plasma sintering method can be employed. Among these, the discharge plasma sintering method is preferable.
放電プラズマ焼結法は、直流パルス通電法を用いた加圧圧縮焼結法の一種で、パルス大電流を種々の材料に通電することによって加熱・焼結する方法であり、原理的には金属・グラファイト等の導電性材料に電流を流し、ジュール加熱により材料を加工・処理する方法である。 The spark plasma sintering method is a type of pressure compression sintering using the direct current pulse current method. It is a method of heating and sintering by applying a large pulse current to various materials. -This is a method in which an electric current is passed through a conductive material such as graphite and the material is processed and processed by Joule heating.
このようにして得られた焼結体は、高い物理的強度を有し、且つ安定して高い熱電変換性能を発揮できる焼結体となる。したがって、本発明の焼結体は熱電変換素子用焼結体として好ましく用いることができる。 The sintered body thus obtained is a sintered body having high physical strength and capable of stably exhibiting high thermoelectric conversion performance. Therefore, the sintered body of the present invention can be preferably used as a sintered body for a thermoelectric conversion element.
<熱電変換素子>
本発明に係る熱電変換素子は、熱電変換部と、該熱電変換部に設けられた第1電極及び第2電極とを備え、この熱電変換部が本発明の焼結体を用いて製造されるものである。
<Thermoelectric conversion element>
The thermoelectric conversion element according to the present invention includes a thermoelectric conversion portion and a first electrode and a second electrode provided in the thermoelectric conversion portion, and the thermoelectric conversion portion is manufactured using the sintered body of the present invention. Is.
[熱電変換部]
熱電変換部は、ワイヤーソー等を用いて、焼結体から、所望の大きさになるように切り出されたものである。なお、切り出しは、後述する方法で焼結体に電極を形成した後で行うことが好ましい。
[Thermoelectric converter]
The thermoelectric conversion part is cut out from the sintered body to have a desired size using a wire saw or the like. In addition, it is preferable to cut out after forming an electrode in a sintered compact by the method mentioned later.
この熱電変換部は、通常、1種類の本発明の熱電変換材料を用いて製造されるが、複数種類の本発明の熱電変換材料を用いて複層構造を有する熱電変換部としてもよい。複層構造を有する熱電変換部は、焼結前に複数種類の本発明の熱電変換材料を所望の順序で積層した後、焼結することにより製造することができる。複数種類の本発明の熱電変換材料としては、ドーパントが異なる熱電変換材料の組み合わせであってもよく、ドーパントの含有量が異なるドーパントを含む熱伝変換材料の組み合わせであってもよい。或いは、上記本発明の熱電変換材料と従来公知の熱電変換材料との組み合わせであってもよい。ただし、マグネシウムシリサイド同士を組み合わせる方が、膨張係数の違い等によって積層界面が劣化することがないため好ましい。 Although this thermoelectric conversion part is normally manufactured using the thermoelectric conversion material of 1 type of this invention, it is good also as a thermoelectric conversion part which has a multilayer structure using the thermoelectric conversion material of multiple types of this invention. The thermoelectric conversion part having a multilayer structure can be manufactured by laminating a plurality of types of thermoelectric conversion materials of the present invention in a desired order before sintering and then sintering. The thermoelectric conversion materials of a plurality of types of the present invention may be a combination of thermoelectric conversion materials having different dopants, or a combination of thermoelectric conversion materials containing dopants having different dopant contents. Alternatively, a combination of the thermoelectric conversion material of the present invention and a conventionally known thermoelectric conversion material may be used. However, it is preferable to combine magnesium silicides because the laminated interface does not deteriorate due to a difference in expansion coefficient or the like.
[電極]
上記第1電極及び第2電極の形成方法は特に限定されず、焼結体に対して電極を形成する方法であってもよいし、本発明の焼結体を得るための、上記マグネシウムシリサイドの焼結時に電極を同時に形成する方法であってもよい。
[electrode]
The method of forming the first electrode and the second electrode is not particularly limited, and may be a method of forming an electrode on the sintered body, or the magnesium silicide for obtaining the sintered body of the present invention. A method of simultaneously forming electrodes during sintering may be used.
焼結体に対して電極を形成する方法としては、メッキ法等が例示される。そして、メッキ法を採用する場合、無電界ニッケルメッキにより電極を形成することが好ましい。また、メッキ法により電極を形成する前の焼結体の表面に、メッキを行うのに支障となる凹凸がある場合には、研磨して平滑にすることが好ましい。 Examples of the method for forming the electrode on the sintered body include a plating method. And when employ | adopting a plating method, it is preferable to form an electrode by electroless nickel plating. Moreover, when the surface of the sintered compact before forming an electrode by plating method has the unevenness | corrugation which obstructs plating, it is preferable to grind and smooth.
このようにして得られたメッキ層付きの焼結体を、ワイヤーソーやブレードソーのような切断機で所定の大きさにカットすることで、第1電極、熱電変換部、及び第2電極からなる熱電変換素子が得られる。 By cutting the sintered body with the plated layer thus obtained into a predetermined size with a cutting machine such as a wire saw or a blade saw, from the first electrode, the thermoelectric conversion unit, and the second electrode A thermoelectric conversion element is obtained.
また、マグネシウムシリサイドの焼結時に電極を形成する方法としては、加圧圧縮焼結法が挙げられる。加圧圧縮焼結法とは、電極材料、マグネシウムシリサイド、電極材料をこの順で積層し、加圧圧縮焼結することにより、両端に電極が形成された焼結体を得る方法である。このようにして製造された焼結体を、ワイヤーソーやブレードソーのような切断機で所定の大きさにカットすることで、第1電極、熱電変換部、及び第2電極からなる熱電変換素子が得られる。 Moreover, as a method of forming an electrode during the sintering of magnesium silicide, a pressure compression sintering method can be mentioned. The pressure compression sintering method is a method in which an electrode material, magnesium silicide, and an electrode material are laminated in this order, and pressure compression sintering is performed to obtain a sintered body having electrodes formed at both ends. The sintered body thus manufactured is cut into a predetermined size with a cutting machine such as a wire saw or a blade saw, so that a thermoelectric conversion element including a first electrode, a thermoelectric conversion unit, and a second electrode Is obtained.
<熱電変換モジュール>
本発明に係る熱電変換モジュールは、上記のような本発明に係る熱電変換素子を備えるものである。
<Thermoelectric conversion module>
The thermoelectric conversion module according to the present invention includes the thermoelectric conversion element according to the present invention as described above.
熱電変換モジュールの一例としては、例えば図1及び図2に示すようなものが挙げられる。この熱電変換モジュールでは、本発明に係るマグネシウムシリサイドから得られたn型半導体及びp型半導体の少なくとも一方がそれぞれn型熱電変換部101、p型熱電変換部102の熱電変換材料として用いられる。並置されたn型熱電変換部101及びp型熱電変換部102の上端部には電極1015、1025が、下端部には電極1016、1026がそれぞれ設けられる。そして、n型熱電変換部及びp型熱電変換部の上端部にそれぞれ設けられた電極1015,1025が接続されて一体化された電極を形成すると共に、n型熱電変換部及びp型熱電変換部の下端部にそれぞれ設けられた電極1016,1026は分離されて構成される。
As an example of a thermoelectric conversion module, what is shown, for example in FIG.1 and FIG.2 is mentioned. In this thermoelectric conversion module, at least one of an n-type semiconductor and a p-type semiconductor obtained from magnesium silicide according to the present invention is used as a thermoelectric conversion material for the n-type
図1に示す熱電変換モジュールにおいては、電極1015,1025の側を加熱し、電極1016,1026の側から放熱することで、電極1015,1025と、電極1016,1026との間に正の温度差(Th−Tc)が生じ、熱励起されたキャリアによってp型熱電変換部102がn型熱電変換部101よりも高電位となる。このとき、電極1016と電極1026との間に負荷として抵抗3を接続することで、p型熱電変換部102からn型熱電変換部101へと電流が流れる。
In the thermoelectric conversion module shown in FIG. 1, a positive temperature difference is generated between the
図2に示す熱電変換モジュールにおいては、直流電源4によってp型熱電変換部102からn型熱電変換部101へと直流電流を流すことで、電極1015,1025において吸熱作用が生じ、電極1016,1026において発熱作用が生じる。また、n型熱電変換部101からp型熱電変換部102へと直流電流を流すことで、電極1015,1025において発熱作用が生じ、電極1016,1026において吸熱作用が生じる。
In the thermoelectric conversion module shown in FIG. 2, a direct current flows from the p-type
また、熱電変換モジュールの他の例としては、例えば図3及び図4に示すようなものが挙げられる。この熱電変換モジュールでは、本発明のマグネシウムシリサイドから得られたn型半導体がn型熱電変換部103の熱電変換材料として用いられる。n型熱電変換部103の上端部には電極1035が、下端部には電極1036がそれぞれ設けられる。
Moreover, as another example of a thermoelectric conversion module, what is shown, for example in FIG.3 and FIG.4 is mentioned. In this thermoelectric conversion module, an n-type semiconductor obtained from the magnesium silicide of the present invention is used as a thermoelectric conversion material of the n-type
図3に示す熱電変換モジュールにおいては、電極1035側を加熱し、電極1036側から放熱することで、電極1035と電極1036との間に正の温度差(Th−Tc)が生じ、電極1035側が電極1036側よりも高電位となる。このとき、電極1035と電極1036との間に負荷として抵抗3を接続することで、電極1035側から電極1036側へと電流が流れる。
In the thermoelectric conversion module shown in FIG. 3, by heating the
図4に示す熱電変換モジュールにおいては、直流電源4によって電極1036側からn型熱電変換部103を経て電極1035側へと直流電流を流すことで、電極1035において吸熱作用が生じ、電極1036において発熱作用が生じる。また、直流電源4によって電極1035側からn型熱電変換部103を経て電極1036へと直流電流を流すことで、電極1035において発熱作用が生じ、電極1036において吸熱作用が生じる。
In the thermoelectric conversion module shown in FIG. 4, a direct current flows from the
以下、本発明について、実施例を挙げて詳細に説明する。なお、本発明は以下に示す実施例に何ら限定されるものではない。 Hereinafter, the present invention will be described in detail with reference to examples. In addition, this invention is not limited to the Example shown below at all.
<実施例1>
高純度シリコンと、Mgと、Coとを混合し、組成原料(66at%Mg、33at%Si、1at%Co)を得た。なお、高純度シリコンとしては、MEMC Electronic Materials社製で、純度が99.9999999%の半導体グレード、大きさが直径4mm以下の粒状のものを用いた。また、Mgとしては、日本サーモケミカル社製で、純度が99.93%、大きさが1.4mm×0.5mmのマグネシウム片を用いた。また、Coとしては、(株)高純度化学研究所製で、純度が99%、大きさが直径5μm以下の粒状のものを用いた。
<Example 1>
High purity silicon, Mg, and Co were mixed to obtain a composition material (66 at% Mg, 33 at% Si, 1 at% Co). As high-purity silicon, a semiconductor grade manufactured by MEMC Electronic Materials, having a purity of 99.999999999%, and having a diameter of 4 mm or less was used. Further, as Mg, a magnesium piece manufactured by Nippon Thermochemical Co., Ltd., having a purity of 99.93% and a size of 1.4 mm × 0.5 mm was used. Further, as Co, a granular material having a purity of 99% and a diameter of 5 μm or less manufactured by Kojundo Chemical Laboratory Co., Ltd. was used.
上記組成原料を、Al2O3製の溶融ルツボ(日本化学陶業社製、内径34mm、外径40mm、高さ150mm;蓋部は直径40mm、厚さ2.5mm)に投入した。溶融ルツボの開口部の辺縁と、蓋部とを密着させて、加熱炉内に静置し、加熱炉の外部からセラミック棒を介して、3kg/cm2となるようにおもりで加圧した。
The above composition raw material was put into a melting crucible made of Al 2 O 3 (manufactured by Nippon Chemical Ceramics Co., Ltd., inner diameter 34 mm, outer diameter 40 mm,
次いで、加熱炉の内部を、ロータリーポンプで5Pa以下となるまで減圧し、次いで拡散ポンプで1.33×10−2Paとなるまで減圧した。この状態で、加熱炉内を200℃/hで150℃に達するまで加熱し、150℃で1時間保持して組成原料を乾燥させた。この際、加熱炉内には、水素ガスとアルゴンガスとの混合ガスを充填し、水素ガスの分圧を0.005MPa、アルゴンガスの分圧を0.052MPaとした。 Next, the inside of the heating furnace was depressurized with a rotary pump until it became 5 Pa or less, and then depressurized with a diffusion pump until it became 1.33 × 10 −2 Pa. In this state, the inside of the heating furnace was heated at 200 ° C./h until reaching 150 ° C., and kept at 150 ° C. for 1 hour to dry the composition raw material. At this time, the heating furnace was filled with a mixed gas of hydrogen gas and argon gas, the hydrogen gas partial pressure was 0.005 MPa, and the argon gas partial pressure was 0.052 MPa.
その後、400℃/hで1105℃に達するまで加熱し、1105℃で3時間保持した。その後、100℃/hで900℃にまで冷却し、1000℃/hで室温にまで冷却することでCoがドープされたマグネシウムシリサイドを得た。 Then, it heated until it reached 1105 degreeC at 400 degreeC / h, and hold | maintained at 1105 degreeC for 3 hours. Then, the magnesium silicide doped with Co was obtained by cooling to 900 ° C. at 100 ° C./h and cooling to room temperature at 1000 ° C./h.
上記マグネシウムシリサイドを、陶製乳鉢を用いて粒径がおよそ75μmになるまで粉砕し、75μmの篩に通した粉末を得た。そして、図5に示すように、内径15mmのグラファイトダイ10と、グラファイト製パンチ11a,11bとで囲まれた空間に、粉砕したマグネシウムシリサイド1.0gを仕込んだ。粉末の上下端には、パンチにマグネシウムシリサイドが固着することを防止するためにカーボンペーパーを挟んだ。その後、放電プラズマ焼結装置(ELENIX社製、「PAS−III−Es」)を用いて真空雰囲気下で焼結を行った。焼結条件は下記のとおりである。
焼結温度:910℃
圧力:30.0MPa
昇温レート:300℃/min×1min40sec(〜500℃)
35℃/min×11min(500〜885℃)
10℃/min×2min30sec(885〜910℃)
0℃/min×5min(910℃)
冷却条件:真空放冷
雰囲気:Ar 60Pa(冷却時は真空)
The magnesium silicide was pulverized using a ceramic mortar until the particle size became approximately 75 μm, and a powder passed through a 75 μm sieve was obtained. Then, as shown in FIG. 5, 1.0 g of pulverized magnesium silicide was charged into a space surrounded by a
Sintering temperature: 910 ° C
Pressure: 30.0 MPa
Temperature rising rate: 300 ° C./min×1 min 40 sec (˜500 ° C.)
35 ° C./min×11 min (500 to 885 ° C.)
10 ° C./min×2 min 30 sec (885-910 ° C.)
0 ° C / min × 5min (910 ° C)
Cooling conditions: Vacuum cooling Atmosphere: Ar 60 Pa (vacuum when cooling)
焼結後、付着したカーボンペーパーをサンドペーパーで除去し、Coがドープされたマグネシウムシリサイドの焼結体を得た。なお、得られた焼結体の形状は、円柱状(上面及び底面が直径15mmの円、高さが10mm)である。 After sintering, the adhered carbon paper was removed with sandpaper to obtain a sintered body of magnesium silicide doped with Co. In addition, the shape of the obtained sintered compact is a column shape (a circle with a diameter of 15 mm on the top and bottom surfaces and a height of 10 mm).
<実施例2>
CoをNb((株)高純度化学研究所製で、純度が99.9%、大きさが直径300μmm以下の粒状)に変更した以外は実施例1と同様の方法で、Nbがドープされたマグネシウムシリサイドを得た。
<Example 2>
Nb was doped in the same manner as in Example 1 except that Co was changed to Nb (manufactured by Kojundo Chemical Laboratory Co., Ltd., purity 99.9%, particle size of 300 μmm or less in diameter). Magnesium silicide was obtained.
<実施例3>
CoをSm((株)高純度化学研究所製で、純度が99.9%、削り状で、直径がおよそ5〜10mmの削り状Smの塊)に変更した以外は実施例1と同様の方法で、Smがドープされたマグネシウムシリサイドを得た。
<Example 3>
The same as Example 1 except that Co was changed to Sm (manufactured by Kojundo Chemical Laboratories Co., Ltd., purity 99.9%, shaved, and a lump of shaved Sm having a diameter of about 5 to 10 mm). By the method, magnesium silicide doped with Sm was obtained.
<実施例4>
CoをZn((株)高純度化学研究所製で、純度が99.9%、削り状で、直径がおよそ5〜10mmの削り状Smの塊)に変更し、放電プラズマ焼結装置による焼結の際の条件を下記の条件に変更した以外は実施例1と同様の方法で、Ndがドープされたマグネシウムシリサイドを得た。
焼結温度:870℃
圧力:30.0MPa
昇温レート:300℃/min×1min40sec(〜500℃)
35℃/min×10min(500〜850℃)
10℃/min×2min(850〜870℃)
0℃/min×5min(870℃)
冷却条件:真空放冷
雰囲気:Ar 60Pa(冷却時は真空)
<Example 4>
Co was changed to Zn (manufactured by Kojundo Chemical Laboratory Co., Ltd., purity 99.9%, machined Sm ingot with a diameter of approximately 5 to 10 mm), and sintered by a discharge plasma sintering apparatus. Magnesium silicide doped with Nd was obtained in the same manner as in Example 1 except that the conditions during the sintering were changed to the following conditions.
Sintering temperature: 870 ° C
Pressure: 30.0 MPa
Temperature rising rate: 300 ° C./min×1 min 40 sec (˜500 ° C.)
35 ° C./min×10 min (500 to 850 ° C.)
10 ° C / min × 2min (850-870 ° C)
0 ° C / min × 5min (870 ° C)
Cooling conditions: Vacuum cooling Atmosphere: Ar 60 Pa (vacuum when cooling)
<実施例5>
NdをTa((株)高純度化学研究所製で、純度が99.9%、大きさが直径45μm以下の粒状)に変更した以外は実施例4と同様の方法で、Taがドープされたマグネシウムシリサイドを得た。
<Example 5>
Ta was doped in the same manner as in Example 4 except that Nd was changed to Ta (made by Kojundo Chemical Laboratory Co., Ltd., purity 99.9%, particle size of 45 μm or less in diameter). Magnesium silicide was obtained.
<実施例6>
CoをZn((株)高純度化学研究所製で、純度が99.9%、大きさが直径150μm以下の粒状)に変更し、放電プラズマ焼結装置による焼結の際の条件を下記の条件に変更した以外は実施例1と同様の方法で、Znがドープされたマグネシウムシリサイドを得た。
焼結温度:870℃
圧力:30.0MPa
昇温レート:300℃/min×2min(〜600℃)
100℃/min×2min(600〜800℃)
10℃/min×4min(800〜840℃)
0℃/min×5min(840℃)
冷却条件:真空放冷
雰囲気:Ar 60Pa(冷却時は真空)
<Example 6>
Co was changed to Zn (manufactured by Kojundo Chemical Laboratory Co., Ltd., with a purity of 99.9% and a granule having a diameter of 150 μm or less), and the conditions for sintering with a discharge plasma sintering apparatus were as follows: A magnesium silicide doped with Zn was obtained in the same manner as in Example 1 except that the conditions were changed.
Sintering temperature: 870 ° C
Pressure: 30.0 MPa
Temperature rising rate: 300 ° C./min×2 min (˜600 ° C.)
100 ° C./min×2 min (600 to 800 ° C.)
10 ° C./min×4 min (800 to 840 ° C.)
0 ° C / min × 5min (840 ° C)
Cooling conditions: Vacuum cooling Atmosphere: Ar 60 Pa (vacuum when cooling)
<参考例1>
CoをSb(エレクトロニクス エンド マテリアルズ コーポレーション社製で、純度が99.9999%、大きさが直径5mm以下の粒状)に変更し、放電プラズマ焼結装置による焼結の際の条件を下記の条件に変更した以外は実施例1と同様の方法で、Sbがドープされたマグネシウムシリサイドを得た。
焼結温度:850℃
圧力:30.0MPa
昇温レート:300℃/min×2min(〜600℃)
100℃/min×2min(600〜800℃)
10℃/min×5min(800〜850℃)
0℃/min×5min(850℃)
冷却条件:真空放冷
雰囲気:Ar 60Pa(冷却時は真空)
<Reference Example 1>
Co was changed to Sb (manufactured by Electronics End Materials Corporation, with a purity of 99.9999% and a particle size of 5 mm or less in diameter), and the conditions for sintering with the spark plasma sintering apparatus were as follows: Except for the change, a magnesium silicide doped with Sb was obtained in the same manner as in Example 1.
Sintering temperature: 850 ° C
Pressure: 30.0 MPa
Temperature rising rate: 300 ° C./min×2 min (˜600 ° C.)
100 ° C./min×2 min (600 to 800 ° C.)
10 ° C / min × 5min (800-850 ° C)
0 ° C / min × 5min (850 ° C)
Cooling conditions: Vacuum cooling Atmosphere: Ar 60 Pa (vacuum when cooling)
<評価1>
実施例1〜6のマグネシウムシリサイドの焼結体について、光学顕微鏡等による観察を以下の方法で行った。
<
About the sintered body of the magnesium silicide of Examples 1-6, observation with an optical microscope etc. was performed with the following method.
ワイヤーソーCS−203(ムサシノ電子)を用いて、焼結体を直径に沿って切断した。切断された焼結体の上記断面を、自動研磨機MA−150(ムサシノ電子)を用いて鏡面加工し、加工面を光学顕微鏡で観察した(倍率200倍)。
The sintered body was cut along the diameter using a wire saw CS-203 (Musashino Electronics). The cross section of the cut sintered body was mirror-finished using an automatic polishing machine MA-150 (Musashino Electronics), and the processed surface was observed with an optical microscope (
上記光学顕微鏡による観察で確認されたMg2Siではない部分を電子線マイクロアナライザーで分析し、マグネシウムシリサイドがドーパントを含有していることを確認した。また、Mg2Siではない部分には未反応のSi、微量のAlが含まれていた。
The optical microscope according to the
<評価2>
実施例1〜6、参考例1のマグネシウムシリサイドの焼結体について、ゼーベック係数、電気伝導率の測定を、ゼーベック係数測定装置(ULVAC−RIKO ZEM−2)を用いて、以下の方法で行った。
<
For the sintered bodies of magnesium silicide of Examples 1 to 6 and Reference Example 1, the measurement of Seebeck coefficient and electrical conductivity was performed by the following method using a Seebeck coefficient measuring apparatus (ULVAC-RIKO ZEM-2). .
各焼結体から厚さ2mm、高さ8mm、幅2mmの試料を切り出した。試料の上端及び下端をニッケル電極で挟み込み、横から温度差測定用熱電対(プローブ)を接触させた。測定温度は50℃から600℃までとし、50℃刻みで測定を行った。また、測定雰囲気はHe雰囲気とし、電極間の温度差は30℃に調整した。 A sample having a thickness of 2 mm, a height of 8 mm, and a width of 2 mm was cut out from each sintered body. The upper and lower ends of the sample were sandwiched between nickel electrodes, and a temperature difference measuring thermocouple (probe) was contacted from the side. The measurement temperature was 50 ° C. to 600 ° C., and the measurement was performed in increments of 50 ° C. The measurement atmosphere was a He atmosphere, and the temperature difference between the electrodes was adjusted to 30 ° C.
試料と試料に接触している各プローブとの間に発生する熱起電力と温度を読み取り、このプローブ間の起電力差をその温度差で割ることでゼーベック係数を算出した。結果を図6に示した。 The Seebeck coefficient was calculated by reading the thermoelectromotive force and temperature generated between the sample and each probe in contact with the sample, and dividing the electromotive force difference between the probes by the temperature difference. The results are shown in FIG.
図6の結果から、ドーパントとしてCo、Nb、Nd、Sm、Ta及びZnを含むマグネシウムシリサイドの焼結体は、ドーパントとしてSbを含むマグネシウムシリサイドの焼結体と比較して、ゼーベック係数の絶対値が高いことが確認された。 From the result of FIG. 6, the sintered body of magnesium silicide containing Co, Nb, Nd, Sm, Ta and Zn as dopants has an absolute value of Seebeck coefficient compared to the sintered body of magnesium silicide containing Sb as dopants. Was confirmed to be high.
上下電極とプローブを用いた四端子法によって抵抗値を測定し、プローブ間の距離と試料の断面積から抵抗率を算出し、その逆数から電気伝導率を算出した。結果を図7に示した。 The resistance value was measured by the four probe method using the upper and lower electrodes and the probe, the resistivity was calculated from the distance between the probes and the cross-sectional area of the sample, and the electrical conductivity was calculated from the reciprocal thereof. The results are shown in FIG.
図7の結果から、ドーパントとしてCo、Nb、Nd、Sm、Ta及びZnを含むマグネシウムシリサイドの焼結体の中で、Taを含むマグネシウムシリサイドの焼結体は電気伝導率を高める効果が高いことが確認された。 From the result of FIG. 7, among the sintered bodies of magnesium silicide containing Co, Nb, Nd, Sm, Ta and Zn as dopants, the sintered body of magnesium silicide containing Ta has a high effect of increasing electrical conductivity. Was confirmed.
上記のようにして導出したゼーベック係数と電気伝導率とからパワーファクター(PF)を算出した。結果を図8に示した。 The power factor (PF) was calculated from the Seebeck coefficient derived as described above and the electrical conductivity. The results are shown in FIG.
図8の結果から、ドーパントとしてTaを含むマグネシウムシリサイドの焼結体は、パワーファクターが高いことが確認された。 From the result of FIG. 8, it was confirmed that the sintered body of magnesium silicide containing Ta as a dopant has a high power factor.
<評価3>
実施例1〜6、参考例1のマグネシウムシリサイドの焼結体について、熱伝導率の測定を、レーザーフラッシュ法熱伝導率測定装置(アルバック理工社製、「TC・7000H」)を用いて、以下の方法で行った。
<
For the sintered bodies of magnesium silicide of Examples 1 to 6 and Reference Example 1, the thermal conductivity was measured using a laser flash method thermal conductivity measuring device (“TC / 7000H” manufactured by ULVAC-RIKO, Inc.) as follows. It was done by the method.
各焼結体から高さ2mm、縦8mm、横2mmの試料を切り出した。試料の表面を軽く研磨し、8mm×8mmの一方の面に銀ペーストを用いて、R熱電対を試料の隅に接着した。 A sample having a height of 2 mm, a length of 8 mm, and a width of 2 mm was cut out from each sintered body. The surface of the sample was lightly polished, and an R thermocouple was adhered to the corner of the sample using silver paste on one side of 8 mm × 8 mm.
先ず、比熱が既知の標準サンプル(サファイア)を用いて吸収熱量を測定した。続いて、サファイアの取り外し、上記試料をセットして吸収熱量を測定した。 First, the amount of absorbed heat was measured using a standard sample (sapphire) with a known specific heat. Subsequently, sapphire was removed, the sample was set, and the amount of heat absorbed was measured.
熱拡散率測定のために、R熱電対を有する一方の面にはグラファイトスプレーによる黒化処理を均一に行った。なお、黒化処理の際、銀ペーストにグラファイトスプレーがかからないようにマスキングをした。 In order to measure the thermal diffusivity, the one surface having the R thermocouple was uniformly blackened with graphite spray. In the blackening treatment, masking was performed so that the silver paste was not exposed to graphite spray.
熱拡散率を50℃、100℃、200℃、300℃から600℃まで50℃刻みで測定し、熱拡散率、比熱、密度から熱伝導率を求めた。結果を図9に示した。 The thermal diffusivity was measured in increments of 50 ° C. from 50 ° C., 100 ° C., 200 ° C., and 300 ° C. to 600 ° C., and the thermal conductivity was determined from the thermal diffusivity, specific heat, and density. The results are shown in FIG.
図9の結果から、ドーパントとしてCo、Nb、Nd、Sm、Ta及びZnを含むマグネシウムシリサイドの焼結体の中で、Znを含むマグネシウムシリサイドの焼結体は熱伝導率を高める効果が高いことが確認された。 From the result of FIG. 9, among the sintered bodies of magnesium silicide containing Co, Nb, Nd, Sm, Ta and Zn as dopants, the sintered body of magnesium silicide containing Zn has a high effect of increasing the thermal conductivity. Was confirmed.
<評価4>
上記のゼーベック係数、電気伝導率、熱伝導率を用いて、無次元性能指数(ZT)を算出した。結果を図10に示した。
<
A dimensionless figure of merit (ZT) was calculated using the Seebeck coefficient, electrical conductivity, and thermal conductivity. The results are shown in FIG.
図10の結果から、ドーパントとしてCo、Nb、Nd、Sm、Ta及びZnを含むマグネシウムシリサイドの焼結体は、ドーパントとしてSbを含む焼結体と比較して、やや無次元性能指数が低いことが確認された。 From the result of FIG. 10, the sintered body of magnesium silicide containing Co, Nb, Nd, Sm, Ta and Zn as dopants has a slightly lower dimensionless figure of merit than the sintered body containing Sb as dopants. Was confirmed.
<評価5>
実施例2〜6、参考例1のマグネシウムシリサイドの焼結体について、高温耐久性を以下の方法で評価した。
<Evaluation 5>
The sintered bodies of magnesium silicide of Examples 2 to 6 and Reference Example 1 were evaluated for high-temperature durability by the following method.
各焼結体から、10mm×10mm×2mmの試料を切り出し、この試料の10mm×10mmの面積の面の一方に対して、自動研磨機MA−150(ムサシノ電気株式会社製)で処理を行い、この面の酸化膜を取り除いた。 A 10 mm × 10 mm × 2 mm sample was cut out from each sintered body, and one of the surfaces of the 10 mm × 10 mm area of this sample was processed with an automatic polishing machine MA-150 (Musashino Electric Co., Ltd.) The oxide film on this surface was removed.
次いで、酸化膜が取り除かれた面を測定面とし、四端子測定装置K−503RS(株式会社共和理研製)を用いて、試料の抵抗を測定した。ここで、測定面に接触する4本のプローブの間隔は1mmとした。測定の際の電流の条件は30mAまでとした。 Next, the surface from which the oxide film was removed was taken as a measurement surface, and the resistance of the sample was measured using a four-terminal measuring device K-503RS (manufactured by Kyowa Riken Co., Ltd.). Here, the interval between the four probes in contact with the measurement surface was 1 mm. The current condition during measurement was up to 30 mA.
上記のようにして導出した抵抗値に補正係数を掛けることで、抵抗率を算出した。補正係数はw×C×Fで表され、wは試料の厚み、Cは4.2209(測定面が10mm×10mm、プローブの間隔が1mmから導出)である。また、Fと厚み/プローブ間隔との関係を表1に示した。
抵抗率を算出した後、大気中、600℃に保った環状炉に試料を入れた。1時間経過後、環状炉から試料を取り出し、測定面を研磨して、上記と同様の方法で抵抗率を導出した。5時間経過後、10時間経過後、50時間経過後、100時間経過後についても同様に、抵抗率の導出を行った。なお、抵抗率の導出にあたっては測定面の研磨を行うため、試料の厚みが薄くなるので、表1に記載の補正係数を使用した。抵抗率評価結果を図11に示した。 After calculating the resistivity, the sample was put in an annular furnace maintained at 600 ° C. in the atmosphere. After 1 hour, the sample was taken out from the annular furnace, the measurement surface was polished, and the resistivity was derived in the same manner as described above. Similarly, the resistivity was derived after 5 hours, 10 hours, 50 hours, and 100 hours. In addition, since the thickness of the sample is reduced because the measurement surface is polished in deriving the resistivity, the correction coefficient shown in Table 1 was used. The resistivity evaluation results are shown in FIG.
図11の結果から、ドーパントとしてNb、Nd、Sm、Ta及びZnを含むマグネシウムシリサイドの焼結体は、ドーパントとしてSbを含む焼結体と同等の高温耐久性を有することが確認された。 From the result of FIG. 11, it was confirmed that the sintered body of magnesium silicide containing Nb, Nd, Sm, Ta and Zn as dopants has high temperature durability equivalent to the sintered body containing Sb as dopants.
101 n型熱電変換部
1015,1016 電極
102 p型熱電変換部
1025,1026 電極
103 n型熱電変換部
1035,1036 電極
3 負荷
4 直流電源
10 グラファイトダイ
11a,11b グラファイト製パンチ
101 n-type
Claims (7)
前記熱電変換部が請求項5に記載の熱電変換素子用焼結体を用いて製造される熱電変換素子。 A thermoelectric converter, and a first electrode and a second electrode provided in the thermoelectric converter,
The thermoelectric conversion element with which the said thermoelectric conversion part is manufactured using the sintered compact for thermoelectric conversion elements of Claim 5.
A thermoelectric conversion module comprising the thermoelectric conversion element according to claim 6.
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JP2016122685A (en) * | 2014-12-24 | 2016-07-07 | 古河機械金属株式会社 | Method for manufacturing thermoelectric conversion material |
JPWO2014084163A1 (en) * | 2012-11-27 | 2017-01-05 | 学校法人東京理科大学 | Mg-Si-based thermoelectric conversion material and manufacturing method thereof, sintered body for thermoelectric conversion, thermoelectric conversion element, and thermoelectric conversion module |
JP2017191816A (en) * | 2016-04-11 | 2017-10-19 | 学校法人東京理科大学 | Conductive film-attached columnar ingot substrate, method for manufacturing the same, silicide-based thermoelectric conversion element, method for manufacturing the same, thermoelectric conversion module, and composition for forming electrode layer of silicide-based thermoelectric conversion element |
JP7562115B2 (en) | 2023-03-13 | 2024-10-07 | 株式会社テックスイージー | Manufacturing method of thermoelectric conversion module |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2005314805A (en) * | 2004-03-29 | 2005-11-10 | Toudai Tlo Ltd | Magnesium compound, metallic material, and method for producing magnesium compound |
JP2006128235A (en) * | 2004-10-27 | 2006-05-18 | National Institute Of Advanced Industrial & Technology | Thermoelectric material and manufacturing method thereof |
WO2011002035A1 (en) * | 2009-06-30 | 2011-01-06 | 学校法人東京理科大学 | Magnesium-silicon composite material and process for producing same, and thermoelectric conversion material, thermoelectric conversion element, and thermoelectric conversion module each comprising or including the composite material |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002285274A (en) * | 2001-03-27 | 2002-10-03 | Daido Steel Co Ltd | Mg-Si BASED THERMOELECTRIC MATERIAL AND PRODUCTION METHOD THEREFOR |
JP2005314805A (en) * | 2004-03-29 | 2005-11-10 | Toudai Tlo Ltd | Magnesium compound, metallic material, and method for producing magnesium compound |
JP2006128235A (en) * | 2004-10-27 | 2006-05-18 | National Institute Of Advanced Industrial & Technology | Thermoelectric material and manufacturing method thereof |
WO2011002035A1 (en) * | 2009-06-30 | 2011-01-06 | 学校法人東京理科大学 | Magnesium-silicon composite material and process for producing same, and thermoelectric conversion material, thermoelectric conversion element, and thermoelectric conversion module each comprising or including the composite material |
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---|---|---|---|---|
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JP2016122685A (en) * | 2014-12-24 | 2016-07-07 | 古河機械金属株式会社 | Method for manufacturing thermoelectric conversion material |
JP2017191816A (en) * | 2016-04-11 | 2017-10-19 | 学校法人東京理科大学 | Conductive film-attached columnar ingot substrate, method for manufacturing the same, silicide-based thermoelectric conversion element, method for manufacturing the same, thermoelectric conversion module, and composition for forming electrode layer of silicide-based thermoelectric conversion element |
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