JP2012201764A5 - - Google Patents

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JP2012201764A5
JP2012201764A5 JP2011066750A JP2011066750A JP2012201764A5 JP 2012201764 A5 JP2012201764 A5 JP 2012201764A5 JP 2011066750 A JP2011066750 A JP 2011066750A JP 2011066750 A JP2011066750 A JP 2011066750A JP 2012201764 A5 JP2012201764 A5 JP 2012201764A5
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group
resin composition
alkenyl group
alkenyl
alkyl group
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JP2011066750A
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JP5805969B2 (en
JP2012201764A (en
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Description

Claims (16)

下記式(1):
(式中、RはC1〜C20のアルキル基またはC2〜C20のアルケニル基であり;RおよびRは、それぞれ独立して、C1〜C4のアルキル基であり;RはC2〜C5のアルケニル基、メチルスチリル基、または−OR基であり、この際、RはC2〜C5のアルケニル基、C2〜C4のアルキニル基、または−C(O)R基であり、この際、RはC2〜C5のアルケニル基であり;Aは有機酸イオンを表す。)
で表される化合物
Following formula (1):
(Wherein, R 1 is a C 1 to C 20 alkyl group or a C 2 to C 20 alkenyl group; R 2 and R 3 are each independently a C 1 to C 4 alkyl group; and R 4 is C 2 to C 5 alkenyl group, a methylstyryl group or a -OR 5 group, this time, R 5 is an alkenyl group of C2-C5, an alkynyl group, or -C (O) R 6 group, a C2-C4, the time , R 6 is an alkenyl group of C2-C5; a - represents an organic acid ion).
A compound represented by
請求項1に記載の化合物であるイオン性モノマーと、これと共重合可能な他のモノマーとの共重合体を含む、水性コーティング用樹脂組成物。 A resin composition for aqueous coating, comprising a copolymer of an ionic monomer which is a compound according to claim 1 and another monomer copolymerizable therewith. 前記他のモノマーが、不飽和基を有する非イオン性界面活性剤を含む、請求項2に記載の水性コーティング用樹脂組成物。   The aqueous coating resin composition according to claim 2, wherein the other monomer comprises a nonionic surfactant having an unsaturated group. 下記式(2):
(式中、RはC6〜20のアルキル基またはC6〜20のアルケニル基であり;RおよびRは、それぞれ独立して、C1〜C4のアルキル基であり;R10はC1〜C5のアルキル基、C2〜C5のアルケニル基、メチルスチリル基、または−OR11基であり、この際、R11はC1〜C5のアルキル基、C2〜C5のアルケニル基、C2〜C4のアルキニル基、−C(O)R12基、−R13−R14基、または−(B−O)−H基であり、この際、R12はC1〜C5のアルキル基またはC2〜C5のアルケニル基であり、R13はC1〜C8のアルキレン基または−R15−O−R16−O−R17−(この際、R15〜R17は、それぞれ独立して、C1〜C4のアルキレン基である)であり、R14は下記式
で表される基(この際、R〜Rは上述の通りである)であり、BはC1〜C8のアルキレン基であり、nは1〜100の整数であり;Aは有機酸イオンを表す。)
で表される化合物
Following formula (2):
(Wherein, R 7 is a C 6-20 alkyl group or a C 6-20 alkenyl group; R 8 and R 9 are each independently a C 1 to C 4 alkyl group; and R 10 is C 1 to C 5 Wherein R 11 is a C 1 to C 5 alkyl group, a C 2 to C 5 alkenyl group, a C 2 to C 4 alkynyl group, and the alkyl group is a C 2 to C 5 alkenyl group, a methylstyryl group, or an —OR 11 group -C (O) R 12 groups, -R 13 -R 14 group, or - (B-O) is a n -H group, this time, R 12 is an alkyl or alkenyl group having C2~C5 of C1~C5 in and, R 13 is an alkylene group or -R 15 of C1~C8 -O-R 16 -O-R 17 - ( Here, R 15 to R 17 are independently a, C1 -C4 alkylene group is there), R 14 is Serial type
Embedded image (wherein R 7 to R 9 are as described above), B is a C 1 to C 8 alkylene group, n is an integer of 1 to 100, and A is an organic acid Represents an ion. )
A compound represented by
請求項4に記載の化合物であるカチオン性界面活性剤を含む、水性コーティング用樹脂組成物。 A resin composition for aqueous coating, comprising a cationic surfactant which is a compound according to claim 4 . ポリオキシアルキレン鎖を有する非イオン性界面活性剤をさらに含む、請求項に記載の水性コーティング用樹脂組成物。 The resin composition for aqueous coating according to claim 5 , further comprising a nonionic surfactant having a polyoxyalkylene chain. 請求項またはに記載の要件および請求項またはに記載の要件を満たす、水性コーティング用樹脂組成物。 The resin composition for aqueous coatings which satisfy | fills the requirements of Claim 2 or 3, and the requirements of Claim 5 or 6 . 前記有機酸イオンが、カルボン酸イオンである、請求項1または4に記載の化合物 The compound according to claim 1 or 4, wherein the organic acid ion is a carboxylate ion. 前記有機酸イオンが、カルボン酸イオンである、請求項2、3、5、6または7に記載の水性コーティング用樹脂組成物。 The resin composition for aqueous coatings according to claim 2, 3, 5, 6, or 7 , wherein the organic acid ion is a carboxylate ion . ハロゲン原子を含まないことを特徴とする、請求項2、3、5、6、7または9に記載の水性コーティング用樹脂組成物。 The resin composition for aqueous coating according to claim 2 , 3, 5, 6 , 7, or 9 , characterized in that it does not contain a halogen atom. 下記式(3):
(式中、RはC1〜20のアルキル基またはC2〜20のアルケニル基であり;RおよびRは、それぞれ独立して、C1〜C4のアルキル基を表す。)
で表される第3級アミンと、下記式(4):
(式中、RはC2〜C5のアルケニル基、メチルスチリル基、または−OR基であり、この際、RはC2〜C5のアルケニル基、C2〜C4のアルキニル基、または−C(O)R基であり、この際、RはC2〜C5のアルケニル基を表す。)
で表されるエポキシドと、を反応させることを含む、請求項1に記載の化合物の製造方法。
Following formula (3):
(Wherein, R 1 is a C 1-20 alkyl group or a C 2-20 alkenyl group; and R 2 and R 3 each independently represent a C 1 -C 4 alkyl group)
And a tertiary amine represented by the following formula (4):
(Wherein, R 4 is a C 2 to C 5 alkenyl group, a methylstyryl group, or an —OR 5 group, wherein R 5 is a C 2 to C 5 alkenyl group, a C 2 to C 4 alkynyl group, or —C O) R 6 group, wherein R 6 represents a C 2 to C 5 alkenyl group.)
A process for producing a compound according to claim 1, comprising reacting an epoxide represented by
下記式(5):
(式中、RはC6〜20のアルキル基またはC6〜20のアルケニル基であり;RおよびRは、それぞれ独立して、C1〜C4のアルキル基を表す。)
で表される第3級アミンと、下記式(6):
(式中、R10はC1〜C5のアルキル基、C2〜C5のアルケニル基、メチルスチリル基、または−OR11基であり、この際、R11はC1〜C5のアルキル基、C2〜C5のアルケニル基、C2〜C4のアルキニル基、−C(O)R12基、−R13−R14基、または−(B−O)−H基であり、この際、R12はC1〜C5のアルキル基またはC2〜C5のアルケニル基であり、R13はC1〜C8のアルキレン基または−R15−O−R16−O−R17−(この際、R15〜R17は、それぞれ独立して、C1〜C4のアルキレン基である)であり、R14は下記式:
で表される基(この際、R〜Rは上述の通りである)であり、BはC1〜C8のアルキレン基であり、nは1〜100の整数を表す。)
で表されるエポキシドと、を反応させることを含む、請求項4に記載の化合物の製造方法。
Following formula (5):
(Wherein, R 7 is a C 6-20 alkyl group or a C 6-20 alkenyl group; R 8 and R 9 each independently represent a C 1 to C 4 alkyl group)
And a tertiary amine represented by the following formula (6):
(Wherein, R 10 is a C 1 to C 5 alkyl group, a C 2 to C 5 alkenyl group, a methylstyryl group, or an —OR 11 group, wherein R 11 is a C 1 to C 5 alkyl group, C 2 to C 5 alkenyl group, an alkynyl group of C2~C4, -C (O) R 12 groups, -R 13 -R 14 group, or - (B-O) n -H group, this time, R 12 is C1~C5 the alkenyl group of the alkyl group or C2-C5, R 13 is an alkylene group or -R 15 of C1~C8 -O-R 16 -O-R 17 - ( Here, R 15 to R 17 are each independently And is a C1 to C4 alkylene group), and R 14 is a group represented by the following formula:
Embedded image (in this case, R 7 to R 9 are as described above), B is a C 1 to C 8 alkylene group, and n is an integer of 1 to 100. )
A process for producing a compound according to claim 4, comprising reacting an epoxide represented by
請求項1に記載の化合物であるイオン性モノマーと、これと共重合可能な他のモノマーとを、水性媒体中で乳化重合させることを含む、水性コーティング用樹脂組成物の製造方法。 The manufacturing method of the resin composition for water-based coatings which comprises carrying out the emulsion polymerization of the ionic monomer which is a compound of Claim 1, and another monomer which can be copolymerized with this in an aqueous medium. 樹脂を形成させるための乳化重合を、請求項4に記載の化合物であるカチオン性界面活性剤の存在下で行うことを含む、水性コーティング用樹脂組成物の製造方法。 A method for producing a resin composition for aqueous coating, comprising conducting emulsion polymerization for forming a resin in the presence of a cationic surfactant which is the compound according to claim 4 . 乳化重合を、請求項に記載の化合物であるカチオン性界面活性剤の存在下で行う、請求項13に記載の水性コーティング用樹脂組成物の製造方法。 The method for producing a resin composition for aqueous coating according to claim 13, wherein the emulsion polymerization is carried out in the presence of a cationic surfactant which is the compound according to claim 4 . 前記水性媒体が水を含む、請求項1315のいずれか1項に記載の製造方法。 The method according to any one of claims 13 to 15 , wherein the aqueous medium comprises water.
JP2011066750A 2011-03-24 2011-03-24 Aqueous coating resin composition and method for producing the same Active JP5805969B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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Publications (3)

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JP2012201764A JP2012201764A (en) 2012-10-22
JP2012201764A5 true JP2012201764A5 (en) 2014-03-06
JP5805969B2 JP5805969B2 (en) 2015-11-10

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Publication number Priority date Publication date Assignee Title
JP2020528474A (en) * 2017-07-24 2020-09-24 ユニオン カーバイド コーポレーション Chloride-free cationic polymer using acetate anion
CN110869484A (en) 2017-07-24 2020-03-06 联合碳化公司 Detergent formulations containing mixed charge polymers

Family Cites Families (8)

* Cited by examiner, † Cited by third party
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US3780092A (en) * 1969-10-20 1973-12-18 Kendall & Co Monomeric emulsion stabilizers
JPS6078947A (en) * 1983-10-06 1985-05-04 Kao Corp Quaternary ammonium salt and reactive surfactant and high polymer modifier containing the same
JPH08253515A (en) * 1995-03-16 1996-10-01 Kansai Paint Co Ltd Surfactant and emulsion composition
JP2001011125A (en) * 1999-06-25 2001-01-16 Mitsubishi Chemicals Corp Cationic resin, and antistatic agent and ink jet recording material based on the resin
JP4173090B2 (en) * 2003-12-25 2008-10-29 本田技研工業株式会社 Alkaline cleaner
JP2009062406A (en) * 2007-09-04 2009-03-26 Aica Kogyo Co Ltd Antistatic agent, antistatic coating agent and antistatic film
JP5070298B2 (en) * 2007-12-14 2012-11-07 アイシン・エィ・ダブリュ株式会社 Surfactant
WO2011080922A1 (en) * 2009-12-28 2011-07-07 キヤノン株式会社 Developer support and developing device

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