JP2013024982A - Wire grid polarizer and method for manufacturing the same - Google Patents
Wire grid polarizer and method for manufacturing the same Download PDFInfo
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本発明は、ワイヤーグリッド偏光子及びその製造方法に係り、赤外線領域で作動するワイヤーグリッド偏光子及びその製造方法に係る。 The present invention relates to a wire grid polarizer and a manufacturing method thereof, and more particularly to a wire grid polarizer operating in an infrared region and a manufacturing method thereof.
近年のフォトリソグラフィー技術の発達により、光の波長レベルのピッチを有する微細構造パターンを形成することができるようになってきた。このように、非常に小さいピッチのパターンを有する部材、製品等は、半導体分野だけでなく、光学分野においても活用されているため、利用範囲が広く有用である。 With the recent development of photolithography technology, it has become possible to form a fine structure pattern having a pitch at the wavelength level of light. As described above, since members, products, and the like having a very small pitch pattern are used not only in the semiconductor field but also in the optical field, the range of use is wide and useful.
例えば、金属等で構成された導電体線が特定のピッチで格子状に配列しているワイヤーグリッドは、そのピッチが入射光の波長（例えば、赤外光の波長１〜３０μｍ）に比べてかなり小さいピッチ（例えば、２分の１以下）であれば、導電体線に対して垂直な電場スペクトル成分の光をほとんど透過させるため、単一偏光を作り出す偏光子として使用できる。このワイヤーグリッド偏光子は、透過しない光を反射して再利用できるので、光の利用効率の観点からも望ましいものである。 For example, a wire grid in which conductor wires made of metal or the like are arranged in a grid pattern at a specific pitch is considerably larger than the wavelength of incident light (for example, infrared light wavelength 1 to 30 μm). If the pitch is small (for example, half or less), light of an electric field spectral component perpendicular to the conductor line is almost transmitted, so that it can be used as a polarizer that generates a single polarized light. This wire grid polarizer can be reused by reflecting light that does not pass through it, which is also desirable from the viewpoint of light utilization efficiency.
このようなワイヤーグリッド偏光子としては、例えば、特許文献１に開示されているものが挙げられる。このワイヤーグリッド偏光子は、入射光の波長より小さいグリッド周期で間隔が置かれた金属ワイヤーを備えている。このワイヤーグリッド偏光子は、電場成分が金属線と平行な偏光成分（ＴＥ波）を反射し、金属線と垂直な偏光成分（ＴＭ波）を透過する偏光特性を有し、ビームスプリッタとして多く使用されている。 Examples of such a wire grid polarizer include those disclosed in Patent Document 1. The wire grid polarizer includes metal wires spaced at a grid period smaller than the wavelength of incident light. This wire grid polarizer has a polarization characteristic that the electric field component reflects the polarization component (TE wave) parallel to the metal wire and transmits the polarization component (TM wave) perpendicular to the metal wire, and is often used as a beam splitter. Has been.
このようなワイヤーグリッド偏光子において、金属線の形状と光学形状との関係が示されており、金属線の断面積が増加すると、消光比が増加すること、更に周期幅に対する所定の幅以上の金属線では透過率が減少することが分かっている（特許文献２）。また、金属線の長手方向に直行する断面形状がテーパー形状であると、広い帯域において透過率、偏光度の波長分散性が少なく、高消光比特性を示すことも分かっている（特許文献３）。 In such a wire grid polarizer, the relationship between the shape of the metal wire and the optical shape is shown, and when the cross-sectional area of the metal wire increases, the extinction ratio increases, and more than a predetermined width with respect to the period width. It has been found that the transmittance decreases with a metal wire (Patent Document 2). Further, it is also known that when the cross-sectional shape perpendicular to the longitudinal direction of the metal wire is a tapered shape, the wavelength dispersion of the transmittance and the polarization degree is small in a wide band and high extinction ratio characteristics are exhibited (Patent Document 3). .
上記のようなワイヤーグリッド偏光子は、一般にリソグラフィ方法を用いて光透過性基板の上に金属線を形成することにより製造される。前記ワイヤーグリッド偏光子の光透過性は、金属線と入射光の反射率により決定される。例えば、赤外線が、光透過性基盤に入射するとき、それぞれ空気／光透過性基板で反射損失が発生する。したがって、前記金属線が形成された光透過性基板の反対表面に反射防止膜又は反射防止構造を形成する必要がある。しかし、この金属線の形成、並びに反射防止膜若しくは反射防止構造の形成には多大な時間と費用がかかるという問題があった。 The wire grid polarizer as described above is generally manufactured by forming a metal wire on a light-transmitting substrate using a lithography method. The light transmittance of the wire grid polarizer is determined by the reflectance of the metal wire and incident light. For example, when infrared light is incident on a light-transmitting substrate, a reflection loss occurs in each air / light-transmitting substrate. Therefore, it is necessary to form an antireflection film or an antireflection structure on the opposite surface of the light transmissive substrate on which the metal line is formed. However, the formation of the metal wire and the formation of the antireflection film or the antireflection structure have a problem that it takes a lot of time and money.
一方、時間及びコストを考慮して反射防止膜を形成しない場合には、前述したように、従来技術に係るワイヤーグリッド偏光子は、反射損失が発生するという問題があった。 On the other hand, when the antireflection film is not formed in consideration of time and cost, as described above, the wire grid polarizer according to the related art has a problem that reflection loss occurs.
そこで、本発明の目的は、赤外線域において偏光性能（消光比、偏光度、透過率）に優れたワイヤーグリッド偏光子と当該ワイヤーグリッド偏光子を容易に製造できる製造方法を提供することにある。 Then, the objective of this invention is providing the manufacturing method which can manufacture easily the wire grid polarizer which was excellent in polarization performance (extinction ratio, polarization degree, transmittance | permeability) in the infrared region, and the said wire grid polarizer.
このような目的を達成するため、本発明者らは、鋭意検討した結果、赤外線を透過し、且つ高温で軟化成型可能なカルコゲナイドガラスを用いて、特定の金属線の周期構造と、特定の周期を有する反射防止構造をそれぞれ別の面に形成させることで、上記の課題を解決したワイヤーグリッド偏光子が得られることを見出した。このような知見に基づき、さらに研究を重ね、本発明を完成させた。すなわち、本発明は、以下の項１〜１２に係るワイヤーグリッド偏光子及びその製造方法を包含する。
項１．第１表面と第２表面とを有し、且つ、カルコゲナイドガラスからなるワイヤーグリッド偏光子であって、
前記第１表面には、入射光の波長以下の周期間隔において、並行に延びる複数の金属線が形成されており、且つ、
前記第２表面には、入射光の波長以下の周期を有する反射防止構造を有する、ワイヤーグリッド偏光子。
項２．前記第１表面は、入射光の波長以下の周期間隔において、並行に延びる複数の凸状部が形成されており、且つ、該凸状部の上面から一方の側面にかけて金属が付着することで、前記複数の金属線が形成されている、項１に記載のワイヤーグリッド偏光子。
項３．前記第２表面が有する反射防止構造は、入射光の波長以下の間隔において、並行に延びる断面視三角形状、半円形状、半楕円形状又はアーチ形状の複数の溝を有することにより形成されている、項１又は２に記載のワイヤーグリッド偏光子。
項４．前記入射光が、波長１〜３０μｍの赤外光である、項１〜３のいずれかに記載のワイヤーグリッド偏光子。
項５．前記金属線が、１００〜１０００ｎｍごとに形成されている、項１〜４のいずれかに記載のワイヤーグリッド偏光子。
項６．前記反射防止構造が、１μｍ〜６μｍの周期を有する、項１〜５のいずれかに記載のワイヤーグリッド偏光子。
項７．第１表面に形成される複数の金属線は、周期に対する格子幅の比が０．３〜０．８である、項１〜６のいずれかに記載のワイヤーグリッド偏光子。
項８．前記金属線が、金、銀、アルミニウム、ニッケル、クロム、タングステン、タングステンシリサイド及び銅よりなる群から選ばれる少なくとも１種により形成されている、項１〜７のいずれかに記載のワイヤーグリッド偏光子。
項９．項１〜８のいずれかに記載のワイヤーグリッド偏光子の製造方法であって、
（１）ガラスモールド法により、カルコゲナイドガラスの片方の表面上に入射光の波長以下周期間隔において、並行に延びる複数の凸状部を形成し、さらに、反対側表面に、入射光の波長以下の周期を有する反射防止構造を形成する工程、及び
（２）前記複数の凸状部上に、所定角度傾斜方向から原子を入射させる斜め成膜により、該凸状部の上面から一方の側面にかけて金属を付着させる工程
を備える、ワイヤーグリッド偏光子の製造方法。
In order to achieve such an object, the present inventors have intensively studied, and as a result, using a chalcogenide glass that transmits infrared rays and can be softened at a high temperature, the periodic structure of a specific metal wire and a specific period It has been found that a wire grid polarizer that solves the above-described problems can be obtained by forming antireflection structures having a thickness on different surfaces. Based on such knowledge, further research was conducted and the present invention was completed. That is, this invention includes the wire grid polarizer which concerns on the following items 1-12, and its manufacturing method.
Item 1. A wire grid polarizer having a first surface and a second surface and made of chalcogenide glass,
The first surface is formed with a plurality of metal wires extending in parallel at a periodic interval equal to or less than the wavelength of incident light, and
The wire grid polarizer which has an antireflection structure which has a period below the wavelength of incident light on the 2nd surface.
Item 2. The first surface is formed with a plurality of convex portions extending in parallel at a periodic interval equal to or less than the wavelength of incident light, and the metal adheres from the upper surface to one side surface of the convex portion, Item 2. The wire grid polarizer according to Item 1, wherein the plurality of metal wires are formed.
Item 3. The antireflection structure of the second surface is formed by having a plurality of grooves having a triangular shape, a semicircular shape, a semi-elliptical shape, or an arch shape extending in parallel at intervals equal to or shorter than the wavelength of incident light. Item 3. A wire grid polarizer according to item 1 or 2.
Item 4. Item 4. The wire grid polarizer according to any one of Items 1 to 3, wherein the incident light is infrared light having a wavelength of 1 to 30 µm.
Item 5. Item 5. The wire grid polarizer according to any one of Items 1 to 4, wherein the metal wire is formed every 100 to 1000 nm.
Item 6. Item 6. The wire grid polarizer according to any one of Items 1 to 5, wherein the antireflection structure has a period of 1 μm to 6 μm.
Item 8. Item 8. The wire grid polarizer according to any one of Items 1 to 7, wherein the metal wire is formed of at least one selected from the group consisting of gold, silver, aluminum, nickel, chromium, tungsten, tungsten silicide, and copper. .
(1) By a glass mold method, a plurality of convex portions extending in parallel are formed on one surface of the chalcogenide glass at a period interval equal to or less than the wavelength of incident light, and further, on the opposite surface, the wavelength is equal to or less than the wavelength of incident light. A step of forming an antireflection structure having a period; and (2) a metal from the upper surface of the convex portion to one side surface by oblique film formation in which atoms are incident on the plurality of convex portions from a predetermined angle inclined direction. The manufacturing method of a wire grid polarizer provided with the process of attaching.
本発明のワイヤーグリッド偏光子は、金属線が形成された赤外光透過性の表面の反対表面に、反射防止構造を形成しているため、赤外線域の透過率を向上させることができる。 Since the wire grid polarizer of the present invention has an antireflection structure formed on the surface opposite to the infrared light transmitting surface on which the metal wire is formed, the transmittance in the infrared region can be improved.
また、本発明では、ガラスモールド法で片側表面に反射防止構造、反対側表面に凸状部を形成した後に、当該凸状部に、金属を斜め成膜することにより、赤外線透過率を向上させるワイヤーグリッド偏光子の製造工程を単純化できる。 Further, in the present invention, after forming an antireflection structure on one surface and a convex portion on the opposite surface by the glass mold method, the infrared transmittance is improved by forming an oblique film of metal on the convex portion. The manufacturing process of the wire grid polarizer can be simplified.
以下、本発明のワイヤーグリッド偏光子及びその製造方法について、詳細に説明する。 Hereinafter, the wire grid polarizer of this invention and its manufacturing method are demonstrated in detail.
１．ワイヤーグリッド偏光子
本発明のワイヤーグリッド偏光子は、カルコゲナイドガラスからなるものである。カルコゲナイドガラスは、入射光である赤外光を透過し、さらに、高温で軟化成型可能なため好ましい。なお、本発明で言うところの赤外光とは、波長１〜３０μｍ、特に２〜１２μｍ程度のものを言う。
1. Wire grid polarizer The wire grid polarizer of the present invention is made of chalcogenide glass. Chalcogenide glass is preferable because it transmits infrared light as incident light and can be softened and molded at a high temperature. The infrared light referred to in the present invention refers to light having a wavelength of 1 to 30 μm, particularly about 2 to 12 μm.
＜カルコゲナイドガラス＞
カルコゲナイドガラスとは、Ｓ、Ｓｅ、Ｔｅ等のカルコゲン元素のいずれかを構成元素として含むガラスのことであり、例えば、特開２００９−１６１３７４号公報等に記載のものが挙げられる。
<Chalkogenide glass>
The chalcogenide glass is a glass containing any of chalcogen elements such as S, Se, and Te as a constituent element, and examples thereof include those described in JP-A-2009-161374.
＜第１表面＞
本発明のワイヤーグリッド偏光子は、その片方の表面（第１表面）には、入射光の波長以下周期間隔において、並行に延びる複数の金属線が形成されている。これにより、入射光である赤外光が透過しやすくなる。なお、この金属線は、一方の端部から、対向する他方の端部まで形成されていることが好ましい。また、途中で金属線の一部が欠損していてもよい。
<First surface>
In the wire grid polarizer of the present invention, a plurality of metal wires extending in parallel are formed on one surface (first surface) at intervals equal to or shorter than the wavelength of incident light. Thereby, the infrared light which is incident light becomes easy to transmit. In addition, it is preferable that this metal wire is formed from one edge part to the other edge part which opposes. In addition, a part of the metal wire may be missing on the way.
この複数の金属線の周期は、特に制限されるわけではないが、入射する赤外光に対して充分に小さいことが好ましい。具体的には、１００〜１０００ｎｍ程度ごと、特に３００〜６００ｎｍ程度ごとに形成されていることが好ましい。 The period of the plurality of metal lines is not particularly limited, but is preferably sufficiently small with respect to incident infrared light. Specifically, it is preferably formed every about 100 to 1000 nm, particularly about every 300 to 600 nm.
また、金属線は、周期に対する格子幅（幅／周期）が０．３〜０．８、特に０．４〜０．６が好ましい。この範囲とすることにより、入射光である赤外光の透過率を向上させることができる。 In addition, the metal wire preferably has a lattice width (width / cycle) with respect to the cycle of 0.3 to 0.8, particularly 0.4 to 0.6. By setting it as this range, the transmittance | permeability of the infrared light which is incident light can be improved.
このような複数の金属線は、入射光の波長以下周期間隔で形成されていれば特に制限されないが、例えば、並行に延びる複数の凸状部が形成され、且つ、当該凸状部の上面から一方の側面にかけて金属が付着したものは、後述の製造方法により簡便に形成できるため好ましい。 Such a plurality of metal lines are not particularly limited as long as they are formed at a periodic interval equal to or less than the wavelength of incident light. For example, a plurality of convex portions extending in parallel are formed, and from the upper surface of the convex portions. A metal attached to one side surface is preferable because it can be easily formed by a manufacturing method described later.
なお、第１表面の金属線の材質としては、特に制限はないが、金、銀、アルミニウム、ニッケル、クロム、タングステン、タングステンシリサイド及び銅よりなる群から選ばれる少なくとも１種により形成されていることが好ましい。 The material of the metal wire on the first surface is not particularly limited, but is formed of at least one selected from the group consisting of gold, silver, aluminum, nickel, chromium, tungsten, tungsten silicide, and copper. Is preferred.
＜第２表面＞
本発明のワイヤーグリッド偏光子は、前記第１表面と反対側の表面（第２表面）には、入射光の波長以下の周期を有する反射防止構造が形成されている。
<Second surface>
In the wire grid polarizer of the present invention, an antireflection structure having a period equal to or less than the wavelength of incident light is formed on the surface (second surface) opposite to the first surface.
反射防止構造の周期は、入射光である赤外光の波長の半分以下である。これは、反射防止構造による回折を除去するためである。また前記反射防止構造の高さが高いほど光透過性基板の屈折率が緩やかに変化するために有利である。 The period of the antireflection structure is half or less of the wavelength of infrared light that is incident light. This is to remove diffraction due to the antireflection structure. Also, the higher the height of the antireflection structure, the more advantageous the refractive index of the light transmissive substrate changes gradually.
このような観点から、波長１０μｍの赤外光を入射する場合には、反射防止構造の周期は、１〜６μｍ、特に２〜４μｍが好ましい。また、反射防止構造の高さは、１〜２μｍ、特に１．４〜１．８μｍが好ましい。この反射防止構造の周期及び高さは、入射する赤外光の波長に比例して変化させればよい。 From such a viewpoint, when infrared light having a wavelength of 10 μm is incident, the period of the antireflection structure is preferably 1 to 6 μm, particularly preferably 2 to 4 μm. The height of the antireflection structure is preferably 1 to 2 μm, particularly preferably 1.4 to 1.8 μm. The period and height of the antireflection structure may be changed in proportion to the wavelength of incident infrared light.
なお、この反射防止構造は、一方の端部から、対向する他方の端部まで形成されていてもよい。 In addition, this antireflection structure may be formed from one end to the other opposite end.
前記反射防止構造の形状は、特に制限されない。例えば、並行に延びる断面視三角形状、四角形状、台形形状、半円形状、半楕円形状、アーチ形状の複数の溝を有することにより形成されていればよいが、これらの形状以外にも採用することができる。このうち、断面視三角形状の溝を有する構造は、光透過性基板の内部方向へ行くほどその幅が広くなるので、該三角形状の溝を有する構造であることが好ましい。 The shape of the antireflection structure is not particularly limited. For example, it may be formed by having a plurality of grooves having a triangular shape, a quadrangular shape, a trapezoidal shape, a semicircular shape, a semi-elliptical shape, and an arch shape extending in parallel, but other than these shapes may be adopted. be able to. Among these, the structure having a triangular groove in cross-section becomes wider as it goes in the inner direction of the light-transmitting substrate. Therefore, the structure having the triangular groove is preferable.
また、光透過性基板の屈折率を連続的に変化させて不連続的な屈折率の変化を除去することにより、反射率を低減することができる。このような効果は、断面視三角形状の溝を有する場合に特に顕著であるが、断面視四角形状、台形形状等の溝を有する場合にも期待できる。 Further, the reflectance can be reduced by continuously changing the refractive index of the light-transmitting substrate to remove the discontinuous change in the refractive index. Such an effect is particularly remarkable when the groove has a triangular shape in cross section, but can also be expected when the groove has a square shape, trapezoidal shape, or the like in cross section.
２．ワイヤーグリッド偏光子の製造方法
＜第１表面の作製＞
本発明では、第１表面を作製する際には、まず、
（１）ガラスモールド法により、カルコゲナイドガラスの片方の表面上に入射光の波長以下周期間隔において、並行に延びる複数の凸状部を形成し、さらに、反対側表面に、入射光の波長以下の周期を有する反射防止構造を形成する工程
を施す。
2. Manufacturing method of wire grid polarizer <Preparation of first surface>
In the present invention, when producing the first surface, first,
(1) By a glass mold method, a plurality of convex portions extending in parallel are formed on one surface of the chalcogenide glass at a period interval equal to or less than the wavelength of incident light, and further, on the opposite surface, the wavelength is equal to or less than the wavelength of incident light. A step of forming an antireflection structure having a period is performed.
ガラスモールド法とは、加熱軟化させたガラス（本発明の場合はカルコゲナイドガラス）を一対の成形型でプレスして成形した後、冷却して取り出す方法である。このガラスモールド法は、研磨加工が難しい成形体の製造に適していて、研磨加工を施すものに較べて製造が容易で小さい成形体でも容易に安価に製造することができる。 The glass mold method is a method in which heat-softened glass (in the case of the present invention, chalcogenide glass) is pressed by a pair of molds and then cooled and taken out. This glass mold method is suitable for manufacturing a molded body that is difficult to polish, and can be manufactured easily and inexpensively even with a small molded body that is easier to manufacture than those subjected to polishing.
工程（１）では、まず、図１（Ａ）のように、第１表面形成用モールド、第２表面形成用モールド及びカルコゲナイドガラスを用意する。図１（Ａ）では、上から、第１表面形成用モールド、カルコゲナイドガラス、第２表面形成用モールドである。 In step (1), first, as shown in FIG. 1A, a first surface forming mold, a second surface forming mold, and chalcogenide glass are prepared. In FIG. 1A, from the top, the first surface forming mold, the chalcogenide glass, and the second surface forming mold.
なお、第１表面形成用モールドは、カルコゲナイドガラスに並行に延びる複数の凸状部が形成された表面が形成できるように加工されている。また、第２表面形成用モールドは、カルコゲナイドガラスに入射光の波長以下の周期を有する反射防止構造を形成できるように加工されている。 In addition, the 1st surface formation mold is processed so that the surface in which the some convex-shaped part extended in parallel to chalcogenide glass was formed can be formed. The second surface forming mold is processed so that an antireflection structure having a period equal to or less than the wavelength of incident light can be formed on the chalcogenide glass.
ここで、第１表面形成用モールド及び第２表面形成用モールドを構成する材料としては、特に制限はないが、カルコゲナイドガラスの軟化成型が可能な温度において耐えられる材料であることが好ましい。具体的には、二酸化ケイ素、シリコン、ニッケル、タングステンカーバイド、シリコンカーバイド、グラッシーカーボン等が挙げられる。 Here, although there is no restriction | limiting in particular as a material which comprises the mold for 1st surface formation, and the mold for 2nd surface formation, It is preferable that it is the material which can endure at the temperature which can soften chalcogenide glass. Specific examples include silicon dioxide, silicon, nickel, tungsten carbide, silicon carbide, and glassy carbon.
次に、高温で、カルコゲナイドガラスを、第１表面形成用モールド及び第２表面形成用モールドで挟んでプレスする。 Next, the chalcogenide glass is sandwiched between the first surface forming mold and the second surface forming mold and pressed at a high temperature.
この際のプレス温度は、カルコゲナイドガラスを軟化成型可能な温度であれば特に制限はなく、ガラスの屈伏温度付近で行うことが好ましいためガラスの種類によっても異なるが、通常２３０〜４００℃程度、特に２５０〜３８０℃程度が好ましい。 The press temperature at this time is not particularly limited as long as it is a temperature at which the chalcogenide glass can be softened and formed, and it is preferably performed near the yield temperature of the glass. About 250-380 degreeC is preferable.
また、プレス圧力も、カルコゲナイドガラスを加工可能であれば特に制限はないが、０．５〜１０ＭＰａ程度、特に１〜９ＭＰａ程度が好ましい。 The press pressure is not particularly limited as long as the chalcogenide glass can be processed, but is preferably about 0.5 to 10 MPa, particularly about 1 to 9 MPa.
なお、第１表面形成用モールド及び第２表面形成用モールドは、それぞれの表面に形成された溝が互いに並行するように配置することが好ましい。 In addition, it is preferable to arrange | position the 1st surface formation mold and the 2nd surface formation mold so that the groove | channel formed in each surface may mutually be parallel.
これにより、カルコゲナイドガラスの片方の表面上に入射光の波長以下周期間隔において、並行に延びる複数の凸状部が形成され、さらに、反対側表面に、入射光の波長以下の周期を有する反射防止構造が形成される。この後、第１表面形成用モールド及び第２表面形成用モールドを離型し、冷却固化させればよい（図１（Ｃ））。 As a result, a plurality of convex portions extending in parallel are formed on one surface of the chalcogenide glass at intervals equal to or less than the wavelength of the incident light, and the antireflection having a period equal to or less than the wavelength of the incident light is formed on the opposite surface. A structure is formed. Thereafter, the first surface forming mold and the second surface forming mold may be released and cooled and solidified (FIG. 1C).
次に、
（２）前記複数の凸状部上に、所定角度傾斜方向から原子を入射させる斜め成膜により、該凸状部の上面から一方の側面にかけて金属を付着させる工程
を施す。
next,
(2) A step of depositing metal on the plurality of convex portions from the upper surface to one side surface of the convex portions by oblique film formation in which atoms are incident from a predetermined angle inclination direction.
このように、図１（Ｄ）のように、斜め成膜することにより、簡便に、入射光の波長以下周期間隔において、並行に延びる複数の金属線を形成することが可能である（図１（Ｅ）及び図２）。この際、金属線を好ましい幅に調整するには、カルコゲナイドガラスの対象面の法線に対し３０〜８０度、特に４０〜７０度の方向から原子を入射させることが好ましい。 As described above, as shown in FIG. 1D, it is possible to easily form a plurality of metal wires extending in parallel at a period interval equal to or less than the wavelength of incident light by forming an oblique film (FIG. 1). (E) and FIG. 2). At this time, in order to adjust the metal line to a preferable width, it is preferable that the atoms are incident from the direction of 30 to 80 degrees, particularly 40 to 70 degrees with respect to the normal line of the target surface of the chalcogenide glass.
成膜の方法としては、特に制限はなく、例えば、蒸着、スパッタ等が挙げられる。 There is no restriction | limiting in particular as a film-forming method, For example, vapor deposition, sputtering, etc. are mentioned.
以下、実施例に基づいて本発明をより詳細に説明するが、本発明はこれらのみに限定されないことは言うまでもない。 EXAMPLES Hereinafter, although this invention is demonstrated in detail based on an Example, it cannot be overemphasized that this invention is not limited only to these.
実施例１
第１表面形成用モールド、第２表面形成用モールド及びカルコゲナイドガラスを用意した。第１表面形成用モールドは、材質がＳｉＣであり、断面視四角形状の周期構造を５００ｎｍおきに有するものを用意した。また、第２表面形成用モールドは、材質がＧＣであり、断面視三角形状の周期構造を３μｍおきに有するものを用意した。さらに、カルコゲナイドガラスとしては、ＩＩＲ−ＳＦ１（五鈴精工硝子製）を使用した。
Example 1
A first surface forming mold, a second surface forming mold, and chalcogenide glass were prepared. The first surface forming mold was made of SiC and had a periodic structure with a square shape in cross section in every 500 nm. The second surface forming mold was made of GC and had a periodic structure with a triangular shape in cross-section every 3 μm. Further, IIR-SF1 (manufactured by Isuzu Seiko Glass) was used as the chalcogenide glass.
まず、カルコゲナイドガラスを挟むように、第１表面形成用モールド及び第２表面形成用モールドを配置し、２５０〜３８０℃、１〜９ＭＰａでプレスした。その後、第１表面形成用モールド及び第２表面形成用モールドを離型し、冷却固化させた。 First, the first surface forming mold and the second surface forming mold were arranged so as to sandwich the chalcogenide glass, and pressed at 250 to 380 ° C. and 1 to 9 MPa. Thereafter, the first surface forming mold and the second surface forming mold were released and cooled and solidified.
さらに、蒸着により、カルコゲナイドガラスの対象面の法線に対して５０度の方向から、金属としてＡｌを斜め成膜した。 Furthermore, Al was obliquely formed as a metal from the direction of 50 degrees with respect to the normal of the target surface of the chalcogenide glass by vapor deposition.
上記で得られたワイヤーグリッド偏光子の第１表面及び第２表面のＳＥＭ写真を示す。ＳＥＭ写真より、第１表面に複数の金属線、第２表面に反射防止構造が形成されたことが分かる。 The SEM photograph of the 1st surface of the wire grid polarizer obtained above and the 2nd surface is shown. From the SEM photograph, it can be seen that a plurality of metal wires are formed on the first surface and an antireflection structure is formed on the second surface.
さらに、図４に、得られたワイヤーグリッド偏光子の赤外分光器により測定した偏光透過率曲線を示す。 Further, FIG. 4 shows a polarization transmittance curve measured by an infrared spectrometer of the obtained wire grid polarizer.
Claims (9)
前記第１表面には、入射光の波長以下の周期間隔において、並行に延びる複数の金属線が形成されており、且つ、
前記第２表面には、入射光の波長以下の周期を有する反射防止構造を有する、ワイヤーグリッド偏光子。 A wire grid polarizer having a first surface and a second surface and made of chalcogenide glass,
The first surface is formed with a plurality of metal wires extending in parallel at a periodic interval equal to or less than the wavelength of incident light, and
The wire grid polarizer which has an antireflection structure which has a period below the wavelength of incident light on the 2nd surface.
（１）ガラスモールド法により、カルコゲナイドガラスの片方の表面上に入射光の波長以下周期間隔において、並行に延びる複数の凸状部を形成し、さらに、反対側表面に、入射光の波長以下の周期を有する反射防止構造を形成する工程、及び
（２）前記複数の凸状部上に、所定角度傾斜方向から原子を入射させる斜め成膜により、該凸状部の上面から一方の側面にかけて金属を付着させる工程
を備える、ワイヤーグリッド偏光子の製造方法。 It is a manufacturing method of the wire grid polarizer according to any one of claims 1 to 8,
(1) By a glass mold method, a plurality of convex portions extending in parallel are formed on one surface of the chalcogenide glass at a period interval equal to or less than the wavelength of incident light, and further, on the opposite surface, the wavelength is equal to or less than the wavelength of incident light. A step of forming an antireflection structure having a period; and (2) a metal from the upper surface of the convex portion to one side surface by oblique film formation in which atoms are incident on the plurality of convex portions from a predetermined angle inclined direction. The manufacturing method of a wire grid polarizer provided with the process of attaching.
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| WO2018088558A1 (en) | 2016-11-14 | 2018-05-17 | 日本化薬株式会社 | Dye-based polarizing plate for infrared wavelength range |
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| WO2020137705A1 (en) | 2018-12-27 | 2020-07-02 | 日本化薬株式会社 | Azo compound or salt thereof, and dye-based polarizing film and dye-based polarizing plate containing same |
| WO2020261856A1 (en) | 2019-06-26 | 2020-12-30 | 国立研究開発法人産業技術総合研究所 | Polarizing element having wire grid structure and method for manufacturing same |
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