JP2012236223A - Device for manufacturing radiator and method for manufacturing semiconductor device - Google Patents

Device for manufacturing radiator and method for manufacturing semiconductor device Download PDF

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JP2012236223A
JP2012236223A JP2011108347A JP2011108347A JP2012236223A JP 2012236223 A JP2012236223 A JP 2012236223A JP 2011108347 A JP2011108347 A JP 2011108347A JP 2011108347 A JP2011108347 A JP 2011108347A JP 2012236223 A JP2012236223 A JP 2012236223A
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radiator
press blade
manufacturing apparatus
metal base
groove
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Hideki Komori
秀樹 古森
Yasushi Nakajima
泰 中島
Tetsuo Sakata
哲夫 坂田
Yoshihiro Kashiba
良裕 加柴
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Mitsubishi Electric Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a device for manufacturing a radiator that can manufacture a radiator while bringing a press blade into even contact with a widening groove, thereby increasing fitting property between fins and a metallic base and reducing thermal contact resistance between the metallic base and fins in the radiator, and to provide a method for manufacturing a semiconductor device.SOLUTION: The device for manufacturing a radiator manufactures the radiator which includes the metallic base 4 and radiator fins 5, and in which the radiator fins are fixed to the metallic base by pushing one end of the radiator fin into an upper groove 4g of a protrusion 4a formed in the metallic base while expanding the upper groove. The device for manufacturing a radiator includes the pressing blade that is moved along the lateral surface of the radiator fin to push and expand the groove and provided therein so as to be movable in a direction perpendicular to the lateral surface of the radiator fin.

Description

本発明は、放熱器製造装置とその放熱器製造装置を使用する半導体装置の製造方法に関する。   The present invention relates to a radiator manufacturing apparatus and a semiconductor device manufacturing method using the radiator manufacturing apparatus.

例えば、パワー半導体素子が発生する熱を放熱するヒートシンクは、ダイキャスト成形や押出し成形でフィンとベースを一体化したものと、フィンとベースを個別化して組み合わせたものとがある。
個別化されたフィンとベースを組み合わせたものは、フィンと金属ベースを個別化することで、押出成形やダイキャスト成形で必要な金型に対する強度面での制約が少なく、狭いフィンピッチや長いフィン長を実現できることから、半導体装置の小型化や低コスト化に有効である。
また、フィンと金属ベースを組み合わせる際の嵌合方法としてカシメ工法が挙げられる。例えば、特許文献1には、金属ベースに形成された溝に1つ置きにフィンを挿入して、フィンが挿入されていない溝にプレス刃を挿入することによりフィンを金属ベースに嵌合させる方法が開示されている。すなわち、特許文献1では、フィンとプレス刃が隣あうように配列されて、プレス刃が直上から溝にプレス荷重を与えて拡幅することで、1枚のフィンは嵌合される。特許文献1では、フィンが挿入される溝と拡幅される溝の深さや配置される高さは同じである。そのため、フィンの両側の拡幅された溝による固定位置の高さはほぼ同じである。
For example, heat sinks that dissipate heat generated by power semiconductor elements include those in which fins and bases are integrated by die casting or extrusion molding, and those in which fins and bases are individually combined.
The combination of individualized fins and bases allows the fins and metal bases to be individualized so that there are few restrictions on the strength of the mold required for extrusion molding and die casting, narrow fin pitch and long fins. Since the length can be realized, it is effective in reducing the size and cost of the semiconductor device.
Moreover, the caulking method is mentioned as a fitting method at the time of combining a fin and a metal base. For example, Patent Document 1 discloses a method in which fins are fitted into a metal base by inserting every other fin into a groove formed in the metal base and inserting a press blade into the groove in which no fin is inserted. Is disclosed. That is, in Patent Document 1, the fins and the press blades are arranged so as to be adjacent to each other, and the press blades are applied with a press load to the grooves from directly above to widen the single fins. In Patent Document 1, the depth of the groove into which the fin is inserted and the height of the groove to be widened and the height of the groove are the same. Therefore, the heights of the fixing positions by the widened grooves on both sides of the fin are almost the same.

特開2001−102786号公報(図1)Japanese Patent Laying-Open No. 2001-102786 (FIG. 1)

しかしながら、従来のフィンと金属ベースのカシメ工法は、金属ベース溝を拡幅する際、金属ベース溝の所定の位置にプレス刃を精度よく当てることが必ずしも容易でなく、プレス刃が位置ずれを起こした状態で溝に荷重されることがあった。このような荷重の偏りがあると、溝の拡幅量に差が生じて、フィンの嵌合状態が不安定になり、十分なフィンによる冷却性能を確保できないことになる。
例えば、特許文献1に示された構造では、一枚のフィンに対して、左右からプレス刃が加圧力を与え、嵌合部を変形させることにより、かしめ加工を行っている。ここで、プレス刃が左右のどちらかにずれた状態でかしめ加工を行ったとすると、片側の加圧力は増すが、他方の加圧力が減ることになる。そのため位置ズレ量が大きくなると、かしめ部の嵌合力のアンバランスが大きく、結果として接触熱抵抗が大きくなってしまうことが懸念される。
However, with the conventional fin and metal base caulking method, when the metal base groove is widened, it is not always easy to accurately apply the press blade to a predetermined position of the metal base groove, and the press blade is displaced. In some cases, the groove was loaded. If there is such a bias in load, a difference occurs in the amount of widening of the grooves, the fins are in an unstable state, and sufficient cooling performance by the fins cannot be ensured.
For example, in the structure shown in Patent Document 1, caulking is performed by applying pressure to a single fin from the left and right and deforming the fitting portion. Here, if caulking is performed in a state where the press blade is shifted to the left or right, the pressing force on one side increases, but the pressing force on the other side decreases. For this reason, when the amount of positional deviation increases, there is a concern that the unbalance of the fitting force of the caulking portion is large, and as a result, the contact thermal resistance increases.

そこで、本発明は、プレス刃と拡幅溝の当たりを均一にでき、フィンと金属ベース間のフィンと金属ベース間の嵌合性が高く、金属ベースとフィンの接触熱抵抗の低い放熱器を製造することができる放熱器製造装置と半導体装置の製造方法を提供することを目的とする。   Therefore, the present invention produces a radiator that can make the contact between the press blade and the widening groove uniform, has a high fitting property between the fin and the metal base, and has a low contact thermal resistance between the metal base and the fin. An object of the present invention is to provide a heatsink manufacturing apparatus and a semiconductor device manufacturing method that can be used.

以上の課題を解決するために、本発明に係る放熱器製造装置は、金属ベースと放熱フィンとを含み、金属ベースに設けられた凸部の上の溝を押し拡げることによって前記放熱フィンがその一端部で前記金属ベースに固定される放熱器を製造する放熱器製造装置であって、前記放熱フィンの側面に沿って移動して前記溝を押し拡げるプレス刃を備え、
該プレス刃が前記放熱フィンの側面に交差する方向に移動可能に設けられたことを特徴とする。
In order to solve the above-described problems, a radiator manufacturing apparatus according to the present invention includes a metal base and a heat radiating fin, and the heat radiating fin is expanded by expanding a groove on a convex portion provided on the metal base. A radiator manufacturing apparatus for manufacturing a radiator that is fixed to the metal base at one end, comprising a press blade that moves along a side surface of the radiation fin to expand the groove,
The press blade is provided so as to be movable in a direction intersecting a side surface of the heat radiating fin.

本発明に係る半導体装置の製造方法は、半導体素子と前記放熱器を備えた半導体装置の製造方法であって、前記金属ベースの前記凸部が形成された面とは異なる面に前記半導体素子を接合し、前記金属ベースの接合部を含む一部を内包するように前記半導体素子を樹脂封止した後に、請求項1〜8のうちのいずれか1つに記載の放熱器製造装置を使用して前記放熱フィンを前記金属ベースに固定することを特徴とする。   A manufacturing method of a semiconductor device according to the present invention is a manufacturing method of a semiconductor device including a semiconductor element and the heat radiator, wherein the semiconductor element is disposed on a surface different from a surface on which the convex portion of the metal base is formed. After joining and sealing the semiconductor element so as to enclose a part including the joint portion of the metal base, the radiator manufacturing apparatus according to any one of claims 1 to 8 is used. The heat dissipating fins are fixed to the metal base.

以上のように構成された本発明に係る放熱器製造装置によれば、前記プレス刃が前記放熱フィンの側面に交差する方向に移動可能に設けられているので、プレス刃と拡幅溝の当たりを均一にでき、フィンと金属ベース間の嵌合性が高く、金属ベースとフィンの接触熱抵抗の低い放熱器を製造することができる。
また、本発明に係る半導体装置の製造方法は、前記本発明に係る放熱器製造装置を用いるので、フィンと金属ベース間の嵌合性が高く、金属ベースとフィンの接触熱抵抗の低い放熱器を備えた半導体装置を製造することができる。
According to the radiator manufacturing apparatus according to the present invention configured as described above, the press blade is provided so as to be movable in a direction intersecting the side surface of the heat radiating fin. It is possible to manufacture a radiator that can be made uniform, has a high fit between the fin and the metal base, and has a low contact thermal resistance between the metal base and the fin.
Moreover, since the manufacturing method of the semiconductor device according to the present invention uses the radiator manufacturing device according to the present invention, the radiator having high fitting property between the fin and the metal base and low contact thermal resistance between the metal base and the fin. Can be manufactured.

本発明に係る放熱器製造装置によって製造される放熱器の断面図である。It is sectional drawing of the heat radiator manufactured by the heat radiator manufacturing apparatus which concerns on this invention. 本発明に係る実施形態1の放熱器製造装置におけるプレス刃アッセンブリの構成を示す断面図である。It is sectional drawing which shows the structure of the press blade assembly in the heat radiator manufacturing apparatus of Embodiment 1 which concerns on this invention. 実施形態1のプレス刃アッセンブリにより、かしめ加工を行った後の様子を模式的に示す断面図である。It is sectional drawing which shows typically the mode after performing caulking by the press blade assembly of Embodiment 1. FIG. 図2に示すプレス刃アッセンブリを備えた実施形態1の放熱器製造装置の側面図である。It is a side view of the heat radiator manufacturing apparatus of Embodiment 1 provided with the press blade assembly shown in FIG. 図4のY−Y線についての断面図である。It is sectional drawing about the YY line of FIG. 本発明に係る実施形態1の変形例の放熱器製造装置の断面図である。It is sectional drawing of the heat radiator manufacturing apparatus of the modification of Embodiment 1 which concerns on this invention. 本発明に係る実施形態2の放熱器製造装置の一部を拡大して示す断面図である。It is sectional drawing which expands and shows a part of heat radiator manufacturing apparatus of Embodiment 2 which concerns on this invention. 本発明に係る実施形態3の放熱器製造方法により作製される放熱器の断面図である。It is sectional drawing of the heat radiator produced by the heat radiator manufacturing method of Embodiment 3 which concerns on this invention.

以下、本発明に係る実施形態について説明する。
実施形態1.
図1は、本発明に係る放熱器製造装置によって製造される放熱器であり、半導体装置のヒートシンクとして用いられる。また、図2は、本発明に係る実施形態1の放熱器製造装置におけるプレス刃8のプレス刃アッセンブリを実現するための構成を示す断面図であり、図3は、実施形態1の放熱器製造装置により、かしめ加工を行った後の様子を模式的に示す断面図である。
以下、図1〜図3を参照しながらプレス刃8のセルフアライメント機構について説明する。
Embodiments according to the present invention will be described below.
Embodiment 1. FIG.
FIG. 1 shows a radiator manufactured by a radiator manufacturing apparatus according to the present invention, and is used as a heat sink of a semiconductor device. 2 is a cross-sectional view showing a configuration for realizing the press blade assembly of the press blade 8 in the heat radiator manufacturing apparatus according to the first embodiment of the present invention, and FIG. 3 shows the manufacturing of the heat radiator according to the first embodiment. It is sectional drawing which shows typically the mode after performing caulking with an apparatus.
Hereinafter, the self-alignment mechanism of the press blade 8 will be described with reference to FIGS.

まず、本実施形態1の放熱器製造装置が適用される放熱器の一例を図1を参照しながら説明する。
図1の放熱器は、金属ベース4と放熱フィン5からなり、放熱フィン5が金属ベース4の上面にそれぞれ形成された凸部4aと固定凸部4bの間の嵌合溝に設けられる。
ここで、凸部4aの上面には拡幅溝4gが形成されており、拡幅溝4gが後述するプレス刃8により拡幅されて放熱フィン5が嵌合溝に固定される。また、固定凸部4bは、凸部4aより高く形成することが好ましく、これにより、後述のかしめ工程により、確実にかつ安定して放熱フィン5を固定できる。
First, an example of a radiator to which the radiator manufacturing apparatus of Embodiment 1 is applied will be described with reference to FIG.
The radiator shown in FIG. 1 includes a metal base 4 and heat radiating fins 5, and the heat radiating fins 5 are provided in fitting grooves between the convex portions 4 a and the fixed convex portions 4 b respectively formed on the upper surface of the metal base 4.
Here, a widening groove 4g is formed on the upper surface of the convex portion 4a, and the widening groove 4g is widened by a press blade 8 to be described later, and the radiating fin 5 is fixed to the fitting groove. Moreover, it is preferable to form the fixed convex part 4b higher than the convex part 4a. Thereby, the radiation fin 5 can be fixed reliably and stably by the caulking process described later.

次に、本発明に係る実施形態1の放熱器製造装置において、プレス刃8が拡幅溝4gを押し拡げる際にその先端部の中心が拡幅溝4gの長手方向に伸びる中心線に一致するように移動するセルフアライメント機構を実現する基本構成(プレス刃アッセンブリ)について説明する。   Next, in the heat radiator manufacturing apparatus according to the first embodiment of the present invention, when the press blade 8 expands the widening groove 4g, the center of the tip thereof coincides with the center line extending in the longitudinal direction of the widening groove 4g. A basic configuration (press blade assembly) for realizing a moving self-alignment mechanism will be described.

本発明に係る実施形態1のプレス刃アッセンブリは、図2に示すように、放熱フィン5の側面に沿って下方に移動して拡幅溝4gを押し拡げるプレス刃8を備えており、そのプレス刃8が水平方向(放熱フィン5の側面に直交する方向)に移動可能に設けられている。   As shown in FIG. 2, the press blade assembly according to the first embodiment of the present invention includes a press blade 8 that moves downward along the side surface of the radiating fin 5 to push and widen the widening groove 4 g. 8 is provided to be movable in a horizontal direction (a direction orthogonal to the side surface of the radiation fin 5).

具体的には、実施形態1のプレス刃アッセンブリにおいて、プレス刃8は、拡幅溝4gを押し拡げるために、楔型の先端部8aを有し、先端部8aの稜線8rが拡幅溝4gの直上に位置するように支持軸12によって支持されている。プレス刃8は、プレス刃8に形成された貫通孔に支持軸12が挿入されて所定の高さで支持されており、プレス刃8が支持軸12の軸方向に移動することができる程度に、プレス刃8の貫通孔と支持軸12の間には隙間が設けられている。   Specifically, in the press blade assembly of the first embodiment, the press blade 8 has a wedge-shaped tip portion 8a in order to push and widen the widening groove 4g, and the ridge line 8r of the tip portion 8a is directly above the widening groove 4g. It is supported by the support shaft 12 so as to be located at The press blade 8 has a support shaft 12 inserted into a through-hole formed in the press blade 8 and is supported at a predetermined height, so that the press blade 8 can move in the axial direction of the support shaft 12. A gap is provided between the through hole of the press blade 8 and the support shaft 12.

また、実施形態1のプレス刃アッセンブリでは、プレス刃8の他に固定凸部4b対向するように設けられたフィンガイド板10を有し、プレス刃8とフィンガイド板10とが交互に設けられている。フィンガイド板10は、プレス刃8と同様、フィンガイド板10に形成された貫通孔に支持軸12が挿入されて所定の高さで支持されている。尚、フィンガイド板10は、支持軸12の軸方向に移動できるように構成してもよいし、支持軸12に固定されていてもよい。   Further, the press blade assembly of the first embodiment has the fin guide plate 10 provided so as to face the fixed convex portion 4b in addition to the press blade 8, and the press blade 8 and the fin guide plate 10 are provided alternately. ing. Similar to the press blade 8, the fin guide plate 10 is supported at a predetermined height by inserting a support shaft 12 into a through hole formed in the fin guide plate 10. The fin guide plate 10 may be configured to be movable in the axial direction of the support shaft 12 or may be fixed to the support shaft 12.

そして、プレス刃8とフィンガイド板10の間には、例えば、皿バネ9aからなる弾性部材9が設けられている。皿バネ9aは中心に貫通孔を有し、2つの皿バネ9aが凸面が接触するようにプレス刃8とフィンガイド板10の間に設けられる。この弾性部材9によって、プレス刃8は、先端部8aの稜線8rが拡幅溝4gの直上に位置するように初期設定される。   And between the press blade 8 and the fin guide plate 10, the elastic member 9 which consists of the disc spring 9a is provided, for example. The disc spring 9a has a through hole in the center, and the two disc springs 9a are provided between the press blade 8 and the fin guide plate 10 so that the convex surfaces are in contact with each other. By this elastic member 9, the press blade 8 is initially set so that the ridge line 8r of the tip 8a is positioned immediately above the widening groove 4g.

以上のように構成された実施形態1の放熱器製造装置において、プレス刃アッセンブリを、放熱フィン5の側面に沿ってプレス刃8を下降させると、以下のようにセルフアライメント機構が働き、拡幅溝4gを左右均等に押し広げることができる。
例えば、プレス刃8の先端部8aが拡幅溝4gの両側の側壁の一方の側壁に先に接したとすると、プレス刃8が他方の側壁の側に移動して両方の側壁に接した後に均等に両側の側壁を押し広げるように加圧する。
また、プレス刃8の先端部8aが拡幅溝4gの両側の側壁に同時に接した場合には、そのまま左右に移動することなく両側の側壁を押し広げるように加圧する。
In the radiator manufacturing apparatus according to the first embodiment configured as described above, when the press blade assembly is lowered along the side surface of the radiating fin 5, the self-alignment mechanism works as described below, and the widening groove is formed. 4g can be spread evenly from side to side.
For example, assuming that the tip 8a of the press blade 8 is in contact with one side wall on both sides of the widening groove 4g first, the press blade 8 moves to the other side wall and contacts the both side walls. Press to spread the side walls on both sides.
Further, when the tip 8a of the press blade 8 is in contact with the side walls on both sides of the widening groove 4g at the same time, pressure is applied so as to push the side walls on both sides without expanding left and right.

以上のようにして、実施形態1のプレス刃アッセンブリは、例えば、金属ベース4の加工バラツキ等により、拡幅溝4gに対してプレス刃8が位置ずれを起こしているような場合であっても、拡幅溝4gを押し拡げる際に先端部8aの稜線8rが拡幅溝4gの長手方向に伸びる中心線に一致するように移動して(セルフアライメント機構)、常に、拡幅溝4gを左右均等に押し広げることができる(図3)。
また、かしめ加工が完了し、プレス力を開放した時には、自動的に初期位置にプレス刃8が戻る。
As described above, the press blade assembly according to the first embodiment is, for example, a case where the press blade 8 is misaligned with respect to the widening groove 4g due to processing variation of the metal base 4 or the like. When the widening groove 4g is expanded, the ridgeline 8r of the tip 8a moves so as to coincide with the center line extending in the longitudinal direction of the widening groove 4g (self-alignment mechanism), and the widening groove 4g is always evenly pushed left and right. (FIG. 3).
When the caulking process is completed and the pressing force is released, the press blade 8 automatically returns to the initial position.

以上のプレス刃アッセンブリを備えた実施形態1の放熱器製造装置によれば、金属ベース4の拡幅溝寸法や位置の加工精度の緩やかにすることができ、金属ベースの低コスト化が可能となる。
尚、プレス刃アッセンブリにおけるプレス刃8の移動可能な範囲(遊び変位量)は、例えば、モールド樹脂とベースの線膨張係数の差、アフターキュア温度と常温の差、金属ベース4の長さを基に想定される加工バラツキが吸収できるように、設定される。
According to the heat radiator manufacturing apparatus of the first embodiment provided with the above press blade assembly, the processing accuracy of the widening groove dimension and position of the metal base 4 can be moderated, and the cost of the metal base can be reduced. .
Note that the movable range (play displacement amount) of the press blade 8 in the press blade assembly is based on, for example, the difference between the linear expansion coefficients of the mold resin and the base, the difference between the after cure temperature and the normal temperature, and the length of the metal base 4. It is set so that the processing variation assumed in the above can be absorbed.

以下、上記プレス刃アッセンブリを備えた実施形態1の放熱器製造装置の全体構成を図4及び図5を参照しながら説明する。
プレス刃8とフィンガイド板10と弾性部材9が支持軸12に支持されてなるプレス刃アッセンブリは、例えば、図4及び図5に示すように、ガイド上板11aとガイド側板11bとを有するアウターガイド板11に組み込まれる。
尚、図4及び図5には、2つの支持軸12によってプレス刃8とフィンガイド板10とが支持されたプレス刃アッセンブリを用いて構成した例を示すが、本発明はこれに限定されるものではなく、支持軸は1以上あればよい。
Hereinafter, the whole structure of the heat radiator manufacturing apparatus of Embodiment 1 provided with the said press blade assembly is demonstrated, referring FIG.4 and FIG.5.
The press blade assembly in which the press blade 8, the fin guide plate 10 and the elastic member 9 are supported by the support shaft 12 is, for example, an outer member having a guide upper plate 11a and a guide side plate 11b as shown in FIGS. It is incorporated in the guide plate 11.
4 and 5 show an example in which the press blade assembly in which the press blade 8 and the fin guide plate 10 are supported by the two support shafts 12 is used, the present invention is limited to this. It is not a thing and what is necessary is just one or more support shafts.

具体的には、アウターガイド板11は、ガイド上板11aの両端部にガイド側板11bが取り付けられてなる。ガイド側板11bにはそれぞれ、支持軸12を支える孔が設けられている。このアウターガイド板11にプレス刃アッセンブリのプレス刃8の上面とフィンガイド板10の上面とがガイド上板11aの下面に接するようにプレス刃アッセンブリが取り付けられる。また、支持軸12をガイド側板11bに固定する方法は、特に限定されるものではないが、例えば、図4及び図5に示すように、支持軸12の先端部分に形成されたねじ部にガイド側板11bの外側からボルト13で固定するようにすればよい。   Specifically, the outer guide plate 11 includes guide side plates 11b attached to both ends of the guide upper plate 11a. Each guide side plate 11b is provided with a hole for supporting the support shaft 12. The press blade assembly is attached to the outer guide plate 11 so that the upper surface of the press blade 8 of the press blade assembly and the upper surface of the fin guide plate 10 are in contact with the lower surface of the guide upper plate 11a. The method of fixing the support shaft 12 to the guide side plate 11b is not particularly limited. For example, as shown in FIGS. 4 and 5, the guide shaft is guided to a screw portion formed at the tip portion of the support shaft 12. What is necessary is just to make it fix with the volt | bolt 13 from the outer side of the side plate 11b.

以上の実施形態1に係る放熱器製造装置のプレス刃アッセンブリでは、弾性部材9として皿ばねを用いたが、本発明はこれに限定されるものではなく、図6に示すリング状弾性体(硬質ゴム、弾性樹脂)を用いて構成してもよい。   In the press blade assembly of the radiator manufacturing apparatus according to Embodiment 1 described above, a disc spring is used as the elastic member 9, but the present invention is not limited to this, and the ring-shaped elastic body (hard material) shown in FIG. (Rubber, elastic resin) may be used.

また、本実施形態1において、プレス刃8の上端面8bは、平坦に加工されており、平坦なアウターガイド板に接している。このためプレス刃8がずれて金属ベース4の拡幅溝4gに対して垂直に押圧されて来た場合、水平方向の力が働くが、このとき各プレス刃8は皿バネ9aおよび上端面8bの平坦面およびアウターガイド板の平坦面の作用により、垂直加圧力を与えながら、水平に移動し、かしめ加工の片当たりを自動的に防止する。
このましくプレス刃8の上端面8bとアウターガイド板の下面とを平滑面に仕上げておくことで、より水平移動の容易にでき、安定なかしめ加圧が可能となる。
また、皿バネ9aのバネ定数を適切な値に設定することでプレス刃8のスムースな移動を確保するとともに安定したかしめ加工を両立できる。
In the first embodiment, the upper end surface 8b of the press blade 8 is processed flat and is in contact with the flat outer guide plate. For this reason, when the press blade 8 is displaced and is pressed perpendicularly to the widening groove 4g of the metal base 4, a horizontal force is applied. At this time, each press blade 8 has a disc spring 9a and an upper end surface 8b. Due to the action of the flat surface and the flat surface of the outer guide plate, it moves horizontally while applying vertical pressure, and automatically prevents the piece from being caulked.
By finishing the upper end surface 8b of the press blade 8 and the lower surface of the outer guide plate as smooth surfaces, horizontal movement can be facilitated and stable caulking can be performed.
Further, by setting the spring constant of the disc spring 9a to an appropriate value, it is possible to ensure smooth movement of the press blade 8 and to achieve stable caulking.

しかしながら、本発明では、プレス刃8の上端面8bを以下の実施形態2のように曲面にすることもできる。   However, in the present invention, the upper end surface 8b of the press blade 8 can be curved as in the second embodiment.

実施形態2.
本発明に係る実施形態2の放熱器製造装置は、図7に示すように、プレス刃8の後端面8bがその後端面の一部でガイド上板の下面に接するように凹円弧状の曲面となっている以外は、実施形態1の放熱器製造装置と同様に構成される。
Embodiment 2. FIG.
As shown in FIG. 7, the radiator manufacturing apparatus according to the second embodiment of the present invention has a concave arcuate curved surface such that the rear end surface 8 b of the press blade 8 is in contact with the lower surface of the guide upper plate at a part of the rear end surface. Except for this, the configuration is the same as that of the radiator manufacturing apparatus of the first embodiment.

以上のように構成された実施形態2の放熱器製造装置では、プレス刃8の後端面8bが凹円弧状に形成されているため、プレス刃8が凸部4aの拡幅溝4gの中心に向けてセルフアライメントする際、プレス刃8の後端面8bとアウターガイド板11との摩擦を小さくできるため、プレス刃8の移動が容易となる。これにより、フィン5と金属ベース4の嵌合処理をスムースにでき、処理スループット改善となり、大幅な生産性向上に寄与できる。
なお、フィンガイド板10の終端表面(アウターガイド板11と接触する面)は、後端面8bと同様、凹円弧状にしてもよいし、フラット(平面)のままでもよい。
In the radiator manufacturing apparatus according to Embodiment 2 configured as described above, the press blade 8 is directed toward the center of the widening groove 4g of the convex portion 4a because the rear end surface 8b of the press blade 8 is formed in a concave arc shape. When the self-alignment is performed, the friction between the rear end surface 8b of the press blade 8 and the outer guide plate 11 can be reduced, so that the press blade 8 can be easily moved. Thereby, the fitting process of the fin 5 and the metal base 4 can be performed smoothly, the processing throughput can be improved, and the productivity can be greatly improved.
Note that the end surface of the fin guide plate 10 (the surface in contact with the outer guide plate 11) may be formed in a concave arc shape or flat (plane) as in the case of the rear end surface 8b.

以上の実施形態1及び実施形態2の放熱器製造装置では、主として、プレス刃8がその加圧移動方向と直交する横方向に移動して溝4gの中心に向けてセルフアライメントする機構を説明したが、本発明はこれに限定されるものではなく、横方向に移動に代え、又は横方向に移動に加えて、例えば、実施形態2における円弧状の後端面8bの中心軸を中心とした回転による先端部の移動により、プレス刃の位置ずれ追従機能が果たされていてもよい。このような回転移動又は回転移動を伴っていても、プレス刃のアスペクト比(プレス刃の厚さに対する加圧方向の長さの比)が十分大きいため、加圧方向における変動がほとんどない状態で、実質的に先端部だけが移動するような動きが実現できる。また、図示しない図の前後方向の端部の軸支えなどを更に備えることで、プレス加工が終了してプレス刃を上昇させる時の(もしくはワークを下降させるときの)プレス刃の脱落を防止でき、強いかしめ力にまで対応可能となる。   In the heat radiator manufacturing apparatus according to the first and second embodiments described above, the mechanism in which the press blade 8 moves in the lateral direction perpendicular to the pressurizing movement direction and self-aligns toward the center of the groove 4g has been mainly described. However, the present invention is not limited to this, and instead of moving in the lateral direction or in addition to moving in the lateral direction, for example, rotation about the central axis of the arcuate rear end surface 8b in the second embodiment. The function of following the positional deviation of the press blade may be fulfilled by the movement of the tip end due to. Even with such rotational movement or rotational movement, the aspect ratio of the press blade (the ratio of the length in the pressurization direction to the thickness of the press blade) is sufficiently large, so there is almost no fluctuation in the pressurization direction. Thus, it is possible to realize a movement in which only the tip portion moves. Further, by further providing a shaft support at the end portion in the front-rear direction in the figure (not shown), it is possible to prevent the press blade from falling off when the press processing is finished and the press blade is raised (or when the workpiece is lowered). It is possible to cope with strong caulking power.

実施形態3.
本発明に係る実施形態3は、実施形態1又は2の放熱器製造装置に用いた半導体装置の製造方法に係るものである。
まず、本実施形態3の半導体装置の製造方法により作製される半導体装置の構成を図8を参照しながら説明する。
図8の半導体装置は、図1に示す放熱器と、金属ベース4の下面に絶縁シート1を介して固着されたフレーム2aと、半導体素子3と、半導体素子3にワイヤにより接続されたフレーム2bとを備え、金属ベース4の固定凸部4bと拡幅凸部4aとを除くベース部分(接合部)が半導体素子3とともにモールド樹脂封止されている。
Embodiment 3. FIG.
Embodiment 3 which concerns on this invention concerns on the manufacturing method of the semiconductor device used for the heat radiator manufacturing apparatus of Embodiment 1 or 2. FIG.
First, the configuration of a semiconductor device manufactured by the semiconductor device manufacturing method of Embodiment 3 will be described with reference to FIG.
The semiconductor device of FIG. 8 includes a radiator shown in FIG. 1, a frame 2a fixed to the lower surface of the metal base 4 via an insulating sheet 1, a semiconductor element 3, and a frame 2b connected to the semiconductor element 3 by wires. The base portion (joint portion) excluding the fixed convex portion 4b and the widened convex portion 4a of the metal base 4 is sealed together with the semiconductor element 3 by mold resin.

そして、本発明に係る実施形態3の半導体装置の製造方法では、半導体素子3を金属ベース4に接合して樹脂封止した後に、実施形態1又は2の放熱器製造装置に用いて拡幅溝4gを加圧して放熱フィン5を金属ベース4に嵌合固定する。   And in the manufacturing method of the semiconductor device of Embodiment 3 which concerns on this invention, after joining the semiconductor element 3 to the metal base 4 and resin-sealing, it is used for the heat radiator manufacturing apparatus of Embodiment 1 or 2, and the widening groove | channel 4g. And the heat dissipating fin 5 is fitted and fixed to the metal base 4.

このように、樹脂封止した後に、拡幅溝4gを加圧して放熱フィン5を嵌合固定しようとすると、例えば、熱硬化性のエポキシ樹脂で封止した場合、硬化温度は通常180℃とするが、この硬化温度から常温に戻る過程で、モールド樹脂6に内包される部分の構成材料が複数あるため、線膨張係数の違いにより反りが発生して、固定凸部4bと拡幅凸部4aとの位置精度が悪化する。しかしながら、
実施形態3の半導体装置の製造方法では、実施形態1又は2の放熱器製造装置に用いているので、そのセルフアライメント機能により拡幅溝4gを偏って加圧することがなく、安定したかしめ加工が可能となる。
Thus, after resin sealing, if it is going to pressurize the widening groove | channel 4g and it is going to fit and fix the radiation fin 5, when it seals with a thermosetting epoxy resin, for example, a curing temperature will usually be 180 degreeC. However, in the process of returning from the curing temperature to room temperature, since there are a plurality of constituent materials included in the mold resin 6, warping occurs due to the difference in linear expansion coefficient, and the fixed convex portion 4 b and the widened convex portion 4 a The position accuracy of will deteriorate. However,
Since the semiconductor device manufacturing method according to the third embodiment is used in the radiator manufacturing apparatus according to the first or second embodiment, the widening groove 4g is not biased by the self-alignment function, and stable caulking is possible. It becomes.

1 絶縁シート
2 フレーム
3 半導体素子
4 金属ベース
4a 凸部
4b 固定凸部
4g 拡幅溝
5 放熱フィン
6 モールド樹脂
8 プレス刃
8a 楔形状の先端部
8b 上端面
8r 稜線
9 弾性部材
9a 皿バネ
9b 弾性体
10 フィンガイド板
11a ガイド上板
11b ガイド側板
11 アウターガイド板
12 支持軸
DESCRIPTION OF SYMBOLS 1 Insulation sheet 2 Frame 3 Semiconductor element 4 Metal base 4a Convex 4b Fixed convex 4g Widening groove 5 Radiation fin 6 Mold resin 8 Press blade 8a Wedge-shaped tip 8b Upper end 8r Ridge line 9 Elastic member 9a Belleville spring 9b Elastic body DESCRIPTION OF SYMBOLS 10 Fin guide plate 11a Guide upper plate 11b Guide side plate 11 Outer guide plate 12 Support shaft

Claims (9)

金属ベースと放熱フィンとを含み、金属ベースに設けられた凸部の上の溝を押し拡げることによって前記放熱フィンがその一端部で前記金属ベースに固定される放熱器を製造する放熱器製造装置であって、
前記放熱フィンの側面に沿って移動して前記溝を押し拡げるプレス刃を備え、
該プレス刃が前記放熱フィンの側面に交差する方向に移動可能に設けられたことを特徴とする放熱器製造装置。
A radiator manufacturing apparatus for manufacturing a radiator including a metal base and a heat radiating fin, wherein the heat radiating fin is fixed to the metal base at one end thereof by expanding a groove on a convex portion provided on the metal base. Because
A press blade that moves along the side surface of the heat dissipating fins to expand the groove,
The radiator manufacturing apparatus, wherein the press blade is provided so as to be movable in a direction intersecting a side surface of the radiation fin.
前記プレス刃は、前記溝の長手方向に平行な稜線を有する楔形状の先端部を有し、該先端部は前記溝を押し拡げる際に前記稜線が前記溝の長手方向に伸びる中心線に一致するように移動可能に設けられている請求項1記載の放熱器製造装置。   The press blade has a wedge-shaped tip portion having a ridge line parallel to the longitudinal direction of the groove, and the tip portion coincides with a center line where the ridge line extends in the longitudinal direction of the groove when the groove is expanded. The radiator manufacturing apparatus according to claim 1, which is movably provided. ガイド上板とガイド側板とを有するアウターガイド板と、前記プレス刃を前記稜線に直交する方向に貫通し該プレス刃の両側でガイド側板に固定された支持軸とをさらに備え、前記プレス刃が支持軸の軸方向に移動可能にアウターガイド板に支持された請求項1又は2に記載の放熱器製造装置。   An outer guide plate having a guide upper plate and a guide side plate; and a support shaft that passes through the press blade in a direction perpendicular to the ridgeline and is fixed to the guide side plate on both sides of the press blade. The heat radiator manufacturing apparatus according to claim 1, wherein the heat sink is supported by an outer guide plate so as to be movable in an axial direction of the support shaft. 前記プレス刃の後端面は、その後端面の一部で前記ガイド上板の下面に接するように曲面となっている請求項3記載の放熱器製造装置。   The radiator manufacturing apparatus according to claim 3, wherein a rear end surface of the press blade is a curved surface so as to be in contact with a lower surface of the guide upper plate at a part of the rear end surface. 貫通孔を有する弾性部材を前記プレス刃の両側に有し、前記貫通孔に前記支持軸が貫通して該弾性部材によって前記プレス刃の位置が初期設定された請求項3又は4記載の放熱器製造装置。   5. The radiator according to claim 3, wherein an elastic member having a through hole is provided on both sides of the press blade, the support shaft passes through the through hole, and the position of the press blade is initially set by the elastic member. manufacturing device. 前記弾性部材は、前記貫通孔から両端部に向かって湾曲した皿バネである請求項5記載の放熱器製造装置。   The radiator manufacturing apparatus according to claim 5, wherein the elastic member is a disc spring curved toward both ends from the through hole. 前記弾性部材は、弾性体からなる請求項5記載の放熱器製造装置。   The radiator manufacturing apparatus according to claim 5, wherein the elastic member is made of an elastic body. 前記金属ベースが前記凸部と交互に設けられた固定凸部を有し、溝が押し拡げられた前記凸部と前記固定凸部とによって前記放熱フィンが固定される放熱器を製造するための放熱器製造装置であって、前記固定凸部に対向する位置にフィンガイド板をさらに有する請求項1〜7のうちのいずれか1つに記載の放熱器製造装置。   The metal base has fixed convex portions provided alternately with the convex portions, and a radiator for manufacturing the radiator in which the radiating fins are fixed by the convex portions and the fixed convex portions in which grooves are expanded. It is a heat radiator manufacturing apparatus, Comprising: The heat radiator manufacturing apparatus as described in any one of Claims 1-7 which further has a fin guide plate in the position facing the said fixed convex part. 半導体素子と前記放熱器を備えた半導体装置の製造方法であって、
前記金属ベースの前記凸部が形成された面とは異なる面に前記半導体素子を接合し、前記金属ベースの接合部を含む一部を内包するように前記半導体素子を樹脂封止した後に、請求項1〜8のうちのいずれか1つに記載の放熱器製造装置を使用して前記放熱フィンを前記金属ベースに固定することを特徴とする半導体装置の製造方法。
A method of manufacturing a semiconductor device comprising a semiconductor element and the heat radiator,
The semiconductor element is bonded to a surface different from the surface on which the convex portion of the metal base is formed, and the semiconductor element is resin-sealed so as to include a part including the metal base bonding portion. The manufacturing method of the semiconductor device characterized by fixing the said radiation fin to the said metal base using the radiator manufacturing apparatus of any one of claim | item 1 -8.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014098214A1 (en) * 2012-12-21 2014-06-26 京セラ株式会社 Flow path member, and heat exchanger and semiconductor device using same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014098214A1 (en) * 2012-12-21 2014-06-26 京セラ株式会社 Flow path member, and heat exchanger and semiconductor device using same

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