JP2013056872A - Method for producing n-halogenoacetylpyrrolidine-2-carbonitrile - Google Patents

Method for producing n-halogenoacetylpyrrolidine-2-carbonitrile Download PDF

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JP2013056872A
JP2013056872A JP2011197553A JP2011197553A JP2013056872A JP 2013056872 A JP2013056872 A JP 2013056872A JP 2011197553 A JP2011197553 A JP 2011197553A JP 2011197553 A JP2011197553 A JP 2011197553A JP 2013056872 A JP2013056872 A JP 2013056872A
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carbonitrile
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Takeshi Miyata
毅 宮田
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Sanwa Kagaku Kenkyusho Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a method for producing S-N-halogenoacetylpyrrolidine-2-carbonitrile expressed by formula (2) with a small number of processes and high purity in a high yield.SOLUTION: A halogenoacetylhalide is reacted with an S-pyrrolidine-2-carbonitrile expressed by general formula (1) or its salt in the presence of a base in a mixed solvent of hydrophobic organic solvent and water, wherein n R's are equal or different, and each represents a hydrogen atom, halogen atom, lower alkyl group, or halogeno-lower alkyl group, and n denotes a number of from 1 to 3.

Description

本発明は、医薬品の製造中間体として有用なS−N−ハロゲノアセチルピロリジン−2−カルボニトリルの製造法に関する。   The present invention relates to a process for producing S—N-halogenoacetylpyrrolidine-2-carbonitrile which is useful as a pharmaceutical production intermediate.

ジペプチジルペプチダーゼIV(DPP−IV)阻害剤は、インスリン分泌促進ホルモンであるGLP−1の分解を抑制し、GLP−1の作用を強めることから、インスリン抵抗性であるII型糖尿病の治療薬として重要である。かかるDPP−IV阻害剤の中には、その構造中にN−アセチルピロリジン−2−カルボニトリル構造を有するものが多い(特許文献1〜3)。   A dipeptidyl peptidase IV (DPP-IV) inhibitor suppresses the degradation of GLP-1 which is an insulin secretagogue hormone and enhances the action of GLP-1, so that it is a therapeutic agent for type II diabetes that is insulin resistant. is important. Many of such DPP-IV inhibitors have an N-acetylpyrrolidine-2-carbonitrile structure in their structure (Patent Documents 1 to 3).

これらのDPP−IV阻害剤の製造にあたっては、N−ハロゲノアセチルピロリジン−2−カルボニトリルを経由することが多いことから、当該化合物は多くのDPP−IV阻害剤の製造中間体として重要である。当該N−ハロゲノアセチルピロリジン−2−カルボニトリルの製造法としては、(1)ピロリジン−2−カルボキサミドを原料として用い、トリエチルアミン及びジメチルアミノピリジンの存在下、この原料にハロゲノアセチルハライドを反応させて、N−ハロゲノアセチルピロリジン−2−カルボキサミドを得、次いで当該カルボキサミドを、トリフルオロ酢酸無水物を用いてニトリルに変換する方法(特許文献1及び2)、(2)ピロリジン−2−カルボニトリルを原料して用い、N,N−ジイソプロピルエチルアミン又はトリエチルアミンの存在下、塩化メチレン中で、この原料にハロゲノアセチルハライドを反応させる方法(特許文献3)が知られている。   In the production of these DPP-IV inhibitors, N-halogenoacetylpyrrolidine-2-carbonitrile is often used, so that the compound is important as an intermediate for the production of many DPP-IV inhibitors. As a method for producing the N-halogenoacetylpyrrolidine-2-carbonitrile, (1) using pyrrolidine-2-carboxamide as a raw material, this raw material is reacted with a halogenoacetyl halide in the presence of triethylamine and dimethylaminopyridine, N-halogenoacetylpyrrolidine-2-carboxamide was obtained, and then the carboxamide was converted to nitrile using trifluoroacetic anhydride (Patent Documents 1 and 2). (2) Pyrrolidine-2-carbonitrile was used as a raw material. And a method of reacting this raw material with a halogenoacetyl halide in methylene chloride in the presence of N, N-diisopropylethylamine or triethylamine (Patent Document 3).

国際公開 WO98/19998号パンフレットInternational Publication WO98 / 19998 Pamphlet 国際公開 WO2004/067509号パンフレットInternational Publication WO2004 / 067509 Pamphlet 国際公開 WO2003/002553号パンフレットInternational Publication WO2003 / 002553 Pamphlet

しかしながら、前記(1)の方法では、原料としてピロリジン−2−カルボキサミドを用いることから、工程数が多く、結果として収率が低くなるという問題がある。一方、前記(2)の方法では、原料としてピロリジン−2−カルボニトリルを用いるため工程数が少ないものの、反応の制御が困難であり、得られる生成物中には不純物が多く含まれてしまうという問題がある。
従って、本発明の課題は、工程数が少なく、かつ高純度のN−ハロゲノアセチルピロリジン−2−カルボニトリルを高収率で製造する方法を提供することにある。
However, in the method (1), since pyrrolidine-2-carboxamide is used as a raw material, there is a problem that the number of steps is large, resulting in a low yield. On the other hand, in the method (2), although pyrrolidine-2-carbonitrile is used as a raw material, the number of steps is small, but the reaction is difficult to control, and the resulting product contains a lot of impurities. There's a problem.
Accordingly, an object of the present invention is to provide a method for producing high-purity N-halogenoacetylpyrrolidine-2-carbonitrile with a small number of steps and high purity.

そこで本発明者は、ピロリジン−2−カルボニトリルを原料として用いる方法について検討したところ、ハロゲノアセチルハライドは加水分解を受けやすく、含水溶媒系で反応を行うことは困難と考えられていたところ、疎水性有機溶媒と少量の水との混合溶媒中で反応を行えば、全く意外にもハロゲノアセチルハライドの分解は概ね抑制され、生成物が疎水性有機溶媒中に移行することで、高純度かつ高収率でN−ハロゲノアセチルピロリジン−2−カルボニトリルが得られ、精製工程が容易であり、工業的に有利であることを見出し、本発明を完成した。   Therefore, the present inventor examined a method using pyrrolidine-2-carbonitrile as a raw material, and halogenoacetyl halide was susceptible to hydrolysis, and it was considered difficult to carry out the reaction in a hydrous solvent system. If the reaction is carried out in a mixed solvent of a basic organic solvent and a small amount of water, the decomposition of the halogenoacetyl halide is almost completely suppressed, and the product migrates into the hydrophobic organic solvent. N-halogenoacetylpyrrolidine-2-carbonitrile was obtained in a yield, and the purification process was easy and found to be industrially advantageous, and the present invention was completed.

すなわち、本発明は、一般式(1)   That is, the present invention relates to the general formula (1)

Figure 2013056872
Figure 2013056872

(式中、n個のR1は同一又は異なって水素原子、ハロゲン原子、低級アルキル基、又はハロゲノ低級アルキル基を示し、nは1〜3の数を示す)
で表されるS−ピロリジン−2−カルボニトリル類又はその塩に、疎水性有機溶媒と水の混合溶媒中、塩基の存在下、ハロゲノアセチルハライドを反応させることを特徴とする一般式(2)
(In the formula, n R 1 s are the same or different and each represents a hydrogen atom, a halogen atom, a lower alkyl group, or a halogeno lower alkyl group, and n represents a number of 1 to 3)
A halogenoacetyl halide in the presence of a base in a mixed solvent of a hydrophobic organic solvent and water with the S-pyrrolidine-2-carbonitrile represented by the general formula (2)

Figure 2013056872
Figure 2013056872

(式中、Xはハロゲン原子を示し、R1及びnは前記と同じ)
で表されるS−N−ハロゲノアセチルピロリジン−2−カルボニトリルの製造法を提供するものである。
(Wherein X represents a halogen atom, R 1 and n are the same as above)
A method for producing S—N-halogenoacetylpyrrolidine-2-carbonitrile represented by the formula:

本発明方法によれば、医薬品の製造中間体として有用な高純度のS−N−ハロゲノアセチルピロリジン−2−カルボニトリルが、少ない工程数で、高収率で得られる。また、反応終了後の目的物の単離操作が簡便であり、煩雑な後処理を必要としないこと、また反応系がクリアであり溶剤の回収が容易であることから工業的にも有利である。   According to the method of the present invention, high-purity S—N-halogenoacetylpyrrolidine-2-carbonitrile useful as a pharmaceutical intermediate can be obtained with a small number of steps and in a high yield. In addition, the isolation of the target product after completion of the reaction is simple and does not require complicated post-treatment, and the reaction system is clear and the solvent can be easily recovered, which is industrially advantageous. .

一般式(1)及び(2)中のn個のR1は、同一又は異なって水素原子、ハロゲン原子、低級アルキル基又はハロゲノ低級アルキル基を示す。ここでハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられるが、フッ素原子が好ましい。低級アルキル基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基等の炭素数1〜6のアルキル基が挙げられ、このうち炭素数1〜4のアルキル基がより好ましい。ハロゲノ低級アルキル基としては、ハロゲノC1−C6アルキル基が挙げられ、ハロゲノC1−C4アルキル基がより好ましく、具体的にはトリクロロメチル基、トリフルオロメチル基、トリブロモメチル基等が挙げられる。 In the general formulas (1) and (2), n R 1 s are the same or different and each represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogeno lower alkyl group. Here, examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is preferable. Examples of the lower alkyl group include an alkyl group having 1 to 6 carbon atoms such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and an n-butyl group, and among these, an alkyl group having 1 to 4 carbon atoms is more preferable. preferable. The halogeno lower alkyl group includes a halogeno C 1 -C 6 alkyl group, more preferably a halogeno C 1 -C 4 alkyl group, specifically, a trichloromethyl group, a trifluoromethyl group, a tribromomethyl group, and the like. Can be mentioned.

一般式(1)及び(2)中のnとしては、1〜3の数が挙げられるが、1又は2がより好ましい。   As n in general formula (1) and (2), the number of 1-3 is mentioned, However, 1 or 2 is more preferable.

上記一般式(1)及び(2)中のR1としては、水素原子、フッ素原子、C1−C4アルキル基又はハロゲノC1−C4アルキル基が好ましく、さらに水素原子又はフッ素原子がより好ましく、水素原子が特に好ましい。 R 1 in the general formulas (1) and (2) is preferably a hydrogen atom, a fluorine atom, a C 1 -C 4 alkyl group or a halogeno C 1 -C 4 alkyl group, and more preferably a hydrogen atom or a fluorine atom. Preferably, a hydrogen atom is particularly preferable.

S−ピロリジン−2−カルボニトリル類の塩としては、塩酸、硫酸、硝酸等の無機酸塩、酢酸、トリフルオロ酢酸、トリクロロ酢酸、メタンスルホン酸、p−トルエンスルホン酸、酒石酸、カンファースルホン酸等の有機酸塩が挙げられるが、無機酸塩が好ましく、特に塩酸塩が好ましい。   As salts of S-pyrrolidine-2-carbonitrile, inorganic acid salts such as hydrochloric acid, sulfuric acid, nitric acid, acetic acid, trifluoroacetic acid, trichloroacetic acid, methanesulfonic acid, p-toluenesulfonic acid, tartaric acid, camphorsulfonic acid, etc. The organic acid salt is preferably an inorganic acid salt, particularly preferably a hydrochloride.

本発明方法に用いられるハロゲノアセチルハライドとしては、クロロアセチルクロリド、ブロモアセチルブロミドが挙げられる。   Examples of the halogenoacetyl halide used in the method of the present invention include chloroacetyl chloride and bromoacetyl bromide.

本発明の反応は、疎水性有機溶媒と水との混合溶媒中で行われる。疎水性有機溶媒としては、水と相互に混じり合わない有機溶媒であればよく、例えば酢酸アルキル等のエステル系溶媒、ベンゼン、トルエン、キシレン等の芳香族炭化水素系溶媒が挙げられる。これらの有機溶媒は、塩化メチレンのように塩素原子を含有しないため安全性、環境への影響、腐食性等から、好ましい。このうち、酢酸アルキルがより好ましく、酢酸メチル、酢酸エチル、酢酸n−プロピルまたは酢酸イソプロピルがさらに好ましく、酢酸エチルが特に好ましい。   The reaction of the present invention is carried out in a mixed solvent of a hydrophobic organic solvent and water. The hydrophobic organic solvent may be an organic solvent that does not mix with water, and examples thereof include ester solvents such as alkyl acetate and aromatic hydrocarbon solvents such as benzene, toluene, and xylene. Since these organic solvents do not contain a chlorine atom like methylene chloride, they are preferable from the viewpoints of safety, environmental impact, corrosiveness, and the like. Among these, alkyl acetate is more preferable, methyl acetate, ethyl acetate, n-propyl acetate or isopropyl acetate is more preferable, and ethyl acetate is particularly preferable.

前記混合溶媒における疎水性有機溶媒(A)と水(B)との混合容量比(A:B)は、100:1〜100:20であるのが好ましく、100:2〜100:10がより好ましく、100:5〜100:10が特に好ましい。水の量が多すぎる場合には、原料であるハロゲノアセチルハライドの加水分解が進行してしまう。一方、有機溶媒のみでは、反応の制御が困難であり、副反応も生じてしまう傾向がある。本発明においては、ハロゲノアセチルハライドが有機溶媒層に存在し、当該ハロゲノアセチルハライドが、原料である式(1)の化合物と塩基を含む少量の水層に移行した瞬間に反応が進行し、生成した式(2)の化合物は有機溶媒層に移るため、副反応が抑制されるものと考えられる。   The mixing volume ratio (A: B) of the hydrophobic organic solvent (A) and water (B) in the mixed solvent is preferably 100: 1 to 100: 20, more preferably 100: 2 to 100: 10. Preferably, 100: 5 to 100: 10 is particularly preferable. If the amount of water is too large, hydrolysis of the raw material halogenoacetyl halide proceeds. On the other hand, with only an organic solvent, it is difficult to control the reaction and a side reaction tends to occur. In the present invention, the halogenoacetyl halide is present in the organic solvent layer, and the reaction proceeds at the moment when the halogenoacetyl halide is transferred to a small amount of the aqueous layer containing the compound of formula (1) and the base as raw materials. Since the compound of formula (2) is transferred to the organic solvent layer, it is considered that side reactions are suppressed.

本発明に用いられる塩基としては、水層中に存在させる点から無機塩基が好ましく、さらに炭酸アルカリ又は炭酸水素アルカリが好ましい。より具体的な塩基としては、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウムが挙げられる。   The base used in the present invention is preferably an inorganic base from the viewpoint of being present in the aqueous layer, and more preferably an alkali carbonate or an alkali hydrogen carbonate. More specific examples of the base include sodium carbonate, potassium carbonate, sodium hydrogen carbonate, and potassium hydrogen carbonate.

反応に際して、式(1)の化合物とハロゲノアセチルハライドの使用量は、式(1)の化合物1モルに対してハロゲノアセチルハライドは1.2〜2.5モルが好ましく、1.5〜2.0モルがより好ましい。前記混合溶媒の使用量は、式(1)の化合物の1質量部に対して5〜15容量/質量倍が好ましく、8〜12容量/質量倍がより好ましい。また塩基の使用量は、式(1)の化合物1モルに対して1.2〜2.0モルが好ましく、1.6〜1.8モルがより好ましい。   In the reaction, the amount of the compound of formula (1) and the halogenoacetyl halide used is preferably 1.2 to 2.5 moles of halogenoacetyl halide with respect to 1 mole of the compound of formula (1). 0 mole is more preferred. The amount of the mixed solvent used is preferably 5 to 15 volumes / mass times, more preferably 8 to 12 volumes / mass times based on 1 part by mass of the compound of the formula (1). The amount of the base used is preferably 1.2 to 2.0 mol, more preferably 1.6 to 1.8 mol, relative to 1 mol of the compound of the formula (1).

反応温度は、反応の進行と副反応防止の点から0〜40℃が好ましく、0〜10℃がより好ましい。また、反応時間は1〜24時間が好ましく、1〜5時間がより好ましい。なお、塩基は、粉末状のものを使用してもよいが、水溶液として用いてもよい。   The reaction temperature is preferably 0 to 40 ° C., more preferably 0 to 10 ° C. from the viewpoint of the progress of the reaction and the prevention of side reactions. The reaction time is preferably 1 to 24 hours, more preferably 1 to 5 hours. In addition, although a powdery base may be used, it may be used as an aqueous solution.

反応終了後、式(2)の化合物を反応混合物から単離するには、有機溶媒に対し6割程度の水を加え、有機層を分離した後濃縮することにより、あるいは有機層にn−へキサンやn−ヘプタン等の貧溶媒を適量加えることにより、目的物を晶析採取するのが好ましい。   In order to isolate the compound of formula (2) from the reaction mixture after completion of the reaction, about 60% of water is added to the organic solvent, and the organic layer is separated and concentrated, or the organic layer is converted to n-. It is preferable to crystallize and collect the target product by adding an appropriate amount of a poor solvent such as xanthan or n-heptane.

得られた式(2)の化合物は、純度が高いので、医薬品の製造中間体として特に有用である。   The resulting compound of formula (2) is particularly useful as an intermediate for the production of pharmaceuticals because of its high purity.

次に実施例を挙げて本発明を詳細に説明する。   EXAMPLES Next, an Example is given and this invention is demonstrated in detail.

実施例1〜4及び比較例1
S−ピロリジン−2−カルボニトリル塩酸塩1g(7.54mmol)及びクロロアセチルクロリド1.70g(15.1mmol)を酢酸エチル10mLに加えて撹拌した。この懸濁液を5℃に冷却しながら、炭酸カリウム1.67g(12.1mmol)及び水0.1〜2mLを添加した。3〜18時間撹拌した後、水5.5mLを加えて反応を終結させ、有機層と水層を分離した。
逆相HPLC法により、水層及び有機層中のS−N−クロロアセチルピロリジン−2−カルボニトリル量を定量し、合計量を収率とした。
得られた結果を表1に示す。
Examples 1 to 4 and Comparative Example 1
1 g (7.54 mmol) of S-pyrrolidine-2-carbonitrile hydrochloride and 1.70 g (15.1 mmol) of chloroacetyl chloride were added to 10 mL of ethyl acetate and stirred. While this suspension was cooled to 5 ° C., 1.67 g (12.1 mmol) of potassium carbonate and 0.1 to 2 mL of water were added. After stirring for 3 to 18 hours, 5.5 mL of water was added to terminate the reaction, and the organic layer and the aqueous layer were separated.
The amount of S—N-chloroacetylpyrrolidine-2-carbonitrile in the aqueous layer and the organic layer was quantified by the reverse phase HPLC method, and the total amount was taken as the yield.
The obtained results are shown in Table 1.

Figure 2013056872
Figure 2013056872

表1から明らかなように、水を添加せず疎水性有機溶媒だけで反応させた場合に比べて、疎水性有機溶媒に水を加えて混合溶媒として反応を行うと収率が向上することがわかる。また水の添加量は酢酸エチルに対して1〜20%(対酢酸エチル容量比、以下同様)が良好であり、5〜10%が特に良好である。   As is apparent from Table 1, the yield is improved when water is added to the hydrophobic organic solvent and the reaction is carried out as a mixed solvent, compared to the case where the reaction is carried out using only the hydrophobic organic solvent without adding water. Recognize. The amount of water added is preferably 1 to 20% with respect to ethyl acetate (volume ratio to ethyl acetate, the same applies hereinafter), and 5 to 10% is particularly good.

実施例5〜9
水の添加量を酢酸エチルに対して5%に固定し、炭酸カリウムの添加量を変化させる以外は、実施例1〜4と同様に反応を行った。その結果を表2に示す。
Examples 5-9
The reaction was carried out in the same manner as in Examples 1 to 4 except that the amount of water added was fixed at 5% with respect to ethyl acetate and the amount of potassium carbonate added was changed. The results are shown in Table 2.

Figure 2013056872
Figure 2013056872

表2から明らかように、炭酸カリウムの添加量は式(1)の化合物1モルに対して1.2〜2.0モルでもよいが、1.6〜1.8モルが良好であることがわかる。   As is apparent from Table 2, the amount of potassium carbonate added may be 1.2 to 2.0 mol per mol of the compound of formula (1), but 1.6 to 1.8 mol is good. Recognize.

Claims (5)

一般式(1)
Figure 2013056872
(式中、n個のR1は同一又は異なって水素原子、ハロゲン原子、低級アルキル基、又はハロゲノ低級アルキル基を示し、nは1〜3の数を示す)
で表されるS−ピロリジン−2−カルボニトリル類又はその塩に、疎水性有機溶媒と水の混合溶媒中、塩基の存在下、ハロゲノアセチルハライドを反応させることを特徴とする一般式(2)
Figure 2013056872
(式中、Xはハロゲン原子を示し、R1及びnは前記と同じ)
で表されるS−N−ハロゲノアセチルピロリジン−2−カルボニトリルの製造法。
General formula (1)
Figure 2013056872
(In the formula, n R 1 s are the same or different and each represents a hydrogen atom, a halogen atom, a lower alkyl group, or a halogeno lower alkyl group, and n represents a number of 1 to 3)
A halogenoacetyl halide in the presence of a base in a mixed solvent of a hydrophobic organic solvent and water with the S-pyrrolidine-2-carbonitrile represented by the general formula (2)
Figure 2013056872
(Wherein X represents a halogen atom, R 1 and n are the same as above)
A process for producing SN-halogenoacetylpyrrolidine-2-carbonitrile represented by the formula:
混合溶媒が、疎水性有機溶媒(A)と水(B)の混合容量比(A:B)が100:1〜100:20の混合溶媒である請求項1記載の製造法。   The process according to claim 1, wherein the mixed solvent is a mixed solvent having a mixing volume ratio (A: B) of the hydrophobic organic solvent (A) and water (B) of 100: 1 to 100: 20. 混合溶媒が、疎水性有機溶媒(A)と水(B)の混合容量比(A:B)が100:5〜100:10の混合溶媒である請求項1又は2記載の製造法。   The process according to claim 1 or 2, wherein the mixed solvent is a mixed solvent having a mixing volume ratio (A: B) of the hydrophobic organic solvent (A) and water (B) of 100: 5 to 100: 10. 疎水性有機溶媒が、酢酸アルキル、ベンゼン、キシレン及びトルエンから選ばれる1種又は2種以上である請求項1〜3のいずれか1項記載の製造法。   The manufacturing method according to any one of claims 1 to 3, wherein the hydrophobic organic solvent is one or more selected from alkyl acetate, benzene, xylene and toluene. 塩基が、炭酸アルカリ又は炭酸水素アルカリである請求項1〜4のいずれか1項記載の製造法。   The production method according to any one of claims 1 to 4, wherein the base is an alkali carbonate or an alkali hydrogen carbonate.
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