JP2012233035A - Addition-curable silicone composition and optical semiconductor device using the same - Google Patents
Addition-curable silicone composition and optical semiconductor device using the same Download PDFInfo
- Publication number
- JP2012233035A JP2012233035A JP2011101142A JP2011101142A JP2012233035A JP 2012233035 A JP2012233035 A JP 2012233035A JP 2011101142 A JP2011101142 A JP 2011101142A JP 2011101142 A JP2011101142 A JP 2011101142A JP 2012233035 A JP2012233035 A JP 2012233035A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silicone composition
- curing
- optical semiconductor
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 66
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 51
- 239000004065 semiconductor Substances 0.000 title claims abstract description 18
- 230000003287 optical effect Effects 0.000 title claims abstract description 17
- 238000001723 curing Methods 0.000 claims abstract description 28
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000003054 catalyst Substances 0.000 claims abstract description 11
- 238000013007 heat curing Methods 0.000 claims abstract description 11
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 claims abstract description 10
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 6
- 239000000853 adhesive Substances 0.000 claims abstract description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 5
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 5
- 239000012463 white pigment Substances 0.000 claims abstract description 5
- 239000003566 sealing material Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 9
- 238000001579 optical reflectometry Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 3
- 238000004382 potting Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 10
- 229910052710 silicon Inorganic materials 0.000 abstract description 10
- 239000000443 aerosol Substances 0.000 abstract 1
- -1 heptenyl group Chemical group 0.000 description 53
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 11
- 229910021485 fumed silica Inorganic materials 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- 238000002156 mixing Methods 0.000 description 9
- 229920001577 copolymer Polymers 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 125000005370 alkoxysilyl group Chemical group 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 125000001183 hydrocarbyl group Chemical group 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000004205 dimethyl polysiloxane Substances 0.000 description 5
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 5
- 229920002545 silicone oil Polymers 0.000 description 5
- 229920002050 silicone resin Polymers 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000006459 hydrosilylation reaction Methods 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000002683 reaction inhibitor Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 3
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 238000004438 BET method Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910004283 SiO 4 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- FCCRGBVYSYHQRQ-UHFFFAOYSA-N [ethenyl(dimethyl)silyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)C=C FCCRGBVYSYHQRQ-UHFFFAOYSA-N 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 229920005645 diorganopolysiloxane polymer Polymers 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000006038 hexenyl group Chemical group 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- QBERHIJABFXGRZ-UHFFFAOYSA-M rhodium;triphenylphosphane;chloride Chemical compound [Cl-].[Rh].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 QBERHIJABFXGRZ-UHFFFAOYSA-M 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 230000009974 thixotropic effect Effects 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 229920005601 base polymer Polymers 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000013008 moisture curing Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 125000005386 organosiloxy group Chemical group 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000012763 reinforcing filler Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000004590 silicone sealant Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011995 wilkinson's catalyst Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/14—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Device Packages (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
本発明は、適度な粘度(吐出性)を有し、非流動性(加熱硬化時の形状安定性)及び光の反射性に優れ、特にLED用光反射材に使用される自己接着性を有する付加硬化型シリコーン組成物及びそれを用いた光半導体装置に関する。 The present invention has an appropriate viscosity (dischargeability), excellent non-fluidity (shape stability during heat curing) and light reflectivity, and particularly has self-adhesiveness used for light reflecting materials for LEDs. The present invention relates to an addition-curable silicone composition and an optical semiconductor device using the same.
近年、LEDは、ノートパソコンや液晶テレビ等への使用が試みられている。大画面を均一に点灯するにはサイドビュータイプLEDやトップビュータイプLEDを数多く並べることで達成される。それに対し、マップ基板と呼ばれる基板上にLEDチップ及びワイヤーが接続された回路基板上に封止材料をドーム状に形成する方法もある。この封止材の成形は、液状シリコーンを数滴垂らして加熱硬化すれば可能であるが、加熱中硬化が始まるまでに粘度が低下して広がってしまうため効果的に封止できない問題があった。また、封止材自身に流動停止性能を持たせるために煙霧質シリカを添加することもできるが、耐熱・耐光性が高いジメチルポリシロキサンを主成分とするシリコーンに添加すると外観が乳白色になる問題があった。 In recent years, LEDs have been tried to be used for notebook computers, liquid crystal televisions, and the like. Uniform lighting of a large screen is achieved by arranging a large number of side view type LEDs and top view type LEDs. On the other hand, there is also a method of forming a sealing material in a dome shape on a circuit board in which LED chips and wires are connected on a substrate called a map substrate. This sealing material can be molded by dripping a few drops of liquid silicone and curing by heating. However, there is a problem that the sealing cannot be effectively performed because the viscosity decreases and spreads before curing starts. . In addition, although fumed silica can be added to give the sealing material itself flow stop performance, the appearance becomes milky white when added to silicone with dimethylpolysiloxane as the main component, which has high heat resistance and light resistance. was there.
このような中で、封止材料の形状を安定化する方法の一つに、形状安定性の高い材料でダムのようなものを作り、その中に封止材をポッティングする方法が考えられた。このようなダムを形成する材料には、無加熱で硬化する湿気硬化型シリコーンゴム組成物が好適と考えられ、実際これを硬化させても塗布前後の形状が変形しないものが少なくない。しかし、半日から数日という長い硬化時間と、架橋させるための硬化剤が付加硬化型シリコーン封止材の架橋に対し硬化阻害を及ぼすことから使用できなかった。 Under such circumstances, as a method for stabilizing the shape of the sealing material, a method of making a dam like a material having high shape stability and potting the sealing material therein was considered. . As a material for forming such a dam, a moisture-curing silicone rubber composition that cures without heating is considered suitable. In fact, there are many cases in which the shape before and after application is not deformed even when cured. However, it cannot be used because it takes a long curing time from half a day to several days and the curing agent for crosslinking exerts a curing inhibition on the crosslinking of the addition-curable silicone sealing material.
なお、本発明に関連する従来技術として、下記文献が挙げられる。 In addition, the following literature is mentioned as a prior art relevant to this invention.
本発明は、上記事情に鑑みなされたもので、適度な粘度(吐出性)と、非流動性(加熱硬化時の形状安定性)及び光の反射性に優れ、特にLED用光反射材に使用される自己接着性を有する付加硬化型シリコーン組成物及びそれを用いた光半導体装置を提供することを目的とする。 The present invention has been made in view of the above circumstances, and is excellent in moderate viscosity (dischargeability), non-fluidity (shape stability at the time of heat curing) and light reflectivity, and particularly used for a light reflecting material for LED. An object of the present invention is to provide a self-adhesive addition-curable silicone composition and an optical semiconductor device using the same.
本発明者らは、上記目的を達成するため鋭意検討を重ねた結果、
(A)一分子中に珪素原子に結合するアルケニル基を少なくとも2個有するオルガノポリシロキサン:100質量部、
(B)一分子中に少なくとも2個の珪素原子に結合する水素原子と少なくとも1個のアルコキシ基を有するオルガノハイドロジェンポリシロキサン:上記(A)成分の総アルケニル基数に対して総Si−H基数が1.4〜5.0倍となる量、
(C)煙霧質シリカ:(A)、(B)成分の合計100質量部に対し8〜30質量部、
(D)白色顔料、
(E)硬化触媒
を含有する、光半導体装置に対する自己接着性付加硬化型シリコーン組成物が、ディスペンス装置を使用して基材に塗布可能で、加熱硬化させても塗布した形状を保ち、良好な自己接着性を有する光反射材となることを見出し、本発明をなすに至った。
As a result of intensive studies to achieve the above object, the present inventors have
(A) Organopolysiloxane having at least two alkenyl groups bonded to silicon atoms in one molecule: 100 parts by mass
(B) Organohydrogenpolysiloxane having hydrogen atoms bonded to at least two silicon atoms and at least one alkoxy group in one molecule: the total number of Si-H groups relative to the total number of alkenyl groups in the component (A) Is 1.4 to 5.0 times,
(C) Smokeous silica: 8 to 30 parts by mass with respect to a total of 100 parts by mass of components (A) and (B),
(D) a white pigment,
(E) A self-adhesive addition curable silicone composition for an optical semiconductor device containing a curing catalyst can be applied to a substrate using a dispensing device, and the applied shape is maintained even when heat-cured, and is good. The present inventors have found that it becomes a light reflecting material having self-adhesiveness, and has made the present invention.
従って、本発明は、下記に示す付加硬化型シリコーン組成物及びそれを用いた光半導体装置を提供する。
〔請求項1〕
(A)一分子中に珪素原子に結合するアルケニル基を少なくとも2個有するオルガノポリシロキサン:100質量部、
(B)一分子中に少なくとも2個の珪素原子に結合する水素原子と少なくとも1個のアルコキシ基を有するオルガノハイドロジェンポリシロキサン:上記(A)成分の総アルケニル基数に対して総Si−H基数が1.4〜5.0倍となる量、
(C)煙霧質シリカ:(A)、(B)成分の合計100質量部に対し8〜30質量部、
(D)白色顔料、
(E)硬化触媒
を含有する光半導体装置に対する自己接着性付加硬化型シリコーン組成物。
〔請求項2〕
E型粘度計を使用したときの回転速度が1rpmの時の25℃における粘度が70Pa・s以上500Pa・s以下であり、5rpmにおける粘度(25℃)との比(1rpm/5rpm粘度比(チクソ係数))が2.5以上であることを特徴とする請求項1記載のシリコーン組成物。
〔請求項3〕
ディスペンス装置によりニードルから基材上に塗布されたシリコーン組成物の硬化前及び加熱硬化後の高さ/幅の比が0.8以上であることを特徴とする請求項1又は2記載のシリコーン組成物。
〔請求項4〕
付加硬化型シリコーン組成物を2mm厚みで成形、硬化したシートの、450nm光の光反射率が90%以上であることを特徴とする請求項1〜3のいずれか1項記載のシリコーン組成物。
〔請求項5〕
光半導体装置の基板上にディスペンス装置を用いて請求項1〜4のいずれか1項記載のシリコーン組成物により、未硬化状態の液状封止材を流れ出さないようにするための、高さ0.5mm以上のダムを形成する工程と、必要によりシリコーン組成物のダムを加熱硬化する工程と、該ダム内に封止材をポッティングする工程と、該封止材又はシリコーン組成物のダムを硬化させてない場合はこれと該封止材とを加熱硬化することで一体成形化する工程とを有する光半導体装置の製造方法。
〔請求項6〕
請求項5記載の方法により得られた光半導体装置。
Accordingly, the present invention provides the following addition-curable silicone composition and an optical semiconductor device using the same.
[Claim 1]
(A) Organopolysiloxane having at least two alkenyl groups bonded to silicon atoms in one molecule: 100 parts by mass
(B) Organohydrogenpolysiloxane having hydrogen atoms bonded to at least two silicon atoms and at least one alkoxy group in one molecule: the total number of Si-H groups relative to the total number of alkenyl groups in the component (A) Is 1.4 to 5.0 times,
(C) Smokeous silica: 8 to 30 parts by mass with respect to a total of 100 parts by mass of components (A) and (B),
(D) a white pigment,
(E) A self-adhesive addition-curable silicone composition for an optical semiconductor device containing a curing catalyst.
[Claim 2]
When using an E-type viscometer, the viscosity at 25 ° C. when the rotational speed is 1 rpm is 70 Pa · s to 500 Pa · s, and the ratio to the viscosity at 25 rpm (25 ° C.) (1 rpm / 5 rpm viscosity ratio (thixo 2. The silicone composition according to claim 1, wherein the coefficient)) is 2.5 or more.
[Claim 3]
The silicone composition according to claim 1 or 2, wherein a ratio of height / width before and after curing of the silicone composition applied from a needle to a substrate by a dispensing device is 0.8 or more. object.
[Claim 4]
The silicone composition according to any one of claims 1 to 3, wherein a sheet obtained by molding and curing the addition-curable silicone composition with a thickness of 2 mm has a light reflectivity of 450 nm light of 90% or more.
[Claim 5]
A height of 0 for preventing the uncured liquid sealing material from flowing out by the silicone composition according to any one of claims 1 to 4 using a dispensing device on the substrate of the optical semiconductor device. A step of forming a dam of 5 mm or more, a step of heat-curing the dam of the silicone composition, if necessary, a step of potting a sealing material in the dam, and a curing of the dam of the sealing material or the silicone composition If not, a method for manufacturing an optical semiconductor device comprising the step of integrally forming the sealing material by heat-curing the sealing material.
[Claim 6]
An optical semiconductor device obtained by the method according to claim 5.
本発明の付加硬化型シリコーン組成物は、適度な粘度を有するため吐出性に優れ、非流動性を有するため加熱硬化時の形状安定性に優れ、また該組成物の硬化物は光の反射性にも優れるものであり、特にLED用光反射材として好適である。 The addition-curable silicone composition of the present invention has an appropriate viscosity and thus excellent dischargeability, and has non-fluidity and thus excellent shape stability during heat curing, and the cured product of the composition has light reflectivity. And is particularly suitable as a light reflecting material for LED.
以下、本発明につき更に詳しく説明する。
(A)成分のオルガノポリシロキサンは、この組成物の主剤(ベースポリマー)であって、一分子中に2個以上の珪素原子に結合したアルケニル基を含有するものであり、好ましくは下記平均組成式(1)で示されるものが用いられる。
RaSiO(4-a)/2 (1)
(式中、Rは互いに同一又は異種の炭素数1〜10、好ましくは1〜8の非置換又は置換の一価炭化水素基であり、aは1.5〜2.8、好ましくは1.8〜2.5、より好ましくは1.95〜2.05の範囲の正数である。)
Hereinafter, the present invention will be described in more detail.
The organopolysiloxane of component (A) is the main component (base polymer) of this composition, and contains an alkenyl group bonded to two or more silicon atoms in one molecule, preferably the following average composition What is shown by Formula (1) is used.
R a SiO (4-a) / 2 (1)
(In the formula, R is an identical or different monovalent hydrocarbon group having 1 to 10 carbon atoms, preferably 1 to 8 carbon atoms, and a is 1.5 to 2.8, preferably 1. (It is a positive number in the range of 8 to 2.5, more preferably 1.95 to 2.05.)
(A)成分中の珪素原子に結合したアルケニル基としては、例えば、ビニル基、アリル基、ブテニル基、ペンテニル基、ヘキセニル基、ヘプテニル基等の、通常、炭素数2〜8、好ましくは2〜6のものが挙げられ、特にビニル基であることが好ましい。 (A) As an alkenyl group couple | bonded with the silicon atom in a component, it is C2-C8 normally, preferably 2-C, such as a vinyl group, an allyl group, a butenyl group, a pentenyl group, a hexenyl group, a heptenyl group, for example. 6 are preferable, and a vinyl group is particularly preferable.
(A)成分のポリシロキサン骨格中におけるアルケニル基が結合する珪素原子の位置としては、例えば、分子鎖末端及び/又は分子鎖途中(分子鎖非末端)が挙げられるが、(A)成分としては、少なくとも分子鎖両末端の珪素原子に結合したアルケニル基を含有する直鎖状のジオルガノポリシロキサンであることが好ましい。なお、(A)成分中のアルケニル基の含有量は、珪素原子に結合した一価の有機基(即ち、上記平均組成式(1)において、Rで示される非置換又は置換の一価炭化水素基)全体に対して0.001〜10モル%、特に0.01〜5モル%程度であることが好ましい。 Examples of the position of the silicon atom to which the alkenyl group in the polysiloxane skeleton of the component (A) is bonded include the molecular chain terminal and / or the molecular chain middle (non-molecular chain terminal). A linear diorganopolysiloxane containing alkenyl groups bonded to silicon atoms at both ends of the molecular chain is preferred. In addition, the content of the alkenyl group in the component (A) is a monovalent organic group bonded to a silicon atom (that is, an unsubstituted or substituted monovalent hydrocarbon represented by R in the average composition formula (1)). Group) is preferably about 0.001 to 10 mol%, particularly about 0.01 to 5 mol%, based on the whole.
(A)成分のアルケニル基以外の珪素原子に結合する有機基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基、ヘプチル基等のアルキル基;フェニル基、トリル基、キシリル基、ナフチル基等のアリール基;ベンジル基、フェネチル基等のアラルキル基;クロロメチル基、3−クロロプロピル基、3,3,3−トリフルオロプロピル基等のハロゲン化アルキル基などの、通常、炭素数1〜12、好ましくは炭素数1〜8の非置換又はハロゲン置換の一価炭化水素基が挙げられ、メチル基、フェニル基が好ましく、特に、メチル基であることが好ましい。 Examples of the organic group bonded to the silicon atom other than the alkenyl group as component (A) include alkyl groups such as methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, cyclohexyl group and heptyl group; phenyl Groups, tolyl groups, xylyl groups, naphthyl groups and other aryl groups; benzyl groups, phenethyl groups and other aralkyl groups; chloromethyl groups, 3-chloropropyl groups, 3,3,3-trifluoropropyl groups and other alkyl halides Examples thereof include an unsubstituted or halogen-substituted monovalent hydrocarbon group having 1 to 12 carbon atoms, preferably 1 to 8 carbon atoms, such as a group, preferably a methyl group and a phenyl group, and particularly a methyl group. Is preferred.
このような(A)成分の分子構造としては、例えば、直鎖状、環状、分岐鎖状が挙げられるが、主鎖が基本的にジオルガノシロキサン単位の繰り返しからなり、分子鎖両末端がトリオルガノシロキシ基で封鎖された、直鎖状のジオルガノポリシロキサンであることが好ましい(なお、ここでのオルガノ基にはアルケニル基も包含し得る。)。 Examples of the molecular structure of the component (A) include linear, cyclic, and branched chains. The main chain is basically composed of repeating diorganosiloxane units, and both ends of the molecular chain are tricyclic. A linear diorganopolysiloxane blocked with an organosiloxy group is preferred (the organo group herein may also include an alkenyl group).
(A)成分の25℃における粘度は、得られるシリコーンゴムの物理的特性が良好であり、また、組成物の取扱い作業性が良好であることから、100〜500,000mPa・sの範囲内であることが好ましく、特に600〜100,000mPa・s、更に好ましくは1,000〜30,000mPa・sの範囲内であることが好ましい。なお、本発明における粘度は回転粘度計により測定されるものである(以下、同じ)。
なお、(A)成分を2種類以上の混合物として用いる場合は、混合後の粘度が上記粘度になるようにすればよい。
The viscosity of component (A) at 25 ° C. is within the range of 100 to 500,000 mPa · s because the physical properties of the resulting silicone rubber are good and the workability of the composition is good. It is preferable that it is within a range of 600 to 100,000 mPa · s, more preferably 1,000 to 30,000 mPa · s. The viscosity in the present invention is measured by a rotational viscometer (hereinafter the same).
In addition, what is necessary is just to make it the viscosity after mixing become the said viscosity, when using (A) component as a 2 or more types of mixture.
このような(A)成分のオルガノポリシロキサンとしては、例えば、分子鎖両末端トリメチルシロキシ基封鎖ジメチルシロキサン・メチルビニルシロキサン共重合体、分子鎖両末端トリメチルシロキシ基封鎖メチルビニルポリシロキサン、分子鎖両末端トリメチルシロキシ基封鎖ジメチルシロキサン・メチルビニルシロキサン・メチルフェニルシロキサン共重合体、分子鎖両末端ジメチルビニルシロキシ基封鎖ジメチルポリシロキサン、分子鎖両末端ジメチルビニルシロキシ基封鎖メチルビニルポリシロキサン、分子鎖両末端ジメチルビニルシロキシ基封鎖ジメチルシロキサン・メチルビニルシロキサン共重合体、分子鎖両末端ジメチルビニルシロキシ基封鎖ジメチルシロキサン・メチルビニルシロキサン・メチルフェニルシロキサン共重合体、分子鎖両末端ジビニルメチルシロキシ基封鎖ジメチルポリシロキサン、分子鎖両末端ジビニルメチルシロキシ基封鎖ジメチルシロキサン・メチルビニルシロキサン共重合体、分子鎖両末端トリビニルシロキシ基封鎖ジメチルポリシロキサン、分子鎖両末端トリビニルシロキシ基封鎖ジメチルシロキサン・メチルビニルシロキサン共重合体、式:R1 3SiO1/2で示されるシロキサン単位と式:R1 2R2SiO1/2で示されるシロキサン単位と式:R1 2SiOで示されるシロキサン単位と式:SiO2で示されるシロキサン単位からなるオルガノシロキサン共重合体、式:R1 3SiO1/2で示されるシロキサン単位と式:R1 2R2SiO1/2で示されるシロキサン単位と式:SiO2で示されるシロキサン単位からなるオルガノシロキサン共重合体、式:R1 2R2SiO1/2で示されるシロキサン単位と式:R1 2SiOで示されるシロキサン単位と式:SiO2で示されるシロキサン単位からなるオルガノシロキサン共重合体、式:R1R2SiOで示されるシロキサン単位と式:R1SiO3/2で示されるシロキサン単位もしくは式:R2SiO3/2で示されるシロキサン単位からなるオルガノシロキサン共重合体、及びこれらのオルガノポリシロキサンの2種以上からなる混合物が挙げられる。 Examples of the organopolysiloxane of the component (A) include, for example, a trimethylsiloxy group-capped dimethylsiloxane / methylvinylsiloxane copolymer, a molecular chain both-ends trimethylsiloxy group-capped methylvinylpolysiloxane, and both molecular chains. Terminal trimethylsiloxy group-blocked dimethylsiloxane / methylvinylsiloxane / methylphenylsiloxane copolymer, molecular chain both ends dimethylvinylsiloxy group-blocked dimethylpolysiloxane, molecular chain both ends dimethylvinylsiloxy group-blocked methylvinylpolysiloxane, molecular chain both ends Dimethylvinylsiloxy-blocked dimethylsiloxane / methylvinylsiloxane copolymer, dimethylvinylsiloxy-blocked dimethylsiloxane / methylvinylsiloxane / methylphenylsiloxane copolymer , Both ends of the molecular chain divinylmethylsiloxy group-blocked dimethylpolysiloxane, both ends of the molecular chain divinylmethylsiloxy group-blocked dimethylsiloxane / methylvinylsiloxane copolymer, both ends of the molecular chain trivinylsiloxy group-blocked dimethylpolysiloxane, both ends of the molecular chain Trivinylsiloxy group-blocked dimethylsiloxane / methylvinylsiloxane copolymer, siloxane unit represented by formula: R 1 3 SiO 1/2 and siloxane unit represented by formula: R 1 2 R 2 SiO 1/2 and formula: R An organosiloxane copolymer comprising a siloxane unit represented by 1 2 SiO and a siloxane unit represented by the formula: SiO 2 , a siloxane unit represented by the formula: R 1 3 SiO 1/2 and a formula: R 1 2 R 2 SiO 1 / siloxane units represented by the formula 2: organosiloxanes composed of siloxane units represented by SiO 2 Polymers, wherein: the siloxane units represented by the formula R 1 2 R 2 SiO 1/2: siloxane units represented by the formula R 1 2 SiO: organosiloxane copolymers composed of siloxane units represented by SiO 2, wherein : A siloxane unit represented by R 1 R 2 SiO and a siloxane unit represented by the formula R 1 SiO 3/2 or a siloxane unit represented by the formula R 2 SiO 3/2 , and these The mixture which consists of 2 or more types of organopolysiloxane is mentioned.
上記式中のR1はアルケニル基以外の非置換又は置換の一価炭化水素基であり、例えば、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、シクロヘキシル基、ヘプチル基等のアルキル基;フェニル基、トリル基、キシリル基、ナフチル基等のアリール基;ベンジル基、フェネチル基等のアラルキル基;クロロメチル基、3−クロロプロピル基、3,3,3−トリフルオロプロピル基等のハロゲン化アルキル基などが挙げられる。また、上記式中のR2はアルケニル基であり、例えば、ビニル基、アリル基、ブテニル基、ペンテニル基、ヘキセニル基、へプテニル基などが挙げられるが、本成分中のアルケニル基としては、入手のしやすさ、価格の面よりビニル基が最も適している。 R 1 in the above formula is an unsubstituted or substituted monovalent hydrocarbon group other than an alkenyl group, such as a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a cyclohexyl group, a heptyl group, etc. Alkyl groups; phenyl groups, tolyl groups, xylyl groups, naphthyl groups and other aryl groups; benzyl groups, phenethyl groups and other aralkyl groups; chloromethyl groups, 3-chloropropyl groups, 3,3,3-trifluoropropyl groups And halogenated alkyl groups. R 2 in the above formula is an alkenyl group, and examples thereof include a vinyl group, an allyl group, a butenyl group, a pentenyl group, a hexenyl group, a heptenyl group, and the like. Vinyl groups are most suitable for ease of use and price.
(A)成分のオルガノポリシロキサンは、重合度や分子構造の異なる2種以上を併用してもよい。例えば、重合度やビニル基含有量の異なるシリコーンオイルの併用やシリコーンオイルとシリコーンレジンを併用する等が挙げられる。 (A) The organopolysiloxane of component may use together 2 or more types from which a polymerization degree and molecular structure differ. For example, the combined use of silicone oils having different degrees of polymerization and vinyl group contents, and the combined use of silicone oil and silicone resin can be mentioned.
本発明では、一分子中に珪素原子に結合するアルケニル基を少なくとも2個有するシリコーンオイルとシリコーンレジンを併用することが強度や接着性向上のために好ましい。シリコーンレジンは、25℃において固体のものもあるが、シリコーンオイルに溶解するため、混合後の粘度が上述した範囲に入るようにすることが好ましい。
シリコーンオイルとシリコーンレジンの混合割合は、質量比で50:50〜98:2であることが好ましく、より好ましくは60:40〜95:5、特に好ましくは70:30〜90:10である。
In the present invention, it is preferable to use a silicone oil having at least two alkenyl groups bonded to a silicon atom in one molecule and a silicone resin in order to improve strength and adhesion. Some silicone resins are solid at 25 ° C., but are soluble in silicone oil, so that the viscosity after mixing is preferably in the above-mentioned range.
The mixing ratio of the silicone oil and the silicone resin is preferably 50:50 to 98: 2 by mass ratio, more preferably 60:40 to 95: 5, and particularly preferably 70:30 to 90:10.
(B)成分のオルガノハイドロジェンポリシロキサンは、(A)成分と反応する、架橋剤として作用するものであり、その分子構造に特に制限はなく、従来製造されている例えば線状、環状、分岐状、三次元状等各種のものが使用可能であるが、一分子中に少なくとも2個、好ましくは3個以上の珪素原子に結合した水素原子(SiHで表されるヒドロシリル基)と1個以上のアルコキシシリル基を有する必要があり、好ましくは2〜300個、より好ましくは3〜200個、特に好ましくは3〜100個のSiH基を有し、好ましくは1〜30個、より好ましくは2〜20個、特に好ましくは3〜10個のアルコキシシリル基を有することが好ましい。このオルガノハイドロジェンポリシロキサンとしては、下記平均組成式(2)で示されるものを用いることができる。
R3 bR4 cHdSiO(4-b-c-d)/2 (2)
The organohydrogenpolysiloxane of component (B) acts as a crosslinking agent that reacts with component (A), and there is no particular limitation on its molecular structure. For example, linear, cyclic, branched, which has been conventionally produced Various types such as a shape and a three-dimensional shape can be used, but at least 2, preferably 3 or more hydrogen atoms bonded to silicon atoms (hydrosilyl group represented by SiH) and 1 or more in one molecule Of alkoxysilyl groups, preferably 2 to 300, more preferably 3 to 200, particularly preferably 3 to 100 SiH groups, preferably 1 to 30, more preferably 2 It is preferable to have ~ 20, particularly preferably 3-10 alkoxysilyl groups. As the organohydrogenpolysiloxane, those represented by the following average composition formula (2) can be used.
R 3 b R 4 c H d SiO (4-bcd) / 2 (2)
上記式(2)中、R3はアルケニル基を除く、好ましくは炭素数1〜10の、珪素原子に結合した非置換又は置換の一価炭化水素基であり、このR3における非置換又は置換の一価炭化水素基としては、例えば、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、tert−ブチル基、n−ヘキシル基、n−オクチル基、n−デシル基、n−オクタデシル基等のアルキル基、シクロペンチル基、シクロヘキシル基、シクロオクチル基等のシクロアルキル基、フェニル基、o−トリル基等のアリール基、ベンジル基、フェニルエチル基等のアラルキル基、3,3,3−トリフルオロプロピル基等のハロゲン置換アルキル基、グリシジルプロピル基、グリシドキシプロピル基等のエポキシ置換アルキル基等が挙げられる。R3の非置換又は置換の一価炭化水素基としては、好ましくはアルキル基、アリール基であり、より好ましくはメチル基、フェニル基である。また、R3の50モル%以上、特に70〜100モル%がメチル基であることが好ましい。 In the formula (2), R 3 is excluding alkenyl group, preferably an unsubstituted or substituted monovalent hydrocarbon group bonded 1 to 10 carbon atoms, a silicon atom, an unsubstituted or substituted in the R 3 Examples of the monovalent hydrocarbon group include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-hexyl group, n- Octyl group, n-decyl group, alkyl group such as n-octadecyl group, cyclopentyl group, cyclohexyl group, cycloalkyl group such as cyclooctyl group, aryl group such as phenyl group, o-tolyl group, benzyl group, phenylethyl group Epoxy groups such as aralkyl groups such as halogen substituted alkyl groups such as 3,3,3-trifluoropropyl groups, glycidylpropyl groups and glycidoxypropyl groups Examples thereof include a substituted alkyl group. The unsubstituted or substituted monovalent hydrocarbon group for R 3 is preferably an alkyl group or an aryl group, and more preferably a methyl group or a phenyl group. Further, 50 mol% or more of R 3, it is preferable, especially 70 to 100 mol% are methyl groups.
また、R4は少なくとも1つのアルコキシ基を有する置換基であり、アルコキシ基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等が例示される。より好ましくはトリアルコキシシリル基を有する置換基であり、中でもアルキレン基を介して珪素原子に結合するトリアルコキシシリル基であることが好ましい。このような置換基としては、トリメトキシシリルエチル基、トリメトキシシリルプロピル基、トリエトキシシリルエチル基、トリエトキシシリルプロピル基等が例示できる。 R 4 is a substituent having at least one alkoxy group, and examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group. A substituent having a trialkoxysilyl group is more preferable, and a trialkoxysilyl group bonded to a silicon atom via an alkylene group is particularly preferable. Examples of such a substituent include a trimethoxysilylethyl group, a trimethoxysilylpropyl group, a triethoxysilylethyl group, and a triethoxysilylpropyl group.
ここで、b、c、dは、0.7≦b≦2.1、0.001≦c≦0.75、0.001≦d≦1.0かつ0.8≦b+c+d≦3.0を満たす正数であり、好ましくは1.0≦b≦2.0、0.01≦c≦0.5、0.1≦d≦1.0かつ1.5≦b+c+d≦2.5である。 Here, b, c and d are 0.7 ≦ b ≦ 2.1, 0.001 ≦ c ≦ 0.75, 0.001 ≦ d ≦ 1.0 and 0.8 ≦ b + c + d ≦ 3.0. It is a positive number that satisfies, preferably 1.0 ≦ b ≦ 2.0, 0.01 ≦ c ≦ 0.5, 0.1 ≦ d ≦ 1.0, and 1.5 ≦ b + c + d ≦ 2.5.
トリアルコキシシリル基を有する式(2)の化合物は、オルガノハイドロジェンポリシロキサンにアルケニル基含有アルコキシシランを付加反応させる方法等により製造することができる。 The compound of the formula (2) having a trialkoxysilyl group can be produced by a method of adding an alkenyl group-containing alkoxysilane to an organohydrogenpolysiloxane.
また、このオルガノハイドロジェンポリシロキサンの25℃における粘度は、好ましくは1,000mPa・s以下、より好ましくは5〜200mPa・s、特に好ましくは10〜50mPa・sである。粘度が高すぎるとシリンジからの吐出性が低下することがある。 The viscosity of the organohydrogenpolysiloxane at 25 ° C. is preferably 1,000 mPa · s or less, more preferably 5 to 200 mPa · s, and particularly preferably 10 to 50 mPa · s. If the viscosity is too high, the dischargeability from the syringe may decrease.
(B)成分の具体的なものの例としては、下記に示すものが挙げられる。
上記式中、m、n、p、q、rはそれぞれ0≦m<200、1≦n<200、1≦p<10、1≦q<10、1≦r<10であり、好ましくは0≦m<50、1≦n<50、1≦p<5、1≦q<5、1≦r<3である。
上記(B)成分は、1種の化合物であってもよいし、また2種類以上の化合物の組み合わせであってもよい。
In the above formula, m, n, p, q, r are 0 ≦ m <200, 1 ≦ n <200, 1 ≦ p <10, 1 ≦ q <10, 1 ≦ r <10, preferably 0, respectively. ≦ m <50, 1 ≦ n <50, 1 ≦ p <5, 1 ≦ q <5, 1 ≦ r <3.
The component (B) may be a single compound or a combination of two or more compounds.
(B)成分の配合量は、上記(A)成分の総アルケニル基数に対して(B)成分の総Si−H基数が1.4〜5.0倍となる量であり、好ましくは1.4〜3.0倍となる量である。この範囲とすることが、ゴム強度、接着性の観点から好ましい。 The amount of component (B) is such that the total number of Si-H groups in component (B) is 1.4 to 5.0 times the total number of alkenyl groups in component (A), preferably 1. The amount is 4 to 3.0 times. This range is preferable from the viewpoint of rubber strength and adhesiveness.
(B)成分は、架橋剤兼接着付与剤として必須なものであり、後述される(C)成分である煙霧質シリカの表面に残存していると考えられるシラノール基と弱い相互作用をすることで、チクソ性が高くなり形状安定性に優れる組成物となる。 Component (B) is essential as a cross-linking agent / adhesion imparting agent, and has a weak interaction with a silanol group that is considered to remain on the surface of fumed silica, which is component (C) described later. Therefore, the thixotropy is high and the composition is excellent in shape stability.
(C)成分である煙霧質シリカは、補強性充填剤であると共にチクソ性を付与する成分である。本発明においては、少なくとも50m2/g、より好ましくは100〜450m2/g、特に200〜380m2/gのBET法による比表面積を持つ煙霧質シリカが好ましい。比表面積が50m2/g未満では十分なチクソ性が得られない場合がある。また、組成物の粘度が上がりすぎないように、ジメチルジクロロシラン、ジメチルジメトキシシラン等のハロゲン化シランやアルコキシシラン等の加水分解性基含有シランやヘキサメチルジシラザン等のシラザン等の有機珪素化合物で表面シラノールを処理したものを使用することが好ましい。 (C) The fumed silica which is a component is a component which imparts thixotropy while being a reinforcing filler. In the present invention, at least 50 m 2 / g, more preferably 100~450m 2 / g, are fumed silicas, especially having a specific surface area by BET method of 200~380m 2 / g preferred. If the specific surface area is less than 50 m 2 / g, sufficient thixotropy may not be obtained. Also, in order to prevent the viscosity of the composition from increasing too much, hydrous group-containing silanes such as dimethyldichlorosilane and dimethyldimethoxysilane, alkoxysilanes and other hydrolysable group-containing silanes, and organosilicon compounds such as hexamethyldisilazane and the like. It is preferable to use a surface treated silanol.
(C)成分である煙霧質シリカの配合量は、前記(A)、(B)成分の合計100質量部に対して8〜30質量部であり、好ましくは8〜20質量部である。このような含有割合で煙霧質シリカを配合することにより、粘度が低く、かつディスペンス装置による塗布及び加熱成形後の形状も変化しないという組成物のチクソトロピー性を向上でき、接着の破壊モードにおいてもCF(凝集破壊)を保持することができる。なお、煙霧質シリカの配合量が8質量部より少なすぎると、十分なチクソ性が得られず、形状安定性が悪くなり、30質量部より多すぎると、形状安定性は優れるものの粘度が上がってディスペンス性が悪くなったり、吐出ニードルの先で糸を引いてしまい仕上がりが悪くなる。 (C) The compounding quantity of the fumed silica which is a component is 8-30 mass parts with respect to a total of 100 mass parts of the said (A) and (B) component, Preferably it is 8-20 mass parts. By blending fumed silica at such a content ratio, the thixotropy of the composition can be improved, such that the viscosity is low and the shape after application and heat molding by the dispensing device does not change, and CF in the adhesion failure mode is also achieved. (Cohesive failure) can be maintained. If the amount of the fumed silica is less than 8 parts by mass, sufficient thixotropy cannot be obtained and the shape stability is deteriorated. If it is more than 30 parts by mass, the shape stability is excellent, but the viscosity increases. As a result, the dispensing property is deteriorated or the yarn is pulled at the tip of the discharge needle, resulting in a poor finish.
(D)成分の白色顔料は、酸化チタンや酸化亜鉛、酸化アルミニウム等の組成物を白色に着色する成分である。本発明において(D)成分は、光の反射という点から、酸化チタンであることが好ましい。なお、酸化チタンの種類は特に限定されるものではなく、アナタース型、ルチル型のいずれであってもよい。また、周知の表面処理剤によって表面処理が施されていてもよい。 The white pigment of component (D) is a component that colors a composition such as titanium oxide, zinc oxide, and aluminum oxide white. In the present invention, the component (D) is preferably titanium oxide from the viewpoint of light reflection. In addition, the kind of titanium oxide is not specifically limited, Any of an anatase type and a rutile type may be sufficient. Further, the surface treatment may be performed by a known surface treatment agent.
(D)成分は、分散性と反射率を高める点から、その平均粒径が0.1〜0.5μm、好ましくは0.1〜0.3μmであり、粒径の異なるものを混合して用いることもできる。なお、平均粒径は、例えばレーザー光回折法による粒度分布測定により得ることができる。 The component (D) has an average particle size of 0.1 to 0.5 μm, preferably 0.1 to 0.3 μm, from the point of increasing dispersibility and reflectance, It can also be used. The average particle diameter can be obtained by, for example, particle size distribution measurement by a laser light diffraction method.
(D)成分の配合量は、(A)〜(C)成分の合計100質量部に対して2〜50質量部であることが好ましく、より好ましくは3〜40質量部、特に好ましくは3〜20質量部である。配合量が少なすぎると、所望の反射率が得られない場合があり、多すぎると、粘度が上がりすぎてディスペンス性が低下することがある。 (D) It is preferable that the compounding quantity of a component is 2-50 mass parts with respect to a total of 100 mass parts of (A)-(C) component, More preferably, it is 3-40 mass parts, Most preferably, it is 3- 20 parts by mass. If the blending amount is too small, the desired reflectance may not be obtained. If the blending amount is too large, the viscosity may increase too much and the dispensing property may decrease.
(E)成分は(A)〜(D)成分との反応を促進する硬化触媒で、有効量の白金族金属系触媒であることが好ましい。
この白金族金属系触媒としては、ヒドロシリル化反応触媒として公知のものが全て使用できる。例えば、白金黒、ロジウム、パラジウム等の白金族金属単体;H2PtCl4・dH2O、H2PtCl6・dH2O、NaHPtCl6・dH2O、KHPtCl6・dH2O、Na2PtCl6・dH2O、K2PtCl4・dH2O、PtCl4・dH2O、PtCl2、Na2HPtCl4・dH2O(式中、dは0〜6の整数であり、好ましくは0又は6である)等の塩化白金、塩化白金酸及び塩化白金酸塩;アルコール変性塩化白金酸(米国特許第3,220,972号明細書参照);塩化白金酸とオレフィンとのコンプレックス(米国特許第3,159,601号明細書、同第3,159,662号明細書、同第3,775,452号明細書参照);白金黒、パラジウム等の白金族金属をアルミナ、シリカ、カーボン等の担体に担持させたもの;ロジウム−オレフィンコンプレックス;クロロトリス(トリフェニルフォスフィン)ロジウム(ウィルキンソン触媒);塩化白金、塩化白金酸又は塩化白金酸塩とビニル基含有シロキサン、特にビニル基含有環状シロキサンとのコンプレックス等が挙げられる。これらの中で、好ましいものとして、相溶性の観点及び塩素不純物の観点から、塩化白金酸をシリコーン変性したものが挙げられ、具体的には例えば塩化白金酸をテトラメチルビニルジシロキサンで変性した白金触媒が挙げられる。
The component (E) is a curing catalyst that promotes the reaction with the components (A) to (D), and is preferably an effective amount of a platinum group metal catalyst.
As this platinum group metal catalyst, any known hydrosilylation catalyst can be used. For example, platinum group metals such as platinum black, rhodium and palladium; H 2 PtCl 4 · dH 2 O, H 2 PtCl 6 · dH 2 O, NaHPtCl 6 · dH 2 O, KHPtCl 6 · dH 2 O, Na 2 PtCl 6 · dH 2 O, K 2 PtCl 4 · dH 2 O, PtCl 4 · dH 2 O, PtCl 2 , Na 2 HPtCl 4 · dH 2 O (wherein d is an integer of 0 to 6, preferably 0) Or chloroplatinic acid and chloroplatinate; alcohol-modified chloroplatinic acid (see US Pat. No. 3,220,972); complex of chloroplatinic acid and olefin (US patent) 3,159,601 specification, 3,159,662 specification, 3,775,452 specification); platinum group metals such as platinum black, palladium, etc., alumina, silica, carbon, etc. Supported on the carrier Rhodium-olefin complex; Chlorotris (triphenylphosphine) rhodium (Wilkinson catalyst); Platinum chloride, chloroplatinic acid or chloroplatinate and vinyl group-containing siloxane, especially vinyl group-containing cyclic siloxane Can be mentioned. Among these, preferred are those obtained by modifying chloroplatinic acid with silicone from the viewpoint of compatibility and chlorine impurities. Specifically, for example, platinum obtained by modifying chloroplatinic acid with tetramethylvinyldisiloxane. A catalyst is mentioned.
硬化触媒の添加量は触媒量でよいが、白金原子にして(A)〜(D)成分の合計中、質量換算で1〜500ppmであることが好ましく、より好ましくは3〜100ppmであり、更に好ましくは5〜40ppmである。 The addition amount of the curing catalyst may be a catalytic amount, but is preferably 1 to 500 ppm in terms of mass, more preferably 3 to 100 ppm in terms of the total of the components (A) to (D) as platinum atoms. Preferably it is 5-40 ppm.
本発明の組成物には、必要に応じて各種の添加剤を更に添加することができる。特に、本発明の組成物を1液型で使用する際の貯蔵安定性向上のために、ヒドロシリル化反応抑制剤を配合することができる。反応抑制剤としては、従来から公知のものを使用することができ、例えばアセチレン系化合物、(A)成分以外のアルケニル基を2個以上含有する化合物、アルキニル基を含有する化合物や、トリアリルイソシアヌレートやその誘導体等が挙げられる。これらの中でも、アルケニル基又はアルキニル基を有する化合物の使用が望ましい。これらの反応抑制剤の添加量は、少なすぎるとヒドロシリル化反応の遅延効果が得られない場合があり、逆に多すぎると硬化そのものが阻害されてしまう場合があるため、(A)〜(E)成分の合計量100質量部に対して0.05〜0.5質量部の範囲であることが望ましい。また、耐熱耐久性をより向上させるために、ヒンダードアミン、ヒンダードフェノールや酸化防止剤、重合禁止剤等を添加してもよく、接着性をより向上させるためにシランカップリング剤等の接着性付与剤を添加してもよい。 Various additives can be further added to the composition of the present invention as necessary. In particular, a hydrosilylation reaction inhibitor can be blended to improve storage stability when the composition of the present invention is used in a one-pack type. As the reaction inhibitor, conventionally known ones can be used. For example, an acetylene compound, a compound containing two or more alkenyl groups other than the component (A), a compound containing an alkynyl group, triallyl isocyanate, Examples thereof include nurate and derivatives thereof. Among these, it is desirable to use a compound having an alkenyl group or an alkynyl group. If the addition amount of these reaction inhibitors is too small, the effect of delaying the hydrosilylation reaction may not be obtained. Conversely, if too large, curing itself may be inhibited, so that (A) to (E) ) The total amount of the components is desirably in the range of 0.05 to 0.5 parts by mass with respect to 100 parts by mass. In order to further improve the heat resistance, hindered amines, hindered phenols, antioxidants, polymerization inhibitors, etc. may be added, and in order to further improve the adhesion, adhesion such as a silane coupling agent is imparted. An agent may be added.
本発明の付加硬化型シリコーン組成物の製造方法としては、例えば(A)〜(E)成分及びその他任意成分をプラネタリーミキサー、ニーダー、品川ミキサー等の混合機で混合する方法等が挙げられる。 Examples of the method for producing the addition-curable silicone composition of the present invention include a method of mixing the components (A) to (E) and other optional components with a mixer such as a planetary mixer, a kneader, or a Shinagawa mixer.
本発明において、組成物の粘度とチクソ係数は作業性を著しく向上させるための重要な因子である。E型粘度計を使用したときの回転速度が1rpmの時の25℃における組成物の粘度が70Pa・s以上500Pa・s以下、特に100〜350Pa・sであることが好ましい。粘度が70Pa・s未満であると、ディスペンス塗布した際あるいは加熱硬化時に流れて形状が保持できない場合があり、また、500Pa・sより高いと、ディスペンス塗布後の材料が糸を引いたり、塗布の最終部の材料切れが悪いため角が立ち外観不良となったりする場合がある。また、25℃における組成物の1rpmにおける粘度と5rpmにおける粘度との比(1rpm/5rpm)(以下、チクソ係数と示す)は、2.5以上、特に2.5〜4.5であることが好ましい。このチクソ係数が2.5未満であると、塗布した形状を安定させることが困難となる場合がある。 In the present invention, the viscosity and thixotropic coefficient of the composition are important factors for significantly improving workability. The viscosity of the composition at 25 ° C. when the rotational speed when using an E-type viscometer is 1 rpm is preferably 70 Pa · s or more and 500 Pa · s or less, and particularly preferably 100 to 350 Pa · s. If the viscosity is less than 70 Pa · s, the shape may not be maintained when dispensed or heat-cured, and if the viscosity is higher than 500 Pa · s, the material after dispensing may draw yarn or Since the material of the final part is poor, corners may stand up and the appearance may be poor. Further, the ratio of the viscosity at 1 rpm to the viscosity at 5 rpm (1 rpm / 5 rpm) (hereinafter referred to as a thixo coefficient) of the composition at 25 ° C. is 2.5 or more, particularly 2.5 to 4.5. preferable. If this thixotropic coefficient is less than 2.5, it may be difficult to stabilize the applied shape.
本発明の組成物は、アルコキシシリル基を有するハイドロジェンポリシロキサンと煙霧質シリカ上のシラノール間の弱い相互作用(擬似的架橋)を利用し、低粘度ながら高いチクソ性を有するものとすることで、ディスペンス塗布時(硬化前)及び加熱硬化後のいずれも形が崩れることなく、高さ/幅の比が0.8以上を保ち、形状安定性に優れるものとすることができる。 The composition of the present invention uses a weak interaction (pseudo-crosslinking) between hydrogenpolysiloxane having an alkoxysilyl group and silanol on fumed silica, and has a high thixotropy while having low viscosity. The height / width ratio can be maintained at 0.8 or more, and the shape stability can be improved, without losing the shape both at the time of dispensing application (before curing) and after heat curing.
本発明の組成物は一液タイプで使用する場合は、通常シリンジに充填して保管することが好ましい。 When the composition of the present invention is used in a one-pack type, it is usually preferable to fill the syringe and store it.
本発明の組成物の硬化条件としては、加熱硬化させることが好ましく、通常80〜200℃、好ましくは100〜150℃で硬化させる。硬化時間は、成形品の形状や硬化温度等により適宜選択すればよいが、通常1分〜10時間、好ましくは10分〜4時間程度である。 The curing conditions for the composition of the present invention are preferably heat-cured, and are usually cured at 80 to 200 ° C, preferably 100 to 150 ° C. The curing time may be appropriately selected depending on the shape of the molded product, the curing temperature, etc., but is usually 1 minute to 10 hours, preferably about 10 minutes to 4 hours.
得られた組成物を硬化させる方法は限定されないが、例えば、FRP樹脂などの基板上に配置された光半導体素子の周りにディスペンス装置を用いて本組成物で円や四角の線を描き、例えば、120℃で1時間硬化させることで白色のダム形状の成形品が得られる。そこにシリコーン封止材をポッティングし、加熱硬化させることで基板・本発明による白色ダム・シリコーン封止材の一体成形品が得られる。また、形状保持性が高いものは、本組成物を塗布後、シリコーン封止材をポッティングして、本組成物・封止材を一括で加熱硬化させることも可能である。なお、本発明の組成物は、2段以上重ねて描写し、高さをもたせることも可能である。 The method of curing the obtained composition is not limited, but, for example, a circle or a square line is drawn with the present composition using a dispensing device around an optical semiconductor element arranged on a substrate such as FRP resin. The white dam-shaped molded product is obtained by curing at 120 ° C. for 1 hour. A silicone sealing material is potted there and heated and cured to obtain an integrally molded product of the substrate, the white dam and the silicone sealing material according to the present invention. For those having high shape retention, it is possible to pot the silicone sealing material after application of the composition and heat cure the composition / sealing material in a lump. In addition, the composition of the present invention can be drawn in two or more layers to give a height.
ここで、封止材としてはシリコーン系封止剤、エポキシ系封止剤等特に制限されないが、シリコーン系封止材が本発明の組成物との接着性、封止後の経時安定性(変色がない)に優れるため好ましい。シリコーン系封止剤の中でも、本発明の組成物と同じ硬化方法である付加反応硬化型シリコーン封止材が本発明の組成物に対し硬化阻害等がなく特に好ましい。 Here, the sealing material is not particularly limited, such as a silicone-based sealing agent and an epoxy-based sealing agent, but the silicone-based sealing material has adhesiveness with the composition of the present invention, stability over time (discoloration) after sealing. Is preferable). Among silicone-based sealants, an addition reaction curable silicone sealant which is the same curing method as the composition of the present invention is particularly preferable because it does not inhibit curing of the composition of the present invention.
封止材の例としては、ジメチルポリシロキサン系からなるKER−2500A/B(信越化学製)や、屈折率を1.5まで高めたKER−6000A/B(信越化学製)が挙げられる。 Examples of the sealing material include KER-2500A / B (manufactured by Shin-Etsu Chemical) made of dimethylpolysiloxane and KER-6000A / B (manufactured by Shin-Etsu Chemical) whose refractive index is increased to 1.5.
封止材には、搭載されるLED素子の種類に応じて、蛍光体が入っていても入っていなくても良い。また、蛍光体の沈降防止を目的として煙霧質シリカが入っていてもよい。 The sealing material may or may not contain a phosphor depending on the type of LED element to be mounted. Further, fumed silica may be contained for the purpose of preventing sedimentation of the phosphor.
本発明の組成物は、いわゆるリフレクタとしての機能も満たすため、2mm厚みの硬化物の光反射率が、450nm光で90%以上、特に95%以上の高い光反射率を有することが好ましく、光半導体素子から照射される光を優れた反射率で反射させることで、光を外部に効率よく取り出させる機能を有する。 Since the composition of the present invention also fulfills a function as a so-called reflector, it is preferable that the light reflectance of a cured product having a thickness of 2 mm has a high light reflectance of 90% or more, particularly 95% or more at 450 nm light. By reflecting light emitted from the semiconductor element with an excellent reflectance, it has a function of efficiently extracting light to the outside.
以下、実施例を挙げて本発明を具体的に説明するが、本発明は以下の実施例に限定されるものではない。実施例及び比較例中、粘度は25℃でE型粘度計(東機産業(株)製RE80)により測定した値である。 EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated concretely, this invention is not limited to a following example. In the examples and comparative examples, the viscosity is a value measured with an E-type viscometer (RE80 manufactured by Toki Sangyo Co., Ltd.) at 25 ° C.
[実施例1〜3、比較例1〜4]
下記に示す成分を表1に示す配合量で(株)ダルトン製万能混合攪拌機(品川ミキサー)により均一に混合してシリコーン組成物を調製した。
[Examples 1 to 3, Comparative Examples 1 to 4]
The components shown below were uniformly mixed with the universal mixing stirrer (Shinagawa mixer) manufactured by Dalton Co., Ltd. in the blending amounts shown in Table 1, to prepare a silicone composition.
〔A〕一分子中に珪素原子に直結したビニル基を2個有し、粘度10,000mPa.sであるオルガノポリシロキサン(分子両末端に珪素原子に直結したビニルを有する25℃における粘度が5,000mPa.sであるオルガノポリシロキサン80質量部と、Me3SiO1/2、ViMe2SiO1/2(Meはメチル基を、Viはビニル基を示す。以下同じ。)、及びSiO4/2単位で構成され、SiO4/2に対してMe3SiO1/2及びViMe2SiO1/2のモル比が0.8で、固形分に対するビニル基量が0.085モル/100gであるシリコーンレジン20質量部の混合物)
〔B−1〕下記式で示される、分子中の片末端の珪素原子に直結したトリメトキシシリルエチル基を有し、25℃における粘度が12mPa.sで、水素ガス発生量が70ml/gであるアルコキシシリル基含有オルガノハイドロジェンポリシロキサン
〔D〕平均粒径0.15μmの酸化チタン粉末(石原産業(株)製)
〔E〕塩化白金酸から誘導した、テトラメチルビニルジシロキサンを配位子として有する白金触媒(白金原子量:1質量%)
〔反応制御剤〕エチニルヘキサノール
〔ハイドロジェンポリシロキサンX〕一分子中アルコキシシリル基を有しない、25℃における粘度が5mPa.sで、水素ガス発生量が330ml/gであるメチルハイドロジェンポリシロキサン
〔結晶性シリカ〕((株)龍森製:クリスタライト5X BET比表面積約5m2/g)
[A] It has two vinyl groups directly bonded to silicon atoms in one molecule and has a viscosity of 10,000 mPa.s. organopolysiloxane (s) (80 parts by mass of organopolysiloxane having vinyl directly bonded to silicon atoms at both ends of the molecule and a viscosity at 25 ° C. of 5,000 mPa.s, Me 3 SiO 1/2 , ViMe 2 SiO 1 / 2 (Me the methyl group, Vi represents a vinyl group. hereinafter the same.), and is composed of SiO 4/2 units, Me against SiO 4/2 3 SiO 1/2 and ViMe 2 SiO 1 / A mixture of 20 parts by mass of a silicone resin in which the molar ratio of 2 is 0.8 and the vinyl group content relative to the solid content is 0.085 mol / 100 g)
[B-1] It has a trimethoxysilylethyl group directly bonded to a silicon atom at one end in the molecule represented by the following formula and has a viscosity at 25 ° C. of 12 mPa.s. s, an alkoxysilyl group-containing organohydrogenpolysiloxane having a hydrogen gas generation rate of 70 ml / g
[E] A platinum catalyst derived from chloroplatinic acid and having tetramethylvinyldisiloxane as a ligand (platinum atom weight: 1% by mass)
[Reaction Control Agent] Ethynylhexanol [Hydrogen Polysiloxane X] One molecule has no alkoxysilyl group and a viscosity at 25 ° C. of 5 mPa.s. methyl hydrogen polysiloxane [crystalline silica] with a hydrogen gas generation rate of 330 ml / g (made by Tatsumori Co., Ltd .: Crystallite 5X BET specific surface area of about 5 m 2 / g)
得られた組成物の各物性を下記に示す方法により評価した。結果を表1に併記する。
[粘度]
東機産業(株)製E型粘度計RE80型粘度計にて回転速度1rpm、5rpmの25℃での粘度を測定した。また、これらの結果からチクソ係数(1rpm/5rpm)を求めた。
Each physical property of the obtained composition was evaluated by the methods shown below. The results are also shown in Table 1.
[viscosity]
The viscosity at 25 ° C. at a rotation speed of 1 rpm and 5 rpm was measured with an E-type viscometer RE80 viscometer manufactured by Toki Sangyo Co., Ltd. Moreover, the thixo coefficient (1 rpm / 5 rpm) was calculated | required from these results.
[形状安定性(高さ/幅アスペクト比)]
武蔵エンジニアリング(株)製ディスペンス塗布装置を用い、線幅0.8mm、高さ0.8mmとなるよう設定し線を描写した。その組成物の線について、硬化前と120℃/1時間オーブンキュアしたときの高さ/幅の値をそれぞれ求め、0.8以上を◎、0.6以上0.8未満を○、0.6未満を×とした。
[Shape stability (height / width aspect ratio)]
Using a dispenser manufactured by Musashi Engineering Co., Ltd., the line width was set to 0.8 mm and the height was set to 0.8 mm, and the line was drawn. About the line of the composition, the value of height / width before curing and when oven-cured at 120 ° C./1 hour is obtained, respectively, 0.8 or more is indicated by ◎, 0.6 or more and less than 0.8 by ○, Less than 6 was set as x.
[光反射率]
(株)日立製作所製分光光度計U−3310及びφ60積分球付属装置を用いて測定した。組成物のシート厚みは2mmとし、付属の酸化アルミニウム板をブランク(100%)として450nm光の相対光反射率を測定した。
[Light reflectance]
Measurement was performed using a spectrophotometer U-3310 manufactured by Hitachi, Ltd. and a φ60 integrating sphere attachment device. The sheet thickness of the composition was 2 mm, and the relative light reflectance of 450 nm light was measured using an attached aluminum oxide plate as a blank (100%).
[接着性]
テストピース社製のエポキシガラス(幅2.5cm、長さ5cm)2枚の間に、組成物が2.5cm×1cm×厚み2mmとなるよう配置し、120℃/1時間オーブンキュアしたのち、せん断接着力を測定した。また、この時の凝集破壊率(CF)を測定した。なお、表中のTCFは界面剥離率を示す。
[Adhesiveness]
Between 2 pieces of epoxy glass (width 2.5 cm, length 5 cm) made by Test Piece, placed so that the composition becomes 2.5 cm × 1 cm × 2 mm in thickness, and after oven-curing at 120 ° C./1 hour, Shear adhesion was measured. Further, the cohesive failure rate (CF) at this time was measured. In the table, TCF indicates the interface peeling rate.
表1の結果より、本発明によって、加熱硬化後も形状安定性が高く、かつ光反射率の高い組成物を得ることができ、該組成物は光半導体装置の光反射材やリフレクタとして使用可能である。特に形状保持性の高いものは、組成物を2段・3段と重ねて塗布することもできる。
また、本発明により、点灯部(明るい部分)に自由度を持たせることができ、例えば小さい円形やハート形状のものも、少ないLEDチップで描写することが可能となる。
From the results of Table 1, according to the present invention, a composition having high shape stability and high light reflectance even after heat curing can be obtained, and the composition can be used as a light reflecting material or a reflector of an optical semiconductor device. It is. In particular, those having a high shape-retaining property can be applied by overlapping the composition in two or three steps.
Further, according to the present invention, the lighting part (bright part) can have a degree of freedom. For example, a small circular or heart-shaped part can be described with a small number of LED chips.
Claims (6)
(B)一分子中に少なくとも2個の珪素原子に結合する水素原子と少なくとも1個のアルコキシ基を有するオルガノハイドロジェンポリシロキサン:上記(A)成分の総アルケニル基数に対して総Si−H基数が1.4〜5.0倍となる量、
(C)煙霧質シリカ:(A)、(B)成分の合計100質量部に対し8〜30質量部、
(D)白色顔料、
(E)硬化触媒
を含有する光半導体装置に対する自己接着性付加硬化型シリコーン組成物。 (A) Organopolysiloxane having at least two alkenyl groups bonded to silicon atoms in one molecule: 100 parts by mass
(B) Organohydrogenpolysiloxane having hydrogen atoms bonded to at least two silicon atoms and at least one alkoxy group in one molecule: the total number of Si-H groups relative to the total number of alkenyl groups in the component (A) Is 1.4 to 5.0 times,
(C) Smokeous silica: 8 to 30 parts by mass with respect to a total of 100 parts by mass of components (A) and (B),
(D) a white pigment,
(E) A self-adhesive addition-curable silicone composition for an optical semiconductor device containing a curing catalyst.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011101142A JP5522116B2 (en) | 2011-04-28 | 2011-04-28 | Addition-curing silicone composition and optical semiconductor device using the same |
CN201210122272.XA CN102757649B (en) | 2011-04-28 | 2012-04-24 | Addition curable silicon composition and use its optical semiconductor device |
TW101115186A TWI507484B (en) | 2011-04-28 | 2012-04-27 | An addition hardening type silicon oxide composition and an optical semiconductor device using the same |
KR1020120044342A KR101808869B1 (en) | 2011-04-28 | 2012-04-27 | Addition curable silicone composition and optical semiconductor device using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011101142A JP5522116B2 (en) | 2011-04-28 | 2011-04-28 | Addition-curing silicone composition and optical semiconductor device using the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012233035A true JP2012233035A (en) | 2012-11-29 |
JP5522116B2 JP5522116B2 (en) | 2014-06-18 |
Family
ID=47052322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011101142A Active JP5522116B2 (en) | 2011-04-28 | 2011-04-28 | Addition-curing silicone composition and optical semiconductor device using the same |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5522116B2 (en) |
KR (1) | KR101808869B1 (en) |
CN (1) | CN102757649B (en) |
TW (1) | TWI507484B (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014050318A1 (en) * | 2012-09-27 | 2014-04-03 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | Silicone composition for sealing optical semiconductor element, and optical semiconductor device |
JP2014148609A (en) * | 2013-02-01 | 2014-08-21 | Shin Etsu Chem Co Ltd | Curable resin composition for light reflecting material, cured product of composition, reflector formed of cured product of composition, and optical semiconductor device using the same |
CN104130578A (en) * | 2014-08-12 | 2014-11-05 | 铜陵国鑫光源技术开发有限公司 | High-performance LED (light-emitting diode) encapsulating material and preparation method thereof |
KR20160034242A (en) | 2013-07-24 | 2016-03-29 | 가부시키가이샤 아데카 | Curable resin composition |
JP2018513891A (en) * | 2015-03-24 | 2018-05-31 | エルジー・ケム・リミテッド | Adhesive composition |
JP2018532006A (en) * | 2015-11-26 | 2018-11-01 | ワッカー ケミー アクチエンゲゼルシャフトWacker Chemie AG | High viscosity silicone composition for producing elastomer-formed parts by ballistic formation method |
EP3215352B1 (en) | 2014-11-06 | 2019-08-21 | Wacker Chemie AG | Method for producing silicone elastomer parts |
JP2020063365A (en) * | 2018-10-17 | 2020-04-23 | 信越化学工業株式会社 | Thermal conductive silicone composition and production method thereof |
KR20200103548A (en) | 2019-02-25 | 2020-09-02 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Addition-curable silicone composition, cured silicone for optical reflective material, optical reflective material, and optical semiconductor device |
JP2021102734A (en) * | 2019-12-25 | 2021-07-15 | デュポン・東レ・スペシャルティ・マテリアル株式会社 | Curable white silicone composition, reflective material for optical semiconductor device, and optical semiconductor device |
WO2023136188A1 (en) * | 2022-01-12 | 2023-07-20 | 信越化学工業株式会社 | Thixotropic silicone gel composition for spot potting, cured product thereof, and photocoupler |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104981517B (en) * | 2012-12-07 | 2017-09-15 | 第一毛织株式会社 | Curable polysiloxane composition, encapsulating material and optics for optical instrument |
EP2938678B1 (en) * | 2012-12-27 | 2018-12-19 | Dow Silicones Corporation | Composition for forming an article having excellent reflectance and flame retardant properties and article formed therefrom |
CN103408945B (en) * | 2013-02-18 | 2016-01-20 | 永信新材料有限公司 | Can be applicable to the polysiloxane composition of light-emitting diode, pedestal formula and light-emitting diode thereof |
CN104726058A (en) * | 2013-12-19 | 2015-06-24 | 烟台德邦科技有限公司 | Single-component high temperature vulcanization conductive glue and preparation method thereof |
KR102007490B1 (en) * | 2017-05-19 | 2019-08-06 | 주식회사 케이씨씨 | Curable organopolysiloxane composition and reflective materials for optical semiconductor compring the same |
JP7021046B2 (en) * | 2018-10-22 | 2022-02-16 | 信越化学工業株式会社 | Additive-curable silicone composition, silicone cured product, and optical element |
JP7001071B2 (en) * | 2019-01-10 | 2022-01-19 | 信越化学工業株式会社 | Thermally conductive silicone composition |
CN110183666A (en) * | 2019-05-28 | 2019-08-30 | 安徽硅宝有机硅新材料有限公司 | A kind of vinylsiloxane grafting containing hydrogen silicone oil and preparation method thereof |
JP7486874B2 (en) * | 2019-12-05 | 2024-05-20 | デュポン・東レ・スペシャルティ・マテリアル株式会社 | Curable white silicone composition, reflector for optical semiconductor device, and optical semiconductor device |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005089671A (en) * | 2003-09-19 | 2005-04-07 | Shin Etsu Chem Co Ltd | Curable silicone resin composition |
JP2009527622A (en) * | 2006-02-24 | 2009-07-30 | ダウ・コーニング・コーポレイション | Light emitting device encapsulated with silicone and curable silicone composition for preparing said silicone |
JP4895879B2 (en) * | 2007-03-19 | 2012-03-14 | サンユレック株式会社 | Silicone resin composition for sealing light emitting device and method for producing optical semiconductor electronic component by potting method using the same |
DE102007044789A1 (en) * | 2007-09-19 | 2009-04-02 | Wacker Chemie Ag | Self-adhesive addition-curing silicone composition |
JP5471180B2 (en) * | 2008-09-11 | 2014-04-16 | 信越化学工業株式会社 | Silicone laminated substrate, method for producing the same, silicone resin composition for producing silicone laminated substrate, and LED device |
JP5383250B2 (en) * | 2009-02-26 | 2014-01-08 | 新日鉄住金化学株式会社 | Curable resin composition and cured product |
JP5499774B2 (en) * | 2009-03-04 | 2014-05-21 | 信越化学工業株式会社 | Composition for sealing optical semiconductor and optical semiconductor device using the same |
-
2011
- 2011-04-28 JP JP2011101142A patent/JP5522116B2/en active Active
-
2012
- 2012-04-24 CN CN201210122272.XA patent/CN102757649B/en active Active
- 2012-04-27 TW TW101115186A patent/TWI507484B/en active
- 2012-04-27 KR KR1020120044342A patent/KR101808869B1/en active IP Right Grant
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014050318A1 (en) * | 2012-09-27 | 2014-04-03 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | Silicone composition for sealing optical semiconductor element, and optical semiconductor device |
JP5524424B1 (en) * | 2012-09-27 | 2014-06-18 | モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 | Silicone composition for optical semiconductor element sealing and optical semiconductor device |
JP2014148609A (en) * | 2013-02-01 | 2014-08-21 | Shin Etsu Chem Co Ltd | Curable resin composition for light reflecting material, cured product of composition, reflector formed of cured product of composition, and optical semiconductor device using the same |
KR20160034242A (en) | 2013-07-24 | 2016-03-29 | 가부시키가이샤 아데카 | Curable resin composition |
CN104130578A (en) * | 2014-08-12 | 2014-11-05 | 铜陵国鑫光源技术开发有限公司 | High-performance LED (light-emitting diode) encapsulating material and preparation method thereof |
EP3215352B1 (en) | 2014-11-06 | 2019-08-21 | Wacker Chemie AG | Method for producing silicone elastomer parts |
JP2018513891A (en) * | 2015-03-24 | 2018-05-31 | エルジー・ケム・リミテッド | Adhesive composition |
US11267996B2 (en) | 2015-03-24 | 2022-03-08 | Lg Chem, Ltd. | Adhesive composition |
US11267995B2 (en) | 2015-03-24 | 2022-03-08 | Lg Chem, Ltd. | Adhesive composition |
JP2018532006A (en) * | 2015-11-26 | 2018-11-01 | ワッカー ケミー アクチエンゲゼルシャフトWacker Chemie AG | High viscosity silicone composition for producing elastomer-formed parts by ballistic formation method |
EP3322581B1 (en) | 2015-11-26 | 2019-01-02 | Wacker Chemie AG | Highly viscous silicone compositions for producing elastomeric molded parts by means of ballistic generative methods |
US10676641B2 (en) | 2015-11-26 | 2020-06-09 | Wacker Chemie Ag | Highly viscous silicone compositions for producing elastomeric molded parts by means of ballistic generative methods |
JP2020063365A (en) * | 2018-10-17 | 2020-04-23 | 信越化学工業株式会社 | Thermal conductive silicone composition and production method thereof |
KR20200103548A (en) | 2019-02-25 | 2020-09-02 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Addition-curable silicone composition, cured silicone for optical reflective material, optical reflective material, and optical semiconductor device |
JP2021102734A (en) * | 2019-12-25 | 2021-07-15 | デュポン・東レ・スペシャルティ・マテリアル株式会社 | Curable white silicone composition, reflective material for optical semiconductor device, and optical semiconductor device |
JP7475135B2 (en) | 2019-12-25 | 2024-04-26 | デュポン・東レ・スペシャルティ・マテリアル株式会社 | Curable white silicone composition, reflector for optical semiconductor device, and optical semiconductor device |
WO2023136188A1 (en) * | 2022-01-12 | 2023-07-20 | 信越化学工業株式会社 | Thixotropic silicone gel composition for spot potting, cured product thereof, and photocoupler |
Also Published As
Publication number | Publication date |
---|---|
JP5522116B2 (en) | 2014-06-18 |
TW201305279A (en) | 2013-02-01 |
CN102757649A (en) | 2012-10-31 |
CN102757649B (en) | 2017-03-01 |
TWI507484B (en) | 2015-11-11 |
KR20120122942A (en) | 2012-11-07 |
KR101808869B1 (en) | 2017-12-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5522116B2 (en) | Addition-curing silicone composition and optical semiconductor device using the same | |
JP5420141B2 (en) | Curable silicone resin composition and cured product | |
KR102065203B1 (en) | Silicone composition for sealing optical semiconductor element, and optical semiconductor device | |
TWI638858B (en) | Silicone gel composition and use thereof | |
KR101802736B1 (en) | Cross-linkable silicone composition and cross-linked product thereof | |
WO2015096570A1 (en) | Curable silicon rubber composition for led packaging | |
TWI758469B (en) | Addition-hardening polysiloxane composition, method for producing the composition, cured polysiloxane, and optical element | |
EP3101062B1 (en) | Nanoparticle, method for producing nanoparticle, addition curing silicone resin composition, and semiconductor apparatus | |
JP4680274B2 (en) | Composition providing high hardness silicone rubber and semiconductor device using the same as sealing material | |
CN108795049B (en) | Addition-curable silicone composition, method for producing same, and optical semiconductor device | |
JP2019085467A (en) | Addition-curable silicone composition, cured product, and optical element | |
JP6038824B2 (en) | Curable composition, semiconductor device, and organosilicon compound containing ester bond | |
JP4822001B2 (en) | Epoxy / silicone hybrid resin composition and cured product thereof | |
JP2007191697A (en) | Epoxy/silicone hybrid resin composition and photosemiconductor device | |
JP6329423B2 (en) | Modified body having polyhedral polysiloxane skeleton, curable composition containing the modified body, cured product, and semiconductor light emitting device | |
JP5886773B2 (en) | Curable organopolysiloxane composition, optical element sealing material, and optical element | |
CN111607231B (en) | Addition curing type silicone composition, silicone cured product for light reflecting material, and optical semiconductor device | |
TWI821340B (en) | Curable silicone composition, and light diffusion material formed thereby | |
KR20160049539A (en) | One-part curable silicone composition and optical semiconductor device | |
CN111073297A (en) | Addition-curable silicone composition, silicone cured product, and optical element | |
KR20200096871A (en) | Organomodified silicone resin composition for die-bonding, cured product thereof, and optical semiconductor element | |
TW202334318A (en) | Curable silicone composition | |
CN117730123A (en) | Heat conductive silicone composition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130524 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20140227 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140311 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140324 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5522116 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |