JP2012250459A - Multilayer film and method for producing the same - Google Patents

Multilayer film and method for producing the same Download PDF

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JP2012250459A
JP2012250459A JP2011125297A JP2011125297A JP2012250459A JP 2012250459 A JP2012250459 A JP 2012250459A JP 2011125297 A JP2011125297 A JP 2011125297A JP 2011125297 A JP2011125297 A JP 2011125297A JP 2012250459 A JP2012250459 A JP 2012250459A
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value
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embossing
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JP5723224B2 (en
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Satoshi Shioda
智志 塩田
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Riken Technos Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a multilayer film, which looks as if an emboss and handle are synchronized with each other and has a high design property.SOLUTION: In the multilayer film 10, a film, produced by layering a colored layer 104 and a surface transparent layer 106 in this order on a substrate concealment layer 102, is subjected to embossing E, and all of the following conditions (a) to (d) are satisfied. In the condition (a), the L* value of the substrate concealment layer 102 is larger than that of the colored layer 104, and a difference between the L* values of both layers is ≥30. In the condition (b), the thickness of the substrate concealment layer 102 is 50-300 μm. In the condition (c), the thickness of the surface transparent layer 106 is 50-200 μm. In the condition (d), the embossment depth is 30-100% of the thickness of the multilayer film.

Description

本発明は、エンボスを施した積層フィルムに関し、エンボスと柄が同調しているかのように見える意匠性の高い積層フィルムおよび積層フィルムの製造方法に関する。   The present invention relates to an embossed laminated film, and more particularly to a laminated film with high design that looks as if the embossing and the handle are synchronized, and a method for producing the laminated film.

従来より、建材、壁層材、家具、家電等の化粧材として、意匠性の高いフィルムの要求がある。その手法として、印刷、ワイピング等の他、印刷柄とエンボスの凹凸が同調したいわゆる同調エンボスがある。   2. Description of the Related Art Conventionally, there is a demand for highly design films as decorative materials for building materials, wall layer materials, furniture, home appliances, and the like. As the method, there is so-called synchronized embossing in which the printed pattern and the embossed unevenness are synchronized in addition to printing and wiping.

同調エンボスを形成する方法として、印刷に用いる印刷インキに発泡剤を添加し、柄に対応する部分を凸状にする方法や、印刷インキに撥液剤を添加し、この印刷面にトップコート層を設け、印刷層の有する撥液性能により柄に対応する部分が凹状のトップコート層を形成する方法や、印刷インキに硬化抑制剤を添加し、この印刷面にトップコート層を設けることにより柄に対応する部分が未硬化で凹状となるトップコート層を形成する方法などがある。   As a method of forming synchronized embossing, a foaming agent is added to the printing ink used for printing, and a portion corresponding to the pattern is made convex, or a liquid repellent is added to the printing ink, and a top coat layer is formed on this printing surface. Provide a pattern by forming a topcoat layer with a concave part corresponding to the pattern due to the liquid repellency of the printing layer, or by adding a curing inhibitor to the printing ink and providing a topcoat layer on this printed surface There is a method of forming a top coat layer in which the corresponding part is uncured and concave.

また、印刷柄とエンボスを同調させる方法としては、平板プレス式のエンボス装置を使用して、印刷柄と同一寸法のエンボス板を用いて形成する方法や、連続方式のエンボス装置において、フィルムの寸法変化を抑制する方法(特許文献1)や、エンボス機の機械制御による方法(特許文献2および3)が知られている。   In addition, as a method of synchronizing the printed pattern and the embossing, a flat plate type embossing device is used to form the embossed plate having the same dimensions as the printed pattern, or in a continuous embossing device, the film dimensions A method for suppressing the change (Patent Document 1) and a method by mechanical control of an embossing machine (Patent Documents 2 and 3) are known.

しかしながら、従来の印刷柄とエンボスを同調させる方法は何れも印刷柄とエンボスとの同調に困難性が有り、容易に実施できる状況にはなかった。   However, none of the conventional methods of synchronizing the printed pattern and the embossment has a difficulty in synchronizing the printed pattern and the embossed pattern, and has not been easily implemented.

特開昭61−046281号公報JP-A-61-046881 特開昭63−286389号公報JP-A 63-286389 特開平7−276497号公報JP-A-7-276497

そこで、本発明の目的は、簡便な方法によりエンボスと柄が同調しているかのように見える意匠性の高い積層フィルムおよび積層フィルムの製造方法を提供することにある。   Then, the objective of this invention is providing the manufacturing method of a highly designable laminated | multilayer film and the laminated | multilayer film which appear as if the embossing and the handle | synchronization are synchronizing with a simple method.

本発明者は、下地隠蔽層の上に着色層および表面透明層をこの順に積層したフィルム構成において、下地隠蔽層および着色層のL*値を特定の関係とし、下地隠蔽層および表面透明層の厚みを特定し、さらにエンボス深度を特定することにより、上記目的が達成されることを見出した。   In the film configuration in which the colored layer and the transparent surface layer are laminated in this order on the underlying concealing layer, the inventor makes the L * values of the underlying concealing layer and the coloring layer have a specific relationship, and It has been found that the above object can be achieved by specifying the thickness and further specifying the embossing depth.

すなわち本発明は、以下の通りである。
1.下地隠蔽層の上に着色層および表面透明層をこの順に積層したフィルムにエンボス加工を施してなり、以下の条件(a)〜(d)をすべて満たすことを特徴とする積層フィルム。
(a)前記下地隠蔽層のL*値が前記着色層のL*値よりも大きく、両者のL*値の差が30以上である。
(b)前記下地隠蔽層の厚みが50μm〜300μmである。
(c)前記表面透明層の厚みが50μm〜200μmである。
(d)エンボス深度が積層フィルム厚みの30%〜100%である。
2.前記下地隠蔽層のL*値が50〜100であることを特徴とする前記1に記載の積層フィルム。
3.前記下地隠蔽層のL*値と着色層のL*値との差が50以上あることを特徴とする前記1または2に記載の積層フィルム。
4.下地隠蔽層の上に着色層および表面透明層をこの順に積層したフィルムにエンボス加工を施す工程を有し、以下の条件(a)〜(d)をすべて満たすことを特徴とする積層フィルムの製造方法。
(a)前記下地隠蔽層のL*値が前記着色層のL*値よりも大きく、両者のL*値の差が30以上である。
(b)前記下地隠蔽層の厚みが50μm〜300μmである。
(c)前記表面透明層の厚みが50μm〜200μmである。
(d)エンボス深度が積層フィルム厚みの30%〜100%である。
5.前記下地隠蔽層のL*値が50〜100であることを特徴とする前記4に記載の積層フィルムの製造方法。
6.前記下地隠蔽層のL*値と着色層のL*値との差が50以上あることを特徴とする前記4または5に記載の積層フィルムの製造方法。
That is, the present invention is as follows.
1. A laminated film characterized by embossing a film in which a colored layer and a transparent surface layer are laminated in this order on a base concealing layer, and satisfying all the following conditions (a) to (d).
(A) The L * value of the base concealing layer is larger than the L * value of the colored layer, and the difference between the two L * values is 30 or more.
(B) The base concealing layer has a thickness of 50 μm to 300 μm.
(C) The surface transparent layer has a thickness of 50 μm to 200 μm.
(D) The emboss depth is 30% to 100% of the laminated film thickness.
2. 2. The laminated film according to 1 above, wherein the base concealing layer has an L * value of 50 to 100.
3. 3. The laminated film as described in 1 or 2 above, wherein the difference between the L * value of the base concealing layer and the L * value of the colored layer is 50 or more.
4). A process for embossing a film in which a colored layer and a surface transparent layer are laminated in this order on a base concealing layer, and satisfying all of the following conditions (a) to (d): Method.
(A) The L * value of the base concealing layer is larger than the L * value of the colored layer, and the difference between the two L * values is 30 or more.
(B) The base concealing layer has a thickness of 50 μm to 300 μm.
(C) The surface transparent layer has a thickness of 50 μm to 200 μm.
(D) The emboss depth is 30% to 100% of the laminated film thickness.
5. 5. The method for producing a laminated film as described in 4 above, wherein the L * value of the base concealing layer is 50 to 100.
6). 6. The method for producing a laminated film as described in 4 or 5 above, wherein the difference between the L * value of the base concealing layer and the L * value of the colored layer is 50 or more.

本発明によれば、印刷とエンボスを同調させる難易度の高い工程を不要としながらも、エンボスと柄が同調しているかのように見える意匠感を有する積層フィルムを得ることができる。
本発明の積層フィルムは、下地隠蔽層の上に着色層および表面透明層をこの順に積層したフィルムにエンボス加工を施したものである。エンボス加工を施されたフィルムにおいては、その凹部では各層とも引き延ばされ、膜厚が他の部分より薄くなっている。その際、下地隠蔽層と着色層のL*値(明度)の関係において、着色層が下地隠蔽層よりも一定値以上低ければ(暗ければ)、引き延ばされた着色層超しに下地隠蔽層が透けて見え、下地隠蔽層と着色層のコントラストにより、あたかも印刷が施されているような外観となり、更にはエンボスとも同調しているため非常に高い意匠性が得られるのである。
ADVANTAGE OF THE INVENTION According to this invention, the laminated | multilayer film which has the design feeling which looks as if the embossing and the pattern are synchronizing can be obtained, without the process with the high difficulty which synchronizes printing and embossing is unnecessary.
The laminated film of the present invention is obtained by embossing a film in which a colored layer and a transparent surface layer are laminated in this order on a base concealing layer. In the embossed film, each layer is stretched in the concave portion, and the film thickness is thinner than other portions. In this case, if the L * value (brightness) of the base concealing layer and the colored layer is lower than the base concealing layer by a certain value or more (if it is dark), the base layer will extend beyond the stretched colored layer. The concealing layer can be seen through, and the contrast between the base concealing layer and the colored layer makes it look as if it has been printed. Furthermore, since it is synchronized with the embossing, a very high design can be obtained.

本発明の積層フィルムの一実施形態の断面図である。It is sectional drawing of one Embodiment of the laminated | multilayer film of this invention.

以下、本発明をさらに詳細に説明する。
図1は、本発明の積層フィルムの一実施形態の断面図である。図1において、本発明の積層フィルム10は、下地隠蔽層102の上に着色層104および表面透明層106をこの順に積層したフィルムにエンボス加工Eを施してなる。また本発明の積層フィルム10は、基材P上に、基材Pと下地隠蔽層102とが接するように、若しくは接着剤・粘着剤・プライマー等の塗料層を介して貼り合わされる。
以下、各層について説明する。
Hereinafter, the present invention will be described in more detail.
FIG. 1 is a cross-sectional view of an embodiment of the laminated film of the present invention. In FIG. 1, a laminated film 10 of the present invention is formed by embossing E on a film in which a colored layer 104 and a surface transparent layer 106 are laminated in this order on a base concealing layer 102. The laminated film 10 of the present invention is bonded onto the substrate P so that the substrate P and the base concealing layer 102 are in contact with each other or through a coating layer such as an adhesive, an adhesive, and a primer.
Hereinafter, each layer will be described.

(1)下地隠蔽層
本発明における下地隠蔽層102の材質は特に限定されるものではなく、紙類、不織布類、樹脂類を使用することができる。中でも加工性が良好な樹脂類が適しており、例えば、オレフィン系樹脂、ポリエステル系樹脂、アクリル系樹脂、塩化ビニル系樹脂、スチレン系樹脂等が挙げられ、中でもエンボス適性に優れる塩化ビニル系樹脂が好ましく使用される。
(1) Base concealment layer The material of the base concealment layer 102 in the present invention is not particularly limited, and papers, nonwoven fabrics, and resins can be used. Among them, resins having good processability are suitable, for example, olefin resin, polyester resin, acrylic resin, vinyl chloride resin, styrene resin, etc. Among them, vinyl chloride resin excellent in embossability is mentioned. Preferably used.

本発明において、下地隠蔽層102のL*値は、下記で説明する着色層104のL*値よりも大きいことが必要である。また、両者のL*値の差は、30以上であることが必要である。
下地隠蔽層102のL*値が、下記で説明する着色層104のL*値よりも小さい場合、エンボスと柄が同調しているかのような意匠感が得られない、という不具合が発生する。
下地隠蔽層102のL*値と着色層104のL*値との差が30以上であることにより、エンボス凹部のコントラストが明確になり、意匠性の高い外観が得られる。逆に両者の差が30未満であると、当該効果が奏されない。本発明では、両者のL*値の差が50以上であることがさらに好ましい。
また、下地隠蔽層102のL*値は、50〜100であることが好ましく、60〜100であることがより好ましい。
In the present invention, the L * value of the base concealing layer 102 needs to be larger than the L * value of the colored layer 104 described below. Also, the difference between the L * values of both needs to be 30 or more.
When the L * value of the base concealing layer 102 is smaller than the L * value of the colored layer 104 described below, there is a problem that a design feeling as if the embossing and the pattern are synchronized cannot be obtained.
When the difference between the L * value of the base concealing layer 102 and the L * value of the colored layer 104 is 30 or more, the contrast of the embossed recesses becomes clear, and an appearance with high design properties is obtained. Conversely, if the difference between the two is less than 30, the effect is not achieved. In the present invention, the difference between the L * values of the two is more preferably 50 or more.
Further, the L * value of the base concealing layer 102 is preferably 50 to 100, and more preferably 60 to 100.

なお、L*値とは、色の明るさの度合である明度を表す周知の尺度であり、JIS Z8722等に従って測定することができる。L*値が大きいほど明度が高く、最大L*値、すなわちL*値=100は白色を意味し、最小L*値、すなわちL*値=0は黒色を意味する。   The L * value is a well-known scale that represents lightness, which is the degree of color brightness, and can be measured according to JIS Z8722 or the like. The greater the L * value, the higher the brightness, and the maximum L * value, that is, L * value = 100 means white, and the minimum L * value, that is, L * value = 0 means black.

また、下地隠蔽層102の厚みは、50μm〜300μmであることが必要であり、50μm〜200μmであることが好ましい。下地隠蔽層102の厚みが50μmを下回ると厚み不足によりエンボスと柄が同調しているかのような意匠感が得られない。逆に300μmを超えると、下地隠蔽層に厚みムラが発生し、それによって隠蔽性能が不均一となり好ましくない。   Further, the thickness of the base concealing layer 102 is required to be 50 μm to 300 μm, and preferably 50 μm to 200 μm. When the thickness of the base concealing layer 102 is less than 50 μm, a design feeling as if the embossing and the pattern are synchronized cannot be obtained due to insufficient thickness. On the other hand, when the thickness exceeds 300 μm, thickness unevenness occurs in the base concealing layer, thereby making the concealing performance non-uniform, which is not preferable.

(2)着色層
着色層104は、塗工または製膜したフィルムにより形成することができる。
塗工による方法においては、塩酢ビ系、ポリエステル系、アクリル系等の樹脂成分に着色剤を添加し公知の方法にて塗工し、着色層104を形成することができる。この際、着色層104に接着性能を付与すれば、エンボスの熱のみでは接着強度が不足する基材同士のラミネートを可能にする効果も有することができる。
製膜したフィルムとしては、カレンダー、Tダイ押出し等公知の方法にて製膜でき、下地隠蔽層102および表面透明層106の材質を考慮し樹脂成分を適宜選択すればよい。着色層104は、下地隠蔽層102および/または表面透明層106の樹脂組成と同種の組成であることが加工性、接着性の点で望ましい。また、下地隠蔽層102と共に、あるいは表面透明層106と共に共押出しで着色層104を形成することもできる。
(2) Colored layer The colored layer 104 can be formed by a coated or formed film.
In the method by coating, a colored layer 104 can be formed by adding a colorant to a resin component such as vinyl chloride, polyester, or acrylic and coating by a known method. At this time, if adhesion performance is imparted to the colored layer 104, it is possible to have an effect of enabling lamination of base materials having insufficient adhesive strength only by heat of embossing.
The formed film can be formed by a known method such as calendering or T-die extrusion, and the resin component may be appropriately selected in consideration of the materials of the base concealing layer 102 and the surface transparent layer 106. The colored layer 104 is desirably the same type of composition as the resin composition of the base concealing layer 102 and / or the surface transparent layer 106 in terms of processability and adhesiveness. The colored layer 104 can also be formed by coextrusion with the base concealing layer 102 or the surface transparent layer 106.

本発明において、下地隠蔽層102のL*値と着色層104のL*値との関係については、上述の通りである。着色層104のL*値は、0〜50であることが好ましい。
また、本発明の効果の観点から、着色層104の厚みは、0.01μm〜30μmが好ましく、0.01μm〜20μmがさらに好ましい。
In the present invention, the relationship between the L * value of the base concealing layer 102 and the L * value of the colored layer 104 is as described above. The L * value of the colored layer 104 is preferably 0-50.
From the viewpoint of the effect of the present invention, the thickness of the colored layer 104 is preferably 0.01 μm to 30 μm, and more preferably 0.01 μm to 20 μm.

(3)表面透明層
表面透明層106としては、透明でエンボス加工適性を有するものであればよく、用途に応じて公知の透明な樹脂フィルムを使用すればよい。樹脂としては、例えば、オレフィン系樹脂、エステル系樹脂、アクリル系樹脂、フッ素系樹脂、塩化ビニル系樹脂、スチレン系樹脂等が挙げられる。また、透明な樹脂フィルムの同種または異種樹脂による多層構成でもよい。
上記の樹脂フィルムの中でもエンボス適正の点で塩化ビニル系樹脂が好適である。
(3) Surface transparent layer As the surface transparent layer 106, what is necessary is just to be transparent and have the embossing suitability, and what is necessary is just to use a well-known transparent resin film according to a use. Examples of the resin include olefin resins, ester resins, acrylic resins, fluorine resins, vinyl chloride resins, styrene resins, and the like. Moreover, the multilayer structure by the same kind or different kind of resin of a transparent resin film may be sufficient.
Among the above resin films, a vinyl chloride resin is preferable from the viewpoint of embossing.

また、表面透明層106の厚みは、50μm〜200μmであることが必要であり、50μm〜150μmであることが好ましい。表面透明層106の厚みが50μmを下回るとエンボスと柄が同調しているかのような意匠感が得られない。逆に200μmを超えると、表面透明層の厚みムラが発生し、積層フィルムとなった時にスジ欠点となり好ましくない。   Moreover, the thickness of the surface transparent layer 106 needs to be 50 micrometers-200 micrometers, and it is preferable that it is 50 micrometers-150 micrometers. If the thickness of the surface transparent layer 106 is less than 50 μm, a design feeling as if the embossing and the pattern are synchronized cannot be obtained. On the other hand, when the thickness exceeds 200 μm, the thickness of the surface transparent layer is uneven, which causes a streak defect when a laminated film is formed.

ここで、前記下地隠蔽層102、着色層104および表面透明層106の厚みとは、エンボス加工を施す前のそれぞれの層の厚みを意味する。   Here, the thicknesses of the base concealing layer 102, the colored layer 104, and the surface transparent layer 106 mean the thicknesses of the respective layers before embossing.

本発明の積層フィルムは、前述の下地隠蔽層102、着色層104および表面透明層106をこの順に積層し、このフィルムをエンボス加工に施すことにより製造できる。エンボス加工の方法に特に制限はなく、例えば、ドラム加熱型エンボッサー、マルチシリンダー型エンボッサーなど公知のエンボス加工機を用いて行うことができる。   The laminated film of the present invention can be produced by laminating the above-described base concealing layer 102, the colored layer 104 and the surface transparent layer 106 in this order and subjecting this film to embossing. There is no restriction | limiting in particular in the method of embossing, For example, it can carry out using well-known embossing machines, such as a drum heating type embosser and a multi-cylinder type embosser.

下地隠蔽層102、着色層104および表面透明層106を直接エンボス加工機により積層し、エンボスを施してもよく、また、事前に着色層104を下地隠蔽層102および/または表面透明層106に塗工積層した後にエンボス加工機で相手方の基材と積層し、エンボスを施してもよく、また、事前に接着性を有する着色層を用いて下地隠蔽層102、着色層104、表面透明層106の3層構成品を作成した後エンボス加工機によりエンボスを施してもよい。   The base concealing layer 102, the colored layer 104 and the surface transparent layer 106 may be directly laminated by an embossing machine and embossed, and the colored layer 104 may be applied to the base concealing layer 102 and / or the surface transparent layer 106 in advance. After laminating, the substrate may be laminated with an embossing machine with an embossing machine and embossed, and the underlying concealing layer 102, the colored layer 104, and the surface transparent layer 106 may be preliminarily formed using an adhesive colored layer. Embossing may be performed by an embossing machine after creating a three-layer component.

また本発明の積層フィルム10のエンボス深度は、積層フィルム10の厚みの30%〜100%であることが必要である。エンボス深度が30%を下回ると、着色層104の引き伸ばされ方が小さく、下地隠蔽層102の透け方が不足し、その結果、印刷のようには見えず、同調の意匠感が得られない。一方、100%を上回ると、フィルム自体に穴が空いたり、バックエンボス(裏面の凹凸)が大きくなり、製品として適さない。本発明の積層フィルム10のエンボス深度は、本発明の効果の観点から、50%〜100%であることが好ましい。
エンボス深度は、エンボスロールの深度を調整することにより調整することができる。
なお、エンボス深度は、JIS B0601に規定された方法に従い、積層フィルム10の表面のRz(最大高さ)を測定し、エンボス加工を施す前の積層フィルム厚みに対するRzのパーセンテージで表した。
Moreover, the embossing depth of the laminated film 10 of the present invention needs to be 30% to 100% of the thickness of the laminated film 10. When the embossing depth is less than 30%, the colored layer 104 is stretched less and the underlayer hiding layer 102 is not transparent. As a result, it does not look like printing, and a synchronized design feeling cannot be obtained. On the other hand, if it exceeds 100%, a hole is formed in the film itself or back embossing (unevenness on the back surface) becomes large, which is not suitable as a product. The embossing depth of the laminated film 10 of the present invention is preferably 50% to 100% from the viewpoint of the effect of the present invention.
The embossing depth can be adjusted by adjusting the depth of the embossing roll.
In addition, the embossing depth measured the Rz (maximum height) of the surface of the laminated | multilayer film 10 according to the method prescribed | regulated to JISB0601, and represented it with the percentage of Rz with respect to the laminated | multilayer film thickness before giving embossing.

以下、実施例および比較例により本発明をさらに説明するが、本発明はこれらの例に限定されるものではない。   Hereinafter, although an example and a comparative example explain the present invention further, the present invention is not limited to these examples.

実施例1
下地隠蔽層としてL*値が90、厚みが80μmの塩化ビニル樹脂フィルム(S23108Fc56095、リケンテクノス(株)製)を用い、この下地隠蔽層の上に着色層として、L*値が10、厚みが2μmの塗工層をグラビアコータを用いて形成した。得られたフィルムの着色層側に表面透明層として厚みが80μmの塩化ビニル樹脂フィルム(S20131Fc025、リケンテクノス(株)製)をエンボス加工機で積層し、エンボス深度が63%になるようにエンボスを施し、積層フィルムを得た。
Example 1
A vinyl chloride resin film (S23108Fc56095, manufactured by Riken Technos Co., Ltd.) having an L * value of 90 and a thickness of 80 μm was used as the base concealing layer, and an L * value of 10 and a thickness of 2 μm were used as a colored layer on the base concealing layer. The coating layer was formed using a gravure coater. A vinyl chloride resin film (S20131Fc025, manufactured by Riken Technos Co., Ltd.) having a thickness of 80 μm as a surface transparent layer is laminated on the colored layer side of the obtained film with an embossing machine and embossed so that the embossing depth becomes 63%. A laminated film was obtained.

得られた積層フィルムについて、下記の評価を行い、その結果を表1にまとめた。
(1)同調意匠感
被験者10人が、エンボスと柄が同調しているように見えるかを判断し、以下の基準で評価した。
○:8人以上が同調しているように見えると判断
△:7〜4人が同調しているように見えると判断
×:同調しているように見えると判断した者が3人以下
About the obtained laminated | multilayer film, the following evaluation was performed and the result was put together in Table 1.
(1) Sense of synchronized design Ten test subjects judged whether the emboss and the pattern seem to be synchronized, and evaluated according to the following criteria.
○: It is judged that 8 or more people seem to be in sync. Δ: 7 to 4 people are judged to be in sync. ×: 3 or less people are judged to be in sync.

(2)裏面へのコーティング加工性
当該積層フィルムの下地隠蔽層側(着色層形成面とは反対面)に、粘着剤を塗工し、それをステンレス板に施工することにより、以下の基準で裏面へのコーティング加工性を評価した。
○:ステンレス板と粘着剤の間にエアを含まず、表面意匠に影響なく施工出来る
△:ステンレス板と粘着剤の間に多少のエアを含み、表面意匠に僅かに悪影響を及ぼす
×:ステンレス板と粘着剤の間に多数のエアを含み、表面意匠に著しい悪影響を及ぼす
(2) Coating processability on the back side By applying an adhesive on the base concealing layer side (the surface opposite to the colored layer forming surface) of the laminated film and applying it to a stainless steel plate, The coating processability on the back surface was evaluated.
○: Air is not included between the stainless steel plate and the adhesive, and construction can be performed without affecting the surface design. Δ: Some air is included between the stainless steel plate and the adhesive, and the surface design is slightly affected. ×: Stainless steel plate Contains a lot of air between the adhesive and the adhesive, which has a significant adverse effect on the surface design

(3)厚みムラ
被験者10人が目視で確認して、厚みムラ起因と判断できるスジ欠点が確認出来るかどうかを判断し、以下の基準で評価した。
○:厚みムラ起因と判断出来るスジ欠点が確認出来ると判断した者が2人以下
△:7〜3人が、厚みムラ起因と判断出来るスジ欠点が確認出来ると判断
×:8人以上が、厚みムラ起因と判断出来るスジ欠点が確認出来ると判断
(3) Thickness unevenness Ten test subjects confirmed visually, it was judged whether the stripe defect which can be judged to be the cause of thickness unevenness could be confirmed, and the following references | standards evaluated.
○: 2 or less people who judged that streak defects that can be judged to be due to uneven thickness were confirmed Δ: 7 to 3 people were judged to be able to confirm streak defects that could be judged to be caused by uneven thickness x: 8 or more people were thick Judge that streak defects that can be attributed to unevenness can be confirmed

結果を表1に示す。   The results are shown in Table 1.

実施例2
下地隠蔽層として、L*値が70、厚みが80μmの塩化ビニル樹脂フィルム(S23108Fc57991、リケンテクノス(株)製)を用いた。それ以外は実施例1を繰り返した。
Example 2
A vinyl chloride resin film (S23108Fc57991, manufactured by Riken Technos Co., Ltd.) having an L * value of 70 and a thickness of 80 μm was used as the base concealing layer. Otherwise, Example 1 was repeated.

実施例3
下地隠蔽層として、L*値が50、厚みが80μmの塩化ビニル樹脂フィルム(S23106Fc93315、リケンテクノス(株)製)を用いた。それ以外は実施例1を繰り返した。
Example 3
A vinyl chloride resin film (S23106Fc93315, manufactured by Riken Technos Co., Ltd.) having an L * value of 50 and a thickness of 80 μm was used as the base concealing layer. Otherwise, Example 1 was repeated.

実施例4〜5
着色層の色調を調整することにより着色層のL*値を表1に示すように変更すること以外は実施例1を繰り返した。
Examples 4-5
Example 1 was repeated except that the L * value of the colored layer was changed as shown in Table 1 by adjusting the color tone of the colored layer.

実施例6〜8
エンボス深度を表1に示すように変更すること以外は実施例1を繰り返した。
Examples 6-8
Example 1 was repeated except that the embossing depth was changed as shown in Table 1.

実施例9〜12
表面透明層および下地隠蔽層の厚み、エンボス深度を表1に示すように設定すること以外は実施例1を繰り返した。
Examples 9-12
Example 1 was repeated except that the thickness of the surface transparent layer and the base concealing layer and the embossing depth were set as shown in Table 1.

実施例13
着色層を、接着剤に着色剤を添加しL*値を10に調整した着色接着剤にしたこと以外は、実施例1を繰り返した。
Example 13
Example 1 was repeated except that the colored layer was a colored adhesive in which the L * value was adjusted to 10 by adding the colorant to the adhesive.

上記各実施例の結果を表1に示す。   The results of the above examples are shown in Table 1.

Figure 2012250459
Figure 2012250459

比較例1
エンボス深度を25%とした以外は実施例1と同条件で積層フィルムを作成し、評価を行ったところ、エンボスが浅いため着色層の引き延ばされ方が不足し、下地隠蔽層の色調が充分透けなかったため、印刷感が出ず、同調意匠感が劣る結果となった。
Comparative Example 1
A laminated film was prepared and evaluated under the same conditions as in Example 1 except that the embossing depth was set to 25%. When the embossing was shallow, the colored layer was insufficiently stretched, and the color tone of the underlying concealing layer was Since it was not sufficiently transparent, a printing feeling did not appear, and the synchronized design feeling was inferior.

比較例2
エンボス深度を113%とした以外は実施例1と同条件で積層フィルムを作成し、評価を行ったところ、エンボスが深すぎ、下地隠蔽層の裏面に激しい凹凸が発生し、裏面にコートをした際にはコート抜けが多大に発生した。
Comparative Example 2
A laminated film was prepared and evaluated under the same conditions as in Example 1 except that the embossing depth was 113%. When the evaluation was carried out, the embossing was too deep, severe irregularities occurred on the back surface of the base concealing layer, and the back surface was coated. In some cases, a large amount of coat loss occurred.

比較例3
下地隠蔽層として、L*値が55の塩化ビニル樹脂フィルム(S23106Fc93134、リケンテクノス(株)製)を用い、着色層のL*値を35とした以外は実施例1と同条件で積層フィルムを作成し、評価を行ったところ、下地隠蔽層と着色層とのL*値の差が小さくコントラストが出ないため、印刷感が出ず、同調意匠感が劣る結果となった。
Comparative Example 3
A laminated film was prepared under the same conditions as in Example 1, except that a vinyl chloride resin film (S23106Fc93134, manufactured by Riken Technos Co., Ltd.) having an L * value of 55 was used as the base concealing layer, and the L * value of the colored layer was set to 35. As a result of the evaluation, the difference in L * value between the base concealing layer and the colored layer was so small that no contrast was produced, resulting in poor print feeling and poor synchronized design.

比較例4
着色層を使用せず表面透明層としてL*値が35の塩化ビニル樹脂カラークリヤーフィルム(S23106Fc93947、リケンテクノス(株)製)を用いた以外は実施例1と同条件で積層フィルムを作成し、評価を行ったところ、カラークリヤーフィルムのバンクマークによる厚みムラが顕著で、意匠感に劣る出来となっていた。
Comparative Example 4
A laminated film was prepared and evaluated under the same conditions as in Example 1 except that a vinyl chloride resin color clear film having an L * value of 35 (S23106Fc93947, manufactured by Riken Technos Co., Ltd.) was used as a surface transparent layer without using a colored layer. As a result, the uneven thickness due to the bank mark of the color clear film was remarkable and the design was inferior.

比較例5
下地隠蔽層として、厚みが40μmの塩化ビニル樹脂フィルム(S23108Fc56095、リケンテクノス(株)製)を用いた以外は実施例1と同条件で積層フィルムを作成し、評価を行ったところ、基材の色の影響を受けやすくなり、意匠感が低下し同調意匠感が劣る結果となった。
Comparative Example 5
A laminated film was prepared under the same conditions as in Example 1 except that a vinyl chloride resin film (S23108Fc56095, manufactured by Riken Technos Co., Ltd.) having a thickness of 40 μm was used as the base concealing layer. As a result, the design feeling decreased and the synchronized design feeling deteriorated.

比較例6
下地隠蔽層の厚みを350μmとした以外は実施例1と同条件で積層フィルムを作成し、評価を行ったところ、下地隠蔽層が厚すぎて、下地隠蔽層に厚みムラが発生し、積層フィルム全体の厚みが不均一となり、それによって隠蔽性能が不均一となり意匠感が低下した。
Comparative Example 6
A laminated film was prepared and evaluated under the same conditions as in Example 1 except that the thickness of the base concealing layer was 350 μm. When the evaluation was performed, the base concealing layer was too thick and uneven thickness occurred in the base concealing layer. The overall thickness became non-uniform, thereby concealing performance was non-uniform and the design feeling was lowered.

比較例7
表面透明層の厚みを40μmとした以外は実施例1と同条件で積層フィルムを作成し、評価を行ったところ、フィルムが薄すぎるために、厚みぶれが大きくなってしまい同調意匠感が劣る結果となった。
Comparative Example 7
A laminated film was prepared and evaluated under the same conditions as in Example 1 except that the thickness of the surface transparent layer was 40 μm. As a result, the film was too thin, resulting in increased thickness fluctuation and inferior tuned design. It became.

比較例8
表面透明層の厚みを250μmとした以外は実施例1と同条件で積層フィルムを作成し、評価を行ったところ、表面透明層が厚すぎて、積層フィルム全体の厚みが不均一となり、裏面へのコーティング加工性が悪化した。
Comparative Example 8
A laminated film was prepared and evaluated under the same conditions as in Example 1 except that the thickness of the surface transparent layer was 250 μm. When the surface transparent layer was too thick, the thickness of the entire laminated film became uneven, and the back surface The coating processability of deteriorated.

上記各比較例の結果を表2に示す。   Table 2 shows the results of the above comparative examples.

Figure 2012250459
Figure 2012250459

本発明の積層フィルムは、エンボスと柄が同調しているかのように見える意匠性の高い積層フィルムであるので、建材、壁層材、家具、家電等の化粧材として好適に適用できる。   Since the laminated film of the present invention is a laminated film with high design that looks as if the embossing and the handle are synchronized, it can be suitably applied as a decorative material for building materials, wall layer materials, furniture, home appliances and the like.

10 積層フィルム
102 下地隠蔽層
104 着色層
106 表面透明層
P 基材
DESCRIPTION OF SYMBOLS 10 Laminated film 102 Base concealment layer 104 Colored layer 106 Surface transparent layer P Base material

Claims (6)

下地隠蔽層の上に着色層および表面透明層をこの順に積層したフィルムにエンボス加工を施してなり、以下の条件(a)〜(d)をすべて満たすことを特徴とする積層フィルム。
(a)前記下地隠蔽層のL*値が前記着色層のL*値よりも大きく、両者のL*値の差が30以上である。
(b)前記下地隠蔽層の厚みが50μm〜300μmである。
(c)前記表面透明層の厚みが50μm〜200μmである。
(d)エンボス深度が積層フィルム厚みの30%〜100%である。
A laminated film characterized by embossing a film in which a colored layer and a transparent surface layer are laminated in this order on a base concealing layer, and satisfying all the following conditions (a) to (d).
(A) The L * value of the base concealing layer is larger than the L * value of the colored layer, and the difference between the two L * values is 30 or more.
(B) The base concealing layer has a thickness of 50 μm to 300 μm.
(C) The surface transparent layer has a thickness of 50 μm to 200 μm.
(D) The emboss depth is 30% to 100% of the laminated film thickness.
前記下地隠蔽層のL*値が50〜100であることを特徴とする請求項1に記載の積層フィルム。   The laminated film according to claim 1, wherein an L * value of the base concealing layer is 50 to 100. 前記下地隠蔽層のL*値と着色層のL*値との差が50以上あることを特徴とする請求項1または請求項2に記載の積層フィルム。   The laminated film according to claim 1 or 2, wherein the difference between the L * value of the base concealing layer and the L * value of the colored layer is 50 or more. 下地隠蔽層の上に着色層および表面透明層をこの順に積層したフィルムにエンボス加工を施す工程を有し、以下の条件(a)〜(d)をすべて満たすことを特徴とする積層フィルムの製造方法。
(a)前記下地隠蔽層のL*値が前記着色層のL*値よりも大きく、両者のL*値の差が30以上である。
(b)前記下地隠蔽層の厚みが50μm〜300μmである。
(c)前記表面透明層の厚みが50μm〜200μmである。
(d)エンボス深度が積層フィルム厚みの30%〜100%である。
A process for embossing a film in which a colored layer and a surface transparent layer are laminated in this order on a base concealing layer, and satisfying all of the following conditions (a) to (d): Method.
(A) The L * value of the base concealing layer is larger than the L * value of the colored layer, and the difference between the two L * values is 30 or more.
(B) The base concealing layer has a thickness of 50 μm to 300 μm.
(C) The surface transparent layer has a thickness of 50 μm to 200 μm.
(D) The emboss depth is 30% to 100% of the laminated film thickness.
前記下地隠蔽層のL*値が50〜100であることを特徴とする請求項4に記載の積層フィルムの製造方法。   The method for producing a laminated film according to claim 4, wherein the L * value of the base concealing layer is 50 to 100. 前記下地隠蔽層のL*値と着色層のL*値との差が50以上あることを特徴とする請求項4または請求項5に記載の積層フィルムの製造方法。   6. The method for producing a laminated film according to claim 4, wherein the difference between the L * value of the base concealing layer and the L * value of the colored layer is 50 or more.
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JPS5919012B2 (en) * 1977-03-17 1984-05-02 亨 真志田 Method for producing colored patterned synthetic sheet
JPS5919011B2 (en) * 1977-03-17 1984-05-02 亨 真志田 Method for producing colored patterned sheets
JPS6160953A (en) * 1984-08-31 1986-03-28 ロンシール工業株式会社 Decorative interior material
JPH0134151B2 (en) * 1982-03-20 1989-07-18 Eidai Co Ltd
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JPS5919011B2 (en) * 1977-03-17 1984-05-02 亨 真志田 Method for producing colored patterned sheets
JPS5889317A (en) * 1981-11-24 1983-05-27 Hiroyuki Yasujima Preparation of embossed decorative sheet
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Publication number Priority date Publication date Assignee Title
WO2021149803A1 (en) * 2020-01-24 2021-07-29 大日本印刷株式会社 Decorative sheet, decorative panel, and manufacturing method for decorative sheet
CN114981075A (en) * 2020-01-24 2022-08-30 大日本印刷株式会社 Decorative sheet, decorative plate, and method for producing decorative sheet

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